Quartz tube cleaning device

Abstract

The utility model provides a quartz tube cleaning device which comprises a cleaning hook assembly, a device body and an acid storage assembly. A first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank and a cleaning tank are contained in the device body, and hot concentrated sulfuric acid in a preset temperature range is contained in the first concentrated sulfuric acid tank; hot concentrated sulfuric acid in the first concentrated sulfuric acid tank is recycled and stored through an acid storage assembly connected with the first concentrated sulfuric acid tank through an acid-resistant pipeline. Meanwhile, a sliding rail is arranged on the inner side of a top plate of the device body, and the cleaning hook assembly is in sliding connection with the sliding rail, so that the cleaning hook assembly can hook the quartz tube and move the quartz tube to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank for acid pickling, or move the quartz tube to the cleaning tank for cleaning and blow-drying through a cleaning brush head assembly; therefore, full-automatic cleaning of the quartz tube is completed, the possibility of manual contact with concentrated sulfuric acid is reduced, and the cleaning safety of the quartz tube is further improved.

Description

Technical Field

[0001] The utility model relates to the field of automatic cleaning equipment, in particular to a quartz tube cleaning device. Background Art

[0002] Gallium arsenide and indium phosphide substrates have application markets in the manufacture of high-frequency and high-power devices, optical fiber communications, wireless transmission, radio astronomy and other RF devices. RF devices made using indium phosphide substrates have demonstrated excellent performance in application scenarios such as satellites and radars. Indium phosphide substrates are highly competitive in the RF front end of radar and communication systems, analog / mixed signal wide-bandwidth circuits, and are suitable for applications such as high-speed data processing and high-precision wide-bandwidth A / D conversion. Indium phosphide substrates are expected to become the mainstream substrate material for RF devices.

[0003] The conventional process of manufacturing indium phosphide substrates is usually achieved through operations such as doping annealing or crystal growth of wafers or crystals. Various types of quartz tubes are required in this process. For semiconductor manufacturing, the cleanliness of the quartz tube is one of the key indicators.

[0004] The traditional quartz tube cleaning method is usually to manually place the quartz tube on a PVC hook, and then two people lift the hook with both hands and place it in a concentrated sulfuric acid tank for acid leaching. After the acid leaching, the staff will rinse it with a water gun. In the above scheme, people are likely to come into contact with concentrated sulfuric acid during the rinsing process or acid leaching process, which may cause burns and is less safe. Utility Model Content

[0005] The utility model discloses a quartz tube cleaning device, which solves the technical problem of low safety in existing quartz tube cleaning solutions, that personnel are easily exposed to concentrated sulfuric acid during the flushing process or the acid leaching process, which may cause burns.

[0006] The utility model embodiment provides a quartz tube cleaning device, including a cleaning hook component, a device body and an acid storage component;

[0007] The device body contains a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank and a cleaning tank;

[0008] The first concentrated sulfuric acid tank contains hot concentrated sulfuric acid in a preset temperature range, and the second concentrated sulfuric acid tank contains concentrated sulfuric acid at room temperature;

[0009] The acid storage component is connected to the first concentrated sulfuric acid tank through an acid-resistant pipeline for recovering and storing the hot concentrated sulfuric acid;

[0010] A slide rail is provided on the inner side of the top plate of the device body;

[0011] The cleaning hook assembly is slidably connected to the slide rail, and is used to hook the quartz tube and move it to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank for pickling, and then move it to the cleaning tank for cleaning;

[0012] The cleaning tank is equipped with a cleaning brush head assembly for cleaning the quartz tube.

[0013] Optionally, the first concentrated sulfuric acid tank is also connected to a pure water storage tank via a water inlet pipe;

[0014] The side wall of the first concentrated sulfuric acid tank is also provided with a plurality of spray ports connected to the water inlet pipe, which are used to spray the quartz tube when pure water is introduced from the pure water storage reservoir.

[0015] Optionally, a drain port is provided at the bottom of the first concentrated sulfuric acid tank for discharging the pure water;

[0016] Optionally, a circulation pump is also provided on the acid-resistant pipeline for responding to a recovery instruction, recovering the hot concentrated sulfuric acid to the acid storage component, and after the pure water is discharged, exporting the hot concentrated sulfuric acid from the acid storage component to the first concentrated sulfuric acid tank.

[0017] Optionally, the cleaning hook assembly includes a lifting frame, a hook beam, a first hook and a second hook;

[0018] The lifting frame and the hook beam are centrally connected;

[0019] The first hook and the second hook are respectively connected to two ends of the hook beam.

[0020] Optionally, the cleaning brush head assembly includes a movable fixing frame, a cleaning brush, a flushing pipe head and an air blowing pipe head;

[0021] The movable fixing frame is provided with the cleaning brush, the flushing pipe head and the blowing pipe head in sequence from bottom to top, and is used to clean the quartz tube in sequence.

[0022] Optionally, a placement rack is fixedly arranged in the cleaning tank for carrying the quartz tube;

[0023] The inner surface of the placement rack is provided with a plurality of rotating wheels for driving the quartz tube to rotate at a preset speed.

[0024] Optionally, the acid storage component is equipped with a spiral heating tube for heating and keeping the stored hot concentrated sulfuric acid warm.

[0025] Optionally, a storage mechanism is also included;

[0026] The storage mechanism is used to hook or clamp the dried quartz tube and move it to a target storage position.

[0027] Optionally, a quartz tube supporting frame is respectively provided at the bottom of the first concentrated sulfuric acid tank and the second concentrated sulfuric acid tank.

[0028] It can be seen from the above technical solutions that the embodiments of the utility model have the following advantages:

[0029] The embodiment of the utility model provides a quartz tube cleaning device, including a cleaning hook assembly, a device body and an acid storage assembly. The device body contains a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank and a cleaning tank. The first concentrated sulfuric acid tank is filled with hot concentrated sulfuric acid in a preset temperature range, and the second concentrated sulfuric acid tank is filled with concentrated sulfuric acid at room temperature. When the quartz tube moves to the second concentrated sulfuric acid tank for room temperature pickling, the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered and stored by the acid storage assembly connected to the first concentrated sulfuric acid tank through an acid-resistant pipe. At the same time, a slide rail is provided on the inner side of the top plate of the device body, and the cleaning hook assembly is slidably connected to the slide rail so that the cleaning hook assembly can hook the quartz tube and move it to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank for pickling, or move it to the cleaning tank to be cleaned and dried by the cleaning brush head assembly, thereby completing the fully automated cleaning of the quartz tube, reducing the possibility of manual contact with concentrated sulfuric acid, and further improving the safety of quartz tube cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0031] Figure 1 This is a structural schematic diagram of a quartz tube cleaning device provided in an embodiment of the utility model;

[0032] Figure 2 This is a structural schematic diagram of a cleaning hook assembly provided in an embodiment of the utility model;

[0033] Figure 3 A schematic diagram of the structure of a cleaning tank provided in an embodiment of the utility model;

[0034] Figure 4 The present invention is a schematic structural diagram of an acid storage component and a concentrated sulfuric acid tank provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0035] The utility model discloses a quartz tube cleaning device for solving the technical problem of low safety in that personnel are easily exposed to concentrated sulfuric acid during a flushing process or an acid leaching process, which may cause burns.

[0036] See also Figure 1-Figure 2 , Figure 1 This is a schematic diagram of the structure of a quartz tube cleaning device provided in an embodiment of the utility model. Figure 2 It is a structural schematic diagram of a cleaning hook assembly provided in an embodiment of the utility model.

[0037] The embodiment of the utility model provides a quartz tube cleaning device, comprising a cleaning hook assembly 2, a device body 1 and an acid storage assembly 3;

[0038] The device body 1 contains a first concentrated sulfuric acid tank 12, a second concentrated sulfuric acid tank 11 and a cleaning tank 13;

[0039] The first concentrated sulfuric acid tank 12 contains hot concentrated sulfuric acid in a preset temperature range, and the second concentrated sulfuric acid tank 11 contains concentrated sulfuric acid at room temperature;

[0040] The acid storage component 3 is connected to the first concentrated sulfuric acid tank 12 through an acid-resistant pipeline for recovering and storing the hot concentrated sulfuric acid;

[0041] A slide rail 4 is provided on the inner side of the top plate of the device body 1;

[0042] The cleaning hook assembly 2 is slidably connected to the slide rail 4, and is used to hook the quartz tube and move it to the first concentrated sulfuric acid tank 12 or the second concentrated sulfuric acid tank 11 for pickling, and then move it to the cleaning tank 13 for cleaning;

[0043] The cleaning tank 13 is equipped with a cleaning brush head assembly for cleaning the quartz tube.

[0044] In the embodiment of the utility model, the quartz tube cleaning device includes a cleaning hook assembly 2, a device body 1 and an acid storage assembly 3, wherein the device body 1 is fixedly provided with a first concentrated sulfuric acid tank 12, a second concentrated sulfuric acid tank 11 and a cleaning tank 13, and the acid storage assembly 3 is connected to the bottom of the first concentrated sulfuric acid tank 12 through an acid-resistant pipe, so as to facilitate the introduction of hot concentrated sulfuric acid in the acid storage assembly 3 to the first concentrated sulfuric acid tank 12, or to recover and store hot concentrated sulfuric acid. In addition, a slide rail 4 is also provided on the inner side of the top plate of the device body 1, and the cleaning hook assembly 2 is slidably connected to the slide rail 4 to move the hooked quartz tube to the first concentrated sulfuric acid tank 12, the second concentrated sulfuric acid tank 11 or the cleaning tank 13 for corresponding pickling or cleaning.

[0045] When the user needs to clean the quartz tube, a command can be sent to control the cleaning hook assembly 2 to hook the quartz tube or directly place the quartz tube on the hook of the cleaning hook assembly 2. After the quartz tube is hooked by the cleaning hook assembly 2, it is moved to the first concentrated sulfuric acid tank 12 for pickling with hot concentrated sulfuric acid, and then moved to the second concentrated sulfuric acid tank 11 for pickling with concentrated sulfuric acid at room temperature. When the quartz tube moves to the second concentrated sulfuric acid tank 11, in order to avoid heat loss and facilitate subsequent water washing, the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank 12 can be recovered and stored by the acid storage assembly 3, and pure water can be introduced through the water inlet pipe 33. After the quartz tube completes the pickling of the second concentrated sulfuric acid tank 11, it is moved to the first concentrated sulfuric acid again for pure water spraying, and then moved to the cleaning tank 13 for cleaning through the cleaning brush head assembly, thereby completing the automatic cleaning of the quartz tube.

[0046] See also Figure 3 , Figure 3 It is a structural schematic diagram of a cleaning tank in an embodiment of the utility model.

[0047] Among them, the cleaning tank 13 can be larger in size than the first concentrated sulfuric acid tank 12 and the second concentrated sulfuric acid tank 11 because it has a built-in cleaning brush head assembly and a placement rack 135. The second concentrated sulfuric acid tank 11 can be the same size as the first concentrated sulfuric acid tank 12 or smaller in size than the first concentrated sulfuric acid tank 12 because it only needs to be pickled.

[0048] See also Figure 4 , Figure 4 It is a structural schematic diagram of an acid storage component and a concentrated sulfuric acid tank in an embodiment of the utility model.

[0049] In one example of the present invention, the first concentrated sulfuric acid tank 12 is also connected to a pure water storage reservoir via a water inlet pipe 33;

[0050] The side wall of the first concentrated sulfuric acid tank 12 is also provided with a plurality of spray ports connected to the water inlet pipe 33 for spraying the quartz tube when pure water is introduced from the pure water storage reservoir.

[0051] In this embodiment, the first concentrated sulfuric acid tank 12 is also connected to the pure water storage tank through the water inlet pipe 33. In order to realize the spraying operation on the quartz tube and the injection of pure water, a plurality of spray ports connected to the water inlet pipe 33 can be opened on the side wall of the first concentrated sulfuric acid tank 12. When pure water is introduced from the pure water storage tank, the quartz tube can be soaked for a period of time, and the concentrated sulfuric acid remaining on the surface can be diluted and then discharged through the drain port at the bottom of the first concentrated sulfuric acid tank 12, and then pure water can be continuously introduced through the spray port to perform the spraying operation on the quartz tube.

[0052] Furthermore, a drain port is provided at the bottom of the first concentrated sulfuric acid tank 12 for discharging the pure water;

[0053] In this embodiment, a drain port may also be provided at the bottom of the first concentrated sulfuric acid tank 12. When the pure water needs to be discharged, for example, after the quartz tube is soaked with pure water, the pure water can be discharged by opening the drain port. In addition, to facilitate the discharge of pure water during the spraying process, the drain port may be kept open until the pure water is discharged.

[0054] In another example of the utility model, a circulation pump 31 is also provided on the acid-resistant pipeline, which is used to respond to the recovery instruction, recover the hot concentrated sulfuric acid to the acid storage component 3, and after the pure water is discharged, export the hot concentrated sulfuric acid from the acid storage component 3 to the first concentrated sulfuric acid tank 12.

[0055] See also Figure 2 In one example of the present utility model, the cleaning hook assembly 2 includes a lifting frame 21, a hook beam 22, a first hook 23 and a second hook 24;

[0056] The lifting frame 21 is centrally connected to the hook beam 22;

[0057] The first hook 23 and the second hook 24 are connected to two ends of the hook beam 22 respectively.

[0058] In this embodiment, the cleaning hook can be constructed by combining a lifting frame 21, a hook beam 22, a first hook 23 and a second hook 24. The lifting frame 21 is connected to the center of the hook beam 22 to keep the first hook 23 and the second hook 24 at the left and right ends of the hook beam 22 in a balanced state. At the same time, the quartz tube can be hooked by the first hook 23 and the second hook 24, and the cleaning hook assembly 2 is lifted and lowered as a whole by the lifting frame 21 to adjust the quartz tube to move up and down.

[0059] In addition, the cleaning hook assembly 2 and the slide rail 4 are slidably connected to move the quartz tube to each slot for corresponding cleaning.

[0060] See also Figure 3 The cleaning brush head assembly includes a movable fixing frame 134, a cleaning brush 133, a flushing pipe head 132 and an air blowing pipe head 131;

[0061] The movable fixing frame 134 is provided with the cleaning brush 133 , the flushing pipe head 132 and the blowing pipe head 131 in sequence from bottom to top, so as to clean the quartz tube in sequence.

[0062] In this embodiment, the cleaning brush head assembly drives the cleaning brush 133, the flushing pipe head 132 and the blowing pipe head 131 to adjust their positions through the movable fixing frame 134. For example, when the cleaning brush 133 cleans the quartz tube, it first rises to the same plane as the quartz tube through the movable fixing frame 134 and aligns the cleaning brush 133 with the test tube opening of the quartz tube, and then drives the cleaning brush 133 to move into the interior of the quartz tube through the movable fixing frame 134, and then the cleaning brush 133 rotates around its center to clean the quartz tube. After the cleaning brush 133 is cleaned, the cleaning brush 133 is driven out of the quartz tube by the movable fixing frame 134, and is moved down to the flushing pipe head 132 to be in the same plane as the quartz tube and aligned with its test tube opening and moved in, and the interior of the quartz tube is further cleaned by flushing. After the flushing and cleaning is completed, the air blowing pipe head 131 is moved down to the same plane as the quartz tube and is aligned with the test tube opening and moved in, and air is further blown into the inside of the quartz tube to dry the residual water stains in the quartz tube.

[0063] Optionally, a placement rack 135 is fixedly disposed in the cleaning tank 13 for carrying the quartz tube;

[0064] The inner surface of the placement rack 135 is provided with a plurality of rotating wheels for driving the quartz tube to rotate at a preset speed.

[0065] In this embodiment, in order to facilitate the cleaning of the quartz tube, a placement rack 135 can be fixedly arranged in the cleaning tank 13, and after the hook assembly 2 to be cleaned moves the quartz tube to the placement rack 135, the quartz tube is carried by the placement rack 135. At the same time, the inner surface of the placement rack 135 can be provided with a plurality of rotating wheels, which rotate at a preset speed to drive the quartz tube to rotate, so as to further improve the cleaning effect of the cleaning brush head assembly on the quartz tube.

[0066] See also Figure 4 In one example of the present utility model, the acid storage component 3 is built with a spiral heating tube 32 for heating and keeping the stored hot concentrated sulfuric acid warm.

[0067] In one example of the present invention, a storage mechanism is also included;

[0068] The storage mechanism is used to hook or clamp the dried quartz tube and move it to a target storage position.

[0069] In this embodiment, the storage mechanism may be a clamping mechanism or a hooking mechanism, and the storage mechanism is called to clamp or hook the blow-dried quartz tube and move it to a target storage position for storage.

[0070] Optionally, a quartz tube supporting frame 5 is provided at the bottom of each of the first concentrated sulfuric acid tank 12 and the second concentrated sulfuric acid tank 11 .

[0071] In this embodiment, in order to improve the cleaning quality of the quartz tube, a quartz tube support rack 5 can be respectively arranged at the bottom of the first concentrated sulfuric acid tank 12 and the second concentrated sulfuric acid tank 11, and the quartz tube is released after the cleaning hook moves the quartz tube to the quartz tube support rack 5, and the quartz tube is pickled by ultrasonic vibration therein. After the pickling is completed, the hook is taken again.

[0072] In the specific implementation, a cleaning hook made of Teflon material is used as a hooking mechanism to hook the quartz tube. After the acid storage component heats the concentrated sulfuric acid to 75±5°C, the hot concentrated sulfuric acid is introduced into the first concentrated sulfuric acid tank, such as 20 liters, by starting the acid-proof, alkali-proof and high-temperature-proof circulation pump, and then the quartz tube is moved into the hot concentrated sulfuric acid for 60 seconds by the cleaning hook, and at the same time, the ultrasonic vibration cleaning with a frequency of 40 Hz is turned on. After the hot concentrated sulfuric acid peracid cleaning is completed, the quartz tube is moved into the second concentrated sulfuric acid tank for peracid cleaning for 30 seconds through the cleaning hook, and the ultrasonic vibration collaborative cleaning with a frequency of 40 Hz can also be turned on. At the same time, the acid-proof, alkali-proof and high-temperature-proof circulation pump is started to recycle the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank to the acid storage component for insulation, and the working mode of the first concentrated sulfuric acid tank is switched to the flushing mode, and about 40 liters of pure water are injected into the tank through the water inlet pipe. After the pure water injection is completed, the cleaning hook lifts the quartz tube from the second concentrated sulfuric acid tank and moves it into the first concentrated sulfuric acid tank for immersion for 10 seconds, and the drain port is opened to quickly discharge the pure water in the first concentrated sulfuric acid tank. After discharging the pure water, continue to spray and rinse the quartz tube through the water inlet pipe for 120 seconds. After the spray and rinse is completed, the quartz tube is moved to the placement rack in the cleaning tank through the cleaning hook and fixed. The placement rack drives the quartz tube to rotate at 20 rpm. First, use a special brush to clean for 30 seconds, use a special flushing pipe head to rinse for 30 seconds, and use a special nitrogen blowing pipe to blow normal temperature nitrogen for 30 seconds, then heat the nitrogen to 30°C, blow dry with hot air, complete the tube cleaning, hook the dried quartz tube through the storage hook mechanism, and move it to the target storage position.

[0073] In the embodiment of the utility model, a quartz tube cleaning device is provided, including a cleaning hook assembly, a device body and an acid storage assembly. The device body contains a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank and a cleaning tank. The first concentrated sulfuric acid tank is filled with hot concentrated sulfuric acid in a preset temperature range, and the second concentrated sulfuric acid tank is filled with concentrated sulfuric acid at room temperature. When the quartz tube moves to the second concentrated sulfuric acid tank for room temperature pickling, the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered and stored by the acid storage assembly connected to the first concentrated sulfuric acid tank through an acid-resistant pipe. At the same time, a slide rail is provided on the inner side of the top plate of the device body, and the cleaning hook assembly is slidably connected to the slide rail so that the cleaning hook assembly can hook the quartz tube and move it to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank for pickling, or move it to the cleaning tank to be cleaned and blown dry by the cleaning brush head assembly, thereby completing the fully automated cleaning of the quartz tube, reducing the possibility of manual contact with concentrated sulfuric acid, and further improving the safety of quartz tube cleaning.

[0074] The above is a detailed introduction to a quartz tube cleaning device provided by the utility model. For those skilled in the art, according to the idea of ​​the embodiment of the utility model, there will be changes in the specific implementation method and application scope. In summary, the content of this specification should not be understood as a limitation on the utility model.

Claims

1. A quartz tube cleaning device, characterized in that: It includes a cleaning hook assembly, a device body and an acid storage assembly; The device body contains a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank and a cleaning tank; The first concentrated sulfuric acid tank contains hot concentrated sulfuric acid in a preset temperature range, and the second concentrated sulfuric acid tank contains concentrated sulfuric acid at room temperature; The acid storage component is connected to the first concentrated sulfuric acid tank through an acid-resistant pipeline for recovering and storing the hot concentrated sulfuric acid; A slide rail is provided on the inner side of the top plate of the device body; The cleaning hook assembly is slidably connected to the slide rail, and is used to hook the quartz tube and move it to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank for pickling, and then move it to the cleaning tank for cleaning; The cleaning tank is equipped with a cleaning brush head assembly for cleaning the quartz tube.

2. The quartz tube cleaning device according to claim 1, characterized in that: The first concentrated sulfuric acid tank is also connected to a pure water storage tank via a water inlet pipe; The side wall of the first concentrated sulfuric acid tank is also provided with a plurality of spray ports connected to the water inlet pipe, which are used to spray the quartz tube when pure water is introduced from the pure water storage reservoir.

3. The quartz tube cleaning device according to claim 2, characterized in that: A drain port is provided at the bottom of the first concentrated sulfuric acid tank for discharging the pure water.

4. The quartz tube cleaning device according to claim 3, characterized in that: The acid-resistant pipeline is also provided with a circulation pump for responding to a recovery instruction, recovering the hot concentrated sulfuric acid to the acid storage component, and after the pure water is discharged, exporting the hot concentrated sulfuric acid from the acid storage component to the first concentrated sulfuric acid tank.

5. The quartz tube cleaning device according to claim 1, characterized in that: The cleaning hook assembly includes a lifting frame, a hook beam, a first hook and a second hook; The lifting frame and the hook beam are centrally connected; The first hook and the second hook are respectively connected to two ends of the hook beam.

6. The quartz tube cleaning device according to claim 1, characterized in that: The cleaning brush head assembly comprises a movable fixing frame, a cleaning brush, a flushing pipe head and an air blowing pipe head; The movable fixing frame is provided with the cleaning brush, the flushing pipe head and the blowing pipe head in sequence from bottom to top, and is used to clean the quartz tube in sequence.

7. The quartz tube cleaning device according to claim 1, characterized in that: A placement rack is also fixedly arranged in the cleaning tank for carrying the quartz tube; The inner surface of the placement rack is provided with a plurality of rotating wheels for driving the quartz tube to rotate at a preset speed.

8. The quartz tube cleaning device according to claim 1, characterized in that: The acid storage component is equipped with a spiral heating tube for heating and keeping the stored hot concentrated sulfuric acid warm.

9. The quartz tube cleaning device according to claim 1, characterized in that: It also includes storage institutions; The storage mechanism is used to hook or clamp the dried quartz tube and move it to a target storage position.

10. The quartz tube cleaning device according to claim 1, characterized in that: A quartz tube supporting frame is respectively provided at the bottom of the first concentrated sulfuric acid tank and the second concentrated sulfuric acid tank.

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