Base and reaction chamber

Abstract

The utility model provides a base and a reaction chamber. The base comprises a base body, a connecting arm, a first auxiliary cantilever and two second auxiliary cantilevers, wherein the connecting arm, the first auxiliary cantilever and the two second auxiliary cantilevers are uniformly distributed along the circumferential direction of the base body at intervals; one end of the connecting arm is connected with the base body, and the other end is connected with the inner side wall of the reaction chamber; one end of the first auxiliary cantilever is connected with the base body; the two second auxiliary cantilevers are located between the connecting arm and the first auxiliary cantilever. And one end of the second auxiliary cantilever is detachably connected with the base body. By adopting the base in the scheme, at least part of space in the reaction chamber is divided into the four airflow channels by the base, the four airflow channels are distributed in a central symmetry manner, and the centers of the four airflow channels are positioned on the central axis of a processed workpiece, so that an airflow field in the reaction chamber is in a central symmetry manner; and the airflow field has good symmetry and uniformity.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, specifically to a base and a reaction chamber. Background Technology

[0002] Plasma processing equipment is widely used for etching or deposition on the surfaces of workpieces such as substrates. In semiconductor processing, the uniformity of plasma is an important indicator affecting process quality, and the uniformity of plasma is closely related to the symmetry of the gas flow field formed by the process gas in the reaction chamber.

[0003] In existing technologies, the base is cantilevered within the reaction chamber. Because the cantilever obstructs the process gas, the airflow field within the reaction chamber is asymmetrical relative to the center of the workpiece, resulting in an asymmetrical distribution of airflow around the workpiece. This, in turn, affects the uniformity of the plasma, leading to low process quality. Utility Model Content

[0004] This utility model aims to solve at least one of the technical problems existing in the prior art, and proposes a base and reaction chamber.

[0005] In a first aspect, the present invention provides a base for use in a reaction chamber, the base comprising: a base body and connecting arms, a first auxiliary cantilever and two second auxiliary cantilever that are circumferentially spaced and evenly distributed along the base body;

[0006] One end of the connecting arm is connected to the base body, and the other end is used to connect to the inner wall of the reaction chamber; one end of the first auxiliary cantilever is connected to the base body; two second auxiliary cantilever arms are located between the connecting arm and the first auxiliary cantilever arm; one end of the second auxiliary cantilever arm is detachably connected to the base body.

[0007] In one possible implementation of the first aspect of this utility model, the second auxiliary cantilever includes a main arm and a connecting plate. One end of the main arm is fixedly connected to the connecting plate, and the connecting plate is detachably connected to the base body. The circumferential edge of the connecting plate protrudes from one end of the main arm along a direction parallel to the longitudinal section of the main arm.

[0008] In one possible implementation of the first aspect of this utility model, an arc-shaped groove is recessed on the outer peripheral surface of the base body, and the center of the arc-shaped groove is located on the central axis of the base body; the connecting plate is an arc-shaped plate, which is embedded in the arc-shaped groove and can be removed from the arc-shaped groove.

[0009] In one possible implementation of the first aspect of this utility model, the arc-shaped plate is housed in and adapted to the arc-shaped groove, and the arc surface of the arc-shaped plate facing the main arm is coplanar with the outer peripheral surface of the base body.

[0010] In one possible implementation of the first aspect of this utility model, the arc-shaped groove has a groove top wall and a groove bottom wall that are spaced apart and parallel along the extension direction of the central axis of the base body, and the groove top wall and the groove bottom wall are both located between the top surface and the bottom surface of the base body; the arc-shaped plate can be moved out of the arc-shaped groove from the groove opening along the radial direction of the base body; the arc-shaped plate is also detachably connected to the base body by fasteners.

[0011] In one possible implementation of the first aspect of this utility model, the connecting arm has an internal hollow structure, and the hollow cavity of the connecting arm is used for the passage of cables connecting the power supply and electrodes on the reaction chamber and / or pipes connecting the cooling source and cooling channel on the reaction chamber; and / or, the first auxiliary cantilever and the second auxiliary cantilever have internal hollow structures.

[0012] In one possible implementation of the first aspect of this utility model, the other end of the connecting arm is used to connect to a chamber door in the reaction chamber for opening and closing openings on the side walls.

[0013] When the chamber door is opened and the second auxiliary cantilever is separated from the base body, the second auxiliary cantilever can be moved out of the reaction chamber through the opening. When both second auxiliary cantilever and base body are separated, the remaining parts of the base can be moved out of the reaction chamber through the opening.

[0014] In one possible implementation of the first aspect of this utility model, there are gaps between the other ends of the first auxiliary cantilever and the second auxiliary cantilever and the inner wall of the reaction chamber.

[0015] In one possible implementation of the first aspect of this utility model, the width of the gap is greater than or equal to 1 mm and less than or equal to 3 mm.

[0016] In one possible implementation of the first aspect of this utility model, one end of the connecting arm is located in the first space of the cavity of the reaction chamber, and the other end is located in the second space of the cavity. The base body, the first auxiliary cantilever and the second auxiliary cantilever are all located in the first space. The cross-section of the first space is circular and it communicates with the outside of the cavity through the second space when the opening is open.

[0017] Furthermore, the portion of the base located within the first space divides the first space into four airflow channels, which are centrally symmetrically distributed.

[0018] Secondly, the present invention provides a reaction chamber, which includes a cavity and any of the bases provided in the first aspect of the present invention, with the base disposed within the cavity.

[0019] This utility model has the following beneficial effects:

[0020] The base provided by this utility model has a connecting arm, a first auxiliary cantilever, and two second auxiliary cantilever externally connected to its annular body. Part of the base's structure is centrally symmetrical, making the airflow field symmetrical with respect to the center of the workpiece. Thus, on the one hand, the airflow distribution in the circumferential direction of the workpiece has good symmetry; on the other hand, the airflow distribution is the same on both sides of the annular body along the first radial direction and along the second radial direction, resulting in good uniformity of the airflow field. This is beneficial for improving plasma uniformity and thus enhancing process quality. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the reaction chamber of a plasma processing device in the related art;

[0022] Figure 2 A schematic cross-sectional view of a reaction chamber along the frontal viewing direction is provided for an embodiment of this application;

[0023] Figure 3 for Figure 2 A schematic cross-sectional view of the reaction chamber shown from a top-down perspective;

[0024] Figure 4 A cross-sectional schematic diagram of a second auxiliary cantilever in a reaction chamber provided in an embodiment of this application;

[0025] Figure 5 A cross-sectional schematic diagram of the annular body of a base and a second auxiliary cantilever in a reaction chamber provided in an embodiment of this application;

[0026] Figure 6 This is a partial structural diagram of a base in a reaction chamber provided in an embodiment of this application;

[0027] Figure 7 A cross-sectional schematic diagram of the annular body of another base in the reaction chamber provided in this application embodiment, cooperating with a second auxiliary cantilever.

[0028] Explanation of reference numerals in the attached figures:

[0029] 100-Reaction Chamber;

[0030] 10 - Intake device;

[0031] 20 - Air extraction device; 21 - Valve; 22 - Air extraction pump;

[0032] 30 - Cavity; 31 - First space; 32 - Second space; 33 - Exhaust port; 34 - Cavity body 34;

[0033] 40-Cavity door;

[0034] 50 - Base; 51 - Base body; 511 - Threaded hole; 512 - Arc-shaped groove; 52 - Connecting arm;

[0035] 53-First auxiliary cantilever; 54-Second auxiliary cantilever; 541-Connecting plate; 5411-Through hole; 5412-Receiving groove; 5413-Second arc surface; 542-Main arm;

[0036] 60-Chuck;

[0037] 70-Screw;

[0038] 80 - Sealing ring;

[0039] 90-Inducing coil;

[0040] 200 - Workpiece to be processed. Detailed Implementation

[0041] Figure 1 A schematic diagram of the reaction chamber of a plasma processing apparatus in the related art is shown. Figure 1 The reaction chamber 100' shown includes: a chamber 30', a base 50' disposed within the chamber 30', an air inlet device 10' disposed at the top of the chamber 30', and an air extraction device 20' disposed at the bottom of the chamber 30'. The base 50' is used to support the workpiece 200 being processed. The air inlet device 10' is used to introduce process gas into the chamber 30'. The air extraction device 20' is used to extract the process gas from the chamber 30' to form an airflow field within the chamber 30'. The base 50' is connected to the chamber wall of the chamber 30' via a cantilever 52'. This cantilever 52' ​​obstructs the flow of process gas, causing the airflow field in the chamber 30' to be asymmetrical relative to the center of the workpiece 200. This results in an asymmetrical distribution of airflow around the workpiece 200, affecting plasma uniformity and leading to low process quality.

[0042] In view of this, the following embodiments of this application provide a base and a reaction chamber. The base has four arms, which makes the airflow field centrally symmetrical, and two of the four arms are detachable. To enable those skilled in the art to better understand the technical solution of this utility model, the base and reaction chamber provided by this utility model will be described in detail below with reference to the accompanying drawings.

[0043] The reaction chamber can be used for processes including, but not limited to, plasma-enhanced chemical vapor deposition (PECVD).

[0044] By supplying process gas into the reaction chamber, the process gas is excited into plasma, which is then used to perform processing techniques such as material deposition or etching on the surface of the workpiece. It is evident that the uniformity of the surface treatment of the workpiece is related to the uniformity of the plasma, which in turn is related to the uniformity of the gas flow generated by the process gas.

[0045] Figure 2 This is a cross-sectional schematic diagram of a reaction chamber along the frontal viewing direction, provided as an embodiment of this application. Figure 3 for Figure 2 The diagram shows a cross-sectional view of the reaction chamber from a top-down perspective. Please refer to it. Figure 2 and Figure 3 The reaction chamber 100 includes a chamber 30, a lower electrode device, an air inlet device 10, an air extraction device 20, and a radio frequency device (not shown in the figure).

[0046] An inlet device 10 is located at the top of the cavity 30 for introducing process gas into the cavity 30. An exhaust port 33 is located at the bottom of the cavity 30, and a vacuum pump 20 is located at the bottom of the cavity 30 for evacuating the interior of the cavity 30 to maintain a certain vacuum level. Specifically, the vacuum pump 20 may include a controller, a vacuum pump 22, and a valve 21. The valve 21 is located at the exhaust port 33, and the controller is connected to the valve 21 to control its opening. When the valve 21 is open, the vacuum pump 22 operates to drive the gas inside the cavity 30 to flow out of the cavity 30 through the exhaust port 33. The vacuum pump 22 disclosed herein may be a dry pump, a molecular pump, or other vacuum pumps well known to those skilled in the art.

[0047] The radio frequency device includes a radio frequency power supply, a matching unit, and at least one radio frequency coil. The radio frequency power supply is used to provide radio frequency power to the radio frequency coil through the matching unit so that the radio frequency coil excites the process gas in the cavity 30 to generate plasma.

[0048] The lower electrode device includes a base 50 and a chuck 60 disposed within the cavity 30. The chuck 60 is located above and stacked on the base 50. The base 50 is used to support the chuck 60. The side of the chuck 60 facing away from the base 50 is used to support the workpiece 200 to be processed. Plasma is deposited on the workpiece 200 to perform process treatment on the surface of the workpiece 200.

[0049] The specific structure of the base 50 provided in the embodiments of this application will be described in detail below with reference to the accompanying drawings.

[0050] The base 50 includes a base body 51, a connecting arm 52, a first auxiliary cantilever 53, and two second auxiliary cantilever 54. The connecting arm 52, the first auxiliary cantilever 53, and the two second auxiliary cantilever 54 are evenly distributed circumferentially around the base body 51, and the two second auxiliary cantilever 54 are located between the connecting arm 52 and the first auxiliary cantilever 53. That is, the two second auxiliary cantilever 54 are respectively arranged on both sides of the base body 51 along a first radial direction, and the connecting arm 52 and the first auxiliary cantilever 53 are respectively arranged on both sides of the base body 51 along a second radial direction. The first radial direction and the second radial direction are perpendicular to the extension direction of the central axis of the base body 51. For ease of description, in the various figures of the embodiments of this application, the directions of the X-axis, Y-axis, and Z-axis represent the extension directions of the first radial direction, the second radial direction, and the central axis of the base body 51, respectively.

[0051] One end of the connecting arm 52 is fixedly connected to the base body 51, and the other end is fixedly connected to the inner wall of the reaction chamber 100 (i.e., the inner wall of the cavity 30), so that the base 50 can be stably installed in the cavity 30. One end of the first auxiliary cantilever 53 is fixedly connected to the base body 51, and the other end is a free end. One end of the second auxiliary cantilever 54 is detachably connected to the base body 51, and the other end is a free end.

[0052] It is worth noting that, along the Z-direction extending from the central axis of the base body 51, the orthographic projections of the connecting arm 52, the first auxiliary cantilever 53, and the two second auxiliary cantilever 54 onto the bottom surface of the cavity 30 are identical. This results in the base 50 dividing at least a portion of the space within the cavity 30 into four airflow channels, which are centrally symmetrically distributed, with their centers located along the central axis of the workpiece being processed. It should be noted that the top surfaces of the connecting arm 52, the first auxiliary cantilever 53, and the two second auxiliary cantilever 54 are on the same plane, and each arm obstructs the process gas at the same height. Thus, the airflow generated by the process gas is symmetrically obstructed by the four arms, allowing the airflow to flow stably through the four airflow channels. The airflow field is centrally symmetrical with respect to the workpiece 200, and the airflow distribution is identical on both sides of the base 50 along the first radial direction X and the second radial direction Y. This improves the uniformity of the airflow field, thereby enhancing the symmetry and uniformity of the plasma distribution within the process space, and ultimately improving the process quality.

[0053] As described above, the reaction chamber 100 of this embodiment is externally connected to a base body 51 with a base 50, a connecting arm 52, a first auxiliary cantilever 53, and two second auxiliary cantilever 54. Part of the structure of the base 50 is centrally symmetrical to ensure that the airflow field within the chamber 30 is symmetrical relative to the center of the workpiece 200. Thus, on the one hand, the airflow distribution in the circumferential direction of the workpiece 200 has good symmetry; on the other hand, the airflow distribution on both sides of the base body 51 along the first radial direction X and along the second radial direction Y is approximately the same, and the airflow field also has good uniformity, which helps to improve the uniformity of the plasma, thereby improving the process quality.

[0054] In an embodiment not shown in the figure, the cross-sectional shape of the cavity 30 may be square, and the central axis of the base body 51 coincides with the central axis of the cavity 30. Then, the bases 50 installed in the cavity 30 are symmetrically distributed about the center of the cavity 30.

[0055] In a specific example of this application, such as Figure 3 As shown, the cavity 30 is constructed to have a first space 31 and a second space 32 communicating with the first space 31. The first space 31 has a circular cross-section, while the second space 32 has an irregular shape. When the base 50 is located inside the cavity 30, one end of the connecting arm 52 is located in the first space 31, and the other end is located in the second space 32. The base body 51, the first auxiliary cantilever 53, and the second auxiliary cantilever 54 are all located in the first space 31. Thus, the portion of the base 50 located in the first space 31 divides the first space 31 into four airflow channels. The portion of the base 50 located in the first space 31 is related to... Figure 6 The first radial axis O1 in the middle is symmetric and about Figure 6 The second radial axis O2 is symmetrical. Thus, the portion of the base 50 located within the first space 31 is centrally symmetrically distributed, and the four airflow channels are also centrally symmetrically distributed, which helps to improve the uniformity of the airflow field distribution.

[0056] It should be noted that the fixed connection between the other end of the connecting arm 52 and the inner wall of the reaction chamber 100 (i.e., the inner wall of the cavity 30) should be interpreted in a broad sense.

[0057] For example, when the cavity 30 includes a base plate and a circumferential surrounding plate connected to the edge of the base plate and extending upward toward the base plate, it can be understood that the other end of the connecting arm 52 is connected to the circumferential surrounding plate.

[0058] For example, please refer to Figure 3The cavity 30 includes a cavity body 34 and a cavity door 40. The side wall of the cavity body 34 has an opening. The cavity door 40 is detachably connected to the cavity body 34 to open and close the opening. Exemplarily, the cavity door 40 and the cavity body 34 are detachably connected by screws 70. Alternatively, a snap-fit ​​technique can be used to achieve the detachable connection between the cavity door 40 and the cavity body 34. When the cavity door 40 is connected to the cavity body 34, the cavity door 40 covers the opening, and the cavity body 34 and the cavity door 40 together enclose a process space. The side of the cavity door 40 facing the opening and the inner side of the cavity body 34 together form the inner sidewall of the cavity 30. When the cavity door 40 is detached from the cavity body 34, the opening opens. Figure 3 In the specific example shown, the process space can be considered as including a first space 31 and a second space 32 that are connected to each other, with the first space 31 communicating with the opening through the second space 32. In this example, it can be understood that the other end of the connecting arm 52 is fixedly connected to the chamber door 40.

[0059] In an embodiment where the other end of the connecting arm 52 is fixedly connected to a chamber door 40 used to open and close an opening on the side wall of the chamber body 34, the base 50 is further configured such that a second auxiliary cantilever 54, which is detached from the base body 51 when the chamber door 40 is opened, can be moved out of the chamber 30 through the opening. Furthermore, when both second auxiliary cantilever 54 are detached from the base body 51, the remaining portion of the base 50 (i.e., the base body 51 and the connecting arm 52 and the first auxiliary cantilever 53 connected thereto) can be moved out of the chamber 30 through the opening.

[0060] In a specific example, such as Figure 3 As shown, the cavity 30 is configured to have a first space 31 and a second space 32 inside. The first space 31 communicates with an opening through the second space 32, and the dimension D3 of the opening along the first radial direction X is smaller than the inner diameter D2 of the first space 31. In this embodiment, when the second auxiliary cantilever 54 is connected to the base body 51, the maximum dimension D1 of the base 50 along the first radial direction X is greater than the dimension D3 of the opening along the first direction, and the outer diameter D4 of the base body 51 is smaller than the dimension D3 of the opening along the first radial direction X. This allows the remaining part of the base 50 (i.e., the base body 51 and the connecting arm 52 and the first auxiliary cantilever 53 connected to it) to be moved out of the cavity 30 through the opening when both second auxiliary cantilever 54 are detached from the base body 51. It should be understood that the maximum height H1 of the lower electrode device along the extension direction Z of the central axis of the base body 51 is less than the height H2 of the opening along the extension direction Z of the central axis of the base body 51, so that the lower electrode device can pass through the opening after the two second auxiliary cantilever arms 54 are removed, and thus the lower electrode device with the two second auxiliary cantilever arms 54 removed can be moved outside the cavity 30 for maintenance.

[0061] With a reaction chamber of 100 Figure 3As shown in the example, an exemplary disassembly process of the lower electrode device in this embodiment is as follows: the chamber door 40 is disassembled from the chamber body 34 of the cavity 30; the chamber door 40 and the base 50 connected thereto are moved a certain distance away from the chamber body 34 along the second radial direction Y, so that while the opening is open, the first auxiliary cantilever 53 and the second auxiliary cantilever 54 of the base 50 are still located in the first space 31; the second auxiliary cantilever 54 extends from between the chamber door 40 and the chamber body 34 to the opening, and then sequentially extends through the opening and the second space 32 into the first space 31, so as to install the second auxiliary cantilever 54. Disassemble from the base body 51; then move the disassembled second auxiliary cantilever 54 through the second space 32 to the opening, and then move it from the opening to between the chamber door 40 and the chamber body 34 before moving it out of the cavity 30; after both second auxiliary cantilever 54 have been moved out of the cavity 30, move the chamber door 40 and the remaining part of the base 50 connected to it (i.e., the base body 51 and the connecting arm 52 and the first auxiliary cantilever 53 connected to it) along the second radial direction Y away from the cavity 30 until the remaining part of the base 50 is completely moved out of the cavity through the opening.

[0062] In this embodiment, since one end of the second auxiliary cantilever 54 is detachably connected to the base body 51, after the chamber door 40 is opened, the second auxiliary cantilever 54 can be detached from the base body 51 and moved out of the cavity 30 through the opening. After the two second auxiliary cantilever 54 are removed, the rest of the base 50 can also be moved out of the cavity 30 through the opening, so that the lower electrode device can be moved out of the cavity 30 for maintenance when it malfunctions.

[0063] In summary, the reaction chamber 100 of this embodiment can balance the uniformity of the airflow field and the maintainability of the lower electrode device.

[0064] In some embodiments, please refer to Figure 3 A sealing ring 80 can be provided between the chamber door 40 and the chamber body 34 to make the chamber door 40 and the chamber body 34 in sealed contact, thereby improving the sealing performance of the chamber 30.

[0065] Please continue to refer to this. Figure 3 In the embodiment where the other end of the connecting arm 52 is fixedly connected to the chamber door 40, the base 50 is further configured such that there is a gap between the other ends of the first auxiliary cantilever 53 and the second auxiliary cantilever 54 and the inner wall of the reaction chamber 100 (i.e., the inner wall of the cavity 30). This configuration ensures that neither the first auxiliary cantilever 53 nor the second auxiliary cantilever 54 contacts the cavity 30, preventing the second auxiliary cantilever 54 from scraping against the cavity 30 and scratching its inner wall during disassembly or assembly.

[0066] Furthermore, the width d of the gap ranges from 1mm to 3mm, preferably 2mm. For example, specifically, the cavity 30 is constructed to have a first space 31 and a second space 32 inside. When the cross-section of the first space 31 is circular and the inner diameter is D2, the end faces of the other ends of the first auxiliary cantilever 53 and the second auxiliary cantilever 54 can both be arc surfaces. The arc centers of the other ends of the first auxiliary cantilever 53 and the second auxiliary cantilever 54 are both located on the central axis of the base body 51. The arc diameter of the other end of the first auxiliary cantilever 53 is the same as the arc diameter of the other end of the second auxiliary cantilever 54. The arc diameters of the other ends of the first auxiliary cantilever 53 and the second auxiliary cantilever 54 are both D1, 1 / 2*(D2-D1)=d, 1mm≤d≤3mm. Since the width of the gap between the first auxiliary cantilever 53 and the inner wall of the cavity 30 is equal to the width of the gap between the second auxiliary cantilever 54 and the inner wall of the cavity 30, this helps to ensure the uniformity of the airflow distribution.

[0067] In addition, while ensuring that there are gaps between the first auxiliary cantilever 53 and the second auxiliary cantilever 54 and the inner wall of the cavity 30 to avoid scratching the inner wall of the cavity 30, the width of the gap is designed to be small so that the process gas flowing through the gap is minimized, which helps to ensure the uniformity of the airflow field.

[0068] The connection structure between the second auxiliary cantilever 54 and the base body 51 will be described in detail below with reference to the accompanying drawings.

[0069] Figure 4 This is a cross-sectional schematic diagram of a second auxiliary cantilever 54 in the reaction chamber 100 provided in an embodiment of this application. Figure 5 This is a cross-sectional schematic diagram showing the cooperation between the base body 51 of a base 50 and a second auxiliary cantilever 54 in the reaction chamber 100 provided in this embodiment of the application. Please refer to... Figure 5 As shown, the second auxiliary cantilever 54 in the reaction chamber 100 disclosed herein may include a main arm 542 and a connecting plate 541. One end of the main arm 542 is fixedly connected to the connecting plate 541, and the connecting plate 541 is detachably connected to the base body 51. Along a direction parallel to the longitudinal section of the main arm 542, the circumferential edge of the connecting plate 541 protrudes beyond one end of the main arm 542. In other words, along the extending direction of the main arm 542, the orthographic projection of the main arm 542 onto the outer circumferential surface of the base body 51 falls within the orthographic projection of the connecting plate 541 onto the outer circumferential surface of the base body 51.

[0070] The detachable connection between the connecting plate 541 and the base body 51 can be achieved by screwing, snap-fitting, or other detachable connection techniques well known to those skilled in the art. Specifically, the circumferential edge of the connecting plate 541 can be connected to the base body 51 by fasteners such as screws and pins. In this case, the connecting plate 541 protruding from the circumferential edge of the main arm 542 provides an installation position for fasteners such as screws, so as to facilitate the connection between the connecting plate 541 and the base body 51.

[0071] Therefore, in this embodiment, the main arm 542 and the connecting plate 541 are used to form the second auxiliary cantilever 54, so that the main arm 542 is detachably connected to the base body 51 through the connecting plate 541. Since the circumferential edge of the connecting plate 541 protrudes from one end of the main arm 542, it is easy to connect the connecting plate 541 to the base body 51, thereby making the assembly between the second auxiliary cantilever 54 and the base body 51 convenient, which helps to improve the assembly efficiency of the base 50.

[0072] The connecting plate 541 has a first surface and a second surface arranged opposite to each other along its thickness direction. When the connecting plate 541 is connected to the base body 51, the first surface is in contact with the base body 51. It should be noted that the fixed connection between one end of the main arm 542 and the connecting plate 541 should be interpreted broadly. That is, it can be understood as one end of the main arm 542 being connected to the second surface of the connecting plate 541, or it can be understood as the connecting plate 541 being a ring structure, surrounding the outer periphery of the main arm 542, and the first surface of the connecting plate 541 being coplanar with the end face of one end of the main arm 542. The connection method between the connecting plate 541 and the main arm 542 is not limited. The two can be connected by snap-fit ​​or other methods, or the connecting plate 541 and the main arm 542 can also be formed into a single piece by an integral molding process.

[0073] according to Figure 3 In the example shown, the main arms 542 of the connecting arm 52, the first auxiliary cantilever 53, and the second auxiliary cantilever 54 can be radially distributed along the radial direction of the base body 51. Each arm is long and narrow, and one end of each arm 52, 53, and 54 extends away from the base body 51.

[0074] Figure 6 This is a partial structural schematic diagram of the base 50 in a reaction chamber 100 provided in an embodiment of this application. Please refer to it in conjunction with... Figure 4 , Figure 5 and Figure 6As a further optional embodiment, an arc-shaped groove 512 may be recessed on the outer peripheral surface of the base body 51, with the center of the arc-shaped groove 512 located on the central axis of the base body 51. Along the radial direction of the base body 51, the arc-shaped groove 512 has an opening and an end. In this embodiment, the connecting plate 541 is an arc-shaped plate, which is embedded in the arc-shaped groove 512 and can be moved out of the arc-shaped groove 512. Since the connecting plate 541 is an arc-shaped plate, the first surface is the first arc surface, and the second surface is the second arc surface 5413, with the first arc surface fitting against the arc-shaped groove 512.

[0075] Compared to the direct connection between the arc-shaped plate and the outer peripheral surface of the base body 51, this embodiment designs the arc-shaped groove 512 and the connecting plate 541 as arc-shaped plates, so that the arc-shaped plate is fitted into the arc-shaped groove 512. This helps to prevent the arc-shaped plate from protruding from the outer peripheral surface of the base body 51, and makes the orthographic projection of the part of the second auxiliary cantilever 54 protruding from the outer peripheral surface of the base body 51 on the bottom surface of the cavity 30 the same as the orthographic projection of the connecting arm 52 and the first auxiliary cantilever 53 on the bottom surface of the cavity 30. That is, the part of the base 50 located in the first space 31 is still symmetrical about the first radial axis O1 and the second radial axis O2, which helps to ensure that the distribution of airflow in the circumferential direction of the workpiece 200 has good symmetry and uniformity.

[0076] Based on the embodiment where the arc-shaped plate is embedded in the arc-shaped groove 512, the arc-shaped plate can be adapted to fit within the arc-shaped groove 512, and the second arc surface 5413 of the arc-shaped plate (i.e., the side of the arc-shaped plate facing the main arm 542) is also coplanar with the outer peripheral surface of the base body 51. That is to say, the shape and size of the arc-shaped plate match the shape and size of the arc-shaped groove 512. In this way, the arc-shaped plate not only does not protrude from the outer peripheral surface of the base body 51, but also, when the arc-shaped plate is located within the arc-shaped groove 512, there is no gap between the arc-shaped plate and the arc-shaped groove 512. Thus, when the second auxiliary cantilever 54 is connected to the base body 51, the outer peripheral surface of the base body 51 can still be formed as a complete circumferential surface, which helps to avoid gaps between the arc-shaped plate and the arc-shaped groove 512 that would cause some airflow to flow into the gaps, further ensuring that the airflow field is centrally symmetrical, so that the distribution of airflow in the circumferential direction of the workpiece 200 has good symmetry and uniformity.

[0077] In summary, by designing the connecting plate 541 as an arc-shaped plate, and ensuring that the second arc surface 5413 is coplanar with the outer peripheral surface of the base body 51, the connecting plate 541 is prevented from affecting the symmetry of the airflow field.

[0078] It is worth noting that there are multiple possibilities for how the curved plate is embedded in the curved groove 512.

[0079] For example, in one possible implementation, please refer to [link / reference]. Figure 5 and Figure 6 The arc-shaped groove 512 has a top wall and a bottom wall that are spaced apart and parallel to each other along the Z-axis of the base body 51. Both the top and bottom walls of the arc-shaped groove 512 are located between the top and bottom surfaces of the base body 51, meaning there is a distance between the top wall and the top surface of the base body 51, and between the bottom wall and the bottom surface of the base body 51. The arc-shaped plate can be moved radially out of the arc-shaped groove 512 from its opening.

[0080] In this embodiment, the airflow flows from top to bottom. The top surface of the base body 51 and the main arm 542 of the connecting arm 52, the first auxiliary cantilever 53, and the second auxiliary cantilever 54 will block the flow of air. Since the arc plate is embedded in the arc groove 512 and the second arc surface 5413 is coplanar with the outer peripheral surface of the base body 51, the obstruction effect on the airflow is centrally symmetrical, making the airflow field centrally symmetrical.

[0081] Taking the connection between the connecting plate 541 and the base body 51 via screws as an example, the base body 51 has a threaded hole 511 located within an arc-shaped groove 512. The arc-shaped plate has a through hole 5411. When the arc-shaped plate is fitted into the arc-shaped groove 512, the central axis of the through hole 5411 is collinear with the central axis of the threaded hole 511. The screw passes through the through hole 5411 and extends into the threaded hole 511, where it is threadedly connected. Furthermore, the second arc surface 5413 of the arc-shaped plate is recessed to form a receiving groove 5412, which communicates with the through hole 5411. When the screw is screwed into the threaded hole 511, the screw head is housed in the receiving groove 5412. Therefore, when the second auxiliary cantilever 54 is fixed to the base body 51, the screw head will not protrude from the outer circumference of the base body 51, thus helping to prevent the airflow from being obstructed by the screw head and affecting symmetry, further ensuring that the airflow field is centrally symmetrical.

[0082] For example, in another possible implementation, please refer to... Figure 7 Along the Z-direction extending from the central axis of the base body 51, the arc-shaped groove 512 penetrates to the top surface of the base body 51, forming a through opening. The arc-shaped plate can be moved out of the arc-shaped groove 512 along the vertical Z-direction through opening. Furthermore, the maximum extension length W1 of the arc-shaped plate is greater than the extension length W2 of the groove, ensuring that the arc-shaped plate is fitted into the arc-shaped groove 512 and cannot pass through the groove radially along the base body 51, thus achieving the connection between the arc-shaped plate and the base body 51. Figure 7 A cross-sectional schematic diagram of the base body 51 of another base 50 in the reaction chamber 100 provided in this application embodiment, cooperating with a second auxiliary cantilever 54.

[0083] In this embodiment, the airflow flows from top to bottom, and the top surface of the base body 51, the top surface of the arc plate, the connecting arm 52, the first auxiliary cantilever 53, and the main arm 542 of the second auxiliary cantilever 54 will block the flow of air.

[0084] In contrast, adopting Figure 6 When the base 50 is shown, the connection between the arc-shaped plate and the base body 51 is reliable; using Figure 7 When the base 50 is shown, the arc-shaped plate is inserted from top to bottom into the arc-shaped groove 512 through the through hole to complete the connection between the arc-shaped plate and the base body 51. When disassembling the second auxiliary cantilever 54, no disassembly tool is needed. Just move the arc-shaped plate upward to remove it from the through hole. It is easy to install and remove.

[0085] As disclosed herein, the connecting arm 52 in the reaction chamber 100 can be a solid structure or an internally hollow structure. In the embodiment where the connecting arm 52 is an internally hollow structure, the hollow cavity of the connecting arm 52 serves as a channel for accommodating cables, pipes (see below) and other components connecting the lower electrode device to the outside of the chamber 30, thereby improving the utilization rate of the hollow cavity and saving the additional process space occupied by cables, pipes and other components.

[0086] Exemplarily, in some embodiments, the chuck 60 is provided with electrodes, which are connected to a power source located outside the cavity 30 via cables. The power source outputs a DC voltage to the electrodes, causing induced charges to form on the workpiece 200. These induced charges attract the charges on the electrodes, thereby causing the workpiece 200 to be adsorbed and fixed onto the chuck 60. In this embodiment, the cables pass through the hollow cavity of the connecting arm 52.

[0087] For example, in some embodiments, the chuck 60 is provided with cooling channels, which are connected to a cooling source located outside the cavity 30 via pipes. The cooling source provides coolant to regulate the temperature of the chuck 60. In this embodiment, the pipes pass through the hollow cavity of the connecting arm 52.

[0088] Exemplarily, in some embodiments, the chuck 60 has a gas flow path inside, with the outlet of the gas flow path located on the top surface of the chuck 60. The inlet of the gas flow path is connected to a gas source located outside the cavity 30 via a transmission pipe. The gas source provides heat-conducting gas to blow heat-conducting gas between the workpiece 200 and the top surface of the chuck 60. The heat-conducting gas can uniformly conduct heat from the chuck 60 to the workpiece 200. In this embodiment, the transmission pipe passes through the hollow cavity of the connecting arm 52. The heat-conducting gas can be an inert gas such as helium (He) or argon (Ar).

[0089] Similarly, the first auxiliary cantilever 53 and the second auxiliary cantilever 54 can also be solid structures or hollow structures. In the embodiment where the first auxiliary cantilever 53 and the second auxiliary cantilever 54 are hollow structures, the weight of the base 50 is reduced, which also helps to save on the materials used to manufacture the first auxiliary cantilever 53 and the second auxiliary cantilever 54.

[0090] Please continue to refer to this. Figure 3 As disclosed herein, the reaction chamber 100 may also include an induction coil 90 disposed between the chamber door 40 and the side wall of the chamber body 30. Similarly, an induction coil 90 may also be provided at the contact point between the chamber door 40 and the other end of the connecting arm 52.

[0091] In any of the above embodiments, the base 50 may be an aluminum base 50 made of aluminum. Of course, the base 50 may also be made of other materials such as ceramic, and this embodiment does not limit this.

[0092] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of this utility model, and the utility model is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of this utility model, and these modifications and improvements are also considered to be within the protection scope of this utility model.

Claims

1. A base for use in a reaction chamber, characterized in that, The base includes: a base body and connecting arms, a first auxiliary cantilever and two second auxiliary cantilever, which are circumferentially spaced and evenly distributed along the base body; One end of the connecting arm is connected to the base body, and the other end is used to connect to the inner wall of the reaction chamber; One end of the first auxiliary cantilever is connected to the base body; Both second auxiliary cantilevers are located between the connecting arm and the first auxiliary cantilevers; one end of the second auxiliary cantilevers is detachably connected to the base body.

2. The base according to claim 1, characterized in that, The second auxiliary cantilever includes a main arm and a connecting plate. One end of the main arm is fixedly connected to the connecting plate, and the connecting plate is detachably connected to the base body. The circumferential edge of the connecting plate protrudes from one end of the main arm along a direction parallel to the longitudinal section of the main arm.

3. The base according to claim 2, characterized in that, An arc-shaped groove is recessed on the outer peripheral surface of the base body, and the center of the arc-shaped groove is located on the central axis of the base body. The connecting plate is an arc-shaped plate, which is embedded in the arc-shaped groove, and the arc-shaped plate can be moved out of the arc-shaped groove.

4. The base according to claim 3, characterized in that, The arc-shaped plate is housed within the arc-shaped groove and is adapted to fit the arc-shaped groove. The arc surface of the arc-shaped plate facing the main arm is coplanar with the outer peripheral surface of the base body.

5. The base according to claim 4, characterized in that, The arc-shaped groove has a groove top wall and a groove bottom wall that are spaced apart and parallel along the extension direction of the central axis of the base body. The groove top wall and the groove bottom wall are both located between the top surface and the bottom surface of the base body. The arc-shaped plate can be moved out of the arc-shaped groove from the groove opening along the radial direction of the base body. The arc-shaped plate is also detachably connected to the base body via fasteners.

6. The base according to any one of claims 1 to 5, characterized in that, The connecting arm has an internal hollow structure, and the hollow cavity of the connecting arm is used for the passage of cables connecting the power supply and electrodes to the reaction chamber and / or pipes connecting the cooling source and cooling channel to the reaction chamber; and / or, The first auxiliary cantilever and the second auxiliary cantilever are hollow structures.

7. The base according to any one of claims 1 to 5, characterized in that, The other end of the connecting arm is used to connect to the chamber door in the reaction chamber, which is used to open and close the openings on the side wall; When the chamber door opens the opening and the second auxiliary cantilever is detached from the base body, the second auxiliary cantilever can be moved out of the reaction chamber through the opening. When both second auxiliary cantilever arms are detached from the base body, the remaining part of the base can be moved out of the reaction chamber through the opening.

8. The base according to claim 7, characterized in that, There are gaps between the other end of the first auxiliary cantilever and the second auxiliary cantilever and the inner wall of the reaction chamber.

9. The base according to claim 8, characterized in that, The width of the gap is greater than or equal to 1 mm and less than or equal to 3 mm.

10. The base according to claim 7, characterized in that, One end of the connecting arm is located in the first space of the cavity of the reaction chamber, and the other end is located in the second space of the cavity. The base body, the first auxiliary cantilever and the second auxiliary cantilever are all located in the first space. The cross-section of the first space is circular and it communicates with the outside of the cavity through the second space when the opening is open. Furthermore, the portion of the base located within the first space divides the first space into four airflow channels, which are centrally symmetrically distributed.

11. A reaction chamber, characterized in that, include: cavity; as well as, The base according to any one of claims 1 to 10, wherein the base is disposed within the cavity.

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