Cleaning device for semiconductor processing

Abstract

The utility model discloses a cleaning device for semiconductor processing. The cleaning device comprises a cleaning device main body and a filtering mechanism, the side wall of the cleaning device body is connected with a liquid discharging pipe and a supplementing pipe, and the supplementing pipe is arranged on the upper side of the liquid discharging pipe. The filtering mechanism is arranged on one side of the cleaning device body and comprises a filtering box, a communicating pipe is connected to the filtering box and connected with the liquid discharging pipe, a filtering curtain is installed in the filtering box, a first inclined plate and a second inclined plate are arranged on the lower side of the filtering curtain, and the first inclined plate and the second inclined plate are staggered. Leakage holes are formed in the lowest positions of the first inclined plate and the second inclined plate. According to the utility model, the cleaning fluid can be filtered to remove metal and particulate matters in the cleaning fluid, so that the cleaning fluid can continuously clean the semiconductor, the frequency of replacing the cleaning fluid by a user can be reduced, the utilization rate of the cleaning fluid can be improved, and the cost input of cleaning the semiconductor by the user can be reduced.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the technical field of semiconductor processing, concretely relates to a kind of cleaning device of semiconductor processing. BACKGROUND

[0002] Semiconductor refers to the electrical conductivity between conductor and insulator at room temperature. Its conductivity can be flexibly regulated by external conditions (such as temperature, illumination, doping, etc.), so it is widely used in various electronic components, such as transistors, diodes and solar cells, etc.

[0003] The manufacturing process of semiconductor is complex, and often needs to go through cutting, etching, grinding and many other processes. In order to ensure the cleanliness of the surface of semiconductor and ensure the processing quality, the semiconductor needs to be cleaned in the manufacturing process to remove the metal and particulate matter on the surface of semiconductor. However, the existing semiconductor cleaning device generally lacks a cleaning liquid filtering mechanism. For example, the Chinese utility model patent with publication number CN221983328 discloses a kind of semiconductor cleaning equipment, which can realize the cleaning of semiconductor. However, as the use of cleaning liquid, the metal and particulate matter contained in it will increase. In order to ensure the cleaning effect of semiconductor, the user will replace the cleaning liquid, which not only reduces the utilization rate of cleaning liquid, but also causes the waste of cleaning liquid, thereby increasing the cost investment of user.

[0004] Therefore, in view of the above technical problems, it is necessary to provide a kind of cleaning device for semiconductor processing.

[0005] The information disclosed in this background section is only intended to increase the understanding of the overall background of the utility model, and should not be regarded as acknowledging or implying in any form that the information constitutes prior art known to those skilled in the art. CONTENT OF UTILITY MODEL

[0006] The utility model aims at providing a kind of cleaning device for semiconductor processing, which can solve the problem of lacking filtering mechanism in semiconductor cleaning device.

[0007] In order to achieve the above purpose, the technical scheme provided by the utility model in one embodiment is as follows:

[0008] A kind of cleaning device for semiconductor processing, comprising: cleaning device main body and filtering mechanism;

[0009] The side wall of the cleaning device main body is connected with drain pipe and replenishment pipe, and the replenishment pipe is arranged on the upper side of the drain pipe;

[0010] The filtering mechanism is arranged on one side of the cleaning device body, and comprises a filtering box, a communication pipe connected to the filtering box, the communication pipe being connected to the liquid discharge pipe, a filtering curtain arranged in the filtering box, a first inclined plate and a second inclined plate arranged on the lower side of the filtering curtain, the first inclined plate being staggered with the second inclined plate, a plurality of leakage holes arranged at the lowest positions of the first inclined plate and the second inclined plate, a plurality of filtering screen frames connected to the first inclined plate and the second inclined plate, a liquid pumping device arranged at the bottom of the filtering box, and a return pipe connected to the liquid pumping device and the replenishing pipe.

[0011] In one or more embodiments of the present application, the control valve is arranged on the liquid discharge pipe, and when the control valve is opened, the cleaning liquid in the cleaning device body is discharged through the liquid discharge pipe.

[0012] The replenishing pipe is provided with a check valve, so that the cleaning liquid in the cleaning device body is not easy to flow back through the replenishing pipe.

[0013] In one or more embodiments of the present application, the control panel is arranged on the cleaning device body, and the control valve and the liquid pumping device are electrically connected to the control panel, so that the operation of the control valve and the liquid pumping device can be controlled through the control panel.

[0014] In one or more embodiments of the present application, one end of the communication pipe arranged in the filtering box is connected to a liquid distribution disc, the liquid distribution disc is arranged on the upper side of the filtering curtain, the cleaning liquid in the cleaning device body enters the liquid distribution disc through the liquid discharge pipe and the communication pipe, and is fully contacted with the filtering curtain under the action of the liquid distribution disc, so that the cleaning liquid can be preliminarily filtered.

[0015] In one or more embodiments of the present application, a plurality of magnetic strips are connected to the second inclined plate, and the plurality of magnetic strips correspond to the plurality of filtering screen frames, so that the metal in the cleaning liquid can be adsorbed by the magnetic strips.

[0016] In one or more embodiments of the present application, the cover door is connected to the side wall of the filtering box and corresponds to the filtering curtain, the first inclined plate and the second inclined plate, and when the cover door is opened, the metal and particles filtered by the filtering curtain, the first inclined plate and the second inclined plate can be removed.

[0017] In one or more embodiments of the present application, the alarm and the power supply are arranged on the outer wall of the filtering box, the alarm is electrically connected to the power supply, the power supply is used for supplying power to the alarm, and the alarm can play a prompting role.

[0018] In one or more embodiments of the utility model, the filter box inner wall is connected with the mounting plate, the mounting plate is located in the second inclined plate downside, the first touch plate is connected on the mounting plate, and the first touch plate is connected with the power supply through the wire.

[0019] In one or more embodiments of the utility model, the filter box bottom wall is connected with the guide rod, and the float ball is slidably connected on the guide rod, and the float ball can slide on the guide rod along with the cleaning liquid level in the filter box.

[0020] In one or more embodiments of the utility model, the second touch plate is installed on the float ball, the second touch plate corresponds with the first touch plate, the second touch plate is connected with the alarm through the wire, when the second touch plate contacts with the first touch plate, the alarm, power supply, first touch plate and second touch plate form a path, at this time, the alarm can send alarm prompt, the user can run the liquid pump, and the filtered cleaning liquid in the filter box is extracted by the liquid pump, so that the cleaning liquid can reenter the cleaning device main body and be used.

[0021] Compared with the prior art, the cleaning device for semiconductor processing can filter the cleaning liquid to remove metal and particulate matter in the cleaning liquid, so that the cleaning liquid can continuously clean the semiconductor, thereby reducing the frequency of replacing the cleaning liquid by the user, improving the utilization rate of the cleaning liquid, and reducing the cost investment of the user for cleaning the semiconductor. BRIEF DESCRIPTION OF DRAWINGS

[0022] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or the prior art, the drawings needed to be used in the embodiment or the prior art description will be briefly introduced below, and obviously, the drawings in the following description are only some embodiments in the utility model, and other drawings can be obtained by those skilled in the art without creative labor on the premise of not paying creative labor.

[0023] Figure 1 It is a perspective view of the cleaning device for semiconductor processing in one embodiment of the utility model;

[0024] Figure 2 It is a sectional view of the filtering mechanism in one embodiment of the utility model;

[0025] Figure 3 It is Figure 2 Structure schematic view in A of the utility model;

[0026] Figure 4 It is Figure 2 Structure schematic view in B of the utility model.

[0027] MAIN REFERENCE NUMERALS EXPLANATION:

[0028] 1-washing device main body, 101-drain pipe, 102-supplement pipe, 103-control panel, 2-filter mechanism, 201-filter box, 202-communication pipe, 203-liquid distribution tray, 204-filter curtain, 205-first inclined plate, 206-second inclined plate, 207-leakage hole, 208-filter net rack, 209-magnetic strip, 210-pumping pump, 211-backflow pipe, 212-cover door, 3-alarm, 301-mounting plate, 302-first touch plate, 303-guide rod, 304-floating ball, 305-second touch plate. DETAILED DESCRIPTION

[0029] In order to make the technical personnel in the technical field better understand the technical solutions in the present application, the technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by the person skilled in the art without creative labor should belong to the scope of protection of the present application.

[0030] As shown in the drawings, the cleaning device for semiconductor processing in an embodiment of the present application comprises a cleaning device main body 1 and a filter mechanism 2. Figures 1 to 4

[0031] Among them, the side wall of the cleaning device main body 1 is connected with a drain pipe 101 and a supplement pipe 102, and the supplement pipe 102 is arranged on the upper side of the drain pipe 101. The drain pipe 101 is used to drain the cleaning liquid in the cleaning device main body 1, and the supplement pipe 102 is used to add cleaning liquid into the cleaning device main body 1.

[0032] In addition, a control valve is installed on the drain pipe 101, which is used to control the on-off of the drain pipe 101, that is, when the control valve is opened, the cleaning liquid in the cleaning device main body 1 is drained through the drain pipe 101.

[0033] Specifically, a check valve is installed on the supplement pipe 102, so that the cleaning liquid in the cleaning device main body 1 is not easy to backflow through the supplement pipe 102.

[0034] In addition, a control panel 103 is installed on the cleaning device main body 1, and the control valve and the pumping pump 210 are electrically connected with the control panel 103, so as to facilitate the control of the operation of the control valve and the pumping pump 210 through the control panel 103.

[0035] Preferably, the cleaning device main body 1 adopted in the present application is the prior art, and the connection between the components of the cleaning device main body 1 is also the prior art, so the connection and working principle will not be described in detail here.

[0036] As​Figures 1 to 4 As shown, the filtering mechanism 2 is arranged on one side of the cleaning device main body 1, and is used to filter the cleaning liquid in the cleaning device main body 1 to remove metal or particulate matter in the cleaning liquid, so that the cleaning liquid can be continuously used, and the utilization rate of the cleaning liquid is improved.

[0037] As shown, the filtering mechanism 2 includes a filtering box 201, and a communication pipe 202 is connected to the filtering box 201, and the communication pipe 202 is connected to the liquid discharge pipe 101. When the control valve is opened, the cleaning liquid in the cleaning device main body 1 enters the filtering box 201 through the liquid discharge pipe 101 and the communication pipe 202.

[0038] Preferably, the communication pipe 202 and the liquid discharge pipe 101 can be connected by sleeving or flange connection, that is, when the cleaning liquid in the cleaning device main body 1 does not need to be filtered, the communication pipe 202 and the liquid discharge pipe 101 are separated, and the cleaning liquid in the cleaning device main body 1 can be discharged.

[0039] In addition, one end of the communication pipe 202 located in the filtering box 201 is connected with a liquid distribution disc 203, and the liquid distribution disc 203 is arranged on the upper side of a filtering curtain 204. The cleaning liquid in the cleaning device main body 1 enters the liquid distribution disc 203 through the liquid discharge pipe 101 and the communication pipe 202, and is fully contacted with the filtering curtain 204 under the action of the liquid distribution disc 203, which can play a role of preliminary filtering.

[0040] Specifically, the filtering box 201 is installed with the filtering curtain 204, which can preliminarily filter the cleaning liquid. The lower side of the filtering curtain 204 is respectively provided with a first inclined plate 205 and a second inclined plate 206, and the first inclined plate 205 and the second inclined plate 206 are staggered with each other, that is, Figure 2 As shown, the first inclined plate 205 and the second inclined plate 206 are used to guide the flow of the cleaning liquid, so as to filter the cleaning liquid.

[0041] In addition, the lowest part of the first inclined plate 205 and the second inclined plate 206 is respectively provided with a leakage hole 207, and the cleaning liquid on the first inclined plate 205 falls on the second inclined plate 206 through the leakage hole 207, and the cleaning liquid on the second inclined plate 206 converges at the bottom of the filtering box 201 through the leakage hole 207.

[0042] As shown, Figures 1 to 4 As shown, the first inclined plate 205 and the second inclined plate 206 are respectively connected with a plurality of filter screen frames 208, and when the cleaning liquid flows on the first inclined plate 205 and / or the second inclined plate 206, the filter screen frames 208 can play a role of re-filtering, which is used to remove metal or particulate matter in the cleaning liquid.

[0043] The second inclined plate 206 is provided with a plurality of magnetic strips 209, and the plurality of magnetic strips 209 correspond to the plurality of filter screen frames 208 respectively. The plurality of magnetic strips 209 can adsorb the metal in the cleaning liquid to separate the metal from the particles.

[0044] Of course, the first inclined plate 205 can also be provided with a plurality of magnetic strips 209, which can be placed according to requirements.

[0045] In addition, the filter box 201 is provided with a liquid pumping device 210 at the bottom, and the liquid pumping device 210 is connected with a return pipe 211 at the liquid outlet. The return pipe 211 is connected with the supplement pipe 102. When the liquid pumping device 210 is running, the liquid pumping device 210 can pump the cleaning liquid at the bottom of the filter box 201. The pumped cleaning liquid is returned to the cleaning device main body 1 through the return pipe 211 and the supplement pipe 102, so that the cleaning liquid can be continuously used, and the utilization rate of the cleaning liquid is improved.

[0046] Specifically, the filter box 201 is provided with a cover door 212 connected to the side wall, and the cover door 212 corresponds to the filter curtain 204, the first inclined plate 205 and the second inclined plate 206. When the cover door 212 is opened, the metal and particles filtered by the filter curtain 204, the first inclined plate 205 and the second inclined plate 206 can be removed.

[0047] Preferably, the cover door 212 and the supplement pipe 102 can also be connected in a sleeved or flange connection manner, so that the cover door 212 and the supplement pipe 102 can be separated conveniently.

[0048] As shown in Figures 1 to 4 The filter box 201 is provided with an alarm 3 and a power supply outside the wall. The alarm 3 is electrically connected with the power supply. The power supply is electrically connected with the control panel 103. The power supply is used to supply power for the alarm 3. The alarm 3 can play a prompting role.

[0049] The filter box 201 is provided with a mounting plate 301 connected to the inner wall. The mounting plate 301 is arranged below the second inclined plate 206. The mounting plate 301 is provided with a first touch plate 302 connected thereto. The first touch plate 302 is connected with the power supply through a wire.

[0050] In addition, the filter box 201 is provided with a guide rod 303 connected to the bottom wall. The guide rod 303 is slidably connected with a floating ball 304. The floating ball 304 can slide on the guide rod 303 along with the liquid level of the cleaning liquid in the filter box 201, that is, the floating ball 304 can float on the cleaning liquid.

[0051] Specifically, the second touch plate 305 is installed on the floating ball 304, and the second touch plate 305 corresponds to the first touch plate 302. The second touch plate 305 is connected to the alarm 3 through a wire. When the second touch plate 305 is in contact with the first touch plate 302, the alarm 3, the power supply, the first touch plate 302, and the second touch plate 305 form a path. At this time, the alarm 3 can issue an alarm prompt, and the user can operate the liquid pump 210 to extract the filtered cleaning liquid in the filter box 201, so that the cleaning liquid can re-enter the cleaning device main body 1 for use.

[0052] In specific use, the cleaning device main body 1 is added with cleaning liquid, and the cleaning device main body 1 and the cleaning liquid can be used to clean the semiconductor. As the cleaning liquid is used, the metal and particles in the cleaning liquid will increase. In order to improve the cleaning effect of the cleaning liquid, the cleaning liquid needs to be filtered. When filtering the cleaning liquid, the user can open the control valve on the liquid discharge pipe 101 through the control panel 103. The cleaning liquid in the cleaning device main body 1 enters the liquid distribution disc 203 through the liquid discharge pipe 101 and the communication pipe 202, and fully contacts the filter curtain 204 under the action of the liquid distribution disc 203. The filter curtain 204 can play a role in preliminarily filtering the cleaning liquid.

[0053] The filtered cleaning liquid falls on the first inclined plate 205. Part of the cleaning liquid on the first inclined plate 205 is filtered through the filter screen frame 208 and falls on the second inclined plate 206 through the leakage hole 207. The filter screen frame 208 on the second inclined plate 206 continues to filter the metal and particles in the cleaning liquid.

[0054] Finally, the filtered cleaning liquid is gathered at the bottom of the filter box 201 through the leakage hole 207 on the second inclined plate 206. As the cleaning liquid at the bottom of the filter box 201 gradually increases, the floating ball 304 can float on the guide rod 303 following the liquid level of the cleaning liquid. When the first touch plate 302 is in contact with the second touch plate 305, the alarm 3, the power supply, the first touch plate 302, and the second touch plate 305 form a path. At this time, the alarm 3 can issue an alarm prompt, and the user can operate the liquid pump 210 to extract the cleaning liquid in the filter box 201. The cleaning liquid re-enters the cleaning device main body 1 through the return pipe 211 and the supplement pipe 102. When the liquid pump 210 operates for 10 minutes, the control valve on the liquid discharge pipe 101 is closed. The liquid pump 210 continues to operate until the liquid pump 210 completely extracts the cleaning liquid in the filter box 201, and then stops operating.

[0055] The present application can circulate and filter the cleaning liquid through the setting of the filtering mechanism 2, thereby reducing the metal and particles contained in the cleaning liquid, ensuring the cleaning effect of the cleaning liquid on the semiconductor, reducing the frequency of replacing the cleaning liquid by the user, thereby improving the utilization rate of the cleaning liquid and reducing the cost investment of the user for cleaning the semiconductor.

[0056] It is obvious for those skilled in the art that the present application is not limited to the details of the above exemplary embodiments, and the present application can be implemented in other specific forms without departing from the spirit or essential characteristics of the present application. Therefore, the embodiments should be regarded as exemplary and non-limiting, and the scope of the present application is defined by the appended claims rather than the above description, and all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be included in the present application. Any reference signs in the claims should not be regarded as limiting the claims involved.

[0057] In addition, it should be understood that although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the description of the specification is only for the sake of clarity, and those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can be appropriately combined to form other embodiments that those skilled in the art can understand.

Claims

1. A cleaning apparatus for semiconductor processing, characterized in that, The utility model relates to a cleaning device, including: The cleaning device main part, the side wall of the cleaning device main part is connected with the drainage pipe and the supplementary pipe, and the supplementary pipe is arranged on the upside of the drainage pipe; The filter mechanism is arranged at one side of the cleaning device main part, and the filter mechanism includes a filter box, a communication pipe is connected to the filter box, the communication pipe is connected with the drainage pipe, a filter curtain is installed in the filter box, a first inclined plate and a second inclined plate are arranged on the lower side of the filter curtain respectively, the first inclined plate and the second inclined plate are staggered with each other, the lowest parts of the first inclined plate and the second inclined plate are provided with leakage holes, a plurality of filter screen frames are connected to the first inclined plate and the second inclined plate, a liquid pumping pump is installed at the bottom of the filter box, a return pipe is connected to the liquid outlet end of the liquid pumping pump, and the return pipe is connected with the supplementary pipe.

2. The semiconductor processing cleaning apparatus of claim 1, wherein A control valve is installed on the drainage pipe, and a check valve is installed on the supplementary pipe.

3. The semiconductor processing cleaning apparatus of claim 2, wherein A control panel is installed on the cleaning device main part, and the control valve and the liquid pumping pump are electrically connected with the control panel.

4. The semiconductor processing cleaning apparatus of claim 1, wherein One end of the communication pipe in the filter box is connected with a liquid preparation disc, and the liquid preparation disc is arranged on the upside of the filter curtain.

5. The semiconductor processing cleaning apparatus of claim 1, wherein A plurality of magnetic strips are connected to the second inclined plate, and the plurality of magnetic strips correspond to the plurality of filter screen frames respectively.

6. The apparatus of claim 1, wherein A cover door is connected to the side wall of the filter box, and the cover door corresponds to the filter curtain, the first inclined plate and the second inclined plate.

7. The semiconductor processing cleaning apparatus of claim 1, wherein An alarm and a power supply are installed on the outer wall of the filter box, and the alarm is electrically connected with the power supply.

8. The semiconductor processing cleaning apparatus of claim 7, wherein An installation plate is connected to the inner wall of the filter box, the installation plate is arranged on the lower side of the second inclined plate, a first touch plate is connected to the installation plate, and the first touch plate is connected with the power supply through wires.

9. The apparatus of claim 8, wherein the at least one nozzle is configured to direct the cleaning fluid at the substrate at an angle of about 45 degrees. A guide rod is connected to the bottom wall of the filter box, and a floating ball is slidably connected to the guide rod.

10. The apparatus of claim 9, wherein the at least one nozzle is configured to direct the cleaning fluid at the substrate at an angle of about 45 degrees. A second touch plate is installed on the floating ball, the second touch plate corresponds to the first touch plate, and the second touch plate is connected with the alarm through wires.

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