Reaction source supply system

Abstract

The utility model provides a reaction source supply system which is communicated with a reaction chamber and comprises a source bottle, a carrier gas branch and a source conveying branch, a liquid reaction source is arranged in the source bottle, one end of the carrier gas branch is connected to the source bottle, the carrier gas branch conveys carrier gas to the source bottle to enable part of the liquid reaction source to be converted into a gaseous reaction source, and the source conveying branch conveys the gaseous reaction source to the source bottle. The two ends of the source conveying branch are connected to the source bottle and the reaction chamber respectively, the source conveying branch conveys carrier gas carrying a gaseous reaction source to the reaction chamber, a flow limiting piece is installed on the source conveying branch, and the flow limiting piece limits the flow of the carrier gas carrying the gaseous reaction source; under the condition of meeting the gaseous reaction source quantity required by the coating process, the gas inlet quantity of the gaseous reaction source converted from a liquid reaction source to enter the reaction chamber is reduced, so that on one hand, the consumption of the liquid reaction source can be reduced, and on the other hand, the influence of excessive gaseous reaction source on the coating quality can be reduced.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor technology, and more specifically, it relates to a reaction source supply system. Background Technology

[0002] In the coating process of the semiconductor industry, liquid reaction sources are typically used as film-forming materials for the coating reaction. However, liquid reaction sources cannot be directly used in the coating reaction and must be converted into gaseous reaction sources. Traditionally, the conversion of liquid reaction sources into gaseous reaction sources is usually carried out by bubbling.

[0003] In the traditional bubbling method, the carrier gas easily carries a large amount of gaseous reaction source into the reaction chamber. Furthermore, as the amount of gaseous reaction source in the source bottle decreases and the vapor level drops below saturation, the liquid reaction source continues to evaporate. Bubbling of the liquid reaction source accelerates the evaporation rate into gaseous form, leading to excess gaseous reaction source being delivered into the reaction chamber, resulting in waste of liquid reaction source and negatively impacting film quality. Therefore, the traditional bubbling method offers relatively low precision in controlling the flow rate of the gaseous reaction source. Utility Model Content

[0004] The purpose of this invention is to provide a reaction source supply system to solve the problem in the prior art where excessive gaseous reaction source entering the reaction chamber causes waste of liquid reaction source and affects film formation quality.

[0005] To achieve the above objectives, the technical solution adopted by this utility model is as follows:

[0006] This utility model provides a reaction source supply system, which is connected to a reaction chamber and includes:

[0007] Source bottle, wherein the source bottle contains a liquid reaction source;

[0008] A carrier gas branch, one end of which is connected to the source bottle, supplies carrier gas to the source bottle to convert part of the liquid reaction source into a gaseous reaction source;

[0009] A source supply branch, the two ends of which are respectively connected to the source bottle and the reaction chamber, the source supply branch supplies carrier gas carrying the gaseous reaction source to the reaction chamber;

[0010] A flow limiter is installed on the power supply branch to restrict the flow rate of the carrier gas carrying the gaseous reaction source.

[0011] Furthermore, one end of the carrier gas branch is inserted into the source bottle and is above the liquid level of the liquid reaction source.

[0012] Furthermore, it also includes a first thermostat, which is located outside the source bottle and is used to heat the source bottle.

[0013] Furthermore, it also includes a second temperature control device, which is located outside the power supply branch and is used to heat the power supply branch.

[0014] Furthermore, at least one valve for controlling the flow of fluid is installed on the carrier gas branch and the source branch, and the flow restrictor is installed on the source branch and located between the valve and the source bottle.

[0015] Furthermore, it also includes a first cleaning branch, which includes a first air inlet branch with its two ends connected to the carrier gas branch and the power supply branch respectively, and a first waste discharge branch with one end connected to the power supply branch. Valves for controlling the flow of fluid are installed on the first air inlet branch and the first waste discharge branch.

[0016] Furthermore, it also includes a replenishment branch, one end of which is connected to the source bottle. The replenishment branch supplies the liquid reaction source to the source bottle, and at least one valve for controlling the flow of fluid is installed on the replenishment branch.

[0017] Furthermore, it also includes a second cleaning branch, which includes a second air inlet branch and a second waste discharge branch connected in parallel to the liquid replenishment branch. Valves for controlling the flow of fluid are installed on the second air inlet branch and the second waste discharge branch.

[0018] Furthermore, it also includes a dilution branch, one end of which is connected to the reaction chamber, the carrier gas branch supplies carrier gas to the reaction chamber, and a valve for controlling the flow of fluid is installed on the dilution branch.

[0019] Furthermore, the other end of the carrier gas branch and the other end of the dilution branch are connected to the same main delivery pipeline, and a flow meter is installed on the main delivery pipeline.

[0020] Compared with the prior art, the reaction source supply system provided by this utility model has at least one of the following beneficial effects:

[0021] 1. Under the condition of meeting the amount of gaseous reaction source required by the coating process, reduce the amount of gas entering the reaction chamber by converting liquid reaction source into gaseous reaction source. On the one hand, this can reduce the consumption of liquid reaction source, and on the other hand, it can reduce the impact of excessive gaseous reaction source on coating quality.

[0022] 2. To prevent gaseous reaction sources in the delivery branch from condensing and liquefying, thereby clogging the pipeline. Attached Figure Description

[0023] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 A schematic diagram of the reaction source supply system provided by this utility model.

[0025] The main markings in the attached figures are as follows:

[0026] 11. Source bottle; 12. Carrier gas branch; 13. Source delivery branch; 14. First cleaning branch; 15. Second cleaning branch; 16. Dilution branch; 17. Main delivery pipeline; 18. Flow meter; 19. Replenishment branch;

[0027] 141. First intake branch; 142. First exhaust branch; 151. Second intake branch; 152. Second exhaust branch;

[0028] 21. Flow limiting component; 22. First thermostatic device; 23. Second thermostatic device;

[0029] 31. First pneumatic valve; 32. Second pneumatic valve; 33. Third pneumatic valve; 34. Fourth pneumatic valve; 35. Fifth pneumatic valve; 36. Sixth pneumatic valve; 37. Seventh pneumatic valve;

[0030] 41. First manual valve; 42. Second manual valve; 43. Third manual valve;

[0031] 51. First shut-off valve; 52. Second shut-off valve; 53. Third shut-off valve; 54. Fourth shut-off valve. Detailed Implementation

[0032] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0033] The reaction source supply system provided by this utility model is connected to the reaction chamber. The reaction source supply system delivers a gaseous reaction source to the reaction chamber. The reaction source is used to grow specific thin film materials in the coating process of the semiconductor industry.

[0034] Please see also Figure 1 The reaction source supply system includes at least:

[0035] Source bottle 11 contains a liquid reaction source;

[0036] Carrier gas branch 12, one end of which is connected to source bottle 11, and carrier gas branch 12 delivers carrier gas to source bottle 11 to convert part of the liquid reaction source into a gaseous reaction source.

[0037] Source supply branch 13, with its two ends connected to source bottle 11 and reaction chamber respectively, supplies carrier gas carrying gaseous reaction source to reaction chamber;

[0038] Among them, a flow limiting device 21 is installed on the power supply branch 13 to limit the flow rate of the carrier gas carrying the gaseous reaction source.

[0039] The advantage of this design is that if an excessive amount of gaseous reaction source enters the reaction chamber, it will result in the gaseous reaction source being in an unsaturated vapor state, causing more liquid reaction source to be converted into gas, leading to excessive consumption of liquid reaction source. To address this, a flow limiter 21 is installed on the source supply branch 13. This flow limiter 21 is used to restrict the flow rate of the carrier gas carrying the gaseous reaction source (i.e., the flow rate of the mixed gas of the gaseous reaction source and the carrier gas), preventing excessive gaseous reaction source from entering the reaction chamber, thereby avoiding waste of liquid reaction source and affecting film formation quality.

[0040] In an optional embodiment of this utility model, one end of the carrier gas branch 12 is inserted into the source bottle 11 and is higher than the liquid level of the liquid reaction source.

[0041] The advantage of this design is that it shortens the section of the carrier gas branch 12 that is placed inside the source bottle 11, so that one end of the carrier gas branch 12 does not come into contact with the liquid reaction source inside the source bottle 11. On the one hand, it prolongs the time for the carrier gas to come into contact with the liquid reaction source to generate bubbles, reducing the evaporation rate of the liquid source. On the other hand, it also effectively avoids blockage in the pipeline, which helps to extend the service life of the pipeline.

[0042] In an optional embodiment of the present invention, the reaction source supply system may further include a first thermostat 22, which is disposed outside the source bottle 11 and is used to heat the source bottle 11.

[0043] Specifically, the first temperature control device 22 can be a silicone flexible heater, which fits tightly against the outside of the source bottle 11 according to its shape. Alternatively, the first temperature control device 22 can be a resistance wire heating tube, which is welded to the outside of the source bottle 11.

[0044] The advantage of this design is that when the gaseous reaction source in the source bottle 11 does not reach its saturated vapor state, the gas molecules in the source bottle 11 will continuously evaporate from the liquid reaction source until the gaseous and liquid states are in equilibrium and the saturated vapor state is reached. By adding a first constant temperature device 22 to the source bottle 11 containing the liquid reaction source, the amount of saturated vapor in the source bottle 11 can be controlled and kept constant at the same temperature and other identical conditions.

[0045] In an optional embodiment of the present invention, the reaction source supply system may further include a second thermostat 23, which is located outside the source supply branch 13 and is used to heat the source supply branch 13.

[0046] Specifically, the second constant temperature device 23 can be a silicone flexible heater, which fits tightly against the outside of the power supply branch 13 according to its shape. Alternatively, the second constant temperature device 23 can be a resistance wire heating tube, which is sleeved on the outside of the power supply branch 13.

[0047] The advantage of this design is that by adding a second thermostat 23 to the power supply branch 13, the power supply branch 13 can be kept at a certain temperature, thus preventing the gaseous reaction source in the power supply branch 13 from condensing and liquefying due to excessively low temperature, which could then block the pipeline.

[0048] In some embodiments of this utility model, at least one valve for controlling the flow of fluid is installed on the carrier gas branch 12 and the source branch 13, and the flow restrictor 21 is installed on the source branch 13 and located between the valve and the source bottle 11.

[0049] In an alternative embodiment, such as Figure 1 As shown, a first pneumatic valve 31, a second pneumatic valve 32, and a first manual valve 41 are installed at intervals on the carrier gas branch 12 to improve system reliability. A second manual valve 42, a third pneumatic valve 33, and a fourth pneumatic valve 34 are installed at intervals on the power supply branch 13 to improve system reliability. A flow restrictor 21 is installed on the power supply branch 13 and located between the source bottle 11 and the second manual valve 42. Of course, in other optional embodiments, the flow restrictor 21 can be installed at other positions on the power supply branch 13 connecting the gas outlet of the source bottle 11 and the reaction chamber.

[0050] In some embodiments of this utility model, the reaction source supply system may further include a first cleaning branch 14, the first cleaning branch 14 including a first air inlet branch 141 connected at both ends to the carrier gas branch 12 and the source supply branch 13 respectively, and a first waste discharge branch 142 connected at one end to the source supply branch 13, and valves for controlling the flow of fluid are installed on the first air inlet branch 141 and the first waste discharge branch 142.

[0051] In an alternative embodiment, such as Figure 1As shown, the first cleaning branch 14 includes a first air intake branch 141 and a first waste discharge branch 142. One end of the first air intake branch 141 is connected to the carrier air branch 12, located between and near the second pneumatic valve 32, and the other end is connected to the power supply branch 13, located between and near the third pneumatic valve 33 and the fourth pneumatic valve 34. A sixth pneumatic valve 36 is installed on the first air intake branch 141. One end of the first waste discharge branch 142 is connected to the power supply branch 13, located between and near the fourth pneumatic valve 34, and the other end is connected to an external waste discharge pipeline system. A fourth shut-off valve 54 is installed on the first waste discharge branch 142.

[0052] The advantage of this design is that the first cleaning branch 14 is set up to clean and purge the residual reaction source in the source supply branch 13.

[0053] In some embodiments of this utility model, the reaction source supply system may further include a liquid replenishment branch 19, one end of which is connected to the source bottle 11. The liquid replenishment branch 19 supplies liquid reaction source to the source bottle 11, and at least one valve for controlling the flow of fluid is installed on the liquid replenishment branch 19.

[0054] In an alternative embodiment, such as Figure 1 As shown, one end of the replenishment branch 19 is connected to the external replenishment pipeline system, and the other end of the replenishment branch 19 is inserted into the source bottle 11 and placed below the liquid level of the liquid reaction source. The replenishment branch 19 is equipped with a second shut-off valve 52, a seventh pneumatic valve 37 and a third manual valve 43 at intervals.

[0055] The advantage of this design is that when the liquid reaction source in the source bottle 11 is consumed to a certain extent, the liquid reaction source in the source bottle 11 can be replenished through the replenishment branch 19, thus preventing the liquid reaction source in the source bottle 11 from being completely consumed.

[0056] In some embodiments of this utility model, the reaction source supply system may further include a second cleaning branch 15, the second cleaning branch 15 including a second air inlet branch 151 and a second waste outlet branch 152 connected in parallel to the liquid replenishment branch 19, and valves for controlling the flow of fluid are installed on the second air inlet branch 151 and the second waste outlet branch 152.

[0057] In an alternative embodiment, such as Figure 1As shown, the second cleaning branch 15 includes a second air intake branch 151 and a second waste discharge branch 152. One end of the second air intake branch 151 is connected to an external purging pipeline system, and the other end is connected to the replenishment branch 19, located between and near the second shut-off valve 52 and the seventh pneumatic valve 37. A first shut-off valve 51 is installed on the second air intake branch 151. One end of the second waste discharge branch 152 is connected to the replenishment branch 19, located between and near the second shut-off valve 52 and the seventh pneumatic valve 37. A third shut-off valve 53 is installed on the second waste discharge branch 152.

[0058] The advantage of this design is that a second cleaning branch 15 is set up to clean the residual reaction sources in the purging and replenishment branch 19.

[0059] In some embodiments of this utility model, the reaction source supply system may further include a dilution branch 16, one end of which is connected to the reaction chamber, a carrier gas branch 12 which supplies carrier gas to the reaction chamber, and a valve for controlling the flow of fluid is installed on the dilution branch 16.

[0060] In an alternative embodiment, such as Figure 1 As shown, one end of the dilution branch 16 is connected to the reaction chamber, and the other end of the dilution branch 16 is connected to the external carrier gas pipeline system. A fifth pneumatic valve 35 is installed on the dilution branch 16.

[0061] The advantage of this design is that the carrier gas, as a dilution gas, enters the reaction chamber through the dilution branch 16, controlling the vacuum level and dilution gas concentration in the reaction chamber, which helps to control the reaction rate.

[0062] In an optional embodiment of this utility model, the other end of the carrier gas branch 12 and the other end of the dilution branch 16 are connected to the same main delivery pipeline 17, and a flow meter 18 is installed on the main delivery pipeline 17.

[0063] like Figure 1 As shown, the other end of the carrier gas branch 12 and the other end of the dilution branch 16 are connected to the same main delivery pipeline 17 and then to the external carrier gas pipeline system. A flow meter 18 is installed on the main delivery pipeline 17.

[0064] The advantage of this design is that the carrier gas branch 12 and the dilution branch 16 share the same flow meter 18 to control the carrier gas flow, which simplifies the structure and saves costs.

[0065] It should be understood that the carrier gas mentioned in this utility model can be an inert gas.

[0066] To facilitate understanding, the following will be combined with Figure 1 The reaction source supply system provided in a preferred embodiment of the present invention will be fully described.

[0067] The reaction source supply system includes a source bottle 11 containing a liquid reaction source, a carrier gas branch 12, a source delivery branch 13, a dilution branch 16, a liquid replenishment branch 19, a first constant temperature device 22, a second constant temperature device 23, a first cleaning branch 14, a second cleaning branch 15, and a main delivery pipeline 17.

[0068] The first thermostatic device 22 surrounds the outside of the source bottle 11, and the second thermostatic device 23 surrounds the outside of the power supply branch 13.

[0069] The main delivery pipeline 17 is connected to an external carrier gas pipeline at its left end, and a flow meter 18 is installed on the main delivery pipeline 17. The upper end of the carrier gas branch 12 is connected to the right end of the main delivery pipeline 17, and the lower end of the carrier gas branch 12 is inserted into the source bottle 11 and is higher than the liquid level of the liquid reaction source. A first pneumatic valve 31, a second pneumatic valve 32, and a first manual valve 41 are installed on the carrier gas branch 12 from top to bottom. The left end of the dilution branch 16 is connected to the right end of the main delivery pipeline 17, and the right end of the dilution branch 16 is connected to the reaction chamber. A fifth pneumatic valve 35 is installed on the dilution branch 16.

[0070] The upper end of the power supply branch 13 is connected to the reaction chamber, and the lower end of the power supply branch 13 is inserted into the source bottle 11 and is higher than the liquid level of the liquid reaction source. The power supply branch 13 is equipped with a second manual valve 42, a third pneumatic valve 33 and a fourth pneumatic valve 34 from bottom to top.

[0071] The upper end of the replenishment branch 19 is connected to the external replenishment pipeline system, and the lower end of the replenishment branch 19 is inserted into the source bottle 11 and placed below the liquid level of the liquid reaction source. The replenishment branch 19 is equipped with a first shut-off valve 51, a seventh pneumatic valve 37 and a third manual valve 43 from top to bottom.

[0072] The first cleaning branch 14 includes a first air intake branch 141 and a first waste discharge branch 142. The left end of the first air intake branch 141 is connected to the carrier air branch 12, located between and near the second pneumatic valve 32, and its right end is connected to the power supply branch 13, located between and near the third pneumatic valve 33 and the fourth pneumatic valve 34. A sixth pneumatic valve 36 is installed on the first air intake branch 141. The right end of the first waste discharge branch 142 is connected to the power supply branch 13, located between and near the fourth pneumatic valve 34, and its left end is connected to the external waste discharge pipeline system. A fourth shut-off valve 54 is installed on the first waste discharge branch 142.

[0073] The second cleaning branch 15 includes a second air intake branch 151 and a second waste discharge branch 152. The left end of the second air intake branch 151 is connected to an external purging pipeline system, and its right end is connected to the replenishment branch 19, located between and near the second shut-off valve 52 and the seventh pneumatic valve 37. A first shut-off valve 51 is installed on the second air intake branch 151. The left end of the second waste discharge branch 152 is connected to an external waste discharge pipeline system, and its right end is connected to the replenishment branch 19, located between and near the second shut-off valve 52 and the seventh pneumatic valve 37. A third shut-off valve 53 is installed on the second waste discharge branch 152.

[0074] Based on the specific structure of the aforementioned reaction source supply system, the control process of the reaction source supply system includes:

[0075] When a gaseous reaction source needs to be delivered, the first pneumatic valve 31, the second pneumatic valve 32, and the first manual valve 41 on the carrier gas branch 12 are opened; the fifth pneumatic valve 35 on the dilution branch 16 is opened; and the third pneumatic valve 33, the fourth pneumatic valve 34, and the second manual valve 42 on the source delivery branch 13 are opened. Simultaneously, the flow rate of the carrier gas through the pipeline is controlled using a flow meter 18. A portion of the carrier gas passing through the flow meter 18 is used as dilution gas and enters the reaction chamber through the dilution branch 16, while another portion is used as carrier gas and enters the source bottle 11 through the carrier gas branch 12. This carries the gaseous reaction source from the source bottle 11 into the reaction chamber through the source delivery branch 13. A flow limiter 21 is installed on the source delivery branch 13 to restrict the flow rate of the mixed gas of the gaseous reaction source and the carrier gas, preventing excessive gaseous reaction source from entering the reaction chamber. At the same time, the first thermostat 22 maintains the saturated vapor quantity in the source bottle 11 at a constant temperature, and the second thermostat 23 maintains a certain temperature in the source delivery branch 13, preventing pipeline blockage.

[0076] When a certain amount of liquid reaction source in source bottle 11 is consumed, the second shut-off valve 52, the seventh pneumatic valve 37 and the third manual valve 43 on the replenishment branch 19 are opened, and the other valves are closed. The liquid reaction source flows into source bottle 11 through replenishment branch 19.

[0077] When it is necessary to clean the residual reaction source in the purge supply branch 13, open the first pneumatic valve 31, the sixth pneumatic valve 36 and the fourth shut-off valve 54 on the cleaning branch, and close the other valves. The purging gas is discharged through the waste discharge system through the pipelines connected to these valves in sequence, thereby cleaning the residual reaction source in the purge supply branch 13.

[0078] When it is necessary to clean the purging and replenishment branch 19, open the first shut-off valve 51 and the third shut-off valve 53 on the second cleaning branch 15, close the other valves, and the purging gas is discharged through the waste discharge system through the pipelines connected to these valves in sequence, thereby cleaning the residual reaction source in the purging and replenishment branch 19.

[0079] The beneficial effects of the reaction source supply system proposed in this utility model are that it can use carrier gas to carry gaseous reaction source into the reaction chamber and can control the amount of gaseous reaction source entering the reaction chamber, avoiding excessive gaseous reaction source being carried into the reaction chamber by the carrier gas, reducing the evaporation rate of liquid reaction source and reducing the consumption of liquid reaction source; it can also prevent gaseous reaction source in the delivery branch from condensing and liquefying, which would cause blockage of the pipeline.

[0080] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A reactant source supply system in communication with a reaction chamber, characterized by, The source bottle contains a liquid reaction source. A carrier gas branch is connected to the source bottle at one end and carries carrier gas to the source bottle to convert part of the liquid reaction source into a gaseous reaction source. A source delivery branch is connected to the source bottle and the reaction chamber at both ends and carries carrier gas with the gaseous reaction source to the reaction chamber. A flow limiting device is installed on the source delivery branch to limit the flow of carrier gas with the gaseous reaction source. One end of the carrier gas branch is inserted into the source bottle above the liquid level of the liquid reaction source.

2. The source supply system according to claim 1, wherein A first constant temperature device is installed outside the source bottle to heat the source bottle.

3. The source supply system according to claim 1, wherein A second constant temperature device is installed outside the source delivery branch to heat the source delivery branch.

4. The source supply system according to claim 1, wherein At least one valve is installed on the carrier gas branch and the source delivery branch to control the flow of fluid.

5. The source supply system according to claim 1, wherein A first cleaning branch is connected to the carrier gas branch and the source delivery branch at both ends and includes a first gas inlet branch and a first waste outlet branch connected to the source delivery branch at one end.

6. The source supply system according to claim 1, wherein At least one valve is installed on the first cleaning branch to control the flow of fluid.

7. The source supply system according to claim 1, wherein A second cleaning branch is connected to the first cleaning branch in parallel and includes a second gas inlet branch and a second waste outlet branch.

8. The reaction source supply system according to claim 7, wherein At least one valve is installed on the second cleaning branch to control the flow of fluid.

9. The source supply system according to claim 1, wherein A dilution branch is connected to the reaction chamber at one end and the carrier gas branch at the other end.

10. The reaction source supply system according to claim 9, wherein At least one valve is installed on the dilution branch to control the flow of fluid. The other end of the carrier gas branch and the other end of the dilution branch are connected to the same main delivery pipeline, and a flow meter is installed on the main delivery pipeline.

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