Optical shutter slit adjusting unit

Abstract

The utility model provides an optical shutter slit adjusting unit, relates to the technical field of X-ray diffractometers, and solves the technical problem that in the prior art, an experiment result is affected by central position deviation easily occurring in the installation and adjustment process of independent components. The optical shutter slit adjusting unit comprises a shutter body which is provided with a through hole, one end of the through hole is a light inlet hole, and the other end of the through hole is a light outlet hole; the Solar diaphragm is fixedly mounted at the central position of the through hole; the gate body is rotatably mounted on the gate sleeve, and a light emitting gate is formed in the gate sleeve; and when the gate body rotates, the relative positions of the light outlet hole or the light inlet hole and the light outlet gate are changed, so that the dynamic adjustment of the aperture of the slit is realized. The Solar diaphragm and the slit are integrated in the same gate body, so that the central position is ensured to be completely consistent. The divergence angle and the receiving angle of the X-ray beam are always kept consistent, and the measurement precision of the diffraction angle is improved.

Description

Technical Field

[0001] This utility model relates to the field of X-ray diffractometer technology, and in particular to a light shutter slit adjustment unit. Background Technology

[0002] X-ray diffraction (XRD) is one of the most fundamental and powerful methods for studying crystal structures, especially excelling in the precise measurement of powder samples. X-rays scatter when they strike a material, and diffraction is a unique phenomenon that occurs when X-rays are scattered by a crystalline substance. A fundamental characteristic of crystals is the periodicity of their microstructure (the arrangement of atoms, molecules, or ions). When X-rays are scattered, coherent scattered waves with the same wavelength as the incident wave interfere with each other. Their intensities reinforce each other in certain directions, while canceling each other out in others, thus producing diffracted lines. This phenomenon is essentially the same as the diffraction phenomenon produced when visible light passes through a grating. The possible directions of diffraction depend on the type of crystal microstructure (cell type) and its basic dimensions (interplanar spacing, cell parameters, etc.), while the diffraction intensity is determined by the types and distribution of the constituent elements in the crystal structure. Therefore, the diffraction pattern of a crystal can comprehensively reflect the microscopic details of the crystal structure. From a transformation perspective, the diffraction pattern of a crystal is a Fourier transformation of the three-dimensional scene of the crystal structure at the atomic scale.

[0003] In practical applications, the most common X-ray powder diffractometers are such as Figure 1 As shown, the optical path of its goniometer includes:

[0004] Sollar slits (apertures): These are positioned between the X-ray source and the sample, and between the sample and the detector, respectively. They are used to limit the divergence of X-rays along the axial direction of the goniometer, ensuring that the X-ray beam diverges approximately only on the scanning circular plane. Small axial divergence reduces diffraction angle measurement errors and peak distortion, which is beneficial for obtaining better peak shape and higher diffraction angle resolution.

[0005] Diverging slit: Used to limit the width of a diverging beam.

[0006] Receiving slit: Used to limit the width of the received diffracted beam.

[0007] Anti-scattering slits: prevent additional scattering (such as scattering from the edges of the apertures of each slit, and scattering from other metal accessories in the optical path) from entering the detector, which helps to reduce background noise.

[0008] Filters / absorbers (attenuators): These are typically placed between the sample and the receiving slit to alter the spectral composition of the radiation or reduce the beam intensity. For example, commonly used aluminum sheets can significantly attenuate long wavelengths, confining the radiation to the short-wavelength band of the continuous spectrum. Appropriate attenuators, used in conjunction with detectors, can effectively achieve linear measurements of radiation intensity over a large dynamic range. The more commonly used "Kβ filter" can produce a beam of radiation with approximately a single Kα wavelength. For the characteristic radiation of each element, it is generally possible to find another element, using the first absorption edge of the latter to create a Kβ filter to filter out Kβ radiation and retain Kα radiation.

[0009] However, in practical use, existing X-ray powder diffractometers use the aperture and slit as two separate components, which makes them prone to center position deviations during installation and adjustment. This deviation leads to inconsistencies between the X-ray beam divergence and reception angles, affecting the accuracy of diffraction angle measurement and peak shape quality, and easily generating significant measurement errors. Especially under high-precision measurement requirements, these errors can severely impact the accuracy and reliability of experimental results.

[0010] Therefore, there is an urgent need to develop a light shutter slit adjustment unit to solve the above-mentioned technical problems. Utility Model Content

[0011] The purpose of this invention is to provide a light shutter slit adjustment unit to solve the technical problem in the prior art where the aperture and slit are set as independent components, which easily leads to center position deviation during installation and adjustment, affecting measurement accuracy and experimental results. The various technical effects of the preferred technical solution among the many technical solutions provided by this invention are detailed below.

[0012] To achieve the above objectives, the present invention provides the following technical solution:

[0013] This utility model provides a light shutter slit adjustment unit, comprising:

[0014] The gate body has a through hole for the passage of a linear focal point X-ray source. One end of the through hole is a light inlet hole, and the other end is a light outlet hole.

[0015] The Sollar aperture is fixedly installed at the center of the through hole. The Sollar aperture is composed of multiple parallel and equally spaced metal sheets. The plane of these metal sheets is perpendicular to the focal line of the X-ray source and is used to limit the divergence of X-rays in the direction of the focal line.

[0016] A gate sleeve, on which the gate body is rotatably mounted, and a light-emitting gate opening is provided on the gate sleeve. The gate sleeve is used to support and guide the rotational movement of the gate body.

[0017] The rotation axis of the gate body is parallel to the focal line of the X-ray source, ensuring that during the rotation of the gate body, the light exit hole or light entrance hole can coincide or partially coincide with the light exit gate opening, forming slits of different diameters.

[0018] The slit adjustment mechanism changes the relative position of the light outlet or light inlet hole and the light outlet gate when the gate body rotates, thereby realizing the dynamic adjustment of the slit diameter.

[0019] Furthermore, the gate sleeve is also provided with a light inlet gate, which is arranged opposite to the light outlet gate. During the rotation of the gate body, the light outlet hole and the light outlet gate coincide or partially coincide, and the light inlet gate and the light inlet hole coincide or partially coincide, forming slits of different diameters.

[0020] Furthermore, the gate sleeve is arranged in a sleeve shape, with a receiving cavity extending from one end of the gate sleeve to the other end. The light inlet gate and the light outlet gate are opened on the circumferential side wall of the gate sleeve. The gate body is rotatably disposed in the receiving cavity, and the outer diameter of the gate body matches the inner diameter of the gate sleeve to ensure stable rotation of the gate body within the gate sleeve.

[0021] Furthermore, the aperture of the light-emitting aperture is smaller than the aperture of the light-emitting gate to ensure that X-rays can completely pass through the light-emitting gate in the maximum aperture state, while in the minimum aperture state, the width of the diffracted beam can be effectively limited.

[0022] Furthermore, a collar is fitted onto the gate sleeve, the collar is rotatably mounted on the gate sleeve, and an absorption sheet for attenuating the wavelength or reducing the intensity of the beam is installed on the collar. During use, the absorption sheet rotates to the light exit gate, allowing X-rays to pass through the absorption sheet.

[0023] Furthermore, the absorber includes a filter for attenuating wavelengths, the filter being fixedly mounted on a collar, and the material of the filter being selected to effectively filter X-rays of a specific wavelength, thereby improving the purity of the diffraction signal.

[0024] Furthermore, the absorber includes an attenuator for reducing beam intensity, the attenuator being fixedly mounted on a collar, and the material of the attenuator being selected to effectively reduce the intensity of X-rays to prevent detector overload damage.

[0025] Furthermore, the absorber includes a filter for reducing wavelength and an attenuator for reducing beam intensity. A positioning hole is provided through the collar along a direction perpendicular to its rotation axis. The attenuator and the filter are arranged overlappingly at the positioning hole to simultaneously filter wavelength and attenuate beam intensity.

[0026] Furthermore, the circumferential sidewall of the collar is provided with a clearance notch along its circumferential direction. When there is no need to reduce the wavelength and reduce the beam intensity, rotating the collar will make both the light exit hole and the light entrance hole on the gate body within the clearance notch, ensuring that the X-rays do not pass through the attenuator and filter and pass directly.

[0027] Furthermore, both the inner and outer walls of the collar are provided with arc-shaped grooves through positioning holes. The attenuator and filter are correspondingly slidably set in the arc-shaped grooves of the inner and outer walls. The position of the attenuator and filter at the positioning hole can be adjusted by sliding to control whether the wavelength of the X-ray is weakened or the beam intensity is reduced.

[0028] This invention provides a shutter slit adjustment unit that integrates the Sollar aperture and slit into a single shutter body. Through precise mechanical design and control system, it significantly improves the measurement accuracy and peak shape quality of an X-ray powder diffractometer. The main technical effects of this solution are as follows:

[0029] 1. Significantly improves the accuracy of diffraction angle measurement.

[0030] Consistent Center Position: This invention integrates the Sollar aperture and slit into a single gate body, ensuring complete consistency in their center positions during installation and adjustment. Traditional independent setups easily lead to deviations in the center positions of the aperture and slit, thus affecting the consistency of the X-ray beam's divergence and reception angles. This invention eliminates this deviation, ensuring that the X-ray beam's divergence and reception angles remain consistent, thereby significantly improving the accuracy of diffraction angle measurement.

[0031] Reduced mechanical errors: Because the Sollar aperture and slit are integrated, assembly errors and mechanical wear between multiple independent components are reduced, further improving the system's stability and repeatability. Especially under high-precision measurement requirements, this design effectively avoids measurement deviations caused by mechanical errors.

[0032] 2. Saves installation space and facilitates the addition of other optical path components:

[0033] Compacting the space occupied by optical components: By integrating the Sollar aperture, gate, and slit adjustment mechanism into one unit, the total space required for individual component installation is significantly reduced. This compact design not only optimizes the internal layout of the instrument but also provides more available space for the addition of other optical components such as monochromators, filters, and detectors.

[0034] Facilitates future upgrades and expansions: The saved installation space allows for easy addition of new optical components or improvement of the existing configuration to meet experimental needs, enhancing the instrument's flexibility and scalability. For example, advanced optical components such as multilayer lenses and capillary optical elements can be easily added without altering the original structure, further improving the instrument's performance and functionality.

[0035] 3. Optimize peak shape quality and resolution.

[0036] Reduced axial divergence: The Sollar aperture consists of multiple parallel, equally spaced metal sheets. The planes of these metal sheets are perpendicular to the focal line of the X-ray source, effectively limiting the divergence of X-rays along the focal line. Compared to traditional independent settings, this design can more precisely control the axial divergence angle of X-rays, thereby reducing the broadening and distortion of diffraction peaks and obtaining sharper, more symmetrical peak shapes.

[0037] Dynamic slit adjustment: By rotating the gate, the relative position of the light exit or light inlet aperture and the light exit gate changes, achieving dynamic adjustment of the slit diameter. This design allows for flexible adjustment of the slit diameter according to different experimental needs, ensuring optimal peak quality and resolution in various application scenarios. Especially in fine structural analysis requiring high resolution, dynamic slit adjustment can significantly improve the accuracy of experimental results.

[0038] Filter / Attenuator Optimization: Filters and attenuators are slidably positioned between the sample and the receiving slit. Appropriate filters or attenuators can be selected based on experimental requirements to alter the spectral composition of the radiation or reduce beam intensity. For example, commonly used Kβ filters can effectively filter out Kβ rays, retaining approximately a single Kα wavelength, thereby improving the quality of the diffraction pattern. Furthermore, appropriate attenuators used in conjunction with the detector can achieve linear measurements of radiation intensity over a large dynamic range, ensuring the accuracy and stability of experimental data.

[0039] 4. Enhance system flexibility and adaptability

[0040] Multi-scenario applications: The optical shutter slit adjustment unit of this invention is not only suitable for conventional X-ray powder diffraction experiments, but can also be flexibly adjusted according to different experimental needs. For example, in applications such as high-precision structural analysis, micro-area diffraction, and in-situ experiments, this unit can meet the requirements of various complex experiments through dynamic slit adjustment and filter optimization, and has wide applicability.

[0041] Automated Control: By introducing precision bearings and angle encoders, the optical shutter slit adjustment unit of this invention can achieve automated slit diameter adjustment and beam characteristic control. This not only simplifies the operation process and improves work efficiency, but also enables long-term stable experiments under unattended conditions, making it particularly suitable for large-scale data acquisition and automated analysis. Attached Figure Description

[0042] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0043] Figure 1 This is a schematic diagram of the optical path system of the goniometer.

[0044] Figure 2 This is a schematic diagram of the overall structure provided in an embodiment of the present utility model;

[0045] Figure 3 Here are some structural schematic diagrams provided by embodiments of this utility model:

[0046] Figure 4 This is a partial exploded view of the structure provided in an embodiment of this utility model;

[0047] Figure 5 This is a schematic diagram of the collar structure provided in an embodiment of the present utility model;

[0048] Figure 6 This is a cross-sectional view of the collar structure provided in an embodiment of the present utility model;

[0049] Figure 7 This is a cross-sectional view of the gate sleeve structure provided in an embodiment of this utility model.

[0050] Explanation of reference numerals in the attached drawings: 100, drive mechanism; 110, first drive assembly; 120, second drive assembly; 130, synchronous pulley; 210, gate sleeve; 211, light exit gate; 212, light inlet gate; 220, gate body; 221, through hole; 222, light inlet hole; 223, light exit hole; 230, collar; 231, positioning hole; 232, filter; 233, attenuator; 234, arc-shaped groove; 235, clearance notch; 240, Sollar aperture; 250, receiving cavity. Detailed Implementation

[0051] To make the objectives, technical solutions, and advantages of this utility model clearer, the technical solutions of this utility model will be described in detail below. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other implementation methods obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0052] In the description of this utility model, it should be noted that, unless otherwise stated, "a plurality of" means two or more; the terms "upper," "lower," "left," "right," "inner," "outer," "front end," "rear end," "head," "tail," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," "third," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0053] In the description of this utility model, it should also be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0054] X-ray diffraction (XRD) is an important method for studying the crystal structure of materials. It utilizes the interaction between X-rays and the atomic arrangement inside the crystal, and by analyzing the intensity and angular distribution of the scattered X-rays, detailed information about the crystal structure can be obtained.

[0055] When X-rays irradiate a material, scattering occurs. For crystalline materials, due to the periodic arrangement of their atoms, molecules, or ions, this scattering exhibits a special diffraction phenomenon. Specifically, when X-rays interact with a crystal, coherent scattered waves with the same wavelength as the incident wave interfere. In certain directions, these scattered waves are in phase, leading to enhanced intensity; while in other directions, they may cancel each other out. This process is similar to the phenomenon produced when visible light passes through a diffraction grating, both based on the principles of wave optics.

[0056] The direction in which diffraction occurs in a crystal is determined by its microstructure, including the cell type and basic dimensions (such as interplanar spacing and cell parameters). The intensity of the diffraction lines depends on the types and spatial distribution of the constituent elements in the crystal structure. Therefore, by analyzing diffraction patterns, we can obtain detailed information about the crystal structure. From a mathematical transformation perspective, the diffraction pattern of a crystal can be viewed as a Fourier transform of its three-dimensional atomic structure, providing a method for converting structural information in physical space into measurable diffraction modes in reciprocal space.

[0057] Crystal diffraction techniques are one of the most fundamental and powerful tools for studying crystal structures. In particular, X-ray powder diffraction (XRD) is suitable for powder samples and can accurately measure diffraction angles to determine the structural features of crystals.

[0058] In powder diffraction, the sample consists of a large number of tiny crystal particles with random orientations. Therefore, when X-rays irradiate such a sample, as long as the incident angle satisfies Bragg's law, i.e., nλ = 2dsin(θ), where n is an integer (usually 1), λ is the wavelength of the X-rays, d is the interplanar spacing, and θ is the incident angle, diffraction signals will be obtained from the crystal particles with different orientations. Since the orientation of the crystal particles in the powder is random, for each interplanar spacing d that satisfies the condition, a diffraction peak will be generated at the corresponding diffraction angle 2θ, resulting in a series of discrete diffraction peaks in the powder diffraction pattern.

[0059] In a typical powder diffractometer setup, the X-ray source provides a line-focal point parallel to the rotation axis of the goniometer. A sample stage is centrally located within the goniometer to hold the sample, ensuring the sample plane is aligned with the rotation axis. The sample stage and detector arm rotate synchronously around the same axis (O-axis) to measure diffraction intensities at different angles. This configuration allows the instrument to systematically collect diffraction data from crystal grains of various orientations, thus constructing a complete diffraction pattern. This method is applicable not only to single-crystal analysis but is also particularly suitable for polycrystalline powder samples, as the latter provides statistical averaging, avoiding the bias introduced by single-crystal orientation.

[0060] The following is in conjunction with the appendix Figure 2-7 To further describe this application in detail, embodiments of this application disclose a light shutter slit adjustment unit.

[0061] Example 1

[0062] Reference Figure 2 and Figure 3 As shown, a light shutter slit adjustment unit includes a shutter body 220, a shutter sleeve 210, and a collar 230.

[0063] Gate 220: A light source for passing X-rays through the line focal point. A Sollar aperture 240 (i.e., a parallel thin-film aperture) is installed inside the gate 220 to limit the axial divergence of the X-ray beam and reduce additional scattering from the aperture edge and other metal accessories into the detector or receiver.

[0064] Gate sleeve 210: Located at the top of gate body 220, gate body 220 can rotate within gate sleeve 210. This design allows the Sollar aperture 240 to rotate synchronously with the rotation of gate sleeve 210, thereby ensuring that the Sollar aperture 240 is always in optimal working condition throughout the entire rotation process, effectively controlling the direction and intensity of the X-ray beam.

[0065] Collar 230: Collar 230 is fitted outside of gate sleeve 210 and can rotate relative to gate sleeve 210. Absorbing plates for attenuating wavelength or reducing beam intensity are mounted on collar 230. These absorbing plates can be selectively inserted into the optical path as needed to adjust the intensity and wavelength of X-rays. The selection and use of absorbing plates can significantly improve experimental conditions, especially when it is necessary to avoid damage to the sample from excessively strong X-rays.

[0066] Drive mechanism 100: A drive mechanism 100 is fixedly installed at the bottom end of the gate sleeve 210. This drive mechanism 100 is responsible for driving the gate body 220 to rotate and the collar 230 to rotate, thereby adjusting the slit diameter and controlling whether to use the absorber plate. The design of the drive mechanism 100 ensures the automation and precision of all operations, reducing errors caused by human operation.

[0067] Reference Figure 3 and Figure 4 As shown, the top part of the gate body 220 that rotates within the gate sleeve 210 is the top end. A through hole 221 is formed at the top end of the gate body 220 along a direction perpendicular to the rotation axis. One end of the through hole 221 is a light inlet hole 222, and the other end is a light outlet hole 223. The design of the through hole 221 ensures that the X-ray beam can pass through smoothly and maintain a stable direction and intensity throughout the process.

[0068] The Sollar aperture 240 is fixedly mounted at the center of the through-hole 221. The Sollar aperture 240 consists of multiple parallel and equally spaced metal sheets, the planes of which are not only parallel to the through-hole 221 but also perpendicular to the focal line of the X-ray source. This design effectively limits the divergence of X-rays in the focal direction, allowing the X-ray beam to be approximated as a diverging beam that diverges only on the scanning circular plane.

[0069] Reference Figure 3 and Figure 4As shown, the shutter sleeve 210 has an exit shutter 211 and an entrance shutter 212, which are arranged opposite to each other, and the through direction of the exit shutter 211 and the entrance shutter 212 is parallel to the plane of the metal sheet in the Sollar aperture 240. The design of the exit shutter 211 and the entrance shutter 212 ensures that the X-ray beam can maintain a stable direction and intensity when passing through. The shutter sleeve 210 is sleeve-shaped, and a receiving cavity 250 is formed extending from one end of the shutter sleeve 210 to the other end. The through direction of the exit shutter 211 and the entrance shutter 212 passes through the center of the receiving cavity 250, and the shutter body is rotatably mounted in the receiving cavity 250. The rotation axis of the gate body 220 is parallel to the focal line of the X-ray source, so that during the rotation of the gate body 220, the light exit hole 223 can coincide or partially coincide with the light exit gate 211, and the light entrance hole 222 can coincide or partially coincide with the light entrance gate 212, thereby forming slits of different diameters.

[0070] Slit adjustment mechanism

[0071] Slit diameter variation:

[0072] When the gate body 220 rotates, the relative position of the light-emitting hole 223 and the light-emitting gate 211 changes, and the relative position of the light-inlet hole 222 and the light-inlet gate 212 also changes, thereby realizing the dynamic adjustment of the slit diameter.

[0073] Specifically, when the light exit aperture 223 is completely located within the light exit gate 211 and the light entrance aperture 222 is completely located within the light entrance gate 212, the slit diameter reaches its maximum, and the slit width is at its maximum, allowing the maximum range of divergent light beams to pass through.

[0074] As the gate body 220 continues to rotate, the light exit aperture 223 gradually deviates from the light exit gate 211, the light entrance aperture 222 gradually deviates from the light entrance gate 212, and the slit diameter gradually decreases, eventually forming the smallest aperture, which is used to precisely control the width of the diverging beam or the received diffracted beam.

[0075] Slit diameter variation pattern:

[0076] As the gate body 220 continues to rotate from its maximum diameter position, the slit diameter gradually decreases according to a predetermined gradient, ensuring that the change in slit diameter is continuous and controllable under different rotation angles, thus meeting the requirements of different experimental conditions.

[0077] This gradual change design allows users to flexibly adjust the slit diameter according to specific experimental requirements, thereby optimizing the quality of the diffraction signal and the accuracy of the experimental results.

[0078] Slit size relationship:

[0079] The aperture of the light exit aperture 223 is smaller than that of the light exit gate 211, and the aperture of the light entrance aperture 222 is smaller than that of the light entrance gate 212. This design ensures that the slit can be fully opened in the maximum aperture state, allowing the maximum range of light beams to pass through; while in the minimum aperture state, the slit can precisely control the width of the light beam, avoiding unnecessary background noise and scattering.

[0080] By precisely controlling the slit aperture, background noise can be effectively reduced, the signal-to-noise ratio improved, and diffraction peaks made more clearly visible, thereby enhancing the reliability and accuracy of experimental results. A smaller slit width helps improve the resolution of the diffraction pattern, which is particularly important in high-precision measurements. The dynamic adjustment mechanism of the slit aperture allows users to flexibly adjust the width of the X-ray beam according to different experimental conditions and sample characteristics, thus optimizing the quality of the diffraction signal.

[0081] Reference Figure 2 and Figure 4 As shown, a clearance notch 235 is provided on the circumferential sidewall of the collar 230 along its circumferential direction. The angle of the clearance notch 235 is greater than 180 degrees (e.g., 190 degrees). When wavelength attenuation and beam intensity reduction are not required, by rotating the collar 230, both the light exit hole 223 and the light entrance hole 222 on the gate body 220 are positioned within the clearance notch 235. At this time, the X-rays pass directly without passing through the attenuator 233 and the filter 232, ensuring that the beam intensity and wavelength are not affected.

[0082] By setting the clearance notch 235, users can flexibly choose whether to use the absorber according to experimental needs. When wavelength attenuation and beam intensity reduction are required, rotating the collar 230 will cause the exit aperture 223 and the entrance aperture 222 to be partially or completely outside the clearance notch 235, thereby allowing the X-rays to pass through the absorber to achieve the desired wavelength and intensity control effect.

[0083] Reference Figure 2 and Figure 4 As shown, a positioning hole 231 is provided on the collar 230 along the direction perpendicular to its rotation axis. Light rays passing through the positioning hole 231 and parallel to the rotation axis of the collar 230 pass through the clearance notch 235. Thus, when the X-ray beam passes through the positioning hole 231, it will pass through the clearance notch 235. Therefore, the collar 230 will not block the X-ray beam.

[0084] Reference Figure 5 and Figure 6 As shown, both the inner and outer walls of the collar 230 are provided with arc-shaped grooves 234 that pass through the positioning hole 231.

[0085] The absorber includes a filter 232 slidably disposed within an arc-shaped groove 234 on the inner wall of the collar 230 and an attenuator 233 slidably disposed within an arc-shaped groove 234 on the outer wall of the collar 230. The filter 232 is used to attenuate wavelengths by selecting specific materials to filter out unwanted wavelengths. The attenuator 233 is used to reduce beam intensity and prevent detector overload.

[0086] When the experiment does not require wavelength selection or beam intensity reduction, rotating the collar 230 ensures that both the exit aperture 223 and the entrance aperture 222 on the gate body 220 are within the clearance notch 235. In this case, the X-rays pass directly without passing through the attenuator 233 and the filter 232, ensuring that the beam intensity and wavelength remain unaffected.

[0087] When it is necessary to reduce the wavelength, rotate the collar 230 to make the positioning hole 231 correspond to the light inlet gate 212 or the light outlet gate 211, so that the X-ray beam passes through the positioning hole 231.

[0088] Then, the filter 232 inside the sliding arc-shaped groove 234 is slidable so that it covers the positioning hole 231. At this time, when the X-ray beam passes through the positioning hole 231, it will pass through the filter 232, effectively filtering out X-rays of a specific wavelength and improving the purity of the diffraction signal.

[0089] The choice of filter 232 can be determined based on the specific wavelength to be filtered. For example, the commonly used "Kβ filter" can be used to obtain a beam of X-rays with an approximate single Kα wavelength. In X-ray diffraction experiments, a single wavelength of X-ray is often required, and using a Kβ filter is the simplest and cheapest method. For the characteristic X-rays of each element, it is generally possible to find another element and use its first absorption edge, i.e., the K absorption edge, to create a so-called "Kβ filter." The Kβ filter can essentially "filter out" the Kβ rays while the Kα attenuation is minimal. For example, for X-rays produced by a Cu target X-ray tube, using a 0.021 mm thick Ni foil as a "Kβ filter" can attenuate the Kβ lines in the beam to 1 / 600 of their original intensity, while the Kα attenuation is only 0.4. For metal elements in the 4th period, the element with an atomic number one less than it (i.e., the element preceding it) is suitable as its Kβ filter material.

[0090] When it is necessary to reduce the beam intensity, the collar 230 is rotated to align the positioning hole 231 with the light inlet gate 212 or the light outlet gate 211, so that the X-ray beam passes through the positioning hole 231.

[0091] Then, the attenuator 233 in the sliding arc-shaped groove 234 is slidable so that it covers the positioning hole 231. At this time, when the X-ray beam passes through the positioning hole 231, it will pass through the attenuator 233, effectively reducing the intensity of the X-ray and preventing detector overload.

[0092] The choice of attenuator 233 depends on the required attenuation level, which determines the material and thickness. Common attenuation materials include thin sheets of metals such as aluminum and copper.

[0093] When it is necessary to both reduce the wavelength and reduce the beam intensity, first rotate the collar 230 so that the positioning hole 231 corresponds to the light inlet gate 212 or the light outlet gate 211, so that the X-ray beam passes through the positioning hole 231.

[0094] Then, slide the filter 232 and attenuator 233 in the arc-shaped groove 234 respectively, so that they simultaneously cover the positioning hole 231. At this time, when the X-ray beam passes through the positioning hole 231, it will first pass through the filter 232 and then through the attenuator 233, thereby simultaneously achieving wavelength reduction and beam intensity reduction.

[0095] This combined approach allows for flexible selection of whether to use attenuator 233 and filter 232, as well as their combination, based on experimental requirements, without compromising experimental accuracy. This is achieved by rotating the collar 230 and sliding the filter 232 and attenuator 233. This enables the equipment to adapt to various application scenarios, performing particularly well in situations requiring frequent changes in experimental conditions, and flexibly adjusting X-ray parameters to meet the needs of different experimental conditions.

[0096] The independent sliding design of filter 232 and attenuator 233 allows users to precisely adjust the wavelength and intensity of X-rays according to specific experimental requirements, ensuring the accuracy and reliability of experimental results.

[0097] The drive mechanism 100 includes a first drive assembly 110 and a second drive assembly 120 for controlling the gate body 220 and the collar 230, respectively. Each drive assembly includes a stepper motor, an angle encoder and a controller.

[0098] The stepper motor is preferably a stepper motor with appropriate torque and resolution. This motor is equipped with a driver that can accept digital pulse input from the controller.

[0099] Angle encoders are preferably absolute encoders, which can provide a unique position code within a 360-degree range. The encoder is mounted directly on the output shaft of the stepper motor, or connected to the motor shaft via a coupling to ensure synchronous rotation.

[0100] The controller is preferably a microprocessor or a dedicated motion controller with a built-in PID control algorithm to process the feedback data from the angle encoder and generate corresponding control commands for the stepper motor driver.

[0101] Initialization: Upon startup, the controller reads the initial position of the angle encoder and uses it as a reference point. At this time, the user can adjust the size of the slit or the rotation angle and direction of the collar 230 as needed, and set the corresponding rotation angle and direction of the stepper motor.

[0102] Target setting: The user inputs the target angle and rotation direction (forward or reverse) to the controller via a human-machine interface (HMI) or programming interface. The controller calculates the number and sequence of pulses to be sent to the stepper motor based on the set target.

[0103] Control process:

[0104] Based on the calculation results, the controller sends pulse signals to the stepper motor through the stepper motor driver, causing the motor to start rotating.

[0105] The angle encoder monitors the position of the motor shaft in real time and feeds the position information back to the controller.

[0106] The controller continuously compares the current actual position with the target position. If a deviation is detected, it corrects the position error by adjusting the pulse frequency and phase, ensuring that the motor rotates in the predetermined angle and direction.

[0107] Stopping condition: When the motor reaches the target position, the controller stops sending pulse signals, and the motor stops rotating. Simultaneously, the controller can record the current position for use as a new reference point in subsequent operations.

[0108] The output shaft of the stepper motor corresponding to the gate body 220 is fixedly connected to the gate body 220 on the same axis, that is, the stepper motor drives the gate body 220 to rotate synchronously.

[0109] Both the output shaft of the stepper motor corresponding to the collar 230 and the bottom end of the collar 230 are provided with synchronous pulleys 130. A belt for transmitting power is provided between the two synchronous pulleys 130, so as to accurately drive the collar 230 to rotate at an angle.

[0110] Example 2: Dynamic slit adjustment device for semi-cylindrical gate sleeve 210

[0111] Reference Figure 7 As shown, the main difference between this embodiment and Embodiment 1 lies in the structure of the gate sleeve 210. Specifically, the gate sleeve 210 in this embodiment adopts a semi-cylindrical design, that is, the gate sleeve 210 has a C-shaped cross-section in the direction perpendicular to the axis. This design not only simplifies the manufacturing process of the gate sleeve 210, but also provides more flexibility for the dynamic adjustment of the slit diameter.

[0112] In this embodiment, the gate sleeve 210 is semi-cylindrical, with a C-shaped cross-section perpendicular to its axis. This design allows the gate sleeve 210 to reduce material usage and manufacturing costs while ensuring structural strength.

[0113] One end of the gate sleeve 210 extends to the other end and has a receiving cavity 250. The gate body is rotatably disposed within the receiving cavity 250. The gate sleeve 210 has a single light inlet gate 212 or light outlet gate 211 communicating with the receiving cavity 250, instead of having two gates simultaneously as in Embodiment 1. This means that in practical applications, the gate sleeve 210 can be used for only the single function of light inlet or light outlet, or different functional requirements can be achieved by replacing the gate sleeve 210.

[0114] The gate sleeve 210 is fitted outside the gate body 220 to ensure that the gate body 220 can rotate freely inside the gate sleeve 210 without affecting the alignment of the gate opening and the formation of the slit.

[0115] Slit adjustment mechanism

[0116] Slit diameter variation:

[0117] During the rotation of the gate body 220, the light outlet 223 or the light inlet 222 can overlap or partially overlap with the light inlet gate 212 or the light outlet gate 211, thereby forming slits of different diameters.

[0118] Specifically, when the gate body 220 is at a certain angle, the light exit hole 223 or the light entrance hole 222 is completely located within the corresponding gate opening, and the slit diameter is maximized, allowing the maximum range of divergent light beams to pass through.

[0119] As the gate body 220 continues to rotate, the light exit aperture 223 or the light entrance aperture 222 gradually deviates from the corresponding gate opening, and the slit diameter gradually decreases, eventually forming the minimum aperture, which is used to precisely control the width of the diverging beam or the received diffracted beam.

[0120] The semi-cylindrical gate sleeve 210 simplifies the overall structure, reduces the number of parts, and lowers manufacturing costs and maintenance difficulty. The single gate design allows the gate sleeve 210 to be used for a single function of either light intake or light output, or different functional requirements can be met by replacing the gate sleeve 210, enhancing the flexibility and adaptability of the equipment.

[0121] The semi-cylindrical gate sleeve 210 design in this embodiment not only simplifies the structure and reduces manufacturing costs, but also provides greater flexibility for dynamic adjustment of the slit diameter. With its single gate design, the gate sleeve 210 can be used for a single function of light intake or light output, or different functional requirements can be achieved by replacing the gate sleeve 210. This design makes the device more flexible and suitable for various application scenarios, performing particularly well in situations requiring frequent changes in experimental conditions.

[0122] The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this utility model should be included within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the protection scope of the claims.

Claims

1. A shutter slit adjustment unit characterized by comprising: The utility model relates to a kind of X-ray slit device, including: Gate body (220), through the through hole (221) for passing through linear focal point X-ray source is set, one end of the through hole (221) is light inlet hole (222), the other end is light outlet hole (223); Sollar diaphragm (240), fixedly installed in the central position of through hole (221), the Sollar diaphragm (240) is composed of multiple parallel equidistant metal sheets, the plane of these metal sheets is perpendicular to the focal line of X-ray source, for limiting the divergence of X-ray in linear focal point direction; Gate sleeve (210), the gate body (220) is rotatably installed on the gate sleeve (210), the gate sleeve (210) is set with light outlet gate (211), and the gate sleeve (210) is used to support and guide the rotary motion of gate body (220); Rotary axis, the rotary axis of the gate body (220) is parallel to the focal line of linear focal point X-ray source, ensure that light outlet hole (223) or light inlet hole (222) can coincide or partially coincide with light outlet gate (211) during the rotation of gate body (220), form different aperture slits; Slit adjusting mechanism, when the gate body (220) rotates, the relative position of light outlet hole (223) or light inlet hole (222) and light outlet gate (211) changes, so as to realize the dynamic adjustment of slit aperture.

2. A shutter slit adjustment unit according to claim 1, characterized in that The gate sleeve (210) is also set with light inlet gate (212), and the light inlet gate (212) is oppositely arranged with the light outlet gate (211), during the rotation of the gate body (220), light outlet hole (223) coincides or partially coincides with light outlet gate (211), and light inlet gate (212) coincides or partially coincides with light inlet hole (222), which forms different aperture slits.

3. A shutter slit adjustment unit according to claim 2, wherein The gate sleeve (210) is in the form of a sleeve, and a receiving cavity (250) is formed from one end of the gate sleeve (210) to the other end, the light inlet gate (212) and the light outlet gate (211) are formed on the circumferential side wall of the gate sleeve (210), and the gate body is rotatably arranged in the receiving cavity (250).

4. A shutter slit adjustment unit according to claim 2, wherein The aperture of the light outlet hole (223) is smaller than the aperture of the light outlet gate (211).

5. The shutter slit adjustment unit according to claim 1, wherein A sleeve ring (230) is rotatably arranged on the gate sleeve (210), and an absorbing sheet for selecting wavelength or reducing beam intensity is arranged on the sleeve ring (230), so that X-rays can pass through the absorbing sheet when the absorbing sheet is rotated to the light outlet gate (211) during use.

6. A shutter slit adjustment unit according to claim 5, wherein The absorbing sheet includes a filter sheet (232) for selecting wavelength, and the filter sheet (232) is fixedly installed on the sleeve ring (230).

7. A shutter slit adjustment unit according to claim 5, wherein The absorbing sheet includes an attenuating sheet (233) for reducing beam intensity, and the attenuating sheet (233) is fixedly installed on the sleeve ring (230).

8. A shutter slit adjustment unit according to claim 5, wherein The absorption sheet comprises a filter sheet (232) for selecting wavelength and an attenuation sheet (233) for reducing light beam intensity, a positioning hole (231) is formed through the sleeve ring (230) along the direction perpendicular to the rotation axis of the sleeve ring (230), and the attenuation sheet (233) and the filter sheet (232) are arranged at the positioning hole (231) to simultaneously realize wavelength selection and light beam intensity adjustment.

9. A shutter slit adjustment unit according to claim 8, wherein The circumferential side wall of the sleeve ring (230) is formed with an avoiding notch (235) along the circumferential direction, when wavelength selection and light beam intensity adjustment are not needed, the sleeve ring (230) is rotated to make the light outlet hole (223) and the light inlet hole (222) on the shutter body (220) both be in the avoiding notch (235), so that the X-ray does not pass through the attenuation sheet (233) and the filter sheet (232) and directly passes through.

10. A shutter slit adjustment unit according to claim 9, wherein The inner wall and the outer wall of the sleeve ring (230) are both formed with an arc-shaped embedding groove (234) through the positioning hole (231), the attenuation sheet (233) and the filter sheet (232) are correspondingly and slidingly arranged in the arc-shaped embedding groove (234) of the inner wall and the outer wall, and whether the attenuation sheet (233) and the filter sheet (232) are located at the positioning hole (231) can be adjusted by sliding, so as to control whether the X-ray is subjected to wavelength weakening or light beam intensity reduction.

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