Photoetching photomask box compatible with various mask plates
By setting multiple placement plates and adjustment components inside the photolithography mask box, combined with positioning posts and buffer strips, the problem that existing photolithography mask boxes can only be compatible with one type of mask is solved, achieving stable positioning of masks of different thicknesses and improving compatibility.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-15
- Publication Date
- 2026-03-31
AI Technical Summary
Existing photomask boxes can only be compatible with one type of photomask and cannot provide limiting protection for photomasks of different thicknesses.
A photolithography mask box was designed, which contains multiple sets of placement plates and adjustment components. The position of the placement plates can be adjusted by adjusting the adjustment components. Combined with positioning posts and buffer strips, stable positioning and fixing of photomasks of different thicknesses can be achieved.
It achieves stable positioning and fixing of photomasks of different thicknesses, improves the practicality of photolithography photomask boxes, and is compatible with a variety of photomasks.
Smart Images

Figure CN224067129U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of photolithography mask box technology, specifically relating to a photolithography mask box that is compatible with multiple photomasks. Background Technology
[0002] A photomask, also known as a lithography mask, is a pattern master used in the photolithography process of microelectronics manufacturing. A photomask consists of an opaque, light-blocking film forming a mask pattern on a transparent substrate, which is then transferred to the product substrate through exposure. It acts as the pattern "negative" in chip manufacturing, used to transfer high-precision circuit designs and carrying intellectual property information such as pattern design and process technology. The main function of a photomask is to transfer the designed circuit pattern to the substrate or wafer in downstream industries through exposure, thereby enabling mass production.
[0003] Any defects on the photomask will have a serious impact on the accuracy of the final pattern, so the photomask must be kept "perfect" during use and storage. A photomask box is required during the use and turnover of the photomask.
[0004] A search revealed that CN212149937U describes a semiconductor photomask box with a stable internal support structure, compatible with different mask models. The components contacting the mask provide multi-directional buffering, and the bottom contact surface is small, ensuring a stable and secure support surface. This further guarantees that the mask will not be damaged during use, storage, and transportation. The box includes an upper and lower cover housing, which are fitted together. Its key feature is that elastic support members, shaped like "S," are provided at the corners of both the upper and lower cover housings. However, this box only accommodates masks of one size. It cannot provide protection for masks of different thicknesses, requiring improvement. Therefore, designing a photomask box compatible with multiple masks to address these shortcomings is crucial. Utility Model Content
[0005] (1) Technical problems to be solved
[0006] To address the shortcomings of existing technologies, the purpose of this utility model is to provide a photomask box that is compatible with multiple photomasks. The main body of this photomask box solves the problem that existing photomask boxes can only place photomasks of one specification, and cannot provide limiting protection for photomasks of different thicknesses.
[0007] (2) Technical solution
[0008] To solve the above-mentioned technical problems, this utility model provides a photolithography mask box that is compatible with multiple photomasks. The photolithography mask box includes a main body. The main body of the photolithography mask box is provided with multiple sets of placement plates. The multiple sets of placement plates are connected by multiple sets of adjustment components. The upper and lower ends of the placement plates are provided with receiving grooves.
[0009] The adjustment assembly is used to adjust the position of multiple sets of placement plates. The adjustment assembly consists of a connecting frame, a moving frame, a first rotating rod, a second rotating rod, a sleeve, and a moving rod. The connecting frame is fixedly connected to the outside of the placement plate, the moving frame is fixedly connected to the outside of another set of placement plates, the first rotating rod is located between the connecting frame and the moving frame, the second rotating rod is rotatably connected to the outside of the first rotating rod, the sleeve is fixedly connected to the inside of the connecting frame, and the moving rod is slidably connected to the inside of the sleeve.
[0010] When using the photomask box body of this technical solution, the photomask is placed inside the receiving groove. The positioning posts ensure the photomask is confined within the receiving groove. Multiple sets of buffer strips protect the outer side of the photomask. Rotating the drive rod drives the second drive gear to rotate, causing the first drive gear to rotate, which in turn drives the drive screw to rotate, allowing the moving rod to move. As the moving rod moves, it moves the moving block, causing the first rotating rod to move. The first and second rotating rods are slidably connected to the moving frame via pulleys, allowing the moving frame to move and thus the placement plate to move. The distance between the two sets of placement plates is adjusted according to the thickness of the photomask, ensuring the receiving groove at the bottom of the other set of placement plates contacts the photomask. The internal positioning posts and buffer strips ensure stable confinement and fixation of the photomask.
[0011] Preferably, a movable block is rotatably connected to the bottom end of the first rotating rod, the movable block is slidably connected to the connecting frame, and the movable rod is fixedly connected to the movable block.
[0012] Furthermore, the bottom end of the second rotating rod is rotatably connected to the connecting frame, and the front ends of both the first and second rotating rods are rotatably connected to pulleys, which are slidably connected to the moving frame.
[0013] Furthermore, the sleeve has an internal rotating connection with a drive screw, and the moving rod is threadedly connected to the drive screw.
[0014] Furthermore, a first drive gear is fixedly connected to the end of the drive screw away from the moving rod, a second drive gear is meshed with the outer side of the first drive gear, and a drive rod is fixedly connected to the outer side of the second drive gear extending to the sleeve. Both the first drive gear and the second drive gear are rotatably connected to the sleeve.
[0015] Furthermore, one set of placement plates is fixedly connected to the main body of the photomask box, while the remaining placement plates are slidably connected to the main body of the photomask box.
[0016] Furthermore, buffer strips are fixedly connected to all four sides of the inside of the receiving groove, and positioning posts are fixedly connected between multiple sets of buffer strips.
[0017] (3) Beneficial effects
[0018] Compared with the prior art, the beneficial effects of this utility model are as follows:
[0019] The photomask box of this utility model, through the design of the adjustment component, places the photomask inside the receiving groove. With the help of the positioning post, the photomask can be limited inside the receiving groove. Multiple sets of buffer strips protect the outside of the photomask. According to the thickness of the photomask, the spacing between the two sets of placement plates can be adjusted by the adjustment component, so that the receiving groove at the bottom of the other set of placement plates can contact the photomask. With the help of the internal positioning post and buffer strips, the photomask can be stably limited and fixed. Through the overall design, photomasks of different thicknesses can be placed, thereby increasing the practicality of the photomask box. Attached Figure Description
[0020] Figure 1 This is a schematic diagram of the overall three-dimensional structure of the device of this utility model;
[0021] Figure 2 This is a schematic diagram of the structure of multiple placement plates in the device of this utility model;
[0022] Figure 3 This is a schematic diagram of the two sets of placement plates in the device of this utility model;
[0023] Figure 4 This is a schematic diagram of the device placement plate structure of this utility model;
[0024] Figure 5 This is a schematic diagram of the adjustment component structure of the device of this utility model;
[0025] Figure 6 This is a schematic diagram of the moving rod structure of the device of this utility model;
[0026] The labels in the attached diagram are as follows: 1. Main body of the photomask box; 2. Placement plate; 3. Adjustment component; 4. Receiving groove; 5. Connecting frame; 6. Moving frame; 7. First rotating rod; 8. Second rotating rod; 9. Sleeve; 10. Moving rod; 11. Moving block; 12. Pulley; 13. Drive screw; 14. First drive gear; 15. Second drive gear; 16. Drive rod; 17. Buffer strip; 18. Positioning post. Detailed Implementation
[0027] This specific embodiment is a photolithography mask box compatible with multiple photomasks, and its structural schematic diagram is shown below. Figure 1-6As shown, the photomask box includes a photomask box body 1; the photomask box body 1 has multiple sets of placement plates 2 inside, the multiple sets of placement plates 2 are connected by multiple sets of adjustment components 3, and the upper and lower ends of the placement plates 2 are provided with receiving grooves 4.
[0028] The adjustment assembly 3 is used to adjust the position of multiple sets of placement plates 2. The adjustment assembly 3 consists of a connecting frame 5, a moving frame 6, a first rotating rod 7, a second rotating rod 8, a sleeve 9, and a moving rod 10. The connecting frame 5 is fixedly connected to the outside of the placement plate 2, the moving frame 6 is fixedly connected to the outside of another set of placement plates 2, the first rotating rod 7 is located between the connecting frame 5 and the moving frame 6, the second rotating rod 8 is rotatably connected to the outside of the first rotating rod 7, the sleeve 9 is fixedly connected to the inside of the connecting frame 5, and the moving rod 10 is slidably connected to the inside of the sleeve 9.
[0029] In this embodiment, the bottom end of the first rotating rod 7 is rotatably connected to a moving block 11, the moving block 11 is slidably connected to the connecting frame 5, the moving rod 10 is fixedly connected to the moving block 11, the moving block 11 is connected to the connecting frame 5, and when the moving rod 10 moves, it drives the moving block 11 to move, so that the first rotating rod 7 moves.
[0030] Secondly, in this embodiment, the bottom end of the second rotating rod 8 is rotatably connected to the connecting frame 5, and the front ends of the first rotating rod 7 and the second rotating rod 8 are rotatably connected to pulleys 12. The pulleys 12 are slidably connected to the moving frame 6. The first rotating rod 7 is displaced, and the first rotating rod 7 and the second rotating rod 8 are slidably connected to the moving frame 6 through the pulleys 12, so that the moving frame 6 can be displaced, thereby driving the placement plate 2 to be displaced.
[0031] Furthermore, in this embodiment, a drive screw 13 is rotatably connected inside the sleeve 9, and the moving rod 10 is threadedly connected to the drive screw 13. A first drive gear 14 is fixedly connected to the end of the drive screw 13 away from the moving rod 10. A second drive gear 15 is meshed with the outer side of the first drive gear 14. The second drive gear 15 extends to the outer side of the sleeve 9 and is fixedly connected to a drive rod 16. Both the first drive gear 14 and the second drive gear 15 are rotatably connected to the sleeve 9. Rotating the drive rod 16 drives the second drive gear 15 to rotate, causing the first drive gear 14 to rotate, which in turn drives the drive screw 13 to rotate, allowing the moving rod 10 to move.
[0032] Furthermore, in this embodiment, a set of placement plates 2 are fixedly connected to the photomask box body 1, and the remaining placement plates 2 are slidably connected to the photomask box body 1. When the placement plates 2 are displaced, the slidable connection between the placement plates 2 and the photomask box body 1 enables the placement plates 2 to be displaced stably.
[0033] Furthermore, in this embodiment, buffer strips 17 are fixedly connected to all four sides of the inside of the receiving groove 4, and positioning posts 18 are fixedly connected between multiple sets of buffer strips 17. When the mask is placed inside the receiving groove 4, the positioning posts 18 help to limit the mask inside the receiving groove 4. The outer side of the mask is protected by multiple sets of buffer strips 17. The distance between the two sets of placement plates 2 is adjusted according to the thickness of the mask so that the receiving groove 4 at the bottom of the other set of placement plates 2 can contact the mask. The positioning posts 18 and buffer strips 17 inside help to stably limit and fix the mask.
[0034] When using the device of this technical solution, the mask plate is placed inside the receiving groove 4. With the help of the positioning post 18, the mask plate can be limited inside the receiving groove 4. Multiple sets of buffer strips 17 protect the outside of the mask plate. Rotating the drive rod 16 drives the second drive gear 15 to rotate, causing the first drive gear 14 to rotate, which in turn drives the drive screw 13 to rotate, allowing the moving rod 10 to move. When the moving rod 10 moves, it drives the moving block 11 to move, causing the first rotating rod 7 to move. The first rotating rod 7 and the second rotating rod 8 are slidably connected to the moving frame 6 through the pulley 12, allowing the moving frame 6 to move, which in turn drives the placement plate 2 to move. According to the thickness of the mask plate, the distance between the two sets of placement plates 2 is adjusted so that the receiving groove 4 at the bottom of the other set of placement plates 2 can contact the mask plate. With the help of the internal positioning post 18 and buffer strips 17, the mask plate can be stably limited and fixed. Compared with the existing photolithography mask box, this utility model can improve the overall practicality of the photolithography mask box through design.
[0035] The above embodiments are preferred implementations of this utility model. In addition, this utility model can also be implemented in other ways. Any obvious substitutions without departing from the concept of this technical solution are within the protection scope of this utility model.
Claims
1. A photomask cassette compatible with multiple mask panels, the photomask cassette comprising a mask cassette body (1); characterized in that, The inside of the mask box body (1) is provided with a plurality of groups of placing plates (2), and the plurality of groups of placing plates (2) are connected through a plurality of groups of adjusting assemblies (3). The adjusting assembly (3) is used for adjusting the position of the plurality of groups of placing plates (2), and the adjusting assembly (3) is composed of a connecting frame (5), a moving frame (6), a first rotating rod (7), a second rotating rod (8), a sleeve (9) and a moving rod (10), the connecting frame (5) is fixedly connected to the outer side of the placing plate (2), the moving frame (6) is fixedly connected to the outer side of another group of placing plates (2), the first rotating rod (7) is located between the connecting frame (5) and the moving frame (6), the second rotating rod (8) is rotatably connected to the outer side of the first rotating rod (7), the sleeve (9) is fixedly connected to the inside of the connecting frame (5), and the moving rod (10) is slidably connected to the inside of the sleeve (9).
2. The photolithography mask box compatible with various mask plates according to claim 1, wherein, The bottom end of the first rotating rod (7) is rotatably connected with a moving block (11), the moving block (11) is slidably connected with the connecting frame (5), and the moving rod (10) is fixedly connected with the moving block (11).
3. The photolithography mask box compatible with various mask plates according to claim 1, wherein, The bottom end of the second rotating rod (8) is rotatably connected with the connecting frame (5), the front ends of the first rotating rod (7) and the second rotating rod (8) are rotatably connected with a pulley (12), and the pulley (12) is slidably connected with the moving frame (6).
4. The photolithography mask box compatible with various masks according to claim 1, wherein, The inside of the sleeve (9) is rotatably connected with a driving screw (13), and the moving rod (10) is threadedly connected with the driving screw (13).
5. The photolithography mask box compatible with various mask plates according to claim 4, wherein, The end, away from the moving rod (10), of the driving screw (13) is fixedly connected with a first driving gear (14), the outer side of the first driving gear (14) is meshedly connected with a second driving gear (15), the second driving gear (15) extends to the outside of the sleeve (9) and is fixedly connected with a driving rod (16), and the first driving gear (14) and the second driving gear (15) are rotatably connected with the sleeve (9).
6. The photolithography mask box compatible with various masks according to claim 1, wherein, One group of the placing plates (2) are fixedly connected with the mask box body (1), and the rest of the placing plates (2) are slidably connected with the mask box body (1).
7. The photolithography mask box compatible with various masks according to claim 1, wherein, The inside of the sleeve (9) is rotatably connected with a driving screw (13), and the moving rod (10) is threadedly connected with the driving screw (13). The inside of the sleeve (9) is rotatably connected with a driving screw (13), and the moving rod (10) is threadedly connected with the driving screw (13). The end, away from the moving rod (10), of the driving screw (13) is fixedly connected with a first driving gear (14), the outer side of the first driving gear (14) is meshedly connected with a second driving gear (15), the second driving gear (15) extends to the outside of the sleeve (9) and is fixedly connected with a driving rod (16), and the first driving gear (14) and the second driving gear (15) are rotatably connected with the sleeve (9). One group of the placing plates (2) are fixedly connected with the mask box body (1), and the rest of the placing plates (2) are slidably connected with the mask box body (1). The inside of the sleeve (9) is rotatably connected with a driving screw (13), and the moving rod (10) is threadedly connected with the driving screw (13). The inside of the sleeve (9) is rotatably connected with a driving screw (13), and the moving rod (10) is threadedly connected with the driving screw (13).
Citation Information
Patent Citations
Semiconductor photoetching photomask box
CN212149937U