Compatible equipment for nanoimprint and photoetching processes

Abstract

The utility model provides compatible equipment for nanoimprint and photoetching processes. The compatible equipment comprises a feeding unit, a glue uniformizing unit, an imprint exposure assembly, a developing unit, a discharging unit and a material taking unit, the imprint exposure assembly comprises a first imprint exposure operation unit, a second imprint exposure operation unit, an exposure unit, a first imprint unit and a second imprint unit. The feeding unit, the glue uniformizing unit, the developing unit, the discharging unit, the first imprinting exposure operation unit and the second imprinting exposure operation unit are fixedly arranged. The material taking unit, the exposure unit, the first imprinting unit and the second imprinting unit can move. According to the compatible equipment for the nanoimprint lithography technology and the photolithography technology, the nanoimprint lithography technology and the photolithography technology can be carried out on the same equipment, and the preparation efficiency of diffraction optical waveguide finished products is greatly improved.

Description

Technical Field

[0001] This invention belongs to the field of diffractive waveguide fabrication technology, specifically relating to a compatible device for nanoimprinting and photolithography processes. Background Technology

[0002] Augmented Reality (AR) technology refers to providing users with additional information in the real world through certain technical means (i.e., "enhancement"). This technology organically integrates images from the virtual world with scenes from the real world, providing users with richer information and an immersive experience by deeply integrating the calculated information with the real world.

[0003] Augmented reality technology can be implemented through many hardware platforms, among which the most immersive is wearable augmented reality devices, namely AR glasses.

[0004] Currently, the more mature AR glasses technology solutions are mainly divided into prism solutions, birdbath solutions, freeform surface solutions, off-axis holographic lens solutions, and diffractive waveguide solutions.

[0005] For example, a diffractive optical waveguide includes an optical waveguide substrate, a coupling grating, and a coupling grating. The coupling grating and the coupling grating are disposed on the optical waveguide substrate (generally a glass wafer), and their basic principle is as follows: Figure 1 As shown, the light output from the optomechanical (imaging device) is coupled into the optical waveguide substrate by a coupling grating and propagates within the optical waveguide substrate via total internal reflection. Whenever it encounters a coupling grating, a portion of the light is coupled out. The coupled-out light (the solid line in the direction of the light entering the human eye in the figure) enters the human eye, thus enabling the human eye to see the same image as the output of the optomechanical. At the same time, the human eye can see the real-world scene (the dashed line in the direction of the light entering the human eye in the figure). The superposition of the two parts can realize the function of augmented reality.

[0006] However, when using the aforementioned diffractive waveguide as the lens for AR glasses, in the actual process of wearing AR glasses, in addition to observing the image that enters the eye from the output of the optical engine through the diffractive waveguide, the user can also see the image of external objects reflected by the waveguide substrate, which reduces the user experience.

[0007] To address the aforementioned issues, those skilled in the art have performed a coating operation on the non-structural regions of a diffractive waveguide obtained by setting a grating structure region on an optical wafer using nanoimprint lithography, thereby obtaining the finished diffractive waveguide. In order to perform the coating operation on the non-structural regions of the diffractive waveguide, the grating structure region of the diffractive waveguide needs to be covered before the coating operation on the non-structural regions of the diffractive waveguide. The existing covering method uses photolithography.

[0008] In existing technologies, nanoimprinting and photolithography processes require the use of corresponding nanoimprinting and photolithography equipment, respectively, resulting in low fabrication efficiency of diffractive waveguide products. Utility Model Content

[0009] In order to overcome the shortcomings of the prior art, this utility model provides a compatible device for nanoimprinting and photolithography processes.

[0010] This utility model is achieved through the following technical solution:

[0011] This utility model provides a compatible device for nanoimprinting and photolithography processes, including a feeding unit, a spin coating unit, an imprinting exposure assembly, a developing unit, a feeding unit, and a material handling unit;

[0012] The imprinting exposure assembly includes a first imprinting exposure operation unit, a second imprinting exposure operation unit, an exposure unit, a first imprinting unit, and a second imprinting unit;

[0013] The feeding unit, the coating unit, the developing unit, the unloading unit, the first imprinting and exposure unit, and the second imprinting and exposure unit are fixedly installed.

[0014] The material handling unit can be moved to the feeding unit, the coating unit, the developing unit, the unloading unit, the first imprinting and exposure unit, and the second imprinting and exposure unit;

[0015] The exposure unit can be moved to either the first imprinting exposure unit or the second imprinting exposure unit; the first imprinting unit can be moved to the first imprinting exposure unit, and the second imprinting unit can be moved to the second imprinting exposure unit.

[0016] Furthermore, the first imprinting exposure unit includes a first stage, a first lifting shaft, a second lifting shaft, a first support frame, a first soft film plate fixing assembly, and a first shielding plate fixing assembly;

[0017] The first lifting shaft and the second lifting shaft are disposed on both sides of the first platform;

[0018] The first support frame is mounted above the first platform. One side of the bottom end of the first support frame is located at the top of the first lifting shaft, and the other side of the bottom end of the first support frame is located at the top of the second lifting shaft. The first soft film plate fixing assembly or the first shielding plate fixing assembly is installed inside the first support frame.

[0019] The first soft membrane plate fixing assembly is used to place the first soft membrane plate, and the first shielding plate fixing assembly is used to place the first shielding plate.

[0020] Furthermore, the first soft membrane plate fixing assembly adopts a first soft membrane plate fixing frame, which is used to place the first soft membrane plate;

[0021] The first shielding plate fixing assembly adopts a first shielding plate fixing frame, which is used to place the first shielding plate.

[0022] Furthermore, the second imprinting exposure unit includes a second stage, a third lifting shaft, a fourth lifting shaft, a second support frame, a second soft film plate fixing assembly, and a second shielding plate fixing assembly;

[0023] The third and fourth lifting shafts are arranged on both sides of the second platform;

[0024] The second support frame is installed above the second platform. One side of the bottom end of the second support frame is located at the top end of the third lifting shaft, and the other side of the bottom end of the second support frame is located at the top end of the fourth lifting shaft. The second soft membrane plate fixing assembly or the second shielding plate fixing assembly is installed inside the second support frame.

[0025] The second soft membrane plate fixing assembly is used to place the second soft membrane plate, and the second shielding plate fixing assembly is used to place the second shielding plate.

[0026] Furthermore, the second soft membrane plate fixing assembly adopts a second soft membrane plate fixing frame, which is used to place the second soft membrane plate;

[0027] The second shielding plate fixing assembly adopts a second shielding plate fixing frame, which is used to place the second shielding plate.

[0028] Furthermore, the exposure unit includes a first sliding component, a UV lamp, a first shielding plate, and a second shielding plate;

[0029] The UV lamp is mounted on the first sliding component.

[0030] Furthermore, the first imprinting unit includes a second sliding component and a first pressure roller, wherein the first pressure roller is disposed on the second sliding component;

[0031] The second imprinting unit includes a third sliding component and a second pressure roller, wherein the third sliding component is provided with the second pressure roller.

[0032] Furthermore, the imprinting exposure assembly also includes an alignment unit;

[0033] The alignment unit can be moved to the first imprinting exposure unit or the second imprinting exposure unit;

[0034] The alignment unit includes a fourth sliding component, a first alignment lens, and a second alignment lens, wherein the first alignment lens and the second alignment lens are disposed on the fourth sliding component.

[0035] Furthermore, it also includes a plasma processing unit, a cleaning unit, and a baking unit;

[0036] The plasma treatment unit, cleaning unit, and baking unit are fixedly installed.

[0037] The material handling unit can be moved to the plasma processing unit, the cleaning unit, and the baking unit.

[0038] Furthermore, multiple spin coating units are used.

[0039] Compared with the prior art, the technical solution of this utility model has the following beneficial effects:

[0040] This invention provides a compatible device for nanoimprinting and photolithography processes, including a loading unit, a spin coating unit, an imprinting exposure assembly, a developing unit, a unloading unit, and a material handling unit. The imprinting exposure assembly includes a first imprinting exposure unit, a second imprinting exposure unit, an exposure unit, a first imprinting unit, and a second imprinting unit. The loading unit, spin coating unit, developing unit, unloading unit, first imprinting exposure unit, and second imprinting exposure unit are fixedly arranged. The material handling unit is movable to the loading unit, spin coating unit, developing unit, unloading unit, first imprinting exposure unit, and second imprinting exposure unit. The exposure unit is movable to either the first imprinting exposure unit or the second imprinting exposure unit. The first imprinting unit is movable to the first imprinting exposure unit, and the second imprinting unit is movable to the second imprinting exposure unit. The compatible device for nanoimprinting and photolithography provided by this invention enables nanoimprinting and photolithography processes to be performed on the same equipment, greatly improving the fabrication efficiency of diffractive waveguide products. Attached Figure Description

[0041] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0042] Figure 1 A schematic diagram illustrating the working principle of an existing diffractive waveguide as an example;

[0043] Figure 2 A structural block diagram of a compatible device for nanoimprinting and photolithography processes of this invention, as an example;

[0044] Figure 3 Here is a block diagram of the imprinting exposure assembly as an example;

[0045] Figure 4 This is a schematic diagram of the first support frame;

[0046] Figure 5 This is a schematic diagram illustrating the connection structure between the first flexible membrane plate fixing frame and the first flexible membrane plate as an example.

[0047] Figure 6 This is a schematic diagram illustrating the connection structure between the first shielding plate fixing frame and the first shielding plate, used as an example.

[0048] Among them, 1-feeding unit, 2-cleaning unit, 3-plasma treatment unit, 4-coating unit, 4-1-first coating unit, 4-2-second coating unit, 5-baking unit, 6-imprinting and exposure assembly, 6-1-first imprinting and exposure operation unit, 6-2-second imprinting and exposure operation unit, 6-3-exposure unit, 6-4-alignment unit, 6-5-first imprinting unit, 6-6-second imprinting unit, 7-developing unit, 8-feeding unit, 9-material handling unit, 10-first support frame, 11-first flexible film plate fixing frame, 12-first flexible film plate, 13-first shielding plate fixing frame, 14-first shielding plate. Detailed Implementation

[0049] The technical solution of this utility model will be clearly and completely described below with reference to its embodiments. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0050] In this document, the terms "first," "second," and other similar words are not intended to imply any order, quantity, or importance, but are merely used to distinguish different elements. The terms "one," "a," and other similar words are not intended to indicate the existence of only one of the stated things, but rather that the description refers only to one of the stated things, which may have one or more. The terms "comprising," "including," and other similar words are intended to indicate a logical relationship, not a spatial relationship. For example, "A includes B" means that logically B belongs to A, not that spatially B is located inside A. Furthermore, the meanings of the terms "comprising," "including," and other similar words should be considered open-ended, not closed. For example, "A includes B" means that B belongs to A, but B does not necessarily constitute all of A; A may also include other elements such as C, D, and E.

[0051] In this document, the terms "embodiment," "this embodiment," "preferred embodiment," and "one embodiment" do not imply that the description applies only to one specific embodiment, but rather that such description may also be applicable to one or more other embodiments. Those skilled in the art will understand that any description made herein relating to one embodiment can be substituted, combined, or otherwise incorporated with the descriptions in one or more other embodiments. Such substitutions, combinations, or other incorporations resulting in new embodiments are readily conceived by those skilled in the art and fall within the protection scope of this utility model.

[0052] In this description, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0053] This invention provides a compatible device for nanoimprinting and photolithography processes, such as... Figure 2 As shown, it includes a feeding unit 1, a cleaning unit 2, a plasma treatment unit 3, a spin coating unit 4, a baking unit 5, an imprinting and exposure assembly 6, a developing unit 7, a feeding unit 8, and a material handling unit 9.

[0054] The aforementioned feeding unit, cleaning unit, plasma treatment unit, coating unit, baking unit, developing unit, unloading unit, and unloading unit can all utilize existing equipment. For example, the unloading unit can employ an existing robotic arm.

[0055] like Figure 3 As shown, the imprinting exposure assembly 6 includes, for example, a first imprinting exposure unit 6-1, a second imprinting exposure unit 6-2, an exposure unit 6-3, an alignment unit 6-4, a first imprinting unit 6-5, and a second imprinting unit 6-6.

[0056] The feeding unit, cleaning unit, plasma treatment unit, coating unit, baking unit, developing unit, unloading unit, first imprinting and exposure unit, and second imprinting and exposure unit are fixedly arranged.

[0057] The material handling unit can be moved to the feeding unit, cleaning unit, plasma treatment unit, spin coating unit, baking unit, developing unit, unloading unit, first imprinting and exposure unit, and second imprinting and exposure unit.

[0058] The exposure unit can be moved to the first imprinting exposure unit or the second imprinting exposure unit, the alignment unit can be moved to the first imprinting exposure unit or the second imprinting exposure unit, the first imprinting unit can be moved to the first imprinting exposure unit, and the second imprinting unit can be moved to the second imprinting exposure unit.

[0059] For example, the first imprinting exposure unit mentioned above includes a first stage, a first lifting shaft, a second lifting shaft, a first support frame, a first soft film plate fixing assembly, and a first shielding plate fixing assembly.

[0060] The first lifting shaft and the second lifting shaft are located on both sides of the first platform.

[0061] The first support frame is installed above the first platform. One side of the bottom end of the first support frame is located at the top end of the first lifting shaft, and the other side of the bottom end of the first support frame is located at the top end of the second lifting shaft. The first support frame is equipped with a first soft membrane plate fixing assembly or a first shielding plate fixing assembly.

[0062] The first PVC membrane fixing assembly is used to place the first PVC membrane, and the first shielding plate fixing assembly is used to place the first shielding plate.

[0063] For example, the first flexible membrane plate fixing assembly described above uses a first flexible membrane plate fixing frame. The first flexible membrane plate fixing frame can be disposed within the first support frame, and the first flexible membrane plate fixing frame is used to place the first flexible membrane plate. The first flexible membrane plate is an existing component, and a grating structure area is provided on the first flexible membrane plate.

[0064] For example, the first shielding plate fixing assembly described above adopts a first shielding plate fixing frame. The first shielding plate fixing frame can be disposed within the first support frame, and the first shielding plate fixing frame is used to place the first shielding plate. Here, the first shielding plate is made of transparent glass with a black film layer coated in a designated area, and the black film layer in the designated area of ​​the transparent glass corresponds to the grating structure area of ​​the diffraction waveguide.

[0065] For example, the second imprinting exposure unit includes a second stage, a third lifting shaft, a fourth lifting shaft, a second support frame, a second soft film plate fixing assembly, and a second shielding plate fixing assembly.

[0066] The third and fourth lifting shafts are located on both sides of the second platform.

[0067] The second support frame is installed above the second platform. One side of the bottom end of the second support frame is located at the top of the third lifting shaft, and the other side of the bottom end of the second support frame is located at the top of the fourth lifting shaft. The second soft membrane plate fixing assembly or the second shielding plate fixing assembly is installed inside the second support frame.

[0068] The second soft membrane plate fixing assembly is used to place the second soft membrane plate, and the second shielding plate fixing assembly is used to place the second shielding plate.

[0069] For example, the second flexible membrane plate fixing assembly described above uses a second flexible membrane plate fixing frame. The second flexible membrane plate fixing frame can be disposed within the second support frame, and the second flexible membrane plate fixing frame is used to place the second flexible membrane plate. Here, the second flexible membrane plate is an existing component, and a grating structure area is provided on the second flexible membrane plate.

[0070] The second shielding plate fixing assembly adopts a second shielding plate fixing frame. The second shielding plate fixing frame can be set inside the second support frame, and the second shielding plate fixing frame is used to place the second shielding plate. Here, the second shielding plate is a transparent glass with a black film layer coated in a designated area, and the black film layer in the designated area of ​​the transparent glass corresponds to the grating structure area of ​​the diffraction waveguide.

[0071] The first and second support frames described above have the same structure. Figure 4 The example is a structural schematic diagram of the first support frame 10.

[0072] The first and second flexible membrane plate fixing frames described above have the same structure. Figure 5 The example is a schematic diagram of the connection structure between the first soft membrane plate fixing frame 11 and the first soft membrane plate 12.

[0073] The first and second baffle fixing frames described above have the same structure. Figure 6 The example is a schematic diagram of the connection structure between the first shielding plate fixing frame 13 and the first shielding plate 14.

[0074] For example, the exposure unit includes a first sliding component, a UV lamp, the first shielding plate, and a second shielding plate. The UV lamp is disposed on the first sliding component.

[0075] For example, the first imprinting unit mentioned above includes a second sliding component and a first pressure roller, with the first pressure roller disposed on the second sliding component.

[0076] The second imprinting unit mentioned above includes a third sliding component and a second pressure roller, wherein the second pressure roller is disposed on the third sliding component.

[0077] For example, the alignment unit includes a fourth sliding component, a first alignment lens, and a second alignment lens, with the first alignment lens and the second alignment lens disposed on the fourth sliding component.

[0078] The first sliding component, the second sliding component, the third sliding component, and the fourth sliding component mentioned above can be made using existing equipment, such as existing slide rail devices.

[0079] Multiple spin coat units can be used as described above. For example... Figure 1 As shown, the example of spin coating unit 4 includes a first spin coating unit 4-1 and a second spin coating unit 4-2.

[0080] The compatible equipment for nanoimprinting and photolithography of this invention can perform nanoimprinting, photolithography, and both processes simultaneously.

[0081] I. Nanoimprinting process operation mode:

[0082] 1. The loading unit loads optical wafers.

[0083] 2. The material handling unit picks up the optical wafer from the feeding unit and sends it to the cleaning unit for cleaning, where impurities on the surface of the optical wafer are removed.

[0084] 3. The material handling unit sends the cleaned optical wafers to the plasma processing unit for processing to improve the hydrophilicity of the optical wafer surface.

[0085] 4. The material handling unit delivers the plasma-treated optical wafers to the spin coating unit for sequential spin coating of tackifier and product adhesive.

[0086] 5. The material handling unit delivers the optical wafers after the homogenization operation to the baking unit for baking to cure the adhesive layer.

[0087] 6. The material handling unit delivers the baked optical wafers to the imprinting and exposure assembly for imprinting. The imprinting and exposure assembly can perform imprinting operations on two optical wafers simultaneously.

[0088] For example,

[0089] (1) A first soft membrane plate fixing assembly for placing the first soft membrane plate is disposed within a first support frame, and a first alignment mark is provided on the first soft membrane plate. A second soft membrane plate fixing assembly for placing the second soft membrane plate is disposed within a second support frame, and a second alignment mark is provided on the second soft membrane plate.

[0090] (2) The material handling unit places the baked first optical wafer on the first stage, with the adhesive layer side facing upwards, and a third alignment mark is set on the first optical wafer. The material handling unit places the baked second optical wafer on the second stage, with the adhesive layer side facing upwards, and a fourth alignment mark is set on the second optical wafer.

[0091] (3) The alignment unit moves above the first support frame and performs alignment operation on the first alignment mark of the first flexible film plate and the third alignment mark of the first optical wafer to realize the alignment operation of the first flexible film plate and the first optical wafer. The alignment unit moves to the initial position.

[0092] (4) The first imprinting unit moves above the first support frame and rolls the first flexible film plate to transfer the grating structure area on the first flexible film plate to the adhesive layer of the first optical wafer. After imprinting is completed, the first imprinting unit moves back to the initial position. At the same time, the alignment unit moves above the second support frame and performs an alignment operation on the second alignment mark of the second flexible film plate and the fourth alignment mark of the second optical wafer to realize the alignment operation of the second flexible film plate and the second optical wafer. The alignment unit moves back to the initial position.

[0093] (5) The UV lamp moves above the first support frame and shines downwards to perform the exposure operation. After the exposure operation is completed, the UV lamp moves back to the initial position. At the same time, the second imprinting unit moves above the second support frame and rolls the second soft film plate to transfer the grating structure area on the second soft film plate to the adhesive layer of the second optical wafer. After the imprinting is completed, the second imprinting unit moves back to the initial position.

[0094] (6) The first imprinting unit moves above the first support frame to perform a demolding operation: separating the first flexible film plate and the first optical wafer with the grating structure region. The first optical wafer with the grating structure region becomes the first diffractive waveguide. After the demolding operation is completed, the first imprinting unit moves back to its initial position. At the same time, the UV lamp moves above the second support frame and illuminates downwards for exposure. After the exposure operation is completed, the UV lamp moves back to its initial position.

[0095] (7) The material handling unit picks up the first diffractive waveguide and sends it to the unloading unit for unloading. The material handling unit continues to place the baked first optical wafer on the first stage and repeats the above-mentioned processing operations for the first optical wafer. At the same time, the second imprinting unit moves above the second support frame to perform a demolding operation: separating the second flexible film plate and the second optical wafer with the grating structure region. The second optical wafer with the grating structure region becomes the second diffractive waveguide. After the demolding operation is completed, the second imprinting unit moves to the initial position. The material handling unit picks up the second diffractive waveguide and sends it to the unloading unit for unloading. The material handling unit continues to place the baked second optical wafer on the second stage and repeats the above-mentioned processing operations for the second optical wafer.

[0096] II. Photolithography process operation mode:

[0097] 1. Feeding unit feeds diffractive waveguide.

[0098] 2. The material handling unit picks up the diffractive waveguide from the material loading unit and sends it to the spin coating unit. The spin coating unit spin coats positive photoresist on the side of the diffractive waveguide with the grating structure.

[0099] 3. The material handling unit delivers the diffraction waveguide of the spin-coated positive photoresist to the baking unit for baking to cure the photoresist layer.

[0100] 4. The material handling unit delivers the baked diffractive waveguide to the imprinting exposure assembly for exposure. The imprinting exposure assembly can perform exposure operations on two diffractive waveguides simultaneously.

[0101] For example,

[0102] (1) A first shield fixing assembly for placing the first shield is installed inside the first support frame, and a fifth positioning mark is installed inside the first shield. A second shield fixing assembly for placing the second shield is installed inside the second support frame, and a sixth positioning mark is installed inside the second shield.

[0103] (2) The material handling unit places the baked first diffractive waveguide on the first stage, with the adhesive layer side of the first diffractive waveguide facing upwards, and a seventh positioning mark is set inside the first diffractive waveguide. The material handling unit places the baked second diffractive waveguide on the second stage, with the adhesive layer side of the second diffractive waveguide facing upwards, and an eighth positioning mark is set inside the second diffractive waveguide.

[0104] (3) The alignment unit moves to the top of the first support frame and performs alignment operation on the fifth positioning mark of the first shield and the seventh positioning mark of the first diffractive waveguide to realize the alignment operation of the first shield and the first diffractive waveguide. The alignment unit moves to the initial position.

[0105] (4) The UV lamp is moved above the first support frame, the spacing between the first shield and the first diffractive waveguide is adjusted, and the UV lamp is started to illuminate downwards for exposure. After the exposure is completed, the UV lamp is moved back to the initial position. At the same time, the alignment unit moves above the second support frame and performs alignment operations on the sixth positioning mark of the second shield and the eighth positioning mark of the second diffractive waveguide to achieve the alignment operation of the second shield and the second diffractive waveguide. The alignment unit moves back to the initial position.

[0106] (5) The material handling unit sends the exposed first diffractive waveguide to the developing unit for developing. The material handling unit then places the baked first diffractive waveguide on the first stage and repeats the above-mentioned processing operations for the first diffractive waveguide. Simultaneously, the UV lamp moves above the second support frame, adjusts the spacing between the second shield and the second diffractive waveguide, and starts the UV lamp to irradiate downwards for exposure. After the exposure operation is completed, the UV lamp moves back to its initial position. The material handling unit sends the exposed second diffractive waveguide to the developing unit for developing. The material handling unit then places the baked second diffractive waveguide on the second stage and repeats the above-mentioned processing operations for the second diffractive waveguide.

[0107] (6) The material receiving unit sends the developed first diffractive waveguide and the second diffractive waveguide to the unloading unit for unloading.

[0108] III. Simultaneous operation mode of nanoimprinting and photolithography processes:

[0109] 1. The loading unit loads optical wafers.

[0110] 2. The material handling unit picks up the optical wafer from the feeding unit and sends it to the cleaning unit for cleaning, where impurities on the surface of the optical wafer are removed.

[0111] 3. The material handling unit sends the cleaned optical wafers to the plasma processing unit for processing to improve the hydrophilicity of the optical wafer surface.

[0112] 4. The material handling unit delivers the plasma-treated optical wafers to the spin coating unit for sequential spin coating of tackifier and product adhesive.

[0113] 5. The material handling unit delivers the optical wafers after the homogenization operation to the baking unit for baking to cure the adhesive layer.

[0114] 6. The first flexible membrane plate fixing assembly, which holds the first flexible membrane plate, is installed inside the first support frame. The second shielding plate fixing assembly, which holds the second shielding plate, is installed inside the second support frame.

[0115] 7. The material handling unit places the baked optical wafer onto the first stage, with the side of the optical wafer having the adhesive layer facing upwards. The material handling unit then places the previously baked diffractive waveguide onto the second stage, with the side of the diffractive waveguide having the adhesive layer facing upwards.

[0116] 8. The alignment unit moves above the first support frame and performs alignment operations on the first flexible film plate and the optical wafer to achieve the alignment of the first flexible film plate and the optical wafer. The alignment unit moves back to the initial position.

[0117] 9. The first imprinting unit moves above the first support frame and rolls the first flexible film plate to transfer the grating structure area on the first flexible film plate onto the adhesive layer of the optical wafer. The first imprinting unit moves back to its initial position.

[0118] 10. The UV lamp moves above the first support frame and shines downwards for exposure. After exposure, the UV lamp moves back to its initial position. Simultaneously, the alignment unit moves above the second support frame and aligns the second shield and the diffractive waveguide. The alignment unit then moves back to its initial position.

[0119] 11. The first imprinting unit moves above the first support frame to perform a demolding operation: separating the first flexible film plate and the optical wafer with the grating structure region, thus obtaining the diffractive waveguide. Simultaneously, the UV lamp moves above the second support frame and illuminates downwards for exposure. After the exposure operation is completed, the UV lamp moves back to its initial position.

[0120] 12. The material handling unit successively picks up the diffractive waveguides on the first platform and the second platform and sends them to the unloading unit for unloading.

[0121] The above embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although the utility model has been described in detail with reference to the above embodiments, those skilled in the art can still make modifications or equivalent substitutions to the specific implementation of this utility model. Any modifications or equivalent substitutions that do not depart from the spirit and scope of this utility model are within the protection scope of the claims of this utility model pending approval.

Claims

1. A compatible device for nanoimprinting and photolithography processes, characterized in that, It includes a feeding unit, a spin coating unit, an imprinting and exposure assembly, a developing unit, a feeding unit, and a material handling unit; The imprinting exposure assembly includes a first imprinting exposure operation unit, a second imprinting exposure operation unit, an exposure unit, a first imprinting unit, and a second imprinting unit; The feeding unit, the coating unit, the developing unit, the unloading unit, the first imprinting and exposure unit, and the second imprinting and exposure unit are fixedly installed. The material handling unit can be moved to the feeding unit, the coating unit, the developing unit, the unloading unit, the first imprinting and exposure unit, and the second imprinting and exposure unit; The exposure unit can be moved to either the first imprinting exposure unit or the second imprinting exposure unit; the first imprinting unit can be moved to the first imprinting exposure unit, and the second imprinting unit can be moved to the second imprinting exposure unit.

2. The compatible equipment for nanoimprinting and photolithography processes according to claim 1, characterized in that, The first imprinting exposure unit includes a first stage, a first lifting shaft, a second lifting shaft, a first support frame, a first soft film plate fixing assembly, and a first shielding plate fixing assembly; The first lifting shaft and the second lifting shaft are disposed on both sides of the first platform; The first support frame is mounted above the first platform. One side of the bottom end of the first support frame is located at the top end of the first lifting shaft, and the other side of the bottom end of the first support frame is located at the top end of the second lifting shaft. The first soft film plate fixing assembly or the first shielding plate fixing assembly is installed inside the first support frame. The first soft membrane plate fixing assembly is used to place the first soft membrane plate, and the first shielding plate fixing assembly is used to place the first shielding plate.

3. The compatible equipment for nanoimprinting and photolithography processes according to claim 2, characterized in that, The first soft membrane plate fixing assembly adopts a first soft membrane plate fixing frame, which is used to place the first soft membrane plate; The first shielding plate fixing assembly adopts a first shielding plate fixing frame, which is used to place the first shielding plate.

4. The compatible equipment for nanoimprinting and photolithography processes according to claim 3, characterized in that, The second imprinting exposure unit includes a second stage, a third lifting shaft, a fourth lifting shaft, a second support frame, a second soft film plate fixing assembly, and a second shielding plate fixing assembly; The third and fourth lifting shafts are arranged on both sides of the second platform; The second support frame is installed above the second platform. One side of the bottom end of the second support frame is located at the top end of the third lifting shaft, and the other side of the bottom end of the second support frame is located at the top end of the fourth lifting shaft. The second soft membrane plate fixing assembly or the second shielding plate fixing assembly is installed inside the second support frame. The second soft membrane plate fixing assembly is used to place the second soft membrane plate, and the second shielding plate fixing assembly is used to place the second shielding plate.

5. The compatible equipment for nanoimprinting and photolithography processes according to claim 4, characterized in that, The second soft membrane plate fixing assembly adopts a second soft membrane plate fixing frame, which is used to place the second soft membrane plate; The second shielding plate fixing assembly adopts a second shielding plate fixing frame, which is used to place the second shielding plate.

6. The compatible equipment for nanoimprinting and photolithography processes according to claim 5, characterized in that, The exposure unit includes a first sliding component, a UV lamp, a first shielding plate, and a second shielding plate; The UV lamp is mounted on the first sliding component.

7. The compatible equipment for nanoimprinting and photolithography processes according to claim 1, characterized in that, The first imprinting unit includes a second sliding component and a first pressure roller, wherein the first pressure roller is disposed on the second sliding component; The second imprinting unit includes a third sliding component and a second pressure roller, wherein the third sliding component is provided with the second pressure roller.

8. The compatible equipment for nanoimprinting and photolithography processes according to claim 1, characterized in that, The imprinting exposure assembly also includes an alignment unit; The alignment unit can be moved to the first imprinting exposure unit or the second imprinting exposure unit; The alignment unit includes a fourth sliding component, a first alignment lens, and a second alignment lens, wherein the first alignment lens and the second alignment lens are disposed on the fourth sliding component.

9. The compatible equipment for nanoimprinting and photolithography processes according to claim 1, characterized in that, It also includes a plasma processing unit, a cleaning unit, and a baking unit; The plasma treatment unit, cleaning unit, and baking unit are fixedly installed. The material handling unit can be moved to the plasma processing unit, the cleaning unit, and the baking unit.

10. The compatible apparatus for nanoimprinting and photolithography processes according to claim 1, characterized in that, Multiple spin coating units are used.

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