TFT array substrate cleaning tank

Abstract

The utility model relates to a cleaning tank, and provides a TFT (thin film transistor) array substrate cleaning tank which comprises an equipment outer protector, a water tank, a partition plate and the like. A plurality of windows are formed in the front side and the rear side of the equipment outer protection device, a transverse notch is formed in the upper portion of the equipment outer protection device, an external material conveying component carries materials to transversely move and pass through the notch, a water tank is transversely arranged in the equipment outer protection device, two partition plates are arranged in the water tank at intervals, and the inner space of the water tank is divided into three cleaning tanks which are transversely arranged through the two partition plates. The sectional type structure of the pre-washing tank, the main washing tank and the rinsing tank is adopted, a countercurrent washing path is formed in the moving direction of liquid and materials in each tank, high-frequency vibration of the ultrasonic module on the lower portion of the water tank is matched, efficient washing is achieved, and edge washing blind areas of uneven pressure of a traditional spraying type are avoided; the pollutant concentration is gradually reduced through segmented procedures, stubborn particles are disintegrated through the ultrasonic cavitation effect, and the problem of concentration gradient of a soaking type medicament is solved; compared with a conventional mode, the substrate cleaning method has the advantages that the yield is obviously improved, and the cleaning period is shortened.

Description

Technical Field

[0001] This utility model relates to a cleaning tank, and more particularly to a TFT array substrate cleaning tank. Background Technology

[0002] In the production process of TFT array substrates, the cleaning process is a critical step to ensure product quality. Various contaminants, such as dust, metal ions, and organic residues, adhere to the TFT array substrate during manufacturing. If these impurities are not thoroughly removed, they can affect the precision of subsequent thin film deposition, photolithography, and other processes, and may even lead to pixel defects, short circuits, and other problems. Therefore, an efficient cleaning tank design is essential for ensuring substrate cleanliness and improving product yield.

[0003] In existing technologies, TFT array substrate cleaning often employs spray or immersion methods, using chemical reagents and deionized water for circulating cleaning. However, these traditional cleaning tanks have significant drawbacks in practical applications. On one hand, spray cleaning may result in incomplete cleaning of the substrate edges due to uneven pressure distribution, while immersion cleaning is prone to reagent concentration gradient differences, affecting cleaning uniformity. On the other hand, the waste liquid discharge system design of traditional cleaning tanks is not optimized enough, leading to low utilization of chemical reagents and long cleaning times, which increases production costs and makes it difficult to meet the large-scale production needs of high-generation substrates. In addition, some cleaning tanks lack effective measures to prevent secondary contamination, and new particulate contaminants may adhere during the cleaning process due to tank material wear or liquid turbulence, further affecting the cleaning effect. Utility Model Content

[0004] To overcome the shortcomings of the existing technology, the technical problem to be solved is to provide a TFT array substrate cleaning tank.

[0005] The technical solution is as follows: A TFT array substrate cleaning tank includes an outer protective structure, a water tank, partitions, a pre-wash tank, a main cleaning tank, a rinsing tank, an ultrasonic module, a water inlet pipe, a diversion pipe, and a drain pipe. Multiple viewing windows are opened on both the front and rear sides of the outer protective structure. A horizontal notch is opened on the upper part of the outer protective structure for external material transfer components to carry materials laterally. A water tank is horizontally arranged inside the outer protective structure. Two partitions are spaced apart within the water tank, dividing the internal space into three horizontally arranged cleaning tanks. From right to left, the three cleaning tanks are respectively designated as a pre-wash tank, a main cleaning tank, and a rinsing tank. An ultrasonic module is located at the bottom of the water tank. A water inlet pipe is installed on the water tank, and the water inlet pipe is connected to the three cleaning tanks through three diversion pipes. Each diversion pipe is equipped with a flow regulating valve, and each cleaning tank is equipped with a drain pipe.

[0006] Furthermore, the material passes through the pre-cleaning tank, the main cleaning tank, and the rinsing tank in sequence within the water tank. The inlet of each diversion pipe is connected to the end area of ​​each cleaning tank, and the inlet of each drain pipe is connected to the front area of ​​each cleaning tank. The cleaning liquid is injected from the end of each tank through the diversion pipe and discharged through the front drain pipe, so that the flow direction of the cleaning liquid is in the opposite direction of the material movement, thereby enhancing the cleaning efficiency and the utilization rate of the cleaning agent.

[0007] Furthermore, it also includes slag discharge pipes and waste discharge pipes. A sludge collection pit is provided at the bottom of the water tank, and the front and rear sides of the bottom of the water tank are constructed as sloping surfaces that slope towards the sludge collection pit. Each area of ​​the cleaning tank is connected to a waste discharge pipe, and each waste discharge pipe is equipped with a liquid pump. The ends of each waste discharge pipe converge and connect with the slag discharge pipe to form a centralized sewage discharge path.

[0008] Furthermore, it also includes baffles and spray plates. The pre-cleaning tank of the water tank is symmetrically equipped with baffles on the front and rear sides of the upper part. Each baffle is equipped with a spray plate. The spray plate has multiple liquid transfer channels. Each side of the two spray plates is equipped with several atomizing nozzles. The number of liquid transfer channels in each spray plate is the same as the number of atomizing nozzles on it, and each liquid transfer channel is connected to and communicates with one atomizing nozzle.

[0009] Furthermore, it also includes a lifting frame, a drive motor, and a multi-link system. The spray plates are all slidably mounted on the baffles. The upper part of each spray plate is connected to a lifting frame. Each baffle is equipped with a drive motor. Each drive motor has a multi-link system on its output shaft. Each multi-link system consists of a swing arm fixedly connected to the output shaft of the drive motor and a connecting rod hinged to the swing arm. The ends of the connecting rods are all hinged to the lifting frame on the same side.

[0010] The beneficial effects are as follows: 1. This utility model adopts a segmented structure of pre-washing tank, main cleaning tank and rinsing tank, and makes the liquid and material movement direction in each tank form a counter-current cleaning path. Combined with the high-frequency vibration of the ultrasonic module at the bottom of the tank, it achieves efficient cleaning and avoids the blind spots of edge cleaning with uneven pressure in traditional spray type. The segmented process gradually reduces the concentration of contaminants, and the ultrasonic cavitation effect breaks down stubborn particles, solving the problem of concentration gradient of immersion agent. It makes the cleanliness of the substrate meet the process requirements, significantly improves the yield and shortens the cleaning cycle compared with conventional methods.

[0011] 2. This utility model features a sludge collection pit at the bottom of the water tank, connected by a sludge discharge assembly. The sloping structure on the front and rear sides of the lower part of the tank allows particulate impurities that detach during the cleaning process to automatically slide into the sludge collection pit. The sludge discharge assembly then discharges the wastewater periodically or intermittently, achieving centralized collection and discharge of cleaning wastewater and impurities. This design avoids secondary pollution caused by the circulation and deposition of impurities within the tank, ensuring the cleanliness of the cleaning solution while reducing the frequency of manual cleaning. It maintains a stable cleaning effect and improves the continuity of equipment operation and ease of maintenance. Attached Figure Description

[0012] Figure 1 This is a three-dimensional structural diagram of the present invention.

[0013] Figure 2 This is a three-dimensional structural diagram of the water tank and spraying mechanism of this utility model.

[0014] Figure 3 This is a three-dimensional structural diagram of the water tank, inlet pipe, and outlet pipe of this utility model.

[0015] Figure 4 This is a three-dimensional structural diagram of the water tank, waste discharge pipe and sewage discharge pipe of this utility model.

[0016] Figure 5 This is a three-dimensional structural diagram of the spraying mechanism of this utility model.

[0017] Component names and serial numbers in the diagram: 1_Equipment external protection, 2_Water tank, 3_Baffle, 301_Pre-wash tank, 302_Main cleaning tank, 303_Rinse tank, 4_Ultrasonic module, 5_Water inlet pipe, 51_Diverter pipe, 6_Drain pipe, 7_Baffle, 8_Spray plate, 9_Lifting frame, 91_Drive motor, 92_Multi-link, 10_Slag discharge pipe, 101_Sludge collection pit, 11_Waste discharge pipe. Detailed Implementation

[0018] The present invention will now be described in detail with reference to the accompanying drawings.

[0019] Example 1

[0020] A TFT array substrate cleaning tank, such as Figure 1-4As shown, the equipment includes an external protective shield 1, a water tank 2, a partition 3, a pre-wash tank 301, a main cleaning tank 302, a rinsing tank 303, an ultrasonic module 4, a water inlet pipe 5, a diversion pipe 51, and a drain pipe 6. The external protective shield 1 has multiple viewing windows on both the front and rear sides, allowing operators to easily observe the internal cleaning status and promptly handle any abnormalities. The upper part of the external protective shield 1 has a horizontal notch designed for the external material transfer components to carry materials laterally, ensuring smooth and unobstructed transmission of the hanging fixture. The internal external protective shield 1 also has horizontally designed... There is a water tank 2, and two partitions 3 are arranged inside the water tank 2. The two partitions 3 divide the internal space of the water tank 2 into three horizontally arranged cleaning tanks. The three cleaning tanks are respectively set as a pre-wash tank 301, a main cleaning tank 302, and a rinsing tank 303 from right to left. This partition design helps to carry out different cleaning stages independently, thereby improving cleaning efficiency and quality. An ultrasonic module 4 is provided at the bottom of the water tank 2. The high-frequency vibration generated by the ultrasonic module 4 can effectively remove tiny particles and stubborn stains on the surface of the substrate, further improving the cleaning effect. The water tank 2 is equipped with an inlet pipe 5, which is connected to three cleaning tanks via three branch pipes 51. Each branch pipe 51 is equipped with a flow regulating valve, allowing operators to flexibly adjust the flow rate of the cleaning solution in each cleaning tank according to actual cleaning needs, ensuring the best cleaning effect. Each cleaning tank is equipped with a drain pipe 6, with the opening of each branch pipe 51 connected to the end area of ​​each cleaning tank, and the opening of each drain pipe 6 connected to the front area of ​​each cleaning tank. The cleaning solution is injected from the end of each tank through the branch pipe 51 and discharged through the front drain pipe 6, making the flow direction of the cleaning solution reverse the direction of material movement. This not only enhances the cleaning efficiency but also improves the utilization rate of the agent and reduces unnecessary waste by creating a certain degree of liquid circulation within the cleaning tank.

[0021] In addition, such as Figure 2 and Figure 4 As shown, it also includes a slag discharge pipe 10 and a waste discharge pipe 11. The lower part of the water tank 2 is provided with a sludge collection pit 101, and the front and rear sides of the lower part of the water tank 2 are constructed as sloping surfaces inclined towards the sludge collection pit 101. This structural design allows particulate impurities generated during the cleaning process to be deposited downwards under the action of gravity and slide down the slope to the sludge collection pit 101, effectively preventing impurities from floating with the water flow in the cleaning tank and maintaining the cleanliness of the cleaning tank to a certain extent. Each area of ​​the sludge collection pit 101 in the cleaning tank is connected to a waste discharge pipe 11. Each waste discharge pipe 11 is equipped with a liquid pump. The function of the liquid pump is to promptly extract the waste liquid and impurities in the sludge collection pit 101 to avoid secondary pollution caused by prolonged residence. The ends of each waste discharge pipe 11 converge and are connected to the slag discharge pipe 10 to form a centralized sewage discharge path, which simplifies the sewage discharge process, facilitates unified management, and facilitates regular cleaning of deposited impurities, ensuring the long-term stable operation of the entire sewage discharge system.

[0022] Initially, cleaning liquid is injected into each cleaning tank. Depending on the cleaning stage, liquids with corresponding functions are injected into each tank: alkaline degreasing solution is injected into the pre-wash tank 301, acidic etching solution into the main cleaning tank 302, and deionized water into the rinsing tank 303. During cleaning, multiple substrates are placed together on a single rack. The rack is customized according to the characteristics of the substrates to ensure that multiple substrates can be stored at once, with each substrate maintaining a certain distance within the rack to ensure that the liquid can fully coat the substrates. External material transfer components, capable of horizontal movement and lifting, move the rack from right to left within the water tank 2. Simultaneously, the material transfer components drive the rack to lift multiple times, allowing the substrates within the rack to sequentially pass through the pre-wash tank 301, main cleaning tank 302, and rinsing tank 303. Through multiple cleaning zones and segmented processes, the concentration of contaminants is gradually reduced. Combined with the ultrasonic cavitation effect, stubborn particles are broken down, solving the problem of concentration gradient in immersion-type chemicals. This ensures that the substrate cleanliness meets process requirements, significantly improving yield and shortening the cleaning cycle compared to conventional methods.

[0023] Example 2

[0024] Based on Example 1, such as Figure 1 , Figure 2 and Figure 5 As shown, this embodiment further optimizes the cleaning structure of the pre-wash tank by adding baffles 7, spray plates 8, lifting frames 9, drive motors 91, and multi-link rods 92. Baffles 7 are symmetrically installed on the front and rear sides of the upper part of the pre-wash tank of the water tank 2. The baffles 7 are fixedly connected to the water tank 2 by bolts. Vertical guide rails are set on their inner sides. The spray plates 8 are installed on the baffles 7 by sliding blocks cooperating with the guide rails. Multiple liquid transfer channels are opened inside the spray plates 8. Several atomizing nozzles are evenly distributed on the opposite side of the two spray plates 8. The number of liquid transfer channels in each spray plate 8 is the same as the number of atomizing nozzles on it. Each liquid transfer channel is connected and communicates with one atomizing nozzle. The cleaning liquid flows into the atomizing nozzle from the liquid transfer channel, forming a fan-shaped atomizing area that sprays onto the substrate surface.

[0025] The upper part of each spray plate 8 is connected to a lifting frame 9. The lifting frame 9 has an inverted U-shaped structure, and its two ends are fixedly connected to the top of the spray plate 8. Each baffle 7 is equipped with a drive motor 91. A multi-link 92 is installed on the output shaft of the drive motor 91. The multi-link 92 consists of a swing arm fixedly connected to the output shaft of the drive motor 91 and a connecting rod hinged to the swing arm. The end of the connecting rod is hinged to the lifting frame 9 on the same side. When the drive motor 91 rotates, the output shaft drives the swing arm to make a circular motion. The swing arm converts the circular motion into the up and down reciprocating motion of the lifting frame 9 through the connecting rod, which in turn drives the spray plate 8 to make a periodic vertical sliding along the guide rail of the baffle 7.

[0026] The vertical movement of the spray plate 8 allows the spray range of the atomizing nozzles to dynamically cover the entire height of the substrate in the vertical direction, eliminating the cleaning blind spots of traditional fixed nozzles. When the opposing spray plates 8 rise and fall synchronously, the atomizing areas on both sides form a cross-washing effect, enhancing the mechanical peeling effect on the substrate surface. The periodic movement of the spray plate 8 causes the cleaning liquid to form a pulsating impact on the substrate surface, improving the softening and removal efficiency of large particulate impurities and organic pollutants in the pre-washing stage before the material enters the water tank 2, providing a good foundation for the subsequent main cleaning process. In addition, the pure mechanical transmission method of the multi-link mechanism ensures the stability of the movement, and the structure is compact, requiring no additional tank space.

[0027] Those skilled in the art should understand that the above embodiments do not limit the present invention in any way, and all technical solutions obtained by means of equivalent substitution or equivalent transformation fall within the protection scope of the present invention.

Claims

1. A TFT array substrate cleaning tank, including an outer protective device (1), with multiple viewing windows on both the front and rear sides of the outer protective device (1), and a transverse notch on the upper part of the outer protective device (1), the notch being used by an external material transfer component to carry materials through laterally. Its features are, It also includes a water tank (2), a partition (3), a pre-wash tank (301), a main cleaning tank (302), a rinsing tank (303), an ultrasonic module (4), a water inlet pipe (5), a diversion pipe (51), and a drain pipe (6). The water tank (2) is horizontally arranged inside the outer protection (1) of the equipment. Two partitions (3) are spaced apart inside the water tank (2). The two partitions (3) divide the internal space of the water tank (2) into three cleaning tanks arranged horizontally. The three cleaning tanks are set as a pre-wash tank (301), a main cleaning tank (302), and a rinsing tank (303) from right to left. An ultrasonic module (4) is provided at the bottom of the water tank (2). A water inlet pipe (5) is provided on the water tank (2). The water inlet pipe (5) is connected to the three cleaning tanks through three diversion pipes (51). A flow regulating valve is provided on the pipe of each diversion pipe (51). A drain pipe (6) is provided on each cleaning tank.

2. The TFT array substrate cleaning tank according to claim 1, characterized in that, The material passes through the pre-cleaning tank, the main cleaning tank (302) and the rinsing tank (303) in sequence in the water tank (2). The opening of each diversion pipe (51) is connected to the end area of ​​each cleaning tank, and the opening of each drain pipe (6) is connected to the front area of ​​each cleaning tank. The cleaning liquid is injected from the end of each tank through the diversion pipe (51) and discharged through the front drain pipe (6), so that the flow direction of the cleaning liquid is in the opposite direction of the material movement, so as to enhance the cleaning efficiency and the utilization rate of the agent.

3. The TFT array substrate cleaning tank according to claim 2, characterized in that, It also includes a slag discharge pipe (10) and a waste discharge pipe (11). The lower part of the water tank (2) is provided with a sludge collection pit (101), and the front and rear sides of the lower part of the water tank (2) are constructed as sloping surfaces inclined towards the sludge collection pit (101). Each area of ​​the sludge collection pit (101) of the cleaning tank is connected to a waste discharge pipe (11). Each waste discharge pipe (11) is equipped with a liquid pump. The ends of each waste discharge pipe (11) converge and connect with the slag discharge pipe (10) to form a centralized sewage discharge path.

4. A TFT array substrate cleaning tank according to claim 3, characterized in that, It also includes baffles (7) and spray plates (8). The pre-cleaning tank of the water tank (2) is symmetrically provided with baffles (7) on the front and back sides. Each baffle (7) is provided with a spray plate (8). The spray plate (8) is provided with multiple liquid transmission channels. Each of the two spray plates (8) is provided with several atomizing nozzles on the opposite side. The number of liquid transmission channels in each spray plate (8) is the same as the number of atomizing nozzles on it, and each liquid transmission channel is connected to and communicates with an atomizing nozzle.

5. A TFT array substrate cleaning tank according to claim 4, characterized in that, It also includes a lifting frame (9), a drive motor (91) and a multi-link (92). The spray plates (8) are all slidably mounted on the baffle (7). The upper part of the spray plates (8) is connected to the lifting frame (9). The baffle (7) is equipped with a drive motor (91). The output shaft of the drive motor (91) is equipped with a multi-link (92). The multi-link (92) consists of a swing arm fixedly connected to the output shaft of the drive motor (91) and a connecting rod hinged to the swing arm. The ends of the connecting rods are all hinged to the lifting frame (9) on the same side.

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