Parallel correction device of exposure machine

Abstract

The utility model discloses a parallel correction device of an exposure machine. The parallel correction device comprises a mask assembly, a correction assembly arranged on the mask assembly and a moving assembly, the correction assembly comprises an air cylinder, a correction plate arranged on the air cylinder and a plurality of correction balls arranged on the correction plate; the air cylinder controls the correction plate to enter and exit between the moving assembly and the mask assembly, one end of the correction ball abuts against the side, close to the correction plate, of the mask assembly, and the moving assembly drives a film source to move in the direction close to the mask assembly through torsion control. Therefore, the film source abuts against the plurality of correction balls. According to the utility model, the moving assembly drives the film source to move towards the correction balls, and the torsion-controlled moving assembly ensures that the uniformly distributed correction balls respectively abut against the photomask and the film source, so that the photomask and the film source are arranged in parallel, the alignment time is shortened, the productivity is improved, the exposure effect of the film source is improved, and the rework rate of products is reduced.

Description

Technical Field

[0001] This utility model relates to the LED chip industry, specifically to a parallel correction device for an exposure machine. Background Technology

[0002] With the development of exposure machine technology, its automation level and control system performance have been continuously improved, and it is widely used in semiconductor chip manufacturing, printed circuit board (PCB) manufacturing, display manufacturing and other fields. Semiconductor chip manufacturing is the most important application area of ​​exposure machines, used to transfer designed integrated circuit patterns onto silicon wafers to manufacture chips of various sizes and functions, such as microprocessors and memory chips.

[0003] Currently, during the exposure process, the stage usually moves the wafer source to align it with the mask stage. The microscope is used for focusing, and after the alignment mark is reached, the light source of the exposure machine is turned on. The light emitted by the light source (such as ultraviolet light, extreme ultraviolet light, etc.) or electron beam is collimated and focused by the optical system and then shines through the mask onto the photoresist on the wafer surface.

[0004] However, during the process of the worktable lifting the film source, it is impossible to ensure that the film source and the mask stage are in a parallel state. Excessive tilt of the film source can easily cause underexposure / overexposure in certain areas, leading to product rework. Utility Model Content

[0005] Based on this, the purpose of this utility model is to provide a parallel correction device for an exposure machine, which aims to solve the problem that, during the process of the worktable driving the film source to rise, it is impossible to ensure that the film source and the mask stage are in a parallel state. Excessive tilt of the film source can easily cause underexposure / overexposure in certain areas, leading to product rework.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a parallel correction device for an exposure machine, comprising a mask assembly, a correction component disposed on the mask assembly, and a moving component;

[0007] The correction assembly includes a cylinder, a correction plate disposed on the cylinder, and a plurality of correction balls disposed on the correction plate;

[0008] The cylinder controls the correction plate to move between the moving assembly and the mask assembly. One end of the correction ball abuts against the side of the mask assembly near the correction plate. The moving assembly drives the wafer source to move towards the mask assembly via torque control, so that the wafer source abuts against a number of correction balls.

[0009] In summary, the parallel correction device for an exposure machine proposed in this utility model uses a moving component to move the wafer source toward the correction balls. The torque-controlled moving component ensures that the correction balls are evenly distributed and abut against the photomask and wafer source, thereby making the photomask and wafer source parallel, shortening alignment time, increasing production capacity, improving the exposure effect of high-quality wafer sources, and reducing product rework rate. Specifically, the correction component includes a cylinder, a correction plate mounted on the cylinder, and a plurality of correction balls mounted on the correction plate. The cylinder controls the movement of the correction balls, with one end of each correction ball abutting against the side of the mask assembly near the correction plate. The moving component, through torque control, moves the wafer source toward the mask assembly, so that the wafer source abuts against the correction balls.

[0010] According to one aspect of the above technical solution, the mask assembly includes a mask support, a mask disposed on the mask support, and a photomask disposed on the mask, wherein the photomask is detachably connected to the mask.

[0011] According to one aspect of the above technical solution, the mask support recess is used to accommodate the receiving portion of the mask, and the receiving portion is configured to conform to the mask.

[0012] The receiving portion is also provided with mounting portions at both ends for attaching the mask.

[0013] According to one aspect of the above technical solution, the mask is provided with a photomask mounting part on the side facing the correction plate, and the mounting part is surrounded by a fastener for fixing the photomask.

[0014] According to one aspect of the above technical solution, the mask is symmetrically provided with handles on both sides and connecting members provided at both ends of the handles, and the connecting members are fixedly connected to the mounting part.

[0015] According to one aspect of the above technical solution, the correction plate includes at least three receiving strips, and the included angles between the at least three receiving strips are equal.

[0016] According to one aspect of the above technical solution, the corrective ball of the same specification on any of the receiving strips is equidistant from the end of the receiving strip.

[0017] According to one aspect of the above technical solution, the moving component includes a lift and a base plate platform disposed on the lift, wherein the lift drives the base plate platform to move in a vertical direction.

[0018] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0019] Figure 1This is a schematic diagram of the structure of the parallel correction device for the exposure machine in one embodiment of the present invention;

[0020] Figure 2 This is a side view of the parallel correction device for an exposure machine in one embodiment of the present invention;

[0021] Figure 3 This is a schematic diagram of the structure of the correction component in one embodiment of the present invention;

[0022] Figure 4 This is a schematic diagram of the bottom structure of the correction component in one embodiment of the present invention;

[0023] Figure 5 This is a schematic diagram of the mask support structure in one embodiment of the present invention;

[0024] Figure 6 This is a schematic diagram of the mask structure in one embodiment of the present invention;

[0025] Figure 7 This is a schematic diagram of the corrective plate in one embodiment of the present invention.

[0026] Component symbol explanation in the attached diagram:

[0027] Mask assembly 100, mask bracket 110, receiving part 111, mounting part 112, mask 120, fastening part 121, snap fastener 122, handle 123, connector 124, photomask 130, correction assembly 200, cylinder 210, correction plate 220, receiving strip 221, correction ball 230, moving assembly 300, lifting machine 310, base plate stage 320. Detailed Implementation

[0028] To make the objectives, features, and advantages of this utility model more apparent and understandable, the specific embodiments of this utility model are described in detail below with reference to the accompanying drawings. Several embodiments of this utility model are shown in the drawings. However, this utility model can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to make the disclosure of this utility model more thorough and complete.

[0029] It should be noted that when an element is referred to as being "fixed to" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "left," "right," "upper," "lower," and similar expressions used herein are for illustrative purposes only and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting the present invention.

[0030] In this utility model, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances. The term "and / or" as used herein includes any and all combinations of one or more of the related listed items.

[0031] Please see Figures 1-7 The diagram shows a schematic of a parallel correction device for an exposure machine provided in one embodiment of the present invention. The parallel correction device includes a mask assembly, a correction component 200 disposed on the mask assembly 100, and a moving component 300, wherein:

[0032] To ensure the source image and mask assembly 100 are parallel and aligned, the mask assembly 100 includes a mask support 110, a mask 120 mounted on the mask support 110, and a photomask 130 mounted on the mask 120. The photomask 130 is detachably connected to the mask 120. The mask support 110 primarily supports the mask 120. A recessed receiving portion 111 is formed within the mask support 110, which is contoured to the mask 120 so that when the mask 120 is placed on the mask support 110, it can be secured within the receiving portion 111 to prevent movement. A square groove is also provided in the receiving portion 111 for connecting the mask 120 to the photomask 130. Additionally, mounting portions 112 for overlapping the mask 120 are provided at both ends of the receiving portion 111.

[0033] Furthermore, handles 123 are symmetrically provided on both sides of the end face of the mask 120 away from the correction plate, and connectors 124 are provided at both ends of the handles 123. The connectors 124 are fixedly connected to the mask support 110. In order to facilitate the assembly of the mask 120 and the mask support 110, handles 123 are provided on both sides of the mask 120 for easy handling. At the same time, connectors 124 are provided on both sides of the handles 123 to connect the mask 120 and the mask support 110 into a whole. When the mask 120 is placed on the mask support 110, the connectors 124 overlap the mounting part 112. While serving the connection function, it can also facilitate the quick alignment of the mask 120 and the mask support 110.

[0034] To install the mask 120 on the side of the mask 120 facing the correction plate 220, a fastening portion 121 for accommodating the photomask 130 is provided on the side of the mask 120 facing the correction plate 220. A latching member 122 for fixing the photomask 130 is provided around the fastening portion 121. When the photomask 130 is aligned with the fastening portion 121, the latching members 122 around the fastening portion 121 are rotated to fix the photomask 130 directly below the mask 120 and facing the moving assembly 300.

[0035] Furthermore, to ensure the source material is parallel to the photomask 130, a correction component 200 is provided between the photomask 130 and the moving assembly 300. The correction component 200 includes a cylinder 210, a correction plate 220 mounted on the cylinder 210, and a plurality of correction balls 230 mounted on the correction plate 220. The correction plate 220 carries the correction balls 230 and is controlled by the cylinder 210 to move between the moving assembly 300 and the photomask 120. The correction plate 220 includes at least three receiving strips 221, and the included angles between the receiving strips 221 are equal. This ensures that when the moving assembly 300 lifts the source material, the light or force on the source material is uniform when the correction balls 230 contact or abut against the source material or photomask 130, preventing offset and thus avoiding underexposure or overexposure in certain areas.

[0036] In addition, in this embodiment, there are six correction balls 230, of which three smaller correction balls 230 are used for 4-inch wafer sources, and the other three larger correction balls 230 are used for 6-inch wafer sources.

[0037] To achieve the correction function, the moving component 300 includes a lift 310 and a substrate stage 320 disposed on the lift 310. The lift 310 drives the substrate stage 320 to move toward the correction plate 220 so that the upper and lower ends of the correction ball 230 abut against the mask 120 and the substrate stage 320 respectively, so as to ensure that the mask 120 and the wafer source disposed on the substrate stage 320 are arranged in parallel, thereby shortening the alignment time, increasing production capacity, improving the exposure effect of the wafer source, and significantly improving the product yield.

[0038] In summary, the parallel correction device for an exposure machine proposed in this utility model uses a moving component to move the wafer source toward the correction balls. The torque-controlled moving component ensures that the correction balls are evenly distributed and abut against the photomask and wafer source, thereby making the photomask and wafer source parallel, shortening alignment time, increasing production capacity, improving the exposure effect of high-quality wafer sources, and reducing product rework rate. Specifically, the correction component includes a cylinder, a correction plate mounted on the cylinder, and a plurality of correction balls mounted on the correction plate. The cylinder controls the movement of the correction balls, with one end of each correction ball abutting against the side of the mask assembly near the correction plate. The moving component, through torque control, moves the wafer source toward the mask assembly, so that the wafer source abuts against the correction balls.

[0039] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0040] The above-described embodiments are merely illustrative of several implementations of this utility model, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of this utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. A parallel correction device for an exposure machine, characterized in that, The parallel correction device for the exposure machine includes a mask assembly, a correction component disposed on the mask assembly, and a moving component; The correction assembly includes a cylinder, a correction plate disposed on the cylinder, and a plurality of correction balls disposed on the correction plate; The cylinder controls the correction plate to move between the moving assembly and the mask assembly. One end of the correction ball abuts against the side of the mask assembly near the correction plate. The moving assembly drives the wafer source to move towards the mask assembly via torque control, so that the wafer source abuts against a number of correction balls.

2. The exposure apparatus parallel correction device according to Claim 1, wherein The mask assembly includes a mask support, a mask disposed on the mask support, and a photomask disposed on the mask, wherein the photomask is detachably connected to the mask.

3. The exposure apparatus parallel correction device according to Claim 2, wherein The mask support recess is used to accommodate the receiving part of the mask. The receiving part is configured to conform to the shape of the mask. The receiving part is also provided at both ends for mounting parts for overlapping the mask.

4. The parallel correction device for the exposure machine according to claim 3, characterized in that, The mask has a fastening part for accommodating the photomask on the side facing the correction plate, and the fastening part is surrounded by a snap fastener for fixing the photomask.

5. The exposure apparatus parallel correction device according to any one of claims 1 to 4, wherein The mask has handles symmetrically arranged on both sides of the end face away from the correction plate, and connectors are provided at both ends of the handles. The connectors are fixedly connected to the mounting part.

6. The exposure apparatus parallel correction device according to any one of claims 1 to 5, wherein The correction plate includes at least three receiving strips, and the included angles between the at least three receiving strips are equal.

7. The parallel correction device for an exposure machine according to claim 6, characterized in that, The corrective ball of the same specification on any of the receiving strips is equidistant from the end of the receiving strip.

8. The exposure apparatus parallel correction device according to any one of claims 1 to 7, wherein The moving component includes a lift and a base plate platform disposed on the lift, the lift driving the base plate platform to move in the vertical direction.

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