STORAGE SYSTEM, LITHOGRAPHY SYSTEM AND METHOD FOR PRODUCING A STORAGE SYSTEM

Abstract

Storage system (200, 300, 400) for storing a first component (202, 302, 402) on a second component (204, 304, 404) of a lithography system (100A, 100B), comprising the first and second components (202, 204, 302, 304, 402, 404) and an adhesive (212, 212', 312, 312', 412, 412') which secures the first and second components (202, 204, 302, 304, 402, 404) to one another, wherein the first component (202, 302, 402) has at least two surfaces (216, 316, 416) inclined towards one another and a first adhesive surface (218, 318) connecting the two surfaces (216, 316, 416), the second component (204, 304, 404) has at least one spherical section (220, 320, 420) received between the at least two mutually inclined surfaces (216, 316, 416), which comprises a spherical surface section (226, 326, 426) and a second adhesive surface (230, 330, 430), wherein the second adhesive surface (230, 330, 430) is arranged, viewed in cross section, between two partial sections (232, 234, 332, 334, 432, 434) of the spherical surface section (226, 326, 426), and the adhesive (212, 212', 312, 312', 412, 412') is arranged between the first and the second adhesive surface (218, 230, 318, 330, 430).

Description

[0001] The present invention relates to a storage system, a lithography system with such a storage system and a method for producing such a storage system.

[0002] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system equipped with an illumination system and a projection system. The image of a mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system, for example, a silicon wafer, in order to transfer the mask structure to the light-sensitive coating of the substrate.

[0003] In a mechanical component that is attached to a carrier of an optical element of a lithography system using an adhesive bond, curing of the adhesive used can lead to displacement or tilting of the component. When the adhesive is applied over a large area, curing can also introduce forces into the carrier of the optical element, which can lead to significant tilting of the optical element. This can impair the optical properties of the optical element, such as a lens or mirror.

[0004] WO 2012 / 013512 A1 describes a method for adjusting an optical element and an optical arrangement with an optical holder that holds an optical element. In order to enable permanent adjustment with high precision and at low cost, an optical holder with a bottom surface having a contact region is used, as well as a base plate with a recess that encompasses a wall having a support region. The contact region and support region are designed such that, when contact is established between the contact region and support region, the optical holder can be rotated about more than one spatial direction (in particular about all three spatial directions) to set a desired or predetermined positioning, and a cavity (or intermediate space) is present between the bottom surface of the optical holder and a bottom of the recess.This is followed by fixing an optical element in the optics holder and subsequently filling a curable adhesive into the cavity, as well as placing the optics holder with its contact area onto the support area of ​​the recess, adjusting the predetermined positioning by rotating the optics holder sitting on the support area, and fixing the optics holder in the predetermined position by curing the adhesive, wherein shrinkage takes place during curing, whereby the contact area is permanently pressed against the support area.

[0005] DE 10 2014 215 105 A1 describes an optical device comprising a micro-optic unit and a holder, and a method for producing an optical device. In the device, the micro-optic unit is fixed in alignment with respect to a surface of the holder. The device is characterized in that the holder has a round, tapered recess, and the micro-optic unit is fixed on a spherical cap, and the spherical cap is fixed to the holder, wherein the spherical cap protrudes at least partially into the recess and rests on a partial surface of the recess or an edge in the recess, wherein the spherical cap is not fixed where it rests.

[0006] DE 10 2019 203 838 A1 describes a method for aligning a sensor reference to a reference surface of a base body in an EUV projection exposure system, wherein the sensor reference comprises a reference element and a receiving element, wherein the receiving element is arranged on the base body or formed as part of the base body.The method comprises determining the position of the reference surface in a reference coordinate system of the base body, as well as determining the deviation of the position of the reference surface from its desired position, as well as inserting the reference element into the receiving element, as well as determining the position and location of the reference element in the reference coordinate system of the base body, as well as determining the deviation from the desired position of the reference element taking into account the previously determined position of the reference element and the deviation of the reference surface from its desired position, as well as aligning the reference element to the determined desired position, as well as fixing the reference element in the desired position, as well as checking the desired position of the reference element in the reference coordinate system.

[0007] Against this background, it is an object of the present invention to provide an improved storage system, a lithography system with such a storage system and a method for producing such a storage system.

[0008] Accordingly, a storage system for storing a first component on a second component of a lithography system is proposed. The storage system comprises: the first and second components and an adhesive that secures the first and second components together, wherein the first component has at least two surfaces inclined towards each other and a first adhesive surface connecting the two surfaces, the second component has at least one spherical section received between the at least two mutually inclined surfaces, which comprises a spherical surface section and a second adhesive surface, wherein the second adhesive surface is arranged between two partial sections of the spherical surface section when viewed in cross section, and the adhesive is arranged between the first and second adhesive surfaces.

[0009] By supporting the first and second components against one another by means of the at least one spherical section that is inserted between the two mutually inclined surfaces, the first and second components only lie directly against one another at point or small surface contacts in the region of the support. As a result, hard contact in the form of surface contact between the first component and the second component can be avoided outside of this support. If the adhesive applied to the adhesive surfaces of the first and second components shrinks during curing, this avoidance of hard contact reduces the effect of force on the first and / or second component. In particular, tilting of the first and / or second component caused by adhesive shrinkage can be avoided.Even if, for example, the second component (which is lighter than the first component, for example) is shifted or tilted due to the shrinkage of the adhesive during curing, the proposed mounting (and the lack of hard surface contact outside the mounting) prevents the force from being transferred to the first component. In particular, the impact of the adhesive curing on the position of the first and / or second component can be reduced.

[0010] The lithography system, for example, is a DUV or EUV lithography system. EUV stands for "extreme ultraviolet" (EUV) and refers to a wavelength of the working light between 0.1 nm and 30 nm, specifically 13.5 nm. Furthermore, DUV stands for "deep ultraviolet" (DUV) and refers to a wavelength of the working light between 30 nm and 250 nm.

[0011] The DUV or EUV lithography system comprises a beam shaping and illumination system and a projection system. In particular, the DUV or EUV lithography system projects the image of a mask (reticle) illuminated by the illumination system onto a substrate coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system, for example, a silicon wafer, using the projection system to transfer the mask structure to the light-sensitive coating of the substrate.

[0012] The first and / or the second component are in particular mechanical components. The first and / or second component is, for example, a carrier, a mount, a holder and / or a cover. The first or second component is, for example, a carrier and / or a mount of an optical element, such as a lens or a mirror of the DUV or EUV lithography system. The first or second component is, for example, a protective cover of the optical element. The first and / or second component can also be, for example, a holder for a measuring device, an aperture or another element of the lithography system. The first and / or the second component is, for example, made of metal.

[0013] The adhesive is, in particular, an adhesive that is applied in a liquid or viscous state to the first and / or second adhesive surface and is cured to form the adhesive bond. For example, the adhesive is a physically setting adhesive or a chemically curing adhesive. As the adhesive cures, it solidifies and, in the solidified state, forms a solid adhesive layer between the first and second components, in particular between the first and second adhesive surfaces. The adhesive layer thus formed lies directly against the first and second adhesive layers and fastens them to one another.

[0014] The two mutually inclined surfaces and the first adhesive surface delimit or form in particular a groove into which the spherical portion is received. The first adhesive surface can, for example, be arranged at least partially perpendicular to a direction pointing from the first component to the second component. The first adhesive surface can, for example, connect the two mutually inclined surfaces in a straight line, viewed in cross-section. In other words, the first adhesive surface can lie in a single plane. However, the first adhesive surface can also have other shapes and arrangements, as long as it connects the two mutually inclined surfaces in such a way that, viewed in cross-section, a groove is produced which is closed on the side of the first adhesive surface.

[0015] The spherical portion is, for example, formed monolithically with the second component. Alternatively, the spherical portion can also be a separate element that is attached to the second component (e.g., screwed, clamped, glued). The spherical surface portion of the spherical portion is, in particular, curved in the shape of a sphere. The spherical portion is, for example, flattened at an end arranged adjacent to the first component in order to provide the second adhesive surface. The spherical surface portion is, in particular, interrupted by the second adhesive surface adjacent to the first component.

[0016] If a spherical segment is inserted between two mutually inclined surfaces, then there is in particular a point contact or, due to tolerances and deformation, a small surface contact between the two mutually inclined surfaces and the spherical segment, i.e. its spherical surface section.

[0017] The two mutually inclined surfaces are, in particular, straight when viewed in cross-section (e.g., in the case of a V-shaped groove, a conical groove, a cone-segment-shaped groove, and / or a funnel-shaped groove). Alternatively, the two mutually inclined surfaces can also be curved when viewed in cross-section (e.g., in the case of a bulbous groove and / or a bulbous cup-shaped groove).

[0018] The two mutually inclined surfaces are, for example, two mutually inclined planes (e.g., in the case of a V-groove). Alternatively, the two mutually inclined surfaces can each be individually curved surfaces (e.g., in the case of a conical groove, a cone-segment groove, and / or a funnel-shaped groove).

[0019] According to one embodiment, the first component comprises at least one groove, a V-groove, a conical groove, a cone-segment-shaped groove, a funnel-shaped groove, a bulbous groove, a groove in the form of a bulbous cup and / or a funnel-shaped groove, which, in particular seen in cross-section, has the two surfaces inclined towards one another.

[0020] For example, a V-groove is used, and the two inclined surfaces are inclined in a V-shape relative to each other when viewed in cross-section. For example, the V-groove is designed at its tip in a different way than a V (e.g., flattened or has a further recess / recess) to form the second adhesive surface. A V-groove with a flattened tip can also be referred to as a cone segment.

[0021] According to a further embodiment, the first and second components are in direct contact with one another only at point or surface contacts, each formed by two mutually inclined surfaces and a spherical section. Furthermore, the first and second components are bonded to one another at the first and second bonding surfaces by means of the adhesive.

[0022] In particular, the first and second components are bonded together exclusively outside of the point or surface contacts (i.e., the point or surface contacts between the two mutually inclined surfaces and the spherical portion). In particular, the bonded connection is only an indirect contact via the adhesive.

[0023] For example, the first and second components are only in direct contact with each other at a total of six point or surface contacts.

[0024] According to a further embodiment, the first and second adhesive surfaces each comprise a plurality of discrete adhesive surfaces.

[0025] This allows the amount of adhesive or the area covered with adhesive to be reduced. Consequently, the impact of adhesive curing on the position of the first and / or second component can be further reduced.

[0026] In particular, the bearing system comprises, in the cured state of the adhesive, several spaced-apart and discrete adhesive layers between the first and second components. In particular, the first and second adhesive surfaces are not circumferential and / or annular adhesive surfaces.

[0027] For example, when the adhesive is cured, the storage system comprises a total of three spaced and discrete adhesive layers.

[0028] According to a further embodiment, the first component comprises at least one recess communicating with the at least one V-groove, which recess has the first adhesive surface and in which the adhesive is arranged. Furthermore, the second component comprises at least one projection on the at least one spherical portion, which, viewed in cross-section, protrudes between the two subsections of the spherical surface portion and has the second adhesive surface. Furthermore, the projection is inserted into the recess of the first component and bonded there using the adhesive.

[0029] In particular, the first adhesive surface is formed by the inner walls of the recess. In particular, the second adhesive surface is formed by the outer walls of the projection.

[0030] By providing the first adhesive surface in the form of the inner walls of a recess, the adhesive can be applied even more precisely and accurately. In particular, application of adhesive outside the predefined first adhesive surface can be avoided. It is also easier to prevent the adhesive, in its liquid or viscous form, from spreading to areas of the first and / or second component that lie outside the first and second adhesive surfaces.

[0031] The recess is, for example, a pot or has a pot shape. In particular, the recess is not an annular (circumferential) recess.

[0032] The projection has, for example, a pin shape. In particular, the projection is not an annular (circumferential) projection. The projection is, for example, formed monolithically with the second component. Alternatively, the projection can also be a separate element that is attached to the second component (e.g., screwed, clamped, glued). The projection protrudes, in particular, in the direction of the first component.

[0033] According to a further embodiment, the second component has at least one threaded pin which is screwed at its first end portion into a threaded bore of the at least one ball portion and forms the projection with the second adhesive surface at its second end portion.

[0034] This makes it easy to manufacture the second component and in particular the projection.

[0035] The threaded pin, for example, is a grub screw that does not have a screw head.

[0036] According to a further embodiment, the at least one projection is configured such that it is bendable relative to the at least one spherical portion about a first bending axis and about a second bending axis perpendicular to the first bending axis. Both the first and second bending axes are arranged perpendicular to a direction pointing from the first component to the second component.

[0037] Since the projection can bend relative to the spherical section, it is possible to compensate for the force exerted by the adhesive during curing, e.g., due to adhesive shrinkage.

[0038] For example, the projection, as described above, is formed by a threaded pin and the threaded pin, in particular its second end portion, is designed such that it is bendable about the first and second bending axes.

[0039] According to a further embodiment, the at least one projection has at least one first leaf spring for bending about the first bending axis and at least one second leaf spring for bending about the second bending axis.

[0040] This allows the bending property around the first and second axes to be easily realized.

[0041] In particular, a main extension direction of the first leaf spring is arranged perpendicular to a main extension direction of the second leaf spring. In particular, the main extension directions of the first and second leaf springs are arranged parallel to the direction from the first component to the second component.

[0042] For example, the projection comprises a pin having an inner cavity and a side wall surrounding the cavity, and the leaf springs are formed by suitable cuts (ie, gaps) in the side wall.

[0043] According to a further embodiment, the second component comprises at least one recess formed in the at least one spherical section, which has the second adhesive surface.

[0044] In particular, the second adhesive surface is formed by inner walls of the recess formed in the at least one spherical section.

[0045] By providing the second adhesive surface in the form of the inner walls of a recess, the adhesive can penetrate into the recess. This makes it easier to prevent the adhesive from spreading outside the predefined first and second adhesive surfaces. For example, it is easier to prevent the adhesive, in its liquid or viscous form, from spreading to areas of the first and / or second component that lie outside the first and second adhesive surfaces.

[0046] The recess formed in the at least one spherical section is, for example, a pot or has a pot shape. The recess formed in the at least one spherical section is, in particular, not an annular (circumferential) recess.

[0047] According to a further embodiment, the second component has at least one screw which is screwed into a threaded bore of the second component at its first end portion and has a ball head at its second end portion which forms one of the at least one ball portion.

[0048] This can simplify the production of the second component and in particular of the at least one spherical section.

[0049] According to a further embodiment, one of the first and second components is a carrier of an optical element of the lithography system, and the other of the first and second components is an annular cover of the optical element of the lithography system.

[0050] Consequently, the bearing system can better prevent tilting of the optical element carrier and thus tilting of the optical element. This prevents the optical properties of the optical element from being impaired by the curing of the adhesive bond.

[0051] The ring-shaped cover, for example, serves to protect against dirt.

[0052] According to a further embodiment, the first component has three V-grooves, which are offset from each other at angles other than zero, the second component has three spherical sections which are offset from each other by angles other than zero, the first component has three recesses communicating with the at least one V-groove, which are arranged offset from one another by angles other than zero, the second component has three projections which are offset from one another by angles other than zero and / or the second component has three recesses formed in the at least one spherical section, which are arranged offset from one another by angles other than zero.

[0053] The non-zero angles between the aforementioned elements are, for example, angles of 120° each. In other words, the aforementioned elements are evenly distributed along a circle. However, the non-zero angles between the aforementioned elements can also have values ​​other than 120°.

[0054] According to a further embodiment, the at least one spherical section is a spherical segment and / or a spherical wedge, or the bearing system comprises exactly one spherical section and exactly one V-groove, and the spherical section is a torus section and the V-groove is an annular V-groove.

[0055] A spherical segment is, in particular, a part of a solid sphere formed by a section with a (single) plane. For example, a spherical segment has the shape of a dome with a circular disk as its base.

[0056] For example, a spherical surface of a dome forms the "spherical surface section" of the spherical segment. An opening angle of the spherical segment is, for example, less than or equal to 90°. The spherical segment can also be a hemisphere (opening angle of 90°, radius of the base of the spherical segment corresponds to the radius of the solid sphere).

[0057] A spherical sector is, in particular, a conical section of a solid sphere. A spherical sector has, in particular, an aperture angle of less than or equal to 90°. For example, a spherical sector is a conical section from the center of the solid sphere to its surface. The spherical sector can also be a hemisphere (aperture angle of 90°).

[0058] A torus segment is, in particular, a section of a torus, in particular a torus of rotation. A torus segment can, in particular, have the same cross-sectional area as a spherical segment.

[0059] According to a further aspect, a support system for supporting an annular cover on a carrier of an optical element of a lithography system is proposed. The support system comprises the carrier and the annular cover. Furthermore, the carrier and the annular cover directly abut each other at only six point or surface contacts. Furthermore, the carrier and the annular cover are glued together.

[0060] In particular, the adhesive bond between the carrier and the annular cover is only an indirect contact via the adhesive. In particular, the carrier and the annular cover are bonded together exclusively outside of the six point or surface contacts.

[0061] The above-mentioned embodiments and features of the storage system according to the first aspect apply accordingly to the storage system according to the second aspect and vice versa.

[0062] According to a further aspect, a lithography system is proposed which has a storage system as described above.

[0063] According to a further aspect, a method for producing a storage system for a lithography system is proposed. The method comprises the steps: a) providing a first adhesive surface which comprises at least two surfaces inclined towards one another and a first adhesive surface connecting the two surfaces, b) providing a second component which comprises at least one spherical section with a spherical surface section and a second adhesive surface, wherein the second adhesive surface is arranged between two partial sections of the spherical surface section when viewed in cross section, c) arranging the second component on the first component so that the at least one spherical section is received between the at least two mutually inclined surfaces and the first adhesive surface is arranged adjacent to the second adhesive surface, d) applying adhesive to the first and / or second adhesive surface, and e) Curing of the adhesive.

[0064] In particular, step d) may be performed before or after step c).

[0065] In embodiments, the first component comprises at least one recess which is in communication with the at least two mutually inclined surfaces and which has the first adhesive surface, and the adhesive is arranged in the recess in step d). Furthermore, the second component comprises at least one projection on the at least one spherical section, which projection has the second adhesive surface. The at least one projection is designed such that it is bendable relative to the at least one spherical section about a first bending axis and about a second bending axis perpendicular to the first bending axis, wherein both the first and the second bending axes are arranged perpendicular to a direction pointing from the first component to the second component. Furthermore, in step c), the projection is introduced into the recess.In addition, a force acting on the first and / or second component by the adhesive during curing in step e) is compensated by bending the projection about the first and / or second bending axis.

[0066] "One" in this case is not necessarily limited to a single element. Rather, multiple elements, such as two, three, or more, may also be included. Any other counting term used here should not be understood as implying a limitation to the exact number of elements stated. Rather, numerical deviations upwards and downwards are possible, unless otherwise stated.

[0067] The embodiments and features described for the storage system apply accordingly to the lithography system and the proposed manufacturing method and vice versa.

[0068] Further possible implementations of the invention also include combinations of features or embodiments described above or below with respect to the exemplary embodiments that are not explicitly mentioned. In this case, the person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention.

[0069] Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention will be explained in more detail below using preferred embodiments with reference to the accompanying figures. Fig. 1A shows a schematic view of an embodiment of an EUV lithography system; Fig. 1B shows a schematic view of an embodiment of a DUV lithography system; Fig. 2 shows a plan view of a storage system according to a first embodiment of the EUV or DUV lithography system of Fig. 1A or Fig. 1B; Fig. 3 shows a carrier with an annular V-groove of the bearing system from Fig. 2; Fig. 4 shows a view similar to Fig. 3, wherein the carrier has three individual V-grooves instead of one annular V-groove; Fig. 5 shows a V-groove ball bearing of the bearing system from Fig. 2 before assembly: Fig. 6 shows the V-groove ball bearing from Fig. 5 after assembly: Fig. 7 shows a perspective view of a V-groove ball bearing of a bearing system according to a second embodiment: Fig. 8 shows a cross-sectional view of the V-groove ball bearing from Fig. 7 before assembly: Fig. 9 shows the V-groove ball bearing from Fig. 8 after assembly: Fig. 10 shows a V-groove ball bearing of a bearing system according to a variant of the second embodiment after assembly: Fig. 11 shows a shaft of a threaded pin of the V-groove ball bearing made of Fig. 10; Fig. 12 shows a V-groove ball bearing of a bearing system according to a third embodiment before assembly; Fig. 13 shows the V-groove ball bearing from Fig. 12 after assembly; and Fig. 14 shows a flow diagram illustrating a method of manufacturing a storage system according to an embodiment.

[0070] In the figures, identical or functionally equivalent elements are provided with the same reference numerals unless otherwise indicated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

[0071] Fig. 1A shows a schematic view of an EUV lithography system 100A, which includes a beam shaping and illumination system 102 and a projection system 104. EUV stands for "extreme ultraviolet" (EUV) and denotes a wavelength of the working light between 0.1 nm and 30 nm, in particular 13.5 nm. The beam shaping and illumination system 102 and the projection system 104 are each provided in a vacuum housing (not shown), wherein each vacuum housing is evacuated by means of an evacuation device (not shown). The vacuum housings are surrounded by a machine room (not shown), in which drive devices for mechanically moving or adjusting optical elements are provided. Furthermore, electrical controls and the like can also be provided in this machine room.

[0072] The EUV lithography system 100A has an EUV light source 106A. A plasma source (or a synchrotron), for example, can be provided as the EUV light source 106A, which emits radiation 108A in the EUV range (extreme ultraviolet range), i.e., for example, in the wavelength range from 5 nm to 20 nm. In the beam-shaping and illumination system 102, the EUV radiation 108A is focused, and the desired operating wavelength is filtered out of the EUV radiation 108A. The EUV radiation 108A generated by the EUV light source 106A has a relatively low transmissivity through air, which is why the beam guidance spaces in the beam-shaping and illumination system 102 and in the projection system 104 are evacuated.

[0073] The Fig. The beam-shaping and illumination system 102 shown in FIG. 1A has five mirrors 110, 112, 114, 116, 118. After passing through the beam-shaping and illumination system 102, the EUV radiation 108A is directed onto a photomask (reticle) 120. The photomask 120 is also designed as a reflective optical element and can be arranged outside the systems 102, 104. Furthermore, the EUV radiation 108A can be directed onto the photomask 120 by means of a mirror 122. The photomask 120 has a structure that is imaged in a reduced size onto a wafer 124 or the like by means of the projection system 104.

[0074] The projection system 104 (also referred to as a projection lens) has six mirrors M1 to M6 for imaging the photomask 120 onto the wafer 124. Individual mirrors M1 to M6 of the projection system 104 can be arranged symmetrically to an optical axis 126 of the projection system 104. It should be noted that the number of mirrors M1 to M6 of the EUV lithography system 100A is not limited to the number shown. More or fewer mirrors M1 to M6 can also be provided. Furthermore, the mirrors M1 to M6 are typically curved at their front sides for beam shaping.

[0075] Fig. 1B shows a schematic view of a DUV lithography system 100B, which comprises a beam shaping and illumination system 102 and a projection system 104. DUV stands for "deep ultraviolet" (DUV) and refers to a wavelength of the working light between 30 nm and 250 nm. The beam shaping and illumination system 102 and the projection system 104 can - as already described with reference to Fig. 1A - be arranged in a vacuum housing and / or surrounded by a machine room with appropriate drive devices.

[0076] The DUV lithography system 100B has a DUV light source 106B. The DUV light source 106B can be, for example, an ArF excimer laser that emits radiation 108B in the DUV range at, for example, 193 nm.

[0077] The Fig. The beam-shaping and illumination system 102 shown in FIG. 1B directs the DUV radiation 108B onto a photomask 120. The photomask 120 is designed as a transmissive optical element and can be arranged outside the systems 102, 104. The photomask 120 has a structure that is imaged in a reduced size onto a wafer 124 or the like by means of the projection system 104.

[0078] The projection system 104 has a plurality of lenses 128, 130 and / or mirrors 132 for imaging the photomask 120 onto the wafer 124. Individual lenses 128, 130 and / or mirrors 132 of the projection system 104 can be arranged symmetrically to an optical axis 126 of the projection system 104. It should be noted that the number of lenses 128, 130 and mirrors 132 of the DUV lithography system 100B is not limited to the number shown. More or fewer lenses 128, 130 and / or mirrors 132 can also be provided. Furthermore, the mirrors 132 are typically curved at their front side for beam shaping.

[0079] An air gap between the last lens 130 and the wafer 124 can be replaced by a liquid medium 134 having a refractive index > 1. The liquid medium 134 can be, for example, ultrapure water. Such a setup is also referred to as immersion lithography and features increased photolithographic resolution. The medium 134 can also be referred to as an immersion liquid.

[0080] Fig. 2 shows a top view of a storage system 200 of the EUV or DUV lithography system 100A, 100B. The storage system 200 has a first mechanical component 202 and a second mechanical component 204 and serves to support these two components 202, 204 against each other.

[0081] In the Fig. 2, the storage system 200 serves to store an annular cover 204 on a carrier 202 of an optical element 206. In Fig. 2, the annular cover 204 partially covers both the carrier 202 and the optical element 206 from above, particularly in a respective edge region. The annular cover 204 serves, for example, as protection against contamination. The annular cover 204 is designed and arranged, for example, to allow air flow between the optical element 206 and the cover 204. In Fig. In Figure 2, the annular cover 204 is shown only in dashed lines for better visibility of the optical element 206 and the carrier 202. The annular cover 204 and the carrier 202 are made of metal, for example.

[0082] The optical element 206 is, for example, the last lens 130 arranged in front of the wafer 124 of the DUV lithography system 100B from Fig. 1B. In other examples, the optical element 206 may also be another optical element of the EUV or DUV lithography system 100A, 100B from Fig. 1A, Fig. 1B. For example, the optical element 206 may also be one of the mirrors 110 - 118, 122, M1 - M6 of the EUV lithography system 100A ( Fig. 1A) or one of the lenses 128 or the mirror 132 of the DUV lithography system 100B ( Fig. 1B).

[0083] The annular cover 204 is, as described in detail below, attached to the carrier 202 via a point bearing, for example a V-groove ball bearing 208 ( Fig. 5), through which only point contacts or, due to tolerances and deformations, small surface contacts exist between the first and second components 202, 204 in the area of ​​the bearing. This enables a clear mounting of the annular cover 204 on the carrier 202, in which, outside of the mounting, a hard surface contact between the annular cover 204 and the carrier 202, which are both made of metal, is avoided. In addition, the annular cover 204 is attached to the carrier 202 by means of an adhesive connection 210 ( Fig. 6), which is arranged outside the point or surface contacts of the V-groove ball bearing 208, is glued.

[0084] Fig. 3 shows the carrier 202 in the same orientation as in Fig. 2, but without the optical element 206 and without the annular cover 204. As in Fig. 3, the carrier 202 has a groove, in the example shown an annular V-groove 214. Fig. 5 shows the V-groove 214 in a radial cross-section (section along line BB in Fig. 3).

[0085] Instead of an annular V-groove 214 ( Fig. 3), the carrier 202' may also have three individual V-grooves 214', as in Fig. 4. In this case, the three individual V-grooves 214' are arranged offset from each other at angles of α, β, γ. In the Fig. 4, the three individual V-grooves 214' are arranged at equal angles of 120° to each other (ie, α = β = γ = 120°). In other examples, the three individual V-grooves can also be arranged at other angles α, β, γ that are different from zero. The Fig. 5 and Fig. 6 shown cross section of the V-groove 214, 214' corresponds to both the cross section of the annular V-groove 214 ( Fig. 3) as well as the cross-section of one of the three V-grooves 214' ( Fig. 4). It is noted that instead of the annular V-groove 214 ( Fig. 3) or the three individual V-grooves 214', one or more differently shaped grooves, such as a conical groove, a cone-segment-shaped groove, a funnel-shaped groove, a bulbous groove and / or a groove in the shape of a bulbous cup, may also be used.

[0086] As in Fig. 5, the V-groove 214, 214' has two mutually inclined surfaces 216. Furthermore, the V-groove 214, 214' has a first adhesive surface 218 connecting the two surfaces 216 for adhesive connection to the annular cover 204. In particular, the V-groove 214, 214' has a bottom (in Fig. 5) has a truncated V-shape, in which a cutting wall has the first adhesive surface 218. In the Fig. In the example shown in Figure 5, the first adhesive surface 218 is arranged perpendicular to a direction Z, which points from the carrier 202 to the cover 204.

[0087] For mounting the cover 204 on the carrier 202 by means of the V-groove ball bearing 208, the cover 204 has three ball sections 220, one of which is in the Fig. 5 and Fig. 6 is shown in cross section. Fig. 5 shows the V-groove ball bearing 208 in a state before the ball portion 220 was inserted into the V-groove 214 or 214'. Fig. 6 shows the V-groove ball bearing 208 in a state in which the ball portion 220 is located in the V-groove 214 or 214'.

[0088] Each of the three spherical sections 220 extends from a lower surface 222 ( Fig. 5) of the cover 204 in the direction of the carrier 202. The Fig. 5 shown spherical section 220 is in particular a hemisphere, which is attached to a Fig. 5 lower end 224 is flattened. Each of the three spherical sections 220 comprises a spherical surface section 226 which is spherically curved according to a solid sphere 228. In addition, each of the three spherical sections 220 has a second adhesive surface 230. The second adhesive surface 230 is in Fig. 5 is arranged at the flattened end 224 of the ball section 220. In addition, in the Fig. 5, the second adhesive surface 230 is arranged perpendicular to the direction Z. The second adhesive surface 230 is, in cross section of Fig. 5, in particular arranged between two partial sections 232 and 234 of the spherical surface section 226.

[0089] As in Fig. 6, liquid adhesive 212 is introduced between the first and second adhesive surfaces 218, 230. In addition, each of the three ball sections 220 is inserted into the annular V-groove 214 ( Fig. 3 and Fig. 6) or in one of the three individual V-grooves 214' ( Fig. 4 and Fig. 6) is introduced and supported therein in such a way that a ball section 220 rests on the mutually inclined surfaces 216 of the V-groove 214, 214' at two support points or two small support surfaces A1, A2. In particular, there are only point contacts between the three ball sections 220 and the V-groove 214 (or the three V-grooves 214') or small surface contacts due to tolerances and deformation. For example, there are a total of six point contacts or surface contacts A1, A2 between the three ball sections 220 and the V-groove 214 (or the three V-grooves 214'). In other words, the cover 204 is in contact with the carrier 202 via the V-groove ball bearing 208 only at point or surface contacts in the area of ​​the bearing 208.

[0090] In other examples, instead of three spherical segments 220, a single torus segment (not shown) may be used, which may also have a Fig. 5 has the radial cross-section shown.

[0091] The adhesive 212 introduced in liquid form between the first and second adhesive surfaces 218, 230 is cured and forms in solidified form an adhesive layer 212' ( Fig. 6). The adhesive bond 210 between the annular cover 204 and the carrier 202 is established by the solid adhesive layer 212'.

[0092] During curing, the adhesive 212, 212' may shrink and thereby exert a force on the annular cover 204 and / or the carrier 202. Since the adhesive 212, 212' is only applied at three discrete locations between the cover 204 and the carrier 202, namely on the flattened side 224 ( Fig. 5) arranged second adhesive surface 230 of the three spherical sections 220, a force effect by the adhesive 212, 212' is reduced compared to a case in which an adhesive is applied flatly and annularly between one component, such as an annular cover 204, and another component, such as a carrier 202.

[0093] If the cover 204 is displaced and / or tilted during the curing of the adhesive 212, 212', the V-groove ball bearing 208 ( Fig. 6) between the cover 204 and the carrier 202, so that the carrier 202 is also tilted. Consequently, it can be prevented in particular that an optical element 206 ( Fig. 2), such as a lens or a mirror, is moved and / or tilted.

[0094] In the Fig. 7-9 show a second embodiment of the bearing system 300 with a V-groove ball bearing 308 and an adhesive connection 310. The bearing system 300 according to the second embodiment includes a carrier 302 for an optical element 206 (similar to the carrier 202 according to the first embodiment) and an annular cover 304 (similar to the annular cover 204 according to the first embodiment).

[0095] The carrier 302 has a V-groove 314 (similar to the V-groove 214, 214', Fig. 5) and three recesses 340 communicating with the V-groove 314 ( Fig. 8). The V-groove 314 may, as in the case of the first embodiment, be an annular V-groove corresponding to the V-groove 214 ( Fig. 3) or there can be three individual V-grooves corresponding to the V-groove 214' ( Fig. 4). The recesses 340 ( Fig. 8) are in particular pot-shaped and formed at three discrete, spaced-apart locations on the carrier 302. The recesses 340 are in particular not circumferential or annular.

[0096] Each of the recesses 340, of which in the Fig. 8 and Fig. 9 one is shown in cross-section, has on its inner walls 342 an adhesive surface 318 (first adhesive surface) in which the adhesive 312 ( Fig. 9) is ordered.

[0097] Furthermore, the annular cover 304 has three spherical sections 320, one of which is in the Fig. 8 and Fig. 9 in cross section. The ball sections 320 have, like the ball sections 220 of the first embodiment ( Fig. 5), a spherical surface section 326 with two subsections 332, 334.

[0098] The ball sections 320 differ from the ball sections 220 of the first embodiment ( Fig. 5) by a projection 344 arranged on the respective ball section. The projection 344 can be formed monolithically with the ball section 320 (not shown). Alternatively, the projection can be formed as shown in the Fig. 7-9, may be provided by a separate element 346 that is attached to the ball portion 320. In the example shown, the projection 344 is provided by a threaded screw 346 having a thread 350 at a first end portion 348.

[0099] The threaded screw 346 is screwed into a threaded hole 352 of the ball section 320 ( Fig. 9), so that the projection 344 provided by a shank 354 (second end portion 354) of the threaded screw 346, viewed in cross-section, protrudes between the two partial portions 332, 334 of the spherical surface portion 326. The projection 344 also has a second adhesive surface 330 for adhesive attachment to the first adhesive surface 318 of the recess 340.

[0100] For mounting and fastening the annular cover 304 to the carrier 302, an adhesive 312 ( Fig. 9) in liquid form. Then, the annular cover 304 is arranged on the carrier 320 such that the projection 344 is inserted into the recess 340 of the carrier 302 and is glued there by means of the adhesive 312, 312'. In addition, as in the first embodiment, the ball portion 320 is inserted into the V-groove 314 ( Fig. 9), so that the ball portion 320 rests in a discrete point or surface contact A1, A2 against mutually inclined surfaces 316 of the V-groove 314. Curing of the adhesive 312 forms a solid adhesive layer 312', which establishes the adhesive connection 310 between the annular cover 304 and the carrier 302.

[0101] The recess 340 with the first adhesive surface 318 and the projection 344 with the second adhesive surface 330 allow the adhesive 312 to be applied in a targeted manner. In particular, it can prevent the adhesive 312, in its liquid form, from spreading to areas of the annular cover 304 and / or the carrier 302 outside the first and second adhesive surfaces 318, 330.

[0102] In Fig. 10 shows a variant of the second embodiment of the bearing system 300' with the V-groove ball bearing 308'. Only differences from the second embodiment are described below. In the bearing system 300', the projection 344' is designed such that it can bend relative to the ball portion 320 in order to compensate for forces during the curing of the adhesive 312, 312'. In particular, the projection 344' can bend relative to the ball portion 320 about a first bending axis X (parallel to the X-direction in Fig. 10) and a second bending axis Y perpendicular to the first bending axis X (parallel to the Y-direction in Fig. 10). Both the first X and second bending axes Y are arranged perpendicular to the direction Z pointing from the carrier 302 to the cover 304.

[0103] In the Fig. 10, the flexibility of the projection 344' is realized by cuts 356 in a wall of the shaft 354' of the threaded screw 346'. Although Fig. 10 shows a cross-section, two incisions 356, which would actually only be visible in a plan view, are shown for the sake of illustration in Fig. 10. Between the two notches 356, a web 358 remains, which forms a first leaf spring 360. At the rear of the shaft 354', the two notches 356 form a leaf spring 360 that is symmetrical to the first leaf spring 360. The two first leaf springs 360 each have a main extension plane in the YZ plane and allow bending of the shaft 354' (i.e., the projection 344') about a bending axis in the X direction. Furthermore, the shaft 354' has two further notches 362, 364 ( Fig. 11), by which two second leaf springs 366 are formed (one of which is in Fig. 11). The two second leaf springs 366 have a main extension plane in the XZ plane and allow bending of the shaft 354' (ie, the projection 344') about a bending axis in the Y direction.

[0104] The flexibility of the shaft 346' makes it possible to compensate for the force that occurs during the curing of the adhesive 312, 312'. This compensation can prevent the carrier 302 and thus the optical element 206 ( Fig. 2) comes.

[0105] In the Fig. 12 and Fig. Figure 13 shows a third embodiment of the bearing system 400 with a V-groove ball bearing 408 and an adhesive connection 410. The bearing system 400 according to the third embodiment has a carrier 402 for an optical element 206 (similar to the carrier 202 according to the first embodiment) and an annular cover 404 (similar to the annular cover 204 according to the first embodiment). The bearing system 400 also has, similar to the bearing system 200 of the first embodiment, an adhesive 412, 412', a groove 414, mutually inclined surfaces 416, and a spherical surface section 426 with two subsections 432, 434. Only differences from the first embodiment are described below.

[0106] In the bearing system 400, the ball portion 420 has a recess 440 which has the second adhesive surface 430. In addition, the ball portion 420 is not monolithically bonded to the annular cover 404 (as in the first embodiment, Fig. 5), but rather as a separate element 442. In particular, the bearing system 400 comprises a screw 442 as a separate element, which has a thread on its first end portion 444, with which it can be screwed into a threaded bore 446 of the annular cover 404. Furthermore, the screw 442 has a ball head 450 on its second end portion 448, which forms the ball portion 420 with the recess 440. In other examples, the ball portion 420, which is formed by a, as in the Fig. 12 and Fig. 13, the ball head 450 is formed by a separate screw 442, can also be realized without the recess 440. Fig. 13 shows the bearing system 400 of the third embodiment in the assembled state with the bearing at a support point or a discrete support surface A1, A2 and the cured adhesive connection 410.

[0107] In the following, with reference to the Fig. 5, Fig. 6 and Fig. 14 describes a method for manufacturing a storage system 200 for a lithography system 100A, 100B according to a first embodiment.

[0108] In a first step S1 of the method, a first component 202, such as a carrier 202 of an optical element 206 ( Fig. 2 and Fig. 5), which comprises at least two mutually inclined surfaces 216 and a first adhesive surface 218 connecting the two surfaces 216.

[0109] In a second step S2 of the method, a second component 204, such as an annular cover 204 ( Fig. 2 and Fig.5), which comprises at least one spherical portion 220 with a spherical surface portion 226 and a second adhesive surface 230. The second adhesive surface 230 is arranged, as seen in cross section, between two partial portions 232 of the spherical surface portion 226.

[0110] In a third step S3 of the method, the second component 204 is arranged on the first component 202 such that the at least one spherical portion 220 is received between the at least two mutually inclined surfaces 216 and the first adhesive surface 218 is arranged adjacent to the second adhesive surface 230.

[0111] In a fourth step S4 of the method, an adhesive 212 is applied to the first and / or second adhesive surface 218, 230.

[0112] In a fifth step S5 of the method, the adhesive 212 is cured to form a solid adhesive layer 212'.

[0113] Although the present invention has been described using exemplary embodiments, it can be modified in many ways. LIST OF REFERENCE SYMBOLS 100A EUV lithography system 100B DUV lithography system 102 Beam shaping and illumination system 104 Projection system 106A EUV light source 106B DUV light source 108A EUV radiation 108B DUV radiation 110 mirrors 112 mirrors 114 mirrors 116 mirrors 118 mirrors 120 photomask 122 mirrors 124 wafers 126 optical axis 128 lens 130 mirrors 132 Medium 200 storage system 202 first component 204 second component 206 optical element 208 Storage 210 Adhesive bond 212, 212' Adhesive 214, 214' groove 216 area 218 first adhesive surface 220 spherical section 222 area 224 End 226 Spherical surface section 228 solid ball 230 second adhesive surface 232 section 234 subsection 300, 300' storage system 302 Component (Beam) 304 Component (cover) 308, 308' storage 310 adhesive bond 312, 312' Adhesive 314 groove 316 area 318 first adhesive surface 320 spherical section 326 Spherical surface section 330 second adhesive surface 332 section 334 section 340 recess 342 interior wall 344, 344' lead 346 Element (threaded screw) 348 final section 350 threads 352 threaded hole 354 Shaft (end section) 356 incision 358 jetty 360 leaf spring 362 incision 364 incision 366 leaf spring 400 storage system 402 Component (Beam) 404 Component (Cover) 408 Storage 410 Adhesive bond 412, 412' Adhesive 414 groove 416 area 420 spherical section 426 Spherical surface section 430 second adhesive surface 432 section 434 section 440 recess 442 screw 444 final section 446 threaded hole 448 final section 450 ball head A1 Support point / support surface A2 Support point / support surface M1 mirror M2 mirror M3 mirror M4 mirror M5 mirror M6 mirror S1-S5 process step X direction, axis Y direction, axis Z direction

Claims

[1] Storage system (200, 300, 400) for storing a first component (202, 302, 402) on a second component (204, 304, 404) of a lithography system (100A, 100B), comprising the first and second components (202, 204, 302, 304, 402, 404) and an adhesive (212, 212', 312, 312', 412, 412') which secures the first and second components (202, 204, 302, 304, 402, 404) to one another, wherein the first component (202, 302, 402) has at least two surfaces (216, 316, 416) inclined towards one another and a first adhesive surface (218, 318) connecting the two surfaces (216, 316, 416), the second component (204, 304, 404) has at least one spherical section (220, 320, 420) received between the at least two mutually inclined surfaces (216, 316, 416), which comprises a spherical surface section (226, 326, 426) and a second adhesive surface (230, 330, 430), wherein the second adhesive surface (230, 330, 430) is arranged, viewed in cross section, between two partial sections (232, 234, 332, 334, 432, 434) of the spherical surface section (226, 326, 426), and the adhesive (212, 212', 312, 312', 412, 412') is arranged between the first and the second adhesive surface (218, 230, 318, 330, 430). [2] Storage system according to claim 1, wherein the first component (202, 302, 402) comprises at least one groove (214, 214', 314, 414), a V-groove (214, 214', 314, 414), a conical groove, a cone-segment-shaped groove, a funnel-shaped groove, a bulbous groove, a groove in the form of a bulbous cup and / or a funnel-shaped groove, which, in particular seen in cross-section, has the two surfaces (216, 316, 416) inclined towards one another. [3] Storage system according to claim 1 or 2, wherein the first and the second component (202, 204, 302, 304, 402, 404) only directly abut one another at point or surface contacts (A1, A2), which are each formed by two mutually inclined surfaces (216, 316, 416) and a spherical section (220, 320, 420), and are also glued to one another at the first and the second adhesive surface (218, 230, 318, 330, 430) by means of the adhesive (212, 212', 312, 312', 412, 412'). [4] Storage system according to one of claims 1-3, wherein the first and second adhesive surfaces (218, 230, 318, 330, 430) each comprise a plurality of discrete adhesive surfaces (218, 230, 318, 330, 430). [5] Storage system according to any one of claims 2-4, wherein the first component (302) comprises at least one recess (340) communicating with the at least one V-groove (314), which recess has the first adhesive surface (318) and in which the adhesive (312, 312') is arranged, the second component (304) comprises at least one projection (344) on the at least one spherical section (320), which, viewed in cross section, projects between the two partial sections (332, 334) of the spherical surface section (326) and has the second adhesive surface (330), and the projection (344) is introduced into the recess (340) of the first component (302) and is glued there by means of the adhesive (312, 312'). [6] Storage system according to claim 5, wherein the second component (304) has at least one threaded pin (346) which is screwed at its first end portion (348) into a threaded bore (352) of the at least one ball portion (320) and forms the projection (344) with the second adhesive surface (330) at its second end portion (354). [7] A bearing system according to claim 5 or 6, wherein the at least one projection (344') is configured such that it is bendable relative to the at least one spherical portion (320) about a first bending axis (X) and about a second bending axis (Y) perpendicular to the first bending axis (X), wherein both the first (X) and the second bending axis (Y) are arranged perpendicular to a direction (Z) pointing from the first component (302) to the second component (304). [8] The bearing system of claim 7, wherein the at least one projection (344') comprises at least one first leaf spring (360) for bending about the first bending axis (X) and at least one second leaf spring (366) for bending about the second bending axis (Y). [9] Storage system according to one of claims 1-4, wherein the second component (404) comprises at least one recess (440) formed in the at least one spherical portion (420) which has the second adhesive surface (430). [10] Storage system according to one of claims 1-4 or claim 9, wherein the second component (404) has at least one screw (442) which is screwed at its first end portion (444) into a threaded bore (446) of the second component (404) and has at its second end portion (448) a ball head (450) which forms one of the at least one ball portion (420). [11] Storage system according to one of claims 1-10, wherein one of the first and second components (202, 204, 302, 304, 402, 404) is a carrier (202, 302, 402) of an optical element (206) of the lithography system (100A, 100B), and the other of the first and second components (202, 204, 302, 304, 402, 404) is an annular cover (204, 304, 404) of the optical element (206) of the lithography system (100A, 100B). [12] Storage system according to any one of claims 1-11, wherein the first component (202', 302, 402) comprises three V-grooves (214', 314, 414) which are offset from one another by angles (α, β, γ) other than zero, and the second component (204, 304, 404) comprises three spherical sections (220, 320, 420) which are arranged offset from one another by angles (α, β, γ) other than zero, the first component (302) comprises three recesses (340) correspondingly communicating with the three V-grooves (314) which are offset from one another by angles (α, β, γ) different from zero, the second component (304) comprises three projections (344, 344') which are arranged offset from one another by angles (α, β, γ) other than zero and / or the second component (404) comprises three spherical sections (420), in each of which a recess (440) is formed, and the recesses (440) are arranged offset from one another by angles (α, β, γ) which are different from zero. [13] Storage system according to any one of claims 1-12, wherein the at least one spherical section (220) is a spherical segment and / or a spherical wedge, or the bearing system comprises exactly one spherical section (220) and exactly one V-groove (214), and the spherical section (220) is a torus section and the V-groove (214) is an annular V-groove (214). [14] Lithography system (100A, 100B) comprising a storage system (200) according to any one of claims 1-13. [15] Method for producing a storage system (200) for a lithography system (100A, 100B), comprising the steps: a) providing (S1) a first component (202) which comprises at least two surfaces (216) inclined towards one another and a first adhesive surface (218) connecting the two surfaces (216), b) providing (S2) a second component (204) which comprises at least one spherical section (220) with a spherical surface section (226) and a second adhesive surface (230), wherein the second adhesive surface (230) is arranged between two partial sections (232, 234) of the spherical surface section (226) as seen in cross section, c) arranging (S3) the second component (204) on the first component (202) such that the at least one spherical section (220) is received between the at least two mutually inclined surfaces (216) and the first adhesive surface (218) is arranged adjacent to the second adhesive surface (230), d) applying (S4) adhesive (212, 212') to the first and / or second adhesive surface (218, 230), and e) curing (S5) of the adhesive (212, 212').

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