Process for rinsing coating product coating device and related device

Abstract

To provide a more environmentally-friendly method for rinsing a coating product coating device.SOLUTION: There is provided a method for rinsing a coating product coating device 12 including a measuring device 10 and a coating product coating device 13. The measuring device 10 includes an inlet 26 which is connected to a gas supply channel 20 and a solvent supply channel 22, and a measuring pump 14 having an outlet 28 connected to a coating device 13. The supply channels are each provided with valves 40 and 42. The method includes at least one step of sucking volumes by the measuring pump during at least one suction stage of the measuring pump 14, and the valves 40 and 42 alternately form opened configurations during at least the one suction stage so that the volumes sucked during at least the one suction stage alternately includes gas and a solvent.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a method and associated device for rinsing a coating product application device that includes a metering device. [Background technology]

[0002] To rinse the coating product application device, a solvent is, for example, injected into the application device.

[0003] However, such methods use a large amount of solvent. Summary of the Invention [Problem to be solved by the invention]

[0004] It is therefore an object of the present invention to propose a more environmentally friendly method of rinsing a coating product application device. [Means for solving the problem]

[0005] To this end, the present invention relates to a method for rinsing a coating product application device comprising a metering device and a coating product applicator, the metering device comprising a metering pump having an inlet and an outlet, the inlet being connected to a gas supply channel and a solvent supply channel and the outlet being connected to the coating product applicator, the gas supply channel being provided with a gas valve and the solvent supply channel being provided with a solvent valve, each of the gas valve and the solvent valve having at least one closed configuration in which the valve blocks passage of the gas or solvent to the inlet, respectively, and at least one open configuration in which the valve allows passage of the gas or solvent to the inlet, respectively, the method comprising at least one step of aspirating a volume by the metering pump during at least one suction phase of the metering pump, the gas valve and the solvent valve being alternately in the open configuration during the at least one suction phase such that the volume aspirated during the at least one suction phase alternately contains gas and solvent.

[0006] Thereby, a gas is injected into the solvent, thereby creating an emulsion that is used to rinse the application device, thereby reducing the amount of solvent used for rinsing.

[0007] According to other advantageous aspects of the invention, the rinsing method comprises one or more of the following characteristics, taken individually or according to all technically possible combinations, the characteristics being: at least one aspiration stage comprises the following steps in the following order: opening a first valve between the gas valve and the solvent valve; aspirating gas or solvent by a metering pump to a first volume; closing the first valve; opening a second valve between the gas valve and the solvent valve, the second valve being different from the first valve; aspirating gas or solvent by a metering pump to a second volume; and closing the second valve, said aforementioned steps being repeated throughout the at least one aspiration stage; - the aspiration includes an aspiration cycle including a gas aspiration by a metering pump and a solvent aspiration, said aspiration cycle being repeated throughout the aspiration phase; the metering method comprises detecting the aspirated volume during aspiration by a metering pump, more particularly by a sensor for the aspirated volume or a displacement sensor of the metering pump, - the metering device further comprises at least two supply channels for each component product, - The metering pump is a piston pump; - the gas supply channel is equipped with a compressor, the compressor being suitable for compressing gas to an inlet of a metering pump upstream of the gas valve, and the solvent supply channel is equipped with a secondary solvent pump, the secondary solvent pump being suitable for pumping solvent to the inlet of the metering pump, the secondary solvent pump being arranged upstream of the solvent valve; and / or The metering device includes a mixer that is positioned downstream of the outlet of the metering pump, more specifically adjacent to the outlet of the metering pump.

[0008] The present invention further relates to a coating product application device comprising a metering device and a coating product applicator, the metering device comprising a metering pump, a gas supply channel and a solvent supply channel and a control module, the metering pump having an inlet and an outlet, the inlet being connected to the gas supply channel and the solvent supply channel and the outlet being connected to the coating product applicator, the gas supply channel being provided with a gas valve and the solvent supply channel being provided with a solvent valve, each of the gas valve and the solvent valve having at least one closed configuration in which the valve prevents passage of the gas or solvent to the inlet, respectively, and at least one open configuration in which the valve allows passage of the gas or solvent to the inlet, respectively, the control module being suitable for controlling the gas valve and the solvent valve, the control module being configured to perform suction according to at least one suction step of the process described above.

[0009] The invention will become clearer on reading the following description, given purely as a non-limiting example, with reference to the drawings, in which: [Brief description of the drawings]

[0010] [Figure 1] FIG. 2 is a schematic diagram of an example of an application device during rinsing according to a first embodiment of the present invention. [Diagram 2] FIG. 2 is a schematic diagram of an example of an application device during rinsing, according to one embodiment of the present invention. [Diagram 3] FIG. 2 is a diagram of an example of a metering pump for an application device according to the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] A first example of a coating product application device 12 will now be described with reference to FIG.

[0012] The coating product may, for example, be a multi-component product.

[0013] The coating product is, for example, a paint.

[0014] The coating product may, for example, have a viscosity comprised between 1100 Cps and 10,000 Cps.

[0015] The coating product application device 12 includes a metering device 10 .

[0016] The application device 12 further includes a coating product applicator 13 .

[0017] The applicator 13 is, for example, one or more spray guns, or one or more rotary spray balls, or one or more deposition valves.

[0018] The metering device 10 includes a metering pump 14 .

[0019] The metering device 10 herein includes a gas supply channel 20 and a solvent supply channel 22 .

[0020] The metering device 10 herein further comprises a plurality of feed channels 16, 18 for each component product.

[0021] The metering device 10 herein further includes an electronic device 24 .

[0022] The metering pump 14 includes an inlet 26 and an outlet 28 .

[0023] A metering pump is suitable for pumping a given volume of a fluid, either a liquid or a gas.

[0024] The metering pump may have a stroke volume, for example, between 10 cc and 500 cc, inclusive.

[0025] The metering pump has at least one suction stage.

[0026] In one embodiment, the metering pump has an aspiration stage and a non-aspiration stage.

[0027] During the suction phase, a volume corresponding to the stroke volume of the metering pump enters the metering pump at the inlet, and in addition, during the suction phase, a volume corresponding to a first portion, here half, of the stroke volume of the pump leaves the pump at the outlet.

[0028] During the non-suction phase, no fluid enters the metering pump at the inlet. A volume corresponding to a first portion of the stroke volume of the pump, here a second portion that makes up half, leaves the pump at the outlet.

[0029] In the illustrated example, the metering pump 14 is a piston pump.

[0030] The piston pump operates in suction and non-suction phases as explained above.

[0031] An example of a piston pump used as metering pump 14 is shown in FIG. 3, for example, during the suction phase.

[0032] The metering pump, for example, includes a cylinder 70 and a piston head 72 that defines two chambers of variable volume within the cylinder, referred to as an upstream chamber 74 and a downstream chamber 76 .

[0033] The inlet 26 is disposed opposite the outlet 28 .

[0034] The inlet 26 opens into an upstream chamber 74 opposite a downstream chamber 76 , and the outlet 28 opens into the downstream chamber 76 opposite the upstream chamber 74 .

[0035] The piston head 72 is here provided with a drain valve 78 .

[0036] The piston head defines an opening 80 for the passage of fluid from the upstream chamber 74 to the downstream chamber 76 , and a drain valve 78 prevents the passage of fluid from the downstream chamber 76 to the upstream chamber 74 .

[0037] The exhaust valve 78 includes, for example, a seat 82 bounded by a head and surrounding an opening, and a ball 84 adapted to rest on the seat 82 .

[0038] The piston pump is further provided with a suction valve 86 disposed at the inlet 26 of the metering pump.

[0039] The suction valve prevents fluid from leaving the metering pump at inlet 26 .

[0040] The suction valve includes, for example, a seat 88 surrounding the inlet 26 and a ball 90 adapted to rest on the seat.

[0041] During the suction phase of the metering pump, the piston head 72 moves towards the outlet 28. The volume contained in the downstream chamber 76 is expelled via the outlet 28. Furthermore, a vacuum is created in the upstream chamber 74 and fluid is drawn in at the inlet 26, more specifically corresponding to the stroke volume of the pump.

[0042] More specifically, the ball 90 of the intake valve 86 moves away from the seat 88 due to the negative pressure created in the upstream chamber 74, and the ball 84 moves away from the exhaust valve 78 which rests on the seat 82 due to the overpressure in the downstream chamber.

[0043] During the non-suction phase of the metering pump, the piston head moves towards the inlet 26. No fluid enters through the inlet 26. The volume contained in the downstream chamber 76 is expelled via the outlet 28. A portion of the volume contained in the upstream chamber 74, here half the volume, moves into the downstream chamber 76.

[0044] More specifically, the ball 90 of the suction valve 86 rests on the seat 88 due to the overpressure created in the upstream chamber 74, and the ball 84 of the exhaust valve 78 moves away from the exhaust valve seat 82 due to the negative pressure in the downstream chamber 76, opening the aperture 80.

[0045] Alternatively, during the suction phase, a volume corresponding to the stroke volume of the metering pump enters the metering pump at the inlet and no fluid exits the pump at the outlet, and during the non-suction phase, a volume corresponding to the stroke volume of the metering pump exits the pump at the outlet and no fluid enters the metering pump at the inlet.

[0046] Alternatively, the metering pump comprises a piston with a head that does not have an opening and defines two non-communicating chambers including the pumping chamber. The inlet and outlet of the metering pump are arranged in the same pumping chamber. The inlet and outlet more specifically open into the pumping chamber opposite the other chamber separated by the head. The inlet and outlet are each provided, for example, with a non-return valve. The metering pump thus has an intake phase, during which the pump draws in a volume of fluid, for example corresponding to the stroke volume of the pump, and expels no fluid at all, and a non-exhaust phase, during which the pump expels said volume of fluid.

[0047] As an alternative to a piston pump, the metering pump may be a diaphragm pump or a ball pump.

[0048] The outlet 28 is suitable for connection to a coating product applicator 13 so that the metering pump 14 supplies the coating product applicator.

[0049] The inlets are connected to a gas supply channel 20 and / or a solvent supply channel 22 and, optionally, further connected to a respective plurality of component product supply channels 16,18.

[0050] In the illustrated example, the connector is located at the inlet 26 .

[0051] The connector is, for example, a distribution unit.

[0052] A connector is connected to each of the supply channels.

[0053] Each component product supply channel 16, 18 is suitable for supplying a corresponding component product to the inlet of the metering pump 14, for example from a respective tank 30, 32 specific to said supply channel containing the corresponding component product.

[0054] The component product supply channels 16, 18 meet at a junction point upstream of the inlet, which is connected to the inlet.

[0055] The connection point may be adjacent to the inlet 26, for example.

[0056] Alternatively, each component product supply channel 16, 18 is connected to the inlet 26 separately from each other.

[0057] Each component product supply channel 16,18 is provided with a respective valve 34,36.

[0058] Each valve 34, 36 is positioned upstream of the inlet 26, and more specifically, upstream of the connection point, as desired.

[0059] Respective valves 34,36 are herein positioned downstream of respective tanks 30,32.

[0060] Each valve 34, 36 has at least one closed configuration in which the valve prevents the passage of the corresponding component product through the valve, i.e., towards the inlet 26 herein, and at least one open configuration in which the valve allows the passage of the corresponding component product through the valve, i.e., towards the inlet 26 herein.

[0061] Each valve 34, 36 herein has a closed configuration and multiple open configurations, with the flow rate of the corresponding component product through said valve being different depending on the open configuration.

[0062] Alternatively, each valve 34, 36 herein has only one closed and one open configuration.

[0063] Thus, the flow rate of the corresponding component product in the supply channel can be adjusted, for example, at another location on the supply channel, for example at the applicator 13 or on the outlet line 44, for example by means of a flow control valve.

[0064] The gas supply channel 20 is suitable for supplying a gas, more particularly air, for example compressed air, to an inlet 26 .

[0065] The solvent supply channel 22 is suitable for supplying solvent to the inlet 26, for example, from a solvent tank 38 containing the solvent.

[0066] In one embodiment, the solvent delivery channels are also considered to be component delivery channels as described herein above, and the multi-component product includes a solvent.

[0067] The gas supply channel 20 and the solvent supply channel 22 meet, for example, at a junction point upstream of the inlet, which is connected to the inlet. The junction point is, for example, the same as the junction point of the component product supply channels 16, 18, and all supply channels meet at said junction point.

[0068] Alternatively, each supply channel 16, 18, 20, 22 is connected to the inlet 26 separately from each other.

[0069] The gas supply channel 20 is provided with a gas valve 40 .

[0070] More specifically, in the illustrated example, gas valve 40 is disposed at the upstream end of gas supply channel 20 .

[0071] The gas valve 40 is for example suitable for obtaining gas, more particularly air, from the atmosphere surrounding the metering device 10 .

[0072] A gas valve 40 is optionally positioned upstream of the inlet 26, and more specifically, upstream of the connection point.

[0073] Gas valve 40 has at least one closed configuration in which the valve prevents the passage of gas through valve 40 toward inlet 26 and at least one open configuration in which the valve allows the passage of gas through valve 40 toward inlet 26.

[0074] As described hereinabove with reference to valves 34, 36, gas valve 40 may, for example, have one closed configuration and multiple open configurations, or alternatively, have only one closed configuration and one open configuration.

[0075] The solvent supply channel 22 is provided with a solvent valve 42 .

[0076] A solvent valve 42 is optionally positioned upstream of the inlet 26, and more specifically, upstream of the connection point.

[0077] The solvent valve 42 is herein located downstream of the solvent tank 38 .

[0078] The solvent valve 42 has at least one closed configuration in which the valve prevents the passage of solvent through the valve 42 toward the inlet and at least one open configuration in which the valve allows the passage of solvent through the valve 42 toward the inlet 26.

[0079] As described above with reference to valves 34, 36, solvent valve 42 may, for example, have one closed configuration and multiple open configurations, or alternatively, have only one closed configuration and one open configuration.

[0080] The application device 12 further includes an outlet line 44 .

[0081] An outlet line 44 herein extends between the upstream and downstream ends.

[0082] The outlet line 44 , more specifically the upstream end, is connected to the outlet 28 of the metering pump 14 .

[0083] The downstream end is connected to an applicator 13 .

[0084] More specifically, metering pump 14 expels the product contained therein into outlet line 44 .

[0085] The metering device 10 further includes a mixer 45, herein a mechanical mixer, more specifically a static mixer, disposed downstream of the metering pump outlet 28, more specifically adjacent to the metering pump outlet 28.

[0086] The mixer 45 is herein disposed within the outlet line 44 , more specifically at the upstream end of the outlet line 44 .

[0087] The metering device 10 is here further provided with a sensor 46 of the volume entering the metering pump 14 or a sensor of the displacement of the metering pump 14 .

[0088] In the illustrated example, the sensor 46 is suitable and positioned to measure the displacement of the piston of the metering pump 14 .

[0089] Alternatively, the sensor 46 is suitable for detecting a parameter related to the metering pump, said parameter being directly dependent on the volume entering the metering pump 14 .

[0090] For example, in the case of a pump having notched gears, the sensor may be adapted, for example, to detect the notch of the mating gear.

[0091] Additionally or alternatively, a sensor 46 may be disposed at the inlet 26 to measure the volume of fluid entering the metering pump 14 via the inlet 26 .

[0092] The sensor 46 provides, for example, an analog signal, such as an incoming volume or piston displacement.

[0093] Alternatively, the sensor 46 provides a digital signal, for example a gear notch, or a signal corresponding to a piston displacement or incoming volume threshold.

[0094] The electronic device 24 includes an information processing unit, for example consisting of a memory and a processor associated with the memory.

[0095] The electronic device 24 includes a control module 48 .

[0096] The control module 48 is adapted to control the valves 34, 36 of each of the supply channels, as will be described more specifically below.

[0097] The control module 48 is connected, for example, to the valves 34, 36, for example by wires or by a remote connection.

[0098] The control module 48 is further adapted to control the gas valve 40 and the solvent valve 42, as required.

[0099] The control module 48 is, for example, connected to the valves 40, 42, for example by wires or by a remote connection.

[0100] The response time from a command of the control module 48 for each of the valves 34, 36, 40, 42 is comprised between 100 and 250 milliseconds.

[0101] The control module 48 is configured to perform the aspiration as described in the metering method described below.

[0102] The control device 24 further includes a monitoring module 50 .

[0103] The monitoring module 50 is connected to the control module 48 .

[0104] The monitoring module 50 is further connected to the sensor 46, for example by wire or by a remote connection.

[0105] More specifically, the monitoring module 50 is adapted to receive information from the sensor 46 , more specifically a signal provided by the sensor 46 and including a measurement result made by the sensor 46 .

[0106] The monitoring module 50 is adapted to determine the amount of volume entering the metering pump 14 and the nature of the fluid entering the pump 14 depending on the respective configuration of the valves.

[0107] The monitoring module 50 is therefore adapted to subsequently determine the amount of each fluid that enters the metering pump 14 .

[0108] The control module 48 and, optionally, the monitoring module 50 are each created in the form of software or software bricks that can be executed by a processor. The memory of the electronic device is therefore suitable for storing the control software and the monitoring software. The processor is therefore suitable for executing each of the software programs among the control software and the monitoring software.

[0109] In a variant (not shown), the control module 48 and, if desired, the monitoring module 50 are each made in the form of a programmable logic component, such as an FPGA (field programmable gate array), or else an integrated circuit, such as an ASIC (application specific integrated circuit).

[0110] When the electronic device is created in the form of one or more software programs, i.e. in the form of computer programs, the electronic device is further suitable for being recorded on a computer-readable medium (not shown). The computer-readable medium is suitable for storing, for example, electronic instructions and for being coupled to the bus of a computer system. As an example, the readable medium is an optical disk, a magneto-optical disk, a ROM, a RAM, any type of non-volatile memory (e.g., FLASH or NVRAM), or a magnetic card. The computer program containing the software instructions is thus stored on a readable medium.

[0111] In the example shown in FIG. 1, the fluid is aspirated by the metering pump 14 during a suction phase by so-called passive suction, i.e. during the suction phase, the metering pump 14 creates a negative pressure at its inlet 26, which draws in the fluid, more specifically the fluid coming from the channels whose corresponding valves are in the open configuration.

[0112] Such a device is particularly simple.

[0113] A second example of application 112 of a coating product for application according to a second embodiment of the invention will now be described with reference to FIG.

[0114] Only the features in which the second embodiment differs from the first embodiment are explained in the following description. Apart from such features, the application device 112 is also identical to the first example of an application device.

[0115] Identical or similar elements will have the same reference number plus 100.

[0116] In a second embodiment, the gas supply channel 120 is provided with a compressor 164 , which is suitable for compressing gas directed to the inlet 126 of the metering pump 114 .

[0117] The compressor 164 is disposed upstream of the gas valve 140 .

[0118] More specifically, the compressor 164 is suitable for taking gas, more specifically air, from the atmosphere surrounding the compressor and compressing said gas in the gas supply channel 120 upstream of the gas valve 140 .

[0119] The solvent supply channel 122 is provided with a secondary solvent pump 166 that is adapted to pump solvent towards the inlet 126 of the metering pump 114 .

[0120] A secondary solvent pump 166 is disposed upstream of the solvent valve 142 .

[0121] The secondary solvent pump 166 is located, for example, downstream of a solvent tank (not shown).

[0122] Additionally, each component product supply channel 116 , 118 includes a respective secondary pump 160 , 162 adapted to pump a respective component product towards the inlet 126 of the metering pump 114 .

[0123] Each respective secondary pump 160,162 is disposed in the supply channels 116,118 upstream of the respective valves 134,136.

[0124] Each respective secondary pump 160, 162 is disposed, for example, downstream of a respective tank (not shown).

[0125] 2, the fluid is aspirated during the suction phase by the metering pump 114 by so-called active suction, i.e. the fluid is pushed towards the inlet 126 by a corresponding secondary pump or compressor. During the suction phase, the metering pump 114 thus aspirates the pushed fluid, more specifically the fluid coming from the channels whose corresponding valves are in the open configuration.

[0126] Such an application device 12,112 is suitable for being coated with a coating product which is administered by a metering device 10,110, more particularly by expulsion of the coating product at an applicator 13,113.

[0127] More specifically, the metering device 12, 112 is suitable for metering different component products by selectively transitioning the valves 34, 36, 134, 136 to an open configuration during the suction phase of the metering pump 14, 114 depending on the component product to be obtained to form a single component or a multi-component product, desirably a multi-component product, more specifically herein, to form a multi-component product.

[0128] Metering is performed and controlled, for example, by electronic device 24,124.

[0129] The multi-component product is premixed, for example, by moving the piston head in the example pump described with reference to FIG.

[0130] The multi-component product is mixed, for example, by mixers 45,145 at the exit lines 44,144.

[0131] The single-component or multi-component product forming the coating product, preferably the multi-component product, is then dispensed by the applicator 13, 113, more specifically towards the surface to be coated.

[0132] Following the application step, the multi-component product is thus present in the application device 12, 112. The application device 12, 112 is then, for example, rinsed.

[0133] Next, a rinsing method for the above described coating product application device will be described.

[0134] The rinsing method includes aspirating a volume with the metering pump during an aspiration phase of the metering pump, with the gas valve and the solvent valve alternately in an open configuration during aspiration such that the aspirated volume alternately contains gas and solvent during the aspiration phase.

[0135] More specifically, the rinse method includes such aspiration steps during each of the aspiration phases of the metering pumps 14, 114 throughout the duration of the rinse.

[0136] The control module 48, 148 performs the aspiration step through sequential control of valves, more specifically, gas and solvent valves.

[0137] The minimum volume of solvent drawn while the valve is open may be, for example, 0.5 cubic centimeters or more, more specifically 1 cubic centimeter or more, more specifically including between 1 cubic centimeter and 100 cubic centimeters.

[0138] The maximum volume of solvent aspirated while the valve is open may be, for example, up to 1000 cubic centimeters, more specifically included between 300 and 1000 cubic centimeters.

[0139] The gas valves 40, 140 are transitioned to the open configuration for a duration comprised, for example, between 1 and 100 pump cycles, and more specifically, between 4 and 10 cycles.

[0140] At any time, at most one valve in the gas or solvent supply channel is open at a time.

[0141] Specifically, the aspiration comprises the following steps in the following order: - opening a first valve between the gas valve and the solvent valve; - aspirating a first volume of gas or solvent by a metering pump; - closing a first valve; - opening a second valve between the gas valve and the solvent valve, the second valve being different from the first valve; - aspirating a second volume of gas or solvent; - closing the second valve; The above steps are repeated throughout the suction phase of the metering pump 14,114.

[0142] The first volume remains the same throughout the aspiration phase, and more particularly during the entire aspiration phase of the rinse.

[0143] The second volume remains the same throughout the aspiration phase, and more particularly during the entire aspiration phase of the rinse.

[0144] The suction, more specifically herein, comprises a suction cycle including gas suction by a metering pump and solvent suction, said suction cycle being repeated throughout the suction phase, more specifically during the entire suction phase of the rinse.

[0145] If at the end of the aspiration phase a suction cycle is in progress, the aspiration cycle will be restarted from where it was stopped during the next aspiration phase.

[0146] For example, if the volume of aspirated solvent is 32 cc and 55 cc of air for a pump suction volume of 100 cc, then during the first suction stage the volumes are aspirated successively, for example 32 cc of solvent, 55 cc of air and then only 13 cc of solvent, so that the second suction stage starts with the aspirating of 19 cc of solvent, followed by 55 cc of air and 26 cc of solvent, and so on for the subsequent suction stages.

[0147] Herein, the volume aspirated by the metering pump 14, 114 during each of its aspiration stages alternately contains solvent and gas, which is repeated along the aspirated volume.

[0148] Alternatively, the volume of solvent and / or air aspirated is greater than or equal to the suction volume of the pump. If desired, the volume aspirated by the metering pump 14, 114 during the suction phase may contain only solvent or only gas. However, the volume aspirated by the metering pump 14, 114 during its entire suction phase may alternately contain solvent and gas, which is repeated along the aspirated volume.

[0149] For example, with a pump suction volume of 25 cc, if the volume of solvent to be aspirated is 78 cc and the volume of air is 105 cc, multiple suction phases will follow one after the other to pump the correct volumes of air on the one hand and solvent on the other hand.

[0150] The rinsing method advantageously includes detection of the volume aspirated during aspiration by the metering pump, and more specifically by the sensor 46,146.

[0151] In a first embodiment, the detection of the volume of aspirated gas, here air, is performed directly in the metering pump.

[0152] In a second embodiment, detection of the volume of compressed gas, herein compressed air, entering the metering pump is accomplished in the compressor 164, for example, by operating the compressor 164 for a given period of time. Additionally or alternatively, detection of the volume of compressed gas, herein compressed air, entering the metering pump is performed directly in the metering pump.

[0153] During aspiration, as the solvent is aspirated by the metering pump 14, 114, when the amount of aspirated solvent reaches a desired amount, as monitored by the monitoring module 50, 150, the control module 48, 148 sends a command to the solvent valve to switch to a closed configuration and then sends a command to the gas valve to switch to an open configuration.

[0154] Then, for example, and more specifically in the first embodiment, when the amount of aspirated gas reaches a desired amount, as monitored by the monitoring modules 50, 150, the control modules 48, 148 send a command to the gas valve to switch to a closed configuration, and then send a command to the solvent valve to switch to an open configuration, and so on.

[0155] Alternatively, in the second embodiment, when the gas valve 140 and the compressor 164, respectively, remain open and operate for a given period of time, the control modules 48, 148 send a command to the gas valve to switch to a closed configuration, and then send a command to the solvent valve to switch to an open configuration, and so on.

[0156] In the example described, during aspiration, the metering pump 14, 114 also expels a portion of the fluid at the outlet 28, here half the stroke volume of the metering pump.

[0157] Said fluids include solvents and gases, here air, for example compressed air.

[0158] The fluids are premixed by displacement of the piston head, for example in the example pump described with reference to FIG.

[0159] The fluids are mixed, for example, by mixers 45,145 in the outlet lines 44,144.

[0160] An emulsion is created.

[0161] The emulsion flows along exit line 44,144 to applicator 13,113.

[0162] The applicator 13, 113 is thereby also rinsed with emulsion.

[0163] When the metering pump includes an aspiration phase and a non-aspiration phase, during the non-aspiration phase all valves are, for example, in a closed configuration.

[0164] Alternatively, during an aspiration phase, if the volume to be aspirated of the last fluid to be aspirated has not been reached, the corresponding valve remains in an open configuration during a non-aspiration phase and closes when the volume to be aspirated is reached during the next aspiration phase.

[0165] Thereby, the rinsing method includes alternating suction and non-suction steps.

[0166] During the non-aspiration step, in the example described above, the metering pump discharges a replacement portion of the fluid at outlet 28 that was discharged during aspiration, here half the stroke volume of the metering pump.

[0167] As before, the fluids include solvents and gases, here air, for example compressed air.

[0168] The fluids are premixed by displacement of the piston head, for example in the example pump described with reference to FIG.

[0169] The fluids are mixed, for example, by mixers 45,145 in the outlet lines 44,144.

[0170] An emulsion is created.

[0171] The emulsion flows along exit line 44,144 to applicator 13,113.

[0172] The applicator 13, 113 is thereby also rinsed with emulsion.

[0173] This rinsing method is performed directly by the electronic device 24 , 124 of the application device 12 , 112 .

[0174] More specifically, the control modules 48,148 effect aspiration through sequential control of the gas valves 40,140 and the solvent valves 42,142.

[0175] Advantageously, the monitoring module 50,150 enables the amount (in volume and / or time) of solvent and gas drawn by the metering pump 14,114 to be monitored.

[0176] Thus, rinsing can be accomplished without human intervention.

[0177] Additionally, the alternating solvent and gas in the inlet volume of the metering pump creates an emulsion that is used to rinse the coating device, thereby reducing the amount of solvent used for rinsing. [Explanation of symbols]

[0178] 10. Metering Devices 12 Coating device 13 Applicator 14 Metering pump 16 Supply Channels 18 Supply Channels 20 Gas Supply Channel 22 Solvent Supply Channel 24 Electronic Devices 26 Entrance 28 Exit 34 Valve 36 Valves 40 Gas valve 42 Solvent valve 44 Exit Line 45 Mixer 46 Sensors 48 Control Module 50 Monitoring Module 74 Upstream Chamber 76 Downstream Chamber 110 Metering Devices 112 Coating Device 113 Applicator 114 Metering pump 116 Supply Channel 118 Supply Channel 120 Gas Supply Channel 122 Solvent supply channel 124 Electronic Devices 126 Entrance 128 Exit 134 Valve 136 Valve 140 Gas valve 142 Solvent valve 144 Exit Line 145 Mixer 146 Sensors 148 Control Module 150 Monitoring Module 164 Compressor 166 Secondary Solvent Pump

Claims

1. A method for rinsing a coating product application device (12, 112), comprising a metering device (10, 110) and a coating product applicator (13, 113), said metering device (10, 110) comprising a metering pump (14, 114) having an inlet (26, 126) and an outlet (28, 128), said inlet (26, 126) being connected to a gas supply channel (20, 120) and a solvent supply channel (22, 122), said outlet (28, 128) being connected to said coating product applicator (13, 113), said gas supply channel (20, 120) being provided with a gas valve (40, 140) and said solvent supply channel (22, 122) being provided with a solvent valve (42, 142), said gas valve and solvent valve (40, 140) being provided with a solvent valve (40, 140), , 42, 140, 142) each having at least one closed configuration in which said valve (40, 42, 140, 142) blocks passage of a gas or a solvent, respectively, to said inlet and at least one open configuration in which said valve (40, 42, 140, 142) allows passage of a gas or a solvent, respectively, to said inlet, said method comprising at least one step of aspirating a volume by said metering pump (14, 114) during at least one suction phase of said metering pump (14, 114), said gas valve (40, 140) and said solvent valve (42, 142) being alternately in said open configuration during said at least one suction phase such that said volume aspirated during said at least one suction phase alternately contains gas and solvent, The method includes detecting the volume aspirated by the metering pump (14, 114) during the aspiration, and during aspiration, when a volume of aspirated solvent reaches a desired volume, as monitored by a monitoring module (50, 150), a control module (48, 148) sends a command to the solvent valve to switch to the closed configuration and then sends a command to the gas valve to switch to the open configuration, and then when a volume of aspirated gas reaches a desired volume, as monitored by the monitoring module (50, 150), the control module (48, 148) sends a command to the gas valve to switch to the closed configuration and then sends a command to the solvent valve to switch to the open configuration, and so on.

2. 2. The rinsing method of claim 1, wherein the at least one suction stage includes the following steps in the following order: opening a first one of the gas valve (40, 140) and the solvent valve (42, 142); aspirating a first volume of gas or solvent by the metering pump (14, 114); closing the first valve; opening a second one of the gas valve (40, 140) and the solvent valve (42, 142), the second valve being different from the first valve; aspirating a second volume of gas or solvent by the metering pump (14, 114); and closing the second valve, the aforementioned steps being repeated throughout the at least one suction stage.

3. 3. The rinsing method of claim 1 or 2, wherein the aspiration includes an aspiration cycle including the aspiration of gas and the aspiration of solvent by the metering pump (14, 114), the aspiration cycle being repeated throughout the aspiration stage.

4. 3. The rinsing method according to claim 1 or 2, wherein the volume aspirated by the metering pump (14, 114) during the suction is detected by a sensor (46, 146) for the aspirated volume or a sensor for the displacement of the metering pump (14, 114).

5. 3. The method of claim 1 or 2, wherein the metering device further comprises at least two supply channels (16, 18, 116, 118) for the respective component products.

6. 3. The method of claim 1 or 2, wherein the metering pump (14, 114) is a piston pump.

7. 3. The method of claim 1 or 2, wherein the gas supply channel (120) is provided with a compressor (164) suitable for compressing the gas to the inlet (126) of the metering pump (114) upstream of the gas valve (140), and the solvent supply channel (122) is provided with a secondary solvent pump (166) suitable for pumping solvent to the inlet (126) of the metering pump (114), the secondary solvent pump (166) being arranged upstream of the solvent valve (142).

8. 3. The method of claim 1 or 2, wherein the metering device (12, 112) comprises a mixer (45, 145) downstream of the outlet (28, 128) of the metering pump (14, 114).

9. The method of claim 8, wherein the mixer (45, 145) is located proximate to the outlet of the metering pump (14, 114).

10. A coating product application device (12, 112) including a metering device (10, 110) and a coating product applicator (13, 113), said metering device (10, 110) including a metering pump (14, 114), a gas supply channel (20, 120) and a solvent supply channel (22, 122), and a control module (48, 148), said metering pump (14, 114) including an inlet (26, 126) and an outlet (26, 126). 28, 128), said inlet (26, 126) is connected to said gas supply channel (20, 120) and said solvent supply channel (22, 122), said outlet (28, 128) is connected to said coating product applicator (13, 113), said gas supply channel (20, 120) is provided with a gas valve (40, 140), said solvent supply channel (22, 122) is provided with a solvent valve (42, 142), 3. A coating product application device comprising: a control module configured to control the gas valve and the solvent valve, each of which has at least one closed configuration in which the valve blocks passage of a gas or solvent, respectively, to the inlet and at least one open configuration in which the valve allows passage of a gas or solvent, respectively, to the inlet; a control module configured to control the gas valve and the solvent valve, an amount of aspirated solvent and an amount of aspirated gas are monitored by a monitoring module, the control module configured to control the gas valve and the solvent valve, an amount of aspirated solvent and an amount of aspirated gas are monitored by a monitoring module, the control module configured to control the gas valve and the solvent valve,

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