Adhesive for semiconductor, and semiconductor device and method for manufacturing the same

Abstract

To provide an adhesive for semiconductors capable of reducing the post thermal history reaction rate, and a semiconductor device and a method for manufacturing the same using the adhesive for semiconductors.SOLUTION: An adhesive for semiconductors includes a thermoplastic resin, a thermosetting resin, a curing agent, an organic acid and a filler, the organic acid is a compound having two or more acidic functional groups and an acid dissociation constant pKa of 4.0 or less, and the adhesive for semiconductors contains only one type of filler.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present invention relates to an adhesive for semiconductors, as well as a semiconductor device and a method for manufacturing the same. [Background technology]

[0002] Conventionally, the wire bonding method using thin metal wires such as gold wires has been widely used to connect semiconductor chips and substrates.

[0003] In recent years, in order to meet the demands for higher functionality, higher integration, and higher speed for semiconductor devices, the flip-chip connection method (FC connection method) in which conductive protrusions called bumps are formed on a semiconductor chip or substrate to directly connect the semiconductor chip to the substrate is becoming widespread.

[0004] For example, the COB (Chip On Board) type connection method, which is widely used for BGA (Ball Grid Array), CSP (Chip Size Package), etc., in connection between semiconductor chips and substrates, also corresponds to the FC connection method. The FC connection method is also widely used in the COC (Chip On Chip) type connection method, which forms connection parts (bumps or wiring) on ​​semiconductor chips to connect between semiconductor chips, and the COW (Chip On Wafer) type connection method, which forms connection parts (bumps or wiring) on ​​a semiconductor wafer to connect between semiconductor chips and semiconductor wafers (see, for example, Patent Document 1).

[0005] In addition, for packages that are strongly required to be even smaller, thinner, and more functional, chip-stack packages, POP (Package On Package), TSV (Through-Silicon Via), etc., which are stacked and multi-layered versions of the above-mentioned connection methods, are beginning to become widespread. These stacking and multi-layering technologies arrange semiconductor chips and other components three-dimensionally, making the package smaller than methods that arrange them two-dimensionally. In addition, they are effective in improving semiconductor performance, reducing noise, reducing mounting area, and saving power, and are therefore attracting attention as the next-generation semiconductor wiring technology. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] JP 2008-294382 A Summary of the Invention [Problem to be solved by the invention]

[0007] In recent years, from the viewpoint of improving productivity, a process has been proposed in which multiple semiconductor chips are mounted and temporarily fixed on a mounting member (semiconductor chip, semiconductor wafer, wiring circuit board, etc.) via a semiconductor adhesive, and then cured and sealed all at once or separately. In this process, heat (approximately 60 to 155°C) is applied to the stage to an extent that the semiconductor adhesive can flow, and the semiconductor chips are temporarily fixed to the mounting member, and then the semiconductor adhesive is reflowed or permanently pressed at a temperature above the melting point of the connection (for example, approximately 260°C), and the semiconductor adhesive is cured all at once or separately. This process allows multiple packages to be produced efficiently.

[0008] In the above process, since the semiconductor chips are mounted sequentially, the semiconductor chips mounted first and the semiconductor adhesive continue to be subjected to a thermal history by the stage until the mounting of the last semiconductor chip is completed. Therefore, when the number of semiconductor chips increases, the hardening of the semiconductor adhesive that temporarily fixes the semiconductor chips mounted first progresses partially, and voids tend to remain without being removed by the pressure applied during the collective hardening. In order to solve this problem, the semiconductor adhesive is required to have excellent heat history resistance, that is, to be able to suppress the progress of the hardening reaction due to the thermal history during the temporary fixing.

[0009] Therefore, an object of the present invention is to provide a semiconductor adhesive capable of reducing the reaction rate after thermal history. Another object of the present invention is to provide a semiconductor device using the semiconductor adhesive and a method for manufacturing the same. [Means for solving the problem]

[0010] In order to achieve the above-mentioned object, the present invention provides an adhesive for semiconductors comprising a thermoplastic resin, a thermosetting resin, a curing agent and an organic acid, wherein the organic acid is a compound having two or more acidic functional groups and an acid dissociation constant pKa of 4.0 or less.

[0011] The organic acid has two or more acidic functional groups and has an acid dissociation constant pKa of 4.0 or less, and thus can form a strong salt with at least a part of the curing agent. The curing agent and the organic acid form a salt, thereby inhibiting the reaction between the curing agent and the thermosetting resin. Therefore, the adhesive for semiconductors containing the organic acid can suppress the progress of the curing reaction between the curing agent and the thermosetting resin due to the thermal history during temporary fixing, and can reduce the reaction rate after the thermal history. During the main pressure bonding, heat at a temperature higher than the thermal history due to the stage during temporary fixing is applied, so that the curing agent and the organic acid that have formed the salt are separated. As a result, during the main pressure bonding, the separated curing agent reacts with the thermosetting resin, and a semiconductor device in which the remaining voids are suppressed can be obtained.

[0012] The acidic functional group may contain at least one group selected from the group consisting of a carboxyl group, a sulfoxyl group, and a phosphoric acid group. The acidic functional group is not particularly limited as long as it is an acidic functional group capable of forming a salt with the basic functional group contained in the curing agent, and the organic acid may contain multiple types of acidic functional groups.

[0013] The equivalent ratio of the acidic functional group contained in the organic acid to the basic functional group contained in the curing agent may be 1.0 or more. By setting the equivalent ratio to 1.0 or more, the amount of the curing agent that has not reacted with the organic acid before the main pressure bonding is reduced, and the reaction rate after the thermal history can be reduced more than when the equivalent ratio is less than 1.0.

[0014] The organic acid may include a compound represented by the following general formula (1-1), (1-2) or (1-3). [ka] [ka] [ka] [In formulas (1-1), (1-2) and (1-3), R 1 represents an electron-withdrawing group, and R 2 represents a hydrogen atom or an electron-withdrawing group, R 3 represents a hydrogen atom or a monovalent organic group, X represents an oxygen atom or a sulfur atom, n 1 represents an integer from 0 to 15, and n 2 and n 3 are n 2 +n 3 represents an integer of 1 or more selected so that the integer is an integer of 2 to 15, and m represents 1 or 2. 3 may be the same or different.]

[0015] The melting point of the organic acid may be 50 to 250° C. Such an organic acid exhibits sufficient flux activity before the curing reaction between the thermosetting resin and the curing agent occurs, and therefore, a semiconductor adhesive containing the organic acid can realize a semiconductor device with even more excellent connection reliability.

[0016] The curing agent may include an amine-based curing agent, which exhibits excellent curing properties through a curing reaction between the thermosetting resin and the curing agent, and can further improve the reflow resistance of the semiconductor device.

[0017] The curing agent may include an imidazole-based curing agent. By using such a compound, the stability of the adhesive for semiconductors can be further improved.

[0018] The structure of the imidazole-based curing agent may be a structure containing a triazine ring. By using such a compound, the stability of the semiconductor adhesive can be further improved.

[0019] The present invention also provides a method for manufacturing a semiconductor device in which the respective connection portions of a semiconductor chip and a wiring circuit board are electrically connected to each other, or a semiconductor device in which the respective connection portions of a plurality of semiconductor chips are electrically connected to each other, comprising a sealing step of curing the semiconductor adhesive of the present invention by applying heat under normal pressure or a pressurized atmosphere, and sealing at least a portion of the connection portions with the cured semiconductor adhesive.

[0020] The manufacturing method may further include a step of arranging a plurality of semiconductor chips on a stage prior to the sealing step, and a temporary fixing step of sequentially arranging other semiconductor chips on each of the plurality of semiconductor chips arranged on the stage via the semiconductor adhesive while heating the stage to 60 to 155°C, thereby obtaining a plurality of laminates in which the semiconductor chips, the semiconductor adhesive and the other semiconductor chips are stacked in this order.

[0021] Alternatively, the manufacturing method may further include a step of arranging a wiring circuit board or a semiconductor wafer on a stage prior to the sealing step, and a temporary fixing step of sequentially arranging a plurality of semiconductor chips on the wiring circuit board or semiconductor wafer arranged on the stage via the semiconductor adhesive while heating the stage to 60 to 155°C, to obtain a laminate in which the wiring circuit board, the semiconductor adhesive, and a plurality of the semiconductor chips are stacked in this order, or a laminate in which the semiconductor wafer, the semiconductor adhesive, and a plurality of the semiconductor chips are stacked in this order.

[0022] The present invention further provides a semiconductor device in which the respective connection portions of a semiconductor chip and a wiring circuit board are electrically connected to each other, or a semiconductor device in which the respective connection portions of a plurality of semiconductor chips are electrically connected to each other, wherein at least a portion of the connection portions is sealed with a cured product of the semiconductor adhesive of the present invention that has been cured by applying heat under normal pressure or a pressurized atmosphere. Effect of the Invention

[0023] According to the present invention, in a process in which a plurality of semiconductor chips are temporarily fixed on a mounting member via a semiconductor adhesive and cured and sealed all at once, it is possible to reduce voids that may remain in the semiconductor adhesive. According to the present invention, it is possible to provide a semiconductor adhesive that can reduce such voids and enables the fabrication of a semiconductor device with excellent connectivity, as well as a semiconductor device and a method for fabricating the same that use the semiconductor adhesive. [Brief description of the drawings]

[0024] [Figure 1] 1 is a schematic cross-sectional view showing an embodiment of a semiconductor device; [Diagram 2] 1 is a schematic cross-sectional view showing an embodiment of a semiconductor device; [Diagram 3] 1 is a schematic cross-sectional view showing an embodiment of a semiconductor device; [Figure 4] FIG. 1 is a circuit diagram of a semiconductor chip used in evaluating connectivity. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0025] Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings as needed. In the drawings, the same or corresponding parts are given the same reference numerals, and duplicated explanations will be omitted. Furthermore, unless otherwise specified, the positional relationships such as up, down, left, and right are based on the positional relationships shown in the drawings. Furthermore, the dimensional ratios of the drawings are not limited to the ratios shown in the drawings.

[0026] The upper and lower limit values ​​of the numerical ranges described in this specification can be combined in any combination. The numerical values ​​described in the examples can also be used as the upper or lower limit values ​​of the numerical ranges. In this specification, "(meth)acrylic" means acrylic or its corresponding methacrylic.

[0027] <Semiconductor adhesive and its manufacturing method> The semiconductor adhesive of this embodiment contains a thermoplastic resin (hereinafter sometimes referred to as "component (a)"), a thermosetting resin (hereinafter sometimes referred to as "component (b)"), a curing agent (hereinafter sometimes referred to as "component (c)"), and an organic acid (hereinafter sometimes referred to as "component (d)"). The semiconductor adhesive of this embodiment may contain a filler (hereinafter sometimes referred to as "component (e)") as necessary.

[0028] The heat generation amount of the DSC curve obtained by differential scanning calorimetry (DSC) of the semiconductor adhesive of this embodiment at 60 to 155°C may be 20 J / g or less. Here, the differential scanning calorimetry is performed by heating the semiconductor adhesive in an air or nitrogen atmosphere with a weight of 10 mg of the sample semiconductor adhesive, a measurement temperature range of 30 to 300°C, and a temperature rise rate of 10°C / min. The heat generation amount is calculated by integrating the peak area.

[0029] Conventional semiconductor adhesives have an exothermic peak in the temperature range of 60 to 155 ° C. on the DSC curve. It is presumed that the heat generation in this temperature range is due to the reaction between the thermosetting resin and the organic acid in the semiconductor adhesive, and that as this reaction progresses, the semiconductor adhesive partially hardens and its fluidity decreases. On the other hand, the temporary fixing of semiconductor chips with a semiconductor adhesive is usually performed by heating the semiconductor adhesive to, for example, 60 to 155 ° C. and causing it to flow appropriately. Therefore, if a conventional semiconductor adhesive is used in a process in which multiple semiconductor chips are mounted and temporarily fixed on a mounting member (semiconductor chip, semiconductor wafer, wiring circuit board, etc.) via a semiconductor adhesive, and then cured and sealed all at once under pressure conditions, it is presumed that when the semiconductor chips are temporarily fixed, the thermosetting resin in the semiconductor adhesive reacts with the organic acid, causing the semiconductor adhesive to partially harden, and the adhesive may not flow sufficiently when cured all at once under pressure conditions. On the other hand, in the semiconductor adhesive of this embodiment, when the heat generation amount at 60 to 155°C of the DSC curve is 20 J / g or less, the curing does not proceed easily in the temperature range (for example, 60 to 155°C) where the semiconductor chip is temporarily fixed. Therefore, by using a semiconductor adhesive that satisfies the above heat generation condition in the above process, it is possible to temporarily fix multiple semiconductor chips while maintaining sufficient fluidity of the semiconductor adhesive, and it is possible to reduce the occurrence of voids during collective curing. Furthermore, as a result of reducing the occurrence of voids, it is expected that defects (peeling of the semiconductor adhesive, poor electrical connection at the connection, etc.) are less likely to occur even if the adhesive is heated at a temperature (for example, 260°C) above the melting point of the connection in the reflow process. In other words, a semiconductor adhesive that satisfies the above heat generation condition tends to improve reflow reliability (reflow resistance) in the manufacture of semiconductor devices.

[0030] The calorific value of the DSC curve from 60 to 155°C is preferably 15 J / g or less, more preferably 10 J / g or less, and even more preferably 5 J / g or less, from the viewpoint of easily obtaining the effects of the present invention. The calorific value of the DSC curve from 60 to 155°C may be 20% or less, 15% or less, or 10% or less of the calorific value of the DSC curve from 60 to 280°C, from the viewpoint of easily obtaining the effects of the present invention. The calorific value of the DSC curve from 60 to 280°C may be 50 J / g or more or 100 J / g or more, and may be 200 J / g or less or 180 J / g or less, or may be 50 to 200 J / g, 100 to 200 J / g, or 100 to 180 J / g, from the viewpoint of easily obtaining the effects of the present invention. It is preferable that the DSC curve does not have an exothermic peak with an onset temperature of 155°C or less, from the viewpoint of easily obtaining the effects of the present invention.

[0031] Hereinafter, each component constituting the semiconductor adhesive of this embodiment will be described.

[0032] (a) Thermoplastic resin The (a) component is not particularly limited, but examples thereof include phenoxy resin, polyimide resin, polyamide resin, polycarbodiimide resin, cyanate ester resin, acrylic resin, polyester resin, polyethylene resin, polyethersulfone resin, polyetherimide resin, polyvinyl acetal resin, urethane resin, and acrylic rubber. Among these, from the viewpoint of excellent heat resistance and film formability, phenoxy resin, polyimide resin, acrylic resin, acrylic rubber, cyanate ester resin, and polycarbodiimide resin are preferred, and phenoxy resin, polyimide resin, and acrylic resin are more preferred. These (a) components can be used alone, or can be used as a mixture or copolymer of two or more kinds.

[0033] The weight average molecular weight (Mw) of the (a) component is preferably 10,000 or more, more preferably 40,000 or more, and even more preferably 60,000 or more. Such a (a) component can further improve the film formability and heat resistance of the adhesive. In addition, when the weight average molecular weight is 10,000 or more, flexibility is easily imparted to the film-shaped semiconductor adhesive, so that more excellent processability is easily obtained. In addition, the weight average molecular weight of the (a) component is preferably 1,000,000 or less, and more preferably 500,000 or less. Such a (a) component reduces the viscosity of the film, so that embedding into bumps is improved, and mounting can be performed with even less voids. From these viewpoints, the weight average molecular weight of the (a) component is preferably 10,000 to 1,000,000, more preferably 40,000 to 500,000, and even more preferably 60,000 to 500,000.

[0034] In this specification, the weight average molecular weight refers to a weight average molecular weight measured using GPC (gel permeation chromatography) in terms of polystyrene. An example of the measurement conditions for the GPC method is shown below. Equipment: HCL-8320GPC, UV-8320 (product name, manufactured by Tosoh Corporation), or HPLC-8020 (product name, manufactured by Tosoh Corporation) Column: TSKgel superMultiporeHZ-M x 2, or 2 pieces of GMHXL + 1 piece of G-2000XL Detector: RI or UV detector Column temperature: 25-40℃ Eluent: A solvent that dissolves polymer components is selected. Examples of the solvent include THF (tetrahydrofuran), DMF (N,N-dimethylformamide), DMA (N,N-dimethylacetamide), NMP (N-methylpyrrolidone), and toluene. When a polar solvent is selected, the phosphoric acid concentration may be adjusted to 0.05 to 0.1 mol / L (usually 0.06 mol / L) and the LiBr concentration may be adjusted to 0.5 to 1.0 mol / L (usually 0.63 mol / L). Flow rate: 0.30~1.5mL / min Standard material: polystyrene

[0035] (a) Component content C a Content of component (b) C b Ratio of C b / C a (mass ratio) is preferably 0.01 or more, more preferably 0.1 or more, even more preferably 1 or more, and is preferably 5 or less, more preferably 4.5 or less, even more preferably 4 or less. b / C a By making the ratio C 0.01 or more, better curing properties and adhesive strength can be obtained. b / C a By setting the ratio C to 5 or less, better film formability can be obtained. b / C a is preferably 0.01 to 5, more preferably 0.1 to 4.5, and further preferably 1 to 4.

[0036] From the viewpoint of improving connection reliability, the glass transition temperature of the component (a) is preferably -50°C or higher, more preferably -40°C or higher, and even more preferably -30°C or higher, and from the viewpoint of lamination, it is preferably 220°C or lower, more preferably 200°C or lower, and even more preferably 180°C or lower. The glass transition temperature of the component (a) is preferably -50 to 220°C, more preferably -40 to 200°C, and even more preferably -30 to 180°C. According to such an adhesive for semiconductors containing the component (a), the amount of wafer warpage can be further reduced during a mounting process at the wafer level, and the heat resistance and film formability of the adhesive for semiconductors can be further improved. The glass transition temperature of the component (a) can be measured by a differential scanning calorimeter (DSC).

[0037] The content of the component (a) is preferably 30% by mass or less, more preferably 25% by mass or less, and even more preferably 20% by mass or less, based on the total solid content of the semiconductor adhesive. When the content of the component (a) is 30% by mass or less, the semiconductor adhesive can obtain good reliability during a temperature cycle test, and can obtain good adhesive strength at a reflow temperature of about 260°C even after moisture absorption. In addition, the content of the component (a) is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more, based on the total solid content of the semiconductor adhesive. When the content of the component (a) is 1% by mass or more, the semiconductor adhesive can further reduce the amount of wafer warpage during a mounting process at the wafer level, and can further improve the heat resistance and film formability of the semiconductor adhesive. When the content of the component (a) is 5% by mass or more, the occurrence of burrs and chips during external processing into a wafer shape can be suppressed. From the above viewpoints, and from the viewpoint of easily imparting flexibility to a film-like semiconductor adhesive and easily achieving even better processability, the content of component (a) is preferably 1 to 30 mass%, more preferably 3 to 30 mass%, and even more preferably 5 to 30 mass%, based on the total solid content of the semiconductor adhesive. Note that "total solid content of the semiconductor adhesive" refers to the total amount of the semiconductor adhesive minus the amount of the solvent contained in the semiconductor adhesive. In this specification, "total solid content of the semiconductor adhesive" may be rephrased as "total amount of components (a) to (e)".

[0038] (b) Thermosetting resin As component (b), any component having two or more reactive groups in the molecule can be used without any particular restrictions. By including a thermosetting resin in the semiconductor adhesive, the adhesive can be cured by heating, and the cured adhesive exhibits high heat resistance and adhesive strength to the chip, resulting in excellent reflow resistance.

[0039] Examples of the (b) component include epoxy resins, phenolic resins, imide resins, urea resins, melamine resins, silicone resins, (meth)acrylic compounds, and vinyl compounds. Among these, from the viewpoint of excellent heat resistance (reflow resistance) and storage stability, epoxy resins, phenolic resins, and imide resins are preferred, epoxy resins and imide resins are more preferred, and epoxy resins are even more preferred. These (b) components can be used alone, or can be used as a mixture or copolymer of two or more kinds. Among conventional semiconductor adhesives, particularly when the thermosetting resin is an epoxy resin, a melamine resin, or a urea resin, a reaction with an organic acid described later tends to proceed in the temperature range of 60 to 155 ° C., and partial curing tends to proceed before the overall curing, but in this embodiment, even if the thermosetting resin contains at least one resin selected from the group consisting of epoxy resins, melamine resins, and urea resins, such a reaction and partial curing are unlikely to occur.

[0040] Examples of epoxy resins and imide resins that can be used include bisphenol A type epoxy resins, bisphenol F type epoxy resins, naphthalene type epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins, phenol aralkyl type epoxy resins, biphenyl type epoxy resins, triphenylmethane type epoxy resins, dicyclopentadiene type epoxy resins, and various polyfunctional epoxy resins, nadimide resins, allylnadimide resins, maleimide resins, amide imide resins, imide acrylate resins, various polyfunctional imide resins, and various polyimide resins. These can be used alone or as a mixture of two or more.

[0041] With respect to component (b), in order to prevent decomposition and generation of volatile components during connection at high temperatures, it is preferable to use one whose thermal weight loss rate at 250°C is 5% or less when the temperature during connection is 250°C, and it is preferable to use one whose thermal weight loss rate at 300°C is 5% or less when the temperature during connection is 300°C.

[0042] The content of the (b) component is, for example, 5% by mass or more, preferably 15% by mass or more, and more preferably 30% by mass or more, based on the total solid content of the adhesive for semiconductors. The content of the (b) component is, for example, 80% by mass or less, preferably 70% by mass or less, and more preferably 60% by mass or less, based on the total solid content of the adhesive for semiconductors. The content of the (b) component is, for example, 5 to 80% by mass, preferably 15 to 70% by mass, and more preferably 30 to 60% by mass, based on the total solid content of the adhesive for semiconductors.

[0043] (c) Hardener The (c) component may be a curing agent capable of forming a salt with an organic acid described later. Examples of the (c) component include amine-based curing agents (amines) and imidazole-based curing agents (imidazoles). When the (c) component contains an amine-based curing agent or an imidazole-based curing agent, it exhibits flux activity that suppresses the formation of an oxide film at the connection portion, and can improve connection reliability and insulation reliability. When the (c) component contains an amine-based curing agent or an imidazole-based curing agent, storage stability is further improved, and decomposition or deterioration due to moisture absorption tends to be less likely to occur. Furthermore, when the (c) component contains an amine-based curing agent or an imidazole-based curing agent, it becomes easy to adjust the curing speed, and the fast curing property makes it easy to realize short-time connection for the purpose of improving productivity.

[0044] Each curing agent will be described below.

[0045] (i) Amine-based hardeners As the amine-based curing agent, for example, dicyandiamide can be used.

[0046] The content of the amine-based curing agent is preferably 0.1 parts by mass or more, preferably 10 parts by mass or less, and more preferably 5 parts by mass or less, relative to 100 parts by mass of the above component (b). When the content of the amine-based curing agent is 0.1 parts by mass or more, the curability tends to improve, and when it is 10 parts by mass or less, the adhesive for semiconductors does not cure before the metal bond is formed, and connection failure tends to be less likely to occur. From these viewpoints, the content of the amine-based curing agent is preferably 0.1 to 10 parts by mass, more preferably 0.1 to 5 parts by mass, relative to 100 parts by mass of the above component (b).

[0047] (ii) Imidazole-based curing agents Examples of the imidazole-based curing agent include 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyano-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazole trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine, and 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine. -[2'-undecylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, and adducts of epoxy resins and imidazoles. Among these, from the viewpoints of excellent curing properties, storage stability and connection reliability, 1-cyanoethyl-2-undecylimidazole, 1-cyano-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazole trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole and 2-phenyl-4-methyl-5-hydroxymethylimidazole are preferred. These may be used alone or in combination of two or more kinds. They may also be microencapsulated to form latent curing agents.

[0048] The content of the imidazole-based curing agent is preferably 0.1 parts by mass or more, preferably 10 parts by mass or less, more preferably 5 parts by mass or less, and even more preferably 2.3 parts by mass or less, relative to 100 parts by mass of the (b) component. When the content of the imidazole-based curing agent is 0.1 parts by mass or more, the curability tends to improve. When the content of the imidazole-based curing agent is 10 parts by mass or less, the semiconductor adhesive does not cure before the metal bond is formed, and connection failure is unlikely to occur, and the generation of voids is easily suppressed in the curing process under a pressurized atmosphere. From these viewpoints, the content of the imidazole-based curing agent is preferably 0.1 to 10 parts by mass, more preferably 0.1 to 5 parts by mass, and more preferably 0.1 to 2.3 parts by mass, relative to 100 parts by mass of the (b) component.

[0049] The (c) component can be used alone or in a mixture of two or more. For example, an imidazole-based curing agent can be used alone or together with an amine-based curing agent. As the (c) component, a curing agent other than the above that functions as a curing agent for the (b) component can also be used.

[0050] The content of the (c) component is preferably 0.5 parts by mass or more, preferably 20 parts by mass or less, more preferably 6 parts by mass or less, and even more preferably 4 parts by mass or less, relative to 100 parts by mass of the (b) component. When the content of the (c) component is 0.5 parts by mass or more, curing tends to proceed sufficiently. When the content of the (c) component is 20 parts by mass or less, the curing tends to be suppressed from proceeding too quickly and increasing the number of reaction points, and the reliability tends to be prevented from decreasing due to shortening of molecular chains and remaining unreacted groups, and in addition, it is easy to suppress the remaining of voids during curing under a pressurized atmosphere. From these viewpoints, the content of the (c) component is preferably 0.2 to 20 parts by mass, more preferably 0.5 to 6 parts by mass, and even more preferably 0.5 to 4 parts by mass, relative to 100 parts by mass of the (b) component.

[0051] The content of the (c) component is preferably 0.5% by mass or more, preferably 2.3% by mass or less, more preferably 2.0% by mass or less, and even more preferably 1.5% by mass or less, based on the total solid content of the adhesive for semiconductors. When the content of the (c) component is 0.5% by mass or more, curing tends to proceed sufficiently. When the content of the (c) component is 2.3% by mass or less, the curing tends to proceed rapidly and the reaction points tend to be suppressed from increasing, and the reliability tends to be prevented from decreasing due to the shortening of the molecular chain or the remaining of unreacted groups, and in addition, it is easy to suppress the remaining of voids during curing under a pressurized atmosphere. From these viewpoints, the content of the (c) component is preferably 0.5 to 2.3% by mass, more preferably 0.5 to 2.0% by mass, based on the total solid content of the adhesive for semiconductors.

[0052] When the adhesive for semiconductors contains an amine-based curing agent as component (c), excellent curing properties are exhibited by the curing reaction with the epoxy resin, and the reflow resistance of the semiconductor device can be further improved.

[0053] (d)Organic acid Component (d) is an organic acid. By including component (d) in the semiconductor adhesive, the metal oxide film on the connection portion and the coating caused by the OSP treatment can be removed, making it easier to obtain excellent connection reliability.

[0054] Component (d) has two or more acidic functional groups. Also, component (d) has an acid dissociation constant pKa of 4.0 or less. Because component (d) has two or more acidic functional groups and an acid dissociation constant pKa of 4.0 or less, the adhesive for semiconductors can reduce the post-thermal history reaction rate due to the thermal history during temporary fixing.

[0055] Since component (d) has two or more acidic functional groups, it may have multiple acid dissociation constants. The acid dissociation constant pKa of 4.0 or less means that at least one of the multiple acid dissociation constants has a value of 4.0 or less.

[0056] The acid dissociation constant pKa of component (d) is 4.0 or less, preferably 3.5 or less, and more preferably 2.5 or less. The acid dissociation constant pKa of component (d) is preferably 1.0 or more, more preferably 1.5 or more, and even more preferably 2.0 or more. By making the acid dissociation constant pKa of component (d) 4.0 or less, it forms a stronger salt with the basic functional group, and the reaction with the epoxy resin is suppressed.

[0057] The (d) component may contain at least one group selected from the group consisting of a carboxyl group, a sulfoxyl group, and a phosphate group as an acidic functional group. The acidic functional group is not particularly limited as long as it is an acidic functional group capable of forming a salt with a basic functional group contained in the curing agent. When the (d) component is a compound having a carboxyl group (e.g., a carboxylic acid), it is easy to obtain even better connection reliability. Since the (d) component is a compound having a carboxyl group (e.g., a carboxylic acid), from the viewpoint of easily obtaining the effects of the present invention, it is preferable that the (b) component is at least one thermosetting resin selected from the group consisting of an epoxy resin, a urethane resin, and a urea resin, and the (c) component is at least one curing agent selected from the group consisting of an amine-based curing agent and an imidazole-based curing agent. The (d) component may further have an acid group other than a carboxyl group, a sulfoxyl group, or a phosphate group.

[0058] Examples of the component (d) include compounds having a structure represented by the following general formula (1-1), (1-2), or (1-3). [ka] [ka] [ka]

[0059] In formulas (1-1) to (1-3), R 1 represents an electron-withdrawing group, and R 2represents a hydrogen atom or an electron-withdrawing group, R 3 represents a hydrogen atom or a monovalent organic group, X represents an oxygen atom or a sulfur atom, n 1 represents an integer from 0 to 15, and n 2 and n 3 are n 2 +n 3 represents an integer of 1 or more selected so that the integer is an integer of 2 to 15, and m represents 1 or 2. 3 may be the same or different from each other.

[0060] Examples of the electron-withdrawing group include a sulfonyl group, a nitro group, a cyano group, a halogen group, and a carbonyl group. The (d) component may have two or more kinds of electron-withdrawing groups. The α-position carbon of the acidic functional group in the (d) component may constitute a part of the electron-withdrawing group. For example, in the above formula (1-2), the α-position carbon of the acidic functional group is a part of the carbonyl group. That is, it can be said that the (d) component has a structure in which the electron-withdrawing group is directly bonded to the α-position carbon of the acidic functional group, or a structure in which the α-position carbon of the acidic functional group constitutes a part of the electron-withdrawing group. From the viewpoint of easily obtaining excellent flux activity and easily obtaining the effects of the present invention, the electron-withdrawing group preferably contains at least one selected from the group consisting of a cyano group, a halogen group, and a carbonyl group, and more preferably contains a carbonyl group.

[0061] The component (d) is preferably a compound having 1 to 3 acidic functional groups, more preferably a compound having 1 to 3 carboxyl groups as the acidic functional groups. The component (d) preferably contains at least one selected from the group consisting of monocarboxylic acids, dicarboxylic acids, and tricarboxylic acids. When a component (d) having 1 to 3 carboxyl groups is used, the viscosity increase of the semiconductor adhesive during storage, connection work, etc. can be further suppressed compared to when a compound having 4 or more carboxyl groups is used, and the connection reliability of the semiconductor device can be further improved.

[0062] It is more preferable that the component (d) is a compound having two carboxyl groups (dicarboxylic acid). In the case of a dicarboxylic acid, compared with a compound having one carboxyl group (monocarboxylic acid), it is less likely to volatilize even at high temperatures during connection, and the occurrence of voids can be further suppressed. In addition, when a compound having two carboxyl groups is used, the viscosity increase of the semiconductor adhesive during storage, connection work, etc. can be further suppressed compared with the case of using a compound having three or more carboxyl groups, and the connection reliability of the semiconductor device can be further improved.

[0063] The melting point of the (d) component is preferably 50°C or higher, more preferably 60°C or higher, and even more preferably 70°C or higher, and is preferably 250°C or lower, more preferably 150°C or lower, and even more preferably 130°C or lower. When the melting point of the (d) component is 250°C or lower, the flux activity is easily expressed sufficiently before the curing reaction between the thermosetting resin and the curing agent occurs. Therefore, according to such a semiconductor adhesive containing the (d) component, the (d) component melts when the chip is mounted, and the oxide film on the solder surface is removed, thereby realizing a semiconductor device with even better connection reliability. In addition, when the (d) component has a melting point of 50°C or higher, the reaction is less likely to start at room temperature or on a high-temperature stage, and the storage stability is even better. From these viewpoints, the melting point of the (d) component is preferably 50 to 250°C, more preferably 60 to 150°C, and even more preferably 70 to 130°C.

[0064] (d) The melting points of components can be measured using a general melting point measuring device. The sample to be measured for melting point is ground into a fine powder and a small amount is used to minimize the temperature deviation within the sample. A capillary tube with one end closed is often used as a sample container, but some measuring devices use a container sandwiched between two microscope cover glasses. In addition, if the temperature is increased suddenly, a temperature gradient will occur between the sample and the thermometer, causing measurement errors, so it is desirable to increase the temperature at the time of measuring the melting point at a rate of less than 1°C per minute.

[0065] As mentioned above, since the sample is prepared as a fine powder, the sample is opaque before melting due to diffuse reflection on the surface. The lower limit of the melting point is usually the temperature at which the sample begins to become transparent, and the upper limit is the temperature at which the sample is completely melted. There are various types of measuring devices, but the most classic device is a device in which a capillary tube filled with the sample is attached to a double-tube thermometer and heated in a hot bath. A highly viscous liquid is used as the hot bath liquid in order to attach the capillary tube to the double-tube thermometer, and concentrated sulfuric acid or silicone oil is often used, and the sample is attached so that it is close to the reservoir at the tip of the thermometer. In addition, a melting point measuring device can also be used that uses a metal heat block for heating, and automatically determines the melting point by adjusting the heating while measuring the light transmittance.

[0066] In this specification, a melting point of 250°C or lower means that the upper limit of the melting point is 250°C or lower, and a melting point of 50°C or higher means that the lower limit of the melting point is 50°C or higher.

[0067] Specific examples of the (d) component include oxalic acid, malonic acid, α-ketoglutaric acid (2-oxoglutaric acid), 2,2'-thiodiglycolic acid, glycolic acid, 2-oxo-1,3-propanedisulfonic acid, benzenedisulfonic acid, naphthalenedisulfonic acid, 3-phosphonopropionic acid, and 4-phosphonobutyric acid. Among these, from the viewpoint of easily obtaining excellent flux activity and easily obtaining the effects of the present invention, oxalic acid, malonic acid, α-ketoglutaric acid, 2,2'-thiodiglycolic acid, and glycolic acid are preferred, and α-ketoglutaric acid is particularly preferred. These can be used alone or in combination of two or more.

[0068] The content of component (d) is preferably 0.1% by mass or more, preferably 10% by mass or less, more preferably 5% by mass or less, and even more preferably 2% by mass or less, based on the total solid content of the adhesive for semiconductor devices. From the viewpoint of connection reliability and reflow resistance during semiconductor device fabrication, the content of component (d) is preferably 0.1 to 10% by mass, more preferably 0.1 to 5% by mass, and even more preferably 0.1 to 2% by mass, based on the total solid content of the adhesive for semiconductor devices. In addition, when an organic acid corresponds to components (a) to (c), the content of component (d) is calculated assuming that the compound also corresponds to component (d).

[0069] In this embodiment, the equivalent ratio (acidic functional group / basic functional group, molar ratio) of the acidic functional groups in the total amount of component (d) to the basic functional groups in the total amount of component (c) is preferably 1.0 or more and 3.0 or less, more preferably 1.3 or more, even more preferably 1.5 or more, more preferably 2.5 or less, even more preferably 2.0 or less.

[0070] (e) Filler The semiconductor adhesive of this embodiment may contain a filler (component (e)) as necessary. Component (e) makes it possible to control the viscosity of the semiconductor adhesive, the physical properties of the cured product of the semiconductor adhesive, and the like. Specifically, component (e) makes it possible, for example, to suppress the generation of voids during connection, reduce the moisture absorption rate of the cured product of the semiconductor adhesive, and the like.

[0071] The component (e) may be an insulating inorganic filler, whiskers, a resin filler, etc. The component (e) may be used alone or in combination of two or more kinds.

[0072] Examples of insulating inorganic fillers include glass, silica, alumina, titanium oxide, carbon black, mica, and boron nitride. Among these, silica, alumina, titanium oxide, and boron nitride are preferred, and silica, alumina, and boron nitride are more preferred.

[0073] Whiskers include, for example, aluminum borate, aluminum titanate, zinc oxide, calcium silicate, magnesium sulfate, and boron nitride.

[0074] Examples of the resin filler include fillers made of resins such as polyurethane and polyimide.

[0075] Resin fillers have a smaller thermal expansion coefficient than organic components (epoxy resins, curing agents, etc.), and therefore are excellent in improving connection reliability. In addition, resin fillers allow easy adjustment of the viscosity of the semiconductor adhesive. In addition, resin fillers are excellent in stress relief compared to inorganic fillers.

[0076] Since inorganic fillers have a smaller coefficient of thermal expansion than resin fillers, the adhesive composition can have a lower coefficient of thermal expansion by using inorganic fillers. In addition, inorganic fillers are often general-purpose products with controlled particle size, which makes them suitable for viscosity adjustment.

[0077] Since the resin filler and the inorganic filler each have advantageous effects, either one may be used depending on the application, or both may be mixed and used to exert the functions of both.

[0078] There are no particular limitations on the shape, particle size, and content of component (e). Furthermore, component (e) may have its physical properties appropriately adjusted by surface treatment.

[0079] The content of component (e) is preferably 10% by mass or more, more preferably 15% by mass or more, and preferably 80% by mass or less, more preferably 60% by mass or less, based on the total solid content of the adhesive for semiconductors. The content of component (e) is preferably 10 to 80% by mass, more preferably 15 to 60% by mass, based on the total solid content of the adhesive for semiconductors.

[0080] The component (e) is preferably made of an insulating material. If the component (e) is made of a conductive material (e.g., solder, gold, silver, copper, etc.), the insulation reliability (especially HAST resistance) may decrease.

[0081] (Other Ingredients) The semiconductor adhesive of the present embodiment may contain additives such as antioxidants, silane coupling agents, titanium coupling agents, leveling agents, and ion trapping agents. These may be used alone or in combination of two or more. The amounts of these additives may be appropriately adjusted so that the effects of each additive are exerted.

[0082] The adhesive for semiconductors of this embodiment may be in the form of a film. In this case, the workability can be improved when sealing the gap between a semiconductor chip and a wiring board or the gap between a plurality of semiconductor chips by the pre-applied method. An example of a method for producing the adhesive for semiconductors (film-like adhesive) of this embodiment formed into a film shape is shown below.

[0083] First, components (a), (b), (c), and (d), as well as component (e) which is added as necessary, are added to an organic solvent, and dissolved or dispersed by stirring, mixing, kneading, etc. to prepare a resin varnish. Thereafter, the resin varnish is applied onto a release-treated substrate film using a knife coater, roll coater, applicator, etc., and the organic solvent is removed by heating, whereby a film-like adhesive can be formed on the substrate film.

[0084] The thickness of the film-like adhesive is not particularly limited, but is, for example, preferably 0.5 to 1.5 times, more preferably 0.6 to 1.3 times, and even more preferably 0.7 to 1.2 times the height of the bump before connection.

[0085] When the thickness of the film-like adhesive is 0.5 times or more the height of the bump, it is possible to sufficiently suppress the occurrence of voids due to unfilled adhesive, and it is possible to further improve the connection reliability. Also, when the thickness is 1.5 times or less, it is possible to sufficiently suppress the amount of adhesive pushed out from the chip connection area during connection, and it is possible to sufficiently prevent the adhesive from adhering to unnecessary parts. When the thickness of the film-like adhesive is more than 1.5 times, the bump must eliminate a lot of adhesive, which is likely to cause poor conduction. Also, in response to the weakening of the bumps due to narrower pitches and more pins (miniaturization of the bump diameter), it is not preferable to eliminate a lot of resin because it will cause greater damage to the bumps.

[0086] Considering that the bump height is generally 5 to 100 μm, the thickness of the film-like adhesive is preferably 2.5 to 150 μm, and more preferably 3.5 to 120 μm.

[0087] The organic solvent used in the preparation of the resin varnish is preferably one that has the property of uniformly dissolving or dispersing each component, and examples thereof include dimethylformamide, dimethylacetamide, N-methyl-2-pyrrolidone, dimethylsulfoxide, diethylene glycol dimethyl ether, toluene, benzene, xylene, methyl ethyl ketone, tetrahydrofuran, ethyl cellosolve, ethyl cellosolve acetate, butyl cellosolve, dioxane, cyclohexanone, and ethyl acetate. These organic solvents can be used alone or in combination of two or more. The stirring and mixing and kneading in the preparation of the resin varnish can be performed, for example, using a stirrer, a grinding machine, a three-roll mill, a ball mill, a bead mill, or a homodisper.

[0088] The substrate film is not particularly limited as long as it has heat resistance sufficient to withstand the heating conditions when volatilizing the organic solvent, and examples thereof include polyolefin films such as polypropylene film and polymethylpentene film, polyester films such as polyethylene terephthalate film and polyethylene naphthalate film, polyimide film, and polyetherimide film. The substrate film is not limited to a single layer made of these films, and may be a multilayer film made of two or more materials.

[0089] The drying conditions for volatilizing the organic solvent from the resin varnish applied to the substrate film are preferably conditions that allow the organic solvent to volatilize sufficiently, specifically, heating is preferably performed at 50 to 200° C. for 0.1 to 90 minutes. The organic solvent is preferably removed to 1.5 mass % or less of the total amount of the film-like adhesive.

[0090] The adhesive for semiconductor of the present embodiment may be formed directly on a wafer. Specifically, for example, the resin varnish may be directly spin-coated on a wafer to form a film, and then the organic solvent may be removed to form a layer of the adhesive for semiconductor directly on the wafer.

[0091] The minimum melt viscosity of the adhesive for semiconductors of this embodiment is preferably 200 to 10,000 Pa·s, and more preferably 200 to 5,000 Pa·s, from the viewpoint that voids are more easily removed during curing under a pressurized atmosphere and more excellent reflow resistance is obtained. The minimum melt viscosity can be measured by the method described in the Examples. The temperature (melting temperature) at which the adhesive for semiconductors shows the minimum melt viscosity is preferably 100 to 250°C, more preferably 120 to 230°C, and even more preferably 140 to 200°C.

[0092] From the viewpoint of facilitating temporary fixing of semiconductor chips in a temperature range of 60 to 170° C., the semiconductor adhesive of this embodiment preferably has a melt viscosity of 2000 to 30000 Pa·s at 80° C., preferably a melt viscosity of 400 to 20000 Pa·s at 130° C., and more preferably a melt viscosity of 4000 to 20000 Pa·s at 80° C. and 400 to 5000 Pa·s at 130° C. The above melt viscosities can be measured by the method described in the Examples.

[0093] The semiconductor adhesive of the present embodiment described above can be suitably used in a process in which the adhesive is cured by applying heat under normal or pressurized atmosphere, and can be particularly suitably used in a process in which multiple semiconductor chips are mounted on a mounting member (semiconductor chip, semiconductor wafer, wiring circuit board, etc.) via the semiconductor adhesive and temporarily fixed, and then cured and sealed all at once under normal or pressurized conditions. When the semiconductor adhesive of the present embodiment is used in this process, voids inside the adhesive are easily removed by normal or pressurized pressure, making it easy to obtain even better reflow resistance.

[0094] <Semiconductor device> The semiconductor device of this embodiment is a semiconductor device in which the connection parts of a semiconductor chip and a wiring circuit board are electrically connected to each other, or a semiconductor device in which the connection parts of a plurality of semiconductor chips are electrically connected to each other. In this semiconductor device, at least a part of the connection parts is sealed with a cured product of the semiconductor adhesive that is cured by applying heat under normal pressure or a pressurized atmosphere. The semiconductor device of this embodiment will be described below with reference to Figures 1, 2, and 3. Figures 1, 2, and 3 are each a cross-sectional view showing one embodiment of a semiconductor device that can be manufactured by a method according to an embodiment described later.

[0095] FIG. 1 is a schematic cross-sectional view showing a COB-type connection between a semiconductor chip and a substrate. The semiconductor device 100 shown in FIG. 1 includes a semiconductor chip 1, a substrate 2 (wired circuit board), and an adhesive layer 40 interposed therebetween. In the case of the semiconductor device 100, the semiconductor chip 1 has a semiconductor chip body 10, wiring or bumps 15 arranged on the surface of the semiconductor chip body 10 facing the substrate 2, and solder 30 as a connection part arranged on the wiring or bumps 15. The substrate 2 has a substrate body 20 and wiring or bumps 16 as a connection part arranged on the surface of the substrate body 20 facing the semiconductor chip 1. The solder 30 of the semiconductor chip 1 and the wiring or bumps 16 of the substrate 2 are electrically connected by metal bonding. The semiconductor chip 1 and the substrate 2 are flip-chip connected by the wiring or bumps 16 and the solder 30. The wiring or bumps 15, 16 and the solder 30 are sealed by the adhesive layer 40 and are thus isolated from the external environment.

[0096] 2 shows a COC type connection between semiconductor chips. The configuration of a semiconductor device 300 shown in FIG. 2 is the same as that of the semiconductor device 100, except that two semiconductor chips 1 are flip-chip connected via wiring or bumps 15 and solder 30.

[0097] In FIG. 1 and FIG. 2, a connection portion such as a wiring or bump 15 may be a metal film (eg, gold plating) called a pad, or may be a post electrode (eg, copper pillar).

[0098] The semiconductor chip body 10 is not particularly limited, and various semiconductors can be used, such as elemental semiconductors composed of the same type of element, such as silicon and germanium, and compound semiconductors, such as gallium arsenide and indium phosphide.

[0099] The substrate 2 is not particularly limited as long as it is a wired circuit board, and examples that can be used include a circuit board in which wiring (wiring pattern) is formed by etching away unnecessary portions of a metal layer formed on the surface of an insulating substrate whose main component is glass epoxy, polyimide, polyester, ceramic, epoxy, bismaleimide triazine, etc., a circuit board in which wiring (wiring pattern) is formed on the surface of the insulating substrate by metal plating or the like, and a circuit board in which wiring (wiring pattern) is formed by printing a conductive material on the surface of the insulating substrate.

[0100] The materials of the connection parts such as the wiring or bumps 15 and 16 and the solder 30 are mainly composed of gold, silver, copper, solder (the main components are, for example, tin-silver, tin-lead, tin-bismuth, tin-copper, tin-silver-copper), tin, nickel, etc., and may be composed of only a single component or multiple components. The connection parts may have a structure in which these metals are laminated. Of the metal materials, copper and solder are relatively inexpensive and preferable. From the viewpoint of improving connection reliability and suppressing warping, the connection parts may contain solder.

[0101] The material of the pad is mainly composed of gold, silver, copper, solder (main components are, for example, tin-silver, tin-lead, tin-bismuth, tin-copper, tin-silver-copper), tin, nickel, etc., and may be composed of only a single component or a plurality of components. The pad may have a structure in which these metals are laminated. From the viewpoint of connection reliability, the pad may contain gold or solder.

[0102] A metal layer mainly composed of gold, silver, copper, solder (main components are, for example, tin-silver, tin-lead, tin-bismuth, tin-copper), tin, nickel, etc. may be formed on the surface of the wiring or bumps 15, 16 (wiring pattern). This metal layer may be composed of only a single component, or may be composed of multiple components. The metal layer may have a structure in which multiple metal layers are laminated. The metal layer may contain relatively inexpensive copper or solder. From the viewpoint of improving connection reliability and suppressing warping, the metal layer may contain solder.

[0103] Semiconductor devices (packages) such as those shown in FIG. 1 or 2 may be stacked and electrically connected with gold, silver, copper, solder (main components are, for example, tin-silver, tin-lead, tin-bismuth, tin-copper, tin-silver-copper), tin, nickel, or the like. The metal for connection may be relatively inexpensive copper or solder. For example, as seen in TSV technology, an adhesive layer may be interposed between semiconductor chips, and flip-chip connection or stacking may be performed, and holes penetrating the semiconductor chips may be formed to connect to electrodes on the pattern surface.

[0104] FIG. 3 is a cross-sectional view showing another embodiment of the semiconductor device (semiconductor chip stacking type embodiment (TSV)). In the semiconductor device 500 shown in FIG. 3, wiring or bumps 15 formed on an interposer body 50 as a substrate are connected to the solder 30 of the semiconductor chip 1, thereby flip-chip connecting the semiconductor chip 1 and the interposer 5. An adhesive layer 40 is interposed between the semiconductor chip 1 and the interposer 5. On the surface of the semiconductor chip 1 opposite to the interposer 5, the semiconductor chips 1 are repeatedly stacked via the wiring or bumps 15, the solder 30, and the adhesive layer 40. The wiring or bumps 15 on the pattern surfaces on the front and back of the semiconductor chip 1 are connected to each other by through electrodes 34 filled in holes penetrating the inside of the semiconductor chip body 10. The material of the through electrodes 34 can be copper, aluminum, or the like.

[0105] Such TSV technology allows signals to be obtained from the back surface of the semiconductor chip, which is not normally used. Furthermore, since the through electrodes 34 are vertically passed through the semiconductor chip 1, the distance between the opposing semiconductor chips 1 and between the semiconductor chip 1 and the interposer 5 can be shortened, enabling flexible connection. In such TSV technology, the adhesive layer can be used as a sealing material between the opposing semiconductor chips 1 and between the semiconductor chip 1 and the interposer 5.

[0106] <Method of Manufacturing Semiconductor Device> One embodiment of the method for manufacturing a semiconductor device includes a lamination step of laminating a first member having a connection portion and a second member having a connection portion via a semiconductor adhesive so that the connection portion of the first member and the connection portion of the second member are arranged opposite each other, and a sealing step of curing the semiconductor adhesive by applying heat under normal pressure or a pressurized atmosphere and sealing at least a part of the connection portion with the cured semiconductor adhesive. Here, the first member is, for example, a wiring circuit board, a semiconductor chip, or a semiconductor wafer, and the second member is a semiconductor chip. In the sealing step, the laminate obtained in the lamination step is heated under normal pressure or a pressurized atmosphere to a temperature equal to or higher than the melting point of the connection portions arranged opposite each other, thereby joining the connection portions arranged opposite each other so as to be electrically connected to each other.

[0107] When the first component is a semiconductor chip, the stacking process includes, for example, a step of arranging a plurality of semiconductor chips on a stage, and a temporary fixing step of sequentially arranging other semiconductor chips on each of the plurality of semiconductor chips arranged on the stage via a semiconductor adhesive while heating the stage, to obtain a plurality of laminates (temporary fixed bodies) in which the semiconductor chips, the semiconductor adhesive, and the other semiconductor chips are stacked in this order.

[0108] When the first component is a wiring circuit board or a semiconductor wafer having a plurality of semiconductor chips as a substrate, the stacking process includes, for example, a step of placing the wiring circuit board or the semiconductor wafer on a stage, and a temporary fixing step of sequentially placing a plurality of semiconductor chips on the wiring circuit board or the semiconductor wafer placed on the stage, via a semiconductor adhesive, while heating the stage, to obtain a laminate (temporary fixed body) in which the wiring circuit board, the semiconductor adhesive, and the plurality of semiconductor chips are stacked in this order, or a laminate (temporary fixed body) in which the semiconductor wafer, the semiconductor adhesive, and the plurality of semiconductor chips are stacked in this order.

[0109] In the temporary fixing step, for example, first, a semiconductor adhesive is placed on a first member or a second member (for example, a film-shaped semiconductor adhesive is attached). Next, the individual semiconductor chips on the dicing tape are picked up and adsorbed to a crimping tool (a crimping head) of a crimping machine, and temporarily fixed to a wiring circuit board, another semiconductor chip, or a semiconductor wafer.

[0110] The method of disposing the semiconductor adhesive is not particularly limited, and for example, when the semiconductor adhesive is in the form of a film, it may be a method such as hot pressing, roll lamination, vacuum lamination, etc. The area and thickness of the semiconductor adhesive to be disposed are appropriately set depending on the size of the first member and the second member, the height of the connection part (bump), etc. The semiconductor adhesive may be disposed on a semiconductor chip, or the semiconductor wafer on which the semiconductor adhesive is disposed may be diced and then separated into individual semiconductor chips.

[0111] In the temporary fixing process, alignment is required to electrically connect the connecting parts, so a compression bonding machine such as a flip chip bonder is generally used.

[0112] When the pressure bonding tool picks up the semiconductor chip for temporary fixation, the pressure bonding tool is preferably at a low temperature so that heat is not transferred to the semiconductor adhesive on the semiconductor chip. On the other hand, during pressure bonding (temporary pressure bonding), the semiconductor chip is preferably heated to a high temperature so that the fluidity of the semiconductor adhesive can be increased and the voids involved can be efficiently eliminated. However, heating at a temperature lower than the start temperature of the curing reaction of the semiconductor adhesive is preferable. In order to shorten the cooling time, it is preferable that the difference between the temperature of the pressure bonding tool when picking up the semiconductor chip and the temperature of the pressure bonding tool when temporary fixing is small. This temperature difference is preferably 100°C or less, more preferably 60°C or less, and even more preferably substantially 0°C. If the temperature difference is 100°C or more, it takes time to cool the pressure bonding tool, so productivity tends to decrease. The start temperature of the curing reaction of the semiconductor adhesive refers to the onset temperature when measured using a DSC (PerkinElmer Co., Ltd., DSC-Pyirs1) under the conditions of a sample amount of 10 mg, a heating rate of 10°C / min, and an air or nitrogen atmosphere.

[0113] The load applied for temporary fixing is appropriately set in consideration of the number of connection parts (bumps), absorption of height variations of the connection parts (bumps), control of the deformation amount of the connection parts (bumps), etc. In the temporary fixing process, it is preferable that the opposing connection parts are in contact with each other after pressure bonding (temporary pressure bonding). If the connection parts are in contact with each other after pressure bonding, metal bonds of the connection parts are easily formed in the pressure bonding (main pressure bonding) in the sealing process, and there is a tendency for the semiconductor adhesive to be less bitten. The load is preferably large in order to eliminate voids and to make the connection parts contact, and for example, 0.0001N to 0.2N is preferable, 0.009N to 0.2N is preferable, and 0.001 to 0.1N is even more preferable per connection part (e.g., bump).

[0114] From the viewpoint of improving productivity, the shorter the pressure-bonding time in the temporary fixing step, the more preferable, and it may be, for example, 5 seconds or less, 3 seconds or less, or 2 seconds or less.

[0115] The heating temperature of the stage is lower than the melting point of the connecting portion of the first member and the melting point of the connecting portion of the second member, and may be usually 60 to 155° C., 65 to 120° C., or 70 to 100° C. By heating at such a temperature, voids trapped in the adhesive for semiconductors can be efficiently eliminated. Note that the heating temperature of the stage is not actually applied to the adhesive itself.

[0116] The temperature of the compression tool during temporary fixing is preferably set so that the temperature difference with the temperature of the compression tool when picking up the semiconductor chip is small as described above, and may be, for example, 80 to 350°C, or 100 to 170°C.

[0117] When the lamination step includes the above-mentioned temporary fixing step, in the sealing step following the temporary fixing step, the semiconductor adhesive in the multiple laminates or the laminate including multiple semiconductor chips may be cured collectively or separately, and the multiple connection parts may be sealed collectively or separately. In the sealing step, the opposing connection parts are joined by metal bonding, and usually the gap between the connection parts is filled with the semiconductor adhesive. The sealing step is performed using an apparatus capable of heating to a temperature equal to or higher than the melting point of the metal of the connection parts and applying pressure. Examples of the apparatus include a pressure reflow furnace and a pressure oven.

[0118] The heating temperature (connection temperature) in the sealing process is preferably set to a temperature equal to or higher than the melting point of the metal of at least one of the opposing connections (e.g., bump-bump, bump-pad, bump-wiring). For example, when the metal of the connection is solder, the temperature is preferably 200°C or higher and 450°C or lower. If the heating temperature is low, the metal of the connection may not melt, and sufficient metal bonding may not be formed. If the heating temperature is excessively high, the effect of suppressing voids may become relatively small, and the solder may tend to splash easily.

[0119] When pressure is applied to join the connection parts using a pressure bonding machine, the heat of the pressure bonding machine is not easily transferred to the semiconductor adhesive (fillet) protruding from the side of the connection parts, so that a heat treatment is often required after pressure bonding (main pressure bonding) to sufficiently proceed with the curing of the semiconductor adhesive. Therefore, it is preferable to apply pressure in the sealing process by air pressure in a pressure reflow oven, pressure oven, etc., rather than by a pressure bonding machine. If pressure is applied by air pressure, heat can be applied to the entire part, and the heat treatment after pressure bonding (main pressure bonding) can be shortened or eliminated, improving productivity. In addition, if pressure is applied by air pressure, it is easy to perform main pressure bonding of multiple laminates (temporary fixed bodies) or laminates (temporary fixed bodies) including multiple temporarily fixed semiconductor chips all at once. Furthermore, pressure by air pressure is preferable from the viewpoint of suppressing fillets, rather than direct pressure using a pressure bonding machine. Suppressing fillets is important for the trend toward miniaturization and high density of semiconductor devices.

[0120] The atmosphere in which pressure bonding is performed in the sealing step is not particularly limited, but an atmosphere containing air, nitrogen, formic acid, or the like is preferable.

[0121] The pressure of the pressure bonding in the sealing step is appropriately set depending on the size and number of the members to be connected. The pressure may be, for example, higher than atmospheric pressure and 1 MPa or less. A higher pressure is preferable from the viewpoint of suppressing voids and improving connectivity, and a lower pressure is preferable from the viewpoint of suppressing fillets. Therefore, the pressure is more preferably 0.05 to 0.5 MPa.

[0122] The pressure bonding time varies depending on the constituent metal of the connection part, but from the viewpoint of improving productivity, the shorter the time, the better. When the connection part is a solder bump, the connection time is preferably 20 seconds or less, more preferably 10 seconds or less, and even more preferably 5 seconds or less. In the case of copper-copper or copper-gold metal connection, the connection time is preferably 60 seconds or less.

[0123] When multiple semiconductor chips are stacked three-dimensionally, such as in a semiconductor device having a TSV structure, the multiple semiconductor chips may be stacked one by one and temporarily fixed in place, and then the stacked multiple semiconductor chips may be heated and pressurized together to obtain the semiconductor device. EXAMPLES

[0124] The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples.

[0125] The compounds used in the examples and comparative examples are as follows. (a) Component: Thermoplastic resin Phenoxy resin (product name "FX293", manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., Tg: approx. 160°C, Mw: approx. 40,000) Polyurethane (manufactured by DIC Covestro Polymer Co., Ltd., product name "T-8175N", Tg: -23°C, Mw: 120000)

[0126] (b) Component: Thermosetting resin - Triphenolmethane skeleton-containing multifunctional solid epoxy (manufactured by Mitsubishi Chemical Corporation, product name "EP1032H60") Bisphenol F type liquid epoxy (manufactured by Mitsubishi Chemical Corporation, product name "YL983U") Liquid Epoxy X (manufactured by Mitsubishi Chemical Corporation, product name "YX")

[0127] (c) Component: Hardener 2,4-Diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine isocyanuric acid adduct (manufactured by Shikoku Chemical Industry Co., Ltd., product name "2MAOK-PW", Mw: 384)

[0128] (d) Component: Organic acid Glutaric acid (manufactured by Fujifilm Wako Pure Chemical Industries, melting point: 98°C, Mw: 132) Diglycolic acid (Tokyo Chemical Industry Co., Ltd., melting point: 144°C, Mw: 134) 2,2'-Thiodiglycolic acid (Tokyo Chemical Industry Co., Ltd., melting point: 131°C, Mw: 150) α-Ketoglutaric acid (manufactured by Fujifilm Wako Pure Chemical Industries, melting point: 118°C, Mw: 146) Benzilic acid (manufactured by Fujifilm Wako Pure Chemical Industries, melting point: 152°C, Mw: 228)

[0129] (e) Filler Methacrylic surface-treated silica filler (manufactured by Admatechs Co., Ltd., product name "180nmSM-EH1", average particle size approximately 180nm) Silica filler (manufactured by Admatechs Co., Ltd., product name "SE2030", average particle size 0.5 μm) Epoxy silane surface-treated silica filler (manufactured by Admatechs Co., Ltd., product name "SE2030-SEJ", average particle size 0.5 μm) Methacrylic surface-treated silica filler (manufactured by Admatechs Co., Ltd., product name "YA050C-SM1", average particle size approximately 0.05 μm)

[0130] The weight average molecular weight (Mw) of the component (a) was determined by the GPC method, the details of which are as follows. Device name: HPLC-8020 (product name, manufactured by Tosoh Corporation) Column: 2 pieces of GMHXL + 1 piece of G-2000XL Detector: RI detector Column temperature: 35℃ Flow rate: 1mL / min Standard material: polystyrene

[0131] <Preparation of film-like semiconductor adhesive> A thermoplastic resin, a thermosetting resin, a curing agent, an organic acid, and a filler in the blending amounts shown in Table 1 (unit: parts by mass) were added to an organic solvent (cyclohexanone) so that the NV value ([mass of paint component after drying] / [mass of paint component before drying]×100) became 50%. Thereafter, zirconia beads with a diameter of φ1.0 mm and zirconia beads with a diameter of φ2.0 mm having the same mass as the blending amount of the solid components (thermoplastic resin, thermosetting resin, curing agent, organic acid, and filler) were added into the same container, and stirred with a ball mill (Fritsch Japan Co., Ltd., planetary type fine grinder P-7) for 30 minutes. After stirring, the zirconia beads were removed by filtration to prepare a coating varnish.

[0132] The obtained coating varnish was applied onto a base film (manufactured by Teijin DuPont Films Co., Ltd., trade name "PUREX A55") with a small precision coating device (manufactured by Yasui Seiki Co., Ltd.), and dried in a clean oven (manufactured by ESPEC) (100 °C / 10 min) to obtain a film-like adhesive with a film thickness of 20 μm.

[0133] The evaluation methods of the film-like adhesives obtained in the examples and comparative examples are shown below. The evaluation results are shown in Table 1 and Table 2.

[0134] <DSC measurement> 10 mg of the obtained film-like adhesive was weighed into an aluminum pan (manufactured by Epolid Service Co., Ltd.), covered with an aluminum lid, and the evaluation sample was sealed in the sample pan using a crimper. Using a differential scanning calorimeter (Thermo plus DSC8235E, manufactured by Rigaku Corporation), measurements were carried out under a nitrogen atmosphere at a heating rate of 10 °C / min and a measurement temperature range of 30 to 300 °C. As the analysis means for the onset temperature, an analysis method of the total area (JIS method) was used, and by instructing the analysis in the temperature range of 60 °C to 250 °C, the intersection of the baseline of the peak and the maximum inclination point in each DSC curve was calculated to obtain the onset temperature (unit: °C). On the other hand, as the analysis means for the heat generation amount, the same analysis method of the total area (JIS method) was used, and by instructing the analysis in the temperature range of 60 °C to 250 °C, the heat generation amount (unit: J / g) was calculated by integrating the peak in each DSC curve.

[0135] <High temperature stability evaluation> The film-like adhesive (initial sample) obtained in the examples and comparative examples was placed in an oven set at 50°C and heated for 3 hours, after which it was further placed in an oven set at 70°C and the sample that had been heated for 3 hours was removed to obtain evaluation sample A after heat treatment.

[0136] Using evaluation sample A, the calorific value (unit: J / g) from 60 to 250° C. was calculated using a differential scanning calorimeter (Thermo plus DSC8235E, manufactured by Rigaku Corporation) in the same manner as before the heat treatment. This was defined as the calorific value after the heat treatment.

[0137] The reaction rate was calculated using the two obtained heat values ​​(the heat value of the initial sample and the heat value of evaluation sample A) according to the following formula. Reaction rate (%) = (initial heat generation amount - heat generation amount after heat treatment) / initial heat generation amount x 100

[0138] <Void evaluation> (Preparation of laminate C (temporary fixed body C) after temporary pressure bonding) The film-like adhesive (initial sample) obtained in the above examples and comparative examples was adjusted to a film thickness of 40 μm using a desktop laminator (product name: Hotdog GK-13DX, manufactured by Lamy Corporation), and then cut into a 7.5 mm square size. This was then attached to a semiconductor chip with multiple solder bumps (chip size: 7.3 mm x 7.3 mm, thickness 0.1 mm, bump (connection part) height: approximately 45 μm (total of copper pillar and solder), number of bumps: 1048 pins, pitch 80 μm, product name: WALTS-TEG CC80, manufactured by Waltz Corporation) at 80°C. The semiconductor chip with the film-like adhesive attached was successively bonded and temporarily fixed to another semiconductor chip (chip size: 10 mm x 10 mm, thickness 0.1 mm, bump number: 1048 pins, pitch 80 μm, product name: WALTS-TEG IP80, manufactured by Waltz Corporation) by heating and pressing with a flip chip bonder (FCB3, manufactured by Panasonic Corporation), to obtain a laminate C (temporarily fixed body C) after temporary bonding. The bonding conditions were 130°C, 75 N, and 3 seconds.

[0139] The laminate (temporary fixed body C) after the above temporary compression bonding was placed in an oven set at 80°C and heated for 6 hours, after which the sample was removed to obtain laminate D (temporary fixed body D) after temporary compression bonding after heat treatment at 80°C.

[0140] The laminate D (temporarily fixed body D) after the above-mentioned temporary pressure bonding was placed in the oven of a pressure oven device (manufactured by NTT Advanced Technology Corporation). The pressure in the oven was set to 0.8 MPa, and the temperature was raised from room temperature to 190°C at a heating rate of 20°C / min. Next, while maintaining the pressure and temperature, the pressure-bonded body was heated in a pressurized atmosphere for 1 hour to obtain a mounting sample E for evaluation.

[0141] (Analysis and Evaluation) An external image of the mounting sample for evaluation was taken using an ultrasonic imaging diagnostic device (product name: Insight-300, manufactured by Insight Corporation). [Measurement conditions] Probe frequency: 180MHz Diagnostic mode: Echo (pulse-echo method)

[0142] From the obtained images, images of the adhesive layer between the chips were captured using a scanner (GT-9300UF, manufactured by Seiko Epson Corporation). In the captured images, voids were identified by color correction and two-tone gradation using image processing software (Adobe Photoshop (trade name)), and the proportion of the voids was calculated using a histogram. The area of ​​the entire adhesive layer including the voids was taken as 100%. When the void area proportion was less than 10%, it was rated as "A", when the void area proportion was 10% or more but less than 30%, it was rated as "B", and when it was 30% or more, it was rated as "C". The evaluation results are shown in Table 1.

[0143] <Check for cracks in connection parts> (Preparation of laminate F (temporary fixed body F) after temporary pressure bonding) The film-like adhesive (initial sample) obtained in the above examples and comparative examples was adjusted to a film thickness of 40 μm using a desktop laminator (product name: Hotdog GK-13DX, manufactured by Lamy Corporation), and then cut into a 7.5 mm square size. This was then attached to a semiconductor chip with multiple solder bumps (chip size: 7.3 mm x 7.3 mm, thickness 0.1 mm, bump (connection part) height: approximately 45 μm (total of copper pillar and solder), number of bumps: 1048 pins, pitch 80 μm, product name: WALTS-TEG CC80, manufactured by Waltz Corporation) at 80°C. The semiconductor chip with the film-like adhesive attached was successively bonded and temporarily fixed to another semiconductor chip (chip size: 10 mm x 10 mm, thickness 0.1 mm, bump number: 1048 pins, pitch 80 μm, product name: WALTS-TEG IP80, manufactured by Waltz Corporation) by heating and pressing with a flip chip bonder (FCB3, manufactured by Panasonic Corporation), to obtain a laminate F (temporarily fixed body F) after temporary bonding. The bonding conditions were 190°C / 25N / 10 seconds, 260°C / 25N / 20 seconds, and 100°C / 25N / 5 seconds (set heating time for each heating: 0.1 seconds), and the bonding was performed while applying heat in stages.

[0144] The laminate F (temporarily fixed body F) after the above-mentioned temporary pressure bonding was placed in the oven of a pressure oven device (manufactured by NTT Advanced Technology Corporation). The pressure in the oven was set to 0.8 MPa, and the temperature was raised from room temperature to 190°C at a rate of 20°C / min. Next, while maintaining the pressure and temperature, the pressure-bonded body was heated in a pressurized atmosphere for 1 hour to obtain a mounting sample G for evaluation.

[0145] The above mounting samples for evaluation were polished using a tabletop polisher (Refine Polisher, manufactured by Refine Tech Co., Ltd.) until the bump connection parts inside the chip were exposed. The waterproof abrasive paper used for polishing was initially 200 cmφ and 1000 grit, then replaced with waterproof abrasive paper with 2000 grit, and polished until the connection parts were exposed. After that, the alumina liquid (suspended liquid) A-0.3 micron (manufactured by Refine Tech Co., Ltd.) was used for further polishing. The exposed bump connection parts were observed with a SEM (TM3030Plus tabletop microscope, manufactured by Hitachi High-Technologies Corporation) to confirm the presence or absence of cracks inside the solder and at the solder-Cu wiring interface.

[0146] <Connectivity evaluation> The connectivity of the obtained evaluation mounting sample G was evaluated by measuring the resistance value of the inner circumference of the chip using a circuit tester (POCKET TESTER 4300 COUNT, manufactured by CUSTOM). The circuit diagram of the lower chip used for mounting (chip size: 7.3 mm x 7.3 mm, thickness: 0.1 mm, bump (connection part) height: about 45 μm (total of copper pillar and solder), number of bumps: 1048 pins, pitch 80 μm, product name: WALTS-TEG CC80, manufactured by Waltz Corporation) is shown in Figure 4. In this circuit, the resistance value between terminal a and terminal b in the figure is the resistance value of the inner circumference of the chip. If this resistance value is less than 35 Ω, it indicates a good connection, and if it is 35 Ω or more or the resistance value cannot be measured, it indicates a poor connection.

[0147] <Evaluation of solder wettability> For the above evaluation mounting samples, the cross section of the connection was observed using an SEM in the same way as for checking for cracks in the connection, and it was rated as "A" (good) if 90% or more of the top surface of the Cu wiring was wetted with solder, and "B" (insufficient wetting) if less than 90% of the solder was wetted.

[0148] [Table 1]

[0149] [Table 2] [Explanation of symbols]

[0150] Reference Signs List 1: semiconductor chip, 2: substrate, 10: semiconductor chip body, 15, 16: wiring or bumps, 20: substrate body, 30: solder, 34: through electrode, 40: adhesive layer, 50: interposer body, 100, 300, 500: semiconductor device.

Claims

1. An adhesive for semiconductors comprising a thermoplastic resin, a thermosetting resin, a curing agent, an organic acid, and a filler, The organic acid is a compound having two or more acidic functional groups and an acid dissociation constant pKa of 4.0 or less, The adhesive for a semiconductor includes only one type of the filler.

2. The adhesive for a semiconductor according to claim 1 , wherein the acidic functional group includes at least one group selected from the group consisting of a carboxyl group, a sulfoxyl group, and a phosphate group.

3. 3. The adhesive for a semiconductor according to claim 1, wherein an equivalent ratio of the acidic functional groups contained in the organic acid to the basic functional groups contained in the curing agent is 1.0 or more.

4. The adhesive for a semiconductor according to any one of claims 1 to 3, wherein the organic acid comprises a compound represented by the following general formula (1-1), (1-2) or (1-3): 【Chemistry 1】 【Chemistry 2】 【Chemistry 3】 [In formulas (1-1), (1-2) and (1-3), R １ represents an electron-withdrawing group, R ２ represents a hydrogen atom or an electron-withdrawing group, R ３ represents a hydrogen atom or a monovalent organic group, X represents an oxygen atom or a sulfur atom, n １ represents an integer from 0 to 15; ２ and n ３ are n ２ +n ３ represents an integer of 1 or more selected so that m is an integer from 2 to 15, and m represents 1 or 2. ３ may be the same or different.

5. The adhesive for a semiconductor according to any one of claims 1 to 4, wherein the organic acid has a melting point of 50 to 250°C.

6. The adhesive for a semiconductor according to any one of claims 1 to 5, wherein the curing agent comprises an amine-based curing agent.

7. The adhesive for a semiconductor according to any one of claims 1 to 6, wherein the curing agent comprises an imidazole-based curing agent.

8. The semiconductor adhesive according to claim 7 , wherein the structure of the imidazole-based curing agent includes a triazine ring.

9. A method for manufacturing a semiconductor device in which connection portions of a semiconductor chip and a wiring circuit board are electrically connected to each other, or a semiconductor device in which connection portions of a plurality of semiconductor chips are electrically connected to each other, comprising the steps of: A method for manufacturing a semiconductor device, comprising a sealing step of curing a semiconductor adhesive described in any one of claims 1 to 8 by applying heat under normal pressure or a pressurized atmosphere, and sealing at least a portion of the connection portion with the cured semiconductor adhesive.

10. Prior to the sealing step, placing a plurality of semiconductor chips on a stage; 10. The method for manufacturing a semiconductor device according to claim 9, further comprising a temporary fixing process of sequentially arranging other semiconductor chips on each of the plurality of semiconductor chips arranged on the stage via the semiconductor adhesive while heating the stage to 60 to 155°C, to obtain a plurality of stacks in which the semiconductor chips, the semiconductor adhesive, and the other semiconductor chips are stacked in this order.

11. Prior to the sealing step, placing a printed circuit board or a semiconductor wafer on a stage; The method for manufacturing a semiconductor device according to claim 9, further comprising a temporary fixing process in which, while heating the stage to 60 to 155°C, a plurality of semiconductor chips are sequentially arranged on the wiring circuit board or semiconductor wafer arranged on the stage via the semiconductor adhesive, to obtain a laminate in which the wiring circuit board, the semiconductor adhesive, and a plurality of the semiconductor chips are stacked in this order, or a laminate in which the semiconductor wafer, the semiconductor adhesive, and a plurality of the semiconductor chips are stacked in this order.

12. A semiconductor device in which the respective connection portions of a semiconductor chip and a wiring circuit board are electrically connected to each other, or a semiconductor device in which the respective connection portions of a plurality of semiconductor chips are electrically connected to each other, wherein at least a portion of the connection portion is sealed with a cured product of the semiconductor adhesive according to any one of claims 1 to 8, which is cured by applying heat under normal pressure or a pressurized atmosphere.

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