Apparatus and method for monitoring droplets in a droplet stream - Patent Application 20070122997

Abstract

An apparatus for monitoring a stream of droplets of a target material to generate a radiation beam in a radiation source, the apparatus comprising: a target material emitter for creating a stream of droplets of the target material, the target material emitter comprising a chamber configured for the target material to pass through before forming the stream of droplets; a first transducer configured to generate an acoustic pressure in the chamber; and a second transducer configured to sense the acoustic pressure in the chamber.

Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims priority to U.S. Application No. 62 / 951,893, filed December 20, 2019, entitled "APPARATUS FOR AND METHOD OF MONITORING DROPLETS IN A DROPLET STREAM," the entire contents of which are incorporated herein by reference.

[0002] The present invention relates to an apparatus for creating, monitoring and controlling a stream of droplets of a target material to generate a radiation beam in a radiation source, more particularly an extreme ultraviolet (EUV) radiation source that generates EUV radiation from the target material. [Background technology]

[0003] A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate. Lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus can, for example, project a pattern in a patterning device (e.g. a mask) onto a layer of radiation-sensitive material (resist) provided on the substrate.

[0004]

[0004] To project a pattern onto a substrate, a lithographic apparatus may use electromagnetic radiation. The wavelength of this radiation determines the minimum size of features that can be formed on the substrate. Lithographic apparatus using extreme ultraviolet (EUV) radiation having a wavelength in the range of 4 to 20 nm, e.g., 6.7 nm or 13.5 nm, can be used to form smaller features on a substrate than lithographic apparatus using radiation having a wavelength of, e.g., 193 nm.

[0005]

[0005] Methods for producing EUV light include, but are not necessarily limited to, converting a source material into a plasma state having chemical elements with emission lines in the EUV range, which may include, but are not necessarily limited to, xenon, lithium, and tin.

[0006] In one such method, the desired plasma, often referred to as laser-produced plasma ("LPP"), can be generated by irradiating a source material, for example in the form of droplets, a stream, or a wire, with a laser beam. In another method, the required plasma, often referred to as discharge-produced plasma ("DPP"), can be generated by positioning a source material with an appropriate emission line between a pair of electrodes and creating an electrical discharge between the electrodes.

[0007] One technique for generating droplets involves melting a target material, such as tin, and then forcing it through a relatively small diameter orifice, such as an orifice having a diameter of about 0.5 μm to about 30 μm, under high pressure to produce a stream of droplets having a droplet velocity in the range of about 30 m / s to about 150 m / s. Under most conditions, instabilities, such as noise in the stream exiting the orifice, will inevitably occur, causing the stream to break up into droplets, in a process called Rayleigh breakup. These droplets may have varying velocities and may combine with each other to coalesce into larger droplets.

[0008]

[0008] In the EUV generation processes considered herein, it is desirable to control the breakup and coalescence processes. For example, a repetitive disturbance with an amplitude exceeding that of random noise can be applied to the continuous stream to synchronize the droplets with the optical pulses of the LPP drive laser. By applying a disturbance at the same frequency as the repetition rate of the pulsed laser (or a higher harmonic thereof), the droplets can be synchronized with the laser pulse. For example, a disturbance can be applied to the stream by coupling an electrically actuatable element (such as a piezoelectric material) to the stream and driving the electrically actuatable element with a periodic waveform. In one embodiment, the diameter of the electrically actuatable element contracts and expands (on the order of nanometers). A column of target material, e.g., molten tin, inside the capillary also contracts and expands in diameter (and length) to induce velocity perturbations in the stream at the nozzle exit.

[0009]

[0009] As used herein, the term "electrically actuatable element" and its derivatives mean a material or structure that undergoes a dimensional change when exposed to a voltage, electric field, magnetic field, or combinations thereof, including, but not limited to, piezoelectric materials, electrostrictive materials, and magnetostrictive materials.

[0010] In addition to the droplets being synchronized with the laser pulse, the droplets may also coalesce into larger droplets than those initially created during stream separation, and the coalescence may be achieved under conditions that allow for control of the coalescence process.

[0011]

[0011] Apparatuses and methods for using electrically actuatable elements to control droplet streams and the coalescence of droplet streams are disclosed, for example, in International Patent Application Publication No. WO2019 / 137846A1, published July 18, 2019, entitled "Apparatus for and method of controlling coalescence of droplets in a droplet stream," the entire contents of which are incorporated herein by reference.

[0012] It would be desirable to monitor and control droplet generation and coalescence that overcomes or mitigates one or more problems associated with the prior art. Summary of the Invention

[0013]

[0013] In one embodiment, an apparatus for monitoring a stream of droplets of target material to generate a radiation beam within a radiation source comprises a target material emitter configured to create a stream of droplets of target material passing therethrough, the target material emitter having a chamber configured for the target material to pass through, a first transducer configured to generate acoustic pressure within the chamber, and a second transducer configured to sense the acoustic pressure within the chamber.

[0014]

[0014] In another embodiment, a lithography system comprising a radiation source and an apparatus for monitoring a stream of droplets of target material to generate a radiation beam within the radiation source comprises a target material emitter configured to create a stream of droplets of target material, the target material emitter having a chamber configured for the target material to pass through, a first transducer configured to generate acoustic pressure within the chamber, and a second transducer configured to sense the acoustic pressure within the chamber.

[0015]

[0015] In another embodiment, a method for monitoring a stream of droplets of target material to generate a radiation beam in a radiation source includes passing the target material through a chamber of a target material emitter before forming the stream of droplets, generating acoustic pressure in the chamber using a first transducer, and sensing the acoustic pressure in the chamber using a second transducer.

[0016]

[0016] In yet another embodiment, an apparatus for monitoring a stream of droplets of target material to generate a radiation beam in a radiation source comprises a target material emitter configured to create a stream of droplets of target material, the target material emitter comprising a chamber configured for the target material to pass through before forming the stream of droplets, and a transducer comprising a transducer material and a plurality of electrodes on the transducer material, the transducer configured to generate and sense acoustic pressure in the chamber.

[0017]

[0017] Embodiments of the present invention will now be described, by way of example only, with reference to the accompanying schematic drawings, in which: [Brief explanation of the drawings]

[0018] [Figure 1] 1 depicts a lithography system comprising a lithographic apparatus and a radiation source, according to one embodiment of the present invention; [Figure 2]

[0019] 1 is a schematic diagram illustrating an apparatus for monitoring a stream of droplets of a target material, in accordance with one embodiment of the present invention; [Figure 3]

[0020] 1 is a schematic diagram illustrating an apparatus for monitoring a stream of droplets of a target material, in accordance with one embodiment of the present invention; [Figure 4]

[0021] 10 is a graph illustrating a comparison between velocity jet transfer function and electrical sensor transducer voltage in accordance with one embodiment of the present invention. [Figure 5]

[0022] 1 is a schematic diagram illustrating an apparatus for monitoring a stream of droplets of a target material, in accordance with one embodiment of the present invention; DETAILED DESCRIPTION OF THE INVENTION

[0019]

[0023] Figure 1 shows a lithography system comprising a radiation source SO and a lithographic apparatus LA. The source SO is configured to generate a beam of EUV radiation B and to provide the beam of EUV radiation B to the lithographic apparatus LA. The lithographic apparatus LA comprises an illumination system IL, a support structure MT configured to support a patterning device MA (e.g. a mask), a projection system PS, and a substrate table WT configured to support a substrate W.

[0020]

[0024] The illumination system IL is configured to condition the EUV radiation beam B before it is incident on the patterning device MA. In addition, the illumination system IL may comprise a facetted field mirror device 10 and a facetted pupil mirror device 11. Together, the facetted field mirror device 10 and the facetted pupil mirror device 11 impart a desired cross-sectional shape and a desired intensity distribution to the EUV radiation beam B. The illumination system IL may comprise other mirrors or devices in addition to or instead of the facetted field mirror device 10 and the facetted pupil mirror device 11.

[0021]

[0025] After being so conditioned, the EUV radiation beam B interacts with the patterning device MA. This interaction results in a patterned EUV radiation beam B'. The projection system PS is configured to project the patterned EUV radiation beam B' onto the substrate W. To that end, the projection system PS may comprise a number of mirrors 13, 14 configured to project the patterned EUV radiation beam B' onto the substrate W held by a substrate table WT. The projection system PS may apply a demagnification factor to the patterned EUV radiation beam B' to form an image having smaller features than corresponding features on the patterning device MA. For example, a demagnification factor of 4 or 8 may be applied. Although the projection system PS is shown in Figure 1 as having only two mirrors 13, 14, the projection system PS may comprise a different number of mirrors (e.g. 6 or 8 mirrors).

[0022]

[0026] The substrate W may include a pre-formed pattern, in which case the lithographic apparatus LA aligns the image formed by the patterned EUV radiation beam B' with the pattern previously formed on the substrate W.

[0023]

[0027] A relative vacuum, ie a small amount of gas (eg hydrogen) at a pressure well below atmospheric pressure, may be provided in the source SO, in the illumination system IL, and / or in the projection system PS.

[0024]

[0028] The radiation source SO shown in FIG. 1 is, for example, of a type sometimes referred to as a laser-produced plasma (LPP) source. The laser system 1, which may include, for example, a CO laser, is arranged to deposit energy via a laser beam 2 in a target material, such as tin (Sn), provided from a target material emitter 3. While the following description refers to tin, any suitable target material (sometimes referred to as "fuel") may be used. The target material may be, for example, in liquid form, such as a metal or alloy. The target material emitter 3 may include a nozzle configured to direct tin, for example, in the form of droplets, along a trajectory toward a plasma formation region 4. The laser beam 2 is incident on the tin in the plasma formation region 4. Deposition of laser energy in the tin creates a tin plasma 7 in the plasma formation region 4. Radiation, including EUV radiation, is emitted from the plasma 7 during de-excitation and recombination of electrons with the ions of the plasma.

[0025]

[0029] Apparatus 20 is provided for monitoring the stream of droplets of target material created by target material emitter 3. Tin (target material) emitted from target material emitter 3 coalesces into droplets (not shown) before reaching plasma formation region 4 where the tin droplets are used to generate a beam of EUV radiation B.

[0026]

[0030] EUV radiation from the plasma is collected and focused by a collector 5. Collector 5 may include, for example, a near-normal incidence radiation collector 5 (which may be more commonly referred to as a normal incidence radiation collector). Collector 5 may have a multi-layer mirror structure arranged to reflect EUV radiation (e.g., EUV radiation having a desired wavelength, such as 13.5 nm). Collector 5 may have an elliptical configuration with two foci. As discussed below, a first of the foci may be at the plasma formation region 4 and a second of the foci may be at an intermediate focus 6.

[0027]

[0031] The laser system 1 may be spatially separated from the radiation source SO. In such cases, the laser beam 2 may be passed from the laser system 1 to the radiation source SO with the aid of a beam delivery system (not shown), e.g., comprising appropriate directing mirrors and / or beam expanders and / or other optics. The laser system 1, the radiation source SO, and the beam delivery system may collectively be considered as a radiation system.

[0028]

[0032] The radiation reflected by the collector 5 forms an EUV radiation beam B. The EUV radiation beam B is focused to an intermediate focus 6 in order to form an image at the intermediate focus 6 in the plasma present in the plasma formation region 4. The image at the intermediate focus 6 acts as a virtual radiation source for the illumination system IL. The radiation source SO is arranged such that the intermediate focus 6 is located at or near an opening 8 in an enclosure 9 of the radiation source SO.

[0029]

[0033] 2 shows in simplified schematic form the target material emitter 3 and the apparatus 20 in more detail. The target material emitter 3 creates a stream of droplets of a target material (e.g., tin (Sn)) to generate an EUV radiation beam B in the radiation source SO. Although the target material emitter 3 is described as forming part of the apparatus 20, it will be understood that the apparatus 20 may be considered to be a separate system from the target material emitter 3.

[0030]

[0034] As shown, the target material emitter 3 may include a chamber (e.g., capillary 22) that holds a fluid (or target material), such as molten tin, under pressure. The capillary 22 may have one or more inlet ports 23 through which the fluid may be introduced into the capillary. Also shown, the capillary 22 may be formed with a nozzle 24 through which the pressurized target material may flow, establishing a continuous stream (not shown) that may then break up into droplets 25. The nozzle 24 may be configured to direct the tin, for example, in the form of droplets, along a trajectory toward a plasma formation region (not shown).

[0031]

[0035] The capillary tube 22 may have a mechanical resonance at a particular frequency, for example 50 kHz, which may set up a relatively high amplitude standing wave within the capillary tube 22, which may help conserve energy within the capillary tube 22.

[0032]

[0036] The target material emitter 3 may include a reservoir (not shown) that holds the target material, e.g., molten tin, under pressure. The reservoir may be connected to the capillary tube 22 near the end opposite the end where the nozzle 24 is located (i.e., the reservoir is near the left end of the capillary tube 22, as shown in FIG. 2). This allows the pressurized target material to flow through the capillary tube 22 and out an orifice in the nozzle 24. This may establish a continuous stream that then breaks up into multiple droplets.

[0033]

[0037] The illustrated apparatus 20 further includes a subsystem for generating a disturbance within the target material, including a first transducer 26 operably coupled to the target material and a first signal generator 28 that drives the first transducer 26. The first transducer 26 is configured to generate an acoustic pressure within the capillary tube 22. That is, the first transducer 26 is an electrically actuatable element. More specifically, the electrically actuatable element may be a piezoelectric element, although it will be understood that in other embodiments, the electrically actuatable element may be made from a different material, such as an electrostrictive or magnetostrictive material. For example, the piezoelectric element may measure up to 10 MHz, and the acoustic frequency of interest may be in the range of 2 MHz to 500 kHz.

[0034]

[0038] The first transducer 26 is configured coaxially with the capillary tube 22. The first transducer 26 may have a ring shape or a cylindrical tube shape. The first transducer 26 may be located at least partially or completely around the capillary tube 22. That is, the first transducer 26 is positioned to surround the outer periphery of the capillary tube 22.

[0035]

[0039] The first transducer 26 has a degree of freedom radially aligned with the capillary tube 22. The first transducer 26 is configured to transmit oscillations to the target material by vibrating the vertical wall of the capillary tube 22 (i.e., the wall extending vertically in the direction of the axis of the capillary tube 22). Oscillation from the first transducer 26 to the target material is transmitted by vibrating the vertical wall of the capillary tube 22; i.e., the vertical wall of the capillary tube 22 vibrates due to the oscillation of the first transducer 26. The first transducer 26 contracts radially, radially squeezing the capillary tube 22 and disturbing the target material therein. This induces a velocity perturbation in the target material based on the amplitude of a control signal from the first signal generator 28. That is, the first transducer 26 generates acoustic pressure in the capillary tube 22. This occurs via the first transducer 26, which is mechanically coupled to the target material therein.

[0036]

[0040] Waveforms having different waveform amplitudes, periodic frequencies, and / or waveform shapes can be used to drive the first transducer 26 to generate target material droplets for EUV output. The first transducer 26 generates disturbances in the target material that generate droplets with different initial velocities, causing at least some adjacent droplet pairs to coalesce together before reaching the irradiation region. The ratio of initial droplets to coalesced droplets can be 2, 3, or more, and in some cases tens, hundreds, or more.

[0037]

[0041] Controlling the breakup / coalescence process therefore involves controlling the droplets to coalesce sufficiently before reaching the irradiated region and to arrive at a timing corresponding to the pulse rate of the laser used to irradiate the coalesced droplets. In some embodiments, a hybrid waveform consisting of multiple superimposed voltage waveforms is supplied to first transducer 26 to control the coalescence process of Rayleigh breakup microdroplets into fully coalesced droplets at a frequency corresponding to the laser pulse rate. The waveform may be defined as a voltage or current signal.

[0038]

[0042] A first transducer 26 on the capillary tube 22 may be used to generate standing acoustic waves within the high pressure system (of the capillary tube 22) to generate droplets of a specific size, frequency, and velocity.

[0039]

[0043] Also part of the subsystems of apparatus 20 is a second transducer 30 operably coupled to the target material within capillary tube 22. Second transducer 30 is configured to sense the acoustic pressure within capillary tube 22. This occurs via second transducer 30 being mechanically coupled to the target material within capillary tube 22. Second transducer 30 is an electrical sensor element. More specifically, the electrical sensor element is a piezo element, although it will be understood that in other embodiments, the electrical sensor element may be made from a different material, such as an electrostrictive or magnetostrictive material.

[0040]

[0044] In this embodiment, the first transducer 26 and the second transducer 30 are independent (i.e., separate from one another and controlled / monitored separately). It will be appreciated that although the first transducer 26 and the second transducer 30 are described as forming part of subsystems of the apparatus 20, they may also be considered to form part of the target material emitter 3 itself.

[0041]

[0045] The second transducer 30 may be a stacked piezoelectric element. The second transducer 30 is located near the inlet end of the capillary 22 (i.e., opposite the nozzle 24 end) where the target material enters the capillary 22. The second transducer 30 is configured linearly with respect to the capillary 22, with a degree of freedom aligned with the longitudinal axis of the capillary 22. That is, the first transducer 26 and the second transducer 30 are oriented with substantially perpendicular degrees of freedom.

[0042]

[0046] A flexible membrane 32 is positioned near the inlet end of the capillary tube 22 (i.e., near the end wall of the capillary tube 22). In various embodiments, the membrane is formed from molybdenum or other material suitable for use in contact with molten tin. Oscillation from the target material to the second transducer 30 is transmitted by vibrating the end wall of the capillary tube 22; i.e., the end wall of the capillary tube 22 vibrates due to acoustic pressure waves in the target material. More specifically, the flexible membrane 32 is configured to transmit oscillations from the target material to the second transducer 30 (by oscillation of the flexible membrane 32). Acoustic pressure generated by the first transducer 26 is transmitted through the target material, causing a force on the flexible membrane 32. Thus, a forced acoustic displacement occurs on the second transducer 30. Because the flexible membrane 32 is compliant and moves more easily than a fixed wall, oscillations are transmitted more effectively to the second transducer 30.

[0043]

[0047] The second transducer 30 is connected to a control unit 34, and an electrical signal from the second transducer 30 is transmitted to the control unit 34 (as indicated by the arrow) for processing. The control unit 34 may have an input signal 35. A mechanical stress applied to the second transducer 30 is converted into an electrical signal. The acoustic pressure within the capillary tube 22 generated by the first transducer 26 may be sensed by the device 20 by measuring a voltage feedback (e.g., in the control unit 34) resulting from the forced acoustic displacement of the second transducer 30.

[0044]

[0048] The control unit 34 processes the electrical signal from the second transducer 30 and can thus determine the pressure wave frequency, phase, and amplitude, and thus measure the conditions within the capillary tube 22. This makes it possible to sense and control the coalescence process without the use of external optical metrology feedback (e.g., imaging the tin jet or droplet formation process). Control can be applied by modifying the signal applied by the first transducer 26 (and, in various embodiments, by the second transducer 30, as discussed below).

[0045]

[0049] A second transducer 30 (e.g., a piezo element) sensing a degree of freedom is aligned with the capillary axis and provides a direct measurement of the acoustic pressure amplitude, phase, and frequency content. The second transducer 30 enables real-time information about conditions within the capillary. This information can be used instead of, or in addition to, measurements of the timing, speed, or coalescence of droplets exiting the nozzle 24. The first transducer 26 (i.e., a coaxial piezo element) can provide a large dynamic pressure directly to the acoustic capillary 22. In various embodiments, the two transducers 26, 30 working in concert can actively monitor and control the desired acoustic pressure required to modulate droplets.

[0046]

[0050] The device 20 (i.e., the active control system) monitors the acoustic characteristics of the system in two degrees of freedom optimal for droplet modulation. This setup can balance the differential pressure induced by the large displacement range provided by the coaxial piezoelectric element (first transducer 26) with the limited displacement range associated with the membrane 32 and the piezoelectric element stack (second transducer 30).

[0047]

[0051] A waveform (e.g., a hybrid waveform) may be provided from first signal generator 28 to first transducer 26 based on control signals from control unit 34. These control signals may be based on feedback from second transducer 30, which senses the acoustic pressure in capillary tube 22 from first transducer 26. The control signals may also be based on input signal 35.

[0048]

[0052] During use, an input signal 35 (e.g., based on a desired droplet size, frequency, and / or velocity) may be sent to a control unit 34, which may provide a control signal to a first signal generator 28 to generate a waveform. The first signal generator 28 may provide an electrical signal to a first transducer 26 to generate an acoustic pressure in the capillary tube 22 to produce the desired droplets. A second transducer 30 senses the acoustic pressure generated by the first transducer 26 in the capillary tube 22, and the electrical signal generated by the second transducer 30 may be transmitted to the control unit 34.

[0049]

[0053] The control unit 34 may process the signal from the second transducer 30 (e.g., by using an algorithm) to ascertain the droplets (e.g., size, velocity, frequency) that are forming (e.g., at or near the plasma formation region). This can be done by comparing the electrical signal from the second transducer 26 to the expected acoustic pressure within the capillary tube 22. The comparison of the electrical signal from the second transducer may also be compared to a look-up table that records droplet characteristics (speed, timing, coalescence length) measured during an initial calibration procedure. The control unit 34 may then appropriately modify the control signal to the first signal generator 28 to control droplet coalescence, etc.

[0050]

[0054] In another embodiment, a control signal may be sent from the control unit 34 to the second signal generator 36 to generate acoustic pressure from the second transducer 30 in the capillary tube 22, which is then sensed by the first transducer 26 and fed back to the control unit 34. The electrical signal from the first transducer 26 may also be processed by the control unit 34 (e.g., fed into an algorithm) and used to modify the control signal used to generate the acoustic pressure in the capillary tube 22. In this way, a feedback loop is set up. Thus, the control unit 34 can actively monitor (continuously) and actively control the droplet creation and coalescence process.

[0051]

[0055] The apparatus 20 provides in-line measurement and control of capillary 22 acoustic pressure in the time and frequency domain, providing functionality to support active control of the droplet generation process.

[0052]

[0056] At least one electrical actuator element (first transducer 26) and at least one electrical sensor element (second transducer 30) may be required to control the acoustic pressure waves within the capillary tube 22 and thus the formation and coalescence of droplets.

[0053]

[0057] However, configurations in which one or both of the first transducer 26 and the second transducer 30 are both actuating and sensing are also contemplated.

[0054]

[0058] In this embodiment, the first transducer 26 is also configured to sense the acoustic pressure within the capillary tube 22. The first transducer 26 is also connected to a control unit 34, and electrical signals from the first transducer 26 are transmitted to the control unit 34 (as indicated by the arrows) for processing. Oscillation from the target material to the first transducer 26 is transmitted by vibrating the vertical wall of the capillary tube 22.

[0055]

[0059] The second transducer 30 is also configured to be driven by a second signal generator 36 to generate an acoustic pressure within the capillary tube 22. The acoustic pressure generated by the second transducer 30 is transmitted through the target material and generates a force against the vertical wall of the capillary tube 22. Thus, a forced acoustic displacement is also generated on the first transducer 26. In other embodiments, the first transducer 26 and the second transducer 30 can be driven by the same signal generator.

[0056]

[0060] Thus, both the first transducer 26 and the second transducer 30 may be configured for both sensing and actuation. Both the first transducer 26 and the second transducer 30 may be considered to comprise both an electrically actuatable element and an electrical sensor element.

[0057]

[0061] This configuration is often referred to as multiple-input multiple-output (MIMO). Using both the first and second transducers 26, 30 in a MIMO configuration (and with advanced control algorithms) can provide better control by utilizing preferred spatial locations for acoustic wavelength as a function of frequency.

[0058]

[0062] Although the first transducer 26 and the second transducer 30 are described as both actuating and sensing, it will be understood that in other embodiments, the first transducer 26 may be configured only for actuation and the second transducer 30 may be configured only for sensing, or vice versa.

[0059]

[0063] Using the principle of reciprocity, it is possible to determine the differential acoustic pressure actuation function of each sensor (i.e., the first and second transducers 26, 30) in the frequency domain and work in concert to actively control the acoustic pressure waves.

[0060]

[0064] Preferably, at least one actuation transducer is located near the nozzle 24 end of the capillary tube 22. It is preferable to have at least one actuation transducer 26, 30 located within less than two-thirds of the length of the capillary tube 22 from the nozzle 24 end of the capillary tube 24.

[0061]

[0065] An alternative system may include a droplet position detection system comprising one or more droplet imagers, e.g., providing an output indicative of one or more droplets relative to the irradiation area. The imagers may provide this output to a droplet position detection feedback system, which may, e.g., calculate the droplet position and trajectory, from which, e.g., a droplet error per droplet or average may be calculated. The droplet error may then be provided as an input to a controller, which may, e.g., provide position, direction, and / or timing correction signals to the system, e.g., to control laser trigger timing and / or control movement of optics in a beam conditioning unit, e.g., to change the location and / or focusing power of light pulses delivered to the irradiation area within the chamber. Also, in the case of an EUV light source, the source material delivery system may have a control system operable in response to signals from the controller (which may, in some embodiments, include the aforementioned droplet error, or some amount derived therefrom) to modify release points, initial droplet stream direction, droplet release timing, and / or droplet adjustment, e.g., to correct errors in droplets reaching the desired irradiation area.

[0062]

[0066] However, such an alternative arrangement may require one or more imagers (i.e., external imaging metrology) to monitor the droplets after they are formed as they exit the source material delivery system. That is, the droplet coalescence process can only be controlled after receiving feedback from images of the actual coalesced droplets, i.e., not in real time. This alternative arrangement presents the challenge that there is no way to measure the amplitude of the acoustic wave in the frequency domain and its effect on the tin target droplet formation process without external metrology to image the tin jet or the droplet formation process.

[0063]

[0067] In embodiments, apparatus 20, including target material emitter 3, can explicitly control the droplet coalescence process in the time and frequency domains without the need for external imaging metrology. Thus, active droplet coalescence control can be achieved using apparatus 20. Apparatus 20 enables in-line measurement of the dynamic pressures required for the EUV tin target droplet formation process, rather than relying on inference from the observed timing and velocity of droplets exiting the apparatus. Furthermore, apparatus 20 enables algorithm development for optimal droplet coalescence, where droplets are formed from a tin jet with varying velocity in a capillary system.

[0064]

[0068] Apparatus 20 affects the momentum or velocity of the stream of target material leaving target material emitter 3, which translates into droplet breakup and coalescence processes. Apparatus 20 can also adjust and optimize the waveforms that affect momentum or velocity to produce droplets of a desired size at a desired location to produce EUV radiation beam B. This can be done in real time, offering the advantage of reduced latency. There would be a lag time for results using external (imaging) metrology, as it only provides results after the droplets have formed, rather than results based on measurements of conditions within the capillary (i.e., acoustic pressure within the capillary).

[0065]

[0069] Furthermore, piezoelectric elements (or other materials) may change over time (i.e., their effect may change after hours, days, or months of operation), and device 20 may perform monitoring to see what this change (and its effect) is.

[0066]

[0070] Figure 3 shows a further embodiment of an apparatus 40 for monitoring a stream of droplets of target material created by a target material emitter 43. Apparatus 40 is similar to apparatus 20 shown in Figure 2 except for the second transducer, as will be explained.

[0067]

[0071] Apparatus 40 and target material emitter 43 function similarly to apparatus 20 and target material emitter 3 shown in Figure 2. That is, target material emitter 43 creates a stream of droplets of target material (e.g., tin (Sn)) to generate an EUV radiation beam B within radiation source SO.

[0068]

[0072] As shown, the target material emitter 43 includes a reservoir (not shown), a capillary tube 42 that holds the target material under pressure, and a nozzle 44 for producing a continuous stream that then breaks into droplets.

[0069]

[0073] The apparatus 40 is substantially the same as that of FIG. 2, ie, it has a coaxial first transducer 46 that generates and senses acoustic pressure waves in the target material within the capillary tube 42 .

[0070]

[0074] The device 40 also includes a second transducer 50 configured coaxially with the capillary tube 42. The second transducer 50 may have a ring shape or a cylindrical tube shape. The second transducer 50 may be located at least partially or completely around the capillary tube 42, i.e., positioned to surround the outer periphery of the capillary tube 42. Thus, the second transducer 50 may be similar to the first transducer 46.

[0071]

[0075] The second transducer 50 has a degree of freedom that is radially aligned with the capillary tube 42. The second transducer 50 is configured to sense acoustic pressure within the capillary tube 42. The acoustic pressure is sensed by measuring a voltage feedback resulting from forced acoustic displacement of the second transducer 50. Oscillation from the target material to the second transducer 50 is transmitted by vibrating the vertical walls of the capillary tube 42 (i.e., the walls extending vertically in the direction of the axis of the capillary tube 42).

[0072]

[0076] In embodiments, the first transducer 46 and / or the second transducer 50 may be configured to both sense and generate acoustic pressure within the capillary tube 42, similar to that described with respect to FIG.

[0073]

[0077] Apparatus 40 has first and second signal generators 48, 56 and a control unit 54 that function similarly to the second embodiment. Thus, active droplet coalescence control can be achieved using apparatus 40. Control unit 54 can have an input signal 55. It will be appreciated that in other embodiments, a different number of signal generators (e.g., only one) and control units can be used.

[0074]

[0078] An advantage of using a coaxial second transducer over using a stacked linear second transducer may be that the device is easier to manufacture. In addition, there is a larger surface area in contact with the capillary, i.e., a larger surface area that influences and is influenced by the capillary. This means that more energy can be deposited into the capillary with a coaxial second transducer compared to a linear second transducer.

[0075]

[0079] An advantage of using a stacked linear secondary transducer over using a coaxial secondary transducer may be that it provides a better measurement of the acoustic pressure within the capillary. There may be areas within the capillary where the acoustic pressure amplitude is not high enough to be detected by the coaxial secondary transducer on the capillary.

[0076]

[0080] Use of the apparatus 40 also allows for nozzle transfer function determination of on-axis target material stream velocity perturbations / profiles, which can be used to optimize parameters of the waveform driving the first transducer 26.

[0077]

[0081] The nozzle transfer function can be defined as the velocity perturbation obtained at the nozzle exit per unit of voltage applied at a particular frequency. Considering the nozzle transfer function, the signal (characterized by frequency, magnitude, and / or phase) applied to the first transducer 46 is the input, and the velocity perturbation imparted on the liquid jet is the output. As an example, the coalescence length can vary monotonically with the amplitude of the sinusoidal component of the hybrid waveform in various regimes. A larger sinusoidal amplitude suggests an increased velocity perturbation, and therefore a decreased coalescence length.

[0078]

[0082] The transfer function can be used to assess the condition of the target material emitter 43. For example, a change in the transfer function can be used as an indication that the target material emitter 43 requires maintenance or has reached the end of its useful life.

[0079]

[0083] FIG. 4 shows a graph illustrating a comparison between the velocity jet transfer function (nozzle TF, thin line) and the second transducer 50 voltage (sensor piezo voltage, thick line). Nozzle TF and sensor piezo voltage are shown on the y-axis, and frequency in kHz (0 to approximately 500 kHz) is shown on the x-axis. It can be seen that the nozzle transfer function is related to, or partially or substantially coincides with, the electrical sensor element voltage (in this case the piezo sensor voltage). Therefore, knowing the piezo sensor voltage means that the nozzle TF can be estimated (or calculated) and therefore fed back into the control unit.

[0080]

[0084] Figure 5 shows a further embodiment of an apparatus 60 for monitoring a stream of droplets of target material created by a target material emitter 63. Apparatus 60 is similar to apparatus 40 shown in Figure 3, except that there is only a single transducer unit. Apparatus 60 has the same or similar components as apparatus 40, and as shown in the figure, are labeled with reference numerals increased by 20. These will not be repeated for the sake of brevity, but will be understood to function in a similar manner unless otherwise noted.

[0081]

[0085] As previously mentioned, there is only a single transducer unit 66 in the device 60. However, there is a conductive layer 67 (coating) around the transducer material 66A, separated into separate conductors (or separate conductive areas, i.e., electrodes) by semicircular cutouts (or notches). The conductive layer 67 allows a voltage to be applied to the surface of the transducer material (i.e., piezo element). In an embodiment, the transducer material 66A may be positioned around the capillary tube 62, and electrodes (conductive areas) may be formed in the conductive layer 67 by circumferential notches. The transducer unit 66 is provided with a first voltage V1 to a first conductive area of the transducer unit 66 closest to the nozzle 64, and a second voltage V2 to a second conductive area of the transducer unit 66 further from the nozzle 64. As shown, there is a third conductive area of the transducer unit 66 further from the nozzle 64 that is connected to ground. Thus, transducer unit 66 can operate as two independent or partially independent transducers that apply voltages V1 and V2 to separate conductive areas. It will be appreciated that in other embodiments, the device may have more than two transducer units.

[0082]

[0086] The conductive areas in the aforementioned transducer unit 66 are separated (see the semicircular cutout in the transducer unit 66). This means that a waveform (V1) can be provided to a first conductive area of the transducer unit 66 to generate an acoustic pressure in the capillary tube 62, and the acoustic pressure can be sensed by a second conductive area of the transducer unit 66. Similarly, a different waveform (V2) can be provided to a second conductive area of the transducer unit 66 to generate an acoustic pressure in the capillary tube 62, and the acoustic pressure can be sensed by the first conductive area of the transducer unit 66. The acoustic pressure can therefore be monitored and controlled by the control unit 74 and signal generators 68, 76, in the same manner as described above with respect to the other embodiments. Active droplet coalescence control can therefore be achieved using the apparatus 60. The control unit can have an input signal 75. Furthermore, the functionality of the apparatus 60 can be integrated into transducers (e.g., piezo elements) currently used in radiation sources (i.e., in or on target material emitters).

[0083]

[0087] 5 shows the transducer unit 66 effectively operating as two independent actuators (actuated by V1 and V2). These actuators can perform double duty as sensors (for MIMO analysis of structures). It will be appreciated that this can be expanded to three or four or more independent actuators by adding more notches and therefore providing more electrodes.

[0084]

[0088] Although specific reference may be made in this text to the use of lithographic apparatus in the manufacture of ICs, it will be appreciated that the lithographic apparatus described herein have other possible applications, such as in the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads, etc.

[0085]

[0089] Although specific reference is made herein to embodiments of the invention in relation to lithography apparatus, embodiments of the invention may also be used in other apparatus. Embodiments of the invention may form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes objects such as wafers (or other substrates) or masks (or other patterning devices). These apparatus are sometimes referred to generically as lithography tools. Such lithography tools may use vacuum or ambient (non-vacuum) conditions.

[0086]

[0090] Although particular reference has been made above to the use of embodiments of the present invention in connection with optical lithography, it will be understood that the present invention may be used in other applications, such as imprint lithography, and is not limited to optical lithography, where the context allows.

[0087]

[0091] Where the context permits, embodiments of the present invention may be implemented in hardware, firmware, software, or any combination thereof. Embodiments of the present invention may also be implemented as instructions stored on a machine-readable medium, which may be read and executed by one or more processors. A machine-readable medium may include any mechanism for storing or transmitting information in a form readable by a machine (e.g., a computing device). For example, machine-readable media may include read-only memory (ROM), random-access memory (RAM), magnetic storage media, optical storage media, flash memory devices, electrical, optical, acoustic, or other forms of propagated signals (e.g., carrier waves, infrared signals, digital signals, etc.), and others. Furthermore, firmware, software, routines, and instructions may be described herein as performing particular actions. However, it should be understood that such description is merely for convenience and that such actions actually result from computing devices, processors, controllers, or other devices executing the firmware, software, routines, instructions, etc., and that in doing so, actuators or other devices may interact with the physical world.

[0088]

[0092] While specific embodiments of the invention have been described above, it will be understood that the invention may be practiced otherwise than as described. The above description is illustrative and not limiting. Accordingly, it will be apparent to those skilled in the art that modifications to the invention as described may be made without departing from the scope of the claims. Additional aspects of the invention are illustrated in the following numbered examples.

[0089] Example A1. An apparatus for monitoring a stream of droplets of target material to generate a radiation beam in a radiation source, comprising: a target material emitter configured to create a stream of droplets of target material, the target material emitter comprising a chamber configured for the target material to pass therethrough; a first transducer configured to generate an acoustic pressure in the chamber; a second transducer configured to sense acoustic pressure within the chamber; and An apparatus comprising: Example A2. The apparatus of Example A1, wherein the apparatus is configured to sense acoustic pressure by measuring voltage feedback generated by forced acoustic displacement of the second transducer. Example A3. The apparatus of any of Examples A1-A2, wherein the first transducer is configured coaxially with the chamber, with a degree of freedom radially aligned with the chamber. Example A4. The apparatus of Example A3, wherein the first transducer is disposed at least partially around the chamber, the first transducer being configured to oscillate a vertical wall of the chamber. Example A5. The apparatus of any of Examples A1-A4, wherein the first transducer is configured to sense acoustic pressure within the chamber. Example A6. The apparatus of any of Examples A1 to A5, wherein the second transducer is configured linearly relative to the chamber, with a degree of freedom aligned with the longitudinal axis of the chamber. Example A7. The apparatus of Example A6, wherein the second transducer is positioned near an end of the chamber, and the second transducer is configured to transmit oscillations between the target material and the second transducer by vibrating the end wall of the chamber. Example A8. The apparatus of Example A7, wherein the apparatus comprises a flexible membrane near an end of the chamber, the flexible membrane configured to transmit oscillations between the target material and the second transducer. Example A9. The apparatus of any of Examples A1 to A8, wherein the second transducer is configured coaxially with the chamber, with a degree of freedom radially aligned with the chamber. Example A10. The apparatus of any of Examples A1 to A9, wherein the second transducer is configured to generate an acoustic pressure within the chamber. Example A11. The apparatus of Example A10, wherein the apparatus is configured to determine a differential acoustic pressure actuation function of the first transducer and the second transducer. Example A12. The apparatus of any of Examples A1 to A11, wherein the apparatus is configured to actively control acoustic pressure within the chamber. Example A13. The apparatus of any of Examples A1 to A12, wherein the first transducer is a first piezo element and / or the second transducer is a second piezo element. Example A14. The apparatus of any one of Examples A1 to A13, wherein the chamber is a capillary tube. Example A15. A radiation source comprising the device of any of Examples A1 to A14. Example A16. A lithography system comprising a radiation source according to Example A15. Example B1. A method of monitoring a stream of droplets of target material to generate a radiation beam in a radiation source, comprising: passing the target material through a chamber of a target material emitter before forming the stream of droplets; generating an acoustic pressure in a chamber using a first transducer; and sensing sound pressure within the chamber using a second transducer; A method comprising: Example B2. The method of Example B1, wherein the method further includes sensing the acoustic pressure by sensing voltage feedback generated by the forced acoustic displacement of the second transducer. Example B3. The method of Examples B1-B2, further comprising actively controlling the acoustic pressure within the chamber. Example B4. The method of Examples B1-B3, wherein the first transducer is a first piezo element and / or the second transducer is a second piezo element. Example C1. An apparatus for monitoring a stream of droplets of target material to generate a radiation beam in a radiation source, comprising: a target material emitter configured to create a stream of droplets of the target material, the target material emitter comprising a chamber configured for the target material to pass through before forming the stream of droplets; A transducer comprising: the transducer comprises a transducer material and a plurality of electrodes on the transducer material, the transducer configured to generate and sense acoustic pressure within the chamber; Device. Example C2. The apparatus of Example C1, wherein the transducer material is a piezo element. Example C3. The apparatus of example C1, wherein the electrodes are formed by notches in a conductive coating around the transducer material.

[0090]

[0093] Other embodiments are within the scope of the following claims.

Claims

1. 1. An apparatus for monitoring a stream of droplets of target material to generate a radiation beam in a radiation source, comprising: a target material emitter configured to create a stream of droplets of the target material, the target material emitter comprising a capillary configured for the target material to pass therethrough; a first transducer configured to generate an acoustic pressure within the capillary tube; a second transducer configured to sense the acoustic pressure within the capillary; and Equipped with the capillary tube has one end where the nozzle is located and another end opposite the one end, The second transducer is positioned near the other end of the capillary, and the second transducer is configured to transmit oscillations between the target material and the second transducer by causing an end wall of the other end to oscillate due to the acoustic pressure within the capillary.

2. The device of claim 1 , wherein the device is configured to sense the acoustic pressure by measuring a voltage feedback generated by forced acoustic displacement of the second transducer.

3. The apparatus of claim 1 , wherein the first transducer is disposed at least partially around the capillary tube, the first transducer being configured to oscillate a longitudinal wall of the capillary tube.

4. The apparatus of claim 1 , wherein the first transducer is configured to sense acoustic pressure within the capillary tube.

5. 10. The apparatus of claim 1, wherein the apparatus comprises a flexible membrane near the end wall of the other end, the flexible membrane configured to transmit oscillations between the target material and the second transducer.

6. The device of claim 5 , wherein the flexible membrane is a molybdenum membrane.

7. The apparatus of claim 1 , wherein the second transducer is configured to generate an acoustic pressure within the capillary tube.

8. The apparatus of claim 1 , wherein the first transducer is a first piezo element and / or the second transducer is a second piezo element.

9. The apparatus of claim 1 , wherein the second transducer is a stacked piezoelectric element.

10. The apparatus of claim 1 , wherein the apparatus comprises a first signal generator configured to drive the first transducer.

11. The apparatus of claim 1 , wherein the apparatus comprises a second signal generator configured to drive the second transducer.

12. The apparatus of claim 1 , wherein the apparatus comprises a control unit configured to process the electrical signal generated by the second transducer to measure a condition within the capillary tube.

13. The apparatus of claim 1 , wherein the capillary tube has an inlet port for introducing the target material into the capillary tube.

14. 1. A method of monitoring a stream of droplets of target material to generate a radiation beam in a radiation source, comprising: passing the target material through a capillary of a target material emitter before forming a stream of droplets; generating an acoustic pressure in the capillary tube using a first transducer; and sensing the acoustic pressure within the capillary tube using a second transducer; Including, the capillary tube has one end where the nozzle is located and another end opposite the one end, The second transducer is positioned near the other end of the capillary, and the second transducer is configured to transmit oscillations between the target material and the second transducer by causing an end wall of the other end to oscillate due to the acoustic pressure within the capillary.

15. 15. The method of claim 14, wherein the apparatus for monitoring the stream of droplets of the target material senses the acoustic pressure by measuring a voltage feedback generated by forced acoustic displacement of the second transducer.

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