Display panel, method for manufacturing same, and electronic device

Abstract

Provided in the present embodiment are a display panel, a method for manufacturing same, and an electronic device. Respectively forming isolation openings and a light-transmitting opening in different etching process steps can improve the consistency of etching environments of a first display region and a second display region when first isolation openings and second isolation openings are formed, such that undercut lengths corresponding to the first isolation openings and the second isolation openings are similar, and thus the uniformity of overlapping effects between an isolation structure and electrodes of light-emitting devices in the first display region and in the second display region is improved, thereby improving the uniformity of display effects of the first display region and the second display region.

Description

Display panel, method for manufacturing display panel, and electronic device

[0001] Cross-reference to related applications

[0002] This application claims priority to Chinese Patent Application No. 202410824746.8, filed on June 24, 2024, entitled “Display panel, method for manufacturing display panel, and electronic device,” the entire contents of which are incorporated herein by reference. TECHNICAL FIELD

[0003] The present disclosure relates to the technical field of display, and in particular, to a display panel, a method for manufacturing the display panel, and an electronic device.

[0004] BACKGROUND

[0005] Organic Light Emitting Diode (OLED) and flat panel display devices based on Light Emitting Diode (LED) technology have been widely applied to mobile phones, televisions, notebook computers, desktop computers and other consumer electronic products due to their high image quality, power saving, thin body and wide application range, and have become the mainstream of display devices.

[0006] In the preparation process of a conventional OLED display panel, a fine metal mask (FMM) is usually used to realize patterning of light-emitting pixels. The FMM technology is mature and has rich mass production experience. However, the FMM technology also has the problems of limited precision and high cost. The fine metal mask-free technology eliminates the limitations of the conventional OLED process on the size, resolution and other performance of the display screen, and has the advantages of high performance, full-size, and agile delivery. Patent CN118251982A, CN115666161A, CN116648095A, CN117062489A, CN118678742A, CN118785761A, CN115224220A, CN118678729A, CN118660529A, and CN118660589A disclose related content of the fine metal mask-free technology, which are referred to for reference.

[0007] However, the process performance of the current OLED display product needs to be improved. SUMMARY

[0008] In order to overcome the above-mentioned deficiencies in the prior art, the purpose of the present disclosure is to provide a display panel, which comprises a first display area and a second display area, and a separation structure comprising a support portion and a shielding portion arranged on the side of the support portion away from the substrate; the display panel comprises: a substrate; a separation structure arranged on one side of the substrate and arranged between the first display area and the second display area; the separation structure comprises a plurality of separation openings and at least one light-transmitting opening, the plurality of separation openings comprise a first separation opening arranged in the first display area and a second separation opening arranged in the second display area, and the at least one light-transmitting opening is arranged in the second display area; at the first separation opening and the second separation opening, one side of the support portion close to the shielding portion is within the projection of the one side of the shielding portion close to the support portion on the substrate; wherein the distance between the projection of the shielding portion arranged in the first display area and close to the first separation opening on the substrate and the projection of the support portion arranged in the first display area and close to the first separation opening on the substrate is SA21, the distance between the projection of the shielding portion arranged in the second display area and close to the second separation opening on the substrate and the projection of the support portion arranged in the second display area and close to the second separation opening on the substrate is SA22, and the difference between the SA21 and the SA22 is less than 0.1 microns.

[0009] The display panel provided by the present disclosure includes a first display area and a second display area, and includes: a substrate; an isolation structure located on one side of the substrate, the isolation structure includes a support portion and a shielding portion which are sequentially stacked in a direction away from the substrate, a projection of the support portion on the substrate is located within a projection of the shielding portion on the substrate, the isolation structure includes a plurality of isolation openings and at least one light-transmitting opening, the plurality of isolation openings include a first isolation opening and a second isolation opening, the first isolation opening is arranged in the first display area, and the second isolation opening and the at least one light-transmitting opening are arranged in the second display area; a plurality of light-emitting devices including a plurality of first light-emitting devices emitting light of a first color and a plurality of second light-emitting devices, the plurality of first light-emitting devices are located in the first display area, and the plurality of second light-emitting devices are located in the second display area, a part of the first light-emitting devices are located in the corresponding first isolation openings, and a part of the second light-emitting devices are located in the corresponding second isolation openings; wherein the support portion has a first projection on the substrate, the shielding portion has a second projection on the substrate, in a first direction, a distance between an edge of the first projection and an edge of the second projection at the first isolation opening corresponding to the first light-emitting device is SA21, and a distance between the edge of the first projection and the edge of the second projection at the second isolation opening corresponding to the second light-emitting device is SA22, and the SA21 is greater than the SA22.

[0010] Another object of the present disclosure is to provide a method for manufacturing a display panel, the display panel including a first display area and a second display area, the method including: providing a substrate; forming an isolation material layer on one side of the substrate, the isolation material layer being arranged in the first display area and the second display area; in a first etching step, etching the isolation material layer to form one of a plurality of isolation openings and at least one light-transmitting opening, wherein the plurality of isolation openings include a first isolation opening arranged in the first display area and a second isolation opening arranged in the second display area, and the at least one light-transmitting opening is arranged in the second display area; in a second etching step, covering and protecting one of the plurality of isolation openings and the at least one light-transmitting opening with other film layers, and etching the isolation material layer to form the other of the plurality of isolation openings and the at least one light-transmitting opening.

[0011] Another object of the present disclosure is to provide an electronic device including the display panel provided by the present disclosure, or the electronic device including a display panel manufactured by the display panel manufacturing method provided by the present disclosure.

[0012] BRIEF DESCRIPTION OF DRAWINGS

[0013] FIG. 1 is a schematic diagram of a region of a display panel.

[0014] FIG. 2 is a schematic diagram of a cross-section of a display panel in the prior art.

[0015] FIG. 3 is a schematic diagram of an isolation opening and a light transmission opening.

[0016] FIG. 4 is a schematic diagram of a cross-section of a display panel according to an embodiment of the present disclosure.

[0017] FIG. 5 is a schematic diagram of a cross-section of a display panel according to another embodiment of the present disclosure.

[0018] FIG. 6 is a schematic diagram of a cross-section of a display panel according to yet another embodiment of the present disclosure.

[0019] FIG. 7 is a schematic diagram of a cross-section of a display panel according to still another embodiment of the present disclosure.

[0020] FIG. 8 is a schematic diagram of an isolation structure according to an embodiment of the present disclosure.

[0021] FIG. 9 is a schematic diagram of a step flow of a method of manufacturing a display panel according to an embodiment of the present disclosure.

[0022] FIG. 10 is a schematic diagram of a manufacturing process of a display panel according to an embodiment of the present disclosure.

[0023] FIG. 11 is a schematic diagram of a manufacturing process of a display panel according to another embodiment of the present disclosure.

[0024] FIG. 12 is a schematic diagram of a manufacturing process of a display panel according to yet another embodiment of the present disclosure.

[0025] FIG. 13 is a schematic diagram of a manufacturing process of a display panel according to still another embodiment of the present disclosure.

[0026] FIG. 14 is a schematic diagram of a manufacturing process of a display panel according to yet another embodiment of the present disclosure.

[0027] FIG. 15 is a schematic diagram of a manufacturing process of a display panel according to still another embodiment of the present disclosure.

[0028] FIG. 16 is a schematic diagram of a manufacturing process of a display panel according to yet another embodiment of the present disclosure.

[0029] FIG. 17 is a schematic diagram of a manufacturing process of a display panel according to still another embodiment of the present disclosure.

[0030] FIG. 18 is a schematic diagram of a manufacturing process of a display panel according to yet another embodiment of the present disclosure.

[0031] FIG. 19 is a schematic diagram of a cross-section of a display panel according to still another embodiment of the present disclosure.

[0032] FIG. 20 is a schematic cross-sectional view of a display panel according to another embodiment of the present disclosure.

[0033] FIG. 21 is a schematic cross-sectional view of a display panel according to another embodiment of the present disclosure.

[0034] FIG. 22 is a schematic cross-sectional view of a display panel according to another embodiment of the present disclosure.

[0035] FIG. 23 is a schematic cross-sectional view of a display panel according to another embodiment of the present disclosure.

[0036] FIG. 24 is a schematic cross-sectional view of a display panel according to another embodiment of the present disclosure.

[0037] FIG. 24 is a schematic cross-sectional view of a display panel according to another embodiment of the present disclosure.

[0038] Embodiments of the present disclosure

[0039] In some electronic devices, as shown in FIG. 1, in order to set optical devices (e.g., cameras, light sensors, etc.) under the display panel, while also ensuring full-screen display of the display panel, a first display area AA1 and a second display area AA2 are set on the display panel, the first display area AA1 is a normal display area, and the second display area AA2 is a light-transmitting display area. Compared with the normal display area, a light-transmitting opening needs to be set on the display panel in the light-transmitting display area to allow external light to be transmitted to the display panel.

[0040] In some display panels, referring to FIG. 2, an isolation structure 140 is provided to disconnect the organic film layers of adjacent sub-pixels during evaporation. For example, such a display panel includes a substrate 111, an isolation structure 140 provided on one side of the substrate 111 and having an isolation opening, and a light-emitting device at least partially located in the isolation opening 1401, the light-emitting device including a first electrode 120, a light-emitting unit 150, and a second electrode 160. In this case, compared with the isolation structure 140 in the normal display area, in addition to the first isolation opening 1401 for accommodating the light-emitting device, the light-transmitting opening 1402 needs to be additionally provided in the light-transmitting display area. In the prior art, the light-transmitting opening 1402, the first isolation opening 1401, and the second isolation opening 1403 are formed in the same etching step.

[0041] Referring to FIGS. 2 and 3, the inventors have found that, in such a display panel, because the light-transmitting display area needs to be provided with an additional light-transmitting opening, the opening density is larger than that in the normal display area, and thus, when the first isolation opening 1401, the light-transmitting opening 1402, and the second isolation opening 1403 are formed by wet etching, the etching environment in the etching process is different between the normal display area and the light-transmitting display area, and the consumption speed of the wet etching solution is different, resulting in that the undercut length SA11 of the isolation structure 140 corresponding to the first isolation opening 1401 in the normal display area is different from the undercut length SA12 of the isolation structure 140 corresponding to the second isolation opening 1403 in the light-transmitting display area, for example, the undercut length SA11 of the isolation structure 140 corresponding to the first isolation opening 1401 in the normal display area is larger than the undercut length SA12 of the isolation structure 140 corresponding to the second isolation opening 1403 in the light-transmitting display area, and thus, the lapping effect of the second electrode 160 and the isolation structure 140 formed subsequently is different, affecting the display uniformity of the normal display area and the light-transmitting display area. The "density" mentioned in this specification refers to the ratio of the area of the projection of the opening on the substrate to the area of the projection of the normal display area / light-transmitting display area on the substrate per unit area.

[0042] Therefore, the embodiment provides a solution that can improve the consistency of the undercut length of the isolation opening corresponding to each position of the display panel. The solution provided by the embodiment is described in detail as follows.

[0043] Referring to FIG. 1, FIG. 1 is a schematic diagram of a display panel provided by the embodiment, which includes a first display area AA1 and a second display area AA2. Optionally, the first display area AA1 can at least partially surround the second display area AA2.

[0044] In the embodiment, the first display area AA1 and the second display area AA2 both have display functions, and the second display area AA2 also has light transmission, so that external light can pass through the second display area AA2 from one side of the display panel to the other side of the display panel.

[0045] Specifically, referring to FIGS. 4 and 5, the display panel provided in the embodiment can include a substrate 111 and an isolation structure 140 located on one side of the substrate 111.

[0046] The substrate 111 can be made of a flexible material, such as polyimide (Pi), or a rigid material, such as glass.

[0047] The isolation structure 140 is arranged in the first display area AA1 and the second display area AA2, and includes a plurality of isolation openings and at least one light transmission opening 1402. Referring to FIG. 3, the plurality of isolation openings include a first isolation opening 1401 arranged in the first display area AA1 and a second isolation opening 1403 arranged in the second display area AA2, and the at least one light transmission opening 1402 is arranged in the second display area AA2.

[0048] In the embodiment, the isolation structure 140 arranged in the first display area AA1 has a first undercut length SA21 close to the first isolation opening 1401, the isolation structure 140 arranged in the second display area AA2 has a second undercut length SA22 close to the second isolation opening 1403, and the difference between the first undercut length SA21 and the second undercut length SA22 is less than 0.1 microns. For example, in some possible implementation manners, the first undercut length SA21 can be equal to the second undercut length SA22. For example, in some possible implementation manners, the first undercut length SA21 can also be greater than the second undercut length SA22.

[0049] In this way, in the case that the first display area AA1 only has the first isolation opening 1401, and the second display area AA2 has the second isolation opening 1403 and the light transmission opening 1402, improving the consistency of the first undercut length SA21 corresponding to the first isolation opening 1401 and the second undercut length SA22 corresponding to the second isolation opening 1403 can improve the uniformity of the lapping effect of the electrodes of the light emitting devices in the first display area AA1 and the second display area AA2 and the isolation structure, and further improve the display effect uniformity of the first display area AA1 and the second display area AA2.

[0050] Optionally, in the embodiment, the first isolation opening 1401 and the second isolation opening 1403 can be formed in the same etching process, and the light-transmitting opening 1402 can be formed in another different etching process. For example, when the light-transmitting opening 1402 is etched, the first isolation opening 1401 and the second isolation opening 1403 are protected by other film layers; or when the first isolation opening 1401 and the second isolation opening 1403 are etched, the light-transmitting opening 1402 is protected by other film layers.

[0051] Based on the above design, when the first isolation opening 1401 and the second isolation opening 1403 are etched, the densities of the openings etched in the first display area AA1 and the second display area AA2 are consistent, so that the consistency of the etching environment of the first display area AA1 and the second display area AA2 in the etching process is ensured, thereby making the undercut lengths of the first isolation openings 1401 and the second isolation openings 1403 corresponding to each other same or similar, improving the uniformity of the lapping effect of the electrodes of the light-emitting devices and the isolation structure 140 in the first display area AA1 and the second display area AA2, and further improving the display effect uniformity of the first display area AA1 and the second display area AA2.

[0052] In some possible implementations, referring to FIG. 4, the isolation structure 140 includes a support portion 141 and a shielding portion 142 located on a side of the support portion 141 away from the substrate 111.

[0053] At the first isolation opening 1401 and the second isolation opening 1403, the normal projection of the side of the support portion 141 close to the shielding portion 142 on the substrate 111 is located in the normal projection of the side of the shielding portion 142 close to the support portion 141 on the substrate 111. For example, on the side close to the first isolation opening 1401 or on the side close to the second isolation opening 1403, the support portion 141 in the isolation structure 140 is recessed compared with the shielding portion 142, forming an undercut structure.

[0054] Optionally, in the embodiment, when the first isolation opening 1401 and the second isolation opening 1403 are formed, dry etching can be used to pattern and etch the shielding portion 142 and at least part of the support portion 141, and then wet etching can be used to side etch the support portion 141.

[0055] In this case, the distance between the normal projection of the shielding portion 142 located in the first display area AA1 and close to the first isolation opening 1401 on the substrate 111 and the normal projection of the support portion 141 located in the first display area AA1 and close to the first isolation opening 1401 on the substrate 111 is the first undercut length SA21.

[0056] That is, the first undercut length SA21 is the distance between the projection of the shielding portion 142 on the substrate 111 near one end of the first isolation opening 1401 and the projection of the support portion 141 on the substrate 111 near one end of the first isolation opening 1401.

[0057] The distance between the projection of the shielding portion 142 on the substrate 111 near the second isolation opening 1403 and the projection of the support portion 141 on the substrate 111 near the second isolation opening 1403 is the second undercut length SA2.

[0058] That is, the second undercut length SA22 is the distance between the projection of the shielding portion 142 on the substrate 111 near one end of the second isolation opening 1403 and the projection of the support portion 141 on the substrate 111 near one end of the second isolation opening 1403.

[0059] In a possible implementation, referring to FIG. 4 again, the side surface of the shielding portion 142 arranged in the second display area AA2 and near the light-transmitting opening 1402 is flush with the side surface of the support portion 141 arranged in the second display area AA2 and near the light-transmitting opening 1402. The flush mentioned in the embodiments of the present disclosure means that the side surfaces of the plurality of structures are located on the same straight line in the longitudinal cross section.

[0060] For example, the light-transmitting opening 1402 can be obtained by dry etching.

[0061] In another possible implementation, referring to FIG. 5, the projection of the side surface of the support portion 141 arranged in the second display area AA2 and near the light-transmitting opening 1402 and near the shielding portion 142 is located within the projection of the shielding portion 142 arranged in the second display area AA2 and near the light-transmitting opening 1402 on the substrate 111. That is, at the light-transmitting opening 1402, the support portion 141 is recessed compared with the shielding portion 142, forming an undercut structure.

[0062] Optionally, in the embodiment, the undercut lengths corresponding to the second isolation opening 1403 and the light-transmitting opening 1402 can be different.

[0063] In a possible implementation, referring to FIG. 6, the isolation structure 140 is a one-piece structure, and the isolation structure 140 has a first surface near the substrate 111 and a second surface away from the substrate 111, and the projection of the first surface on the substrate 111 is located within the projection of the second surface on the substrate 111. For example, the cross-sectional shape of the isolation structure is an inverted trapezoid.

[0064] In this case, the distance between the normal projection of the second surface located in the first display area AA1 on the substrate 111 close to one end of the first isolation opening 1401 and the normal projection of the first surface located in the first display area AA1 on the substrate 1111 close to one end of the first isolation opening 1401 is a first undercut length SA21.

[0065] That is, the first undercut length SA21 is the distance between the normal projection of the second surface on the substrate 111 close to one end of the first isolation opening 1401 and the normal projection of the first surface on the substrate 111 close to one end of the first isolation opening 1401 at the first isolation opening 1401.

[0066] The distance between the normal projection of the second surface located in the second display area AA2 on the substrate 111 close to one end of the second isolation opening 1403 and the normal projection of the first surface located in the second display area AA2 on the substrate 111 close to one end of the second isolation opening 1403 is a second undercut length SA22.

[0067] That is, the second undercut length SA22 is the distance between the normal projection of the second surface on the substrate 111 close to one end of the second isolation opening 1403 and the normal projection of the first surface on the substrate 111 close to one end of the second isolation opening 1403 at the second isolation opening 1403.

[0068] In some possible implementation manners, referring to FIG. 3, the light-transmitting opening 1402 is located between adjacent second isolation openings 1403.

[0069] Optionally, the density of the first isolation openings 1401 located in the first display area AA1 is the same as the density of the second isolation openings 1403 located in the second display area AA2. In this way, when the first isolation openings 1401 and the second isolation openings 1403 are etched, the etching environment of the first display area AA1 and the second display area AA2 is substantially the same, and the consistency of the undercut lengths corresponding to the isolation openings in the first display area AA1 and the second display area AA2 can be improved.

[0070] In some possible implementation manners, referring again to FIG. 4 and FIG. 5, the display panel further includes a light-emitting device located at least partially in the first isolation openings 1401 and the second isolation openings 1403, and the light-emitting device includes a first electrode 120, a light-emitting unit 150 and a second electrode 160 which are sequentially stacked in a direction away from the substrate 111. For example, in this embodiment, the light-emitting device is arranged only in the first isolation openings 1401 and the second isolation openings 1403, and is not arranged in the light-transmitting openings 1402.

[0071] In some possible implementations, referring to FIGS. 4 and 5 again, the display panel further includes a plurality of light emitting devices 150, including a plurality of first light emitting devices 1501 emitting light of a first color and a plurality of second light emitting devices 1502. The plurality of first light emitting devices 1501 are located in the first display area AA1, and a part of the first light emitting devices 1501 are located in the corresponding first isolation openings 1401. The plurality of second light emitting devices 1502 are located in the second display area AA2, and a part of the second light emitting devices 1502 are located in the corresponding second isolation openings 1403.

[0072] The support portion 141 has a first orthographic projection on the substrate 111, and the blocking portion 142 has a second orthographic projection on the substrate 111. In the first direction, the distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the first isolation opening 1401 corresponding to the first light emitting device 1501 is a first undercut length SA21, and the distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the second isolation opening corresponding to the second light emitting device 1502 is a second undercut length SA22. For example, in some possible implementations, SA21 is greater than SA22. The first direction is parallel to the substrate 111 in the cross-sectional view shown in FIGS. 4 or 5.

[0073] In some possible implementations, referring to FIG. 5 again, in the first direction, the distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the light-transmitting opening 1402 is a third undercut length SA0. For example, in some possible implementations, SA0 is greater than SA21.

[0074] In some possible implementations, referring to FIG. 19, the display panel further includes a plurality of light emitting devices 150, and the plurality of light emitting devices 150 further include a plurality of third light emitting devices 1503 emitting light of a second color and a plurality of fourth light emitting devices 1504, the light of the second color being different from the light of the first color.

[0075] The plurality of third light emitting devices 1503 are located in the first display area AA1, and a part of the third light emitting devices 1503 are located in the corresponding first isolation openings 1401. The distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the first isolation opening 1401 corresponding to the third light emitting device 1503 is a fourth undercut length SA23. The plurality of fourth light emitting devices 1504 are located in the second display area AA2, and a part of the fourth light emitting devices 1504 are located in the corresponding second isolation openings 1403. The distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the second isolation opening 1403 corresponding to the fourth light emitting device 1504 is a fifth undercut length SA24.

[0076] In some possible implementations, SA23 is greater than SA24, SA21 is greater than SA23, SA22 is greater than SA24, a difference between SA0 and SA21 is less than a difference between SA0 and SA23, and a difference between SA0 and SA22 is less than a difference between SA0 and SA24.

[0077] In some possible implementations, referring to FIG. 20, the display panel further includes a plurality of light emitting devices 150, and the plurality of light emitting devices 150 further include fifth light emitting devices 1505 and sixth light emitting devices 1506 that emit third color light, the first color light, the second color light, and the third color light being different from each other.

[0078] The plurality of fifth light emitting devices 1505 are located in the first display area AA1, a portion of the fifth light emitting devices 1505 is located in the corresponding first isolation opening 1401, and a distance between the first orthographic projection edge and the second orthographic projection edge at the corresponding first isolation opening 1401 of the fifth light emitting device 1505 is a sixth undercut length SA25. The plurality of sixth light emitting devices 1506 are located in the second display area AA2, a portion of the sixth light emitting devices 1506 is located in the corresponding second isolation opening 1403, and a distance between the first orthographic projection edge and the second orthographic projection edge at the corresponding second isolation opening 1403 of the sixth light emitting device 1506 is a seventh undercut length SA26.

[0079] In the manufacturing method of the display panel corresponding to the above-described embodiments, the plurality of isolation openings and the at least one light-transmitting opening are etched in one etching process when etching the isolation material layer. Therefore, in the process of forming the plurality of light emitting devices of different colors, since the light-transmitting opening is partially lost after the evaporation process corresponding to each color of light emitting device, the corresponding undercut length SA0 is greater than the undercut length corresponding to the isolation opening.

[0080] For example, in some possible implementations, SA25 is greater than SA26, SA23 is greater than SA25, SA24 is greater than SA26, a difference between SA0 and SA23 is less than a difference between SA0 and SA25, and a difference between SA0 and SA24 is less than a difference between SA0 and SA26.

[0081] In some possible implementations, the first color light is red, the second color light is green, and the third color light is blue.

[0082] In some possible implementations, SA0>SA21>SA22>SA23>SA24>SA25>SA26.

[0083] In some possible implementations, a difference between SA21 and SA22 is less than or equal to 0.4 microns.

[0084] In some possible implementations, the difference between SA0 and SA21 ranges from 0.1 microns to 0.4 microns.

[0085] Preferably, in some possible implementations, the difference between SA21 and SA22 is less than or equal to 0.2 microns.

[0086] Preferably, in some possible implementations, the difference between SA0 and SA21 ranges from 0.1 microns to 0.2 microns.

[0087] The isolation structure 140 is electrically conductive, and the second electrode 160 extends to be electrically connected with the isolation structure 140.

[0088] Optionally, a normal projection of the light-transmitting opening 1402 on the substrate 111 at least partially does not overlap with a normal projection of the first electrode 120 on the substrate 111. In this way, the light-transmitting property of the second display area AA2 can be improved.

[0089] In some possible implementations, the display panel further includes a pixel definition layer 130, the pixel definition layer 130 is located between the isolation structure 140 and the substrate 111, and the pixel definition layer 130 includes a pixel opening, a normal projection of the pixel opening on the substrate 111 is located within normal projections of the first isolation opening 1401 and the second isolation opening 1403 on the substrate 111. That is, in the embodiment, the pixel opening and the isolation opening are in communication, and jointly form a cavity accommodating the light-emitting device.

[0090] In some possible implementations, the pixel definition layer 130 includes a light-transmitting region, a normal projection of the light-transmitting region on the substrate 111 at least partially overlaps with a normal projection of the light-transmitting opening 1402 on the substrate 111, and a material of the pixel definition layer 130 of the light-transmitting region includes a light-transmitting material. In this way, the light-transmitting property of the second display area AA2 can be improved.

[0091] In some possible implementations, referring to FIG. 23, the pixel definition layer 130 is disposed in the first display area AA1 and the second display area AA2. The pixel definition layer 130 has a side surface flush with a side surface of the shielding portion 142, a side surface of the supporting portion 141, and a side surface of the first encapsulation unit 1701 at a position close to the same light-transmitting opening 1402.

[0092] In some possible implementations, referring to FIG. 24, the pixel definition layer 130 is disposed in the first display area AA1 and the second display area AA2. The pixel definition layer 130 is not coplanar with a side surface of the supporting portion 141 facing the light-transmitting opening 1402 at a position close to the same light-transmitting opening 1402.

[0093] In some possible implementations, the display panel further includes an encapsulation unit 170 located on the side of the second electrode 160 away from the substrate 111, at least part of the encapsulation unit 170 is located in the isolation opening and extends from the isolation opening to the side of the isolation structure 140 away from the substrate 111.

[0094] In a possible implementation, please refer to FIG. 21, the display panel further includes a plurality of encapsulation units. At least part of the encapsulation units is located in the corresponding isolation opening and extends from the isolation opening to the side of the isolation structure away from the substrate 111. The plurality of encapsulation units includes a plurality of first encapsulation units 170. The first encapsulation unit 1701 is located on the side of the corresponding second light emitting device 1502 away from the substrate 111. The orthographic projection of the first encapsulation unit 1701 located on the side of the isolation structure away from the substrate 111 on the substrate 111 is located in the second orthographic projection.

[0095] In a possible implementation, please refer to FIG. 21, the side surface of the shielding part 142, the side surface of the supporting part 141 and the side surface of the first encapsulation unit 1701 are flush at the position close to the same light transmission opening.

[0096] In a possible implementation, please refer to FIG. 22, the side surface of the shielding part 142 and the side surface of the first encapsulation unit 1701 are flush at the position close to the same light transmission opening, and the orthographic projection of the side of the supporting part 141 close to the shielding part 142 on the substrate 111 is located in the orthographic projection of the shielding part 142 on the substrate 111.

[0097] Optionally, please refer to FIG. 7, the display panel further includes a second encapsulation layer 180 and a third encapsulation layer 190 located on the side of the encapsulation unit 170 away from the substrate 111. The second encapsulation layer 180 is located on the side of the encapsulation unit 170 away from the substrate 111 and fills the first isolation opening 1401 and the second isolation opening 1403.

[0098] Optionally, the material of the encapsulation unit 170 and the third encapsulation layer 190 includes inorganic material, and the material of the second encapsulation layer 180 includes organic material. For example, the encapsulation unit 170 and the third encapsulation layer 190 can be formed by chemical vapor deposition (CVD), and the second encapsulation layer 180 can be formed by ink-jet printing (IJP).

[0099] Optionally, the second encapsulation layer 180 fills the light transmission opening 1402.

[0100] In some possible implementations, the etching resistance of the supporting part 141 is less than the etching resistance of the shielding part 142.

[0101] Optionally, the material of the support portion 141 comprises aluminum, and / or the material of the shielding portion 142 comprises titanium.

[0102] Optionally, referring to FIG. 8, the isolation structure 140 further comprises a receiving portion 143 between the support portion 141 and the substrate 111. In a possible implementation, the orthographic projection of the side of the support portion 141 towards the receiving portion 143 on the substrate 111 does not exceed the orthographic projection of the receiving portion 143 on the substrate 111. The orthographic projection of the receiving portion 143 on the substrate 111 is located within the orthographic projection of the shielding portion 142 on the substrate 111 at a position close to the isolation opening 1401.

[0103] Optionally, the material of the receiving portion 143 comprises at least one of molybdenum (chemical formula: Mo) and titanium (chemical formula: Ti).

[0104] Optionally, the material of the support portion 141 comprises aluminum (chemical formula: Al).

[0105] Optionally, the material of the shielding portion 143 comprises titanium.

[0106] Optionally, the shielding portion 143 can be a double-layer structure, the material of the side of the shielding portion 143 away from the support portion 141 comprises Indium Tin Oxide (ITO), and the material of the side of the shielding portion 143 close to the support portion 141 comprises titanium.

[0107] The present disclosure further provides a method for manufacturing a display panel comprising a first display area AA1 and a second display area AA2, referring to FIG. 9, the method can comprise the following steps.

[0108] Step S110, providing a substrate.

[0109] Step S120, forming an isolation material layer on one side of the substrate, the isolation material layer being arranged in the first display area and the second display area.

[0110] Step S130, in a first etching step, etching the isolation material layer to form one of a plurality of isolation openings and at least one light-transmitting opening, wherein the plurality of isolation openings comprise a first isolation opening arranged in the first display area and a second isolation opening arranged in the second display area AA2, and the at least one light-transmitting opening is arranged in the second display area.

[0111] Step S140, in a second etching step, covering and protecting one of the plurality of isolation openings and the at least one light-transmitting opening with other film layers, and etching the isolation material layer to form the other of the plurality of isolation openings and the at least one light-transmitting opening.

[0112] That is, in the etching of the isolation material layer to form the isolation structure, the isolation opening and the light-transmitting opening 1402 are formed in two different etching steps, respectively, wherein the isolation opening is covered and protected by other film layers when the light-transmitting opening 1402 is etched, or the light-transmitting opening 1402 is covered and protected by other film layers when the isolation opening is etched.

[0113] In the method for manufacturing the display panel provided in the embodiment, by forming the isolation opening and the light-transmitting opening 1402 in different etching process steps, respectively, the consistency of the etching environment of the first display area AA1 and the second display area AA2 when the first isolation opening 1401 and the second isolation opening 1403 are formed can be improved, so that the isolation structure 140 arranged in the first display area AA1 has a first undercut length SA21 close to the first isolation opening 1401, the isolation structure 140 arranged in the second display area AA2 has a second undercut length SA22 close to the second isolation opening 1403, and the difference between the first undercut length SA21 and the second undercut length SA22 is less than 0.1 microns.

[0114] In some possible implementation manners, as shown in FIG. 16, the step S130 can include the following sub-steps.

[0115] In step S210, the isolation material layer is etched to form a plurality of isolation openings, including a first isolation opening in the first display area and a second isolation opening in the second display area.

[0116] Since only the first isolation opening 1401 and the second isolation opening 1403 are etched in step S210, and the light-transmitting opening 1402 is not etched, in this case, the density of the openings to be etched in the first display area AA1 and the second display area AA2 in step S210 is the same, and the first undercut length SA21 corresponding to the first isolation opening 1401 and the second undercut length SA22 corresponding to the second isolation opening 1403 are also substantially the same.

[0117] Optionally, after the etching of the first isolation opening 1401 and the second isolation opening 1403 is completed, the pixel definition layer 130 can also be etched to form a pixel opening.

[0118] In step S220, a plurality of light emitting devices and a plurality of encapsulation units in the plurality of isolation openings are formed. The encapsulation unit 170 is located on the side of the light emitting device away from the substrate 111.

[0119] Specifically, referring to FIG. 11, in step S220, the light emitting devices and the encapsulation units 170 can be formed in each of the isolation openings by multiple times of layer-by-layer evaporation and etching. At least part of the encapsulation units 170 extends from the isolation opening to the side wall of the isolation structure 140 away from the substrate 111. That is, the encapsulation units 170 cover and protect the isolation structure 140 at the isolation opening.

[0120] In the process of forming the light emitting devices, since the first undercut length SA21 corresponding to each of the first isolation openings 1401 in the first display area AA1 and the second undercut length SA22 corresponding to each of the second isolation openings 1403 in the second display area AA2 are substantially the same, the overlap between the second electrode 160 and the isolation structure 140 in each of the light emitting devices is also substantially the same, thereby ensuring the uniformity of the light emitting display of the light emitting devices in the first display area AA1 and the second display area AA2.

[0121] Optionally, the light emitting devices formed in step S220 can include first color light emitting devices and second color light emitting devices.

[0122] Optionally, the light emitting devices formed in step S220 can further include third color light emitting devices. For example, the light emitting devices formed in step S220 can include light emitting devices with red, green and blue light emitting colors respectively.

[0123] Step S140 can include the following sub-steps.

[0124] Step S230, the plurality of encapsulation units 170 cover and protect the plurality of isolation openings, and the isolation material layer is etched to form at least one light transmission opening 1402 in the second display area AA2.

[0125] Specifically, after the light emitting devices are formed in step S220, the etching of the light transmission opening 1402 is performed to form the structure as shown in FIG. 4 or FIG. 5.

[0126] In this process, the light emitting devices and the encapsulation units 170 have been formed in each of the first isolation openings 1401 and the second isolation openings 1403, and the encapsulation units 170 can protect the side wall of the isolation structure 140 facing the isolation opening 1401 from being damaged by etching. Therefore, the etching action for the light transmission opening 1402 will no longer affect the morphology of the isolation opening 1401, nor the overlap between the electrode of the light emitting device and the isolation structure 140.

[0127] In some possible implementations, after step S230, the following steps can be further included.

[0128] Step S235: disposing a second encapsulation layer and a third encapsulation layer on a side of the plurality of encapsulation units and the at least one light-transmitting opening away from the substrate.

[0129] The second encapsulation layer 180 is disposed on a side of the plurality of encapsulation units 170 and the at least one light-transmitting opening 1402 away from the substrate 111, and the third encapsulation layer 190 is disposed on a side of the second encapsulation layer 180 away from the substrate 111.

[0130] In some possible implementation, as shown in FIG. 17, step S130 can include the following sub-steps.

[0131] Step S310: etching the isolation material layer to form a plurality of isolation openings, the plurality of isolation openings including a first isolation opening in the first display area and a second isolation opening in the second display area.

[0132] Specifically, as shown in FIG. 12, in step S310, the first isolation opening 1401 and the second isolation opening 1403 can be etched in the first display area AA1 and the second display area AA2.

[0133] Since only the first isolation opening 1401 and the second isolation opening 1403 are etched in step S310, and the light-transmitting opening 1402 is not etched, in this case, the density of the openings etched in the first display area AA1 and the second display area AA2 is the same in step S310, and the first undercut length SA21 corresponding to the first isolation opening 1401 and the second undercut length SA22 corresponding to the second isolation opening 1403 are also substantially the same.

[0134] Step S320: disposing etching stop material covering the first isolation opening and the second isolation opening.

[0135] Specifically, in step S320, the etching stop material such as photoresist can be used to cover the first isolation opening 1401 and the second isolation opening 1403, and then step S140 is performed.

[0136] Step S140 can include the following sub-steps.

[0137] Step S330: etching the isolation material layer to form the at least one light-transmitting opening in the second display area, with the etching stop material covering the plurality of isolation openings.

[0138] Step S340: removing the etching stop material.

[0139] Specifically, in step S330, since the first isolation opening 1401 and the second isolation opening 1403 are covered by the etching stop material, the etching for the light-transmitting opening 1402 does not affect the topography of the first isolation opening 1401 and the second isolation opening 1403, and thus after the etching of the light-transmitting opening 1402 is completed, the first undercut length SA21 corresponding to the first isolation opening 1401 and the second undercut length SA22 corresponding to the second isolation opening 1403 are also substantially the same, and finally a structure as shown in FIG. 13 is formed.

[0140] Optionally, after step S330, the pixel defining layer 130 can be further etched to form a pixel opening at a position corresponding to the isolation opening 1401, as shown in FIG. 14.

[0141] Optionally, after step S340, the following steps can be further included.

[0142] In step S350, a plurality of light emitting devices located in the plurality of isolation openings and a plurality of packaging units are formed, and the packaging units are located on a side of the light emitting devices away from the substrate. A structure as shown in FIG. 4 or FIG. 5 is formed. In this way, after the isolation opening 1401 and the light-transmitting opening 1402 are etched to form, the light emitting device is arranged, which can avoid damage to the light emitting device when the light-transmitting opening 1402 is etched.

[0143] In some other possible implementation manners, as shown in FIG. 18, step S130 can include the following sub-steps.

[0144] In step S410, the isolation material layer is etched to form at least one light-transmitting opening located in the second display area.

[0145] Specifically, referring to FIG. 15, in step S410, the light-transmitting opening 1402 can be formed by one-time etching of the shielding part 142 and the supporting part 141 by using dry etching or wet etching.

[0146] In step S420, an etching stop material covering the at least one light-transmitting opening is arranged.

[0147] Specifically, in step S420, the light-transmitting opening 1402 can be covered by using an etching stop material such as photoresist, and then step S140 is performed.

[0148] Step S140 can include the following sub-steps.

[0149] In step S430, the at least one light-transmitting opening is covered by the etching stop material, and the isolation material layer is etched to form a plurality of isolation openings, and the plurality of isolation openings include a first isolation opening located in the first display area and a second isolation opening located in the second display area.

[0150] Step S440, removing the etching stop material.

[0151] In this process, since the light transmission opening 1402 is covered by the etching stop material, the position corresponding to the light transmission opening 1402 will not consume etching liquid in the etching process for the first isolation opening 1401 and the second isolation opening 1403, and therefore the etching environment of the first display area AA1 and the second display area AA2 is substantially the same in the etching process for the first isolation opening 1401 and the second isolation opening 1403, and therefore the first undercut length SA21 corresponding to the first isolation opening 1401 in the first display area AA1 and the second undercut length SA22 corresponding to the second isolation opening 1403 in the second display area AA2 are also substantially the same, as shown in FIG. 12.

[0152] Optionally, after step S430, the pixel definition layer 130 can be further etched to form a pixel opening at a position corresponding to the isolation opening 1401, as shown in FIG. 14.

[0153] Optionally, after step S440, the following steps can be further included.

[0154] Step S450, forming a plurality of light emitting devices and a plurality of packaging units in the plurality of isolation openings. The structure shown in FIG. 4 or FIG. 5 is formed. In this way, the light emitting devices are disposed after the isolation opening 1401 and the light transmission opening 1402 are etched, which can avoid damage to the light emitting devices when the light transmission opening 1402 is etched.

[0155] In some possible implementation manners, when the isolation material layer is etched to form at least one light transmission opening 1402 in the second display area AA2, dry etching can be used to etch the isolation material layer to form the isolation structure 140 in the second display area AA2 and defining at least one light transmission opening 1402.

[0156] The isolation structure 140 includes a support portion 141 and a shielding portion 142 disposed on a side of the support portion 141 away from the substrate 111. The side surface of the shielding portion 142 disposed in the second display area AA2 and close to the light transmission opening 1402 is flush with the side surface of the support portion 141 disposed in the second display area AA2 and close to the light transmission opening 1402.

[0157] In some possible implementation manners, when the isolation material layer is etched to form at least one light transmission opening 1402 in the second display area AA2, dry etching can be used to etch the isolation material layer to form the isolation structure 140 in the second display area AA2 and defining at least one light transmission opening 1402.

[0158] The isolation structure 140 includes a support portion 141 and a shielding portion 142 disposed on the side of the support portion 141 away from the substrate 111. The side of the support portion 141 disposed in the second display area AA2 and close to the light-transmitting opening 1402, which is close to the shielding portion 142, is in the orthographic projection of the shielding portion 142 disposed in the second display area AA2 and close to the light-transmitting opening 1402 on the substrate 111.

[0159] In addition, the display panel provided by the embodiment also includes a touch structure, an optical film (for example, a microlens or a polaroid), a cover plate, and the like disposed on the side of the third encapsulation layer 190 away from the substrate 111, which are not specifically limited in the embodiment.

[0160] The display panel provided by the embodiment can be used in an electronic device. The electronic device can include a mobile phone, a tablet computer, a smart wearable device, a television, a notebook computer, a display, and the like.

[0161] In summary, the display panel, the method for manufacturing the display panel, and the electronic device provided by the embodiment can improve the consistency of the etching environment of the first display area and the second display area when the first isolation openings and the second isolation openings are formed, so that the undercut lengths of the first isolation openings and the second isolation openings are the same, the uniformity of the lapping effect of the electrodes of the light-emitting devices and the isolation structures in the first display area and the second display area is improved, and the display effect uniformity of the first display area and the second display area is improved.

[0162] The technical features of the above-described embodiments can be combined in any manner. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described, but it should be considered that any combination of the technical features is within the scope of the present disclosure as long as the combination does not cause contradiction.

[0163] The above-described embodiments only express several embodiments of the present application, and the description is relatively specific and detailed, but it should not be considered as a limitation on the scope of the patent. It should be noted that for ordinary skilled persons in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are within the scope of the present application. Therefore, the scope of protection of the present application should be subject to the appended claims.

Claims

1. A display panel comprising a first display area and a second display area, the display panel comprising: a substrate; an isolation structure located on one side of the substrate, disposed in the first display area and the second display area, the isolation structure comprising a support portion and a shielding portion disposed on a side of the support portion away from the substrate; the isolation structure comprising a plurality of isolation openings and at least one light-transmitting opening, the plurality of isolation openings comprising a first isolation opening disposed in the first display area and a second isolation opening disposed in the second display area, the at least one light-transmitting opening being disposed in the second display area, at the first isolation opening and the second isolation opening, a side of the support portion close to the shielding portion is within a projection of the side of the support portion on the substrate; wherein a distance between a projection of the shielding portion disposed in the first display area and close to the first isolation opening on the substrate and a projection of the support portion disposed in the first display area and close to the first isolation opening on the substrate is SA21, a distance between a projection of the shielding portion disposed in the second display area and close to the second isolation opening on the substrate and a projection of the support portion disposed in the second display area and close to the second isolation opening on the substrate is SA22, a difference between the SA21 and the SA22 is less than 0.1 microns. The display panel further comprises a plurality of light emitting devices, the plurality of light emitting devices comprising a plurality of first light emitting devices emitting a first color light and a plurality of second light emitting devices, wherein: the plurality of first light emitting devices are located in the first display area, a part of the first light emitting devices are located in the corresponding first isolation openings, a distance between a projection of the shielding portion disposed in the first display area and close to the corresponding first isolation opening of the first light emitting devices on the substrate and a projection of the support portion disposed in the first display area and close to the corresponding first isolation opening of the first light emitting devices on the substrate is the SA21; the plurality of second light emitting devices are located in the second display area, a part of the second light emitting devices are located in the corresponding second isolation openings, a distance between a projection of the shielding portion disposed in the second display area and close to the corresponding second isolation opening of the second light emitting devices on the substrate and a projection of the support portion disposed in the second display area and close to the corresponding second isolation opening of the second light emitting devices on the substrate is the SA22. The isolation structure further comprises: a receiving portion between the support portion and the substrate, a projection of an end of the receiving portion close to the isolation opening on the substrate is within a projection of the shielding portion on the substrate; wherein a material of the receiving portion comprises at least one of molybdenum and titanium, and / or a material of the support portion comprises aluminum, and / or a material of the shielding portion comprises titanium. 4.The display panel of claim 1, wherein, ​ 2. The display panel of claim 1, wherein, ​ ​ ​ 3. The display panel of claim 1, wherein, ​ ​ ​ ​ A side surface of the shielding portion disposed in the second display area and close to the light-transmitting opening is flush with a side surface of the supporting portion disposed in the second display area and close to the light-transmitting opening; or A side of the supporting portion disposed in the second display area and close to the light-transmitting opening, which is close to the shielding portion, is located within a projection of the shielding portion disposed in the second display area and close to the light-transmitting opening on the substrate.

5. The display panel of claim 2, wherein, The display panel further comprises: A plurality of encapsulation units, at least part of the encapsulation units being located in and extending from the isolation openings to a side of the isolation structure away from the substrate, the plurality of encapsulation units comprising a plurality of first encapsulation units, the first encapsulation units being located at a side of the second light-emitting devices away from the substrate; Wherein, a projection of the first encapsulation units on the substrate, which is located at a side of the isolation structure away from the substrate, is located within a projection of the shielding portion on the substrate.

6. The display panel of claim 5, wherein, At a position close to the same light-transmitting opening: The side surface of the shielding portion, the side surface of the supporting portion and the side surface of the first encapsulation units are flush; or The side surface of the shielding portion and the side surface of the first encapsulation units are flush, and a side of the supporting portion close to the shielding portion is located within a projection of the shielding portion on the substrate.

7. The display panel of claim 5, wherein, The display panel further comprises a pixel definition layer, the pixel definition layer being disposed in the first display area and the second display area, the pixel definition layer being located between the isolation structure and the substrate, the pixel definition layer comprising a plurality of pixel openings, the pixel openings being in communication with the corresponding isolation openings, at a position close to the same light-transmitting opening: The pixel definition layer has a side surface flush with the side surface of the shielding portion, the side surface of the supporting portion and the side surface of the first encapsulation units; or A side of the pixel definition layer close to the supporting portion is not coplanar with a side of the supporting portion facing the light-transmitting opening.

8. The display panel of claim 1, wherein, The light-transmitting opening is located between adjacent isolation openings; the density of the isolation openings in the first display area is the same as the density of the isolation openings in the second display area.

9. The display panel of claim 1, wherein The display panel further comprises a light-emitting device at least partially located in the isolation opening, the light-emitting device comprising a first electrode, a light-emitting unit and a second electrode which are sequentially stacked away from the substrate; the isolation structure has conductivity, the second electrode extends to electrically connect with the isolation structure; a projection of the light-transmitting opening on the substrate at least partially does not coincide with a projection of the first electrode on the substrate; And / or The display panel further comprises a pixel definition layer, the pixel definition layer being located between the isolation structure and the substrate, the pixel definition layer comprising a pixel opening, a projection of the pixel opening on the substrate being located within a projection of the isolation opening on the substrate; And / or The display panel further comprises an encapsulation unit located on a side of the second electrode away from the substrate, at least part of the encapsulation unit is located in the isolation opening and extends from the isolation opening to a side of the isolation structure away from the substrate; the display panel further comprises a second encapsulation layer and a third encapsulation layer located on a side of the encapsulation unit away from the substrate, the second encapsulation layer is located on a side of the encapsulation unit away from the substrate and fills the first isolation opening and the second isolation opening; Materials of the encapsulation unit and the third encapsulation layer comprise inorganic materials, and a material of the second encapsulation layer comprises an organic material; the second encapsulation layer fills the light-transmitting opening.

10. A display panel, the display panel comprising a first display area and a second display area, the display panel comprising: a substrate; an isolation structure located on a side of the substrate, the isolation structure comprising a support portion and a shielding portion which are sequentially stacked in a direction away from the substrate, a side of the support portion close to the shielding portion has a first orthographic projection on the substrate within a second orthographic projection of the shielding portion on the substrate, the isolation structure comprises a plurality of isolation openings and at least one light-transmitting opening, the plurality of isolation openings comprises a first isolation opening and a second isolation opening, the first isolation opening is arranged in the first display area, and the second isolation opening and the at least one light-transmitting opening are arranged in the second display area; a plurality of light emitting devices comprising a plurality of first light emitting devices emitting a first color light and a plurality of second light emitting devices, the plurality of first light emitting devices are located in the first display area, and the plurality of second light emitting devices are located in the second display area, a part of the first light emitting devices are located in the corresponding first isolation opening, and a part of the second light emitting devices are located in the corresponding second isolation opening; wherein the side of the support portion close to the substrate has a first orthographic projection on the substrate, the shielding portion has a second orthographic projection on the substrate, in a first direction, a distance between edges of the first orthographic projection and the second orthographic projection at the first isolation opening corresponding to the first light emitting device is SA21, and a distance between edges of the first orthographic projection and the second orthographic projection at the second isolation opening corresponding to the second light emitting device is SA22, and the SA21 is greater than the SA22.

11. The display panel of claim 10, wherein, In the first direction, a distance between edges of the first orthographic projection and the second orthographic projection at the light-transmitting opening is SA0, and the SA0 is greater than the SA21.

12. The display panel of claim 11, wherein, The plurality of light emitting devices further comprise a plurality of third light emitting devices emitting a second color light and a plurality of fourth light emitting devices, the second color light being different from the first color light, wherein: the plurality of third light emitting devices are located in the first display area, a part of the third light emitting devices are located in the corresponding first isolation opening, and a distance between edges of the first orthographic projection and the second orthographic projection at the first isolation opening corresponding to the third light emitting device is SA23; The fourth light emitting devices are located in the second display area, and a portion of the fourth light emitting devices are located in the corresponding second isolation openings. The distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the corresponding second isolation opening of the fourth light emitting device is SA24. The SA23 is greater than the SA24, the SA21 is greater than the SA23, the SA24 is greater than the SA26, the difference between the SA0 and the SA23 is less than the difference between the SA0 and the SA25, and the difference between the SA0 and the SA24 is less than the difference between the SA0 and the SA26.

13. The display panel of claim 12, wherein, The light emitting devices further include a plurality of fifth light emitting devices and a plurality of sixth light emitting devices emitting a third color light, wherein the first color light, the second color light and the third color light are different from each other. The fifth light emitting devices are located in the first display area, and a portion of the fifth light emitting devices are located in the corresponding first isolation openings. The distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the corresponding first isolation opening of the fifth light emitting device is SA25. The sixth light emitting devices are located in the second display area, and a portion of the sixth light emitting devices are located in the corresponding second isolation openings. The distance between the edge of the first orthographic projection and the edge of the second orthographic projection at the corresponding second isolation opening of the sixth light emitting device is SA26. The SA25 is greater than the SA26, the SA23 is greater than the SA25, the SA24 is greater than the SA26, the difference between the SA0 and the SA23 is less than the difference between the SA0 and the SA25, and the difference between the SA0 and the SA24 is less than the difference between the SA0 and the SA26.

14. The display panel of claim 13, wherein, The first color light is red, the second color light is green, and the third color light is blue.

15. The display panel of claim 13, wherein, SA0>SA21>SA22>SA23>SA24>SA25>SA26.

16. The display panel of claim 11, wherein, The difference between the SA21 and the SA22 is less than or equal to 0.4 microns, and / or the difference between the SA0 and the SA21 is in the range of 0.1 microns to 0.4 microns.

17. The display panel of claim 10, wherein, The display panel further includes: A plurality of packaging units, at least a portion of the packaging units are located in the corresponding isolation openings and extend from the isolation openings to a side of the isolation structure away from the substrate. The packaging units include a plurality of first packaging units, and the first packaging units are located at a side of the second light emitting devices away from the substrate. The orthographic projection of the first packaging units on the side of the isolation structure away from the substrate on the substrate is located in the second orthographic projection.

18. The display panel of claim 17, wherein, The side surface of the shielding portion, the side surface of the supporting portion and the side surface of the first packaging unit are flush at a position close to the same light transmission opening.

19. The display panel of claim 17, wherein, At a position close to the same light-transmitting opening, a side surface of the shielding portion and a side surface of the first encapsulation unit are flush, and a normal projection of a side of the supporting portion close to the shielding portion on the substrate is within a normal projection of the shielding portion on the substrate.

20. The display panel of claim 18, wherein, The display panel further comprises: a pixel defining layer disposed on the first display area and the second display area, the pixel defining layer being located between the isolation structure and the substrate, the pixel defining layer comprising a plurality of pixel openings, the pixel openings being in communication with the corresponding isolation openings; wherein, at a position close to the same light-transmitting opening, the pixel defining layer has a side surface flush with the side surface of the shielding portion, the side surface of the supporting portion and the side surface of the first encapsulation unit.

21. The display panel of claim 19, wherein, The display panel further comprises: a pixel defining layer disposed on the first display area and the second display area, the pixel defining layer being located between the isolation structure and the substrate, the pixel defining layer comprising a plurality of pixel openings, the pixel openings being in communication with the corresponding isolation openings; wherein, at a position close to the same light-transmitting opening, a side of the pixel defining layer close to the supporting portion is not coplanar with a side of the supporting portion facing the light-transmitting opening.

22. The display panel of any one of claims 10 to 21, wherein, The isolation structure further comprises: a receiving portion located between the supporting portion and the substrate, a normal projection of a side of the supporting portion facing the receiving portion on the substrate does not exceed a normal projection of the receiving portion on the substrate; and wherein the material of the receiving portion comprises at least one of molybdenum and titanium, and / or the material of the supporting portion comprises aluminum, and / or the material of the shielding portion comprises titanium.

23. A method for manufacturing a display panel, the display panel comprising a first display area and a second display area, the method comprising: providing a substrate; forming an isolation material layer on a side of the substrate, the isolation material layer being disposed on the first display area and the second display area; in a first etching step, etching the isolation material layer to form one of a plurality of isolation openings and at least one light-transmitting opening, wherein the plurality of isolation openings comprise a first isolation opening disposed on the first display area and a second isolation opening disposed on the second display area, and the at least one light-transmitting opening is disposed on the second display area; in a second etching step, etching the isolation material layer to form the other of the plurality of isolation openings and the at least one light-transmitting opening, with the other film layer covering and protecting one of the plurality of isolation openings and the at least one light-transmitting opening.

24. The method of claim 23, wherein the first etching step comprises: etching the isolation material layer to form a plurality of isolation openings, the plurality of isolation openings comprising a first isolation opening located on the first display area and a second isolation opening located on the second display area; forming a plurality of light-emitting devices and a plurality of encapsulation units in the plurality of isolation openings, the encapsulation units being located on a side of the light-emitting devices away from the substrate; the second etching step comprises: Covering the plurality of isolation openings with the plurality of encapsulation units, and etching the isolation material layer to form at least one light-transmitting opening in the second display area.

25. The method of claim 24, wherein, In the step of forming the plurality of light-emitting devices and the plurality of encapsulation units in the plurality of isolation openings, the plurality of light-emitting devices comprises first color light-emitting devices, second color light-emitting devices and third color light-emitting devices, and after the second etching step, the method further comprises: A second encapsulation layer and a third encapsulation layer are disposed on a side of the plurality of encapsulation units and the at least one light-transmitting opening away from the substrate; The second encapsulation layer is disposed on a side of the plurality of encapsulation units and the at least one light-transmitting opening away from the substrate, and the third encapsulation layer is disposed on a side of the second encapsulation layer away from the substrate.

26. The method of claim 23, wherein The first etching step comprises: Etching the isolation material layer to form a plurality of isolation openings, the plurality of isolation openings comprising a first isolation opening in the first display area and a second isolation opening in the second display area; An etching stop material covering the first isolation opening and the second isolation opening is disposed; The second etching step comprises: Covering the plurality of isolation openings with the etching stop material, and etching the isolation material layer to form at least one light-transmitting opening in the second display area; The etching stop material is removed; After the step of removing the etching stop material, the method further comprises: Forming a plurality of light-emitting devices and a plurality of encapsulation units in the plurality of isolation openings, the encapsulation units being disposed on a side of the light-emitting devices away from the substrate.

27. The method of claim 23, wherein The first etching step comprises: Etching the isolation material layer to form at least one light-transmitting opening in the second display area; An etching stop material covering the at least one light-transmitting opening is disposed; The second etching step comprises: Covering the at least one light-transmitting opening with the etching stop material, and etching the isolation material layer to form a plurality of isolation openings, the plurality of isolation openings comprising a first isolation opening in the first display area and a second isolation opening in the second display area; The etching stop material is removed; After the step of removing the etching stop material, the method further comprises: Forming a plurality of light-emitting devices and a plurality of encapsulation units in the plurality of isolation openings, the encapsulation units being disposed on a side of the light-emitting devices away from the substrate.

28. The method of any one of claims 23-27, wherein, The step of etching the isolation material layer to form at least one light-transmitting opening in the second display area comprises: Etching the isolation material layer to form an isolation structure in the second display area and defining at least one light-transmitting opening by dry etching; The isolation structure comprises a support part and a shielding part arranged on the side of the support part away from the substrate, and the side of the shielding part arranged in the second display area and close to the light-transmitting opening is flush with the side of the support part arranged in the second display area and close to the light-transmitting opening.

29. The method of any one of claims 23-27, wherein, The step of etching the isolation material layer to form at least one light-transmitting opening in the second display area comprises: The isolation material layer is etched by wet etching to form an isolation structure defining at least one light-transmitting opening in the second display area; The isolation structure comprises a support part and a shielding part arranged on the side of the support part away from the substrate, and the side of the shielding part arranged in the second display area and close to the light-transmitting opening is flush with the side of the support part arranged in the second display area and close to the light-transmitting opening.

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