Display substrate and display apparatus

Abstract

A display substrate and a display apparatus. The display substrate comprises a base substrate, a plurality of sub-pixels, an insulating layer and pixel defining patterns. The insulating layer comprises a plurality of recesses, the recesses being at least partially located between adjacent sub-pixels. The pixel defining patterns each comprise pixel defining portions surrounding a plurality of first openings and a plurality of second openings. The display substrate further comprises an isolation layer; the isolation layer comprises a flat portion, the edge of the flat portion being covered by the pixel defining portions. Isolation structures are provided in the recesses; each isolation structure comprises a first isolation portion and a second isolation portion, the edge of the second isolation portion protruding relative to the edge of the first isolation portion to form a protruding portion. The protruding portions are configured to separate at least one of a plurality of film layers, and the second isolation portions are portions of the isolation layer exposed by the second openings. Providing the isolation layer and the isolation structures can alleviate the problem of ghosting and ameliorate the problem of crosstalk between adjacent sub-pixels while improving the flatness of first electrodes.

Description

Display substrate and display device

[0001] Cross Reference to Related Applications

[0002] This application claims priority to Chinese Patent Application No. 202510191873.3, filed February 20, 2025, the disclosure of which is incorporated herein in its entirety by this reference as part of the present application. TECHNICAL FIELD

[0003] At least one embodiment of the present disclosure relates to a display substrate and a display device. BACKGROUND

[0004] A tandem organic light emitting display device improves the life and brightness of the light emitting device, and reduces power consumption by adding at least one light emitting layer and a charge generation layer in the organic light emitting device to meet the user's demand for the life and power consumption of the display device. SUMMARY

[0005] At least one embodiment of the present disclosure provides a display substrate and a display device.

[0006] The display substrate includes a substrate substrate; a plurality of sub-pixels located on the substrate substrate, each of at least part of the sub-pixels including a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer in a direction perpendicular to the substrate substrate, the first electrode being located between the light-emitting functional layer and the substrate substrate, the light-emitting functional layer including a plurality of film layers; an insulating layer located between the first electrode and the substrate substrate; the insulating layer includes a plurality of grooves, the grooves being located at least partially between adjacent sub-pixels; a pixel defining pattern located on a side of the first electrode away from the substrate substrate, the pixel defining pattern including a plurality of first openings and a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, one of the sub-pixels corresponding to at least one first opening, the light-emitting functional layer of the sub-pixel being located at least partially in the first opening corresponding to the sub-pixel, and the first opening being configured to expose the first electrode; wherein the display substrate further includes an isolation layer located between the first electrode and the insulating layer; the isolation layer includes a flat portion overlapping the first electrode in a direction perpendicular to the substrate substrate, an edge of the flat portion being covered by the pixel defining portion; at least part of the grooves are provided with an isolation structure, at least part of the isolation structure being exposed by the second opening; the isolation structure includes a first isolation portion and a second isolation portion arranged in layers, the first isolation portion being located between the second isolation portion and the substrate substrate, at least part of the first isolation portion being located in the groove, an edge of the second isolation portion protruding relative to an edge of the first isolation portion to form a protruding portion, the protruding portion being configured to isolate at least one of the plurality of film layers; the second isolation portion is the part of the isolation layer exposed by the second opening.

[0007] For example, according to at least one embodiment of the present disclosure, the first isolation portion and the insulating layer are integrally formed.

[0008] For example, according to at least one embodiment of the present disclosure, in the arrangement direction of adjacent sub-pixels, the orthogonal projection of the isolation structure on the substrate substrate has a spacing between the orthogonal projection of the pixel defining portion on the substrate substrate.

[0009] For example, according to at least one embodiment of the present disclosure, the protruding portion is configured to isolate the second electrode.

[0010] For example, according to at least one embodiment of the present disclosure, in a direction perpendicular to the substrate substrate, the ratio of the spacing between the flat portion and the substrate substrate to the spacing between the second isolation portion and the substrate substrate is 0.9-1.1.

[0011] For example, according to at least one embodiment of the present disclosure, a maximum depth of the recess is greater than a maximum dimension of the light-emitting functional layer in a direction perpendicular to the substrate substrate; the maximum depth of the recess is 0.2 microns-0.5 microns.

[0012] For example, according to at least one embodiment of the present disclosure, a projection of the first electrode on the substrate substrate is located within a projection of the flat portion on the substrate substrate; in any direction parallel to the substrate substrate, a dimension of the flat portion is not less than a dimension of the first electrode.

[0013] For example, according to at least one embodiment of the present disclosure, the pixel defining portion includes a portion located within the recess, and the portion is spaced apart from the first isolation portion.

[0014] For example, according to at least one embodiment of the present disclosure, an isolation column is disposed in the second opening, located on a side of the isolation structure away from the substrate substrate, and the isolation column covers at least part of the second isolation portion other than the protruding portion.

[0015] For example, according to at least one embodiment of the present disclosure, the pixel defining portion includes a first sidewall, an included angle between at least part of the first sidewall and a contact surface between the pixel defining portion and a bottom wall of the recess is a first slope angle; a projection of the first sidewall on the substrate substrate overlaps a projection of the bottom wall of the recess on the substrate substrate; the isolation column includes a second sidewall, an included angle between at least part of the second sidewall and a contact surface between the isolation column and the second isolation portion is a second slope angle; the first slope angle is greater than the second slope angle, and both the first slope angle and the second slope angle are less than 90 degrees.

[0016] For example, according to at least one embodiment of the present disclosure, the pixel defining portion and the isolation column are configured to be formed by one patterning process.

[0017] For example, according to at least one embodiment of the present disclosure, the display substrate further includes a touch structure located on a side of the pixel defining pattern away from the substrate substrate; the touch structure includes a plurality of layers of touch electrodes, and a projection of at least one layer of the plurality of layers of touch electrodes on the substrate substrate overlaps a projection of part of the isolation structure other than the protruding portion on the substrate substrate.

[0018] For example, according to at least one embodiment of the present disclosure, an isolation column is located in the second opening, on a side of the isolation structure away from the substrate substrate, and the isolation column covers at at least part of the second isolation portion other than the protruding portion; a projection of at least one of the plurality of layers of touch electrodes on the substrate substrate overlaps a projection of the isolation column on the substrate substrate.

[0019] For example, according to at least one embodiment of the present disclosure, the isolation structure in the at least one groove comprises a plurality of sub-isolation structures, and the plurality of sub-isolation structures are arranged at intervals in the arrangement direction of the adjacent sub-pixels.

[0020] For example, according to at least one embodiment of the present disclosure, the number of the second openings is less than the number of groove openings of the grooves.

[0021] For example, according to at least one embodiment of the present disclosure, the distance between the orthographic projection of the second isolation portion on the substrate and the orthographic projection of the pixel defining portion adjacent thereto on the substrate in the arrangement direction of the adjacent sub-pixels is 1-3 microns.

[0022] For example, according to at least one embodiment of the present disclosure, the size of the protruding portion in the arrangement direction of the adjacent sub-pixels is greater than the maximum thickness of the light-emitting functional layer.

[0023] For example, according to at least one embodiment of the present disclosure, the size of the second isolation portion in the arrangement direction of the adjacent sub-pixels is 5-7 microns.

[0024] At least one embodiment of the present disclosure provides a display device comprising the display substrate described in any of the above embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0025] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings described below only relate to some embodiments of the present disclosure, and not limit the present disclosure.

[0026] FIG. 1 is a plan view of a display substrate according to an example of at least one embodiment of the present disclosure.

[0027] FIG. 2 is a cross-sectional view of FIG. 1 taken along line AA'.

[0028] FIG. 3 is a cross-sectional view of a partial structure of the display substrate of FIG. 1.

[0029] FIG. 4 is a cross-sectional view of a display substrate according to an example of at least one embodiment of the present disclosure.

[0030] FIG. 5 is a plan view of a display substrate according to an example of at least one embodiment of the present disclosure.

[0031] FIG. 6 is a cross-sectional view of FIG. 5 taken along line BB'.

[0032] FIGS. 7 and 8 are cross-sectional views of display substrates according to different examples of at least one embodiment of the present disclosure.

[0033] FIGS. 9 and 10 are schematic cross-sectional views of display substrates provided in different examples of at least one embodiment of the present disclosure. DETAILED DESCRIPTION

[0034] In order to make the objects, technical solutions, and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are some but not all of the embodiments of the present disclosure. Based on the described embodiments of the present disclosure, all other embodiments obtained by a person of ordinary skill in the art without creative effort belong to the scope of the present disclosure.

[0035] Unless otherwise defined, technical terms or scientific terms used in the present disclosure shall have the ordinary meanings as understood by a person of ordinary skill in the art to which the present disclosure belongs. The terms “first”, “second”, and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are used to distinguish different components. The terms “include”, “contain”, and similar terms mean that the elements or objects before the terms encompass the elements or objects listed after the terms and their equivalents, and do not exclude other elements or objects.

[0036] The terms “parallel”, “perpendicular”, and “same” and the like used in the present disclosure include the strict “parallel”, “perpendicular”, “same” and the like, and “approximately parallel”, “approximately perpendicular”, “approximately same” and the like with a certain error, which, considering the measurement and the error related to the measurement of a specific value (that is, the limitation of the measurement system), represents the acceptable deviation range for the specific value determined by a person of ordinary skill in the art. The “center” in the embodiments of the present disclosure can include the position strictly at the geometric center and the position approximately at the center within a small area around the geometric center. For example, “approximately” can mean within one or more standard deviations, or within 10% or 5% of the value.

[0037] A single-layer organic light-emitting display device is an organic light-emitting display device including one light-emitting layer, also known as a Single device. Since the display life of the Single device is limited, it is difficult to meet the needs of users, and the Tandem technology emerges as the times require. Since the Tandem device needs to perform at least two times of evaporation of light-emitting materials, the crosstalk problem is particularly serious.

[0038] In the research, the inventors of the present application found that an inorganic isolation structure can be designed around the sub-pixel to separate the light-emitting layer, thereby improving the above-mentioned crosstalk problem. In the research, the inventors of the present application also found that after introducing the above-mentioned inorganic isolation structure, there is a new optical problem under the new process condition, and the display panel has a more serious trailing problem and crosstalk problem under low brightness. Specifically, in the light-emitting layer separated by the isolation groove, the charge generation layer and the cathode directly contact at the position close to the sub-pixel light-emitting area, causing the short circuit of the second layer device (such as the second layer light-emitting layer and the like), and the total capacitance of the second layer device is too large. For example, due to the material properties of the light-emitting layer in the green sub-pixel, the capacitance of the green sub-pixel is large and the efficiency is high, which will cause the display screen of the display device to have a trailing problem.

[0039] The display substrate and the display device are provided. The display substrate comprises a substrate, a plurality of sub-pixels, an insulating layer and a pixel definition pattern. The plurality of sub-pixels are located on the substrate, each of at least part of the sub-pixels comprises a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer in a direction perpendicular to the substrate, the first electrode is located between the light-emitting functional layer and the substrate, and the light-emitting functional layer comprises a plurality of film layers; the insulating layer is located between the first electrode and the substrate; the insulating layer comprises a plurality of grooves, and the grooves are at least partially located between adjacent sub-pixels; the pixel definition pattern is located on a side of the first electrode away from the substrate, and the pixel definition pattern comprises a plurality of first openings and a plurality of second openings, and a pixel definition part surrounding the plurality of first openings and the plurality of second openings, one sub-pixel corresponds to at least one first opening, the light-emitting functional layer of the sub-pixel is at least partially located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode; wherein the display substrate further comprises an isolation layer located between the first electrode and the insulating layer; the isolation layer comprises a flat part, the flat part overlaps the first electrode in a direction perpendicular to the substrate, and the edge of the flat part is covered by the pixel definition part; at least part of the grooves are provided with an isolation structure, at least part of the isolation structure is exposed by the second opening; the isolation structure comprises a first isolation part and a second isolation part arranged in layers, the first isolation part is located between the second isolation part and the substrate, at least part of the first isolation part is located in the groove, the edge of the second isolation part protrudes relative to the edge of the first isolation part to form a protruding part, and the protruding part is configured to separate at least one layer of the multi-layer film layer; the second isolation part is the part of the isolation layer exposed by the second opening.

[0040] The display substrate and the display device provided by at least one embodiment of the present disclosure can improve the crosstalk problem between adjacent sub-pixels by setting the isolation layer, using the flat part to improve the flatness of the first electrode, and using the protruding part of the second isolation part to separate at least one layer in the multi-layer film layer of the light-emitting functional layer. Moreover, the isolation structure arranged in the groove can separate the groove into multiple sub-grooves, which is conducive to prolonging the crosstalk path between adjacent sub-pixels. In addition, in the case where the protruding part separates at least one layer of the multi-layer film layer in the light-emitting functional layer, even if the separated layer directly contacts the second electrode and causes a short circuit, since the position of the short circuit is at the isolation structure, i.e., at the side of the sub-groove away from the light-emitting area of the sub-pixel, the influence of the short circuit on the sub-pixel can be reduced or even eliminated, which is conducive to alleviating the ghosting problem.

[0041] The display substrate and the display device will be described below in conjunction with the accompanying drawings and some embodiments.

[0042] FIG. 1 is a schematic plan view of a display substrate provided by an example in at least one embodiment of the present disclosure. FIG. 2 is a schematic cross-sectional view of the display substrate shown in FIG. 1 taken along the line AA'. FIG. 3 is a schematic cross-sectional view of a partial structure of the display substrate shown in FIG. 1.

[0043] For example, the difference between the schematic cross-sectional view of the display substrate shown in FIG. 3 and the schematic cross-sectional view of the display substrate shown in FIG. 2 is that the display substrate in FIG. 3 omits the light-emitting functional layer and the second electrode. It can be understood that the structure in the display substrate shown in FIG. 3 can be the same as the structure of the display substrate shown in FIG. 2 except for the light-emitting functional layer and the second electrode. However, the present disclosure is not limited thereto, and the display substrate shown in FIG. 3 can also be different from the display substrate shown in FIG. 2 in other aspects.

[0044] Referring to FIGS. 1, 2 and 3, the display substrate includes a substrate 01, a plurality of sub-pixels 100, an insulating layer 200 and a pixel definition pattern 300. The plurality of sub-pixels 100 are located on the substrate 01, and each of at least part of the sub-pixels 100 includes a light-emitting functional layer 130 and a first electrode 110 and a second electrode 120 located on both sides of the light-emitting functional layer 130 in a direction Z perpendicular to the substrate 01, the first electrode 110 is located between the light-emitting functional layer 130 and the substrate 01, and the light-emitting functional layer 130 includes a plurality of film layers. For example, all the sub-pixels can include the light-emitting functional layer, the first electrode and the second electrode. However, the present disclosure is not limited thereto, and only a part of the sub-pixels can include the light-emitting functional layer, the first electrode and the second electrode.

[0045] Referring to FIGS. 1, 2 and 3, the insulating layer 200 is located between the first electrode 110 and the substrate 01, and the insulating layer 200 includes a plurality of grooves 210, at least part of which is located between adjacent sub-pixels 100. As shown in FIG. 3, the dashed box schematically shows the area where the groove 210 is located. For example, adjacent sub-pixels refer to the absence of other sub-pixels between the two adjacent sub-pixels. For example, the groove can be completely located between adjacent sub-pixels, or only a part of it can be located between adjacent sub-pixels, which is not limited in the present disclosure.

[0046] Referring to FIGS. 1, 2 and 3, the pixel defining pattern 300 is located on the side of the first electrode 110 away from the substrate 01, and the pixel defining pattern 300 includes a plurality of first openings 301 and a plurality of second openings 302, and a pixel defining portion 310 surrounding the plurality of first openings 301 and the plurality of second openings 302, and one sub-pixel 100 corresponds to at least one first opening 301. For example, one sub-pixel can correspond to one first opening, or more than two first openings.

[0047] Referring to FIGS. 1, 2 and 3, the light-emitting functional layer 130 of the sub-pixel 100 is at least partially located in the first opening 301 corresponding to the sub-pixel 100, and the first opening 301 is configured to expose the first electrode 110. For example, the first electrode 110 and the second electrode 120 located on both sides of the light-emitting functional layer 130 can drive the light-emitting functional layer 130 in the first opening 301 of the pixel defining pattern 300 to emit light. For example, the light-emitting functional layer can be located only in the first opening, or can be located in the first opening and on the pixel defining portion, or can be located in the first opening, on the pixel defining portion and in the second opening and on the isolation structure in the example described below, which is not limited in the present disclosure.

[0048] Referring to FIGS. 1, 2 and 3, the display substrate further includes an isolation layer 02 located between the first electrode 110 and the insulating layer 200. The isolation layer 02 includes a flat portion 400, which overlaps the first electrode 110 in a direction perpendicular to the substrate 01, and the edges of the flat portion 400 are covered by the pixel defining portion 310. For example, the flat portion 400 can provide a flat surface for the first electrode 110, reducing the risk of the first electrode 110 breaking.

[0049] Referring to FIGS. 1, 2 and 3, at least part of the groove 210 is provided with an isolation structure 500. For example, all grooves can be provided with an isolation structure, or only a part of the grooves can be provided with an isolation structure, which is not limited in the present disclosure. At least part of the isolation structure 500 is exposed by the second opening 302. For example, the second opening can expose all of the isolation structure, or only a part of the isolation structure, which is not limited in the present disclosure.

[0050] Referring to FIG. 1, FIG. 2 and FIG. 3, the isolation structure 500 includes a first isolation portion 510 and a second isolation portion 520 which are arranged in a stack, and the first isolation portion 510 is located between the second isolation portion 520 and the substrate 01. At least part of the first isolation portion 510 is located in the groove 210. For example, the first isolation portion can be completely located in the groove, or only a part of the first isolation portion can be located in the groove, and the present disclosure does not limit this.

[0051] Referring to FIG. 1, FIG. 2 and FIG. 3, the edge of the second isolation portion 520 protrudes relative to the edge of the first isolation portion 510 to form a protruding portion 521, and the protruding portion 521 is configured to isolate at least one layer of the multi-layer film layer of the light-emitting functional layer 130. The second isolation portion 520 is the part of the isolation layer 02 which is exposed by the second opening 302. For example, the protruding portion can isolate one layer of the multi-layer film layer, or the protruding portion can isolate all layers of the multi-layer film layer, and the present disclosure does not limit this.

[0052] Referring to FIG. 1, FIG. 2 and FIG. 3, the display substrate provided by the embodiments of the present disclosure can isolate at least one layer of the multi-layer film layer of the light-emitting functional layer 130 by the protruding portion 521 of the second isolation portion 520 while improving the flatness of the first electrode 110 by the flat portion 400, thereby improving the crosstalk problem between adjacent sub-pixels 100. Moreover, the isolation structure 500 arranged in the groove 210 can divide the groove 210 into multiple sub-grooves, which is conducive to prolonging the crosstalk path between adjacent sub-pixels 100. In addition, in the case where the protruding portion 521 isolates at least one layer of the multi-layer film layer of the light-emitting functional layer 130, even if the isolated layer directly contacts the second electrode 120 to cause a short circuit as shown in FIG. 2, since the position of the short circuit is at the isolation structure 500, i.e., at the side of the sub-groove away from the light-emitting area of the sub-pixel 100, the influence of the short circuit on the sub-pixel 100 can be reduced or even eliminated, which is conducive to improving the ghosting problem.

[0053] For example, the material of the first isolation portion is different from the material of the second isolation portion, so that the protruding portion of the second isolation portion can be formed by using the different material characteristics of the first isolation portion and the second isolation portion in the etching process.

[0054] For example, the material of the isolation layer includes inorganic non-metallic material, and the material of the insulating layer includes organic material. For example, the material of the isolation layer can include silicon nitride or silicon oxide. For example, the insulating layer can be a planarization layer, and the material of the insulating layer can include polyimide and the like. It can be understood that in combination with the foregoing examples, the materials of the flat portion and the second isolation portion can both be inorganic non-metallic material, and the material of the first isolation portion can be organic material.

[0055] Referring to FIG. 1, FIG. 2 and FIG. 3, after the insulating material layer is formed on the substrate, a planar isolation material layer can be formed, and the isolation material layer can be etched by an etching liquid to form a flat portion, a groove, and an isolation structure disposed in the groove. For example, the isolation material layer is etched by the etching liquid to form two sub-grooves to form the isolation structure. Since the etching selectivity of the etching liquid to the material of the insulating material layer is greater than the etching selectivity of the etching liquid to the material of the isolation material layer, the edges of the two sub-grooves formed after etching are respectively inwardly recessed relative to the edges of the flat portion and the second isolation portion. Thus, the edge of the second isolation portion can protrude relative to the edge of the first isolation portion to form a protruding portion of the second isolation portion, and the edge of the flat portion can protrude relative to the edge of the groove to form a protruding portion of the flat portion.

[0056] For example, FIG. 2 schematically circumscribes the protruding portion 521 of the second isolation portion 520 with a dashed line box, and the protruding portion 410 of the flat portion 400 protruding relative to the edge of the groove 211 is divided by a dashed line. For example, the protruding portion 521 and the portion of the second isolation portion 520 other than the protruding portion 521 are integrally formed. For example, the protruding portion 410 and the portion of the flat portion 400 other than the protruding portion 410 are integrally formed.

[0057] Referring to FIG. 1, for example, FIG. 1 schematically shows a plurality of openings on the isolation layer 02. In combination with FIG. 1 and FIG. 2, the openings of the above-mentioned isolation layer 02 are the intervals between the adjacent sub-pixels 100 between the flat portion 400 and the second isolation portion 520 along the arrangement direction of the adjacent sub-pixels 100. In combination with FIG. 1 to FIG. 3, the openings of the isolation layer 02 are located in the groove opening 201 of the groove 210, and the isolation structure 500 is located between the openings of the two isolation layers 02 adjacent to each other along the arrangement direction of the adjacent sub-pixels 100.

[0058] Referring to FIG. 1, FIG. 2 and FIG. 3, for example, the plurality of sub-pixels 100 can include a first sub-pixel 101, a second sub-pixel 102 and a third sub-pixel 103. For example, the first sub-pixel 101 can be a red sub-pixel, the second sub-pixel 102 can be a green sub-pixel, and the third sub-pixel 103 can be a blue sub-pixel.

[0059] Referring to FIG. 1, FIG. 2 and FIG. 3, the first opening 301 surrounded by the pixel defining portion 310 is used to define the light emitting area of the sub-pixel 100. For example, the second opening 302 can be formed by the pixel defining portion 310. For example, the above-mentioned light emitting area can refer to the area in which the sub-pixel effectively emits light, and the shape of the light emitting area refers to a two-dimensional shape, for example, the shape of the light emitting area can be the same as the shape of the first opening 301 surrounded by the pixel defining portion 310.

[0060] Referring to FIGS. 1, 2 and 3, for example, the first electrode 110 can be an anode, and the second electrode 120 can be a cathode. For example, the anode can be formed of a transparent conductive material having a high work function. For example, the cathode can be formed of a material having high conductivity and a low work function, for example, the cathode can be made of a metal material.

[0061] Referring to FIG. 1, for example, the first electrode 110 can include a body portion 111 and a connection portion 112. For example, the first opening 301 exposes a portion of the body portion 111 to define a light emitting region of the sub-pixel 100. For example, the connection portion 112 is configured to be electrically connected with other structures, for example, the connection portion 112 is configured to be electrically connected with a pixel circuit through a via.

[0062] Referring to FIGS. 1, 2 and 3, for example, the light emitting functional layer 130 can include a first emitting layer (EML), a charge generation layer 133 (CGL) and a second emitting layer (EML) which are stacked, and the charge generation layer 133 is located between the first emitting layer and the second emitting layer. The charge generation layer 133 has strong conductivity, and can make the light emitting functional layer have advantages of long service life, low power consumption and high brightness. For example, compared with a light emitting functional layer without the charge generation layer, the sub-pixel can increase the light emitting brightness by nearly one time by setting the charge generation layer in the light emitting functional layer.

[0063] Referring to FIGS. 1 and 2, for example, in each sub-pixel 100, the light emitting functional layer 130 can further include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL) and an electron injection layer (EIL). For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer and the charge generation layer are common film layers of the plurality of sub-pixels, which can be referred to as common layers. For example, the above common layers and the second electrode can be film layers formed by using an open mask.

[0064] Referring to FIGS. 1 and 2, for example, the second emitting layer can be located between the first emitting layer and the second electrode 120, and the hole injection layer can be located between the first electrode 110 and the first emitting layer. For example, an electron transport layer can be further provided between the charge generation layer and the first emitting layer. For example, a hole transport layer can be provided between the second emitting layer and the charge generation layer. For example, an electron transport layer and an electron injection layer can be provided between the second emitting layer and the second electrode 120.

[0065] Referring to FIGS. 1 and 2, for example, the material of the flat portion 400 can be the same as that of the second isolation portion 520, so that the flat portion 400 and the second isolation portion 520 can be formed by using one patterning process, thereby simplifying the manufacturing process.

[0066] Referring to FIGS. 1 and 2, in some examples, the first isolation portion 510 is integrally formed with the insulating layer 200 to simplify the manufacturing process. For example, the dashed line extending in the X direction shown in FIG. 2 schematically shows the boundary between the first isolation portion 510 and the insulating layer 200. For example, the material of the first isolation portion can be the same as the material of the material layer. For example, the two sub-grooves can be formed by etching, thereby forming the isolation structure arranged in the groove.

[0067] However, the present disclosure is not limited thereto. For example, the first isolation portion can also be formed separately from the insulating layer. For example, the material of the first isolation portion can be different from the material of the insulating layer.

[0068] Referring to FIG. 2, in some examples, in the arrangement direction of the adjacent sub-pixels 100, such as the X direction, the orthographic projection of the isolation structure 500 on the substrate 01 has a gap G with the orthographic projection of the pixel defining portion 310 on the substrate 01, so that the gap G and the protruding portion 521 can be used in cooperation to make a part of the light-emitting functional layer 130 extend to the bottom wall of the groove 210, prevent the part of the light-emitting functional layer 130 covering on the second isolation portion 520 from directly contacting the part of the light-emitting functional layer 130 covering on the pixel defining portion 310, and achieve the isolation of at least one film layer in the light-emitting functional layer 130.

[0069] Referring to FIGS. 1 and 2, for example, FIGS. 1 and 2 schematically show a group of adjacent blue sub-pixels 103 and green sub-pixels 102 arranged in the X direction, but the present disclosure does not limit the arrangement direction of the sub-pixels to the X direction. For example, FIG. 1 also shows a group of adjacent blue sub-pixels 103 and green sub-pixels 102 arranged in the Y direction, a group of adjacent green sub-pixels 102 and red sub-pixels 101 arranged in the X direction, and a group of adjacent red sub-pixels 101 and green sub-pixels 102 arranged in the Y direction.

[0070] Referring to FIG. 1, for example, the X direction is perpendicular to the Y direction, and both are parallel to the substrate 01.

[0071] Referring to FIG. 2, in some examples, the protruding portion 521 is configured to isolate the second electrode 120. For example, the protruding portion 521 can isolate all the film layers in the light-emitting functional layer 130 and the second electrode 120, thereby improving the improvement effect on the crosstalk problem.

[0072] Referring to FIG. 3, in some examples, a ratio of a spacing D1 between the planar portion 400 and the substrate 01 in a direction Z perpendicular to the substrate 01 and a spacing D2 between the second isolation portion 520 and the substrate 01 is 0.9-1.1. For example, the spacing D1 between the planar portion 400 and the substrate 01 and the spacing D2 between the second isolation portion 520 and the substrate 01 are substantially the same, facilitating the planar portion 400 and the second isolation portion 520 being disposed in the same layer.

[0073] Referring to FIG. 3, for example, the ratio of the spacing D1 and the spacing D2 can be 0.91-1.09. For example, the ratio of the spacing D1 and the spacing D2 can be 0.91-1.09. For example, the ratio of the spacing D1 and the spacing D2 can be 0.95-1.05. For example, the ratio of the spacing D1 and the spacing D2 can be 1.

[0074] Referring to FIGS. 2 and 3, in some examples, a maximum depth D3 of the groove 210 is greater than a maximum dimension D4 of the light-emitting functional layer 130 in the direction Z perpendicular to the substrate 01, and the maximum depth D3 of the groove 210 is 0.2-0.5 microns. In this way, the groove 210 can assist the isolation structure 500 to achieve isolation of the light-emitting functional layer 130.

[0075] Referring to FIG. 2, in some examples, a footprint of the first electrode 110 on the substrate 01 is located within a footprint of the planar portion 400 on the substrate 01. In this way, the planar portion 400 can provide a larger area of flat surface for the first electrode 110 thereabove, facilitating prevention of disconnection of the first electrode 110 due to formation of structures such as steps.

[0076] Referring to FIG. 2, in some examples, in any direction parallel to the substrate 01 (such as the X direction), a dimension of the planar portion 400 is not less than a dimension of the first electrode 110, facilitating flatness of the first electrode 110.

[0077] For example, in any direction parallel to the substrate, the dimension of the planar portion can be greater than the dimension of the first electrode. For example, in any direction parallel to the substrate, the dimension of the planar portion can be equal to the dimension of the first electrode.

[0078] Referring to FIGS. 2 and 3, in some examples, the pixel-defining portion 310 includes a portion 311 located within the groove 210, and the portion 311 is spaced apart from the first isolation portion 510. The portion 311 of the pixel-defining portion 310 extends into the groove 210, thereby being able to cover an edge of the planar portion 400, preventing the light-emitting functional layer 130 and the second electrode 120 from being isolated by the planar portion 400, and facilitating the second electrode 120 being able to be continuously disposed on the pixel-defining portion 310 while extending a crosstalk path of the charge generation layer.

[0079] Referring to FIGS. 2 and 3, for example, the material of the flat portion 400 can be different from the material of the insulating layer 200. In combination with the aforementioned example of etching the protruding portion 521 of the second isolation portion 520 using an etchant, after etching using the etchant, the edge of the flat portion 400 protrudes relative to the opening of the groove 210 to form the protruding portion 410. The portion 311 of the pixel defining portion 310 disposed within the groove 210 can cover the protruding portion 410, so that the light-emitting functional layer 130 and the second electrode 120 can be continuously disposed on the side of the pixel defining portion 310 away from the substrate 01 without being interrupted.

[0080] Referring to FIGS. 1 and 3, for example, in the X direction, the size a of the edge of the first electrode 110 covered by the pixel defining portion 310 is not greater than 2 microns. By setting the numerical range of the size a, the pixel aperture ratio can be improved while the covering effect on the first electrode 110 is improved.

[0081] Referring to FIGS. 1 and 3, for example, the size a can be 2 microns. For example, the size a can be 0.1 microns to 1.9 microns. For example, the size a can be 0.2 microns to 1.85 microns. For example, the size a can be 0.3 microns to 1.8 microns. For example, the size a can be 0.4 microns to 1.7 microns. For example, the size a can be 0.5 microns to 1.6 microns. For example, the size a can be 0.6 microns to 1.5 microns. For example, the size a can be 0.7 microns to 1.4 microns. For example, the size a can be 0.8 microns to 1.3 microns. For example, the size a can be 0.9 microns to 1.2 microns. For example, the size a can be 1 micron to 1.1 microns. It can be understood that the size a can also be other numerical values within the above ranges, which are not listed one by one in the present disclosure.

[0082] Referring to FIGS. 1, 2 and 3, for example, in the X direction, the difference between the size of the orthographic projection of the pixel defining portion 310 on the substrate 01 and the size a is the size b, and the size b is 3 microns to 4.5 microns. By setting the numerical range of the size b, the protruding portion 410 of the flat layer 400 can be well covered, and the light-emitting functional layer 130 and the second electrode 120 can be prevented from being interrupted.

[0083] Referring to FIGS. 1, 2 and 3, for example, the size b can be 3 microns to 4.4 microns. For example, the size b can be 3.1 microns to 4.35 microns. For example, the size b can be 3.15 microns to 4.3 microns. For example, the size b can be 3.2 microns to 4.25 microns. For example, the size b can be 3.25 microns to 4.2 microns. For example, the size b can be 3.3 microns to 4.15 microns. For example, the size b can be 3.4 microns to 4.1 microns. For example, the size b can be 3.5 microns to 4 microns. For example, the size b can be 3.6 microns to 3.9 microns. For example, the size b can be 3.7 microns to 3.8 microns. It can be understood that the size b can also be other values within the above ranges, which are not listed one by one herein.

[0084] Referring to FIGS. 1, 2 and 3, in some examples, the distance c in the arrangement direction of the adjacent sub-pixels 100 between the orthographic projection of the second isolation portion 520 on the substrate substrate 01 and the orthographic projection of the pixel defining portion 310 immediately adjacent thereto on the substrate substrate 01 is 1 micron to 3 microns. By setting the numerical range of the above distance c, it can be prevented that the second isolation portion 520 is in direct contact with the pixel defining portion 310, so as to separate at least one layer in the light-emitting functional layer 130 by the protruding portion 521 of the second isolation portion 520.

[0085] Referring to FIGS. 1, 2 and 3, for example, the distance c can be 1.1 microns to 2.9 microns. For example, the distance c can be 1.2 microns to 2.8 microns. For example, the distance c can be 1.3 microns to 2.7 microns. For example, the distance c can be 1.4 microns to 2.6 microns. For example, the distance c can be 1.5 microns to 2.5 microns. For example, the distance c can be 1.55 microns to 2.4 microns. For example, the distance c can be 1.6 microns to 2.3 microns. For example, the distance c can be 1.65 microns to 2.2 microns. For example, the distance c can be 1.7 microns to 2.1 microns. For example, the distance c can be 1.75 microns to 2 microns. For example, the distance c can be 1.8 microns to 1.9 microns. It can be understood that the distance c can also be other values within the above ranges, which are not listed one by one herein. The disclosure is not limited in this regard.

[0086] Referring to FIGS. 1, 2 and 3, for example, it is referred to that the orthographic projection of the second isolation portion 520 immediately adjacent to each other on the substrate substrate 01 and the orthographic projection of the pixel defining portion 310 on the substrate substrate 01 means that there is no orthographic projection of other second isolation portions 520 on the substrate substrate 01 and no orthographic projection of other pixel defining portions 310 on the substrate substrate 01 between the two orthographic projections. However, there can be orthographic projections of other film layers or other structures between the two orthographic projections, such as the orthographic projection of the insulating layer 200 on the substrate substrate 01 between the two orthographic projections, and the disclosure is not limited in this regard.

[0087] Referring to FIGS. 1, 2 and 3, in some examples, the second isolation portion 520 has a dimension d in the arrangement direction of the adjacent sub-pixels 100 of 5 to 7 micrometers. For example, the dimension d can be much greater than the maximum thickness of the light-emitting functional layer 130. By setting the numerical range of the dimension d as described above, it is beneficial to block at least one film layer in the light-emitting functional layer 130 and to make the position where the second electrode 120 directly contacts the charge generation layer 133 in the light-emitting functional layer 130 to cause short circuit as far away from the first electrode 110 as possible, thereby reducing the impact of short circuit on the sub-pixel 100.

[0088] Referring to FIGS. 1, 2 and 3, for example, the dimension d can be 5.1 to 6.9 micrometers. For example, the dimension d can be 5.2 to 6.8 micrometers. For example, the dimension d can be 5.3 to 6.7 micrometers. For example, the dimension d can be 5.4 to 6.6 micrometers. For example, the dimension d can be 5.5 to 6.5 micrometers. For example, the dimension d can be 5.65 to 6.45 micrometers. For example, the dimension d can be 5.7 to 6.4 micrometers. For example, the dimension d can be 5.75 to 6.39 micrometers. For example, the dimension d can be 5.8 to 6.31 micrometers. For example, the dimension d can be 5.9 to 6.3 micrometers. For example, the dimension d can be 5.95 to 6.25 micrometers. For example, the dimension d can be 6 to 6.2 micrometers. For example, the dimension d can be 6.1 to 6.15 micrometers. It can be understood that the dimension d can also be other values within the above ranges, which are not listed one by one herein.

[0089] Referring to FIGS. 1, 2 and 3, in some examples, the protruding portion 521 has a dimension in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100 greater than the maximum thickness of the light-emitting functional layer 130, so as to block all film layers in the light-emitting functional layer 130 by the protruding portion 521.

[0090] Referring to FIGS. 1, 2 and 3, for example, the maximum thickness of the light-emitting functional layer 130 can refer to the maximum distance between the side surface of the light-emitting functional layer 130 on the flat surface away from the substrate 01 and the flat surface in the direction Z perpendicular to the substrate 01. For example, the flat surface can refer to the surface of the first electrode 110 away from the substrate 01. For example, the flat surface can refer to the surface of the second isolation portion 520 away from the substrate 01.

[0091] Referring to FIGS. 1, 2 and 3, for example, the size of the protrusion 521 in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100 is greater than the sum of the maximum thickness of the light-emitting functional layer 130 and the maximum thickness of the second electrode 120, so as to block all film layers in the light-emitting functional layer 130 and the second electrode 120 by the protrusion 521. For example, the maximum thickness of the second electrode 120 can refer to the maximum distance between the side surface of the second electrode 120 away from the substrate 01 and the flat surface of the second electrode 120 in the direction Z perpendicular to the substrate 01. For example, the flat surface can refer to the surface of the first electrode 110 away from the substrate 01. For example, the flat surface can refer to the surface of the second isolation portion 520 away from the substrate 01.

[0092] Referring to FIGS. 2 and 3, for example, the other film layer 011 between the insulating layer 200 and the substrate 01 can include a gate insulating layer, an interlayer insulating layer, various film layers in a pixel circuit (e.g., including a thin film transistor, a storage capacitor, etc.), a data line, a gate line, an initialization signal line, a power signal line, a reset power signal line, a reset control signal line, a light-emitting control signal line, etc. For example, the side surface of the insulating layer 200 facing the substrate 01 can be in contact with the interlayer insulating layer.

[0093] Referring to FIGS. 1 to 3, for example, in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100, the distance between the orthographic projection of the isolation structure 500 on the substrate 01 and the orthographic projection of the first electrode 100 of the two sub-pixels 100 on the substrate 01 is substantially the same. For example, the isolation structure 500 can be arranged as much as possible in the middle of the groove 210, so as to facilitate the consistency of the crosstalk path of the elongated charge generation layer of each sub-pixel 100. However, the disclosure is not limited thereto, for example, the position of the isolation structure can be closer to one of the two adjacent sub-pixels.

[0094] FIG. 4 is a schematic cross-sectional view of a display substrate provided by an example of at least one embodiment of the present disclosure.

[0095] For example, FIG. 4 only schematically shows part of the structure in the display substrate, such as the structure of the light-emitting functional layer, the second electrode, etc. For example, the difference between the display substrate shown in FIG. 4 and the display substrate shown in FIG. 3 is that the display substrate shown in FIG. 4 includes an isolation column. It can be understood that the structure in the display substrate shown in FIG. 4 can be the same as the structure in the display substrate shown in FIG. 3 except for the isolation column. However, the display substrate shown in FIG. 4 can also be different from the display substrate shown in FIG. 3 in other aspects, which is not limited in the present disclosure.

[0096] Referring to FIG. 4, in some examples, the second opening 302 is provided with an isolation column 320 on a side of the isolation structure 500 away from the substrate 01, the isolation column 320 covering at least part of the second isolation portion 520 except the protruding portion 521. The isolation column 320 leaves the part where the protruding portion 521 is located, which is conducive to reliably isolating at least one film layer in the light-emitting functional layer by the protruding portion 521. By providing the isolation column 320, it is conducive to prolonging the crosstalk path of the light-emitting functional layer, so as to alleviate the ghosting problem of the sub-pixel while reducing the crosstalk between adjacent sub-pixels.

[0097] Referring to FIG. 4, for example, the second opening 302 can be formed by the pixel defining portion 310.

[0098] Referring to FIG. 4, for example, the isolation column 320 can cover all of the isolation structure 500 except the protruding portion 521, or can only cover part of the part of the isolation structure 500 except the protruding portion 521, and the present disclosure does not limit this.

[0099] Referring to FIG. 4, in some examples, the pixel defining portion 310 includes a first side wall 3101, an included angle between at least part of the first side wall 3101 and a contact surface between the pixel defining portion 310 and the bottom wall 211 of the groove 210 is a first slope angle p, and a normal projection of the first side wall 3101 on the substrate 01 overlaps a normal projection of the bottom wall 211 of the groove 210 on the substrate 01. For example, in the arrangement direction (such as the X direction) of the adjacent sub-pixel 100, the first side wall 3101 is a side wall of the side of the pixel defining portion 310 away from the first electrode 110.

[0100] Referring to FIG. 4, in some examples, the isolation column 320 includes a second side wall 3201, an included angle between at least part of the second side wall 3201 and a contact surface between the isolation column 320 and the second isolation portion 520 is a second slope angle q.

[0101] Referring to FIG. 4, in some examples, the first slope angle p is greater than the second slope angle q, and both the first slope angle p and the second slope angle q are less than 90 degrees, so as to facilitate the continuous arrangement of the light-emitting functional layer and the second electrode by arranging the second slope angle q with a smaller angle.

[0102] Referring to FIG. 4, for example, the pixel defining portion 310 further includes a third side wall 3102 opposite to the first side wall 3101 in the X direction, an included angle between at least part of the third side wall 3102 and a plane parallel to the contact surface between the first electrode 110 and the pixel defining portion 310 is a third slope angle m, and the third slope angle m is less than the first slope angle p.

[0103] Referring to FIG. 4, for example, the third slope angle m is not greater than the second slope angle q. For example, the third slope angle m can be equal to the second slope angle q. For example, the third slope angle m can be less than the second slope angle q.

[0104] Referring to FIG. 4, for example, the isolation column 320 further includes a fourth side wall 3202 opposite the second side wall 3201 in the X direction, at least a portion of the fourth side wall 3202 has a slope angle with a plane parallel to the contact surface of the isolation column 320 and the second isolation portion 520, and the fourth slope angle n is substantially the same as the second slope angle q.

[0105] For example, the above-mentioned slope angle refers to an acute angle between two surfaces. For example, the above-mentioned slope angle ranges from 20 degrees to 60 degrees. For example, the above-mentioned slope angle ranges from 30 degrees to 50 degrees. The above-mentioned slope angle ranges from 35 degrees to 45 degrees.

[0106] For example, FIG. 4 schematically shows that the first side wall 3101, the second side wall 3201, the third side wall 3102, and the fourth side wall 3202 are all straight edges, but are not limited thereto. In actual processes, the above-mentioned side walls (for example, the first side wall 3101, the second side wall 3201, the third side wall 3102, and the fourth side wall 3202) can also be curved edges. For example, the curved edges can curve towards one side away from the center of the pixel defining portion (for example, the pixel defining portion 310 or the isolation column 320) where the curved edges are located, or the curved edges can curve towards one side close to the center of the pixel defining portion where the curved edges are located. In this case, the slope angle between the curved edge and the contact surface can refer to the included angle between the tangent line at the midpoint of the curved edge and the contact surface, or can refer to the included angle between the tangent line at the intersection point of the curved edge and the contact surface and the contact surface.

[0107] Referring to FIG. 4, in some examples, the pixel defining portion 310 and the isolation column 320 are configured to be formed by one patterning process, so as to facilitate simplifying the manufacturing process.

[0108] FIG. 5 is a plan view of a display substrate provided by an example of at least one embodiment of the present disclosure. FIG. 6 is a cross-sectional view of FIG. 5 taken along the line BB’.

[0109] For example, the display substrate shown in FIG. 5 is different from the display substrate shown in FIG. 1 in that the display substrate shown in FIG. 5 includes a touch structure. It can be understood that the structures of the display substrate shown in FIG. 5 except the touch structure can be the same as the display substrate structure shown in FIG. 1. However, the display substrate shown in FIG. 5 can also be different from the display substrate shown in FIG. 1 in other aspects, which is not limited in the present disclosure.

[0110] Referring to FIGS. 5 and 6, in some examples, the display substrate further includes a touch structure 600 located on a side of the pixel defining pattern 300 away from the substrate 01. The touch structure 600 includes a plurality of layers of touch electrodes 610, and a projection on the substrate 01 of at least one of the plurality of layers of touch electrodes 610 overlaps a projection on the substrate 01 of the portion of the isolation structure 500 other than the protrusion 521.

[0111] Referring to FIGS. 5 and 6, the second electrode 120 located above the isolation structure 500 (i.e., on a side away from the substrate 01) is not blocked, and thus signals transmitted by structures such as data lines, gate lines, initialization signal lines, and the like between the insulating layer 200 and the substrate 01 can be shielded by the second electrode 120. Thus, by disposing at least one of the plurality of layers of touch electrodes 610 above the isolation structure 500 while avoiding the protrusion 521, signal shielding can be achieved using the second electrode 120 to prevent signals transmitted by the touch structure 600 from being affected by coupling from other signals. In this way, it is beneficial to prevent abnormal functioning of the touch structure, to improve display effects.

[0112] For example, a projection on the substrate 01 of only one of the touch electrodes can overlap a projection on the substrate 01 of the portion of the isolation structure other than the protrusion. For example, a projection on the substrate 01 of multiple ones of the touch electrodes can overlap a projection on the substrate 01 of the portion of the isolation structure other than the protrusion. For example, a projection on the substrate 01 of all of the touch electrodes can overlap a projection on the substrate 01 of the portion of the isolation structure other than the protrusion.

[0113] For example, the touch structure can be a single-layer touch structure or a double-layer touch structure, and the present disclosure does not limit the specific structure of the touch structure. For example, the touch electrodes can include a first touch electrode and a second touch electrode. Referring to FIG. 5, FIG. 5 schematically shows that the first touch electrode and the second touch electrode are disposed in the same layer when the touch structure is a single-layer touch structure. When the touch structure is a double-layer touch structure, the first touch electrode and the second touch electrode are disposed in different layers. The present disclosure does not limit the specific structure of the touch structure.

[0114] For example, referring to FIG. 6, other film layers 012 can be further disposed between the second electrode 120 and the touch structure 600, and the other film layers 012 can be film layers such as an encapsulation layer, and the present disclosure does not limit the specific structure of the other film layers 012.

[0115] FIGS. 7 and 8 are cross-sectional schematic views of display substrates provided in different examples of at least one embodiment of the present disclosure.

[0116] For example, the display substrate shown in FIG. 7 differs from the display substrate shown in FIG. 6 in that the display substrate shown in FIG. 7 includes an isolation column. For example, the light-emitting functional layer in the display substrate shown in FIG. 7 can be a multilayer film layer, which can have the same structure as the light-emitting functional layer in the display substrate shown in FIG. 6. However, the display substrate shown in FIG. 7 can also differ from the display substrate shown in FIG. 6 in other ways, which are not limited in the present disclosure.

[0117] For example, the display substrate shown in FIG. 8 omits the light-emitting functional layer and the second electrode. For example, the display substrate shown in FIG. 8 also includes other differences compared with the display substrates shown in other figures, which will be described later.

[0118] Referring to FIG. 7, in some examples, the second opening 302 is provided with an isolation column 320 located away from the isolation structure 500 on the side of the substrate 01, and the isolation column 320 covers at least part of the second isolation portion 520 except the protruding portion 521. The orthographic projection of at least one of the multilayer touch electrodes 610 on the substrate 01 overlaps with the orthographic projection of the isolation column 320 on the substrate 01.

[0119] Referring to FIG. 7, the isolation column 320 avoids the part where the protruding portion 521 is located, which is conducive to reliably isolating at least one layer of film in the light-emitting functional layer. By providing the isolation column 320, it is conducive to prolonging the crosstalk path of the light-emitting functional layer, so that the crosstalk between adjacent sub-pixels can be reduced while the ghosting problem of the sub-pixel is alleviated. At the same time, by arranging at least one of the multilayer touch electrodes 610 above the isolation column 320, signal shielding can be achieved by the second electrode 120 located above the isolation column 320, so as to prevent the signal transmitted by the touch structure 600 from being affected by the coupling of other signals. In this way, it is conducive to preventing functional abnormalities of the touch structure, so as to improve the display effect.

[0120] For example, the isolation column can cover all of the second isolation portion except the protruding portion, or can only cover part of the part of the second isolation portion except the protruding portion, which is not limited in the present disclosure.

[0121] For example, the orthographic projection of the first touch electrode on the substrate can overlap with the orthographic projection of the isolation column on the substrate. For example, the orthographic projection of the second touch electrode on the substrate can overlap with the orthographic projection of the isolation column on the substrate.

[0122] Referring to FIG. 7, for example, in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100, the orthogonal projection of the isolation column 320 on the substrate 01 is substantially the same as the interval between the orthogonal projection of the first electrode 110 of the two sub-pixels 100 on the substrate 01. For example, the isolation column 320 can be arranged as much as possible in the middle of the second isolation part 520, so as to facilitate the consistency of the crosstalk path of the extended charge generation layer of each sub-pixel 100. However, the present disclosure is not limited thereto, for example, the position of the isolation column can be closer to one of the two adjacent sub-pixels.

[0123] For example, the display substrate shown in FIG. 8 is different from the display substrate shown in FIG. 3 in that the isolation structure in the display substrate shown in FIG. 8 is different from the isolation structure in the display substrate shown in FIG. 3.

[0124] Referring to FIG. 8, in some examples, the isolation structure 500 in the at least one groove 210 includes a plurality of sub-isolation structures 501. The dashed box shown in FIG. 8 schematically circumscribes one sub-isolation structure 501. The plurality of sub-isolation structures 501 are arranged at intervals in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100. By arranging the plurality of sub-isolation structures 501, the groove 210 can be divided into a plurality of sub-grooves, thereby facilitating the extension of the crosstalk path of the charge generation layer in the light-emitting functional layer, and also enhancing the isolation effect of the light-emitting functional layer.

[0125] For example, referring to FIG. 8, the isolation structure 500 in the at least one groove 210 can include two sub-isolation structures 501, thereby dividing the groove 210 into three sub-grooves. For example, the three sub-grooves can be formed by etching, thereby forming the two sub-isolation structures arranged in the groove. However, the present disclosure is not limited thereto, and the isolation structure can include more than three isolation structures.

[0126] For example, referring to FIG. 8, each sub-isolation structure 501 includes a sub-first isolation part 5101 and a sub-second isolation part 5202, and the edge of the sub-second isolation part 5202 protrudes relative to the sub-first isolation part 5101 to form a protruding part. Thus, in the case where the isolation structure 500 includes a plurality of sub-isolation structures 501, the number of positions that can isolate the light-emitting functional layer can be increased by using the protruding part of each sub-second isolation part 5202, so as to extend the crosstalk path and enhance the isolation effect.

[0127] For example, only one groove can be provided with the isolation structure including a plurality of sub-isolation structures as shown in FIG. 8. For example, a plurality of grooves can be provided with the isolation structure including a plurality of sub-isolation structures as shown in FIG.

[0128] FIGS. 9 and 10 are schematic cross-sectional views of display substrates provided by different examples in at least one embodiment of the present disclosure.

[0129] The display substrate shown in FIG. 9 is different from the display substrate shown in FIG. 10 in that the number of the second openings of the display substrate shown in FIG. 9 is different from the number of the second openings of the display substrate shown in FIG. 10. However, the present disclosure is not limited thereto, and the display substrate shown in FIG. 9 can also be different from the display substrate shown in FIG. 10 in more ways, such as the shapes of the second openings shown in FIG. 9 being different from the shapes of the second openings shown in FIG. 10.

[0130] Referring to FIG. 9, in combination with the foregoing examples, the openings of the isolation layer 02 are located in the groove openings 201 of the grooves 210, and the isolation structures 500 are located between the openings of the two isolation layers 02 that are adjacent to each other along the arrangement direction of the adjacent sub-pixels 100. For example, the number of the second openings 302 is the same as the number of the groove openings 201 of the grooves 210. For example, the shapes of the second openings 302 and the groove openings 201 are both rectangular. For example, the plurality of second openings 302 correspond one-to-one to the plurality of groove openings 201 of the plurality of grooves 210. For example, taking two adjacent sub-pixels 100 as a group, in each group of sub-pixels, the second opening 302 formed by the pixel defining portion 310 surrounding the two sub-pixels 100 can not be connected in different groups of sub-pixels. Thus, the groove openings 201 can be arranged one-to-one with the second openings 302.

[0131] Referring to FIG. 10, in some examples, the number of the second openings 302 is different from the number of the groove openings 201 of the grooves 210. For example, taking two adjacent sub-pixels 100 as a group, in each group of sub-pixels, the second opening 302 formed by the pixel defining portion 310 surrounding the two sub-pixels 100 can be connected to each other in different groups of sub-pixels. As shown in FIG. 10, the shapes of the groove openings 201 are rectangular, and the shapes of the second openings 302 in different groups of sub-pixels are different due to the connection to each other. Thus, the number of the groove openings 201 can be different from the number of the second openings 302, so as to prolong the crosstalk path between the adjacent sub-pixels 100.

[0132] Referring to FIG. 10, for example, in different groups of sub-pixels, only a part of the second openings 302 in a group of sub-pixels can be connected to each other. However, the present disclosure is not limited thereto, and for example, the second openings in all groups of sub-pixels can be connected to each other.

[0133] For example, FIGS. 9 and 10 only schematically show that the arrangement of the sub-pixels can be a real RGB arrangement. However, the present disclosure is not limited thereto, and the cross-sectional views shown in FIGS. 2 to 4 and FIGS. 6 to 8 in the embodiments of the present disclosure can also be matched with other arrangements of sub-pixels to form corresponding display substrates.

[0134] The display device according to the embodiments of the present disclosure also has the corresponding beneficial technical effects, which are not described here again.

[0135] For example, the display device can be a display device such as an organic light emitting diode display device, and any product or component having a display function such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, or the like, and the embodiments are not limited thereto.

[0136] The following points need to be explained:

[0137] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can be referred to the general design.

[0138] (2) In the case of no conflict, the features in the same and different embodiments of the present disclosure can be combined with each other.

[0139] The above only describes the exemplary embodiments of the present disclosure, and is not used to limit the protection scope of the present disclosure, and the protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: Substrate; Multiple sub-pixels are located on the substrate. Each sub-pixel, at least in some of them, includes a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the substrate. The first electrode is located between the light-emitting functional layer and the substrate. The light-emitting functional layer includes multiple film layers. An insulating layer is located between the first electrode and the substrate; the insulating layer includes a plurality of grooves, the grooves being at least partially located between adjacent sub-pixels; A pixel-defining pattern is located on the side of the first electrode away from the substrate. The pixel-defining pattern includes a plurality of first openings and a plurality of second openings, and a pixel-defining portion surrounding the plurality of first openings and the plurality of second openings. Each sub-pixel corresponds to at least one first opening. The light-emitting functional layer of the sub-pixel is at least partially located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode. The display substrate further includes an isolation layer located between the first electrode and the insulating layer; the isolation layer includes a flat portion that overlaps with the first electrode in a direction perpendicular to the substrate, and the edge of the flat portion is covered by the pixel defining portion; An isolation structure is provided in at least a portion of the groove, and at least a portion of the isolation structure is exposed by the second opening; the isolation structure includes a first isolation portion and a second isolation portion stacked together, the first isolation portion being located between the second isolation portion and the substrate, at least a portion of the first isolation portion being located in the groove, and the edge of the second isolation portion protruding relative to the edge of the first isolation portion to form a protrusion, the protrusion being configured to block at least one layer of the multilayer film. The second isolation section is the portion of the isolation layer exposed by the second opening.

2. The display substrate according to claim 1, wherein, The first isolation part and the insulating layer are integrally formed.

3. The display substrate according to claim 1 or 2, wherein, In the direction of adjacent sub-pixel arrangement, there is a gap between the orthographic projection of the isolation structure on the substrate and the orthographic projection of the pixel defining portion on the substrate.

4. The display substrate according to any one of claims 1-3, wherein, The protrusion is configured to block the second electrode.

5. The display substrate according to any one of claims 1-4, wherein, In a direction perpendicular to the substrate, the ratio of the distance between the flat portion and the substrate to the distance between the second isolation portion and the substrate is 0.9-1.

1.

6. The display substrate according to any one of claims 1-5, wherein, The maximum depth of the groove is greater than the maximum dimension of the light-emitting functional layer in the direction perpendicular to the substrate. The maximum depth of the groove is 0.2 micrometers to 0.5 micrometers.

7. The display substrate according to any one of claims 1-6, wherein, The orthographic projection of the first electrode on the substrate is located within the orthographic projection of the flat portion on the substrate. In any direction parallel to the substrate, the size of the flat portion is not less than the size of the first electrode.

8. The display substrate according to any one of claims 1-7, wherein, The pixel defining portion includes a portion located within the groove, and this portion is spaced apart from the first isolation portion.

9. The display substrate according to any one of claims 1-8, wherein, An isolation pillar is provided in the second opening, located on the side of the isolation structure away from the substrate, and the isolation pillar covers at least a portion of the second isolation portion except for the protrusion.

10. The display substrate according to claim 9, wherein, The pixel defining portion includes a first sidewall, and the angle between at least a portion of the first sidewall and the contact surface between the pixel defining portion and the bottom wall of the groove is a first slope angle; the orthographic projection of the first sidewall on the substrate overlaps with the orthographic projection of the bottom wall of the groove on the substrate. The isolation column includes a second sidewall, and at least a portion of the second sidewall forms a second slope angle with the contact surface between the isolation column and the second isolation portion. The first slope angle is greater than the second slope angle, and both the first slope angle and the second slope angle are less than 90 degrees.

11. The display substrate according to claim 10, wherein, The pixel definition portion and the isolation pillar are configured to be formed by a patterning process.

12. The display substrate according to any one of claims 1-8, wherein, It also includes a touch structure located on the side of the pixel-defined pattern away from the substrate. The touch structure includes multiple layers of touch electrodes, wherein the orthographic projection of at least one layer of the multiple layers of touch electrodes on the substrate overlaps with the orthographic projection of the portion of the isolation structure other than the protrusion on the substrate.

13. The display substrate according to claim 12, wherein, An isolation post is provided in the second opening, located on the side of the isolation structure away from the substrate, and the isolation post covers at least a portion of the second isolation portion except for the protrusion; The orthographic projection of at least one of the multilayer touch electrodes on the substrate overlaps with the orthographic projection of the isolation pillar on the substrate.

14. The display substrate according to any one of claims 1-13, wherein, The isolation structure within at least one groove includes a plurality of sub-isolation structures, which are spaced apart in the arrangement direction of adjacent sub-pixels.

15. The display substrate according to any one of claims 1-14, wherein, The number of the second opening is less than the number of groove openings in the groove.

16. The display substrate according to any one of claims 1-15, wherein, The distance between the orthographic projection of the second isolation portion on the substrate and the orthographic projection of the pixel defining portion adjacent thereto on the substrate in the arrangement direction of the adjacent sub-pixels is 1 micrometer to 3 micrometers.

17. The display substrate according to any one of claims 1-16, wherein, The size of the protrusion in the direction of arrangement of adjacent sub-pixels is greater than the maximum thickness of the light-emitting functional layer.

18. The display substrate according to any one of claims 1-17, wherein, The second isolation section has a size of 5 to 7 micrometers in the direction of arrangement of adjacent sub-pixels.

19. A display device comprising a display substrate according to any one of claims 1-18.

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