A two-step MTJ etch with spacer-defined openings removes residues while limiting NBLOK loss and sidewall damage in MRAM fabrication.
A triple-layer spin-orbit torque memory uses random lower-layer magnetization to deliver reconfigurable, stable PUF security.
Vertical stacking of magnetoresistance cells with demagnetized non-element portions raises integration density while supporting 3D memory layout.
A dual-layer MTJ top contact uses a wider lower contact and narrower upper contact to prevent shorts while reducing MRAM cell height.
An oxide-CoFeB-Cr seed stack improves perpendicular MTJ thermal stability in STT-MRAM while keeping switching currents low.
Hierarchical stacking of magnetoresistive magnetic elements with switching elements overcomes shape mismatch and enables denser neuromorphic integration.
Tapered MTJ layers and segmented ILD filling suppress voids between MRAM pillars, reducing top-contact shorts and improving scalability.