The invention provides a silicon controlled device and a manufacturing method thereof, and the method comprises the steps: providing a substrate, forming an epitaxial layer on the substrate, forming awell region, i.e., a doped region, forming an injection region, and depositing a dielectric layer and a metal connection layer, wherein the device comprises a substrate, an epitaxial layer, a well region, an N+ injection region, a P+ injection region, a dielectric layer and a metal wiring layer. The silicon controlled device has the beneficial effects that the silicon controlled device provided by the invention has a lower trigger voltage, the higher electrostatic discharge capacity, higher stability and reliability, and meanwhile, the silicon controlled device is small in area, redundant device types do not need to be increased, and the production cost is reduced.