Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Optimum study scheme pushing method and system

An optimal and planned technology, applied in the field of the best learning plan push method and system, can solve the problems of lack of pertinence in students' learning, and achieve the effect of great learning benefits

Active Publication Date: 2015-07-08
SUN YAT SEN UNIV
View PDF4 Cites 27 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to overcome the deficiencies of the prior art. The present invention provides a method and system for pushing the best learning plan, which solves the problem of lack of pertinence in students' learning in the traditional computer-aided teaching method, and enables students to produce maximum learning within a limited time. learning benefits

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optimum study scheme pushing method and system
  • Optimum study scheme pushing method and system
  • Optimum study scheme pushing method and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0078] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0079] figure 1 It is a schematic flow chart of the best learning scheme push method in the embodiment of the present invention, such as figure 1 As shown, the method includes:

[0080] S1, constructing subject knowledge and skill map;

[0081] S2. Score all the knowledge points in the subject knowledge skill map according to the knowledge point scoring method, and obtain the score of each knowledge point;

[0082] S3, obtain the best knowledge point according t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The embodiment of the invention discloses an optimum study scheme pushing method and system. The method comprises the steps that subject knowledge and skill maps are structured; all knowledge points in the subject knowledge and skill maps are subjected to scoring according to knowledge point scoring methods to obtain the score of each knowledge point; the optimum knowledge point is obtained according to the score of each knowledge point; the questions corresponding to the optimum knowledge point are obtained from question banks to form an optimum study scheme, and the optimum study scheme is pushed to a user. According to the optimum study scheme pushing method and system, through the construction of the subject knowledge and skill maps, the problems of standardization, visualization and priority of the knowledge points are solved, and the optimum study scheme is formed through the fact that the significance of each knowledge point in the subject knowledge and skill maps is accessed; the formed optimum study scheme is pushed to a student and is used for solving the defect that study can not be carried out according to the real studying condition of the student and the problem that the study of the strudent in traditional computer aided education is lack of pertinency, and therefore the student can obtain the largest study benefit in limiting time.

Description

technical field [0001] The invention relates to the technical field of computer-aided education, in particular to a method and system for pushing an optimal learning plan. Background technique [0002] Entering the 21st century, more and more parents are paying attention to their children's learning, and the education industry is getting more and more attention. Faced with a large amount of homework, students often cannot mobilize their enthusiasm in learning, their learning efficiency is not high, and their interaction in learning is less. How to improve the learning efficiency of primary and middle school students, strengthen the learning effect, and at the same time stimulate students' enthusiasm for learning. This is a common but not well-solved problem in life. [0003] A computer-aided education system and method, its learning push method is mainly to determine its state according to the information of the learner, and read the interactive content if it is in the cor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/30G06N3/08
Inventor 林格陈湘萍马超訾飞
Owner SUN YAT SEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products