Thermal plasma treatment equipment

Abstract

The present invention relates to a thermal plasma treatment device that can effectively use thermal plasma and can ensure the reaction time of thermally decomposing a treatment gas. A thermal plasma treatment device according to one embodiment of the present invention includes: a torch part, in which an arc is generated between a cathode and an anode, and a treatment gas to be thermally decomposed by the arc is injected between the cathode and the anode; a power supply part, which is connected to the cathode and the anode and is used to apply a high voltage between the cathode and the anode; and a reaction part, which is connected to the torch part and forms turbulence in the treatment gas passing through the torch part.

Description

Technical Field

[0001] The present disclosure relates to a thermal plasma processing apparatus capable of effectively using thermal plasma and ensuring a reaction time for thermal decomposition of a processing gas. Background Art

[0002] Generally, thermal plasma is a partially ionized gas composed mainly of electrons, ions and neutral particles (atoms and molecules) generated by arc discharge, and maintains a local thermodynamic equilibrium state, so that all constituent particles form a high-speed jet flame with the same temperature ranging from thousands to tens of thousands of degrees.

[0003] As described above, thermal plasma is being used in advanced technologies in various industrial fields by utilizing the characteristics of high temperature, high heat capacity, high speed, and a large number of active particles of thermal plasma.

[0004] In recent years, as environmental contamination by certain industrial wastes has become a social problem, there has been increasing interest in processing technology using thermal plasma for the purpose of removing harmful gases and greenhouse gases emitted from the electronics industry such as semiconductors / displays.

[0005] Thermal plasma processing equipment (plasma torch, plasma tube) using electric energy is equipment that converts a large amount of thermal energy that can be used to decompose an object to be processed or the like.

[0006] By generating high-temperature thermal plasma, when sufficient gas ionization energy is supplied to the two electrodes, arcs are generated at the two electrodes, and when the discharge gas passes between the high-temperature arcs, a thermal plasma jet is generated when the discharge gas is converted into a plasma state.

[0007] In Korean Patent No. 967016 (application date: September 20, 2007), a plasma torch device is disclosed, which includes and is configured to assemble: a device body; an electrode portion, which includes a cathode disposed therein and an anode disposed on the front thereof; a body integrated gas channel configured to supply gas to one side of the electrode portion and a body integrated cooling water channel configured to cool the device, which are respectively integrally arranged with the device body; and at least one of a gas twisting device and a magnet device, which are respectively arranged around the electrode portion, wherein the device body includes: a first metal body portion, which includes a A first body, a shell assembled in the first body and supplying power while supporting the anode, and a first shell for fixing the anode while being assembled to one side of the first body; a thermal insulation body part, which includes a first thermal insulator assembled to the inside of the first body and the shell above the first body and the shell, and a second thermal insulator consisting of a second shell fixedly assembled to the first body and one side of the first thermal insulator; and a second metal body part, which includes a second body assembled to the inside of the first insulator and the second insulator above the first insulator and the second insulator and assembled and fixed to apply power to the cathode, and a power application member assembled with the second body and fastened to the inside of the cathode.

[0008] As described above, when the electrode portion forms an arc, the gas twisting device rotates and injects discharge gas to move the arc point to prevent the electrode portion from being worn, and the magnet device forms a magnetic field to adjust the electron flow to improve thermal plasma discharge stability.

[0009] However, according to the above related art, a separate structure for supplying a process gas into a high-temperature thermal plasma jet is not applied, and since the electrode portion is composed of a cathode and an anode, the length of the arc is limited.

[0010] Therefore, even if a structure for supplying a process gas is applied, the process gas passes through the surface of a thermal plasma jet having a relatively low temperature, and thus there is a limitation in increasing the thermal decomposition effect of the process gas, and there is a problem in that required power consumption increases.

[0011] In Korean Patent No. 1573844 (application date: November 11, 2013), a plasma torch is disclosed, which includes: an electrode, which protrudes in one direction and is applied with a voltage; a first shell, which receives the electrode with a heat insulating member interposed therebetween, forms a first channel for supplying a discharge gas to between the electrode and the first shell, and discharges an arc generated by first grounding to a first discharge port; and a second shell, which forms a second channel for supplying a process gas by receiving the top end of the first shell, and discharges an arc flame that burns a material to be treated contained in the process gas to a second discharge port by secondary grounding, thereby expanding the arc.

[0012] As described above, since the arc is formed in the first shell and the second shell, the length of the arc can be extended, and the arc can rotate through the spiral line formed inside the second shell, and the processing gas is supplied and passes through the central part of the high-temperature thermal plasma jet to effectively process the processing gas.

[0013] However, according to the prior art, there is a limit in extending the arc length. In addition, since the process gas is immediately discharged into the atmosphere after passing through the high-temperature arc, it is difficult to ensure the reaction time for the process gas to be fully thermally decomposed in the insulating space.

[0014] In addition, according to the prior art, the rotation of the arc is caused by using a wire on the inner peripheral surface of the housing, but since the arc does not rotate smoothly, the inner peripheral surface of the housing is partially damaged by the arc, making it difficult to ensure the life of the electrode. Summary of the invention

[0015] Technical issues

[0016] The present disclosure is designed to solve the problems of the prior art, and an object of the present disclosure is to provide a thermal plasma processing apparatus capable of ensuring a thermal decomposition reaction time of a processing gas.

[0017] In addition, an object of the present disclosure is to provide a thermal plasma processing apparatus capable of uniformly rotating an arc and appropriately adjusting an arc length.

[0018] Technical Solution

[0019] A thermal plasma processing device according to an embodiment of the present disclosure includes: a torch section, in which an arc is generated between a cathode and a cathode, and in which a processing gas to be thermally decomposed by the arc is injected between the cathode and the cathode; a power supply section, which is configured to be connected to the cathode and the cathode and to apply a high voltage between the cathode and the cathode; and a reaction section, which is configured to be connected to the torch section and to generate turbulence in the processing gas passing through the torch section.

[0020] The torch portion may include: a negative electrode located at the center of the torch portion; a cylindrical first positive electrode, which is configured to surround the negative electrode and has a first hole in the center of the first positive electrode; and a cylindrical second positive electrode, which is configured to be spaced apart from the lower side of the first positive electrode and has a second hole in the center of the second positive electrode that is connected to the first hole.

[0021] The torch portion may include: an axial-type negative electrode shell, wherein the negative electrode is installed at the lowermost end and wherein a cooling flow path is provided at the center of the negative electrode shell; a cylindrical first positive electrode shell, which is configured to be installed to surround the first positive electrode and has a supply path connected to the cooling flow path provided on the outer peripheral surface of the first positive electrode; and a cylindrical second positive electrode shell, which is configured to be installed to surround the second positive electrode and has a cooling flow path between the second positive electrode and the second positive electrode shell.

[0022] The torch section may further include: a first discharge gas injection section, which is configured to be disposed above the first positive electrode so as to inject the discharge gas into the interior of the first discharge gas injection section in a rotation direction and supply the discharge gas to an upper portion of the first hole; a process gas injection section, which is configured to be disposed to surround the first positive electrode shell, inject the process gas to be treated into the interior of the process gas injection section in a rotation direction, and supply the process gas to an upper portion of the second hole; and a second discharge gas injection section, which is configured to be disposed between the process gas injection section and the second positive electrode so as to inject the discharge gas into the interior of the second discharge gas injection section in a rotation direction and supply the discharge gas to an upper portion of the second hole, and the first discharge gas injection section, the second discharge gas injection section and the process gas injection section may be configured to inject the discharge gas and the process gas in the same rotation direction.

[0023] The first discharge gas injection part may include: a first main body part, which is configured to have a cylindrical shape connected to the first hole and has a predetermined thickness in a radial direction; and a plurality of first discharge gas injection ports, which are configured to pass through the inner circumferential surface / outer circumferential surface of the first main body part and inject the discharge gas in a tangential direction relative to the inner circumferential surface of the first main body part.

[0024] The process gas injection part may include: a cylindrical main body part, which is configured to surround the first positive electrode and the first discharge gas injection part and communicate with the second hole; and a plurality of injection pipes, which are configured to communicate with the interior of the main body part and inject the process gas in a tangential direction relative to the inner circumferential surface of the main body part.

[0025] The second discharge gas injection part may include: a second main body portion, which is configured to have a cylindrical shape connected to the second hole and has a predetermined thickness in a radial direction; a plurality of second discharge gas injection ports, which are configured to pass through the inner circumferential surface / outer circumferential surface of the second main body portion and inject the discharge gas in a tangential direction relative to the inner circumferential surface of the second main body portion; and annular second discharge gas auxiliary injection ports, which are configured to be connected to each other outside the second discharge gas injection ports.

[0026] The torch may further include a third discharge gas injection portion configured to be disposed at a lower end of the second positive electrode case and the second positive electrode to inject the discharge gas inside in a rotation direction and supply the discharge gas to a lower portion of the second hole.

[0027] The third discharge gas injection part may include: a plurality of third discharge gas injection ports configured to pass through the inner circumferential surface of the second positive electrode and the outer circumferential surface of the second positive electrode casing and inject discharge gas in a tangential direction relative to the inner circumferential surface of the second positive electrode; and annular third discharge gas auxiliary injection ports configured to communicate with each other outside the third discharge gas injection ports.

[0028] The torch part may further include a first magnet part configured to be disposed around the first positive electrode and to generate a magnetic field in the same direction as a rotation direction of the discharge gas injected by the first discharge gas injection part.

[0029] The torch part may further include a second magnet configured to be disposed around the second positive electrode and to generate a magnetic field in the same direction as a rotation direction of the discharge gas injected by the second discharge gas injection part.

[0030] The power supply unit may include: a negative electrode wire, which is configured to connect negative charge to the negative electrode; a first positive electrode wire, which is configured to connect positive charge to the first positive electrode; a second positive electrode wire, which is configured to connect positive charge to the second positive electrode; and a switch, which is configured to be set on the first positive electrode wire and selectively energize the negative electrode and the first positive electrode.

[0031] The reaction part may include: a reaction chamber disposed below the second positive electrode and provided with a discharge current path long in an axial direction and connected to the second hole; a first protective gas injection part configured to be disposed on an upper portion of the reaction chamber, inject a protective gas into the interior of the first protective gas injection part, and supply the protective gas to an upper portion of a discharge channel; and a second protective gas injection part configured to be disposed below the reaction chamber, inject a protective gas into the interior of the second protective gas injection part, and remove foreign matter accumulated in a lower portion of the discharge current path.

[0032] The reaction chamber may include: a cylindrical inner shell provided with at least one bottleneck formed by reducing a diameter of the discharge current path; and a double-tube outer shell installed to surround the inner shell and provided with a cooling flow path therein.

[0033] The inner housing may be made of insulating ceramic.

[0034] The first protective gas injection part and the second protective gas injection part may supply one of nitrogen (N2), argon (Ar), air, and oxygen (O2) as the protective gas.

[0035] The first protective gas injection part may include: a plurality of first protective gas injection ports, which are configured to pass through the upper inner circumference / outer circumference of the reaction chamber and inject the protective gas in a tangential direction relative to the inner circumference of the reaction chamber; and an annular first protective gas auxiliary injection port, which is connected to each other outside the first protective gas injection port.

[0036] The second protective gas injection part may include: a plurality of second protective gas injection ports, which are configured to pass through the lower inner circumference / outer circumference of the reaction chamber and inject the protective gas in an orthogonal direction relative to the inner circumference of the reaction chamber; and an annular second protective gas auxiliary injection port, which is configured to be connected to each other outside the second protective gas injection port.

[0037] The second protective gas injection port may be configured to be inclined downward from an outer circumferential surface toward an inner circumferential surface of the reaction chamber in a discharge direction of the discharge current path.

[0038] Beneficial effects

[0039] The thermal plasma processing apparatus according to the present disclosure is provided with a reaction part below the torch part.

[0040] Therefore, after the process gas is thermally decomposed by the high-temperature arc in the torch section, by causing turbulence of the process gas in the reaction section, the reaction time can be increased, the thermal decomposition can be promoted, and the process efficiency and energy efficiency can be improved.

[0041] In addition, the torch is provided with a first discharge gas injection part above the first positive electrode, a process gas injection part is provided above the second positive electrode to surround the first positive electrode, and a second discharge gas injection part is provided above the second positive electrode.

[0042] Therefore, the discharge gas injected by the first and second discharge gas injection parts is formed to smoothly rotate arcs formed inside the first and second positive electrodes, thereby increasing the service life of peripheral components.

[0043] Then, the discharge gas injected by the first discharge gas injection part and the second discharge gas injection part causes the first arc to move or expand to the second arc inside the second positive electrode to increase the length of the arc, so that the processing gas contacts the center of the high-temperature arc, thereby improving the thermal decomposition performance and reducing the power consumption required to decompose the processing gas.

[0044] In addition, the torch is provided with a third discharge gas injection portion below the second positive electrode.

[0045] Therefore, by controlling the position of the second arc point through the discharge gas injected by the third discharge gas injection part, the length of the entire arc can be appropriately adjusted, and the arc can be prevented from being exposed to the outside.

[0046] In addition, the power supply section is connected to the negative electrode, the first positive electrode, and the second positive electrode, and the switch is provided on the electric wire connected to the first positive electrode.

[0047] Therefore, by turning on the switch at the initial startup and then turning off the switch, it is easy to generate a first arc between the negative electrode and the first positive electrode that are initially installed close to each other, and then using the first arc, the generation of the second arc is stably induced to the gap between the relatively wide installed negative electrode and the second positive electrode, and the plasma discharge stability can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] Figure 1 is a front cross-sectional view illustrating a thermal plasma processing apparatus according to an embodiment of the present disclosure.

[0049] Figure 2 is a front cross-sectional view illustrating an example of a torch portion and a power supply portion applied to the thermal plasma processing apparatus of the present disclosure.

[0050] Figure 3a and Figure 3b This is an example of an application Figure 2 FIG. 1 is a front cross-sectional view and a plan cross-sectional view of an example of a first discharge gas injection portion.

[0051] Figure 4a and Figure 4b This is an example of an application Figure 2 A front cross-sectional view and a plan cross-sectional view of an example of a process gas injection portion.

[0052] Figure 5a and Figure 5b This is an example of an application Figure 2 FIG. 1 is a front cross-sectional view and a plan cross-sectional view of an example of a second discharge gas injection portion.

[0053] Figure 6a and Figure 6b This is an example of an application Figure 2 A front cross-sectional view and a plan cross-sectional view of an example of a third discharge gas injection portion.

[0054] Figure 7a and Figure 7b This is an example of an application Figure 2 1 and 2 are plan cross-sectional views of a first embodiment and a second embodiment of a magnet portion.

[0055] Figure 8is a front cross-sectional view illustrating an example of a reaction portion of the thermal plasma processing apparatus applied to the present disclosure.

[0056] Figures 9a to 9c This is an example of an application Figure 8 Front cross-sectional views of various examples of inner shells.

[0057] Fig.10a and Fig.10b This is an example of an application Figure 8 A front sectional view and a plan sectional view of an example of a first protective gas injection part.

[0058] Fig.11a and Fig.11b This is an example of an application Figure 8 A front sectional view and a plan sectional view of an example of a second protective gas injection portion.

[0059] Figure 12 to Figure 14 is a front cross-sectional view illustrating an operating state of a thermal plasma processing apparatus according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0060] Hereinafter, the present embodiment will be described in detail with reference to the accompanying drawings. However, it can be said that the scope of the spirit of the present disclosure provided by the present embodiment can be determined by the matters disclosed in the embodiment, and the spirit of the present disclosure provided by the present embodiment includes implementation modification forms such as addition, deletion and change of components relative to the proposed embodiment.

[0061] Figure 1 is a front cross-sectional view illustrating a thermal plasma processing apparatus according to an embodiment of the present disclosure.

[0062] The thermal plasma processing apparatus according to an embodiment of the present disclosure includes a torch 100 for thermally decomposing a process gas by an arc, a power supply part 200 for applying a high voltage to an electrode on the side of the torch 100 , and a reaction part 300 for promoting thermal decomposition of the process gas passing through the torch 100 .

[0063] The torch 100 and the reaction part 300 communicate with each other, and a process gas may be supplied into the torch 100 and then discharged through the reaction part 300. Of course, the torch 100 and the reaction part 300 are configured as one system, but the reaction part 300 may be configured to be detachably attached to the torch 100.

[0064] Figure 2 is a front cross-sectional view illustrating an example of a torch portion and a power supply portion applied to the thermal plasma processing apparatus of the present disclosure.

[0065] The torch 100 includes a cathode 110 , a first cathode 120 , a second cathode 130 , a first discharge gas injection part 140 , a process gas injection part 150 , a second discharge gas injection part 160 , a third discharge gas injection part 170 , and first and second magnet parts M1 and M2 .

[0066] The negative electrode 110 may be formed in a rod shape at the center, and may be made of a tungsten (W) material containing thorium (Th) to which a high voltage may be applied, but is not limited thereto.

[0067] The negative electrode 110 having such a configuration is mounted on the lower end of the axial negative electrode case 110A, and a negative electrode cooling flow path 110B through which cooling water can circulate along the axial direction of the negative electrode case 110A may be provided.

[0068] The first positive electrode 120 may be formed of a cylindrical type in which a first hole 120h surrounding the negative electrode 110 is located at the center, and may be made of a copper (Cu) or tungsten (W) material capable of generating an arc when a high voltage is applied, but is not limited thereto.

[0069] Specifically, the first positive electrode 120 may include a negative electrode receiving portion 121 surrounding the circumference of the negative electrode 110 and a first arc generating portion 122 that is continuous below the negative electrode receiving portion 121 and electrically generates the first arc.

[0070] In addition, the diameter of the first hole 120h gradually decreases toward the lower side of the negative electrode receiving portion 121, and can be uniformly arranged in the first arc generating portion 122. In addition, it can be configured to maintain a minimum gap between the negative electrode 110 and the negative electrode receiving portion 121 to promote arc generation between the negative electrode 110 and the first positive electrode 120.

[0071] Therefore, when the discharge gas passes through the first hole 120h of the first positive electrode 120, the speed of the discharge gas increases as the discharge gas passes and is pressurized between the negative electrode receiving portion 121 and the first arc generating portion 122. In addition, the accelerated discharge gas may cause the first arc generated inside the first positive electrode 120 to move toward the inside of the second positive electrode 130, and the arc moved to the second positive electrode 130 or the arc generated in the second positive electrode 130 is referred to as a second arc.

[0072] The first positive electrode 120 having such a configuration is mounted on the inner circumferential surface of a first positive electrode casing 120A having a cylindrical shape, a first positive electrode cooling flow path 120B through which cooling water can be circulated can be provided in the first positive electrode casing 120A, and a cooling groove 123 connected to the first positive electrode cooling flow path 120B can be formed along the outer circumferential surface of the first positive electrode 120 to improve cooling efficiency.

[0073] The second positive electrode 130 may be spaced apart from the lower side of the first positive electrode 120, may be configured as a cylindrical type with the second hole 130h that can communicate with the first hole 120h located at the center, may be configured to be larger than the first positive electrode 120, and like the first positive electrode 120, may be made of a material that can apply a high voltage.

[0074] Specifically, the diameter of the second hole 130h is configured to be larger than the diameter of the first hole 120h, the second arc formed inside the second hole 130h is induced not to transfer to the first hole 120h, and the first arc formed inside the first hole 120h can stably move or expand to the inside of the second hole 130h.

[0075] In addition, the length of the second hole 130h is configured to be longer than that of the first hole 120h, and the second arc formed inside the second hole 130h may be configured to thermally decompose the process gas.

[0076] The second positive electrode 130 having the above configuration is mounted on the inner circumferential surface of a second positive electrode case 130A having a cylindrical shape, and a second positive electrode cooling flow path 130B through which cooling water can circulate may be provided inside the second positive electrode case 130A.

[0077] In addition to the above components, the first discharge gas injection part 140 , the process gas injection part 150 , and the second and third discharge gas injection parts 160 and 170 included in the torch part 100 will be described in detail below.

[0078] In addition, the negative electrode case 110A and the first and second positive electrode cases 120A and 130A may be made of a metal material, and when a high voltage is applied to the negative electrode 110 and the first and second positive electrodes 120 and 130 by the power supply unit 200, current may also flow in the negative electrode case 110A and the first and second positive electrode cases 120A and 130A.

[0079] Therefore, the negative electrode case 110A and the first and second positive electrode cases 120A and 130A should be connected with a heat insulating member 1 therebetween to isolate the negative electrode case 110A and the first and second positive electrode cases 120A and 130A from other surrounding components.

[0080] The power supply unit 200 is a device capable of supplying direct current power, and is configured to energize the negative electrode 110 and the first positive electrode 120 or energize the negative electrode 110 and the second positive electrode 130 .

[0081] In detail, the power supply unit 200 may also include a negative electrode wire 210 configured to connect negative charge to the negative electrode 110, a first positive electrode wire 220 configured to connect positive charge to the first positive electrode 120, a second positive electrode wire 230 configured to connect positive charge to the second positive electrode 130, and a switch 240 arranged on the first positive electrode wire 220.

[0082] When the switch 240 is temporarily turned on during the initial startup, since the negative electrode 110 and the first positive electrode 120 are energized, a first arc is generated inside the first positive electrode 120, and the negative electrode and the second positive electrode may also maintain an energized state.

[0083] However, since the gap between the negative electrode 110 and the second positive electrode 130 is somewhat large, the second arc is not easily generated between the negative electrode and the second positive electrode 130 , but the second arc may be easily induced by the first arc.

[0084] Thereafter, when the switch 240 is turned off, even if the power supplied to the first positive electrode 120 is cut off, the negative electrode 110 and the second positive electrode 130 maintain the energized state, and the second arc can be stably generated inside the second positive electrode 130 .

[0085] Figure 3a and Figure 3b This is an example of an application Figure 2 FIG. 1 is a front cross-sectional view and a plan cross-sectional view of an example of a first discharge gas injection portion.

[0086] The first discharge gas injection part 140 supplies a discharge gas for forming plasma inside the first positive electrode 120 and may be configured to be disposed above the first positive electrode 120 and supply the discharge gas to the inside of the first hole 120h of the first positive electrode in a rotation direction.

[0087] The first discharge gas injection part 140 may be made of a heat insulating material, and the discharge gas injected into the first discharge gas injection part 140 may be composed of a gas such as nitrogen (N2), argon (Ar), air, oxygen (O2), and hydrogen (H2).

[0088] In detail, the first discharge gas injection part 140 may include a first body part 141 having a cylindrical shape and a plurality of first injection ports 141 h horizontally passing through an inner / outer circumferential surface of the first body part 141 .

[0089] The first body part 141 may have a cylindrical shape communicating with an upper side of the first hole 120 h of the first positive electrode, and may be configured to have a predetermined width in a radial direction and a predetermined thickness in a height direction.

[0090] The first injection port 141 h may be configured to inject the discharge gas to rotate in a clockwise or counterclockwise direction along an inner circumferential surface of the first body part 141 .

[0091] According to an embodiment, the first injection port 141 h is formed in a tangential direction with respect to the inner circumferential surface of the first body part 141 , and four first injection ports 141 h may be disposed at regular intervals in the circumferential direction, but are not limited thereto.

[0092] Therefore, when the discharge gas is supplied in a rotation direction along the inner circumferential surface of the first positive electrode 120 through the first discharge gas injection part 140 , the discharge gas may be generated as thermal plasma by the first arc.

[0093] In addition, since the first arc moves or expands to the second arc along the flow direction of the discharge gas, the entire length of the arc can be extended.

[0094] Figure 4a and Figure 4b This is an example of an application Figure 2 A front cross-sectional view and a plan cross-sectional view of an example of a process gas injection portion.

[0095] The processing gas injection portion 150 is used to supply the processing gas to be thermally decomposed and the reaction gas that chemically reacts with the processing gas, and is arranged on the upper side of the second positive electrode 130 to surround the circumference of the first positive electrode 120, and the processing gas and the reaction gas can be configured to be supplied to the inside of the second hole 130h of the second positive electrode in the rotation direction.

[0096] The process gas is a greenhouse gas and a harmful gas, which may be N2 gas mixed with PFC gas (CF4, SF6, C2F6, NF3, etc.), and the reaction gas may be air, steam (H2O), oxygen (O2), hydrogen (H2), etc., which may decompose the process gas by chemical reaction with the above process gas, but is not limited thereto.

[0097] In detail, the process gas injection part 150 may include a cylindrical body part 151 and a plurality of injection pipes 152 horizontally disposed outside the body part 151 so as to communicate with the inside of the body part 151 .

[0098] The body part 151 has a large cylindrical shape surrounding the first positive electrode 120 and the first discharge gas injection part 140 , and may communicate with an upper side of the second hole 130 h of the second positive electrode.

[0099] The injection pipe 152 may be configured to inject the process gas and the reaction gas in a clockwise or counterclockwise direction along the inner circumferential surface of the body part 151 .

[0100] According to an embodiment, the injection pipe 152 is disposed in a tangential direction with respect to the inner circumferential surface of the body part 151 , and four injection pipes 152 may be disposed at regular intervals in the circumferential direction, but are not limited thereto.

[0101] In order to allow the process gas to smoothly reach the center of the arc, the rotation direction of the process gas injected from the injection pipe 151 is preferably configured to be consistent with the rotation direction of the discharge gas injected from the first injection port 141h.

[0102] Generally, when a process gas is supplied from an upper side of an arc, if the arc length is short, the process gas comes into contact with the arc surface having a relatively low temperature.

[0103] However, according to the present disclosure, the total arc length including the lengths of the first arc and the second arc may be increased by the discharge gas supplied by the first discharge gas injection part 140 and the second discharge gas injection part 160, and even the arc length may be increased by the process gas supplied by the process gas injection part 150.

[0104] Therefore, when the process gas is supplied from the upper side of the second cathode 130 in the rotation direction through the process gas injection part 150, the process gas contacts the central portion of the second arc having a relatively high temperature, and thermal decomposition performance of the process gas may be improved.

[0105] Figure 5a and Figure 5b This is an example of an application Figure 2 FIG. 1 is a front cross-sectional view and a plan cross-sectional view of an example of a second discharge gas injection portion.

[0106] The second discharge gas injection part 160 supplies a discharge gas for rotation driving of a second arc formed inside the second positive electrode 130 , is disposed above the second positive electrode 130 , and may be configured to supply a discharge gas into the second hole 130 h of the second positive electrode 130 in a rotation direction.

[0107] Of course, the discharge gas injected into the second discharge gas injection part 160 may also be a gas such as nitrogen (N2), argon (Ar), or a gas such as air, oxygen (O2), hydrogen (H2), but is not limited thereto.

[0108] The second discharge gas injection part 160 is configured in the same manner as the first discharge gas injection part 140 , and may include a second body part 161 having a cylindrical shape made of a heat insulating material and a plurality of second injection ports 161 h horizontally passing through the inner / outer circumference of the second body part 161 .

[0109] According to an embodiment, the second injection port 161h is formed in a tangential direction relative to the inner circumferential surface of the second body portion 161, and eight second injection ports 161h may be arranged at regular intervals in the circumferential direction, but are not limited thereto. However, the second injection port 161h is configured to inject the discharge gas in the same rotation direction as the first injection port 141h.

[0110] In addition, in order to uniformly supply the discharge gas to the plurality of second injection ports 161h, an annular auxiliary injection port 162h communicating with each other outside the second injection ports 161h is provided in the second positive electrode case 130B, or a communication hole 163h for injecting the discharge gas into the auxiliary injection port 162h from the outside may be provided in the second positive electrode case 130B, but the present invention is not limited thereto.

[0111] Therefore, when the discharge gas is supplied along the inner circumference of the second positive electrode 130 in the rotation direction through the second discharge gas injection part 160, the discharge gas induces effective rotation drive by the second arc, and the high-temperature thermal plasma causes the process gas to be thermally decomposed. Of course, it is possible to prevent the inner circumference of the second positive electrode 130 from being damaged by the second arc due to byproducts generated during the decomposition of the process gas due to the influence of the flow direction of the discharge gas.

[0112] Figure 6a and Figure 6b This is an example of an application Figure 2 A front cross-sectional view and a plan cross-sectional view of an example of a third discharge gas injection portion.

[0113] The third discharge gas injection part 170 is used to form a flow of the discharge gas capable of restricting the arc length, is disposed below the second positive electrode 130, and is configured to supply the discharge gas to the lower side of the second hole 130h of the second positive electrode.

[0114] The discharge gas injected into the third discharge gas injection part 170 may also be composed of gases such as nitrogen (N2) and argon (Ar), or gases such as air, oxygen (O2), and hydrogen (H2), but is not limited thereto.

[0115] In detail, the third discharge gas injection part 170 may be configured as a third injection port 171 h horizontally passing through the lower inner / outer circumference of the second positive electrode 130 .

[0116] According to an embodiment, the third injection port 171h is formed in a tangential direction relative to the inner circumferential surface of the second positive electrode 130, and eight third injection ports 171h may be arranged at regular intervals in the circumferential direction, but are not limited thereto. However, the third injection port 171h is also configured to inject the discharge gas in the same rotation direction as the first injection port 141h and the second injection port 161h.

[0117] In addition, a ring-shaped auxiliary injection port 172h communicating with each other outside the third injection port 171h and a communication hole 173h for injecting a discharge gas into the auxiliary injection port 172h from the outside are additionally provided with the second positive electrode case 130A, but are not limited thereto.

[0118] Therefore, when the discharge gas is supplied to the lower side of the second positive electrode 130 in the rotation direction through the third discharge gas injection part 170 , the length of the second arc formed in the vertical direction may be prevented from further extending.

[0119] Figure 7a and Figure 7b This is an example of an application Figure 2 1 and 2 are plan cross-sectional views of a first embodiment and a second embodiment of a magnet portion.

[0120] The magnetic portions M1 and M2 form a magnetic field around the arc to help the arc rotate, and may include a first magnetic portion M1 mounted on an outer circumferential surface of the first positive pole 120 and a second magnetic portion M2 mounted on an outer circumferential surface of the second positive pole 130 .

[0121] The magnet portions M1 and M2 are constituted by cylindrical permanent magnets surrounding the electrodes 120 and 130 , and the N-pole portion N and the S-pole portion N may be configured to overlap such that the inner and outer circumferences have different polarities from each other.

[0122] Of course, the shapes of the magnet parts M1 and M2 may also be configured differently according to the shapes of the electrodes 120 and 130 .

[0123] When the process gas is injected in a counterclockwise direction, as Figure 7a As illustrated in FIG. 1 , the S-pole portion S is installed to surround the electrode, and the N-pole portion N is installed to surround the S-pole portion S, so that a magnetic field can be formed in a counterclockwise direction as a process gas flow direction.

[0124] When the process gas is injected in a clockwise direction, as Figure 7b As illustrated in FIG. 1 , the N-pole portion N is installed to surround the electrode, and the S-pole portion S is installed to surround the N-pole portion N, so that a magnetic field can be formed in the clockwise direction as the flow direction of the process gas.

[0125] Therefore, by improving the rotation of the hot plasma arc formed inside the electrodes 120 and 130 under the influence of the magnetic field formed by the magnet parts M1 and M2, the thermal decomposition performance can be improved, and the hot plasma jet formed by the arc is not eccentric and is located in the central part of the electrodes 120 and 130, so that the discharge stability of the hot plasma jet can be improved.

[0126] Figure 8is a front cross-sectional view illustrating an example of a reaction portion of the thermal plasma processing apparatus applied to the present disclosure.

[0127] The reaction part 300 includes a reaction chamber 310 , a first protective gas injection part 320 , and a second protective gas injection part 330 .

[0128] The reaction chamber 310 and the torch 100 ( Figure 2 The second arc on the side of the second positive electrode causes the process gas to thermally decompose. Figure 2 ) is connected, and an axially long discharge current path 310h is provided in the center.

[0129] Therefore, it is set that when the torch portion 100 ( Figure 2 The reaction time of thermal decomposition can be accelerated when the processing gas (exemplified in FIG. 4 ) passes through the reaction chamber before being discharged to the outside.

[0130] According to an embodiment, the reaction chamber 310 may include an inner housing 311 having at least one bottleneck 311A ​​formed by reducing a diameter of a discharge current path 310 h , and an outer housing 312 disposed to surround the inner housing 311 so as to cool the inner housing 311 .

[0131] The inner case 311 has a cylindrical shape and includes a heat insulating material 311a having a bottleneck 311A ​​on an inner circumferential surface and a case 311b provided to surround the outside of the heat insulating material 311a. In this case, the heat insulating material 311a may be made of ceramics that can withstand even a high temperature environment.

[0132] The outer casing 312 takes the form of a double tube 312 a , and a cooling flow path 312 b is provided inside the double tube 312 a .

[0133] Therefore, the discharge current path 310 h can be maintained at a high temperature by the inner case 311 , and the heat insulating material on the inner case 311 side can be effectively cooled by the outer case 312 .

[0134] Figures 9a to 9c This is an example of an application Figure 8 Front cross-sectional views of various examples of inner shells.

[0135] A plurality of bottlenecks 311A, 311B, and 311C may be provided in a discharge direction of the process gas within the inner housing 311 .

[0136] The diameter D2 of the bottlenecks 311A, 311B, and 311C may be configured to be smaller than the diameter D1 of the inner housing 311 , and the diameters thereof may be gradually reduced in consideration of the flow rate of the process gas.

[0137] The bottlenecks 311A, 311B and 311C of the configuration are arranged in a manner that passes through the reaction chamber 310 ( Figure 8 ) generates turbulence in the flow of the process gas, causing mixing of the process gas, and delaying the process gas from leaving the reaction chamber 310 ( Figure 8 The time spent on the treatment (as exemplified in FIG. ) can promote the thermal decomposition of the treated gas.

[0138] Of course, as the number of bottlenecks 311A, 311B, and 311C increases, thermal decomposition of the process gas can be further promoted, but the number of bottlenecks 311A, 311B, and 311C can be appropriately adjusted in consideration of flow resistance.

[0139] Fig.10a and Fig.10b This is an example of an application Figure 8 A front sectional view and a plan sectional view of an example of a first protective gas injection part.

[0140] The first protective gas injection part 320 is used to inject protective gas into the reaction chamber 310 ( Figure 8 The inner circumference of the reaction chamber 310 (shown in FIG. 1 ) forms a protective gas region and is located in the reaction chamber 310 ( Figure 8 ) and may be configured to inject the protective gas into the reaction chamber 310 ( Figure 8 (example in ) internal.

[0141] The protective gas injected into the first protective gas injection part 320 may also be composed of gases such as nitrogen (N2) and argon (Ar) or gases such as air and oxygen (O2) like the discharge gas, but is not limited thereto.

[0142] The first protective gas injection part 320 may include a first protective gas injection part 320 that horizontally passes through the reaction chamber 310 ( Figure 8 The first protective gas injection port 321h at the upper part of the PCB is shown in the figure.

[0143] According to this embodiment, the heat insulating member 1 may be installed in the torch portion 100 ( Figure 1 ) and reaction chamber 310 ( Figure 8 ), the first discharge gas injection port 312h may be provided in the heat insulating member 1, and the first protective gas injection port 321h may be provided in a position relative to the reaction chamber 310 ( Figure 8 The eight first protective gas injection ports 321h are formed in the tangential direction of the inner circumferential surface of the first protective gas injection port 321h, and the eight first protective gas injection ports 321h may be arranged at regular intervals in the circumferential direction, but are not limited thereto.

[0144] Of course, considering that the discharge gas and the process gas are Figure 1 Preferably, the shielding gas is also injected in the same direction of rotation as the flow on the side (exemplified in FIG. 5 ).

[0145] In addition, in order to uniformly supply the protective gas to the plurality of first protective gas injection parts 321h, annular auxiliary injection ports 322h connected to each other may be provided outside the first protective gas injection ports 321h, and connecting holes 323h for injecting the protective gas into the auxiliary injection ports 322h from the outside may be provided, but are not limited thereto.

[0146] Therefore, when the first protective gas injection unit 320 is passed along the reaction chamber 310 ( Figure 8 When the protective gas is supplied to the inner circumference of the reaction chamber 310 ( Figure 8 The inner peripheral surface of the protective gas zone is formed.

[0147] In addition, when the processing gas passes through the reaction chamber 310 ( Figure 8 When the reaction chamber 310 is heated to 100°, the reaction chamber 310 is heated to 100°, and the reaction chamber 310 is heated to 100°. Figure 8 ) and can prevent the reaction chamber 310 (such as Figure 8 shown) is corroded.

[0148] Fig.11a and Fig.11b This is an example of an application Figure 8 A front sectional view and a plan sectional view of an example of a second protective gas injection portion.

[0149] The second protective gas injection part 330 is used to discharge the gas accumulated in the reaction chamber 310 ( Figure 8 ) is disposed in the reaction chamber 310 ( Figure 8 ) and can be configured to inject the protective gas into the reaction chamber 310 ( Figure 8 (example).

[0150] The protective gas injected into the second protective gas injection part 330 may also be composed of gases such as nitrogen (N2) and argon (Ar) or gases such as air and oxygen (O2) like the discharge gas, but is not limited thereto.

[0151] The second discharge gas injection part 330 may include a portion obliquely passing through the reaction chamber 310 ( Figure 8 The second protective gas injection port 331h at the lower portion of the reaction chamber 310 (shown in FIG. 1 ) may be provided at a second protective gas injection port 331h at the lower portion of the reaction chamber 310 ( Figure 8 at the lowermost end of the inner circumferential surface (illustrated in the example).

[0152] According to an embodiment, the reaction chamber 310 ( Figure 8) is configured such that the outer shell 312 surrounds the inner shell 311 ( Figure 8 The second protective gas injection port 331h can be set at the lower part of the outer shell 312 (illustrated in FIG).

[0153] In this case, the second protective gas injection port 331h is located relative to the reaction chamber 310 ( Figure 8 In the embodiment of the present invention, the second protective gas injection ports 331h are formed in a direction orthogonal to the inner circumferential surface of the semiconductor device (exemplified in FIG), and eight second protective gas injection ports 331h may be arranged at regular intervals in the circumferential direction, but are not limited thereto.

[0154] In addition, in order to uniformly supply the protective gas to the plurality of second protective gas injection parts 331h, annular auxiliary injection ports 332h connected to each other may be provided outside the second protective gas injection ports 331h, and connecting holes 333h for injecting the protective gas into the auxiliary injection ports 332h from the outside may be provided, but are not limited thereto.

[0155] When the high temperature processing gas is discharged from the reaction chamber 310 ( Figure 1 When the reaction chamber 310 (shown in FIG. 1 ) is discharged outside the room temperature, a large amount of fine particles will be generated. These fine particles will accumulate in the reaction chamber 310 ( Figure 1 In the discharge port on the lower side).

[0156] Therefore, when the second protective gas injection unit 330 is placed relative to the reaction chamber 310 ( Figure 1 When the protective gas is supplied downwardly in a direction perpendicular to the inner peripheral surface of the reaction chamber 310 (shown in FIG. Figure 1 Foreign matter in the lower part of the reaction chamber 310 (illustrated in FIG. 1 ) can be discharged to the outside, and the reaction chamber 310 ( Figure 1 The discharge port (illustrated in FIG) is blocked.

[0157] Figure 12 to Figure 14 is a front cross-sectional view illustrating an operating state of a thermal plasma processing apparatus according to an embodiment of the present disclosure.

[0158] At initial startup, if Fig.12 When the switch 240 is turned on as illustrated in the figure, the negative electrode 110 and the first positive electrode 120 are also energized, and at the same time, the negative electrode 110 and the second positive electrode 130 are energized, and a first arc is generated between the negative electrode 110 and the first positive electrode 120 that are close to each other, and even between the negative electrode 110 and the second positive electrode 130 that are slightly farther away, the first arc can also move toward the second arc.

[0159] like Fig.13 As illustrated in FIG. 1 , even if the switch is turned off, the second arc can be continuously generated, and when the power supply to the first positive electrode 120 is cut off, the second arc can be prevented from moving toward the first arc.

[0160] As described above, when the first arc and the second arc are generated in the torch part and the discharge gas and the process gas are injected simultaneously, the process gas is thermally decomposed.

[0161] When the discharge gas is injected into the upper side of the first positive electrode 120 through the first discharge gas injection part 140, the discharge gas contacts the first arc to form, rotate and move the thermal plasma jet downward. Therefore, the discharge gas flow formed inside the first positive electrode 120 can extend or move the first arc to the inside of the second positive electrode 130.

[0162] When the discharge gas is injected into the upper side of the second cathode 130 through the second discharge gas injection part 160, the discharge gas contacts the second arc to form, rotate, and move downward a thermal plasma jet.

[0163] As described above, when the arc and the thermal plasma jet are formed to be long in the axial direction and the processing gas is injected into the upper side of the second positive electrode 130 through the processing gas injection part 150, the processing gas not only contacts the arc for a long time, but also passes through the central part of the arc at approximately 10000°C, which can further improve the thermal decomposition performance of the processing gas.

[0164] When the discharge gas is injected into the lower side of the second positive electrode 130 through the third discharge gas injection part 170 , the horizontal flow of the discharge gas blocks the vertical flow of the second arc, thereby controlling the length of the second arc and preventing exposure to the reaction chamber 310 .

[0165] As described above, the process gas thermally decomposed in the torch is Fig.14 The process gas illustratively flows into the reaction chamber 310, and while passing through the reaction chamber 310, the process gas may ensure a reaction time at a high temperature to promote thermal decomposition.

[0166] In addition, the process gas collides with the bottleneck 311A ​​inside the reaction chamber 310 to form turbulence, thereby causing mixing of the process gas and ensuring a long reaction time of the process gas, thereby promoting thermal decomposition of the process gas.

[0167] Furthermore, when the process gas is thermally decomposed in the torch and the reaction chamber 310, corrosive gas is generated.

[0168] Therefore, when the protective gas is injected into the upper side of the reaction chamber 310 through the first protective gas injection part 320, the protective gas forms a protective gas area on the inner circumferential surface of the reaction chamber 310, and since the corrosive gas does not directly contact the inner circumferential surface of the reaction chamber 310, the reaction chamber 310 can be prevented from being corroded.

[0169] In addition, when the process gas is discharged from the inside of the high temperature reaction chamber 310 to the outside thereof where the temperature is relatively low, a large amount of fine particles and the like may be generated, and these fine particles may be accumulated as foreign matter on the lower side of the inside of the reaction chamber 310 .

[0170] Therefore, when the protective gas is injected into the lower side of the reaction chamber 310 through the second protective gas injection part 330, the protective gas can effectively discharge foreign matter accumulated in the lower portion of the reaction chamber 310 to the outside thereof and can prevent the reaction chamber 310 from being blocked.

[0171] Industrial Applicability

[0172] The present embodiment can be applied to a thermal plasma processing apparatus that thermally decomposes and processes a processing gas such as a harmful gas and a greenhouse gas.

Claims

1. A thermal plasma processing device, comprising: a torch section in which an arc is generated between a cathode and a cathode, and in which a process gas to be thermally decomposed by the arc is injected between the cathode and the cathode; a power supply unit configured to be connected to the negative electrode and the positive electrode and to apply a high voltage between the negative electrode and the positive electrode; as well as a reaction section configured to communicate with the torch section and generate turbulence in the process gas passing through the torch section, Wherein, the torch part comprises: a cathode located at the center of the torch; an axis-type negative electrode case, wherein the negative electrode is mounted at a lowermost end, and wherein a cooling flow path is provided at a center of the negative electrode case; a cylindrical first positive electrode, which is arranged to surround the negative electrode and has a first hole at the center of the first positive electrode, wherein a first arc is formed inside the first hole; a cylindrical first positive electrode case configured to be installed to surround the first positive electrode and having a supply path communicating with a cooling flow path provided on an outer peripheral surface of the first positive electrode; a cylindrical second positive electrode configured to be spaced apart from a lower side of the first positive electrode and having a second hole communicating with the first hole at a center of the second positive electrode, wherein a diameter of the second hole is larger than a diameter of the first hole and a length of the second hole is longer than a length of the first hole, wherein a second arc induced by the first arc is formed inside the second hole; and a cylindrical second positive electrode casing configured to be mounted around the second positive electrode and having a cooling flow path between the second positive electrode and the second positive electrode casing, wherein the second arc formed inside the second hole thermally decomposes the process gas, Wherein, the reaction part comprises: a reaction chamber disposed below the second positive electrode and provided with a discharge current path long in the axial direction and communicating with the second hole; a first protective gas injection part configured to be disposed on an upper portion of the reaction chamber, inject a protective gas into an interior of the first protective gas injection part, and supply the protective gas to an upper portion of a discharge channel; and a second protective gas injection part configured to be disposed below the reaction chamber, injecting protective gas into the interior of the second protective gas injection part and removing foreign matter accumulated in the lower part of the discharge current path, wherein the reaction chamber comprises: a cylindrical inner casing provided with at least one bottleneck formed by reducing the diameter of the discharge current path, the cylindrical inner casing being made of insulating ceramic; and A double-tube type outer casing is installed to surround the inner casing and a cooling flow path is provided in the outer casing.

2. The thermal plasma processing apparatus according to claim 1, in, The torch also includes: a first discharge gas injection portion configured to be disposed above the first positive electrode to inject a discharge gas into an interior of the first discharge gas injection portion in a rotation direction and supply the discharge gas to an upper portion of the first hole; a process gas injection portion configured to be disposed around the first positive electrode case, inject a process gas to be processed into the interior of the process gas injection portion in a rotation direction, and supply the process gas to an upper portion of the second hole; and a second discharge gas injection portion configured to be disposed between the process gas injection portion and the second positive electrode to inject the discharge gas into an interior of the second discharge gas injection portion in a rotation direction and supply the discharge gas to an upper portion of the second hole, and The first discharge gas injection part, the second discharge gas injection part, and the process gas injection part are configured to inject the discharge gas and the process gas in the same rotation direction.

3. The thermal plasma processing apparatus according to claim 2, in, The first discharge gas injection part includes: a first body portion configured to have a cylindrical shape communicating with the first hole and having a predetermined thickness in a radial direction; and A plurality of first discharge gas injection ports are disposed to pass through the inner circumference and the outer circumference of the first body portion and to inject the discharge gas in a tangential direction relative to the inner circumference of the first body portion.

4. The thermal plasma processing apparatus according to claim 2, in, The process gas injection unit comprises: a cylindrical body portion configured to surround the first positive electrode and the first discharge gas injection portion and communicate with the second hole; and A plurality of injection pipes are configured to communicate with the interior of the main body and to inject the process gas in a tangential direction relative to the inner circumferential surface of the main body.

5. The thermal plasma processing apparatus according to claim 2, in, The second discharge gas injection part includes: a second body portion configured to have a cylindrical shape communicating with the second hole and having a predetermined thickness in a radial direction; a plurality of second discharge gas injection ports arranged to pass through the inner and outer circumferential surfaces of the second body portion and inject the discharge gas in a tangential direction relative to the inner circumferential surface of the second body portion; and The ring-shaped second discharge gas auxiliary injection ports are configured to communicate with each other outside the second discharge gas injection ports.

6. The thermal plasma processing apparatus according to claim 2, in, The torch also includes: A third discharge gas injection portion is configured to be disposed at a lower end of the second positive electrode case and the second positive electrode to inject the discharge gas into an inner side in a rotation direction and supply the discharge gas to a lower portion of the second hole.

7. The thermal plasma processing apparatus according to claim 6, in, The third discharge gas injection part includes: a plurality of third discharge gas injection ports configured to pass through the inner circumferential surface of the second positive electrode and the outer circumferential surface of the second positive electrode case and inject the discharge gas in a tangential direction relative to the inner circumferential surface of the second positive electrode; and The ring-shaped third discharge gas auxiliary injection port is configured to communicate with each other outside the third discharge gas injection port.

8. The thermal plasma processing apparatus according to claim 2, in, The torch also includes: A first magnet part is configured to be disposed around the first positive electrode and to generate a magnetic field in the same direction as a rotation direction of the discharge gas injected by the first discharge gas injection part.

9. The thermal plasma processing apparatus according to claim 2, in, The torch also includes: A second magnet is configured to be disposed around the second positive electrode and to generate a magnetic field in the same direction as a rotation direction of the discharge gas injected by the second discharge gas injection part.

10. The thermal plasma processing apparatus according to claim 1, in, The power supply unit comprises: a negative electrode wire configured to connect a negative charge to the negative electrode; a first positive electrode wire configured to connect a positive charge to the first positive electrode; a second positive electrode wire configured to connect a positive charge to the second positive electrode; and A switch is configured to be disposed on the first positive wire and selectively energize the negative electrode and the first positive electrode.

11. The thermal plasma processing apparatus according to claim 1, in, The first protective gas injection part and the second protective gas injection part supply one of nitrogen N2, argon Ar, air, and oxygen O2 as a protective gas.

12. The thermal plasma processing apparatus according to claim 1, in, The first protective gas injection part comprises: a plurality of first protective gas injection ports, which are configured to pass through an upper portion of the reaction chamber and inject the protective gas in a tangential direction relative to an inner circumferential surface of the reaction chamber; and The annular first protective gas auxiliary injection part is communicated with each other outside the first protective gas injection port.

13. The thermal plasma processing apparatus according to claim 1, in, The second protective gas injection part comprises: a plurality of second protective gas injection ports, which are arranged to pass through a lower portion of the reaction chamber and inject the protective gas in an orthogonal direction relative to an inner circumferential surface of the reaction chamber; and The annular second protective gas auxiliary injection port is configured to communicate with each other outside the second protective gas injection port.

14. The thermal plasma processing apparatus according to claim 13, in, The second protective gas injection port is configured to be inclined downward from the outer peripheral surface toward the inner peripheral surface of the reaction chamber in the discharge direction of the discharge current path.

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