Aberration estimating method, aberration estimating apparatus, and storage medium

a technology of aberration estimation and estimating method, applied in the direction of measuring devices, instruments, structural/machine measurement, etc., can solve the problems of significant variation in the initial value at which optimization starts, high cost and large estimation of dedicated optical modules, etc., and achieve high accuracy

Active Publication Date: 2022-11-03
CANON KK
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This approach enables high-accuracy aberration estimation by determining an appropriate initial value, reducing the impact of measurement and calculation errors, and improving the overall estimation precision.

Problems solved by technology

However, these measurement apparatuses require a dedicated optical module, and are thus expensive and large.
However, the method of Japanese Patent No. 4411395 has a problem in that the result estimated by the initial value at which optimization starts significantly varies.
The method disclosed in Woods et al. does not use repetitive calculations and does not have the above problem, but cannot provide a measurement with high accuracy due to an approximation error in solving the equation.
Both methods lower the accuracy due to an apparatus error, a measurement error, or the like.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Aberration estimating method, aberration estimating apparatus, and storage medium
  • Aberration estimating method, aberration estimating apparatus, and storage medium
  • Aberration estimating method, aberration estimating apparatus, and storage medium

Examples

Experimental program
Comparison scheme
Effect test

first embodiment

[0045]A description will now be given through simulation of an aberration estimating method according to a first embodiment. This embodiment is realized by the aberration estimating apparatus 100 in FIG. 1. The image sensor 103 is installed on the driver 104 and moves to a position designated by the computer 105. In this embodiment, the light intensity distribution is acquired at each position where the focus position of the target optical system 102 is set to the origin and the defocus amounts are set to −70 μm, −60 μm, −50 μm, 50 μm, 60 μm, and 70 μm. It is assumed that the pinhole 101 is located at a sufficiently long distance, and light incident on the target optical system 102 is substantially parallel light. Assume that the target optical system 102 has an F-number of 1.4, and an aberration in which the coefficient of the fifth term in the Zernike polynomial is −2λ, the coefficient of the seventh term is 4λ, and the coefficient of the ninth term is 2λ. There are various defini...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An aberration estimating method includes acquiring a light intensity distribution of an optical image of an object formed via a target optical system, acquiring an approximated aberration of the target optical system based on the light intensity distribution, determining an initial value of the aberration of the target optical system based on the approximated aberration, and estimating an aberration of the target optical system using the initial value.

Description

BACKGROUND OF THE INVENTIONField of the Invention[0001]The present invention relates to an aberration estimating method, an aberration estimating apparatus, and a storage medium, each of which can estimate an aberration of an optical system using a light intensity distribution.Description of the Related Art[0002]An optical apparatus, such as a camera and a telescope, measures an aberration of an optical system, such as a lens, in order to evaluate and guarantee the performance of the optical apparatus. The aberration measurement needs to measure a phase of light, and thus conventionally uses an interferometer, a Shack-Hartmann sensor, or the like. However, these measurement apparatuses require a dedicated optical module, and are thus expensive and large.[0003]Japanese Patent No. (“JP”) 4411395 and Simon C. Woods, Alan H. Greenaway, “Wave-front sensing by use of a Green's function solution to the intensity transport equation”, Journal of the Optical Society America A, U.S.A., March 2...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & AuthorityApplications(United States)
IPC IPC(8): G01M11/02
CPCG01M11/0257G01M11/0264
InventorEGUCHI, AKIRA
OwnerCANON KK