Chamfering wheel and chamfering device having the chamfering wheel

Abstract

In order to manufacture a chamfering wheel that can prevent damage during chamfering and a chamfering device having the chamfering wheel, the present invention provides a chamfering wheel having the following components and a chamfering device having the chamfering wheel: a first rotating part having a first radius from a rotation center axis to an outer side surface, and when one side of the rotation center axis is called an upper part and the other side of the rotation center axis is called a lower part, the outer side surface has a first main groove extending in the up-down direction; a second rotating part having a second radius from the rotation center axis to the outer side surface, the second radius is larger than the first radius, and is located at the upper and lower parts of the first rotating part; a third rotating part is located between the second rotating part and the first rotating part and connects the second rotating part and the first rotating part, and the radius from the rotation center axis to the outer side surface increases as it moves from a part adjacent to the first rotating part to a part adjacent to the second rotating part.

Description

Technical Field

[0001] Embodiments of the present invention relate to a chamfering wheel and a chamfering device having the chamfering wheel, and more particularly to a chamfering wheel capable of preventing damage during chamfering and a chamfering device having the chamfering wheel. Background Art

[0002] Generally, a display device has a structure in which a display portion is formed on a substrate. Of course, an upper substrate covering the display portion may be bonded to the substrate as required. In order to make the corners of the substrate of such a display device not sharp, the corners of the substrate are processed during the manufacturing process of the display device. Summary of the invention

[0003] However, conventional wheels for processing corners have a problem in that the corners of a substrate cannot be accurately processed as intended.

[0004] The present invention is proposed to solve many problems including the above problems, and its purpose is to provide a chamfering wheel that can prevent damage during chamfering, a chamfering device having the chamfering wheel, and a manufacturing method of a display device using the chamfering wheel. However, such a subject is only exemplary, and the scope of the present invention is not limited thereto.

[0005] According to one aspect of the present invention, there is provided a chamfering wheel, comprising: a first rotating portion, having a first radius from a rotation center axis to an outer side surface, and when one side of the rotation center axis is referred to as an upper portion and the other side of the rotation center axis is referred to as a lower portion, the outer side surface has a first main groove extending in an up-down direction; a second rotating portion, located at the upper and lower portions of the first rotating portion, having a second radius from the rotation center axis to the outer side surface, the second radius being greater than the first radius; a third rotating portion, located between the second rotating portion and the first rotating portion and connecting the second rotating portion and the first rotating portion, the radius from the rotation center axis to the outer side surface increasing as it moves from a portion adjacent to the first rotating portion toward a portion adjacent to the second rotating portion.

[0006] When the second rotating part located at the upper part of the second rotating part is called the second upper rotating part, and the second rotating part located at the lower part is called the second lower rotating part, the straight line connecting the end of the second upper rotating part of the first main groove and the end of the second lower rotating part of the first main groove may not be parallel to the rotation center axis.

[0007] The first main groove may rotate at least once along the outer side surface of the first rotating portion around the rotation center axis.

[0008] When the second rotating portion located at the upper part of the second rotating portion is called the second upper rotating portion, the second rotating portion located at the lower part is called the second lower rotating portion, the third rotating portion adjacent to the second upper rotating portion of the third rotating portion is called the third upper rotating portion, and the third rotating portion adjacent to the second lower rotating portion is called the third lower rotating portion, the end of the first main groove in the direction of the third lower rotating portion can be located at the boundary between the first rotating portion and the third lower rotating portion.

[0009] When the third rotating part adjacent to the second upper rotating part is called the third upper rotating part, and the third rotating part adjacent to the second lower rotating part is called the third lower rotating part, at least one of the third upper rotating part and the third lower rotating part may have an additional groove extending in the up and down direction on the outer side.

[0010] At this time, the additional groove may be connected to the first main groove.

[0011] In addition, the first rotating portion, the second rotating portion, and the third rotating portion may be formed as one body.

[0012] When the second rotating part located at the upper part of the second rotating part is called the second upper rotating part, and the second rotating part located at the lower part is called the second lower rotating part, the chamfering processing wheel can also have: a second additional rotating part, located at the upper part of the second upper rotating part, and the radius from the rotation center axis to the outer side surface is the same as the second radius; a first additional rotating part, located between the second additional rotating part and the second upper rotating part, and the radius from the rotation center axis to the outer side surface is the same as the first radius, and the outer side surface has a second main groove extending in the up and down direction; a third additional rotating part, located between the second additional rotating part and the first additional rotating part and between the second upper rotating part and the first additional rotating part, so as to connect the second additional rotating part and the second upper rotating part to the first additional rotating part, and the radius from the rotation center axis to the outer side surface increases as it goes from the part adjacent to the first additional rotating part to the part adjacent to the second additional rotating part or from the part adjacent to the first additional rotating part to the part adjacent to the second upper rotating part.

[0013] According to another aspect of the present invention, there is provided a chamfering device comprising: any one of the aforementioned chamfering wheels; a motor capable of rotating the chamfering wheel; and a position adjustment unit capable of moving the chamfering wheel in an up-and-down direction relative to a chamfering object, or in a plane perpendicular to the up-and-down direction.

[0014] The first rotating portion, the second rotating portion, and the third rotating portion may be formed as one body.

[0015] Other aspects, features, and advantages besides the above will become apparent from the following detailed description for carrying out the invention, the claims, and the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 FIG. 1 is a perspective view schematically showing a chamfering wheel according to an embodiment of the present invention.

[0017] Figure 2 as well as Figure 3 It is a schematic diagram showing the use of Figure 1 Conceptual diagram of chamfering using a chamfering wheel.

[0018] Figure 4 It is a side view schematically showing a chamfering wheel according to a comparative example.

[0019] Figure 5 FIG. 1 is a perspective view schematically showing a chamfering wheel according to another embodiment of the present invention.

[0020] Figure 6 FIG. 1 is a perspective view schematically showing a chamfering wheel according to still another embodiment of the present invention.

[0021] Figure 7 FIG. 1 is a perspective view schematically showing a chamfering wheel according to still another embodiment of the present invention.

[0022] Figure 8 FIG. 1 is a perspective view schematically showing a chamfering wheel according to still another embodiment of the present invention.

[0023] Fig. 9 FIG. 1 is a perspective view schematically showing a chamfering wheel according to still another embodiment of the present invention.

[0024] Fig.10 FIG. 1 is a conceptual diagram schematically showing a chamfering wheel according to still another embodiment of the present invention.

[0025] Fig.11 This is a conceptual diagram schematically showing a part of a chamfering processing device according to an embodiment of the present invention.

[0026] Fig.12 as well as Fig.13 The present invention is a perspective view schematically showing a part of the steps of a method for manufacturing a display device according to an embodiment of the present invention. DETAILED DESCRIPTION

[0027] The present invention is susceptible to many variations and may have multiple embodiments, specific embodiments of which are shown in the drawings and described in detail in the detailed description. Figure 1The effects and features of the present invention and methods for achieving the effects and features will be made clear by the detailed description of the embodiments. However, the present invention is not limited to the embodiments disclosed below, and can be implemented in various forms.

[0028] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. When describing with reference to the accompanying drawings, the same or corresponding components are given the same reference numerals and repeated description thereof will be omitted.

[0029] In the following embodiments, when various components such as layers, films, regions, and plates are mentioned as being "above" another component, it includes not only the case where they are "immediately above" another component, but also the case where other components are sandwiched between the two. In addition, for ease of explanation, the size of the components in the drawings may be exaggerated or reduced. For example, for ease of explanation, the size and thickness of each component shown in the drawings are shown as arbitrary sizes and thicknesses, so the present invention is not necessarily limited to the contents shown in the drawings.

[0030] In the following embodiments, the x-axis, y-axis, and z-axis are not limited to the three axes in the rectangular coordinate system, but can be interpreted as including a broader meaning thereof. For example, the x-axis, y-axis, and z-axis can intersect perpendicularly, but can also refer to different directions that do not intersect perpendicularly.

[0031] Figure 1 FIG. 2 is a perspective view schematically showing a chamfering wheel CW according to an embodiment of the present invention. Figure 1 As shown, the chamfering wheel CW according to the present embodiment includes a first rotating portion 110 , second rotating portions 210 , 220 , and third rotating portions 310 , 320 .

[0032] The first rotating part 110 can rotate around a rotation center axis RA parallel to the z-axis. The first rotating part 110 has a first radius from the rotation center axis RA to the outer side. Figure 1 As shown, the first rotating part 110 may have a cylindrical shape or a hollow cylindrical shape. Figure 1 As shown, the first rotating portion 110 has a first main groove 112 on the outer side. If one side of the rotation center axis RA (in the +z direction) is called the upper part and the other side of the rotation center axis RA (in the -z direction) is called the lower part, the first main groove 112 can have a shape extending in the up and down directions.

[0033] The second rotating parts 210 and 220 can also rotate around the rotation center axis RA. Such second rotating parts 210 and 220 respectively have a second radius from the rotation center axis RA to the outer side surface, such as Figure 1As shown, the second radius is greater than the first radius of the first rotating part 110. The second rotating parts 210 and 220 are located at the upper part (in the +z direction) and the lower part (in the -z direction) of the first rotating part 110. The second rotating part 210 and 220 located at the upper part (in the +z axis direction) of the second rotating parts 210 and 220 may be referred to as the second upper rotating part 210, and the second rotating part located at the lower part (in the -z axis direction) may be referred to as the second lower rotating part 220.

[0034] The third rotating parts 310 and 320 can also rotate around the rotation center axis RA. Such third rotating parts 310 and 320 are located between the second rotating parts 210 and 220 and the first rotating part 110 to connect the second rotating parts 210 and 220 and the first rotating part 110. The third rotating part adjacent to the second upper rotating part 210 of the third rotating parts 310 and 320 can be called the third upper rotating part 310, and the third rotating part adjacent to the second lower rotating part 220 can be called the third lower rotating part 320. At this time, the radius from the rotation center axis RA of the third upper rotating part 310 to the outer side surface increases as it moves from the part adjacent to the first rotating part 110 to the part adjacent to the second upper rotating part 210, that is, as it moves toward the +z direction. Similarly, the radius from the rotation center axis RA of the third lower rotating part 320 to the outer side surface increases as it moves from the part adjacent to the first rotating part 110 to the part adjacent to the second lower rotating part 220, that is, as it moves toward the -z direction.

[0035] like Figure 1 As shown, the first rotating part 110, the second rotating parts 210, 220 and the third rotating parts 310, 320 can be formed as one body. The chamfering wheel CW having the first rotating part 110, the second rotating parts 210, 220 and the third rotating parts 310, 320 can be realized by using a grinding stone, for example. Of course, the present invention is not limited to this, and the chamfering wheel CW can also have Figure 1 The structure has the shape shown, and the abrasive particles are located on its surface.

[0036] Figure 2 as well as Figure 3 It is a schematic diagram showing the use of Figure 1 Conceptual diagram of chamfering with wheel CW. Figure 2As shown in a part of FIG. 1 , the lower substrate SUB1 and the upper substrate SUB2 of the display panel as the chamfering object are connected by a sealing member SU, and in this case, the display portion DU may be located on the surface of the lower substrate SUB1 in the direction of the upper substrate SUB2. The corners of the lower substrate SUB1 and the upper substrate SUB2 of the display panel as the chamfering object have sharp shapes. In this case, if the display panel is moved (along the +y direction) so that the side of the display panel contacts the chamfering wheel CW rotating around the rotation center axis RA, as shown in FIG. Figure 3 As shown, the side surface of the display panel will be processed according to the outer side surface shape of the chamfering wheel CW.

[0037] Specifically, the upper corner (in the +z direction) of the upper substrate SUB2 of the display panel is processed into a chamfer by contacting the outer side surface of the third upper rotating part 310 of the chamfering wheel CW rotating around the rotation center axis RA, and the lower corner (in the -z direction) of the lower substrate SUB1 of the display panel is processed into a chamfer by contacting the outer side surface of the third lower rotating part 320 of the chamfering wheel CW rotating around the rotation center axis RA. Of course, as needed, the portion of the end surface of the chamfering wheel CW direction (+y direction) of the upper substrate SUB2 of the display panel located on the lower side (in the -z direction) can be made to contact the outer side surface of the first rotating part 110 of the chamfering wheel CW, and the portion of the end surface of the chamfering wheel CW direction (+y direction) of the lower substrate SUB1 of the display panel located on the upper side (in the +z direction) can be made to contact the outer side surface of the first rotating part 110 of the chamfering wheel CW. As described above, the surface of the portion of the display panel that contacts the outer side surface of the first rotating portion 110 of the chamfering wheel CW may be processed by the first rotating portion 110 .

[0038] Thus, while the chamfering wheel CW rotating about the rotation center axis RA is in contact with the display panel, the chamfering wheel CW moves relative to the display panel in the +x direction or the -x direction, thereby chamfering the entire edge of the display panel.

[0039] As described above, when the edge of the display panel is processed by the chamfering wheel CW rotating about the rotation center axis RA, foreign matter such as powder may be generated on the lower substrate SUB1 or the upper substrate SUB2. Of course, liquid such as water may be supplied to the chamfering object during the chamfering process, but in this case, the powder dropped from the lower substrate SUB1 or the upper substrate SUB2 may form sludge with the liquid. If the foreign matter or sludge generated during the chamfering process as described above is located between the chamfering wheel CW and the chamfering object, it may cause defects in the chamfering object or damage the chamfering wheel CW.

[0040] Figure 4 1 is a side view schematically showing a chamfering wheel CW' according to a comparative example. Figures 1 to 3 Unlike the chamfering wheel CW according to the present embodiment, the chamfering wheel CW′ according to the comparative example does not have the first main groove 112. Therefore, a part of the foreign matter or mud generated during the chamfering process is located between the chamfering wheel CW and the chamfering object without being discharged to the outside, so that Figure 4 As shown in FIG. 1 , a concave portion CP is formed in the center of the chamfering wheel CW', thereby damaging the chamfering wheel CW'. Furthermore, if the damaged chamfering wheel CW' having the concave portion CP is used, the front end surface of the edge of the substrate or the like, which is the chamfering object, is processed to have a convex portion corresponding to the shape of the concave portion CP, resulting in a defect in the display panel or the like.

[0041] However, for the chamfering wheel CW according to the present embodiment, as described above, the first rotating portion 110 has the first main groove 112 extending in the vertical direction on the outer side surface. Therefore, foreign matter or mud generated during the chamfering process is collected in the first main groove 112 and then discharged to the outside, thereby effectively preventing or minimizing the undesirable situation caused by a part of the foreign matter or mud being located between the chamfering wheel CW and the chamfering object.

[0042] For reference, the chamfering wheel CW rotates around the rotation center axis RA while contacting the processed part of the chamfering object. Therefore, even if the first main groove 112 is formed on the outer side of the first rotating part 110, such a first main groove 112 will not affect the shape of the processed part of the chamfering object itself. This is because the first main groove 112 is not located in a plane (for example, an xy plane) perpendicular to the rotation center axis RA and is not formed around the outer side of the first rotating part 110. Therefore, the processed part of the chamfering object that contacts the chamfering wheel CW during the rotation of the chamfering wheel CW does not have a portion that only contacts the first groove portion 112. In addition, when the first main groove 112 is directed in other directions other than the direction of the chamfering object, the foreign matter or muddy matter temporarily contained in the first main groove 112 is discharged to the outside by the centrifugal force generated by the rotation of the chamfering wheel CW around the rotation center axis RA.

[0043] Figures 1 to 3 The first main groove 112 of the chamfering wheel CW is shown to have a straight line shape extending in the up-down direction (z-axis direction). Figures 1 to 31 shows a situation where a straight line connecting an end 112a of the first main groove 112 formed in the first rotating part 110 of the chamfering wheel CW in the direction of the second upper rotating part 210 (+z direction) and an end 112b of the first main groove 112 in the direction of the second lower rotating part 220 (-z direction) is consistent with the extending direction of the first main groove 112. However, the present invention is not limited to this.

[0044] For example, as a perspective view schematically showing a chamfering wheel according to another embodiment of the present invention, Figure 5 As shown in FIG. 1 , the straight line connecting the end 112a of the first main groove 112 formed in the first rotating portion 110 of the chamfering wheel CW in the direction of the second upper rotating portion 210 (+z direction) and the end 112b of the first main groove 112 in the direction of the second lower rotating portion 220 (-z direction) may not be parallel to the rotation center axis RA of the chamfering wheel CW. More specifically, as shown in FIG. 1 which is a perspective view schematically showing a chamfering wheel CW according to another embodiment of the present invention, Figure 6 As shown, the first main groove 112 can rotate one circle along the outer side surface of the first rotating part 110 with the rotation center axis RA as the center. At this time, although the straight line connecting the end 112a of the first main groove 112 formed on the first rotating part 110 for chamfering processing wheel CW in the direction of the second upper rotating part 210 (+z direction) and the end 112b of the first main groove 112 in the direction of the second lower rotating part 220 (-z direction) can be parallel to the rotation center axis RA, the extension direction of the first main groove 112 is different from the straight line. Of course, the first main groove 112 may not be a structure that rotates one circle along the outer side surface of the first rotating part 110 with the rotation center axis RA as the center, but as shown in FIG. Figure 7 The structure shown as rotating three times can obviously be modified in various ways.

[0045] As mentioned above, for Figures 5 to 7 As for the chamfering wheel CW according to the present embodiment, foreign matter or mud generated during the chamfering process is collected in the first main groove 112 and then discharged to the outside, thereby effectively preventing or minimizing the adverse conditions caused by the foreign matter or mud between the chamfering wheel CW and the chamfering object.

[0046] As described above, the chamfering wheel CW rotates around the rotation center axis RA while contacting the processed portion of the chamfered object, so even if the first main groove 112 is formed on the outer side of the first rotating portion 110, the first main groove 112 does not affect the shape of the processed portion of the chamfered object. In addition, when the first main groove 112 is directed in a direction other than the chamfered object, the foreign matter or muddy matter temporarily received in the first main groove 112 is discharged to the outside by the centrifugal force generated by the rotation of the chamfering wheel CW around the rotation center axis RA.

[0047] In addition, if Figures 1 to 3 as well as Figures 5 to 7 As shown, the end 112b of the first main groove 112 in the direction of the third lower rotating part 320 can be located at the boundary between the first rotating part 110 and the third lower rotating part 320. As mentioned above, the use of the first main groove 112 can effectively prevent or minimize the adverse conditions caused by foreign matter or mud between the chamfering wheel CW and the chamfering object. At this time, the foreign matter or mud has a tendency to move downward (-z direction) due to gravity. Therefore, the amount of foreign matter or mud in the portion from the upper and lower center of the first rotating part 110 to the boundary between the first rotating part 110 and the third lower rotating part 320 is greater than the amount of foreign matter or mud in the portion from the upper and lower center of the first rotating part 110 to the boundary between the first rotating part 110 and the third upper rotating part 310. Therefore, by making the end 112b of the first main groove 112 in the direction of the third lower rotating part 320 located at the boundary between the first rotating part 110 and the third lower rotating part 320, foreign matter or mud existing in the part from the upper and lower centers of the first rotating part 110 to the boundary between the first rotating part 110 and the third lower rotating part 320 can be effectively stored in the first main groove 112 and discharged to the outside.

[0048] Of course, if Figures 1 to 3 as well as Figures 5 to 7 As shown in FIG. 1 , the end 112a of the first main groove 112 in the direction of the third upper rotating portion 310 can be located at the boundary between the first rotating portion 110 and the third upper rotating portion 310. In addition, as required, as shown in FIG. 1 which is a perspective view schematically showing a chamfering wheel according to another embodiment of the present invention, Figure 8 As shown, the end 112a of the first main groove 112 formed on the outer side of the first rotating part 110 in the direction of the third upper rotating part 310 and the end 112b in the direction of the third lower rotating part 320 may not reach the boundary between the first rotating part 110 and the third upper rotating part 310 or the boundary between the first rotating part 110 and the third lower rotating part 320, but are located inside the first rotating part 110.

[0049] Fig. 9 FIG. 2 is a perspective view schematically showing a chamfering wheel CW according to another embodiment of the present invention. Fig. 9 As shown, the chamfering wheel CW according to this embodiment may also have a first additional groove 312 extending in the up-down direction on the outer side surface of the third upper rotating part 310 and a second additional groove 322 extending in the up-down direction on the outer side surface of the third lower rotating part 320. Of course, it is also possible to have only one of the first additional groove 312 and the second additional groove 322.

[0050] As referenced above Figure 2 and Figure 3 As described above, the processed surface of the chamfered object not only contacts the outer side surface of the first rotating part 110 of the chamfering wheel CW, but also contacts and processes the outer side surface of the third upper rotating part 310 and the outer side surface of the third lower rotating part 320. Therefore, part of the foreign matter or mud generated during the chamfering process is located between the outer side surface of the third upper rotating part 310 and the chamfered object and / or between the outer side surface of the third lower rotating part 320 and the chamfered object without being discharged to the outside, thereby causing a defect. Therefore, in order to prevent the occurrence of the above-mentioned defect, the chamfering wheel CW can have the first additional groove 312 and / or the second additional groove 322 as described above.

[0051] With reference above Figures 1 to 3 as well as Figures 5 to 8 Similar to the description of the shape of the first main groove 112, the shapes of the first additional groove 312 and / or the second additional groove 322 can be modified in many ways. Fig. 9 As shown, such a first additional groove 312 and / or a second additional groove 322 can be connected to the first main groove 112 as needed. That is, the end 312b of the first additional groove 312 in the direction of the first rotation portion 110 can be consistent with the end 112a of the first main groove 112 in the direction of the third upper rotation portion 310. Of course, the end 322a of the second additional groove 322 in the direction of the first rotation portion 110 can be consistent with the end 112b of the first main groove 112 in the direction of the third lower rotation portion 320.

[0052] For reference, the end 312a of the first additional groove 312 in the direction of the second upper rotating part 210 may be located at the boundary between the third upper rotating part 310 and the second upper rotating part 210. Similarly, the end 322b of the second additional groove 322 in the direction of the second lower rotating part 220 may be located at the boundary between the third lower rotating part 320 and the second lower rotating part 220.

[0053] Fig.10FIG. 2 is a conceptual diagram schematically showing a chamfering wheel CW according to another embodiment of the present invention. Fig.10 As shown, the chamfering wheel CW according to this embodiment is compared with the reference Figure 5 The chamfering wheel CW of the aforementioned embodiment further includes a second additional rotating portion 210 ′, a first additional rotating portion 110 ′, and third additional rotating portions 310 ′ and 320 ′.

[0054] The second additional rotating portion 210' is located at the upper part (in the +z direction) of the second upper rotating portion 210, and the radius from the rotation center axis RA to the outer side surface is the same as the second radius of the second upper rotating portion 210. The first additional rotating portion 110' is located between the second additional rotating portion 210' and the second upper rotating portion 210, and the radius from the rotation center axis RA to the outer side surface is the same as the first radius of the first upper rotating portion 110. In addition, the first additional rotating portion 110' has a second main groove 112' extending in the upward and downward directions on the outer side surface. The shape of the second main groove 112' can be the same as the shape of the first main groove 112. Of course, as described above with respect to the shape of the first main groove 112, the shape of the second main groove 112' can be modified in various ways.

[0055] The third additional rotating part 310', 320' may include a third additional upper rotating part 310' and a third additional lower rotating part 320'. The third additional upper rotating part 310' is located between the second additional rotating part 210' and the first additional rotating part 110', thereby connecting the second additional rotating part 210' to the first additional rotating part 110'. At this time, the radius from the rotation center axis RA of the third additional upper rotating part 310' to the outer side surface increases as it goes from the portion adjacent to the first additional rotating part 110' to the portion adjacent to the second additional rotating part 210'. The third additional lower rotating part 320' is located between the second upper rotating part 210 and the first additional rotating part 110', thereby connecting the second upper rotating part 210 to the first additional rotating part 110'. At this time, the radius from the rotation center axis RA of the third additional lower rotating part 320' to the outer side surface increases as it goes from the portion adjacent to the first additional rotating part 110' to the portion adjacent to the second upper rotating part 210.

[0056] For the chamfering wheel CW according to the present embodiment, the first rotating part 110, the second rotating parts 210, 220, the third rotating parts 310, 320, the first additional rotating part 110', the second additional rotating part 210' and the third additional rotating parts 310', 320' can be as follows: Fig.10 As shown, they are formed as one piece.

[0057] As mentioned above, the chamfering wheel CW rotates around the rotation center axis RA while contacting the processed surface of the chamfering object to process. Therefore, with use, the outer side of the chamfering wheel CW may be damaged. In this case, it is necessary to replace the chamfering wheel CW.

[0058] For the chamfering wheel CW according to this embodiment, if at least one of the first rotating part 110 and the third rotating part 310, 320 is damaged during processing of the chamfered object using the first rotating part 110 and the third rotating parts 310, 320, the chamfered object can be processed using the first additional rotating part 110' and the third additional rotating parts 310', 320'. Therefore, since the entire chamfering wheel CW does not need to be replaced, the efficiency can be significantly improved in the processing operation.

[0059] Fig.10 FIG. 3 shows that the third rotating parts 310 and 320 do not have the first additional groove 312 on the outer side surface (refer to FIG. Fig. 9 ) and / or the second additional groove 322 (reference Fig. 9 ), but the present invention is not limited thereto. That is, the third rotating parts 310 and 320 may have a first additional groove 312 on the outer side (refer to Fig. 9 ) and / or the second additional groove 322 (reference Fig. 9 ). The third additional rotating parts 310 ′ and 320 ′ may also have additional grooves on the outer side surface, and the shapes of the additional grooves may be variously modified as described above for the first additional grooves 312 and / or the second additional grooves 322 .

[0060] Fig.11 FIG. 2 is a conceptual diagram schematically showing a portion of a chamfering device according to an embodiment of the present invention. Fig.11 As shown, the chamfering processing device according to this embodiment has the following features: Fig.10 The chamfering wheel CW and a connecting member such as a crank CR as described above may be provided with a motor MT capable of rotating the chamfering wheel CW. In addition, the chamfering device may have a position adjustment unit (not shown) capable of moving the chamfering wheel CW in the up-down direction relative to the chamfering object (along the z-axis) or on a plane (xy plane) perpendicular to the up-down direction. Such a position adjustment unit may be configured with a generally known xy table and an adjustment unit capable of adjusting the up-down position of the xy table.

[0061] Of course, if Fig.11As shown, the chamfering processing device may include an upper fixture CL1 and a lower fixture CL2 for fixing a chamfering object such as a display panel, wherein the display panel includes a lower substrate SUB1 having a display portion DU formed on one side and an upper substrate SUB2 connected to the lower substrate SUB1 by a sealing member SU. In this case, a first elastic portion RU1 made of rubber or the like is disposed below the upper fixture CL1, and a second elastic portion RU2 made of rubber or the like is disposed above the lower fixture CL2, so that even if the position of the chamfering object is fixed by the upper fixture CL1 and the lower fixture CL2, the chamfering object can be prevented from being damaged by the upper fixture CL1 and the lower fixture CL2.

[0062] As described above, after the position of the chamfering object is fixed, the chamfering wheel CW is rotated about the rotation center axis RA by the motor MT to change its relative position to the chamfering object while contacting the chamfering object, thereby enabling processing.

[0063] Although Fig.11 The chamfering device has a reference Fig.10 The above-mentioned chamfering wheel CW is described, but the present invention is not limited thereto. That is, it is obvious that the chamfering device can include any one of the chamfering wheels CW according to the above-mentioned various embodiments.

[0064] Although the chamfering wheel CW or the chamfering device having the chamfering wheel CW has been described so far, the present invention is not limited thereto. A display device manufacturing method using the chamfering wheel CW or the chamfering device also belongs to the present invention.

[0065] Fig.12 as well as Fig.13 1 is a perspective view schematically showing a part of the steps of a method for manufacturing a display device according to an embodiment of the present invention as described above. Fig.12 As shown in FIG. 1 , a plurality of display parts DU are formed on the first mother substrate SUB1 ′. Fig.13 As shown, a second mother substrate SUB2' is arranged on the first mother substrate SUB1' to cover the plurality of display parts DU, and the first mother substrate SUB1' and the second mother substrate SUB2' are connected by a sealing member (not shown). Fig.13 The first mother substrate SUB1' and the second mother substrate SUB2' are cut along the periphery of each of the plurality of display parts DU along the cutting line CL shown in FIG. Fig.11 The chamfering apparatus shown or according to its modified example performs chamfering on the side surface of each of a plurality of display panels, thereby manufacturing a plurality of display units.

[0066] As described above, the present invention has been described with reference to the embodiments shown in the accompanying drawings, but these are only exemplary descriptions, and anyone with basic knowledge in the technical field of the present invention will understand that various modifications and equivalent embodiments can be implemented based on the present invention. Therefore, the true technical protection scope of the present invention should be determined based on the technical ideas of the claims.

Claims

1. A chamfering wheel, the chamfering wheel is used to chamfer the side of a display panel, wherein: have: The first rotating portion has a first radius from the rotation center axis to the outer side surface, and when one side of the rotation center axis is called the upper part and the other side of the rotation center axis is called the lower part, the outer side surface has a first main groove extending in the up-down direction; A second rotating portion, located above and below the first rotating portion, having a second radius from the rotation center axis to the outer side surface, the second radius being greater than the first radius; as well as a third rotating portion, located between the second rotating portion and the first rotating portion and connecting the second rotating portion and the first rotating portion, wherein a radius from the rotation center axis to an outer side surface increases as it moves from a portion adjacent to the first rotating portion toward a portion adjacent to the second rotating portion, The second rotating portion located at the upper part of the second rotating portion is called the second upper rotating portion, the second rotating portion located at the lower part is called the second lower rotating portion, the third rotating portion adjacent to the second upper rotating portion of the third rotating portion is called the third upper rotating portion, and the third rotating portion adjacent to the second lower rotating portion is called the third lower rotating portion, the end of the first main groove in the direction of the third upper rotating portion extends to the boundary between the first rotating portion and the third upper rotating portion, and the end of the first main groove in the direction of the third lower rotating portion extends to the boundary between the first rotating portion and the third lower rotating portion, The first main groove extends continuously and uninterruptedly from an end of the first main groove in the direction of the third upper rotation portion to an end of the first main groove in the direction of the third lower rotation portion. And, no additional grooves are formed in the third upper rotating part and the third lower rotating part.

2. The chamfering wheel according to claim 1, wherein: When the second rotating part located at the upper part of the second rotating part is called the second upper rotating part, and the second rotating part located at the lower part is called the second lower rotating part, the straight line connecting the end of the first main groove in the direction of the second upper rotating part and the end of the first main groove in the direction of the second lower rotating part is not parallel to the rotation center axis.

3. The chamfering wheel according to claim 1, wherein: The first main groove rotates at least once along the outer side surface of the first rotating portion around the rotation center axis.

4. The chamfering wheel according to any one of claims 1 to 3, wherein: The first rotating portion, the second rotating portion, and the third rotating portion are formed as one body.

5. The chamfering wheel according to any one of claims 1 to 3, wherein: When the second rotating part located at the upper part of the second rotating part is called the second upper rotating part, and the second rotating part located at the lower part is called the second lower rotating part, the second rotating part further comprises: A second additional rotating portion, located above the second upper rotating portion, and having a radius from the rotation center axis to the outer side surface that is the same as the second radius; A first additional rotating portion, located between the second additional rotating portion and the second upper rotating portion, wherein the radius from the rotation center axis to the outer side surface is the same as the first radius, and the outer side surface has a second main groove extending in the up-down direction; as well as The third additional rotating part is located between the second additional rotating part and the first additional rotating part and between the second upper rotating part and the first additional rotating part to connect the second additional rotating part and the second upper rotating part to the first additional rotating part, and the radius from the rotation center axis to the outer side surface increases as it goes from the part adjacent to the first additional rotating part to the part adjacent to the second additional rotating part or from the part adjacent to the first additional rotating part to the part adjacent to the second upper rotating part.

6. A chamfering device, wherein: have: The chamfering wheel according to any one of claims 1 to 3; a motor capable of rotating the chamfering wheel; as well as The position adjustment unit can move the chamfering wheel in a vertical direction relative to the chamfering object, or move it on a plane perpendicular to the vertical direction.

7. The chamfering processing device according to claim 6, wherein: The first rotating portion, the second rotating portion, and the third rotating portion are formed as one body.

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