A chemical vapor deposition CVD outer tube and its processing technology

Abstract

The invention discloses a chemical vapor deposition (CVD) outer tube and a processing technology thereof, comprising a quartz plate, a butt-jointed outer tube, a top cover, a weight edge, an inner opening, a quartz sheet, and an outer butt joint. The quartz plate and the butt-jointed outer tube are welded into an integrated structure. A top cover is fixed to the front end of the butt-jointed outer tube. The quartz plate is annular and a weight edge is fixed outside the quartz plate. An inner opening is opened on the quartz plate. A quartz sheet is fixed in the quartz plate adjacent to the inner opening. The quartz sheet is overlapped on an inner inclined surface of the quartz plate. The quartz sheet is fixed to the quartz plate by welding.

Description

Technical Field

[0001] The invention relates to the technical field of quartz, in particular to a chemical vapor deposition (CVD) outer tube and a processing technology thereof. Background Art

[0002] The existing chemical vapor deposition outer tube is small in size and simple to process, but has poor durability. Since the original head adopts a round head, it is not conducive to operation. At the same time, the original flange is directly connected, and the usability and outer tube do not meet the existing use requirements. Therefore, the applicant specially designed a new type of chemical vapor deposition CVD outer tube according to the needs. Summary of the invention

[0003] The object of the present invention is to provide a chemical vapor deposition (CVD) outer tube and a processing technology thereof to solve the problems raised in the above background technology.

[0004] The objective of the present invention is achieved through the following technical scheme: a chemical vapor deposition CVD outer tube, comprising a quartz plate, a butt-jointed outer tube, a top cover, a counterweight edge, an inner mouth, a quartz sheet, and an outer butt joint, wherein the quartz plate and the butt-jointed outer tube are welded into an integral structure, and a top cover is fixed to the front end of the butt-jointed outer tube.

[0005] Furthermore, the quartz plate is annular, and a counterweight edge is fixedly provided outside the quartz plate.

[0006] Furthermore, the quartz plate is provided with an inner opening, a quartz sheet is fixed in the quartz plate adjacent to the inner opening, the quartz sheet is overlapped on the inner inclined surface of the quartz plate, and the quartz sheet is fixed to the quartz plate by welding.

[0007] Furthermore, a through hole is opened on the quartz plate, and the through hole is smaller than the diameter of the inner opening.

[0008] Furthermore, the top cover is arc-shaped, and the arc radius is 300 mm. The top cover and the butt-jointed outer tube are fixed by welding, and an arc transition zone of R35 is fixed at the connection between the top cover and the butt-jointed outer tube.

[0009] Furthermore, the quartz plate is provided with an external interface, and a slope angle is formed on the external interface, and the slope angle forms an angle of 40 degrees with the horizontal direction.

[0010] Furthermore, the inner inclined surface of the quartz plate is wide-mouthed, and the inclined surface forms an angle of 40 degrees with the horizontal direction.

[0011] A processing technology for a chemical vapor deposition CVD outer tube, the processing technology is as follows:

[0012] 1) Turn the quartz plate according to the accessory drawing;

[0013] 2) After being pickled twice, the first time it was soaked in 2% nitric acid and then cleaned with pure water; the second time it was soaked in 2% hydrofluoric acid and then cleaned with pure water;

[0014] 3) After the overall fire blasting of step 2, fully annealing is carried out at a constant temperature for 2 hours;

[0015] 4) The quartz plate annealed in step 3 is pickled in a pickling machine, soaked in 2% hydrofluoric acid, cleaned with pure water, and set aside;

[0016] 5) Use a lamp lathe to connect the quartz plate with the outer tube and top cover;

[0017] 6) Finely grind the quartz plate and the top cover interface; soak in 2% nitric acid and clean with pure water; soak in 2% hydrofluoric acid and clean with pure water;

[0018] 7) Overall fire polishing, full annealing, constant temperature for 2 hours;

[0019] 8) After overall inspection, use a pickling machine to soak in 2% hydrofluoric acid and then clean with pure water;

[0020] 9) Soak in 2% nitric acid, treat with 2% hydrofluoric acid, clean with pure water, package cleanly, and store.

[0021] Compared with the prior art, the beneficial effects of the present invention are as follows: the invention expands the main body of the outer tube, which is connected to the main tube. The invention adopts the German Arnold tube expander and independently develops the tube expansion process to operate. The independently developed tube expansion process makes the main tube expand from Φ200*9*3500 to Φ450*6*1300, and overcomes the problems of large wall thickness of the main tube, long tube expansion time, and easy crystallization and particles in the processing. The head is improved to the current flat bottom and patch method. The original head cannot meet the appearance requirements, and the wall is thick. The operator cannot make the arc top thickness meet the requirements of the drawing. The round plate V-bend method is used to connect with the tube body to ensure that the top plate arc is flat and smooth, which is synchronized with the international advanced level. The quartz plate and the outer tube are connected by the flange wrapping method. The large flange of the tube body is wrapped with the flange process to improve the process method of connecting the main tube of the outer tube with the quartz plate. The invention has a large diameter and a thick tube wall, and requires high flatness, high transparency, and a large overall volume. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is an overall schematic diagram of the present invention. DETAILED DESCRIPTION

[0023] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0024] like Figure 1 As shown, a chemical vapor deposition CVD outer tube includes a quartz plate 1, a docking outer tube 2, a top cover 3, a counterweight edge 4, an inner port 5, a quartz sheet 6, and an outer docking port 7. The quartz plate 1 and the docking outer tube 2 are welded into an integral structure, and the top cover 3 is fixed to the front end of the docking outer tube 2.

[0025] In this embodiment, the quartz plate 1 is annular, and a counterweight edge 4 is fixedly provided outside the quartz plate 1 .

[0026] In this embodiment, the quartz plate 1 has an inner opening 5 , a quartz plate 6 is fixed in the quartz plate 1 adjacent to the inner opening 5 , the quartz plate 6 overlaps the inner inclined surface of the quartz plate 1 , and the quartz plate 6 is fixed to the quartz plate 1 by welding.

[0027] In this embodiment, a through hole is opened on the quartz plate 6 , and the through hole is smaller than the diameter of the inner opening 5 .

[0028] In this embodiment, the top cover 3 is arc-shaped with a radius of 300 mm. The top cover 3 is fixed to the butt outer tube 2 by welding, and an arc transition zone of R35 is fixed at the connection between the top cover 3 and the butt outer tube 2.

[0029] In this embodiment, the quartz plate 1 is provided with an outer butt joint 7, and a slope is formed on the outer butt joint 7, and the slope forms an angle of 40 degrees with the horizontal direction.

[0030] In this embodiment, the inner inclined surface of the quartz plate 1 is wide-mouthed, and the inclined surface forms an angle of 40 degrees with the horizontal direction.

[0031] A processing technology for a chemical vapor deposition (CVD) outer tube, characterized in that the processing technology is as follows:

[0032] 1) Turning the quartz plate 1 according to the accessory diagram;

[0033] 2) After being pickled twice, the first time it was soaked in 2% nitric acid and then cleaned with pure water; the second time it was soaked in 2% hydrofluoric acid and then cleaned with pure water;

[0034] 3) After the overall fire blasting of step 2, fully annealing is carried out at a constant temperature for 2 hours;

[0035] 4) The quartz plate 1 after annealing in step 3 is pickled in a pickling machine, soaked in 2% hydrofluoric acid, cleaned with pure water, and set aside;

[0036] 5) Use a lamp lathe to connect the quartz plate with the outer tube 2 and the top cover 3;

[0037] 6) Finely grind the quartz plate and the top cover interface; soak in 2% nitric acid and clean with pure water; soak in 2% hydrofluoric acid and clean with pure water;

[0038] 7) Overall fire polishing, full annealing, constant temperature for 2 hours;

[0039] 8) After overall inspection, use a pickling machine to soak in 2% hydrofluoric acid and then clean with pure water;

[0040] 9) Soak in 2% nitric acid, treat with 2% hydrofluoric acid, clean with pure water, package cleanly, and store.

[0041] The quartz plate and the butt-jointed outer tube of the invention are connected by flange wrapping, and the original interface printing is obviously improved to flange wrapping, that is, a quartz strip is wrapped on the original tube to make the tube body and the flange integrated, reaching a first-class level in terms of appearance and usability.

[0042] This tube is composed of a main tube, a top plate and a flange. The flange surface is a sealing surface, and the flatness is required to be less than 1mm to prevent air leakage. The top cover is an arc shape, so that the gas can diffuse more evenly from top to bottom. This tube is equivalent to a large sealed container. Quartz boats, insulation tubes, inner tubes and other quartz components necessary for the CVD process are installed in it. The gas required for this quartz component is slowly filled into the tube body under pressure through the nozzle, and diffused from top to bottom to every part of the tube body. Under the action of temperature, it is slowly deposited on the surface of the silicon wafer. Since the gases used are mostly toxic and harmful gases, it is necessary to use the sealing surface flange with a silicone O-ring during use to ensure that the interior is within 1×10 -3 The vacuum state is leak-free, completing the CVD process chemical vapor deposition.

[0043] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

[0044] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.

Claims

1. A chemical vapor deposition (CVD) outer tube, characterized in that: It comprises a quartz plate (1), a butt-jointed outer tube (2), a top cover (3), a counterweight edge (4), an inner opening (5), a quartz sheet (6), and an outer butt-jointed opening (7); the quartz plate (1) and the butt-jointed outer tube (2) are welded into an integrated structure; and the top cover (3) is fixed to the front end of the butt-jointed outer tube (2); The top cover (3) is arc-shaped, and the arc radius is 306 mm. The top cover (3) and the butt-jointed outer tube (2) are fixed by welding, and an arc transition zone of R30 is fixed at the connection between the top cover (3) and the butt-jointed outer tube (2); The quartz plate (1) is provided with an external interface (7), and the external interface (7) is provided with a slope angle, and the slope angle forms an angle of 45 degrees with the horizontal direction; The inner inclined surface of the quartz plate (1) is wide-mouthed, and the inclined surface is 45 degrees to the horizontal direction; The specific processing technology is as follows: 1) Turning the quartz plate (1) according to the accessory diagram; 2) After being pickled twice, the first time, it was soaked in 25% to 30% nitric acid for 4 hours at a temperature of 20°C, and then cleaned with pure water; the second time, it was soaked in 5% to 7% hydrofluoric acid for 15 minutes at a temperature of 20°C, and then cleaned with pure water; 3) After the overall fire blasting of step 2, fully annealing is performed at a temperature of 1130-1150° C. for one hour; 4) The quartz plate (1) annealed in step 3 is pickled in a pickling machine, soaked in 5% to 7% hydrofluoric acid for 15 minutes at a temperature of 20° C., and then cleaned with pure water for later use; 5) Butt-jointing the quartz plate with the outer tube (2) and the top cover (3) by means of a lamp lathe; 6) Finely grind the quartz plate and the top cover interface; soak in 25% to 30% nitric acid for 4 hours at 20°C, and then rinse with pure water; soak in 5% to 7% hydrofluoric acid for 15 minutes at 20°C, and then rinse with pure water; 7) Overall fire polishing, full annealing, temperature is 1130 ~ 1150 ℃, constant temperature for one hour; 8) After overall inspection, use a pickling machine to soak in 5% to 7% hydrofluoric acid for 15 minutes at 20°C, and then clean with pure water; 9) Soak in 25% to 30% nitric acid for 15 minutes, treat with 5% to 7% hydrofluoric acid at 20 degrees, clean with pure water, package cleanly, and put into storage.

2. A chemical vapor deposition (CVD) outer tube according to claim 1, characterized in that: The quartz plate (1) is annular, and a counterweight edge (4) is fixedly provided outside the quartz plate (1).

3. The chemical vapor deposition (CVD) outer tube according to claim 1, characterized in that: The quartz plate (1) is provided with an inner opening (5), a quartz plate (6) is fixed in the quartz plate (1) adjacent to the inner opening (5), the quartz plate (6) overlaps the inner inclined surface of the quartz plate (1), and the quartz plate (6) is fixed to the quartz plate (1) by welding.

4. The chemical vapor deposition (CVD) outer tube according to claim 1, characterized in that: The quartz plate (6) is provided with a through hole, and the through hole is smaller than the diameter of the inner opening (5).

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