Offline silver-based Low-e glass and preparation method thereof
By adding Sizrnx and/or Sizralnx to the bottom film of offline silver-based LOW-E glass, the problem of traditional low-radiation glass silver layers is easy to oxidize, and low-cost, wide-range Low-E glass products are achieved.
Patent Information
- Application Number
- CN202011167681.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2020-10-27
- Publication Date
- 2025-01-21
- Estimated Expiration
- 2040-10-27
AI Technical Summary
The silver layer of traditional low-emission glass cannot be used in single pieces due to its soft texture and easy oxidation. It must be made into hollow glass, with many processes, low production efficiency and high production costs.
By adding silicon zirconium materials SiZrNx and/or SiZrAlNx to the underlying film of the offline silver-based Low-e glass, its physical and chemical properties are stabilized to prevent air oxidation and prevent air from entering between the glass substrate and the underlying film, thereby making the offline silver-based Low-e glass -e glass can be used directly as laminated glass.
It realizes that offline silver-based Low-e glass does not need to be made into insulating glass, which expands its scope of application, reduces production costs, and improves product performance and competitiveness.
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Figure CN112194385B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of energy-saving glass, and in particular to an offline silver-based Low-e glass and a preparation method thereof. Background Art
[0002] Glass is widely used in buildings due to its good permeability, lighting, UV protection, and wind and snow protection. With the increasing demand for energy-saving glass materials, ordinary glass can no longer meet the requirements. Low-e glass is a coated glass with a high reflectivity (more than 80%) for far infrared rays with a wavelength range of 4.5 to 25 microns. Low-e glass is also called low-emissivity glass. It has extremely low surface thermal emissivity and extremely high far-infrared reflectivity, which can not only prevent the glass from absorbing heat and heating up and then radiating heat from the film surface, but also directly reflect far-infrared thermal radiation, significantly reducing the transfer of indoor and outdoor heat in summer and winter, and has a very good energy-saving effect.
[0003] In the preparation process of traditional low-emissivity glass, the silver layer serves as a functional layer to reduce the emissivity. However, the characteristics of silver itself determine that the silver layer is soft and not wear-resistant, and the nano-scale silver layer is easily oxidized when exposed to the air. As a result, traditional low-emissivity glass cannot be used in a single piece, but must be made into insulating glass, which has many processes, low production efficiency and high production cost.
[0004] The production process of traditional hollow Low-e glass coating production line is generally white glass cutting, edge grinding, tempering, coating, interlayer, hollowing, and finally the product. With the continuous advocacy and acceptance of the concept of building energy conservation, Low-e glass as a building energy-saving product has become increasingly competitive in the market. How to broaden the scope of use of Low-e glass, simplify the production process of Low-e glass, and reduce the cost of Low-e glass is a development direction for glass deep processing enterprises. Summary of the invention
[0005] The main purpose of the present invention is to provide an offline silver-based Low-e glass, aiming to provide a Low-e glass with a wide application range and low cost that can be used directly after lamination without the need for synthesizing insulating glass.
[0006] To achieve the above objectives, in a first aspect, the present invention provides an offline silver-based Low-e glass, comprising a glass substrate and a film layer disposed on the glass substrate, wherein the film layer comprises:
[0007] A plurality of dielectric layers, the plurality of dielectric layers comprising a first dielectric layer disposed on the glass substrate, the first dielectric layer being SiZrNx and / or SiZrAlNx;
[0008] The functional layer has a first protective layer and a second protective layer disposed on both sides thereof.
[0009] Optionally, the plurality of dielectric layers further comprises:
[0010] a second dielectric layer, wherein the second dielectric layer is disposed on the first dielectric layer, and the first protective layer is disposed on the second dielectric layer;
[0011] A third dielectric layer is disposed on the second protective layer.
[0012] Optionally, the second dielectric layer and the third dielectric layer are SiNx.
[0013] Optionally, the film layer further comprises:
[0014] A dielectric protection layer, wherein the dielectric protection layer is disposed on the third dielectric layer, and the dielectric protection layer is ZrOx.
[0015] Optionally, the first dielectric layer has a thickness of 10-15 nm.
[0016] Furthermore, the film layer has a thickness of 136-168 nm.
[0017] In a second aspect, the present invention further proposes a laminated glass comprising: tempered glass and an offline silver-based Low-e glass as described in the first aspect, and a PVB film for bonding the film layers of the tempered glass and the offline silver-based Low-e glass.
[0018] In a third aspect, the present invention further provides a method for preparing an off-line silver-based Low-e glass, comprising:
[0019] S1. providing a glass substrate;
[0020] S2. Forming a film layer on the glass substrate by magnetron sputtering, wherein the film layer includes a plurality of dielectric layers, wherein the plurality of dielectric layers include a first dielectric layer formed on the glass substrate, and the first dielectric layer is SiZrNx or SiZrAlNx;
[0021] S3. Form a functional layer by magnetron sputtering, and form a first protective layer and a second protective layer on both sides of the functional layer respectively.
[0022] Optionally, before forming the functional layer by magnetron sputtering, the method further comprises:
[0023] A second dielectric layer is formed by coating on the first dielectric layer, and the first protective layer is formed by coating on the second dielectric layer.
[0024] Optionally, after forming the second protective layer, the method further includes:
[0025] A third dielectric layer is formed by coating on the second protective layer, and a dielectric protective layer is formed by coating on the third dielectric layer.
[0026] In a fourth aspect, the present invention further provides a method for preparing laminated glass, comprising:
[0027] S1', preparing offline silver-based Low-e glass according to the method for preparing offline silver-based Low-e glass according to the third aspect;
[0028] S2', bonding the offline silver-based Low-e glass and the tempered glass in a laminated glass lamination room by means of PVB film to form the laminated glass.
[0029] The technical solution of the present invention adds silicon zirconium materials SiZrNx and / or SiZrAlNx to the bottom film of the offline silver-based Low-e glass, utilizes the stable physical and chemical properties of SiZrNx and / or SiZrAlNx to prevent air oxidation, and prevents air from entering between the glass substrate and the bottom film to cause oxidation of the product edge. After the offline silver-based Low-e glass is made into laminated glass, the outermost film and PVB film of the offline silver-based Low-e glass will not be separated due to oxidation of the product edge, thereby improving the performance of the laminated glass, making it unnecessary for the offline silver-based Low-e glass to be made into insulating glass, thereby expanding its scope of application and improving its competitiveness. BRIEF DESCRIPTION OF THE DRAWINGS
[0030] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.
[0031] Figure 1 This is a schematic diagram of the structure of an offline silver-based Low-e glass of the present invention;
[0032] Figure 2 This is a schematic diagram of the structure of a laminated glass according to the present invention;
[0033] Figure 3 It is a schematic flow chart of an offline silver-based Low-e glass preparation method of the present invention;
[0034] Figure 4 The figure is a schematic diagram of a process for preparing laminated glass according to the present invention.
[0035] Description of Figure Numbers:
[0036]
[0037]
[0038] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION
[0039] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0040] The present invention provides an off-line silver-based Low-e glass, which can be directly made into laminated glass for use without being made into insulating glass, and has a wide range of applications.
[0041] Reference Figures 1 to 4 , Figure 1 This is a schematic diagram of the structure of an offline silver-based Low-e glass of the present invention; Figure 2 This is a schematic diagram of the structure of a laminated glass according to the present invention; Figure 3 It is a schematic flow chart of an offline silver-based Low-e glass preparation method of the present invention; Figure 4 The figure is a schematic diagram of a process for preparing laminated glass according to the present invention.
[0042] Reference Figure 1 In a first aspect, the present invention provides an offline silver-based Low-e glass 100, comprising a glass substrate 1 and a film layer arranged on the glass substrate 1, wherein the film layer comprises: a plurality of dielectric layers 10, wherein the plurality of dielectric layers 10 comprises a first dielectric layer 10a arranged on the glass substrate 1, wherein the first dielectric layer 10a is SiZrNx and / or SiZrAlNx; a functional layer 20, wherein a first protective layer 30a and a second protective layer 30b are respectively arranged on both sides of the functional layer 20.
[0043] Specifically, the glass substrate 1 serves as a substrate and plays a supporting role. The film layer is a laminated structure arranged on the glass substrate 1, and the film layer plays a role in blocking infrared radiation. In the embodiment of the present invention, the film of the laminated structure is formed layer by layer on the glass substrate 1 by sputtering coating. Sputtering coating is a new type of physical vapor coating method, which is to use an electron gun system to emit and focus electrons on the material to be plated, so that the sputtered atoms follow the momentum conversion principle and fly to the substrate with higher kinetic energy to form a film.
[0044] Specifically, the functional layer 20 determines the emissivity of the offline silver-based Low-e glass 100. The offline silver-based Low-e glass 100 has an extremely low surface thermal emissivity and an extremely high far-infrared reflectivity, so that it can not only prevent the glass from absorbing heat and heating up and then radiating heat from the film surface, but also directly reflect far-infrared thermal radiation to achieve energy saving. The functional layer 20 can be a film layer formed of silver, nano-copper or fine-crystalline silver material, preferably silver. More preferably, the thickness of the functional layer 20 is 5 to 8 nm. The first protective layer 30a and the second protective layer 30b located on both sides of the functional layer 20 respectively play a role in protecting the functional layer 20 and preventing it from oxidation.
[0045] Specifically, the multiple dielectric layers 10 play a role in adjusting the color of the glass, so that the offline silver-based Low-e glass 100 has a wide range of color choices. On the other hand, the multiple dielectric layers 10 also have a protective effect on the functional layer 20.
[0046] Traditional offline silver-based Low-e glass has good alkali resistance but poor acid resistance and is easily oxidized by air, so it needs to be made into insulating glass or laminated glass. However, although the interlayer film of laminated glass can block air, the acidic ions in the air will still enter between the bottom film and the glass through the glass substrate 1, causing oxidation of the product edge. After the product is oxidized, the outermost film will separate from the film, which limits the use of laminated glass, and it usually needs to be made into insulating glass.
[0047] The technical solution of the present invention adds silicon zirconium materials SiZrNx and / or SiZrAlNx to the bottom film of the offline silver-based Low-e glass 100, i.e., the first dielectric layer 10a, and utilizes the stable physical and chemical properties of SiZrNx and / or SiZrAlNx to prevent air oxidation, and prevent air from entering between the glass substrate 1 and the first dielectric layer 10a, resulting in oxidation of the product edge. After the offline silver-based Low-e glass is made into laminated glass, the outermost film of the offline silver-based Low-e glass and the PVB film will not be separated due to oxidation of the product edge, thereby improving the performance of the laminated glass, making it unnecessary for the offline silver-based Low-e glass to be made into insulating glass, thereby expanding its scope of application and improving its competitiveness.
[0048] Optionally, please continue to refer to Figure 1 The plurality of dielectric layers 10 further include: a second dielectric layer 10b, the second dielectric layer 10b is disposed on the first dielectric layer 10a, the first protective layer 30a is disposed on the second dielectric layer 10b; and a third dielectric layer 10c, the third dielectric layer 10c is disposed on the second protective layer 30b. The thickness of the dielectric layer 10 determines the color of the glass. By providing a plurality of dielectric layers 10, the color of the glass can be better adjusted.
[0049] Optionally, the second dielectric layer 10b and the third dielectric layer 10c are SiNx or SiAlNx. The thickness of the second dielectric layer 10b is 50-60 nm, and the thickness of the third dielectric layer 10c is 65-75 nm.
[0050] Optionally, please continue to refer to Figure 1 The film layer further includes: a dielectric protection layer 40, which is disposed on the third dielectric layer 10c and is ZrOx. ZrOx can improve the wear resistance and oxidation resistance of the product and the bonding property with the film after the laminated glass is synthesized.
[0051] Specifically, the thickness of the dielectric protection layer 40 is 2-4 nm.
[0052] Optionally, the first dielectric layer 10a has a thickness of 10-15 nm.
[0053] Optionally, the first protective layer 30a and the second protective layer 30b are formed by coating any one or more materials of NiCr, NiCrOx, and NiCrNx, preferably NiCr. Specifically, the thickness of the first protective layer 30a is 2-2.5 nm, and the thickness of the second protective layer 30b is 2.5-3 nm.
[0054] Furthermore, the film layer has a thickness of 136-168 nm.
[0055] The second aspect of the present invention further provides a laminated glass, please refer to Figure 2 , comprising: a tempered glass 200 and the offline silver-based Low-e glass 100 described in the first aspect, and a PVB film 300 for bonding the film layers of the tempered glass 200 and the offline silver-based Low-e glass 100. Since the laminated glass adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought by the technical solutions of the above embodiments, which will not be described one by one here.
[0056] Third, please refer to Figure 3 The present invention also provides a method for preparing an off-line silver-based Low-e glass, comprising:
[0057] S1. Provide a glass substrate.
[0058] The glass substrate 1 serves as a substrate and plays a supporting role.
[0059] S2. Forming a film layer on the glass substrate by magnetron sputtering, wherein the film layer includes a plurality of dielectric layers, wherein the plurality of dielectric layers include a first dielectric layer formed on the glass substrate, and the first dielectric layer is SiZrNx or SiZrAlNx.
[0060] Specifically, the film layer is a laminated structure disposed on the glass substrate 1, and the film layer plays a role in blocking infrared radiation. In the embodiment of the present invention, the film of the laminated structure is formed layer by layer on the glass substrate 1 by sputtering coating. Sputtering coating is a new type of physical vapor coating method, which is to use an electron gun system to emit and focus electrons on the material to be plated, so that the sputtered atoms follow the momentum conversion principle and fly to the substrate with higher kinetic energy to form a film.
[0061] Specifically, the multiple dielectric layers 10 play a role in adjusting the color of the glass, so that the offline silver-based Low-e glass 100 has a wide range of color choices. On the other hand, the multiple dielectric layers 10 also have a protective effect on the functional layer 20.
[0062] By adding silicon zirconium materials SiZrNx and / or SiZrAlNx to the bottom film, i.e., the first dielectric layer, of the offline silver-based Low-e glass, and utilizing the stable physical and chemical properties of SiZrNx and / or SiZrAlNx, air oxidation can be prevented, and air can be prevented from entering between the glass substrate and the first dielectric layer to cause oxidation of the product edge. This prevents the outermost film of the offline silver-based Low-e glass from being separated from the PVB film due to oxidation of the product edge after it is made into laminated glass, thereby improving the performance of the laminated glass, eliminating the need for the offline silver-based Low-e glass to be made into insulating glass, thereby expanding its scope of application and improving its competitiveness.
[0063] S3. Form a functional layer by magnetron sputtering, and form a first protective layer and a second protective layer on both sides of the functional layer respectively.
[0064] Specifically, the functional layer 20 determines the emissivity of the offline silver-based Low-e glass 100. The offline silver-based Low-e glass 100 has an extremely low surface thermal emissivity and an extremely high far-infrared reflectivity, so that it can not only prevent the glass from absorbing heat and heating up and then radiating heat from the film surface, but also directly reflect far-infrared thermal radiation to achieve energy saving. The functional layer 20 can be a film layer formed by silver, nano-copper or fine-crystalline silver material, preferably silver. The first protective layer 30a and the second protective layer 30b located on both sides of the functional layer 20 respectively play a role in protecting the functional layer 20 to prevent it from oxidation.
[0065] Optionally, before forming the functional layer by magnetron sputtering, the method further comprises:
[0066] A second dielectric layer is formed by coating on the first dielectric layer, and the first protective layer is formed by coating on the second dielectric layer.
[0067] Optionally, after forming the second protective layer, the method further includes:
[0068] A third dielectric layer is formed by coating on the second protective layer, and a dielectric protective layer is formed by coating on the third dielectric layer.
[0069] Fourth, please refer to Figure 4 The present invention also provides a method for preparing laminated glass, comprising:
[0070] S1', preparing offline silver-based Low-e glass according to the method for preparing offline silver-based Low-e glass according to the third aspect;
[0071] S2', bonding the offline silver-based Low-e glass and the tempered glass in a laminated glass lamination room by means of PVB film to form the laminated glass.
[0072] The embodiments of the present invention will be described in detail below in conjunction with specific examples, but it will be appreciated by those skilled in the art that the following examples are only used to illustrate the present invention and should not be considered to limit the scope of the present invention. If specific conditions are not specified in the examples, they are carried out according to normal conditions or conditions recommended by the manufacturer. If the manufacturer is not specified for the reagents or instruments used, they are all conventional products that can be purchased commercially.
[0073] Example 1
[0074] 1. Preparation of offline silver-based Low-e glass
[0075] The various film layers are formed by magnetron sputtering coating on a glass substrate:
[0076] A. Magnetron sputtering to form the first dielectric layer:
[0077] Target quantity: 1 to 2 AC rotating targets; target configuration is silicon zirconium (SiZr): process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.2, and the sputtering pressure is 3 to 8×10 -3 mbar; the first dielectric layer is SiZrNx, and the coating thickness is 10nm.
[0078] B. Magnetron sputtering to form the second dielectric layer:
[0079] Target quantity: 6 to 8 AC rotating targets, with silicon aluminum (SiAl) as the target material; process gas ratio: argon and nitrogen, argon and oxygen ratio is 1:1.3, sputtering pressure is 3 to 8×10 -3 mbar; the second dielectric layer is SiAlNx, and the coating thickness is 51nm.
[0080] C. Magnetron sputtering to form the first protective layer:
[0081] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas ratio: pure argon, sputtering pressure is 3~5×10-3 mbar; the first protective layer is NiCr, and the coating thickness is 2.4nm.
[0082] D. Magnetron sputtering to form functional layer:
[0083] Target quantity: 1 DC plane target; target configuration is silver (Ag); process gas: pure argon, sputtering pressure is 3~5×10 -3 mbar; coating thickness is 6nm.
[0084] E. Magnetron sputtering to form the second protective layer:
[0085] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas: pure argon, sputtering pressure is 3~5×10 -3 mbar; coating thickness is 2.5nm.
[0086] F. Magnetron sputtering to form the third dielectric layer:
[0087] Target quantity: 8 to 10 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.3, and the sputtering pressure is 3 to 8×10 -3 mbar; the third dielectric layer is SiAlNx, and the coating thickness is 65nm.
[0088] G. Magnetron sputtering to form dielectric protection layer:
[0089] Target quantity: 1 AC rotating target; target configuration is zirconium (Zr); process gas ratio: argon and oxygen, sputtering pressure is 3~8×10 -3 mbar; the dielectric protective layer is ZrOx, and the coating thickness is 2.5nm.
[0090] The total thickness of the film layer of the off-line silver-based Low-e glass obtained in Example 1 is 139.4 nm.
[0091] 2. Preparation of laminated glass
[0092] The offline silver-based Low-e glass 6mm obtained in step 1 and the tempered glass 6mm are laminated in the interlayer laminating room through PVB film to obtain the laminated glass of Example 1. The laminating room is a dust-free and closed space, the temperature is controlled at 20℃±5℃, and the relative humidity is controlled at 20% to 40%; the pre-pressing machine adopts upper and lower infrared heating, the temperature range of zone 1 is 150℃~80℃, the temperature range of zone 2 is 200℃~220℃, the temperature range of zone 3 is 220℃~240℃, the transmission speed is 0.5m-1.5m / min, the autoclave is heated by a heating tube, the medium is air compressed gas, the equilibrium heat is 135±5℃, the equilibrium pressure is 12±0.5㎏, and the equilibrium time is 35-45min.
[0093] In addition, according to the data shown in Table 1, offline silver-based Low-e glass and laminated glass of Example 2, Example 3 and Example 4, and Comparative Examples 1 to 3 were prepared respectively. The preparation methods refer to those described in Example 1 and are not described again here.
[0094] Table 1 Film composition and thickness of each embodiment and comparative example
[0095]
[0096] Performance Testing
[0097] The off-line silver-based Low-e glasses of Examples 1 to 4 and Comparative Examples 1 to 3 prepared as above were tested for performance indicators such as glass surface reflection color, transmission color, wear resistance, corrosion resistance, and appearance. Among them, wear resistance refers to the number of revolutions of the product in the grinding machine that affects the change in the product's transmission color by more than 4%, corrosion resistance refers to the acid and alkali resistance of the film layer of products with different structures, and appearance refers to its oxidation condition. The results are shown in Table 2.
[0098] Table 2 Performance parameters of offline silver-based Low-e glass in various embodiments and comparative examples
[0099]
[0100] Since SiZrNx is added to the bottom film, the off-line silver-based Low-e glass of Examples 1 to 4 has better corrosion resistance than Comparative Examples 1 to 3 without adding SiZrNx, and the product is more resistant to oxidation. Since ZrOx is added to the top film, the off-line silver-based Low-e glass of Examples 1 to 4 and Comparative Examples 1 and 2 has better wear resistance than Comparative Example 3 without adding ZrOx, and the thickness of ZrOx is also related to the wear resistance.
[0101] The laminated glasses of Examples 1 to 4 and Comparative Examples 1 to 3 prepared above were tested for glass surface reflection color, transmission color, wear resistance and corrosion resistance, and the results are shown in Table 3. As can be seen from Table 3, the performance of the off-line silver-based Low-e glass used to make laminated glass has a great influence on the performance of the laminated glass, and the laminated glass made of the off-line silver-based Low-e glass with SiZrNx added to the bottom film will not have edge oxidation and film separation problems when exposed outdoors for a long time.
[0102] Table 3 Performance parameters of laminated glass in various embodiments and comparative examples
[0103]
[0104] The above descriptions are only optional embodiments of the present invention, and are not intended to limit the patent scope of the present invention. All equivalent structural changes made using the contents of the present invention's specification and drawings, or directly / indirectly applied in other related technical fields, are included in the patent protection scope of the present invention.
Claims
1. An offline silver-based Low-e glass, characterized in that: The invention comprises a glass substrate and a film layer arranged on the glass substrate, wherein the film layer comprises: A plurality of dielectric layers, wherein the plurality of dielectric layers comprises a first dielectric layer disposed on the glass substrate, wherein the first dielectric layer is SiZrNx and / or SiZrAlNx, and the thickness of the first dielectric layer is 10-15 nm; A functional layer, wherein a first protective layer and a second protective layer are respectively disposed on both sides of the functional layer; The plurality of dielectric layers further include a second dielectric layer and a third dielectric layer, the second dielectric layer is disposed on the first dielectric layer, the first protection layer is disposed on the second dielectric layer, and the third dielectric layer is disposed on the second protection layer.
2. The off-line silver-based Low-e glass according to claim 1, characterized in that: The second dielectric layer and the third dielectric layer are SiNx.
3. The off-line silver-based Low-e glass according to claim 1, characterized in that: The film layer also includes: A dielectric protection layer, wherein the dielectric protection layer is disposed on the third dielectric layer, and the dielectric protection layer is ZrOx.
4. The off-line silver-based Low-e glass according to any one of claims 1 to 3, characterized in that: The film layer thickness is 136-168 nm.
5. A laminated glass, characterized in that: include: Tempered glass and an offline silver-based Low-e glass as claimed in any one of claims 1 to 4, and a PVB film for bonding the film layers of the tempered glass and the offline silver-based Low-e glass.
6. A method for preparing off-line silver-based Low-e glass, characterized in that: The preparation method is used to prepare an offline silver-based Low-e glass according to any one of claims 1 to 4, and the preparation method comprises: S1. providing a glass substrate; S2. Forming a film layer on the glass substrate by magnetron sputtering, wherein the film layer includes a plurality of dielectric layers, wherein the plurality of dielectric layers include a first dielectric layer formed on the glass substrate, and the first dielectric layer is SiZrNx or SiZrAlNx; S3. Form a functional layer by magnetron sputtering, and form a first protective layer and a second protective layer on both sides of the functional layer respectively.
7. The method for preparing an off-line silver-based Low-e glass according to claim 6, characterized in that: Before magnetron sputtering forms the functional layer, it also includes: A second dielectric layer is formed by coating on the first dielectric layer, and the first protective layer is formed by coating on the second dielectric layer.
8. The method for preparing an off-line silver-based Low-e glass according to claim 7, characterized in that: After forming the second protective layer, the method further comprises: A third dielectric layer is formed by coating on the second protective layer, and a dielectric protective layer is formed by coating on the third dielectric layer.
9. A method for preparing laminated glass, characterized in that: include: S1', preparing offline silver-based Low-e glass according to the preparation method according to any one of claims 6 to 8; S2', bonding the offline silver-based Low-e glass and the tempered glass in a laminated glass lamination room by means of PVB film to form the laminated glass.
Citation Information
Patent Citations
Off-line silver-based Low-e glass and laminated glass
CN214457644U