Method for producing organic compound

Abstract

A method for producing an organic compound is provided, characterized in that a fluid treatment device (F) used in the above-mentioned production method comprises: an upstream side treatment section for treating a treated fluid between at least two treatment surfaces (1) and (2) rotating relatively to each other, and a downstream side treatment section arranged on the downstream side of the upstream side treatment section and provided with a plurality of labyrinth seals for retaining and stirring the treated fluid treated in the upstream side treatment section, wherein the upstream side treatment of the treated fluid is performed by passing the above-mentioned treated fluid containing at least one organic compound through the upstream side treatment section, and the downstream side treatment of the treated fluid treated on the upstream side is performed by passing the treated fluid treated on the upstream side through the downstream side treatment section, and the upstream side treatment and the downstream side treatment are performed continuously.

Description

Technical Field

[0001] The present invention relates to an improvement in a method for producing an organic compound using a fluid treatment device that uses a processing space defined by at least two processing surfaces at least one of which rotates relative to the other. In addition, it relates to a method for producing an organic compound using a continuous stirring device. More specifically, it relates to a method for producing an organic compound using a continuous reaction device that is effective and useful in the fields of chemistry, biochemistry, agriculture, food, medicine, and cosmetics, especially in chemical reactions and chemical synthesis using organic compounds. Background Art

[0002] Generally, the reaction treatment for making two or more substances or one substance itself react chemically to obtain a new substance is roughly divided into intermittent and continuous. In the intermittent reaction treatment, a solvent, a substrate, a reactant, etc. are placed in a container represented by a flask in the laboratory, and a stirrer or the like is used to stir and react. Both intermittent and continuous methods have been put into practical use in industry, and of course, their reaction fields have volumes. The volume in the reaction container affects the non-uniformity of the reaction conditions in the reaction field. For example, when a reactant is added to a uniform substrate solution to carry out a chemical reaction, it takes a certain amount of time until the concentration of the reactant becomes uniform. The same thing is considered for the temperature in the reaction conditions. That is, when the reaction container is heated and cooled from the outside or even the inside, it is believed that it takes a certain amount of time until the entire reaction container reaches a certain temperature, and then it is extremely difficult to make the entire reaction field in the container completely become a certain temperature. In addition, in the case of an intermittent reaction container, when a reactant is put into the solvent and substrate in the container, different reaction conditions are already at the beginning and end of the input of the reactant. The non-uniformity of the reaction conditions in the reaction field caused by the above-mentioned main reasons has an impact on the reaction product. That is, since various reaction conditions are generated in one container, the target reaction cannot be carried out ideally. For example, it can be cited that the main reaction and the side reaction cannot be completely selected, the by-products accompanying it are generated, and the molecular weight distribution of the product obtained in the case of polymerization reaction is difficult to become uniform. If the product attached to the wall of the container is also included, the yield from the reactant to the product is naturally reduced. In order to solve these problems in the reaction field, usually, a stirring device such as a stirrer and a turbine is provided in the reaction container. By using a stirring device, the mixing speed of the mixed reaction fluid in the container is increased, thereby ensuring the uniformity of the reaction field and responding to the reaction speed. However, every time the viscosity of the mixed reaction fluid that becomes the object rises, the problem of non-uniformity in the above-mentioned reaction field emerges again. However, since the goal is instantaneous mixing, naturally, the power required for stirring is increasing. In addition, due to the large temperature gradient, when heating in a short time, there are also problems such as the need for more than necessary heat energy.

[0003] Furthermore, although the above-mentioned reaction treatment is frequently used in the chemical industry, it is accompanied by safety problems and dangers. In most cases, a relatively large amount of highly toxic chemical substances are used, which are quite dangerous to humans and the environment. Since the solvent is an environmental pollutant in various aspects, it is particularly problematic. In addition, for example, in the case of Fridel-Crafts acylation, there is a risk of strong exothermicity of the reaction, and in the case of nitration, there is not only an exothermic reaction but also a risk of a large explosion. Furthermore, these dangers appear at the same time when the scale is expanded towards actual production.

[0004] In order to solve the above problems, a micro mixer and a micro reactor as shown in Patent Documents 1 and 2 are proposed as micro reactors and micro flow path reactors, and the advantages of being able to perform synthesis of a small amount, high efficiency of temperature control, high efficiency of interface reaction, efficient mixing, etc. are advocated. However, when using a general micro reactor, although the micro device and system have many advantages, in fact, the narrower the diameter of the micro flow path, the more pressure loss there is, which is inversely proportional to the fourth power of the flow path, that is, it is actually necessary to obtain a large liquid delivery pressure to the extent that it is difficult to obtain a pump to deliver the fluid. In addition, in the case of a reaction accompanied by precipitation, the product is blocked in the flow path, and the micro flow path is closed by bubbles generated by the reaction. Furthermore, the reaction is basically expected to be at the diffusion rate of the molecule. Therefore, for all reactions, the micro flow path is not effective and adaptable. In reality, it is necessary to try the reaction in a trial and error manner and select the successful reaction, etc., which also has many problems. Therefore, as in Patent Document 1, sometimes the problem of deposits generated in the microreactor is avoided by ultrasonic treatment, but there is a high possibility that the irregular turbulence and cavitation in the flow path generated by ultrasound will not always work in a favorable manner for the target reaction. Furthermore, for scale expansion, the number of microreactors themselves can also be increased, that is, the number can be increased, but in fact, the limit of the number that can be stacked is tens, so it is easy to focus on products with high product value. In addition, increasing the number of devices means that the absolute number of failure causes also increases. In the case of problems such as blockage, it may become very difficult to detect the failure site and other problem sites.

[0005] In order to solve these problems, the applicant of the present application has proposed a method for producing an organic compound as shown in Patent Document 3. Patent Document 3 is a method for producing an organic compound, characterized in that, in a thin film fluid formed between processing surfaces that are arranged relative to each other so as to be approachable and separable, and at least one of which rotates relative to the other, for example, a fluid containing at least one organic compound and a fluid containing at least one reactant are merged, and various organic reactions are carried out in the thin film fluid. Since the organic reaction is carried out in the thin film fluid, the uniformity of the reaction can be ensured, and the scale can also be expanded.

[0006] However, even when the method for producing an organic compound disclosed in Patent Document 3 is used, it is actually necessary to try the reaction by trial and error and select a successful reaction, as described above, and the same problem is seen.

[0007] As the first of its problems, the guarantee of reaction time can be enumerated.Due to making each fluid merge in the thin film fluid between the processing faces, the diffusion efficiency is unprecedentedly high, and the result can be achieved by mixing completely, but particularly under the situation of organic reaction, sometimes want to extend the absolute reaction time.For the shortening of the reaction time, extremely improve the reaction temperature or increase the catalyst amount and so on. The drawbacks such as the increase of by-products, the danger are also remarkable.In addition, if the processing face is extremely large-scaled, although the guarantee of reaction time becomes possible, the problem of large cost, setting area etc. is unrealistic.

[0008] Patent document 4, which is the subject of the present application, discloses that: in a thin film fluid formed between processing surfaces that are arranged relative to each other in an approachable and detachable manner and at least one of which rotates relative to the other, each fluid is merged, a container is provided for collecting the effluent that is discharged from the processing surfaces after the particles are precipitated in the thin film fluid, a tubular container is connected to the lower end of the container, and the nuclei and crystallites of the particles contained in the effluent are grown in the tubular container. However, this proposal is useful in the case of growing crystal nuclei and crystallites. For example, in organic synthesis, in order to meet the retention time of the effluent in the tubular container, a relatively large tubular container is required. It is difficult to meet the conditions for obtaining the target reactant by simply allowing the effluent to flow to the tubular container, and the problem of clogging of the tubular container also occurs. In addition, in most cases, a stirrer and a liquid delivery system are separately required.

[0009] Patent document 5, to which the applicant of the present application is concerned, discloses a fluid treatment device, which is configured as follows: for a microreactor using an annular flow path defined between relatively rotating processing surfaces, a cylindrical stirring space is provided on the radial inner side of the annular flow path, and stirring blades and a wire mesh are arranged in the stirring space, stirring energy is applied to the processed fluid immediately before being introduced into the annular flow path by the stirring blades, and a shear force is applied between the stirring blades and the wire mesh. Patent document 5 achieves a homogeneous reaction in the annular flow path by improving the homogeneity of the processed fluid introduced into the annular flow path, and there is no specific record of further processing of the fluid discharged from the annular flow path.

[0010] Patent Document 6 discloses a mixer for mixing one or more fluids, in which a volume body is arranged on the downstream side of a static microreactor. The volume body has a labyrinth wall inside to form a labyrinth-shaped flow path, and the labyrinth-shaped flow path is provided to generate turbulence in the passing fluid and promote mixing.

[0011] In addition, Patent Document 7 discloses a Taylor reaction device that generates a plurality of Taylor vortices in a gap space formed between an outer cylinder and an inner cylinder rotating inside the outer cylinder, and a labyrinth passage that suppresses the flow between the Taylor vortices is provided in the gap space. The reaction device of Patent Document 7 is based on the generation of Taylor vortices (e.g., paragraph 0017 of Patent Document 7), and the structure of the device should be set to a condition that can generate Taylor vortices. According to Patent Document 8, it is said that if the Taylor number calculated by the following formula (1) is less than 2000, Taylor vortices can be stably obtained. According to Formula (1), there are constraints on the setting interval of the labyrinth seal, the rotation speed of the rotating part (inner cylinder), and the kinematic viscosity of the treated fluid.

[0012] Ta=ω·R·b / ν·(b / R) 1 / 2 Formula (1)

[0013] Where Ta is the Taylor number (dimensionless number), ω is the angular velocity of the rotating part (1 / second), R is the radius of the rotating part (cm), b is the distance between the outer circumference of the inner cylinder and the inner circumference of the outer cylinder (cm), and ν is the kinematic viscosity of the fluid (cm 2 / Second).

[0014] Since most organic solvents have a lower kinematic viscosity than water, there are many restrictions on setting conditions for keeping the Taylor number below 2000, and the device is not suitable for use in organic reactions in reality.

[0015] Taking these viewpoints into consideration, the applicant of the present application has proposed a method for producing an organic compound using a fluid treatment device and a continuous stirring device, which can ensure sufficient reaction time and obtain a target reaction product with high efficiency.

[0016] Prior art literature

[0017] Patent Literature

[0018] Patent Document 1: Japanese Patent Application Publication No. 2005-060281

[0019] Patent Document 2: Japanese Patent Application Publication No. 2007-050340

[0020] Patent Document 3: Japanese Patent No. 5561732

[0021] Patent Document 4: Japanese Patent Application Publication No. 2014-023997

[0022] Patent Document 5: International Publication No. 2018 / 069997 Pamphlet

[0023] Patent Document 6: Japanese Patent Application Publication No. 2006-239638

[0024] Patent Document 7: Japanese Patent Application Publication No. 2016-087485

[0025] Patent Document 8: Japanese Patent Application Laid-Open No. 8-109208 Summary of the invention

[0026] Problems to be solved by the invention

[0027] In view of the above, an object of the present invention is to provide a method for producing an organic compound by which a sufficient reaction time can be ensured even in an organic reaction which requires a relatively long time to complete the reaction, and a target substance can be obtained in a high yield.

[0028] As an example, suppose that raw material A and raw material B are reacted in a chemical reaction process to obtain a target product X. In this case, the first fluid treatment is the mixing of raw materials A and raw material B, and it is desired to mix raw materials A and raw material B more evenly and more quickly. Next, as a second fluid treatment, raw materials A and raw material B are reacted. In order to make this reaction proceed, the reaction conditions for efficiently obtaining product X are adjusted. The so-called reaction conditions refer to the concentrations of raw materials A and raw material B, the temperature conditions of the reaction field, the pressure conditions, the stirring conditions, the presence or absence of a catalyst, its optimization, the reaction time, etc. Therefore, it is necessary to make it possible for a highly efficient, continuous, inexpensive, and simple processing device to efficiently process the above-mentioned treatments (first fluid treatment and second fluid treatment).

[0029] Means for solving problems

[0030] The present invention is a method for producing organic compounds, and the fluid treatment device used in the above production method includes: an upstream side treatment section for treating a treated fluid between at least two relatively rotating treatment surfaces; and a downstream side treatment section configured and provided with a plurality of labyrinth seals on the downstream side of the above upstream side treatment section to retain and stir the above treated fluid treated in the above upstream side treatment section. The method is characterized in that the above treated fluid containing at least one organic compound is passed through the above upstream side treatment section, thereby performing upstream side treatment on the above treated fluid, and the above treated fluid that has undergone the above upstream side treatment is passed through the above downstream side treatment section, thereby performing downstream side treatment on the above treated fluid that has undergone the above upstream side treatment, and the above upstream side treatment and the above downstream side treatment are performed continuously.

[0031] In the present invention, the upstream treatment and the downstream treatment are treatments of organic reactions.

[0032] In the fluid processing device used in the above-mentioned manufacturing method, the above-mentioned downstream side processing section includes a narrow sealed space, and a retention space arranged on the upstream side of the above-mentioned sealed space and wider than the above-mentioned sealed space, the upstream side flow outlet of the above-mentioned processed fluid from the above-mentioned upstream side processing section opens in the above-mentioned retention space, and the above-mentioned downstream side processing section can be implemented by continuously arranging multiple groups of the above-mentioned sealed space and the above-mentioned retention space from the upstream to the downstream of the flow of the above-mentioned processed fluid.

[0033] In addition, in the fluid treatment device used in the above-mentioned manufacturing method, the above-mentioned downstream side processing part includes a cylindrical accommodating part and a cylindrical part accommodated therein, and the method can be implemented by rotating at least one of the above-mentioned cylindrical accommodating part and the above-mentioned cylindrical part so that the above-mentioned cylindrical accommodating part and the above-mentioned cylindrical part rotate relative to each other.

[0034] In addition, the present invention can be implemented by applying shear force to the processed fluid passing through the upstream processing section and / or the downstream processing section by rotating at least one of the at least two processing surfaces and / or rotating at least any one of the cylindrical containing section and the columnar section.

[0035] In addition, the present invention is provided with a temperature regulating mechanism for the purpose of controlling the temperature of the processed fluid passing through the downstream processing section, and can be implemented by heating or cooling the processed fluid passing through the downstream processing section using the temperature regulating mechanism.

[0036] In addition, the present invention can be implemented by providing an inlet in the downstream side processing section for introducing fluid other than the processed fluid from the upstream side processing section, and introducing fluid other than the processed fluid from the upstream side processing section into the processed fluid from the upstream side processing section.

[0037] In addition, the present invention can be implemented in the following manner, using one of the above-mentioned fluid processing devices to implement the following steps: using the above-mentioned upstream side processing section to immediately mix the reaction substances contained in the above-mentioned processed fluid at the molecular level, and maintaining the above-mentioned processed fluid for a long time while maintaining the necessary reaction conditions in the above-mentioned downstream side processing section.

[0038] This makes it possible to apply the processing described in Patent Document 4, for example.

[0039] In addition, the present invention can be implemented in the following manner: the above-mentioned processed fluid is at least two fluids including a fluid containing at least one of the above-mentioned organic compounds, and a fluid containing at least one polymerizable monomer and a fluid containing at least one emulsifier for emulsifying the above-mentioned monomer in the above-mentioned medium or a dispersant for dispersing the above-mentioned monomer in the above-mentioned medium which is not mixed with the above-mentioned monomer are used as the above-mentioned processed fluid, and an emulsification process or a dispersion process is carried out in the above-mentioned upstream side treatment section as the above-mentioned upstream side treatment, and a polymerization process is carried out in the above-mentioned downstream side treatment section as the above-mentioned downstream side treatment, thereby obtaining a polymer.

[0040] In addition, the present invention can be implemented in the following manner: the above-mentioned processed fluid is at least two fluids including a fluid containing the above-mentioned at least one organic compound, and an organic reaction is carried out through the above-mentioned upstream side treatment and the above-mentioned downstream side treatment, and the combination of the above-mentioned at least two fluids and the above-mentioned organic reaction is at least one combination selected from the group consisting of the first to fourth combinations described below.

[0041] First combination:

[0042] The at least two fluids are a fluid containing at least one ester and a fluid containing at least one acidic substance or alkaline substance that promotes the hydrolysis of the ester.

[0043] The above organic reaction is a combination of the above hydrolysis reactions to obtain alcohols.

[0044] Second combination:

[0045] The at least two fluids are a fluid containing at least one alcohol or amine and a fluid containing at least one of a carboxylic acid, a carboxylic anhydride or a carboxylic acid halide,

[0046] The above-mentioned organic reaction is a combination of reactions to obtain esters or amides by condensation.

[0047] The third combination:

[0048] The at least two fluids are fluids containing at least one aldehyde or ketone and an active methylene compound, and a fluid containing a substance that promotes the reaction of the aldehyde and the active methylene compound or the reaction of the ketone and the active methylene compound.

[0049] The above-mentioned organic reaction is a combination of reactions for obtaining olefins through dehydration condensation.

[0050] The fourth combination:

[0051] The at least two fluids are a fluid containing at least one aldehyde or ketone and an alcohol, and a fluid containing a protonic acid catalyst that promotes the reaction of the aldehyde and the alcohol or the reaction of the ketone and the alcohol.

[0052] The above organic reaction is a combination of acetalization reactions.

[0053] In addition, the present invention is a method for producing organic compounds, characterized in that the following stirring device is used, wherein the stirring device concentrically has an outer wall and an inner wall arranged on the inner side of the outer wall, at least one of the outer wall and the inner wall rotates relative to the other, and a processed object is passed through and stirred in a processing space formed between the outer wall and the inner wall, and a plurality of labyrinth seals are installed in the processing space; a processed object containing at least one organic compound is introduced from the upstream side of the labyrinth seal, and the retention of the processed object on the upstream side of the labyrinth seal and the subsequent passage of the processed object through the labyrinth seal are repeated to stir the processed object.

[0054] In the stirring device used in the above-mentioned manufacturing method, the above-mentioned processing space combines a narrow sealed space and a retention space arranged on the upstream side of the above-mentioned sealed space and wider than the above-mentioned sealed space into a group, and a plurality of groups of the above-mentioned sealed spaces and the above-mentioned retention spaces are continuously provided from the upstream to the downstream of the flow of the above-mentioned processed object. The above-mentioned outer wall and the above-mentioned inner wall are in the shape of a frustum of cones. For the purpose of adjusting the width of the above-mentioned sealed space, a gap adjustment mechanism is installed, and the gap adjustment mechanism enables the implementation by moving at least one of the above-mentioned outer wall and the above-mentioned inner wall concentrically.

[0055] The fluid treatment device used in the method for producing organic compounds involved in the present invention relates to the following fluid treatment device, which includes an upstream side treatment section defined by at least two treatment surfaces rotating relatively to each other and a downstream side treatment section arranged on the downstream side of the above-mentioned upstream side treatment section, the above-mentioned upstream side treatment section performs upstream side treatment of the above-mentioned treated fluid by allowing the treated fluid to pass through the upstream side treatment space defined by the above-mentioned at least two treatment surfaces, and is constructed in this way, the above-mentioned downstream side treatment section includes a downstream side treatment space that uses multiple labyrinth seals to retain and stir the above-mentioned treated fluid, the upstream side flow outlet of the above-mentioned treated fluid from the above-mentioned upstream side treatment section opens in the above-mentioned downstream side treatment space, and the above-mentioned downstream side treatment space uses the above-mentioned labyrinth seal to control the retention time, and is constructed in this way.

[0056] The device can be implemented as a device in which the downstream processing space includes a narrow sealed space and a retention space disposed upstream of the sealed space and wider than the sealed space. The device can be implemented as a device in which the width of the sealed space can be adjusted.

[0057] This device can be implemented as a device in which the upstream flow outlet opens in the retention space.

[0058] Furthermore, the apparatus can be implemented as an apparatus in which the downstream processing section continuously arranges a plurality of sets of the sealed space and the retention space from upstream to downstream of the flow of the processed fluid.

[0059] The device can be implemented as follows: the downstream processing section includes a cylindrical housing section defining the downstream processing space and a cylindrical section accommodated therein, and the cylindrical housing section and the cylindrical section rotate relative to each other by rotating at least one of the cylindrical housing section and the cylindrical section. The device can be implemented as follows: the rotation of at least one of the cylindrical housing section and the cylindrical section is performed independently of the rotation of the processing surface of the upstream processing section, and the device can be implemented as follows: the rotation of at least one of the cylindrical housing section and the cylindrical section is performed integrally with the rotation of the processing surface of the upstream processing section.

[0060] The device can be implemented as the following device: the at least two processing surfaces are disc-shaped processing surfaces separately arranged in the axial direction of the rotation of the processing surfaces; the upstream side processing section takes the central side of the rotation of the processing surfaces as the upstream and the peripheral side of the rotation as the downstream, so that the processed fluid passes through the upstream processing space and is discharged from the upstream side flow outlet at the peripheral end of the upstream side processing space; the downstream side processing section has an annular receiving space on the peripheral side of the upstream side flow outlet, and the receiving space is the most upstream space in the downstream side processing space and is a space wider than the sealed space.

[0061] This device can be implemented as a device in which a temperature adjustment mechanism can be installed for the purpose of controlling the temperature of the processed fluid in the downstream processing space, and a plurality of temperature adjustment mechanisms can be installed to adjust the temperatures to different temperatures.

[0062] The device can be implemented as the following device: it includes: a gap measuring sensor for mechanically setting the interval between the at least two processing surfaces and measuring the above-mentioned interval, and a gap adjustment mechanism for automatically moving one of the at least two processing surfaces based on the measurement result of the above-mentioned gap measuring sensor to make the position of the above-mentioned one processing surface variable.

[0063] The device may be provided with a microwave irradiation mechanism for the processed fluid in the downstream processing space. In addition, the device may be provided with a pressure regulating mechanism for the purpose of controlling the pressure of the processed fluid in the downstream processing space.

[0064] In the device, an inlet for introducing a processed fluid other than the processed fluid from the upstream processing section can be provided in the downstream processing space. In addition, in the device, an outlet for discharging gas generated in the upstream processing and / or the downstream processing performed in the downstream processing section can be provided in the downstream processing space. In addition, in the device, a plurality of outlets can be provided in the downstream processing section for the purpose of enabling the discharge of the processed fluid at each residence time in the downstream processing space.

[0065] The device can be implemented as the following device: the above-mentioned upstream side treatment in the above-mentioned upstream side treatment section is performed on the above-mentioned processed fluid under laminar flow conditions, and the above-mentioned downstream side treatment in the above-mentioned downstream side treatment section is performed on the above-mentioned processed fluid under non-laminar flow conditions, and is constructed in this way.

[0066] Furthermore, the fluid processing apparatus used in the method for producing an organic compound according to the present invention can be implemented in the following aspects.

[0067] The fluid treatment device used in the method for producing organic compounds according to the present invention relates to the following fluid treatment device: comprising an upstream side treatment section defined by at least two treatment surfaces that are arranged relative to each other and rotate relative to each other in an approachable and detachable manner, and a downstream side treatment section configured on the downstream side of the upstream side treatment section, wherein the upstream side treatment section is configured in such a manner that the processed fluid passes through the upstream side treatment space defined by the at least two treatment surfaces, thereby performing upstream side treatment on the processed fluid. In the device, the downstream side treatment section includes a downstream side treatment space connected to the upstream side treatment space, and a part of a rotating member that rotates integrally with the rotating treatment surface of the upstream side treatment section constitutes a part of the wall surface defining the downstream side treatment space. Moreover, the downstream side treatment section utilizes the rotation of the rotating member to perform downstream side treatment on the processed fluid continuously with the upstream side treatment, and is configured in such a manner.

[0068] The device can be implemented as a device in which the downstream side treatment is configured such that the peripheral side of the rotating member is upstream and the central side of the rotation of the rotating member is downstream, and the treatment characteristics of the processed fluid are controlled. In addition, the device can be implemented as a device in which the downstream side treatment section includes a cylindrical flow path extending in the axial direction of the rotation of the rotating member as at least a part of the downstream side treatment space, and the treatment characteristics of the processed fluid are controlled through the cylindrical flow path.

[0069] This device can be implemented as a device in which the downstream processing section is configured to control the residence time by utilizing centrifugal force.

[0070] The device can be implemented as the following device: the above-mentioned rotating member that rotates integrally with the above-mentioned rotating processing surface is a cylindrical portion that forms a cylindrical shape as a whole, the above-mentioned rotating processing surface is arranged on one upstream end face of the above-mentioned cylindrical portion, and the above-mentioned cylindrical portion is arranged in a cylindrical containing portion that forms a cylindrical shape as a whole, and the above-mentioned downstream side processing space is a space defined between the inner surface of at least any one of the above-mentioned downstream side end face and the outer circumferential surface of the above-mentioned cylindrical portion and the outer surface of at least any one of the downstream side inner end face and the inner circumferential surface in the above-mentioned cylindrical containing portion, and at least any one of the above-mentioned inner surface and the above-mentioned outer surface that define the above-mentioned downstream side processing space has concave-convex for fluid processing, and the above-mentioned downstream side processing is performed by the interaction between the above-mentioned concave-convex for fluid processing and the above-mentioned wall surface opposite to the concave-convex, and the configuration is made in this way.

[0071] In this device, in order to control the residence time of the fluid to be processed in the downstream processing space, a position adjustment mechanism that makes the position of a part of the wall surface defining the downstream processing space variable can be installed.

[0072] The device can be implemented as the following device: the above-mentioned upstream side processing part includes: at least two processing parts that are arranged relative to each other in an approachable and separable manner, and at least one of them is rotatable relative to the other, and a plurality of the above-mentioned processing surfaces are arranged at positions relative to each other in each of the above-mentioned at least two processing parts, one of the above-mentioned at least two processing parts constitutes a part of the above-mentioned rotating member, the above-mentioned at least two processing surfaces are approachable and separable in the axial direction of the above-mentioned rotation of the above-mentioned processing surfaces, and the above-mentioned at least two processing surfaces define the above-mentioned upstream side processing space as an annular flow path for allowing the above-mentioned processed fluid to pass through, and the above-mentioned upstream side processing space is formed by removing the above-mentioned annular flow path from the above-mentioned annular flow path when the above-mentioned processed fluid has become a thin film fluid. The flow path passes radially from the inner side to the outer side, so that the upstream side treatment of the processed fluid is carried out between the at least two processing surfaces. An upstream side flow outlet is provided at the outer peripheral end of the annular flow path. By balancing the force applied in the direction of bringing the at least two processing surfaces closer in the axial direction and the force in the direction of separating the at least two processing surfaces in the axial direction, the interval between the processing surfaces is controlled, and the processed fluid discharged from the upstream side flow outlet is freed from the forced force generated by the processing surfaces and discharged to the downstream side space. The processed fluid passes through the downstream side space while being affected by the rotation of the rotating member. The structure is constructed in this way.

[0073] The device can be implemented as the following device: the upstream processing part includes a first processing part and a second processing part, the first processing part constitutes a part of the rotating member, and as the at least two processing surfaces, the first processing part includes a first processing surface, and the second processing part includes a second processing surface. The shell accommodating the first processing part is arranged on the outside of the first processing part, and the space between the outer peripheral surface of the first processing part and the inner peripheral surface of the shell and the space between the outer surface of the first processing part and the inner surface of the bottom of the shell constitute at least a part of the downstream processing space. The downstream processing space is a flow path space where the processed fluid discharged from the upstream processing space is retained.

[0074] In addition, the continuous stirring device used in the method for producing an organic compound according to the present invention can be implemented in the following form. In this form, the upstream side processing unit of the fluid processing device used in the method for producing an organic compound is removed, and only the downstream side processing unit is used to perform downstream side processing. The downstream side processing is the processing of an organic reaction.

[0075] The continuous stirring device used in the method for producing an organic compound according to the present invention is a stirring device having an outer wall and an inner wall arranged inside the outer wall concentrically, wherein at least one of the outer wall and the inner wall rotates relative to the other, so that the processed object passes through a processing space formed between the outer wall and the inner wall to be stirred. In the device, a plurality of labyrinth seals are arranged in the processing space, and the processing object is repeatedly retained on the upstream side of the labyrinth seal and then passes through the labyrinth seal to stir the processed object.

[0076] In addition, in the device, a plurality of labyrinth seals are installed in the above-mentioned processing space, and the retention of the above-mentioned processed material on the upstream side of the above-mentioned labyrinth seal and the subsequent passage of the above-mentioned processed material through the above-mentioned labyrinth seal are repeated, and the retention time of the above-mentioned processed material is controlled and stirred.

[0077] In the present invention, the so-called object to be processed refers to the fluid to be processed in the above-mentioned processing space.

[0078] The device can be implemented as follows: the above-mentioned processing space combines a narrow sealed space and a retention space arranged on the upstream side of the above-mentioned sealed space and wider than the above-mentioned sealed space as a group, and continuously has multiple groups of the above-mentioned sealed space and the above-mentioned retention space from the upstream to the downstream of the flow of the above-mentioned processed object.

[0079] The device can be implemented as a device in which the outer wall is a cylindrical wall, and can be implemented as a device in which the inner wall is a cylindrical wall.

[0080] The device is intended to control the temperature of the object to be processed in the above-mentioned processing space, and can be implemented as a device equipped with a temperature regulating mechanism. A plurality of the above-mentioned temperature regulating mechanisms can be installed and implemented in a manner that the object to be processed in the above-mentioned processing space is adjusted to different temperatures using the plurality of the above-mentioned temperature regulating mechanisms.

[0081] The device can be implemented as a device including a supply port for supplying the processed object into the processing space, wherein one end of the supply port is connected to the outside of the continuous stirring device, and the other end of the supply port is communicated with the processing space.

[0082] This apparatus can be implemented as an apparatus including an introduction port for introducing the processed object into the processing space through a path different from that of the processed object supplied from the supply port.

[0083] This device can be implemented as a device in which a plurality of discharge ports are provided for discharging the processed object from the processing space at different processing times.

[0084] This device can be implemented as a device equipped with a microwave irradiation mechanism for the object to be processed in the above-mentioned processing space.

[0085] This device can be implemented as a device provided with a gap adjustment mechanism for adjusting the width of the sealed space.

[0086] The device can be implemented as follows: the outer wall and the inner wall are in a truncated cone shape, and a gap adjustment mechanism is provided to move at least one of the outer wall and the inner wall concentrically for the purpose of adjusting the width of the sealed space.

[0087] The device can be implemented as the following device: it includes a processing part having an outer wall and an inner wall arranged on the inner side of the outer wall, the outer wall and the inner wall are concentric, the processing part includes a processing space, the processing space is the space between the outer wall and the inner wall, at least one of the outer wall and the inner wall has a component constituting a labyrinth seal mechanism including a plurality of labyrinth seals, at least one of the outer wall and the inner wall rotates relative to the other, repeatedly retaining the processed object on the upstream side of the labyrinth seal and subsequently passing the processed object through the labyrinth seal, and in this way, the processing space is a space for stirring the processed object.

[0088] Effects of the Invention

[0089] In the present invention, fluid treatment (upstream side treatment) of the fluid to be treated is performed by passing the fluid to be treated through an upstream side treatment section that treats the fluid to be treated between at least two relatively rotating treatment surfaces, and further fluid treatment (downstream side treatment) of the fluid to be treated is performed by passing the fluid to be treated that has undergone the upstream side treatment through a downstream side treatment section that is arranged on the downstream side of the above-mentioned upstream side treatment section. When a series of chemical reaction treatments are performed in the fluid treatment device, various reaction conditions, especially the reaction time, such as raw material concentration, temperature conditions of the reaction field, pressure conditions, stirring conditions, presence or absence of a catalyst, its optimization, and reaction time, can be adjusted, and as a result, a method for producing an organic compound that can obtain a target product with high efficiency can be provided.

[0090] In particular, by providing a plurality of labyrinth seals in the downstream treatment section that have the function of retaining and stirring the fluid to be treated in the upstream treatment section, the upstream treatment and the downstream treatment are continuously performed, so that, for example, the emulsification by the upstream treatment in the emulsion polymerization and the polymerization reaction caused by the retention in the downstream treatment can be carried out uninterruptedly, and a method for completing emulsion polymerization with one device can be provided. In addition, by using the temperature regulating mechanism installed in the downstream treatment section according to claim 5 of the present application to regulate the temperature, the fluid to be treated that has been subjected to the upstream treatment is slowly and fully stirred in the treatment space of the downstream treatment section at a specified temperature, so that the reaction can be carried out while the temperature of the fluid to be treated is maintained at a specified temperature.

[0091] In addition, in the present invention, even in the case of using a continuous stirring device in which the upstream side processing section of the above-mentioned fluid processing device is removed and only the downstream side processing section is used for downstream side processing, in the processing space formed between the outer wall and the inner wall in which at least one of them rotates relative to the other, by performing fluid processing on the processed object, when a series of fluid processing such as chemical reaction, emulsification, dispersion, mixing, etc. is performed in the stirring device, various reaction conditions, especially the reaction time, such as raw material concentration, temperature conditions of the reaction field, pressure conditions, stirring conditions, presence or absence of a catalyst, its optimization, reaction time, etc. can be adjusted, and as a result, a method for producing an organic compound that can obtain a target product with high efficiency can be provided.

[0092] In particular, by installing a plurality of labyrinth seals in the processing space, the retention of the processed object on the upstream side of the labyrinth seal and the subsequent passage of the processed object through the labyrinth seal are repeated, so as to stir the processed object or control the retention time of the processed object and stir it, thereby adjusting the retention time of the processed object in the processing space. In particular, the continuation of the reaction in the organic reaction and the reaction time for completing the reaction can be fully ensured, thereby effectively processing the fluid of the processed object. BRIEF DESCRIPTION OF THE DRAWINGS

[0093] Figure 1 It is a schematic cross-sectional view of a fluid treatment device used in the implementation of the present invention.

[0094] Figure 2 (A) is Figure 1 0 is a schematic plan view of the first processing surface of the fluid treatment device shown in FIG. 1 , and (B) is an enlarged view of the main part of the processing surface of the device.

[0095] Figure 3 (A) is a cross-sectional view of a second introduction portion of the device, and (B) is an enlarged view of a main portion for explaining a processing surface of the second introduction portion.

[0096] Figure 4 This is a schematic cross-sectional view of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0097] Figure 5 This is an explanatory diagram of the main parts of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0098] Figure 6 This is a schematic cross-sectional view of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0099] Figure 7 This is a schematic cross-sectional view of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0100] Figure 8 This is a schematic cross-sectional view of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0101] Fig. 9 For the general Figure 8 An explanatory diagram showing a set of protrusions of a bottom member and a protrusion of a housing taken out of a fluid treatment device shown in , wherein the protrusion of the bottom member is depicted as an oblique view from below, and the protrusion of the housing is depicted as an oblique view from above.

[0102] Fig.10 This is a schematic cross-sectional view of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0103] Fig.11 For viewing from below Figure 1 An oblique view of the first processing portion of the fluid processing device shown in FIG.

[0104] Fig.12 (A) is a schematic cross-sectional view of another embodiment of a fluid treatment device used in the implementation of the present invention, and (B) is Fig.12 (A) is an enlarged cross-sectional view of the main part, (C) is Fig.12 (A) is an enlarged cross-sectional view of a main part of a modified example.

[0105] Fig.13 This is an explanatory diagram of the main parts of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0106] Fig.14 This is an explanatory diagram of the main parts of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0107] Fig.15 This is a schematic cross-sectional view of a fluid treatment device according to another embodiment of the fluid treatment device used in practicing the present invention.

[0108] Fig.16 (A) is a schematic cross-sectional view of a continuous stirring device used in the practice of the present invention, and (B) is an explanatory view of the main parts of the device.

[0109] Fig.17 (A) is along Fig.16 (A) is a cross-sectional view of the main part along the AA line, and (B) is a cross-sectional view along the Fig.17 (A) is a cross-sectional view of the main part along line BB.

[0110] Fig.18 This is a perspective view of a main part of a continuous stirring device according to another embodiment of the continuous stirring device used in practicing the present invention.

[0111] Fig.19 This is a cross-sectional view of a main part of a continuous stirring device according to another embodiment of the continuous stirring device used in practicing the present invention.

[0112] Fig. 20 (A) is a schematic cross-sectional view of a continuous stirring device according to another embodiment of the continuous stirring device used in practicing the present invention, and (B) and (C) are diagrams for explaining the main parts of the device. DETAILED DESCRIPTION

[0113] Embodiments of the present invention will be described below with reference to the drawings.

[0114] The present invention is a method for producing an organic compound by conducting an organic reaction such as oxidation reaction, reduction reaction, substitution reaction (replacement reaction), addition reaction, elimination reaction, rearrangement reaction, condensation reaction, pericyclic reaction, polymerization reaction, solvent decomposition, dehydration reaction, halogenation reaction, etc. using an organic compound as a starting material to obtain an organic compound.

[0115] (About Fluid Processing Device F)

[0116] Regarding the fluid processing device F suitable for implementing the method for producing an organic compound according to the present invention, refer to Figure 1 to Figure 15 Provide explanation.

[0117] The fluid processing device F includes an upstream processing section defined by at least two processing surfaces that rotate relative to each other, and a downstream processing section arranged on the downstream side of the upstream processing section. The upstream processing section is constructed in a manner of performing upstream processing on the processed fluid by allowing the processed fluid to pass through an upstream processing space defined by at least two processing surfaces.

[0118] The part of the fluid treatment in the upstream processing space in the fluid treatment device F is the same as the device described in patent documents 3 to 5. Specifically, the processed fluid is treated in the upstream processing space defined by at least two processing surfaces that rotate relatively. It is a device as follows: a first fluid as the first processed fluid in the processed fluid is introduced into the upstream processing space, and a second fluid as the second processed fluid in the processed fluid is introduced into the upstream processing space independently from the flow path into which the first fluid is introduced from another flow path including an opening that leads to the upstream processing space, and the first fluid and the second fluid are mixed in the upstream processing space to continuously process the fluid. In other words, in the upstream processing space defined by the rotating axially opposite disc-shaped processing surfaces, the above-mentioned fluids are merged to form a thin film fluid, the above-mentioned processed fluid is processed in the thin film fluid, and the processed fluid is discharged from the upstream processing space. Furthermore, the device is most suitable for processing a plurality of fluids to be processed, and can also be used to process a single fluid to be processed in the upstream processing space.

[0119] Figure 1 In the figure, the top and bottom correspond to the top and bottom of the device. In the fluid processing device used in the implementation of the present invention, up and down, front and back, left and right only represent relative positional relationships and do not limit absolute positions. Figure 1 , Figure 2 (A) Figure 3 In (B), R indicates the direction of rotation. Figure 3 In (B), C represents the direction of centrifugal force (radial direction). In addition, in the fluid treatment device used in the implementation of the present application, the so-called cylinder is not to be interpreted as a mathematical cylinder as a whole, and in addition to the cylinder, it also includes a hollow cylinder (hereinafter referred to as a cylinder) and a cylinder with a top.

[0120] The fluid treatment device F used in the implementation of the invention processes the fluid in the upstream processing space, and a downstream processing space is provided in the fluid treatment device F for further processing the fluid discharged from the upstream processing space, which is different from the devices described in Patent Documents 3-5. However, it is important to explain the structure and function of the fluid treatment device related to the upstream processing space common to the devices described in the prior art documents in order to deepen the understanding of the invention, so the part related to the upstream processing space is first explained. In the present invention, at least one organic compound is contained in the processed fluid.

[0121] (About processing surface)

[0122] The fluid handling device F includes first and second processing parts 10 and 20, at least one of which rotates relative to the other processing part. The opposing surfaces of the two processing parts 10 and 20 are respectively called processing surfaces. The first processing part 10 includes a first processing surface 1, and the second processing part 20 includes a second processing surface 2.

[0123] The two processing surfaces 1 and 2 define the upstream processing part and the upstream processing space 3, and the processing of the fluid such as mixing the processed fluid is carried out in the upstream processing space 3. The upstream processing space 3 is an annular space as described later. The processing of the fluid carried out in the upstream processing space 3 is called upstream processing.

[0124] The interval between the two processing surfaces 1 and 2 can be appropriately changed and implemented. In this embodiment, it is usually adjusted to a small interval of less than 1 mm, for example, 0.1 μm to 50 μm. Thus, the processed fluid passing between the two processing surfaces 1 and 2 becomes a forced film fluid forced by the two processing surfaces 1 and 2.

[0125] When the fluid treatment device F is used to treat a plurality of processed fluids including a first fluid and a second fluid, the fluid treatment device F is connected to the flow path of the first fluid and introduced from the upstream end (in this case, the inner side of the ring shape) of the upstream side processing space 3 defined between the two processing surfaces 1 and 2. At the same time, the upstream side processing space 3 forms a part of the flow path of the second fluid that is different from the first fluid. Moreover, in the upstream side processing space 3 between the two processing surfaces 1 and 2, the two processed fluids of the first fluid and the second fluid are mixed and reacted.

[0126] Specifically speaking, the fluid processing device F includes: a second bracket 22 for holding the second processing part 20, a surface pressure imparting mechanism, a rotation driving mechanism M, a first introduction part d1, a second introduction part d2 and fluid pressure imparting mechanisms P1 and P2.

[0127] In this embodiment, the second processing member 20 is arranged above the first processing member 10, the lower surface of the second processing member 20 is the second processing surface 2, and the upper surface of the first processing member 10 is the first processing surface 1.

[0128] like Figure 1As shown in, in this embodiment, the first processing part 10 is a disk body without an opening in the center. In addition, the second processing part 20 is an annular body, more specifically, an annular disk. In this embodiment, since the first processing surface 1 is disk-shaped and the second processing surface 2 is annular, the upstream processing space 3 defined by the two processing surfaces 1 and 2 constitutes an annular space, i.e., an annular flow path. The second processing part 20 can be a disk-shaped without an opening in the center under the condition that the processed fluid containing the first fluid and the second fluid can be introduced.

[0129] The first and second processing parts 10 and 20 can be composed of a single component or a combination of multiple components. As for the material, in addition to metal, ceramics such as silicon carbide (SiC), sintered metal, wear-resistant steel, sapphire, and products obtained by hardening metals, lining, coating, plating, etc. can be used. In this embodiment, at least a portion of the first and second processing surfaces 1 and 2 is mirror-polished.

[0130] (Regarding the rotation of the processing part)

[0131] In the first processing usefulness part 10 and the second processing usefulness part 20, the processing usefulness part of at least one adopts a rotation drive mechanism M such as a motor to rotate relatively relative to the processing usefulness part of the other. The driving shaft of the rotation drive mechanism M is connected to the rotation shaft 31. In this example, the first processing usefulness part 10 installed on the rotation shaft 31 rotates relative to the second processing usefulness part 20. In the present embodiment, the rotation shaft 31 is fixed to the center of the first processing usefulness part 10 using a fixing tool 32 such as a screw, and its rear end is connected with the driving shaft of the rotation drive mechanism M, and the driving force of the rotation drive mechanism M is transmitted to the first processing usefulness part 10, so that the first processing usefulness part 10 is rotated, and a supporting part 33 for axially supporting the rotation shaft 31 is provided in the ring-shaped center of the ring-shaped second bracket 22. Of course, the second processing usefulness part 20 supported by the second bracket 22 can also be rotated, and both can also be rotated.

[0132] (About the proximity and separation of the processing surface)

[0133] In this embodiment, at least one of the first processing member 10 and the second processing member 20 is approachable to and separable from at least the other relative to the axial direction of the rotation axis 31, and the two processing surfaces 1 and 2 are able to approach and separate.

[0134] In this embodiment, the first processing part 10 is fixed in the axial direction and is configured to rotate in the circumferential direction. The second processing part 20 is close to and separated from the first processing part 10 in the axial direction, so the second processing part 20 is accommodated in a retractable manner in the receiving part 23 provided in the second bracket 22 using a sealing mechanism such as an O-ring 26. The receiving part 23 is a recessed part of the second processing part 20 that mainly accommodates the part on the axially opposite side of the second processing surface 2, and is a circular groove in a plan view, that is, formed into an annular shape.

[0135] Furthermore, the second processing part 20 can be arranged in the receiving part 23 of the second bracket 22 in a manner that it can move parallel to the axial direction only, and can also be received in a state where the gap is enlarged. The second processing part 20 can be held by a floating mechanism that can be displaced three-dimensionally.

[0136] (About the fluid pressure imparting mechanism)

[0137] The processed fluid (in this example, the first fluid and the second fluid) is supplied to the fluid processing device F by means of fluid pressure imparting mechanisms P1 and P2. Various pumps can be used in the fluid pressure imparting mechanisms P1 and P2, and the processed fluid can be supplied to the fluid processing device F at a specified pressure. In addition, in order to suppress the generation of pulsation during pressure feeding, a pressure imparting device having a pressurized container can also be used as the fluid pressure imparting mechanisms P1 and P2. By introducing a pressurized gas into a pressurized container containing the processed fluid, the processed fluid is squeezed out by the pressure, thereby enabling the processed fluid to be pressure fed.

[0138] (Movement of the fluid being processed)

[0139] The fluid to be processed is pressurized by the fluid pressure imparting mechanisms P1 and P2. In this pressurized state, the fluid to be processed including the first fluid and the second fluid is introduced between the two processing surfaces 1 and 2 from the first introduction part d1 and the second introduction part d2.

[0140] In this embodiment, the first introduction part d1 is a flow path provided in the annular second support 22, and one end thereof is connected to the cylindrical introduction space 51. The introduction space 51 is a cylindrical space defined by the lower surface of the support part 33, the lower surface of the inner circumference of the second support 22, the inner circumference of the second processing part 20, and the first processing surface 1.

[0141] The second introduction portion d2 is a passage provided inside the second processing portion 20, one end of which opens at the second processing surface 2, and this opening serves as a direct introduction opening (second introduction port d20) to the upstream processing space 3.

[0142] The first fluid is introduced into the upstream side processing space 3 from the upstream end of the upstream side processing space 3 as the gap on the inner diameter side between the two processing parts 10 and 20 via the introduction space 51 from the first introduction part d1. The first fluid introduced from the first introduction port d10 to the upstream side processing space 3 becomes a thin film fluid on the first processing surface 1 and the second processing surface 2, and passes through the outside of the two processing parts 10 and 20. Between these processing surfaces 1 and 2, the second fluid pressurized to a prescribed pressure is supplied from the second introduction port d20 of the second introduction part d2, and the first fluid that has become a thin film fluid is merged, and as an upstream side treatment, a reaction treatment is mainly carried out while or after mixing by molecular diffusion. As an upstream side treatment, mixing by molecular diffusion can be mainly carried out. By adopting this molecular diffusion, the reaction substances contained in the processed fluid can be immediately mixed at the molecular level. This reaction treatment may be accompanied by crystallization, crystallization, precipitation, etc., or may not be accompanied by.

[0143] With regard to the film fluid produced by the first fluid and the second fluid, after the upstream side is processed, the outer side of the two processing parts 10, 20 is discharged from the two processing surfaces 1, 2 (in this example, between the peripheral end and the peripheral end of the processing surface 1, 2, that is, the downstream end of the upstream side processing space 3). The downstream end of the upstream side processing space 3 becomes the outlet of the upstream side processing space 3, so the downstream end of the upstream side processing space 3 is also referred to as the upstream side flow outlet 4 below. The fluid discharged from the two processing surfaces 1, 2 to the outside of the two processing parts 10, 20 is accommodated with the shell 61 configured in the outside of the first processing part 10, the fluid processed by the upstream side is efficiently processed with further fluid, and discharged to the outside of the system (outside the device). The fluid discharged from the two processing surfaces 1, 2 to the outside of the two processing parts 10, 20 is liberated from the forced generation of the two processing surfaces 1, 2, and discharged to a wider flow path space (downstream side processing space 81).

[0144] Furthermore, the first processing part 10 rotates, so the processed fluid in the upstream processing space 3 does not move in a straight line from the inside to the outside, but the synthetic vector of the movement vector in the radial direction of the ring and the movement vector in the circumferential direction acts on the processed fluid, causing it to move from the inside to the outside in a roughly vortex shape.

[0145] In the motion of a fluid, a dimensionless number indicating the ratio of inertial force to viscous force is called the Reynolds number, and is represented by the following equation (2).

[0146] Reynolds number Re = inertial force / viscous force = ρVL / μ = VL / ν Formula (2)

[0147] Among them, ν = μ / ρ represents kinematic viscosity, V represents characteristic velocity, L represents characteristic length, ρ represents density, and μ represents viscosity.

[0148] The flow of a fluid is limited by a critical Reynolds number. If the flow is below the critical Reynolds number, the flow becomes laminar flow, and if the flow is above the critical Reynolds number, the flow becomes turbulent flow.

[0149] The interval between the two processing surfaces 1 and 2 of the fluid processing device F is usually adjusted to be less than 1 mm, for example, a small interval of about 0.1 μm to 50 μm, so the amount of fluid held between the two processing surfaces 1 and 2 is extremely small. Therefore, the characteristic length L becomes very small, the centrifugal force of the thin film fluid passing through the two processing surfaces 1 and 2 is small, and the influence of the viscous force in the thin film fluid increases. Therefore, the Reynolds number becomes small, and the thin film fluid becomes a laminar flow.

[0150] Furthermore, by increasing the rotation speed of the first processing member 10, the Reynolds number is increased, thereby applying a shear force to the thin film fluid.

[0151] Centrifugal force is a type of inertial force in rotational motion, and is a force from the center to the outside. Centrifugal force is expressed by the following formula (3).

[0152] Centrifugal force F = ma = mv2 / R (3)

[0153] Among them, a represents acceleration, m represents mass, v represents velocity, and R represents radius.

[0154] As described above, since the amount of fluid held between the two processing surfaces 1 and 2 is small, the ratio of the velocity to the mass of the fluid becomes very large and its mass can be ignored. Therefore, in the thin film fluid formed between the two processing surfaces 1 and 2, the influence of gravity can be ignored.

[0155] (About the balance of forces)

[0156] Secondly, for the joint pressure imparting mechanism for the power that works on the direction that makes the first processing usefulness face 1 and the second processing usefulness face 2 approach to the processing portion is described. In this embodiment, the joint pressure imparting mechanism is arranged on the second support 22, and the second processing usefulness portion 20 is empowered (powered) toward the first processing usefulness portion 10. The above-mentioned joint pressure imparting mechanism is a mechanism for the force (hereinafter referred to as joint pressure) applied on the direction approaching each other for the first processing usefulness face 1 of the first processing usefulness portion 10 and the second processing usefulness face 2 of the second processing usefulness portion 20. The fluid pressure produced by this joint pressure imparting mechanism P1, P2, etc. makes the balance of the power separated between the two processing usefulness faces 1,2, produce the thin film fluid with the tiny film thickness of the nm unit to μm unit below 1mm. In other words, by the balance of above-mentioned power, the interval between the two processing usefulness faces 1,2 is maintained at the small interval of regulation.

[0157] exist Figure 1In the embodiment shown in, the interface pressure imparting mechanism is configured between the above-mentioned receiving portion 23 and the second processing usefulness portion 20. Specifically, the spring 25 that energizes the second processing usefulness portion 20 in the direction close to the first processing usefulness portion 10 and the energizing fluid introduction portion (not shown) that imports energizing fluids such as air and oil constitutes, by the fluid pressure of the spring 25 and the above-mentioned energizing fluid, the above-mentioned interface pressure is imparted. The spring 25 and the fluid pressure of the above-mentioned energizing fluid can be imparted to any one, and can be other forces such as magnetic force, gravity, etc.

[0158] To counter the empowerment of the interface pressure imparting mechanism, the separation force generated by the pressure, viscosity, etc. of the processed fluid pressurized by the fluid pressure imparting mechanism P1, P2 is adopted, and the second processing part 20 is away from the first processing part 10, and a small gap is opened between the two processing surfaces 1 and 2. In this way, the first processing surface 1 and the second processing surface 2 are set with an accuracy of μm units by adopting the balance of the force of the interface pressure and the separation force, and the small gap between the two processing surfaces 1 and 2 is set. As the above-mentioned separation force, in addition to the separation force generated by the fluid pressure and viscosity of the processed fluid, the centrifugal force generated by the rotation of the processing part, the negative pressure when the empowering fluid introduction part is applied with negative pressure, the spring force when the spring 25 becomes a tension spring, etc. can be listed. The interface pressure imparting mechanism may be arranged not at the second processing part 20, but at the first processing part 10, or at both.

[0159] As for the first and second processing parts 10 and 20, a temperature regulating mechanism may be assembled in at least one of them to cool or heat and adjust the temperature. In addition, the processed fluid introduced into the fluid processing device F from the first introduction part d1 and the second introduction part d2 may be cooled or heated to adjust the temperature. The temperature energy of the processed fluid may also be used for the precipitation of particles in the case of a reaction accompanied by precipitation.

[0160] (Concave and micro pump effect)

[0161] like Figure 2 As shown in FIG. 1 , the first processing surface 1 of the first processing portion 10 can be formed with a groove-shaped recess 13 extending from the center side of the first processing portion 10 to the outside, that is, in the radial direction. The planar shape of the recess 13 is as follows: Figure 2As shown in (B), it can be a shape that is curved or stretched in a spiral shape on the first processing surface 1; a shape that is straight and stretched in the outer direction, although not shown; a shape that is bent or curved in an L shape; a continuous shape; a discontinuous shape; a branched shape. In addition, the recess 13 can also be implemented as a product formed on the second processing surface 2, and can also be implemented as a product formed on both the first and second processing surfaces 1, 2. By forming such a recess 13, a micropump effect can be obtained, which has the effect of being able to suck the processed fluid between the first and second processing surfaces 1, 2.

[0162] When the first processing surface 1 is provided with a recess 13, the base end of the recess 13 preferably reaches the introduction space 51. The top end of the recess 13 may extend toward the outer peripheral surface of the first processing member 10, and its depth (cross-sectional area) may gradually decrease from the base end to the top end.

[0163] A flat surface 14 without the recess 13 is provided between the tip of the recess 13 and the outer peripheral surface 11 of the first processing member 10 .

[0164] (Regarding rotation speed and fluid handling)

[0165] When the second introduction port d20 of the second introduction portion d2 is provided on the second processing surface 2, it is preferably provided at a position facing the flat surface 14 of the opposed first processing surface 1.

[0166] The second inlet d20 is preferably disposed on the downstream side (outer side in this example) of the recess 13 of the first processing surface 1. In particular, it is preferably disposed at a position opposite to the flat surface 14 on the outer diameter side of the point where the flow direction of the first fluid is changed to the flow direction of the spiral laminar flow formed between the processing surfaces 1 and 2 when the flow direction of the first fluid is introduced into the upstream processing space 3 by the micropump effect. Specifically, Figure 2 In (B), it is preferred that the distance n in the radial direction from the outermost position of the recess 13 provided on the first processing surface 1 is about 0.5 mm or more. In particular, when particles are precipitated from a fluid, it is preferred that the mixing and reaction of the particles with the diffusion of molecules of a plurality of processed fluids be performed under laminar flow conditions.

[0167] In order to process the fluid to be processed under the laminar flow condition, the peripheral velocity at the outer periphery of the first processing member 10 is appropriately 0.3 to 35 m / sec.

[0168] (About the Second Introduction Section)

[0169] The shape of the second introduction port d20 is as follows: Figure 1 As shown in , it can be a continuous opening such as a concentric ring shape surrounding the central opening of the second processing surface 2 of the annular disk, such as Figure 2 (B) Figure 3 As shown in (B), it may be an independent opening of a circle, etc. In addition, when the second introduction port d20 is made into an annular shape, the annular opening may be continuous over the entire circumference or may be partially discontinuous.

[0170] If the annular second inlet port d20 is set as a concentric circle around the opening in the center of the second processing surface 2, the second fluid can be introduced into the upstream processing space 3 under the same conditions in the circumferential direction. Therefore, when it is desired to mass-produce the target product, it is preferred to make the shape of the opening a concentric annular shape.

[0171] The second introduction portion d2 can have directionality. Figure 3 As shown in (A), the introduction direction from the second introduction port d20 of the second processing surface 2 is inclined at a predetermined elevation angle (θ1) relative to the second processing surface 2. The elevation angle (θ1) is set to be greater than 0 degrees and less than 90 degrees, and in the case of a reaction with a fast reaction speed, it is preferably set to be greater than 1 degree and less than 45 degrees.

[0172] In addition, if Figure 3 As shown in (B), when the second introduction port d20 is an independent perforated hole, it is also possible to have directivity along the second plane of the processing with face 2. The introduction direction of the second fluid is for the outer direction away from the center with respect to the component of the radial direction of the processing with face, and with respect to the component of the rotation direction of the fluid between the processing with faces relative to rotation, for the forward direction. In other words, with the radial direction by the second introduction port d20 and the line segment of the outer direction as the reference line g, there is the angle (θ2) of the regulation from the reference line g to the rotation direction R. For this angle (θ2), it is preferably set to exceed 0 degree and be less than 90 degree.

[0173] (Type of fluid being processed and number of flow paths)

[0174] The types of the above-mentioned fluids to be processed and the number of their flow paths are Figure 1 In the example of , there are 2, but there may be 1, or there may be 3 or more. Figure 1In the example, the second fluid is introduced into the upstream processing space 3 from the second introduction part d2, and the introduction part can be provided in the first processing part 10, or in both. In addition, a plurality of introduction parts can be prepared for a processed fluid. In addition, as for each introduction port, there is no particular restriction on its shape, size, and number, and it can be implemented by appropriate changes. In addition, an introduction port can be provided in front of or further upstream of the first and second processing surfaces 1 and 2. In addition, expressions such as the first and second in each fluid refer to the nth number of a plurality of fluids, but they are only used for identification, and there are also third and higher fluids. In Figure 6-8 , Fig.10 The flow path of the third fluid as the third processed fluid, i.e., the third introduction part d3 and its opening d30 are shown. The third introduction part d3, like the second introduction part d2, is a passage provided inside the second processing part 20, one end of which opens at the second processing surface 2, and its introduction opening (third introduction port d30) is located on the downstream side in the second processing surface 2 relative to the second introduction port d20 of the second introduction part d2. Figure 6-8 , Fig.10 In order to avoid the drawing becoming complicated, the first introduction part d1 is omitted. In this regard, the cross section where the first introduction part d1 is not provided can be considered. In addition, each flow path is a closed flow path, which is liquid-tight (when the processed fluid is liquid) and air-tight (when the processed fluid is gas).

[0175] (Downstream processing)

[0176] Next, further fluid processing (downstream processing) in the downstream processing space 81, which is an essential part of the fluid processing device F used in practicing the present invention, will be described.

[0177] The fluid treatment device F includes a downstream side treatment section arranged on the downstream side of the upstream side treatment section, and the downstream side treatment section includes a downstream side treatment space 81. Figure 1 and Fig.12 (A) shows by way of example a range DS of a region where the downstream processing space 81 is arranged.

[0178] In the fluid treatment device F used in the implementation of the present invention, upstream side treatment is performed in the upstream side treatment space 3, and a downstream side treatment space 81 is provided for further fluid treatment of the fluid (fluid subjected to upstream side treatment) discharged from the downstream end of the upstream side treatment space 3. The fluid treatment performed in the downstream side treatment space 81 is referred to as downstream side treatment.

[0179] (shell)

[0180] In order to accommodate the first processing part 10, a housing 61 is provided outside the rotating first processing part 10. The housing 61 accommodates the fluid discharged from the upstream flow outlet 4. In the present embodiment, the housing 61 accommodates the first processing part 10 and a part of the second processing part 20, and the fluid flowing out from the upstream flow outlet 4 of the first processing part 10 is subjected to downstream processing in the downstream processing space 81 between the inner surface of the housing 61 and the outer surface of the first processing part 10.

[0181] In this embodiment, the housing 61 is Figure 1 As shown in , a cylindrical receiving portion that is formed into a cylindrical shape as a whole can be implemented as a product with a bottom as needed. In addition, the outer shell 61 may not be movable in the axial direction (the up and down direction of the figure), but in this embodiment, it is movably provided in the up and down direction. Thus, the interval between the bottom of the first processing part (the outer end surface 12 of the first processing part 10) and the bottom 62 of the outer shell 61 (the inner surface 71 of the bottom 62) can be adjusted. Figure 1 In FIG. 1 , the state in which the housing 61 is raised is depicted on the left side of the center line, and the state in which the housing 61 is lowered is depicted on the right side.

[0182] The structure for moving up and down can be implemented by various deformations. If an example of a structure suitable for it is shown, the housing 61 includes a bottom 62 and a peripheral wall portion 63 extending upward from the periphery of the bottom 62, and a flange 67 protruding radially outward from the peripheral wall portion 63 is formed at the upper end of the peripheral wall portion 63. In this embodiment, the peripheral wall portion 63 includes a thin-walled portion 64 with a thin thickness, a thick-walled portion 65 with a thick thickness, and a boundary portion 66 as a boundary between the two, and includes an outflow portion 68 in the center of the bottom 62. In this embodiment, the thin-walled portion 64 and the thick-walled portion 65 are included according to the thickness of the peripheral wall portion 63, but the thickness of the peripheral wall portion 63 can be constant. In addition, the flange 67 can be formed only in a part of the circumference, and the flange 67 can also be not included in the housing 61. The outflow portion 68 is a discharge port for discharging the fluid flowing in the downstream side processing space 81 out of the system (outside the device).

[0183] The housing 61 is mounted on the second support 22, and the first processing member 10 and the second processing member 20 are accommodated in the housing 61. Figure 1As shown in , the second bracket 22 includes a protrusion 24 protruding radially outward from the outer circumference of the second bracket 22. When the outer circumference of the second bracket 22 is closely fitted with the inner circumference of the thin-walled portion 64 of the housing 61 and the lower surface of the protrusion 24 is abutted against the upper surface of the flange 67, the step portion 66 of the housing 61 abuts against the bottom surface of the outer circumference of the second bracket 22. Then, the housing 61 is fixed to the second bracket 22 in a liquid-tight and air-tight manner by fixing with a fixing tool such as a bolt and using a sealing mechanism such as an O-ring 72, and the first processing part 10 and the second processing part 20 are accommodated in the housing 61. As long as the housing 61 can accommodate the fluid discharged from the two processing surfaces 1 and 2 to the outside of the two processing parts 10 and 20, that is, the fluid discharged from the upstream side outlet 4, the housing 61 can be installed in a manner that a part of the outer circumference of the second bracket 22 is closely fitted with a part of the inner circumference of the thin-walled portion 64 of the housing 61, and the housing 61 is installed in a liquid-tight and air-tight manner on the second bracket 22.

[0184] (Downstream processing space)

[0185] As described above, by mounting the housing 61 on the second bracket 22, a downstream processing space 81 can be provided between (a) the outer peripheral surfaces 11, 21 of the first and second processing parts 10, 20 and the inner peripheral surface 70 of the peripheral wall portion 63 (thick wall portion 65) of the housing 61 and (b) the outer end surface 12 of the first processing part 10 and the inner surface 71 of the bottom 62 of the housing 61. The outer end surface 12 of the first processing part 10 is the bottom surface of the first processing part 10 (in other words, the surface on the opposite side of the first processing surface 1 in the axial direction).

[0186] In this embodiment, the first processing portion 10 that rotates integrally with the rotating first processing surface 1 is a rotating member, and the outer peripheral surface 11 and the outer end surface 12 of the first processing portion 10 constitute a part of the wall portion constituting the downstream processing space 81. In other words, the first processing portion 10 constitutes a cylindrical portion that is formed into a cylindrical shape as a whole, and the downstream processing space 81 is formed between the outer surface and the inner surface of the housing 61, and the downstream processing is performed between the outer surface and the inner surface.

[0187] In addition, the upstream flow outlet 4 opens in the downstream processing space 81, and the downstream processing space 81 can accommodate and retain the fluid discharged from the two processing surfaces 1 and 2 to the outside of the two processing parts 10 and 20. By forming such a structure, the downstream processing part including the downstream processing space 81 is arranged on the downstream side of the first and second processing surfaces 1 and 2 that define the upstream processing part, and the upstream processing space 4 is connected to the downstream processing space 81, so that the downstream processing can be continuously performed with the upstream processing.

[0188] And then, utilize the rotation of the first processing usefulness part 10 as a rotating member, can carry out downstream side processing.So-called downstream side processing, is the processing of the fluid carried out in the downstream side processing space 81, is the processing of the reaction after the upstream side processing, is to react to obtain the processing of the reaction product.In the upstream side processing in the upstream side processing space 4, mainly complete the mixing carried out by molecular diffusion, as the downstream side processing, can carry out the following processing.For example, can list the retention of fluid, the stirring of fluid, the mixing of fluid, heat treatment, pH regulation, slaking.For example, in the case of organic reaction, can carry out the completion of reaction by retention processing, can stir processing now.

[0189] The interval of the downstream processing space 81 also depends on the residence time of the fluid in the downstream processing space 81, and is preferably 2 to 30% of the outer diameter D of the first processing portion 10, and more preferably 3 to 20% of the outer diameter D of the first processing portion 10. For example, when the outer diameter of the first processing portion 10 is 100 mm, the interval of the downstream processing space 81 is preferably 2 to 30 mm, and more preferably 3 to 20 mm. The outer diameter D of the first processing portion 10 is the diameter of the first processing portion 10, excluding the protrusion 16 described later.

[0190] The shape of the housing 61 is not particularly limited as long as it includes a portion for performing downstream processing between the housing 61 and the first processing member 10. Fig.10 As shown in FIG. , the bottom 62 is formed into a conical funnel with a gradually decreasing diameter, and the lower end of the funnel may include an outflow portion, such as Figure 4 As shown in FIG. 6 , the bottom 62 of the housing 61 may be inclined toward the outflow portion 68 provided on the peripheral wall portion 63 .

[0191] (outflow part)

[0192] The outflow portion 68 is not limited to opening at the bottom 62, and may be opened at the peripheral wall portion 63, for example. In addition, a plurality of outflow portions 68 may be provided, and by providing a plurality of outflow portions 68, the inflow and outflow of the fluid that matches the residence time of the fluid in the downstream processing space 81 may be possible.

[0193] (Separate introduction section)

[0194] Furthermore, as described later Fig.12 As shown in the embodiment shown in (A), an introduction device (not shown) for supplying a fluid to the downstream processing space 81 is included, and the introduction part 69 can be arranged in the housing 61. Examples of substances contained in the fluid supplied from the introduction part 69 to the downstream processing space 81 include raw materials themselves, polymerization initiators, reaction terminators, polymerization terminators, pH adjusters, catalysts, coating agents, etc.

[0195] (Removable housing)

[0196] The housing 61 can be movably included in the vertical direction (rotational axis) by using a mounting position adjustment mechanism (not shown). By movably including the housing 61 in the vertical direction (rotational axis), the volume of the downstream processing space 81 can be increased or decreased, and the retention time of the fluid in the downstream processing space 81 can be controlled. The specific structure of the mounting position adjustment mechanism is not particularly limited, and can be appropriately selected and adopted: a conveying mechanism using screws, a fluid pressure drive mechanism such as air and oil pressure, etc., and a linear conveying means.

[0197] (Concave and convex for stirring)

[0198] The downstream side processing space 81 includes the concavoconvex for stirring, which can have the stirring function for the fluid. For example, stirring blades can be included in the outer peripheral surface 11 of the first processing portion 10 and the outer end surface 12 of the first processing portion 10. If stirring blades are included in the outer peripheral surface 11 of the first processing portion 10 and the outer end surface 12 of the first processing portion 10, the fluid processed on the upstream side can be stirred with the stirring blade by the rotation of the rotating shaft 31. With regard to the stirring blade, various forms of shearing force can be implemented as the fluid discharged from the outside of the two processing portions 10, 20 to the two processing portions 10, 20 as processed with faces 1, 2, for example, can be plate-like blades, screw-type blades, or can be blades processed into concave shapes. The shape of the stirring blade is optimally selected according to the discharge amount (the outflow amount from the outflow portion 68) and the shearing force that conform to the processing purpose.

[0199] As an example, in Figure 1 The half-section diagram shown on the right and Fig.11 As shown in , the outer end surface 12 of the first processing part 10 includes a plurality of groove-shaped recesses 15 extending radially from the outer side to the inner side. In the relatively narrow space between the cylindrical portion (specifically the first processing part 10) which is formed in a cylindrical shape as a whole and the cylindrical accommodating portion (specifically the outer shell 61) which is formed in a cylindrical shape as a whole to accommodate it, if the first processing part 10 rotates, the recess 15 functions as a stirring blade to discharge the fluid around the recess 15 to the outside of the first processing part 10, thereby stirring the fluid. The fluid discharged to the outside of the first processing part 10 hits the inner circumferential surface 70 of the peripheral wall portion 63 of the outer shell 61 and the inner surface 71 of the bottom 62 and bounces back, thereby further promoting the stirring action. As shown in FIG. Figure 4 As shown in FIG. 1 , a recess 15 may be provided on the outer peripheral surface 11 of the first processing member 10 .

[0200] (Labyrinth seal mechanism)

[0201] The wall portions constituting the downstream processing space 81, such as the outer peripheral surface 11 of the first processing portion 10, the outer end surface 12, the inner peripheral surface 70 of the peripheral wall portion 63 of the housing 61, and the inner surface 71 of the bottom 62, may include a labyrinth seal mechanism for extending the retention time of the fluid in the downstream processing space 81. The so-called labyrinth seal is a seal that provides resistance to the flow of the fluid and minimizes leakage while having a gap in the radial direction or the axial direction, and refers to a labyrinth formed by the knife-like structure of the peripheral portion and the contact points, which successively causes the expansion of the passing fluid.

[0202] For example, Figure 4 As shown in the figure, as a protrusion for serving as a labyrinth seal mechanism, the following form can be shown: it includes a protrusion 73 protruding radially inward from the inner peripheral surface 70 of the peripheral wall portion 63 of the housing 61 toward the downstream processing space 81. The protrusion 73 is formed in a circular shape when viewed from a plane, and one or more protrusions can be set in a concentric circle shape.

[0203] In this embodiment, the protrusion 73 is narrowed from its base end to the top end. There is a small gap of about 0.01mm to 1mm between the top end of the protrusion 73 and the outer peripheral surface 11 of the first processing part 10, which also depends on the viscosity of the processed material. In addition, the bottom 62 of the housing 61 can be tilted toward the outflow portion 68 provided on the peripheral wall portion 63.

[0204] As another embodiment, Figure 5 As shown in the figure, the following form can be shown: it includes a plurality of protrusions 16 protruding radially outward from the outer peripheral surface 11 of the first processing part 10 toward the downstream processing space 81. In this embodiment, the protrusions 16 are narrowed from their base ends to the top ends. There is a small gap of about 0.01mm to 1mm between the top ends of the protrusions 16 and the inner peripheral surface 70 of the peripheral wall portion 63 (wall thickness portion 65) of the housing 61.

[0205] By setting the gap to be small in this way, the fluid becomes laminar when passing through it, and it becomes difficult to pass through. As a result, it takes time to pass through the small gap, and the fluid stays in a relatively wide space on the upstream side of the small gap.

[0206] In other words, the labyrinth seal mechanism used in the fluid handling device F used in the implementation of the present invention is not a completely leak-free seal mechanism, but can be said to be a mechanism that retains the fluid in the space on its upstream side while slowly leaking the fluid to the downstream side.

[0207] The first processing part 10 is not necessarily composed of one member, but may be formed by assembling a plurality of members in one piece. In this way, it is easy to process and form projections and depressions in the first processing part 10 formed in a cylindrical shape as a whole by a plurality of members.

[0208] Specifically, as another embodiment, it is possible to cite Figure 6 The embodiment shown in. In this embodiment, the following form can be shown: the outer end surface 12 of the first processing part 10 is provided with a bottom member 91, and a plurality of protrusions 94 protruding downward from the bottom 93 of the bottom member 91 to the downstream processing space 81. The bottom member 91 is installed on the first processing part 10 in a manner that rotates co-existently with the first processing part 10. In this embodiment, a plurality of protrusions 94 narrow from its base end to the top. There is a small gap of about 0.01mm to 1mm between the top of the protrusion 94 and the inner surface 71 of the bottom 62 of the shell 61. In this embodiment, the downstream processing space 81 can be set between the outer peripheral surfaces 11, 21, 92 of the first and second processing parts 10, 20 and the bottom member 91 and the inner peripheral surface 70 of the peripheral wall portion 63 (wall thickness portion 65) of the shell 61 and between the bottom 93 of the bottom member 91 and the inner surface 71 of the bottom 62 of the shell 61 (b). In this embodiment, the first processing part 10 and the bottom member 91 are rotating members, and the outer peripheral surface 11 of the first processing part 10 and the outer peripheral surface 92 and the bottom 93 of the bottom member 91 constitute a part of the wall portion constituting the downstream processing space 81. In this embodiment, the bottom member 91 is manufactured as a component independent of the first processing part 10, and is mounted on the first processing part 10 in a manner that rotates integrally with the first processing part 10, but the bottom member 91 can be directly processed from the first processing part 10, or can be configured as a completely integral body with the first processing part 10. In addition, as Figure 6 As shown in FIG. 8 , the depth of the downstream processing space 81 can be made deeper from the radially outer side to the inner side by making the inner surface 71 of the bottom 62 of the housing 61 into a conical funnel shape.

[0209] As another embodiment, Figure 7 As shown in FIG. 1 , in addition to the plurality of protrusions 94, a step may be provided on the inner surface 71 of the bottom 62 of the housing 61 so that the depth of the processing space 81 increases from the radially outer side toward the inner side, the downstream side. A small gap of about 0.01 mm to 1 mm is provided between the top of the protrusion 94 and the inner surface 71 of the bottom 62 of the housing 61.

[0210] As another embodiment, Fig.10As shown in, the following form can be shown: including a bottom member 91 formed in a manner that the outer end surface 12 of the first processing part 10 and the outer peripheral surface 11 of the first processing part 10 are substantially covered, and a plurality of protrusions 94 protruding downward from the bottom 93 of the bottom member 91 toward the downstream processing space 81 and a plurality of protrusions 95 protruding radially outward from the outer peripheral surface 92 of the bottom member 91 toward the downstream processing space 81. The bottom member 91 is mounted on the first processing part 10 in a manner that rotates co-existing with the first processing part 10. In this embodiment, a plurality of protrusions 94, 95 narrow from their base end to the top. There is a small gap of about 0.01mm to 1mm between the top of the protrusion 95 and the inner peripheral surface 70 of the peripheral wall portion 63 of the housing 61, and there is a small gap of about 0.01mm to 1mm between the top of the protrusion 94 and the inner surface 71 of the bottom 62 of the housing 61. In this embodiment, the first processing portion 10 and the bottom member 91 are cylindrical portions that are formed into a cylindrical shape as a whole, and the space between them and the cylindrical housing portion (housing 61) that houses them constitutes the downstream side processing space 81.

[0211] The outer peripheral surface 11 of the first processing portion 10 and the outer peripheral surface 92 and the lower surface 93 of the bottom member 91 constitute a part of the wall portion constituting the downstream processing space 81 .

[0212] Among them, use Figure 5 The specific structure and function of the labyrinth seal mechanism will be described.

[0213] The downstream processing space 81 includes a sealing portion 84 and a reserve portion 83. The sealing portion 84 is a narrow space formed between the top of the protrusion 16 and the inner peripheral surface 70 of the peripheral wall portion 63 (thick wall portion 65) of the housing 61, and the reserve portion 83 is a space formed between the outer peripheral surface 11 of the first processing portion 10 without the protrusion 16 and the inner peripheral surface 70 of the peripheral wall portion 63 (thick wall portion 65) of the housing 61, and is arranged on the upstream side of the sealing portion 84, and is a space wider than the sealing portion 84.

[0214] The sealing portion 84 and the reserve portion 83 may be a set, but preferably, a plurality of sets are arranged continuously from upstream to downstream of the flow of the fluid.

[0215] The downstream processing space 81 is provided with a receiving portion 82 on the outer peripheral side of the upstream flow outlet 4. The receiving portion 82 is the most upstream space in the downstream processing space 81, is a space wider than the sealing portion 84, and can receive the fluid discharged from the upstream flow outlet 4 opened in the downstream processing space 81 without resistance. It can also serve as a reserve portion 83 arranged at the most upstream of the flow of the fluid.

[0216] The fluid discharged from the upstream flow outlet 4 is first received by the receiving portion 82 and accumulated. If the receiving portion 82 is filled with the fluid, the fluid leaks to the sealing portion 84 arranged on the downstream side of the receiving portion 82. If the sealing portion 84 is filled with the fluid, the fluid leaks to the reserve portion 83 arranged on the downstream side of the sealing portion 84. The fluid is received by the reserve portion 83 and accumulated. If the reserve portion 83 is filled with the fluid, the fluid leaks to the sealing portion 84 arranged on the downstream side of the reserve portion 83. Since a plurality of sets of sealing portions 84 and reserve portions 83 are continuously arranged in the downstream processing space 81, the movement of these fluids is repeated.

[0217] On the other hand, the first processing member 10 having the protrusion 16 on the outer peripheral surface 11 rotates. When the fluid fills each space of the receiving portion 82, the sealing portion 84, and the reserve portion 83, the centrifugal force acts due to the rotation of the first processing member 10, and for example, the fluid in the receiving portion 82 is not easy to leak to the sealing portion 84 arranged on the downstream side of the receiving portion 82. In particular, in the sealing portion 84 which is a narrow space, the fluid is not easy to leak to the reserve portion 83 arranged on the downstream side of the sealing portion 84 due to the rotation of the first processing member 10.

[0218] In this way, by rotating the first processing part 10 which is a rotating component that is a part of the wall portion constituting the downstream processing space 81, a plurality of groups of a receiving part 82, a sealing part 82 which is a narrow sealed space, and a reserve part 83 which is a retention space wider than the sealing part are continuously arranged in the downstream processing space 81, so that the leakage amount of the fluid discharged from the upstream flow outlet 4 to the downstream processing space 81 in the sealing part 84 is minimized, and the fluid leaked from the sealing part 84 will be filled and accumulated in the reserve part 83 arranged on the downstream side of the sealing part 84. As a result, the retention time of the fluid in the downstream processing space 81 is extended through the labyrinth seal.

[0219] In particular, by setting up multiple sets of reserve parts 83 and sealing parts 84, the retention time of the fluid in the entire device is averaged. For example, if a single reserve part 83 is used to fill the total storage capacity of the predetermined fluid in the entire device, even if the retention time of the single reserve part 83 from an empty state to its full state is constant, and it is continuously operated after being filled, it is difficult to replace all the fluids filling the single reserve part 83 with new fluids flowing in from the upstream. A part of the fluid flows out to the downstream before reaching the above-mentioned retention time, and the other part of the fluid is always retained in the reserve part 83. Therefore, in terms of the control of the retention time, the possibility of accidental control increases, and as a result, the proportion of the fluid flowing out to the downstream before reaching the predetermined specified retention time is also accidental. In the case of setting up multiple sets of reserve parts 83 and sealing parts 84, even if the retention time in each reserve part 83 is accidental, by increasing the number of sets, the retention time of each fluid is averaged, which becomes advantageous in terms of stable control of the retention time.

[0220] The retention time of the fluid in the downstream processing space 81 can be adjusted by adjusting the volume of the downstream processing space 81, the interval of the downstream processing space 81, its length, the number of groups of the sealing portion 84 and the reserve portion 83, the first processing portion 10, the rotation speed of the rotating member such as the bottom member 91, and the amount of fluid (the first fluid and the second fluid) introduced into the fluid processing device F. When the retention time is desired to be adjusted during the operation of the fluid processing device F, the rotation speed of the rotating member such as the first processing portion 10 and the bottom member 91 and the amount of fluid (the first fluid and the second fluid) introduced into the fluid processing device F are adjusted. By adjusting these, the target retention time is achieved according to the product.

[0221] use Figure 5 The specific structure and function of the labyrinth seal mechanism are described. In other embodiments, the functions of the rotating member (the first processing part 10, the bottom member 91), the receiving part 82, the storage part 83, and the sealing part 84 are also the same, and the same effect is exerted. The shape of the protrusions 16, 73, 94, and 95 is as long as the shape of the sealing part 84 that can form a narrow space between the top and the cylindrical part (the first processing part 10, the bottom member 91) or the cylindrical receiving part (housing 61) can be used. The length of the protrusion and the width of the top of the protrusion can be appropriately set within the range required for obtaining labyrinth sealing.

[0222] Furthermore, the fluid filling the sealing portion 84, which is a narrow space, becomes a laminar flow, thereby improving the sealing effect. On the other hand, the fluid accumulated in the receiving portion 82 and the reserve portion 83, which are relatively wide spaces, becomes a turbulent flow, thereby applying a stirring effect to the fluid during its retention.

[0223] Secondly, refer to Figure 12-15 , a modified example of the downstream processing unit is described. In the following description, the basic structure and function of the fluid processing device F are also the same, and the description is centered on the different parts. For the aspects not described, the description of the above-mentioned embodiment is directly applicable. In all the modified examples, a labyrinth sealing mechanism is provided to exert its function.

[0224] The downstream side treatment section has a cylindrical flow path extending in the axial direction of the rotating member in at least a part of the downstream side treatment space 81, which is advantageous in allowing the reaction as the downstream side treatment to proceed for a long period of time.

[0225] Fig.12 (A) In order to extend at least the first processing member 10 in the axial direction, the cylindrical flow path between the outer peripheral surface 19 thereof and the inner peripheral surface 70 of the peripheral wall portion 63 of the housing 61 is extended longer than in the previous embodiment.

[0226] In this embodiment, the first processing member 10 is formed as a cylindrical portion. Fig.12 As shown in (A), it has a top portion 17, and the upper surface thereof is the first processing surface 1.

[0227] The first processing portion 10 is provided with an extension portion 18 extending in the axial direction (lower in the figure), and the outer peripheral surface 19 thereof is provided with a protrusion 16 protruding radially outward toward the downstream processing space 81. The protrusion 16 is narrowed from its base end to its top end. The outer peripheral surface 19 of the extension portion 18 can be as follows Fig.12 (B) as flat as shown, or as Fig.12 (C). Fig.12 As shown in (C), the outer peripheral surface 19 of the extension portion 18 is curved, so that it is possible to prevent the product from being attached to the outer peripheral surface 19 of the extension portion 18 and the protrusion 16 .

[0228] A small gap of about 0.01 mm to 1 mm exists between the tip of the protrusion 16 and the inner peripheral surface 70 of the peripheral wall 63 of the housing 61 described later, thereby constituting a seal 84. A relatively wide reserve 83 is formed upstream of the seal 84.

[0229] (Regarding the rotation of the processing part)

[0230] In this embodiment, the first processing usefulness part 10 installed on the rotating shaft 31 rotates relative to the second processing usefulness part 20. Therefore, the first processing usefulness part 10 is a rotating member. The rotating shaft 31 is arranged in the hollow through which the first processing usefulness part 10 is penetrated, and a fixing tool 32 such as a screw is fixed to the center of the top 17 of the first processing usefulness part 10. The base end of the rotating shaft 31 is connected with the driving shaft of the rotating drive mechanism 24, and the driving force of the rotating drive mechanism 24 is conveyed to the first processing usefulness part 10, so that the first processing usefulness part 10 is rotated. In order to smoothly support the rotation, the rotating support part 34 is arranged on its periphery, and the rotating shaft 31 is rotatably supported on its top end side and base end side.

[0231] In detail, the rotation support part 34 includes a cylindrical shaft part 35 and a cylindrical table part 36 below the shaft part 35 with a larger diameter than the shaft part 35, and a through hole 37 is provided at the center for mounting the rotation shaft 31. The shaft part 35 is arranged inside the extension part 18 of the first processing part 10, and the rotation shaft 31 is mounted in the through hole 37 to support the rotation shaft 31.

[0232] The interval between two processing faces 1,2 is the same as described above about the upstream side treatment unit, when good nanoparticles are separated out, preferably below 1mm. But, even if the fluid treatment that does not make nanoparticles separate out, or make particulate separate out, its particle size is also larger when carrying out organic reaction etc., can be adjusted to below 5mm, for example 1 μ m to 5mm left and right intervals to implement. Under the situation of relatively large interval, even if the interval setting of the balance of the force of adopting the above-mentioned contact pressure and separating force is beyond, also can be implemented suitably, even if it is the structure of mechanical gap setting, also can be implemented. Therefore in all embodiments described above, it should be understood that the interval adjustment between two processing faces 1,2 can be implemented with the structure of mechanical gap setting sometimes.

[0233] In the implementation of the structure with the mechanical gap setting, the two processing surfaces 1 and 2 are not close to or separated from each other, but can be implemented as a structure with a fixed gap.

[0234] (Mechanical clearance adjustment mechanism)

[0235] Taking the mechanical gap setting structure as an example, although not shown in the figure, it can be constructed in the following manner: a sensor that can measure the gap between the two processing surfaces 1 and 2 is used to measure, and based on the measurement result, a gap adjustment mechanism is used to move the second processing portion 20 in the axial direction. There is no particular limitation on the specific structure of the gap adjustment mechanism, and a linear conveying means such as a conveying mechanism using a screw, a fluid pressure drive mechanism such as air or oil pressure can be appropriately selected.

[0236] In this embodiment, the second processing member 20 is attached to the center of the annular second holder 22 using a sealing mechanism such as an O-ring 26 .

[0237] In this embodiment, the first introduction part d1 is a flow path that axially penetrates the central part 41 disposed in the center of the annular second processing member 20, and its downstream end is connected to the introduction space 51. The introduction space 51 is a space defined by the lower surface of the central part 41 and the first processing surface 1.

[0238] In this embodiment, the housing 61 has a cylindrical shape.

[0239] The housing 61 is mounted on the second support 22 and the rotating support part 34, and the first processing part 10 and the second processing part 20 are accommodated in the housing 61. First, the housing 61 is mounted on the second support 22 in a liquid-tight and air-tight manner by fixing the lower surface of the second support 22 and the upper surface of the cylindrical peripheral wall part 63 of the housing 61 with a fixing tool such as a bolt and using a sealing mechanism such as an O-ring. Next, the upper surface of the table 36 of the rotating support part 34 and the lower surface of the housing 61 are fixed with a fixing tool such as a bolt and using a sealing mechanism such as an O-ring, and the housing 61 is mounted on the rotating support part 34 in a liquid-tight and air-tight manner, and the lower surface of the extension part 18 of the first processing part 10 and the upper surface of the table 36 are sealed with the sealing member 38.

[0240] In this way, by installing the overall substantially cylindrical housing 61 on the second support 22 and the rotating support portion 34, it is possible to provide a downstream processing space 81 as a cylindrical space between (a) the outer circumferential surface 21 of the second processing unit 20 and the inner circumferential surface 70 of the peripheral wall portion 63 of the housing 61 and (b) the outer circumferential surface 19 of the extension 18 of the first processing unit 10 and the inner circumferential surface 70 of the peripheral wall portion 63 of the housing 61. In this embodiment, the extension 18 of the first processing unit 10 becomes a cylindrical portion, and the peripheral wall portion 63 of the housing 61 becomes a cylindrical receiving portion. The extension 18 of the first processing unit 10 as a cylindrical portion rotates relative to the peripheral wall portion 63 of the housing 61. On the contrary, the cylindrical portion can be fixed and the cylindrical receiving portion of the other party can be rotated to implement, or both can be rotated together, but both must be rotated relatively.

[0241] The peripheral wall portion 63 of the housing 61 is provided with an outflow portion 68 and an introduction portion 69. The introduction portion 69 is used to supply the fluid to the downstream processing space 81 from a path different from the fluid supplied from the upstream outlet 4 to the downstream processing space 81. The fluid from the introduction portion 69 and the fluid from the upstream outlet 4 may be different or the same when the fluid itself is compared.

[0242] The introduction portion 69 may also be used as an exhaust port for exhausting the gas generated in the upstream side process and / or the downstream side process, or a separate exhaust port may be provided.

[0243] Therefore, the fluid flowing out from the upstream side outlet 4 passes through the inlet portion 69 as needed, while the fluid is introduced and the gas and other fluids are discharged, and is discharged from the outflow portion 68, thereby completing the downstream side processing in the restricted downstream side processing space 81.

[0244] Fig.13 Another example is shown in which the bottom member 91 and the first processing member 10 are driven independently.

[0245] In this embodiment, the first processing member 10 is a thin cylindrical body, that is, a disk body, and has a flange portion on its upper portion for receiving the bottom member 91. The upper surface of the first processing member 10 is a first processing surface 1.

[0246] In this embodiment, the bottom member 91 is cylindrical and has a protrusion 95 protruding radially outward from its outer peripheral surface 98 toward the downstream processing space 81. The protrusion 95 is narrowed from its base end toward its tip end.

[0247] There is a small gap of about 0.01 mm to 1 mm between the tip of the protrusion 95 and the inner peripheral surface 70 of the peripheral wall portion 63 of the housing 61 .

[0248] The lower surface of the flange portion of the first processing surface 10 and the upper surface of the bottom member 91 are sealed using a sealing member, so that the first processing surface 10 and the bottom member 91 are attached to each other in a liquid-tight and air-tight manner.

[0249] The bottom member 91 is rotated by a rotational drive mechanism M1 such as a motor, which is different from the rotational drive mechanism M used to rotate the first processing portion 10. As an example, the bottom member 91 is rotated by using a rotational drive mechanism M1 via a rotational force transmission means such as a gear 101 or a speed change means. By forming such a structure, the first processing portion 10 rotates concentrically with the bottom member 91, and the bottom member 91 and the first processing portion 10 are driven independently. This is advantageous when the bottom member 91 is desired to be rotated at a different rotation speed from the first processing portion 10.

[0250] The rotation support portion 34 attaches the rotation shaft 31 to the through hole 37 to axially support the rotation shaft 31 , and supports the bottom member 91 on the outer peripheral side of the shaft portion 35 using a bearing such as a bearing.

[0251] Fig.14Another example is shown, which can be shown as follows: a protrusion 73 protruding radially inward from the inner circumferential surface 70 of the peripheral wall portion 63 of the housing 61 as a cylindrical shape toward the downstream processing space 81, and a protrusion 95 protruding radially outward from the outer circumferential surface 98 of the peripheral wall portion 97 of the bottom member 91 as a cylindrical portion toward the downstream processing space 81, and the protrusion 95 is arranged in a manner that the protrusion 95 is accommodated between the protrusions 73 and the protrusions 73, and the protrusions 73 and the protrusions 95 are accommodated between the protrusions 95 and the protrusions 95. The protrusions 73 and 95 are narrowed from their base ends to their top ends. In this embodiment, the protrusion 95 of the bottom member 91 and the inner circumferential surface 70 of the peripheral wall portion 63 of the housing 61 are formed into a sealing portion 84. In addition, the protrusion 73 of the housing 61 and the outer circumferential surface 98 of the peripheral wall portion 97 of the bottom member 91 can be formed into a sealing portion 84. Furthermore, the bottom member 91 is in a cylindrical shape having a top portion 99 as a cylindrical portion that is formed in a cylindrical shape as a whole.

[0252] There is a small gap of about 0.01 mm to 1 mm between the tip of the protrusion 95 and the inner peripheral surface 70 of the peripheral wall portion 63 of the housing 61 .

[0253] Fig.15 In this example, Fig.15 The lower side is the upstream side, Fig.15 The upper side is the downstream side, the second processing part 20 is arranged below the first processing part 10, and the downstream processing part is provided above the first and second processing surfaces 1 and 2 that define the upstream processing part. For example, it is suitable for the following situations: when an emulsion polymerization reaction or a suspension polymerization reaction is carried out, a suitable emulsified state or a suspended state is formed in the upstream processing part, and the gas generated in the polymerization reaction is discharged to the outside of the system in the downstream processing part. In addition, the fluid processing device F according to the present invention can be implemented regardless of the vertical, horizontal, or horizontal arrangement when it is set.

[0254] In this example, the protrusion 73 of the housing 61 and the protrusion 95 of the bottom member 91 are arranged to face each other, and the bottom member 91 and the first processing member 10 are driven independently, and the housing 61 is movable in the vertical direction (rotational axial direction).

[0255] More specifically, the housing 61 is cylindrical with a top, and has a plurality of protrusions 73 protruding radially inward from the inner circumferential surface 70 of the peripheral wall portion 63 thereof toward the downstream processing space 81, and the protrusions 73 form a circular shape when viewed from a plane. The bottom member 91 is a cylindrical portion formed as a whole in a cylindrical shape, and is cylindrical with a top 99, and has a plurality of protrusions 95 protruding radially outward from the outer circumferential surface 98 of the peripheral wall portion 97 thereof toward the downstream processing space 81, and form a circular shape when viewed from a plane. The protrusions 73 of the housing 61 and the protrusions 95 of the bottom member 91 are arranged opposite to each other. Here, the so-called arrangement of the protrusions 73 and the protrusions 95 opposite to each other means that the protrusions 73 and the protrusions 95 are close to or overlapped in the radial direction.

[0256] In this embodiment, the housing 61 is provided to be movable in the vertical direction by using a mounting position adjustment mechanism (not shown). By providing the housing 61 to be movable in the vertical direction, the width of the sealing portion 84 can be adjusted. When it is desired to extract the gas generated in the reaction or to process a highly viscous process material, it is advantageous to be able to adjust the width of the sealing portion 84 to have a relatively wide sealing portion 84. Fig.15 In the figure, the state of the housing 61 being lowered is depicted on the left side of the center line, and the state of the housing 61 being raised is depicted on the right side. The specific structure of the mounting position adjustment mechanism is not particularly limited, and a linear conveying means such as a conveying mechanism using screws, air, oil pressure or other fluid pressure driving mechanism can be appropriately selected.

[0257] In this embodiment, the temperature of the fluid flowing in the downstream processing space 81 is adjusted by assembling a temperature adjustment mechanism T in the housing 61 to cool or heat it, thereby adjusting the temperature. As the temperature adjustment mechanism T, the housing 61 has a temperature adjustment jacket for flowing various heat media including ice water and steam. One temperature adjustment jacket may be assembled in the housing 61, or Fig.15 As shown in Fig.15 In the embodiment of the present invention, the temperature regulating jackets (two of which are T1 and T2) are assembled into the housing 61. In addition, when multiple temperature regulating jackets are used, these jackets can be adjusted to the same temperature or different temperatures. By adjusting multiple temperature jackets to different temperatures, the temperature of the fluid flowing in the downstream processing space 81 can be adjusted according to the progress of the downstream processing. A cooling element or a heating element can also be installed in at least one of the components instead of the temperature regulating jacket.

[0258] (When shear force is applied to the fluid)

[0259] As another embodiment that is not an example of a labyrinth seal mechanism, Figure 8As shown in , the following form can be shown: the outer end surface 12 of the first processing part 10 is provided with a bottom member 91, and a comb-tooth-shaped protrusion 96 protruding downward from the bottom 93 of the bottom member 91 toward the downstream processing space 81, and a comb-tooth-shaped protrusion 74 protruding upward from the inner surface 71 of the bottom 62 of the housing 61 toward the downstream processing space 81, and the protrusion 74 is accommodated between the protrusions 96 and the protrusions 96, and the protrusions 96 are accommodated between the protrusions 74 and the protrusions 74. The bottom member 91 is mounted on the first processing part 10 in a manner that rotates co-existing with the first processing part 10. By such a configuration, a shear force can be imparted to the fluid passing between the protrusions 96 and the protrusions 74. In more detail, the comb-tooth-shaped protrusion 96 provided on the bottom member 91 rotates integrally with the first processing portion 10, and when the rotating comb-tooth-shaped protrusion 96 passes between the comb-tooth-shaped protrusion 74 and the protrusion 74, a shear force can be applied to the processed fluid in the tiny gap between the protrusion 96 and the protrusion 74. In order to efficiently apply a shear force to the fluid passing between the protrusion 96 and the protrusion 74, the gap between the protrusion 96 and the protrusion 74 is preferably about 0.1 mm to 1 mm. In addition, there is a tiny gap of about 0.5 mm to 2 mm between the top of the comb-tooth-shaped protrusion 96 and the inner surface 71 of the bottom 62 of the outer shell 61, and there is a tiny gap of about 0.5 mm to 2 mm between the top of the comb-tooth-shaped protrusion 74 and the bottom 93 of the bottom member 91. For the comb-tooth-shaped protrusions 96 and 74, at Figure 8 In , the left side of the center line shows the overlap of the two, and the right side of the center line shows the non-overlap of the two. Fig. 9 , a pair of comb-shaped protrusions 96a and comb-shaped protrusions 74a disposed on the outermost radial side are removed. For ease of understanding, only the inner surface 71 of the bottom 62 and the comb-shaped protrusions 74a are depicted for the housing 61.

[0260] (Movement of the fluid being processed)

[0261] The fluid subjected to the upstream side treatment is discharged from the downstream end of the upstream side treatment space 3. The fluid discharged from the downstream end of the upstream side treatment space 3 is contained in the housing 61, reacts as the downstream side treatment while flowing in the downstream side treatment space 81 to obtain a reaction product, and is discharged from the outflow portion 68 to the outside of the system (outside the device).

[0262] (Centrifugal force)

[0263] The first processing part 10 and the bottom member 91 as the rotating member rotate, so when the fluid flowing in the downstream processing space 81 fills the downstream processing space 81, centrifugal force acts in the radially outward direction. The residence time of the fluid in the downstream processing space 81 is controlled by the action of the centrifugal force.

[0264] Specifically, for example, by adjusting the rotation speed of the first processing part 10 and the bottom member 91, the centrifugal force acting on the fluid flowing in the downstream processing space 81 is adjusted to control the residence time of the fluid in the downstream processing space 81. In order to control the residence time, it is appropriate that the peripheral speed at the periphery of the first processing part 10 is 0.5 to 35 m / sec. The periphery of the first processing part 10 does not contain a protrusion 16. The rotation speed of the rotating member can be set by both sides of the upstream side processing and the downstream side processing. For example, the rotation speed of the first processing part 10 in the downstream side processing can be set by the range of the rotation speed of the first processing part 10 for the upstream side processing under the laminar flow condition in the upstream side processing space 3.

[0265] In addition, when the adjustment of the residence time is concerned, the volume of the downstream side processing space 81 can be increased by providing a labyrinth sealing mechanism in the downstream side processing section, or the discharge speed of the fluid subjected to the downstream side treatment to the outside of the system from the outflow section 68 is slowed down, thereby extending the residence time of the fluid in the downstream side processing space 81. The residence time of the fluid in the downstream side processing space 81 is preferably about 5 to 60 minutes, more preferably about 10 to 30 minutes. In the case where the fluid treatment is a polymerization reaction, etc., it is sometimes necessary to retain for several hours. If the introduction amount of the raw material, that is, the introduction speed (introduction amount per unit time) of the first fluid and the second fluid into the upstream side processing space 3 is adjusted, the relative rotation speed of the first and second processing parts becomes constant, and the residence time can be adjusted even without replacing the parts.

[0266] (Material)

[0267] The housing 61 can be formed by a single member or a combination of multiple members. As for its material, in addition to various metals, ceramics such as silicon carbide (SiC), sintered metals, wear-resistant steel, sapphire, and products obtained by hardening metals, products obtained by lining, coating, plating, etc. on hard materials, etc., which are the same materials as the first and second processing parts 10 and 20, can be used. In addition, in the bottom member 91, metals such as stainless steel and titanium, resins such as polytetrafluoroethylene (PTFE) and polyetheretherketone (PEEK) can be selected and used.

[0268] (Temperature adjustment mechanism)

[0269] A temperature control mechanism T may be assembled in at least one of the first processing portion 10, the bottom member 91, and the housing 61 to adjust the temperature of the member by cooling or heating. This allows the temperature of the fluid flowing in the downstream processing space 81 to be adjusted. Figure 1 , Figure 4-8 , Fig.10 , Figure 12-15 In the embodiment shown in , a temperature regulating jacket for flowing various heat media including ice water and steam is provided in the housing 61 as the temperature regulating mechanism T. Instead of the heat media, a cooling element or a heating element may be installed in at least one of the components.

[0270] (microwave)

[0271] At least one of the first processing part 10, the bottom member 91, and the outer shell 61 includes a microwave generating device such as a magnetron for irradiating microwaves as a microwave irradiation mechanism, which can heat the fluid flowing in the downstream processing space 81 and promote chemical reactions.

[0272] (Pressure adjustment mechanism)

[0273] In order to adjust the pressure of the fluid flowing in the downstream processing space 81, a pressure regulating mechanism may be provided in the first processing unit 10, the bottom member 91, and the housing 61. For example, various pumps can be used as the pressure regulating mechanism. Negative pressure can be applied to the downstream processing space 81. Specifically, nitrogen can be used to pressurize the downstream processing space 81, and a vacuum pump can be used to control the vacuum degree of the downstream processing space 81.

[0274] (Control of processing characteristics)

[0275] By using the fluid processing device of the present invention to perform upstream side processing and downstream side processing, it is possible to adjust reaction conditions such as temperature conditions, pressure conditions, stirring conditions, and reaction time of the reaction field. Therefore, for example, it is possible to control processing characteristics such as the reaction rate of the raw material, the selectivity, and the yield of the product. The reaction rate of the raw material is the ratio of the raw material consumed by the reaction relative to the supplied raw material, the selectivity is the ratio of the raw material consumed by the reaction to the production of the target product, and the yield of the product is the product of the reaction rate and the selectivity.

[0276] (under laminar flow and non-laminar flow conditions)

[0277] In the present invention, it is preferred to carry out the upstream side treatment in the upstream side treatment space 3 under laminar flow conditions, and to carry out the downstream side treatment in the downstream side treatment space 81 under non-laminar flow conditions. It is preferred that for the first fluid that becomes a thin film fluid in the upstream side treatment space 3, the second fluid is merged under laminar flow conditions, and molecular diffusion is used to carry out homogeneous mixing of the processed fluid under laminar flow conditions. The fluid discharged from the downstream end of the upstream side treatment space 3 is liberated from the coercion generated by the two treatment surfaces 1 and 2, and discharged to the wider downstream side treatment space 81. By giving shear force to the fluid discharged from the downstream end of the upstream side treatment space 3 to the downstream side treatment space 81, or increasing the characteristic length L recorded in the above-mentioned formula (2), etc. to become a turbulent state, the frequency of contact or collision between molecules in the fluid is increased, thereby also being able to obtain a product. For example, after an organic reaction is used in the upstream side treatment space 3 to generate organic pigment particles, stirring under turbulent conditions is useful when the pigment particles are dispersed. In addition, under the turbulent flow condition, it can be expected that the heat exchange rate between the heat medium flowing through the temperature adjustment mechanism T and the fluid flowing through the downstream processing space 81 will increase.

[0278] By using the fluid treatment device F, the upstream side treatment is carried out under laminar flow conditions, so that the reaction substances contained in the treated fluid can be immediately mixed at the molecular level by molecular diffusion in the upstream side treatment section. Moreover, by using the fluid treatment device F, the downstream side treatment is carried out after the upstream side treatment, so that the treated fluid that has been treated on the upstream side under laminar flow conditions can be kept for a long time while maintaining the reaction conditions required for the reaction in the downstream side treatment section, such as the temperature conditions, pressure conditions, and stirring conditions of the reaction field. Therefore, the fluid treatment device F is a device suitable for carrying out organic reactions such as addition reactions, polymerization reactions, condensation reactions, and solvent decompositions that are difficult to complete in a short time.

[0279] In addition, by increasing the rotation speed of the first processing part 10 to increase the Reynolds number, a shear force can be applied to the processed fluid flowing in the upstream processing space. For example, when the fluid processing device F is used for emulsion polymerization, the emulsification process is performed in the upstream processing part, and the polymerization process is performed in the downstream processing part. By applying a shear force to the incompatible processed fluids flowing in the upstream processing space, it can be emulsified efficiently.

[0280] (About continuous stirring device F)

[0281] Regarding the continuous stirring device F suitable for implementing the method for producing an organic compound according to the present invention, refer to Figures 16 to 20 This embodiment removes the upstream processing section of the above-mentioned fluid processing device F, and performs downstream processing only with the downstream processing section. The downstream processing is processing of an organic reaction.

[0282] exist Fig.16 (A) Fig. 20 In (A), the top and bottom of the figure correspond to the top and bottom of the device. In the present invention, up and down, front and back, left and right only represent relative positional relationships and do not limit absolute positions. Fig.17 In (A), R indicates the direction of rotation.

[0283] The continuous stirring device F includes a processing portion including an outer wall 161 and an inner wall 110 disposed inside the outer wall 161. The outer wall 161 is concentric with the inner wall 110, and the processing portion includes a processing space 181 formed between the outer wall 161 and the inner wall 110. At least one of the outer wall 161 and the inner wall 110 rotates relative to the other.

[0284] (outer wall)

[0285] The outer wall 161 is as Fig.16 As shown in (A), the overall shape is cylindrical, and it can be implemented as a structure with a bottom and a top as needed. In this embodiment, the outer wall 161 is a cylindrical wall 163, and flanges 167 protruding radially outward from the cylindrical wall 163 are formed at both ends. The top 176 or the bottom 162, which is a member independent of the outer wall 161, is fixed to the flanges 167, 167, so that the two ends of the cylindrical wall 163 are closed.

[0286] (Inner wall)

[0287] The inner wall 110 is Fig.16 In this embodiment, the inner wall 110 is cylindrical and includes a plurality of protrusions 116 protruding radially outward from its outer peripheral surface 111. The protrusions 116 are formed in a circular shape in a plan view and are arranged at predetermined intervals in the axial direction. Fig.16 (B) is a diagram for explaining the main parts of the continuous stirring device F, which is a perspective view showing the arrangement of the inner wall 110, the protrusion 116, and the stirring blade 211 described later, and depicts a state without the other protrusion 116 above. Fig.16 As shown in (B), the protrusion 116 is in the shape of a disk having a uniform thickness throughout. The thickness of the protrusion 116 may vary in the radial direction.

[0288] Instead of the protrusion 116 or together with the protrusion 116, a protrusion protruding radially inward from the inner circumferential surface 170 of the cylindrical wall 163 of the outer wall 161 can be provided, or a protrusion protruding from the inner surface 171 of the bottom 162 and the inner surface of the top 176 toward the processing space 181 can be provided.

[0289] The outer wall 161 is formed into a cylindrical shape as a whole, and the inner wall 110 is formed into a columnar shape as a whole. The outer wall 161 is hollow because it is important for processing the fluid on the inner surface of the outer wall 161 constituting the processing space 181. The inner wall 110 is solid or hollow because it is important for processing the fluid on the outer surface of the inner wall 110 constituting the processing space 181. For the inner wall 110, whether it is cylindrical or columnar, it should be understood that it includes inner walls with circular cross-sections, square cross-sections, and irregular cross-sections. For the outer wall 161, whether it is cylindrical or columnar, it can be understood that it includes outer walls with circular cross-sections, square cross-sections, and irregular cross-sections. However, the small gap between the protrusion 116 and the outer wall 161 becomes important when implementing the present invention, so the following point should be noted when implementing: when the outer wall 161 is not circular in cross-section, the gap between the protrusion 116 changes with rotation.

[0290] (Processing Space)

[0291] The inner wall 110 is arranged on the inner side of the outer wall 161, and the outer wall 161 and the inner wall 110 are arranged concentrically. A processing space 181 is formed between the outer wall 161 and the inner wall 110. In the present embodiment, a processing space 181 is provided between the outer peripheral surface 111 of the inner wall 110 and the inner peripheral surface 170 of the cylindrical wall 163 of the outer wall 161. The processing of the object to be processed is carried out in the processing space 181. The so-called object to be processed refers to the fluid of the processing of the predetermined fluid in the processing space 181, and the object to be processed will also be recorded as a fluid below. In the present invention, at least one organic compound is included in the object to be processed. As long as the processing space 181 can be set between the outer wall 161 and the inner wall 110, the outer wall 161 and the inner wall 110 may not be arranged concentrically.

[0292] The interval of the processing space 181, that is, the interval between the outer peripheral surface 111 of the inner wall 110 and the inner peripheral surface 170 of the cylindrical wall 163 of the outer wall 161 in this embodiment also depends on the residence time of the processed object in the processing space 181, but is preferably 5 to 200% of the outer diameter D2 of the inner wall 110, and more preferably 10 to 150% of the outer diameter D2 of the inner wall 110. For example, when the outer diameter D2 of the inner wall 110 is 100 mm, the interval of the processing space 181 is preferably 5 to 200 mm, and more preferably 10 to 150 mm. The outer diameter D2 of the inner wall 110 is the diameter of the inner wall 110, excluding the protrusion 116.

[0293] At least one of the outer wall 161 and the inner wall 110 rotates relative to the other. In this embodiment, the driving shaft of the rotation drive mechanism M such as a motor is connected to the rotating shaft 131, and the rotating shaft 131 rotatably supports the inner wall 110 via bearings 177, 177 provided at the bottom 162 and the top 176, and the inner wall 110 rotates relative to the outer wall 161. The outer wall 161 may rotate relative to the inner wall 110, or both may rotate, but both must rotate relative to each other.

[0294] (supply part and outflow part)

[0295] The outer wall 161 is provided with a supply portion 175 and an outflow portion 168. The supply portion 175 is a supply port for supplying a fluid to be processed as a predetermined fluid in the processing space 181 from outside the system (outside the device) to the processing space 181, and one end thereof is connected to the outside of a continuous stirring device F such as a tank for storing the processed material, and the other end thereof is directly or indirectly connected to the processing space 181. In this embodiment, as shown in FIG. Fig.16 As shown in (A), the supply part 175 is provided on the outer wall 161 and communicated with the sealing part 184 via the receiving part 182 described below. The outflow part 168 is a discharge port for discharging the processed material processed by the fluid in the processing space 181 to the outside of the system (outside the device). In this embodiment, Fig.16 The upper side of (A) is the upstream side of the flow of the processed object. Fig.16 (A) is the downstream side of the flow of the processed object, the supply portion 175 is provided above the cylindrical wall 163 of the outer wall 161, and the outflow portion 168 is provided below the cylindrical wall 163 of the outer wall 161. A plurality of supply portions 175 and outflow portions 168 may be provided on the outer wall 161. By providing a plurality of supply portions 175 on the outer wall 161, a plurality of processed objects can be supplied from outside the system (outside the device) to the processing space 181, and by providing a plurality of outflow portions 168 on the outer wall 161, the processed objects can be made to flow out of the processing space 181 to the outside of the system (outside the device) according to the processing time of the processed objects in the processing space 181.

[0296] (Labyrinth seal mechanism)

[0297] The outer peripheral surface 111 of the inner wall 110, the cylindrical wall 163 of the outer wall 161 and other components constituting the processing space 181 may be provided with a labyrinth seal mechanism for extending the retention time of the fluid in the processing space 181. The so-called labyrinth seal is a seal that provides resistance to the flow of the fluid and minimizes leakage while having a gap in the radial direction or the axial direction, and refers to a labyrinth formed by a knife-like structure and contact points of the peripheral portion, which continuously causes expansion of the fluid passing through.

[0298] In this embodiment, the protrusion 116 is a component that constitutes a labyrinth sealing mechanism, and there is a tiny gap of about 0.01 mm to 1 mm between the top of the protrusion 116 and the inner circumferential surface 170 of the cylindrical wall 163 of the outer wall 161, although it also depends on the viscosity of the processed object.

[0299] By setting the gap to be small, the processed object becomes laminar when passing through it, and it becomes difficult to pass through. As a result, it takes time to pass through the small gap, and the processed object is retained in a relatively wide space on the upstream side of the small gap.

[0300] In other words, the labyrinth seal used in the continuous stirring device F used in the practice of the present invention is not a completely leak-proof seal, but can be said to be a mechanism that allows the fluid to be retained in the space on the upstream side while gradually leaking the fluid to the downstream side.

[0301] use Fig.16 (A) The specific structure and function of the labyrinth seal mechanism will be described.

[0302] The processing space 181 includes a sealing portion 184 and a reserve portion 183. The sealing portion 184 is a narrow space formed between the top end of the protrusion 116 and the inner peripheral surface 170 of the cylindrical wall 163 of the outer wall 161, and the reserve portion 183 is a space formed between the outer peripheral surface 111 of the inner wall 110 without the protrusion 116 and the inner peripheral surface 170 of the cylindrical wall 163 of the outer wall 161, and is arranged on the upstream side of the sealing portion 184 and is a space wider than the sealing portion 184.

[0303] In the continuous stirring device F, the so-called labyrinth seal refers to the sealing portion 184 , and the so-called labyrinth seal mechanism refers to a set of the sealing portion 184 and the reserve portion 183 .

[0304] As in the present embodiment, the inner wall 110 rotates relative to the outer wall 161, a protrusion 116 is provided on the outer peripheral surface 111 of the inner wall 110, and a sealing portion 184 is provided between the top end of the protrusion 116 and the inner peripheral surface 170 of the cylindrical wall 163 of the outer wall 161, which is ideal in terms of controlling the age of the processed object.

[0305] In this embodiment, a plurality of sets of sealing parts 184 and reserve parts 183 are arranged in a row from upstream to downstream of the flow of the processed object as one set. Alternatively, one set of sealing parts 184 and reserve parts 183 may be arranged.

[0306] The processing space 181 includes a receiving portion 182. The receiving portion 182 is the most upstream space in the processing space 181, is a space wider than the sealing portion 184, and can receive the processed object supplied from the supply portion 175 without resistance. It can also serve as a reserve portion 183 disposed most upstream of the flow of the processed object.

[0307] The fluid supplied from the supply section 175 to the processing space 181 is first received by the receiving section 182 and accumulated. If the receiving section 182 is filled with the fluid, the fluid leaks toward the sealing section 184 arranged on the downstream side of the receiving section 182. If the sealing section 184 is filled with the fluid, the fluid leaks toward the reserve section 183 arranged on the downstream side of the sealing section 184. The fluid is received by the reserve section 183 and accumulated. If the reserve section 183 is filled with the fluid, the fluid leaks toward the sealing section 184 arranged on the downstream side of the reserve section 183. Since a plurality of sets of sealing sections 184 and reserve sections 183 are continuously arranged in the processing space 181, the movement of these fluids is repeated.

[0308] On the other hand, the inner wall 110 having the protrusion 116 on the outer peripheral surface 111 rotates. When the fluid fills each space of the receiving portion 182, the sealing portion 184, and the reserve portion 183, the centrifugal force acts due to the rotation of the inner wall 110, and for example, the fluid in the receiving portion 182 is difficult to leak to the sealing portion 184 arranged on the downstream side of the receiving portion 182. In particular, in the sealing portion 184 which is a narrow space, the fluid is difficult to leak to the reserve portion 183 arranged on the downstream side of the sealing portion 184 due to the rotation of the inner wall 110, but it is not completely sealed, and a small prescribed amount moves to the downstream side. The prescribed amount is determined according to the necessary processing conditions such as the purpose of the required processing, the processing amount, and the processing speed.

[0309] In this way, by rotating the inner wall 110, a plurality of receiving portions 182, a sealing portion 184 serving as a narrow sealed space, and a reserve portion 183 serving as a retention space wider than the sealing portion 184 are continuously arranged in the processing space 181, so that the leakage of the fluid supplied from the supply portion 175 to the processing space 181 in the sealing portion 184 is minimized, and the fluid leaked from the sealing portion 184 will fill and accumulate in the reserve portion 183 arranged on the downstream side of the sealing portion 184. As a result, the retention time of the fluid in the processing space 181 is extended through the labyrinth seal.

[0310] In particular, by providing a plurality of sets of reserve sections 183 and sealing sections 184, the retention time of the fluid in the entire device is averaged. For example, if a single reserve section 183 is used to fill the total storage capacity of the predetermined fluid in the entire device, even if the retention time from the empty state to the full state of the single reserve section 183 is constant, and the single reserve section 183 is continuously operated after being filled, it is difficult to replace all the fluid filling the single reserve section 183 with new fluid flowing in from the upstream, and a part of the fluid flows out to the downstream before reaching the above-mentioned retention time, and another part of the fluid always stays in the reserve section 183. Therefore, the possibility of accidental control increases in terms of the control of the retention time, and as a result, the proportion of the fluid flowing out to the downstream before reaching the predetermined specified retention time is also accidental. When multiple groups of reserve sections 183 and sealing sections 184 are provided, even if the residence time in each reserve section 183 is governed by chance, increasing the number of groups provided will average the residence time of each fluid, which is advantageous in terms of stable control of the residence time.

[0311] In the processing space 181, the sealing section 184 and the reserve section 183 are taken as a group, and multiple groups are continuously arranged. By rotating the inner wall 110 constituting the processing space 181 relative to the outer wall 161, the retention of the processed object in the reserve section 183 located on the upstream side of the sealing section 184 and the subsequent passage of the processed object through the sealing section 184 are repeated, thereby controlling the retention time of the processed object.

[0312] As for the residence time of the fluid in the processing space 181, it can be adjusted by adjusting the volume of the processing space 181, the interval of the processing space 181, its length, the number of groups of the sealing part 184 and the reserve part 183, the rotation speed of the inner wall 110, and the introduction amount of the fluid introduced into the continuous stirring device F. The residence time of the fluid in the processing space 181 is preferably about 2 to 30 minutes, more preferably about 3 to 10 minutes. In the case where the treatment of the fluid is a polymerization reaction, etc., it is sometimes necessary to retain for several hours. In addition, it is appropriate that the peripheral speed at the periphery of the inner wall 110 is 0.5 to 35 m / sec. The outer periphery of the inner wall 110 does not contain a protrusion 116. When the residence time is desired to be adjusted during the operation of the continuous stirring device F, the rotation speed of the inner wall 110 and the introduction amount of the fluid introduced into the continuous stirring device F are adjusted.

[0313] By adjusting these, the target retention time of the product can be achieved.

[0314] The shape of the protrusion 116 can be any shape as long as it can form a sealing portion 184 as a narrow space between the top end thereof and the outer wall 161. When the outer wall 161 has a protrusion, the shape of the protrusion can be any shape as long as it can form a sealing portion 184 as a narrow space between the top end thereof and the inner wall 110. The length of the protrusion and the width of the top end of the protrusion can be appropriately set within the range required to obtain labyrinth sealing properties.

[0315] Furthermore, the sealing effect is improved by making the fluid filled in the sealing portion 184, which is a narrow space, into a laminar flow. On the other hand, the fluid accumulated in the receiving portion 182 and the reserve portion 183, which are relatively wide spaces, into a turbulent flow, thereby applying a stirring effect to the fluid during its retention.

[0316] (Introduction)

[0317] The outer wall 161 and the top 176 may be provided with an introduction portion 169. The introduction portion 169 is a supply port for supplying the processed object to the processing space 181 from a path different from the processed object supplied from the supply portion 175 to the processing space 181. In the present embodiment, the introduction portion 169 is arranged on the outer wall 161 between the supply portion 175 and the outflow portion 168, and other processed objects are supplied to the processed object in the middle of the processing. The introduction portion 169 can be arranged at the upper end of the cylindrical wall 163 of the outer wall 161, and its position can also be changed. The processed object supplied from the introduction portion 169 to the processing space 181 and the processed object supplied from the supply portion 175 to the processing space 181, if the processed object itself is compared, can be different or the same. As an example of the processed object supplied from the introduction portion 169 to the processing space 181, raw materials themselves, polymerization initiators, reaction terminators, polymerization terminators, pH adjusters, catalysts, coating agents, etc. can be listed.

[0318] The introduction portion 169 may also be used as an exhaust port for exhausting gas generated during the processing of the fluid, or an exhaust port for exhausting the gas may be separately provided.

[0319] Therefore, the processed object supplied from the supply part 175 to the processing space 181 passes through the inlet part 169 as needed, and is introduced and discharged from the outflow part 168 while the processed object is introduced and the fluid such as gas is discharged, thereby completing the processing of the fluid in the limited processing space 181.

[0320] (Temperature adjustment mechanism)

[0321] At least one of the outer wall 161 and the inner wall 110 is provided with a temperature control mechanism T10, and the temperature of the member is adjusted by cooling or heating, thereby adjusting the temperature of the fluid flowing in the processing space 181. Fig.16In (A), as the temperature control mechanism T10, a temperature control jacket for flowing various heat media including ice water and steam is installed on the outer peripheral surface of the cylindrical wall 163 of the outer wall 161. Fig.16 As shown in (A), a temperature regulating jacket may be provided on the outer wall 161, as described later. Fig. 20 As shown in (A), multiple temperature regulating jackets ( Fig. 20 (A) These are T11 and T21. Fig. 20 As shown in (A), when the outer wall 161 is provided with a plurality of temperature regulating jackets, these jackets may be adjusted to the same temperature or to different temperatures. By adjusting the plurality of temperature regulating jackets to different temperatures, the temperature of the fluid flowing in the processing space 181 may be adjusted according to the progress of the processing of the fluid in the processing space 181. Instead of the temperature regulating jacket, a cooling element or a heating element may be installed on at least one of the outer wall 161 and the inner wall 110.

[0322] (Mixing blade and scraper)

[0323] The inner wall 110 may be provided with a stirring blade 211 and a scraper 212. This is effective when a highly viscous fluid of a treatment object is treated.

[0324] In this embodiment, if Fig.16 As shown in (A) and (B), on the outer peripheral surface 111 without the protrusion 116 between the protrusions 116 and the protrusions 116 provided on the inner wall 110, a plurality of plate-shaped stirring blades 211 are provided at intervals in the circumferential direction. The stirring blade 211 can be fixed to the outer peripheral surface 111 of the inner wall 110, or to the disc-shaped protrusion 116. The stirring blade 211 rotates together with the inner wall 110, thereby improving the stirring function of the processed object flowing in the processing space 181. Another blade can be detachably mounted on the stirring blade 211.

[0325] In addition, in this embodiment, if Fig.16 As shown in FIG. 5A , a scraper 212 is provided between the protrusions 116 provided on the inner wall 110 . Fig.17 (A) is along Fig.16 (A) is a cross-sectional view of the main part along the AA line, and (B) is a cross-sectional view along the Fig.17 (A) is a cross-sectional view of the main part of the BB line. Fig.17 As shown in (A) and (B), a column 213 for supporting the scraper 212 is provided between the protrusions 116 and the protrusions 116. Fig.17As shown in (A), the column 213 is a two-piece plate-like member, and the scraper 212 is clamped between the two plate-like members, and the scraper 212 and the two plate-like members are fixed with bolts 214, so that the column 213 supports the scraper 212. Fig.17 As shown in (A) and (B), the tip of the scraper 212 is brought into close contact with the inner peripheral surface 170 of the cylindrical wall 170 of the outer wall 161 .

[0326] The scraper 212 is a scraping blade that scrapes off the attached matter attached to the inner circumferential surface 170 of the cylindrical wall 163 of the outer wall 161. The scraper 212 is fixed to the column 213 provided on the inner wall 110 so that the top end of the scraper 212 is in close contact with the inner circumferential surface 170 of the cylindrical wall 163 of the outer wall 161, and the scraper 212 rotates together with the inner wall 110, so that the scraper 212 continuously scrapes off the attached matter.

[0327] When a temperature regulating mechanism T10 is installed on the outer circumferential surface of the cylindrical wall 163 of the outer wall 161 and a fluid treatment such as polymerization reaction is performed while adjusting the temperature of the treated object flowing in the treatment space 181, if deposits are generated on the inner circumferential surface 170 of the cylindrical wall 163 of the outer wall 161, the heat transfer efficiency of the inner circumferential surface 170, which serves as a heat transfer surface, is significantly reduced, and the temperature of the fluid in the treatment space 181 can no longer be adjusted. The deposits are continuously scraped off by the scraper 212, thereby preventing the heat transfer efficiency of the inner circumferential surface 170 of the cylindrical wall 163 of the outer wall 161 from being reduced, and at the same time achieving an improvement in the yield of the product.

[0328] This can also be implemented by providing a baffle plate (baffle) 178 on the outer wall 161. Fig.18 , a baffle plate (baffle) 178 is shown installed on the outer wall 161. More specifically, a support portion 179 for supporting the baffle plate (baffle) 178 is provided on the cylindrical wall 163 of the outer wall 161, and the top end portion of the baffle plate (baffle) 178 supported by the support portion 179 protrudes toward the reserve portion 183. In this way, by providing the baffle plate (baffle) 178, stirring of the fluid is promoted.

[0329] In this embodiment, the inner wall 110 is hexagonal and has a plurality of protrusions 116 protruding radially outward from its outer peripheral surface 111. The inner wall 110 may be cylindrical, hexagonal, quadrangular, or other prism-shaped, or may be a special-shaped column.

[0330] This can also be implemented by providing a catalyst unit 215 in the storage unit 183. Fig.19In the figure, it can be shown that as a catalyst part 215, a catalyst loaded on a carrier is installed. More specifically, a catalyst part 215 having an outer diameter substantially the same as that of the protrusion 116 is installed on the outer peripheral surface 111 between the protrusion 116 and the protrusion 116 provided on the inner wall 110. The outer diameter of the catalyst part 215 can be shorter than the protrusion 116. Among them, the outer diameter of the catalyst part 215 refers to the outer diameter of the entire carrier loaded with the catalyst. The catalyst part 215 can be installed on the disc-shaped protrusion 116. In this case, a space can be provided between the outer peripheral surface 111 of the inner wall 110 and the catalyst part 215, and the catalyst part 215 can be installed on the disc-shaped protrusion 116. A plurality of catalysts loaded on the carrier as the catalyst part 215 can be installed on the outer peripheral surface 111 of the inner wall 110 with intervals in the circumferential direction. Since the catalyst part 215 rotates together with the inner wall 110, the carrier loaded with the catalyst can have a strength that can withstand rotation. In addition, for the carrier loaded with the catalyst, in order to make the fluid flow, it can be a honeycomb or mesh carrier, and it is not preferred to have a carrier that excessively generates resistance to the fluid flowing in the processing space 181. The catalyst loaded on the carrier or the catalyst itself is solid, and can be selected and implemented as needed according to the type of the processed object and the type of reaction. By providing the catalyst section 215 in the reserve section 183, the reaction can be carried out efficiently.

[0331] In addition, each embodiment can be implemented in combination with the previous embodiment.

[0332] (Material)

[0333] The inner wall 110 and the outer wall 161 can be composed of a single component or a combination of multiple components. As for their materials, in addition to various metals, ceramics such as silicon carbide (SiC), sintered metals, wear-resistant steel, sapphire, and products of hardening metals, products of lining, coating, plating, etc. on hard materials can be used.

[0334] (Variation Example)

[0335] Secondly, refer to Fig. 20 (A) A modified example of the continuous stirring device F is described. In the following description, the basic structure and function of the continuous stirring device F are the same, and the description is centered on the different parts. For the aspects not described, the description of the above-mentioned embodiment is directly applicable. In this modified example, a labyrinth sealing mechanism is also provided to exert its function.

[0336] exist Fig. 20 In (A), the following form can be shown: the outer wall 161 and the inner wall 110 are both in the shape of a truncated cone, and the outer wall 161 and the inner wall 110 are arranged concentrically. In this example, Fig. 20The lower side of (A) is the upstream side of the flow of the processed object. Fig. 20 (A) is the downstream side of the flow of the treated object. For example, it is suitable for the case where, when an emulsion polymerization reaction or a suspension polymerization reaction is carried out, for a fluid that is in a preferred emulsified state or suspended state in the pre-treatment, the gas generated in the reaction is discharged to the outside of the system (outside the device) when the polymerization reaction is carried out in the processing space 181. Among them, the so-called truncated cone cylinder is a cylinder with a circular cross section, and its diameter gradually increases or decreases from the upstream side of the flow of the treated object to the downstream side, and there may be a portion where its diameter becomes constant. For example, as described later, in the case where at least one of the outer wall 161 and the inner wall 110 is movably provided with a gap adjustment mechanism (not shown), a portion where its diameter becomes constant can be set on the upstream side and downstream side of the flow of the treated object. In addition, in the portion where the labyrinth sealing mechanism works, there may also be a portion where its diameter gradually increases or decreases and a portion where its diameter becomes constant. In the present embodiment, both the outer wall 161 and the inner wall 110 are cylindrical with a circular cross section, and their diameter gradually increases from the upstream side of the flow of the treated object to the downstream side.

[0337] The outer wall 161 is in the shape of a truncated cone having a bottom 162 , and a flange protruding radially outward is formed at the open end thereof. The outer wall 161 is closed by fixing a top portion 176 and a flange 167 which are independent components from the outer wall 161 .

[0338] The inner wall 110 is in the shape of a truncated cone and has a plurality of protrusions 116 protruding radially outward from its outer peripheral surface 111. In this embodiment, the protrusions 116 are formed in a circumferential shape in a plan view, are arranged at predetermined intervals in the axial direction, and are narrowed from the base end to the top end of the protrusion 116, with a thickness varying in the radial direction. The inner wall 110 may be in the shape of a solid truncated cone.

[0339] (Gap adjustment mechanism)

[0340] At least one of the outer wall 161 and the inner wall 110 can be movably provided by a gap adjustment mechanism (not shown). By movably providing at least one of the outer wall 161 and the inner wall 110, the width of the sealing portion 184 can be adjusted. In this embodiment, the inner wall 110 is movably provided concentrically, that is, in the direction of the central axis, by a gap adjustment mechanism (not shown). Preferably, the position of the central axis does not change. By movably providing the inner wall 110 concentrically, the width of the sealing portion 184 can be adjusted. In this embodiment, the outer wall 161 is a truncated cone cylinder, and by movably providing the inner wall 110 concentrically, the small gap between the top of the protrusion 116 and the inner circumferential surface 170 of the cylindrical wall 163 of the outer wall 161 can be adjusted. It is advantageous to be able to adjust the width of the sealing portion 184 to have a relatively wide sealing portion 184 when it is desired to extract the gas generated in the reaction or to process a highly viscous processed object. Fig. 20 (B) and (C) are diagrams for explaining the main parts of the continuous stirring device F, showing the change in the width of the sealing portion when the inner wall 110 is moved concentrically using a gap adjustment mechanism (not shown). The state where the inner wall 110 is lowered is depicted by a solid line, and the state where the inner wall 110 is raised is depicted by a two-dot chain line. Fig. 20 (C) is a cross-sectional view of the main part when the inner wall 110, which is in the shape of a cylinder, is moved concentrically using a gap adjustment mechanism (not shown). Fig. 20 As shown in (B) and (C), if the inner wall 110 is raised concentrically by using a gap adjustment mechanism (not shown), the width of the sealing portion 184 becomes larger. The specific structure of the gap adjustment mechanism is not particularly limited, and a linear conveying means such as a conveying mechanism using a screw, a fluid pressure drive mechanism such as air or oil pressure can be appropriately selected.

[0341] (Microwave irradiation mechanism)

[0342] A microwave generating device such as a magnetron is provided on the outer wall 161 and the inner wall 110 as a microwave irradiation mechanism for irradiating at least one of the outer wall 161 and the inner wall 110 , so that the fluid flowing in the processing space 181 can be heated and a chemical reaction can be promoted.

[0343] (Pressure adjustment mechanism)

[0344] The inner wall 110 and the outer wall 161 may be provided with a pressure adjustment mechanism in order to adjust the pressure of the fluid flowing in the processing space 181. For example, various pumps can be used as the pressure adjustment mechanism. Negative pressure can be applied to the processing space 181. Specifically, it can be listed that: nitrogen is used to pressurize the processing space 181, and the vacuum degree of the processing space 181 obtained by using a vacuum pump is controlled.

[0345] The processed object of the processing of the predetermined fluid in the processing space 181 is supplied to the processing space 181 from the supply unit 175. The processed object supplied from the supply unit 175 to the processing space 181 processes the fluid while flowing in the processing space 181, and is discharged from the outflow portion 168 to the outside of the system (outside the device). The so-called processing of fluid is a reaction treatment, which is the mixing of raw materials and the subsequent reaction and the processing of obtaining the reaction product, and the following processing can be performed. For example, the retention of fluid, the stirring of fluid, the mixing of fluid, heat treatment, pH adjustment, aging, etc. of fluid can be listed. The reaction treatment may be accompanied by crystallization, crystallization, precipitation, etc., or may not be accompanied by these. For example, in the case of an organic reaction, the completion of the reaction can be carried out by the retention treatment, and stirring treatment can be applied at this moment.

[0346] The continuous stirring device F used in the implementation of the present invention can be used as a device for implementing the first fluid treatment (mixing of raw materials A and raw materials B) and the second fluid treatment (conducting the reaction of raw materials A and raw materials B) exemplified above. It is also possible to implement the first fluid treatment using a device different from the continuous stirring device F of the present invention, and implement the second fluid treatment following the first fluid treatment using the continuous stirring device F of the present invention, and it is also possible to implement the first fluid treatment using the continuous stirring device F of the present invention, and implement the second fluid treatment following the first fluid treatment using a device different from the continuous stirring device F of the present invention.

[0347] In addition, the following developments can be made: treating a fluid that has been pre-treated by pre-dispersion, pre-emulsification, pre-crushing, etc. using an apparatus different from the continuous processing apparatus F according to the present invention, or directly treating the fluid without pre-treatment.

[0348] (Control of processing characteristics)

[0349] By using the continuous stirring device F of the present invention to perform fluid processing, it is possible to adjust reaction conditions such as temperature conditions, pressure conditions, stirring conditions, and reaction time of the reaction field, so that, for example, processing characteristics such as the reaction rate of the raw material, the selectivity, and the yield of the product can be controlled. The reaction rate of the raw material is the ratio of the raw material consumed by the reaction relative to the supplied raw material, the selectivity is the ratio of the raw material consumed by the reaction to the production of the target product, and the yield of the product is the product of the reaction rate and the selectivity.

[0350] (Under non-laminar flow conditions)

[0351] In the present invention, it is preferred to perform fluid processing in the processing space 181 under non-laminar flow conditions. A shear force is applied to the fluid supplied from the supply unit 175 to the processing space 181, or the characteristic length L described in the above-mentioned formula (2) is increased, etc., to form a turbulent state, so that the frequency of contact or collision between molecules in the fluid is increased, thereby also being able to obtain a product. For example, stirring under turbulent conditions is useful when it is desired to disperse a fluid containing pigment particles to obtain a pigment dispersion. In addition, under turbulent conditions, it is possible to expect an increase in the heat exchange rate between the heat medium flowing in the temperature regulating mechanism T10 and the fluid flowing in the processing space 181.

[0352] The present invention is described in more detail below using several chemical reactions as examples. However, the present invention is not limited to this form. This is just an example of all organic reactions using organic compounds as starting materials.

[0353] In the organic reaction of the present invention, an organic compound that becomes a reaction substrate and / or a substance that promotes the reaction (reactant) contained in the fluid to be treated is reacted by Fig.12 The fluid treatment device F shown in (C) has an upstream treatment section and a downstream treatment section provided with a plurality of labyrinth seals that function to retain and stir the fluid to be treated, thereby forcibly mixing and stirring uniformly, and an organic reaction proceeds. In the present invention, the fluid to be treated contains at least one organic compound.

[0354] (Reaction type and reaction conditions)

[0355] The reaction in the present invention may be a homogeneous liquid phase reaction, a reaction between immiscible liquids, or a liquid-solid system or a liquid-gas system. Typically, the organic compound itself, which will become the reaction substrate, or a product in the form of a solution obtained by dissolving the organic compound in a solvent in advance, and / or the substance (reactant) that promotes the reaction itself, or a product in the form of a solution obtained by dissolving the substance (reactant) that promotes the reaction in a solvent in advance, are reacted according to the above method. Fig.12 (C) The fluid treatment device F is introduced from the first introduction part d1 and the second introduction part d2, and is forcibly uniformly mixed and stirred to perform an organic reaction. In addition, when the reaction substrate reacts with the reaction substrate or when the reaction substrate reacts with the reactant, a third component different from the reaction substrate and the reactant can be present as needed. As the third component, polymerization initiators, reaction terminators, polymerization terminators, pH adjusting agents, catalysts, coating agents, etc. can be listed, and multiple components can be present during the reaction.

[0356] When a solvent different from the organic compound as the reaction substrate is used, water, liquid ammonia, an organic solvent, a supercritical fluid, an ionic liquid, an inorganic acid, or the like can be used as the solvent.

[0357] Examples of the organic solvent include aliphatic hydrocarbons such as pentane and hexane, aromatic hydrocarbons such as benzene, toluene and xylene, alcohols such as methanol, ethanol, propanol and isopropanol, glycols such as ethylene glycol, propylene glycol and butanediol, ketones such as acetone, diethyl ketone and methyl ethyl ketone, aldehydes such as butyraldehyde, ethers such as diethyl ether, dibutyl ether, dimethoxyethane, tetrahydrofuran and dioxane, esters such as methyl acetate, ethyl acetate, butyl acetate and γ-butyrolactone, amines such as triethylamine, pyrrolidine and pyridine, nitriles such as acetonitrile, amides such as dimethylformamide and N-methylpyrrolidone, sulfoxides such as dimethyl sulfoxide, halogen solvents such as carbon tetrachloride, chloroform, dichloromethane and dichloroethane, carboxylic acids such as acetic acid and formic acid, and sulfonic acids such as methanesulfonic acid. Mixtures of these in any proportions may also be used.

[0358] As the supercritical fluid, supercritical water, supercritical carbon dioxide, or the like can be used.

[0359] Examples of the ionic liquid include ammonium salts, imidazolium salts, morpholinium salts, phosphonium salts, piperidinium salts, pyridinium salts, pyrrolidinium salts, and sulfonium salts. A mixture of these in an arbitrary ratio may also be used.

[0360] Examples of the inorganic acid include sulfuric acids such as nitric acid, nitrous acid, sulfuric acid, persulfuric acid, sulfurous acid, thiosulfuric acid, and dithionite, and phosphoric acids such as phosphonic acid, phosphorous acid, phosphoric acid, and polyphosphoric acid. A mixture of these in any ratio may also be used.

[0361] Among them, water and organic solvents are preferred. The solvent can be used in an amount such that the concentration of the reaction substrate is usually 0.01 to 20 mol, preferably 0.1 to 10 mol, more preferably 1 to 5 mol per liter of the solvent.

[0362] Examples of the reaction in the present invention include oxidation reaction, reduction reaction, substitution reaction, addition reaction, elimination reaction, rearrangement reaction, condensation reaction, pericyclic reaction, polymerization reaction, solvolysis, dehydration reaction, and halogenation reaction.

[0363] Examples of the oxidation reaction include oxidation of hydroxyl groups to carbonyl groups, oxidation of aldehyde groups to carboxylic acids, oxidation of carboxylic acids to percarboxylic acids, dehydrogenation of alkanes to alkenes, dehydrogenation of alkenes to alkynes, oxidation of alkenes to olefin oxides, nitro synthesis reactions of amines by oxidation, and NO free radical synthesis reactions of amines by oxidation. Examples of the reactants for the oxidation reaction include chromates, hypochlorites, perchlorates, osmium compounds, hypervalent iodine compounds, sulfur oxides, N-oxide compounds, hydrogen peroxide, peroxides such as hydroperoxides, and oxygen.

[0364] Examples of the reduction reaction include reduction reactions from esters to aldehydes, reduction reactions from esters to alcohols, reduction reactions from esters to methyl groups, reduction reactions from ketones to alcohols, reduction reactions from ketones to hydrocarbon groups, reduction reactions from cyano groups to Schiff bases, reduction reactions from cyano groups to methylamino groups, reduction reactions from nitro groups to amino groups, reduction reactions from Schiff bases to amino groups, and reduction amination reactions of carbonyl groups. Examples of the reactants for the reduction reaction include aluminum hydride compounds, borane compounds, borohydride compounds, metal hydride compounds, silane compounds, and tin hydride compounds.

[0365] Substitution reactions are reactions in which atoms or substituents of organic compounds are substituted, and are roughly divided into electrophilic substitution reactions and nucleophilic substitution reactions according to the reaction mode. Examples include nucleophilic substitution reactions of halogenated alkyl groups, aromatic nucleophilic substitution reactions, aromatic electrophilic substitution reactions, electrophilic substitution reactions, substitution reactions of alcohols with hydrogen atoms, nucleophilic substitution reactions of siloxy compounds, halogen atom substitution reactions of diazo groups, and hydroxyl substitution reactions of diazo groups.

[0366] Addition reaction is a reaction in which multiple bonds are cleaved and each end forms a new single bond with another atomic group. Similar to substitution reaction, it is roughly divided into electrophilic addition reaction and nucleophilic addition reaction according to the reaction mode. Examples include addition reaction of halogen to olefin, addition reaction of halogen to alkyne, addition reaction of hydrogen halide to olefin, addition reaction of hydrogen halide to alkyne, conjugate addition reaction to α,β-unsaturated carbonyl compound, hydroboration of olefin, hydroformylation of olefin, diol synthesis reaction from olefin, alcohol addition reaction to isocyano group, amine addition reaction to isocyano group, acid addition reaction to isocyano group, cyanohydrinization reaction of carbonyl group, reaction of carbonyl group and alcohol giving acetal group, hemiacetalization reaction of carbonyl group, synthesis reaction of secondary amine or tertiary amine or quaternary ammonium salt by alkylation reaction of amine, and nucleophilic addition reaction of organometallic compound (Grignard reagent, butyl lithium, etc.) to carbonyl group or cyano group.

[0367] Elimination reaction is a reaction in which an organic compound releases an atomic group to form a molecule with a smaller number of atoms, and as a result, a multiple bond is formed. Examples include dehydrocyanation reaction of cyano groups, Hofmann elimination reaction of quaternary ammonium salts, and dealcoholization reaction of ethers.

[0368] The so-called rearrangement reaction is a reaction in which the atoms or atomic groups (groups) constituting a compound change their binding positions. According to the reaction mode, it can be classified into nucleophilic rearrangement, electrophilic rearrangement, σ-shift rearrangement, and free radical rearrangement. Examples include Wagner-Meerwein rearrangement, pinacol-pinacolone rearrangement, benzyl-benzoic acid rearrangement, allyl rearrangement, Favorsky rearrangement, Pummerer rearrangement, Beckmann rearrangement, Curtius rearrangement, Rosen rearrangement, Hofmann rearrangement, Schmidt reaction, and Baeyer-Villiger oxidation.

[0369] The so-called condensation reaction is a reaction in which an addition reaction and an elimination reaction are carried out continuously, and is also called an addition elimination reaction. The situation in which water molecules are eliminated in the condensation reaction is called dehydration condensation. As examples, there can be cited the esterification reaction of alcohol and carboxylic acid, carboxylic anhydride or carboxylic acid chloride, the amidation reaction of amine and carboxylic acid, carboxylic anhydride or carboxylic acid chloride, the aldol condensation reaction of carbonyl compounds having hydrogen at the α position and aldehydes or ketones, the Claisen condensation reaction between esters under alkaline conditions, the anhydride synthesis reaction of carboxylic acids, the reaction of obtaining olefins by condensation of active methylene compounds with aldehydes or ketones, etc.

[0370] The so-called pericyclic reaction is a reaction mode in which multiple bonds containing π electrons pass through a cyclic transition state and are simultaneously formed and cut off without passing through a reaction intermediate. Examples include the Diels-Alder reaction of olefins and dienes, the Diels-Alder reaction of alkynes and dienes, the hetero-Diels-Alder reaction of carbonyls and dienes, the ene reaction of an olefin having hydrogen at the allylic position with an olefin or a carbonyl, and the chelate reaction of 1,3-butadiene and sulfur dioxide.

[0371] The so-called polymerization reaction is a group of reactions for the purpose of synthesizing polymers (polymers), including addition polymerization in which a polymerizable monomer (monomer) with double bonds opens the double bonds while polymerizing, ring-opening polymerization in which a monomer with a ring structure opens the bonds of the ring while polymerizing, and condensation polymerization in which a monomer is separated from water molecules and atomic groups while polymerizing. In addition, the process in which a monomer reacts with an active species generated by a small amount of initiator to newly generate an active species of the same type, and the reaction occurs continuously to generate a polymer is called chain polymerization. Depending on the active species, it is classified into free radical polymerization, anionic polymerization, cationic polymerization, and coordination polymerization. In the case of liquid phase polymerization, it is classified into homogeneous polymerization in which the polymer is dissolved in the monomer or solvent, and heterogeneous polymerization in which the polymer is insoluble in the monomer or solvent and precipitates. As the former, solution polymerization and bulk polymerization can be listed, and as the latter, suspension polymerization and emulsion polymerization can be listed.

[0372] The so-called solvolysis is a nucleophilic substitution reaction or elimination reaction in which a solvent becomes a nucleophile and an organic compound as a solute is a reactant. Solvolysis is classified into hydrolysis (when the nucleophile is water), alcohololysis (when the nucleophile is alcohol), ammonialysis (when the nucleophile is ammonia), aminolysis (when the nucleophile is alkylamine), etc., depending on the type of solvent that becomes a nucleophile. As the reactants of solvolysis, esters, nitriles, isonitriles, and amides can be listed, and generally two decomposition products are generated from one reactant. For example, in the case of hydrolysis, esters are decomposed into alcohols and carboxylic acids, and amides are decomposed into carboxylic acids and amines. Alcohololysis with esters as reactants is known as an ester exchange reaction in which the alcohol portion is exchanged.

[0373] The so-called dehydration reaction is a reaction in which a water molecule is separated from a molecule or between molecules. Examples thereof include a reaction in which an ether is synthesized by dehydration between two alcohol molecules, a reaction in which an olefin is synthesized by dehydration within an alcohol molecule, and a reaction in which a Schiff base is formed by dehydration between carbonyl and amino groups.

[0374] The so-called halogenation reaction is a reaction of introducing one or more halogen atoms into an organic compound. According to the type of halogen, it is classified into fluorination, chlorination (chlorination), bromination (bromination), and iodination. Examples include halogenation of alkyl groups, halogenation of aromatic rings, and halogenation of the α position of carbonyl groups. As reactants for halogenation, fluorine, hydrogen fluoride, fluoride salts, chlorine, thionyl chloride, phosphorus trichloride, phosphorus pentachloride, sulfonyl chloride, oxalyl chloride, N-chlorosuccinimide, bromine, tribromo compounds, N-bromosuccinimide, iodine, and N-iodosuccinimide can be listed.

[0375] In addition to the reactions listed above, examples of the reactions in the present invention include transesterification reactions between carboxylic acids and esters, transamide reactions between carboxylic acids and amides, transamide reactions between esters and amides, ylide reactions, reactions of forming olefins from phosphorus compounds and carbonyl compounds such as the Horner-Wadsworth-Emmons reaction, reactions of forming olefins from organosilicon compounds and carbonyl compounds such as the Peterson olefination reaction, olefination reactions using titanium carbene complexes such as the Teber reagent, reactions of synthesizing epoxides from carbonyl compounds and sulfur ylides such as the Corey-Tchaikovsky reaction, Simmons-Smith reactions of cyclopropanating olefins using dihaloalkane, and various coupling reactions (Suzuki-Miyaura coupling reaction, Kumada-Corriu reaction, Ullmann coupling), and the like.

[0376] The method of the present invention can effectively remove the reaction heat generated during the reaction by using a fluid processing device F having a temperature control mechanism T installed in the downstream processing section. Therefore, it is suitable for reactions that generate large amounts of heat and reactions that may be out of control.

[0377] In the present invention, it is considered that the downstream side treatment is particularly effective for the following reactions that are difficult to complete in a short time, and although it has been described in detail, there is no limitation on the reaction using the fluid treatment device F. This device is also effective for reactions other than the reactions described below, and it can be expected to further improve the yield and reduce the amount of reaction accelerators and catalysts used.

[0378] Reaction Example 1 (emulsion polymerization)

[0379] Emulsion polymerization is a widely used polymerization method because it uses cheap and safe water as a medium to obtain high molecular weight polymers and can produce microparticles with a wide range of particle sizes from 0.01 to several μm. In typical emulsion polymerization, monomers, emulsifiers or dispersants, initiators, and water are used to produce an aqueous dispersion of polymer microparticles through free radical polymerization. The fluid treatment device F used in the practice of the present invention applies shear force to the treated fluid between at least two relatively rotating treatment surfaces in the upstream treatment section. Therefore, two incompatible fluids can be emulsified efficiently by passing through the upstream treatment section. In addition, since the reaction can continue for a certain period of time in the downstream treatment section, it is suitable for reactions that require maintaining the same conditions, such as chain polymerization. For example, when using Fig.12 In the case of emulsion polymerization performed by the device shown in (C), various raw materials used for emulsion polymerization as polymer raw materials are preferably prepared as a first fluid and a second fluid, which are introduced from the first introduction part d1 and the second introduction part d2, respectively. In the upstream side treatment part, an emulsification process or a dispersion process of the monomers is performed as an upstream side treatment, and in the downstream side treatment part, a heating and stirring treatment is performed on the treated fluid as a downstream side treatment, thereby performing a polymerization process to manufacture a dispersion of polymer particles. As an upstream side treatment, a portion of the polymerization can be performed, and as a downstream side treatment, the emulsification or dispersion of the monomers can be performed in parallel with the polymerization. As examples of the first fluid and the second fluid, there can be listed a fluid containing at least one monomer, and a fluid containing at least one initiator and an emulsifier or a dispersant in water as a medium that is immiscible with the monomers.

[0380] The monomers for emulsion polymerization that can be used in the present invention are not limited to the following monomers, and examples thereof include α-olefins such as ethylene and propylene, alkyl (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, and isobutyl (meth)acrylate, alkoxyalkyl (meth)acrylates such as 2-methoxyethyl (meth)acrylate and 2-ethoxyethyl (meth)acrylate, styrene, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, etc., which are obtained by esterifying both terminal hydroxyl groups of ethylene glycol or its oligomers with acrylic acid or methacrylic acid, neopentyl glycol di(meth)acrylate, di(meth)acrylate, α,β-unsaturated acids such as acrylic acid and methacrylic acid, dicarboxylic acids containing unsaturated groups such as maleic acid, fumaric acid, itaconic acid, and cinnamic acid, and their alkyl esters, styrene, o-methylstyrene, m-methylstyrene, and t-butylstyrene. Styrene monomers such as methyl styrene, p-methyl styrene, 2,4-dimethyl styrene, 2,5-dimethyl styrene, 3,4-dimethyl styrene, 3,5-dimethyl styrene, p-ethyl styrene, m-ethyl styrene, o-ethyl styrene, p-tert-butyl styrene, isopropenylbenzene (α-methyl styrene), 1-vinylnaphthalene, 2-vinylnaphthalene, 1,1-diphenylethylene, isopropenyltoluene, isopropenylethylbenzene, isopropenylpropylbenzene, isopropyl Aromatic vinyl compounds such as alkenylbutylbenzene, isopropenylpentylbenzene, isopropenylhexylbenzene, and isopropenyloctylbenzene, vinyl cyanide compounds such as acrylonitrile and methacrylonitrile, unsaturated carboxylic anhydrides such as maleic anhydride and itaconic anhydride, N-substituted maleimides such as maleimide, N-methylmaleimide, N-ethylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide, amides such as acrylamide and methacrylamide, and polyfunctional monomers such as divinylbenzene. These can be used alone or in combination of two or more.

[0381] The emulsifier or dispersant is not limited to the following emulsifiers or dispersants, and examples thereof include anionic surfactants, cationic surfactants, nonionic surfactants, polymer dispersants, etc. The emulsifier or dispersant is a substance that emulsifies or disperses the monomer in water.

[0382] Examples of the anionic surfactant include fatty acid salts such as sodium laurate, potassium myristate, sodium palmitate, potassium oleate, sodium linolenate, sodium rosinate, potassium rosinate, alkylbenzenesulfonates such as sodium dodecylbenzenesulfonate, potassium dodecylbenzenesulfonate, sodium decylbenzenesulfonate, potassium decylbenzenesulfonate, sodium hexadecylbenzenesulfonate, potassium hexadecylbenzenesulfonate, alkylsulfosuccinates such as sodium di(2-ethylhexyl)sulfosuccinate, potassium di(2-ethylhexyl)sulfosuccinate, sodium dioctylsulfosuccinate, alkylsulfuric acid ester salts such as sodium lauryl sulfate and potassium lauryl sulfate, polyoxyethylene alkyl ether sulfate ester salts such as sodium polyoxyethylene lauryl ether sulfate and potassium polyoxyethylene lauryl ether sulfate, phosphate ester salts such as sodium dodecyl phosphate, potassium dodecyl phosphate, sodium polyoxyethylene nonylphenyl ether phosphate, etc. Among these anionic surfactants, alkylsulfuric acid ester salts and phosphate ester salts are preferred.

[0383] Examples of the cationic surfactant include alkyltrimethylammonium chloride, dialkylammonium chloride, and benzylammonium chloride.

[0384] Examples of the nonionic surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyethylene glycol monostearate, sorbitan monostearate, polyoxyethylene alkyl esters, polyoxyethylene sorbitan alkyl esters, polyoxyethylene polyoxypropylene glycol, and polyethylene glycol monostearate. Among these nonionic surfactants, polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyoxyethylene polyoxypropylene glycol, and polyethylene glycol monostearate are preferred.

[0385] Examples of the polymer dispersant include carboxyvinyl polymer, hydroxypropyl cellulose, hydroxypropyl methyl cellulose, hydroxyethyl cellulose, polyvinyl alcohol, polyvinyl pyrrolidone, carboxymethyl cellulose, and carboxyethyl cellulose.

[0386] The emulsifiers or dispersants listed above may be used alone or two or more may be added to the system as needed. In addition, a polymerizable emulsifier or dispersant containing a polymerizable functional group in the emulsifier or dispersant itself may be used.

[0387] Examples of the initiator for initiating the polymerization of the monomers include persulfates such as potassium persulfate (potassium peroxodisulfate), sodium persulfate, and ammonium persulfate; peroxide-based polymerization initiators such as benzoyl peroxide, lauroyl peroxide, octanoyl peroxide, o-chlorobenzoyl peroxide, methyl ethyl ketone peroxide, diisopropyl peroxydicarbonate, cumene hydroperoxide, and tert-butyl hydroperoxide; and azo-based polymerization initiators such as 2,2'-azobisisobutyronitrile and 2,2'-azobis(2,4-dimethylvaleronitrile).

[0388] The initiator may be any of the above substances alone, or a redox initiator comprising an oxidizing agent (such as ammonium peroxide, potassium peroxide, etc.), a reducing agent (such as sodium sulfite, sodium bisulfite, sodium thiosulfate, etc.) and a transition metal salt (such as ferric sulfate, etc.) may be used.

[0389] For the purpose of controlling the reaction, a polymerization terminator may be used as necessary. Examples of the polymerization terminator include hydroxylamine, hydroxylamine sulfate, diethylhydroxylamine, hydroxylamine sulfonic acid and its alkali metal salts, sodium dimethyldithiocarbamate, and hydroquinone.

[0390] In the present invention, when emulsion polymerization is carried out, the above-mentioned monomers, water, emulsifiers or dispersants, initiators, and other agents used as needed (such as polymerization terminators) can be used in appropriate proportions. The supply rate of polymer raw materials (flow rate per unit time), the volume of the device (the volume of the downstream side processing space 81), and the polymerization time (the residence time of the fluid in the downstream side processing space 81) are related to each other. Usually, as far as the volume of the device is concerned, once the device is set, it is fixed in most cases. As for the polymerization time, an appropriate time is also set according to the polymer raw materials. Therefore, the supply rate of polymer raw materials is generally appropriately set by the volume of the device and the polymerization time, but in the present invention, such a method is not limited. Among them, the so-called supply rate of polymer raw materials refers to the supply rate (flow rate per unit time) of the first fluid and the second fluid into the upstream side processing space 3. Hereinafter, in the present invention, the so-called supply rate (flow rate per unit time) of raw materials in various organic reactions refers to the supply rate (flow rate per unit time) of the first fluid and the second fluid into the upstream side processing space 3.

[0391] The polymerization temperature is usually from room temperature to about 95°C, and is preferably determined according to the free radical generation temperature of the initiator used. In the case where the polymer raw material is polymerized in the downstream processing section, the fluid flowing in the downstream processing space 81 is heat-exchanged with the heat medium by using the installed temperature regulating mechanism T, so that the temperature can be adjusted to a uniform temperature in a short time, the fluctuation of the polymerization reaction can be suppressed, and polymer particles with a uniform molecular weight distribution can be produced.

[0392] Reaction Example 2 (Ester Hydrolysis Reaction)

[0393] Ester bonds are basic bonds that are often seen in plastic materials, fibers, pharmaceuticals, etc. Ester bonds contained in polymers and pharmaceuticals are sometimes decomposed when polymers are decomposed for reuse, when protecting groups of intermediates are removed in pharmaceuticals, etc. to allow the target functional groups to bind. The hydrolysis reaction is a reaction that decomposes esters into alcohols and carboxylic acids, and is one of the basic reaction operations. It is known that the reaction rate can be increased catalytically by using acidic or alkaline substances. In the case of a typical hydrolysis, an ester, water, a catalyst, and a solvent are used, and the reaction is carried out in a homogeneous system or a heterogeneous system. For example, using Fig.12 In the apparatus shown in (C), when performing hydrolysis of esters, various compounds used as hydrolysis raw materials are prepared as the first fluid and the second fluid, which are introduced from the first introduction part d1 and the second introduction part d2 respectively. In the upstream treatment part, the mixing process is carried out as the upstream treatment, and in the downstream treatment part, the reaction process is carried out on the treated fluid, thereby obtaining a mixed liquid of alcohol and carboxylic acid. As the upstream treatment, the first fluid and the second fluid are mixed and reacted, and in the downstream treatment, the reaction state can be continued for the treated fluid.

[0394] Examples of the first fluid and the second fluid include a fluid containing at least one ester and a fluid containing at least one acidic substance or alkaline substance that promotes hydrolysis of the ester.

[0395] As esters that can be used in this reaction, the following examples can be cited, and the present invention is not subject to any limitation of the following substances. As esters, the simplest methyl formate to ethyl formate, propyl formate, isopropyl formate, butyl formate, isobutyl formate, pentyl formate, hexyl formate, heptyl formate, octyl formate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, pentyl acetate, 3-methylbutyl acetate, hexyl acetate, heptyl acetate, octyl acetate and other aliphatic alcohol and aliphatic carboxylic acid esters, phenyl acetate, benzyl acetate and other phenol or aromatic alcohol and aliphatic carboxylic acid esters, methyl benzoate, diethyl phthalate and other aliphatic alcohol and aromatic carboxylic acid esters, phenyl benzoate, benzyl benzoate and other phenol or aromatic alcohol and aromatic carboxylic acid esters, not limited to chain structures, cyclic lactones, esters of polyols such as triglycerides and fatty acids, etc. can also be cited. Furthermore, the present invention can also be applied to the deprotection of compounds having a hydroxyl group protected by an acyl protecting group such as acetyl, pivaloyl or benzoyl (for example, retinol acetate (vitamin A acetate) and tocopherol acetate (vitamin E acetate)).

[0396] Examples of catalysts used for hydrolysis include inorganic acids such as hydrochloric acid, nitric acid, and sulfuric acid, acidic substances such as organic acids such as methanesulfonic acid and benzenesulfonic acid, alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, alkaline earth metal hydroxides such as calcium hydroxide, and alkaline substances such as quaternary ammonium hydroxides such as tetramethylammonium hydroxide.

[0397] The solvent is not particularly limited, but is preferably a hydrophilic solvent such as water or alcohol that can dissolve the reactants and decomposition products.

[0398] In the present invention, when performing hydrolysis of esters, the above-mentioned esters, water, catalysts, solvents, and other agents used as needed (e.g., emulsifiers, hydrolases, buffers, etc.) can be used as hydrolysis raw materials in appropriate proportions. The supply rate of the hydrolysis raw material (flow rate per unit time), the volume of the device (the volume of the downstream side treatment space 81), and the reaction time (the residence time of the fluid in the downstream side treatment space 81) are interrelated. The appropriate reaction time is set according to the raw materials and the catalyst. Therefore, the supply rate of the hydrolysis raw material is generally appropriately set according to the volume of the device and the reaction time, but the present invention is not limited to such a method.

[0399] The reaction time of the hydrolysis is usually from several minutes at the lower limit to several hours at the upper limit, preferably from 5 minutes to 1 hour, more preferably from 10 minutes to 30 minutes. The reaction temperature is usually about 0°C to 95°C, preferably determined according to the strength of the catalyst used and the reactivity of the ester used as the raw material.

[0400] Reaction Example 3 (esterification reaction or amidation reaction)

[0401] This is the reverse reaction of Reaction Example 2, and is also often used in the synthesis of organic compounds. However, if the water separated from the raw material is not properly removed during the esterification reaction or the amidation reaction, the esterification reaction or the amidation reaction will be hindered due to the reverse reaction. Therefore, a dehydrating agent and other reagents are used together as needed. In particular, when the reactivity of the carboxylic acid itself is low, the reactivity can be improved by using the corresponding carboxylic acid halide such as carboxylic acid chloride, carboxylic acid anhydride and other carboxylic acid equivalents. From the perspective of easy handling, carboxylic acid anhydride is preferably used. In addition, when conducting the esterification reaction or the amidation reaction, a substance (reactant) that promotes the reaction can be used as needed. In the case of a typical esterification reaction or amidation reaction, an alcohol or amine, a carboxylic acid equivalent, a substance (reactant) that promotes the reaction, and a solvent are used in a homogeneous system or a heterogeneous system. For example, using Fig.12 In the device shown in (C), when an esterification reaction or an amidation reaction is performed, various compounds used as esterification raw materials or amidation raw materials are prepared as a first fluid and a second fluid, which are introduced from the first introduction part d1 and the second introduction part d2, respectively. In the upstream treatment part, a mixing process is performed as an upstream treatment, and in the downstream treatment part, a reaction process is performed on the treated fluid as a downstream treatment, thereby obtaining the target ester or amide. As the upstream treatment, the first fluid and the second fluid are mixed and reacted, and as the downstream treatment, the reaction state can be continued for the treated fluid.

[0402] Examples of the first fluid and the second fluid include a fluid containing at least one alcohol or amine and a fluid containing at least one of a carboxylic acid, a carboxylic anhydride, and a carboxylic acid halide.

[0403] Examples of the alcohol used in the esterification reaction include aliphatic alcohols having 1 to 10 carbon atoms (preferably 1 to 5), alicyclic alcohols having 3 to 10 carbon atoms (preferably 3 to 7), and aromatic alcohols having 6 to 30 carbon atoms (preferably 7 to 18). Examples of the aliphatic alcohols having 1 to 10 carbon atoms include monovalent aliphatic alcohols such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methylpropanol, 1-pentanol, 3-methyl-1-butanol, 1-hexanol, 1-heptanol, 2-ethyl-1-hexanol, 1-octanol, and 1-decanol, divalent aliphatic alcohols such as ethylene glycol, 1,2-propylene glycol, 1,3-propylene glycol, 1,3-butylene glycol, and 1,4-butylene glycol, and trivalent aliphatic alcohols such as glycerol. Examples of the alicyclic alcohol having 3 to 10 carbon atoms include cyclohexylmethanol, 2-cyclohexylethanol, glucose, and fructose. Examples of the aromatic alcohol having 6 to 30 carbon atoms include benzyl alcohol, 2-phenylethanol, 3-phenylpropanol, and 3-phenyl-2-propene-1-ol.

[0404] Examples of the amine used in the amidation reaction include alkylamines such as methylamine, ethylamine, propylamine, isopropylamine, butylamine, isobutylamine, tert-butylamine, pentylamine, isopentylamine, and hexylamine, cyclic amines such as cyclohexylamine, piperidine, and morpholine, aminoethanol, various isomers of aminopropanol, various isomers of aminopropylene glycol, bis(hydroxyethyl)amine, tris(hydroxymethyl)aminomethane, (dimethylamino)ethylamine, (dimethylamino)propylamine, (aminomethyl)pyridine, (aminoethyl)pyridine, and histamine.

[0405] As carboxylic anhydride, for example, aliphatic carboxylic anhydride, alicyclic carboxylic anhydride and aromatic carboxylic anhydride can be cited. As aliphatic carboxylic anhydride, as long as it is an anhydride of a carboxylic acid having a saturated or unsaturated aliphatic hydrocarbon group, it is not particularly limited, and acetic anhydride, propionic anhydride (propionic anhydride), butyric anhydride, valeric anhydride, hexanoic anhydride, heptanoic anhydride, octanoic anhydride, nonanoic anhydride, capric anhydride, lauric anhydride, myristic anhydride, palmitic anhydride, stearic anhydride, maleic anhydride, succinic anhydride, etc. can be cited. As alicyclic carboxylic anhydride, as long as it is an anhydride of a carboxylic acid having a saturated or unsaturated alicyclic hydrocarbon group, it is not particularly limited, and for example, cyclohexane dicarboxylic anhydride, cyclohexene dicarboxylic anhydride, bis (cyclopentane carboxylic acid) anhydride, bis (cyclohexane carboxylic acid) anhydride, bis (adamantane carboxylic acid) anhydride, bis (norbornane carboxylic acid) anhydride, etc. can be cited. The aromatic carboxylic anhydride is not particularly limited as long as it is an anhydride of a carboxylic acid having an aromatic hydrocarbon group, and examples thereof include benzoic anhydride, phthalic anhydride, and derivatives thereof.

[0406] As carboxylic acid halide, for example, aliphatic carboxylic acid halide, alicyclic carboxylic acid halide and aromatic carboxylic acid halide can be listed. In addition, as halide, fluoride, chloride, bromide and iodide can be listed. As aliphatic carboxylic acid halide, as long as it is a halide of carboxylic acid with saturated or unsaturated aliphatic hydrocarbon group, it is not particularly limited, for example, acetyl fluoride, acetyl chloride, acetyl bromide, acetyl iodide, propionyl fluoride, propionyl chloride, propionyl bromide, propionyl iodide, butyryl fluoride, butyryl chloride, butyryl bromide, butyryl iodide, etc. can be listed. As alicyclic carboxylic acid halide, as long as it is a halide of carboxylic acid with saturated or unsaturated alicyclic hydrocarbon group, it is not particularly limited, for example, cyclohexane diformyl chloride and cyclohexene diformyl chloride can be listed. In addition, as aromatic carboxylic acid halide, as long as it is a halide of carboxylic acid with aromatic hydrocarbon group, it is not particularly limited, for example, benzoyl fluoride, benzoyl chloride, benzoyl bromide, benzoyl iodide, etc. can be listed.

[0407] As the substance (including a catalyst and a dehydrating agent) that promotes the esterification reaction or the amidation reaction, for example, it is preferable to use an inorganic acid such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc., an organic carboxylic acid such as acetic acid, propionic acid, phthalic acid, benzoic acid, etc., an organic sulfonic acid such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, trifluoromethanesulfonic acid, etc., an organic phosphoric acid such as diethyl phosphate, phenyl phosphate, etc., an alkali metal or alkaline earth metal hydroxide such as sodium hydroxide, potassium hydroxide, magnesium hydroxide, an alkali metal or alkaline earth metal carbonate and hydrogen carbonate such as sodium hydrogen carbonate, potassium carbonate, calcium hydrogen carbonate, an alkali metal or alkaline earth metal phosphate and hydrogen phosphate such as trilithium phosphate, potassium dihydrogen phosphate, sodium pyrophosphate, calcium metaphosphate, metaboric acid, etc. Alkali metal or alkaline earth metal borates such as potassium, sodium tetraborate, and magnesium orthoborate; alkali metal or alkaline earth metal carboxylates such as sodium acetate, potassium acetate, sodium benzoate, and magnesium acetate; alkali metal or alkaline earth metal alkoxide compounds or phenolate compounds such as lithium ethoxide, sodium methoxide, potassium methoxide, magnesium methoxide, and sodium phenolate; alkali metal or alkaline earth metal oxides such as calcium oxide; ammonia; ammonium hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrabutylammonium hydroxide, ammonium carbonate, ammonium hydrogen carbonate, tetramethylammonium methyl carbonate, tetramethylammonium ethyl carbonate, methyl triethylammonium methyl carbonate, methyl tri-n-butylammonium methyl carbonate, methyl tri-n-octylammonium methyl carbonate, and ammonium salts such as tetraphenyl hydroxide Phosphonium, tetramethylphosphonium hydroxide, tetramethylphosphonium methyl carbonate, methyl tri-n-butylphosphonium ethyl carbonate, methyl tri-n-octylphosphonium methyl carbonate and other phosphonium salts, n-butylamine, benzylamine, aniline, ethylenediamine and other primary amines, diethylamine, methylethylamine, pyrrolidine, N-methyltoluidine and other secondary amines, triethylamine, tri-n-butylamine, N-methyl-N-ethylaniline, 1,4-diazabicyclo [2,2,2] octane, 1,8-diazabicyclo [5,4,0] -7-undecene and other tertiary amines, pyridine, picoline, quinoline, imidazole, pyrimidine, N, N-dimethyl-4-aminopyridine and other nitrogen-containing aromatic heterocyclic compounds, cadmium chloride, cadmium oxide, cadmium acetate and other cadmium compounds, tin chloride, Tin compounds such as tin oxide, tin acetate, tin octoate, tributyltin, tin(IV) acetylacetonate chloride, lead compounds such as lead chloride, lead oxide, lead carbonate, lead tetraacetate, aluminum compounds such as aluminum chloride, aluminum oxide, aluminum acetate, aluminum alkoxide, zinc chloride, zinc bromide, zinc iodide, zinc oxide, zinc acetate, zinc trifluoroacetate, zinc stearate, zinc nitrate, zinc carbonate, zinc sulfate, zinc(II) acetylacetonate, zinc(II) trifluoromethanesulfonate, zinc 2-tetrafluoroborate, zinc compounds such as tetrazinc oxyhexa(trifluoroacetate), bismuth compounds such as bismuth chloride, bismuth oxide, bismuth acetate, iron chloride, iron oxide, iron acetate, iron(III) acetylacetonate, N,Iron compounds such as N'-bis(salicylidene)ethylenediamine iron (II), cobalt compounds such as cobalt chloride, cobalt oxide, cobalt acetate, cobalt stearate, cobalt (II) acetylacetonate, copper compounds such as copper chloride, copper bromide, copper iodide, copper oxide, copper acetate, copper (II) acetylacetonate, chromium compounds such as chromium chloride, chromium oxide, chromium acetate, chromium (III) acetylacetonate, molybdenum compounds such as molybdenum chloride, molybdenum oxide, molybdenum acetate, molybdenum (VI) acetylacetonate, manganese chloride, manganese oxide, manganese acetate, manganese acetylacetonate (VI) II), titanium compounds such as titanium chloride, titanium oxide, titanium acetate, alkoxytitanium, titanium lactate, titanium (VI) acetylacetonate, zirconium compounds such as zirconium chloride, zirconium oxide, zirconium acetate, zirconium (IV) acetylacetonate, hafnium chloride, hafnium oxide, hafnium (IV) trifluoromethanesulfonate, lanthanum chloride, lanthanum oxide, lanthanum acetate, lanthanum nitrate, lanthanum alkoxide, lanthanum (III) acetylacetonate, lanthanum (III) trifluoromethanesulfonate, germanium compounds such as germanium chloride and germanium oxide, enzymes such as lipase, etc.

[0408] The solvent used is not particularly limited, and examples thereof include aliphatic or alicyclic hydrocarbons such as n-hexane, n-pentane, and cyclohexane, aromatic hydrocarbons such as benzene and toluene, aliphatic or aromatic halides such as dichloromethane, chloroform, chlorobenzene, and dichlorobenzene, ethers such as tetrahydrofuran, diethyl ether, diphenyl ether, anisole, 1,2-dimethoxyethane, and 1,4-dioxane, sulfoxides such as dimethyl sulfoxide, and sulfolanes such as sulfolane. Amines, which are substances that promote the reaction, may be used as the solvent as they are.

[0409] In the present invention, when an esterification reaction or an amidation reaction is carried out, the above-mentioned alcohol or amine, carboxylic acid equivalent, solvent, substance that promotes the reaction, and other agents used as needed (such as inhibitors, dehydrating agents, etc.) can be used in appropriate proportions as esterification or amidation raw materials. The supply rate (flow rate per unit time) of the esterification raw material or the amidation raw material, the volume of the device (the volume of the downstream side treatment space 81), and the reaction time (the residence time of the fluid in the downstream side treatment space 81) are related to each other. The appropriate reaction time is set according to the alcohol or amine, carboxylic acid equivalent, and substance that promotes the reaction. Therefore, the supply rate of the esterification raw material or the amidation raw material is generally appropriately set according to the volume of the device and the reaction time, but the present invention is not limited to such a method.

[0410] The reaction time of the esterification reaction or the amidation reaction is usually from a lower limit of several minutes to an upper limit of several hours, preferably from 5 minutes to 1 hour, more preferably from 10 minutes to 30 minutes. The reaction temperature is usually from room temperature to about 95°C, preferably determined according to the strength of the substance that promotes the reaction and the reactivity of the alcohol or amine and the carboxylic acid equivalent as the raw material.

[0411] Reaction Example 4 (Dehydration Condensation Reaction)

[0412] There are several methods for dehydration condensation reaction. One of them is described below, which is a reaction of obtaining olefins by condensation of active methylene compounds with aldehydes or ketones (also known as Knoevenagel condensation). In addition, when performing the dehydration condensation reaction, a substance that promotes the reaction (reactant) can be used as needed. In the case of a typical dehydration condensation reaction, an active methylene compound and an aldehyde or ketone, a substance that promotes the reaction (reactant), and a solvent are used in a homogeneous system or a heterogeneous system. For example, using Fig.12 In the case of the dehydration condensation reaction performed by the device shown in (C), various compounds used as dehydration condensation raw materials are prepared as the first fluid and the second fluid, which are introduced from the first introduction part d1 and the second introduction part d2, respectively. In the upstream side treatment part, as the upstream side treatment, a mixing process is performed, and in the downstream side treatment part, as the downstream side treatment, the treated fluid is heated and stirred, thereby performing a reaction process, thereby obtaining the target olefin. As the upstream side treatment, the first fluid and the second fluid are mixed and reacted, and as the downstream side treatment, the reaction state can be continued by heating and stirring the treated fluid.

[0413] Examples of the first fluid and the second fluid include fluids containing at least one aldehyde or ketone and an active methylene compound, and fluids containing a substance that promotes the reaction of an aldehyde with an active methylene compound or a reaction of a ketone with an active methylene compound.

[0414] The aldehydes and ketones used in the present reaction are not particularly limited. Specific examples include formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, valeraldehyde, hexanal, heptaldehyde, octanal, nonanal, decanal, glyoxal, benzaldehyde, anisaldehyde, salicylaldehyde, 3-methylbutyraldehyde, acrolein, cinnamaldehyde, perillaldehyde, and vanillin. Examples of ketones include acetone, 2-butanone, 2-pentanone, 3-pentanone, 2-hexanone, 3-hexanone, 4-methyl-2-pentanone, 2-heptanone, 3-heptanone, 2-octanone, 3-octanone, cyclohexanone, 2-methylcyclopentanone, acetophenone, benzophenone, benzylideneacetone, 3-buten-2-one, and isophorone.

[0415] On the other hand, the active methylene compound is a series of compound groups having a methylene group sandwiched between two electron-withdrawing groups in an organic compound, and examples of the electron-withdrawing group include a carbonyl group, an ester group, a cyano group, a nitro group, a sulfonyl group, a sulfinyl group, and a phosphonyl group. The active methylene compound used in this reaction is not particularly limited, and specific examples include malonic acid diesters such as dimethyl malonate and diethyl malonate, acetoacetic acid esters such as ethyl acetoacetate and propyl acetoacetate, malononitrile, acetylacetone, Mel's acid, and malonic acid.

[0416] As the substance that promotes this reaction, an acidic substance such as acetic acid and propionic acid, a basic substance such as pyridine, piperidine, and imidazole, or a mixture thereof, etc. can be used.

[0417] The solvent used is not particularly limited, and examples thereof include alcohols such as methanol, ethanol, propanol, and butanol, aliphatic or alicyclic hydrocarbons such as n-hexane, n-pentane, and cyclohexane, aromatic hydrocarbons such as benzene and toluene, aliphatic or aromatic halides such as chloroform, chlorobenzene, and dichlorobenzene, ethers such as tetrahydrofuran, diethyl ether, diphenyl ether, anisole, 1,2-dimethoxyethane, and 1,4-dioxane, sulfoxides such as dimethyl sulfoxide, and sulfolanes such as sulfolane.

[0418] In the present invention, when a dehydration condensation reaction is carried out, the above-mentioned active methylene compounds and aldehydes or ketones, solvents, substances that promote the reaction, and other reagents used as needed (such as ammonium acetate) can be used as raw materials in appropriate proportions. The supply rate of the raw materials (flow rate per unit time), the volume of the device (the volume of the downstream side processing space 81), and the reaction time (the residence time of the fluid in the downstream side processing space 81) are related to each other. The appropriate reaction time is set by the combination of the active methylene compounds and aldehydes or ketones and substances that promote the reaction. Therefore, the supply rate of the raw materials is generally appropriately set by the volume of the device and the reaction time. In the present invention, it is not limited to such a method.

[0419] The reaction time of the dehydration condensation reaction is usually from a lower limit of several minutes to an upper limit of several hours, preferably from 5 minutes to 1 hour, more preferably from 10 minutes to 30 minutes. The reaction temperature is usually from room temperature to about 95°C, preferably determined by the strength of the substance that promotes the reaction and the reactivity of the active methylene compound and aldehydes or ketones as raw materials.

[0420] Reaction Example 5 (Acetalization Reaction)

[0421] The acetalization reaction is a reaction in which an aldehyde or ketone is condensed with an alcohol in the presence of an acid catalyst to obtain an acetal, or a reaction in which a vinyl ether is condensed with an alcohol to obtain an acetal, and is used for the synthesis of intermediates for resins and adhesives. In addition, when the reaction is carried out, a substance (reactant) that promotes the reaction may be used as needed. In the case of a typical acetalization reaction, an alcohol and an aldehyde or ketone or vinyl ether, an acid catalyst, a substance (reactant) that promotes the reaction, and a solvent are used in a homogeneous system or a heterogeneous system. For example, using Fig.12In the case of the acetalization reaction performed by the device shown in (C), various compounds used as acetalization raw materials are prepared as the first fluid and the second fluid, respectively introduced from the first introduction part d1 and the second introduction part d2, and the mixing process is performed in the upstream side treatment part as the upstream side treatment, and the process is performed in the downstream side treatment part as the downstream side treatment, and the treated fluid is heated and stirred to obtain the target acetal. As the upstream side treatment, the first fluid and the second fluid are mixed and reacted, and as the downstream side treatment, the reaction state can be continued by heating and stirring the treated fluid.

[0422] Examples of the first fluid and the second fluid include a fluid containing at least one aldehyde or ketone and an alcohol, and a fluid containing a protonic acid catalyst that promotes the reaction between an aldehyde and an alcohol or between a ketone and an alcohol.

[0423] There is no particular limitation on the aldehydes and ketones used in the present reaction. Specific examples include formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, valeraldehyde, hexanal, heptaldehyde, octanal, nonanal, decanal, glyoxal, benzaldehyde, anisaldehyde, salicylaldehyde, 3-methylbutyraldehyde, acrolein, cinnamaldehyde, perillaldehyde, and vanillin. Examples of ketones include acetone, 2-butanone, 2-pentanone, 3-pentanone, 2-hexanone, 3-hexanone, 4-methyl-2-pentanone, 2-heptanone, 3-heptanone, 2-octanone, 3-octanone, cyclohexanone, 2-methylcyclopentanone, acetophenone, benzophenone, benzylideneacetone, 3-buten-2-one, and isophorone.

[0424] Examples of the alcohol used in the acetalization reaction include aliphatic alcohols having 1 to 10 carbon atoms (preferably 1 to 5). Examples of the aliphatic alcohols having 1 to 10 carbon atoms include monovalent aliphatic alcohols such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methylpropanol, 1-pentanol, 1-hexanol, 1-heptanol, 2-ethyl-1-hexanol, 1-octanol, and 1-decanol, and divalent aliphatic alcohols such as ethylene glycol, 1,2-propylene glycol, 1,3-propylene glycol, and 1,3-butylene glycol.

[0425] The vinyl ether used for the acetalization reaction is, for example, 3,4-dihydro-2H-pyran, and tetrahydropyranyl ether is obtained as a product.

[0426] As the acid (protonic acid catalyst) used as a catalyst for the acetalization reaction in the present invention, any acid generally used for the acetalization reaction, such as sulfuric acid, hydrochloric acid, phosphoric acid, and hydrobromic acid, can be used.

[0427] The solvent used is not particularly limited, and examples thereof include aliphatic or alicyclic hydrocarbons such as n-hexane, n-pentane, and cyclohexane, aromatic hydrocarbons such as benzene and toluene, aliphatic or aromatic halides such as chloroform, chlorobenzene, and dichlorobenzene, ethers such as tetrahydrofuran, diethyl ether, diphenyl ether, anisole, 1,2-dimethoxyethane, and 1,4-dioxane, sulfoxides such as dimethyl sulfoxide, and sulfolanes such as sulfolane. The alcohol of the raw material may be used as the solvent as it is.

[0428] In the present invention, when the acetalization reaction is carried out, the above-mentioned aldehydes, ketones or vinyl ethers and alcohols, catalysts, solvents, and other reagents (such as dimethoxypropane) used as needed can be used as raw materials in appropriate proportions. The supply rate (flow rate per unit time) of the acetalization raw material, the volume of the device (the volume of the downstream side processing space 81), and the reaction time (the residence time of the fluid in the downstream side processing space 81) are related to each other. The appropriate reaction time is set according to the combination of aldehydes, ketones or vinyl ethers and alcohols and catalysts. Therefore, the supply rate of the raw material is generally appropriately set according to the volume of the device and the reaction time, but the present invention is not limited to such a method.

[0429] The reaction time of the acetalization reaction is usually from a lower limit of several minutes to an upper limit of several hours, preferably from 5 minutes to 1 hour, more preferably from 10 minutes to 30 minutes. The reaction temperature is usually from room temperature to about 95°C, preferably determined by the strength of the acid catalyst used and the reactivity of the raw materials aldehydes, ketones or vinyl ethers and alcohols.

[0430] Example

[0431] The present invention is described in more detail below with reference to the following embodiments, but the present invention is not limited to these embodiments. In addition, the order of "first fluid, first introduction part d1" and "second fluid, second introduction part d2" is not limited, and the first fluid and the second fluid can be replaced.

[0432] (Device used in the present invention)

[0433] Used Fig.12 (C) shows a fluid processing device F. A raw material liquid is prepared in advance, and the raw material liquid is introduced from a container (not shown) storing the raw material liquid into the upstream processing space 3 from the first introduction part d1 and the second introduction part d2 using liquid delivery pumps P1 and P2 to perform an organic reaction. In addition, for comparison, as a conventional type of device without a downstream processing part, a device similar to the one of Japanese Patent Publication No. 2010-189661, which is related to the applicant of the present application, is used. Figure 1The device shown in (A) is a forced thin film reactor (ULREA SS-11-75) manufactured by MTECHNIQUE CO., LTD., and similarly uses liquid delivery pumps P1 and P2 to introduce the raw material liquid into the processing surfaces 1 and 2 to carry out the organic reaction. The fluid treatment device F used in the implementation of the method for producing an organic compound according to the present invention is different from the device shown in Japanese Patent Application Publication No. 2010-189661 in that a downstream side processing space 81 for performing downstream side processing is provided in the fluid treatment device F.

[0434] (Molecular weight and molecular weight distribution analysis)

[0435] The dispersion of polymer (polymer) fine particles obtained by emulsion polymerization was evaluated for number average molecular weight (Mn), weight average molecular weight (Mw) and molecular weight distribution Mw / Mn by gel permeation chromatography.

[0436] Specifically, for Example 1 and Comparative Examples 1 and 2, a certain amount of the dispersion of polymer particles obtained after the polymerization reaction is completed is taken. For the dispersion of the polymer particles taken, a centrifuge (high-speed cooling centrifuge model 7000, manufactured by Kubota Manufacturing Co., Ltd.) is used to centrifuge for 10 minutes at a centrifugal force of 8000G, and the obtained solid component is washed twice with pure water to remove the initiator and the like. The washed solid component is dried by reduced pressure drying to obtain a dry powder of the polymer particles. The dry powder of the polymer particles is dissolved in tetrahydrofuran (manufactured by Kanto Chemical Co., Ltd.) at a concentration of 0.3% by mass to prepare a measurement sample for gel permeation chromatography. As an analytical device, two organic solvent-based SEC (GPC) packed columns (KF-807L, column size: 8.0 mm Φ × 300 mm, manufactured by Showa Denko K.K.) were connected in series in a gel permeation chromatography apparatus (Prominence, manufactured by Shimadzu Corporation), and a differential refractive index detector (RID-10A, manufactured by Shimadzu Corporation) was used as a detector. Tetrahydrofuran was used as an eluent, and the measurement was carried out at a column temperature of 40°C and a flow rate of 1.0 mL per minute. The measurement results were analyzed using the analysis software LCsolution GPC (manufactured by Shimadzu Corporation) to obtain the number average molecular weight (Mn), weight average molecular weight (Mw) and molecular weight distribution Mw / Mn.

[0437] (Particle size distribution)

[0438] For Example 1 and Comparative Examples 1-1 and 1-2, the particle size distribution of the dispersion of polymer microparticles obtained after the polymerization reaction was completed was measured using a laser diffraction-scattering particle size distribution measuring apparatus (MT-3300, manufactured by Microtrac BEL Co., Ltd.).

[0439] (Response rate)

[0440] The reaction rates in Examples 2 to 12 and Comparative Examples 2 to 12 were evaluated by gas chromatography. The so-called reaction rate is the ratio of the reactants put into the reaction that react and become products. As an analytical device, a GC column (DB-WAXetr, 30m long, 0.250mm inner diameter, 0.25μm film thickness, manufactured by Agilent J&W) was connected to a gas chromatograph (manufactured by Agilent, Agilent7890 GCsystem) and used. For organic compounds that become raw materials or products, the retention time of the raw materials or products is measured on the chromatogram obtained by gas chromatography analysis in advance. On the chromatogram of the solution obtained after the reaction is completed, the respective areas of the peaks of these products and raw materials are substituted into the following formula (4), and the degree of progress of the reaction is evaluated as the reaction rate of the raw materials to the products.

[0441] Reaction rate (%) = area of ​​the peak corresponding to the product / (area of ​​the peak corresponding to the product + area of ​​the peak corresponding to the raw material) Formula (4)

[0442] In addition, for the sampling of the effluent flowing out of the outflow portion 68 (Examples 2 to 12) or the sampling of the effluent flowing out between the processing surfaces 1 and 2 (Comparison Examples 2 to 12), for the cases not recorded in the embodiments and comparison examples, the sampling time is 1 minute.

[0443] (Example 1: Emulsion polymerization of methyl methacrylate)

[0444] 2000 parts by weight of sodium dodecyl sulfate (manufactured by Kanto Chemical Co., Ltd.), 81 parts by weight of potassium peroxodisulfate (potassium persulfate, manufactured by Kanto Chemical Co., Ltd.), and 74 parts by weight of sodium thiosulfate pentahydrate (manufactured by Tokyo Chemical Industry Co., Ltd.) were added to 97845 parts by weight of ion exchange water, and stirred at 8000 rpm for 10 minutes using Clearmix (manufactured by MTECHNIQUE CO., LTD.), which is a stirrer with a stirring blade, to prepare Solution 1. Solution 1 was depressurized to -0.1 MPaG or less immediately before use to remove bubbles. Solution 1 was stirred at 1000 rpm for 10 minutes. Fig.12 The first introduction part d1 of the fluid treatment device F shown in (C) introduces methyl methacrylate (containing 0.005% of hydroquinone as a stabilizer, manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) Fig.12The second inlet d2 of the fluid treatment device F shown in (C) was introduced into the fluid treatment device F using liquid delivery pumps P1 and P2, respectively, and emulsion polymerization was performed while circulating 80°C warm water in the temperature regulating jacket provided as the temperature regulating mechanism T. The liquid delivery rate was set to 14.0 / 6.0 (in mL / min, respectively) so that the ratio of the liquid delivery rate (supply rate) of solution 1 to methyl methacrylate became 7:3. The temperature when the raw material liquid (solution 1, methyl methacrylate) was introduced into the device inlet d1 and d2 (hereinafter also referred to as the supply temperature of the raw material liquid to the inlet d1 and d2) was 20°C, respectively. The rotation speed of the first processing part 10 was set to 3000 rpm. The residence time of the fluid in the downstream side processing space 81 was 10 minutes. The temperature of the effluent, i.e., the dispersion of polymethyl methacrylate microparticles, when flowing out from the outflow part 68 as the outlet of the fluid treatment device F was 71°C. The effluent was collected for 3 minutes. The results of gel permeation chromatography of the effluent showed that the weight average molecular weight of the polymethyl methacrylate obtained in Example 1 was 6.78×10 6 , the number average molecular weight is 5.74×10 5 The molecular weight distribution Mw / Mn is 11.8. From the results of the particle size distribution measurement, it can be seen that the mode value of the diameter of the polymethyl methacrylate microparticles obtained in Example 1 is 0.110 μm.

[0445] (Comparative Example 1-1: Emulsion Polymerization of Methyl Methacrylate in a Beaker)

[0446] 140 mL of solution 1 was stirred at 600 rpm in a 300 mL beaker on a hot stirrer until it reached 70°C, and then 60 mL of methyl methacrylate used in Example 1, which had been preheated to about 70°C, was added and stirred at 600 rpm for 15 minutes. The results of gel permeation chromatography showed that the weight average molecular weight of the polymethyl methacrylate obtained in Comparative Example 1 was 5.41×10 6 , the number average molecular weight is 4.45×10 4 , the molecular weight distribution Mw / Mn was 121.3. From the results of the particle size distribution measurement, it was found that the mode value of the diameter of the polymethyl methacrylate microparticles obtained in Comparative Example 1-1 was 104.8 μm.

[0447] (Comparative Example 1-2: Emulsion polymerization of methyl methacrylate using a conventional apparatus not having a downstream treatment section)

[0448] Use the same method as that disclosed in Japanese Patent Application Laid-Open No. 2010-189661 Figure 1Emulsion polymerization was carried out in a forced thin film reactor (ULREA SS-11-75) manufactured by M TECHNIQUE CO., LTD., which is similar to the device shown in (A). Solution 1 used in Example 1 was introduced into the fluid treatment device from the first introduction part d1, and methyl methacrylate used in Example 1 was introduced from the second introduction part d2. The rotation speed of the first treatment part 10 was set to 3000 rpm, the same as in Example 1. The liquid delivery rate (supply rate) of solution 1 and methyl methacrylate and the supply temperature of solution 1 and methyl methacrylate to the introduction parts d1 and d2 were the same as in Example 1. The effluent flowing out from between the treatment surfaces 1 and 2 was collected into a beaker, and 60 ml of the effluent collected into the beaker was stirred at a rotation speed of 600 rpm while being heated to 70°C. After the effluent reached 70°C, it was maintained at 70°C for 10 minutes, the same as the residence time of the fluid in the downstream treatment space 81 in Example 1, and the polymerization reaction was carried out. The effluent reached 70°C. After a short time, bubbles were generated, and a temperature rise due to the heat of reaction was observed. The obtained dispersion of polymethyl methacrylate microparticles was analyzed in the same manner as in Example 1. The results of gel permeation chromatography showed that the weight average molecular weight of the polymethyl methacrylate obtained in Comparative Example 2 was 7.06×10 6 , the number average molecular weight is 4.08×10 5 The molecular weight distribution Mw / Mn was 17.3. From the results of the particle size distribution measurement, it was found that the mode value of the diameter of the polymethyl methacrylate microparticles obtained in Comparative Example 1-2 was 0.120 μm.

[0449] (Example 2: Hydrolysis of Butyl Acetate)

[0450] 4 parts by weight of butyl acetate (structural formula (1), manufactured by Kanto Chemical Co., Ltd.) as an ester of a reaction substrate was added to 396 parts by weight of methanol (manufactured by Good Co., Ltd.), and stirred at 5000 rpm for 10 minutes using Clearmix (manufactured by M TECHNIQUE CO., LTD.) to prepare solution 2. On the other hand, 40 parts by weight of sodium hydroxide (manufactured by Kanto Chemical Co., Ltd.) as a hydrolysis catalyst was dissolved in 160 parts by weight of pure water to prepare solution 3. Fig.12 The fluid treatment device F shown in (C) performs the hydrolysis reaction of the ester.

[0451] The chemical reaction at this time is represented by the reaction formula shown below.

[0452] [Chemistry 1]

[0453]

[0454] For the substances represented by the chemical formulas and abbreviations recorded in the following reaction formulas, H2O is water, MeOH is methanol, NaOH is sodium hydroxide, CH2Cl2 is dichloromethane, TEA is triethylamine, DMAP is N,N-dimethyl-4-aminopyridine, and THF is tetrahydrofuran.

[0455] The matrix solution (solution 2) was introduced into the fluid treatment device F from the first inlet d1 of the fluid treatment device F using a liquid delivery pump P1 at a supply rate of 10 mL / min, and the alkaline solution (solution 3) was introduced into the fluid treatment device F from the second inlet d2 of the fluid treatment device F using a liquid delivery pump P2 at a supply rate of 1 mL / min, and the rotation speed of the first processing part 10 was set to 500 rpm, and the hydrolysis reaction of the ester was carried out. The supply temperature of the raw liquid (matrix solution (solution 2) and alkaline solution (solution 3)) to the inlet d1 and d2 was set to 20° C. respectively. The residence time of the fluid in the downstream side processing space 81 was 20 minutes. As for the effluent flowing out of the outflow part 68, by putting ammonium chloride (manufactured by Kanto Chemical Co., Ltd.) 5 times the molar amount of sodium hydroxide as a hydrolysis catalyst into a recovery container, the effluent was neutralized to stop the hydrolysis reaction and recovered.

[0456] In the obtained chromatogram, a peak of butyl acetate (structural formula (1)) was confirmed at a retention time of about 9.2 minutes, and a peak of n-butanol (structural formula (2)) was confirmed at 11 minutes, indicating that Example 2 had a high reaction rate of 99%.

[0457] (Comparative Example 2: Hydrolysis of Butyl Acetate Using a Conventional Apparatus Not Having a Downstream Treatment Section)

[0458] Using the same raw material liquid (solution 2 and solution 3) as in Example 2, ULREA SS-11-75 (manufactured by MTECHNIQUE CO., LTD.) was used as a conventional type device without a downstream treatment section, and the same supply method (introduction paths d1 and d2 for supplying solution 2 and solution 3 to the fluid treatment device, the supply speed thereof and the supply temperature of solution 2 and solution 3 to the introduction sections d1 and d2) and operating conditions (rotation speed of the first treatment section 10) as in Example 2 were used to carry out the hydrolysis reaction of the ester. A recovery container containing ammonium chloride (manufactured by Kanto Chemical Co., Ltd.) in an amount 5 times the molar amount of sodium hydroxide as a hydrolysis catalyst was prepared, and the effluent flowing out from between the treatment surfaces 1 and 2 was recovered in the recovery container, thereby neutralizing the effluent and recovering it while stopping the hydrolysis reaction.

[0459] According to the same analysis as in Example 2, the reaction rate of Comparative Example 2 was 11%.

[0460] (Example 3: Hydrolysis of n-propyl acetate)

[0461] The same procedure as in Example 2 was carried out except that n-propyl acetate (Structural Formula 3, manufactured by Kanto Chemical Co., Ltd.) was used as the reaction substrate instead of butyl acetate. The chemical reaction at this time is represented by the reaction formula shown below.

[0462] [Chemistry 2]

[0463]

[0464] In the obtained chromatogram, a peak of n-propyl acetate (structural formula (3)) was confirmed at a retention time of about 7.1 minutes, and a peak of n-propanol (structural formula (4)) was confirmed at 8.7 minutes, indicating a high reaction rate of 99% for Example 3.

[0465] (Comparative Example 3: Hydrolysis of n-propyl acetate using a conventional apparatus not having a downstream treatment section)

[0466] The same procedure as in Comparative Example 2 was carried out except that n-propyl acetate (structural formula (3), manufactured by Kanto Chemical Co., Ltd.) was used as the reaction substrate instead of butyl acetate.

[0467] According to the same analysis as in Example 3, the reaction rate of Comparative Example 3 was 14%.

[0468] (Example 4: Hydrolysis of 3-methylbutyl acetate)

[0469] The same procedure as in Example 2 was carried out except that 3-methylbutyl acetate (structural formula (5), manufactured by Kanto Chemical Co., Ltd.) was used as the reaction substrate instead of butyl acetate. The chemical reaction at this time is represented by the reaction formula shown below.

[0470] [Chemistry 3]

[0471]

[0472] On the obtained chromatogram, the peak of 3-methylbutyl acetate (structural formula (5)) was confirmed at a retention time of about 10.3 minutes, and the peak of 3-methyl-1-butanol (structural formula (6)) was confirmed at 12.3 minutes, indicating a reaction rate of 99% for Example 4.

[0473] (Comparative Example 4: Hydrolysis of 3-methylbutyl acetate using a conventional apparatus not having a downstream treatment section)

[0474] The same procedure as in Comparative Example 2 was followed except that 3-methylbutyl acetate (structural formula (5), manufactured by Kanto Chemical Co., Ltd.) was used as the reaction substrate instead of butyl acetate. The same analysis as in Example 4 revealed that the reaction rate in Comparative Example 4 was 17%.

[0475] (Example 5: Esterification reaction of acetic anhydride and n-butanol)

[0476] 15 parts by weight of n-butanol (structural formula (2), manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 985 parts by weight of dichloromethane (manufactured by Kanto Chemical Co., Ltd.) were mixed to prepare an alcohol solution (solution 4). 240 parts by weight of acetic anhydride (structural formula (7), manufactured by Sigma-Aldrich Co., Ltd.), 240 parts by weight of triethylamine (manufactured by Kanto Chemical Co., Ltd.), and 3 parts by weight of N,N-dimethyl-4-aminopyridine (manufactured by Tokyo Chemical Industry Co., Ltd.) were dissolved in 9517 parts by weight of dichloromethane to prepare solution 5. These raw material solutions (solution 4 and solution 5) were supplied at a rate of 5 mL / min using Fig.12 In the fluid processing apparatus F shown in (C), the esterification reaction is performed at a rotation speed of 500 rpm for the first processing member 10. The chemical reaction at this time is represented by the reaction formula shown below.

[0477] [Chemistry 4]

[0478]

[0479] The alcohol solution (solution 4) was introduced into the fluid treatment device F from the first inlet d1 of the fluid treatment device F using the liquid delivery pump P1, and the solution 5 was introduced into the fluid treatment device F from the second inlet d2 of the fluid treatment device F using the liquid delivery pump P2, and the esterification reaction was carried out. The residence time of the fluid in the downstream treatment space 81 was 20 minutes. Warm water at 40°C was circulated in the temperature regulating jacket provided as the temperature regulating mechanism T, so that the temperature of the effluent flowing out of the outflow portion 68 became 30°C or above. The effluent flowing out of the outflow portion 68 was treated with ammonium chloride in an amount 10 times that of the alcohol (n-butanol in Example 5) introduced into the fluid treatment device F to stop the reaction.

[0480] For the quantitative determination of the alcohol (n-butanol, structural formula (2)) as the raw material and the ester (butyl acetate, structural formula (1)) as the product, gas chromatography analysis was performed in the same manner as in Examples and Comparative Examples 2 to 4, and the reaction rate was calculated from the ratio of the respective peak areas. From the peak ratio of the gas chromatogram after the reaction, the reaction rate of Example 5 was 89%.

[0481] (Comparative Example 5: Esterification reaction of acetic anhydride and n-butanol using a conventional apparatus not having a downstream treatment section)

[0482] Using the same raw material liquids (alcohol solution (solution 4) and solution 5) as in Example 5, an esterification reaction was carried out using ULREA SS-11-75 (manufactured by MTECHNIQUE CO., LTD.) as a conventional type device without a downstream treatment section, and using the same liquid feeding method (introduction paths d1 and d2 for supplying solution 2 and solution 3 to the fluid treatment device and their supply speed) and operating conditions (rotation speed of the first treatment section 10) as in Example 5. The effluent flowing out from between the treatment surfaces 1 and 2 was treated with ammonium chloride in an amount 10 times that of the alcohol (n-butanol in Comparative Example 6) introduced into the fluid treatment device to stop the reaction.

[0483] The quantitative analysis in the solution after the reaction was performed in the same manner as in Example 5. The reaction rate in Comparative Example 5 was 45%.

[0484] (Example 6: Esterification reaction of acetic anhydride and n-propanol)

[0485] The same procedure as in Example 5 was carried out except that 12 parts by weight of n-propanol (structural formula (4), manufactured by Kanto Chemical Co., Ltd.) was used as alcohol instead of n-butanol. The chemical reaction at this time is represented by the reaction formula shown below.

[0486] [Chemistry 5]

[0487]

[0488] From the peak ratio of gas chromatography after the reaction, the reaction rate of Example 6 was 94%.

[0489] (Comparative Example 6: Esterification reaction of acetic anhydride and n-propanol using a conventional apparatus not having a downstream treatment section)

[0490] The same procedure as in Comparative Example 5 was carried out except that 12 parts by weight of n-propanol (structural formula (4), manufactured by Kanto Chemical Co., Ltd.) was used as the alcohol instead of n-butanol.

[0491] The quantitative analysis in the solution after the reaction was performed in the same manner as in Example 6. The reaction rate in Comparative Example 6 was approximately 43%.

[0492] (Example 7: Esterification reaction of acetic anhydride and 3-methyl-1-butanol)

[0493] The same procedure as in Example 5 was carried out except that 17 parts by weight of 3-methyl-1-butanol (structural formula (6), manufactured by Kanto Chemical Co., Ltd.) was used as alcohol instead of n-butanol. The chemical reaction at this time is represented by the reaction formula shown below.

[0494] [Chemistry 6]

[0495]

[0496] From the peak ratio of gas chromatography after the reaction, the reaction rate of Example 7 was 94%.

[0497] (Comparative Example 7: Esterification reaction of acetic anhydride and 3-methyl-1-butanol using a conventional apparatus not having a downstream treatment section)

[0498] The same procedure as in Comparative Example 5 was carried out except that 17 parts by weight of 3-methyl-1-butanol (structural formula (6), manufactured by Kanto Chemical Co., Ltd.) was used as the alcohol instead of n-butanol.

[0499] The quantitative analysis in the solution after the reaction was performed in the same manner as in Example 7. The reaction rate in Comparative Example 7 was 46%.

[0500] (Example 8: Dehydration condensation reaction of benzaldehyde and dimethyl malonate)

[0501] 106 parts by weight of benzaldehyde (structural formula (8), grade 1 manufactured by Kanto Chemical Co., Ltd.) and 134 parts by weight of dimethyl malonate (structural formula (9), special grade manufactured by Kanto Chemical Co., Ltd.) were added to 1760 parts by weight of methanol (manufactured by Gord Corporation), and the mixture was stirred at 5000 rpm for 10 minutes using Clearmix (manufactured by MTECHNIQUE CO., LTD.) to dissolve benzaldehyde and dimethyl malonate in methanol, thereby preparing Solution 6. 180 parts by weight of acetic acid (manufactured by Kanto Chemical Co., Ltd.) and 255 parts by weight of piperidine (special grade manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were added to 1065 parts by weight of methanol, and the mixture was stirred at 5000 rpm for 10 minutes using Clearmix (manufactured by MTECHNIQUE CO., LTD.) to dissolve acetic acid and piperidine in methanol, thereby preparing Solution 7. Solution 6 was supplied at a rate of 5.0 mL / min and solution 7 was supplied at a rate of 1.0 mL / min using liquid delivery pumps P1 and P2. Fig.12 In the fluid treatment apparatus F shown in (C), the rotation speed of the first processing member 10 was set to 500 rpm, and a dehydration condensation reaction was performed. The chemical reaction at this time is represented by the reaction formula shown below.

[0502] [Chemistry 7]

[0503]

[0504] Solution 6 was introduced into the fluid processing device F from the first inlet d1 of the fluid processing device F using a liquid delivery pump P1, and solution 7 was introduced into the fluid processing device F from the second inlet d2 of the fluid processing device F using a liquid delivery pump P2, and a dehydration condensation reaction was carried out. Warm water at 59°C was circulated in a temperature regulating jacket provided as a temperature regulating mechanism T so that the temperature of the effluent flowing out of the outflow portion 68 became above 51°C. At the supply rate of the above-mentioned solution 6 and solution 7, the retention time in the downstream processing space 81 was 22 minutes. The effluent was collected for 1 minute. The effluent collected for 1 minute was immediately divided into a container for GC measurement, and quantitative analysis was carried out using a gas chromatography measurement device. On the chromatogram, the reaction rate became 91% based on the ratio of the peak of the raw material appearing at the retention time of 10.4 minutes and the peak of the product (structural formula (10)) appearing at 20.9 minutes.

[0505] (Comparative Example 8: Dehydration condensation reaction of benzaldehyde and dimethyl malonate using a conventional apparatus not having a downstream treatment section)

[0506] The same raw material liquid (solution 6, solution 7) as in Example 8 was introduced into ULREA SS-11-75 (manufactured by M TECHNIQUE CO., LTD.), which is a conventional type of device without a downstream processing unit, to carry out a dehydration condensation reaction. The method of feeding solutions 6 and 7 to the fluid processing device (the introduction paths d1 and d2 for supplying solutions 6 and 7 to the fluid processing device and their supply speeds) and the operating conditions of the fluid processing device (the rotation speed of the first processing unit 10) were the same as in Example 8. The effluent flowing out from the processing surfaces 1 and 2 for 1 minute was taken and quantitatively analyzed using a gas chromatography measuring device. Through the same analysis as in Example 8, the reaction rate of Comparative Example 8 was 22%.

[0507] (Example 9: Dehydration condensation reaction of benzaldehyde and acetylacetone)

[0508] 106 parts by weight of benzaldehyde (structural formula (8), manufactured by Kanto Chemical Co., Ltd.) and 106 parts by weight of acetylacetone (structural formula (11), manufactured by Kanto Chemical Co., Ltd.) were added to 1788 parts by weight of methanol (manufactured by Good Co., Ltd.), and stirred at 5000 rpm for 10 minutes using Clearmix (manufactured by M TECHNIQUE CO., LTD.) to dissolve benzaldehyde and acetylacetone in methanol to prepare solution 8. Solution 8 was supplied at a rate of 5.0 mL / min using liquid delivery pumps P1 and P2, and solution 7 used in Example 8 was supplied at a rate of 1.0 mL / min using a liquid delivery pump P1 and P2. Fig.12In the fluid treatment device shown in (C), the rotation speed of the first processing member 10 was set to 500 rpm, and a dehydration condensation reaction was performed. The chemical reaction at this time is represented by the reaction formula shown below.

[0509] [Chemistry 8]

[0510]

[0511] Solution 8 was introduced into the fluid processing device F from the first inlet d1 of the fluid processing device F using a liquid delivery pump P1, and solution 7 used in Example 8 was introduced into the fluid processing device F from the second inlet d2 of the fluid processing device F using a liquid delivery pump P2, and a dehydration condensation reaction was carried out. The retention time of the fluid in the downstream processing space 81 was 40 minutes. Warm water at 59°C was circulated in a temperature regulating jacket provided as a temperature regulating mechanism T so that the temperature of the effluent flowing out of the outflow portion 68 became above 51°C. The effluent was sampled for 1 minute in the same manner as in Example 8. The effluent sampled for 1 minute was immediately fractionated into a GC measurement container and quantitatively analyzed using a gas chromatography measurement device. From the ratio of the peak of the raw material appearing at a retention time of 10.5 minutes to the peak of the product (structural formula (12)) appearing at 19.7 minutes on the chromatogram, the reaction rate of Example 9 became 78%.

[0512] (Comparative Example 9: Dehydration condensation reaction of benzaldehyde and acetylacetone using a conventional apparatus not having a downstream treatment section)

[0513] The same raw material liquid (solution 8, solution 7) as in Example 9 was introduced into ULREA SS-11-75 (manufactured by M TECHNIQUE CO., LTD.), which is a conventional type of device without a downstream processing unit, to carry out a dehydration condensation reaction. The method of feeding solution 8 and solution 7 to the fluid processing device (the introduction paths d1 and d2 for supplying solution 8 and solution 7 to the fluid processing device and their supply speed) and the operating conditions of the fluid processing device (the rotation speed of the first processing unit 10) were the same as in Example 9. The effluent flowing out from between the processing surfaces 1 and 2 was collected for 1 minute and quantitatively analyzed using a gas chromatography measuring device. Through the same analysis as in Example 9, the reaction rate of Comparative Example 9 was 14%.

[0514] (Example 10: Dehydration condensation reaction of anisaldehyde and acetylacetone)

[0515] 134 parts by weight of anisaldehyde (structural formula (13), manufactured by Kanto Chemical Co., Ltd.) and 106 parts by weight of acetylacetone (structural formula (11), manufactured by Kanto Chemical Co., Ltd.) were added to 1760 parts by weight of methanol (manufactured by Good Co., Ltd.), and stirred at 5000 rpm for 10 minutes using Clearmix (manufactured by M TECHNIQUE CO., LTD.) to dissolve anisaldehyde and acetylacetone in methanol to prepare solution 9. Solution 9 was supplied at a rate of 5.0 mL / min using liquid delivery pumps P1 and P2, and solution 7 used in Example 8 was supplied at a rate of 1.0 mL / min. Fig.12 In the fluid treatment apparatus F shown in (C), the rotation speed of the first processing member 10 is set to 500 rpm to carry out a dehydration condensation reaction. The chemical reaction at this time is represented by the reaction formula shown below.

[0516] [Chemistry 9]

[0517]

[0518] Solution 9 was introduced into the fluid treatment device F from the first inlet d1 of the fluid treatment device F using a liquid delivery pump P1, and solution 7 used in Example 8 was introduced into the fluid treatment device F from the second inlet d2 of the fluid treatment device F using a liquid delivery pump P2, and a dehydration condensation reaction was carried out. The retention time of the fluid in the downstream treatment space 81 was 40 minutes. Warm water at 59°C was circulated in a temperature regulating jacket provided as a temperature regulating mechanism T, so that the temperature of the effluent flowing out of the outflow portion 68 became above 52°C. The effluent was sampled for 1 minute in the same manner as in Example 8. The effluent sampled for 1 minute was immediately fractionated into a GC measurement container, and quantitative analysis was carried out using a gas chromatography measurement device. From the ratio of the peak of the raw material appearing at a retention time of 15.9 minutes to the peak of the product (structural formula (14)) appearing at 29.4 minutes on the chromatogram, the reaction rate of Example 10 became 37%.

[0519] (Comparative Example 10: Dehydration condensation reaction of anisaldehyde and acetylacetone using a conventional device not having a downstream treatment section)

[0520] The same raw material liquid (solution 9, solution 7) as in Example 10 was introduced into ULREA SS-11-75 (manufactured by MTECHNIQUE CO., LTD.), which is a conventional type of device without a downstream processing section, to carry out a dehydration condensation reaction. The method of feeding solution 9 and solution 7 to the fluid processing device (the introduction paths d1 and d2 for supplying solution 9 and solution 7 to the fluid processing device and their supply speed) and the operating conditions of the fluid processing device (the rotation speed of the first processing section 10) were the same as those in Example 10. The effluent flowing out from between the processing surfaces 1 and 2 was collected for 1 minute and quantitatively analyzed using a gas chromatography measuring device. No peak corresponding to the product (structural formula (14)) was detected on the chromatogram, and the reaction rate of Comparative Example 10 was 0%.

[0521] (Example 11: Acetalization reaction of benzaldehyde and ethylene glycol)

[0522] 106 parts by weight of benzaldehyde (structural formula (8), manufactured by Kanto Chemical Co., Ltd.), 186 parts by weight of ethylene glycol (structural formula (15), manufactured by Mitsubishi Chemical Corporation), and 104 parts by weight of dimethoxypropane (manufactured by Sigma Aldrich) were dissolved in 1404 parts by weight of tetrahydrofuran (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) as a solvent to prepare solution 10. A product obtained by dissolving 96 parts by weight of methanesulfonic acid (manufactured by Kanto Chemical Co., Ltd.) as a catalyst in 1704 parts by weight of tetrahydrofuran was prepared as solution 11. Solution 10 was supplied at a flow rate (supply rate) of 10.0 mL / min, and solution 11 was supplied at a flow rate (supply rate) of 1.0 mL / min or 2.0 mL / min. Fig.12 The fluid treatment device F shown in (C) performs an acetalization reaction. The chemical reaction at this time is represented by the reaction formula shown below.

[0523] [Chemistry 10]

[0524]

[0525] The solution 10 is introduced into the fluid processing device F from the first inlet d1 of the fluid processing device F using a liquid feeding pump P1, and the solution 11 is introduced into the fluid processing device F from the second inlet d2 of the fluid processing device F using a liquid feeding pump P2, and an acetalization reaction is carried out. The rotation speed of the first processing part 10 is set to 500rpm. The residence time of the fluid in the downstream side processing space 81 is 20 minutes. The effluent flowing out of the outflow part 68 is taken in a saturated concentration of sodium carbonate (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) aqueous solution for 1 minute to deactivate the acid contained in the solvent and stop the reaction. Then, by contacting diethyl ether with the effluent that stops the reaction, solvent extraction is carried out, thereby recovering the raw materials and the product, taking them into a GC measurement container, and quantitative analysis is carried out using a gas chromatography measurement device. The reaction rate of Example 11 was determined from the ratio of the peak of the raw material appearing at a retention time of 10.2 minutes and the peak of the product 2-phenyl-1,3-dioxolane (structural formula (16)) appearing at 14.2 minutes on the chromatogram. The reaction rate of Example 11 was 64% when the flow rate (supply rate) of solution 11 was 1.0 mL / min and 59% when it was 2.0 mL / min.

[0526] (Comparative Example 11: Acetalization reaction of benzaldehyde and ethylene glycol using a conventional apparatus not having a downstream treatment section)

[0527] The same raw material liquid (solution 10, solution 11) as in Example 11 was introduced into ULREA SS-11-75 (manufactured by MTECHNIQUE CO., LTD.), which is a conventional type of device without a downstream treatment section, to carry out acetalization reaction. The method of feeding solutions 10 and 11 to the fluid treatment device (the introduction paths d1 and d2 for respectively supplying solutions 10 and 11 to the fluid treatment device and their supply speeds) and the operating conditions of the fluid treatment device (the rotation speed of the first treatment section 10) were the same as those in Example 11. The effluent flowing out from between the treatment surfaces 1 and 2 was collected in a saturated sodium carbonate aqueous solution (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) for 1 minute to deactivate the acid in the solvent and stop the reaction. Then, solvent extraction was carried out by contacting the effluent from which the reaction was stopped with diethyl ether, and the raw materials and products were recovered, and were divided into a GC measurement container, and quantitative analysis was carried out using a gas chromatography measurement device. The reaction rate of Comparative Example 11 was 15% when the flow rate (supply rate) of the solution 11 was 1.0 mL / min, and was 25% when the flow rate (supply rate) of the solution 11 was 2.0 mL / min.

[0528] (Example 12: Acetalization reaction of cyclohexanone and ethylene glycol)

[0529] 98 parts by weight of cyclohexanone (structural formula (17), manufactured by Kanto Chemical Co., Ltd.), 186 parts by weight of ethylene glycol (structural formula (15), manufactured by Mitsubishi Chemical Corporation), and 104 parts by weight of dimethoxypropane (manufactured by Sigma Aldrich) were dissolved in 1412 parts by weight of tetrahydrofuran (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) as a solvent to prepare a solution 12. The solution 12 was supplied at a flow rate (supply rate) of 10.0 mL / min, and the solution 11 used in Example 11 was supplied at a flow rate (supply rate) of 1.0 mL / min or 2.0 mL / min. Fig.12 The fluid shown in (C) undergoes acetalization reaction in the treatment device F. The chemical reaction at this time is represented by the reaction formula shown below.

[0530] [Chemistry 11]

[0531]

[0532] The solution 12 was introduced into the fluid treatment device F from the first inlet d1 of the fluid treatment device F using a liquid delivery pump P1, and the solution 11 was introduced into the fluid treatment device F from the second inlet d2 of the fluid treatment device F using a liquid delivery pump P2, and the acetalization reaction was carried out. The residence time of the fluid in the downstream processing space 81 was 20 minutes. The effluent flowing out of the outflow portion 68 was separated into a saturated sodium carbonate aqueous solution for 1 minute to inactivate the acid contained in the solvent and stop the reaction. The effluent flowing out of the outflow portion 68 was quantitatively analyzed using a gas chromatography measuring device using the same operation as in Example 11. The reaction rate of Example 12 was calculated on the chromatogram from the ratio of the peak of the raw material appearing at a retention time of 6.9 minutes and the peak of the product 1,4-dioxaspiro[4.5]decane (structural formula (18)) appearing at 8.5 minutes. The reaction rate of Example 12 was 95% when the flow rate (supply rate) of the solution 11 was 1.0 mL / min, and was 95% when it was 2.0 mL / min.

[0533] (Comparative Example 12: Acetalization reaction of cyclohexanone and ethylene glycol using a conventional apparatus not having a downstream treatment section)

[0534] The same raw material liquid (solution 12, solution 11) as in Example 12 was introduced into ULREA SS-11-75 (manufactured by MTECHNIQUE CO., LTD.), which is an existing type of device without a downstream processing unit, to carry out acetalization reaction. The method of feeding solution 12 and solution 11 to the fluid processing device (the introduction paths d1 and d2 for supplying solution 12 and solution 11 to the fluid processing device and their supply speed) and the operating conditions of the fluid processing device (the rotation speed of the first processing unit 10) were the same as in Example 12. The effluent was collected for 1 minute, and the same operation as in Example 12 was performed, and quantitative analysis was performed using a gas chromatography measuring device. Through the same analysis as in Example 12, the reaction rate of Comparative Example 12 was 22% when the flow rate (supply rate) of solution 11 was 1.0 mL / min, and was 37% when it was 2.0 mL / min.

[0535] For Examples 2 to 12 and Comparative Examples 2 to 12, the reaction formulas and reaction rates of each Example and each Comparative Example are shown in Tables 1 and 2. Furthermore, for Example 11 and Comparative Example 11, and Example 12 and Comparative Example 12, which were implemented by changing the supply rate of the solution 11 to calculate a plurality of reaction rates, the reaction rates when the flow rate of the solution 11 was 2.0 L / min are recorded in Table 2.

[0536] [Table 1]

[0537]

[0538] [Table 2]

[0539]

[0540] Description of Reference Numerals

[0541] 1 First treatment surface

[0542] 2 Second processing surface

[0543] 3 Upstream processing space

[0544] 4 Upstream side outlet

[0545] 10 First processing unit

[0546] 20 Second processing unit

[0547] 61 Shell

[0548] 81 Downstream processing space

[0549] 83 Reserve Department

[0550] 84 Sealing part

[0551] 91 Bottom member

[0552] 110 Inner wall

[0553] 161 outer wall

[0554] 181 Processing Space

[0555] 183 Reserve Department

[0556] 184 Sealing part

[0557] F Fluid handling device, continuous stirring device

Claims

1. A method for producing an organic compound, characterized in that: The fluid treatment device used in the manufacturing method comprises: an upstream treatment section for treating a fluid to be treated between at least two treatment surfaces that are accessible and separable and relatively rotatable, and a downstream treatment section disposed on the downstream side of the upstream treatment section and provided with a plurality of labyrinth seals that function to retain and stir the fluid to be treated that has been treated in the upstream treatment section. The fluid to be processed containing at least one organic compound is passed through the upstream side processing section to perform upstream side processing on the fluid to be processed, and the fluid to be processed that has undergone the upstream side processing is passed through the downstream side processing section to perform downstream side processing on the fluid to be processed that has undergone the upstream side processing, The upstream side treatment and the downstream side treatment are performed continuously.

2. The method for producing an organic compound according to claim 1, wherein: The downstream side processing section includes a narrow sealed space, and a retention space which is arranged on the upstream side of the sealed space and is wider than the sealed space. The upstream side flow outlet of the processed fluid from the upstream side processing section opens in the retention space, and the downstream side processing section continuously arranges a plurality of groups of the sealed space and the retention space from the upstream to the downstream of the flow of the processed fluid.

3. The method for producing an organic compound according to claim 1 or 2, characterized in that: The downstream processing section includes a cylindrical housing portion and a columnar portion housed therein, and the cylindrical housing portion and the columnar portion are relatively rotated by rotation of at least one of the cylindrical housing portion and the columnar portion.

4. The method for producing an organic compound according to claim 3, characterized in that: By rotating at least one of the at least two processing surfaces and / or rotating at least one of the cylindrical housing portion and the columnar portion, a shear force is applied to the processed fluid passing through the upstream processing portion and / or the downstream processing portion.

5. The method for producing an organic compound according to claim 1 or 2, characterized in that: A temperature adjustment mechanism is provided for controlling the temperature of the fluid to be processed that passes through the downstream processing section, and the fluid to be processed that passes through the downstream processing section is heated or cooled by the temperature adjustment mechanism.

6. The method for producing an organic compound according to claim 1 or 2, characterized in that: The downstream processing section is provided with an inlet for introducing a fluid other than the processed fluid from the upstream processing section, so that the fluid other than the processed fluid from the upstream processing section is introduced into the processed fluid from the upstream processing section.

7. The method for producing an organic compound according to claim 1 or 2, characterized in that: The following steps are carried out using one of the fluid processing devices: the reaction substances contained in the processed fluid are immediately mixed at the molecular level in the upstream processing section, and the processed fluid is directly maintained for a long time in the downstream processing section while maintaining necessary reaction conditions.

8. The method for producing an organic compound according to claim 1 or 2, characterized in that: The processed fluid is at least two fluids including a fluid containing at least one organic compound. A fluid containing at least one polymerizable monomer and a fluid containing at least one emulsifier for emulsifying the monomer in the medium or a dispersant for dispersing the monomer in the medium that is not mixed with the monomer are used as the processed fluid. In the upstream side treatment section, an emulsification process or a dispersion process is carried out as the upstream side treatment, and in the downstream side treatment section, a polymerization process is carried out as the downstream side treatment, thereby obtaining a polymer.

9. The method for producing an organic compound according to claim 1 or 2, characterized in that: The processed fluid is at least two fluids including a fluid containing the at least one organic compound, and an organic reaction is performed by the upstream side treatment and the downstream side treatment, and the combination of the at least two fluids and the organic reaction is at least one combination selected from the first to fourth combinations described below, First combination: The at least two fluids are a fluid containing at least one ester and a fluid containing at least one acidic substance or alkaline substance that promotes the hydrolysis of the ester. The organic reaction is a combination of reactions using the hydrolysis to obtain alcohols, Second combination: The at least two fluids are a fluid containing at least one alcohol or amine and a fluid containing at least one of a carboxylic acid, a carboxylic anhydride or a carboxylic acid halide, The organic reaction is a combination of reactions to obtain esters or amides by condensation, The third combination: The at least two fluids are fluids containing at least one aldehyde or ketone and an active methylene compound, and a fluid containing a substance that promotes the reaction of the aldehyde and the active methylene compound or the reaction of the ketone and the active methylene compound. The organic reaction is a combination of reactions to obtain olefins through dehydration condensation, The fourth combination: The at least two fluids are a fluid containing at least one aldehyde or ketone and an alcohol, respectively, and a fluid containing a protonic acid catalyst that promotes the reaction of the aldehyde and the alcohol or the reaction of the ketone and the alcohol, The organic reaction is a combination of acetalization reactions.

10. A method for producing an organic compound, characterized in that: A stirring device is used, wherein the stirring device has an outer wall and an inner wall arranged inside the outer wall concentrically, at least one of the outer wall and the inner wall rotates relative to the other, and a processed object is passed through and stirred in a processing space formed between the outer wall and the inner wall, and a plurality of labyrinth seals are arranged in the processing space; a processed object containing at least one organic compound is introduced from the upstream side of the labyrinth seal, and the retention of the processed object on the upstream side of the labyrinth seal and the subsequent passage of the processed object through the labyrinth seal are repeated to stir the processed object, The processing space combines a narrow sealed space and a retention space which is arranged on the upstream side of the sealed space and is wider than the sealed space as a group, and continuously has multiple groups of the sealed space and the retention space from the upstream to the downstream of the flow of the processed object. The outer wall and the inner wall are in the shape of a frustum of cones. For the purpose of adjusting the width of the sealed space, a gap adjustment mechanism is installed, and the gap adjustment mechanism enables at least one of the outer wall and the inner wall to move concentrically.

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