Lifting mechanism and semiconductor process equipment

Abstract

The present invention provides a lifting mechanism for lifting a vacuum pumping device of a semiconductor process equipment. The lifting mechanism includes an upper support plate, a lifting drive assembly and a bottom plate arranged in sequence from top to bottom. The upper support plate is used to carry and fix the vacuum pumping device. A guide component extending upward in a vertical direction is arranged on the bottom plate. The lifting drive assembly is arranged on the bottom plate, wherein: the lifting drive assembly includes a cam assembly and a rotating handle. The cam assembly is matched with the upper support plate to abut against the top. The cam assembly can be driven to rotate by rotating the handle to drive the upper support plate to lift and lower along the guide component. The above lifting mechanism is simpler to operate, saves time and effort, and has a self-locking function.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor processing, and in particular to a lifting mechanism and semiconductor process equipment. Background Art

[0002] A vacuum pump is a device used to provide a vacuum environment inside a process chamber (such as a process chamber of a semiconductor process equipment), and a molecular pump and a swing valve are two indispensable key components of the vacuum pump.

[0003] like Figure 1 and Figure 2 As shown, the molecular pump 1 and the swing valve 2 are integrally installed at the bottom of the process chamber 3, and the molecular pump 1 is connected to the interior of the process chamber 3 through the swing valve 2. Among them, the molecular pump 1 is used to perform a vacuum operation, and the swing valve 2 is used to control the chamber pressure of the process chamber 3. During the semiconductor process, process by-products (such as process waste gas) will flow through the molecular pump 1 and be discharged into the tail gas treatment equipment, and most of the process by-products are corrosive. Therefore, the molecular pump 1 needs to be disassembled and maintained regularly to reduce the damage of the process by-products to the molecular pump 1 and extend the service life of the molecular pump 1.

[0004] In the prior art, when the molecular pump 1 and the swing valve 2 are disassembled and installed as a whole, a movable lifting platform is usually used to realize the movement process of the molecular pump 1 and the swing valve 2 as a whole. The movable lifting platform has four studs arranged at intervals along the circumference, and the movable lifting platform drives the molecular pump 1 and the swing valve 2 to be lifted and lowered as a whole by adjusting the screwing positions of the four studs. The operation is cumbersome, time-consuming and labor-intensive. Summary of the invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a lifting mechanism and a semiconductor process equipment.

[0006] In the first aspect, the present invention provides a lifting mechanism for lifting a vacuum pumping device of a semiconductor process equipment. The lifting mechanism includes an upper support plate, a lifting drive assembly and a bottom plate arranged in sequence from top to bottom. The upper support plate is used to carry and fix the vacuum pumping device. A guide component extending upward in a vertical direction is arranged on the bottom plate. The lifting drive assembly is arranged on the bottom plate, wherein: the lifting drive assembly includes a cam assembly and a rotating handle. The cam assembly is abutted against the upper support plate, and the cam assembly can be driven to rotate by rotating the handle to drive the upper support plate to rise and fall along the guide component.

[0007] Furthermore, the cam assembly includes a cam and a rotating shaft detachably connected to the cam, and the cam cooperates with the upper support plate; the lifting drive assembly also includes a support arranged on the base plate, the support has an axial through hole, the rotating shaft is passed through the axial through hole, and the support is used to support the rotating shaft; the rotating shaft can be driven to rotate by rotating the handle to drive the cam to rotate.

[0008] Furthermore, the cam includes a first cam and a second cam spaced apart along the rotating shaft, and the support includes a first support and a second support, and the first support and the second support are respectively located on opposite sides of the first cam and the second cam.

[0009] Furthermore, the first cam and the second cam are key-connected to the rotating shaft, the rotating shaft has a first step surface and a second step surface, the first cam is clamped between the first step surface and the first support, and the second cam is clamped between the second step surface and the second support.

[0010] Furthermore, the guide component includes a plurality of evenly distributed guide columns, the upper support plate has a plurality of matching through holes, the plurality of matching through holes correspond one-to-one to the plurality of guide columns, and each guide column is passed through the corresponding matching through hole, so that the upper support plate can be lifted and lowered along the plurality of guide columns.

[0011] Furthermore, the lifting mechanism also includes a self-locking structure arranged on the side of the base plate, and the self-locking structure is arranged on the same side as the rotating handle, for limiting the rotation of the rotating handle so that the upper support plate can be maintained at at least one height position; the rotating handle is connected to the side of either end of the rotating shaft.

[0012] Furthermore, the self-locking structure includes a first stop block. When the upper support plate is located at the lowest position, the first stop block resists the rotating handle to limit the movement trend of the rotating handle toward the first stop block.

[0013] Furthermore, the self-locking structure also includes a second stop block, and the first stop block and the second stop block are respectively located on both sides of the cam assembly. When the upper support plate is at a target height position, the second stop block resists the rotating handle to limit the movement trend of the rotating handle toward the second stop block. The target height position is lower than the highest position that the upper support plate can reach.

[0014] Furthermore, the cam is circular, and the rotating shaft is eccentrically arranged relative to the cam.

[0015] Furthermore, the lifting mechanism also includes a plurality of support components arranged at intervals on the base plate, each support component including a mounting column, an adjustment sleeve, a fastener and a roller structure; the roller structure is arranged on the mounting column and is installed under the base plate through the mounting column; the mounting column passes through the base plate, the adjustment sleeve is arranged on the mounting column and cooperates with the mounting column thread to adjust the distance between the roller structure and the base plate; the fastener is used to fix the adjustment sleeve to the base plate.

[0016] Furthermore, the lifting mechanism also includes two parallel guide rail structures for being fixed on the frame of the semiconductor process equipment, the guide rail structure includes a guide rail body and a limiting structure arranged on the guide rail body; the roller structure includes an upper roller and a lower roller, which are arranged at intervals on the same side of the side wall of the mounting column in the vertical direction, the upper roller and the lower roller respectively rollingly cooperate with the top surface and the bottom surface of the guide rail body, and the limiting structure is used to limit the upper roller and / or the lower roller from detaching from the guide rail structure.

[0017] In a second aspect, the present invention also provides a semiconductor process equipment, including a process chamber and a vacuum pumping device, wherein the vacuum pumping device is arranged at the bottom of the process chamber, and is used to vacuum the interior of the process chamber. The vacuum pumping device also includes a lifting mechanism for lifting and lowering the vacuum pumping device, and the lifting mechanism is the above-mentioned lifting mechanism.

[0018] The present invention has the following beneficial effects:

[0019] In the lifting mechanism provided by the present invention, a guide component extending upward in the vertical direction is arranged on the bottom plate, and a lifting drive assembly is arranged on the bottom plate. The lifting drive assembly includes a cam assembly and a rotating handle. The cam assembly cooperates with the upper support plate, and the operator can drive the cam assembly to rotate by manually operating the rotating handle, thereby driving the upper support plate to lift and lower along the guide component. Among them, the guide component cooperates with the upper support plate to limit the relative movement of the upper support plate and the bottom plate in the horizontal direction. In other words, by setting the guide component, the upper support plate can only be lifted and lowered relative to the bottom plate along the guide component under the drive of the lifting drive assembly, and cannot move relative to the bottom plate in the horizontal direction.

[0020] Since the guide component restricts the upper support plate to be able to be lifted and lowered only in the vertical direction relative to the bottom plate, when the handle is rotated to drive the cam assembly to rotate, the height of the portion where the outer peripheral surface of the cam assembly abuts against the upper support plate will change, thereby driving the upper support plate to be lifted and lowered in the vertical direction relative to the bottom plate. The lifting drive assembly utilizes the special structure of the cam assembly to drive the upper support plate to be lifted and lowered as a whole, which is simpler to operate and saves time and effort compared to the existing method of completely relying on adjusting four studs to achieve lifting and lowering. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the installation position relationship of the molecular pump, the swing valve and the process chamber in the prior art;

[0022] Figure 2 for Figure 1 A schematic diagram showing the installation position relationship of the molecular pump, the swing valve and the process chamber from another angle;

[0023] Figure 3 for Figure 2Schematic diagram of the movement direction of the molecular pump and the swing valve when they are disassembled as a whole;

[0024] Figure 4 A schematic structural diagram of a lifting mechanism according to an embodiment of the present invention;

[0025] Figure 5 for Figure 4 Schematic diagram of the exploded structure of the lifting mechanism;

[0026] Figure 6 for Figure 4 A schematic diagram of the structure of the upper support plate and the isolation gasket of the lifting mechanism;

[0027] Figure 7 for Figure 4 A schematic diagram of the structure of the upper support plate, the lifting drive assembly and the support assembly of the lifting mechanism;

[0028] Figure 8 for Figure 4 A schematic diagram of the structure of the mounting column and bottom roller of the support assembly of the lifting mechanism;

[0029] Fig. 9 is a structural schematic diagram of a lifting mechanism according to another embodiment of the present invention;

[0030] Fig.10 for Fig. 9 Schematic diagram of the exploded structure of the lifting mechanism;

[0031] Fig.11 for Fig. 9 A schematic diagram of the structure of the bottom plate, lifting drive assembly and adjustment sleeve of the lifting mechanism;

[0032] Fig.12 for Fig. 9 A cross-sectional schematic diagram of the cooperation between the support assembly and the guide rail structure of the lifting mechanism;

[0033] Fig.13 for Fig. 9 A schematic diagram of the structure of the supporting assembly and the guide rail structure of the lifting mechanism;

[0034] Fig.14 It is a structural schematic diagram of a rotating handle, a cam assembly, a rotating shaft and a support of a lifting mechanism according to some embodiments of the present invention;

[0035] Fig.15 for Fig.14 A schematic diagram of the positional relationship between the first abutting contact portion, the second abutting contact portion and the middle portion of the cam;

[0036] Fig.16 for Fig.14 A schematic diagram of the lifting mechanism when the rotating handle cooperates with the first stop block;

[0037] Fig.17 for Fig.14 A schematic diagram of the lifting mechanism when the rotating handle is located on the left side of the rotating shaft and extends in the horizontal direction;

[0038] Fig.18 for Fig.14 A schematic diagram of the lifting mechanism when the rotating handle cooperates with the second stop block;

[0039] Fig.19 Schematic diagram of the structure of semiconductor process equipment according to some embodiments of the present invention. DETAILED DESCRIPTION

[0040] In order to enable those skilled in the art to better understand the technical solution of the present invention, the lifting mechanism and semiconductor process equipment provided by the present invention are described in detail below with reference to the accompanying drawings.

[0041] like Figures 1 to 3 As shown, the existing vacuum pumping device for semiconductor process equipment includes a molecular pump 1 and a swing valve 2. The molecular pump 1 is usually cylindrical in shape, and the swing valve 2 is usually similar to a "T-shape" in shape. The molecular pump 1 and the swing valve 2 are installed as a whole at the rear position of the bottom of the process chamber 3, and the molecular pump 1 is connected to the interior of the process chamber 3 through the swing valve 2. A chamber accessory is provided at the front position of the bottom of the process chamber 3. Due to the obstruction of the chamber accessory, the molecular pump 1 can only be disassembled and installed at the rear side of the process chamber 3. In addition, a part of the downward protruding structure of the "T-shaped" swing valve 2 is located on the rear side of the molecular pump 1. Therefore, it is usually necessary to disassemble and install the molecular pump 1 and the swing valve 2 as a whole from the rear side of the process chamber 3 at the same time. Taking the disassembly of the molecular pump 1 and the swing valve 2 as an example, as shown in Figure 3 As shown, the molecular pump 1 and the swing valve 2 need to be moved downward as a whole first, and then moved backward (the installation process is the opposite). The downward movement of the molecular pump 1 and the swing valve 2 as a whole during the disassembly process (or the upward movement during the installation process) is the lifting process, and the backward movement of the molecular pump 1 and the swing valve 2 as a whole during the disassembly process (or the forward movement during the installation process) is the lateral movement.

[0042] The present invention provides a lifting mechanism, which is at least used to lift a vacuum pumping device of a semiconductor process equipment, for example, to drive the vacuum pumping device to move downward when the vacuum pumping device undergoes a disassembly process similar to the above-mentioned one; or to drive the vacuum pumping device to move upward when the vacuum pumping device undergoes an installation process similar to the above-mentioned one.

[0043] like Figures 4 to 7 , Figures 9 to 11 as well as Figures 14 to 19As shown, in some embodiments, the lifting mechanism includes an upper support plate 110, a lifting drive assembly and a bottom plate 120 arranged in sequence from top to bottom. Among them, the upper support plate 110 is used to carry and fix the vacuum device. The fixing method between the vacuum device and the upper support plate 110 is not limited, and can be any method that can achieve a fixed connection between the two. For example, in the specific embodiment shown in the figure, a plurality of evenly distributed connecting studs 112 are provided on the upper support plate 110, each connecting stud 112 is fixed to the upper support plate 110 by cooperating with a nut, and each connecting stud 112 is provided with a connecting thread on the portion located above the upper support plate 110, and the above-mentioned connecting stud 112 is used to be inserted into the connecting structure at the bottom of the vacuum device and threadedly connected thereto, thereby fixing the vacuum device on the upper support plate 110.

[0044] A guide component extending upward in the vertical direction is provided on the bottom plate 120, and a lifting drive assembly is provided on the bottom plate 120. The lifting drive assembly includes a cam assembly and a rotating handle 136. The cam assembly is matched with the upper support plate 110, and the operator can drive the cam assembly to rotate by manually operating the rotating handle 136, thereby driving the upper support plate 110 to rise and fall along the guide component. Among them, the guide component cooperates with the upper support plate 110, thereby limiting the relative movement of the upper support plate 110 and the bottom plate 120 in the horizontal direction. In other words, by providing the guide component, the upper support plate 110 can only be lifted and lowered relative to the bottom plate 120 along the guide component under the drive of the lifting drive assembly, and cannot move relative to the bottom plate 120 in the horizontal direction.

[0045] Since the guide component restricts the upper support plate 110 to be lifted and lowered only in the vertical direction relative to the bottom plate 120, when the rotating handle 136 drives the cam assembly to rotate, the height of the portion where the outer peripheral surface of the cam assembly abuts against the upper support plate 110 will change, thereby driving the upper support plate 110 to be lifted and lowered in the vertical direction relative to the bottom plate 120. The lifting drive assembly utilizes the special structure of the cam assembly to drive the upper support plate 110 to be lifted and lowered as a whole, which is simpler to operate and saves time and effort compared to the existing method of completely relying on adjusting four studs to achieve lifting and lowering.

[0046] like Figure 4 , Figure 5 , Figure 7 , Figures 9 to 11 as well as Figures 14 to 18As shown, in some embodiments, the cam assembly includes a cam and a rotating shaft 133 detachably connected to the cam. The cam is abutted against the upper support plate 110, that is, the outer peripheral surface of the cam is always abutted against the upper support plate 110. The rotating shaft 133 and the cam are limited at least in the circumferential direction of the rotating shaft 133, so that when the rotating shaft 133 rotates, the cam can be driven to rotate together. The lifting drive assembly also includes a support arranged on the base plate 120, the support has an axial through hole, the rotating shaft 133 is penetrated in the axial through hole, and the support is used to support the rotating shaft 133, that is, the rotating shaft 133 is rotatably arranged on the support. The operator can drive the rotating shaft 133 to rotate along its own axis by manually operating the rotating handle 136, thereby driving the cam to rotate around the same axis.

[0047] Preferably, if Figure 4 , Figure 5 , Figure 7 , Figures 9 to 11 as well as Figures 14 to 18 As shown, in some embodiments, the cam includes a first cam 131 and a second cam 132 arranged at intervals along the rotating shaft 133, and the support includes a first support 134 and a second support 135, and the first support 134 and the second support 135 are respectively located on opposite sides of the first cam 131 and the second cam 132. The two ends of the rotating shaft 133 are respectively penetrated in the axial through holes of the first support 134 and the second support 135, that is, the rotating shaft 133 is supported by the first support 134 and the second support 135, and the support is more stable. Generally, the first cam 131 and the second cam 132 have the same structure (that is, the same shape and size), and are connected to the rotating shaft 133 at the same position. The first cam 131 and the second cam 132 can be driven to rotate synchronously by rotating the rotating shaft 133. Since the first cam 131 and the second cam 132 are both abutted against the upper support plate 110, when the first cam 131 and the second cam 132 rotate synchronously, the first cam 131 and the second cam 132 can jointly drive the upper support plate 110 to rise and fall. In the specific embodiment shown in the figure, two avoidance grooves 122 are provided on the bottom plate 120. The two avoidance grooves 122 are respectively located below the first cam 131 and the second cam 132 so as to avoid the first cam 131 and the second cam 132 when they rotate.

[0048] In particular, in some embodiments, the rotating shaft 133 can be designed as a variable diameter shaft structure with different diameters. For example, the diameter of the portion of the rotating shaft 133 between the first cam 131 and the second cam 132 is larger, so that the first step surface and the second step surface are formed on the inner sides of the first cam 131 and the second cam 132, respectively. The first cam 131, the second cam 132 and the rotating shaft 133 can be circumferentially limited by key connection or the like. The first cam 131 is sandwiched between the first step surface and the first support 134, so that the first step surface and the first support 134 jointly limit the first cam 131 in the axial direction; the second cam 132 is sandwiched between the second step surface and the second support 135, so that the second step surface and the second support 135 jointly limit the second cam 132 in the axial direction. In addition, the diameter of the rotating shaft 133 can be consistent with the diameter of the hole for penetrating the rotating shaft 133 in the first cam 131 and the second cam 132, so as to achieve radial positioning between the rotating shaft 133 and the first cam 131, and between the rotating shaft 133 and the second cam 132. The matching mode between the rotating shaft 133, the first cam 131, the second cam 132, the first support 134, and the second support 135 is more convenient for assembly and disassembly.

[0049] Of course, it is understandable that in other embodiments not shown in the figure, the specific number of cams, the connection mode between the rotating shaft 133 and the cams, etc. can be reasonably designed according to actual needs. For example, the rotating shaft 133 is divided into multiple sections, and each section is directly fixedly connected to the end face of the cam.

[0050] like Figures 4 to 7 as well as Figures 9 to 11As shown, in some embodiments, the guide component includes a plurality of uniformly distributed guide posts 150, for example, the plurality of guide posts 150 can be spaced and uniformly distributed along the circumference of the bottom plate 120. Each guide post 150 is disposed on the bottom plate 120 and extends in the vertical direction. The upper support plate 110 has a plurality of matching through holes 111, and the plurality of matching through holes 111 correspond to the plurality of guide posts 150 one by one, and each guide post 150 is penetrated in the corresponding matching through hole 111, so that the upper support plate 110 can be lifted and lowered along the plurality of guide posts 150. Preferably, the top end of each guide post 150 has a guide cone 151, and the guide cone 151 can guide the guide post 150 when it passes through the matching through hole 111. When the upper support plate 110 is lifted and lowered relative to the bottom plate 120, the upper support plate 110 can move along the plurality of guide posts 150, and due to the matching between the guide posts 150 and the matching through holes 111, the upper support plate 110 can be lifted and lowered only in the vertical direction. Of course, it can be understood that the specific structure of the guide component is not limited to this. In other embodiments not shown in the figures, the guide component can be any structure that can guide and limit the upper support plate 110. For example, the guide component can be a guide cover arranged around the upper support plate 110, and the bottom of the guide cover is connected to the base plate 120, and the edges around the upper support plate 110 can move up and down along the inner wall of the guide cover.

[0051] like Figure 4 , Figure 5 , Figure 7 , Figures 9 to 11 as well as Figures 14 to 18 As shown, in some embodiments, the rotating handle 136 is connected to the side of any end of the rotating shaft 133, and the rotating handle 136 is connected to the rotating shaft 133 at an angle, preferably at 90 degrees, so that the operator can save more effort when operating the rotating handle 136. Furthermore, the lifting mechanism also includes a self-locking structure arranged on the side of the bottom plate 120, and the self-locking structure is arranged on the same side as the rotating handle 136. The self-locking structure is used to limit the rotation of the rotating handle 136, that is, the self-locking structure can keep the rotating handle 136 at at least one rotation angle, so that the cam can be kept at at least one corresponding rotation angle, and then the upper support plate 110 can be kept at at least one corresponding height position. Therefore, the above-mentioned lifting mechanism has a self-locking function, which can ensure that the vacuum device is stably placed at the above-mentioned height position, avoid the vacuum device from falling suddenly, and then ensure the personal safety of the operator.

[0052] It should be noted that the rotation position to which the self-locking structure locks the rotating handle 136 is specifically determined according to the height position that the upper support plate 110 actually needs to maintain. In other words, when the specific connection and matching relationship between the rotating handle 136, the cam and the upper support plate 110 is determined, the rotating handle 136 rotates to a certain rotation position, and the cam is in a state corresponding to the rotation position, and then the upper support plate 110 is in a height position corresponding to the rotation position. Based on this, according to the height position that the upper support plate 110 actually needs to maintain, the rotation position of the rotating handle 136 required for self-locking can be reasonably designed.

[0053] Specifically, Figure 4 , Figure 5 , Fig. 9 , Fig.10 as well as Figures 14 to 18 As shown, in some embodiments, the self-locking structure includes a first stopper 161. When the upper support plate 110 is at the lowest position, the first stopper 161 blocks the rotating handle 136 to limit the movement trend of the rotating handle 136 toward the first stopper 161, so as to ensure that the rotating handle 136 remains in the rotation position at this time, and the self-locking of the lifting mechanism at this time is achieved, thereby keeping the upper support plate 110 at the lowest position at this time. Wherein, "lowest position" refers to the position where the upper support plate 110 will not continue to descend. Further, the self-locking structure also includes a second stopper 162. The first stopper 161 and the second stopper 162 are respectively located on both sides of the cam assembly. When the upper support plate 110 is at the target height position, the second stopper 162 blocks the rotating handle 136 to limit the movement trend of the rotating handle 136 toward the second stopper 162, thereby ensuring that the rotating handle 136 remains in the rotation position at this time, and the self-locking of the lifting mechanism at this time is achieved, thereby keeping the upper support plate 110 at the target height position at this time. The target height position can be reasonably designed according to actual needs, and the target height position is lower than the highest position that the upper support plate 110 can reach, and the “highest position” refers to the position where the upper support plate 110 will not continue to rise.

[0054] Preferably, if Figure 4 , Figure 5 , Fig. 9 , Fig.10 as well as Figures 14 to 18 As shown, in some embodiments, the cam is circular, and the rotating shaft 133 is eccentrically arranged relative to the cam, that is, the cam is an eccentric wheel. For example, the first cam 131 and the second cam 132 are both circular, and the distance between the axis of the rotating shaft 133 and the center of the first cam 131 and the second cam 132 is also the same. As the cam rotates, the outer peripheral surface of the cam is sequentially abutted against the upper support plate 110 at various locations along the circumferential direction.

[0055] like Fig.15 As shown, the outer circumference of the cam has a first abutting contact portion 1321, a second abutting contact portion 1322 and a third abutting contact portion 1323. The first abutting contact portion 1321 is configured to have the largest distance from the rotating shaft 133, and "largest distance" means that the distance between the remaining parts of the outer circumference of the cam and the rotating shaft 133 is smaller than the distance L between the first abutting contact portion 1321 and the rotating shaft 133. max The second abutting contact portion 1322 is configured to have a minimum distance from the rotating shaft 133. "Minimum distance" means that the distance between the remaining parts of the outer peripheral surface of the cam and the rotating shaft 133 is greater than the distance L between the second abutting contact portion 1322 and the rotating shaft 133. min The third abutting contact portion 1323 is configured to be located between the first abutting contact portion 1321 and the second abutting contact portion 1322 in the circumferential direction, that is, the third abutting contact portion 1323 is located Fig.15 The middle part shown in .

[0056] In addition, the first abutting contact portion 1321, the second abutting contact portion 1322 and the third abutting contact portion 1323 refer to the portion of the outer circumference of the cam that can abut against the upper support plate 110. Since the cam has a certain thickness, when the longitudinal section of the cam is circular, the cam as a whole can be regarded as a cylindrical shape, and there is a line contact between the cam and the upper support plate 110. At this time, the first abutting contact portion 1321 (or the second abutting contact portion 1322, the third abutting contact portion 1323) can be regarded as a certain area extending axially on the outer circumference of the cam, and the area includes a plurality of "straight lines" that can abut against the upper support plate 110; at the same time, the width of the area along the circumferential direction is small, so that the distances between all the "straight lines" in the area and the center of the rotating shaft 133 can be regarded as equal. It should be noted that the distance between the first abutting contact portion 1321 (or the second abutting contact portion 1322 ) and the rotation shaft 133 refers to the distance between the center of the first abutting contact portion 1321 (or the second abutting contact portion 1322 ) and the center of the rotation shaft 133 .

[0057] The first stopper 161 is disposed on the bottom plate 120 and is located on one side of the rotating shaft 133. Fig.16 As shown, when the upper support plate 110 is in contact with the second contact portion 1322, the distance between the second contact portion 1322 and the rotating shaft 133 is the smallest, and the upper support plate 110 is at the lowest position, and the upper support plate 110 will not fall further. Theoretically, since the cam is in a stable state at this time (i.e., it will not generate a rotation tendency when subjected to downward pressure), even if the upper support plate 110 has a vertical downward movement tendency under the action of gravity, the rotating handle 136 will not spontaneously generate a rotational movement tendency.

[0058] However, since the second abutting contact portion 1322 includes a plurality of “straight lines” that can abut against the upper support plate 110, only when the upper support plate 110 and the second abutting contact portion 1322 are directly opposite to the “straight line” of the center of the rotation shaft 133 (such as Fig.15 When the second abutting contact portion 1322 (the "straight line" in the center of the second abutting contact portion 1322) accurately abuts against each other, even if no restriction is imposed on the rotating handle 136, the rotating handle 136 will not generate any rotational movement tendency. However, in actual operation, the second abutting contact portion 1322 may be any "straight line" abutting against the upper support plate 110, which causes the rotating handle 136 to still have a certain rotational movement tendency, that is, the rotating handle 136 will shake in a small range. Based on this, a first stop block 161 is set on the side where the rotating handle 136 will generate a movement tendency at this time. When the upper support plate 110 abuts against the second abutting contact portion 1322, the first stop block 161 abuts against the rotating handle 136 to limit the movement tendency of the rotating handle 136 toward the first stop block 161, thereby further ensuring that the rotating handle 136 remains in the rotation position at this time, realizing the self-locking of the lifting mechanism at this time, and then keeping the upper support plate 110 at the lowest position at this time.

[0059] The second stop block 162 is disposed on the bottom plate 120 and is located on the other side of the rotating shaft 133, that is, the second stop block 162 and the first stop block 161 are located on opposite sides of the rotating shaft 133. Fig.18 As shown, when the upper support plate 110 is in abutment with the third abutting contact portion 1323, if the operator stops operating the rotating handle 136 and does not impose any restrictions on the rotating handle 136, under the action of the gravity of the vacuum device and the upper support plate 110, the upper support plate 110 has a tendency to move vertically downward, that is, the vacuum device and the upper support plate 110 will press down on the cam. Since the cam is in an unstable state at this time (that is, it will produce a rotation tendency when subjected to downward pressure), this will cause the rotating handle 136 to spontaneously generate a rotational movement tendency in only one direction along with the cam, such as a counterclockwise movement tendency or a clockwise movement tendency. Based on this, a second stop block 162 is set on the side where the rotating handle 136 will have a movement tendency at this time. When the upper support plate 110 and the third abutting contact portion 1323 abut against each other, the second stop block 162 blocks the rotating handle 136 to limit the movement tendency of the rotating handle 136 toward the second stop block 162, so that the rotating handle 136 can be maintained at the rotation position at this time, realizing the self-locking of the lifting mechanism at this time, and then the upper support plate 110 can be maintained at the target height position at this time.

[0060] It should be noted that the specific position of the third abutting contact portion 1323 needs to be designed according to the target height position that the upper support plate 110 needs to maintain. Fig.18In the specific embodiment shown, the upper support plate 110 is in abutment with the third abutting contact portion 1323, and the upper support plate 110 maintains the height position shown in the figure (i.e., the target height position). If the position of the third abutting contact portion 1323 is moved to the right side of the figure by a certain distance, when the upper support plate 110 is in abutment with the third abutting contact portion 1323, the height position of the upper support plate 110 will be lower than the target height position shown in the figure. In addition, when the upper support plate 110 is in abutment with the third abutting contact portion 1323, whether the rotating handle 136 will specifically generate a counterclockwise movement trend or a clockwise movement trend depends on the rotation trend of the cam when it is pressed down, which in turn is related to which side of the second stop block 162 of the cam the third abutting contact portion 1323 is located, which will be specifically explained by example below.

[0061] exist Figures 16 to 18 In the specific embodiment shown, the rotation position of the rotating handle 136 is represented by the rotation angle of the rotating handle 136 , and the specific height position of the upper support plate 110 is determined by the rotation angle of the rotating handle 136 .

[0062] like Fig.16 As shown, the first stop block 161 is arranged on the right side of the rotating shaft 133. The rotating handle 136 is located on the right side of the rotating shaft 133 and extends in the horizontal direction. It is assumed that the rotating handle 136 is in the starting position at this time, that is, the rotation angle is 0 degrees. The upper support plate 110 and the second abutting contact portion 1322 of the outer peripheral surface of the cam are abutted and matched, the upper support plate 110 and the vacuum device are in the lowest position, and the overall height of the lifting mechanism is Ha. At this time, no matter whether the rotating handle 136 rotates clockwise or counterclockwise, the abutting contact position of the outer peripheral surface of the cam and the upper support plate 110 will gradually rise, that is, the upper support plate 110 will rise. Therefore, even if the upper support plate 110 has a tendency to move vertically downward under the action of the gravity of the vacuum device and the upper support plate 110, the rotating handle 136 will not spontaneously generate a tendency to rotate.

[0063] It should be noted that, from the above analysis of the abutment cooperation between the upper support plate 110 and the second abutment contact portion 1322, it can be seen that in actual operation, although the rotating handle 136 is in a relatively stable state, the rotating handle 136 still has a certain rotational movement tendency, that is, the rotating handle 136 may shake within a small range. Therefore, it is necessary to set the first stop block 161 to limit the movement tendency of the rotating handle 136. Fig.16 In the illustrated embodiment, the top surface of the first stop block 161 has a horizontal receiving groove, and when the rotating handle 136 is located on the right side of the rotating shaft 133 and extends in the horizontal direction, the rod portion of the rotating handle 136 can be placed in the horizontal receiving groove.

[0064] The first stopper 161 is mainly used to limit the clockwise movement trend of the rotating handle 136 at this time, and it can also be known from the above-mentioned related analysis that the rotating handle 136 may also have a counterclockwise movement trend at this time. In the embodiment shown in the figure, the top surface of the support is also provided with a support plane. When the upper support plate 110 and the second abutting contact portion 1322 are abutted, the upper support plate 110 fits with the support plane, and the support plane can support and limit the upper support plate 110, so that the upper support plate 110 can reduce or avoid the cam being pressed down by the upper support plate 110, thereby limiting the counterclockwise movement trend of the rotating handle 136 and further limiting the clockwise movement trend. In addition, in other embodiments, it can also be designed that: when the rotating handle 136 is placed on the first stopper 161, the upper support plate 110 and the part slightly to the right of the second abutting contact portion 1322 are abutted. At this time, if the rotating handle 136 has a rotational movement trend, it must be a clockwise movement trend, and the self-locking function can be fully realized by relying only on the first stopper 161.

[0065] like Fig.17 As shown, the rotating handle 136 is located on the left side of the rotating shaft 133 and extends in the horizontal direction. At this time, the rotation angle of the rotating handle 136 is 180 degrees. The upper support plate 110 and the first abutting contact portion 1321 of the outer peripheral surface of the cam are abutted and matched, the upper support plate 110 and the vacuum device are in the highest position, and the overall height of the lifting mechanism is Hb. If there is no restriction on the rotating handle 136, at this time, whether the rotating handle 136 rotates clockwise or counterclockwise, the abutting contact position of the outer peripheral surface of the cam and the upper support plate 110 will gradually decrease, that is, the upper support plate 110 will all drop. Under the action of the gravity of the vacuum device and the upper support plate 110, the upper support plate 110 has a tendency to move vertically downward, and the rotating handle 136 will spontaneously generate a counterclockwise movement trend or a clockwise movement trend, and this state is relatively unstable. Therefore, the rotating handle 136 at this time is not restricted.

[0066] like Fig.18 As shown, the second stopper 162 is disposed on the left side of the rotating shaft 133. The rotating handle 136 is located on the left side of the rotating shaft 133 and extends in an oblique downward direction. At this time, the rotation angle of the rotating handle 136 is related to the target height position of the upper support plate 110. For example, when the target height position of the upper support plate 110 is Fig.18When the rotating handle 136 is at the height position shown in the figure, the rotation angle of the rotating handle 136 is 204 degrees. The upper support plate 110 and the third abutting contact portion 1323 of the outer peripheral surface of the cam abut against each other, and the overall height of the lifting mechanism is Hc. If there is no restriction on the rotating handle 136, under the action of the gravity of the vacuum pumping device and the upper support plate 110, the upper support plate 110 has a tendency to move vertically downward, and the rotating handle 136 will spontaneously generate a tendency to move counterclockwise, and the abutting contact position between the outer peripheral surface of the cam and the upper support plate 110 will gradually decrease, that is, the upper support plate 110 drops. Therefore, it is necessary to set a second stop block 162 to limit the counterclockwise movement tendency of the rotating handle 136. Fig.18 In the illustrated embodiment, the top surface of the second stop block 162 has an inclined accommodating groove. When the rotating handle 136 is located on the left side of the rotating shaft 133 and extends in an oblique downward direction, the rod portion of the rotating handle 136 can be placed in the inclined accommodating groove, thereby limiting the counterclockwise movement trend of the rotating handle 136 at this time through the second stop block 162.

[0067] In the above process, the maximum lifting height of the upper support plate 110 and the vacuum pumping device is Hb-Ha, and the lifting height when self-locking is achieved by the second stop block 162 is Hc-Ha. The first stop block 161 and the second stop block 162 utilize the inherent characteristics of the cam to limit the rotation angle of the rotating handle 136, thereby achieving a self-locking function. It should be noted that the specific form of the self-locking structure and the matching method with the rotating handle 136 are not limited. In other embodiments, it can be any structure that can keep the rotating handle 136 in the desired rotation position. For example, the self-locking structure can be a structure such as a buckle that can be snapped with the rotating handle 136 to lock the rotation angle of the rotating handle 136. In addition, in other embodiments, the rotating handle 136 can also be replaced by a drive motor with a self-locking function, thereby simultaneously achieving the functions of driving the cam to rotate and self-locking. In addition, the specific shape of the cam is not limited to a cylindrical shape. In other embodiments not shown in the figure, it can also be other shapes, as long as it can drive the upper support plate 110 to rise and fall, and facilitate the self-locking function. At this time, when the upper support plate 110 is at the lowest position and the target height position, the specific coordination method of the self-locking structure and the rotating handle 136 needs to be reasonably designed.

[0068] Generally, in order to ensure the wear resistance, compression resistance, tensile resistance, etc. of the structure, each component in the lifting mechanism can be made of metal materials. For example, the support, the rotating shaft 133, the cam, the upper support plate 110, the bottom plate 120, the guide column 150, etc. are all made of metal materials. If two or more components made of metal materials need to rub against each other frequently, metal pollution is likely to occur.

[0069] In order to solve the above problems, in some embodiments, a non-metallic isolation structure is provided between the parts made of metal and in need of frequent friction, so as to play an isolation role. Figure 6 As shown, an isolation gasket 170 is provided on the bottom surface of the upper support plate 110. Specifically, a mounting groove is provided on the bottom surface of the upper support plate 110 at a position corresponding to the cam (e.g., the first cam 131 and the second cam 132), and the isolation gasket 170 is fixedly connected to the mounting groove by a mounting screw. The cam and the isolation gasket 170 are always in contact with each other, and the isolation gasket 170 is used to isolate the cam and the upper support plate 110. The isolation gasket 170 is made of a wear-resistant non-metallic material such as resin. The isolation of the isolation gasket 170 can prevent direct friction between the cam and the upper support plate 110, both of which are made of metal materials, thereby avoiding metal contamination here.

[0070] Furthermore, the hole wall of the axial through hole of the support (such as the first support 134 and the second support 135) may also be provided with a first isolation bushing (not shown in the figure), the rotating shaft 133 is arranged inside the first isolation bushing, and the first isolation bushing is used to isolate the rotating shaft 133 from the hole wall of the axial through hole. The first isolation bushing is made of a wear-resistant non-metallic material such as resin, and the isolation of the first isolation bushing can prevent direct friction between the rotating shaft 133 and the support, both of which are made of metal materials, thereby avoiding metal contamination here.

[0071] In addition, the hole wall of the matching through hole 111 of the upper support plate 110 may also be provided with a second isolation bushing (not shown in the figure), and the guide column 150 is arranged inside the second isolation bushing, and the second isolation bushing is used to isolate the guide column 150 from the hole wall of the matching through hole 111. The second isolation bushing is made of a wear-resistant non-metallic material such as resin, and the isolation of the second isolation bushing can prevent direct friction between the guide column 150 and the upper support plate 110, both of which are made of metal materials, thereby avoiding metal contamination here.

[0072] In some embodiments, the lifting mechanism is also used to drive the vacuum device to move horizontally. That is, the lifting mechanism as a whole is movably arranged. It should be noted that, in general, the lifting mechanism as a whole can move in a horizontal plane, thereby driving the vacuum device to move horizontally, for example, Fig.19As shown, when the vacuum device is disassembled, it moves laterally from the bottom of the process chamber 400 to the rear side of the process chamber 400; or, when the vacuum device is installed, it moves laterally from the rear side of the process chamber 400 to the bottom of the process chamber 400. Of course, it can be understood that according to the specific requirements of the vacuum device disassembly and assembly process, the lifting mechanism as a whole can also move in the inclined plane. In addition, the overall lifting of the upper support plate 110 is generally also lifted in the vertical direction, that is, the vacuum device is lifted in the vertical direction. For example, when the vacuum device is disassembled, the vacuum device is lowered to a certain height position to facilitate the subsequent lateral movement operation; or, when the vacuum device is installed, after the vacuum device is moved laterally to the bottom of the process chamber 400, the vacuum device is raised to a certain height position to facilitate the subsequent connection operation with the bottom of the process chamber 400.

[0073] like Fig.19 As shown, in some embodiments, the vacuum device includes a molecular pump 510 and a swing valve 520, the molecular pump 510 and the swing valve 520 are located at the bottom of the process chamber 400, the molecular pump 510 is connected to the inside of the process chamber 400 through the swing valve 520, and the connection studs 112 of the upper support plate 110 are fixedly connected to the connection structure at the bottom of the molecular pump 510 by threads. In the prior art, the movable lifting platform first raises the molecular pump 1 and the swing valve 2 to a certain height by adjusting the screwing position of the four studs. In order to facilitate the subsequent connection operation of the operator, there should be a certain gap between the top surface of the molecular pump 1 and the bottom of the process chamber 3. Thereafter, the operator lifts the movable lifting platform and the molecular pump 1 and the swing valve 2 as a whole by manpower until the top surface of the molecular pump 1 is basically in contact with the bottom of the process chamber 3, and then connects the two by fasteners such as screws. However, in this process, there is a risk that the movable lifting platform, the molecular pump 1, and the swing valve 2 may suddenly fall due to operator error, which may easily cause personal injury to the operator and pose a safety hazard.

[0074] In some embodiments, a height-adjustable support assembly is provided on the bottom plate 120 to be used together with the lifting drive assembly to avoid the risk of the above-mentioned device falling. Figures 4 to 13As shown, in some embodiments, the lifting mechanism further includes a plurality of evenly distributed support assemblies 200 spaced apart on the bottom plate 120. Preferably, there are four support assemblies 200, and the four support assemblies 200 are respectively disposed at the four corners of the bottom plate 120. Each support assembly 200 includes an adjustment component 210 and a roller structure, and the roller structure is installed below the bottom plate 120 through the adjustment component 210, and the distance between the roller structure and the bottom plate 120 in the vertical direction is adjustable. As the bearing assembly moves, the roller structure can roll within the plane in which it is located, so that the support assembly 200 can support the bearing assembly during this process. Fig.19 As shown, after the bearing assembly is moved to the bottom of the process chamber 400, the distance between the roller structure and the bottom plate 120 can be increased by operating the adjustment component 210, that is, the bearing assembly as a whole rises to a certain height, and at this time there is a certain space between the top surface of the molecular pump 510 and the bottom of the process chamber 400. After that, the cam is driven to rotate by rotating the handle 136, thereby driving the upper support plate 110 and the molecular pump 510 and the swing valve 520 carried by it to continue to rise until the top surface of the molecular pump 510 is basically in contact with the bottom of the process chamber 400, and then the two are connected by fasteners such as screws. In this process, there is no need for the operator to lift the equipment by manpower, thereby avoiding the risk of sudden falling of the equipment and ensuring the personal safety of the operator.

[0075] The specific structure of the adjustment component 210 is not limited and can be any structure that can achieve the height adjustment function. Figures 4 to 12 As shown, in some embodiments, the adjustment component 210 includes a mounting post 211, an adjustment sleeve 212 and a fastener 213, and the roller structure is arranged on the mounting post 211 and is installed below the base plate 120 through the mounting post 211. The base plate 120 has a through hole 121, and the mounting post 211 passes through the base plate 120 through the through hole 121. The adjustment sleeve 212 is sleeved on the mounting post 211, and the adjustment sleeve 212 and the mounting post 211 are threadedly matched. By changing the threaded engagement position between the adjustment sleeve 212 and the mounting post 211, the position of the mounting post 211 in the vertical direction can be changed, thereby adjusting the distance between the roller structure and the base plate 120. Preferably, the mounting post 211 can be driven to move in the vertical direction by rotating the adjustment sleeve 212, thereby adjusting the distance between the roller structure and the base plate 120. After the adjustment is completed, the adjustment sleeve 212 is fixedly connected to the base plate 120 by the fastener 213. During this process, the mounting column 211 and the roller structure arranged thereon do not need to rotate, and only need to move in the vertical direction.

[0076] It should be noted that, in other embodiments, the position of the mounting column 211 can also be changed by rotating the mounting column 211, keeping the adjustment sleeve 212 stationary, or rotating both the mounting column 211 and the adjustment sleeve 212. However, it should be ensured that the specific structure of the roller structure does not restrict the rotation of the mounting column 211, that is, the roller structure can rotate with the mounting column 211. In addition, in the specific embodiment shown in the figure, the adjustment sleeve 212 is located above the bottom plate 120, and the fastener 213 is a plurality of fastening screws. Of course, it can be understood that in other embodiments, the adjustment sleeve 212 can also be located below the bottom plate 120, and the fastener 213 can also be other fasteners such as positioning pins, buckles, etc.

[0077] In addition, the specific structure of the roller structure is not limited, and can be any component that can roll in the plane in which it is located as the bearing assembly moves. Figure 4 , Figure 5 , Figure 7 as well as Figure 8 As shown, in some embodiments, the roller structure includes a bottom roller 221, which is embedded in the bottom end of the mounting column 211 and can roll. Preferably, the bottom roller 221 can adopt a spherical roller structure. The structure and setting method of the above roller structure occupy less machine space, and the bottom roller 221 can be set on a plane of many structural equipment to roll, and has a wider application.

[0078] like Figure 1 and Figure 2 As shown, since the shape of the swing valve 2 is similar to a "T-shape", the downward protruding structure of the "T-shaped" swing valve 2 is located on the side of the molecular pump 1, and the center of gravity of the molecular pump 1 and the swing valve 2 as a whole is offset. In addition, since the weight of the molecular pump 1 and the swing valve 2 are both large (the weight of the molecular pump 1 is about 30-40Kg, and the weight of the swing valve 2 is about 20-30Kg), during the operation of the existing movable lifting platform, there is a risk of the molecular pump 1, the swing valve 2 and the movable lifting platform tipping over as a whole.

[0079] In order to solve this problem, in other embodiments, the roller structure is specially designed and used in conjunction with the guide rail structure. Figures 9 to 13 As shown, the lifting mechanism further includes two parallel guide rail structures 300, which are used to be fixedly arranged on a frame 600 of the semiconductor process equipment. Each guide rail structure 300 includes a guide rail body 310 and a limiting structure arranged on the guide rail body 310.

[0080] On the one hand, the roller structure includes an upper roller 222 and a lower roller 223, which are arranged at intervals on the same side of the side wall of the mounting column 211 in the vertical direction, and the upper roller 222 and the lower roller 223 respectively roll with the top surface and the bottom surface of the guide rail body 310. The extension direction of the guide rail body 310 is the long side direction, and the direction perpendicular to the extension direction of the guide rail body 310 is the short side direction. The upper support plate 110, the bottom plate 120 and the lifting drive assembly can move along the long side direction of the guide rail body 310 as a whole. When moving, the upper roller 222 and the lower roller 223 roll along the guide rail body 310, and the upper roller 222 and the lower roller 223 will not separate from the guide rail body 310 in the vertical direction as a whole.

[0081] On the other hand, the limiting structure can limit the displacement of the upper roller 222 and / or the lower roller 223 in the short side direction, thereby preventing the upper roller 222 and / or the lower roller 223 from escaping from the guide rail structure 300. Specifically, in the specific embodiment shown in the figure, the limiting structure includes a stop flange 320 connected to one side of the guide rail body 310, that is, the cross section of each guide rail structure 300 is "L-shaped". The stop flange 320 and the guide rail body 310 are extended in the same direction. The stop flange 320 can resist the side of the upper roller 222 and / or the lower roller 223 away from the mounting column 211. At the same time, the stop flanges 320 of the two guide rail structures 300 are arranged oppositely, and the roller structures of at least two of the multiple support assemblies 200 are respectively matched with the two guide rail structures 300, so that the displacement of the roller structure in the short side direction can be limited, thereby preventing the roller structure from escaping from the side of the guide rail structure 300.

[0082] The example of two guide rail structures 300 and four roller structures is used for illustration. Specifically, the two guide rail structures 300 may be symmetrically arranged as two "L-shaped" guide rail structures 300 arranged opposite to each other (e.g. Fig.13 In the state shown in FIG. 3 , the two stop flanges 320 are close to each other, and the four roller structures are divided into two groups, each group includes two roller structures arranged in the same direction, and the arrangement directions of the two groups of roller structures are opposite. The two groups of roller structures are respectively matched with the corresponding two guide rail structures 300. Fig.13As shown, the upper roller 222 and the lower roller 223 of the roller structure on the left are located on the right side of the mounting column 211, and the upper roller 222 and the lower roller 223 are abutted and matched with the stop flange 320 of the guide rail structure 300 on the left, thereby preventing the roller structure on the left from moving to the right. Correspondingly, the upper roller 222 and the lower roller 223 of the roller structure on the right are located on the left side of the mounting column 211, and the upper roller 222 and the lower roller 223 are abutted and matched with the stop flange 320 of the guide rail structure 300 on the right, thereby preventing the roller structure on the right from moving to the left. The above two groups of roller structures and the two guide rail structures 300 cooperate together to prevent the roller structure from escaping from the side of the guide rail structure 300.

[0083] The guide rail structure 300 serves as a support for the entire lifting mechanism, the molecular pump 510, and the swing valve 520. When the lifting mechanism is working, the guide rail structure 300 can be fixed to the frame 600 through the mounting holes and other structures thereon, thereby ensuring that the lifting mechanism cannot be separated from the frame 600, thereby ensuring safety. At the same time, combining the above two aspects, it is possible to prevent the lifting mechanism, the molecular pump 510, and the swing valve 520 from tipping over or overturning as a whole.

[0084] The present invention also provides a semiconductor process equipment, according to an embodiment of the semiconductor process equipment, including a process chamber 400 and a vacuum pumping device, the vacuum pumping device is arranged at the bottom of the process chamber 400, and the vacuum pumping device is used to vacuum the interior of the process chamber 400. In some embodiments, the vacuum pumping device includes a molecular pump 510 and a swing valve 520, the molecular pump 510 and the swing valve 520 are located at the bottom of the process chamber 400, and the molecular pump 510 is connected to the interior of the process chamber 400 through the swing valve 520. In addition, the semiconductor process equipment also includes a lifting mechanism for lifting and lowering the vacuum pumping device, and the lifting mechanism is the lifting mechanism of the above embodiment. The upper support plate 110 of the lifting mechanism is fixedly connected to the molecular pump 510.

[0085] It is to be understood that the above embodiments are merely exemplary embodiments used to illustrate the principles of the present invention, but the present invention is not limited thereto. For those of ordinary skill in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.

Claims

1. A semiconductor process equipment, comprising a process chamber and a vacuum pumping device, wherein the vacuum pumping device is arranged at the bottom of the process chamber, and the vacuum pumping device is used to vacuum the interior of the process chamber, characterized in that: It also includes a lifting mechanism for lifting the vacuum device, the lifting mechanism includes an upper support plate, a lifting drive assembly and a bottom plate arranged in sequence from top to bottom, the upper support plate is used to carry and fix the vacuum device, the bottom plate is provided with a guide component extending upward in a vertical direction, the lifting drive assembly is arranged on the bottom plate, wherein: The lifting drive assembly includes a cam assembly and a rotating handle, wherein the cam assembly is abutted against the upper support plate, and the cam assembly can be driven to rotate by the rotating handle to drive the upper support plate to rise and fall along the guide component; The cam assembly comprises a cam and a rotating shaft detachably connected to the cam, and the cam is abutted against the upper support plate; The lifting drive assembly further comprises a support provided on the bottom plate, the support having an axial through hole, the rotating shaft passing through the axial through hole, and the support being used to support the rotating shaft; the rotating shaft can be driven to rotate by the rotating handle to drive the cam to rotate; The lifting mechanism further comprises a self-locking structure arranged on the side of the bottom plate, and the self-locking structure is arranged on the same side as the rotating handle, and is used to limit the rotation of the rotating handle so that the upper support plate can be maintained at at least one height position; the rotating handle is connected to the side of any end of the rotating shaft; The self-locking structure includes a first stop block. When the upper support plate is at the lowest position, the first stop block blocks the rotating handle to limit the movement trend of the rotating handle toward the first stop block, so that the rotating handle is kept at the rotation position at this time, so as to lock the rotation angle of the rotating handle at this time. The self-locking structure further comprises a second stop block, wherein the first stop block and the second stop block are respectively located at two sides of the cam assembly, and when the upper support plate is located at a target height position, the second stop block resists the rotating handle to limit the movement trend of the rotating handle toward the second stop block, so that the rotating handle is kept at the rotation position at this time, so as to achieve locking of the rotation angle of the rotating handle at this time, and the target height position is lower than the highest position that the upper support plate can reach; The cam is circular, and the rotating shaft is eccentrically arranged relative to the cam; The lifting mechanism further comprises a plurality of support assemblies spaced apart on the bottom plate, each of the support assemblies comprising a mounting column, an adjustment sleeve, a fastener and a roller structure; The roller structure is arranged on the mounting post and is installed below the base plate through the mounting post; the mounting post passes through the base plate, and the adjustment sleeve is sleeved on the mounting post and matched with the mounting post thread to adjust the distance between the roller structure and the base plate; the fastener is used to fix the adjustment sleeve to the base plate; The self-locking structure is a buckle, and the buckle is engaged with the rotating handle to lock the rotation angle of the rotating handle; The lifting mechanism further comprises two parallel guide rail structures, which are used to be fixedly arranged on the frame of the semiconductor process equipment, and the guide rail structure comprises a guide rail body and a limiting structure arranged on the guide rail body; The roller structure comprises an upper roller and a lower roller, which are arranged at intervals on the same side of the side wall of the mounting column in the vertical direction, and the upper roller and the lower roller are respectively rollingly matched with the top surface and the bottom surface of the guide rail body. The limiting structure is used to limit the upper roller and / or the lower roller from being separated from the guide rail structure.

2. The semiconductor process equipment according to claim 1, characterized in that: The cam comprises a first cam and a second cam spaced apart along the rotating shaft, and the support comprises a first support and a second support, wherein the first support and the second support are respectively located on opposite sides of the first cam and the second cam.

3. The semiconductor process equipment according to claim 2, characterized in that: The first cam and the second cam are key-connected to the rotating shaft, the rotating shaft has a first step surface and a second step surface, the first cam is clamped between the first step surface and the first support, and the second cam is clamped between the second step surface and the second support.

4. The semiconductor process equipment according to claim 1, characterized in that: The guide component includes a plurality of evenly distributed guide columns, and the upper support plate has a plurality of matching through holes, the plurality of matching through holes correspond one-to-one to the plurality of guide columns, and each of the guide columns is inserted into the corresponding matching through hole, so that the upper support plate can be lifted and lowered along the plurality of guide columns.

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