Cleaning device

Abstract

The present invention discloses a cleaning device for cleaning a substrate, the cleaning device comprises a shell, a carrier, a liquid receiving structure and a flow guide, wherein a cleaning chamber is arranged in the shell; the carrier is rotatably arranged in the cleaning chamber and is used to carry the substrate; the liquid receiving structure is arranged in the cleaning chamber, the liquid receiving structure is provided with a liquid receiving groove arranged around the outer periphery of the carrier, the liquid receiving groove is used to receive the processing liquid thrown outward when the carrier rotates; the flow guide is arranged in the cleaning chamber, and is used to spray fluid into the liquid receiving groove, so as to form a fluid wall in the liquid receiving groove that can guide the processing liquid to flow to the bottom wall of the liquid receiving groove. The cleaning device proposed by the present invention has higher cleaning reliability for substrates.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a substrate processing device. Background Art

[0002] In the semiconductor manufacturing process, the cleaning quality of the substrate can directly affect the performance of the related semiconductor devices. In addition, as the size of integrated circuits becomes smaller and the structure becomes more complex, the sensitivity of the substrate to the residual contaminants on its surface is gradually increasing.

[0003] In the related art, the substrate is fixed on a chuck in a cleaning chamber, and a treatment liquid is sprayed onto the substrate through a spray device above the chuck, and the chuck is driven to rotate the substrate to achieve substrate cleaning. When the chuck rotates, the treatment liquid is thrown out from the edge of the substrate under the action of centrifugal force, and the thrown-out part of the treatment liquid collides with the side wall of the cleaning chamber and splashes onto the surface of the substrate, causing the surface of the substrate to become dirty, resulting in the cleaning of the substrate not being clean and reliable enough, and affecting the performance of the single wafer product. Summary of the invention

[0004] The main purpose of the present invention is to provide a cleaning device, aiming to improve the reliability of substrate cleaning.

[0005] To achieve the above object, the present invention provides a cleaning device for cleaning a substrate, the cleaning device comprising:

[0006] A housing, wherein a cleaning chamber is provided in the housing;

[0007] A carrying platform, which is rotatably disposed in the cleaning chamber and is used to carry the substrate;

[0008] A liquid receiving structure, the liquid receiving structure is arranged in the cleaning chamber, the liquid receiving structure is provided with a liquid receiving groove arranged around the outer periphery of the supporting platform, and the liquid receiving groove is used to receive the processing liquid thrown outward when the supporting platform rotates; and

[0009] A flow guide is disposed in the cleaning chamber and is used to spray fluid into the liquid receiving tank to form a fluid wall in the liquid receiving tank that can guide the treated liquid to flow toward the bottom wall of the liquid receiving tank.

[0010] In one embodiment of the present invention, the liquid contact structure includes a first stopper, a second stopper, and a portion of the inner peripheral wall of the cleaning chamber;

[0011] The first stopper and the second stopper are arranged around the inner peripheral wall of the cleaning chamber, the first stopper is located above the second stopper, and the first stopper, the second stopper and a part of the inner peripheral wall of the cleaning chamber are surrounded to form the liquid receiving groove;

[0012] Wherein, when the substrate is located on the supporting platform, the plane where the substrate is located is located between the ends of the first stopper and the second stopper away from the inner peripheral wall of the cleaning chamber.

[0013] In one embodiment of the present invention, the first stopper is further connected to the top wall of the cleaning chamber, and a drainage slope is provided on a side of the first stopper facing the second stopper;

[0014] The flow guide is connected to the end of the first stopper away from the inner peripheral wall of the cleaning chamber, and sprays the fluid toward the drainage slope.

[0015] In one embodiment of the present invention, the flow guide is connected to the end of the first stopper away from the inner peripheral wall of the cleaning chamber, and is arranged around the outer periphery of the supporting platform;

[0016] The flow guide is provided with a cavity and a fluid inlet end and a fluid outlet end connected to the cavity. The fluid outlet end is located between the first stop part and the second stop part, and is used to spray the fluid toward the first stop part so that the fluid wall is formed on the side of the first stop part facing the second stop part.

[0017] In one embodiment of the present invention, the fluid outflow end is provided with an opening, the opening is annular, the opening is arranged around the outer circumference of the supporting platform, and is connected to the cavity;

[0018] Alternatively, the fluid outflow end is provided with a plurality of through holes connected to the cavity, the plurality of through holes are arranged at intervals around the outer circumference of the supporting platform, and the fluid injection directions of any two adjacent through holes are not parallel.

[0019] In one embodiment of the present invention, the fluid outflow end is provided with a plurality of through holes connected to the cavity, the plurality of through holes are arranged at intervals around the outer circumference of the support platform, and the fluid inflow end is provided with a plurality of inflow holes connected to the cavity;

[0020] Each of the inflow holes is located between two adjacent through holes;

[0021] And / or, the axial directions of the plurality of through holes are parallel, and an angle between the axial direction of each of the inflow holes and the axial direction of any of the through holes is defined as α, 30°≤α≤150°.

[0022] In one embodiment of the present invention, the angle between the fluid ejection direction of the fluid outflow end and the plane where the first stop portion is located is defined as β, and 5°≤β≤30°.

[0023] In one embodiment of the present invention, the extension direction of the first stopper is arranged at an angle γ with the plane where the substrate is located, γ≠0° and γ≠180°;

[0024] And / or, the extension direction of the second stopper is arranged at an angle β with the plane where the substrate is located, θ≠0° and θ≠180°.

[0025] In one embodiment of the present invention, it is defined that in the radial direction of the substrate, the distance between the guide member and the substrate is D, 0<D;

[0026] And / or, a height difference between a plane where the substrate is located and the guide member is defined as H, 0<H.

[0027] In one embodiment of the present invention, the cleaning device further comprises a supply module, wherein the supply module is connected to the flow guide member via a pipeline and is used for supplying the fluid to the flow guide member.

[0028] In one embodiment of the present invention, the supply device further includes a temperature control module;

[0029] The supply module, the temperature control module and the flow guide are connected in sequence through pipelines, and the temperature control module is used to adjust the temperature of the fluid supplied to the flow guide.

[0030] In one embodiment of the present invention, the cleaning device further comprises a circulation module, and the circulation module comprises a flow guiding unit and a pumping unit;

[0031] The flow guide unit has a first connection end, a second connection end and a discharge end, the first connection end is connected to the liquid receiving tank through a pipeline, the second connection end is connected to the pumping unit through a pipeline, and the pumping unit is connected to the supply module through a pipeline;

[0032] The guide unit has a supply state and a discharge state. In the supply state, the first connection end is connected to the second connection end; in the discharge state, the first connection end is connected to the discharge end.

[0033] In one embodiment of the present invention, the circulation module further comprises a filtering unit, and the second connection end, the filtering unit and the pumping unit are sequentially connected via a pipeline;

[0034] In the replenishing state, the filtering unit filters the treatment liquid flowing into the pumping unit from the second connecting end.

[0035] The technical solution of the present invention is to set a liquid receiving groove on the periphery of the carrier platform, receive the processing liquid for cleaning the single wafer thrown out when the carrier platform rotates, and then spray the fluid into the liquid receiving groove through the guide member, so that the fluid flows from the guide member to the bottom wall of the liquid receiving groove and forms a fluid wall. The processing liquid thrown out by the carrier platform will collide with the fluid wall in the liquid receiving groove with a certain momentum. At this time, the fluid wall becomes a barrier to buffer the splashing processing liquid. The processing liquid that collides with the fluid wall will flow to the bottom wall of the liquid receiving groove under the drive of the fluid. In this way, on the one hand, the processing liquid thrown out by the carrier platform will not collide with the side wall of the cleaning chamber and splash onto the surface of the substrate, which avoids the contamination of the substrate by the used processing liquid and improves the reliability of substrate cleaning; on the other hand, the processing liquid thrown out by the carrier platform will be uniformly collected in the liquid receiving groove under the action of the fluid wall, which is conducive to the recovery and reuse of the processing liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0037] Figure 1 It is a schematic structural diagram of a cleaning device in one embodiment of the present invention;

[0038] Figure 2 It is a schematic structural diagram of another embodiment of the cleaning device of the present invention;

[0039] Figure 3 for Figure 2 In the diagram, the structure diagram after adding the fluid wall is shown on the basis of the enlarged structure diagram in Part A;

[0040] Figure 4 for Figure 2 The enlarged structure diagram of part A in the middle;

[0041] Figure 5 for Figure 2 The enlarged structure diagram of part A in the middle;

[0042] Figure 6 for Figure 2 A structural diagram of the first stopper and the guide member;

[0043] Figure 7 for Figure 6 Enlarged structural diagram of part B.

[0044] Description of Figure Numbers:

[0045]

[0046]

[0047] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0048] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0049] It should be noted that all directional indications in the embodiments of the present invention (such as up, down, left, right, front, back, etc.) are only used to explain the relative position relationship, movement status, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.

[0050] In the present invention, unless otherwise clearly specified and limited, the terms "connection", "fixation", etc. should be understood in a broad sense. For example, "fixation" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0051] In addition, in the present invention, descriptions such as "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. The meaning of "and / or" appearing in the full text is that it includes three parallel solutions. Taking "A and / or B as an example", it includes solution A, or solution B, or solutions that satisfy both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in this field to implement. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0052] The embodiment of the present invention provides a cleaning device for cleaning a substrate 9. Figure 1 and Figure 2As shown, the cleaning device includes a shell 1, a supporting platform 2, a liquid receiving structure 3 and a flow guide 4, wherein a cleaning chamber 1a is provided in the shell 1; the supporting platform 2 is rotatably disposed in the cleaning chamber 1a and is used to carry a substrate 9; the liquid receiving structure 3 is disposed in the cleaning chamber 1a, and the liquid receiving structure 3 is provided with a liquid receiving groove 3a disposed around the outer periphery of the supporting platform 2, and the liquid receiving groove 3a is used to receive the processing liquid thrown outward when the supporting platform 2 rotates; the flow guide 4 is disposed in the cleaning chamber 1a, and is used to spray fluid into the liquid receiving groove 3a, so as to form a fluid wall 4a in the liquid receiving groove 3a that can guide the processing liquid to flow toward the bottom wall of the liquid receiving groove 3a.

[0053] In this embodiment, the housing 1 encloses a cleaning chamber 1a for accommodating the carrier 2 and the substrate 9, and the cleaning chamber 1a provides a cleaning space for the substrate 9. The housing 1 can be made of metal or metal alloy, and its appearance and shape are not limited.

[0054] The carrier 2 is rotatably disposed in the cleaning chamber 1a, for example, the carrier 2 is rotatably disposed on the bottom wall of the cleaning chamber 1a. The carrier 2 may specifically include a driving member, a turntable, and a plurality of chuck pins; wherein, the turntable is provided with a rotating shaft, which is penetrated through the bottom wall of the cleaning chamber 1a, and a plurality of chuck pins are provided on the side of the bottom wall of the turntable facing away from the cleaning chamber 1a. The plurality of chuck pins may be evenly distributed at equal intervals on the edge of the turntable, and the chuck pins are used to clamp and fix the substrate 9 so that the substrate 9 is reliably fixed to the turntable. The driving member is connected to the rotating shaft, and drives the rotating shaft to drive the turntable and the substrate 9 to rotate. The cleaning device also includes a spray module 8, which is located above the carrier 2 and is used to spray a processing liquid onto the substrate 9 on the carrier 2, and the processing liquid is used to clean the substrate 9, and the processing liquid includes but is not limited to hot sulfuric acid and alkaline liquid. In this way, the driving member and the spray module 8 work together, and the spray module 8 sprays the processing liquid onto the rotating substrate 9. The processing liquid on the surface of the single wafer and the surface of the turntable will be thrown outward with the rotation of the turntable, and the thrown out processing liquid enters the liquid receiving groove 3a of the liquid receiving structure 3. The specific structure of the above-mentioned carrier 2 is only used as an exemplary description to facilitate the understanding of the purpose of this embodiment, and does not represent the only limitation on the specific structure of the carrier 2. The actual carrier 2 can be any structure that can realize the positioning, fixing and rotation of the substrate 9.

[0055] The liquid receiving structure 3 is used to receive and collect the treatment liquid thrown outward from the carrier 2. The liquid receiving structure 3 may include a shell disposed in the cleaning chamber 1a, and the shell is provided with a liquid receiving groove 3a; the liquid receiving structure 3 may also include a shell and a part of the cavity wall of the cleaning chamber 1a, and the shell is connected to the cavity wall of the part of the cleaning chamber 1a and encloses to form the liquid receiving groove 3a; the difference between the two types of liquid receiving structures 3 is that the shell of the liquid receiving structure 3 is separately disposed in the cleaning chamber 1a and the liquid receiving groove 3a is independently disposed, or the shell needs to cooperate with the cavity wall of the part of the cleaning chamber 1a to form the liquid receiving groove 3a. However, no matter which of the above two situations the liquid receiving structure 3 belongs to, the notch of the liquid receiving groove 3a on the liquid receiving structure 3 faces the carrier 2, so that the treatment liquid thrown outward from the carrier 2 and the substrate 9 can enter the liquid receiving groove 3a and be collected.

[0056] The flow guide 4 is used to spray fluid into the liquid receiving tank 3a, so that a fluid wall 4a is formed in the liquid receiving tank 3a when the fluid flows, and the fluid includes gas and liquid. The flow guide 4 can be arranged adjacent to the notch of the liquid receiving tank 3a, and the flow guide 4 can spray fluid toward the upper side wall, lower side wall or bottom wall of the liquid receiving tank 3a, so that the fluid wall 4a formed by the fluid spraying passes through the notch of the liquid receiving tank 3a and extends to the lower side wall or bottom wall of the liquid receiving tank 3a. The treatment liquid entering the liquid receiving tank 3a through the notch of the liquid receiving tank 3a will impact the fluid wall 4a, and the flow direction of the fluid is downward, so when the fluid flows, the treatment liquid that impacts the fluid wall 4a will be driven to flow downward, so that the treatment liquid flows with the fluid to the lower side wall or bottom wall of the liquid receiving tank 3a, and the treatment liquid that falls to the lower side wall of the liquid receiving tank 3a will also continue to slide toward the bottom wall of the liquid receiving tank 3a under the influence of gravity, so the treatment liquid entering the liquid receiving tank 3a will flow and gather toward the bottom wall of the liquid receiving tank 3a. It is worth pointing out that, because the processing liquid on the carrier 2 will be thrown out in all directions around the carrier 2 when the carrier 2 rotates, the liquid receiving groove 3a is an annular groove, which is arranged around the periphery of the carrier 2, and the flow guide 4 will also adaptively spray fluid into the liquid receiving groove 3a along the annular direction of the liquid receiving groove 3a to form an annular fluid wall 4a in the liquid receiving groove 3a, so as to guide the flow direction of the processing liquid thrown out in all directions around the carrier 2, so that the processing liquid thrown out of the carrier 2 can be collected in the liquid receiving groove 3a. The above-mentioned flow guide 4 can be a nozzle, a spray gun, etc. for spraying fluid, which is not limited here.

[0057] To better illustrate this embodiment, Figure 3As shown, the dotted arrow in the figure indicates the flow direction of the treatment liquid. The treatment liquid thrown out of the supporting platform 2 will have a momentum toward the direction of the liquid receiving tank 3a, and the treatment liquid will impact the fluid wall 4a formed in the liquid receiving tank 3a with the momentum in this direction. The fluid in the fluid wall 4a flows downward, and the fluid has a momentum toward the lower side wall or bottom wall of the liquid receiving tank 3a. Therefore, when the treatment liquid impacts the fluid wall 4a, it will collide with the fluid in the fluid wall 4a and change the flow direction. The treatment liquid will flow toward the lower side wall or bottom wall of the liquid receiving tank 3a. The existence of the fluid wall 4a, on the one hand, prevents the processing liquid thrown out of the supporting platform 2 from colliding with the side wall of the liquid receiving tank 3a or the cavity wall of the cleaning chamber 1a, thereby avoiding the problem of splashing of the processing liquid when colliding with the side wall of the liquid receiving tank 3a or the cavity wall of the cleaning chamber 1a, causing the substrate 9 to be contaminated, thereby improving the reliability of cleaning the substrate 9; on the other hand, through the collision of the fluid in the fluid wall 4a and the processing liquid, the processing liquid is driven to flow downward and be collected in the liquid receiving tank 3a, which is conducive to the unified collection and recycling of the processing liquid.

[0058] Optionally, to facilitate the recycling of the treatment liquid, the chemical composition of the fluid is designed to be consistent with the treatment liquid, that is, the guide member 4 also sprays the treatment liquid into the liquid receiving tank 3a. In this way, the treatment liquid sprayed by the guide member 4 and the treatment liquid thrown out of the supporting platform 2 can be mixed in the liquid receiving tank 3a, which is convenient for simplifying the recovery procedure of the treatment liquid and improving the recovery efficiency of the treatment liquid.

[0059] Optionally, in order to achieve a more ideal drainage effect, the density of the fluid is greater than the density of the processing liquid. In this way, according to the principle of conservation of momentum, the possibility of the processing liquid thrown out by the supporting platform 2 and rebounding back to the surface of the substrate 9 after colliding with the fluid can be reduced, thereby avoiding as much as possible the use of the processing liquid to contaminate the substrate 9, thereby improving the reliability of the substrate 9 when cleaning.

[0060] In one embodiment of the present invention, Figure 1 and Figure 2 As shown, the liquid receiving structure 3 includes a first stopper 31, a second stopper 32 and a part of the inner circumferential wall of the cleaning chamber 1a; the first stopper 31 and the second stopper 32 are arranged in a ring around the inner circumferential wall of the cleaning chamber 1a, the first stopper 31 is located above the second stopper 32, and the first stopper 31, the second stopper 32 and a part of the inner circumferential wall of the cleaning chamber 1a are enclosed to form a liquid receiving groove 3a; wherein, when the substrate 9 is located on the supporting platform 2, the plane where the substrate 9 is located is located between the ends of the first stopper 31 and the second stopper 32 away from the inner circumferential wall of the cleaning chamber 1a.

[0061] In this embodiment, the first stopper 31 and the second stopper 32 are arranged around the inner peripheral wall of the cleaning chamber 1a, and the first stopper 31, the second stopper 32 and the wall of the cleaning chamber 1a between the first stopper 31 and the second stopper 32 enclose to form a liquid receiving groove 3a, and the plane where the substrate 9 is located is located between the ends of the first stopper 31 and the second stopper 32 away from the inner peripheral wall of the cleaning chamber 1a, so that the processing liquid thrown outward by the carrier 2 will fly to the area between the first stopper 31 and the second stopper 32, and enter the liquid receiving groove 3a through the notch of the liquid receiving groove 3a. The first stopper 31 and the second stopper 32 can be detachably connected to the inner peripheral wall of the cleaning chamber 1a by means of snap-fitting and plug-in, so as to facilitate the disassembly and assembly of the first stopper 31 and the second stopper 32 in the cleaning chamber 1a, facilitate the replacement and cleaning of the first stopper 31 and the second stopper 32, and improve the convenience of disassembly and maintenance of the cleaning device assembly.

[0062] In one embodiment of the present invention, Figure 1 As shown, the first stop portion 31 is also connected to the top wall of the cleaning chamber 1a, and a drainage slope 311 is provided on the side of the first stop portion 31 facing the second stop portion 32; the guide member 4 is connected to the end of the first stop portion 31 away from the inner wall of the cleaning chamber 1a, and sprays fluid toward the drainage slope 311.

[0063] In this embodiment, the drainage slope 311 is used to guide the fluid sprayed by the guide member 4 to flow into the liquid receiving groove 31a. The first stop portion 31 is an annular structure and connects the inner wall and the top wall of the cleaning chamber 1a. The inner wall of the cleaning chamber 1a is the circumferential side wall of the cleaning chamber 1a, and the top wall of the cleaning chamber 1a is the cavity wall of the cleaning chamber 1a facing the upper surface of the supporting platform 2. The first stop portion 31 may be a raised structure arranged on the top wall of the cleaning chamber 1a, and a drainage slope 311 is provided on the side of the raised structure facing the second stop portion 32. The raised structure is connected to the shell 1 by welding, bonding, etc., that is, the raised structure and the shell 1 are structurally independent of each other; or, the raised structure and the shell 1 are an integrally formed structure, in which case the drainage slope 311 on the raised structure is the cavity wall surface of the cleaning chamber 1a. By connecting the first stop portion 31 to the inner circumferential wall and the top wall of the cleaning chamber 1a, it is beneficial to improve the tightness of the connection between the first stop portion 31 and the shell 1, ensure that the drainage slope 311 has a stable and reliable drainage effect on the fluid, and at the same time help save the internal space of the cleaning chamber 1a and reduce the volume of the entire cleaning device.

[0064] In one embodiment of the present invention, Figure 2 and Figure 3As shown, the flow guide 4 is connected to the end of the first stop portion 31 away from the inner wall of the cleaning chamber 1a, and is arranged around the outer periphery of the supporting platform 2; the flow guide 4 is provided with a cavity 4b and a fluid inlet end 41 and a fluid outlet end 42 connected to the cavity 4b, the fluid outlet end 42 is located between the first stop portion 31 and the second stop portion 32, and is used to spray fluid to the first stop portion 31, so that a fluid wall 4a is formed on the side of the first stop portion 31 facing the second stop portion 32.

[0065] In this embodiment, the fluid inlet end 41 of the flow guide 4 is used to introduce fluid into the cavity 4b, the cavity 4b is used to accommodate fluid, and the fluid outlet end 42 of the flow guide 4 is used to lead out the fluid in the cavity 4b, and the fluid entering the cavity 4b of the flow guide 4 is ejected outward through the fluid outlet end 42. The flow guide 4 can be detachably connected to the first stopper 31 by plugging, clamping, screwing, etc., so as to facilitate the installation, replacement and cleaning of the flow guide 4.

[0066] When the carrier 2 rotates, the processing liquid on the carrier 2 will be thrown out in all directions of the outer periphery of the carrier 2. The flow guide 4 is set in an annular shape and is arranged above the carrier 2 around the outer periphery of the carrier 2, so that the flow guide 4 can spray fluid toward the annular first stopper 31, and the sprayed fluid flows along the side of the first stopper 31 facing the second stopper 32 to form an annular fluid wall 4a. In this way, when the processing liquid on the carrier 2 is thrown out and enters the liquid receiving tank 3a, the thrown out processing liquid will fly to the side of the first stopper 31 facing the second stopper 32, and collide with the fluid wall 4a formed on the side of the first stopper 31 facing the second stopper 32. After colliding with the flowing fluid, the processing liquid will flow downward into the liquid receiving tank 3a to achieve the collection of the processing liquid.

[0067] In one embodiment of the present invention, Figure 2 and Figure 3 As shown, the fluid outflow end 42 is provided with an opening 42a, which is annular in shape, arranged around the outer circumference of the supporting platform 2, and connected to the containing cavity 4b.

[0068] In this embodiment, the flow guide 4 is arranged around the outer circumference of the carrier 2, and the opening 42a is arranged in an annular shape along the circumference of the flow guide 4. The opening 42a is used to lead out the fluid in the chamber 4b of the flow guide 4, and spray the fluid toward the first stopper 31 to form a fluid wall 4a. By arranging the opening 42a in an annular shape, the fluid sprayed from the opening 42a to the first stopper 31 can form an annular fluid wall 4a, and the annular fluid wall 4a can stop and guide the processing liquid thrown outward in various directions from the carrier 2, so as to realize the collection of the processing liquid in the liquid receiving tank 3a.

[0069] In one embodiment of the present invention, Figure 2 , Figure 6as well as Figure 7 As shown, the fluid outflow end 42 is provided with a plurality of through holes 42b connected to the cavities 4b, and the plurality of through holes 42b are arranged at intervals around the outer circumference of the carrier 2, and the fluid injection directions of any two adjacent through holes 42b are not parallel.

[0070] In this embodiment, the plurality of through holes 42b can be evenly distributed along the circumference of the flow guide 4 at equal intervals, and the fluid injection directions of any two adjacent through holes 42b are not parallel, so as to avoid the fluid injected from the plurality of through holes 42b to be injected in parallel, so that a space is formed between the fluid injected from any two adjacent through holes 42b, and the processing liquid entering the space cannot be stopped and guided, resulting in a part of the processing liquid thrown out by the carrier 2 colliding with the groove wall of the liquid receiving groove 3a and splashing onto the substrate 9, causing the substrate 9 to be dirty. By setting the fluid injection directions of any two through holes 42b to be non-parallel, the fluid injected from multiple pairs of through holes 42b (a pair of through holes 42b includes two adjacent through holes 42b) is allowed to converge and overlap to form a fluid wall 4a, and the fluid wall 4a is allowed to cover the side of the first stopper 31 facing the second stopper 32, so that the processing liquid thrown outward from the carrier 2 in various directions can be stopped and guided, and the processing liquid can be reliably collected in the liquid receiving groove 3a.

[0071] In one embodiment of the present invention, Figure 2 , Figure 6 as well as Figure 7 As shown, the fluid inlet end 41 is provided with a plurality of inlet holes 41a connected to the cavities 4b; each inlet hole 41a is located between two adjacent through holes 42b; and / or, the axial directions of the plurality of through holes 42b are parallel, and the angle between the axial direction of each inlet hole 41a and the axial direction of any through hole 42b is defined as α, 30°≤α≤150°.

[0072] In this embodiment, the inflow hole 41a is used to introduce fluid into the chamber 4b, and the through hole 42b is used to spray the fluid in the chamber 4b into the liquid receiving tank 3a. When each inflow hole 41a is located between two adjacent through holes 42b, the fluid introduced by each inflow hole 41a will not flow out directly through the through hole 42b, but will flow to the two through holes 42b adjacent to the inflow hole 41a, that is, the fluid in the chamber 4b is diverted through the multiple through holes 42b, so that the fluid is sprayed into the liquid receiving tank 3a through each through hole 42b, so that an annular fluid wall 4a can be formed in the liquid receiving tank 3a, ensuring the flow direction guidance and collection effect of the treated liquid. When the angle α between the axial direction of each inflow hole 41a and the axial direction of any through hole 42b is greater than or equal to 30° and less than or equal to 150°, each inflow hole 41a will not be coaxially arranged with any through hole 42b, so as to prevent the fluid introduced by each inflow hole 41a from directly flowing out through a through hole 42b: on the one hand, it prevents the fluid from being ejected from the through hole 42b at a fast speed and being difficult to control, and the fluid with a faster flow rate does not flow completely along the side of the first stop portion 31 facing the second stop portion 32. When the fluid is a liquid, a large amount of the fluid drips or sprays onto the second stop portion 32, causing part of the fluid to collide with the second stop portion 32 and splash onto the surface of the substrate 9, causing the substrate 9 to be dirty. On the other hand, providing the pipeline for supplying fluid with a suitable installation angle installed in the inlet hole 41a also makes it convenient for the flow guide member 4 to make the axial direction of the through hole 42b toward the liquid receiving groove 3a and the first stop portion 31 after installation and fixation, thereby providing the through hole 42b with a suitable fluid injection angle, ensuring that an ideal fluid wall 4a is formed after fluid injection, thereby improving the flow guidance and collection effect of the treated liquid.

[0073] In one embodiment of the present invention, Figure 2 and Figure 4 As shown, the angle between the fluid injection direction of the fluid outflow end 42 and the plane where the first stop portion 31 is located is β, and 5°≤β≤30°.

[0074] In this embodiment, when the angle β between the fluid injection direction of the fluid outlet end 42 and the plane where the first stop portion 31 is located is greater than or equal to 5° and less than or equal to 30°, the fluid at the fluid outlet end 42 has a suitable injection angle, so that the fluid can be injected to the side of the first stop portion 31 facing the second stop portion 32, and flow along the surface of the first stop portion 31 to form a covering fluid wall 4a. When the angle β is less than 5°, the fluid ejected from the fluid outflow end 42 has too long a travel before contacting the upper baffle, so that a considerable portion of the fluid fails to flow along the side of the first stopper 31 facing the second stopper 32 under the influence of gravity. In particular, when the fluid is a liquid, a large amount of the fluid will drip or spray onto the second stopper 32, and the ejected fluid may not form a fluid wall 4a covering the side of the first stopper 31 facing the second stopper 32, which will not only cause part of the processing liquid thrown out by the carrier 2 to impact and rebound to the surface of the substrate 9 with the first stopper 31, but also cause part of the fluid to directly fall and impact the second stopper 32 and then splash onto the surface of the substrate 9, causing the substrate 9 to be dirty. When β is greater than 30°, the fluid ejected from the fluid outflow end 42 impacts the side of the first stopper 31 facing the second stopper 32 at a larger angle. At this time, the fluid is more likely to rebound when colliding with the first stopper 31, and splash to the second stopper 32 or the carrier 2, causing the substrate 9 to be dirty.

[0075] In one embodiment of the present invention, Figure 2 As shown, the extension direction of the first stop portion 31 is set at an angle γ with the plane where the substrate 9 is located, γ≠0° and γ≠180°; and / or the extension direction of the second stop portion 32 is set at an angle β with the plane where the substrate 9 is located, θ≠0° and θ≠180°.

[0076] In this embodiment, the substrate 9 is fixed to the carrier 2. When the carrier 2 rotates, the substrate 9 forms a rotation plane, and the rotation plane is set at a non-0 degree and non-180 degree angle with the first stopper 31 and the second stopper 32, that is, the extension direction of the first stopper 31 and the second stopper 32 is not parallel to the rotation plane of the substrate 9. In this way, when the processing liquid on the substrate 9 is thrown out, the fluid wall 4a formed on the side of the first stopper 31 facing the second stopper 32 can reliably stop and guide the flow direction of the processing liquid, so that the processing liquid flows to the bottom wall of the liquid receiving tank 3a and is collected in a centralized manner, and the processing liquid or fluid falling on the second stopper 32 can also slide along the surface of the second stopper 32 to the bottom wall of the liquid receiving tank 3a, so as to realize the centralized collection of the processing liquid and the fluid.

[0077] In one embodiment of the present invention, Figure 2 and Figure 5 As shown, the distance between the guide member 4 and the substrate 9 in the radial direction of the substrate 9 is defined as D, 0<D; and / or, the height difference between the plane where the substrate 9 is located and the guide member 4 is defined as H, 0<H.

[0078] In this embodiment, when the distance D between the flow guide 4 and the substrate 9 is greater than 0, the flow guide 4 will not interfere with the fixing and removal process of the substrate 9 on the carrier 2, which facilitates the fixing and removal of the substrate 9. When the height difference H between the plane where the substrate 9 is located and the flow guide 4 is greater than 0, it can avoid the problem that the processing liquid thrown out by the carrier 2 hits the flow guide 4, causing the flow guide 4 to be dirty, and part of the processing liquid splashes onto the substrate 9 and cannot be accurately collected in the liquid receiving tank 3a.

[0079] In one embodiment of the present invention, Figure 2 and Figure 3 As shown, the cleaning device further includes a supply module 5 , which is connected to the flow guide member 4 through a pipeline and is used to supply fluid to the flow guide member 4 .

[0080] In this embodiment, the supply module 5 is used to supply fluid to the flow guide 4. The supply module 5 can be a liquid pump, a fan, etc. The supply module 5 sends the fluid into the fluid inlet end 41 of the flow guide 4 through a pipeline. The fluid enters the cavity 4b along the fluid inlet end 41 of the flow guide 4 and is sprayed from the fluid outlet end 42 into the liquid receiving tank 3a at a certain flow rate. The sprayed fluid forms a fluid wall 4a in the liquid receiving tank 3a. The setting of the supply module 5 can realize the continuous supply of fluid to the flow guide 4, thereby maintaining the formation of the fluid wall 4a in the liquid receiving tank 3a, ensuring that during the cleaning process of the substrate 9, the processing liquid thrown out by the carrier 2 flows into the liquid receiving tank 3a as much as possible under the guiding effect of the fluid wall 4a to be collected, and also avoiding the used processing liquid from splashing onto the substrate 9, affecting the quality of the single wafer product.

[0081] Optionally, continue combining Figure 2 and Figure 3 As shown, the cleaning device also includes a fluid control module 10, which is arranged at the fluid inlet end 41 and connected to the supply module 5 through a pipeline; or, the fluid control module 10 is connected to the fluid inlet end 41 and the supply module 5 through two pipelines respectively; the supply module 5 first supplies the fluid to the fluid control module 10, and the fluid control module 10 controls the flow rate and flow rate of the fluid flowing into the fluid inlet end 41 to adjust the flow rate and flow rate of the fluid sprayed from the fluid outlet end 42 into the liquid receiving tank 3a, stabilize the fluid spraying direction of the fluid outlet end 42, reduce the flow rate and flow rate fluctuations during fluid spraying, avoid violent turbulence, and avoid the fluid violently impacting the tank wall of the liquid receiving tank 3a and splashing onto the substrate 9, causing the substrate 9 to be dirty. Among them, the fluid control module 10 can be a valve body structure such as a switch valve and a pressure valve, and the flow rate and flow rate of the fluid supplied to the fluid inlet end 41 can be controlled by controlling the opening of the valve body structure.

[0082] In one embodiment of the present invention, Figure 2As shown, the cleaning device also includes a temperature control module 6 ; the supply module 5 , the temperature control module 6 and the flow guide 4 are connected in sequence through pipelines, and the temperature control module 6 is used to adjust the temperature of the fluid supplied to the flow guide 4 .

[0083] In this embodiment, because the temperature of the treatment liquid used in the cleaning process of the substrate 9 is higher than the ambient temperature, the treatment liquid thrown out by the carrier 2 will gradually cool down during the flight. The temperature of the fluid input to the guide member 4 is adjusted by the temperature control module 6, so that the temperature of the fluid sprayed by the guide member 4 into the liquid receiving tank 3a is not too low, ensuring that the treatment liquid will not further cool down after contacting the sprayed fluid and generate crystals or particulate contaminants attached to the wall of the liquid receiving tank 3a, affecting the collection of the treatment liquid by the liquid receiving tank 3a. At the same time, it also prevents the fluid with too low temperature from being blocked in the fluid inlet end 41, the cavity 4b and the fluid outlet end 42 of the guide member 4, and also prevents the crystals or particulates generated when the fluid temperature is too low from being retained and silted on the wall of the liquid receiving tank 3a, ensuring sufficient fluidity of the fluid, so that the fluid can fully guide the treatment liquid thrown out by the carrier 2, and realize the collection of the treatment liquid in the liquid receiving tank 3a. The temperature control module 6 may be a temperature controller, which may include a heating module for heating the fluid and a cooling module for cooling the fluid, which is not limited here.

[0084] In one embodiment of the present invention, Figure 2 As shown, the cleaning device also includes a circulation module 7, and the circulation module 7 includes a guide unit 71 and a pumping unit 72; the guide unit 71 has a first connection end 711, a second connection end 712 and a discharge end 713, the first connection end 711 is connected to the liquid receiving tank 3a through a pipeline, the second connection end 712 is connected to the pumping unit 72 through a pipeline, and the pumping unit 72 is connected to the supply module 5 through a pipeline; the guide unit 71 has a replenishment state and a discharge state, in the replenishment state, the first connection end 711 is connected to the second connection end 712; in the discharge state, the first connection end 711 is connected to the discharge end 713.

[0085] In this embodiment, the circulation module 7 is used to selectively recover the treatment liquid in the liquid receiving tank 3a, and the guide unit 71 in the circulation module 7 can be a three-way control valve, so that the guide unit 71 can switch between the above-mentioned replenishment state and the discharge state. In the replenishment state, the treatment liquid collected in the liquid receiving tank 3a is pumped to the supply module 5 through the pumping unit 72, and a fluid filtering device can be set on the pipeline connecting the second connection end 712 of the guide unit 71 and the pumping unit 72. The recovered fluid is filtered by the fluid processing device so that the fluid meets the reuse standard. The pumping unit 72 then sends the filtered fluid to the supply module 5 to the guide member 4 for reuse, thereby realizing the recycling of the fluid and avoiding the waste of the fluid. The guide unit 71 can also be switched to the discharge state first, the mixture in the liquid receiving tank 3a is discharged, the mixture is filtered and separated by an external fluid filtering device, and the filtered and separated fluid is then sent to the guide member 4 through the supply module 5 for reuse. The fluid in the docking tank 3a that is not suitable for recycling can also be centrally disposed of by switching the flow guide unit 71 to the discharge state. The pumping unit 72 can be a pressure pump or a booster pump, which can increase the air pressure in the pipeline to achieve a longer distance or higher position for the fluid to be transported, meeting the fluid transportation and supply needs of the cleaning device.

[0086] In one embodiment of the present invention, Figure 2 As shown, the circulation module 7 also includes a filtering unit 73, and the second connecting end 712, the filtering unit 73 and the pumping unit 72 are sequentially connected through pipelines; in the replenishing state, the filtering unit 73 filters the treatment liquid flowing into the pumping unit 72 from the second connecting end 712.

[0087] In this embodiment, the filter unit 73 is used to filter the mixture of the treatment liquid and the fluid in the liquid receiving tank 3a to separate the fluid in the liquid receiving tank 3a, and at the same time filter out impurities in the mixed liquid so that the separated fluid meets the standard for recycling, thereby realizing the recycling of the fluid and avoiding waste of the fluid. The filter unit 73 may also have a discharge port for discharging the filtered material, so that the filtered material can be centrally processed through the discharge port. When the fluid is the treatment liquid, the liquid collected in the liquid receiving tank 3a is the treatment liquid. At this time, the filter unit 73 only needs to filter the impurities in the treatment liquid in the liquid receiving tank 3a, which can reduce the filtering procedure of the filter unit 73 and reduce the filtering cost of the filter unit 73.

[0088] The above are only optional embodiments of the present invention, and are not intended to limit the patent scope of the present invention. All equivalent structural changes made using the contents of the present invention's specification and drawings, or directly / indirectly applied in other related technical fields, are included in the patent protection scope of the present invention.

Claims

1. A cleaning device for cleaning a substrate, characterized in that: The cleaning device comprises: A housing, wherein a cleaning chamber is provided in the housing; A carrying platform, which is rotatably disposed in the cleaning chamber and is used to carry the substrate; A liquid receiving structure, the liquid receiving structure is arranged in the cleaning chamber, the liquid receiving structure is provided with a liquid receiving groove arranged around the outer periphery of the supporting platform, and the liquid receiving groove is used to receive the processing liquid thrown outward when the supporting platform rotates; and A flow guide, which is disposed in the cleaning chamber and is used to spray fluid into the liquid receiving tank to form a fluid wall in the liquid receiving tank that can guide the treatment liquid to flow toward the bottom wall of the liquid receiving tank, wherein the fluid is a liquid, and the density of the fluid is greater than the density of the treatment liquid; The liquid contact structure includes a first stopper, a second stopper and a portion of the inner peripheral wall of the cleaning chamber; The first stopper and the second stopper are arranged around the inner peripheral wall of the cleaning chamber, the first stopper is located above the second stopper, and the first stopper, the second stopper and a part of the inner peripheral wall of the cleaning chamber are surrounded to form the liquid receiving groove; Wherein, when the substrate is located on the carrying platform, the plane where the substrate is located is located between the ends of the first stopper and the second stopper away from the inner peripheral wall of the cleaning chamber; The cleaning device further comprises a supply module, the supply module being connected to the flow guide member through a pipeline and being used for supplying the fluid to the flow guide member; The flow guide is provided with a cavity and a fluid inflow end and a fluid outflow end communicating with the cavity; The fluid outflow end is provided with a plurality of through holes connected to the cavity, and the plurality of through holes are arranged at intervals around the outer circumference of the supporting platform. The fluid inlet end is provided with a plurality of inlet holes connected to the cavity, and the axial directions of the plurality of through holes are parallel. The angle between the axial direction of each inlet hole and the axial direction of any through hole is defined as α, 30°≤α≤150°.

2. The cleaning device according to claim 1, characterized in that: The first stopper is also connected to the top wall of the cleaning chamber, and a drainage slope is provided on a side of the first stopper facing the second stopper; The flow guide is connected to the end of the first stopper away from the inner peripheral wall of the cleaning chamber, and sprays the fluid toward the drainage slope.

3. The cleaning device according to claim 1, characterized in that: The flow guide is connected to the end of the first stopper away from the inner peripheral wall of the cleaning chamber, and is arranged around the outer periphery of the supporting platform; The fluid outflow end is located between the first stopper and the second stopper, and is used to spray the fluid toward the first stopper, so that the fluid wall is formed on a side of the first stopper facing the second stopper.

4. The cleaning device according to claim 3, characterized in that: The fluid outflow end is provided with an opening, the opening is annular, the opening is arranged around the outer circumference of the supporting platform, and is connected to the cavity; Alternatively, the fluid outflow end is provided with a plurality of through holes connected to the cavity, the plurality of through holes are arranged at intervals around the outer circumference of the supporting platform, and the fluid injection directions of any two adjacent through holes are not parallel.

5. The cleaning device according to claim 3, characterized in that: Each of the inflow holes is located between two adjacent through holes.

6. The cleaning device according to claim 3, characterized in that: The angle between the fluid ejection direction of the fluid outflow end and the plane where the first stop portion is located is defined as β, 5°≤β≤30°.

7. The cleaning device according to claim 1, characterized in that: The extending direction of the first stopper is arranged at an angle γ with the plane where the substrate is located, γ≠0° and γ≠180°; And / or, the extension direction of the second stopper is arranged at an angle β with the plane where the substrate is located, θ≠0° and θ≠180°.

8. The cleaning device according to any one of claims 1 to 7, characterized in that: It is defined that in the radial direction of the substrate, the distance between the guide member and the substrate is D, 0<D; And / or, a height difference between a plane where the substrate is located and the guide member is defined as H, 0<H.

9. The cleaning device according to claim 1, characterized in that: The cleaning device also includes a temperature control module; The supply module, the temperature control module and the flow guide are connected in sequence through pipelines, and the temperature control module is used to adjust the temperature of the fluid supplied to the flow guide.

10. The cleaning device according to claim 1, characterized in that: The cleaning device further comprises a circulation module, wherein the circulation module comprises a flow guiding unit and a pumping unit; The flow guide unit has a first connection end, a second connection end and a discharge end, the first connection end is connected to the liquid receiving tank through a pipeline, the second connection end is connected to the pumping unit through a pipeline, and the pumping unit is connected to the supply module through a pipeline; The guide unit has a supply state and a discharge state. In the supply state, the first connection end is connected to the second connection end; in the discharge state, the first connection end is connected to the discharge end.

11. The cleaning device according to claim 10, characterized in that: The circulation module further includes a filtering unit, and the second connection end, the filtering unit and the pumping unit are sequentially connected through a pipeline; In the replenishing state, the filtering unit filters the treatment liquid flowing into the pumping unit from the second connecting end.

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