Shear thickening polishing liquid for fine inner holes of quartz parts, polishing device and polishing method

Abstract

The present invention provides a shear thickening polishing liquid for fine inner holes of quartz parts, a polishing device and a polishing method. The shear thickening polishing liquid for fine inner holes of quartz parts is a non-Newtonian fluid polishing liquid with a shear thickening effect, and the polishing liquid is a shear thickening polishing liquid containing aluminum oxide and / or cerium oxide abrasive particles with a diameter of 0.1-3 μm. The polishing device includes a polishing stirring plate, a polishing pool, a part workbench and a lifting workbench. The shear thickening polishing liquid of the present invention has the advantages of being green, environmentally friendly, non-toxic, harmless, low cost and easy to prepare.

Description

Technical Field

[0001] The invention relates to the technical field of precision / ultra-precision machining, and in particular to a shear thickening polishing liquid for fine inner holes of quartz parts, a polishing device and a polishing method. Background Art

[0002] Science and technology have always been the key factors driving the growth of the world economy. In recent years, with the continuous innovation and improvement of science and technology, the competition faced by the market has become more intense. In particular, the speed of product design and development and the final performance of the product have received more and more attention from the society. The faster the product is designed and developed and put on the market, the more likely it is to take the lead. In the fields of aerospace, biology, astronomy, mechanical parts, etc., more and more key components adopt complex curved surface design or multi-porous deep inner wall structure to obtain better performance and reduce the processing link to compress the manufacturing time. What follows is the post-processing problem of complex curved surfaces, especially complex curved surface quartz parts with inner pore structure. The post-polishing process has always been a time-consuming and high scrap rate process. Traditional chemical mechanical polishing is mostly aimed at planes, the polishing pad is glued to the turntable, the part to be polished is glued to the bottom of the polishing disk and pressurized on the top to achieve chemical mechanical polishing. This polishing method is obviously not suitable for complex curved surface parts, especially complex curved surface parts with certain pore structures. Non-Newtonian fluid polishing is based on its own shear thickening characteristics. When the workpiece is in a certain relative position, it can be polished by fitting on the surface of the part without being restricted by the surface shape of the part to be polished. It has become an important chemical mechanical polishing method for complex curved parts.

[0003] Li Min and others from Hunan University proposed a new polishing method based on the shear thickening effect of non-Newtonian power-law fluids—shear thickening polishing. During the polishing process, the polishing liquid and the parts form a relative motion. When the shear strain rate between the polishing liquid and the parts exceeds the critical value, the viscosity of the polishing liquid in the processing area rises sharply, and a "flexible fixed abrasive tool" that fits the surface of the parts is formed. The solid phase particles in the processing area form particle clusters, which wrap the abrasive particles and exert force on them to make them micro-cut the surface of the parts. Patent CN105033833 discloses a method for polishing the inner wall of a hole based on the shear thickening mechanism of non-Newtonian fluids, including a polishing pool, a polishing liquid circulation system, a polishing tool, and a part fixture. The rotation of the part and the uniform up and down movement of the polishing tool can ensure that the inner wall of the hole has good shape accuracy after polishing. The setting of the polishing liquid circulation system can make the polishing liquid that heats up and thickens during work return to the normal temperature fluid state as soon as possible, and through the action of the pump, it can be re-input into the polishing pool for cyclic polishing, so as to achieve continuous, efficient and high-quality polishing of the inner wall of the part hole. However, these studies and methods still have disadvantages such as large size, many links, high equipment strength requirements, and multiple external power sources.

[0004] In view of the shortcomings of the traditional non-Newtonian fluid polishing method, the present invention has further simplified and innovated the structure of the hole inner wall polishing device based on the shear thickening mechanism of non-Newtonian fluid, and designed a polishing combination of "screw + part to be polished" based on the climbing effect (Weissenberg effect) of non-Newtonian fluid, realizing the transformation of the polishing liquid from passive impact polishing to active absorption polishing covering all the holes and gaps of the processed part, realizing the "self-priming" climbing chemical mechanical polishing of the new non-Newtonian fluid polishing liquid. Summary of the invention

[0005] According to the technical problems that the traditional non-Newtonian fluid polishing method has the disadvantages of large volume, many links, high equipment strength requirements, and many external power sources, a shear thickening polishing liquid for fine inner holes of quartz parts, a polishing device, and a polishing method are provided. The shear thickening polishing liquid containing aluminum oxide or cerium oxide abrasive particles of the present invention has the advantages of being green, environmentally friendly, non-toxic, harmless, low cost, and easy to prepare. The polishing liquid is based on the shear thickening principle of non-Newtonian fluids, combined with chemical mechanical polishing liquid, and the shear thickening characteristics of non-Newtonian fluids are used to replace the mechanical pressure in the original chemical mechanical polishing. During the polishing process, the non-Newtonian fluid polishing liquid will form a flexible polishing area that fits and wraps the curved surface in the inner channel and surface of the quartz parts, and the aluminum oxide or cerium oxide abrasive particles added to the polishing liquid and the shear thickening force of the non-Newtonian fluid and the chemical action of the polishing liquid are used to polish the fine inner holes of the quartz parts.

[0006] The technical means adopted by the present invention are as follows:

[0007] A shear thickening polishing liquid for fine inner holes of quartz parts is a non-Newtonian fluid polishing liquid with a shear thickening effect. The polishing liquid is a shear thickening polishing liquid containing aluminum oxide and / or cerium oxide abrasive particles with a diameter of 0.1-3 μm.

[0008] Furthermore, the polishing liquid, calculated by mass fraction 100%, includes the following components and mass fractions:

[0009] 10-15wt% abrasive, 1-2wt% surfactant, 0.5-1.2wt% dispersant, 1-3wt% hexagonal boron nitride, 18-25wt% polyhydroxy polymer, 1-3wt% pH regulator, and the rest is deionized water, and the pH value of the polishing liquid is adjusted to 9-11.

[0010] Furthermore, the abrasive grains are one or a mixture of two or more of aluminum oxide or cerium oxide abrasive grains, with a particle size of 3 μm, 1 μm, 300 nm or 100 nm, and are used to remove surface materials by micro-cutting and rolling the contact surface of the part during the polishing process.

[0011] Furthermore, the surfactant is one or a mixture of two or more of sorbitol, ethylenediaminetetraacetic acid, and tetradecanoic acid, and is used alone or in combination with a dispersant to improve the dispersion stability of the polishing liquid.

[0012] Furthermore, the dispersant is sodium hexametaphosphate, which is used to adsorb anions on the surface of particles, so that the particles have the same charge and repel each other, thereby making the polishing liquid dispersed as a whole and not easy to settle.

[0013] Furthermore, the polyhydroxy polymer is corn starch, and the non-Newtonian fluid made from corn starch is a shear thickening type.

[0014] Furthermore, the pH regulator is one of guanidine carbonate or sodium metasilicate, which is used to form an alkaline polishing environment.

[0015] The present invention also provides a polishing device using the above-mentioned quartz part fine inner hole shear thickening polishing liquid, comprising: a polishing stirring plate, a polishing pool, a part workbench and a lifting workbench, wherein the polishing pool has a accommodating chamber inside for accommodating the prepared polishing liquid; the polishing stirring plate is installed at the bottom of the polishing pool and is driven to rotate by a motor for stirring the polishing liquid; the lifting workbench comprises a workbench base and a lifting guide rail installed on the workbench base; the part workbench comprises a part support table, a part rotating motor and a self-priming screw, the part to be processed is installed on the self-priming screw through a clamp, the part rotating motor is installed on the part support table, the motor shaft of the part rotating motor is connected to the self-priming screw, and is used to drive the self-priming screw to rotate with the part to be processed, and the part support table is slidably connected to the lifting guide rail and reciprocates on the lifting guide rail to realize the movement of the part to be processed; during operation, the part to be processed is immersed in the polishing liquid, and the rotation directions of the part to be processed and the polishing stirring plate are opposite.

[0016] The present invention also provides a polishing method using the above-mentioned polishing device, which is used to polish the inner hole of a simple flow channel with a larger diameter of a quartz part, and comprises the following steps:

[0017] S1, prepare the above-mentioned polishing liquid in a polishing pool;

[0018] S11, adding a certain amount of deionized water into the polishing pool, adding 18-25wt% of polyhydroxy polymer, and starting the polishing pool stirring base to a low speed mode to start stirring, so that the fluid in the polishing pool is in a flowing state;

[0019] S12, adding 0.1-3 μm, 10-15 wt% abrasive, 1-3 wt% hexagonal boron nitride, and 1-2 wt% surfactant into an appropriate amount of deionized water, placing the mixture in an ultrasonic water bath and subjecting it to ultrasonic treatment for 20-25 min to fully mix and disperse the components;

[0020] S13, adding the mixed liquid in step S12 into the polishing tank, adding 1-3wt% of pH adjuster, and then adding an appropriate amount of deionized water into the polishing tank, and adjusting the pH value of the polishing liquid to 9-11;

[0021] S2. Prepare the non-Newtonian fluid polishing liquid according to the prescribed formula and add it into the polishing pool. After continuously turning on the stirring base at the bottom of the polishing pool for 2-3 minutes, increase the speed of the stirring base of the polishing pool so that the fluid near the outer circle of the polishing pool has a certain flow speed.

[0022] S3, raising the part support table to the upper limit position, clamping the quartz part to be processed at the position of the part to be processed, and starting the part rotation motor on the part support table to make the part rotate clockwise;

[0023] S4. The part support table is then adjusted to a suitable position through the lifting guide rail, so that the self-priming screw is completely inserted into the fully stirred non-Newtonian fluid polishing liquid, so that the part is immersed in the polishing liquid. As the polishing pool stirring base and the self-priming screw rotate in opposite directions, the self-priming screw inserted therein rotates, and the polishing liquid containing the non-Newtonian fluid is not thrown toward the container wall due to inertia. Instead, it surrounds the rod due to the non-Newtonian effect caused by shear, and a "climbing rod" phenomenon of climbing up the rod occurs. The non-Newtonian fluid polishing liquid carries the hexagonal boron nitride and aluminum oxide abrasives and immerses them in any place that the fluid can reach without being thrown away, thereby achieving the rising wrapping of the non-Newtonian fluid polishing liquid, and finally forming a layer of non-Newtonian fluid polishing liquid with abrasives and chemical components on the surface of the part to achieve polishing removal.

[0024] The present invention also provides a polishing method using the above-mentioned polishing device, which is used to polish the inner hole of a small-diameter complex flow channel of a quartz part, comprising the following steps:

[0025] S10, preparing the above-mentioned polishing liquid in a polishing pool;

[0026] S10.1, add a certain amount of deionized water to the polishing pool, add 18-25wt% of polyhydroxy polymer, and start the polishing pool stirring base to a low speed mode to start stirring, so that the fluid in the polishing pool is in a flowing state;

[0027] S10.2, add 0.1-3 μm, 10-15 wt% abrasive, 1-3 wt% hexagonal boron nitride, 0.5-1.2 wt% dispersant, 1-2 wt% surfactant into an appropriate amount of deionized water, place in an ultrasonic water bath and allow to stand for 20-25 min to allow the components to be fully mixed and dispersed;

[0028] S10.3, adding the mixed liquid in step S10.2 into the polishing pool, adding 1-3wt% of pH adjuster, and then adding an appropriate amount of deionized water into the polishing pool, and adjusting the pH value of the polishing liquid to 9-11;

[0029] S20, prepare the non-Newtonian fluid polishing liquid according to the prescribed formula and add it into the polishing pool, and keep the stirring base at the bottom of the polishing pool open for 2-3 minutes, then increase the speed of the stirring base of the polishing pool so that the fluid near the outer circle of the polishing pool has a sufficient flow speed;

[0030] S30, raising the part support table to the upper limit position, clamping the quartz part to be processed at the position of the part to be processed, and starting the part rotation motor on the part support table to make the part rotate clockwise;

[0031] S40, then adjust the part support table to a suitable position through the lifting guide rail, so that the self-priming screw is completely inserted into the fully stirred non-Newtonian fluid polishing liquid, so that the part is immersed in the polishing liquid, and as the polishing pool stirring base and the self-priming screw rotate in opposite directions, the polishing liquid containing the non-Newtonian fluid is centered on the rod and protrudes to wrap the entire part;

[0032] S50, adjusting the speed of the component rotating motor so that the liquid can fully reach each structure;

[0033] S60, then polish and remove the complex structure of the small inner holes of the quartz parts.

[0034] Compared with the prior art, the present invention has the following advantages:

[0035] 1. The present invention provides a shear thickening polishing liquid for fine inner holes of quartz parts, a polishing device and a polishing method. The polishing liquid is based on the shear thickening principle of non-Newtonian fluids and is combined with chemical mechanical polishing liquid. The shear thickening characteristics of non-Newtonian fluids are used to replace the mechanical pressure in the original chemical mechanical polishing. During the polishing process, the non-Newtonian fluid polishing liquid will form a flexible polishing area that fits and wraps the curved surface in the inner holes and surfaces of the quartz parts. The aluminum oxide or cerium oxide abrasives added to the polishing liquid, the shear thickening force of the non-Newtonian fluid and the chemical action of the polishing liquid are used to polish the fine inner holes of the quartz parts.

[0036] 2. The shear thickening polishing liquid, polishing device and polishing method for fine inner holes of quartz parts provided by the present invention contain alumina or cerium oxide abrasive particles, which are green, environmentally friendly, non-toxic, low-cost and easy to prepare.

[0037] 3. The shear thickening polishing liquid, polishing device and polishing method for fine inner holes of quartz parts provided by the present invention utilize the shear thickening property of the prepared polishing liquid to form a "flexible polishing tool" with a certain strength to polish the fine inner holes and surfaces of parts. When a rotating rod is inserted into a Newtonian fluid, the fluid will form a concave liquid surface with the rod as the center due to the centrifugal force, while for the non-Newtonian fluid polishing liquid described in the present invention, the fluid will activate its shear thickening property due to the shear force generated by the rotation of the rod, and the disturbed fluid area will form pressure toward the rod, forming a convex liquid surface with the rod as the center and climbing up along the rod until a "polishing film" that completely wraps the part is formed to wrap or fill any place on the inner and outer surfaces of the part that the fluid can reach. After a convex "polishing film" is formed that wraps the parts, as the parts continue to rotate, the non-Newtonian fluid polishing liquid wraps the hard abrasive aluminum oxide or cerium oxide under the shear action to mechanically polish the parts. Prior to this, since the parts have been completely immersed in the polishing liquid, the quartz parts are under the coupling action of chemical and mechanical actions, thus achieving chemical mechanical polishing of the quartz parts.

[0038] 4. The shear thickening polishing liquid, polishing device and polishing method for fine inner holes of quartz parts provided by the present invention, during the process of processing quartz parts with non-Newtonian fluid polishing liquid, due to the fluidity of the polishing liquid, aluminum oxide or cerium oxide abrasives and hexagonal boron nitride are driven by the polishing liquid to perform micro-cutting on the surface of the parts and roll the parts under the shear thickening effect of the non-Newtonian fluid to achieve removal of the surface of the parts, thereby forming a "flexible polishing head with aluminum oxide or cerium oxide abrasives" on the surface of the parts and the fine inner hole structure to achieve polishing of the quartz parts.

[0039] In summary, the application of the technical solution of the present invention can solve the problems of the traditional non-Newtonian fluid polishing method having the disadvantages of large volume, multiple links, high equipment strength requirements, and multiple external power sources.

[0040] Based on the above reasons, the present invention can be widely promoted in the fields of fine polishing and the like. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0042] Figure 1 The present invention is a schematic diagram of a device for shear thickening polishing liquid and polishing method for fine inner holes of quartz parts.

[0043] Figure 2 The figure is a schematic diagram of a polishing device for a quartz part with a complex structure and a small inner hole according to the present invention.

[0044] Figure 3 It is a schematic diagram of the polishing process of the polishing method of the present invention.

[0045] In the figure: 1. workbench base; 2. lifting guide rail; 3. part rotating motor; 4. part supporting platform; 5. polishing pool; 6. stirring base; 7. self-priming screw; 8. part to be polished I; 9. part to be polished II; 10. abrasive particles; 11. polishing liquid. DETAILED DESCRIPTION

[0046] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0047] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. The following description of at least one exemplary embodiment is actually only illustrative and is by no means intended to limit the present invention and its application or use. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0048] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and / or "including" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0049] Unless otherwise specifically stated, the relative arrangement, numerical expressions and numerical values ​​of the parts and steps described in these embodiments do not limit the scope of the present invention. At the same time, it should be clear that, for ease of description, the sizes of the various parts shown in the drawings are not drawn according to the actual proportional relationship. The technology, methods and equipment known to ordinary technicians in the relevant field may not be discussed in detail, but in appropriate cases, the technology, methods and equipment should be regarded as a part of the authorization specification. In all examples shown and discussed here, any specific value should be interpreted as being merely exemplary, rather than as a limitation. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once a certain item is defined in an accompanying drawing, it does not need to be further discussed in subsequent drawings.

[0050] In the description of the present invention, it is necessary to understand that the directions or positional relationships indicated by directional words such as "front, back, up, down, left, right", "lateral, vertical, perpendicular, horizontal" and "top, bottom" are usually based on the directions or positional relationships shown in the drawings. They are only for the convenience of describing the present invention and simplifying the description. Unless otherwise specified, these directional words do not indicate or imply that the device or element referred to must have a specific direction or be constructed and operated in a specific direction. Therefore, they cannot be understood as limiting the scope of protection of the present invention: the directional words "inside and outside" refer to the inside and outside relative to the contours of each component itself.

[0051] For ease of description, spatially relative terms such as "above", "above", "on the upper surface of", "above", etc. may be used here to describe the spatial positional relationship between a device or feature and other devices or features as shown in the figure. It should be understood that spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation described in the figure. For example, if the device in the accompanying drawings is inverted, the device described as "above other devices or structures" or "above other devices or structures" will be positioned as "below other devices or structures" or "below their position devices or structures". Thus, the exemplary term "above" can include both "above" and "below". The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatially relative descriptions used here are interpreted accordingly.

[0052] In addition, it should be noted that the use of terms such as "first" and "second" to limit components is only for the convenience of distinguishing the corresponding components. If not otherwise stated, the above terms have no special meaning and therefore cannot be understood as limiting the scope of protection of the present invention.

[0053] The invention provides a shear thickening polishing liquid for fine inner holes of quartz parts and a polishing method, belonging to the field of fine polishing.

[0054] The shear thickening polishing liquid containing aluminum oxide or cerium oxide abrasive particles proposed by the present invention has the advantages of being green, environmentally friendly, non-toxic, harmless, low-cost and easy to prepare. The polishing liquid is based on the shear thickening principle of non-Newtonian fluids and is combined with chemical mechanical polishing liquids. The shear thickening characteristics of non-Newtonian fluids are used to replace the mechanical pressure in the original chemical mechanical polishing. During the polishing process, the non-Newtonian fluid polishing liquid will form a flexible polishing area that fits and wraps the curved surface in the inner channels and surfaces of the quartz parts. The aluminum oxide or cerium oxide abrasive particles added to the polishing liquid, the shear thickening force of the non-Newtonian fluid, and the chemical action of the polishing liquid are used to polish the fine inner holes of the quartz parts.

[0055] The shear thickening property of the polishing liquid is the principle basis of the polishing method of the present invention. The type, size and concentration of hard abrasive particles in the polishing liquid, as well as the concentration of the non-Newtonian phase are the decisive factors affecting the surface effect and removal rate of the parts after polishing. Surfactants, corrosion inhibitors, etc. also have an important influence on the polishing results. Therefore, the components and corresponding proportions of the polishing liquid are one of the core contents of the present invention and have a prerequisite effect on the polishing effect. The components and specific gravity of the polishing liquid of the present invention are introduced below.

[0056] The polishing liquid prepared in the present invention, based on the overall mass fraction of the polishing liquid of 100%, contains the following components and proportions: 10-15wt% abrasive, 1-2wt% surfactant, 0.5-1.2wt% dispersant, 1-3wt% hexagonal boron nitride, 18-25wt% polyhydroxy polymer, 1-3wt% pH regulator, and the rest is deionized water, and the pH value of the polishing liquid is adjusted to 9-11. The specific details are as follows:

[0057] The abrasive grains are one or a mixture of two or more of aluminum oxide or cerium oxide abrasive grains with particle sizes of 3 μm, 1 μm, 300 nm, and 100 nm, respectively, and their function is to remove surface materials by micro-cutting and rolling the contact surface of the parts during the polishing process.

[0058] The surfactant is one or a mixture of two or more of sorbitol, ethylenediaminetetraacetic acid or tetradecanoic acid, and its function is to improve the dispersion stability of the polishing liquid when used alone or in combination with a dispersant.

[0059] The dispersant is sodium hexametaphosphate. By using sodium hexametaphosphate as the dispersant, anions are adsorbed on the surface of particles, and the particles are charged with the same charge and repel each other, so that the polishing liquid is dispersed as a whole and is not easy to settle.

[0060] The hexagonal boron nitride has the function of achieving liquid super-slipperiness and improving the quality of the polished surface. It also plays the role of abrasive particles together with aluminum oxide, and is a specific component of the present invention.

[0061] The polyhydroxy polymer is corn starch, and the non-Newtonian fluid made from corn starch is a shear thickening type, which is a specific type of the present invention.

[0062] The pH regulator is one of guanidine carbonate or sodium metasilicate. The alkaline polishing environment is conducive to the chemical reaction and has weak corrosiveness, and is not easy to form corrosion pits on the surface of the quartz parts.

[0063] The present invention proposes a polishing method for tiny inner holes of quartz parts based on the shear thickening effect of non-Newtonian fluid. The method mainly utilizes the shear thickening property of the prepared polishing liquid to make the polishing liquid containing abrasive particles and chemical components form a "flexible polishing tool" with a certain strength to polish the tiny inner holes and surfaces of the parts. When a rotating rod is inserted into a Newtonian fluid, the fluid will form a concave liquid surface with the rod as the center due to the centrifugal force. For the non-Newtonian fluid polishing liquid similar to the present invention, the shear force generated by the rotation of the rod will activate its shear thickening property, and the disturbed fluid area will form a pressure toward the rod, forming a convex liquid surface with the rod as the center and climbing up along the rod until a "polishing film" that completely wraps the part is formed to wrap or fill any place on the inner and outer surfaces of the part that the fluid can reach. After a convex "polishing film" is formed that wraps the parts, as the parts continue to rotate, the non-Newtonian fluid polishing liquid wraps the hard abrasive aluminum oxide or cerium oxide under the shear action to mechanically polish the parts. Prior to this, since the parts have been completely immersed in the polishing liquid, the quartz parts are under the coupling action of chemical and mechanical actions, thus achieving chemical mechanical polishing of the quartz parts.

[0064] The polishing device of the present invention mainly includes: a polishing stirring disc (stirring base 6), a circular polishing pool 5, a self-priming screw 7, a part workbench, and a lifting workbench. The polishing pool has a containing chamber inside for containing the prepared polishing liquid 11; the polishing stirring disc is installed at the bottom of the polishing pool, driven to rotate by a motor, and used to stir the polishing liquid; the lifting workbench includes a workbench base 1 and a lifting guide rail 2 installed on the workbench base; the part workbench includes a part support table 4, a part rotating motor 3 and a self-priming screw, the part to be processed is installed on the self-priming screw through a clamp, the part rotating motor is installed on the part support table, the motor shaft of the part rotating motor is connected to the self-priming screw, and is used to drive the self-priming screw to rotate with the part to be processed, the part support table is slidably connected to the lifting guide rail and reciprocates on the lifting guide rail to realize the movement of the part to be processed; when working, the part to be processed is moved to be immersed in the polishing liquid, and the rotation direction of the part to be processed and the polishing stirring disc is opposite.

[0065] The polishing pool is a circular polishing pool, in which the polishing liquid is a non-Newtonian fluid polishing liquid with a shear thickening effect, and aluminum oxide or cerium oxide abrasive particles with a diameter of 0.1-3 μm are added.

[0066] The technical solution of the method of the present invention is: the quartz parts to be processed are mounted on the parts fixture, the parts fixture is located above the polishing pool, and is driven by a motor to rotate at a uniform speed. Since the performance of non-Newtonian fluids is particularly affected by concentration, the concentration of non-Newtonian phases is a key factor affecting the polishing effect of parts. Therefore, the parts need to be clamped by the fixture to extend to a deeper position, that is, 2-8mm from the bottom. The motor drives the parts to rotate, and the parts pass through or are clamped with suitable connecting tools to be connected to the self-priming screw. Due to the shear force generated by the rotation, the non-Newtonian fluid polishing liquid has an upward movement trend, and as the parts continue to rotate, the parts are gradually wrapped along the inner and outer surfaces of the parts, so that the parts are completely immersed in the polishing liquid of the non-Newtonian fluid. At this time, a layer of completely fitting polishing film with a certain delay effect is formed on the surface of the parts. The parts rotate at a constant speed, and the non-Newtonian fluid polishing liquid moves upward under the shearing effect and wraps around the surface of the parts, and is driven to rotate. Due to the contact between the two, the speed of the polishing liquid is always slightly slower than the speed of the parts in the active rotating state. At the same time, the non-Newtonian fluid polishing liquid is continuously squeezed into the complex flow channel of the inner hole of the quartz parts under the shearing effect and squeezed out, and a speed difference is achieved between the two, thus producing a polishing effect. After flowing through the surface and inner hole of the quartz parts, the polishing liquid returns to the polishing pool under the action of gravity. Driven by the polishing pool rotating base at the bottom of the polishing pool, it continues to mix and stir to form a polishing liquid with certain non-Newtonian properties, and then is pressed into the center area of ​​the rod for circulation, and the polishing process is thus running.

[0067] The polishing stirring plate is located at the bottom of the polishing pool, and its stirring blades are designed to be high in the middle and low on both sides, so as to ensure that the polishing liquid is reasonably distributed in the places with high linear speed on the outside, which is beneficial to the polishing of parts. The stirring of the polishing liquid ensures its non-Newtonian fluid characteristics. The polishing stirring plate maintains a certain speed and uniform stirring to prevent the deposition of non-Newtonian phases and abrasive particles from affecting the performance changes of the polishing liquid, and better consistency can be obtained. The polishing liquid rotates in the polishing pool and is given energy. When the parts rotate, relative motion occurs between the polishing liquid and the parts, and the polishing liquid is subjected to shear interaction. Once the shear force is formed, according to the above-mentioned climbing rod principle, a polishing action area is formed on the surface and small inner holes of the quartz parts. With the continuous stirring of the polishing liquid pool and the rotation of the parts, the belt-type flexible polishing head containing abrasive particles continuously polishes and removes the surface and inner holes of the parts.

[0068] The polishing stirring plate is driven by a motor to rotate counterclockwise, and the part fixture is driven by a motor to rotate clockwise.

[0069] In the process of processing quartz parts with non-Newtonian fluid polishing liquid, due to the fluidity of the polishing liquid, aluminum oxide or cerium oxide abrasives and hexagonal boron nitride are driven by the polishing liquid to micro-cut the surface of the parts and roll the parts under the shear thickening effect of the non-Newtonian fluid to remove the surface of the parts. Therefore, a "flexible polishing head with aluminum oxide or cerium oxide abrasives" is formed on the surface of the parts and the small inner pore structure to polish the quartz parts.

[0070] Example 1

[0071] Larger diameter simple flow channel inner hole ( Figure 1 ):

[0072] 1. Add a certain amount of deionized water to the polishing pool 5, add 25wt% starch, and start the polishing pool stirring base to a low speed mode to start stirring, so that the fluid in the polishing pool is in a flowing state;

[0073] 2. Add 10wt% 3μm aluminum oxide abrasive, 1wt% hexagonal boron nitride, and 1.5wt% sorbitol to an appropriate amount of deionized water, place in an ultrasonic water bath and ultrasonicate for 20-25 minutes to fully mix and disperse the components;

[0074] 3. Add the mixed liquid in step 2 to the polishing pool 5, add 1.5 wt% guanidine carbonate, and then add an appropriate amount of deionized water to the polishing pool 5, and adjust the pH value of the polishing liquid to 10.5;

[0075] 4. Prepare the non-Newtonian fluid polishing liquid according to the prescribed formula and add it into the polishing pool 5. After continuously turning on the stirring base 6 at the bottom of the polishing pool for 2-3 minutes, slightly increase the speed of the stirring base 6 of the polishing pool so that the fluid near the outer circle of the polishing pool 5 has a certain flow speed;

[0076] 5. Raise the part support table 4 to the upper limit position, clamp the quartz part to be processed at the position of the part to be processed (part to be polished Ⅰ8), and start the part rotation motor 3 on the part support table 4 to make the part rotate clockwise;

[0077] 6. Then, the part support table 4 is adjusted to a suitable position through the lifting guide rail 2, so that the self-priming screw 7 is completely inserted into the fully stirred non-Newtonian fluid polishing liquid 11, so that the parts to be processed are immersed in the polishing liquid. As the polishing pool stirring base and the self-priming screw rotate in opposite directions, when the self-priming screw inserted therein rotates, the polishing liquid containing the non-Newtonian fluid is not thrown toward the container wall due to inertia, but surrounds the rod due to the non-Newtonian effect caused by shear, and a "climbing rod" phenomenon of climbing up along the rod occurs. The non-Newtonian fluid polishing liquid carries the hexagonal boron nitride and aluminum oxide abrasive particles 10 and immerses them in any place that the fluid can reach without being thrown away, thereby realizing the rising package of the non-Newtonian fluid polishing liquid (such as Figure 3 As shown in the figure, a layer of non-Newtonian fluid polishing liquid with abrasive particles and chemical components is finally formed on the surface of the part to achieve polishing removal.

[0078] Example 2

[0079] Small diameter complex flow channel inner hole ( Figure 2 ):

[0080] 1. Add a certain amount of deionized water to the polishing pool 5, add 20wt% starch, and start the polishing pool stirring base to a low speed mode to start stirring, so that the fluid in the polishing pool is in a flowing state;

[0081] 2. 15wt% cerium oxide abrasive with a size of 300nm, 1.2wt% hexagonal boron nitride, 1wt% sodium hexametaphosphate, and 1wt% sorbitol were added to an appropriate amount of deionized water, and placed in an ultrasonic water bath for 20-25min to allow the various components to be fully mixed and dispersed. Compared with Example 1, this embodiment performs targeted proportioning for complex flow channels with small diameters, reduces the abrasive particle size, increases the abrasive concentration, adds a dispersant and a surfactant together, and appropriately reduces the concentration of the non-Newtonian phase so that the polishing liquid can more easily enter and pass through the complex flow channels with small diameters;

[0082] 3. Add the mixed liquid in step 2 into the polishing tank 5, add 1wt% sodium metasilicate, and then add an appropriate amount of deionized water until the pH value of the polishing liquid in the polishing tank 5 is 10;

[0083] 4. Prepare the non-Newtonian fluid polishing liquid according to the prescribed formula and add it into the polishing pool 5. After continuously turning on the stirring base 6 at the bottom of the polishing pool for 2-3 minutes, slightly increase the speed of the stirring base 6 of the polishing pool so that the fluid near the outer circle of the polishing pool 5 has a sufficient flow speed;

[0084] 5. Raise the part support table 4 to the upper limit position, clamp the quartz part to be processed at the position of the part to be processed (part to be polished II 9), and start the part rotation motor 3 on the part support table 4 to make the part rotate clockwise;

[0085] 6. Then, the part support platform 4 is adjusted to a suitable position through the lifting guide rail 2, so that the self-priming screw 7 is completely inserted into the fully stirred non-Newtonian fluid polishing liquid, so that the part to be processed is immersed in the polishing liquid. With the reverse rotation of the polishing pool stirring base and the self-priming screw, the polishing liquid containing the non-Newtonian fluid is centered on the rod and protrudes to wrap the entire part;

[0086] 7. Adjust the speed of the motor for rotating the parts. Compared with Example 1, this embodiment needs to appropriately increase the speed of the motor for rotating the parts because it is aimed at small diameter and complex flow channels, so that the liquid can fully reach each structure. The more notable feature is that the non-Newtonian fluid polishing liquid is stably extruded from the part channel or the connection between the part and the self-priming screw.

[0087] 8. Then, as in Example 1, the complex structure of the small inner holes of the quartz parts is polished and removed.

[0088] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A shear thickening polishing liquid for fine inner holes of quartz parts, characterized in that: A non-Newtonian fluid polishing liquid with a shear thickening effect, wherein the polishing liquid is a shear thickening polishing liquid containing aluminum oxide and / or cerium oxide abrasive particles with a diameter of 0.1-3 μm; The polishing liquid, calculated by mass fraction 100%, includes the following components and mass fractions: 10-15 wt% abrasive, 1-2 wt% surfactant, 0.5-1.2 wt% dispersant, 1-3 wt% hexagonal boron nitride, 18-25 wt% polyhydroxy polymer, 1-3 wt% pH regulator, and the rest is deionized water, and the pH value of the polishing liquid is adjusted to 9-11; The surfactant is one or a mixture of two or more of sorbitol, ethylenediaminetetraacetic acid, and tetradecanoic acid, used alone or in combination with a dispersant to improve the dispersion stability of the polishing liquid; The dispersant is sodium hexametaphosphate, which is used to adsorb anions on the surface of particles, so that the particles have the same charge and repel each other, thereby making the polishing liquid dispersed as a whole and not easy to settle; The polyhydroxy polymer is corn starch, and the non-Newtonian fluid made of corn starch is a shear thickening type; The pH regulator is one of guanidine carbonate and sodium metasilicate, and is used to form an alkaline polishing environment.

2. The shear thickening polishing liquid for fine inner holes of quartz parts according to claim 1, characterized in that: The abrasive grains are one or a mixture of aluminum oxide or cerium oxide abrasive grains, with a particle size of 3 μm, 1 μm, 300 nm or 100 nm, and are used to remove surface materials by micro-cutting and rolling the contact surface of the parts during the polishing process.

3. A polishing method using the shear thickening polishing liquid for fine inner holes of quartz parts according to claim 1 or 2, which is used to polish the inner holes of small diameter complex flow channels of quartz parts, and the polishing device for the shear thickening polishing liquid for fine inner holes of quartz parts comprises: A polishing stirring plate, a polishing pool, a parts workbench and a lifting workbench, wherein the polishing pool has a containing chamber inside for containing the prepared polishing liquid; The polishing stirring disc is installed at the bottom of the polishing pool and is driven to rotate by a motor to stir the polishing liquid; the lifting workbench includes a workbench base and a lifting guide rail installed on the workbench base; the part workbench includes a part support table, a part rotating motor and a self-priming screw, the part to be processed is installed on the self-priming screw through a clamp, the part rotating motor is installed on the part support table, the motor shaft of the part rotating motor is connected to the self-priming screw, and is used to drive the self-priming screw to rotate with the part to be processed, and the part support table is slidably connected to the lifting guide rail and reciprocates on the lifting guide rail to realize the movement of the part to be processed; when working, the part to be processed is immersed in the polishing liquid, and the rotation directions of the part to be processed and the polishing stirring disc are opposite; it is characterized in that it includes the following steps: S10, preparing the polishing liquid according to any one of claims 1 to 2 in a polishing pool; S10.1, add a certain amount of deionized water to the polishing pool, add 18-25 wt% of polyhydroxy polymer, and start the polishing pool stirring base to a low speed mode to start stirring, so that the fluid in the polishing pool is in a flowing state; S10.2, add 0.1-3 μm, 10-15 wt% abrasive, 1-3 wt% hexagonal boron nitride, 0.5-1.2 wt% dispersant, 1-2 wt% surfactant into appropriate amount of deionized water, place in ultrasonic water bath and stand for 20-25 min to fully mix and disperse the components; S10.3, adding the mixed liquid in step S10.2 into the polishing pool, adding 1-3 wt% of a pH adjuster, and then adding an appropriate amount of deionized water into the polishing pool, and adjusting the pH value of the polishing liquid to 9-11; S20, prepare the non-Newtonian fluid polishing liquid according to the prescribed formula and add it into the polishing pool, and keep the stirring base at the bottom of the polishing pool open for 2-3 minutes, then increase the speed of the stirring base of the polishing pool so that the fluid near the outer circle of the polishing pool has a sufficient flow speed; S30, raising the part support table to the upper limit position, clamping the quartz part to be processed at the position of the part to be processed, and starting the part rotation motor on the part support table to make the part rotate clockwise; S40, then adjust the part support table to a suitable position through the lifting guide rail, so that the self-priming screw is completely inserted into the fully stirred non-Newtonian fluid polishing liquid, so that the part is immersed in the polishing liquid, and as the polishing pool stirring base and the self-priming screw rotate in opposite directions, the polishing liquid containing the non-Newtonian fluid is centered on the rod and protrudes to wrap the entire part; S50, adjusting the speed of the component rotating motor so that the liquid can fully reach each structure; S60, then polish and remove the complex structure of the small inner holes of the quartz parts.

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