A large-area linear anode layer ion source with gas path topology

Abstract

The present application relates to the field of vacuum coating technology, and specifically, to a large-area linear anode layer ion source with a gas path topology structure, including a source body component, a permanent magnet, a cathode, a ring anode and a gas path topology structure, wherein: the cathode is composed of an inner cathode and an outer cathode, the inner cathode is arranged in the middle of the source body component, and the outer cathode is arranged on both sides of the inner cathode, forming an ion beam exit slit between the inner cathode; the ring anode is arranged below the ion beam exit slit; the permanent magnet is arranged between the side wall of the source body component and the edge of the outer cathode; the gas path topology structure is composed of multiple layers of gas distribution plates, which are arranged below the bottom surface of the source body component; a plurality of vents are arranged on the bottom surface of the source body component, which correspond one to one with the gas distribution holes on the gas path topology structure. The present application achieves the consistency of gas characteristics in the ionization area inside the ion source body by setting different gas distribution plates to etch opening structures and performing reliable arrangement and combination forms.

Description

Technical Field

[0001] The present application relates to the field of vacuum coating technology, and in particular to a large-area linear anode layer ion source with a gas path topology structure. Background Art

[0002] In PVD vacuum coating technology, it is necessary to use external high-energy particle beams to sputter clean the substrate in the entire film deposition process and assist in film deposition, so as to prepare dense films and improve the film-substrate bonding performance and strength. Anode layer ion source, a type of Hall-type ion source widely used in industry, comes from the anode layer ion thruster system for aerospace. During the film deposition and growth process, a large-area linear anode layer ion source is used to generate a high-energy ion beam to bombard the surface of the substrate to clean, activate and strengthen the material surface and eliminate static electricity.

[0003] The anode layer ion source mainly realizes two functions: one is to complete the effective ionization of a certain gas medium and generate a plasma with sufficient concentration to meet the needs of extracting beam density; the other is to extract, accelerate and focus from the plasma boundary to form a large-area uniform ion beam. The ion source component that realizes this function is the ion extraction system: this linear ion source does not require an electron emitter (such as a filament, etc.), so it is suitable for working conditions where the discharge gas contains oxygen, hydrogen and corrosive gases, and can avoid the disadvantage that the ion source cannot work normally due to damage to the electron emitter.

[0004] The linear anode layer ion source has a wide energy range of the emitted ion beam, a simple structure, and a low design cost, and is therefore widely used in industrial coating. At present, the existing anode layer ion sources in the field of vacuum coating are basically planar linear or circular annular anode structures. The spatial layered area of ​​about 4-5 mm above the annular anode plane and perpendicular to the inner and outer cathode ion emission slits is the anode layer ion source plasma generation area. Therefore, the uniformity of the flow rate and density of the inert gas molecules or active gas molecules entering this area has a direct impact on the discharge characteristics of the overall linear anode layer ion source, and thus affects the discharge quality of the ion source and the uniformity of the emitted ion beam flow.

[0005] Therefore, for a large-area linear anode layer ion source, the design of its gas distribution system is one of the key design indicators that determine the performance of the source. However, when my country's large-area linear anode layer ion source is supplied with gas through vacuum equipment, generally only one gas channel is reserved, the gas path structure design is unreasonable, and the gas distribution is uneven, resulting in uneven and insufficient discharge current of the anode layer ion source, which makes the Hall discharge area of ​​the ion source prone to sparking and other prominent problems, seriously affecting the performance of the large-area linear anode layer ion source. Summary of the invention

[0006] The present application provides a large-area linear anode layer ion source with a gas path topology structure, which effectively suppresses the abnormal glow under high-voltage discharge and significantly improves the stability and reliability of the discharge.

[0007] In order to achieve the above-mentioned purpose, the present application provides a large-area linear anode layer ion source with a gas path topology structure, including a source body assembly, a permanent magnet, a cathode, an annular anode and a gas path topology structure, wherein: the cathode is composed of an inner cathode and an outer cathode, the inner cathode is arranged in the middle of the source body assembly, and the outer cathode is arranged on both sides of the inner cathode, forming an ion beam exit slit between the inner cathode; the annular anode is arranged below the ion beam exit slit and is located above the bottom surface of the source body assembly; the permanent magnet is arranged between the side wall of the source body assembly and the edge of the outer cathode; the gas path topology structure is composed of multiple layers of gas distribution plates, which are arranged below the bottom surface of the source body assembly; a plurality of air vents are arranged on the bottom surface of the source body assembly, corresponding one to one to the air distribution holes on the gas path topology structure.

[0008] Furthermore, a water cooling circulation structure is provided under the permanent magnet.

[0009] Furthermore, the gas path topology structure is composed of 9 layers of surface-polished 2A12 aluminum alloy gas distribution plates.

[0010] Furthermore, 9 layers of air distribution plates are stacked and arranged in sequence below the bottom surface of the source body assembly.

[0011] Furthermore, a plurality of air distribution holes are etched on each air distribution plate, forming an air distribution channel as a whole, which is arranged corresponding to the plurality of ventilation holes.

[0012] Furthermore, the thickness of the uppermost air distribution plate is 5-8 mm, the thickness of the lowermost air distribution plate is 12-18 mm, and the thickness of each intermediate air distribution plate is 1-2 mm.

[0013] Furthermore, the vent hole on the bottom surface of the source body component has a conical structure at the upper end and a cylindrical structure at the lower end.

[0014] The large-area linear anode layer ion source with a gas path topology structure provided by the present invention has the following beneficial effects:

[0015] In response to the stringent requirements of large-area linear anode layer ion sources for uniform gas distribution in the gas path, the present application achieves consistency in gas characteristics in the ionization region inside the ion source body by setting up different gas distribution plate etching opening structures and performing reliable arrangement and combination forms, effectively suppressing the abnormal glow under high-voltage discharge, and significantly improving the stability and reliability of discharge in large-area linear anode layer ion sources. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The drawings constituting a part of this application are used to provide a further understanding of this application, so that other features, purposes and advantages of this application become more obvious. The schematic embodiment drawings and their descriptions of this application are used to explain this application and do not constitute an improper limitation on this application. In the drawings:

[0017] Figure 1 is a schematic diagram of a large-area linear anode layer ion source with a gas path topology structure provided according to an embodiment of the present application;

[0018] Figure 2 is a schematic diagram of etching the first layer of gas distribution plate provided in an embodiment of the present application;

[0019] Figure 3 is a schematic diagram of etching the second layer of gas distribution plate provided in an embodiment of the present application;

[0020] Figure 4 is a schematic diagram of etching the third layer of gas distribution plate provided in an embodiment of the present application;

[0021] Figure 5 is a schematic diagram of etching the fourth gas distribution plate provided in an embodiment of the present application;

[0022] Figure 6 is a schematic diagram of etching the fifth gas distribution plate provided in an embodiment of the present application;

[0023] Figure 7 is a schematic diagram of etching the sixth gas distribution plate according to an embodiment of the present application;

[0024] Figure 8 is a schematic diagram of etching the seventh gas distribution plate according to an embodiment of the present application;

[0025] Fig. 9 is a schematic diagram of etching the eighth gas distribution plate according to an embodiment of the present application;

[0026] Fig.10 is a schematic diagram of etching the ninth gas distribution plate according to an embodiment of the present application;

[0027] Fig.11 is a schematic diagram of an overall gas distribution channel of a gas topological structure provided according to an embodiment of the present application;

[0028] Fig.12 is a schematic diagram of ANSYS simulation fluid characteristics of a gas topological structure provided in an embodiment of the present application;

[0029] In the figure: 1-source assembly, 2-permanent magnet, 3-inner cathode, 4-outer cathode, 5-annular anode, 6-gas path topology, 7-vent, 8-water cooling circulation structure, 9-air distribution holes. DETAILED DESCRIPTION

[0030] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present application.

[0031] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present application described here. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0032] In the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0033] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0034] In addition, the term "plurality" shall mean two or more.

[0035] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0036] like Figure 1As shown, the present application provides a large-area linear anode layer ion source with a gas path topology structure, including a source body component 1, a permanent magnet 2, a cathode, an annular anode 5 and a gas path topology structure 6, wherein: the cathode is composed of an inner cathode 3 and an outer cathode 4, the inner cathode 3 is arranged in the middle of the source body component 1, and the outer cathode 4 is arranged on both sides of the inner cathode 3, forming an ion beam exit slit between the inner cathode 3; the annular anode 5 is arranged below the ion beam exit slit and is located above the bottom surface of the source body component 1; the permanent magnet 2 is arranged between the side wall of the source body component 1 and the edge of the outer cathode 4; the gas path topology structure 6 is composed of a plurality of gas distribution plates, which are arranged below the bottom surface of the source body component 1; a plurality of ventilation holes 7 are arranged on the bottom surface of the source body component 1, corresponding one to one to the gas distribution holes 9 on the gas path topology structure 6.

[0037] Specifically, the large-area linear anode layer ion source with a gas path topology structure provided in the embodiment of the present application is provided with an annular slit with a width of about 4.5 mm between the inner cathode 3 and the outer cathode 4 for extracting the ion beam, and a vertically arranged annular anode 5 is arranged below it, and the upper surface of the annular anode 5 is a planar structure; a permanent magnet 2 (Nd-Fe-B) is arranged on the horizontal side of the outer cathode 4, and is fixed to the source body component 1 through a 2A12 type aluminum alloy fixing structure; through the magnetic field design, an obvious magnetic field lens structure is formed at the slit between the inner cathode 3 and the outer cathode 4, thereby confining electrons to form a plasma discharge area; then a magnetic field is applied between the cathode and the annular anode 5. When an electric field is applied, an electromagnetic field with an orthogonal structure will be formed at the slit. Under the action of electromagnetic field superposition, it can significantly affect the motion characteristics of charged particles in the plasma region, causing electrons to drift in a rotary motion, extending the electron motion trajectory, and forming a high-density electron cloud. Through the gas path topological structure 6 below and the multiple air vents 7 on the bottom surface of the source body component 1, ventilation can be directed to the electron cloud region above. When the gas is injected into the annular region where the drift electron cloud exists, the probability of collision between gas molecules and electrons is greatly increased, thereby significantly improving the ionization effect of the gas molecules. At the same time, under the action of the anode potential, high-density ions will form a high-energy ion beam to bombard the substrate and the thin film growth surface, thereby achieving the preparation of the thin film.

[0038] Furthermore, a water cooling circulation structure 8 is provided below the permanent magnet 2. The water cooling circulation structure 8 is provided inside the source assembly 1 mainly to prevent the magnet temperature from being higher than the Curie temperature when the source is running, thereby affecting the discharge performance of the source.

[0039] Furthermore, the gas path topology structure 6 is composed of 9 layers of surface-polished 2A12 aluminum alloy gas distribution plates.

[0040] Furthermore, 9 layers of air distribution plates are stacked and sequentially arranged below the bottom surface of the source body assembly 1 .

[0041] Specifically, the uniformity of the flow rate and density of the gas molecules entering the source assembly 1 and participating in the collision will have a direct impact on the discharge characteristics of the overall linear anode layer ion source, thereby affecting the discharge quality of the ion source and the uniformity of the output ion beam. Therefore, the embodiment of the present application optimizes the gas path topology structure 6, and divides the gas path topology structure 6 as a whole into 9 layers of gas distribution plates, each layer of which is made of 2A12 type aluminum alloy with a polished surface, and is stacked and combined according to the actual gas entry rules, and is fixed in sequence by screws and arranged directly below the bottom surface of the source body assembly 1; wherein, the number of layers of the gas distribution plates is determined according to the number of air vents 7 on the bottom surface of the source body assembly 1. In the embodiment of the present application, the number of air vents 7 on the bottom surface of the source body assembly 1 is 32, so 9 layers of air distribution plates are set, and when the length of the ion source becomes longer, the number of air vents 7 on the bottom surface of the source body assembly 1 will increase, and then the number of required air distribution plates will also increase. For example, when the number of air vents 7 on the bottom surface of the source body assembly 1 of the ion source is set to 64, 11 layers of air distribution plates are required.

[0042] Further, such as Figure 2-11 As shown, a plurality of air distribution holes 9 are etched on each air distribution plate, forming an air distribution channel as a whole, which is arranged corresponding to the plurality of ventilation holes 7. The gas path topological structure 6 is mainly used for the entry of gas. Each layer of gas distribution plate needs to be etched with gas distribution holes 9 of different patterns according to the actual gas intake requirements. After combination, the gas distribution holes 9 on the 9 layers of gas distribution plates form a uniform gas distribution channel, and the gas distribution holes 9 of the topmost gas distribution plate are arranged corresponding to the air vents 7 inside the source body component 1. When the external gas enters the source body component 1 through the gas path topological structure 6, it first enters the gas distribution channel composed of the multiple layers of gas distribution plates, and then enters the corresponding air vents 7 on the bottom surface of the source body component 1 through the gas distribution holes 9 of the topmost gas distribution plate, and finally enters the interior of the source body component 1, that is, the one-way gas supply of the vacuum equipment is dispersed into multiple air intakes of the air vents 7 through the gas path topological structure 6, so that the overall distance taken by the incoming gas is consistent, ensuring that the flow rate of the gas entering the source body component 1 through each air vent 7 is the same, thereby achieving the consistency and uniformity of the gas characteristics in the ionization area inside the ion source body.

[0043] Specifically, the gas outlet performance of the gas path topology 6 can be calculated by ANSYS fluid simulation. The specific gas path analysis structure is as follows: Fig.12 As shown, it can be seen that the gas enters the source body assembly 1 from the gas distribution channels and air vents 7 formed by the multi-layer gas distribution plates, and the gas flow rate and flow rate of each air vent 7 are exactly the same, achieving the purpose of absolutely uniform gas distribution along the length of the ion source.

[0044] Furthermore, the thickness of the top gas distribution plate is 5-8mm, the thickness of the bottom gas distribution plate is 12-18mm, and the thickness of each middle gas distribution plate is 1-2mm. The thickness of the upper and lower gas distribution plates is relatively thick. On the one hand, it is used to fix the middle gas distribution plate and play a role of fixed support. On the other hand, it increases the collimation of the inlet and outlet directions, increases the inlet and outlet distance of the inlet and outlet gas, and makes the inlet and outlet gas more uniform.

[0045] Furthermore, the vent hole 7 on the bottom surface of the source body component 1 has a conical structure at the upper end and a cylindrical structure at the lower end. The vent hole 7 on the bottom surface of the source body component 1 is specially designed with a conical structure at the upper end leading to the annular anode 5 above, and a cylindrical structure at the lower end corresponding to the gas distribution channel of the gas path topology structure 6, mainly to improve the uniformity and directionality of the flow rate when the gas molecules enter.

[0046] Specifically, the embodiment of the present application optimizes the gas distribution components of the gas path topology structure 6 to disperse one gas supply into multiple gas supplies, thereby achieving the uniformity and uniformity of the plasma fluid characteristics in the ionization region of the large-area linear anode layer ion source, effectively suppressing the abnormal glow under high-voltage discharge, significantly improving the stability and reliability of the large-area linear anode layer ion source discharge, and improving the overall discharge performance and usage performance of the ion source.

[0047] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A large-area linear anode layer ion source with a gas path topology, characterized in that: It includes a source body component, a permanent magnet, a cathode, a ring anode and a gas path topology structure, wherein: The cathode is composed of an inner cathode and an outer cathode, wherein the inner cathode is arranged in the middle of the source body component, and the outer cathode is arranged on both sides of the inner cathode to form an ion beam exit slit between the inner cathode and the outer cathode; The annular anode is arranged below the ion beam exit slit and above the bottom surface of the source body assembly; The permanent magnet is disposed between the side wall of the source assembly and the edge of the outer cathode; The gas path topology structure is composed of multiple layers of gas distribution plates, which are arranged below the bottom surface of the source body component; A plurality of vent holes are arranged on the bottom surface of the source body component, corresponding one-to-one to the air distribution holes on the air path topological structure; The gas path topology structure is composed of 9 layers of surface-polished 2A12 aluminum alloy gas distribution plates; 9 layers of air distribution plates are stacked and sequentially arranged below the bottom surface of the source assembly; A plurality of air distribution holes are etched on each air distribution plate, forming an air distribution channel as a whole, which is arranged corresponding to the plurality of ventilation holes.

2. The large-area linear anode layer ion source with a gas path topology structure according to claim 1, characterized in that: A water cooling circulation structure is arranged below the permanent magnet.

3. The large-area linear anode layer ion source with a gas path topology structure according to claim 1, characterized in that: The thickness of the top air distribution plate is 5-8 mm, the thickness of the bottom air distribution plate is 12-18 mm, and the thickness of each intermediate air distribution plate is 1-2 mm.

4. The large-area linear anode layer ion source with a gas path topology structure according to claim 1, characterized in that: The vent hole on the bottom surface of the source body component has a conical structure at the upper end and a cylindrical structure at the lower end.

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