Sulfur-nitrogen co-doped carbon dots modified carbon nitride and preparation method and application thereof

Abstract

The application discloses a kind of sulfur-nitrogen co-doped carbon dot modified carbon nitride and preparation method and application, including first precursor is washed by high-temperature pyrolysis, using deionized water, to obtain carbon nitride material;Second precursor is dissolved in solvent and dispersed, to form second precursor solution, carbon nitride material is added in second precursor solution, and dispersed uniformly, then organic acid is added, and hydrothermal-solvothermal method is used to synthesize, and sulfur-nitrogen co-doped carbon dot modified carbon nitride photocatalyst is obtained by filtration and washing;Second precursor includes sulfur, carbon source and passivator of sulfur-nitrogen co-doped carbon dot modified carbon nitride material.The application uses the above-mentioned sulfur-nitrogen co-doped carbon dot modified carbon nitride and preparation method and application, not only can utilize renewable solar energy, greatly reduce environmental pollution, but also can produce green energy hydrogen, and simultaneously accompanied by the production of high value-added chemicals, with good application prospect.

Description

A sulfur-nitrogen co-doped carbon dot modified carbon nitride, its preparation method and application Technical Field

[0001] This invention relates to the field of photoreforming technology, and in particular to a sulfur-nitrogen co-doped carbon dot modified carbon nitride, its preparation method, and its application. Background Technology

[0002] Plastics are widely used in many aspects of daily production and life due to their low cost and multifunctionality. However, waste plastic pollution is increasingly threatening human health. Currently, the main methods for treating waste plastics include traditional methods such as incineration, landfill, and mechanical recycling, but these are limited by environmental pollution and stringent pretreatment conditions. Among new recycling methods that can produce high-value-added chemicals, thermal treatment is widely promoted due to its ability to generate these chemicals, but it is still limited by its high energy consumption. Therefore, photocatalysis technology, utilizing clean and renewable solar energy, has gradually attracted the interest of researchers in exploring its application in waste plastics due to its advantages such as mild pretreatment conditions and the ability to produce high-value-added chemicals. Photocatalytic treatment of waste plastics mainly includes photodegradation, photoreforming, photothermal catalysis, and artificial photosynthesis. Photoreforming of waste plastics can generate both clean energy and high-value-added chemicals, and more importantly, it has good selectivity, making it a more advantageous waste plastic treatment method among photocatalytic technologies. However, the biggest challenge facing photocatalysis technology in the upgrading and utilization of waste plastics is its low efficiency. Therefore, improving photocatalytic efficiency is of great significance for the practical application of photocatalytic treatment of waste plastics. The key to this research lies in the construction of highly efficient photocatalysts, which can expand light absorption, promote charge separation, and facilitate surface redox reactions.

[0003] Currently, the main photocatalysts used in solar reforming for the upgrading and conversion of waste plastics include cadmium sulfide (CdS)-based photocatalysts and metal-organic framework (MOF)-based photocatalysts. In 2018, Professor Erwin Reisner first used CdS / CdOx quantum dots in the field of solar reforming (Energy Environ. Sci. 2018, 11, 2853.).

[0004] In 2022, Professor Qiu Bocheng applied a photocatalyst (MoS2 / CdS) with MoS2 embedded in the tip of CdS nanorods to the field of photoreforming (ACS Catalysis, Trash to Treasure: Photoreforming of Plastic Waste into Commodity Chemicals and Hydrogen over MoS2-Tipped CdS Nanorods 2022, 12, 12823-12832.). In 2023, Professor Qiao Shizhang prepared a CdS photocatalyst (d-NiPS3 / CdS) coupled with defect-rich nickel thiophosphate (d-NiPS3) using plasma technology for photoreforming, achieving a new level of hydrogen production performance. Furthermore, in the photoreforming of plastics, the high-value-added products generated per unit time also reached new indicators (J. Am. Chem. Soc. Boosted Photoreforming of Plastic Waste via Defect-RichNiPS3Nanosheets 2023, 145, 6410.). In 2022, Professor Zhang Wenjing's team applied Ag2O / Fe-MOF, synthesized by combining Ag2O with Fe-MOF structures, to the field of photo-reforming plastics (Applied Catalysis B: Environmental, In-situ formation of Ag2O in metal-organic framework for light-driven upcycling of microplastics coupled with hydrogen production 2022, 319, 121940).

[0005] Among the mainstream photocatalysts currently used in the field of photo-reforming for upgrading and converting waste plastics, most CdS-based composite photocatalysts, while exhibiting superior performance, are still hampered by issues such as toxicity and instability. Meanwhile, most MOF-based composite photocatalysts contain elements such as metals, and their high cost continues to limit their further application.

[0006] Among numerous photocatalysts, carbon nitride has been initially explored for application in the field of photoreforming due to its advantages such as broad absorption, ease of modification, low cost, and high safety. In 2019, Professor Erwin Reisner prepared a carbon nitride / nickel phosphide photocatalyst by combining non-toxic carbon nitride with nickel phosphide, and demonstrated its application using a self-made mobile phase photoreforming device (J. Am. Chem. Soc. Photoreforming of Nonrecyclable Plastic Waste over a Carbon Nitride / Nickel Phosphide Catalyst 2019, 141, 15201). In 2022, Gong X et al. constructed a photocatalytic system by connecting carbon nitride to NiMo metal bridges using carbon nanotubes. This system aimed to broaden the light absorption of carbon nitride materials, improve its charge separation efficiency, and provide reactive sites (AppliedCatalysis B: Environmental, Photoreforming of plastic waste poly (ethyleneterephthalate) via in-situ derived CN-CNTs-NiMo hybrids 2022, 307, 121143). However, a key scientific challenge in the field of upgrading and converting waste plastics using modified carbon nitride photoreforming is its low photocatalytic efficiency and poor selectivity.

[0007] Carbon dots have been shown to broaden light absorption and promote charge separation (Science, Metal-free efficient photocatalyst for stable visible water splitting via a two-electron pathway 2015, 347, 970-974). Furthermore, sulfur- and nitrogen-co-doped carbon dots possess long-wavelength absorption, effectively expanding the light absorption range of carbon nitride (Nanoscale, Highly luminescent S, N co-doped graphene quantum dots with broad visible absorption bands for visible light photocatalysts 2013, 5, 12272). Their abundant functional groups significantly reduce the difficulty of modifying carbon nitride materials, adjusting their bandgap structure and active sites, and promoting charge separation. This invention provides a method for preparing sulfur- and nitrogen-co-doped carbon dot-modified carbon nitride photocatalysts, and has successfully applied it to photo-reforming for the upgrading and conversion of waste plastics. Summary of the Invention

[0008] The purpose of this invention is to provide a sulfur-nitrogen co-doped carbon dot modified carbon nitride, its preparation method, and its applications. This method not only utilizes renewable solar energy, significantly reducing environmental pollution, but also produces green energy hydrogen, while simultaneously generating high-value-added chemicals. The catalyst exhibits excellent performance and good stability, showing promising application prospects.

[0009] To achieve the above objectives, this invention provides a sulfur-nitrogen co-doped carbon dot modified carbon nitride, its preparation method, and its application, comprising the following steps:

[0010] S1. First, the first precursor is subjected to high-temperature pyrolysis and washed with deionized water to obtain carbon nitride material.

[0011] S2. The second precursor is dissolved in a solvent and dispersed to form a second precursor solution. Carbon nitride material is added to the second precursor solution and dispersed evenly. Then, organic acid is added and synthesized by hydrothermal-solventothermal method. After filtration and washing, sulfur and nitrogen co-doped carbon dot modified carbon nitride photocatalyst is obtained.

[0012] The second precursor includes a carbon source and a passivating agent for sulfur and nitrogen co-doped carbon dot modified carbon nitride materials.

[0013] Preferably, in step S1, the first precursor includes one or more of melamine, dicyandiamide, urea, thiourea, and monocyanamide.

[0014] Preferably, in step S1, the reaction conditions for high-temperature pyrolysis are a temperature range of 400 ℃-600 ℃, a heating rate range of 0.1 ℃ / min-20 ℃ / min, and a heating duration range of 1-24 h.

[0015] Preferably, in step S2, the carbon source includes one or more of glucose, citric acid, ascorbic acid, o-phenylenediamine, catechol, starch, cellulose, chitosan, fructose, glyceraldehyde, ribose, and deoxyribose.

[0016] Preferably, in step S2, the passivating agent includes one or more of thiazole, benzothiazole, thiourea, phenylthiourea, N,N-diphenylthiourea, thiazolidinone, 2-aminothiazole, tetrahydrothiophene-3-one, glutathione, 2-acetylpyrrole, 2-methyl-3-thiophenethiol, and 2-thiophenethiol.

[0017] Preferably, in step S2, the solvent includes one or more of the following: water, methanol, ethanol, acetonitrile, diethyl ether, ethylene glycol, propanol, N,N-dimethylformamide, dimethyl sulfoxide, dimethylacetamide, acetone, dichloromethane, cyclohexane, chloroform, n-hexane, benzyl alcohol, toluene, ethyl acetate, methyl tert-butyl ether, benzene, and n-butanol.

[0018] Preferably, in step S2, the temperature range for hydrothermal-solvothermal synthesis is 100 ℃-240 ℃, and the holding time ranges from 4 to 72 h.

[0019] Preferably, the ratio of carbon source to passivating agent is 100:1 to 1:100, and the ratio of solvent to organic acid is 10000:1 to 1000:1.

[0020] A method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride catalyst.

[0021] Application of sulfur-nitrogen co-doped carbon dot modified carbon nitride catalyst in photo-reforming waste plastic upgrading and conversion.

[0022] Therefore, the present invention employs the above-mentioned sulfur-nitrogen co-doped carbon dot modified carbon nitride, its preparation method, and its application, and its technical effects are as follows:

[0023] (1) A carbon nitride photocatalyst modified with sulfur and nitrogen co-doped carbon dots is used to improve its photocatalytic performance and apply it to the photo-reforming treatment of plastic waste to upgrade and convert it into green energy hydrogen while obtaining high value-added chemicals.

[0024] (2) It can not only utilize renewable solar energy to greatly reduce environmental pollution, but also produce green energy hydrogen, and at the same time generate high-value-added chemicals. The catalyst has excellent performance and good stability, and has good application prospects.

[0025] The technical solution of the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. Attached Figure Description

[0026] Figure 1 shows the TEM images of sulfur and nitrogen co-doped carbon dot modified carbon nitride materials; Figure 1(a) is the TEM image of sulfur and nitrogen co-doped carbon dot modified carbon nitride at 50 nm; Figure 1(b) is the TEM image of sulfur and nitrogen co-doped carbon dot modified carbon nitride at 10 nm; Figure 1(c) is the particle size distribution histogram of sulfur and nitrogen co-doped carbon dot modified carbon nitride in the TEM images.

[0027] Figure 2 shows the XRD pattern of sulfur and nitrogen co-doped carbon dot modified carbon nitride material;

[0028] Figure 3 shows the FTIR of sulfur and nitrogen co-doped carbon dot modified carbon nitride materials;

[0029] Figure 4 shows the EDS test results of sulfur and nitrogen co-doped carbon dot modified carbon nitride materials; Figure 4(a) shows the HADDF image of sulfur and nitrogen co-doped carbon dot modified carbon nitride; Figure 4(b) shows the carbon element distribution in the HADDF image; Figure 4(c) shows the nitrogen element distribution in the HADDF image; Figure 4(d) shows the oxygen element distribution in the HADDF image; Figure 4(e) shows the sulfur element distribution in the HADDF image.

[0030] Figure 5 shows the high-resolution XPS spectra of sulfur-nitrogen co-doped carbon nitride materials; Figure 5(a) shows the fine carbon spectrum of sulfur-nitrogen co-doped carbon nitride; Figure 5(b) shows the fine nitrogen spectrum of sulfur-nitrogen co-doped carbon nitride; Figure 5(c) shows the fine oxygen spectrum of sulfur-nitrogen co-doped carbon nitride; Figure 5(d) shows the fine sulfur spectrum of sulfur-nitrogen co-doped carbon nitride.

[0031] Figure 6 shows the photo-reforming performance characterization of sulfur-nitrogen co-doped carbon dots modified carbon nitride materials; Figure 6(a) shows the hydrogen production performance of sulfur-nitrogen co-doped carbon dots, carbon nitride, and sulfur-nitrogen co-doped carbon dots modified carbon nitride; Figure 6(b) shows the distribution of high-value-added products of sulfur-nitrogen co-doped carbon dots, carbon nitride, and sulfur-nitrogen co-doped carbon dots modified carbon nitride; Figure 6(c) shows the five-cycle stability test of sulfur-nitrogen co-doped carbon dots modified carbon nitride; Figure 6(d) shows the NMR spectrum of high-value-added products of sulfur-nitrogen co-doped carbon dots modified carbon nitride. Detailed Implementation

[0032] The technical solution of the present invention will be further described below with reference to the accompanying drawings and embodiments.

[0033] Unless otherwise defined, the technical or scientific terms used in this invention shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention pertains.

[0034] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the present invention, and no reference numerals in the claims should be construed as limiting the scope of the claims.

[0035] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can be appropriately combined to form other embodiments that can be understood by those skilled in the art. These other embodiments are also covered within the scope of protection of this invention.

[0036] It should also be understood that the specific embodiments described above are only used to explain the present invention, and the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

[0037] Techniques, methods, and apparatus known to those skilled in the art may not be discussed in detail, but where appropriate, they should be considered part of the specification.

[0038] All prior art documents cited in this specification are incorporated herein by reference in their entirety and are therefore part of the disclosure of this invention.

[0039] Example 1

[0040] This invention provides a method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride, comprising the following steps:

[0041] S1. Dicyandiamide was selected as the first precursor. The preparation temperature was controlled at 550 °C, the heating rate was maintained at 5 °C / min, and the heating time was maintained at 8 h. After washing with deionized water, carbon nitride material CN-1 was obtained.

[0042] S2. Using 1 mmol glucose as the carbon source and 10 mmol thiourea as the passivating agent, the catalyst was dispersed in 100 mL of ethanol. 150 μL formic acid and 2 g CN-1 were added, and the mixture was heated to 220℃ and maintained at this temperature for 24 hours. The catalyst was then washed with deionized water and ethanol, followed by drying. This yielded nitrogen-co-doped carbon dot-modified carbon nitride (R0). S,N -CDs-CN-1) photocatalyst.

[0043] Example 2

[0044] This invention provides a method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride, comprising the following steps:

[0045] S1. Melamine was selected as the first precursor. The preparation temperature was controlled at 500 °C, the heating rate was maintained at 10 °C / min, and the heating time was maintained at 12 h. After that, it was washed with deionized water. The carbon nitride material CN-2 was obtained.

[0046] S2. Using 1 mmol citric acid as the carbon source and 3 mmol thiourea as the passivating agent, the catalyst was dispersed in 100 mL of dimethyl sulfoxide. 100 μL acetic acid and 5 g CN-2 were added, and the mixture was heated to 180 °C and maintained at this temperature for 12 hours. The catalyst was then washed with deionized water and ethanol, and subsequently dried. This yielded nitrogen-co-doped carbon dot-modified carbon nitride (R2). S,N -CDs-CN-2) photocatalyst.

[0047] Example 3

[0048] This invention provides a method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride, comprising the following steps:

[0049] S1. Thiourea was selected as the first precursor. The preparation temperature was controlled at 600 °C, the heating rate was maintained at 1 °C / min, and the heating time was maintained at 24 h. After that, it was washed with deionized water. The carbon nitride material CN-3 was obtained.

[0050] S2. Using 1 mmol ascorbic acid as the carbon source and 5 mmol thiazole as the passivating agent, the catalyst was dispersed in 100 mL of N,N-dimethylformamide. 200 μL of propionic acid and 15 g of CN-3 were added, and the mixture was heated to 200 °C and maintained at this temperature for 48 hours. The catalyst was then washed with deionized water and ethanol, followed by drying. This yielded nitrogen-co-doped carbon dot-modified carbon nitride (R0). S,N -CDs-CN-3) photocatalyst.

[0051] Example 4

[0052] This invention provides a method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride, comprising the following steps:

[0053] S1. Urea was selected as the first precursor. The preparation temperature was controlled at 450 °C, the heating rate was maintained at 15 °C / min, and the heating time was maintained at 10 h. After that, it was washed with deionized water. The carbon nitride material CN-4 was obtained.

[0054] S2. Using 1 mmol citric acid as the carbon source and 10 mmol glutathione as the passivating agent, the catalyst was dispersed in 100 mL of N,N-dimethylformamide. 10 μL of acrylic acid and 15 g of CN-4 were added, and the mixture was heated to 160 °C and maintained at this temperature for 12 hours. The catalyst was then washed with deionized water and ethanol, followed by drying. This yielded nitrogen-co-doped carbon dot-modified carbon nitride (R0). S,N -CDs-CN-4) photocatalyst.

[0055] Example 5

[0056] This invention provides a method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride, comprising the following steps:

[0057] S1. Ammonium salt-treated melamine was selected as the first precursor. The preparation temperature was controlled at 550 °C, the heating rate was maintained at 5 °C / min, and the heating time was maintained at 24 h. After that, it was washed with deionized water. The carbon nitride material CN-5 was obtained.

[0058] S2. Using 1 mmol ascorbic acid as the carbon source and 5 mmol 2-thiophenethyl alcohol as the passivating agent, the catalyst was dispersed in 100 mL of dimethyl sulfoxide. 100 μL of propionic acid and 25 g of CN-5 were added, and the mixture was heated to 170 °C and maintained at this temperature for 16 hours. The catalyst was then washed with deionized water and ethanol, followed by drying. This yielded nitrogen-co-doped carbon dot-modified carbon nitride (R2). S,N -CDs-CN-5) photocatalyst.

[0059] Example 6

[0060] This invention provides a method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride, comprising the following steps:

[0061] S1. Urea treated with ammonium salts was selected as the first precursor. The preparation temperature was controlled at 450 °C, the heating rate was maintained at 1 °C / min, and the heating time was maintained at 4 h. After that, it was washed with deionized water. The carbon nitride material CN-6 was obtained.

[0062] S2. Using 1 mmol starch as the carbon source and 5 mmol phenylthiourea as the passivating agent, the catalyst was dispersed in 100 mL acetone. 100 μL formic acid and 25 g CN-6 were added, and the mixture was heated to 140 °C and maintained at this temperature for 8 hours. The catalyst was then washed with deionized water and ethanol, followed by drying. This yielded nitrogen-co-doped carbon dot-modified carbon nitride (R0). S,N -CDs-CN-6) photocatalyst.

[0063] Application Example 1

[0064] The catalyst material R in Example 3 S,N -CDs-CN-3 is used for the photoreforming of plastics, as detailed below:

[0065] Polyethylene terephthalate (PET) treated with NaOH was hydrolyzed, and the supernatant was obtained by centrifugation. Then, 100 mg of catalyst was taken, and 3% Pt co-catalyst was added. Simultaneously, an AM 1.5G filter was used, with a light intensity of 100 mW·cm⁻¹. -2 The hydrogen production performance was determined to be 1.5 mmol·g using a 6A Labsolar and GC coupled assay. -1 .h -1 Quantitative analysis by proton nuclear magnetic resonance spectroscopy revealed that 0.92 mmol / L acetic acid, 0.68 mmol / L glycolic acid, and 0.68 mmol / L formic acid were produced after 24 hours of photo-reforming.

[0066] Application Example 2

[0067] The catalyst material R from Example 5 S,N -CDs-CN-5 is used for the photoreforming of plastics, as detailed below:

[0068] Polyethylene terephthalate (PET) treated with NaOH was hydrolyzed, and the supernatant was obtained by centrifugation. Then, 100 mg of catalyst was taken, and 3% Pt co-catalyst was added. Simultaneously, an AM 1.5G filter was used, with a light intensity of 100 mW·cm⁻¹. -2 Hydrogen production efficiency was determined to be 1.08 mmol·g⁻¹·h⁻¹ using a 6A Labsolar and GC coupled assay. Quantitative analysis by 1H NMR spectroscopy revealed that after 24 hours of photo-reforming, 0.92 mmol / L of acetic acid, 0.68 mmol / L of glycolic acid, and 0.68 mmol / L of formic acid were produced.

[0069] This invention develops a sulfur and nitrogen co-doped carbon dot modified carbon nitride photocatalyst, and for the first time applies it to the photo-reforming of waste plastics for upgrading and conversion, achieving a maximum hydrogen production performance of 3.5 mmol·g. -1 .h -1Furthermore, its selectivity for organic acids can reach 100%, especially for high-value-added chemicals such as glycolic acid, with a performance of up to 2 mmol g. - 1 d -1 .

[0070] Figure 1 shows TEM characterization, demonstrating that carbon dots are uniformly distributed within the carbon nitride catalyst. Figure 2 shows XRD, and Figure 3 shows FTIR, confirming that the carbon dot-modified carbon nitride photocatalyst retains its basic carbon nitride structure intact. Figure 4 shows HADFF and mapping tests, and Figure 5 shows XPS high-resolution spectroscopy, demonstrating that the composite photocatalyst contains carbon, oxygen, nitrogen, and sulfur. These data fully demonstrate that this invention successfully prepared a sulfur and nitrogen co-doped carbon dot-modified carbon nitride photocatalyst. Figure 6 shows the photoreforming performance characterization of the sulfur and nitrogen co-doped carbon dot-modified carbon nitride material.

[0071] Therefore, the present invention utilizes the aforementioned sulfur and nitrogen co-doped carbon dot modified carbon nitride, its preparation, and its application. This not only allows for the utilization of renewable solar energy, significantly reducing environmental pollution, but also generates green energy hydrogen, while simultaneously producing high-value-added chemicals. The catalyst exhibits excellent performance and good stability, demonstrating promising application prospects.

[0072] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit them. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can still be made to the technical solutions of the present invention, and these modifications or equivalent substitutions cannot cause the modified technical solutions to deviate from the spirit and scope of the technical solutions of the present invention.

Claims

1. An application of sulfur-nitrogen co-doped carbon dot modified carbon nitride in the upgrading and conversion of waste plastics through photo-reforming, characterized in that, A method for preparing sulfur-nitrogen co-doped carbon dot modified carbon nitride includes the following steps: S1, firstly, the first precursor is subjected to high-temperature pyrolysis and washed with deionized water to obtain carbon nitride material; S2, the second precursor is dissolved in a solvent and dispersed to form a second precursor solution, the carbon nitride material is added to the second precursor solution and dispersed evenly, then an organic acid is added, and synthesis is performed using a hydrothermal or solvothermal method, followed by filtration and washing to obtain sulfur-nitrogen co-doped carbon dot modified carbon nitride photocatalyst; the second precursor includes a carbon source and a passivating agent; in step S1, the first precursor includes one or more of melamine, dicyandiamide, urea, thiourea, and monocyanamide; the reaction conditions for high-temperature pyrolysis are a temperature range of 400 ℃-600 ℃. ℃; In step S2, the carbon source includes one or more of glucose, citric acid, ascorbic acid, o-phenylenediamine, catechol, starch, cellulose, chitosan, fructose, glyceraldehyde, ribose, and deoxyribose; In step S2, the passivating agent includes one or more of thiazole, benzothiazole, thiourea, phenylthiourea, N,N-diphenylthiourea, thiazolidinone, 2-aminothiazole, and glutathione; In step S2, the temperature range for hydrothermal or solvothermal synthesis is 100 ℃-240 ℃, and the holding time ranges from 4 to 72 h; The ratio of carbon source to passivating agent is 100:1-1:100, and the ratio of solvent to organic acid is 10000:1-1000:1; wherein, the organic acid is formic acid, acetic acid, propionic acid, or acrylic acid.

2. The application according to claim 1, characterized in that, In step S1, the heating rate of high-temperature pyrolysis ranges from 0.1 ℃ / min to 20 ℃ / min, and the heating time ranges from 1 to 24 h.

3. The application according to claim 1, characterized in that, In step S2, the solvent includes one or more of the following: water, methanol, ethanol, acetonitrile, diethyl ether, ethylene glycol, propanol, N,N-dimethylformamide, dimethyl sulfoxide, dimethylacetamide, acetone, dichloromethane, cyclohexane, chloroform, n-hexane, benzyl alcohol, toluene, ethyl acetate, methyl tert-butyl ether, benzene, and n-butanol.

Images