A processing device for zinc anode production that is easy to clean

Abstract

The present invention relates to the field of zinc anode plate production, and in particular to a processing device for zinc anode production that is easy to clean, including a bearing frame, a moving structure, a lifting structure I, a positioning frame and a lifting structure II, etc.; the bearing frame is equipped with a moving structure; the moving structure is equipped with a plurality of lifting structures I; all lifting structures I are equipped with positioning frames, and all positioning frames are provided with trigger blocks; and the bearing frame is equipped with a lifting structure II. The present invention provides through grooves on a pressing plate I, a pressing plate II and a grinding plate. When the grinding plate grinds the zinc anode plate, the generated debris will gradually be discharged outward through the through grooves on the pressing plate I, the pressing plate II and the grinding plate. As the debris on the zinc anode plate is discharged, the debris remaining on the grinding plate gradually decreases, thereby reducing the influence of the debris on the grinding effect of the zinc anode plate.

Description

Technical Field

[0001] The invention relates to the field of zinc anode plate production, and in particular to a processing device for zinc anode production which is easy to clean. Background Art

[0002] During the grinding process of the zinc anode plate, the debris from the grinding of the zinc anode plate will remain on the grinding structure. During the reciprocating grinding process of the zinc anode plate, the debris will gradually fill the friction surface of the grinding structure, and the friction surface of the grinding structure will gradually become flat, so that the grinding structure will grind the zinc anode plate through the debris, affecting the grinding effect of the grinding structure on the zinc anode plate.

[0003] During the grinding process of the zinc anode plate, when the zinc anode plate contacts the grinding structure, since the zinc anode plate is in a moving state, some debris generated by the grinding will splash outwards, which may easily splash onto the operator and cause harm to the operator. Summary of the invention

[0004] In order to overcome the disadvantage that the debris generated by grinding will remain on the grinding plate and the debris will affect the grinding effect of the zinc anode plate, the present invention provides a processing device for zinc anode production that is easy to clean.

[0005] The technical solution is as follows: A processing device for zinc anode production that is easy to clean, including a bearing frame, a mobile structure, a lifting structure I, a positioning frame, a lifting structure II and a water circulation component; a mobile structure is installed on the bearing frame; a plurality of lifting structures I are installed on the moving structure; all lifting structures I are installed with positioning frames, and all positioning frames are provided with trigger blocks; a lifting structure II is installed on the bearing frame; it also includes a pressure plate I, a pressure plate II and a grinding plate; a pressure plate I is installed on the lifting structure II; a pressure plate II is fixedly connected in the bearing frame, and the pressure plate II is located below the pressure plate I; grinding plates are fixedly connected to the opposite sides of the pressure plates I and II, and a plurality of through grooves are opened on the pressure plates I, II and the grinding plates; a water circulation component for cleaning debris is connected to the bearing frame.

[0006] Preferably, all positioning frames are provided with electric push plates, and the electric push plates are located below the trigger blocks.

[0007] Preferably, the water circulation component includes a water tank, a connecting frame and a connecting channel; a water tank is provided at the bottom of the supporting frame, and a water pump is provided in the water tank; the left and right parts of the supporting frame are connected to connecting frames; all the connecting frames are connected to connecting channels on the back sides; the left connecting channel is connected to the left bottom of the water tank, and the right connecting channel is connected to the right upper part of the water tank.

[0008] As a preference, it further comprises a guide block; the left and right parts of the pressing plate I are fixedly connected with a guide block; the left and right parts of the pressing plate II are fixedly connected with another guide block.

[0009] Preferably, all through grooves of the pressing plate I are provided with inclined surfaces.

[0010] Preferably, the upper left guide block is provided with connecting grooves having the same number as the through grooves of the pressure plate I.

[0011] Preferably, a debris collection rack is provided in the water tank.

[0012] Preferably, a guide plate is also included; two left-right symmetrical guide plates are installed in the supporting frame.

[0013] Preferably, the two guide plates are distributed in an eight-shaped shape.

[0014] Preferably, the distance between the upper end of the guide plate and the lower side of the zinc anode plate is smaller than the distance between the lower end of the guide plate and the inner bottom of the supporting frame.

[0015] The beneficial effect of the present invention is that through grooves are provided on the pressing plate I, the pressing plate II and the grinding plate. When the grinding plate grinds the zinc anode plate, the generated debris will gradually be discharged outward through the through grooves on the pressing plate I, the pressing plate II and the grinding plate. As the debris on the zinc anode plate is discharged, the debris remaining on the grinding plate gradually decreases, thereby reducing the influence of the debris on the grinding effect of the zinc anode plate.

[0016] The present invention guides the debris carried by the water flow through the guide block. The guide block on the pressure plate I guides the debris driven by the water flow upward to above the pressure plate I, and the guide block on the pressure plate II guides the debris driven by the water flow downward to between the pressure plate II and the bottom of the supporting frame, thereby preventing the debris driven by the water flow from being transferred to the area where the zinc anode plate contacts the grinding plate and affects the grinding efficiency of the zinc anode plate.

[0017] The present invention adds an inclined surface in the through groove of the pressing plate I. When the water flow is guided to the top of the pressing plate I by the guide block, the water flow flows into the through groove of the pressing plate I, and the water flow impacts the debris remaining in the through groove of the pressing plate I. The water flow is guided by the inclined surface, so that part of the debris in the through groove of the pressing plate I moves to the right with the water flow, thereby reducing the debris remaining in the through groove of the pressing plate I and reducing the influence of the residual debris in the through groove of the pressing plate I on the grinding of the zinc anode plate.

[0018] The present invention sets the distance between the upper end of the guide plate and the lower side of the zinc anode plate to be smaller than the distance between the lower end of the guide plate and the bottom of the supporting frame, so that the amount of water flowing at the bottom of the supporting frame is greater than the amount of water flowing at the lower side of the zinc anode plate, thereby ensuring that the water flowing at the bottom of the supporting frame can carry away the disturbed water and debris at the lower side of the zinc anode plate.

[0019] The present invention guides the water flowing on the lower side of the zinc anode plate through the guide block on the left part of the pressure plate II, so that the water flowing on the lower side of the zinc anode plate flows toward the bottom of the supporting frame, thereby pushing downward the debris that is disturbed and still moves upward after contacting the guide plate, thereby further reducing the possibility of the debris that has not yet settled moving to the contact area between the zinc anode plate and the polishing plate.

[0020] The present invention sets the guide plate in an inclined state, so that when the water flow hits the guide plate, the degree of water flow recoil is reduced, so that the water flow can better push the debris to the right, thereby preventing the debris from accumulating in the middle of the supporting frame. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 A schematic diagram of the overall structure from a first perspective of the processing device for zinc anode production that is easy to clean disclosed by the present invention;

[0022] Figure 2 A schematic diagram of the overall structure from a second viewing angle of the processing device for zinc anode production that is easy to clean disclosed by the present invention;

[0023] Figure 3 A structural cross-sectional view of a supporting frame disclosed in the processing device for zinc anode production that is easy to clean according to the present invention;

[0024] Figure 4 A cross-sectional view of the water tank structure disclosed in the processing device for zinc anode production that is easy to clean according to the present invention;

[0025] Figure 5 A schematic structural diagram of a combination of a pressing plate I, a pressing plate II and a grinding plate disclosed in the processing device for zinc anode production that is easy to clean according to the present invention;

[0026] Figure 6 The present invention is a schematic structural diagram of a combination of a pressing plate I and a guide block disclosed in a processing device for zinc anode production that is easy to clean.

[0027] Explanation of the accompanying drawings: 1-carrying frame, 2-moving structure, 3-lifting structure I, 4-positioning frame, 5-lifting structure II, 6-pressing plate I, 7-pressing plate II, 8-polishing plate, 101-water tank, 102-connecting frame, 103-connecting channel, 110-guide block, 201-guide plate, 4a-trigger block, 4b-electric push plate, 6a-inclined surface, 110a-connecting groove. DETAILED DESCRIPTION

[0028] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments.

[0029] A processing device for zinc anode production that is easy to clean, such as Figure 1-Figure 6As shown, it includes a carrying frame 1, a moving structure 2, a lifting structure I3, a positioning frame 4 and a lifting structure II5; the moving structure 2 is installed on the carrying frame 1; two lifting structures I3 are installed on the moving structure 2; all lifting structures I3 are installed with positioning frames 4, and all positioning frames 4 are provided with trigger blocks 4a; the lifting structure II5 is installed on the carrying frame 1;

[0030] It also includes a pressing plate I6, a pressing plate II7, a grinding plate 8 and a water circulation component; a pressing plate I6 is installed on the lifting structure II5; a pressing plate II7 is fixedly connected in the supporting frame 1, and the pressing plate II7 is located below the pressing plate I6; grinding plates 8 are fixedly connected to the opposite sides of the pressing plates I6 and II7, and a number of through grooves are opened on the pressing plates I6, II7 and grinding plates 8 to facilitate the discharge of debris on the zinc anode plate; the supporting frame 1 is connected to a water circulation component.

[0031] All positioning frames 4 are provided with electric push plates 4b, which are located below the trigger blocks 4a, so that the grinding of the zinc anode plates is more comprehensive.

[0032] The water circulation component includes a water tank 101, a connecting frame 102 and a connecting channel 103; a water tank 101 is provided at the bottom of the supporting frame 1, and a water pump is provided in the water tank 101; the left and right parts of the supporting frame 1 are both connected with the connecting frame 102; all the connecting frames 102 are connected with the connecting channels 103 on the opposite sides; the left connecting channel 103 is connected with the left bottom part of the water tank 101, and the right connecting channel 103 is connected with the right upper part of the water tank 101.

[0033] It also includes a guide block 110; the left and right parts of the pressing plate I6 are fixedly connected with a guide block 110; the left and right parts of the pressing plate II7 are fixedly connected with another guide block 110.

[0034] All through slots of the pressing plate Ⅰ6 are provided with inclined surfaces 6a, so as to facilitate the discharge of debris in the through slots of the pressing plate Ⅰ6.

[0035] The guide block 110 on the upper left is provided with connecting grooves 110a having the same number as the through grooves of the pressing plate Ⅰ6, so that the water flow can better push the debris in the through grooves of the pressing plate Ⅰ6.

[0036] A debris collection grid is provided in the water tank 101 .

[0037] The moving structure 2 is composed of a slide rail and a moving block. The slide rail is fixedly connected to the rear of the supporting frame 1; and the moving block is slidably connected to the slide rail.

[0038] The lifting structure I3 is composed of a guide rail and a lifting block. The guide rail is fixedly connected to the moving block of the moving structure 2; the lifting block is slidably connected to the guide rail, and the lifting block is fixedly connected to the positioning frame 4.

[0039] The lifting structure II5 is composed of a guide rail and a lifting block. The guide rail is fixedly connected to the load-bearing frame 1; the guide rail is slidably connected to the lifting block, and the lifting block is fixedly connected to the pressing plate I6.

[0040] Before using the present invention, first control the lifting structure II5 to drive the pressing plate I6 to move upward, then place the middle part of the zinc anode plate to be polished between the pressing plate I6 and the pressing plate II7, the zinc anode plate first contacts the polishing plate 8 on the pressing plate II7, then control the lifting structure II5 to drive the pressing plate I6 to move down and reset, so that the polishing plate 8 on the pressing plate I6 contacts the zinc anode plate, then the moving structure 2 drives the lifting structure I3 and the positioning frame 4 to move toward the zinc anode plate, and at the same time, the lifting structure I3 drives the positioning frame 4 to lift and lower, so that the inner bottom surface of the positioning frame 4 is flush with the bottom surface of the zinc anode plate, after the zinc anode plate contacts the trigger block 4a, the lifting structure I3 and the positioning frame 4 stop moving, and then control the moving structure 2 to drive the lifting structure I3 and the positioning frame 4 to move back and forth left and right, pushing the zinc anode plate to move back and forth on the polishing plate 8, thereby performing a polishing operation on the zinc anode plate.

[0041] During the reciprocating left and right movement of the positioning frame 4, when the positioning frame 4 contacts the grinding plate 8, the electric push plate 4b pushes the zinc anode plate so that part of the zinc anode plate located in the positioning frame 4 can be grinded, making the grinding of the zinc anode plate more comprehensive.

[0042] During the grinding process of the zinc anode plate, the debris from the grinding of the zinc anode plate will remain on the grinding plate 8. During the reciprocating grinding process of the zinc anode plate, the debris will gradually fill the friction surface of the grinding plate 8, and the friction surface of the grinding plate 8 will gradually become flat, so that the grinding plate 8 grinds the zinc anode plate through the debris, affecting the grinding effect of the grinding plate 8 on the zinc anode plate. By opening through grooves on the pressing plate Ⅰ6, the pressing plate Ⅱ7 and the grinding plate 8, when the grinding plate 8 grinds the zinc anode plate, the generated debris will gradually be discharged outward through the through grooves on the pressing plate Ⅰ6, the pressing plate Ⅱ7 and the grinding plate 8. As the debris on the zinc anode plate is discharged, the debris remaining on the grinding plate 8 gradually decreases, reducing the influence of the debris on the grinding effect of the zinc anode plate.

[0043] Considering that during the zinc anode plate grinding process, when the zinc anode plate contacts the grinding plate 8, because the zinc anode plate is in a moving state, some debris generated by grinding will splash outward, which is easy to splash onto the operator and cause harm to the operator. In order to better grind the zinc anode plate, before the zinc anode plate grinding operation is performed, sufficient water is first added to the supporting frame 1 so that the water is lower than the supporting frame 1 and the pressure plate Ⅰ6 is immersed. At this time, the zinc anode plate is located in the water. When the zinc anode plate is ground, the water pump in the water tank 101 is started to start the water circulation. The water is transferred from the right connecting frame 102 and the right connecting channel 103 to the water tank 101, and the water in the water tank 101 is transferred from the left connecting frame 102 and the left connecting channel 103 to the water tank 101. The water is transferred to the supporting frame 1, and flows from left to right, so that the water circulates during the grinding process of the zinc anode plate. First, the zinc anode plate can be quickly cooled during the grinding process to avoid overheating of the zinc anode plate and sparks during the grinding process. Secondly, the debris generated by the grinding is intercepted and taken away by the circulating water, and the debris stays in the water in the supporting frame 1 to avoid the debris splashing onto the operator and causing harm to the operator. The debris generated by the grinding is taken away by the circulating water, and the debris can also be prevented from remaining on the zinc anode plate. During the grinding process, the debris remaining on the zinc anode plate is prevented from easily entering between the zinc anode plate and the grinding plate 8 to affect the grinding. At the same time, the zinc anode plate is ground in water to prevent the smoke generated during the grinding from escaping to the outside.

[0044] When the water in the supporting frame 1 is transferred from the right connecting frame 102 and the right connecting channel 103 to the water tank 101, the debris carried in the water is intercepted and collected by the debris collection grid in the water tank 101, so as to prevent the water from being transferred from the left connecting frame 102 and the left connecting channel 103 to the supporting frame 1 and carrying debris, causing the debris to re-circulate into the supporting frame 1 and affect the polishing of the zinc anode plate.

[0045] Considering that when the zinc anode plate is polished in water, the water flow will carry debris to collide with the contact area between the polishing plate 8 and the zinc anode plate, the debris carried by the water flow diffuses around the contact area between the polishing plate 8 and the zinc anode plate, and the debris is easily mixed into the contact area between the polishing plate 8 and the zinc anode plate, affecting the polishing of the zinc anode plate. At this time, guide blocks 110 are added to the left and right parts of the pressing plate I6 and the left and right parts of the pressing plate II7. When the water flow drives the debris to transfer to the contact area between the zinc anode plate and the polishing plate 8, the debris carried by the water flow is guided by the guide blocks 110. The guide blocks 110 on the pressing plate I6 guide the debris driven by the water flow upward to the top of the pressing plate I6, and the guide blocks 110 on the pressing plate II7 guide the debris driven by the water flow downward to between the pressing plate II7 and the bottom of the supporting frame 1, so as to avoid the debris carried by the water flow from diffusing around the contact area between the zinc anode plate and the polishing plate 8, thereby affecting the polishing of the zinc anode plate.

[0046] When the debris is gradually discharged outward through the through grooves on the pressing plate Ⅰ6, the pressing plate Ⅱ7 and the grinding plate 8, the debris in the through groove of the pressing plate Ⅰ6 cannot be discharged outward into the external load-bearing frame 1, and a large amount of debris generated by grinding is still in the through groove of the pressing plate Ⅰ6. There is still debris in the through groove of the pressing plate Ⅰ6, and the grinding of the zinc anode plate will still be affected. By adding an inclined surface 6a in the through groove of the pressing plate Ⅰ6, when the water flow is guided to the top of the pressing plate Ⅰ6 by the guide block 110, the water flow flows into the through groove of the pressing plate Ⅰ6, and the water flow has an impact on the debris remaining in the through groove of the pressing plate Ⅰ6. The debris in the groove is impacted, and the water flow is guided by the inclined surface 6a, so that part of the debris in the groove of the pressing plate Ⅰ6 moves to the right with the water flow, thereby reducing the residual debris in the groove of the pressing plate Ⅰ6 and reducing the influence of the residual debris in the groove of the pressing plate Ⅰ6 on the grinding of the zinc anode plate. By opening a connecting groove 110a on the upper left guide block 110, the water flow can directly flow into the groove of the pressing plate Ⅰ6, so that the debris in the groove of the pressing plate Ⅰ6 is directly pushed to the right, and the debris in the groove of the pressing plate Ⅰ6 is better transferred to the right.

[0047] On the basis of Example 1, Figure 3-4 As shown, a guide plate 201 is also included; two left-right symmetrical guide plates 201 are installed in the supporting frame 1.

[0048] The two guide plates 201 are arranged in an eight-shaped arrangement.

[0049] The distance between the upper end of the guide plate 201 and the lower side of the zinc anode plate is smaller than the distance between the lower end of the guide plate 201 and the inner bottom of the supporting frame 1 .

[0050] Because the grinding area of ​​the zinc anode plate is located in the middle of the supporting frame 1, the debris generated by grinding is mainly concentrated in the middle of the supporting frame 1. During the grinding and water circulation of the zinc anode plate, the zinc anode plate moves in the water. When the zinc anode plate moves, the water flow circulating in the supporting frame 1 is disturbed. The debris in the middle of the supporting frame 1 is disturbed, and the debris will move upward to the area where the zinc anode plate contacts the grinding plate 8, affecting the grinding of the zinc anode plate. By adding a guide plate 201 in the supporting frame 1, during the water circulation process, the water flowing from left to right under the zinc anode plate will contact the guide plate 201. 01 contact, the water flowing from left to right below the zinc anode plate is diverted through the guide plate 201, so that the diverted water flows toward the zinc anode plate and the bottom of the supporting frame 1. At this time, the water flowing in the supporting frame 1 is divided into three layers, namely, above the zinc anode plate, below the zinc anode plate and the bottom of the supporting frame 1, so that when the zinc anode plate is polished and the zinc anode plate is moved in the water, the water disturbed by the zinc anode plate is the water above and below the zinc anode plate, so that the water flowing below the zinc anode plate is used as a buffer layer to reduce the zinc anode plate in the water. The disturbance of the flowing water at the bottom of the supporting frame 1 during the movement ensures that the debris settled at the bottom of the supporting frame 1 can be normally carried away by the water. At the same time, by setting the guide plate 201 to an inclined state, when the zinc anode plate is moved in the water, the disturbed water below the zinc anode plate will contact the right side of the guide plate 201, thereby blocking the water and the debris carried in the water through the right side of the guide plate 201, and guiding the water and the debris downward, that is, after the disturbed water below the zinc anode plate contacts the right side of the guide plate 201, the water and the debris will move obliquely downward along the right side of the guide plate 201, and then Mixed into the flowing water at the bottom of the supporting frame 1, the flowing water at the bottom of the supporting frame 1 will carry away the disturbed water and debris under the zinc anode plate, thereby reducing the possibility of debris that has not yet settled moving to the contact area between the zinc anode plate and the polishing plate 8, and making the distance between the upper end of the guide plate 201 and the lower side of the zinc anode plate smaller than the distance between the lower end of the guide plate 201 and the bottom of the supporting frame 1, so that the amount of water flowing at the bottom of the supporting frame 1 is greater than the amount of water flowing on the lower side of the zinc anode plate, ensuring that the water flowing at the bottom of the supporting frame 1 can carry away the disturbed water and debris on the lower side of the zinc anode plate.

[0051] At the same time, after the water flowing on the lower side of the zinc anode plate contacts the guide block 110 on the left side of the pressing plate II 7, the guide block 110 on the left side of the pressing plate II 7 guides the water flowing on the lower side of the zinc anode plate, so that the water flowing on the lower side of the zinc anode plate flows toward the bottom of the supporting frame 1, thereby pushing downward the debris that is disturbed and still moves upward after contacting the guide plate 201, thereby further reducing the possibility of debris that has not yet settled moving to the contact area between the zinc anode plate and the polishing plate 8.

[0052] Taking into account that the water flow is blocked by the guide plate 201, the water flow velocity is reduced too much, and the water flow cannot push the debris to the right well, and the debris will accumulate in the middle of the supporting frame 1. By setting the guide plate 201 to an inclined state, when the water flow hits the guide plate 201, the degree of water flow recoil is reduced, so that the water flow can better push the debris to the right, thereby preventing the debris from accumulating in the middle of the supporting frame 1.

[0053] The above descriptions are merely embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made using the contents of the present invention specification, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A processing device for zinc anode production that is easy to clean, comprising a bearing frame (1), a moving structure (2), a lifting structure I (3), a positioning frame (4) and a lifting structure II (5); the bearing frame (1) is mounted with the moving structure (2); the moving structure (2) is mounted with a plurality of lifting structures I (3); all lifting structures I (3) are mounted with positioning frames (4), and all positioning frames (4) are provided with trigger blocks (4a); the bearing frame (1) is mounted with the lifting structure II (5); It is characterized in that It also includes a pressing plate I (6), a pressing plate II (7), a grinding plate (8) and a water circulation component; the pressing plate I (6) is installed on the lifting structure II (5); the pressing plate II (7) is fixedly connected in the bearing frame (1), and the pressing plate II (7) is located below the pressing plate I (6); the grinding plates (8) are fixedly connected to the facing sides of the pressing plates I (6) and II (7), and the pressing plates I (6), II (7) and the grinding plates (8) are all provided with a plurality of through grooves; the bearing frame (1) is connected to a water circulation component for cleaning debris; The water circulation component comprises a water tank (101), a connecting frame (102) and a connecting channel (103); the water tank (101) is provided at the bottom of the supporting frame (1), and a water pump is provided in the water tank (101); the left and right parts of the supporting frame (1) are both connected to the connecting frame (102); the opposite sides of all the connecting frames (102) are connected to the connecting channels (103); the left connecting channel (103) is connected to the left bottom of the water tank (101), and the right connecting channel (103) is connected to the right upper part of the water tank (101); A debris collection grid is provided in the water tank (101); When in use, the lifting structure II (5) is first controlled to drive the pressing plate I (6) to move upward, and then the middle part of the zinc anode to be polished is placed between the pressing plate I (6) and the pressing plate II (7). The zinc anode first contacts the polishing plate (8) on the pressing plate II (7). Then the lifting structure II (5) is controlled to drive the pressing plate I (6) to move downward and reset, so that the polishing plate (8) on the pressing plate I (6) contacts the zinc anode. Then the moving structure (2) drives the lifting structure I (3) and the positioning frame (4) to move toward the zinc anode. At the same time, the lifting structure I (3) drives the positioning frame (4) to move upward and downward, so that the inner bottom surface of the positioning frame (4) is flush with the bottom surface of the zinc anode. After the zinc anode contacts the trigger block (4a), the lifting structure I (3) and the positioning frame (4) stop moving. Then the moving structure (2) is controlled to drive the lifting structure I (3) and the positioning frame (4) to move back and forth left and right, so as to push the zinc anode to move back and forth on the polishing plate (8), thereby performing a polishing operation on the zinc anode.

2. A processing device for zinc anode production that is easy to clean according to claim 1, It is characterized in that All positioning frames (4) are provided with electric push plates (4b), and the electric push plates (4b) are located below the trigger blocks (4a).

3. A processing device for zinc anode production that is easy to clean according to claim 1, It is characterized in that It also includes a guide block (110); the left and right parts of the pressing plate I (6) are fixedly connected to the guide block (110); and the left and right parts of the pressing plate II (7) are fixedly connected to another guide block (110).

4. A processing device for producing zinc anodes that is easy to clean according to claim 3, It is characterized in that All through grooves of the pressing plate I (6) are provided with inclined surfaces (6a).

5. A processing device for producing zinc anodes that is easy to clean according to claim 4, It is characterized in that The guide block (110) at the upper left is provided with connecting grooves (110a) having the same number as the through grooves of the pressing plate I (6).

6. A processing device for producing zinc anodes that is easy to clean according to claim 5, It is characterized in that It also includes a guide plate (201); two left-right symmetrical guide plates (201) are installed in the supporting frame (1).

7. A processing device for producing zinc anodes that is easy to clean according to claim 6, It is characterized in that The two guide plates (201) are distributed in an eight-shaped shape.

8. A processing device for zinc anode production that is easy to clean according to claim 7, It is characterized in that The distance between the upper end of the guide plate (201) and the lower side of the zinc anode is smaller than the distance between the lower end of the guide plate (201) and the inner bottom of the supporting frame (1).

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