Gas diffusion plate, assembly and device

Abstract

The present invention discloses a gas diffusion plate, an assembly and a device, wherein the gas diffusion plate comprises a plate body, wherein the plate body is selectively concave on one side to form a diffusion structure, and the other side is a closed portion for forming the diffusion structure, and the diffusion structure comprises: a plurality of gas distribution holes connected in sequence, each for providing gas to a primary diffusion chamber; a primary diffusion chamber, comprising a first main chamber and a first chamber adapted to the gas distribution holes; a first isolation plate with a plurality of primary injection ports; a secondary diffusion chamber, comprising a second main chamber; a second isolation plate with a plurality of secondary injection ports; and a tertiary diffusion chamber connected to the diffusion port. The present invention effectively improves the distribution stability of gas phase material distribution, flow rate and pressure on the entire spray disk surface by optimizing the design of the diffusion structure of the gas shower head, and the gas uniformity at the gas outlet end of the disk surface is good, and the uniformity of thin film deposition is good.

Description

Technical Field

[0001] The invention belongs to the technical field of vapor deposition, and in particular relates to a gas diffusion plate, a combination and a device. Background Art

[0002] In the prior art semiconductor industry CVD vapor deposition equipment, when the gas spray device is in operation, the gas enters from the small hole in the middle, diffuses freely in the cavity, and then opens dense small holes on the gas outlet disk surface, and the gas flows out from the holes. The distribution of gas at the gas outlet of this scheme depends entirely on the diffusion rate of the gas itself, and the gas concentration at the gas outlet is relatively high near the gas outlet, and the gas concentration at the gas outlet is relatively much lower at the edge of the disk surface. The gas uniformity at the gas outlet of the disk surface is relatively poor, which affects the uniformity of the film deposition of the final product.

[0003] Therefore, in view of the above technical problems, it is necessary to provide a gas diffusion plate, assembly and device.

[0004] The information disclosed in this background technology section is only intended to enhance the understanding of the overall background of the invention and should not be regarded as an acknowledgment or any form of suggestion that the information constitutes the prior art already known to a person skilled in the art. Summary of the invention

[0005] The object of the present invention is to provide a gas diffusion plate, a combination and a device.

[0006] In order to achieve the above object, a technical solution provided by a specific embodiment of the present invention is as follows:

[0007] A gas diffusion plate, comprising a plate body, wherein one side of the plate body is concavely formed to form a diffusion structure, and the other side is a closed portion for the diffusion structure, and the diffusion structure comprises sequentially connected (in the following definition: the direction from the primary diffusion cavity to the tertiary diffusion cavity is the main direction):

[0008] A plurality of gas distribution holes, each for supplying gas to the primary diffusion chamber;

[0009] A primary diffusion chamber, comprising a first main chamber and a first subchamber adapted to the air distribution hole, wherein the first subchamber diverges along the main direction and the bottom thereof is connected to the air distribution hole;

[0010] A first isolation plate having a plurality of primary injection ports, wherein the inner diameter of any of the primary injection ports converges from the primary diffusion chamber to the secondary diffusion chamber (e.g., converges linearly along the main direction);

[0011] A secondary diffusion chamber, including a second main chamber;

[0012] A second isolation plate having a plurality of secondary injection ports, wherein the inner diameter of any secondary injection port has a convergence trend (e.g., nonlinear convergence along the main direction and a decreasing convergence speed) or a divergence trend (e.g., nonlinear divergence along the main direction and a decreasing convergence speed) from the secondary diffusion chamber to the tertiary diffusion chamber;

[0013] The tertiary diffusion chamber is connected to the diffusion port.

[0014] In one or more embodiments of the present invention, the primary injection port is at least partially conical, and the cone angle of the cone is 10-18°.

[0015] In one or more embodiments of the present invention, the primary injection port is tapered as a whole, and the slot width of the first outlet on the secondary diffusion chamber side is 0.5-0.8 mm, and the thickness of the first isolation plate is 5-8 mm.

[0016] In one or more embodiments of the present invention, the first chamber is a portion of a circle with a size of 6≤R≤12 mm in the viewing direction perpendicular to the paper surface, and the center distance between two adjacent first chambers is 40-60 mm. Preferably, the central angle θ corresponding to the portion of the circle on one side of the first outlet is: 30°≤θ≤90°.

[0017] In one or more embodiments of the present invention, the secondary injection port includes a second inlet connected to the secondary diffusion chamber and a second expansion body connected to the second inlet. The second expansion body is connected to the tertiary diffusion chamber. When observed from a direction perpendicular to the plate body, the boundary of the second expansion body bulges outwardly away from the axis on both sides of the axis of the second inlet or bulges inwardly toward the axis.

[0018] In one or more embodiments of the present invention, the groove width of the second inlet is 0.4-0.7 mm, the depth is 0.5-1 mm, the second expansion body is a portion of a circle of 4≤R≤8 mm in the observation direction perpendicular to the paper surface, and the center distance between two adjacent second expansion bodies is 10-14 mm. Preferably, the central angle θ corresponding to the portion of the circle on one side of the second inlet is: 30°≤θ≤90°.

[0019] In one or more embodiments of the present invention, air supply holes are further formed on the plate body, and the air supply holes are used to supply air to the diffusion structure of another plate body.

[0020] In one or more embodiments of the present invention, a separation structure is formed on the plate body, which may be a groove or a vacancy located at the edge independent of the chamber and the tube, so as to separate two or more plate bodies in a combined state.

[0021] In one or more embodiments of the present invention, the assembly includes two gas diffusion plates arranged opposite to each other, and the diffusion structures of the two gas diffusion plates cooperate to form an open (can be regarded as a semi-closed) diffusion cavity. In the assembly, the closed portions formed by the two bonded plate bodies are not adjacent, so that the diffusion structures of the two are connected to form a complete diffusion chamber structure.

[0022] In one or more embodiments of the present invention, the gas diffusion uniformity device includes an array of several assemblies arranged in parallel to form a uniform gas outlet surface.

[0023] In one or more embodiments of the present invention, it further comprises a first gas supply assembly structure and a second gas supply assembly structure respectively arranged on both sides of the array.

[0024] The first air supply assembly structure includes a first air intake pipe, the first air intake pipe is connected to a plurality of first air supply assemblies, and the first air supply assemblies are obtained by alternately arranged and closely combined air distribution holes and air supply holes;

[0025] The second air supply assembly structure comprises a second air intake pipe, which is connected to a plurality of second air supply assemblies. The second air supply assemblies are obtained by alternately arranged and tightly combined air distribution holes and air supply holes.

[0026] Compared with the prior art, the gas diffusion plate, assembly and device of the present invention effectively improve the distribution stability of gas phase material, flow rate and pressure on the entire spray disk surface by optimizing the diffusion structure of the gas shower head. The pressure fluctuation in each area is less than 0.5‰, the gas uniformity at the gas outlet end of the disk is good, and the uniformity of thin film deposition is good. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0028] Figure 1 It is a structural schematic diagram of a plate body in one embodiment of the present invention;

[0029] Figure 2 The diagram is a diagram of the internal array combination state of the gas diffusion uniform device in one embodiment of the present invention, wherein the superimposed pipeline is a schematic diagram of the gas distribution holes and the gas supply holes in the combination state;

[0030] Figure 3 This is a schematic diagram of the external three-dimensional structure of a gas diffusion uniformity device in one embodiment of the present invention;

[0031] Figure 4 It is a schematic diagram of the external side view of the gas diffusion uniformity device in one embodiment of the present invention;

[0032] Figure 5 Schematic diagram of the detection effect of the deposition product of the gas diffusion uniformity device in one embodiment of the present invention. DETAILED DESCRIPTION

[0033] In order to enable those skilled in the art to better understand the technical solutions in the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0034] The design theoretical basis of a single pore structure such as a single pore size and its cross section in the scheme of the present invention is: according to the pore size flow model formula,

[0035]

[0036] Where Q is the flow rate, is the flow coefficient, A is the cross-sectional area, △P is the pressure difference at both ends, ρ is the gas density, and the ability of gas to pass through a small hole is positively correlated with the hole cross-section.

[0037] A gas diffusion plate in an embodiment of the present invention includes a plate body. When viewed perpendicular to the paper, the plate body is recessed on one side to form a diffusion structure, and the other side is a closed portion for the diffusion structure. In this case, the diffusion structure can be regarded as a groove-shaped structure recessed toward the closed side. The diffusion structure includes: a gas supply structure, a primary diffusion chamber, a first isolation plate, a secondary diffusion chamber, a second isolation plate, and a tertiary diffusion chamber, which are connected in sequence.

[0038] Furthermore, in order to meet the gas diffusion efficiency and structure utilization, the overall thickness of the primary diffusion chamber 151 in the closed portion is relatively thin, such as 0.6-1.0 mm, and specifically can be selected to be 0.8 mm.

[0039] In one embodiment of the present invention, the primary diffusion chamber 151 includes a first main chamber and a first chamber independently adapted to the gas distribution holes 41, 43, 45, 47, etc., and the first chamber diverges along the main direction and its bottom is connected to the gas distribution holes. The gas that has been decompressed and accelerated in the first chamber enters a further expanded chamber after preliminary diffusion. At this time, there are multiple first chambers arranged adjacent to each other (the spacing between them can be equal or unequal), so as to achieve balanced mixing of gases between the multiple first chambers. This process balances the pressure and composition differences between gases from different sources. The first chamber is a part of a circle with a size of 6≤R≤12mm in the observation direction perpendicular to the paper surface, and the center distance between two adjacent first chambers is 40-60mm. Preferably, the center angle θ corresponding to the part of the circle on the first outlet side is: 30°≤θ≤90°. Figure 1 The first chamber is a part of a circle with R of 6 mm in the observation direction perpendicular to the paper surface, the center distance between two adjacent first chambers is 40 mm, the central angle θ corresponding to the part of the circle on one side of the first outlet is 90°, and the two sides are axially symmetrical with the axis of the first outlet.

[0040] In one embodiment of the present invention, the gas is further pressurized through a first isolation plate having a plurality of primary injection ports 152. This process not only plays a role in diversion and mixing through the primary injection ports 152, but also can increase the density of the mixed gas through the structure of the gradually reduced diameter of the primary injection ports 152, such as limiting the inner diameter of any primary injection port 152 to converge from the primary diffusion chamber 151 to the secondary diffusion chamber 153 (further, it can be in the form of linear convergence along the main direction), thereby further providing a basic preparation for volume expansion. After diffusion in the primary diffusion chamber 151, the gas is pressurized and ejected through the uniformly distributed primary injection ports 152 to enter the secondary diffusion chamber 153.

[0041] In one embodiment of the present invention, the gas pressurized by the first isolation plate enters the second main cavity defined by the secondary diffusion cavity 153 again. In this process, the primary injection ports 152 are arranged in a relatively close manner (arrangement spacing is 16-20 mm, and the arrangement is equidistant). Figure 1 The spacing used in the experiment is 16 mm), thereby further weakening the laminar flow, and the disturbance of the airflow between the primary injection ports 152 (forming turbulence, disturbance, etc.) further forms an optimized diffusion effect in the second main cavity. At this time, the gas is accelerated and further mixed and uniformed in the second main cavity.

[0042] Furthermore, if Figure 1As shown in the enlarged view in FIG. 1 , the primary injection port 152 can be in the form of an overall conical structure. As a feasible solution, the cone angle can be selected to be 10-18°, the inner diameter of the first outlet on the secondary diffusion chamber 153 side can be 0.5-0.8 mm, and the thickness of the first isolation plate can be 5-8 mm. Figure 1 The cone angle of the middle cone is 12°, the inner diameter of the first outlet on the secondary diffusion chamber 153 side is 0.5 mm, and the thickness of the first isolation plate is 5 mm.

[0043] In one embodiment of the present invention, at the end of the second main cavity is a second isolation plate with a plurality of secondary injection ports 154, on which the secondary injection ports 154 can also be selectively arranged in a close arrangement, and the gas after being accelerated and uniformly mixed is compressed again through the secondary injection ports 154, where the secondary injection ports 154. The inner diameter of any secondary injection port 154 has a convergence trend (and nonlinear convergence along the main direction and a reduced convergence speed) or a divergence trend (and nonlinear divergence along the main direction and a reduced convergence speed) from the secondary diffusion cavity 153 to the tertiary diffusion cavity 155, to meet the needs of different gas source types, such as the mixing of light and heavy gases (the difference in the average molecular weight of the gases is greater than 20), and the secondary injection port 154 can be selected to adopt a divergent structural form to form a secondary diffusion effect.

[0044] Furthermore, if Figure 1 As shown in the enlarged view, the secondary injection port 154 includes a second inlet connected to the secondary diffusion chamber 153 and a second expansion body connected to the second inlet. The second expansion body is connected to the tertiary diffusion chamber 155. When observed from the direction perpendicular to the plate body, the boundary of the second expansion body is convex outwardly or convex inwardly toward the axis on both sides of the axis of the second inlet. As a feasible solution, the groove width of the second inlet can be selected to be 0.4-0.7mm and the depth to be 0.5-1mm. The second expansion body is a portion of a circle of 4≤R≤8mm in the observation direction perpendicular to the paper surface, and the center distance between two adjacent second expansion bodies is 10-14mm. Figure 1 The groove width of the second inlet is 0.4 mm and the depth is 0.5 mm. The second expansion body is a part of a circle with R of 4 mm in the observation direction perpendicular to the paper surface, the center distance between two adjacent second expansion bodies is 10 mm, the central angle θ corresponding to the part of the circle on one side of the second inlet is: 90°, and the two sides are axially symmetrical with the axis of the second inlet.

[0045] In one embodiment of the present invention, the gas pressurized by the second isolation plate enters the main structure chamber of the tertiary diffusion chamber 155 and is mixed and homogenized again, and has stable pressure and flow rate to meet application requirements. At this time, the connected diffusion port can be used to provide uniform and stable gas to the target area.

[0046] Furthermore, if Figure 1 In one embodiment shown, the gas can enter the diffusion structure of the plate body from the gas distribution holes 41 , 43 , 45 , 47 etc. formed by the sealing of the diffusion plate, and diffuse in the primary diffusion cavity 151 .

[0047] Furthermore, in order to meet the air supply needs of another symmetrical plate body for assembly with the plate body, air supply holes 32, 34, 36, 38, etc. may be correspondingly provided on the plate body for matching with the first / second air supply combination. Effective air supply between the first combination is achieved through the close fit between the air supply holes 32, 34, 36, 38, etc. and the air distribution holes 41, 43, 45, 47, etc. in the matching combination state.

[0048] In one embodiment of the present invention, Figure 1 As shown, a separation structure 158 can also be provided on the plate body, which can be in a step shape, a notch shape, etc. The separation structure 158 can be used to assist in the combination of the plate bodies and the auxiliary separation of the combination.

[0049] In one embodiment of the present invention, in order to realize the gas diffusion function, a first combination body formed by two mutually cooperating gas diffusion plates 15 and 16 is also provided. The diffusion structures of the two gas diffusion plates of the combination body (including the primary diffusion chamber 151, the first isolation plate, the secondary diffusion chamber 153, the second isolation plate, the tertiary diffusion chamber 155, etc.) cooperate with each other to be closed with boundaries to form a diffusion chamber with an opening (which can be regarded as a semi-closed form). During the operation, the mixing and diffusion of the gas and other processes are realized in the diffusion chamber, during which it undergoes multiple compression and expansion processes.

[0050] Furthermore, in the first assembly, both of the two mutually cooperating plate bodies may have the separation structure 158, or the structure may be optionally provided on one of them.

[0051] In one embodiment of the present invention, when a plurality of gas diffusion plates 15 and 16 are stacked, Figure 2As shown, a plurality of air supply holes are alternately spliced ​​into a plurality of air branch holes 41, 43, 45, 47, so as to be further spliced ​​to obtain a first air supply assembly 321, 341, 361, 381 or a second air supply assembly 411, 431, 451, 471 which are connected, and the first air supply assembly 321, 341, 361, 381 and the second air supply assembly 411, 431, 451, 471 are respectively connected to an external air source through a first air intake pipe 12, a second air intake pipe 22, and an air intake port 11, 21 having an air intake connection portion (such as a branch pipe having one end connected to the air inlet 11, 21 and the other end connected to a sealing ring end, and the sealing ring end matches the inner diameter of the corresponding assembly). Gas is supplied to the primary diffusion chamber 151 by the gas distribution holes 41, 43, 45, 47, etc., and there is a volume expansion process between the gas distribution holes 41, 43, 45, 47, etc. and the primary diffusion chamber 151, which preliminarily realizes the gas buffer and the gas buffer balance between the first assemblies of each group of gas diffusion plates 15, 16. At this time, the primary injection port 152 also plays a flow limiting role in pressure control to avoid a large pressure difference in the gas supply pressure between the first assemblies. And through the volume expansion process, the air flow velocity in the cavity is limitedly increased, which is conducive to full balance in the primary diffusion chamber, and plays a preliminary effective diffusion mixing and uniform effect.

[0052] In one embodiment of the present invention, Figure 2-3 As shown, a gas diffusion uniform device having an array formed by a plurality of assemblies is shown. The array scale of the assemblies in the device is adapted to the needs of the application end.

[0053] Furthermore, the gas diffusion uniform device can be connected to the gas source on one side for air intake, or can be connected to the gas source on both sides for air intake. Figure 2 shows the form of connecting the gas source on both sides, with an air inlet 11 and an air inlet 21 on the left and right sides of the device respectively. The gas source enters the first air intake pipe 12 and the second air intake pipe 22 from these two ports respectively. The first air supply assembly and the second air supply assembly connected to the first air intake pipe 12 and the second air intake pipe 22 then divide the single-point gas into multiple paths to enter the diffusion cavity through the corresponding gas distribution holes 41, 43, 45, 47, etc., and then spray out from the outlet surface after the aforementioned gas diffusion process, forming a relatively uniform concentration strip surface on the upper surface of the disk surface, and multiple diffusion plates in the combined state are overlapped to form multiple relatively uniform concentration strip surfaces, and multiple uniform strip surfaces overlap to form a uniform concentration surface.

[0054] Furthermore, the connection parts between the air inlet 11 and the air inlet 21 and the first air inlet pipe 12 and the second air inlet pipe 22 may be provided with sealing grooves 122, and sealing rings 123 are placed in the grooves to lock and complete the sealing.

[0055] Furthermore, in order to limit the structure in the combined state and achieve the closedness of the structure, a sealing plate 14 can be set on the outside of the combination to seal the opening when processing the pipeline. It can be fixed on the shell sealing plates 141, 241 through a threaded connector (it can also be replaced by a plug, welding seal, etc.). The space defined by the relative arrangement of the shell sealing plates 141, 241 is an array formed by several combinations.

[0056] like Figure 3 and 4 In one embodiment shown, a locking screw 13 can be used to penetrate the shell sealing plates 141, 241, which have a hole 131, and the gas diffusion plates 15, 16 arranged in an array, and the two ends are locked by nuts. The screws are distributed around the outer frame of the device. After multiple screws are evenly locked, the shell sealing plates 141, 241 and the gas diffusion plates 15, 16 arranged in an array are completely fitted to each other to form a mechanical seal, ensuring that the gas does not leak from the side and is only discharged from the upper end of the disk to form a uniform outlet surface.

[0057] like Figure 2 and 3 As shown, during the operation of the gas diffusion uniformity device, the gas enters the shell sealing plates 141, 241 and the space defined by the array from the air inlet 11 and the air inlet 21, and is divided into four paths after passing through the first air inlet pipe 12 and the second air inlet pipe 22, and enters the mechanically sealed diffusion cavity of the gas diffusion plates 15, 16 arranged in the array through a combination formed by alternating air distribution holes 41, 43, 45, 47, etc. and air supply holes 32, 34, 36, 38, etc.

[0058] The gas diffuser plates 15 and 16, the gas enters the cavity from four points, namely, the gas distribution holes 41, 43, 45, 47, etc., formed by the gas diffuser plate 15 being sealed, and starts the diffusion process in the primary diffusion chamber 151, and flows in the direction of the first isolation plate. The overall thickness of the closed part formed by the concave primary diffusion chamber 151 in the gas diffuser plate 15 is relatively thin, which can be 0.8 mm. After diffusion in the primary diffusion chamber 151, the gas is pressurized and ejected through the uniformly distributed primary injection ports 152, and then diffused for the second time in the secondary diffusion chamber 153. After the secondary diffusion is completed, the gas is accelerated and ejected again through the uniformly distributed secondary injection ports 154. After the injection is completed, the gas is diffused again in the tertiary diffusion chamber 155, and a relatively uniform gas path is obtained, which is ejected on the surface of the diffusion device to complete the gas diffusion function. In addition, the diffuser plate can be optionally processed as a step of the separation structure 158, so as to facilitate the separation of the two closely attached diffuser plates during maintenance.

[0059] The film forming test was carried out using the gas diffusion device, and the test conditions are shown in Table 1 below:

[0060]

[0061] The test results are as follows Figure 5 As shown in Table 2 below:

[0062]

[0063] Uniformity is a parameter used to characterize the thickness deviation of different sampling points of the same sample, which means: uniformity = [(D max —D min )÷D 均值 ÷2]×100%, where D max Refers to the maximum value of the film thickness measured at all test points, D min Refers to the minimum value of film thickness measured at all test points, D 均值 Refers to the average value of the film thickness measured at all test points.

[0064] By analyzing the above test results, the conclusions shown in Table 3 are obtained.

[0065]

[0066] The gas diffusion schemes including but not limited to those shown in the above embodiments all meet the requirements of the vapor deposition technology and effectively improve the thickness uniformity of the deposited product.

[0067] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

[0068] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.

Claims

1. A gas diffusion plate, characterized in that: The plate body comprises a plate body, one side of which is concavely formed with a diffusion structure, and the other side is a closed portion for the diffusion structure, wherein the diffusion structure comprises: A plurality of gas distribution holes, each for supplying gas to the primary diffusion chamber; The primary diffusion chamber includes a first main chamber and a first subchamber adapted to the air distribution hole, and the first subchamber is divergently spread out along the main direction, and the bottom of the first subchamber is connected to the air distribution hole, with the primary diffusion chamber to the direction of the tertiary diffusion chamber as the main direction; A first isolation plate having a plurality of primary injection ports, wherein the inner diameter of any of the primary injection ports decreases from the primary diffusion chamber to the secondary diffusion chamber; A secondary diffusion chamber, including a second main chamber; A second isolation plate having a plurality of secondary injection ports, wherein the inner diameter of any of the secondary injection ports decreases or increases from the secondary diffusion chamber to the tertiary diffusion chamber; The tertiary diffusion chamber is connected to the diffusion port.

2. The gas diffusion plate according to claim 1, characterized in that: The primary injection port is at least partially conical, and the cone angle of the cone is 10-18°.

3. The gas diffusion plate according to claim 2, characterized in that: The primary injection port is tapered as a whole, and the slot width of the first outlet on the secondary diffusion chamber side is 0.5-0.8 mm, and the thickness of the first isolation plate is 5-8 mm.

4. The gas diffusion plate according to claim 1, characterized in that: The secondary injection port includes a second inlet connected to the secondary diffusion chamber and a second expansion body connected to the second inlet. The second expansion body is connected to the tertiary diffusion chamber. When observed from a direction perpendicular to the plate body, the boundary of the second expansion body bulges outwardly away from the axis of the second inlet or bulges inwardly toward the axis on both sides.

5. The gas diffusion plate according to claim 4, characterized in that: The second inlet has a groove width of 0.4-0.7 mm and a depth of 0.5-1 mm.

6. The gas diffusion plate according to claim 1, characterized in that: The plate body is also provided with air supply holes, which are used to supply air to the diffusion structure of another plate body.

7. The gas diffusion plate according to claim 1, characterized in that: A separation structure is also formed on the plate body.

8. A combination comprising two gas diffusion plates according to any one of claims 1 to 7 arranged opposite to each other, wherein the diffusion structures of the two gas diffusion plates cooperate to form a diffusion cavity with an opening.

9. A gas diffusion uniformity device, comprising an array of several assemblies according to claim 8 arranged in parallel to form a uniform gas outlet surface.

10. The gas diffusion uniform device according to claim 9, characterized in that: It also includes a first gas supply assembly structure and a second gas supply assembly structure respectively arranged on both sides of the array, The first air supply assembly structure comprises a first air intake pipe, the first air intake pipe is connected to a plurality of first air supply assemblies, and the first air supply assemblies are obtained by alternately arranged and closely combined air distribution holes and air supply holes; The second air supply assembly structure comprises a second air intake pipe, which is connected to a plurality of second air supply assemblies. The second air supply assemblies are obtained by alternately arranged and tightly combined air distribution holes and air supply holes.

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