Cleaning mechanism of sodium hypochlorite reaction kettle

Abstract

The cleaning mechanism comprises a base, a softening box is fixedly mounted on the upper surface of the base, the reaction kettle is fixedly mounted on the portion, located on the right side of the softening box, of the upper surface of the base through a supporting rod, and a fixing plate is fixedly mounted on the inner wall of the reaction kettle; supporting plates are fixedly mounted on the inner top wall of the reaction kettle and the lower surface of the fixed plate, an electrode plate is fixedly mounted on the surfaces of the opposite sides of the two supporting plates, a cleaning assembly for cleaning the electrode plate is arranged on the surface of the electrode plate, and two electric push rods are arranged on the upper surface of the fixed plate on the surface of the cleaning assembly. The movable ends of the two electric push rods extend to the position below the fixing plate and are provided with cleaning pieces. According to the cleaning mechanism of the sodium hypochlorite reaction kettle, by arranging the cleaning assembly, the cleaning mechanism can automatically clean attachments on the electrode plate, workers do not need to manually clean the electrode plate, and the burden of the workers is relieved.

Description

Technical Field

[0001] The invention relates to the technical field of reactors, in particular to a cleaning mechanism for a sodium hypochlorite reactor. Background Art

[0002] Sodium hypochlorite is an inorganic substance, a hypochlorite, a transparent light yellow solution with a special smell. Sodium hypochlorite is a strong oxidant, corrosive to metal instruments. Its bactericidal effect decreases with the increase of environmental pH value, and is affected by the temperature of organic matter. It is easily decomposed by light and heat. The working principle of sodium hypochlorite is that hypochlorous acid oxidizes the glucose inside bacteria, thereby destroying the cell membrane of bacteria and achieving a bactericidal effect. Therefore, sodium hypochlorite is a broad-spectrum bactericide with strong killing effects on bacteria, viruses, spores, etc. At the same time, sodium hypochlorite also has the characteristics of strong detergency and high efficiency, and can be used to disinfect various utensils, tableware, clothing, excrement and stainless steel instruments.

[0003] When sodium hypochlorite is produced, salt water is usually injected into a reactor, and sodium hydroxide, chlorine and hydrogen are generated by electrolysis in the reactor. The generated chlorine will dissolve in water and combine with sodium hydroxide to generate sodium hypochlorite. However, the electrode plates are usually made of metal, such as titanium or titanium coating. During the electrolysis process, the metal surface may react with chlorine or hydroxide ions to generate metal oxides or hydroxides. These compounds will cover the electrode surface, reduce the conductivity of the electrode, and thus affect the normal working efficiency of the reactor. Therefore, in order to maintain the efficient operation of the reactor, the staff needs to regularly use tools to clean and maintain it, and remove the attachments on the surface of the electrode plate, which is time-consuming and laborious, thereby increasing the burden on the staff and affecting the work efficiency of the staff. Therefore, this invention is proposed to solve the above problems. Summary of the invention

[0004] In view of the deficiencies in the prior art, the present invention provides a cleaning mechanism for a sodium hypochlorite reactor, which has the advantages of being easy to clean the attachments on the surface of the electrode plate.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a cleaning mechanism for a sodium hypochlorite reactor, comprising a base, a softening box is fixedly installed on the upper surface of the base, a reactor is fixedly installed on the upper surface of the base and located on the right side of the softening box through a support rod, a fixing plate is fixedly installed on the inner wall of the reactor, a support plate is fixedly installed on the inner top wall of the reactor and the lower surface of the fixing plate, electrode plates are fixedly installed on the surfaces of the two opposite sides of the support plates, and a cleaning component for cleaning the electrode plates is provided on the surface of the electrode plates.

[0006] The surface of the cleaning component is provided with two electric push rods on the upper surface of the fixed plate, the movable ends of the two electric push rods extend to the bottom of the fixed plate and are provided with cleaning members, and flushing members for flushing the electrode plates are provided on both sides of the cleaning members.

[0007] Furthermore, the cleaning member comprises a square cleaning plate fixedly mounted on the movable ends of the two electric push rods, and a plurality of cleaning brushes are fixedly mounted on the inner wall of the cleaning plate.

[0008] Furthermore, the flushing member includes a water tank fixedly mounted on the two side surfaces of the cleaning plate, the top of the water tank is connected to a water supply pipe, a valve is fixedly mounted on the water supply pipe, the lower surface of the water tank is connected to a water supply pipe, and a nozzle facing the electrode plate is fixedly mounted on the other end of the water supply pipe.

[0009] Furthermore, the lower surface of the reactor is connected to a water outlet pipe, a solenoid valve is fixedly installed on the water outlet pipe, the other end of the water outlet pipe is connected to a filter box, the upper surface of the filter box is fixedly installed on the lower surface of the reactor through a connecting rod, a box door is hinged on the front of the filter box and a filter net is fixedly installed on the inner wall, and the lower surface of the filter box is connected to a water supply pipe.

[0010] Furthermore, an opening is provided on the upper surface of the reactor and a sealing cover is threadedly inserted on the inner wall of the opening, two partitions are fixedly installed on the upper surface of the fixed plate, a holder is fixedly installed on the upper surface of the fixed plate and directly below the opening, a filter net basket is slidably inserted on the upper surface of the holder, the top of the filter net basket is an open structure and a conical block is fixedly installed on the inner bottom wall, and drainage outlets are provided on the upper surface of the fixed plate and on both sides of the filter net basket.

[0011] Furthermore, a water inlet pipe is connected to one side surface of the softening box, a feed pipe is connected to the upper surface of the softening box, a water pump is fixedly installed on the upper surface of the softening box, water pipes are fixedly installed on the output and input ends of the water pump, the other end of the water pipe on the input end of the water pump is connected to the interior of the softening box, and the other end of the water pipe on the output end of the water pump vertically penetrates the sealing cover and extends to the interior of the filter basket.

[0012] Furthermore, a pH detector is fixedly installed on one side surface of the reactor, and the other end of the pH detector extends into the interior of the reactor.

[0013] Furthermore, a feeding pipe is connected to the other side surface of the reactor away from the pH value detector, and a movable docking joint is fixedly installed at the other end of the feeding pipe.

[0014] Compared with the prior art, the technical solution of this application has the following beneficial effects:

[0015] 1. The cleaning mechanism of the sodium hypochlorite reactor is provided with a cleaning component, so that the device can automatically clean the attachments on the electrode plate, so that the staff does not need to manually clean the electrode plate, which saves time and effort, reduces the burden on the staff, improves work efficiency, and improves the applicability of the present invention.

[0016] 2. The cleaning mechanism of the sodium hypochlorite reactor is equipped with a softening box and a filter basket, so that the device can use a chemical precipitation method to remove calcium, magnesium and other ions in the raw brine, thereby avoiding the calcium, magnesium and other ions from combining with chloride ions or hydroxide ions in the subsequent electrolysis process to form insoluble precipitates, so that the precipitates will gradually deposit on the surface of the electrode plate and affect the conductive performance of the electrode plate. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the structure of the present invention;

[0018] Figure 2 It is a schematic diagram of the three-dimensional structure of the cleaning part and the flushing part in the present invention;

[0019] Figure 3 For the present invention Figure 1 Enlarged view of point A in the middle.

[0020] In the figure: 1. base; 2. softening box; 3. fixing plate; 4. supporting plate; 5. electrode plate; 6. electric push rod; 7. cleaning plate; 8. cleaning brush; 9. water storage tank; 10. nozzle; 11. reactor; 12. water outlet pipe; 13. filter box; 14. filter screen; 15. sealing cover; 16. partition; 17. holder; 18. filter screen basket; 19. feed pipe; 20. water pump; 21. pH detector; 22. feeding pipe; 23. movable joint. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0022] See also Figure 1A cleaning mechanism for a sodium hypochlorite reactor in this embodiment includes a base 1, a softening box 2 is fixedly installed on the upper surface of the base 1, a reactor 11 is fixedly installed on the upper surface of the base 1 and located on the right side of the softening box 2 through a support rod, a fixing plate 3 is fixedly installed on the inner wall of the reactor 11, a supporting plate 4 is fixedly installed on the inner top wall of the reactor 11 and the lower surface of the fixing plate 3, an electrode plate 5 is fixedly installed on the surface of the two supporting plates 4 on one side opposite to each other, and a cleaning component for cleaning the electrode plate 5 is provided on the surface of the electrode plate 5.

[0023] It should be noted that the front of the reaction kettle 11 is hinged with a door, which is a prior art and will not be described in detail herein.

[0024] Among them, the lower surface of the reactor 11 is connected to a water outlet pipe 12, on which a solenoid valve is fixedly installed, and the other end of the water outlet pipe 12 is connected to a filter box 13, the upper surface of the filter box 13 is fixedly installed on the lower surface of the reactor 11 through a connecting rod, the front of the filter box 13 is hinged with a box door and a filter screen 14 is fixedly installed on the inner wall, and the lower surface of the filter box 13 is connected to a water supply pipe.

[0025] By arranging the filter screen 14 in the filter box 13 , impurities in the produced sodium hypochlorite can be filtered, and by arranging the box door, it is convenient for the staff to clean the impurities on the filter screen 14 .

[0026] See also Figure 1 In this embodiment, a pH detector 21 is fixedly installed on one side surface of the reactor 11, and the other end of the pH detector 21 extends into the interior of the reactor 11. A feeding pipe 22 is connected to the other side surface of the reactor 11 away from the pH detector 21, and a movable docking joint 23 is fixedly installed on the other end of the feeding pipe 22.

[0027] By setting up the pH value detector 21, it is convenient to detect the pH value inside the reactor 11. When the pH value is abnormal, the feed pipeline is connected through the movable joint 23 to inject a proper amount of neutralizer into the reactor 11 to adjust the pH value inside the reactor 11.

[0028] See also Figure 1 , Figure 2 and Figure 3 In this embodiment, the surface of the cleaning component is provided with two electric push rods 6 on the upper surface of the fixed plate 3. The movable ends of the two electric push rods 6 extend to the bottom of the fixed plate 3 and are provided with cleaning parts. Flushing parts for flushing the electrode plate 5 are provided on both sides of the cleaning parts.

[0029] The cleaning member comprises a square cleaning plate 7 fixedly mounted on the movable ends of two electric push rods 6 , and a plurality of cleaning brushes 8 are fixedly mounted on the inner wall of the cleaning plate 7 .

[0030] Secondly, the flushing part includes a water tank 9 fixedly installed on the two side surfaces of the cleaning plate 7, the top of the water tank 9 is connected to a water supply pipe, a valve is fixedly installed on the water supply pipe, the lower surface of the water tank 9 is connected to a water supply pipe, and the other end of the water supply pipe is fixedly installed with a nozzle 10 facing the electrode plate 5.

[0031] Through the movable joint 23, the feeding pipe 22 is connected with another feeding pipe, so that the cleaning agent is injected into the reactor 11. This type of cleaning agent usually contains chemical components that can decompose and remove attachments, so that the attachments on the surface of the electrode plate 5 can be immersed in the cleaning agent, so that the attachments are gradually decomposed. At this time, the electric push rod 6 drives the cleaning plate 7 to move downward, so that the cleaning brush 8 on the inner wall of the cleaning plate 7 can clean the remaining attachments on the electrode plate 5, thereby completing the cleaning of the surface of the electrode plate 5.

[0032] See also Figure 1 In this embodiment, an opening is provided on the upper surface of the reaction kettle 11 and a sealing cover 15 is threadedly inserted on the inner wall of the opening, two partitions 16 are fixedly installed on the upper surface of the fixed plate 3, a holder 17 is fixedly installed on the upper surface of the fixed plate 3 and directly below the opening, a filter net basket 18 is slidably inserted on the upper surface of the holder 17, the top of the filter net basket 18 is an open structure and a conical block is fixedly installed on the inner bottom wall, and drainage ports are provided on the upper surface of the fixed plate 3 and on both sides of the filter net basket 18.

[0033] Among them, a water inlet pipe is connected to the surface of one side of the softening box 2, a feed pipe 19 is connected to the upper surface of the softening box 2, a water pump 20 is fixedly installed on the upper surface of the softening box 2, and water pipes are fixedly installed on the output and input ends of the water pump 20. The other end of the water pipe on the input end of the water pump 20 is connected to the inside of the softening box 2, and the other end of the water pipe on the output end of the water pump 20 vertically penetrates the sealing cover 15 and extends to the inside of the filter basket 18.

[0034] Chemical substances such as sodium hydroxide and sodium carbonate are added to the softening box 2 through the feed pipe 19, so that calcium and magnesium ions react with these chemicals to generate water-insoluble precipitates. The solution is pumped into the reactor 11 through the water pump 20, and the precipitates and other impurities are removed through the filter basket 18, thereby preventing calcium, magnesium ions and other ions from combining with chloride ions or hydroxide ions in the subsequent electrolysis process to form insoluble precipitates, so that the precipitates are gradually deposited on the surface of the electrode plate 5, thereby affecting the conductive performance of the electrode plate 5.

[0035] The working principle of the above embodiment is:

[0036] Through the movable docking joint 23, the feeding pipe 22 is connected to another feeding pipe, so that the cleaning agent is injected into the reactor 11. This type of cleaning agent usually contains chemical components that can decompose and remove attachments, so that the attachments on the surface of the electrode plate 5 can be immersed in the cleaning agent, so that the attachments are gradually decomposed. At this time, the electric push rod 6 drives the cleaning plate 7 to move downward, so that the cleaning brush 8 on the inner wall of the cleaning plate 7 can clean the remaining attachments on the electrode plate 5, thereby completing the cleaning of the surface of the electrode plate 5, so that the device can automatically clean the attachments on the electrode plate 5, so that the staff does not need to manually clean the electrode plate 5, saving time and effort, and reducing the burden on the staff.

[0037] Chemical substances such as sodium hydroxide and sodium carbonate are added to the softening box 2 through the feed pipe 19, so that calcium and magnesium ions react with these chemicals to generate water-insoluble precipitates. The solution is pumped into the reactor 11 through the water pump 20, and the precipitates and other impurities are removed through the filter basket 18, thereby preventing calcium, magnesium ions and other ions from combining with chloride ions or hydroxide ions in the subsequent electrolysis process to form insoluble precipitates, so that the precipitates are gradually deposited on the surface of the electrode plate 5, thereby affecting the conductive performance of the electrode plate 5.

[0038] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0039] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A cleaning mechanism for a sodium hypochlorite reactor, comprising a base (1), Features: A softening box (2) is fixedly mounted on the upper surface of the base (1); a reaction kettle (11) is fixedly mounted on the upper surface of the base (1) and located on the right side of the softening box (2) via a support rod; a fixing plate (3) is fixedly mounted on the inner wall of the reaction kettle (11); a support plate (4) is fixedly mounted on the inner top wall of the reaction kettle (11) and the lower surface of the fixing plate (3); an electrode plate (5) is fixedly mounted on the surface of one side opposite to the other of the two support plates (4); and a cleaning component for cleaning the electrode plate (5) is provided on the surface of the electrode plate (5); The cleaning component surface is provided with two electric push rods (6) on the upper surface of the fixed plate (3), the movable ends of the two electric push rods (6) extend below the fixed plate (3) and are provided with cleaning members, and flushing members for flushing the electrode plate (5) are provided on both sides of the cleaning members.

2. A cleaning mechanism for a sodium hypochlorite reactor according to claim 1, Features: The cleaning member comprises a square cleaning plate (7) fixedly mounted on the movable ends of the two electric push rods (6), and a plurality of cleaning brushes (8) are fixedly mounted on the inner wall of the cleaning plate (7).

3. A cleaning mechanism for a sodium hypochlorite reactor according to claim 2, Features: The flushing member comprises a water storage tank (9) fixedly mounted on the surfaces of both sides of the cleaning plate (7); the top of the water storage tank (9) is connected to a water supply pipeline, a valve is fixedly mounted on the water supply pipeline, the lower surface of the water storage tank (9) is connected to a water delivery pipeline, and a nozzle (10) facing the electrode plate (5) is fixedly mounted on the other end of the water delivery pipeline.

4. A cleaning mechanism for a sodium hypochlorite reactor according to claim 1, Features: The lower surface of the reactor (11) is connected to a water outlet pipe (12), a solenoid valve is fixedly mounted on the water outlet pipe (12), the other end of the water outlet pipe (12) is connected to a filter box (13), the upper surface of the filter box (13) is fixedly mounted on the lower surface of the reactor (11) via a connecting rod, a box door is hinged on the front of the filter box (13) and a filter screen (14) is fixedly mounted on the inner wall, and the lower surface of the filter box (13) is connected to a water delivery pipe.

5. A cleaning mechanism for a sodium hypochlorite reactor according to claim 1, Features: The upper surface of the reaction kettle (11) is provided with an opening and a sealing cover (15) is threadedly inserted on the inner wall of the opening; two partitions (16) are fixedly installed on the upper surface of the fixed plate (3); a holder (17) is fixedly installed on the upper surface of the fixed plate (3) and located directly below the opening; a filter basket (18) is slidably inserted on the upper surface of the holder (17); the top of the filter basket (18) is an open structure and a conical block is fixedly installed on the inner bottom wall; and drainage outlets are provided on the upper surface of the fixed plate (3) and located on both sides of the filter basket (18).

6. A cleaning mechanism for a sodium hypochlorite reactor according to claim 5, Features: A water inlet pipe is connected to one side surface of the softening box (2), a feed pipe (19) is connected to the upper surface of the softening box (2), a water pump (20) is fixedly installed on the upper surface of the softening box (2), water pipes are fixedly installed at both the output end and the input end of the water pump (20), the other end of the water pipe on the input end of the water pump (20) is connected to the inside of the softening box (2), and the other end of the water pipe on the output end of the water pump (20) vertically penetrates the sealing cover (15) and extends to the inside of the filter basket (18).

7. A cleaning mechanism for a sodium hypochlorite reactor according to claim 1, Features: A pH value detector (21) is fixedly mounted on one side surface of the reaction kettle (11), and the other end of the pH value detector (21) extends into the interior of the reaction kettle (11).

8. A cleaning mechanism for a sodium hypochlorite reactor according to claim 7, Features: A feeding pipe (22) is connected to the other side surface of the reaction kettle (11) away from the pH value detector (21), and a movable docking joint (23) is fixedly installed at the other end of the feeding pipe (22).

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