Device system for improving dissolution rate of nickel shots / nickel plates
By using screen plates and compressed air pipelines during the dissolution process of nickel bean/nickel plates for stirring and erosion, combined with the gas-liquid separator and solenoid valve of the lieutenant tank, the unstable dissolution rate and easy damage to the conveying pump during the traditional dissolution process are solved. The problem of this achieves more efficient dissolution and reduces production costs.
Patent Information
- Application Number
- CN202411261997.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-10
- Publication Date
- 2024-12-13
AI Technical Summary
The dissolution rate is unstable during the dissolution process of traditional nickel bean/nickel plate pile leaching, resulting in uneven liquid flow, blockage and groove flow problems, and the conveyor pump is easy to damage and has high maintenance costs.
A device system is designed, including a reactor, a lying tank and a conveying pump. By setting up a screen plate and a compressed air pipeline in the reactor for stirring and erosion, the capillary function is increased, and the gas-liquid separator and solenoid valve of the lying tank are combined. Optimize the flow of the spray liquid and the settlement of nickel powder to prevent small-particle nickel powder from entering the conveying pump impeller chamber.
It effectively shortens the dissolution time of nickel bean/nickel plate, improves the dissolution rate, reduces the loss of the conveying pump, extends the service life of the equipment, and reduces production costs.
Smart Images
Figure CN119113959A_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the technical field of nickel dissolution and recovery, and in particular relates to a device system for improving the dissolution rate of nickel beans / nickel plates. Background Art
[0002] Reagent-grade high-purity nickel sulfate has high added value in high-end chemical plating and other fields. Compared with the wide sources of raw materials for electroplating and battery-grade nickel sulfate, the production raw materials of reagent-grade high-purity nickel sulfate are limited to nickel beans / nickel plates with a purity of more than 99%, which are produced through dissolution, purification, evaporation, crystallization, screening, packaging and other processes.
[0003] The density of nickel beans / nickel plates is 8.5t / m 3 ~8.9t / m 3 When dissolving, heap leaching is usually used. The nickel beans / nickel plates are piled up and sulfuric acid, a leaching agent, is used to infiltrate them. The metallic nickel is leached through the capillary action of the cracks and gaps in the pile to convert it into a nickel sulfate solution. When the nickel concentration is enriched to 120g / L-130g / L, the leaching solution is pumped out for subsequent operations.
[0004] Traditional nickel bean / nickel plate heap leaching usually adopts the method of in-situ leaching, that is, the material is piled at the bottom of the reactor and leached by spraying sulfuric acid. After the spray liquid is extracted by a delivery pump at the bottom of the reactor, it is sent back to the reactor through the outlet of the delivery pump. The spray liquid forms a circulation system between the reactor and the pump until the concentration of the leaching liquid reaches the standard. In actual implementation, the early stage of leaching is often due to the dense accumulation of materials, which makes the cracks and gaps inside the pile small. Even under the combined action of machinery and gravity, most of the spray leaching agents are still blocked outside the pile, and only the outer layer of metallic nickel is etched and dissolved, and it is impossible to effectively penetrate into the pile. As a result, uneven liquid flow, blockage and channel flow problems often occur, and the leaching time is prolonged due to the unstable dissolution rate; in the middle and late stages of leaching, when the material is etched into nickel powder with a particle size of 50μm to 200μm, it will be entrained by the spray liquid and pass through the cracks inside the pile into the impeller cavity of the delivery pump. The specific gravity of the nickel powder is 5.4t / m 3 When the vehicle is stopped regularly to replenish nickel beans / nickel plates, nickel powder quickly precipitates from the spray liquid due to the difference in specific gravity and is deposited in the impeller cavity of the delivery pump. When it is started again, the flow rate of the delivery pump decreases and the pressure fluctuation increases, causing the pump to produce noise and abnormal vibration, and dry grinding is prone to occur, resulting in the crushing of the mechanical seal dynamic ring. The highly corrosive spray liquid corrodes the pump shaft and pump cover along the damaged gaps of the mechanical seal dynamic ring, causing the delivery pump to be damaged and replaced as a whole, with high maintenance costs. Summary of the invention
[0005] The technical problem to be solved by the present invention is to provide a device system which can effectively shorten the dissolution time of nickel beans / nickel plates, reduce the shortage of leaching agent in traditional stacking infiltration, inhibit uneven liquid flow, blockage and channel flow, and reduce the loss of conveying pumps.
[0006] In order to solve the above technical problems, the present invention provides a device system for improving the dissolution rate of nickel beans, and the technical solution is as follows:
[0007] like Figure 1 As shown, the device system consists of three parts, namely, a reactor, a horizontal tank, and a delivery pump. The reactor is used to hold nickel beans / nickel plates, and the reactor is connected to the horizontal tank through a pipeline; the horizontal tank is used to intercept the nickel powder of 50μm to 200μm produced after the nickel beans / nickel plates are dissolved, and the horizontal tank is connected to the delivery pump through a pipeline; the delivery pump pushes the spray liquid to circulate between the delivery pump → reactor → horizontal tank → delivery pump, and the delivery pump is connected to the reactor through a pipeline.
[0008] Specifically, there is a feed port at the top of the reactor, which is sealed by a manhole cover. When feeding, the nickel beans / nickel plates are naturally slid to the center of the sieve plate through the feeding plate, and there are shields on both sides of the feeding plate to prevent the nickel beans / nickel plates from spilling; a peephole (not shown in the figure) is also installed on the top of the reactor to observe the internal situation of the reactor; a sieve plate is provided in the lower part of the reactor, the sieve plate is suspended, and the nickel beans / nickel plates are piled on the sieve plate, and the sieve plate can make the nickel beans / nickel plate pile completely soaked in the leaching agent; the sieve plate is provided with sieve plate holes running through the upper and lower surfaces of the sieve plate, such as Figure 2 As shown in the figure, the holes of the sieve plate are radially distributed with the center of the sieve plate as the center of the circle, and the diameter of the holes of the sieve plate is smaller than the particle size of the nickel beans / nickel plates; the sieve plate is supported by legs, one end of the legs is fixedly connected to the bottom of the sieve plate, and the other end of the legs is fixedly connected to the bottom surface of the reactor. The number of legs is greater than or equal to 3, and the legs ensure that the sieve plate is level; a cofferdam is fixedly installed on the outer edge of the sieve plate to prevent the pile from colliding and damaging the inner wall of the reactor; an air inlet hole is opened at the upper end of the reactor near the vertical side surface, and the air inlet hole is tightly fixedly connected to the compressed air inlet pipe, which extends vertically downward to a certain height below the bottom surface of the sieve plate, and then A circular compressed air pipeline is tightly fixed and connected. The ring formed by the compressed air pipeline is coaxial with the circular cross-section of the sieve plate, and the maximum radius of the ring is 75% of the radius of the circular cross-section of the sieve plate. A vertical upward air hole is opened at a certain interval along the circular axis at the top of the outer side of the compressed air pipeline. The compressed air is ejected upward through the air hole, and then passes through the sieve plate holes on the sieve plate to impact the nickel beans / nickel plates on the sieve plate, stirring the nickel beans / nickel plates, and at the same time, new cracks and gaps are flushed out inside the nickel beans / nickel plates pile, the capillary action is enhanced, and the reaction is further accelerated, so as to achieve the purpose of increasing production capacity.
[0009] Specifically, a hole is opened at 1 / 2 the height of the reactor, and is sealed and connected to an opening A on a head end of the horizontal tank through a pipe. The end of the pipe connected to the reactor has its pipe mouth at the center position of the height in the reactor. There is an opening B on the other head end of the horizontal tank, and the opening B is higher than the position of the opening A. The liquid in the horizontal tank flows in a low-in and high-out manner. The pipe at the opening B is provided with a solenoid valve; there is an opening C in the middle of the upper end of the horizontal tank, and the opening C is tightly fixedly connected to the gas-liquid separator to discharge hydrogen and compressed air; the diameter of the horizontal tank is 5 to 10 times the diameter of the pipe connected to the opening A. By reducing the diameter of the pipeline, the flow rate of the fluid entering the horizontal tank is reduced, and the residence time of the fluid in the tank is prolonged, so that the nickel powder entrained in the spray liquid is retained in the horizontal tank through gravity sedimentation. At the same time, the sulfuric acid in the spray liquid is continuously flowing to continuously flush and dissolve the nickel powder layer that has been deposited in the horizontal tank, forming a balanced relationship between the deposition rate and the dissolution rate, thereby maintaining the dynamic height of the nickel powder in the horizontal tank, reducing the amount of small-particle nickel powder entering the impeller cavity of the delivery pump with the spray liquid, and preventing the mechanical seal and other components of the delivery pump from being damaged, thereby extending the service life of the delivery pump and reducing production costs.
[0010] Specifically, one-way solenoid valves are installed at the inlet and outlet of the delivery pump to form a chain. When the delivery pump is turned off, the solenoid valves are closed at the same time to prevent the nickel powder in the horizontal tank and on the sieve plate in the reactor from flowing back due to fluid pressure fluctuations.
[0011] Preferably, the diameter of the circular cross section of the sieve plate is 95% of the diameter of the cross section of the reactor.
[0012] Preferably, the sieve plate is made of PP plastic plate.
[0013] Preferably, the distance between the sieve plate and the annular compressed air pipeline is 150 mm.
[0014] Through the above design scheme, the present invention can bring the following beneficial effects:
[0015] (1) The device system is simple and convenient to manufacture, has a low failure rate, and can be adjusted according to production needs;
[0016] (2) The cost of materials used is low, and the cost of replacement or repair is low;
[0017] (3) It can stabilize the material dissolution rate and effectively shorten the material leaching time, shortening the production time by more than 25% compared with the traditional heap leaching method, greatly improving the production capacity and reducing the production cost. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The present invention is further described below with reference to the accompanying drawings and specific embodiments:
[0019] Figure 1The present invention provides a device system for improving the dissolution rate of nickel beans / nickel plates and a schematic diagram of the process.
[0020] Figure 2 The present invention is a top view of a sieve plate in a device system for improving the dissolution rate of nickel beans / nickel plates.
[0021] In the figure, 1-reactor, 2-nickel beans / nickel plates, 3-cofferdam, 4-sieve plate, 5-sieve plate holes, 6-compressed air pipeline, 7-legs, 8-feed port, 9-compressed air inlet pipe, 10-manhole cover, 11-horizontal tank, 12-delivery pump, 13-air inlet, 14-opening A, 15-opening B, 16-gas-liquid separator. DETAILED DESCRIPTION
[0022] In order to make the purpose, technical scheme and advantages of the present invention more clear, the following is a further detailed description of a device system for improving the dissolution rate of nickel beans / nickel plates of the present invention in conjunction with the accompanying drawings. It should be understood that the specific embodiments described herein are only used to explain the present invention and do not constitute a limitation of the present invention.
[0023] Example
[0024] like Figure 1 As shown, the reactor 1 is connected to the horizontal tank 11 through a pipeline, the horizontal tank 11 is connected to the delivery pump 12 through a pipeline, and the delivery pump 12 is connected to the reactor 1 through a pipeline.
[0025] There is a feed port 8 at the top of the reactor 1, which is sealed by a manhole cover 10. There is a sieve plate 4 at the lower part of the reactor 1. The sieve plate 4 is provided with sieve plate holes 5 that penetrate the upper and lower surfaces of the sieve plate 4. A φ6 drill bit is used to drill 1200 sieve plate holes 5 per m2 on the sieve plate 4. The sieve plate holes 5 are radially distributed with the center of the sieve plate 4 as the center of the circle. The diameter of the sieve plate holes 5 is smaller than the particle size of the nickel beans / nickel plates. When feeding, the nickel beans / nickel plates are naturally slid to the center of the sieve plate 4 through the feeding plate. There are shielding on both sides of the feeding plate to prevent the nickel beans / nickel plates from spilling; the sieve plate 4 is suspended, and the installation position of the sieve plate 4 is 100 mm above the welding line between the lower head of the reactor 1 and the cylinder of the reactor 1. The sieve plate 4 is supported by three legs 7, one end of the leg 7 is fixedly connected to the bottom of the sieve plate 4, and the other end of the leg 7 is fixedly connected to the bottom of the reactor 1. On the inner bottom surface, the legs 7 ensure that the sieve plate 4 is level; the cofferdam 3 is fixedly installed on the outer edge of the sieve plate 4 to prevent the piled materials from colliding and damaging the inner wall of the reactor 1; an air inlet hole 13 is opened at the upper end of the reactor 1 near the vertical side, and the air inlet hole 13 is tightly fixedly connected to the compressed air inlet pipe 9, which extends vertically downward to a height of 150mm below the bottom surface of the sieve plate 4, and then tightly fixedly connected to the annular compressed air pipeline 6. The ring surrounded by the compressed air pipeline 6 is coaxial with the circular cross-section of the sieve plate 4, and the maximum radius of the ring is 75% of the radius of the circular cross-section of the sieve plate 4. Along the annular axis at the top of the outer side of the compressed air pipeline 6, a vertical upward air hole is opened at a certain interval; a peephole is also installed on the top of the reactor 1 to observe the internal situation of the reactor 1.
[0026] A hole is opened at 1 / 2 of the height of the reactor 1, and is sealed and connected to an opening A14 on a head end of the horizontal tank 11 through a pipeline. The end of the pipeline at the opening A14 connected to the reactor 11 has its pipe opening at the center of the height in the reactor 11. There is an opening B15 on the other head end of the horizontal tank 11, and the opening B15 is higher than the position of the opening A14. The pipeline at the opening B15 is provided with a solenoid valve, and the liquid in the horizontal tank 11 flows in a low-in and high-out manner; there is an opening C in the middle of the upper end of the horizontal tank 11, and the opening C is tightly fixedly connected to the gas-liquid separator 16 to discharge hydrogen and compressed air; the diameter of the horizontal tank 11 is 5 to 10 times the diameter of the pipeline connected to the opening A14;
[0027] One-way solenoid valves are installed at the inlet and outlet of the delivery pump 12 to form a chain. When the delivery pump 12 is turned off, the solenoid valves are closed at the same time.
[0028] The present invention discloses a device system for improving the dissolution rate of nickel beans / nickel plates. Compared with the general nickel beans / nickel plates dissolution device system in the prior art, when the sizes of the reactors are the same, the comparative data of the material processing volume and the material and energy quotas are shown in the following table.
[0029] Material handling capacity comparison table
[0030] project unit Existing technology processing capacity The processing capacity of the present invention Increased throughput nickel beans t 20.5 26.8 6.3 project unit Existing technology processing capacity The processing capacity of the present invention Increased throughput nickel beans t 19.8 27.1 7.3 project unit Existing technology processing capacity The processing capacity of the present invention Increased throughput nickel beans t 20.2 26.9 6.7
[0031] Comparison table of material and energy quotas
[0032]
[0033]
Claims
1. A device system for improving the dissolution rate of nickel beans / nickel plates, comprising a reaction kettle (1) and a delivery pump (12), wherein the reaction kettle (1) is tightly connected to the delivery pump (12) through a pipeline. Features: It also includes a horizontal tank (11), wherein the horizontal tank (11) is respectively and hermetically connected to a delivery pump (12) and a reaction kettle (1) through pipelines; The reactor (1) has a feed inlet (8) at the top, which is sealed by a manhole cover (10). A sieve plate (4) is provided at the lower part of the reactor (1). The sieve plate (4) is suspended in the air. The sieve plate (4) is provided with sieve plate holes (5) penetrating the upper and lower surfaces of the sieve plate (4). The sieve plate holes (5) are radially distributed with the center of the sieve plate (4) as the center of the circle. The sieve plate (4) is supported by a support leg (7). One end of the support leg (7) is fixedly connected to the bottom of the sieve plate (4), and the other end is fixedly connected to the reactor (1). On the inner bottom surface, a cofferdam (3) is fixedly installed on the outer edge of the sieve plate (4); an air inlet hole (13) is opened at a position near the vertical side of the upper end of the reactor (1); a compressed air inlet pipe (9) is tightly fixedly connected to the air inlet hole (13); the compressed air inlet pipe (9) extends vertically downward to the bottom of the sieve plate (4), and is then tightly fixedly connected to an annular compressed air pipeline (6); and an air hole is opened vertically upward at a certain interval along the annular axis at the top of the outer side of the compressed air pipeline (6); A hole is opened at 1 / 2 of the height of the reactor (1), and is sealedly connected to an opening A (14) on a head end of the horizontal tank (11) through a pipeline. The end of the pipeline connected to the reactor (1) has a pipe opening at the center of the height inside the reactor (1). An opening B (15) is provided on the other head end of the horizontal tank (11). The opening B (15) is higher than the position of the opening A (14). A solenoid valve is provided on the pipeline at the opening B (15). An opening C is provided in the middle of the upper end of the horizontal tank (11). The opening C is tightly fixedly connected to a gas-liquid separator (16); One-way solenoid valves are installed at the inlet and outlet of the delivery pump (12) to form a chain.
2. A device system for improving the dissolution rate of nickel beans / nickel plates according to claim 1, Features: The ring formed by the compressed air pipeline (6) is coaxial with the circular cross section of the sieve plate (4).
3. A device system for improving the dissolution rate of nickel beans / nickel plates according to claim 1, Features: The maximum radius of the ring formed by the compressed air pipeline (6) is 75% of the radius of the circular cross section of the sieve plate (4).
4. A device system for improving the dissolution rate of nickel beans / nickel plates according to claim 1, Features: The diameter of the circular cross section of the sieve plate (4) is 95% of the diameter of the cross section of the reaction kettle (1).
5. A device system for improving the dissolution rate of nickel beans / nickel plates according to claim 1, Features: The distance between the sieve plate (4) and the annular compressed air pipeline (6) is 150 mm.
6. A device system for improving the dissolution rate of nickel beans / nickel plates according to claim 1, Features: The diameter of the horizontal tank (11) is 5 to 10 times the diameter of the pipe connected to the opening A (14).