Optical proximity correction method and device and mask

Abstract

The invention relates to an optical proximity correction method and device and a mask. The method comprises the following steps: selecting a first graph from design graphs to be corrected, wherein the area of the first graph is smaller than a first preset area; the first graph is adjusted for the first time, a second graph is obtained, and the area of the second graph is not smaller than a first preset area; adjusting the second graph and the design graphs except the first graph for the second time to obtain a pre-corrected graph of the design graphs; selecting a third graph from the pre-corrected graph of the design graph, wherein the area of the third graph is smaller than a second preset area; acquiring a non-overlapped graph between the second graph and the third graph, wherein the non-overlapped graph is a deviation graph; selecting a second graph which shares an edge with the deviation graph from the second graphs as a fourth graph; and obtaining a target correction graph of the design graph according to the fourth graph and the pre-correction graph of the design graph. According to the method, the adjustment precision is higher, and product failure or reliability reduction is avoided.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to an optical proximity correction method, device and mask. Background Art

[0002] With the rapid development of ultra-large scale integrated circuits (ULSI), integrated circuit manufacturing processes have become increasingly complex and sophisticated. In the key layers of 0.13um and below technology nodes, such as TO (active area layer), GT (gate oxide layer) and An (metal layer), the critical dimensions (CD) of key layers are getting smaller and smaller. The CD of some key layers is close to or even smaller than the wavelength of the light wave used in the photolithography process. Therefore, during the exposure process in the photolithography, due to the interference and diffraction of light, there are certain deformations and deviations between the photolithography pattern obtained on the actual product wafer and the mask pattern. This error in the photolithography directly affects the circuit performance and production yield. In order to eliminate the above errors, the optical proximity correction (OPC) method is usually used to make certain corrections to the design pattern.

[0003] In advanced processes, certain key layers (such as metal layers) will add process window adjustment requirements provided by lithography before OPC correction, that is, special selective adjustment (SSA) to solve the problem of insufficient lithography process window. In the exemplary SSA solution, since the area of ​​the island pattern after expansion is not considered when lithography is used to make the process window, when the metal strip is reduced in SSA, it may cause insufficient island area, and insufficient metal strip area will cause product failure or reduced reliability. Summary of the invention

[0004] Based on this, it is necessary to provide an optical proximity correction method, device and mask that can avoid product failure or reduced reliability in order to solve the above technical problems.

[0005] In a first aspect, the present application provides an optical proximity correction method, comprising:

[0006] Selecting a first graphic from the design graphics to be corrected, wherein the area of ​​the first graphic is smaller than a first preset area;

[0007] Performing a first adjustment on the first graphic to obtain a second graphic, wherein the area of ​​the second graphic is not less than the first preset area;

[0008] Performing a second adjustment on the second graphic and the design graphic except the first graphic to obtain a pre-corrected graphic of the design graphic;

[0009] Selecting a third graphic from the pre-corrected graphics of the design graphic, wherein the area of ​​the third graphic is smaller than the second preset area;

[0010] Acquire a non-overlapping graph between the second graph and the third graph, wherein the non-overlapping graph is a deviation graph;

[0011] Selecting a second figure having a common edge with the deviation figure from the second figure as a fourth figure;

[0012] A target correction pattern of the design pattern is obtained according to the fourth pattern and the pre-correction pattern of the design pattern.

[0013] In one embodiment, the step of adjusting the first graphic for the first time includes:

[0014] The first adjustment is a first special selective adjustment for enlargement.

[0015] In one embodiment, the step of performing a second adjustment on the second graphic and the design graphic other than the first graphic comprises:

[0016] The second adjustment is a second special selective adjustment for enlarging or shrinking.

[0017] In one embodiment, the step of obtaining a non-overlapping graphic between the second graphic and the third graphic includes:

[0018] An XOR operation is performed on the second graph and the third graph to obtain the non-overlapping graph.

[0019] In one embodiment, the step of selecting a second graphic having a common edge with the deviation graphic from the second graphic as the fourth graphic comprises:

[0020] The second graphic having a common edge with the deviation graphic is a second graphic that completely covers the deviation graphic and has a common edge with the deviation graphic.

[0021] In one embodiment, the step of obtaining a target corrected pattern of the design pattern according to the fourth pattern and the pre-corrected pattern of the design pattern comprises:

[0022] An OR command is performed on the fourth pattern and the pre-correction pattern of the design pattern to obtain a target corrected pattern of the design pattern.

[0023] In one embodiment, the first preset area and the second preset area are the same.

[0024] In one embodiment, the first graphic and / or the third graphic is an island graphic.

[0025] In a second aspect, the present application provides an optical proximity correction device, comprising:

[0026] A first graphic screening module, used for selecting a first graphic from the design graphics to be corrected, wherein the area of ​​the first graphic is smaller than a first preset area;

[0027] A graphic adjustment module, configured to perform a first adjustment on the first graphic to obtain a second graphic, wherein the area of ​​the second graphic is not less than the first preset area; and perform a second adjustment on the second graphic and the design graphic except the first graphic to obtain a pre-corrected graphic of the design graphic;

[0028] A second graphic screening module, used for selecting a third graphic from the pre-corrected graphic of the design graphic, wherein the area of ​​the third graphic is smaller than the second preset area;

[0029] The third graphic screening module is used to obtain a non-overlapping graphic between the second graphic and the third graphic, wherein the non-overlapping graphic is a deviation graphic; select a second graphic having a common edge with the deviation graphic from the second graphic as a fourth graphic; and obtain a target correction graphic of the design graphic based on the fourth graphic and a pre-correction graphic of the design graphic.

[0030] In a third aspect, the present application proposes a mask, wherein the mask is made of a target correction pattern obtained by the optical proximity correction method described in the embodiment of the first aspect.

[0031] The above optical proximity correction method, device and mask plate firstly make a first adjustment to the first graphic whose area is smaller than the first preset area in the design graphic of the mask plate to obtain a second graphic whose area is not smaller than the first preset area, then make a second adjustment to the second graphic and the design graphic other than the first graphic to obtain a pre-corrected graphic, and select a third graphic whose area is smaller than the second preset area from the pre-corrected graphic, then obtain a non-overlapping deviation graphic between the second graphic and the third graphic, and obtain a fourth graphic with the same edge as the deviation graphic from the second graphic, and finally obtain the final target correction graphic according to the fourth graphic and the pre-corrected graphic. By compensating and correcting the third graphic whose area is smaller than the second preset area, the problem of insufficient area caused by the second adjustment is solved, and the second adjustment is a synchronous adjustment of the entire design graphic, so the second adjustment is based on the graphic environment where the second graphic is located, and the graphic environment where the second graphic is located is fully considered. Compared with directly making a second adjustment to the graphic whose area is smaller than the first preset area, the adjustment accuracy is higher, avoiding product failure or reduced reliability. It not only solves the problem of insufficient area in the compensation process, but also ensures the accuracy of all design graphics at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the conventional technology, the drawings required for use in the embodiments or the conventional technology descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0033] Figure 1 is a schematic flow chart of an optical proximity correction method in one embodiment;

[0034] Figure 2 is a schematic diagram of a first figure in one embodiment;

[0035] Figure 3 is a schematic diagram of a second graph in one embodiment;

[0036] Figure 4 is a schematic diagram of a third figure in one embodiment;

[0037] Figure 5 is a schematic diagram of a deviation graph in one embodiment;

[0038] Figure 6 is a schematic diagram of a fourth figure in one embodiment;

[0039] Figure 7 FIG. 4 is a schematic diagram of a module of an optical proximity correction device in one embodiment. DETAILED DESCRIPTION

[0040] In order to facilitate understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Embodiments of the present application are provided in the drawings. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive.

[0041] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used herein in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application.

[0042] It can be understood that the terms "first", "second", etc. used in the present application can be used in this article to describe various elements, but these elements are not limited by these terms. These terms are only used to distinguish the first element from another element.

[0043] Spatially relative terms such as "under," "beneath," "below," "under," "above," "above," and the like may be used herein to describe the relationship of an element or feature shown in the figures to other elements or features. It should be understood that, in addition to the orientations shown in the figures, spatially relative terms also include different orientations of the device in use and operation. For example, if the device in the accompanying drawings is flipped, an element or feature described as "under other elements" or "under it" or "under it" will be oriented as being "above" the other elements or features. Thus, the exemplary terms "under" and "under" may include both upper and lower orientations. In addition, the device may also include additional orientations (e.g., rotated 90 degrees or other orientations), and the spatial descriptors used herein are interpreted accordingly.

[0044] It should be noted that when an element is considered to be "connected" to another element, it can be directly connected to the other element, or connected to the other element through an intermediate element. In addition, the "connection" in the following embodiments should be understood as "electrical connection", "communication connection", etc. if there is transmission of electrical signals or data between the connected objects.

[0045] When used herein, the singular forms "a", "an", and "said / the" may also include plural forms, unless the context clearly indicates otherwise. It should also be understood that the terms "include / comprise" or "have" and the like specify the presence of stated features, wholes, steps, operations, components, parts, or combinations thereof, but do not exclude the possibility of the presence or addition of one or more other features, wholes, steps, operations, components, parts, or combinations thereof. At the same time, the term "and / or" used in this specification includes any and all combinations of the relevant listed items.

[0046] Exemplary SSA solutions also include SSA1 and SSA2, but there are problems with product failure and reduced reliability. Another SSA solution is to first perform SSA2 reduction, then select islands with an area smaller than S1 in the graph after SSA2 reduction, and perform SSA1 expansion on islands with an area smaller than S1 so that their area can reach S1. However, this solution does not take into account the area and environment of the island after the expansion when performing SSA2 reduction. The area of ​​the island may be reduced to a smaller size during SSA2 reduction, which increases the difficulty of setting the subsequent SSA1 expansion value, and may also cause the enlarged island to deviate further from the original target position, thereby causing product failure or reduced reliability.

[0047] Based on the above reasons, the present application provides an optical proximity correction method, device and mask, which can avoid product failure or reduced reliability.

[0048] In one embodiment, Figure 1 As shown, an optical proximity correction method is provided, comprising:

[0049] Step S100, selecting a first graphic from the design graphics to be corrected, wherein the area of ​​the first graphic is smaller than a first preset area.

[0050] Specifically, the optical proximity correction method of the embodiment of the present application can be executed by OPC software. The design graphics to be corrected of the mask plate include multiple island graphics of different sizes, and also include graphics of other areas. Among them, the island graphic refers to an isolated area in the mask graphic, which is usually used to manufacture electrodes, capacitors and other components in semiconductor devices. For example, an area of ​​less than 0.3 square microns in a 0.18um process platform is considered to be an island graphic. In some other embodiments, the process platform is different, and the area used to determine whether it is an island graphic is also different.

[0051] In the embodiment of the present application, after the OPC software receives the area screening instruction input by the user, the graphics in a specific range can be screened according to the area screening instruction input by the user, thereby obtaining a first graphic whose area is smaller than a first preset area. The first preset area is the minimum graphic area that the mask graphic needs to reach in the actual photolithography process to meet the reliability requirements of the manufactured device after the photolithography process. The size of the first preset area can be set according to the actual needs of different photolithography processes.

[0052] Step S200, performing a first adjustment on the first graphic to obtain a second graphic, wherein the area of ​​the second graphic is not less than the first preset area.

[0053] Specifically, after selecting the first graphic with an area smaller than the first preset area, the first graphic is adjusted for the first time to obtain a second graphic with an area not smaller than the first preset area. It can be understood that the first adjustment is to enlarge the area of ​​the first graphic.

[0054] Step S300, performing a second adjustment on the second graphic and the design graphic except the first graphic to obtain a pre-corrected graphic of the design graphic.

[0055] Specifically, after obtaining the second figure, the figure that has not been adjusted for the first time, that is, the design figure other than the first figure, is combined with the second figure and adjusted for the second time to obtain a pre-corrected figure of the design figure. It can be understood that the second adjustment is to reduce or increase the area of ​​a certain figure among all the figures, and usually, the degree of reduction of the area of ​​the second figure is less than the degree of increase of the area of ​​the first figure.

[0056] Step S400, selecting a third graphic from the pre-corrected graphics of the design graphics, the area of ​​the third graphic being smaller than the second preset area.

[0057] Specifically, after obtaining the pre-corrected figure of the design figure, a third figure whose area is smaller than the second preset area in the pre-corrected figure is screened out. It can be understood that, in the case where only the area of ​​the second figure is reduced, since the degree of reduction of the area of ​​the second figure is smaller than the degree of increase of the area of ​​the first figure, the third figure is a figure after part or all of the second figure is reduced.

[0058] Step S500, obtaining a non-overlapping graph between the second graph and the third graph, where the non-overlapping graph is a deviation graph.

[0059] Specifically, by comparing the graphic differences between the second graphic and the third graphic, the graphic of the non-overlapping area between the second graphic and the third graphic can be obtained, and the non-overlapping graphic is used as the deviation graphic. It can be understood that in the process of the second adjustment, the area of ​​the second graphic and the design graphics other than the first graphic can be adjusted, so the third graphic obtained by screening may be obtained by adjusting the second graphic or not, and accordingly, the deviation graphic may belong to the second graphic or not. Therefore, the obtained deviation graphics include the following situations: the non-overlapping deviation graphics belong only to the second graphic; the non-overlapping deviation graphics belong to the second graphic and the third graphic.

[0060] Step S600: Selecting a second graphic having a common edge with the deviation graphic from the second graphics as a fourth graphic.

[0061] Specifically, after obtaining the deviation graph, a second graph that shares a common edge with the deviation graph is selected from the second graph and used as the fourth graph. For example, when the deviation graph only belongs to the second graph, the second graph that shares a common edge with the deviation graph can be screened out from the second graph; when the deviation graph belongs to the second graph and the third graph, the deviation graph that belongs to the third graph cannot be screened out from the second graph that shares a common edge.

[0062] Step S700, obtaining a target corrected pattern of the design pattern according to the fourth pattern and the pre-corrected pattern of the design pattern.

[0063] Specifically, after obtaining the fourth figure, the fourth figure and the pre-corrected figure of the design figure are superimposed together to complete the correction of the pre-corrected figure and obtain the target corrected figure. It can be understood that since the fourth figure is part or all of the second figure, when the second adjustment is made, the area of ​​the second figure is reduced to less than the second preset area. In order to prevent the area of ​​the second figure from being reduced to insufficient area, the fourth figure is used to correct it so that its area is the same as that in the second figure, thereby obtaining a target corrected figure that meets the area requirements, fully considering the graphic environment of the second figure, solving the problem of insufficient area caused by the second adjustment, and avoiding product failure or reduced reliability. It not only solves the problem of insufficient area in the compensation process, but also ensures the accuracy of all design figures at the same time.

[0064] In one embodiment, in step S200, the step of performing a first adjustment on the first graphic includes: the first adjustment is a first special selective adjustment for enlarging the image.

[0065] Specifically, since the first adjustment is to adjust the first graphic that is smaller than the first preset area to a second graphic that is not smaller than the first area, it is necessary to enlarge the area of ​​the first graphic. The OPC software enlarges the area of ​​the first graphic to a certain extent by receiving the area enlargement instruction input by the user, thereby obtaining the second graphic. It is understandable that the first graphic includes multiple graphics, and the first adjustment will perform the first special selective adjustment to enlarge each graphic. The first special selective adjustment can only enlarge a certain side of the graphic or enlarge the area of ​​the graphic in proportion.

[0066] In one embodiment, in step S300, the step of performing a second adjustment on the second graphic and the design graphics other than the first graphic includes: the second adjustment is a second special selective adjustment for enlarging or shrinking.

[0067] Specifically, after obtaining the second graphic, the user can input a control instruction to cover the second graphic on the original design graphic, and obtain the design graphic after the first graphic is enlarged. Then, by inputting an area reduction instruction or an area increase instruction, a certain degree of area reduction or area increase is performed on a certain graphic in the design graphic after the area increase (that is, the second graphic and the design graphic other than the first graphic), thereby obtaining a pre-corrected graphic that has undergone a second special selective adjustment. It can be understood that the area reduction or area increase in the embodiment of the present application is to increase or shrink a specific edge in a certain graphic outwardly or inwardly, thereby adjusting the area size of the graphic.

[0068] In one embodiment, in step S500, the step of obtaining a non-overlapping graphic between the second graphic and the third graphic includes: performing an XOR operation on the second graphic and the third graphic to obtain the non-overlapping graphic.

[0069] Specifically, the user can input an XOR command to the OPC software. After receiving the XOR command, the OPC software will perform an XOR operation on the second graphic and the third graphic to obtain non-overlapping graphics in the second graphic and the third graphic, and then intercept the non-overlapping graphics as the deviation graphic.

[0070] In one embodiment, in step S600, the step of selecting a second graphic having a common edge with the deviation graphic from the second graphics as the fourth graphic includes: the second graphic having a common edge with the deviation graphic is a second graphic that completely covers the deviation graphic and has a common edge with the deviation graphic.

[0071] Specifically, in the embodiments of the present application, the third graphics selected from the pre-corrected graphics of the design graphics are all obtained after the area of ​​the second graphics is reduced. Therefore, the obtained deviation graphics are all parts of the second graphics. The second graphics completely cover the deviation graphics and have a common edge with the deviation graphics. At this time, the corresponding fourth graphics can be screened out. In some other embodiments, when the area of ​​the design graphics other than the first graphics is reduced, the third graphics obtained include graphics that are not reduced from the second graphics. At this time, the deviation graphics obtained include other graphics other than the second graphics, but the other graphics in the deviation graphics have no effect on the screening of the fourth graphics. The screened fourth graphics are part or all of the second graphics.

[0072] In one embodiment, in step S700, the step of obtaining the target correction figure of the design figure according to the fourth figure and the pre-correction figure of the design figure includes: performing an OR command on the fourth figure and the pre-correction figure of the design figure to obtain the target correction figure of the design figure.

[0073] Specifically, the user can input an OR command to the OPC software. After receiving the OR command, the OPC software will combine the fourth graphic and the pre-corrected graphic of the design graphic, so that the fourth graphic covers the part of the third graphic whose area is smaller than the second preset area in the pre-corrected graphic, so as to obtain the target corrected graphic. Since the fourth graphic is selected from the second graphic when correcting the third graphic, the second graphic after the first adjustment is still followed when correcting and compensating, and the compensation setting for the pre-corrected graphic is also more accurate.

[0074] In one embodiment, the first preset area is the same as the second preset area. Specifically, in general, the first preset area and the second preset area are exactly the same in size. In some other embodiments, when the graphics need to be fine-tuned, the first preset area and the second preset area may also be different.

[0075] In one embodiment, the first figure and / or the third figure are island figures. Specifically, in the embodiment of the present application, the first figure and / or the third figure selected by area are all island figures, that is, the present application only adjusts the area of ​​the island figure. In some other embodiments, when it is necessary to adjust the area of ​​other figures, other types of figures can also be selected.

[0076] The optical proximity correction method of the present application is described in detail below with a specific embodiment. Figure 2 As shown, firstly, the area of ​​the design figure to be modified is screened, and the first figure whose area is smaller than the first preset area is selected, which is recorded as I1, and the length of the top side of I1 is a. Figure 3 As shown, the first special selective adjustment of the area enlargement processing is performed on the first graphic I1 so that its area can reach the first preset area. The enlarged graphic is the second graphic, recorded as I2, where b is the enlarged size at the top of the graphic. The second special selective adjustment of the enlargement or reduction processing is performed on the second graphic I2 and the design graphics except the first graphic I1 to obtain a pre-corrected graphic, recorded as T1. Figure 4 As shown, the pre-corrected graphic T1 is then screened by area to obtain a third graphic whose area is smaller than the second preset area, which is recorded as I3, wherein the third graphic I3 is reduced in area during the second special selective adjustment, and c is the reduced size at the top of the graphic. Figure 5 As shown, for the second graph I2 and the third graph I3, the XOR command is used to select the graphs that do not overlap I2 and I3, and the deviation graph is obtained, which is recorded as P1. Figure 6As shown, the fourth figure in the second figure I2 that shares the same edge with the deviation figure P1 is selected, and is recorded as I4. Finally, the fourth figure I4 and the pre-corrected figure T1 are combined using the OR command to obtain the final target corrected figure, which is recorded as T2. It can be understood that the above figure only illustrates the correction process of one figure. In some other embodiments, there may be multiple second figures, third figures, and fourth figures. Through the optical proximity correction method of the embodiment of the present application, the reduction of the figure whose area is smaller than the second preset area after the second special selective adjustment is compensated, and the area increase of the first special selective adjustment is still followed during compensation, and the compensation setting of the figure is more accurate. It not only solves the problem of insufficient area in the compensation process, but also ensures the accuracy of all designed figures at the same time.

[0077] Based on the same inventive concept, the embodiment of the present application also provides an optical proximity correction device for implementing the optical proximity correction method involved above. The implementation solution provided by the device to solve the problem is similar to the implementation solution recorded in the above method, so the specific limitations in one or more optical proximity correction device embodiments provided below can refer to the limitations of the optical proximity correction method above, and will not be repeated here.

[0078] In one embodiment, Figure 7 As shown, the present application also proposes an optical proximity correction device, including: a first graphic filtering module 810, a graphic adjustment module 820, a second graphic filtering module 830 and a third graphic filtering module 840.

[0079] A first graphic screening module 810, for selecting a first graphic from the design graphics to be corrected, the area of ​​the first graphic being smaller than a first preset area;

[0080] The graphic adjustment module 820 is used to make a first adjustment to the first graphic to obtain a second graphic, wherein the area of ​​the second graphic is not less than the first preset area; and to make a second adjustment to the second graphic and the design graphic other than the first graphic to obtain a pre-corrected graphic of the design graphic;

[0081] A second graphic screening module 830, for selecting a third graphic from the pre-corrected graphic of the design graphic, the area of ​​the third graphic being smaller than the second preset area;

[0082] The third graphic screening module 840 is used to obtain non-overlapping graphics between the second graphic and the third graphic, and the non-overlapping graphics are deviation graphics; select a second graphic that has a common edge with the deviation graphic from the second graphic as the fourth graphic; and obtain a target correction graphic of the design graphic based on the fourth graphic and the pre-correction graphic of the design graphic.

[0083] In one embodiment, the present application also provides a mask, which is made of a target correction pattern obtained by the optical proximity correction method in the above embodiment.

[0084] In one embodiment, a computer device is provided, including a memory and a processor, wherein a computer program is stored in the memory, and the processor implements the steps in the above-mentioned method embodiments when executing the computer program.

[0085] In one embodiment, a computer-readable storage medium is provided, on which a computer program is stored. When the processor executes the computer program, the steps in the above-mentioned method embodiments are implemented.

[0086] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "specific embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example.

[0087] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0088] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. An optical proximity correction method, It is characterized in that include: Selecting a first graphic from the design graphics to be corrected, wherein the area of ​​the first graphic is smaller than a first preset area; Performing a first adjustment on the first graphic to obtain a second graphic, wherein the area of ​​the second graphic is not less than the first preset area; Performing a second adjustment on the second graphic and the design graphic except the first graphic to obtain a pre-corrected graphic of the design graphic; Selecting a third graphic from the pre-corrected graphics of the design graphic, wherein the area of ​​the third graphic is smaller than the second preset area; Acquire a non-overlapping graph between the second graph and the third graph, wherein the non-overlapping graph is a deviation graph; Selecting a second figure having a common edge with the deviation figure from the second figure as a fourth figure; A target correction pattern of the design pattern is obtained according to the fourth pattern and the pre-correction pattern of the design pattern.

2. The optical proximity correction method according to claim 1, It is characterized in that The step of adjusting the first graphic for the first time comprises: The first adjustment is a first special selective adjustment for enlargement.

3. The optical proximity correction method according to claim 1, It is characterized in that The step of performing a second adjustment on the second graphic and the design graphic other than the first graphic comprises: The second adjustment is a second special selective adjustment for enlarging or shrinking.

4. The optical proximity correction method according to claim 1, It is characterized in that The step of obtaining a non-overlapping graphic between the second graphic and the third graphic comprises: An XOR operation is performed on the second graph and the third graph to obtain the non-overlapping graph.

5. The optical proximity correction method according to claim 1, It is characterized in that The step of selecting a second graphic having a common edge with the deviation graphic from the second graphic as the fourth graphic comprises: The second graphic having a common edge with the deviation graphic is a second graphic that completely covers the deviation graphic and has a common edge with the deviation graphic.

6. The optical proximity correction method according to claim 1, It is characterized in that The step of obtaining a target corrected pattern of the design pattern according to the fourth pattern and the pre-corrected pattern of the design pattern comprises: An OR command is performed on the fourth pattern and the pre-correction pattern of the design pattern to obtain a target corrected pattern of the design pattern.

7. The optical proximity correction method according to any one of claims 1 to 6, It is characterized in that The first preset area is the same as the second preset area.

8. The optical proximity correction method according to claim 7, It is characterized in that The first graphic and / or the third graphic is an island graphic.

9. An optical proximity correction device, It is characterized in that include: A first graphic screening module, used for selecting a first graphic from the design graphics to be corrected, wherein the area of ​​the first graphic is smaller than a first preset area; A graphic adjustment module, used for performing a first adjustment on the first graphic to obtain a second graphic, wherein the area of ​​the second graphic is not less than the first preset area; Performing a second adjustment on the second graphic and the design graphic except the first graphic to obtain a pre-corrected graphic of the design graphic; A second graphic screening module, used for selecting a third graphic from the pre-corrected graphic of the design graphic, wherein the area of ​​the third graphic is smaller than the second preset area; The third graphic screening module is used to obtain a non-overlapping graphic between the second graphic and the third graphic, wherein the non-overlapping graphic is a deviation graphic; select a second graphic having a common edge with the deviation graphic from the second graphic as a fourth graphic; and obtain a target correction graphic of the design graphic based on the fourth graphic and a pre-correction graphic of the design graphic.

10. A mask plate, It is characterized in that The mask is made of a target correction pattern obtained by the optical proximity correction method according to any one of claims 1 to 9.

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