Glass etching liquid and glass etching method

Abstract

The invention provides a glass etching solution and a glass etching method. The glass etching solution comprises the following raw materials in parts by weight: 20-40 parts of fluoride, 5-10 parts of organic acid, 15-20 parts of hydrochloric acid, 1-5 parts of a surfactant, 1-3 parts of carboxymethyl cellulose, 1-5 parts of polyol, 1-1.5 parts of triethanolamine and 80-100 parts of water. Wherein the fluoride is a mixture of potassium fluoride, sodium fluoride and ammonium fluosilicate in a mass ratio of 1: 1: (0.4-0.7). The fluoride of the glass etching liquid is prepared by matching potassium fluoride, sodium fluoride and ammonium fluosilicate, the ammonium fluosilicate is hydrolyzed in the etching liquid to generate certain SiF6 < 2-> ions to slow down the etching reaction speed, the potassium fluoride and the sodium fluoride mainly provide fluorine ions, and the fluorine ions and hydrogen ions of organic acid and hydrochloric acid form hydrofluoric acid to etch glass; and meanwhile, the carboxymethyl cellulose, the polyhydric alcohol and the triethanolamine are matched, so that the etching uniformity is improved.

Description

Technical Field

[0001] The invention belongs to the technical field of glass etching, and in particular relates to a glass etching liquid and a glass etching method. Background Art

[0002] Glass is widely used in daily life due to its high strength, excellent optical properties, and good long-term working stability. Nowadays, glass materials are widely used in electronic products such as mobile phones, tablets, and LCD screens. Glass substrates are used as components of touch panels and cover glasses for protecting image display panels. In the production process of glass, the glass substrate needs to be etched and thinned. During the thinning process, the glass substrate needs to be immersed in a reaction tank containing glass etching liquid to react until the glass is thinned to the target thickness. Some glass etching liquids have a fast etching rate, which is prone to problems such as uneven etching and high defective rate of concave and convex points. Summary of the invention

[0003] In view of this, the present invention aims to provide a glass etching solution and a glass etching method to solve the above problems.

[0004] To achieve the above object, the technical solution of the present invention is achieved as follows:

[0005] A glass etching solution comprises the following raw materials in parts by weight: 20-40 parts of fluoride, 5-10 parts of organic acid, 15-20 parts of hydrochloric acid, 1-5 parts of surfactant, 1-3 parts of carboxymethyl cellulose, 1-5 parts of polyol, 1-1.5 parts of triethanolamine and 80-100 parts of water; wherein the fluoride is a mixture of potassium fluoride, sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:1:(0.4-0.7).

[0006] Furthermore, the organic acid is tartaric acid and oxalic acid in a mass ratio of 1:(1.5-3).

[0007] Furthermore, the surfactant is a nonionic surfactant.

[0008] Furthermore, the nonionic surfactant is one or more of sorbitan fatty acid, polysorbate, and polyoxyethylene fatty acid ester.

[0009] Furthermore, the polyol is glycerol and / or xylitol.

[0010] Furthermore, the polyol is glycerol and xylitol in a mass ratio of (2-3):1.

[0011] Furthermore, the mass percentage of HCl in the hydrochloric acid is 20 to 30%.

[0012] The present invention also provides a glass etching method, which comprises the following steps:

[0013] 1) Clean the glass to be etched with a cleaning agent and pure water in turn and dry it;

[0014] 2) immersing the glass in the etching solution as described in any one of claims 1 to 7, controlling the temperature of the etching solution to 40-50° C. and the etching time to 3-6 hours;

[0015] 3) Take out the glass and rinse it with clean water, then put it into the drying oven to dry and then take it out.

[0016] Compared with the prior art, the glass etching liquid and glass etching method of the present invention have the following advantages:

[0017] The fluoride in the glass etching solution of the present invention is prepared by combining potassium fluoride, sodium fluoride and ammonium fluorosilicate. Ammonium fluorosilicate is hydrolyzed in the etching solution to produce a certain amount of SiF6 2- Ions slow down the etching reaction speed. Potassium fluoride and sodium fluoride mainly provide fluoride ions. Fluoride ions react with hydrogen ions of organic acids and hydrochloric acid to form hydrofluoric acid to etch the glass. At the same time, carboxymethyl cellulose, polyols and triethanolamine are used to improve the uniformity of etching. DETAILED DESCRIPTION

[0018] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.

[0019] The following will be combined with the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0020] Example 1

[0021] A glass etching liquid comprises the following raw materials in parts by weight: 20 parts of fluoride, 5 parts of organic acid, 15 parts of hydrochloric acid, 2 parts of surfactant, 1 part of carboxymethyl cellulose, 1 part of polyol, 1 part of triethanolamine and 80 parts of water; wherein the fluoride is a mixture of potassium fluoride, sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:1:0.5, the organic acid is tartaric acid and oxalic acid in a mass ratio of 1:1.5, the mass percentage of HCl in the hydrochloric acid is 25%, the surfactant is fatty acid sorbitan, and the polyol is glycerol and xylitol in a mass ratio of 2:1.

[0022] The glass etching method comprises the following steps:

[0023] 1) Clean the glass to be etched with a cleaning agent and pure water in turn and dry it;

[0024] 2) Immerse the glass in the above etching solution, control the temperature of the etching solution to 50° C., and the etching time to 4 hours;

[0025] 3) Take out the glass and rinse it with clean water, then put it into the drying oven to dry and then take it out.

[0026] Example 2

[0027] A glass etching liquid comprises the following raw materials in parts by weight: 30 parts of fluoride, 8 parts of organic acid, 17 parts of hydrochloric acid, 3 parts of surfactant, 1.5 parts of carboxymethyl cellulose, 3 parts of polyol, 1.3 parts of triethanolamine and 90 parts of water; wherein the fluoride is a mixture of potassium fluoride, sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:1:0.6, the organic acid is tartaric acid and oxalic acid in a mass ratio of 1:2, the mass percentage of HCl in the hydrochloric acid is 25%, the surfactant is polysorbate, and the polyol is glycerol and xylitol in a mass ratio of 2.5:1.

[0028] The glass etching method comprises the following steps:

[0029] 1) Clean the glass to be etched with a cleaning agent and pure water in turn and dry it;

[0030] 2) Immerse the glass in the above etching solution, control the temperature of the etching solution to 50° C., and the etching time to 5 hours;

[0031] 3) Take out the glass and rinse it with clean water, then put it into the drying oven to dry and then take it out.

[0032] Example 3

[0033] A glass etching liquid comprises the following raw materials in parts by weight: 40 parts of fluoride, 10 parts of organic acid, 20 parts of hydrochloric acid, 5 parts of surfactant, 3 parts of carboxymethyl cellulose, 5 parts of polyol, 1.5 parts of triethanolamine and 100 parts of water; wherein the fluoride is a mixture of potassium fluoride, sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:1:0.7, the organic acid is tartaric acid and oxalic acid in a mass ratio of 1:3, the mass percentage of HCl in the hydrochloric acid is 30%, the surfactant is fatty acid sorbitan and polysorbate, and the polyol is glycerol and xylitol in a mass ratio of 3:1.

[0034] The glass etching method comprises the following steps:

[0035] 1) Clean the glass to be etched with a cleaning agent and pure water in turn and dry it;

[0036] 2) Immerse the glass in the above etching solution, control the temperature of the etching solution to 45°C, and the etching time to 3 hours;

[0037] 3) Take out the glass and rinse it with clean water, then put it into the drying oven to dry and then take it out.

[0038] Comparative Example 1

[0039] The difference from Example 1 is that the fluoride is a mixture of potassium fluoride, sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:1:1.

[0040] Comparative Example 2

[0041] The difference from Example 1 is that the fluoride is a mixture of potassium fluoride and sodium fluoride in a mass ratio of 1:1.

[0042] Comparative Example 3

[0043] The difference from Example 1 is that the fluoride is a mixture of potassium fluoride and ammonium fluorosilicate in a mass ratio of 1:0.5.

[0044] Comparative Example 4

[0045] The difference from Example 1 is that the fluoride is a mixture of sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:0.5.

[0046] Comparative Example 5

[0047] The difference from Example 1 is that the fluoride is a mixture of calcium fluoride, sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:1:0.5.

[0048] Comparative Example 6

[0049] The difference from Example 1 is that the fluoride is a mixture of potassium fluoride, sodium fluoride and potassium fluorosilicate in a mass ratio of 1:1:0.5.

[0050] Comparative Example 7

[0051] The difference from Example 1 is that the organic acid is tartaric acid and oxalic acid in a mass ratio of 1:1.

[0052] Comparative Example 8

[0053] The difference from Example 1 is that the organic acid is tartaric acid.

[0054] Comparative Example 9

[0055] The difference from Example 1 is that the organic acid is oxalic acid.

[0056] Comparative Example 10

[0057] The difference from Example 1 is that the organic acid is citric acid and oxalic acid in a mass ratio of 1:1.5.

[0058] Comparative Example 11

[0059] The difference from Example 1 is that the polyols are glycerol and xylitol in a mass ratio of 1:1.

[0060] Comparative Example 12

[0061] The difference from Example 1 is that the polyol is glycerol.

[0062] Comparative Example 13

[0063] The difference from Example 1 is that the polyol is xylitol.

[0064] Comparative Example 14

[0065] The difference from Example 1 is that the polyols are glycerol and sorbitol in a mass ratio of 2:1.

[0066] Comparative Example 15

[0067] The difference from Example 1 is that no triethanolamine is added.

[0068] Comparative Example 16

[0069] The difference from Example 1 is that carboxymethyl cellulose was not added.

[0070] Comparative Example 17

[0071] The difference from Example 1 is that no polyol is added.

[0072] The glass etched by the etching solutions of the above embodiments and comparative examples was tested and evaluated. The uniformity, light transmittance, haze and roughness of the etched glass were measured, as well as the appearance evaluation. The test results are shown in Table 1 below.

[0073] Table 1 Comparison of glass conditions after etching

[0074]

[0075]

[0076]

[0077] It can be seen from the comparison in the above table that the glass surface etched by the etching solution prepared according to the formula of the present invention is smoother and the defective rate of concave and convex points is reduced.

[0078] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A glass etching solution, characterized in that: The invention comprises the following raw materials in parts by weight: 20-40 parts of fluoride, 5-10 parts of organic acid, 15-20 parts of hydrochloric acid, 1-5 parts of surfactant, 1-3 parts of carboxymethyl cellulose, 1-5 parts of polyol, 1-1.5 parts of triethanolamine and 80-100 parts of water; wherein the fluoride is a mixture of potassium fluoride, sodium fluoride and ammonium fluorosilicate in a mass ratio of 1:1:(0.4-0.7).

2. The glass etching liquid according to claim 1, characterized in that: The organic acid is tartaric acid and oxalic acid in a mass ratio of 1:(1.5-3).

3. The glass etching solution according to claim 1, characterized in that: The surfactant is a nonionic surfactant.

4. The glass etching liquid according to claim 3, characterized in that: The nonionic surfactant is one or more of sorbitan fatty acid, polysorbate, and polyoxyethylene fatty acid ester.

5. The glass etching solution according to claim 1, characterized in that: The polyol is glycerol and / or xylitol.

6. The glass etching liquid according to claim 5, characterized in that: The polyol is glycerol and xylitol in a mass ratio of (2-3):

1.

7. The glass etching liquid according to claim 1, characterized in that: The mass percentage of HCl in hydrochloric acid is 20-30%.

8. A glass etching method, characterized in that: The method comprises the following steps: 1) Clean the glass to be etched with a cleaning agent and pure water in turn and dry it; 2) immersing the glass in the etching solution as described in any one of claims 1 to 7, controlling the temperature of the etching solution to 40-50° C. and the etching time to 3-6 hours; 3) Take out the glass and rinse it with clean water, then put it into the drying oven to dry and then take it out.

Images