Ion beam etching control system
By introducing safety detection, input, control and output modules into the ion beam etching control system, the problem of not being able to stop the ion source power supply and neutralizer power supply when the PLC control module fails, achieving safety in the case of PLC failure Control reduces work safety risks.
Patent Information
- Application Number
- CN202411445135.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-15
- Publication Date
- 2025-01-07
AI Technical Summary
The ion beam etching device cannot control the power supply of the ion source power supply and the neutralizer power supply when the PLC control module fails, which poses a working safety hazard.
An ion beam etching control system was designed, including a safety detection module, a PLC control module, a safety input module, a safety control module and a safety output module. The safety detection module detects the safe operation signal of ion beam etching, and the PLC control module is connected. The external power grid is used to obtain power and control the safety output module through the safety input module and the safety control module to ensure that the power supply of the ion source power supply and the neutralizer power supply can still be stopped when the PLC control module fails.
It effectively reduces the operating safety hazards of ion beam etching equipment, ensures that the power supply of the ion source power supply and the neutralizer power supply can be safely controlled when the PLC control module fails, and improves the safety of the equipment.
Smart Images
Figure CN119270758A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of ion beam etching, in particular to an ion beam etching control system. Background Art
[0002] With the development of semiconductor integrated circuits and optoelectronic devices, the requirements for fine pattern etching are getting higher and higher. The isotropy of the traditional wet etching process cannot achieve the etching of small line width images. The dry etching technology is becoming more and more mature, and its good anisotropic etching characteristics make dry etching widely used in semiconductors. Ion beam etching is a type of dry etching. In addition, with the popularization of PLC (Programmable Logic Controller) modularization, the PLC control module plays a leading role in the control application of equipment.
[0003] In the related art, a PLC control module is used in the control system of an ion beam etching device to obtain detection signals from various sensors in the ion beam etching operation, and outputs a control signal after performing relatively complex logic processing on the detection signal to control the power supply of the ion source power supply and the neutralizer power supply. For example, the PLC control module obtains the air pressure signal detected by the air pressure sensor, compares the air pressure signal with a preset value, determines whether the air pressure is normal, and outputs a control signal in the case of abnormal air pressure to control the stopping of the power supply of the ion source power supply and the neutralizer power supply, thereby realizing safe operation control of the ion beam etching equipment.
[0004] However, in the event of a failure of the PLC control module, it is impossible to control the ion source power supply and the neutralizer power supply to stop supplying power. Therefore, there are hidden dangers to the safety of ion beam etching. Summary of the invention
[0005] The technical problem to be solved by the embodiments of the present invention is to provide an ion beam etching control system to solve the problem in the prior art that when the PLC control module of the ion beam etching equipment fails, it is impossible to control the stopping of the power supply of the ion source power supply and the neutralizer power supply, resulting in a potential safety hazard in the ion beam etching operation.
[0006] The present invention discloses an ion beam etching control system, comprising a safety detection module, a PLC control module, a safety input module, a safety control module, a safety output module, an ion source power supply and a neutralizer power supply, wherein the safety detection module is used to detect a safety operation signal of ion beam etching, the PLC control module is connected to an external power grid to obtain electrical energy, and the PLC control module controls the power supply of the ion source power supply and the neutralizer power supply according to the safety operation signal, the safety input module transmits a corresponding status signal to the safety control module based on the safety operation signal, and the safety control module controls the working state of the safety output module based on the status signal to control the power supply of the ion source power supply and the neutralizer power supply.
[0007] Optionally, the safety detection module includes a first relay, a first power supply and a photoelectric sensor, the photoelectric sensor is used to detect the covering state of the etching chassis cover, the photoelectric sensor has a built-in phototransistor, the first input end of the first relay is connected to the emitter of the phototransistor, the second input end of the first relay is connected to the negative electrode of the first power supply, the positive electrode of the first power supply is connected to the collector of the phototransistor, the photoelectric sensor is also connected to the PLC control module, the safety input module includes a second power supply and a first light-emitting diode, the negative electrode of the first light-emitting diode is connected to the first output end of the first relay, the positive electrode of the first light-emitting diode is connected to the positive electrode of the second power supply, the negative electrode of the second power supply is connected to the second output end of the first relay, and the safety control module controls the working state of the safety output module according to the state light signal of the first light-emitting diode.
[0008] Optionally, the safety detection module also includes an emergency stop button, and the safety input module also includes a third power supply and a second light-emitting diode, the positive pole of the third power supply is connected to the positive pole of the second light-emitting diode, the negative pole of the third power supply is connected to one end of the emergency stop button, and the other end of the emergency stop button is connected to the negative pole of the second light-emitting diode, and the two ends of the emergency stop button are also connected to the PLC control module, and the safety control module controls the working state of the safety output module according to the status light signals of the first light-emitting diode and the second light-emitting diode.
[0009] Optionally, the safety output module includes a fourth power supply and a second relay, and the ion beam etching control system also includes a power supply switch unit for turning on or off the power supply, the power supply switch unit is connected to the ion source power supply and the neutralizer power supply, the first end of the power supply switch unit is connected to the first output end of the second relay, the second end of the power supply switch unit is connected to the negative pole of the fourth power supply, the second output end of the second relay is connected to the positive pole of the fourth power supply, and the first input end and the second input end of the second relay are both connected to the safety control module.
[0010] Optionally, the safety output module also includes a comparison unit and an ammeter, the first end of the ammeter is connected to the positive pole of the fourth power supply, the second end is connected to the second output end of the second relay, the output end of the ammeter is connected to the comparison unit, and the comparison unit is used to compare the current data of the ammeter with a preset current value and transmit the comparison result to the safety control module.
[0011] Optionally, the ion beam etching control system further includes a bus communication module and at least one functional module, and the PLC control module is communicatively connected with the functional module via the bus communication module.
[0012] Optionally, the bus communication module includes at least one Devicenet bus and at least one EtherCAT bus, and the PLC control module is communicatively connected with one of the functional modules via one Devicenet bus or one EtherCAT bus.
[0013] Optionally, the functional module includes one of a process gas control unit, a vacuum pressure detection unit, a gas valve control unit, and a servo control unit.
[0014] Optionally, the ion beam etching control system includes a serial communication module, and the PLC control module is communicatively connected with the ion source power supply and the neutralizer power supply via the serial communication module.
[0015] Optionally, the ion beam etching control system further includes an uninterruptible power supply, and the uninterruptible power supply is used to supply power to the PLC control module.
[0016] Compared with the prior art, the beneficial effect of the ion beam etching control system provided by the embodiment of the present invention is that: a PLC control module is set to control the power supply of the ion source power supply and the neutralizer power supply according to the safety operation signal of the ion beam etching detected by the safety detection module, and an independently operated safety input module, a safety control module and a safety output module are additionally set. The safety input module transmits a corresponding status signal to the safety control module based on the safety operation signal, and the safety control module controls the working state of the safety output module based on the status signal to control the power supply of the ion source power supply and the neutralizer power supply. Therefore, in the event of failure of the PLC control module, the safety input module, the safety control module and the safety output module can cooperate to control the stopping of the power supply of the ion source power supply and the neutralizer power supply, thereby reducing the safety hazards of ion beam etching operations. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] The technical solution of the present invention will be further described in detail below with reference to the accompanying drawings and embodiments, in which:
[0018] Figure 1 It is a structural block diagram of an embodiment of the ion beam etching control system provided by the present invention;
[0019] Figure 2 is a structural block diagram of another embodiment of the ion beam etching control system provided by the present invention;
[0020] Figure 3 It is a schematic diagram of a partial circuit principle of an embodiment of the connection between the safety input module and the safety detection module provided by the present invention;
[0021] Figure 4 It is another part of the circuit principle schematic diagram of an embodiment of the connection between the safety input module and the safety detection module provided by the present invention;
[0022] Figure 5 The invention is a schematic diagram of a circuit principle of an embodiment of the connection between the safety output module and the power supply switch unit.
[0023] The reference numerals in the figures are:
[0024] 110. Safety detection module; 111. First relay; 112. First power supply; 113. Photoelectric sensor; 1131. Phototransistor; 114. Emergency stop button; 120. PLC control module; 130. Safety input module; 131. Second power supply; 132. First light emitting diode; 133. Third power supply; 134. Second light emitting diode; 140. Safety control module; 150. Safety output module; 151. Fourth power supply; 152. Second relay; 153. Ammeter; 160. Ion source power supply; 170. Neutralizer power supply; 180. Power supply switch unit; 190. Bus communication module; 210. Functional module; 220. Serial communication module; 230. Uninterruptible power supply; 240. Analog module; 250. IO module. DETAILED DESCRIPTION
[0025] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. Now, in conjunction with the accompanying drawings, a preferred embodiment of the present invention is described in detail.
[0026] The embodiment of the present invention provides an ion beam etching control system, such as Figure 1 As shown, the ion beam etching control system includes a safety detection module 110, a PLC control module 120, a safety input module 130, a safety control module 140, a safety output module 150, an ion source power supply 160 and a neutralizer power supply 170, wherein the safety detection module 110 is used to detect the safety operation signal of the ion beam etching, the PLC control module 120 is connected to the external power grid to obtain electrical energy, and the PLC control module 120 controls the power supply of the ion source power supply 160 and the neutralizer power supply 170 according to the safety operation signal, the safety input module 130 transmits the corresponding status signal to the safety control module 140 based on the safety operation signal, and the safety control module 140 controls the working state of the safety output module 150 based on the status signal to control the power supply of the ion source power supply 160 and the neutralizer power supply 170.
[0027] The present application sets up a PLC control module 120 to control the power supply of the ion source power supply 160 and the neutralizer power supply 170 according to the safety operation signal of ion beam etching detected by the safety detection module 110, and also additionally sets up an independently operated safety input module 130, a safety control module 140 and a safety output module 150. The safety input module 130 transmits a corresponding status signal to the safety control module 140 based on the safety operation signal, and the safety control module 140 controls the working state of the safety output module 150 based on the status signal to control the power supply of the ion source power supply 160 and the neutralizer power supply 170. Therefore, when the PLC control module 120 fails, the safety input module 130, the safety control module 140 and the safety output module 150 can cooperate to control the stopping of the power supply of the ion source power supply 160 and the neutralizer power supply 170, thereby reducing the safety hazards of ion beam etching operations.
[0028] The PLC control module 120 can also communicate with the safety control module 140 to obtain the input status of the safety input module 130 and the output status of the safety output module 150, and remind the staff to perform maintenance when errors occur in the safety input module 130 and the safety output module 150.
[0029] refer to Figure 1 and Figure 3 In an optional embodiment of the present application, the safety detection module 110 includes a first relay 111, a first power supply 112 and a photoelectric sensor 113. The photoelectric sensor 113 is used to detect the covering state of the etching chassis cover. The photoelectric sensor 113 has a built-in phototransistor 1131. The first input end of the first relay 111 is connected to the emitter of the phototransistor 1131, the second input end of the first relay 111 is connected to the negative electrode of the first power supply 112, the positive electrode of the first power supply 112 is connected to the collector of the phototransistor 1131, and the photo The electrical sensor 113 is also connected to the PLC control module 120. The safety input module 130 includes a second power supply 131 and a first light-emitting diode 132. The cathode of the first light-emitting diode 132 is connected to the first output end of the first relay 111. The anode of the first light-emitting diode 132 is connected to the anode of the second power supply 131. The cathode of the second power supply 131 is connected to the second output end of the first relay 111. The safety control module 140 controls the working state of the safety output module 150 according to the state light signal of the first light-emitting diode 132.
[0030] Photoelectric sensor 113 is a sensor that uses the properties of light to detect the presence, position, color, distance or other properties of an object. Photoelectric sensor 113 measures through light without physical contact with the target object, and can respond to changes in light signals in a very short time.
[0031] The photoelectric sensor 113 is used to detect the cover state of the etching chassis cover, and the detection is sensitive, and it can quickly detect whether the chassis cover of the ion beam etching equipment is covered during the ion beam etching process. Specifically, when the chassis cover is in a covered state, the light signal emitted by the photoelectric sensor 113 can be reflected by the chassis cover, and the photosensitive transistor 1131 built into the photoelectric sensor 113 can receive the reflected light signal, thereby being in a conducting state. If the chassis cover is in an open state, the light signal emitted by the photoelectric sensor 113 cannot be reflected by the chassis cover, and the photosensitive transistor 1131 built into the photoelectric sensor 113 does not receive the reflected light signal, and is in a cut-off state. The photoelectric sensor 113 can transmit the detection signal to the PLC control module 120, and the PLC control module 120 controls the power supply of the ion source power supply 160 and the neutralizer power supply 170 according to the detection signal.
[0032] The phototransistor 1131 built into the photoelectric sensor 113 acts as a switch in the safety detection module 110. When the photoelectric sensor 113 emits light and when the phototransistor 1131 receives a light signal, the phototransistor 1131 is turned on, connecting the path between the positive pole of the first power supply 112 and the first input end of the first relay 111, and the first relay 111 operates normally, thereby connecting the loop connecting the first light-emitting diode 132 and the second power supply 131, so that the light-emitting diode emits light normally. The safety control module 140 receives the light signal and controls the safety output module 150 to operate normally, so as to control the normal power supply of the ion source power supply 160 and the neutralizer power supply 170. When the phototransistor 1131 does not receive the light signal, the phototransistor 1131 is in the cut-off state, the path between the positive pole of the first power supply 112 and the first input end of the first relay 111 is disconnected, the first relay 111 cannot work normally and is in the normally open state, the loop connecting the first light-emitting diode 132 and the second power supply 131 is disconnected, the light-emitting diode does not work, the safety control module 140 does not receive the light signal of the first light-emitting diode 132, and controls the safety output module 150 to stop working, so as to control the power supply of the ion source power supply 160 and the neutralizer power supply 170 to be cut off.
[0033] The safety input module 130 and the safety detection module 110 realize the input of the chassis cover closing signal in the ion beam etching safety operation signal in the form of a relay, and the passive contact signal is connected, which can play a role in signal isolation. The safety input module 130 relies on its own second power supply 131, and the signal transmission is more stable and accurate.
[0034] refer to Figure 1 and Figure 4The safety detection module 110 also includes an emergency stop button 114, and the safety input module 130 also includes a third power supply 133 and a second light-emitting diode 134. The positive electrode of the third power supply 133 is connected to the positive electrode of the second light-emitting diode 134, and the negative electrode of the third power supply 133 is connected to one end of the emergency stop button 114. The other end of the emergency stop button 114 is connected to the negative electrode of the second light-emitting diode 134. Both ends of the emergency stop button 114 are also connected to the PLC control module 120. The safety control module 140 also controls the working state of the safety output module 150 according to the status light signals of the first light-emitting diode 132 and the second light-emitting diode 134.
[0035] In an emergency, the staff can press the emergency stop button 114 to stop the ion beam etching operation urgently. When the emergency stop button 114 is not pressed, the third power supply 133 and the second light-emitting diode 134 form a loop, the second light-emitting diode 134 works normally, and the safety control module 140 can receive the optical signal of the second light-emitting diode 134. The safety control module 140 controls the working state of the safety output module 150 according to the optical signal of the first light-emitting diode 132 and the second light-emitting diode 134 to control the power supply of the ion source power supply 160 and the neutralizer power supply 170. When the emergency stop button 114 is pressed, the third power supply 133 and the second light-emitting diode 134 do not form a loop, the second light-emitting diode 134 does not work, the safety control module 140 does not receive the optical signal of the second light-emitting diode 134, and the safety control module 140 controls to stop the power supply of the ion source power supply 160 and the neutralizer power supply 170.
[0036] Among them, when the first light-emitting diode 132 and the second light-emitting diode 134 are working normally, it means that the emergency stop button 114 has not been pressed and the chassis cover is in a closed state, then the sub-source power supply and the neutralizer power supply 170 can supply power normally. When one of the first light-emitting diode 132 and the second light-emitting diode 134 is not working normally, it indicates an abnormality and it is necessary to stop the power supply of the ion source power supply 160 and the neutralizer power supply 170. Therefore, the safety control module 140 can control the power supply of the ion source power supply 160 and the neutralizer power supply 170 according to the status light signals of the first light-emitting diode 132 and the second light-emitting diode 134. Specifically, the safety control module 140 controls the power supply of the ion source power supply 160 and the neutralizer power supply 170 according to the state light signal of the first light emitting diode 132 and the second light emitting diode 134. The safety input module 130 may include a photodiode and a main control chip. The photodiode converts the light signal of the first light emitting diode 132 and the second light emitting diode 134 into an electrical signal. The main control chip converts the electrical signal into a digital signal. The digital signal is the state light signal. The safety control module 140 performs AND or NOR logic operations on the state light signals corresponding to the first light emitting diode 132 and the second light emitting diode 134, outputs a control signal to the safety output module 150, controls the working state of the safety output module 150, and further controls the power supply of the ion source power supply 160 and the neutralizer power supply 170. The safety control module 140 may use an existing chip or a combination of multiple logic gates to implement the AND or NOR logic operations of the state light signal.
[0037] The emergency stop button 114 is also connected to the PLC control module 120 , and the PLC control module 120 can also control the stopping of the power supply of the ion source power supply 160 and the neutralizer power supply 170 according to the pressing signal of the emergency stop button 114 .
[0038] In the safety control module 140 and the safety input module 130, the pressing signal of the emergency stop button 114 is transmitted through the optical signal of the second light-emitting diode 134, realizing transmission with a passive contact signal, rather than directly connecting and transmitting with the safety control module 140, thereby playing a role of signal isolation, and its power supply is supplied by the third power supply 133 of the safety input module 130, so the signal is more stable and accurate.
[0039] It can be seen from the above that in the event of failure of the PLC control module 120 , the power supply of the ion source power supply 160 and the neutralizer power supply 170 can still be controlled by the safety input module 130 , the safety control module 140 and the safety output module 150 .
[0040] Further, refer to Figure 1 and Figure 5The safety output module 150 includes a fourth power supply 151 and a second relay 152. The ion beam etching control system also includes a power supply switch unit 180 for turning on or off the power supply. The power supply switch unit 180 is connected to the ion source power supply 160 and the neutralizer power supply 170. The first end of the power supply switch unit 180 is connected to the first output end of the second relay 152, the second end of the power supply switch unit 180 is connected to the negative pole of the fourth power supply 151, the second output end of the second relay 152 is connected to the positive pole of the fourth power supply 151, and the first input end and the second input end of the second relay 152 are both connected to the safety control module 140.
[0041] The power supply switch unit 180 is used to turn on or off the power supply, that is, to turn on or off the power supply of the ion source power supply 160 and the neutralizer power supply 170. The power supply switch unit 180 can specifically use switch actuators such as relays and AC contactors to turn on or off the power supply of the ion source power supply 160 and the neutralizer power supply 170.
[0042] By setting the second relay 152 and the fourth power supply 151 and connecting them to the power supply switch unit 180, when the second relay 152 works normally, the second relay 152, the power supply switch unit 180 and the fourth power supply 151 form a loop, and the fourth power supply 151 outputs a DC voltage to drive the power supply switch unit 180 to work normally, so that the ion source power supply 160 and the neutralizer power supply 170 are powered normally; when the second relay 152 stops working and is in a normally open state, the second relay 152, the power supply switch unit 180 and the fourth power supply 151 do not form a loop, the power supply switch unit 180 is not driven by a DC voltage and cannot work normally, so that the ion source power supply 160 and the neutralizer power supply 170 stop supplying power normally.
[0043] By controlling the operation of the second relay 152 to indirectly control the operation of the power switch unit 180, and then controlling the power supply of the ion source power supply 160 and the neutralizer power supply 170, the power supply can be quickly cut off or started when needed, so as to quickly respond to failures or dangerous situations and ensure the safety of equipment and operators. The connection output between the safety output module 150 and the power switch unit 180 is a two-wire output, so that the controlled power switch unit 180 is independent of other components. The fourth power supply 151 provides independent power supply for the power switch unit 180. When the main power supply of the system fails, the power switch unit 180 can still work normally, which improves the overall stability of the system.
[0044] refer to Figure 1 and Figure 5The safety output module 150 also includes a comparison unit and an ammeter 153. The first end of the ammeter 153 is connected to the positive pole of the fourth power supply 151, and the second end is connected to the second output end of the second relay 152. The output end of the ammeter 153 is connected to the comparison unit. The comparison unit is used to compare the current data of the ammeter 153 with the preset current value and transmit the comparison result to the safety control module 140.
[0045] By setting the ammeter 153 and the comparison unit, the ammeter 153 can detect the current value of the loop formed by the second relay 152, the fourth power supply 151 and the power switch unit 180. The comparison unit compares the detected current value with the preset current value to determine whether the loop is faulty. The safety control module 140 can control the operation of the second relay 152 according to the comparison result. Through the ammeter 153 and the comparison unit, the current of the loop can be effectively monitored, further improving the safety of the ion beam etching operation.
[0046] During specific implementation, the comparison unit may use an existing chip or comparator circuit to compare the detected current value with the preset current value and output a comparison result.
[0047] refer to Figure 2 The ion beam etching control system further includes a bus communication module 190 and at least one functional module 210 , and the PLC control module 120 is connected to the functional module 210 for communication via the bus communication module 190 .
[0048] By setting the bus communication module 190, the PLC control module 120 can communicate with at least one functional module 210 through the bus communication module 190, especially multiple functional modules 210, and the communication wiring between multiple functional modules 210 and the PLC control module 120 can be centrally managed. The bus communication method provides a high degree of scalability and flexibility. The extended functional module 210 can be easily added to the existing bus communication module 190 without large-scale modification of the physical layout of the entire system, which makes system upgrades and maintenance easier and more efficient. In addition, the bus communication module 190 has a low communication delay, and can obtain the data of each functional module 210 in a timely and accurate manner, thereby improving the yield of the ion beam etching process.
[0049] Specifically, the bus communication module 190 includes at least one Devicenet bus and at least one EtherCAT bus, and the PLC control module 120 is communicatively connected with one functional module 210 via one Devicenet bus or one EtherCAT bus.
[0050] DeviceNet is an industrial network protocol based on the CAN (Controller Area Network) bus, mainly used in the field of industrial automation. It uses standard, low-cost cables to transmit data and power, allowing data and power to be transmitted through the same cable, simplifying the wiring requirements of industrial sites and reducing the need for additional power wiring. The DeviceNet bus has strong anti-interference capabilities, ensuring stable signal transmission and reducing the risk of data errors and communication interruptions. The DeviceNet network can be easily expanded, and adding new functional modules or nodes does not require significant changes to the existing network architecture.
[0051] EtherCAT is a high-performance industrial network protocol based on Ethernet. Designed for real-time industrial applications, EtherCAT uses standard Ethernet hardware to achieve extremely high data transmission speeds and excellent real-time performance, and has become one of the fastest industrial Ethernet communication protocols in automation technology. Compared with other industrial Ethernet protocols, the EtherCAT bus provides higher data transmission speeds and lower communication delays, and can achieve real-time control of functional modules 210. EtherCAT supports a variety of network topologies, including linear, tree, and star, and can even be mixed, providing great design flexibility. In addition, the EtherCAT network can be easily expanded to large-scale systems containing hundreds of nodes without significantly affecting performance, and has good scalability.
[0052] The functional module 210 includes one of a process gas control unit, a vacuum pressure detection unit, a gas valve control unit, and a servo control unit.
[0053] The process gas control unit is used to control the gas flow rate. The process gas control unit may include three or more process gas controllers, which respectively control the process gas flow rate of the ion source, the process gas flow rate of the neutralizer, the gas flow rate of nitrogen, etc. Other process gases can be added when the process requires. The process gas controller can be implemented using conventional technology and will not be described in detail here.
[0054] The vacuum pressure detection unit is used to detect the vacuum pressure, such as the low vacuum pressure detection of the cavity, the high vacuum pressure detection, the vacuum pressure detection of the molecular pump front pipeline, and the vacuum pressure detection of the roughing pump pipeline. It can be implemented by conventional technology and will not be elaborated here.
[0055] The gas valve control unit is used for the gas valves of the ion beam etching equipment, such as controlling the gas valves in the process gas pipeline, the gas valves in the vacuum pipeline, the water valves of the cooling water, etc. The gas valve control unit can be implemented by conventional technology, which will not be described in detail here.
[0056] The servo control unit is used to control the angle of the fixture in the ion beam etching equipment, the rotation of the fixture, and the opening and closing of the ion beam. The servo control unit includes multiple servo drives and multiple motors corresponding to the servo drives. The servo drive and the motor cooperate to control the angle of the fixture to facilitate the placement of materials. During the process, the angle of the material relative to the ion source is controlled to optimize the etching rate; the servo drive and the motor cooperate to control the rotation of the fixture to facilitate the placement of materials. During the process, the material rotation is controlled to optimize the uniformity of etching; the servo drive and the motor cooperate to control the closing and opening of the ion beam. At the beginning and end of the process, the ion beam can be quickly opened and blocked to etch the material. The servo control unit can use conventional technology to achieve the corresponding control operations, which will not be repeated here.
[0057] refer to Figure 2 The ion beam etching control system includes a serial communication module 220 , and the PLC control module 120 is connected to the ion source power supply 160 and the neutralizer power supply 170 through the serial communication module 220 .
[0058] The serial communication module 220 allows data exchange between modules through a serial communication protocol (such as RS-232, RS-485, etc.), which provides a simple and reliable way to connect and control each module.
[0059] The hardware and protocol used by the serial communication module 220 are relatively simple and low cost, and serial communication is very reliable, especially the RS-485 protocol, which supports long-distance communication and strong anti-interference ability, and serial communication requires only a few cables, which simplifies the system's wiring requirements and reduces maintenance complexity.
[0060] refer to Figure 2 The ion beam etching control system also includes an uninterruptible power supply 230 , which is used to supply power to the PLC control module 120 .
[0061] Uninterruptible Power Supply 230 (UPS) is a power device with energy storage device, and its main function is to provide short-term or medium-term stable power supply when the main power supply is cut off or the power quality is unstable. By setting up the uninterruptible power supply 230, power can be provided immediately when the power is cut off, preventing the influence of sudden power outage and power grid fluctuation on the PLC control module 120, and having time to handle the normal shutdown of the equipment when there is a sudden power outage.
[0062] refer to Figure 2The ion beam etching control system also includes an analog module 240 connected to the PLC control module 120. The analog module 240 is used to collect cooling water temperature and molecular pump speed signals. Specifically, the analog module 240 can be connected to a temperature sensor for collecting temperature and a speed sensor for collecting molecular pump speed, and convert the cooling water temperature signal collected by the temperature sensor and the molecular pump speed signal collected by the speed sensor into corresponding analog signals, and transmit them to the PLC control module 120.
[0063] Further, continue to refer to Figure 2 The ion beam etching control system also includes an IO module 250, which is used to transmit position sensor signals, status signals and start-stop control signals of the ion source power supply 160, status signals and start-stop control signals of the neutralizer power supply 170, status signals and start-stop control signals of the molecular pump, and status signals and start-stop control signals of the mechanical pump, etc.
[0064] It should be understood that the above embodiments are only used to illustrate the technical solutions of the present invention rather than to limit it. For those skilled in the art, the technical solutions described in the above embodiments can be modified, or some of the technical features therein can be replaced by equivalents; and all these modifications and replacements should fall within the scope of protection of the claims attached to the present invention.
Claims
1. An ion beam etching control system, characterized in that: It includes a safety detection module, a PLC control module, a safety input module, a safety control module, a safety output module, an ion source power supply and a neutralizer power supply, wherein the safety detection module is used to detect the safety operation signal of ion beam etching, the PLC control module is connected to an external power grid to obtain electrical energy, and the PLC control module controls the power supply of the ion source power supply and the neutralizer power supply according to the safety operation signal, the safety input module transmits a corresponding status signal to the safety control module based on the safety operation signal, and the safety control module controls the working state of the safety output module based on the status signal to control the power supply of the ion source power supply and the neutralizer power supply.
2. The ion beam etching control system according to claim 1, characterized in that: The safety detection module includes a first relay, a first power supply and a photoelectric sensor, the photoelectric sensor is used to detect the covering state of the etching chassis cover, the photoelectric sensor has a built-in phototransistor, the first input end of the first relay is connected to the emitter of the phototransistor, the second input end of the first relay is connected to the negative electrode of the first power supply, the positive electrode of the first power supply is connected to the collector of the phototransistor, the photoelectric sensor is also connected to the PLC control module, the safety input module includes a second power supply and a first light-emitting diode, the negative electrode of the first light-emitting diode is connected to the first output end of the first relay, the positive electrode of the first light-emitting diode is connected to the positive electrode of the second power supply, the negative electrode of the second power supply is connected to the second output end of the first relay, and the safety control module controls the working state of the safety output module according to the state light signal of the first light-emitting diode.
3. The ion beam etching control system according to claim 2, characterized in that: The safety detection module also includes an emergency stop button, and the safety input module also includes a third power supply and a second light-emitting diode. The positive electrode of the third power supply is connected to the positive electrode of the second light-emitting diode, the negative electrode of the third power supply is connected to one end of the emergency stop button, and the other end of the emergency stop button is connected to the negative electrode of the second light-emitting diode. The two ends of the emergency stop button are also connected to the PLC control module. The safety control module controls the working state of the safety output module according to the status light signals of the first light-emitting diode and the second light-emitting diode.
4. The ion beam etching control system according to claim 2 or 3, characterized in that: The safety output module includes a fourth power supply and a second relay, and the ion beam etching control system also includes a power supply switch unit for turning on or off the power supply, the power supply switch unit is connected to the ion source power supply and the neutralizer power supply, the first end of the power supply switch unit is connected to the first output end of the second relay, the second end of the power supply switch unit is connected to the negative pole of the fourth power supply, the second output end of the second relay is connected to the positive pole of the fourth power supply, and the first input end and the second input end of the second relay are both connected to the safety control module.
5. The ion beam etching control system according to claim 4, characterized in that: The safety output module also includes a comparison unit and an ammeter, wherein a first end of the ammeter is connected to the positive electrode of the fourth power supply, and a second end is connected to the second output end of the second relay, and the output end of the ammeter is connected to the comparison unit, and the comparison unit is used to compare the current data of the ammeter with a preset current value and transmit the comparison result to the safety control module.
6. The ion beam etching control system according to claim 1, characterized in that: The ion beam etching control system further comprises a bus communication module and at least one functional module, and the PLC control module is communicatively connected with the functional module via the bus communication module.
7. The ion beam etching control system according to claim 6, characterized in that: The bus communication module includes at least one Devicenet bus and at least one EtherCAT bus, and the PLC control module is communicatively connected with one of the functional modules via one Devicenet bus or one EtherCAT bus.
8. The ion beam etching control system according to claim 6, characterized in that: The functional module includes one of a process gas control unit, a vacuum pressure detection unit, a gas valve control unit, and a servo control unit.
9. The ion beam etching control system according to claim 1, characterized in that: The ion beam etching control system comprises a serial communication module, and the PLC control module is communicatively connected with the ion source power supply and the neutralizer power supply via the serial communication module.
10. The ion beam etching control system according to claim 1, characterized in that: The ion beam etching control system also includes an uninterruptible power supply, which is used to supply power to the PLC control module.