Self-adaptive light pattern generation method in light control scene

Abstract

The invention relates to a self-adaptive light pattern generation method in a light operation scene, and the method comprises the steps: S1, recognizing a plurality of to-be-operated targets in the light operation scene, and a starting point position and an end point position corresponding to each target; s2, based on a preset multi-target path planning method, according to the starting point position and the final point position of each target, a light pattern path corresponding to each target is planned, and the light pattern path comprises a light pattern position point of each target under each light step; s3, under the condition of the same light step, if the distance between the light pattern position points of any two targets is smaller than the critical distance, obtaining the pattern of the intersection part of the light patterns of the two targets, and correcting the pattern of the intersection part; and S4, finishing the correction processing of the light pattern of the target under all the light steps, and obtaining a finally generated adaptive light pattern. According to the method, the problem that the operation reliability of the controlled object is obviously reduced due to the fact that the light pattern generated in the prior art is too close is solved.

Description

Technical Field

[0001] The present invention relates to the field of micro-nano operation technology, and in particular to an adaptive light pattern generation method in a light operation scenario. Background Art

[0002] Optoelectronic tweezers technology (OET), also known as photoconductive technology and photoinduced dielectrophoresis, is a micro-nano manipulation technology that uses photoelectric fields to act on the manipulation target. Its technical principle is similar to that of dielectrophoresis. It has the advantages of dielectrophoresis manipulation while overcoming the disadvantage of dielectrophoresis that it is difficult to achieve dynamic manipulation. Compared with optical tweezers, the light intensity required for optoelectronic tweezers manipulation is about five orders of magnitude smaller, which allows optoelectronic tweezers to manipulate thermosensitive biological samples, and optoelectronic tweezers have the advantages of high throughput, flexibility, and strong manipulation. Compared with dielectrophoresis technology, optoelectronic tweezers manipulation does not require the preparation of complex physical microelectrodes, and the required virtual electrodes can be dynamically reconfigured in real time through incident light controlled by a computer. Therefore, optoelectronic tweezers are widely used in medical and engineering integration fields such as cell sorting, cell fusion, and cell lysis; they can also be used to achieve micro-nano processing operations such as capturing, screening, and arranging tiny particles of different properties.

[0003] With the development of computer vision and multi-target path planning technology and the demand for high-throughput application of micro-nano manipulation technology, the task of using optoelectronic tweezers technology to realize automatic parallel manipulation of multiple targets has attracted widespread attention. Path planning for multi-target objects is a key link in automatic parallel manipulation, which can provide path information of each manipulated target for subsequent light pattern generation.

[0004] At present, the commonly used target trajectory planning algorithms can still calculate that the paths at the same time can usually maintain a sufficient safety distance in a wide area scenario with few obstacles and control targets; however, when the number of obstacles or control targets increases, the controllable space area will become smaller, which will make it easy for the calculated paths at the same time to be too close. For optoelectronic tweezers control technology, too close a distance will cause the controlled object to be affected by the adjacent light patterns and deviate from the original trajectory, resulting in a significant decrease in operational reliability.

[0005] The solution to the above problem is usually to increase the safety distance between each path in the input of the path planning algorithm, which will lead to a smaller search space and increased solution time, which will lead to the path planning algorithm's solution efficiency being too low or even unable to converge within a finite loop. Therefore, it is urgent to develop an adaptive light pattern generation method to achieve effective convergence of the algorithm while ensuring the success rate of the operation. Summary of the invention

[0006] In view of the above problems, an object of the present invention is to provide an adaptive light pattern generation method in a light operation scenario, so as to solve the problem that the light pattern generated by the prior art significantly reduces the operational reliability of the controlled object due to the close distance.

[0007] To achieve the above object, the present invention adopts the following technical solutions:

[0008] In a first aspect, the present application provides a method for generating an adaptive light pattern in a light operation scenario, the method comprising:

[0009] S1, identifying multiple targets to be operated in a light operation scene, and a starting position and an end position corresponding to each target;

[0010] S2, based on a preset multi-target path planning method, planning a light pattern path corresponding to each target according to the starting position and the end position of each target, wherein the light pattern path includes the light pattern position point of each target at each light step;

[0011] S3, under the condition of the same light step, if the distance between the light pattern position points of any two targets is less than the critical distance, then obtain the intersection pattern of the light patterns of the two targets, and correct the intersection pattern;

[0012] S4, completing the correction processing of the light patterns of the targets under all light steps to obtain the finally generated adaptive light pattern.

[0013] In one implementation, in S1, multiple targets to be operated in the light operation scene and the starting position and the end position corresponding to each target are identified based on computer vision technology.

[0014] In one implementation, the preset multi-objective path planning method includes: a conflict-based search algorithm, an enhanced conflict search algorithm, or a safe interval path planning algorithm in a dynamic environment.

[0015] In one implementation, the light step is a time step divided according to a preset time interval.

[0016] In one implementation, the light pattern under each light step - includes a closed figure or a semi-closed figure;

[0017] Wherein, the enclosed pattern includes a circular pattern, a triangular pattern or a square pattern;

[0018] The light patterns of different targets under the same light step are the same pattern or different patterns.

[0019] In one implementation, the modifying the intersection pattern includes:

[0020] The intersection pattern in the two-light pattern is deleted, and a rectangular mask is added again in the center line of the two-light pattern.

[0021] The present application also provides an adaptive light pattern generating device in a light operation scenario, comprising:

[0022] A recognition module, used to recognize multiple targets to be operated in the light operation scene, and the starting position and the end position corresponding to each target;

[0023] A path planning module, for planning a light pattern path corresponding to each target based on a preset multi-target path planning method and according to the starting position and the end position of each target, wherein the light pattern path includes the light pattern position point of each target at each light step;

[0024] The correction module is used to obtain the intersection pattern of the light patterns of any two targets under the same light step condition if the distance between the light pattern position points of the two targets is less than the critical distance, and correct the intersection pattern. After completing the correction processing of the light patterns of the targets under all light steps, the final generated adaptive light pattern is obtained.

[0025] The present application also provides a computer-readable storage medium storing a computer program, wherein the computer program is executed by a processor to control a device where the processor is located to implement the adaptive light pattern generation method in the light operation scenario described in the first aspect.

[0026] The technical solution of the present invention can enable each circular light pattern to perform adaptive light pattern reconstruction according to the distance information between the light patterns, thereby preventing the problem of target control failure caused by the intersection of light patterns. It can greatly improve the success rate and algorithm calculation efficiency of high-throughput parallel control of multiple targets in a narrow area, and help complete the multi-target parallel automated control task based on photoelectric tweezers. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 This is a schematic diagram of the structure of the photoelectric tweezers chip in the embodiment of this application;

[0028] Figure 2 This is a flowchart of multi-target automated control based on optoelectronic tweezers (OET) technology in an embodiment of the present application;

[0029] Figure 3 This is an experimental picture of a single circular light pattern capturing a 10 μm-sized PS ball in an embodiment of the application;

[0030] Figure 4 This is a diagram of a control failure experiment caused by the intersection of two circular light patterns in the application example;

[0031] Figure 5This is a diagram of an adaptive light pattern manipulation experiment after being redesigned in accordance with an embodiment of the application;

[0032] Figure 6 A schematic diagram of the process of the adaptive light pattern design method of the application embodiment;

[0033] Figure 7 This is an optimized comparison diagram of the original light pattern and the adaptively designed light pattern of the application embodiment;

[0034] Figure 8 A schematic diagram of the arrangement and combination of multiple patterns used in the adaptive light pattern design method of the present invention;

[0035] Fig. 9 Schematic diagram showing the difference between using an adaptive light pattern strategy in a narrow area and not using an adaptive light pattern strategy. DETAILED DESCRIPTION

[0036] In order to make the purpose, technical solution and advantages of the embodiment of the present invention clearer, the technical solution of the embodiment of the present invention will be clearly and completely described below in conjunction with the drawings of the embodiment of the present invention. Obviously, the described embodiment is a part of the embodiment of the present invention, not all of the embodiments. Based on the described embodiment of the present invention, all other embodiments obtained by ordinary technicians in this field belong to the scope of protection of the present invention.

[0037] In view of the defects and problems of the prior art, the present application provides an adaptive light pattern generation method in a light operation scenario, the method comprising:

[0038] S1, identifying multiple targets to be operated in a light operation scene, and a starting position and an end position corresponding to each target;

[0039] S2, based on a preset multi-target path planning method, planning a light pattern path corresponding to each target according to the starting position and the end position of each target, wherein the light pattern path includes the light pattern position point of each target at each light step;

[0040] S3, under the condition of the same light step, if the distance between the light pattern position points of any two targets is less than the critical distance, then obtain the intersection pattern of the light patterns of the two targets, and correct the intersection pattern;

[0041] S4, completing the correction processing of the light patterns of the targets under all light steps to obtain the finally generated adaptive light pattern.

[0042] The light pattern in the embodiment of the present application can be a closed figure or a semi-closed figure. The closed figure can include a ring, a square or a triangle. In the subsequent embodiments of the present application, a ring is used as an example. It can be understood that the light pattern of the present application adopts other figures, which is also applicable. At the same time, the light patterns of different targets of the present application can be the same pattern or different patterns.

[0043] The above method flow is described in a more detailed embodiment in conjunction with the accompanying drawings of the present invention.

[0044] In order to explain the present technical solution more clearly, the photoelectric tweezers technology is first explained.

[0045] Photoelectric tweezers technology not only shows remarkable performance in clustering manipulation, but also can perform differentiated control on each individual target, and has unique advantages in the automated parallel manipulation of multi-target particles. Because photoelectric tweezers technology is different from the uniform operation forms such as acoustic field and magnetic field, it has flexible characteristics. The use of photoelectric tweezers technology can realize personalized operation of multiple targets at the same time (each independently performs different manipulation modes), and the manipulation light pattern outside the safe distance does not interfere with the controlled object. Therefore, photoelectric tweezers technology is more suitable for high-throughput parallel operation for multiple targets. The spatially non-uniform electric field induced by light interacts with the particles suspended in the liquid medium, inducing repulsive force (negative DEP force) or attractive force (positive DEP force), which depends on the Clausius-Mossotti (CM) factor of the system. In the actual operation process, it is necessary to formulate a corresponding operation plan according to the voltage frequency and the dielectric properties of the material. The related work of the present invention is based on the situation of repulsive force (negative DEP force).

[0046] Multi-target automated manipulation based on optoelectronic tweezers (OET) technology usually requires the following three processes: 1) Target object identification and positioning: Use image recognition algorithms to obtain the precise position information of each target object, obstacle, and end point in the scene captured by the camera. 2) Multi-target path planning: Input the position information of each target object as the starting point coordinates and the corresponding end point coordinate information into the multi-target path planning algorithm to calculate the path of each target object from the starting point to the end point. 3) Draw and project light patterns: Draw the corresponding light pattern for each target object at the coordinate position at each time step according to the path results (this article takes the object subjected to negative dielectrophoretic force as an example, and usually uses a circular light pattern to capture the corresponding target particles, such as Figure 1 As shown in the figure, of course, in other embodiments, triangles or other patterns can be used. After the corresponding light pattern is generated, the sequence light pattern is projected through a projector to achieve parallel automatic manipulation of multiple target objects. The multi-target automatic manipulation flow chart based on optoelectronic tweezers (OET) technology is shown in the figure. Figure 2The process in the black dotted box is the key content of the present invention, that is, the part based on the adaptive light pattern generation strategy.

[0047] However, in the actual manipulation process, the diameter of the circular light pattern used to manipulate the target object is usually between 5 and 10 times the diameter of the manipulated target object. When the distance between the two paths is close at the same time, the controlled object will be affected by the adjacent manipulated light pattern (attracted or repelled), thereby deviating from the original trajectory, resulting in operation failure. A common solution is to use the outer diameter of the circular light pattern as a safety distance in the path planning algorithm to keep a sufficient distance between each light pattern to avoid intersection, but increasing the algorithm safety distance will make it difficult for the algorithm to converge, which is particularly obvious in multi-objective planning tasks in a small space. Therefore, it is necessary to propose a solution for high-throughput parallel operation of multiple targets based on optoelectronic tweezers technology.

[0048] The method provided in the present application can ensure that the control process will not fail due to the intersection of light patterns caused by the distance between light patterns being too close. Its uniqueness lies in that it takes into account the impact of the distance between different light patterns on the parallel control of multiple targets. And when the distance between two adjacent light patterns is too small, causing the light patterns to cross, the light pattern is redesigned. This innovative design not only improves the capture rate of targets under multi-target parallel control, but also improves the space utilization rate of limited space at the micro-nano scale, and provides an effective light pattern design method for multi-target parallel control of photoelectric tweezers.

[0049] In order to achieve the above-mentioned purpose, the present invention proposes a method for generating an adaptive light pattern. The details are as follows:

[0050] The core of an adaptive pattern design method for multi-target manipulation of photoelectric tweezers is that when the distance between two target objects at the same time is less than the critical distance d of the intersection of the two patterns c When the light pattern is used, the part is redesigned to achieve the effect that the new light pattern can stably capture the target object.

[0051] The original light pattern is a circular light pattern. Figure 3 As shown in Figure 1, this light pattern is used to capture the target object under the condition of negative dielectrophoretic force in the optoelectronic tweezers technique and conduct related manipulation experiments. Its inner diameter and outer diameter are represented by r in and r out express.

[0052] The two adjacent light patterns are intersecting. Figure 4 As shown, due to the close distance between the light patterns (specifically shown as the two circles of left 1 and left 2), the two light patterns intersect and the controlled target loses control. However, the light patterns that do not intersect ensure stable control of the controlled target.

[0053] The redesigned light pattern. Figure 5 As shown, at this time, the distance between the two light patterns is less than the critical distance d c Due to the optimized design of the light pattern, the redesigned light pattern can still maintain stable control of the controlled target at a close distance.

[0054] Compared with the prior art, the present invention has the following obvious outstanding substantive features and significant advantages:

[0055] (1) Distance detection mechanism between target objects: The distance detection module between target objects provides the adaptive light pattern with the coordinate information of the light pattern that needs to be redesigned. The module first obtains the coordinates of all target objects at the same time and calculates the distance between any two target objects and the critical distance d that intersects with the light pattern. c Compare to decide whether to redesign the light pattern.

[0056] (2) Light pattern adaptive design module: The light pattern adaptive design module is used to make the distance between two target objects at the same time less than the critical distance d of the light pattern intersection. c This method deletes the intersection of the two light patterns and adds a rectangular mask in the center line of the two light patterns to ensure effective manipulation of the target object. This method takes advantage of the flexibility of light and has the following advantages: it solves the problem of manipulation failure caused by the intersection of light patterns while improving the spatial utilization efficiency of multi-target manipulation of optoelectronic tweezers; at the same time, this design method can set a lower collision radius in the multi-target path planning algorithm, thereby improving the computational efficiency of the path planning algorithm.

[0057] The present application relates to an adaptive light pattern design method for multi-target manipulation of photoelectric tweezers. First, it is necessary to determine the crossover between light patterns and specific parameters. The manipulation target is a polystyrene (PS) microsphere with a diameter of 10 μm, which is subjected to a negative DEP force under the manipulation condition and is repelled by light. Figure 6 (a) Simulates the situation where two circular light patterns are at a critical distance without crossing. At this time, the critical distance d c =r in +r out T is the thickness of the circular light pattern, and its thickness is used to ensure that a sufficiently large driving force is generated on the controlled object. Then, the scene when the two light patterns intersect is simulated, such as Figure 6 As shown in (b), the distance d between the two light patterns is less than the critical distance d c .L s It is used to indicate the size of the space inside the circular light pattern used to manipulate the target object. When there is no intersection between the light patterns, L s =2r in , and as the intersection between the two light patterns becomes more serious, Ls The value of will continue to decrease, resulting in loss of control over the target object. <d c When there is L s =dT.

[0058] The adaptive light pattern design method redesigns the light pattern when crossing. Figure 6 As shown in (c) and (d), Figure 6 (c) describes the process of clearing all light patterns within the inner diameter circle of each circular ring light pattern. This operation clears the intersection between the two light patterns and prevents the intersection of the light patterns from invading the control space area of ​​the original light pattern (the arc dotted line part represents the intersection of the two light patterns). Figure 6 (d) shows the process of adding a rectangular mask light pattern at the center line of the two light patterns. This step ensures that the two light patterns have independent control areas to prevent the two target objects from entering the same control area and causing control failure. This is the redesigned adaptive light pattern. In this case, L s =r in +0.5(dT), at this time the adaptive control space size is larger than the control space size when the original light patterns are crossed.

[0059] Therefore, the process of redesigning the intersection part in the embodiment of the present application can be summarized as follows:

[0060] ① Identify the light pattern positions of the two targets in the current light step;

[0061] ② Make the median line connecting the two targets;

[0062] ③ Keep the graphics of the two targets from the median line outward. That is, for target A, keep the part of the original graphics of target A to the median line, and for target B, keep the part of the graphics of target B to the median line;

[0063] ④ Connect the median line to separate targets A and B.

[0064] Figure 7 It shows the original pattern design and the adaptive light pattern design L s Curves that vary with d (with the inner diameter of the light pattern r in 22 μm, thickness T is 10 μm), the figure shows that the adaptive light pattern design method has a larger control space L than the original pattern design method when the distance d between the two light patterns is the same s , demonstrating the superiority of the adaptive light pattern design method.

[0065] The above examples are explained with the light cluster pattern being a circular ring pattern. In addition to the circular ring light pattern, the above-summarized design method of median line segmentation and completion can also be applied to triangular light clusters and rectangular light clusters. Moreover, the light patterns of different targets can be the same or different. Figure 8 In the accompanying drawings, a schematic diagram of a combination of a triangle and a circular light pattern is provided. The specific process can refer to the description of the circular part, and the principle can be deduced by analogy.

[0066] Verify this with the following two examples:

[0067] Example 1:

[0068] Simulation verification of two targets meeting

[0069] (1) Simulation process:

[0070] Single simulation process: set a 348*192 map, set ten target destinations on the map, randomly set obstacles, and then randomly set ten particles, each of which corresponds to a different target destination. After the setting is completed, input the map information into the simulation program to run two path planning algorithms using the adaptive light pattern generation strategy and not using the adaptive light pattern generation strategy to calculate the path.

[0071] Multiple simulations were performed to obtain accurate results: obstacles were set so that the number of obstacles was small and the distance between obstacles was far (the distance was 3 to 4 times the diameter of the light pattern), and the single simulation process was repeated ten times, and the number of path conflicts in each simulation was recorded; obstacles were set so that the number of obstacles was large and the distance between obstacles was close (the distance was 1 to 2 times the diameter of the light pattern), and the single simulation process was repeated ten times, and the number of path conflicts in each simulation was recorded. This step was used to explore the influence of using the adaptive light pattern generation strategy to simulate and calculate the ten particle paths on the number of path conflicts in the path planning process under different obstacle distributions in the map.

[0072] Finally, the data results are recorded in a table, as shown in Table 1.

[0073]

[0074] Table 1

[0075] (2) Simulation results:

[0076] As can be seen from Table 1, the number of path conflicts when using the adaptive light pattern generation strategy for path planning is always less than when the adaptive light pattern generation strategy is not used. Generally speaking, the more path conflicts there are, the more times and time the path planning program needs to repeat the calculation, and the higher the probability of failure of particles losing control. Therefore, using the adaptive light pattern generation strategy for path planning is always a better method. And as shown in Table 1, under normal circumstances where the path has a solution, when there are many obstacles in the map and the obstacles are close to each other, the difference in the number of path conflicts between the two methods is larger on average, and the advantage of using the adaptive light pattern generation strategy for path planning will be further magnified. This simulation result can effectively reflect the advantages and beneficial effects of the present invention in improving the success rate of high-throughput parallel control of multiple targets and the efficiency of algorithm calculation.

[0077] (3) Process example

[0078] When the obstacles are close together (twice the target diameter), such as Fig. 9 As shown in the figure. At time t1, the two target trajectories are closest to each other. If the adaptive light pattern generation strategy is not used, the light patterns between different targets will squeeze each other, eventually "bouncing" the target and losing control. In this case, it is necessary to appropriately increase the safety distance of the algorithm and reduce efficiency.

[0079] When using the adaptive light pattern generation strategy, smooth control will be guaranteed without increasing the algorithm's safety distance.

[0080] Example 2:

[0081] Adaptive light pattern generation strategy for multiple targets encountering each other

[0082] The situation where multiple targets meet can be abstracted as the superposition of several groups of two targets meeting (refer to the first embodiment) and several targets meeting each other. Therefore, this embodiment describes the strategy of the situation where multiple targets meet each other.

[0083] Assume that there are n targets in the operation space that meet each other at a certain moment (light patterns are superimposed). For the convenience of description, the light patterns are abstracted into thick lines. For a certain light pattern i, the radius of the circumscribed circle of the light pattern R is i It can be calculated by the following formula:

[0084] R i =r i +T (1)

[0085] Among them, r i is the inner diameter of the circumscribed circle of the light pattern, and T is the line width of the lines of the light pattern.

[0086] After being abstracted into lines, the coordinates of the “focus” F of the adaptive pattern (X F,Y F ), with X F For example, it can be calculated by the following formula:

[0087]

[0088] Among them, X i is the abscissa of the centroid of the ith pattern.

[0089] Similarly, the ordinate Y of the focus F can be calculated F .

[0090] For the case where n targets meet each other, it is necessary to find the n intersection points of the figures farthest from the focus F, connect these n points with the focus, and then fill in the outer circle. This is the adaptive light pattern generation strategy of the present invention for the case where n targets meet each other.

[0091] In summary, this application proposes a multi-target high-throughput parallel light control scheme based on an adaptive light pattern generation strategy. This design method enables each circular light pattern to be adaptively reconstructed according to the distance information between the light patterns, preventing the failure of target control due to the intersection of light patterns, and greatly improving the success rate and algorithm calculation efficiency of high-throughput parallel control of multiple targets in narrow areas, helping to complete multi-target parallel automated control tasks based on photoelectric tweezers. This innovative technology not only gives full play to the flexibility of "light" control of photoelectric tweezers technology, but also provides an effective light pattern generation method for multi-target parallel automated control based on photoelectric tweezers.

[0092] In the several embodiments provided by the present invention, it should be understood that the disclosed method can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of the above units is only a logical function division. There may be other division methods in actual implementation. For example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or units, which can be electrical, mechanical or other forms.

[0093] The above-mentioned integrated unit implemented in the form of a software functional unit can be stored in a computer-readable storage medium. The above-mentioned software functional unit is stored in a storage medium, including a number of instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) or a processor (Processor) to perform some steps of the above-mentioned method of each embodiment of the present invention. The aforementioned storage medium includes: U disk, mobile hard disk, read-only memory (Read-Only Memory, ROM), random access memory (Random Access Memory, RAM), disk or optical disk and other media that can store program codes.

[0094] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A method for generating an adaptive light pattern in a light operation scenario, characterized in that: The method comprises: S1, identifying multiple targets to be operated in a light operation scene, and a starting position and an end position corresponding to each target; S2, based on a preset multi-target path planning method, planning a light pattern path corresponding to each target according to the starting position and the end position of each target, wherein the light pattern path includes the light pattern position point of each target at each light step; S3, under the condition of the same light step, if the distance between the light pattern position points of any two targets is less than the critical distance, then obtain the intersection pattern of the light patterns of the two targets, and correct the intersection pattern; S4, completing the correction processing of the light patterns of the targets under all light steps to obtain the finally generated adaptive light pattern.

2. The method for generating an adaptive light pattern in a light operation scenario according to claim 1, characterized in that: In S1, a plurality of targets to be operated in the light operation scene and a starting position and an end position corresponding to each target are identified based on computer vision technology.

3. The method for generating an adaptive light pattern in a light operation scenario according to claim 1, characterized in that: The preset multi-objective path planning method includes: a conflict-based search algorithm, an enhanced conflict search algorithm, or a safe interval path planning algorithm in a dynamic environment.

4. The method for generating an adaptive light pattern in a light operation scenario according to claim 1, characterized in that: The light step is a time step divided according to a preset time interval.

5. The method for generating an adaptive light pattern in a light operation scenario according to claim 4, characterized in that: Light pattern under each light step - including closed figures or semi-closed figures; Wherein, the enclosed pattern includes a circular pattern, a triangular pattern or a square pattern; The light patterns of different targets under the same light step are the same pattern or different patterns.

6. The method for generating an adaptive light pattern in a light operation scenario according to claim 5, characterized in that: The step of modifying the intersection pattern comprises: The intersection pattern in the two-light pattern is deleted, and a rectangular mask is added again in the center line of the two-light pattern.

7. An adaptive light pattern generating device in a light operation scenario, characterized in that: include: A recognition module, used to recognize multiple targets to be operated in a light operation scene, and a starting position and an end position corresponding to each target; A path planning module, for planning a light pattern path corresponding to each target based on a preset multi-target path planning method and according to the starting position and the end position of each target, wherein the light pattern path includes the light pattern position point of each target at each light step; The correction module is used for correcting the distance between the light pattern positions of any two targets under the condition of the same light step. If the distance between the two targets is less than the critical distance, the intersection pattern of the light patterns of the two targets is obtained, and the intersection pattern is corrected. After the correction processing of the light patterns of the targets under all light steps is completed, the finally generated adaptive light pattern is obtained.

8. A computer-readable storage medium, characterized in that: A computer program is stored, and the computer program is executed by a processor to control the device where the processor is located to implement the adaptive light pattern generation method in the light operation scenario according to any one of claims 1 to 6.

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