Exposure equipment

Abstract

According to the exposure equipment, a light source module used for forming at least two paths of exposure light beams is arranged, a baffle and a mask plate are sequentially arranged in the transmission direction of any path of exposure light beam, at least two to-be-exposed areas of a waveguide plate are exposed at the same time, and the light source module is arranged along the transmission direction of any path of exposure light beam. The projection contour of the light-transmitting area of the baffle on the plane where the waveguide sheet is located covers at least part of the corresponding to-be-exposed area, and the projection contour of the mask on the plane where the waveguide sheet is located covers the corresponding to-be-exposed area. Therefore, multiple exposure paths are arranged at the same time, multiple to-be-exposed areas on the waveguide sheet can be exposed at the same time, and the exposure efficiency is improved. Besides, each to-be-exposed area can correspond to a plurality of baffles and one mask plate, so that the utilization rate of the baffles and the mask plates is increased, and the preparation cost of the baffles and the mask plates is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor preparation, and in particular to an exposure device. Background Art

[0002] Augmented Reality (AR) is a new technology that innovates visual experience and human-computer interaction. It is a new technology that "seamlessly" integrates real-world information and virtual-world information. The optical display system of AR devices usually consists of a micro display screen and optical components. Currently, HUD (Head-up-Display) is very popular in the market. The automotive HUD head-up display using AR technology has a larger field of view and a longer imaging distance, a wider field of view, better imaging effects, and good user interactivity.

[0003] At present, the waveguide sheets in AR-HUD are generally volume holographic waveguides or surface relief waveguides. Volume holographic waveguides are widely used because they have relative advantages in manufacturing difficulty and cost. When a volume holographic waveguide is exposed to form a grating using a mask, it is usually necessary to form an input grating, a turning grating, and an output grating. In the related art, when exposing an optical waveguide, it is generally necessary to expose each area separately, which results in low exposure efficiency. In order to improve efficiency, when exposing three areas at the same time, a mask with exposure patterns for three areas is required, which in turn limits the reuse rate of the mask. When the area or shape of the area is different, the mask needs to be re-prepared, which increases costs and is time-consuming and labor-intensive. Summary of the invention

[0004] The present invention provides an exposure device to solve the problem of low exposure efficiency in the related art.

[0005] To solve the above problems, an embodiment of the present invention provides an exposure device, comprising:

[0006] A light source module, used for forming at least two exposure light beams;

[0007] A baffle and a mask are sequentially arranged along the transmission direction of any exposure beam, wherein the baffle is provided with a light-transmitting area, and the mask is provided with a periodic grating mask structure, wherein the light-transmitting area is used to transmit the exposure beam of the corresponding path, so that the exposure beam of the corresponding path irradiates the mask, and transfers the periodic grating mask structure to the waveguide sheet to be exposed;

[0008] In which, the waveguide plate has at least two areas to be exposed, and along the transmission direction of any exposure light beam, the projection contour of the light-transmitting area of ​​the baffle on the plane where the waveguide plate is located covers at least a part of the area corresponding to the area to be exposed, and the projection contour of the mask on the plane where the waveguide plate is located covers the area corresponding to the area to be exposed; based on the two exposure light beams, the two areas to be exposed can be exposed simultaneously.

[0009] Optionally, the light source module is provided with a main light path unit, a light splitting unit and at least two light splitting path units in sequence in the light transmission direction;

[0010] The main optical path unit is provided with a laser, a first switch element, a shaping element, a first beam expansion element and a polarization element in sequence in the light transmission direction, for emitting a main laser beam;

[0011] The beam splitting unit is used to split the main laser beam;

[0012] Each of the splitting path units is provided with a light intensity control element, a second switching element, a second beam expansion element and a collimating element in sequence in the direction of light transmission, which are used to form an exposure beam from the beam split from the main laser beam. Each of the splitting path units is also provided with a reflection component, which is used to adjust the angle and / or position of the exposure beam of the corresponding path incident on the area to be exposed.

[0013] Optionally, the number of the light splitting path units is three, and the light splitting unit includes: a first light splitting prism, a second light splitting prism, a third light splitting prism, a light blocking element and a first reflecting element;

[0014] The first beam splitter prism is used to split the main laser beam into a first beam and a second beam;

[0015] The second beam splitter prism is used to form a third beam and a fourth beam from the first beam, the third beam is the first incident beam of the first beam splitting path unit, and the fourth beam is irradiated to the light blocking element;

[0016] The third beam splitter prism is used to form the second beam into a fifth beam and a sixth beam, and the fifth beam is the second incident beam of the second beam splitting path unit;

[0017] The first reflecting element is used for reflecting the sixth light beam to form a third incident light beam of the third light splitting path unit.

[0018] Optionally, the number of the light splitting path units is three, and the light splitting units include: a fourth light splitting prism, a fifth light splitting prism, a second reflecting element, a third reflecting element, a fourth reflecting element and an optical path adjusting member;

[0019] The fourth beam splitter prism is used to split the main laser beam into a first beam and a second beam, wherein the second beam is a second incident beam of the second beam splitting path unit;

[0020] The fifth beam splitter prism is used to form the first beam into a third beam and a fourth beam, and the third beam is the first incident beam of the first beam splitting path unit;

[0021] The second reflecting element is used to reflect the fourth light beam to the third reflecting element to form a fifth light beam, the third reflecting element is used to reflect the fifth light beam to form a sixth light beam, the optical path adjusting component is used to adjust the distance between the sixth light beam and the second light beam and the third light beam, and the fourth reflecting element is used to reflect the sixth light beam to form a third incident light beam of the third light splitting path unit.

[0022] Optionally, the reflection assembly includes a fifth reflection element, which is used to adjust the angle at which the exposure light beam of a corresponding path is incident on the mask.

[0023] Optionally, when the transmission direction of the exposure light beam of the corresponding path is not perpendicular to the periodic grating structure of the mask, the reflection assembly also includes a sixth reflection element, which is used to adjust the transmission direction of the exposure light beam of the corresponding path to be perpendicular to the periodic grating structure of the mask, and direct the adjusted exposure light beam of the corresponding path to be incident on the fifth reflection element.

[0024] Optionally, the reflection assembly also includes a seventh reflection element and an eighth reflection element arranged in parallel, the seventh reflection element is used to receive the exposure light beam of the corresponding path and reflect it to the eighth reflection element, the eighth reflection element is translated relative to the seventh reflection element along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to reflect the exposure light beam of the corresponding path to the fifth reflection element, and adjust the exposure light beam of the corresponding path to translate along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0025] Optionally, the fifth reflecting element further includes a light blocking element on a side adjacent to the waveguide plate, wherein the light blocking element is arranged perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to transmit the exposure light beam of the corresponding path, and the light blocking element can translate within a plane perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0026] Optionally, the exposure device further comprises: a support unit, the support unit comprising a support shaft and a plurality of support rods, one end of the support rod is connected to the support shaft, and the other end of the support rod is connected to a connecting piece for connecting a baffle and / or a mask;

[0027] Alternatively, it further comprises a plurality of support seats, wherein one end of the support rod is connected to the support shaft, and the other end is connected to the support seat;

[0028] The support rod can rotate around the support shaft, the support seat can rotate, the support seat has a hollow receiving groove that can accommodate the baffle, and at least two of the support seats can simultaneously support the corresponding baffle to be located in the corresponding area to be exposed;

[0029] Alternatively, it further comprises a baffle switching disc, on which a hollow receiving groove is arranged in an annular manner.

[0030] Optionally, the exposure device further comprises: a workpiece stage, the workpiece stage is used to carry the waveguide plate, and the workpiece stage can translate and rotate.

[0031] Optionally, the exposure device further comprises: a refractive index matching liquid spraying element, comprising a liquid spraying nozzle and a movable shaft, wherein the liquid spraying nozzle is used to spray the refractive index matching liquid onto the waveguide plate, and the movable shaft is connected to a driving device for moving the liquid spraying nozzle.

[0032] The technical solution of the embodiment of the present invention is to simultaneously expose at least two areas to be exposed on the waveguide sheet by setting a light source module for forming at least two exposure beams, and sequentially setting a baffle and a mask in the direction of transmission of any exposure beam, wherein the baffle is provided with a light-transmitting area, and the mask is provided with a periodic grating mask structure, and the light-transmitting area is used to transmit the exposure beam of the corresponding path, so that the exposure beam of the corresponding path irradiates the mask, and transfers the periodic grating mask structure to the waveguide sheet, and along the direction of transmission of any exposure beam, the projection contour of the light-transmitting area of ​​the baffle on the plane where the waveguide sheet is located covers at least part of the corresponding area to be exposed, and the projection contour of the mask on the plane where the waveguide sheet is located covers the corresponding area to be exposed. Thus, multiple exposure paths are set at the same time, and multiple areas to be exposed on the waveguide sheet can be exposed simultaneously, thereby improving exposure efficiency. In addition, each area to be exposed can correspond to multiple baffles and one mask, which increases the utilization rate of the baffles and the mask, and reduces the preparation cost of the baffles and the mask.

[0033] It should be understood that the contents described in this section are not intended to identify the key or important features of the embodiments of the present invention, nor are they intended to limit the scope of the present invention. Other features of the present invention will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0035] Figure 1 is a schematic structural diagram of an exposure device provided by an embodiment of the present invention;

[0036] Figure 2 is a schematic diagram of a waveguide plate in an exposure device provided by an embodiment of the present invention;

[0037] Figure 3 is a schematic diagram of a baffle in a coupling region of an exposure device provided by an embodiment of the present invention;

[0038] Figure 4 is a schematic diagram of a baffle in an outcoupling region of an exposure device provided in an embodiment of the present invention;

[0039] Figure 5 is a schematic diagram of a baffle in a turning area of ​​an exposure device provided in an embodiment of the present invention;

[0040] Figure 6 is a schematic diagram of a mask in an exposure device provided by an embodiment of the present invention;

[0041] Figure 7 is a schematic diagram of a light source module in an exposure device provided in an embodiment of the present invention;

[0042] Figure 8 is a schematic diagram of a light source module in an exposure device provided by another embodiment of the present invention;

[0043] Fig. 9 is a schematic diagram of exposure of an area to be exposed in an exposure device provided by an embodiment of the present invention;

[0044] Fig.10 is a schematic diagram of exposure of three areas to be exposed in an exposure device provided by an embodiment of the present invention;

[0045] Fig.11 is a schematic diagram of a support unit in an exposure device provided in an embodiment of the present invention;

[0046] Fig.12 is a schematic diagram of a support unit in an exposure device provided by another embodiment of the present invention;

[0047] Fig.13 is a schematic diagram of splicing the to-be-exposed area of ​​the waveguide plate in the exposure device provided by an embodiment of the present invention;

[0048] Fig.14 It is a schematic diagram of the exposure sequence of the to-be-exposed area of ​​the waveguide plate in the exposure device provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0049] In order to enable those skilled in the art to better understand the scheme of the present invention, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0050] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions.

[0051] In the related art, the volume holographic optical waveguide generally includes a coupling-in region, a turning region and a coupling-out region. The coupling-in region is used to couple external light carrying image information into the volume holographic optical waveguide. The turning region and the coupling-out region are used to propagate and expand the coupled external light. The coupling-out region is also used to couple the light in the volume holographic optical waveguide to form a coupling-out light field for the human eye to receive, thereby observing the relevant image information. Among them, the area of ​​the coupling-in region is generally small, and the corresponding mask and baffle can be used for exposure. However, the area of ​​the turning region and the coupling-out region is generally large. If a baffle is used for exposure, a baffle with a larger area needs to be made. And when the shape and contour of the turning region or the coupling-out region changes, the baffle cannot be reused, resulting in a waste of resources. In addition, when exposing the waveguide sheet, only one area can be exposed at a time, and the exposure efficiency is low.

[0052] Based on the above problems, an embodiment of the present invention proposes an exposure device that can simultaneously meet the two aspects of improving the utilization rate of the baffle and the mask and improving the exposure efficiency.

[0053] Specifically, Figure 1 1 is a schematic diagram of the structure of an exposure device provided in an embodiment of the present invention. The exposure device 100 includes:

[0054] The light source module 200 is used to form at least two exposure light beams;

[0055] Along the transmission direction of any exposure light beam, a baffle 300 and a mask plate 400 are sequentially arranged, the baffle 300 is provided with a light-transmitting area A, and the mask plate 400 is provided with a periodic grating mask structure, and the light-transmitting area A is used to transmit the exposure light beam of the corresponding path, so that the exposure light beam of the corresponding path irradiates the mask plate 400, and transfers the periodic grating mask structure to the waveguide plate 500 to be exposed;

[0056] Among them, the waveguide plate 500 has at least two areas B to be exposed. Along the transmission direction of any exposure light beam, the projection contour of the light-transmitting area A of the baffle 300 on the plane where the waveguide plate 500 is located covers at least part of the corresponding area to be exposed, and the projection contour of the mask plate 400 on the plane where the waveguide plate 500 is located covers the corresponding area to be exposed; based on the two exposure light beams, the two areas to be exposed can be exposed simultaneously.

[0057] Among them, the light transmittance of the light-transmitting area A of the baffle 300 is 100%, and the light transmittance in the non-exposure area is 0%, so as to obtain a single exposure target pattern. The material of the baffle 300 is not limited, as long as the transmittance in the laser band is 0%; the thickness of the baffle 300 needs to be less than 0.1mm to reduce the edge diffraction effect of the grating. The mask 400 has a periodic grating structure, which can expose the volume holographic material by interfering the diffracted light and the direct light. The waveguide 500 can be a HUD waveguide, which has a structure of two layers of glass with a volume holographic material sandwiched between them, and the size of the HUD waveguide is greater than 15 inches.

[0058] Understandably, Figure 2 Schematic diagram of a waveguide in an exposure device provided by an embodiment of the present invention, Figure 2 As shown, at least two areas B to be exposed on the waveguide plate 500 can be exposure areas corresponding to the coupling-in area B1 and the coupling-out area B3. An coupling-in area mask and a coupling-in area baffle are arranged above the exposure area corresponding to the coupling-in area B1, and an out-coupling area mask and an out-coupling area baffle are arranged above the exposure area corresponding to the out-coupling area B3. The light source module 200 can emit a first exposure light beam and a second exposure light beam. After the first exposure light beam passes through the light-transmitting area of ​​the coupling-in area baffle and the coupling-in area mask, it is used to expose the exposure area corresponding to the coupling-in area, so that the periodic mask pattern on the coupling-in area mask is transferred to the coupling-in area. After the second exposure light beam passes through the out-coupling area baffle and the out-coupling area mask, it is used to expose the exposure area corresponding to the out-coupling area. The periodic mask pattern on the out-coupling area mask is transferred to the out-coupling area. Therefore, by emitting two exposure light beams at the same time and setting two baffles and two mask plates at the same time, two areas to be exposed on the waveguide plate 500 can be exposed at the same time, thereby improving the exposure efficiency.

[0059] It should be noted that, since the area of ​​the coupling region B1 is generally small, the light-transmitting area of ​​the coupling region baffle and the coupling region on the waveguide plate 500 can cover the contour of the coupling region B1 along the transmission direction of the exposure light beam ( Figure 3 Schematic diagram of a baffle in the coupling region of an exposure device provided in an embodiment of the present invention, Figure 3 As shown). Since the area of ​​the outcoupling area B3 is generally large, the light-transmitting area of ​​the outcoupling area baffle and the outcoupling area B3 on the waveguide plate 500 can cover part of the outline of the outcoupling area B3 along the transmission direction of the exposure light beam. In this way, by switching multiple baffles and performing multiple exposures, the outline of the outcoupling area B3 is finally spliced ​​( Figure 4 Schematic diagram of a baffle in the outcoupling region of an exposure device provided in an embodiment of the present invention, Figure 4 In other embodiments, the waveguide sheet 500 further includes a turning area B2, and the area of ​​the turning area B2 is generally larger. The light-transmitting area of ​​the turning area baffle and the turning area on the waveguide sheet 500 can cover a portion of the contour of the turning area B2 along the direction of transmission of the exposure light beam. In this way, by switching multiple baffles and performing multiple exposures, the contour of the turning area is finally spliced ​​( Figure 5 Schematic diagram of a baffle in a turning area of ​​an exposure device provided in an embodiment of the present invention, Figure 5 shown).

[0060] Figure 6 Schematic diagram of a mask in an exposure device provided by an embodiment of the present invention, such as Figure 6 As shown, the periodic grating mask structure of the mask 400 required for different exposure areas B is the same, but the angles or periods may be different. Each exposure area B only uses a mask 400 with one periodic grating mask structure, which can improve the utilization rate of the mask 400.

[0061] Thus, each baffle can be reused, and the mask only corresponds to one area to be exposed, rather than setting multiple areas on the same mask, so that the mask can also be reused.

[0062] The light source module 200 in the embodiment of the present invention is described in detail below.

[0063] Optionally, Figure 7 is a schematic diagram of a light source module in an exposure device provided in an embodiment of the present invention, Figure 8 is a schematic diagram of a light source module in an exposure device provided in another embodiment of the present invention, such as Figure 7 and Figure 8 As shown, the light source module 200 is provided with a main light path unit 201, a light splitting unit 202 and at least two light splitting path units 203 in sequence in the light transmission direction;

[0064] The main optical path unit 201 is provided with a laser 2011, a first switch element 2012, a shaping element 2013, a first beam expansion element 2014 and a polarization element 2015 in sequence in the light transmission direction, for emitting a main laser beam;

[0065] The beam splitting unit 202 is used to split the main laser beam;

[0066] Each splitting path unit 203 is provided with a light intensity control element 2031, a second switching element 2032, a second beam expansion element 2033 and a collimating element 2034 in sequence in the light transmission direction, which are used to form an exposure beam from the beam after the main laser beam is split. Each splitting path unit 203 is also provided with a reflection component 2035, and the reflection component 2035 is used to adjust the angle and / or position of the exposure beam of the corresponding path incident on the area to be exposed.

[0067] Among them, the laser 2011 is used to emit a laser beam, the first switch element 2012 can be an electric switch for controlling the exposure time of the laser, the shaping element 2013 can be a flat-top beam shaper for converting a Gaussian beam into a flat-top beam to homogenize the beam, the first beam expansion element 2014 is used to initially expand the light spot, and the beam expansion multiple range is 8-12 times, and the polarization element 2015 is a device for adjusting the polarization direction of the polarized light spot, which can be a half-wave plate. The laser beam passes through the first switch element 2012, the shaping element 2013, the first beam expansion element 2014 and the polarization element 2015 in sequence to form a main laser beam.

[0068] The light splitting unit 202 can split the main laser beam into at least two beams, wherein the light splitting unit 202 can be a polarization beam splitter.

[0069] On the light splitting path unit 203, the light intensity control element 2031 can be a polarizing plate or an attenuation plate, which is used to adjust the light intensity of the light path individually. The second switch element 2032 can be an electrically controlled switch, which is used to control the exposure time of a single light path. The second beam expansion element 2033 is used to convert the collimated light beam into an expanded light beam, which can be a spatial filter, a beam expansion lens, or a convex lens and a pinhole aperture, or a concave lens and a pinhole aperture. The collimating element 2034 can be a convex lens, a plano-convex lens, or a biconvex lens. Its spherical profile is not constrained, and it can also be an aspherical profile. The purpose is to convert the expanded light beam into a parallel collimated light beam. That is, an exposure beam is formed.

[0070] It is understandable that, in order to better match the exposure beam on each exposure path, a reflection component 2035 is provided on each light splitting path unit 203 to adjust the position and / or angle of the exposure beam incident on the mask, so as to adapt to the exposure requirements.

[0071] Optionally, continue to refer to Figure 7 , there are three light splitting path units 203, and the light splitting unit 202 includes: a first light splitting prism 2021, a second light splitting prism 2022, a third light splitting prism 2023, a light blocking element 2024 and a first reflecting element 2025; the first light splitting prism 2021 is used to reflect the main laser beam into a first light beam L1, and is also used to transmit the main laser beam into a second light beam L2; the second light splitting prism 2022 is used to reflect the first light beam L1 to form a third light beam L3, and is also used to transmit the first light beam L1 to form a fourth light beam L4, the third light beam L3 is the first incident light beam of the first light splitting path unit, and the fourth light beam L4 is irradiated to the light blocking element 2024; the third light splitting prism 2023 is used to transmit the second light beam L2 to form a fifth light beam L5, and is also used to reflect the second light beam L2 to form a sixth light beam L6; the fifth light beam L5 is the second incident light beam of the second light splitting path unit, and the first reflecting element 2025 is used to reflect the sixth light beam L6 to form the third incident light beam of the third light splitting path unit.

[0072] There are three light splitting path units 203, which are the coupling-in region light path, the turning region light path and the out-coupling region light path. The exposure light spots of the three light paths are of the same size and intensity, and the light spot diameter is 90-120 mm. The first light splitting path unit corresponds to the coupling-in region light path, the second light splitting path unit corresponds to the turning region light path, and the third light splitting path unit corresponds to the out-coupling region light path.

[0073] The first beam splitter prism 2021, the second beam splitter prism 2022, and the third beam splitter prism 2023 can all be polarization beam splitters, or beam splitters, etc., which can split a light path into two light paths. The light blocking element 2024 is not limited to a light trap or a light block, and the first reflective element 2025 is a reflective mirror with a fixed position and a fixed angle, which is used to turn the light path. Optionally, continue to refer to Figure 8The number of the light splitting path units 203 is three, and the light splitting unit 202 includes: a fourth light splitting prism 2201, a fifth light splitting prism 2202, a second reflecting element 2203, a third reflecting element 2204, a fourth reflecting element 2206 and an optical path adjusting member 2205; the fourth light splitting prism 2201 is used to reflect the main laser beam into a first light beam L1, and is used to transmit the main laser beam into a second light beam L2, and the second light beam L2 is the second incident light beam of the second light splitting path unit; the fifth light splitting prism 2202 is used to reflect the first light beam L1 to form a third light beam L3, Used to transmit the first light beam L1 to form a fourth light beam L4; the third light beam L3 is the first incident light beam of the first splitter path unit, the second reflecting element 2203 is used to reflect the fourth light beam L4 to the third reflecting element 2204 to form a fifth light beam L5, the third reflecting element 2204 is used to reflect the fifth light beam L5 to form a sixth light beam L6, the optical path adjusting component 2205 is used to adjust the distance between the sixth light beam L6 and the second light beam L2 and the third light beam L3, and the fourth reflecting element 2206 is used to reflect the sixth light beam L6 to form the third incident light beam of the third splitter path unit.

[0074] Among them, there are three light splitting path units 203, namely the coupling-in area light path, the turning area light path and the out-coupling area light path. The exposure spot sizes of the three light paths are the same, and the spot diameter size is 90-120mm. The above-mentioned first light splitting path unit corresponds to the coupling-in area light path, the second light splitting path unit corresponds to the turning area light path, and the third light splitting path unit corresponds to the out-coupling area light path. The light path adjustment part 2205 is a light path climbing frame or a light path lowering frame, the purpose of which is to adjust the height of the light path to avoid overlapping with the other two light paths. The second reflecting element 2203 and the third reflecting element 2204 are symmetrical reflectors, which can adjust the direction of the fourth light beam L4 to the reverse direction such as the sixth light beam L6.

[0075] In this embodiment, the light intensity of the three light splitting path units is consistent, the light spots of the first light splitting path unit and the third light splitting path unit are consistent, and the light spot of the second light splitting path unit is different from that of the other two paths. In other words, the light spot size of the coupling-in light path and the coupling-out light path is consistent, the light intensity of the turning zone is consistent with that of the other two paths, but the light spot is 0.7 to 1.4 times that of them.

[0076] Optionally, continue to refer to Figure 7 and Figure 8 The reflection component 2035 includes a fifth reflection element, which is used to adjust the angle at which the exposure light beam of the corresponding path is incident on the mask to be equal to the exposure angle.

[0077] It should be noted that the fifth reflecting element is a reflector. Still taking the three splitting path units as an example, the first splitting path unit corresponding to the coupling-in area includes the coupling-in fifth reflecting element 011, the second splitting path unit corresponding to the turning area includes the turning fifth reflecting element 012, and the third splitting path unit corresponding to the out-coupling area includes the out-coupling fifth reflecting element 013.

[0078] Among them, the fifth reflective element (the coupling-in fifth reflective element 011, the turning fifth reflective element 012 and the coupling-out fifth reflective element 013) in each light splitting path unit is equipped with an electrically controlled rotating stage to control the rotation angle of the light path in the xy-z plane, and the target angle is that the angle at which the light spot enters the mask is equal to the exposure angle of the area to be exposed. And the displacement axis in the x-axis direction is configured to give the same displacement as the displacement of the center of the light spot and the displacement axis in the y-axis direction, the purpose is to adjust the center of the light spot to be movable in the y-axis direction.

[0079] Optionally, continue to refer to Figure 7 and Figure 8 When the transmission direction of the exposure light beam of the corresponding path is not perpendicular to the periodic grating structure of the mask, the reflection component 2035 also includes a sixth reflection element, which is used to adjust the transmission direction of the exposure light beam of the corresponding path to be perpendicular to the periodic grating structure of the mask, and to direct the adjusted exposure light beam of the corresponding path to be incident on the fifth reflection element.

[0080] It should be noted that the sixth reflective element is a reflector. Still taking the three light splitting path units as an example, the first light splitting path unit corresponding to the coupling-in area includes the coupling-in fifth reflective element 011, the second light splitting path unit corresponding to the turning area includes the turning fifth reflective element 012, and the third light splitting path unit corresponding to the coupling-out area includes the coupling-out fifth reflective element 013. Figure 7 and Figure 8 It can be seen that the transmission direction of the exposure light beam corresponding to the second light splitting path unit is the y direction, which is set in advance by default to be perpendicular to the periodic grating structure of the mask. Although the transmission direction of the exposure light beam in the first light splitting path unit and the third light splitting path unit is also the y direction, it is not perpendicular to the periodic grating structure of the mask, and thus, a sixth reflective element needs to be added. Among them, the first light splitting path unit includes a coupling-in sixth reflective element 021, and the third light splitting path unit includes a coupling-out sixth reflective element 022. The coupling-in sixth reflective element 021 and the coupling-in fifth reflective element 011 are relatively fixed in position, and the coupling-out sixth reflective element 022 and the coupling-out fifth reflective element 013 are relatively fixed in position.

[0081] Among them, the sixth reflective element needs to be equipped with an electrically controlled x-axis displacement, an electrically controlled y-axis displacement, and an electrically controlled rotating table. The x-axis movement of the sixth reflective element is used to control the displacement of the light spot in the x-axis direction. The y-axis movement of the sixth reflective element is used to control the displacement of the light spot in the y-axis direction. In addition, the sixth reflective element is used to adjust the rotation angle in the xy plane, and the purpose is to make the propagation direction of the light spot perpendicular to the grating strip. The sixth reflective element is fixed together with the fifth reflective element, the displacement is relatively static, and the two are parallel in the xy plane.

[0082] In this embodiment, if the transmission direction of the exposure beam in the second light splitting path unit is not the y direction, the incident angle of the exposure beam in the turning area can be made perpendicular to the periodic grating structure of the mask by rotating and translating the workpiece stage 800.

[0083] Optionally, continue to refer to Figure 7 The reflection component 2035 also includes a seventh reflection element and an eighth reflection element arranged in parallel. The seventh reflection element is used to receive the exposure light beam of the corresponding path and reflect it to the eighth reflection element. The eighth reflection element is translated relative to the seventh reflection element along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to reflect the exposure light beam of the corresponding path to the fifth reflection element, and adjust the exposure light beam of the corresponding path to translate along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0084] Among them, the seventh reflective element and the eighth reflective element are both reflectors, and are a pair of parallel reflectors. The seventh reflective element is set at a fixed position and a fixed angle, and the eighth reflective element is set at an adjustable position and a fixed angle. The eighth reflective element is connected to the movable axis and can move along the x-axis direction. Still taking the three light splitting path units as an example, the first light splitting path unit corresponding to the coupling-in area includes the coupling-in seventh reflective element 031, the coupling-in eighth reflective element 032 and the coupling-in movable axis 041, the second light splitting path unit corresponding to the turning area includes the turning seventh reflective element 033, the turning eighth reflective element 034 and the turning movable axis 042, and the third light splitting path unit corresponding to the coupling-out area includes the coupling-out seventh reflective element 035, the coupling-out eighth reflective element 036 and the coupling-out movable axis 043.

[0085] exist Figure 7 In the optical path principle diagram shown, the coupling-in eighth reflective element 032 is arranged in linkage with the coupling-in sixth reflective element 021, and the movement of the coupling-in sixth reflective element 021 in the x-axis direction is performed simultaneously with the movement of the coupling-in eighth reflective element 032 in the x-axis direction. The coupling-out eighth reflective element 036 is arranged in linkage with the coupling-out sixth reflective element 022, and the movement of the coupling-out sixth reflective element 022 in the x-axis direction is performed simultaneously with the movement of the coupling-out eighth reflective element 036 in the x-axis direction.

[0086] For the turning zone, the eighth reflecting element 034 is also used to adjust the rotation angle of the exposure light beam of the turning path in the xy plane, and the target angle is to make the propagation direction of the light spot perpendicular to the grating strip. In this embodiment, due to the arrangement of the seventh reflecting element and the eighth reflecting element, when the transmission direction and angle of the exposure light beam are adjusted separately, the workpiece stage 800 does not need to move.

[0087] Thus, through Figure 7 and Figure 8 The setting of the central light source module can control the light intensity and exposure time of the exposure beam in each split light path unit, and can also control the angle between the exposure beam and the xy plane and the xy-z plane, so as to flexibly control the transmission direction and angle of the exposure beam.

[0088] Optionally, Fig. 9 is a schematic diagram of an exposure area to be exposed in an exposure device provided in an embodiment of the present invention; Figure 1 and Fig. 9 The side of the fifth reflective element adjacent to the waveguide plate 500 also includes a light blocking element 001. The light blocking element 001 is arranged perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to transmit the exposure light beam of the corresponding path. The light blocking element 001 can translate in a plane perpendicular to the transmission direction of the exposure light beam of the corresponding path.

[0089] That is, the light blocking element 001 can be configured with a movable device in the xy plane, and the movement of the light spot projected onto the workpiece stage 800 can be controlled by controlling the movement of the light blocking element 001. Fig. 9 The light transmittance is 0%. The outer diameter of the light blocking element 001 is slightly larger than the spot diameter of the exposure beam, and the inner diameter of the light blocking element 001 is slightly smaller than the outer diameter of the light blocking area of ​​the mask 400, so that the exposure beam can be prevented from irradiating other areas, so as to ensure that the exposure beam can be irradiated to the light-transmitting area A of the baffle 300 and the periodic grating mask structure of the mask 400. Then, the light spot passes through the light blocking element 001, the baffle 300, and the mask 400, and the pattern of the waveguide sheet 500 to be exposed after exposure is the target pattern, and no stray light exposure pattern will be generated.

[0090] Optionally, continue to refer to Figure 1 The exposure device further includes: a workpiece stage 800, which is used to carry the waveguide sheet 500 to be exposed, and the workpiece stage 800 can translate and rotate.

[0091] In this embodiment, the exposure device 100 further includes a light absorbing element 600 , a refractive index matching liquid spraying element 700 , a workpiece stage 800 and an alignment camera 900 , wherein the workpiece stage 800 further includes a supporting platform 801 , a connecting component 802 and a supporting base 803 .

[0092] The light absorbing element 600 is located between the waveguide sheet 500 to be exposed and the workpiece stage 800, and is used to absorb the exposure light beam passing through the waveguide sheet 500 to be exposed, so as to prevent the light beam from being reflected back to the waveguide sheet 500 to be exposed, thereby affecting the exposure effect. The material of the light absorbing element 600 has an absorptivity greater than 95% in the laser band, and the size of the light absorbing element 600 is comparable to that of the waveguide sheet 500. In addition, a prism-type irregular glass device can be selected to conduct the light from the lower surface of the waveguide sheet 500 to be exposed, so as not to reflect the light back to the waveguide sheet 500 to be exposed and affect the exposure.

[0093] The refractive index matching liquid spraying element 700 includes a liquid spraying nozzle and a movable axis. The function of the refractive index matching liquid spraying element 700 is to spray the refractive index matching liquid on the upper surface of the waveguide plate 500 to be exposed, and to spray the refractive index matching liquid after replacing the mask plate 400. The refractive index of the refractive index matching liquid matches the refractive index of the waveguide plate 500 to be exposed and the mask plate 400, which helps the light conduction. The movable area of ​​the fixed axis of the liquid spraying nozzle is within the range of the waveguide plate 500 to be exposed, and the displacement destination point of a single exposure is the center of the mask plate 400. The single liquid output is sufficient to fill the contact area between the mask plate 400 and the waveguide plate 500 to be exposed with the refractive index matching liquid. The liquid spraying method is not limited, and can be piezoelectric or pneumatic.

[0094] The alignment camera 900 is used to collect the alignment marks on the mask 400 so that the mask 400 and the waveguide 500 to be exposed can be aligned. It includes a set of lenses for alignment; it is movable. After the alignment is completed, the alignment camera 900 can be moved to the outside of the operating platform to avoid affecting the exposure. The movable area of ​​the movable arm of the alignment camera 900 is the outer ring area of ​​the mask 400. The inner side of the edge of the mask 400 is engraved with an alignment mark. The alignment camera 900 can collect the alignment mark and the alignment mark on the waveguide 500 to be exposed to achieve the alignment of the mask 400 and the waveguide 500 to be exposed.

[0095] In addition, the workpiece stage 800 is used to displace the light absorbing element 600 and the waveguide plate 500 to be exposed. The support stage 801 is provided with a positioning block 03 ( Fig.10 Schematic diagram of exposure of three areas to be exposed in the exposure device provided in an embodiment of the present invention. Fig.10As shown), it is used to position the waveguide sheet 500 to be exposed. The connecting component 802 can be displaced in the x-axis, y-axis, and θ-angle rotation. The workpiece stage 800 needs to drive the waveguide sheet 500 to be exposed to rotate for exposure, and the rotation angle range is [0°, 360°]. Therefore, the displacement area of ​​the workpiece stage 800 is the circumscribed circle of the waveguide sheet 500 to be exposed. When exposing, the area B to be exposed needs to be displaced to the center of the light spot. With the center of the light spot as the reference, the center of the fixed workpiece stage 800 coincides with the center of the light spot. The ±x and ±y displacement travels of the workpiece stage 800 need to be greater than the radius of the circumscribed circle of the waveguide sheet 500 to be exposed - the radius of the light spot.

[0096] Among them, continue to refer to Figure 1 and Fig.10 The edge of the mask 400 is heightened to prevent the refractive index matching liquid from penetrating into the upper surface of the mask 400 when the waveguide plate 500 to be exposed moves, thereby destroying the periodic structure and causing exposure failure. Two hanging ears, namely support columns 02, are protruded from the heightened part. The support columns 02 are connected to the support rods 01 and are used to move the mask 400.

[0097] like Fig.10 As shown, there are four movable operating parts above the workpiece stage 800, namely, the alignment camera 900, the mask part of the coupling-in area B1, the mask part of the turning area B2, and the mask part of the coupling-out area B3. The masks are all provided with "+" alignment marks. The alignment marks are distributed on the surface of the waveguide plate 500 to be exposed and the surface of the mask 400. The movable area of ​​the alignment camera 900 is the entire waveguide plate 500 to be exposed, and a group of alignment marks are distributed on the outer ring of the mask. The alignment camera 900 is aligned with the alignment mark position for alignment. Only one alignment camera 900 is drawn in this schematic diagram. Without affecting the movement of other modules, two alignment cameras 900 or three alignment cameras 900 can be set. Since the three grating areas are exposed at the same time, the workpiece stage 800 is provided with three mask moving modules (including support columns 02 and support rods 01). When a single exposure is performed, the mask 400 needs to be moved to the corresponding position. The turning area B2 and the out-coupling area B3 are relatively large in area and need to be exposed multiple times. The pattern of each exposure is different, so the baffle 300 needs to be replaced to complete the splicing exposure. Fig.11 Schematic diagram of a support unit in an exposure device provided in an embodiment of the present invention, Fig.11 As shown, a device for automatically replacing baffles, namely, a baffle switching disk 002, has an outer contour 003 and a hollow inner contour 004, and the hollow inner contour 004 forms a hollow receiving groove for placing baffles 300. The number of baffles 300 is not fixed, depending on the number of exposures in this exposure area. After each exposure, the automatic baffle replacement device rotates an angle to replace the next baffle 300.

[0098] In another embodiment, optionally, Fig.12 is a schematic diagram of a support unit in an exposure device provided in another embodiment of the present invention, such as Fig.12 As shown, the exposure device 100 also includes:

[0099] A support unit 002, the support unit 002 comprises a support shaft 007 and a plurality of support rods 006, one end of the support rod 006 is connected to the support shaft 007, and the other end is connected to a connecting piece for connecting a baffle and / or a mask;

[0100] Alternatively, the bracket unit 002 further includes a plurality of support seats 005, one end of the support rod 006 is connected to the support shaft 007, and the other end is connected to the support seat 005; the support rod 006 can rotate around the support shaft 007, and the support seat 005 can rotate by itself, and the support seat 005 has a hollow receiving groove that can accommodate the baffle 300, and at least two support seats 005 can simultaneously support the corresponding baffle 300 in the corresponding area to be exposed. Alternatively, the exposure device 100 further includes a baffle switching disk, and the baffle switching disk is annularly arranged with hollow receiving grooves.

[0101] Among them, each support rod 006 can rotate around the support axis 007 at the same time, or can rotate around the support axis 007 without interfering with each other; the bracket unit 002 of this embodiment is more flexible, and the angle between adjacent support seats 005 is not fixed and can be flexibly adjusted.

[0102] in, Fig.11 The bracket unit shown and Fig.12 The bracket units shown can be used interchangeably or in combination according to actual scenarios, so that the exposure device can expose two or more areas to be exposed at the same time. Fig.11 and Fig.12 The bracket units shown can all be arranged in multiple layers. Fig.11 and Fig.12 The bracket unit shown can also be used to carry masks and switch masks.

[0103] In another embodiment, Fig.12 The bracket unit shown may also be provided without the support base 005 , and directly connected to the mask 400 / baffle 300 via the support rod 006 , and a connector capable of connecting to the mask 400 / baffle 300 is provided at the end of the support rod 006 , such as a buckle.

[0104] The following is a specific example to introduce the exposure process of a waveguide plate using the exposure device proposed in the embodiment of the present invention.

[0105] With 15-inch HUD waveguide (such as Figure 2 As an example, a 4-inch mask (such as Figure 6 shown), where Figure 6 Figure (a) corresponds to the mask of coupling region B1. Figure 6 Figure (b) corresponds to the mask of the turning area B2. Figure 6 Figure (c) corresponds to the mask of the outcoupling area B3, and each mask is provided with a "+" alignment mark. The alignment mark on the waveguide plate 500 to be exposed needs to avoid the grating area, otherwise it will affect the formation of the grating in the exposure stage; at the same time, the alignment mark should be reduced to reduce the influence of the light conduction inside the waveguide glass, thereby affecting the imaging effect of the optical waveguide. The placement position of the waveguide plate 500 to be exposed on the workpiece stage 800 is shown in FIG. Fig.13 As shown, the waveguide plate 500 to be exposed has no rotation angle. Fig.13 The figure shows the splicing method of the coupling-in area B1, the splicing method of the turning area B2, and the splicing method of the coupling-out area B3. The area of ​​the coupling-in area B1 is usually small, and no splicing exposure is required; the grating area of ​​the turning area B2 and the coupling-out area B3 is large, and multiple splicing exposures are required. The principle of splicing is to minimize the number of exposures. Figure 6 It is a schematic diagram of the mask, which is divided into three masks according to the three grating areas. The most basic design of a pair of alignment marks "+" on mask 400 is to be set on mask 400, on the outer ring of mask 400, and symmetrical with the center of mask 400. However, if the alignment marks of mask 400 are all based on the basic design, the alignment marks will appear in the grating area, so the alignment marks that appear in the grating area need to be adjusted. The adjustment principle is to use the center of the circle as the rotation point, rotate to the non-grating area, and maintain a certain distance between a group of alignment marks to ensure the alignment accuracy. Figure 6 As shown, different exposure areas may share the same mask alignment mark, or different exposure areas may have alignment marks designated by different masks. Figure 3 is a schematic diagram of the baffle in the coupling area, Figure 5 This is a schematic diagram of the baffle in the turning area. Figure 4 It is a schematic diagram of the baffle in the outcoupling area. The gray area is the opaque area, and the white area is the translucent area.

[0106] Fig.14The exposure sequence of the waveguide plate 500 to be exposed is shown. The number of exposures of the waveguide plate 500 to be exposed is equal to the maximum number of exposures of a single grating area. The turning area B2 of the waveguide plate 500 to be exposed in the example has the largest number of exposures, which requires six times. Therefore, the waveguide plate 500 to be exposed needs to be exposed six times. The exposure principle is based on the exposure sequence of the turning area B2. Each time one of the areas of the turning area B2 is exposed, one of the coupling-in area B1 and the coupling-out area B3 can be selected for simultaneous exposure. It is required that the two masks 400 do not overlap. In this example, there is no overlap. However, if the overlap of the two masks 400 cannot be avoided during exposure, the mask 400 needs to be cut and the overlapping part needs to be cut off. If the cut part contains an alignment mark, an alignment mark needs to be added to the uncut part without the grating area.

[0107] Before exposure, make sure that the three optical paths are adjusted to the correct propagation angle and exposure incident angle, drop a proper amount of refractive index matching liquid on the waveguide, and stick the three masks to the waveguide to be exposed 500. Assume that the exposure area of ​​the coupling area B1 is 1-1 (the baffle corresponds to Figure 3 The exposure areas of the turning zone B2 are 2-1, 2-2, 2-3, 2-4, 2-5, and 2-6 (the baffles correspond to Figure 5 abcdef), the exposure areas of the outcoupling area B3 are 3-1, 3-2, 3-3, and 3-4 (the baffles correspond to Figure 4 Chinese: ghij).

[0108] Among them, Fig.14 As shown, the first exposure area 1201 of exposure sequence 1 is exposure area 2-1 in turning zone B2, and the second exposure area 1202 is exposure area 3-1 of coupling-out zone B3; the first exposure area 1203 of exposure sequence 2 is exposure area 2-3 in turning zone B2, and the second exposure area 1204 is exposure area 3-3 of coupling-out zone B3; the first exposure area 1205 of exposure sequence 3 is exposure area 2-2 in turning zone B2, and the second exposure area 1206 is exposure area 3-2 of coupling-out zone B3; the first exposure area 1207 of exposure sequence 4 is exposure area 2-4 in turning zone B2, and the second exposure area 1208 is exposure area 3-4 of coupling-out zone B3; the first exposure area 1209 of exposure sequence 5 is exposure area 1-1 of coupling-in zone B1, and the second exposure area 1210 is exposure area 2-5 of turning zone B2; and the exposure area 1211 of exposure sequence 6 is exposure area 2-6 in turning zone B2.

[0109] In exposure sequence 1, the mask fixing arm (support rod 01) is controlled to move the mask 400 to the corresponding position. The center of the light spot of the turning area B2 and the center of the light spot of the out-coupling area B3 need to be moved to the center of the mask 400, and the alignment camera 900 is turned on to align the two areas in turn. After the alignment is completed, the light path switch of the turning area and the light path switch of the out-coupling area are turned on to start exposure. After the exposure is completed, the light path switch is turned off. Continue with exposure sequence 2, replace the baffle 300, control the mask fixing arm to move the mask 400 to the corresponding position, move the center of the light spot of the turning area B2 and the center of the light spot of the out-coupling area B3 to the center of the mask 400, turn on the alignment camera 900, align the two areas in turn, after the alignment is completed, the light path switch of the turning area and the light path switch of the out-coupling area are turned on to start exposure. After the exposure is completed, the light path switch is turned off. According to the above operations, the exposure of exposure sequence 3, exposure sequence 4, exposure sequence 5, and exposure sequence 6 are completed, and then the exposure of the entire waveguide sheet 500 is completed.

[0110] Therefore, the exposure equipment proposed in the embodiment of the present invention solves the shortcoming that HUD optical waveguide devices are difficult to manufacture. The exposure equipment is designed with a variety of movable worktables, configured with software operations, and fully automated operations, which can achieve mass production. The equipment adopts a top-projection exposure method, the waveguide sheet is large in size, the mask is small in size, the small size is on top, and the large size is on the bottom, which is easier to operate. And the platform on which the waveguide sheet is placed is specially treated to make the exposure effect equivalent to the bottom-projection exposure method. The equipment is highly flexible and can be used for the exposure and preparation of a variety of waveguide sheets. The exposure equipment has the characteristics of high-precision alignment, and the prepared optical waveguide device has excellent imaging effect. The design of three optical paths reduces the waveguide exposure time and improves the preparation efficiency.

[0111] In summary, the technical solution of the embodiment of the present invention is to expose at least two areas to be exposed on the waveguide sheet at the same time by setting a light source module for forming at least two exposure beams, and sequentially setting a baffle and a mask in the direction of transmission of any exposure beam, wherein the baffle is provided with a light-transmitting area, and the mask is provided with a periodic grating mask structure, and the light-transmitting area is used to transmit the exposure beam of the corresponding path, so that the exposure beam of the corresponding path irradiates the mask, and transfers the periodic grating mask structure to the waveguide sheet, and along the direction of transmission of any exposure beam, the projection contour of the light-transmitting area of ​​the baffle on the plane where the waveguide sheet is located covers at least part of the corresponding area to be exposed, and the projection contour of the mask on the plane where the waveguide sheet is located covers the corresponding area to be exposed. Thus, multiple exposure paths are set at the same time, and multiple areas to be exposed on the waveguide sheet can be exposed at the same time, thereby improving the exposure efficiency. In addition, each area to be exposed can correspond to multiple baffles and one mask, which increases the utilization rate of the baffles and the mask, and reduces the preparation cost of the baffles and the mask.

[0112] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the present invention can be executed in parallel, sequentially or in different orders, as long as the desired results of the technical solution of the present invention can be achieved, and this document does not limit this.

[0113] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. An exposure device, characterized in that: include: A light source module, used for forming at least two exposure light beams; A baffle and a mask are sequentially arranged along the transmission direction of any exposure beam, wherein the baffle is provided with a light-transmitting area, and the mask is provided with a periodic grating mask structure, wherein the light-transmitting area is used to transmit the exposure beam of the corresponding path, so that the exposure beam of the corresponding path irradiates the mask, and transfers the periodic grating mask structure to the waveguide sheet to be exposed; In which, the waveguide plate has at least two areas to be exposed, and along the transmission direction of any exposure light beam, the projection contour of the light-transmitting area of ​​the baffle on the plane where the waveguide plate is located covers at least a part of the area corresponding to the area to be exposed, and the projection contour of the mask on the plane where the waveguide plate is located covers the area corresponding to the area to be exposed; based on the two exposure light beams, the two areas to be exposed can be exposed simultaneously.

2. The exposure device according to claim 1, characterized in that The light source module is provided with a main light path unit, a light splitting unit and at least two light splitting path units in sequence in the light transmission direction; The main optical path unit is provided with a laser, a first switch element, a shaping element, a first beam expansion element and a polarization element in sequence in the light transmission direction, for emitting a main laser beam; The beam splitting unit is used to split the main laser beam; Each of the splitting path units is provided with a light intensity control element, a second switching element, a second beam expansion element and a collimating element in sequence in the direction of light transmission, which are used to form an exposure beam from the beam split from the main laser beam. Each of the splitting path units is also provided with a reflection component, which is used to adjust the angle and / or position of the exposure beam of the corresponding path incident on the area to be exposed.

3. The exposure device according to claim 2, characterized in that The number of the light splitting path units is three, and the light splitting units include: a first light splitting prism, a second light splitting prism, a third light splitting prism, a light blocking element and a first reflecting element; The first beam splitter prism is used to split the main laser beam into a first beam and a second beam; The second beam splitter prism is used to form a third beam and a fourth beam from the first beam, the third beam is the first incident beam of the first beam splitting path unit, and the fourth beam is irradiated to the light blocking element; The third beam splitter prism is used to form a fifth beam and a sixth beam from the second beam, and the fifth beam is the second incident beam of the second beam splitting path unit; The first reflecting element is used for reflecting the sixth light beam to form a third incident light beam of the third light splitting path unit.

4. The exposure device according to claim 2, characterized in that The number of the light splitting path units is three, and the light splitting units include: a fourth light splitting prism, a fifth light splitting prism, a second reflecting element, a third reflecting element, a fourth reflecting element and an optical path adjusting member; The fourth beam splitter prism is used to split the main laser beam into a first beam and a second beam, wherein the second beam is a second incident beam of the second beam splitting path unit; The fifth beam splitter prism is used to form the first beam into a third beam and a fourth beam, and the third beam is the first incident beam of the first beam splitting path unit; The second reflecting element is used to reflect the fourth light beam to the third reflecting element to form a fifth light beam, the third reflecting element is used to reflect the fifth light beam to form a sixth light beam, the optical path adjusting component is used to adjust the distance between the sixth light beam and the second light beam and the third light beam, and the fourth reflecting element is used to reflect the sixth light beam to form a third incident light beam of the third light splitting path unit.

5. The exposure device according to claim 2, characterized in that The reflection assembly includes a fifth reflection element, which is used to adjust the angle at which the exposure light beam of the corresponding path is incident on the mask.

6. The exposure device according to claim 5, characterized in that When the transmission direction of the exposure light beam of the corresponding path is not perpendicular to the periodic grating structure of the mask, the reflection assembly also includes a sixth reflection element, which is used to adjust the transmission direction of the exposure light beam of the corresponding path to be perpendicular to the periodic grating structure of the mask, and to direct the adjusted exposure light beam of the corresponding path to be incident on the fifth reflection element.

7. The exposure device according to claim 5, characterized in that The reflection assembly also includes a seventh reflection element and an eighth reflection element arranged in parallel, the seventh reflection element is used to receive the exposure light beam of the corresponding path and reflect it to the eighth reflection element, the eighth reflection element is translated relative to the seventh reflection element along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path, and is used to reflect the exposure light beam of the corresponding path to the fifth reflection element, and adjust the exposure light beam of the corresponding path to translate along a direction perpendicular to the transmission direction of the exposure light beam of the corresponding path.

8. The exposure device according to claim 5, characterized in that The fifth reflecting element also includes a light blocking element on a side adjacent to the waveguide plate. The light blocking element is arranged perpendicular to the transmission direction of the exposure light beam of the corresponding path and is used to transmit the exposure light beam of the corresponding path. The light blocking element can translate in a plane perpendicular to the transmission direction of the exposure light beam of the corresponding path.

9. The exposure device according to claim 1, characterized in that Also includes: A support unit, the support unit comprising a support shaft and a plurality of support rods, one end of each support rod being connected to the support shaft, and the other end of each support rod being connected to a connecting piece for connecting a baffle and / or a mask; Alternatively, it further comprises a plurality of support seats, wherein one end of the support rod is connected to the support shaft, and the other end is connected to the support seat; the support rod can rotate around the support shaft, and the support seat can rotate on its own, and the support seat has a hollow receiving groove capable of accommodating the baffle, and at least two of the support seats can simultaneously support corresponding baffles to be located in corresponding areas to be exposed; Alternatively, it further comprises a baffle switching disc, on which a hollow receiving groove is arranged in an annular manner.

10. The exposure device according to claim 1, characterized in that Also includes: A workpiece stage is used to carry the waveguide sheet, and the workpiece stage can translate and rotate.

11. The exposure device according to claim 1, characterized in that Also includes: The refractive index matching liquid spraying element comprises a liquid spraying nozzle and a moving shaft. The liquid spraying nozzle is used to spray the refractive index matching liquid to the waveguide plate. The moving shaft is connected to a driving device to move the liquid spraying nozzle.

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