Method and system for online leveling mass unevenness of harmonic oscillator of quartz hemispherical resonator gyro

Abstract

The invention relates to the technical field of laser beam processing, in particular to a method and a system for online leveling quality unevenness of a harmonic oscillator of a quartz hemispherical resonator gyro, and the method comprises the following steps: mounting the quartz hemispherical resonator gyro on a four-axis mobile platform; testing the size and the position of the uneven quality of the fourth harmonic of the harmonic oscillator of the quartz hemispherical resonator gyro, and if the computer judges that the test result does not meet the precision requirement, turning to the next step; laser pulses emitted by the femtosecond laser enter the electronic dynamic regulation and control pulse string generation device through the high-response laser shutter and the light path transmission system to obtain a femtosecond laser pulse string, and the femtosecond laser pulse string is reflected by the ultrafast reflector and focused on the surface of the quartz hemispherical resonator gyroscope harmonic oscillator through the focusing objective lens for dynamic leveling machining. And the test result meets the precision requirement. According to the method and the system provided by the invention, high-quality and high-precision leveling of the quartz hemispherical resonator gyro harmonic oscillator is realized.

Description

Technical Field

[0001] The invention relates to the technical field of laser beam processing, and in particular to a method and a system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope. Background Art

[0002] The hemispherical resonator gyroscope is mainly composed of key components such as a hemispherical resonator and an excitation base. The material of the hemispherical resonator is generally fused quartz, which makes the processed resonator have many advantages such as high quality, high reliability, long service life, high precision, strong long-term stability of the scale factor, low noise in the measurement output signal, short start-up preparation time, low power consumption, small size, light weight, strong radiation resistance, good impact resistance, and strong resistance to temperature drift.

[0003] The principle of the hemispherical resonant gyroscope can be further extended to the standing wave sensitive angular velocity effect. Ideally, the symmetry of the resonator shows that the driving mode is consistent with the detected natural frequency, and the gyroscope has the best performance at this time. Although many advanced processing technologies are adopted in the processing, from the perspective of vibration dynamics, due to the inevitable existence of processing errors in the processing process, the processing accuracy does not meet the requirements of high-precision gyroscopes. Due to non-ideal factors such as processing errors, material density, and uneven stress distribution, the equivalent mass of the resonator is unevenly distributed along the circumference, which will lead to a decrease in the performance of the gyroscope, especially the unbalanced mass distributed according to the fourth harmonic will have a serious impact on the performance of the gyroscope. Therefore, in order to give full play to the high-precision potential of the hemispherical resonant gyroscope, it is particularly important to precisely level the mass imbalance defects.

[0004] The sensitive component of the quartz hemispherical resonator gyroscope is a representative of the complex curved surface processing of hard and brittle materials. It has become a key hot issue in domestic and foreign research due to its high processing difficulty, strict requirements on shape and position accuracy and surface quality, and high stress sensitivity. The methods for removing the unbalanced mass of the resonator currently mainly include: mechanical leveling, chemical corrosion leveling, ion beam etching leveling and laser leveling. Each method has its shortcomings, that is, the inevitable defects of stress concentration, sub-surface damage and excess residue in the adjustment process seriously affect the performance of the resonator.

[0005] Laser de-weighting and leveling uses laser to remove material from local positions of the resonator. The local heating feature of the leveling position means that the temperature of the entire resonator will not increase during the de-weighting process, which provides unique conditions for online leveling of the resonator. At the same time, this feature makes laser de-weighting and leveling technology the most promising method on the road to large-scale industrial production of quartz hemispherical resonator gyroscopes. However, the existing laser leveling technology has low de-weighting accuracy, and it is difficult to avoid the heat affected zone generated by laser processing during the leveling and de-weighting of the resonator, which causes the resonator to have local stress concentration problems after leveling, and even produces a deeper damage layer and surface debris and cracks, which seriously affects the quality factor and performance of the resonator after leveling. Summary of the invention

[0006] The technical problem to be solved by the present invention is to provide a method and system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope resonator. By forming a pulse train with adjustable pulse delay, local instantaneous electronic dynamic regulation is performed on the processing process of fused quartz, the electron density of the processed area during the processing is changed, and low-heat or even heatless removal of the fused quartz is completed before the material lattice temperature rises, thereby achieving high-quality and high-precision leveling of the quartz hemispherical resonator gyroscope resonator.

[0007] The present invention is achieved through the following technical solutions: A method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope comprises the following steps: S1: Install the quartz hemispherical resonant gyroscope on a four-axis moving platform; S2: The online leveling monitoring device tests the size and position of the fourth harmonic mass unevenness of the quartz hemispherical resonator gyroscope resonator, and transmits the test results to the computer. The computer determines whether the test results meet the accuracy requirements. If not, the quartz hemispherical resonator gyroscope resonator needs to be dynamically leveled, and then proceeds to the next step. S3: After the computer adjusts the processing parameters of the femtosecond laser pulse, the laser pulse emitted by the femtosecond laser enters the electronic dynamic control pulse train generation device through the high-response laser shutter and the optical path transmission system to obtain a femtosecond laser pulse train. The femtosecond laser pulse train is reflected by the ultrafast reflector and focused on the surface of the quartz hemispherical resonant gyroscope resonator through the focusing objective lens. The surface of the quartz hemispherical resonant gyroscope resonator is dynamically leveled by changing the electron density during the processing; S4: Repeat steps S2 to S3 until the test results meet the accuracy requirements.

[0008] Preferably, in step S2, the online leveling monitoring device uses a quality unevenness monitoring method under a time-division multiplexing control strategy to test the size and position of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator.

[0009] Further, in step S2, when the frequency splitting value of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator tested by the online leveling monitoring device is less than or equal to 0.1 MHz, the test result is judged to meet the accuracy requirements; when the frequency splitting value of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator tested by the online leveling monitoring device is greater than 0.1 MHz, the test result is judged to not meet the accuracy requirements.

[0010] Furthermore, during the dynamic leveling process in step S3, the illumination light emitted by the illumination light source is focused by the dichroic mirror, the ultrafast reflector and the focusing objective lens onto the surface of the quartz hemispherical resonant gyroscope resonator for reflection. The reflected illumination light is then returned by the focusing objective lens and the ultrafast reflector, and is reflected by the dichroic mirror to reach the camera dynamic imaging unit. The camera dynamic imaging unit feeds back the imaging result to the computer. The computer adjusts the femtosecond laser pulse processing parameters in real time according to the surface processing condition of the quartz hemispherical resonant gyroscope resonator displayed in the image.

[0011] Preferably, the femtosecond laser pulse processing parameters in step S3 include femtosecond laser energy, femtosecond pulse delay and femtosecond pulse repetition frequency.

[0012] Preferably, the initial femtosecond laser energy is 50 microjoules, the initial femtosecond pulse delay is 5 picoseconds, and the initial femtosecond pulse repetition frequency is 200 kHz.

[0013] Furthermore, in step S3, the electron density during the processing is controlled according to formula (1): (1); in: Indicates time, represents the radius of the laser beam axis, represents the depth of the fused silica material, represents the number of photons required for multiphoton absorption, express The radius of the laser beam axis at time The depth of the fused silica material is The free electron density is is the collision ionization constant, express The radius of the laser beam axis at time The depth of the fused silica material is The laser intensity distribution at express The radius of the laser beam axis at time The depth of the fused silica material is The laser intensity distribution at represents the multiphoton absorption cross-sectional area, represents the femtosecond pulse delay, is the free electron recombination time.

[0014] further, The radius of the laser beam axis at time The depth of the fused silica material is Laser intensity distribution at Control is performed according to formula (2): (2); in: represents the laser flux, represents the pulse width, express The radius of the laser beam axis at time The reflectivity of the material surface, Expressed as a natural constant The exponential function with base , is the laser beam waist radius, express The radius of the laser beam axis at time The depth of the fused silica material is The absorption coefficient of the material is represents the femtosecond laser energy, represents the femtosecond laser repetition frequency.

[0015] A system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope resonator is used to execute any of the above-mentioned methods for online leveling of uneven mass of a quartz hemispherical resonator gyroscope resonator, comprising a femtosecond laser processing optical path mechanism, a four-axis mobile platform and a computer. The quartz hemispherical resonator gyroscope is installed on the four-axis mobile platform. The femtosecond laser processing optical path mechanism comprises a femtosecond laser, a mechanical switch, an attenuation plate group, an aperture, an electronic dynamic control pulse sequence generator, an ultrafast reflector and a focusing objective lens. The laser beam emitted by the femtosecond laser enters the electronic dynamic control pulse sequence generator after passing through the mechanical switch, the attenuation plate group and the aperture, obtains a femtosecond laser pulse sequence through Michelson interference, is then reflected by the ultrafast reflector, and is focused on the quartz hemispherical resonator gyroscope through the focusing objective lens. The computer controls the electronic dynamic control pulse sequence generator to adjust the length of the pulse delay, and controls the opening and closing of the mechanical switch and the movement of the four-axis mobile platform.

[0016] Furthermore, the femtosecond laser processing optical path mechanism also includes a camera dynamic imaging unit, an illumination light source, a dichroic mirror and a plano-convex lens. The illumination light emitted by the illumination light source passes through the plano-convex lens, the dichroic mirror, the ultrafast reflector and the focusing objective lens to illuminate the quartz hemispherical resonator gyroscope and then is reflected. The reflected illumination light then passes through the focusing objective lens and the ultrafast reflector and returns, and after being reflected by the dichroic mirror, it reaches the camera dynamic imaging unit. The camera dynamic imaging unit feeds back the image to the computer, and the computer adjusts the femtosecond laser pulse processing parameters in real time according to the surface processing status of the quartz hemispherical resonator gyroscope resonator displayed in the image.

[0017] Beneficial effects of the invention: The method and system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope provided by the present invention have the following advantages: 1. The pulse shaping technology is used to perform femtosecond laser electronic dynamic control processing on the resonator, the core component of the quartz hemispherical resonator gyroscope, to achieve online high-precision leveling of the uneven fourth harmonic quality of the quartz hemispherical resonator gyroscope; 2. The method and system provided by the present invention have the characteristics of high efficiency, flexibility, non-contact and pollution-free. The femtosecond laser high-precision mass removal and leveling steps are combined with the online monitoring function. The positive feedback based on the test results further guides the leveling steps, which greatly reduces the leveling cycle and improves the efficiency, laying a foundation for the mass production of quartz hemispherical resonant gyroscopes. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the process of the present invention.

[0019] Figure 2 It is a schematic diagram of the system of the present invention.

[0020] In the figure: 1. Femtosecond laser; 2. Mechanical switch; 3. Attenuation plate group; 4. Aperture; 5. Camera dynamic imaging unit; 6. Illumination light source; 7. Dichroic mirror; 8. Ultrafast reflector; 9. Focusing objective lens; 10. Quartz hemispherical resonator gyroscope; 11. Four-axis mobile platform; 12. Computer; 13. Plano-convex lens; 14. Electronic dynamic control pulse sequence generator. DETAILED DESCRIPTION

[0021] A method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope, the flow chart of which is as follows Figure 1 As shown, the specific steps include: S1: Install the quartz hemispherical resonant gyroscope on a four-axis moving platform; S2: The online leveling monitoring device tests the size and position of the fourth harmonic mass unevenness of the quartz hemispherical resonator gyroscope resonator, and transmits the test results to the computer. The computer determines whether the test results meet the accuracy requirements. If not, the quartz hemispherical resonator gyroscope resonator needs to be dynamically leveled and goes to the next step. If it meets the accuracy requirements, there is no need to use this method to perform the operation of leveling the quartz hemispherical resonator gyroscope resonator mass unevenness.

[0022] Specifically, the online leveling monitoring device can use the quality unevenness monitoring method under the time-sharing multiplexing control strategy to test the size and position of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator, and the quality unevenness monitoring method under the time-sharing multiplexing control strategy is an existing technology.

[0023] The computer can determine whether the test results meet the accuracy requirements by the following methods: When the frequency splitting value of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator tested by the online leveling monitoring device is less than or equal to 0.1 MHz, the test result is judged to meet the accuracy requirements; when the frequency splitting value of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator tested by the online leveling monitoring device is greater than 0.1 MHz, the test result is judged to not meet the accuracy requirements.

[0024] S3: After the computer adjusts the processing parameters of the femtosecond laser pulse, the laser pulse emitted by the femtosecond laser enters the electronic dynamic control pulse train generation device through the high-response laser shutter and the optical path transmission system to obtain a femtosecond laser pulse train. The femtosecond laser pulse train is reflected by the ultrafast reflector and focused on the surface of the quartz hemispherical resonant gyroscope resonator through the focusing objective lens. The surface of the quartz hemispherical resonant gyroscope resonator is dynamically leveled by changing the electron density during the processing; This dynamic leveling processing method changes the electron density during the processing and completes the low-heat or even no-heat removal of molten quartz before the material lattice temperature rises. It performs thermal stress-free, low-damage, and high-precision mass removal on the surface area of ​​the oscillator, thereby achieving high-quality and high-precision leveling of the quartz hemispherical resonator gyroscope oscillator.

[0025] During the dynamic leveling process, the illumination light emitted by the illumination light source is focused by the dichroic mirror, the ultrafast reflector and the focusing objective lens onto the surface of the quartz hemispherical resonant gyroscope resonator for reflection. The reflected illumination light then returns through the focusing objective lens and the ultrafast reflector, and is reflected by the dichroic mirror to reach the camera dynamic imaging unit. The camera dynamic imaging unit feeds back the imaging results to the computer. The computer adjusts the femtosecond laser pulse processing parameters in real time according to the surface processing conditions of the quartz hemispherical resonant gyroscope resonator displayed in the image.

[0026] The femtosecond laser high-precision mass removal and leveling are combined with the online monitoring function during the processing. The positive feedback of the test results further guides the leveling steps, which greatly reduces the leveling cycle and improves efficiency, laying the foundation for the mass production of quartz hemispherical resonant gyroscopes.

[0027] Preferably, the femtosecond laser pulse processing parameters in step S3 include femtosecond laser energy, femtosecond pulse delay and femtosecond pulse repetition frequency.

[0028] Preferably, the initial femtosecond laser energy is 50 microjoules, the initial femtosecond pulse delay is 5 picoseconds, and the initial femtosecond pulse repetition frequency is 200 kHz. By optimizing the parameters, the free electron density can be controlled, thereby controlling the interaction process between the laser and the fused quartz material, and removing the material at the microgram level before the electrons and phonons couple and heat is transferred, thereby achieving non-thermal, low-stress, and high-precision leveling of uneven mass.

[0029] Furthermore, in step S3, the electron density during the processing is controlled according to formula (1): (1); in: Indicates time, represents the radius of the laser beam axis, represents the depth of the fused silica material, represents the number of photons required for multiphoton absorption, express The radius of the laser beam axis at time The depth of the fused silica material is The free electron density is is the collision ionization constant, express The radius of the laser beam axis at time The depth of the fused silica material is The laser intensity distribution at express The radius of the laser beam axis at time The depth of the fused silica material is The laser intensity distribution at represents the multiphoton absorption cross-sectional area, represents the femtosecond pulse delay, is the free electron recombination time.

[0030] further, The radius of the laser beam axis at time The depth of the fused silica material is Laser intensity distribution at Control is performed according to formula (2): (2); in: represents the laser flux, represents the pulse width, express The radius of the laser beam axis at time The reflectivity of the material surface, Indicated by natural constant The exponential function with base , is the laser beam waist radius, express The radius of the laser beam axis at time The depth of the fused silica material is The absorption coefficient of the material is represents the femtosecond laser energy, represents the femtosecond laser repetition frequency.

[0031] The above method is to The radius of the laser beam axis at time The depth of the fused silica material is Laser intensity distribution at The control of the electron density during the processing can be achieved, thereby ensuring that the fused quartz is removed at low or even no heat before the material lattice temperature rises, preventing the resonator from having local stress after leveling, and even causing deeper damage layers and surface debris and cracks. This enables high-quality and high-precision leveling of the quartz hemispherical resonator gyroscope.

[0032] S4: Repeat steps S2 to S3 until the test results meet the accuracy requirements.

[0033] The specific record form during the leveling process is shown in Table 1: Table 1

[0034] It can be seen from Table 1 that the entire leveling process requires multiple repetitions of steps S2 to S3, and as the leveling process parameters change, the femtosecond laser energy gradually decreases in the later stage of leveling, thereby controlling the interaction process between the laser and the fused quartz material, removing the material at the microgram level before the electrons and phonons couple and heat is transferred, thus achieving non-thermal, low-stress, and high-precision leveling of uneven quality.

[0035] A system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope resonator, used to perform any of the above-mentioned methods for online leveling of uneven mass of a quartz hemispherical resonator gyroscope resonator, the system diagram is as follows: Figure 2As shown, it includes a femtosecond laser processing optical path mechanism, a four-axis mobile platform 11 and a computer 12. A quartz hemispherical resonant gyroscope 10 is installed on the four-axis mobile platform. The femtosecond laser processing optical path mechanism includes a femtosecond laser 1, a mechanical switch 2, an attenuation plate group 3, an aperture 4, an electronic dynamic control pulse sequence generator 14, an ultrafast reflector 8 and a focusing objective lens 9. The laser beam emitted by the femtosecond laser enters the electronic dynamic control pulse sequence generator after passing through the mechanical switch, the attenuation plate group and the aperture, obtains a femtosecond laser pulse sequence through Michelson interference, and then is reflected by the ultrafast reflector and focused on the quartz hemispherical resonant gyroscope through the focusing objective lens. The computer controls the electronic dynamic control pulse sequence generator to adjust the length of the pulse delay, and controls the opening and closing of the mechanical switch and the movement of the four-axis mobile platform.

[0036] Furthermore, the femtosecond laser processing optical path mechanism also includes a camera dynamic imaging unit 5, an illumination light source 6, a dichroic mirror 7 and a plano-convex lens 13. The illumination light emitted by the illumination light source passes through the plano-convex lens, the dichroic mirror, the ultrafast reflector and the focusing objective lens to illuminate the quartz hemispherical resonator gyroscope and then is reflected. The reflected illumination light then passes through the focusing objective lens and the ultrafast reflector and returns. After being reflected by the dichroic mirror, it reaches the camera dynamic imaging unit. The camera dynamic imaging unit feeds back the image to the computer. The computer adjusts the femtosecond laser pulse processing parameters in real time according to the surface processing condition of the quartz hemispherical resonator gyroscope resonator displayed in the image.

[0037] In summary, the present invention provides a method and system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope resonator, which forms a pulse train with adjustable pulse delay, performs local instantaneous electronic dynamic regulation on the processing process of fused quartz, changes the electron density of the processed area during the processing, and completes low-heat or even heatless removal of the fused quartz before the material lattice temperature rises, thereby achieving high-quality and high-precision leveling of the quartz hemispherical resonator gyroscope resonator.

[0038] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope, characterized in that: The steps include: S1: Install the quartz hemispherical resonant gyroscope on a four-axis moving platform; S2: The online leveling monitoring device tests the size and position of the fourth harmonic mass unevenness of the quartz hemispherical resonator gyroscope resonator, and transmits the test results to the computer. The computer determines whether the test results meet the accuracy requirements. If not, the quartz hemispherical resonator gyroscope resonator needs to be dynamically leveled, and then proceeds to the next step. S3: After the computer adjusts the processing parameters of the femtosecond laser pulse, the laser pulse emitted by the femtosecond laser enters the electronic dynamic control pulse train generation device through the high-response laser shutter and the optical path transmission system to obtain a femtosecond laser pulse train. The femtosecond laser pulse train is reflected by the ultrafast reflector and focused on the surface of the quartz hemispherical resonant gyroscope resonator through the focusing objective lens. The surface of the quartz hemispherical resonant gyroscope resonator is dynamically leveled by changing the electron density during the processing; S4: Repeat steps S2 to S3 until the test results meet the accuracy requirements.

2. The method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 1, characterized in that: In step S2, the online leveling monitoring device uses a quality unevenness monitoring method under a time-division multiplexing control strategy to test the size and position of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator.

3. The method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 1, characterized in that: In step S2, when the frequency splitting value of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator tested by the online leveling monitoring device is less than or equal to 0.1 MHz, the test result is judged to meet the accuracy requirements; when the frequency splitting value of the fourth harmonic quality unevenness of the quartz hemispherical resonator gyroscope resonator tested by the online leveling monitoring device is greater than 0.1 MHz, the test result is judged to not meet the accuracy requirements.

4. The method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 1, characterized in that: During the dynamic leveling process in step S3, the illumination light emitted by the illumination light source is focused by the dichroic mirror, the ultrafast reflector and the focusing objective lens to the surface of the quartz hemispherical resonant gyroscope resonator for reflection. The reflected illumination light is then returned by the focusing objective lens and the ultrafast reflector, and is reflected by the dichroic mirror to reach the camera dynamic imaging unit. The camera dynamic imaging unit feeds back the imaging result to the computer. The computer adjusts the femtosecond laser pulse processing parameters in real time according to the surface processing condition of the quartz hemispherical resonant gyroscope resonator displayed in the image.

5. The method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 1, characterized in that: The femtosecond laser pulse processing parameters in step S3 include femtosecond laser energy, femtosecond pulse delay and femtosecond pulse repetition frequency.

6. The method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 5, characterized in that: The initial femtosecond laser energy is 50 microjoules, the initial femtosecond pulse delay is 5 picoseconds, and the initial femtosecond pulse repetition frequency is 200 kHz.

7. The method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 1, characterized in that: In step S3, the electron density during the processing is controlled according to formula (1): （1）； in: Indicates time, represents the radius of the laser beam axis, represents the depth of the fused silica material, represents the number of photons required for multiphoton absorption, express The radius of the laser beam axis at time The depth of the fused silica material is The free electron density is is the collision ionization constant, express The radius of the laser beam axis at time The depth of the fused silica material is The laser intensity distribution at express The radius of the laser beam axis at time The depth of the fused silica material is The laser intensity distribution at represents the multiphoton absorption cross-sectional area, represents the femtosecond pulse delay, is the free electron recombination time.

8. The method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 7, characterized in that: The radius of the laser beam axis at time The depth of the fused silica material is Laser intensity distribution at Control is performed according to formula (2): （2）； in: represents the laser flux, represents the pulse width, express The radius of the laser beam axis at time The reflectivity of the material surface, Indicated by natural constant The exponential function with base , is the laser beam waist radius, express The radius of the laser beam axis at time The depth of the fused silica material is The absorption coefficient of the material is represents the femtosecond laser energy, represents the femtosecond laser repetition frequency.

9. A system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope, characterized in that: A method for online leveling of uneven mass of a quartz hemispherical resonator gyroscope resonator as described in any one of claims 1 to 8, comprising a femtosecond laser processing optical path mechanism, a four-axis mobile platform and a computer, wherein the quartz hemispherical resonator gyroscope is mounted on the four-axis mobile platform, the femtosecond laser processing optical path mechanism comprising a femtosecond laser, a mechanical switch, an attenuation plate group, an aperture, an electronic dynamic control pulse sequence generator, an ultrafast reflector and a focusing objective lens, the laser beam emitted by the femtosecond laser enters the electronic dynamic control pulse sequence generator after passing through the mechanical switch, the attenuation plate group and the aperture, obtains a femtosecond laser pulse sequence through Michelson interference, is then reflected by the ultrafast reflector, and is focused on the quartz hemispherical resonator gyroscope through the focusing objective lens, the computer controls the electronic dynamic control pulse sequence generator to adjust the length of the pulse delay, controls the opening and closing of the mechanical switch and the movement of the four-axis mobile platform.

10. The system for online leveling of uneven mass of a quartz hemispherical resonator gyroscope according to claim 9, characterized in that: The femtosecond laser processing optical path mechanism also includes a camera dynamic imaging unit, an illumination light source, a dichroic mirror and a plano-convex lens. The illumination light emitted by the illumination light source passes through the plano-convex lens, the dichroic mirror, the ultrafast reflector and the focusing objective lens to illuminate the quartz hemispherical resonator gyroscope and then is reflected. The reflected illumination light then passes through the focusing objective lens and the ultrafast reflector and returns. After being reflected by the dichroic mirror, it reaches the camera dynamic imaging unit. The camera dynamic imaging unit feeds back the image to the computer. The computer adjusts the femtosecond laser pulse processing parameters in real time according to the surface processing status of the quartz hemispherical resonator gyroscope resonator displayed in the image.

Images