Rolling polishing equipment for steel ball production of ball mill

By designing rolling polishing equipment, using polishing motors and cooling systems to achieve efficient steel ball polishing, the problem of low polishing efficiency in the prior art is solved, and the grinding efficiency and product quality are improved.

CN119304767APending Publication Date: 2025-01-14LOUDI DINGLI HYDRAULIC TECH CO LTD
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Patent Information

Application Number
CN202410096958.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-01-24
Publication Date
2025-01-14

AI Technical Summary

Technical Problem

The existing steel ball polishing methods are low in efficiency and are difficult to achieve batch polishing, resulting in limited grinding efficiency and quality.

Method used

A rolling polishing equipment for steel ball production of ball mills is designed, including a polishing main machine and loading mechanism, using a polishing motor, cooling system and PLC controller, efficient polishing is achieved through an annular cooling tube and a three-head spray tube, and through electromagnetic locks and hands The rod is conveniently loaded and removed by the steel ball.

Benefits of technology

It realizes high-efficiency steel ball polishing, which can quickly process multiple steel balls, ensures the accuracy and smoothness of polishing, reduces friction and energy consumption, and improves grinding effect and product quality.

✦ Generated by Eureka AI based on patent content.

Smart Images

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Patent Text Reader

Abstract

The invention provides rolling polishing equipment for ball mill steel ball production, and relates to the technical field of steel ball polishing. The rolling polishing equipment for ball mill steel ball production comprises a polishing main machine and a loading mechanism, the polishing main machine comprises a polishing shell, a cooling water conveying cavity, a cooling water storage cavity and an equipment cavity are formed in the polishing shell, and a circulating water pump is fixedly arranged in the cooling water conveying cavity; a semiconductor chilling plate is embedded in the inner wall of one side of the cooling water storage cavity, and a temperature detector is fixedly arranged at the position, close to the semiconductor chilling plate, in the cooling water storage cavity. And a polishing motor is fixedly arranged at the center of the interior of the equipment cavity, and the output end of the polishing motor penetrates through the equipment cavity to be communicated to the exterior of the polishing shell and is fixedly provided with a polishing mechanism. The rolling polishing equipment for steel ball production of the ball mill is high in polishing efficiency, easy to operate and convenient and fast to use.
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Description

Technical Field

[0001] The invention relates to the technical field of steel ball polishing, in particular to rolling polishing equipment for producing steel balls for ball mills. Background Art

[0002] A ball mill is a common grinding equipment used to crush and mix materials. It usually consists of a rotating cylinder with abrasives, such as steel balls or ceramic balls, and the material to be ground inside. The cylinder rotates horizontally or tilted so that the abrasives and the material are thrown toward the cylinder wall to grind the material. A ball mill is a device used to grind materials, usually using grinding balls (steel balls) to crush and grind the materials. The steel balls used in ball mills are generally made of high-quality alloy steel or carbon steel, because these materials have sufficient hardness and wear resistance to withstand high-intensity wear and impact during the ball milling process. These steel balls are usually heat-treated to ensure that their hardness and wear resistance meet the requirements so that they can perform grinding operations for a long time. In a ball mill, the diameter of the steel balls is usually between a few millimeters and a few inches, and different sizes of steel balls can be used for different grinding requirements and materials. In general, the steel balls of the ball mill must have sufficient hardness, wear resistance and impact resistance to ensure efficient grinding operations. Therefore, a key step in the production process of steel balls is to polish the steel balls.

[0003] Polishing the steel balls used in the ball mill is to ensure the finish and smoothness of their surfaces, thereby improving grinding efficiency and grinding quality. Polishing can eliminate the roughness and particles on the surface of the steel balls, making their surfaces smoother and reducing the friction resistance of the surface. The polished steel balls can roll and slide better in the ball mill, reducing the friction and resistance between the materials, thereby reducing energy consumption and loss. In addition, polishing can also increase the contact area between the abrasive and the materials, increase the grinding effect and the degree of refinement. By polishing the steel balls, pollution and impurities can also be reduced. After polishing, the surface of the steel balls is smoother and cleaner, and it is not easy to produce impurities such as iron filings and oxides, thereby reducing the risk of contamination of the materials and maintaining the high quality of the products. Most of the existing polishing equipment is polished by hand-held steel balls or clamped by fixtures. This polishing method is inefficient and difficult to polish in batches. Summary of the invention

[0004] 1. Technical issues to be resolved

[0005] In view of the deficiencies in the prior art, the present invention provides a rolling polishing device for producing ball mill steel balls, which solves the problem of low polishing efficiency in the prior polishing method.

[0006] (II) Technical solution

[0007] To achieve the above purpose, the present invention is implemented by the following technical scheme: a rolling polishing device for ball mill steel ball production, comprising a polishing main unit and a loading mechanism, the polishing main unit comprising a polishing shell, the polishing shell is provided with a cooling water transport chamber, a cooling water storage chamber and an equipment chamber, a circulating water pump is fixedly provided inside the cooling water transport chamber, a semiconductor cooling sheet is embedded in the inner wall of one side of the cooling water storage chamber, and a temperature detector is fixedly provided inside the cooling water storage chamber near the semiconductor cooling sheet;

[0008] A polishing motor is fixedly arranged at the inner center of the equipment cavity, the output end of the polishing motor passes through the equipment cavity and is connected to the outside of the polishing shell, where a polishing mechanism is fixedly arranged, a PLC controller and a No. 1 storage battery are fixedly arranged on the inner top surface of the polishing shell, an annular cooling pipe is fixedly arranged on the outer surface of the polishing motor, and a Hall sensor is arranged on the surface of the annular cooling pipe;

[0009] A No. 1 pipe is fixedly arranged at the output end of the circulating water pump, a three-head spray pipe is penetrated through the inner wall of the equipment cavity away from the cooling water storage cavity, and nozzles are fixedly arranged at both ends of the three-head spray pipe located outside the polishing shell;

[0010] An upper cover plate and a lower cover plate are respectively hingedly provided at the upper end and the lower end of the polishing housing away from the cooling water storage chamber, and an electromagnetic lock groove and a lower limit groove are respectively provided at the center of the opposite side of the upper cover plate and the lower cover plate, and an electromagnetic lock seat is fixedly provided inside the electromagnetic lock groove;

[0011] The loading mechanism includes a loading shell, one side of which is embedded with a No. 2 storage battery, an electromagnetic lock core metal strip and a lower clamping strip are fixedly provided at the center of the upper end and the center of the lower end of the loading shell respectively, a polished ball groove is opened at the center of the inner top surface and the center of the inner bottom surface of the loading shell, the front and rear ends of the two polished ball grooves are movably provided with entry and exit round covers, the outsides of the four entry and exit round covers are fixedly provided with connecting blocks, and hand levers are fixedly provided between the four connecting blocks.

[0012] Preferably, an inlet and a drain are respectively provided on the upper and lower ends of the inner wall of one side of the cooling water storage chamber, and sealing plugs are threadedly sleeved inside the inlet and the drain, and a protective heat dissipation cover is fixedly provided on the outer wall of the polished shell located at the semiconductor refrigeration plate.

[0013] Preferably, a filter baffle is fixedly installed at the lower end of the cooling water storage chamber, a No. 2 pipe is fixedly installed at the water inlet of the circulating water pump, and the lower end of the No. 2 pipe passes through the cooling water transport chamber to the interior of the cooling water storage chamber.

[0014] Preferably, a return pipe is provided between the cooling water storage chamber and the equipment chamber, a micro water pump is provided on the pipe body of the return pipe, one end of the return pipe is located at the bottom of the cooling water storage chamber, and the other end passes through to the outside of the polishing shell.

[0015] Preferably, one end of the three-head spray pipe and the No. 1 pipeline are fixedly arranged at both ends of the annular cooling pipe.

[0016] Preferably, the polishing mechanism includes a fixed block, one end of which is fixedly connected to the output end of the polishing motor, the other end of the fixed block is fixedly provided with a fixed shaft, the middle part of the shaft of the fixed shaft is threadedly sleeved with an internal threaded tube, the body of the internal threaded tube is fixedly sleeved with an extrusion sponge, and the surface of the extrusion sponge is fixedly provided with a polishing cloth.

[0017] Preferably, the semicircular groove angle of the polished ball groove needs to be greater than 90°, the upper end of the electromagnetic lock core metal strip is located inside the electromagnetic lock seat, and the lower end of the lower clamping strip is located inside the lower limit groove.

[0018] Working principle: During assembly, bend the upper cover upwards and the lower cover downwards, hold the loading shell so that the lower card strip is inserted into the lower limit slot, and insert the polishing mechanism into the loading shell, then cover the upper cover, open the electromagnetic lock seat, and fix the electromagnetic lock seat and the electromagnetic lock core metal strip to achieve the installation of the equipment;

[0019] During installation, pull the hand lever on the front side to open the inlet and outlet round cover, put the steel ball to be polished into the polishing ball slot, close the inlet and outlet round cover, and then start the polishing motor. The output end of the polishing motor rotates to drive the polishing mechanism to rotate. The polishing mechanism rotates to polish the steel ball through the polishing cloth. During this process, the number of rotations of the output end of the polishing motor is controlled by the PLC controller to achieve timed and quantitative polishing. At the same time, the semiconductor refrigeration plate can be turned on to cool the cooling water in the cooling water storage chamber. Then start the circulating water pump to make the cooling water pass through the No. 2 pipe, the No. 1 pipe, the annular cooling pipe and the three-head spray pipe in turn and then be sprayed out by the nozzle to cool the polished steel ball. At the same time, the polishing motor can also be cooled. The cooling water after cooling the steel ball will enter the cooling water storage chamber through the return pipe due to the inclined surface of the loading shell to realize water circulation.

[0020] (III) Beneficial effects

[0021] The present invention provides a rolling polishing device for producing ball mill steel balls. It has the following beneficial effects:

[0022] The present invention provides a rolling polishing device for producing ball mill steel balls. The polishing device provided in the present invention is a split mechanism, which is divided into a polishing main machine and a loading mechanism. The polishing main machine is mainly used for cooling during the polishing process of the steel balls, and can also assist in cooling the polishing motor. The loading mechanism is adapted to the steel balls, and can efficiently position a plurality of steel balls while performing polishing operations. In this process, both placing in and taking out the steel balls are very quick. At the same time, the installation between the polishing main machine and the loading mechanism is also very convenient. In addition, the polishing device provided in the present invention can set the total number of polishing revolutions, thereby achieving efficient and precise polishing. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the axial side of the present invention;

[0024] Figure 2 It is a schematic cross-sectional view of the present invention;

[0025] Figure 3 It is a schematic diagram of the axial side of the loading mechanism of the present invention;

[0026] Figure 4 It is a schematic diagram of the loading mechanism of the present invention in a cross-section.

[0027] Figure 5 It is a front cross-sectional schematic diagram of the polishing mechanism of the present invention;

[0028] Figure 6 It is a schematic diagram of the system flow of the present invention;

[0029] Figure 7 This is a protection circuit diagram of the electromagnetic lock circuit of the present invention;

[0030] Figure 8 This is the electromagnetic lock control circuit diagram of the present invention;

[0031] Fig. 9 This is a control circuit diagram of the semiconductor refrigeration plate of the present invention.

[0032] Among them, 1. Polishing host; 2. Loading mechanism; 101. Polishing shell; 102. Cooling water transport chamber; 103. Cooling water storage chamber; 104. Equipment chamber; 105. Polishing mechanism; 106. Electromagnetic lock seat; 107. Electromagnetic lock slot; 108. Upper cover; 109. No. 1 battery; 1010. PLC controller; 1011. No. 1 pipeline; 1012. Circulating water pump; 1013. No. 2 pipeline; 1014. Temperature detector; 1015. Protective heat dissipation cover; 1016. Semiconductor refrigeration plate; 1017. Sealing plug; 1018. Filter partition; 1019. Return pipe; 1020, micro water pump; 1021, Hall sensor; 1022, annular cooling pipe; 1023, three-head spray pipe; 1024, lower limit groove; 1025, lower cover; 1026, polishing motor; 201, loading shell; 202, polishing ball groove; 203, electromagnetic lock core metal strip; 204, inlet and outlet round cover; 205, lower clamping strip; 206, No. 2 battery; 207, hand lever; 208, connecting block; 10501, extrusion sponge; 10502, fixing block; 10503, internal threaded pipe; 10504, polishing cloth; 10505, fixing shaft. DETAILED DESCRIPTION

[0033] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0034] Example:

[0035] like Figure 1-9 As shown, an embodiment of the present invention provides a rolling polishing device for ball mill steel ball production, including a polishing main unit 1 and a loading mechanism 2, the polishing main unit 1 includes a polishing shell 101, and the polishing shell 101 is respectively provided with a cooling water transport chamber 102, a cooling water storage chamber 103 and an equipment chamber 104, a circulating water pump 1012 is fixedly provided inside the cooling water transport chamber 102, a semiconductor refrigeration plate 1016 is embedded in the inner wall of one side of the cooling water storage chamber 103, and a temperature detector 1014 is fixedly provided inside the cooling water storage chamber 103 near the semiconductor refrigeration plate 1016.

[0036] The temperature detector 1014 is specifically an intelligent temperature sensor, which is a sensor module integrating a temperature sensor and a signal processing circuit, and generally has a digital output and high accuracy and stability. Its working principle is as follows:

[0037] The intelligent temperature sensor integrates temperature sensor elements (such as thermal resistors, thermistors or thermocouples) inside. When the ambient temperature changes, the sensor element will generate an electrical signal accordingly. The built-in signal processing circuit of the sensor will amplify, filter and linearize the electrical signal generated by the sensor element to ensure that the output digital signal has high accuracy and stability. After signal processing, the intelligent temperature sensor will convert the temperature measurement result into a digital signal and output it through the communication interface. Common output interfaces include I2C, SPI, and UART digital interfaces, which can also be analog output or digital signal output. The intelligent temperature sensor can communicate with a microprocessor or other digital system through a digital interface to realize the transmission and processing of temperature data. Users can obtain ambient temperature data by reading the digital signal output by the sensor.

[0038] like Figure 6 As shown, the temperature detector 1014 is used to detect the stability of the cooling water, thereby controlling the output power of the semiconductor refrigeration plate 1016, and the protective heat dissipation cover 1015 arranged outside the polishing shell 101 is used to protect the semiconductor refrigeration plate 1016, to prevent the heating end of the outer semiconductor refrigeration plate 1016 from being accidentally touched by the staff during the heat dissipation process and to protect the semiconductor refrigeration plate 1016 from being damaged by bumps.

[0039] A polishing motor 1026 is fixedly installed at the inner center of the equipment cavity 104, and the output end of the polishing motor 1026 passes through the equipment cavity 104 and reaches the outside of the polishing shell 101 where a polishing mechanism 105 is fixedly installed. A PLC controller 1010 and a No. 1 battery 109 are fixedly installed on the inner top surface of the polishing shell 101, and an annular cooling pipe 1022 is fixedly installed on the outer surface of the polishing motor 1026, and a Hall sensor 1021 is installed on the surface of the annular cooling pipe 1022.

[0040] The principle of the Hall sensor 1021 detecting the number of rotations of the polishing motor 1026 is:

[0041] Mainly through the Hall effect, the Hall effect refers to when a conductor is suspended in an electric field, the flow of current through it in a certain direction will generate a transverse voltage, and this phenomenon is called the Hall effect. Using this effect, the Hall sensor 1021 can detect the change in the magnetic field generated when the motor rotates, thereby measuring the speed and position of the motor. When the Hall sensor 1021 is used to detect the number of revolutions of the polishing motor 1026, a permanent magnet, such as a permanent magnet or a magnet, is usually installed on the motor. When the motor rotates, the permanent magnet generates a rotating magnetic field. The Hall sensor 1021 is installed near the permanent magnet. When the permanent magnet rotates, the magnetic field generated also changes. The Hall sensor 1021 can output a signal related to the rotation of the motor by detecting this magnetic field change. By processing this signal, the speed and position of the motor can be measured, thereby realizing the detection of the number of revolutions of the motor. In general, the Hall sensor 1021 uses the Hall effect to detect the change in the magnetic field generated by the permanent magnet, thereby realizing the measurement of the speed and position of the motor, and then the number of revolutions of the polishing motor 1026 can be detected.

[0042] The front end of the polishing housing 101 is provided with a display screen and a key control panel, and is connected to a PLC controller 1010 to realize the start and stop control of the electrical equipment on the polishing host 1, as well as the setting of the number of polishing circles.

[0043] A No. 1 pipe 1011 is fixedly installed at the output end of the circulating water pump 1012, and a three-head spray pipe 1023 is penetrated through the inner wall of the equipment cavity 104 away from the cooling water storage cavity 103, and nozzles are fixedly installed at both ends of the three-head spray pipe 1023 located outside the polishing shell 101.

[0044] The water spraying directions of the two nozzles are directed to the polishing ball grooves 202 at the upper and lower parts, so that the steel balls can avoid high temperatures caused by large friction during the polishing process, which will affect the polishing of the steel balls.

[0045] An upper cover plate 108 and a lower cover plate 1025 are respectively hingedly provided at the upper end and the lower end of the polishing housing 101 away from the cooling water storage chamber 103, and an electromagnetic lock groove 107 and a lower limit groove 1024 are respectively provided at the center of the opposite side of the upper cover plate 108 and the lower cover plate 1025, and an electromagnetic lock seat 106 is fixedly provided inside the electromagnetic lock groove 107;

[0046] The loading mechanism 2 includes a loading shell 201, one side of which is embedded with a No. 2 storage battery 206, an electromagnetic lock core metal strip 203 and a lower clamping strip 205 are fixedly provided at the center of the upper end and the center of the lower end of the loading shell 201 respectively, a polished ball groove 202 is opened at the center of the top surface and the center of the bottom surface of the loading shell 201, the front and rear ends of the two polished ball grooves 202 are movably sleeved with entry and exit round covers 204, the outside of the four entry and exit round covers 204 are fixedly provided with connecting blocks 208, and hand levers 207 are fixedly provided between the four connecting blocks 208.

[0047] The hand lever 207 can be used to facilitate the removal of the inlet and outlet round cover 204, and can also make the inlet and outlet round cover 204 more stable when inserted into the polishing ball groove 202. The steel balls to be polished can be placed in the inlet and outlet round cover 204 on the front side, and the polished steel balls can be taken out by opening the inlet and outlet round cover 204 on the rear side. If the steel balls need to be discharged more conveniently, an electric telescopic rod or oil cylinder can be set at the front part of the lower end of the polishing shell 101. The inclination angle can be adjusted by the extension and retraction of the electric telescopic rod, which facilitates the discharge and is more convenient to use.

[0048] The No. 2 storage battery 206 is used to supply power to the electromagnetic lock core metal strip 203 .

[0049] A water inlet and a water outlet are respectively provided on the upper and lower ends of the inner wall of one side of the cooling water storage chamber 103, and the insides of the water inlet and the water outlet are threadedly sleeved with sealing plugs 1017, and a protective heat dissipation cover 1015 is fixedly provided on the outer wall of the polishing shell 101 located at the semiconductor refrigeration plate 1016.

[0050] A filter baffle 1018 is fixedly installed at the lower end of the cooling water storage chamber 103, and a No. 2 pipe 1013 is fixedly installed at the water inlet of the circulating water pump 1012, and the lower end of the No. 2 pipe 1013 passes through the cooling water transport chamber 102 and reaches the interior of the cooling water storage chamber 103.

[0051] A return pipe 1019 is provided between the cooling water storage chamber 103 and the equipment chamber 104 . A micro water pump 1020 is provided on the pipe body of the return pipe 1019 . One end of the return pipe 1019 is located at the bottom of the cooling water storage chamber 103 , and the other end passes through to the outside of the polishing shell 101 .

[0052] One end of the three-head spray pipe 1023 and the No. 1 pipeline 1011 are fixedly arranged at both ends of the annular cooling pipe 1022.

[0053] The annular cooling pipe 1022 is wound closely around the polishing motor 1026. When the circulating cooling water is being transported, the cooling water will first cool down the polishing motor 1026 and then cool down the steel balls.

[0054] The polishing mechanism 105 includes a fixed block 10502, one end of which is fixedly connected to the output end of the polishing motor 1026, and the other end of the fixed block 10502 is fixedly provided with a fixed shaft 10505, and the middle part of the shaft of the fixed shaft 10505 is threadedly sleeved with an internal threaded tube 10503, and the tube body of the internal threaded tube 10503 is fixedly sleeved with an extrusion sponge 10501, and the surface of the extrusion sponge 10501 is fixedly provided with a polishing cloth 10504.

[0055] According to the data of the steel ball that needs to be polished, the internal threaded tube 10503 can be rotated so that the internal threaded tube 10503 leaves the fixed shaft 10505, and then the corresponding polishing cloth 10504 is replaced. The extruded sponge 10501 set in the polishing mechanism 105 is used to adapt to the steel ball to increase the polishing area.

[0056] The semicircular groove angle of the polished ball groove 202 needs to be greater than 90°, the upper end of the electromagnetic lock core metal strip 203 is located inside the electromagnetic lock seat 106, and the lower end of the lower clamping strip 205 is located inside the lower limit groove 1024.

[0057] The angle of the semicircular groove needs to be greater than 90° to prevent the steel ball from falling out of the groove and increase the stability of polishing. The lower end of the lower clamping strip 205 is located inside the lower limit groove 1024 for reinforcing the connection, and the upper end of the electromagnetic lock core metal strip 203 is located inside the electromagnetic lock seat 106 for locking and fixing.

[0058] like Figure 7 As shown, in this circuit, the power supply provides power to the electromagnetic lock and is protected against overload and short circuit by a fuse or fuse. The voltage stabilizer is used to stabilize the power supply voltage to ensure that the electromagnetic lock works at the appropriate voltage. The relay is used to isolate the electromagnetic lock circuit and the control circuit to prevent electromagnetic interference and possible interference from the control circuit. Between the electromagnetic lock and the control circuit, reverse polarity protection can be added to prevent damage caused by incorrect polarity connection.

[0059] like Figure 8 As shown in the figure, this circuit includes a switch and a control circuit. The control circuit controls the on / off state of the relay to switch the on / off state of the electromagnetic lock. When the switch is turned on, the control circuit will output a high-level signal, causing the contacts of the relay to close, and the electromagnetic lock will be powered on to lock the door. When the switch is turned off, the control circuit will output a low-level signal, causing the contacts of the relay to open, and the electromagnetic lock will be powered off to release the door.

[0060] like Fig. 9As shown in the figure, in this circuit, the temperature detector is used to measure the temperature of the surrounding environment. The control circuit receives the signal from the temperature detector and controls the opening and closing state of the semiconductor cooling chip according to the temperature signal. When the temperature exceeds the set threshold, the control circuit will turn on the semiconductor cooling chip to start working and lower the ambient temperature. When the temperature drops below the set threshold, the control circuit will turn off the semiconductor cooling chip and stop cooling.

[0061] Program code (pseudo code):

[0062]

[0063]

[0064] In the program code, a loop is used to continuously read the value of the temperature detector, and the opening and closing state of the semiconductor refrigerator is controlled according to the temperature value. When the temperature exceeds the set threshold, the turnOnCooler() function is called to turn on the semiconductor refrigerator; when the temperature is lower than the set threshold, the turnOffCooler() function is called to turn off the semiconductor refrigerator.

[0065] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A rolling polishing device for producing ball mill steel balls, comprising a polishing main machine (1) and a loading mechanism (2), characterized in that: The polishing main unit (1) comprises a polishing shell (101), wherein a cooling water transport chamber (102), a cooling water storage chamber (103) and an equipment chamber (104) are respectively arranged inside the polishing shell (101), a circulating water pump (1012) is fixedly arranged inside the cooling water transport chamber (102), a semiconductor cooling plate (1016) is embedded in the inner wall of one side of the cooling water storage chamber (103), and a temperature detector (1014) is fixedly arranged inside the cooling water storage chamber (103) near the semiconductor cooling plate (1016); A polishing motor (1026) is fixedly arranged at the inner center of the equipment cavity (104); the output end of the polishing motor (1026) passes through the equipment cavity (104) and leads to the polishing housing (101) where a polishing mechanism (105) is fixedly arranged outside; a PLC controller (1010) and a No. 1 storage battery (109) are fixedly arranged on the inner top surface of the polishing housing (101); an annular cooling pipe (1022) is fixedly sleeved on the outer surface of the polishing motor (1026); and a Hall sensor (1021) is sleeved on the surface of the annular cooling pipe (1022); A No. 1 pipe (1011) is fixedly provided at the output end of the circulating water pump (1012); a three-head spray pipe (1023) is provided through the inner wall of the equipment chamber (104) away from the cooling water storage chamber (103); and nozzles are fixedly provided at both ends of the three-head spray pipe (1023) located outside the polishing housing (101); An upper cover plate (108) and a lower cover plate (1025) are respectively hingedly provided at the upper end and the lower end of the polishing housing (101) away from the cooling water storage chamber (103); an electromagnetic lock slot (107) and a lower limit slot (1024) are respectively provided at the center of the opposite side of the upper cover plate (108) and the lower cover plate (1025); an electromagnetic lock seat (106) is fixedly provided inside the electromagnetic lock slot (107); The loading mechanism (2) comprises a loading shell (201), a No. 2 storage battery (206) is embedded in one side of the loading shell (201), an electromagnetic lock core metal strip (203) and a lower clamping strip (205) are respectively fixedly arranged at the center of the upper end and the center of the lower end of the loading shell (201), a polishing ball groove (202) is opened at the center of the inner top surface and the center of the inner bottom surface of the loading shell (201), the front and rear ends of the two polishing ball grooves (202) are movably sleeved with entry and exit round covers (204), the outsides of the four entry and exit round covers (204) are fixedly arranged with connection blocks (208), and hand levers (207) are fixedly arranged between the four connection blocks (208).

2. The rolling polishing equipment for producing ball mill steel balls according to claim 1, characterized in that: A water inlet and a water outlet are respectively provided on the upper and lower ends of the inner wall of one side of the cooling water storage chamber (103), and the insides of the water inlet and the water outlet are threadedly sleeved with sealing plugs (1017), and a protective heat dissipation cover (1015) is fixedly provided on the outer wall of the polishing shell (101) located at the semiconductor refrigeration plate (1016).

3. The rolling polishing equipment for producing ball mill steel balls according to claim 1, characterized in that: A filter baffle (1018) is fixedly arranged at the lower end of the cooling water storage chamber (103), a No. 2 pipe (1013) is fixedly arranged at the water inlet of the circulating water pump (1012), and the lower end of the No. 2 pipe (1013) passes through the cooling water transport chamber (102) and reaches the interior of the cooling water storage chamber (103).

4. The rolling polishing equipment for producing ball mill steel balls according to claim 1, characterized in that: A return pipe (1019) is provided between the cooling water storage chamber (103) and the equipment chamber (104), a micro water pump (1020) is provided on the pipe body of the return pipe (1019), one end of the return pipe (1019) is located at the bottom of the cooling water storage chamber (103), and the other end passes through to the outside of the polishing shell (101).

5. The rolling polishing equipment for producing ball mill steel balls according to claim 1, characterized in that: One end of the three-head spray pipe (1023) and the first pipeline (1011) are fixedly arranged at both ends of the annular cooling pipe (1022).

6. The rolling polishing equipment for producing ball mill steel balls according to claim 1, characterized in that: The polishing mechanism (105) comprises a fixed block (10502), one end of which is fixedly connected to the output end of the polishing motor (1026), and the other end of the fixed block (10502) is fixedly provided with a fixed shaft (10505), an internal threaded tube (10503) is threadedly sleeved on the middle part of the shaft of the fixed shaft (10505), an extrusion sponge (10501) is fixedly sleeved on the tube body of the internal threaded tube (10503), and a polishing cloth (10504) is fixedly provided on the surface of the extrusion sponge (10501).

7. The rolling polishing equipment for producing ball mill steel balls according to claim 1, characterized in that: The semicircular groove angle of the polished ball groove (202) must be greater than 90°, the upper end of the electromagnetic lock core metal strip (203) is located inside the electromagnetic lock seat (106), and the lower end of the lower clamping strip (205) is located inside the lower limit groove (1024).