Isolation device of semiconductor cleaning equipment

Abstract

The invention discloses an isolation device of semiconductor cleaning equipment, and relates to the technical field of isolation, the isolation device comprises a cleaning device, the surface of the cleaning device is fixedly provided with a slide rail, and the inner wall of the slide rail is slidably provided with a slide block; the isolation device is arranged at the top of the sliding block, and the isolation device comprises an elastic telescopic plate, a cleaning roller, a scraping plate, a fixing frame, a rotating rod, a rotating plate, a sliding frame, an isolation plate and a baffle. The top of the cleaning device is sealed and isolated through sliding of the isolation plate, external pollutants are prevented from entering a cleaning area to pollute a semiconductor material and affect normal use, the elastic telescopic plate is fixedly installed on the surface of the sliding rail, and the situation that pollutants exist at the bottom of the isolation plate when the isolation plate is closed is prevented. The equipment may fall into a cleaning device in the cleaning process, and the isolation cleaning effect of the equipment is affected.

Description

Technical Field

[0001] The present invention relates to the field of isolation technology, in particular to an isolation device for semiconductor cleaning equipment. Background Art

[0002] The isolation device of semiconductor cleaning equipment plays a vital role in semiconductor manufacturing. Its main purpose is to protect sensitive components inside the equipment, ensure that they are not contaminated during the cleaning process, and improve the cleaning effect.

[0003] The patent with the patent announcement number CN215988678U relates to an isolation device for semiconductor cleaning equipment and semiconductor cleaning equipment. The isolation device for semiconductor cleaning equipment includes: a driving module, including a main body and a movable part, the main body is used to drive the movable part to move; a plurality of buffers are respectively located on the first side and the second side of the movable part along the displacement path of the movable part; a baffle is connected to the movable part. The isolation device for semiconductor cleaning equipment proposed in the patent has a movable part that can be movably arranged on the main body, the main body can drive the movable part to move, and a baffle is arranged on the movable part, which can isolate two cleaning tanks, thereby reducing the possibility of acid gas jumping between the two cleaning tanks during the semiconductor cleaning process, improving the cleanliness and yield of semiconductors, and the movement of the movable part can make the baffle no longer separate the two cleaning tanks, thereby facilitating the transportation of semiconductors between the two cleaning tanks.

[0004] In the above patent, a baffle is provided on the movable part, which can isolate the two cleaning tanks, thereby reducing the possibility of acid gas jumping between the two cleaning tanks during the semiconductor cleaning process, improving the cleanliness and yield of the semiconductor. In addition, the movement of the movable part can make the baffle no longer separate the two cleaning tanks, thereby facilitating the transportation of semiconductors between the two cleaning tanks. However, during use, impurities or cleaning liquid may adhere to the isolation plate, which may cause contamination to the semiconductors cleaned subsequently. Summary of the invention

[0005] In view of the deficiencies of the prior art, the present invention provides an isolation device for semiconductor cleaning equipment, which solves the problems raised in the above-mentioned background technology.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: an isolation device for semiconductor cleaning equipment, comprising: a cleaning device, a slide rail is fixedly installed on the surface of the cleaning device, and a slider is slidably installed on the inner wall of the slide rail; an isolation device, the isolation device is arranged on the top of the slider, the isolation device includes an elastic telescopic plate, a cleaning roller, a scraper, a fixed frame, a rotating rod, a rotating plate, a sliding frame, an isolation plate and a baffle, the semiconductor material is cleaned by placing the semiconductor into the cleaning device, and the isolation plate is pushed to slide, and the top of the cleaning device is sealed and isolated by the sliding of the isolation plate to prevent external contaminants from entering the cleaning area, causing the semiconductor material to be contaminated and affecting normal use, and at the same time, the isolation plate will contact the cleaning roller during the sliding process, and the cleaning roller will clean the solution or impurities attached to the bottom of the isolation plate. The cam is fixedly mounted on the surface of the slide rail, the cleaning roller is fixedly mounted on the free end of the elastic telescopic plate, the scraper is fixedly mounted on the fixed end of the elastic telescopic plate, the fixing frame is fixedly mounted on the free end of the elastic telescopic plate, the rotating rod is rotatably mounted on the surface of the fixing frame, the sliding frame is slidably mounted on a side of the slide rail close to the fixing frame, one end of the rotating plate is fixedly mounted on the circumferential surface of the rotating rod, the other end of the rotating plate is rotatably mounted on the inner wall of the sliding frame, the isolation plate is fixedly mounted on the top of the slider, the baffle is fixedly mounted on the bottom of the isolation plate, and a notch is provided at the bottom of the isolation plate. The rotation of the rotating plate will squeeze the rotating rod to move downward, the downward movement of the rotating rod will squeeze the fixing frame to move downward, the downward movement of the fixing frame will drive the free end of the elastic telescopic plate to move downward, and the downward movement of the free end of the elastic telescopic plate will drive the cleaning roller to move downward.

[0007] According to the above technical solution, a No. 1 spring is arranged between the sliding frame and the sliding rail, and the sliding frame is driven to reset by the No. 1 spring. A No. 1 torsion spring is arranged between the rotating plate and the sliding frame, and the rotating plate is driven to reset by the No. 1 torsion spring.

[0008] According to the above technical solution, a sealing device for improving the isolation effect of the equipment is arranged inside the cleaning device, and a disengagement device is arranged on the sealing device. The sealing device includes a trapezoidal block, a connecting pipe, a hydraulic rod, a push rod, a connecting frame and a sealing rubber. The isolation plate moves toward the direction close to the trapezoidal block. The movement of the isolation plate will squeeze the trapezoidal block to move downward, and the downward movement of the trapezoidal block will squeeze the hydraulic rod to move downward. The downward movement of the hydraulic rod will squeeze the liquid inside the connecting pipe to push the push rod to move upward. A groove is provided on the surface of the cleaning device, and the trapezoidal block is slidably installed on the inner wall of the groove. The connecting pipe is fixedly penetrated through the surface of the groove, and the hydraulic rod is slidably installed on the inner wall of the connecting pipe. The hydraulic rod is fixedly installed on the bottom of the trapezoidal block, and the push rod is slidably installed on the end of the connecting pipe away from the hydraulic rod. The connecting frame is fixedly installed on the top of the push rod, and the sealing rubber is arranged on the top of the connecting frame.

[0009] According to the above technical solution, a connecting frame is fixedly installed on the bottom of the connecting frame, a rotating plate is rotatably installed on the surface of the connecting frame, a square plate is fixedly installed on the circumferential surface of the rotating plate, a fixed plate is fixedly installed on the inner wall of the cleaning device, and a square frame is slidably installed on the surface of the connecting frame. The downward rotation of the square plate will drive the rotating plate to rotate upward, and the upward rotation of the rotating plate will push the square frame to move upward, and the upward movement of the square frame will cover the sealing rubber.

[0010] According to the above technical solution, a No. 2 spring is arranged between the trapezoidal block and the groove, and the trapezoidal block is reset by the No. 2 spring. A No. 2 torsion spring is arranged between the connecting frame and the rotating plate, and the rotating plate is reset by the No. 2 torsion spring. The fixed plate is arranged above the square plate. A No. 3 spring is arranged between the connecting frame and the square frame, and the square frame is driven by the No. 3 spring.

[0011] According to the above technical scheme, the disengagement device includes a sealing plate, a connecting plate, a rotating plate, a limit block, a fixed rod and a protrusion. The sealing plate is driven upward by moving the connecting frame upward. The upward movement of the sealing plate will drive the connecting plate upward. The upward movement of the connecting plate will drive the rotating plate upward. The sealing plate is fixedly installed at the bottom of the connecting frame. A slide groove is provided on the surface of the cleaning device. The connecting plate is fixedly installed on a side of the sealing plate close to the cleaning device. The rotating plate is rotatably installed on the inner wall of the connecting plate. The limit block is fixedly installed on the inner wall of the connecting plate. The fixed rod is fixedly installed on the inner wall of the slide groove. The protrusion is fixedly installed on a side of the fixed rod close to the rotating plate.

[0012] According to the above technical solution, a slide plate is slidably installed on the inner wall of the slide groove, a rotating push plate is rotatably installed on the surface of the slide plate, and a limiting plate is fixedly installed on the surface of the slide plate. During the resetting process of the isolation plate, the groove will squeeze the rotating push plate to move downward, and the rotating push plate will be limited by the limiting plate, so that the rotating push plate drives the slide plate to move downward. The downward movement of the slide plate will squeeze the connecting plate downward, and the downward movement of the connecting plate will drive the sealing plate, the connecting frame and the sealing rubber to move downward.

[0013] According to the above technical solution, a No. 3 torsion spring is arranged between the rotating plate and the connecting plate, and the rotating plate is driven to reset by the No. 3 torsion spring. The limit block is arranged above the rotating plate. A No. 4 spring is arranged between the slide groove and the slide plate, and the slide plate is driven to reset by the No. 4 spring. A No. 4 torsion spring is arranged between the slide plate and the rotating push plate, and the rotating push plate is driven to reset by the No. 4 torsion spring.

[0014] The present invention provides an isolation device for semiconductor cleaning equipment. It has the following beneficial effects: (1) In this invention, the isolation plate will contact the cleaning roller during the sliding process, and the cleaning roller will clean the solution or impurities attached to the bottom of the isolation plate to prevent the existence of contaminants at the bottom of the isolation plate when the isolation plate is closed. The contaminants may fall into the cleaning device during the equipment cleaning process, affecting the isolation and cleaning effect of the equipment. At the same time, the downward movement of the free end of the elastic telescopic plate will drive the cleaning roller to move downward, and the impurities on the cleaning roller will be scraped off by the scraper to prevent other impurities from being attached to the cleaning roller and affecting the subsequent scraping effect. (2) In this invention, the upward movement of the connecting frame will drive the sealing rubber to move upward, and the upward movement of the sealing rubber will fit the isolation plate, thereby improving the sealing and isolation effect of the equipment. A good sealing effect can effectively prevent external air, dust, particles and other contaminants from entering the cleaning area, ensuring the purity of the cleaning process. The upward movement of the square frame will cover the sealing rubber to prevent the contaminated liquid from splashing onto the sealing rubber during the cleaning process, accelerating the aging process of the rubber, causing the rubber to become brittle and lose elasticity, thereby affecting the sealing performance. (3) In the invention, when the rotating plate moves downward, it will contact with the protrusion and generate vibration, which will shake off the splashed cleaning liquid through the vibration, preventing the cleaning liquid from adhering to the square frame and affecting subsequent use. At the same time, during the resetting process of the isolation plate, the groove will squeeze the rotating push plate to move downward, and the rotating push plate will be limited by the limit plate, so that the rotating push plate drives the sliding plate to move downward. The downward movement of the sliding plate will squeeze the connecting plate downward, and the downward movement of the connecting plate will drive the sealing plate, the connecting frame and the sealing rubber to move downward, preventing the sealing rubber from being too tightly sealed with the isolation plate and affecting the normal opening of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic diagram of the overall bottom structure of the present invention; Figure 3 For the present invention Figure 2 A schematic diagram of the structure enlargement of part A; Figure 4 It is a schematic diagram of the cross-sectional structure of the cleaning device of the present invention; Figure 5 This is a schematic diagram of the structure of the trapezoidal block and the connecting pipe of the present invention; Figure 6 It is a schematic diagram of the cleaning device and the connection frame structure of the present invention; Figure 7 For the present invention Figure 6 A schematic diagram of the structure of part B in the middle is enlarged; Figure 8 It is a schematic diagram of the structure of the separation device of the present invention; Fig. 9 For the present invention Figure 8 Schematic diagram of the enlarged structure of part C in the middle.

[0016] In the figure: 1, cleaning device; 2, slide rail; 3, slider; 4, elastic telescopic plate; 5, cleaning roller; 6, scraper; 7, fixed frame; 8, rotating rod; 9, rotating plate; 10, sliding frame; 11, isolation plate; 12, baffle; 131, trapezoidal block; 132, connecting pipe; 133, hydraulic rod; 134, push rod; 135, connecting frame; 136, sealing rubber; 137, connecting frame; 138, rotating plate; 139, square plate; 1310, fixed plate; 1311, square frame; 141, sealing plate; 142, connecting plate; 143, rotating plate; 144, limiting block; 145, fixed rod; 146, bump; 147, slide plate; 148, rotating push plate; 149, limiting plate. DETAILED DESCRIPTION

[0017] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0018] See also Figure 1-Figure 3 , one embodiment of the present invention is: an isolation device for semiconductor cleaning equipment, comprising: a cleaning device 1, a slide rail 2 is fixedly installed on the surface of the cleaning device 1, and a slider 3 is slidably installed on the inner wall of the slide rail 2; an isolation device, the isolation device is arranged on the top of the slider 3, the isolation device includes an elastic telescopic plate 4, a cleaning roller 5, a scraper 6, a fixed frame 7, a rotating rod 8, a rotating plate 9, a sliding frame 10, an isolation plate 11 and a baffle 12, to prevent the existence of contaminants at the bottom of the isolation plate 11 when the isolation plate 11 is closed, which may fall into the cleaning device 1 during the equipment cleaning process, thereby affecting the isolation and cleaning effect of the equipment, the elastic telescopic plate 4 is fixedly installed on the surface of the slide rail 2, the cleaning roller 5 is fixed It is installed at the free end of the elastic telescopic plate 4, the scraper 6 is fixedly installed at the fixed end of the elastic telescopic plate 4, the fixing frame 7 is fixedly installed at the free end of the elastic telescopic plate 4, the rotating rod 8 is rotatably installed on the surface of the fixing frame 7, the sliding frame 10 is slidably installed on the side of the slide rail 2 close to the fixing frame 7, one end of the rotating plate 9 is fixedly installed on the circumferential surface of the rotating rod 8, and the other end of the rotating plate 9 is rotatably installed on the inner wall of the sliding frame 10, the isolation plate 11 is fixedly installed on the top of the slider 3, the baffle 12 is fixedly installed on the bottom of the isolation plate 11, and a notch is provided at the bottom of the isolation plate 11. The scraper 6 is used to scrape off the impurities on the cleaning roller 5 to prevent other impurities from being attached to the cleaning roller 5 and affecting the subsequent scraping effect.

[0019] A No. 1 spring is arranged between the sliding frame 10 and the slide rail 2, and the sliding frame 10 is reset by the No. 1 spring. A No. 1 torsion spring is arranged between the rotating plate 9 and the sliding frame 10, and the rotating plate 9 is reset by the No. 1 torsion spring.

[0020] When the present embodiment is working, the semiconductor material is cleaned by placing the semiconductor into the cleaning device 1, and the isolation plate 11 is pushed to slide. The top of the cleaning device 1 is sealed and isolated by sliding the isolation plate 11 to prevent external pollutants from entering the cleaning area, causing the semiconductor material to be contaminated and affecting normal use. At the same time, the isolation plate 11 will contact the cleaning roller 5 during the sliding process. The cleaning roller 5 will clean the solution or impurities attached to the bottom of the isolation plate 11 to prevent the presence of pollutants at the bottom of the isolation plate 11 when the isolation plate 11 is closed. The pollutants may fall into the cleaning device 1 during the equipment cleaning process, affecting the isolation and cleaning effect of the equipment. At the same time, the isolation plate The movement of 11 will drive the baffle plate 12 to move, and the movement of the baffle plate 12 will contact the sliding frame 10. The baffle plate 12 will push the sliding frame 10 to move in the direction close to the cleaning device 1. The movement of the sliding frame 10 in the direction close to the cleaning device 1 will squeeze the rotating plate 9 to rotate, and the rotation of the rotating plate 9 will squeeze the rotating rod 8 to move downward. The downward movement of the rotating rod 8 will squeeze the fixing frame 7 to move downward, and the downward movement of the fixing frame 7 will drive the free end of the elastic telescopic plate 4 to move downward. The downward movement of the free end of the elastic telescopic plate 4 will drive the cleaning roller 5 to move downward, and the impurities on the cleaning roller 5 will be scraped off by the scraper 6 to prevent other impurities from being attached to the cleaning roller 5 and affecting the subsequent scraping effect.

[0021] See also Figure 1-Figure 9 On the basis of the above embodiment, in another embodiment of the present invention, a sealing device for improving the isolation effect of the equipment is arranged inside the cleaning device 1, and a disengagement device is arranged on the sealing device. The sealing device comprises a trapezoidal block 131, a connecting pipe 132, a hydraulic rod 133, a push rod 134, a connecting frame 135 and a sealing rubber 136. A groove is provided on the surface of the cleaning device 1, the trapezoidal block 131 is slidably mounted on the inner wall of the groove, the connecting pipe 132 is fixedly penetrated through the surface of the groove, the hydraulic rod 133 is slidably mounted on the inner wall of the connecting pipe 132, the hydraulic rod 133 is fixedly mounted on the bottom of the trapezoidal block 131, the push rod 134 is slidably mounted on the end of the connecting pipe 132 away from the hydraulic rod 133, the connecting frame 135 is fixedly mounted on the top of the push rod 134, and the sealing rubber 136 is arranged on the top of the connecting frame 135, and the sealing rubber 136 moves upward to fit with the isolation plate 11, thereby improving the sealing isolation effect of the equipment. A good sealing effect can effectively prevent external air, dust, particles and other pollutants from entering the cleaning area, thereby ensuring the purity of the cleaning process.

[0022] A connecting frame 137 is fixedly installed at the bottom of the connecting frame 135, a rotating plate 138 is rotatably installed on the surface of the connecting frame 137, a square plate 139 is fixedly installed on the circumferential surface of the rotating plate 138, a fixed plate 1310 is fixedly installed on the inner wall of the cleaning device 1, and a square frame 1311 is slidably installed on the surface of the connecting frame 135 to prevent contaminated liquid from splashing onto the sealing rubber 136 during the cleaning process, accelerating the aging process of the rubber, causing the rubber to become brittle and lose elasticity, thereby affecting the sealing performance.

[0023] A No. 2 spring is arranged between the trapezoidal block 131 and the groove, and the trapezoidal block 131 is reset by the No. 2 spring. A No. 2 torsion spring is arranged between the connecting frame 137 and the rotating plate 138, and the rotating plate 138 is reset by the No. 2 torsion spring. The fixed plate 1310 is arranged above the square plate 139. A No. 3 spring is arranged between the connecting frame 135 and the square frame 1311, and the square frame 1311 is reset by the No. 3 spring.

[0024] The disengagement device includes a sealing plate 141, a connecting plate 142, a rotating plate 143, a limit block 144, a fixing rod 145 and a protrusion 146. The sealing plate 141 is fixedly installed at the bottom of the connecting frame 135. A slide groove is provided on the surface of the cleaning device 1. The connecting plate 142 is fixedly installed on a side of the sealing plate 141 close to the cleaning device 1. The rotating plate 143 is rotatably installed on the inner wall of the connecting plate 142. The limit block 144 is fixedly installed on the inner wall of the connecting plate 142. The fixing rod 145 is fixedly installed on the inner wall of the slide groove. The protrusion 146 is fixedly installed on a side of the fixing rod 145 close to the rotating plate 143. The splashed cleaning liquid is shaken off by vibration to prevent the cleaning liquid from adhering to the square frame 1311 and affecting subsequent use.

[0025] A slide plate 147 is slidably installed on the inner wall of the slide groove, a rotating push plate 148 is rotatably installed on the surface of the slide plate 147, and a limit plate 149 is fixedly installed on the surface of the slide plate 147 to prevent the sealing rubber 136 and the isolation plate 11 from being sealed too tightly, affecting the normal opening of the equipment.

[0026] A No. 3 torsion spring is arranged between the rotating plate 143 and the connecting plate 142, and the rotating plate 143 is reset by the No. 3 torsion spring. The limit block 144 is arranged above the rotating plate 143. A No. 4 spring is arranged between the slide groove and the slide plate 147, and the slide plate 147 is reset by the No. 4 spring. A No. 4 torsion spring is arranged between the slide plate 147 and the rotating push plate 148, and the rotating push plate 148 is reset by the No. 4 torsion spring.

[0027] When the present embodiment is working, the isolation plate 11 moves toward the direction close to the trapezoidal block 131, and the movement of the isolation plate 11 will squeeze the trapezoidal block 131 to move downward, and the downward movement of the trapezoidal block 131 will squeeze the hydraulic rod 133 to move downward, and the downward movement of the hydraulic rod 133 will squeeze the liquid inside the connecting pipe 132 to push the push rod 134 to move upward, and the upward movement of the push rod 134 will drive the connecting frame 135 to move upward, and the upward movement of the connecting frame 135 will drive the sealing rubber 136 to move upward, and the sealing rubber 136 moves upward to fit the isolation plate 11, thereby improving the sealing isolation effect of the equipment, and a good sealing effect can effectively prevent external air, dust, particles and other pollutants from entering the cleaning area, ensuring the cleaning process purity, and at the same time, the upward movement of the connecting frame 135 will drive the connecting frame 137 to move upward, the upward movement of the connecting frame 137 will drive the rotating plate 138 and the square plate 139 to move upward, the upward movement of the square plate 139 will contact the fixed plate 1310, and the fixed plate 1310 will squeeze the square plate 139 to rotate downward, the downward rotation of the square plate 139 will drive the rotating plate 138 to rotate upward, and the upward rotation of the rotating plate 138 will push the square frame 1311 to move upward, and the upward movement of the square frame 1311 will cover the sealing rubber 136 to prevent the contaminated liquid from splashing onto the sealing rubber 136 during the cleaning process, accelerating the aging process of the rubber, causing the rubber to become brittle and lose elasticity, thereby affecting the sealing performance.

[0028] The sealing plate 141 is driven upward by the connection frame 135 to move upward, and the sealing plate 141 moves upward to drive the connecting plate 142 to move upward, and the connecting plate 142 moves upward to drive the rotating plate 143 to move upward, and the rotating plate 143 contacts the protrusion 146 during the upward movement, and the protrusion 146 pushes the rotating plate 143 to rotate downward. When the connection frame 135 drives the sealing plate 141 and the connecting plate 142 to reset, the connecting plate 142 moves downward to drive the rotating plate 143 to move downward, and the rotating plate 143 contacts the protrusion 146 when it moves downward. At the same time, the rotating plate 143 is limited by the limit block 144, so that the rotating plate 143 moves downward. During the process, it will contact with the protrusion 146 to generate vibration, and the splashed cleaning liquid will be shaken off by the vibration to prevent the cleaning liquid from adhering to the square frame 1311 and affecting subsequent use. At the same time, during the resetting process of the isolation plate 11, the groove will squeeze the rotating push plate 148 to move downward, and the rotating push plate 148 will be limited by the limiting plate 149, so that the rotating push plate 148 drives the slide plate 147 to move downward. The downward movement of the slide plate 147 will squeeze the connecting plate 142 downward, and the downward movement of the connecting plate 142 will drive the sealing plate 141, the connecting frame 135 and the sealing rubber 136 to move downward, so as to prevent the sealing rubber 136 from being too tightly sealed with the isolation plate 11 and affecting the normal opening of the equipment.

[0029] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An isolation device for semiconductor cleaning equipment, characterized in that: include: A cleaning device (1), wherein a slide rail (2) is fixedly mounted on the surface of the cleaning device (1), and a slider (3) is slidably mounted on the inner wall of the slide rail (2); An isolation device is arranged on the top of the slide block (3), and comprises an elastic telescopic plate (4), a cleaning roller (5), a scraper (6), a fixing frame (7), a rotating rod (8), a rotating plate (9), a sliding frame (10), an isolation plate (11) and a baffle (12), wherein the elastic telescopic plate (4) is fixedly mounted on the surface of the slide rail (2), the cleaning roller (5) is fixedly mounted on the free end of the elastic telescopic plate (4), the scraper (6) is fixedly mounted on the fixed end of the elastic telescopic plate (4), and the fixing frame (7) is fixedly mounted on the sliding rail (2). Mounted on the free end of the elastic telescopic plate (4), the rotating rod (8) is rotatably mounted on the surface of the fixed frame (7), the sliding frame (10) is slidably mounted on a side of the slide rail (2) close to the fixed frame (7), one end of the rotating plate (9) is fixedly mounted on the circumferential surface of the rotating rod (8), and the other end of the rotating plate (9) is rotatably mounted on the inner wall of the sliding frame (10), the isolation plate (11) is fixedly mounted on the top of the slider (3), and the baffle (12) is fixedly mounted on the bottom of the isolation plate (11), and a notch is provided at the bottom of the isolation plate (11); Wherein, a sealing device for improving the isolation effect of the equipment is arranged inside the cleaning device (1), and a release device is arranged on the sealing device.

2. The isolation device of semiconductor cleaning equipment according to claim 1, characterized in that: A No. 1 spring is provided between the sliding frame (10) and the sliding rail (2), and a No. 1 torsion spring is provided between the rotating plate (9) and the sliding frame (10).

3. The isolation device of semiconductor cleaning equipment according to claim 2, characterized in that: The sealing device comprises a trapezoidal block (131), a connecting pipe (132), a hydraulic rod (133), a push rod (134), a connecting frame (135) and a sealing rubber (136); a groove is provided on the surface of the cleaning device (1); the trapezoidal block (131) is slidably mounted on the inner wall of the groove; the connecting pipe (132) is fixedly inserted through the surface of the groove; the hydraulic rod (133) is slidably mounted on the inner wall of the connecting pipe (132); the hydraulic rod (133) is fixedly mounted on the bottom of the trapezoidal block (131); the push rod (134) is slidably mounted on an end of the connecting pipe (132) away from the hydraulic rod (133); the connecting frame (135) is fixedly mounted on the top of the push rod (134); and the sealing rubber (136) is arranged on the top of the connecting frame (135).

4. The isolation device of semiconductor cleaning equipment according to claim 3, characterized in that: A connecting frame (137) is fixedly mounted on the bottom of the connecting frame (135); a rotating plate (138) is rotatably mounted on the surface of the connecting frame (137); a square plate (139) is fixedly mounted on the circumferential surface of the rotating plate (138); a fixed plate (1310) is fixedly mounted on the inner wall of the cleaning device (1); and a square frame (1311) is slidably mounted on the surface of the connecting frame (135).

5. The isolation device of semiconductor cleaning equipment according to claim 4, characterized in that: A No. 2 spring is provided between the trapezoidal block (131) and the groove, a No. 2 torsion spring is provided between the connecting frame (137) and the rotating plate (138), the fixed plate (1310) is provided above the square plate (139), and a No. 3 spring is provided between the connecting frame (135) and the square frame (1311).

6. The isolation device of semiconductor cleaning equipment according to claim 5, characterized in that: The disengagement device comprises a sealing plate (141), a connecting plate (142), a rotating plate (143), a limiting block (144), a fixing rod (145) and a protrusion (146); the sealing plate (141) is fixedly mounted on the bottom of the connecting frame (135); a sliding groove is provided on the surface of the cleaning device (1); the connecting plate (142) is fixedly mounted on a side of the sealing plate (141) close to the cleaning device (1); the rotating plate (143) is rotatably mounted on the inner wall of the connecting plate (142); the limiting block (144) is fixedly mounted on the inner wall of the connecting plate (142); the fixing rod (145) is fixedly mounted on the inner wall of the sliding groove; and the protrusion (146) is fixedly mounted on a side of the fixing rod (145) close to the rotating plate (143).

7. The isolation device of semiconductor cleaning equipment according to claim 6, characterized in that: A slide plate (147) is slidably mounted on the inner wall of the slide groove, a rotating push plate (148) is rotatably mounted on the surface of the slide plate (147), and a limit plate (149) is fixedly mounted on the surface of the slide plate (147).

8. The isolation device of semiconductor cleaning equipment according to claim 7, characterized in that: A No. 3 torsion spring is arranged between the rotating plate (143) and the connecting plate (142), the limit block (144) is arranged above the rotating plate (143), a No. 4 spring is arranged between the sliding groove and the sliding plate (147), and a No. 4 torsion spring is arranged between the sliding plate (147) and the rotating push plate (148).

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