Semiconductor process waste gas combustion treatment system

Abstract

The invention relates to the technical field of waste gas purification, in particular to a semiconductor process waste gas combustion treatment system which is characterized by comprising a combustor body, a gas inlet bin is arranged at the bottom of the combustor body, a plurality of gas inlet pipes are connected to the outer side wall of the gas inlet bin, and the combustor body comprises an inner cylinder, a middle cylinder and an outer cylinder which are arranged in an inner-outer stacked mode; the inner side ends of the inner cylinder, the middle cylinder and the outer cylinder respectively form an inner cavity, a middle cavity and an outer cavity for gas to flow, and the outer cavity, the middle cavity and the inner cavity form a longitudinal zigzag gas flow path from outside to inside. The problems that inner cavity structures of some existing combustion systems are only single cavity channel structures, so that the flow direction of waste gas and combustible gas entering a combustor is fixed, efficient mixing cannot be achieved, local waste gas does not participate in sufficient combustion or high-temperature catalysis, and then the waste gas escapes to affect the purification effect are solved.

Description

Technical Field

[0001] The present invention relates to the technical field of waste gas purification, and in particular to a semiconductor process waste gas combustion treatment system. Background Art

[0002] During the semiconductor manufacturing process, a lot of toxic, corrosive and flammable process waste gases are generated. In order to avoid the possibility of the waste gas polluting the environment and causing public hazards, the harmful substances in the waste gas must be filtered and removed before the harmless waste gas can be discharged into the outside atmosphere.

[0003] The traditional way to treat semiconductor process waste gas is to inject the process waste gas into the waste gas burner, first accept the high-temperature flame in the burner to burn, and form high-temperature waste gas, forcing the harmful substances in the high-temperature waste gas to accept high-temperature catalysis and decompose into harmless substances, and then introduce the washing tower to use washing water to melt the water-soluble harmful substances in the high-temperature waste gas, so that the high-temperature waste gas is converted into harmless gas, and the high-temperature waste gas is cooled at the same time to facilitate discharge into the outside atmosphere without causing environmental pollution. Therefore, the burner is an important semiconductor process waste gas treatment system in the entire waste gas purification process.

[0004] The input end of the burner simultaneously inputs exhaust gas and combustible gas to mix the exhaust gas and combustible gas, and generates a high-temperature flame by igniting the combustible gas to burn the exhaust gas. However, the inner cavity structure of most burners is simple, with only a single chamber channel structure, which makes the exhaust gas and combustible gas flow in a fixed direction when entering the burner and cannot be efficiently mixed. This will cause local exhaust gas to not participate in full combustion or high-temperature catalysis, and then escape to affect the purification effect. Summary of the invention

[0005] The present invention provides a tooling structure for processing a molecular pump core shaft, which is helpful for solving the problem that the inner cavity structure of some current combustion systems is only a single chamber channel structure, so that the exhaust gas and combustible gas have a fixed flow direction when entering the burner and cannot be efficiently mixed, resulting in local exhaust gas not participating in full combustion or high-temperature catalysis, and then escaping to affect the purification effect.

[0006] The present invention is achieved in that:

[0007] A semiconductor process waste gas combustion treatment system includes a burner body, an air intake bin is arranged at the bottom of the burner body, a plurality of air intake pipes are connected to the outer wall of the air intake bin, the air intake pipes are used to input semiconductor process waste gas and combustible gas into the air intake bin, the burner body includes an inner cylinder, a middle cylinder and an outer cylinder stacked inside and outside, the inner ends of the inner cylinder, the middle cylinder and the outer cylinder respectively constitute an inner cavity, a middle cavity and an outer cavity for gas flow, the bottom of the outer cavity is connected to the top of the air intake bin, the top of the outer cavity is connected to the top of the middle cavity, the bottom of the middle cavity is connected to the bottom of the inner cavity, and the top of the middle cavity is used as a combustion chamber At the gas output end of the burner body, the outer cavity, the middle cavity and the inner cavity form a longitudinal tortuous airflow path from the outside to the inside; a spiral guide structure is provided on the inner side wall of the outer cavity, a diversion structure is provided in the middle cavity near the connection area between the middle cavity and the inner cavity, and an inner wing plate made of a heat-conducting material is provided on the inner side wall of the inner cavity, the long side direction of the inner wing plate is parallel to the axial direction of the inner tube, the short side direction of the inner wing plate is parallel to the radial direction of the inner tube, the lateral outer side end of the inner wing plate is connected to the inner side wall of the inner tube, and a plurality of inner wing plates are centrally symmetrical with respect to the axial center line of the inner tube.

[0008] On the basis of the above technical solution, the guide structure is a spiral guide flange, and the lateral outer end of the guide flange is connected and fixed to the inner wall of the outer cylinder.

[0009] On the basis of the above technical solution, a guide flange is also provided on the inner side wall of the middle tube in the area above its longitudinal midline, and the rotation direction of the guide flanges in the middle cavity and the outer cavity is consistent.

[0010] On the basis of the above technical solution, the diversion structure is a diversion plate, which is arranged in the area below the longitudinal centerline of the middle cavity, the transverse inner end of the diversion plate is closed and connected with the outer wall of the inner tube, and the transverse outer end of the diversion plate is closed and connected with the inner wall of the middle tube. A number of diversion holes are evenly distributed on the diversion plate, and the diversion holes penetrate the diversion plate longitudinally.

[0011] On the basis of the above technical solution, a plurality of diverter plates are spaced apart and distributed longitudinally, and the diverter holes on adjacent diverter plates are staggered.

[0012] On the basis of the above technical solution, a plurality of bases are provided on the inner wall of the inner tube, the bases are centrally symmetrical with respect to the axial center line of the inner tube, the bases and the inner tube are an integrated structure, and the inner wing plate is arranged at the lateral inner end of the base.

[0013] On the basis of the above technical solution, the inner wing panel is a curved panel structure.

[0014] On the basis of the above technical solution, an extension plate is provided on the inner wing plate, and the extension plate is perpendicular to the inner wing plate.

[0015] On the basis of the above technical solution, an outer wing plate is provided on the outer side wall of the inner tube below the longitudinal center line of the central cavity.

[0016] Compared with the prior art, the present invention has at least the following advantages:

[0017] 1. The present invention arranges the burner body into an inner and outer multi-layer structure to form an inner cavity, a middle cavity and an outer cavity divided into inner and outer parts, constitutes an insulation structure with an inner part and a core, and forms a longitudinal tortuous airflow path. The gas on the outside can be preheated before entering the inner cavity, thereby improving the thermal interaction efficiency of the subsequent combustion area and further improving the purification effect.

[0018] 2. The present invention provides a spiral guide structure in the outer cavity so that the gas can form a vortex posture that accelerates the convergence after entering the burner body. This is beneficial to increase the mutual mixing of gases in various regions, improve the uniformity of gas component distribution, avoid local deflagration or local incomplete combustion during combustion, and reduce the escape of exhaust gas.

[0019] 3. The present invention arranges an inner wing plate in the inner cavity, which not only has the effect of partitioning and diverting, but also has the effect of heat conduction, so that the temperature distribution in the inner cavity is more uniform, and is also beneficial to increase the contact time with the gas by means of its own structure, thereby producing a better purification effect on the gas at a relatively stable temperature. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0021] Figure 1 This is a schematic structural diagram of a semiconductor process waste gas combustion treatment system in one embodiment;

[0022] Figure 2 for Figure 1 A simplified diagram of the internal structure;

[0023] Figure 3 is a cross-sectional view of an inner cylinder in one embodiment;

[0024] Figure 4 A schematic diagram of a partial structure of an outer cylinder in one embodiment;

[0025] Figure 5 This is a schematic structural diagram of a diverter plate in one embodiment;

[0026] Figure 6 is a schematic structural diagram of an inner wing plate in another embodiment;

[0027] Figure 7is a cross-sectional view of an inner cylinder in another embodiment;

[0028] Figure 8 It is a cross-sectional view of an inner cylinder in yet another embodiment.

[0029] Markings in the figure: 1. Burner body; 11. Air inlet chamber; 12. Air inlet pipe; 13. Ignitor; 2. Inner cylinder; 21. Base; 22. Inner wing plate; 23. Extension plate; 24. Outer wing plate; 3. Middle cylinder; 4. Outer cylinder; 5. Guide flange; 6. Diverter plate; 61. Diverter hole; 7. Conical cover; a. Outer cavity; b. Middle cavity; c. Inner cavity. DETAILED DESCRIPTION

[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. Therefore, the following detailed description of the embodiments of the present invention provided in the drawings is not intended to limit the scope of the invention claimed for protection, but merely represents selected embodiments of the present invention.

[0031] In the description of the present invention, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0032] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to an element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and do not represent the only implementation method.

[0033] The present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0034] Example 1: Combination Figure 1-5 This embodiment discloses a semiconductor process waste gas combustion treatment system, which achieves efficient mixing and full combustion of waste gas and combustible gas by optimizing the internal structure of the burner.

[0035] In this embodiment, the system specifically includes a burner body 1, the bottom of the burner body 1 is connected to an air intake bin 11 through a flange and a bolt assembly, and 8 air intake pipes 12 are connected to the outer wall of the air intake bin 11, some of the air intake pipes 12 are connected to an external combustible gas supply mechanism, and some of the air intake pipes 12 are connected to a semiconductor process exhaust gas discharge pipeline. The two types of air intake pipes 12 are arranged alternately, and the air intake pipes 12 are used to input semiconductor process exhaust gas and combustible gas into the air intake bin 11, and the air intake bin 11 can preliminarily mix the input gas.

[0036] Combination Figure 2 As shown, the burner body 1 includes an inner cylinder 2, a middle cylinder 3 and an outer cylinder 4 which are stacked inside and outside and coaxially arranged. The inner ends of the inner cylinder 2, the middle cylinder 3 and the outer cylinder 4 respectively constitute an inner cavity c, a middle cavity b and an outer cavity a for gas flow. The bottom of the outer cavity a is connected to the top of the air inlet bin 11, the top of the outer cavity a is connected to the top of the middle cavity b, the bottom of the middle cavity b is connected to the bottom of the inner cavity c, and the top of the middle cavity b serves as the gas output end of the burner body 1. The outer cavity a, the middle cavity b and the inner cavity c constitute a longitudinal tortuous airflow path from the outside to the inside, as shown in FIG. Figure 2 This structure increases the flow distance of the gas inside the burner body 1, which is beneficial to increase the purification reaction time of the exhaust gas within a limited structural space, thereby improving the purification effect.

[0037] In order to improve the gas flow into the burner to have a more stable and active flow direction, the inner wall of the outer cavity a is provided with a spiral guide structure. Figure 2 and Figure 4 As shown, the guide structure is a spiral guide flange 5, and the lateral outer end of the guide flange 5 is connected and fixed to the inner wall of the outer tube 4. The guide flange 5 plays a guiding role. When the gas enters the outer chamber a and flows from bottom to top, due to the shielding of the guide flange 5, part of the outer gas will flow along the bottom surface of the guide flange 5, forming a spiral vortex, which can accelerate the convergence of the gas, increase the mutual mixing of gases in various regions, improve the uniformity of gas component distribution, avoid local deflagration or incomplete local combustion during combustion, and reduce the escape of exhaust gas. It should be noted that in order to ensure that the gas in the outer chamber a can maintain the vortex effect when entering the middle chamber b, the middle chamber b is also provided with a guide flange 5 in the area above its longitudinal midline, and the rotation direction of the guide flange 5 in the middle chamber b is consistent with that in the outer chamber a.

[0038] Furthermore, the middle cavity b is provided with a flow dividing structure near the connecting area between the middle cavity b and the inner cavity c. Figure 2 and Figure 5The diversion structure specifically adopts a diverter plate 6, which is arranged in the area below the longitudinal centerline of the middle cavity b. The lateral inner end of the diverter plate 6 is closed and connected to the outer wall of the inner tube 2, and the lateral outer end of the diverter plate 6 is closed and connected to the inner wall of the middle tube 3. There are a number of diverter holes 61 evenly distributed on the diverter plate 6. The diverter holes 61 penetrate the diverter plate 6 longitudinally. The diverter holes 61 are for the gas descending in the middle cavity b to pass through the diverter plate 6. The diverter plate 6 can have a diverting effect on the gas, further improve the degree of gas cross-mixing, further improve the uniformity of gas component distribution, further avoid local deflagration or local incomplete combustion during combustion, and further reduce the escape of exhaust gas. It should be noted that in order to increase the diversion effect, the two diverter plates 6 are spaced apart in the longitudinal direction, and the diverter holes 61 on the adjacent diverter plates 6 are staggered. In other embodiments, a larger number of diverter plates 6 can be set.

[0039] Further, combined with Figure 3 As shown, six bases 21 are provided on the inner wall of the inner cylinder 2, and the bases 21 are centrally symmetrical with respect to the axial center line of the inner cylinder 2. The bases 21 and the inner cylinder 2 are an integrated structure. An inner wing plate 22 made of a heat-conducting material (metal, ceramic, etc.) is provided on the inner wall of the base 21. The long side direction of the inner wing plate 22 is parallel to the axial direction of the inner cylinder 2, and the short side direction of the inner wing plate 22 is parallel to the radial direction of the inner cylinder 2. The transverse outer end of the inner wing plate 22 is connected to the inner wall of the inner cylinder 2 to form a rib plate structure on the inner wall of the inner cylinder 2. The six inner wing plates 22 are centrally symmetrical with respect to the axial center line of the inner cylinder 2. The inner wing plates 22 not only have a partition effect, so that the gas is divided into multiple partitions when flowing through the inner cavity c, but also have a heat conduction effect, so that the temperature distribution in the inner cavity c is more uniform, and it is also beneficial to increase the contact time with the gas by means of its own structure, and then produce a better purification effect on the gas at a relatively stable temperature.

[0040] In this embodiment, a conical cover 7 is further provided at the bottom of the inner cavity c, and its function is to guide the gas output from the middle cavity b to flow quickly into the inner cavity c. Furthermore, an igniter 13 is provided inside the conical cover 7, and the main body of the igniter 13 extends to the outside of the burner and the air inlet bin 11.

[0041] Example 2: Based on Example 1, Figure 6 As shown, in order to increase the contact area and contact efficiency between the gas and the inner wing plate 22, the inner wing plate 22 is a curved plate structure, which forms a wavy guide surface in the longitudinal direction, so that the gas will hit the surface during the flow, thereby generating reverse fluctuations, so that the gas in this area is further cross-mixed, and the appropriate friction is increased, which plays a certain degree of slowing down effect, so as to increase the gas combustion reaction time and thus improve the purification effect.

[0042] Embodiment 3: Based on Embodiment 1, Figure 7As shown, in this embodiment, in order to further improve the precise control of the temperature in the inner cavity c, extension plates 23 are provided on the left and right sides of the inner wing plate 22. The extension plates 23 are perpendicular to the inner wing plate 22, which can effectively and evenly perform heat conduction and temperature control.

[0043] Embodiment 4: Based on Embodiment 1, Figure 8 As shown, in this embodiment, an outer wing plate 24 is provided on the outer wall of the inner cylinder 2 below the longitudinal center line of the middle cavity b. The outer wing plate 24 is perpendicular to the outer wall of the inner cylinder 2. Its function is to orderly expand the temperature of the inner cylinder 2 when it is working, so that the specific area of ​​the middle cavity b also has a higher temperature, which can preheat the gas efficiently and is also beneficial to the gas diversion and homogenization, thereby improving the purification efficiency.

[0044] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A semiconductor process waste gas combustion treatment system, characterized in that: The invention comprises a burner body (1), wherein an air inlet bin (11) is provided at the bottom of the burner body (1), and a plurality of air inlet pipes (12) are connected to the outer wall of the air inlet bin (11), and the air inlet pipes (12) are used to input semiconductor process waste gas and combustible gas into the air inlet bin (11). The burner body (1) comprises an inner cylinder (2), a middle cylinder (3) and an outer cylinder (4) which are stacked inside and outside, and the inner ends of the inner cylinder (2), the middle cylinder (3) and the outer cylinder (4) respectively constitute an inner cavity (c), a middle cavity (b) and an outer cavity (a) for gas flow, the bottom of the outer cavity (a) is connected to the top of the air inlet bin (11), the top of the outer cavity (a) is connected to the top of the middle cavity (b), the bottom of the middle cavity (b) is connected to the bottom of the inner cavity (c), and the top of the middle cavity (b) serves as the gas output end of the burner body (1), and the outer cavity (a), the middle cavity (b) and the inner cavity (c) constitute a longitudinal tortuous airflow path from outside to inside; A spiral guide structure is provided on the inner side wall of the outer cavity (a); a flow diversion structure is provided in the middle cavity (b) near the area where the middle cavity (b) and the inner cavity (c) are connected; an inner wing plate (22) made of a heat conductive material is provided on the inner side wall of the inner cavity (c); the long side direction of the inner wing plate (22) is parallel to the axial direction of the inner cylinder (2); the short side direction of the inner wing plate (22) is parallel to the radial direction of the inner cylinder (2); the lateral outer side end of the inner wing plate (22) is connected to the inner side wall of the inner cylinder (2); and a plurality of inner wing plates (22) are centrally symmetrical with respect to the axial center line of the inner cylinder (2).

2. A semiconductor process waste gas combustion treatment system according to claim 1, characterized in that: The guide structure is a spiral guide flange (5), and the transverse outer end of the guide flange (5) is connected and fixed to the inner wall of the outer cylinder (4).

3. A semiconductor process waste gas combustion treatment system according to claim 2, characterized in that: A guide flange (5) is also provided on the inner side wall of the middle tube (3) in an area above its longitudinal midline, and the rotation direction of the guide flange (5) in the middle cavity (b) is consistent with that in the outer cavity (a).

4. A semiconductor process waste gas combustion treatment system according to claim 3, characterized in that: The flow dividing structure is a flow dividing plate (6), which is arranged in the area below the longitudinal center line of the middle cavity (b), the transverse inner end of the flow dividing plate (6) is closed connected to the outer wall of the inner cylinder (2), and the transverse outer end of the flow dividing plate (6) is closed connected to the inner wall of the middle cylinder (3), and a plurality of flow dividing holes (61) are evenly distributed on the flow dividing plate (6), and the flow dividing holes (61) penetrate the flow dividing plate (6) longitudinally.

5. A semiconductor process waste gas combustion treatment system according to claim 4, characterized in that: A plurality of flow dividing plates (6) are spaced apart and distributed longitudinally, and the flow dividing holes (61) on adjacent flow dividing plates (6) are staggered.

6. The semiconductor process waste gas combustion treatment system according to claim 1, characterized in that: A plurality of bases (21) are provided on the inner wall of the inner cylinder (2). The bases (21) are centrally symmetrical with respect to the axial center line of the inner cylinder (2). The bases (21) and the inner cylinder (2) are an integrated structure. The inner wing plate (22) is arranged at the lateral inner end of the base (21).

7. The semiconductor process waste gas combustion treatment system according to claim 1, characterized in that: The inner wing plate (22) is a curved plate structure.

8. The semiconductor process waste gas combustion treatment system according to claim 6, characterized in that: An extension plate (23) is provided on the inner wing plate (22), and the extension plate (23) is in a vertical relationship with the inner wing plate (22).

9. The semiconductor process waste gas combustion treatment system according to claim 4, characterized in that: An outer wing plate (24) is provided on the outer side wall of the inner tube (2) below the longitudinal center line of the middle cavity (b).

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