Combined type continuous coating system

Abstract

The invention discloses a combined type continuous coating system which comprises a feeding assembly, a pretreatment assembly, a coating assembly and a discharging assembly which are sequentially connected, the pretreatment assembly is used for pretreating a substrate, the coating assembly is used for coating the double faces of the substrate, and the coating assembly is provided with a composite coating chamber; the composite coating chamber is internally provided with coating pieces which are oppositely arranged on the two sides of the substrate, each coating piece comprises an arc source and a magnetron sputtering cathode, the arc sources are used for depositing a carbon layer on the substrate, and the magnetron sputtering cathodes are used for doping transition metal elements in the carbon layer deposited on the substrate. According to the composite continuous coating system, a method for reducing the contact resistance of a carbon coating in a continuous coating line of an arc ion plating technology is adopted, that is, doping of transition elements in an arc carbon layer is achieved by adding magnetron sputtering cathode deposition transition metal elements, and the contact resistance of the carbon layer is reduced on the premise that the corrosion resistance of the carbon layer is not reduced.

Description

Technical Field

[0001] The invention relates to the technical field of fuel cells, and in particular to a composite continuous coating system. Background Art

[0002] Fuel cells, especially hydrogen fuel cells, are mainly used in fuel cell-powered cars, buses and trucks in the new energy vehicle series, new energy fuel cell-powered locomotives, aircraft, and household distributed power sources. Its main structure is composed of a plurality of single components (single cells) stacked by bipolar plates to clamp membrane electrode assemblies. Based on the airtightness, conductivity and corrosion resistance of the bipolar plates, the bipolar plates are divided into graphite plates, graphite composite plates, and metal bipolar plates according to the selected materials. Compared with graphite plates and graphite composite plates, metal bipolar plates have excellent strength and plasticity and can be produced in large quantities at low cost. However, the corrosion resistance of metal bipolar plates is relatively poor and the contact resistance with carbon paper is large, so it is necessary to deposit a carbon coating on the surface of the metal bipolar plate to solve this problem.

[0003] In the related art, magnetron sputtering technology or arc ion plating technology is used to prepare carbon coatings. However, both technologies have disadvantages. For example, they cannot achieve efficient and continuous coating, the internal resistance of the battery stack is large, and they cannot dope transition metal elements or cannot achieve uniform and effective doping. Summary of the invention

[0004] The present invention is based on the inventor's discovery and understanding of the following facts and problems:

[0005] Fuel cells need to ensure that the fuel gas and the oxidant gas do not mix with each other, so that each gas is supplied to the positive and negative electrode surfaces of the membrane electrode assembly respectively. Therefore, firstly, the bipolar plate is airtight to the gas to prevent the gas from diffusing through the bipolar plate; secondly, the bipolar plate is required to have good electrical conductivity. As an electrical connector between the bipolar plate and the membrane electrode assembly and multiple single cells, the material bulk conductivity and contact resistance should be low enough to ensure the collection and transmission of electrons generated by the reaction. Finally, since the electrolyte surface is strongly acidic, the bipolar plate is required to be corrosion-resistant; in addition, the bipolar plate also has certain requirements in terms of material density, mechanical properties, thermal conductivity, etc.

[0006] Based on the functions of bipolar plates, bipolar plates are divided into graphite plates, graphite composite plates, and metal bipolar plates according to the selected materials. Compared with graphite plates and graphite composite plates, metal bipolar plates have excellent strength and plasticity, and can be processed by stamping to form gas flow paths, so they can be produced in large quantities at low cost. In addition, metal bipolar plates can be stamped to a smaller thickness (about 0.5mm or less), thereby miniaturizing fuel cells and increasing the volume power density of batteries, which is very important for the mass production and popularization of fuel cells.

[0007] However, compared with graphite and graphite composite bipolar plates, metal bipolar plates have relatively poor corrosion resistance. In the use environment of fuel cells, metal ions dissolved in metal bipolar plates may contaminate the proton exchange membrane of fuel cells. In addition, materials used as metal bipolar plates, such as stainless steel, titanium, etc., have large contact resistance with carbon paper.

[0008] To solve this problem, magnetron sputtering is used to deposit carbon coatings on the surface of metal bipolar plates. First, the metal strip is cut into suitable small pieces, then stamped and formed. After the plates are welded, vacuum surface treatment technology is used to deposit amorphous carbon coatings on the surface of the plates.

[0009] In the surface coating process, if a single-type coating machine is used, the vacuum needs to be broken when loading and unloading samples, and continuous production cannot be carried out. In addition, the bipolar plates are large in size, and the number of bipolar plates that can be mounted in a single furnace is limited. In addition, the loading and unloading of bipolar plates needs to be done piece by piece, which is time-consuming and labor-intensive. Therefore, the production capacity of bipolar plates using a single-type coating machine is low and the cost is high. If a continuous vacuum coating machine is used for coating, the production capacity of metal bipolar plate surface treatment can be greatly improved and the cost can be reduced.

[0010] Compared with magnetron sputtering technology for preparing amorphous carbon coatings, arc ion plating technology has the advantages of fast deposition rate, high graphite target ionization rate, and strong corrosion resistance of the coating. However, due to the high ablation rate of graphite targets, arc ion plating technology has a relatively short target life and requires frequent destruction of chamber vacuum to replace graphite targets, resulting in low overall operating efficiency of continuous coating equipment.

[0011] In the related technology, the carbon coating prepared by arc ion plating has the advantages of high deposition rate, high film density, good bonding with the substrate, and better corrosion resistance. In the working environment of the metal bipolar plate of the fuel cell (80°C, PH=3), it can still play a good protective effect even under high potential conditions. Due to the high deposition rate of arc ion plating technology, it can greatly improve production efficiency and quickly reduce the production cost of the coating, which is conducive to the large-scale industrial promotion of fuel cells. Although the carbon coating prepared by arc ion plating has good corrosion resistance, the contact resistance of the prepared carbon layer is relatively large, usually between 1.2 and 3.0 mΩ·cm 2 , resulting in large internal resistance of the battery stack and high ohmic loss, which is not conducive to the use of high-power battery stacks.

[0012] Therefore, the relevant technology also proposed the use of closed-field unbalanced magnetron sputtering to prepare Nb-doped carbon coatings, and found that Nb doping can reduce the contact resistance of the carbon layer without reducing the corrosion resistance of the coating. The main reason is that Nb doping increases the sp2 / sp3 of the carbon layer, thereby reducing the contact resistance.

[0013] However, this technology is a single magnetron sputtering coating machine. The graphite target and the Nb target are turned on at the same time. The preparation of the doped carbon coating is achieved by rotating the pole plate multiple times in the vacuum chamber. This technology cannot be applied to continuous coating lines, and the carbon layer is deposited by the magnetron sputtering method, and the carbon layer deposition rate is low.

[0014] Furthermore, in the above-mentioned continuous vacuum coating system, efficient preparation of carbon layers doped with transition metal elements such as Cr, Nb, Ti, and W is achieved. When arc ion plating is used to deposit the doped carbon layer, if a doped alloy target such as C-Cr, C-Nb, or CW is used, it is difficult to incorporate transition metal elements such as Cr, Nb, Ti, and W into the graphite target due to the brittleness of graphite, and it is difficult to prepare a composite target material with uniform distribution of doped elements. Therefore, it is technically difficult to use a doped graphite target material.

[0015] If two rows of arc cathodes are used, with graphite targets placed in the first row and transition metal targets such as Cr, Nb, Ti, and W placed in the second row, the contact resistance of the prepared carbon coating is not significantly reduced. The main reason is that elements such as Cr, Nb, Ti, and W are not effectively incorporated into the carbon layer and cannot play the role of element doping.

[0016] The present invention aims to solve one of the technical problems in the related art at least to a certain extent.

[0017] To this end, an embodiment of the present invention proposes a composite continuous coating system to efficiently prepare a carbon layer doped with transition metal elements, thereby reducing the contact resistance of the carbon layer and improving the performance of the fuel cell stack while ensuring that the corrosion resistance of the coating is not reduced.

[0018] The composite continuous coating system of the embodiment of the present invention comprises:

[0019] A feeding assembly, the feeding assembly is used for substrate feeding;

[0020] A pre-processing component, the pre-processing component is connected to the feed component to pre-process the substrate;

[0021] A coating component, the coating component is connected to the pretreatment component, the coating component is used for coating the double sides of the pretreated substrate, the coating component has a composite coating chamber, the composite coating chamber is provided with coating parts arranged relatively on both sides of the substrate, the coating parts include an arc source and a magnetron sputtering cathode, the arc source and the magnetron sputtering cathode are spaced along the substrate moving direction and in the direction from upstream to downstream, the arc source is used to deposit a carbon layer on the substrate, and the magnetron sputtering cathode is used to dope the carbon layer deposited on the substrate with transition metal elements;

[0022] A discharging assembly is connected to the coating assembly so that the coated substrate can be discharged through the discharging assembly.

[0023] The composite continuous coating system of an embodiment of the present invention adopts a method for reducing the contact resistance of the carbon coating in a continuous coating line using arc ion plating technology, namely, by adding a magnetron sputtering cathode to deposit transition metal elements, thereby achieving doping of transition elements in the arc carbon layer, thereby reducing the contact resistance of the carbon layer without reducing the corrosion resistance of the carbon layer.

[0024] Therefore, the composite continuous coating system of the embodiment of the present invention solves the problem of efficient preparation of the doped carbon layer in the continuous coating line, and the preparation of the doped carbon layer can be completed by a single pass of the substrate in the composite coating chamber.

[0025] In addition, the composite continuous coating system of the embodiment of the present invention can adjust the doping amount of metal elements in the carbon layer by controlling the power of the arc source and the magnetron sputtering cathode, thereby reducing the contact resistance of the carbon layer without reducing the corrosion resistance of the coating.

[0026] In some embodiments, the feed component has an inlet chamber, the pretreatment component has a cleaning chamber, the coating component also has a sputtering primer chamber, and the discharge component has a cooling chamber and an outlet chamber. The inlet chamber, the cleaning chamber, the sputtering primer chamber, the composite coating chamber, the cooling chamber and the outlet chamber are connected in sequence, and the cross-sectional area of ​​the connection between any two of them is smaller than the cross-sectional area of ​​any chamber.

[0027] In some embodiments, the arc source is a graphite target, and the magnetron sputtering cathode is a transition metal target.

[0028] In some embodiments, the arc source is circular, there are multiple arc sources, and the multiple arc sources are distributed at intervals along the height direction of the composite coating chamber.

[0029] In some embodiments, the magnetron sputtering cathode is in a strip shape, and the magnetron sputtering cathode extends along the height direction of the composite coating chamber.

[0030] In some embodiments, the distance between the arc sources at both ends of the plurality of arc sources is defined as a, the length of the magnetron sputtering cathode is defined as b, and the relationship is satisfied: a<b.

[0031] In some embodiments, the distance between the center point of the target surface of the arc source and the moving plane of the substrate is 220 mm to 300 mm.

[0032] In some embodiments, the distance between the center point of the target surface of the magnetron sputtering cathode and the moving plane of the substrate is 100 mm to 400 mm.

[0033] In some embodiments, the distance between the center point of the target surface of the arc source and the center point of the target surface of the magnetron sputtering cathode is 150 mm to 300 mm.

[0034] In some embodiments, the angle between the target surface center line of the arc source and the target surface center line of the magnetron sputtering cathode is 10° to 50°. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 Schematic diagram of the chamber arrangement of the composite continuous coating system according to an embodiment of the present invention.

[0036] Figure 2 Schematic diagram of the interior of a composite coating chamber of a composite continuous coating system according to an embodiment of the present invention.

[0037] Figure 3 It is a schematic structural diagram of a composite coating chamber of half of a composite continuous coating system according to an embodiment of the present invention.

[0038] Reference numerals:

[0039] 10-substrate,

[0040] 1-inlet chamber, 2-cleaning chamber, 3-sputtering primer chamber, 4-composite coating chamber, 401-arc source, 402-magnetron sputtering cathode, 5-cooling chamber, 6-exit chamber. DETAILED DESCRIPTION

[0041] Embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and intended to be used to explain the present invention, but should not be understood as limiting the present invention.

[0042] The composite continuous coating system according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

[0043] like Figures 1 to 3 As shown, the composite continuous coating system of the embodiment of the present invention includes: a feeding component, a pretreatment component, a coating component and a discharging component.

[0044] The feed assembly is used to carry the substrate 10 for feeding using a carrier and switch the environment of the substrate 10 to a vacuum environment. The pretreatment assembly is connected to the feed assembly to pretreatment the substrate 10 .

[0045] The coating assembly is connected to the pretreatment assembly, and the coating assembly is used to coat the double sides of the pretreated substrate 10. The coating assembly has a composite coating chamber 4, and the composite coating chamber 4 is provided with coating parts arranged on both sides of the substrate 10 to achieve double-sided coating of the substrate 10. The coating parts include an arc source 401 and a magnetron sputtering cathode 402, and the arc source 401 and the magnetron sputtering cathode 402 are arranged along the moving direction of the substrate 10 and in the direction from upstream to downstream ( Figure 2The arc source 401 is used to deposit a carbon layer on the substrate 10, and the magnetron sputtering cathode 402 is used to dope the carbon layer deposited on the substrate 10 with transition metal elements.

[0046] It is understandable that the arc source 401 can be used to achieve high-speed deposition of the carbon layer, and the magnetron sputtering cathode 402 can be used to evenly sputter the metal target material, thereby better doping with the carbon evaporated from the arc source 401 .

[0047] The discharge assembly is connected to the coating assembly so that the coated substrate 10 is discharged through the discharge assembly, thereby completing the preparation of the doped carbon layer on the substrate 10 .

[0048] It should be noted that the continuous vacuum coating equipment based on arc ion plating technology is used to prepare the corrosion-resistant amorphous carbon coating of metal bipolar plates. Compared with the continuous equipment of magnetron sputtering technology, the coating has better performance and greatly improved production capacity, which is conducive to the large-scale market promotion of fuel cells. However, the contact resistance of the carbon layer prepared by arc ion plating technology is relatively high. In order to further improve the performance of the battery stack, the contact resistance of the coating needs to be further reduced.

[0049] The composite continuous coating system of an embodiment of the present invention adopts a method for reducing the contact resistance of the carbon coating in a continuous coating line using arc ion plating technology, namely, by adding a magnetron sputtering cathode 402 to deposit transition metal elements, thereby achieving doping of transition elements in the arc carbon layer, thereby reducing the contact resistance of the carbon layer without reducing the corrosion resistance of the carbon layer.

[0050] Therefore, the composite continuous coating system of the embodiment of the present invention solves the problem of efficient preparation of the doped carbon layer in the continuous coating line, and the substrate 10 can complete the preparation of the doped carbon layer by passing through the composite coating chamber 4 once.

[0051] In addition, the composite continuous coating system of the embodiment of the present invention can adjust the doping amount of metal elements in the carbon layer by controlling the power of the arc source 401 and the magnetron sputtering cathode 402, thereby reducing the contact resistance of the carbon layer without reducing the corrosion resistance of the coating.

[0052] Furthermore, the carbon layer prepared by the composite continuous coating system of the embodiment of the present invention has a contact resistance of less than 0.9 mΩ·cm2, which can reduce the internal resistance of the battery stack, reduce the ohmic loss, and improve the power of the battery stack.

[0053] In some embodiments, Figure 1 As shown, the feed component has an inlet chamber 1, the pretreatment component has a cleaning chamber 2, the coating component also has a sputtering primer chamber 3, the discharge component has a cooling chamber 5 and an outlet chamber 6, and the inlet chamber 1, the cleaning chamber 2, the sputtering primer chamber 3, the composite coating chamber 4, the cooling chamber 5 and the outlet chamber 6 are connected in sequence.

[0054] Any two chambers are connected through a transition chamber, and the cross-sectional area of ​​the transition chamber is smaller than the cross-sectional area of ​​any chamber. The modular chamber configuration scheme is adopted to reduce the size of the transition chamber, which is conducive to reducing equipment costs, reducing vacuum pumping time, and improving production efficiency.

[0055] It can be understood that the inlet chamber 1 realizes the feeding of the carrier carrying the substrate 10 and the switching from the atmosphere to the vacuum environment; the transition chamber between the inlet chamber 1 and the cleaning chamber 2 realizes the switching between low vacuum and high vacuum, as well as the preheating of the substrate 10; the cleaning chamber 2 realizes the pre-cleaning of the substrate 10 to remove residual impurities and oxide layers on the surface of the substrate; the sputtering primer chamber 3 realizes the double-sided pre-coating of the substrate 10 to improve the film-substrate bonding strength of the coating; the transition chamber between the sputtering primer chamber 3 and the composite coating chamber 4 realizes the isolation and buffering of magnetron sputtering and multi-arc coating; the multi-arc / magnetron composite coating chamber 4 realizes the multi-arc doping process film formation on both sides of the substrate 10; the cooling chamber 5 realizes the cooling and temperature reduction of the substrate 10; the outlet chamber 6 realizes the switching of the carrier from the vacuum to the atmospheric environment to complete the preparation of the doped carbon layer.

[0056] In some embodiments, the arc source 401 is a graphite target, and the magnetron sputtering cathode 402 is a transition metal target (such as Nb, Cr, W or other targets or alloy targets thereof).

[0057] Furthermore, if Figure 2 and Figure 3 As shown, the arc source 401 is circular, and there are multiple arc sources 401, and the multiple arc sources 401 are arranged along the height direction of the composite coating chamber 4 ( Figure 3 The upper and lower directions shown in the figure are spaced apart to improve the uniformity of carbon layer deposition.

[0058] It should be noted that the number of arc sources 401 is determined according to the height of the composite coating chamber 4 and the center distance of the arc sources 401. Preferably, the number of arc sources 401 is 2 to 10.

[0059] In some embodiments, Figure 2 and Figure 3 As shown, the magnetron sputtering cathode 402 is in a strip shape, and the magnetron sputtering cathode 402 extends along the height direction of the composite coating chamber 4.

[0060] Furthermore, the distance between the arc sources 401 at both ends of the plurality of arc sources 401 is defined as a, and the length of the magnetron sputtering cathode 402 is defined as b, and the relationship is satisfied: a<b. That is, the length of the magnetron sputtering cathode 402 is greater than the length of a row of the plurality of arc sources 401, so as to ensure the effectiveness of doping the carbon layer with transition metal elements.

[0061] In some embodiments, the distance between the center point of the target surface of the arc source 401 and the moving plane of the substrate 10 is 220 mm to 300 mm. It is understood that the smaller the center distance of the arc source 401, the denser the arrangement, and the more uniform the thickness of the deposited carbon layer. Preferably, the distance between the center point of the target surface of the arc source 401 and the moving plane of the substrate 10 is 300 mm.

[0062] Furthermore, the distance between the center point of the target surface of the magnetron sputtering cathode 402 and the moving plane of the substrate 10 is 100 mm to 400 mm, and the distance range between the two is controlled to reduce the energy loss of the sputtered particles and increase the doping rate.

[0063] In some embodiments, the distance between the target surface center point of the arc source 401 and the target surface center point of the magnetron sputtering cathode 402 is 150 mm to 300 mm. It should be noted that the smaller the distance between the two, the better the doping effect of the transition metal element in the carbon layer.

[0064] Furthermore, the angle between the target surface center line of the arc source 401 and the target surface center line of the magnetron sputtering cathode 402 is 10° to 50°. It is understood that the incident angle of sputtering is controlled to form a denser doped carbon layer structure, thereby improving the quality and performance of the doped carbon layer preparation.

[0065] In the description of the present invention, it is to be understood that the terms “center”, “longitudinal”, “lateral”, “length”, “width”, “thickness”, “up”, “down”, “front”, “back”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom”, “inside”, “outside”, “clockwise”, “counterclockwise”, “axial”, “radial”, “circumferential”, etc., indicating orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0066] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0067] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral one; it can be a mechanical connection, an electrical connection, or communication with each other; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0068] In the present invention, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0069] In the present invention, the terms "one embodiment", "some embodiments", "examples", "specific examples", or "some examples" etc. mean that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the described specific features, structures, materials or characteristics may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0070] Although the above embodiments have been shown and described, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations on the present invention. Changes, modifications, substitutions and variations of the above embodiments by those of ordinary skill in the art are all within the scope of protection of the present invention.

Claims

1. A composite continuous coating system, characterized in that: include: A feeding assembly, the feeding assembly is used for substrate feeding; A pre-processing component, the pre-processing component is connected to the feed component to pre-process the substrate; A coating component, the coating component is connected to the pretreatment component, the coating component is used for coating the double sides of the pretreated substrate, the coating component has a composite coating chamber, the composite coating chamber is provided with coating parts arranged relatively on both sides of the substrate, the coating parts include an arc source and a magnetron sputtering cathode, the arc source and the magnetron sputtering cathode are spaced along the substrate moving direction and in the direction from upstream to downstream, the arc source is used to deposit a carbon layer on the substrate, and the magnetron sputtering cathode is used to dope the carbon layer deposited on the substrate with transition metal elements; A discharging assembly is connected to the coating assembly so that the coated substrate can be discharged through the discharging assembly.

2. The composite continuous coating system according to claim 1, characterized in that: The feed component has an inlet chamber, the pretreatment component has a cleaning chamber, the coating component also has a sputtering primer chamber, and the discharge component has a cooling chamber and an outlet chamber. The inlet chamber, the cleaning chamber, the sputtering primer chamber, the composite coating chamber, the cooling chamber and the outlet chamber are connected in sequence, and the cross-sectional area of ​​the connection between any two of them is smaller than the cross-sectional area of ​​any chamber.

3. The composite continuous coating system according to claim 1, characterized in that: The arc source is a graphite target material, and the magnetron sputtering cathode is a transition metal target material.

4. The composite continuous coating system according to claim 1, characterized in that: The arc source is circular, and there are a plurality of arc sources, which are spaced apart and distributed along the height direction of the composite coating chamber.

5. The composite continuous coating system according to claim 4, characterized in that: The magnetron sputtering cathode is in a strip shape and extends along the height direction of the composite coating chamber.

6. The composite continuous coating system according to claim 5, characterized in that: The distance between the arc sources at both ends of the plurality of arc sources is defined as a, and the length of the magnetron sputtering cathode is defined as b, and the relationship is satisfied: a<b.

7. The composite continuous coating system according to claim 1, characterized in that: The distance between the center point of the target surface of the arc source and the moving plane of the substrate is 220 mm to 300 mm.

8. The composite continuous coating system according to claim 7, characterized in that: The distance between the center point of the target surface of the magnetron sputtering cathode and the moving plane of the substrate is 100 mm to 400 mm.

9. The composite continuous coating system according to claim 8, characterized in that: The distance between the center point of the target surface of the arc source and the center point of the target surface of the magnetron sputtering cathode is 150 mm to 300 mm.

10. The composite continuous coating system according to claim 9, characterized in that: The angle between the target surface center line of the arc source and the target surface center line of the magnetron sputtering cathode is 10° to 50°.

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