Layout construction method, device and equipment, computer storage medium and program product

Abstract

The invention discloses a layout construction method, device and equipment, a computer storage medium and a program product, and relates to the technical field of semiconductors. The method comprises the steps of determining N parameter variables matched with a target test pattern type on the basis of the target test pattern type meeting layout construction requirements; based on the M parametric variable combinations, drawing M test pattern groups in one-to-one correspondence with the M parametric variable combinations, and constructing to obtain an initial layout containing the M test pattern groups; the M parameter variable combinations are determined and obtained based on N parameter variables under different values; based on an attribute limiting rule matched with the target test pattern type, marking a test pattern group of which the value of the parameter variable does not accord with the attribute limiting rule in the initial layout to obtain an intermediate layout; and performing Boolean operation on the initial layout and the intermediate layout to obtain a target layout meeting the layout manufacturing standard. According to the embodiment of the invention, layout construction can be more efficiently and accurately realized.

Description

Technical Field

[0001] The present application belongs to the field of semiconductor technology, and in particular, relates to a layout construction method, device, equipment, computer storage medium and program product. Background Art

[0002] At present, in the semiconductor integrated circuit manufacturing process, the photolithography mask plays a vital role in the photolithography process. As the master of complex chip process graphics, it is composed of an opaque light-shielding film on a transparent substrate to form a mask graphic structure, and the graphic information is exposed and transferred to the silicon wafer through the corresponding proportion. However, when constructing the layout corresponding to the test mask, some phenomena that do not meet the actual production process indicators will appear. Therefore, before making the layout, it is necessary to ensure that the attribute parameters of multiple test graphics in the layout meet the actual production process indicators to avoid the appearance of test graphics that do not meet expectations in the actual production process. However, the existing layout construction method has the problems of cumbersome parameter settings for test graphics, low layout construction efficiency, and low user satisfaction.

[0003] Based on this, the industry is still in urgent need of a new user layout construction solution to effectively improve layout construction efficiency while ensuring layout accuracy, so as to fully improve user layout construction satisfaction. Summary of the invention

[0004] The embodiments of the present application provide a layout construction method, device, equipment, computer storage medium and program product, which can realize layout construction more efficiently and accurately, thereby effectively improving the overall layout construction efficiency and improving user satisfaction.

[0005] In a first aspect, an embodiment of the present application provides a layout construction method, the layout construction method comprising:

[0006] Based on the target test pattern type that meets the layout construction requirements, determine N parameter variables that match the target test pattern type, where N is a positive integer;

[0007] Based on M parameter variable combinations, M test pattern groups corresponding to the M parameter variable combinations are drawn, and an initial layout including the M test pattern groups is constructed; the M parameter variable combinations are determined based on N parameter variables under different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern;

[0008] Based on the attribute restriction rule of the target test pattern type matching, the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule is marked to obtain an intermediate layout;

[0009] Boolean operations are performed on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standards.

[0010] In some possible implementations, before drawing M test pattern groups corresponding to the M parameter variable combinations one by one based on the M parameter variable combinations and constructing an initial layout including the M test pattern groups, the layout construction method further includes:

[0011] Receiving configuration input of variable values ​​of N parameter variables, the variable values ​​including a custom value range and a custom step size corresponding to each parameter variable in the N parameter variables;

[0012] In response to the configuration input, M parameter variable combinations are determined based on the custom value range and the custom step size corresponding to each parameter variable in the N parameter variables.

[0013] In some possible implementations, based on the attribute restriction rule of the target test pattern type matching, the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule is marked, and before obtaining the intermediate layout, the layout construction method further includes:

[0014] Based on the correspondence between a plurality of pre-set test pattern types and a plurality of manufacturing rule check MRC scripts, determining a target MRC script corresponding to the target test pattern type, wherein the target MRC script includes an attribute restriction rule;

[0015] Based on the attribute restriction rules of the target test pattern type matching, the test pattern groups whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rules are marked to obtain an intermediate layout, including:

[0016] By running the target MRC script, the test pattern groups whose values ​​of parameter variables in the initial layout do not meet the attribute restriction rules are marked to obtain the intermediate layout.

[0017] In some possible implementations, the N parameter variables include a target parameter variable, and the attribute restriction rule includes a minimum standard value and / or a maximum standard value corresponding to the target parameter variable; based on the attribute restriction rule of the target test pattern type matching, the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule is marked to obtain an intermediate layout, including:

[0018] Compare the value of the target parameter variable of each test pattern group in the M test pattern groups with the minimum standard value and the maximum standard value respectively, and determine the comparison result;

[0019] Based on the comparison result, the target test pattern group whose values ​​of the target parameter variables in the initial layout do not meet the attribute restriction rules is marked;

[0020] Based on the initial layout after marking the target test pattern group, an intermediate layout is obtained.

[0021] In some possible implementations, based on the comparison result, marking the target test pattern group whose values ​​of the target parameter variables in the initial layout do not conform to the attribute restriction rule includes:

[0022] Based on the comparison result, a target test pattern group whose value of the target parameter variable is less than a minimum standard value or greater than a maximum standard value is determined from the initial layout;

[0023] Mark the target test pattern group in the initial layout.

[0024] In some possible implementations, the N parameter variables include a first parameter variable and a second parameter variable, and the attribute restriction rule includes a first attribute restriction sub-rule corresponding to the first parameter variable and a second attribute restriction sub-rule corresponding to the second parameter variable; based on the attribute restriction rule matching the target test pattern type, a test pattern group whose values ​​of the parameter variables in the initial layout do not comply with the attribute restriction rule is marked to obtain an intermediate layout, including:

[0025] Based on the first attribute restriction sub-rule, marking the test pattern groups whose values ​​of the first parameter variable do not meet the first attribute restriction sub-rule among the M test pattern groups, and determining K test pattern groups whose values ​​of the first parameter variable meet the first attribute restriction sub-rule among the M test pattern groups, where K is a non-negative integer;

[0026] Based on the second attribute restriction sub-rule, marking the test pattern groups whose values ​​of the second parameter variable do not meet the second attribute restriction sub-rule among the K test pattern groups, and determining L test pattern groups whose values ​​of the second parameter variable meet the second attribute restriction sub-rule among the K test pattern groups, where L is a non-negative integer;

[0027] Based on the rules except the first attribute restriction sub-rule and the second attribute restriction sub-rule in the attribute restriction rules, the test patterns whose values ​​of the parameter variables in the L test pattern groups do not meet the attribute restriction rules are marked to obtain an intermediate layout.

[0028] In some possible implementations, based on M parameter variable combinations, M test pattern groups corresponding to the M parameter variable combinations are drawn, and an initial layout including the M test pattern groups is constructed, including:

[0029] Based on M combinations of parameter variables, M test pattern groups are drawn in M ​​preset division areas in a blank layout to obtain an initial layout; the M preset division areas correspond one to one with the M test pattern groups;

[0030] Based on the attribute restriction rules of the target test pattern type matching, the test pattern groups whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rules are marked to obtain an intermediate layout, including:

[0031] Based on the attribute restriction rule, the preset division areas corresponding to the test pattern groups whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule are marked to obtain an intermediate layout.

[0032] In some possible implementations, a Boolean operation is performed on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standard, including:

[0033] Performing Boolean operations on the initial layout and the intermediate layout to determine at least one unmarked preset division area contained in both the initial layout and the intermediate layout;

[0034] A target layout is obtained based on at least one unmarked preset divided area and its corresponding test pattern group.

[0035] In some possible implementations, before determining N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, the layout construction method further includes:

[0036] receiving a user's selection input of a target test pattern type from among a plurality of test pattern types;

[0037] In response to the selection input, a test pattern type that meets the layout construction requirement is determined as a target test pattern type.

[0038] In some possible implementations, the N parameter variables include at least one of a line width parameter variable, a spacing parameter variable, and an angle-to-angle spacing parameter variable.

[0039] Based on the same inventive concept, in a second aspect, an embodiment of the present application provides a layout construction device, the layout construction device comprising:

[0040] A first determination module is used to determine N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, where N is a positive integer;

[0041] A first drawing module is used to draw M test pattern groups corresponding to the M parameter variable combinations based on M parameter variable combinations, and construct an initial layout including the M test pattern groups; the M parameter variable combinations are determined based on N parameter variables under different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern;

[0042] A first marking module is used to mark the test pattern group whose values ​​of parameter variables in the initial layout do not meet the attribute restriction rules based on the attribute restriction rules of the target test pattern type matching, so as to obtain an intermediate layout;

[0043] The first acquisition module is used to perform Boolean operations on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standards.

[0044] In a third aspect, an embodiment of the present application provides a layout construction device, the layout construction device comprising:

[0045] a processor and a memory storing computer program instructions;

[0046] When the processor executes the computer program instructions, it implements the layout construction method provided in any one of the above-mentioned embodiments of the present application.

[0047] In a fourth aspect, an embodiment of the present application provides a computer storage medium having computer program instructions stored thereon, and when the computer program instructions are executed by a processor, a layout construction method as provided in any one of the above-mentioned embodiments of the present application is implemented.

[0048] In a fifth aspect, an embodiment of the present application provides a computer program product. When the instructions in the computer program product are executed by a processor of an electronic device, the electronic device executes a layout construction method provided in any one of the above-mentioned embodiments of the present application.

[0049] The embodiments of the present application provide a layout construction method, device, equipment, computer storage medium and program product. The corresponding N parameter variables are determined by pre-acquired target test pattern types that meet the layout construction requirements, and then the corresponding M test pattern groups are drawn based on the M parameter variable combinations obtained based on the N parameter variables under different values, so as to construct an initial layout containing M test pattern groups. Then, based on the attribute restriction rules matching the target test pattern type, the test pattern groups whose parameter variable values ​​in the initial layout do not meet the attribute restriction rules are marked to obtain an intermediate layout. Finally, by performing Boolean operations on the initial layout and the intermediate layout, the marked test pattern groups are screened and eliminated, so as to obtain a target layout that meets the layout production standards.

[0050] It can be seen from the above description that a layout construction method, device, equipment, computer storage medium and program product of the embodiment of the present application can directly draw test pattern groups under various value conditions by pre-acquiring different value combinations of parameter variables corresponding to the test image type, and then efficiently mark the test pattern groups that do not conform to the actual situation in the initial layout based on the attribute restriction rules, so as to efficiently screen out the test pattern groups that meet the actual process index requirements through Boolean operations between layouts, and obtain the final target layout. In this way, by adopting the embodiment of the present application, the attribute restriction rules can be used efficiently and automatically to screen and eliminate unreasonable data, and the user does not need to manually judge the rationality of each setting parameter one by one when constructing a specific layout, which greatly reduces the complexity of the user in parameter value screening and setting, thereby effectively improving the efficiency and accuracy of layout construction, and further fully improving the user's layout construction experience and convenience. BRIEF DESCRIPTION OF THE DRAWINGS

[0051] In order to more clearly illustrate the technical solution of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0052] Figure 1 It is a flow chart of a layout construction method provided in one embodiment of the present application;

[0053] Figure 2 It is a schematic diagram of the status comparison of a part of the layout before and after processing provided by an embodiment of the present application;

[0054] Figure 3 It is a schematic diagram of the state comparison before and after the processing of a part of the layout provided by another embodiment of the present application;

[0055] Figure 4 It is a schematic diagram of the status comparison of a part of the layout before and after processing provided by another embodiment of the present application;

[0056] Figure 5 It is a structural schematic diagram of a layout construction device provided in one embodiment of the present application;

[0057] Figure 6 It is a structural schematic diagram of a layout construction device provided in one embodiment of the present application. DETAILED DESCRIPTION

[0058] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain the present application, rather than to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is only to provide a better understanding of the present application by illustrating the examples of the present application.

[0059] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the statement "include..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0060] It should be noted that the acquisition, storage, use, and processing of data in the technical solution of this application are in compliance with the relevant provisions of national laws and regulations.

[0061] It should be noted that in the embodiments of the present application, certain software, components, models and other existing solutions in the industry may be mentioned, and they should be regarded as exemplary. Their purpose is only to illustrate the feasibility of implementing the technical solution of the present application, but it does not mean that the applicant has or will necessarily use the solution.

[0062] As described in the background technology section, the existing layout construction method has the problems of cumbersome parameter setting of test patterns, low layout construction efficiency, and low user satisfaction. Specifically, in the current prior art, in the process of drawing the test pattern of the mask, it is mainly through personalized parameter setting for each test pattern used by the user, selecting different types of test patterns according to the needs of the user, and specifically setting the parameter range of each test pattern, which is equivalent to eliminating the data that does not conform to the actual production process in the process of setting parameters such as line width, line spacing, or corner to corner spacing, thereby avoiding the appearance of test patterns that do not meet expectations.

[0063] However, in actual application, when there are many types of test patterns involved, the rationality of the parameter settings of each test pattern needs to be considered before drawing, which is equivalent to that each pattern needs to be personalized according to the needs of the user. When there are many types of test patterns involved, and there are many parameter settings corresponding to each type of test pattern, this method is more complicated for users. Users need to manually judge the rationality of each setting parameter when constructing a specific layout. Therefore, the parameter settings are cumbersome, the user layout construction efficiency is low, and the operation convenience is not high.

[0064] In view of the above, in order to solve the problems of the prior art, the embodiments of the present application provide a layout construction method, device, equipment, computer storage medium and program product. It should be noted that the embodiments provided in the present application are not intended to limit the scope of the present application.

[0065] The following first introduces the layout construction method provided in the embodiment of the present application.

[0066] Figure 1 FIG. 1 is a flow chart of a layout construction method provided by an embodiment of the present application. The layout construction method is applied to an electronic device, which may include a server or a user terminal. Figure 1 As shown, the layout construction method includes the following steps:

[0067] S110, based on the target test pattern type that meets the layout construction requirements, determining N parameter variables that match the target test pattern type, where N is a positive integer;

[0068] S120, based on M parameter variable combinations, drawing M test pattern groups corresponding to the M parameter variable combinations one by one, and constructing an initial layout including the M test pattern groups; the M parameter variable combinations are determined based on N parameter variables under different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern;

[0069] S130, based on the attribute restriction rule of the target test pattern type matching, marking the test pattern group whose parameter variable values ​​in the initial layout do not meet the attribute restriction rule, to obtain an intermediate layout;

[0070] S140, performing Boolean operations on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standard.

[0071] The embodiment of the present application provides a layout construction method, which determines the corresponding N parameter variables by pre-acquired target test pattern types that meet the layout construction requirements, and then draws the corresponding M test pattern groups based on the M parameter variable combinations obtained based on the N parameter variables under different values, so as to construct an initial layout containing M test pattern groups. Then, based on the attribute restriction rules matched by the target test pattern type, the test pattern groups whose parameter variable values ​​in the initial layout do not meet the attribute restriction rules are marked to obtain an intermediate layout. Finally, by performing Boolean operations on the initial layout and the intermediate layout, the marked test pattern groups are screened and eliminated, so as to obtain a target layout that meets the layout production standards.

[0072] It can be seen from the above description that a layout construction method of an embodiment of the present application can directly draw a variety of test pattern groups by pre-acquiring different value combinations of parameter variables corresponding to the test image type, and then efficiently mark the test pattern groups that do not conform to the actual situation in the initial layout based on the attribute restriction rules, so as to efficiently screen out the test pattern groups that meet the actual process index requirements through Boolean operations between layouts, and obtain the final target layout. In this way, by adopting the embodiment of the present application, the attribute restriction rules can be used efficiently and automatically to screen and eliminate unreasonable data. When constructing a specific layout, the user does not need to manually judge the rationality of each setting parameter one by one, which greatly reduces the complexity of the user in the parameter value screening setting, thereby effectively improving the efficiency and accuracy of layout construction, and then fully improving the user's layout construction experience and convenience.

[0073] The specific implementation of the above steps 110 to 140 is described in detail below.

[0074] In S110, in a specific implementation, based on the target test pattern type that meets the layout construction requirements, N parameter variables matching the target test pattern type are determined, where N is a positive integer. According to some embodiments of the present application, the N parameter variables may optionally include at least one of a line width parameter variable, a spacing parameter variable, and an angle-to-angle spacing parameter variable.

[0075] The target test pattern type may be, for example, a basic line space test pattern (Basic Line Space) type, a multi-line space test pattern (Multi Line Space) type, or a regular test pattern (RegularCH) type, etc., which is not strictly limited herein.

[0076] To facilitate understanding of the N parameter variables that match the target test pattern type in this application, the target test pattern type is taken as an example for introduction below. Specifically, the basic line spacing test pattern type is mainly used to detect the width and spacing of lines, so the N parameter variables that match the target test pattern type may include parameters such as line width and line spacing.

[0077] Furthermore, considering the need for periodic arrangement of test patterns in some situations, the arrangement direction of the test patterns in the layout, the number of periodic pattern cycles, etc. can also be set to facilitate drawing a series of periodic test patterns, which is not strictly limited in this embodiment.

[0078] It should be noted that the target test pattern type that meets the layout construction requirements can be input in advance by the user, or obtained by using an algorithm based on the layout construction requirements analysis. This application does not impose strict restrictions on the method of obtaining the target test pattern type.

[0079] According to some embodiments of the present application, optionally, in order to quickly, efficiently and reasonably achieve the acquisition of the target test pattern type that meets the layout construction requirements, so as to fully improve the user experience and convenience of constructing the layout, before determining the N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, the layout construction method may also include:

[0080] receiving a user's selection input of a target test pattern type from among a plurality of test pattern types;

[0081] In response to the selection input, a test pattern type that meets the layout construction requirement is determined as a target test pattern type.

[0082] For example, the multiple test pattern types may include the basic line spacing test pattern type, the multi-line spacing test pattern type, or the regular test pattern type.

[0083] When the user specifically selects and inputs the above-mentioned target test pattern type, for example, by displaying the above-mentioned multiple test pattern types on an interface, the user can select and input the target test pattern type that meets the requirements by performing simple touch or character input operations on the interface for the target test pattern type.

[0084] In this way, after receiving the user's selection input, the test pattern type that meets the layout construction requirements is determined as the target test pattern type, and the test pattern is subsequently drawn according to the test pattern type.

[0085] In S120, during the specific implementation, based on M parameter variable combinations, M test pattern groups corresponding to the M parameter variable combinations are drawn, and an initial layout including the M test pattern groups is constructed; the M parameter variable combinations are determined based on N parameter variables under different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern.

[0086] In this embodiment, after determining N parameter variables that match the target test pattern type, specific values ​​of different parameter variables among the N parameter variables may be customized or randomly input.

[0087] In this way, M parameter variable combinations are determined according to the N parameter variables under different values, and then M test pattern groups are drawn according to the specific values ​​of the N parameter variables in the different parameter variable combinations, thereby constructing an initial layout containing the M test pattern groups.

[0088] Exemplarily, the N parameter variables include parameter variable A (e.g., line width), parameter variable B (e.g., line spacing), and parameter variable C (e.g., number of graphic periodic cycles), and there are a total of 8 different parameter variable combinations formed by different value combinations of parameter variable A, parameter variable B, and parameter variable C. Thus, 8 test pattern groups corresponding to each other are drawn according to the obtained 8 parameter variable combinations.

[0089] It should be added that, considering the periodic cycle requirements when drawing patterns, a test pattern group often includes multiple test patterns that are periodically arranged and drawn according to parameters such as fixed line spacing. Therefore, any test pattern group of the above M test pattern groups in this embodiment includes at least one test pattern.

[0090] The above-mentioned initial layout can specifically be a GDS (Graphic Design System) layout file format or an OASIS (Open Artwork System Interchange Standard) layout file format, which can be set according to actual layout construction requirements and conditions and is not strictly limited here.

[0091] And, it should be added that, when drawing the above test pattern, it can be achieved through GUI (Graphical User Interface), and the user can interact with the computer through the visual and operation interface to achieve the drawing of the above test pattern.

[0092] Alternatively, in some embodiments, in order to further enhance the user's operational convenience in overall layout construction, drawing rules may be pre-programmed to generate programming scripts, so that efficient drawing of the above test pattern group can be achieved more quickly by running the programming scripts.

[0093] According to some embodiments of the present application, optionally, in order to more fully improve the convenience and experience of user layout construction and fully reduce the complexity of user parameter setting, before drawing M test pattern groups corresponding to M parameter variable combinations based on M parameter variable combinations and constructing an initial layout including M test pattern groups, the layout construction method may further include:

[0094] Receiving configuration input of variable values ​​of N parameter variables, where the variable values ​​may include a custom value range and a custom step size corresponding to each parameter variable in the N parameter variables;

[0095] In response to the configuration input, M parameter variable combinations are determined based on the custom value range and the custom step size corresponding to each parameter variable in the N parameter variables.

[0096] In specific implementation, the user can implement the configuration input of the variable values ​​of the N parameter variables by performing input operations such as clicking or touching the operation interface, and there is no strict restriction on the input method of the above configuration input.

[0097] The configuration input of the above variable values ​​may specifically include a custom value range and a custom step size corresponding to each parameter variable in the N parameter variables. Exemplarily, the N parameter variables include parameter variable A, and the custom value range of parameter variable A can be determined by random selection or the like. The custom value range is not specifically limited and can be set arbitrarily by the user. The user does not need to judge the rationality of the set parameters, thereby fully realizing the convenience and extensiveness of drawing the test pattern group and the overall layout construction operation.

[0098] The above-mentioned custom step size (split) can be to set a specific step size within a certain range of values. By setting the step size, the corresponding custom value range can be divided according to the step size to obtain a series of multiple values ​​of the parameter variable that are spaced by the custom step size. The step size can be flexibly set according to user needs and actual parameter setting experience, and is not strictly limited here.

[0099] In this embodiment, the user only needs to arbitrarily set the custom value range and custom step size for each of the N parameter variables to quickly divide and obtain different values ​​of each parameter variable, thereby determining the M parameter variable combinations. In this way, the user's layout construction experience can be fully improved, and the complexity of the user's parameter setting can be fully reduced, which is conducive to the convenience and extensiveness of drawing test pattern groups and overall layout construction operations.

[0100] In S130 , in specific implementation, based on the attribute restriction rule of the target test pattern type matching, the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule is marked to obtain an intermediate layout.

[0101] The above-mentioned attribute restriction rules can be combined with the actual semiconductor-related production process manufacturing restrictions in the layout construction scenario, and can be set in advance for different test pattern types, so as to effectively ensure the accuracy of data screening and elimination. In an example, the attribute restriction rules can include the restricted value range of some or all of the above-mentioned N parameter variables, etc., and this embodiment does not impose strict restrictions here.

[0102] The attribute restrictions of test pattern groups of different test pattern types are not completely the same. For example, test pattern groups of some test pattern types have restrictions on corner-to-corner spacing, while test pattern groups of some test pattern types do not have such restrictions.

[0103] In specific implementation, the rationality of the parameter variables of each test pattern in the initial layout can be judged in a programmed manner according to the above-mentioned attribute restriction rules, and the test pattern groups that do not conform to the actual process can be screened out from the M test pattern groups and marked, thereby obtaining an intermediate layout with marks.

[0104] According to some embodiments of the present application, optionally, in combination with actual layout construction scenarios, in order to more reasonably implement the above-mentioned attribute parameter screening, in the above-mentioned attribute restriction rules based on target test pattern type matching, the test pattern group whose values ​​of parameter variables in the initial layout do not meet the attribute restriction rules is marked, and before obtaining the intermediate layout, the layout construction method may also include:

[0105] Based on the correspondence between the preset multiple test pattern types and the multiple manufacturing rule check MRC scripts, determine the target MRC script corresponding to the target test pattern type, and the target MRC script may include attribute restriction rules;

[0106] Based on the attribute restriction rules of the target test pattern type matching, the test pattern groups whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rules are marked to obtain the intermediate layout, which may include:

[0107] By running the target MRC script, the test pattern groups whose values ​​of parameter variables in the initial layout do not meet the attribute restriction rules are marked to obtain the intermediate layout.

[0108] In specific implementation, different MRC scripts may be set according to the process manufacturing limitations corresponding to different test pattern types, and the correspondence between multiple test pattern types and multiple MRC scripts may be stored. In order to reduce storage pressure, the correspondence between multiple test pattern types and multiple MRC scripts may be implemented by key-value pairs. Corresponding attribute restriction rules may be programmed in different MRC scripts.

[0109] After determining the target test pattern type that meets the current layout construction requirements, the target MRC script corresponding to the target test pattern type is queried and determined from the correspondence between multiple test pattern types and multiple MRC scripts.

[0110] In this way, after drawing the above-mentioned M test graphics and constructing the above-mentioned initial layout, the corresponding target MRC script can be run to efficiently mark the test pattern groups whose parameter variable values ​​do not meet the attribute restriction rules in the M test pattern groups in the initial layout, so that the intermediate layout can be obtained quickly and conveniently.

[0111] In this embodiment, by running the MRC script to screen and remove unreasonable data in the initial layout, the complexity of the user's parameter setting is greatly reduced. In addition, the MRC script is used to remove test patterns in the test pattern group that do not conform to the actual situation. The operation and setting of the MRC script are more flexible and easy to maintain and modify.

[0112] According to some embodiments of the present application, optionally, in order to more reasonably implement the marking of the test patterns whose values ​​of the parameter variables in the initial layout do not conform to the attribute restriction rules according to the attribute restriction rules, the above-mentioned N parameter variables may include the target parameter variable, and the above-mentioned attribute restriction rules may include the minimum standard value and / or the maximum standard value corresponding to the target parameter variable. Based on the attribute restriction rules matching the target test pattern type, the test pattern group whose values ​​of the parameter variables in the initial layout do not conform to the attribute restriction rules is marked to obtain the intermediate layout, which may include:

[0113] Compare the value of the target parameter variable of each test pattern group in the M test pattern groups with the minimum standard value and the maximum standard value respectively, and determine the comparison result;

[0114] Based on the comparison result, the target test pattern group whose values ​​of the target parameter variables in the initial layout do not meet the attribute restriction rules is marked;

[0115] Based on the initial layout after marking the target test pattern group, an intermediate layout is obtained.

[0116] More specifically, based on the comparison result, marking the target test pattern group whose values ​​of the target parameter variables in the initial layout do not conform to the attribute restriction rule may include:

[0117] Based on the comparison result, a target test pattern whose value of the target parameter variable is less than a minimum standard value or greater than a maximum standard value is determined from the initial layout;

[0118] Mark the target test pattern in the initial layout.

[0119] In this embodiment, taking the example that the attribute restriction rules include both the minimum standard value and the maximum standard value corresponding to the target parameter variable, the target parameter variables corresponding to different test pattern groups are compared with their corresponding minimum standard value and maximum standard value respectively.

[0120] Thus, if the value of the target parameter variable corresponding to a test pattern group is greater than the maximum standard value, it is determined that the test patterns in the test pattern group do not meet the process manufacturing requirements, and the test pattern group is marked as a target test pattern group. Alternatively, if the value of the target parameter variable corresponding to a test pattern group is less than the minimum standard value, it is determined that the test patterns in the test pattern group also do not meet the process manufacturing requirements, and the test pattern group is marked as a target test pattern group.

[0121] This process is repeated in this way until the target parameter variables of the M test patterns in the initial layout are compared with the maximum standard value and the minimum standard value, thereby achieving the mark screening of the test pattern group in the initial layout under the target parameter variables.

[0122] In this case, based on the initial layout after marking the target test pattern group, the next round of comparison is performed on the maximum standard values ​​and / or minimum standard values ​​corresponding to other parameter variables in the switching attribute restriction rules until the above attribute restriction rule traversal is completed and the above intermediate layout is finally determined.

[0123] It should be added that, in some embodiments, the above attribute restriction rules may also include only the minimum standard value corresponding to the target parameter variable, or only the maximum standard value corresponding to the target parameter variable, which is not strictly limited here.

[0124] According to some embodiments of the present application, optionally, in order to effectively improve the data screening efficiency of multiple test pattern groups in the initial layout, the above-mentioned N parameter variables may include a first parameter variable and a second parameter variable, and the attribute restriction rule may include a first attribute restriction sub-rule corresponding to the first parameter variable and a second attribute restriction sub-rule corresponding to the second parameter variable; based on the attribute restriction rule matching the target test pattern type, the test pattern group whose value of the parameter variable in the initial layout does not meet the attribute restriction rule is marked to obtain the intermediate layout, which may include:

[0125] Based on the first attribute restriction sub-rule, marking the test pattern groups whose values ​​of the first parameter variable do not meet the first attribute restriction sub-rule among the M test pattern groups, and determining K test pattern groups whose values ​​of the first parameter variable meet the first attribute restriction sub-rule among the M test pattern groups, where K is a non-negative integer;

[0126] Based on the second attribute restriction sub-rule, marking the test pattern groups whose values ​​of the second parameter variable do not meet the second attribute restriction sub-rule among the K test pattern groups, and determining L test pattern groups whose values ​​of the second parameter variable meet the second attribute restriction sub-rule among the K test pattern groups, where L is a non-negative integer;

[0127] Based on the rules except the first attribute restriction sub-rule and the second attribute restriction sub-rule in the attribute restriction rule, the test pattern groups whose parameter variable values ​​do not meet the attribute restriction rule in the L test pattern groups are marked to obtain an intermediate layout.

[0128] In this embodiment, considering that a marked test pattern group will be eliminated later, multiple test pattern groups can be screened by the first parameter variable, and after marking the test pattern groups whose first parameter variables do not meet the first attribute restriction sub-rule, several test pattern groups that have not been marked yet are determined.

[0129] Thus, when screening the second parameter variable, attribute parameter comparison and screening can be performed on the aforementioned several unmarked test pattern groups, and then the test pattern groups whose second parameter variables do not meet the second attribute restriction rule can be marked.

[0130] By analogy, each time a new parameter variable is screened and eliminated from the test pattern group, the test pattern groups involved in determining whether the new parameter variable is reasonable are all previously unmarked test patterns, which effectively reduces the amount of calculation involved in the attribute parameter screening process.

[0131] According to some embodiments of the present application, optionally, in combination with actual layout test scenarios, in order to more conveniently implement the marking of different test pattern groups and improve the efficiency of Boolean operations between subsequent layouts, the above-mentioned method of drawing M test pattern groups corresponding to M parameter variable combinations one by one based on M parameter variable combinations, and constructing an initial layout containing M test pattern groups, may include:

[0132] Based on M combinations of parameter variables, M test pattern groups are drawn in M ​​preset division areas in a blank layout to obtain an initial layout; the M preset division areas correspond one to one with the M test pattern groups;

[0133] Based on the attribute restriction rules of the target test pattern type matching, the test pattern groups whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rules are marked to obtain the intermediate layout, which may include:

[0134] Based on the attribute restriction rule, the preset division areas corresponding to the test pattern groups whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule are marked to obtain an intermediate layout.

[0135] In this embodiment, the above-mentioned preset division area (block) is an area within a layout, and a test pattern group corresponding to a parameter variable is drawn in the preset division area. A test pattern group corresponding to any parameter variable combination of the aforementioned M parameter variable combinations can be drawn in a preset division area. There are multiple preset division areas for multiple parameter variable combinations to draw multiple test pattern groups, thereby forming the above-mentioned initial layout.

[0136] In the above-mentioned attribute restriction rule based on the target test pattern type matching, when marking the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule, the intermediate layout can be obtained by marking the preset divided area corresponding to the corresponding test pattern group.

[0137] In this way, by setting the preset divided area block to draw the test pattern group and filter the mark processing, it can be more convenient to realize the marking of different test pattern groups, and help to fully improve the efficiency of subsequent Boolean operation between layouts.

[0138] In S140, in the specific implementation, at least one of the Boolean operations such as 'AND', 'OR', 'NOT', 'XOR' and 'AND NOT' can be used to perform Boolean operations on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standards. This application does not impose strict restrictions on this.

[0139] In one example, more specifically, in order to more reasonably calculate and obtain the target layout that meets the layout production standards, the initial layout and the intermediate layout can be Boolean operated using the logical "and" operation to quickly determine the overlapping test pattern groups in the initial layout and the intermediate layout (i.e., the test pattern groups that are not marked), thereby indirectly eliminating the test pattern groups in the initial layout and the intermediate layout. In this way, based on the overlapping test pattern groups in the initial layout and the intermediate layout determined above, the final target layout is generated, and the test pattern groups existing in the target layout are all test patterns whose parameter variable values ​​meet the aforementioned attribute restriction rules.

[0140] For example, the initial layout includes test pattern group 1, test pattern group 2, and test pattern group 3, and none of the three test pattern groups are marked, so the Boolean values ​​of the three test pattern groups are all true. The intermediate layout includes test pattern group 1, test pattern group 2, and the marked test pattern group 3, and neither test pattern group 1 nor test pattern group 2 are marked, and the Boolean values ​​of test pattern group 1 and test pattern group 2 are all true, and the Boolean value of the marked test pattern group 3 is false.

[0141] In this case, by performing an AND operation in a Boolean operation on the initial layout and the intermediate layout, it is determined that the AND operation results of the test pattern group 1 and the test pattern group 2 between the two layouts are true, and the AND operation result of the test pattern group 3 is false. In this way, based on the test pattern group 1 and the test pattern group 2 whose AND operation results are true, a target layout that meets the layout production standard can be finally generated.

[0142] According to some embodiments of the present application, optionally, in combination with the above-mentioned embodiment of drawing and marking test patterns in a test pattern group by setting a preset divided area block, the above-mentioned Boolean operation operation is performed on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standard, specifically including:

[0143] Performing Boolean operations on the initial layout and the intermediate layout to determine at least one unmarked preset division area contained in both the initial layout and the intermediate layout;

[0144] A target layout is obtained based on at least one unmarked preset divided area and its corresponding test pattern group.

[0145] In this embodiment, after obtaining the above-mentioned intermediate layout, Boolean operations are performed on the initial layout and the intermediate layout to compare whether there are marks on the corresponding preset division areas between different layouts, so as to quickly determine the overlapping preset division areas in the two layouts, and return the shared parts of the initial layout and the intermediate layout.

[0146] Since the preset division areas with marks in the intermediate layout are not marked in the initial layout, such preset division areas marked in the intermediate layout will be determined as non-overlapping parts between layouts in the Boolean operation, thereby achieving the removal and filtering of the preset division areas with marks and their corresponding test patterns that do not comply with the attribute restriction rules.

[0147] After performing the Boolean operation between the initial layout and the intermediate layout, the overlapping part between the initial layout and the intermediate layout can be obtained, and the overlapping part is at least one unmarked preset division area contained in both the initial layout and the intermediate layout.

[0148] In this way, based on the above-mentioned at least one unmarked preset division area and its corresponding test pattern group, the final required target layout is constructed, thereby effectively ensuring that the test pattern groups in the target layout are all test pattern groups whose parameter variable values ​​comply with the attribute restriction rules.

[0149] In order to facilitate understanding of the layout construction method provided in the above embodiment, the above method is described below using a specific scenario embodiment. Figure 2 It is a schematic diagram of the status comparison of a part of the layout before and after processing provided by an embodiment of the present application; Figure 3 It is a schematic diagram of the state comparison before and after the processing of a part of the layout provided by another embodiment of the present application; Figure 4 This is a schematic diagram showing the status comparison of a portion of the layout before and after processing provided by another embodiment of the present application.

[0150] The application scenario of this scenario embodiment can be: the test pattern in the aforementioned generated initial layout may have the following three situations: the multiple parameter variables may include parameter variables such as line width, line spacing, or corner to corner spacing. The above parameter variables may be smaller than the actual production process. It is necessary to use the rules in the MRC script to filter out the test pattern group that does not meet the attribute parameter conditions in the initial layout. The following examples illustrate the operation processing in each case;

[0151] 1. Process the test pattern group whose space is less than a specific value:

[0152] See also Figure 2 , there is a situation in the initial layout where the space corresponding to the test pattern group is smaller than a certain value (for example, 30nm), Figure 2Some test pattern groups are selected as examples. For test pattern groups whose space is smaller than a certain value, they cannot be exposed due to the influence of the process. It is necessary to remove the test pattern groups with the above situation from the multiple test pattern groups in the initial layout. In this way, the min space parameter is set in the MRC script to filter out the test pattern groups with less than the min space ( Figure 2 The test pattern group with space of 25nm and 15nm in the middle) marks its block (corresponding to the preset division area) to form an intermediate layout. Then, the intermediate layout is Boolean-operated with the initial layout to obtain the final target layout;

[0153] 2. Process the test pattern group whose width is less than a specific value:

[0154] Similarly, see Figure 3 , if the width of the test pattern group in the initial layout is less than a certain value (for example, 60nm), a similar method as above is used to screen and mark the test pattern groups that do not meet the conditions ( Figure 3 The test pattern group with a width of 50nm and 55nm in the middle) is used to form an intermediate layout. Then, the intermediate layout is Boolean-operated with the initial layout to obtain the final target layout.

[0155] 3. Process the test pattern group whose corner to corner is less than a specific value:

[0156] See also Figure 4 , corresponding to the situation in which the corner to corner of the test pattern group in the initial layout is smaller than a certain value (for example, 20nm), Figure 4 Taking some test pattern groups as an example, for test pattern groups with corner to corner values ​​less than a certain value, they are often affected by the mask manufacturing process and cannot be exposed in actual production. Therefore, it is necessary to remove these test pattern groups with abnormal corner to corner values ​​in the early stage. Therefore, the mincorner to corner parameter is set in the MRC script to filter out the test pattern groups with corner to corner values ​​less than the min corner to corner value in the initial layout ( Figure 4 The test pattern group with corner to corner of 10nm and 14nm is used to mark its block (corresponding to the preset division area) to form an intermediate layout. Then, the intermediate layout is subjected to Boolean operation with the initial layout to obtain the final target layout.

[0157] Based on the layout construction method provided in the above embodiment, for the same inventive concept, the present application also provides a layout construction device corresponding to the above layout construction method. Figure 5 The layout construction device is introduced in detail.

[0158] Figure 5 A schematic diagram of the structure of a layout construction device provided in one embodiment of the present application is shown. Figure 5 The layout construction device 500 shown includes:

[0159] A first determination module 510 is used to determine N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, where N is a positive integer;

[0160] The first drawing module 520 is used to draw M test pattern groups corresponding to the M parameter variable combinations based on M parameter variable combinations, and construct an initial layout including the M test pattern groups; the M parameter variable combinations are determined based on N parameter variables under different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern;

[0161] A first marking module 530 is used to mark the test pattern group whose values ​​of parameter variables in the initial layout do not meet the attribute restriction rules based on the attribute restriction rules of the target test pattern type matching, so as to obtain an intermediate layout;

[0162] The first obtaining module 540 is used to perform Boolean operations on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standard.

[0163] A layout construction device provided in an embodiment of the present application pre-acquires a target test pattern type that meets the layout construction requirements by setting corresponding functional modules, determines the corresponding N parameter variables, and then draws the corresponding M test pattern groups based on the M parameter variable combinations obtained based on the N parameter variables under different values, so as to construct an initial layout containing M test pattern groups. Then, based on the attribute restriction rules matching the target test pattern type, the test pattern groups whose parameter variable values ​​in the initial layout do not meet the attribute restriction rules are marked to obtain an intermediate layout. Finally, by performing Boolean operations on the initial layout and the intermediate layout, the marked test patterns are screened and eliminated, thereby obtaining a target layout that meets the layout production standards.

[0164] It can be seen from the above description that a layout construction device of an embodiment of the present application can directly draw a variety of test pattern groups by pre-acquiring different value combinations of parameter variables corresponding to the test image type, and then efficiently mark the test pattern groups that do not conform to the actual situation in the initial layout based on the attribute restriction rules, so as to efficiently screen out the test pattern groups that meet the actual process index requirements through Boolean operations between layouts, and obtain the final target layout. In this way, by adopting the embodiment of the present application, the attribute restriction rules can be used efficiently and automatically to screen and eliminate unreasonable data, and the user does not need to manually judge the rationality of each setting parameter one by one when constructing a specific layout, which greatly reduces the complexity of the user in the parameter value screening setting, thereby effectively improving the efficiency and accuracy of layout construction, and then fully improving the user's layout construction experience and convenience.

[0165] According to some embodiments of the present application, optionally, before drawing M test pattern groups corresponding to the M parameter variable combinations one by one based on the M parameter variable combinations and constructing an initial layout including the M test pattern groups, the layout construction device may further include:

[0166] A first receiving module may be used to receive a configuration input of a variable value of N parameter variables, where the variable value may include a custom value range and a custom step size corresponding to each parameter variable in the N parameter variables;

[0167] The first response module can be used to respond to the configuration input and determine M parameter variable combinations based on the custom value range and custom step size corresponding to each parameter variable in the N parameter variables.

[0168] According to some embodiments of the present application, optionally, based on the attribute restriction rule of the target test pattern type matching, the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule is marked, and before obtaining the intermediate layout, the layout construction device may further include:

[0169] A second determination module may be used to determine a target MRC script corresponding to a target test pattern type based on a correspondence relationship between a plurality of pre-set test pattern types and a plurality of manufacturing rule check MRC scripts, wherein the target MRC script may include an attribute restriction rule;

[0170] The first marking module 530 may be specifically used to mark the test pattern groups whose values ​​of parameter variables in the initial layout do not conform to the attribute restriction rules by running the target MRC script, so as to obtain an intermediate layout.

[0171] According to some embodiments of the present application, optionally, the N parameter variables may include a target parameter variable, and the attribute restriction rule may include a minimum standard value and / or a maximum standard value corresponding to the target parameter variable; the first marking module 530 may include:

[0172] The first determination submodule may be used to compare the value of the target parameter variable of each test pattern group in the M test pattern groups with the minimum standard value and the maximum standard value, respectively, to determine a comparison result;

[0173] The first marking submodule may be used to mark the target test pattern group whose values ​​of the target parameter variables in the initial layout do not conform to the attribute restriction rules based on the comparison result;

[0174] The first obtaining submodule can be used to obtain an intermediate layout based on the initial layout after marking the target test pattern group.

[0175] According to some embodiments of the present application, optionally, the first marking submodule may include:

[0176] A first determination unit may be used to determine, based on the comparison result, from the initial layout, a target test pattern group whose value of the target parameter variable is less than a minimum standard value or greater than a maximum standard value;

[0177] The first marking unit may be used to mark the target test pattern group in the initial layout.

[0178] According to some embodiments of the present application, optionally, the N parameter variables may include a first parameter variable and a second parameter variable, and the attribute restriction rule may include a first attribute restriction sub-rule corresponding to the first parameter variable and a second attribute restriction sub-rule corresponding to the second parameter variable; based on the attribute restriction rule matching the target test pattern type, a test pattern group whose values ​​of the parameter variables in the initial layout do not comply with the attribute restriction rule is marked to obtain an intermediate layout, which may include:

[0179] The second marking submodule may be used to mark the test pattern groups whose values ​​of the first parameter variable do not conform to the first attribute restriction subrule in the M test pattern groups based on the first attribute restriction subrule, and determine K test pattern groups whose values ​​of the first parameter variable conform to the first attribute restriction subrule in the M test pattern groups, where K is a non-negative integer;

[0180] The third marking submodule may be used to mark the test pattern groups whose values ​​of the second parameter variables do not conform to the second attribute restriction subrule among the K test pattern groups based on the second attribute restriction subrule, and determine L test pattern groups whose values ​​of the second parameter variables conform to the second attribute restriction subrule among the K test pattern groups, where L is a non-negative integer;

[0181] The fourth marking submodule can be used to mark the test patterns whose parameter variable values ​​in the L test pattern groups do not comply with the attribute restriction rules based on the rules other than the first attribute restriction sub-rule and the second attribute restriction sub-rule in the attribute restriction rules to obtain an intermediate layout.

[0182] According to some embodiments of the present application, optionally, the first drawing module 520 may be used to: draw M test pattern groups in M ​​preset division areas in a blank layout based on M parameter variable combinations to obtain an initial layout; the M preset division areas correspond one-to-one to the M test pattern groups;

[0183] The first marking module 530 can be used to mark the preset division areas corresponding to the test pattern groups whose values ​​of parameter variables in the initial layout do not meet the attribute restriction rules based on the attribute restriction rules to obtain the intermediate layout.

[0184] In some possible implementations, the first obtaining module 540 may include:

[0185] The Boolean operation submodule can be used to perform Boolean operation on the initial layout and the intermediate layout to determine at least one unmarked preset division area contained in both the initial layout and the intermediate layout;

[0186] The obtaining submodule can be used to obtain a target layout based on at least one unmarked preset divided area and its corresponding test pattern group.

[0187] According to some embodiments of the present application, optionally, before determining N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, the layout construction device may further include:

[0188] A second receiving module may be used to receive a user's selection input of a target test pattern type among a plurality of test pattern types;

[0189] The second response module may be used to determine, in response to the selection input, a test pattern type that meets the layout construction requirement as a target test pattern type.

[0190] According to some embodiments of the present application, optionally, the N parameter variables may include at least one of a line width parameter variable, a spacing parameter variable, and an angle-to-angle spacing parameter variable.

[0191] Based on the layout construction method provided in the above embodiment, for the same inventive concept, the present application also provides a layout construction device corresponding to the above layout construction method. Figure 6 A detailed introduction to the layout construction equipment is given.

[0192] See below Figure 6 , Figure 6 It is a structural schematic diagram of a layout construction device provided in one embodiment of the present application.

[0193] The layout construction device may include a processor 601 and a memory 602 storing computer program instructions.

[0194] Specifically, the processor 601 may include a central processing unit (CPU), or an application specific integrated circuit (ASIC), or may be configured to implement one or more integrated circuits of the embodiments of the present application.

[0195] The memory 602 may include a large capacity memory for data or instructions. By way of example and not limitation, the memory 602 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive or a combination of two or more of these. In appropriate cases, the memory 602 may include a removable or non-removable (or fixed) medium. In appropriate cases, the memory 602 may be inside or outside the integrated gateway disaster recovery device. In a specific embodiment, the memory 602 is a non-volatile solid-state memory.

[0196] The memory may include read-only memory (ROM), random access memory (RAM), magnetic disk storage media devices, optical storage media devices, flash memory devices, electrical, optical or other physical / tangible memory storage devices. Thus, typically, the memory includes one or more tangible (non-transitory) computer-readable storage media (e.g., memory devices) encoded with software including computer-executable instructions, and when the software is executed (e.g., by one or more processors), it is operable to perform the operations described with reference to the method according to an aspect of the present disclosure.

[0197] The processor 601 implements any one of the layout construction methods in the above embodiments by reading and executing the computer program instructions stored in the memory 602 .

[0198] In one example, the data layout construction device may further include a communication interface 603 and a bus 610. Figure 6 As shown, the processor 601, the memory 602, and the communication interface 603 are connected via a bus 610 and communicate with each other.

[0199] The communication interface 603 is mainly used to implement communication between various modules, devices, units and / or equipment in the embodiments of the present application.

[0200] Bus 610 includes hardware, software or both, and the parts of layout construction equipment are coupled to each other. For example, but not limitation, bus may include accelerated graphics port (AGP) or other graphics bus, enhanced industrial standard architecture (EISA) bus, front side bus (FSB), hypertransport (HT) interconnection, industrial standard architecture (ISA) bus, infinite bandwidth interconnection, low pin count (LPC) bus, memory bus, micro channel architecture (MCA) bus, peripheral component interconnection (PCI) bus, PCI-Express (PCI-X) bus, serial advanced technology attachment (SATA) bus, video electronics standard association local (VLB) bus or other suitable bus or two or more of these combinations. In appropriate cases, bus 610 may include one or more buses. Although the present application embodiment describes and shows a specific bus, the application considers any suitable bus or interconnection.

[0201] The layout construction device executes the layout construction method in the embodiment of the present application, thereby realizing the layout construction method described in the embodiment of the present application.

[0202] In addition, in combination with the layout construction method in the above embodiment, the embodiment of the present application can provide a computer storage medium for implementation. The computer storage medium stores computer program instructions; when the computer program instructions are executed by a processor, any one of the layout construction methods in the above embodiment is implemented.

[0203] Based on the layout construction method in the above-mentioned embodiment, an embodiment of the present application provides a computer program product. When the instructions in the computer program product are executed by a processor of an electronic device, the electronic device executes the layout construction method provided in any one of the above-mentioned embodiments of the present application.

[0204] It should be clear that the present application is not limited to the specific configuration and processing described above and shown in the figures. For the sake of simplicity, a detailed description of the known method is omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of the present application is not limited to the specific steps described and shown, and those skilled in the art can make various changes, modifications and additions, or change the order between the steps after understanding the spirit of the present application.

[0205] The functional blocks shown in the above-described block diagram can be implemented as hardware, software, firmware or a combination thereof. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), appropriate firmware, a plug-in, a function card, etc. When implemented in software, the elements of the present application are programs or code segments that are used to perform the required tasks. The program or code segment can be stored in a machine-readable medium, or transmitted on a transmission medium or a communication link by a data signal carried in a carrier wave. "Machine-readable medium" can include any medium capable of storing or transmitting information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, optical fiber media, radio frequency (RF) links, etc. The code segment can be downloaded via a computer network such as the Internet, an intranet, etc.

[0206] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or systems based on a series of steps or devices. However, this application is not limited to the order of the above steps, that is, the steps can be performed in the order mentioned in the embodiment, or in a different order from the embodiment, or several steps can be performed simultaneously.

[0207] Aspects of the present disclosure are described above with reference to the flowchart and / or block diagram of the method, device (system) and computer program product according to the embodiment of the present disclosure. It should be understood that each box in the flowchart and / or block diagram and the combination of each box in the flowchart and / or block diagram can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, or other programmable data processing device to produce a machine so that these instructions executed by the processor of the computer or other programmable data processing device enable the implementation of the function / action specified in one or more boxes of the flowchart and / or block diagram. Such a processor can be, but is not limited to, a general-purpose processor, a special-purpose processor, a special application processor, or a field programmable logic circuit. It can also be understood that each box in the block diagram and / or flowchart and the combination of boxes in the block diagram and / or flowchart can also be implemented by dedicated hardware that performs a specified function or action, or can be implemented by a combination of dedicated hardware and computer instructions.

[0208] The above is only a specific implementation of the present application. Those skilled in the art can clearly understand that for the convenience and simplicity of description, the specific working processes of the systems, modules and units described above can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the protection scope of the present application is not limited to this. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in this application, and these modifications or replacements should be included in the protection scope of this application.

Claims

1. A layout construction method, characterized in that: The method comprises: Based on a target test pattern type that meets the layout construction requirements, determining N parameter variables that match the target test pattern type, where N is a positive integer; Based on M parameter variable combinations, M test pattern groups corresponding to the M parameter variable combinations are drawn, and an initial layout including the M test pattern groups is constructed; the M parameter variable combinations are determined based on the N parameter variables under different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern; Based on the attribute restriction rule of the target test pattern type matching, the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule is marked to obtain an intermediate layout; A Boolean operation is performed on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standard.

2. The method according to claim 1, characterized in that Before drawing M test pattern groups corresponding to the M parameter variable combinations one by one based on the M parameter variable combinations and constructing an initial layout including the M test pattern groups, the method further includes: Receiving configuration input of variable values ​​of the N parameter variables, the variable values ​​including a custom value range and a custom step size corresponding to each parameter variable in the N parameter variables; In response to the configuration input, the M parameter variable combinations are determined based on a custom value range and a custom step size corresponding to each parameter variable in the N parameter variables.

3. The method according to claim 1, characterized in that Before obtaining the intermediate layout, the method further includes: marking the test pattern group whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule based on the attribute restriction rule of the target test pattern type matching, and obtaining the intermediate layout: Based on the correspondence between a plurality of preset test pattern types and a plurality of manufacturing rule check MRC scripts, determining a target MRC script corresponding to the target test pattern type, wherein the target MRC script includes the attribute restriction rule; The method of marking the test pattern group whose values ​​of the parameter variables in the initial layout do not conform to the attribute restriction rule based on the attribute restriction rule of the target test pattern type matching to obtain the intermediate layout includes: By running the target MRC script, the test pattern groups whose values ​​of parameter variables in the initial layout do not conform to the attribute restriction rules are marked to obtain the intermediate layout.

4. The method according to claim 1, characterized in that: The N parameter variables include a target parameter variable, and the attribute restriction rule includes a minimum standard value and / or a maximum standard value corresponding to the target parameter variable; the attribute restriction rule based on the target test pattern type matching marks the test pattern group whose parameter variable values ​​in the initial layout do not meet the attribute restriction rule, to obtain an intermediate layout, including: Compare the value of the target parameter variable of each test pattern group in the M test pattern groups with the minimum standard value and the maximum standard value respectively to determine a comparison result; Based on the comparison result, marking the target test pattern group whose value of the target parameter variable in the initial layout does not meet the attribute restriction rule; The intermediate layout is obtained based on the initial layout after marking the target test pattern group.

5. The method according to claim 4, characterized in that The step of marking the target test pattern group whose values ​​of the target parameter variables in the initial layout do not conform to the attribute restriction rule based on the comparison result includes: Based on the comparison result, determining the target test pattern group whose value of the target parameter variable is less than the minimum standard value or greater than the maximum standard value from the initial layout; The target test pattern group in the initial layout is marked.

6. The method according to claim 1, characterized in that The N parameter variables include a first parameter variable and a second parameter variable, and the attribute restriction rule includes a first attribute restriction sub-rule corresponding to the first parameter variable and a second attribute restriction sub-rule corresponding to the second parameter variable; the attribute restriction rule based on the target test pattern type matching marks the test pattern group whose parameter variable values ​​in the initial layout do not meet the attribute restriction rule, and obtains an intermediate layout, including: Based on the first attribute restriction sub-rule, marking the test pattern groups whose values ​​of the first parameter variable do not comply with the first attribute restriction sub-rule among the M test pattern groups, and determining K test pattern groups whose values ​​of the first parameter variable comply with the first attribute restriction sub-rule among the M test pattern groups, where K is a non-negative integer; Based on the second attribute restriction sub-rule, marking the test pattern groups whose values ​​of the second parameter variable do not comply with the second attribute restriction sub-rule among the K test pattern groups, and determining L test pattern groups whose values ​​of the second parameter variable comply with the second attribute restriction sub-rule among the K test pattern groups, where L is a non-negative integer; Based on the rules in the attribute restriction rules except the first attribute restriction sub-rule and the second attribute restriction sub-rule, the test pattern groups whose values ​​of parameter variables in the L test pattern groups do not comply with the attribute restriction rules are marked to obtain the intermediate layout.

7. The method according to claim 1, characterized in that Based on the M parameter variable combinations, M test pattern groups corresponding to the M parameter variable combinations are drawn one by one, and an initial layout including the M test pattern groups is constructed, including: Based on the M parameter variable combinations, the M test pattern groups are drawn in the M preset division areas in the blank layout to obtain the initial layout; the M preset division areas correspond one to one with the M test pattern groups; The method of marking the test pattern group whose values ​​of the parameter variables in the initial layout do not conform to the attribute restriction rule based on the attribute restriction rule of the target test pattern type matching to obtain the intermediate layout includes: Based on the attribute restriction rule, the preset division areas corresponding to the test pattern groups whose values ​​of the parameter variables in the initial layout do not meet the attribute restriction rule are marked to obtain the intermediate layout.

8. The method according to claim 7, characterized in that The step of performing Boolean operations on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standard includes: Performing a Boolean operation on the initial layout and the intermediate layout to determine at least one unmarked preset division area contained in both the initial layout and the intermediate layout; The target layout is obtained based on the at least one unmarked preset divided area and its corresponding test pattern group.

9. The method according to any one of claims 1 to 8, characterized in that: Before determining N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, the method further includes: receiving a user's selection input of the target test pattern type among a plurality of test pattern types; In response to the selection input, a test pattern type that meets the layout construction requirement is determined as the target test pattern type.

10. The method according to any one of claims 1 to 8, characterized in that: The N parameter variables include at least one of a line width parameter variable, a spacing parameter variable, and an angle-to-angle spacing parameter variable.

11. A layout construction device, characterized in that: The device comprises: A first determination module is used to determine N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, where N is a positive integer; A first drawing module is used to draw M test pattern groups corresponding to the M parameter variable combinations based on M parameter variable combinations, and construct an initial layout including the M test pattern groups; the M parameter variable combinations are determined based on the N parameter variables under different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern; A first marking module is used to mark the test pattern group whose values ​​of parameter variables in the initial layout do not meet the attribute restriction rule based on the attribute restriction rule of the target test pattern type matching, so as to obtain an intermediate layout; The first acquisition module is used to perform Boolean operations on the initial layout and the intermediate layout to obtain a target layout that meets the layout production standards.

12. A layout construction device, characterized in that: The device comprises: a processor and a memory storing computer program instructions; When the processor executes the computer program instructions, the layout construction method as described in any one of claims 1-10 is implemented.

13. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer program instructions, and when the computer program instructions are executed by a processor, the layout construction method according to any one of claims 1 to 10 is implemented.

14. A computer program product, characterized in that When the instructions in the computer program product are executed by a processor of an electronic device, the electronic device executes the layout construction method as described in any one of claims 1-10.

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