Quantitative analysis method, device and system for vacuum degree of vacuum switch, electronic equipment and storage medium

Abstract

The invention discloses a method and a system for quantitatively analyzing the vacuum degree of a vacuum switch. The method comprises the following steps: acquiring laser plasma spectral data of a preset target material in a to-be-detected vacuum environment; extracting spectral intensity data of a characteristic spectral line according to the spectral data; laser plasma spectral characteristic parameters are obtained according to the spectral intensity data; and according to the laser plasma spectrum characteristic parameters, obtaining the vacuum degree to be measured by using a preset relation between the laser plasma spectrum characteristic parameters and the vacuum degree. The target material preset in the to-be-detected vacuum environment is induced by laser to generate the laser plasma, the spectrum and morphology characteristics of the laser plasma are detected to obtain the vacuum degree of the to-be-detected vacuum switch, non-contact vacuum degree detection is achieved, the stability of the spectral characteristic parameters of the laser plasma representing the vacuum degree is higher, and the detection accuracy is higher. The vacuum degree can be better represented, the anti-interference capability is higher, and the method is more practical.

Description

Technical Field

[0001] The present invention relates to the technical field of power equipment detection, and in particular to a method and system for quantitatively analyzing the vacuum degree of a vacuum switch. Background Art

[0002] Vacuum switch is a switchgear widely used in power systems. It uses the vacuum in the vacuum interrupter as an insulating arc-extinguishing medium to open and close the circuit. The vacuum switch has the advantages of strong breaking capacity, compact structure, simple maintenance, and naturally has the advantage of no greenhouse gas emissions. It is the most ideal substitute for SF6 circuit breakers. The insulating arc-extinguishing ability of the vacuum switch is closely related to the vacuum degree of the vacuum interrupter. The higher the vacuum degree, the stronger the insulating arc-extinguishing ability. As the vacuum switch ages, the vacuum degree of the vacuum interrupter will gradually decrease, causing the insulating arc-extinguishing ability of the vacuum switch to decline, posing serious safety hazards to the power system. At present, there are two main types of laser plasma characteristics used to characterize the degree of vacuum: spectral characteristics and morphological characteristics. Among them, spectral characteristics are to collect spectral signals of laser plasma and extract its spectral characteristics to characterize the degree of vacuum, mainly the spectral intensity of specific spectral lines. The spectral intensity of spectral lines is different under different vacuum environments and can be used to characterize the degree of vacuum; morphological characteristics are to perform rapid imaging analysis of laser plasma. The main characteristics are the radiation intensity integral and contour area of ​​laser plasma. Both are directly obtained from the laser plasma image. The laser plasma radiation intensity integral changes monotonically with the ambient pressure within a specific pressure range, and the contour area changes monotonically with the ambient pressure within the full pressure range; combining the laser plasma radiation intensity integral and contour area can characterize the degree of vacuum within the full pressure range.

[0003] However, existing technologies cannot achieve safe and reliable live detection of the vacuum degree of vacuum switches, resulting in inspectors being unable to evaluate the insulation arc extinguishing performance of vacuum switches in operation, limiting the application of vacuum switches in higher voltage level power systems. Summary of the invention

[0004] In view of the above existing problems, the present invention is proposed.

[0005] Therefore, the present invention provides a method and system for quantitatively analyzing the vacuum degree of a vacuum switch to solve the problem that the current laser induced plasma parameter measurement results have large fluctuations, resulting in reduced accuracy and stability of the vacuum degree measurement results, and unable to achieve safe and reliable live detection of the vacuum degree of the vacuum switch, resulting in inspection personnel being unable to evaluate the insulation arc extinguishing performance of the vacuum switch in operation.

[0006] In order to solve the above technical problems, the present invention provides the following technical solutions:

[0007] In a first aspect, the present invention provides a method for quantitatively analyzing the vacuum degree of a vacuum switch, comprising:

[0008] Obtaining laser plasma spectrum data of a preset target material in a vacuum environment to be tested;

[0009] Extracting spectral intensity data of characteristic spectral lines according to the spectral data;

[0010] Obtaining laser plasma spectrum characteristic parameters according to the spectrum intensity data;

[0011] According to the characteristic parameters of the laser plasma spectrum, the vacuum degree to be measured is obtained by utilizing the preset relationship between the characteristic parameters of the laser plasma spectrum and the vacuum degree.

[0012] As a preferred solution of the method for quantitatively analyzing the vacuum degree of a vacuum switch of the present invention, the process of acquiring the laser plasma spectrum data includes:

[0013] By sending a high-energy pulse laser to transmit along a first optical path and irradiate a preset target material in a vacuum environment to be tested, the preset target material is induced to generate laser plasma;

[0014] detecting the laser plasma beam that returns along the first optical path and continues to be transmitted along the second optical path to obtain a laser plasma spectrum;

[0015] Laser plasma spectrum data is obtained based on the laser plasma spectrum.

[0016] As a preferred solution of the method for quantitatively analyzing the vacuum degree of a vacuum switch described in the present invention, the relationship between the characteristic parameters of the laser plasma spectrum and the vacuum degree is obtained through a calibration curve.

[0017] As a preferred solution of the method for quantitatively analyzing the vacuum degree of a vacuum switch of the present invention, the calibration curve is obtained by fitting the spectral intensity ratio under known air pressure to the spectral intensity ratio.

[0018] As a preferred solution of the method for quantitatively analyzing the vacuum degree of a vacuum switch according to the present invention, it further comprises: the characteristic spectral lines include: Cu I 510.5nm, Cu I 515.3nm, Cu I 521.8nm, H I656.3nm, O I777.3nm.

[0019] In a second aspect, the present invention provides a vacuum switch vacuum degree quantitative analysis device, comprising:

[0020] A laser induced plasma unit comprises: a pulse laser, a dichroic mirror, a first focusing lens and a preset target material arranged in sequence along a first optical path;

[0021] The laser plasma spectrum detection unit comprises: a second focusing lens, a low-pass filter and a spectrometer arranged along a second optical path;

[0022] A controller connected to the spectrometer;

[0023] An observation window made of quartz glass, disposed between the first focusing lens and the preset target material;

[0024] The preset target material is set in the vacuum environment to be tested.

[0025] In a third aspect, the present invention provides a vacuum degree quantitative analysis system for a vacuum switch, comprising:

[0026] The first acquisition module is used to acquire the laser plasma spectrum data of a preset target material in the vacuum environment to be tested;

[0027] An extraction module, used for extracting spectral intensity data of characteristic spectral lines according to the spectral data;

[0028] A second data processing module, used for obtaining laser plasma spectrum characteristic parameters according to the spectrum intensity data;

[0029] The third data processing module is used to obtain the vacuum degree to be measured according to the laser plasma spectrum characteristic parameters and the relationship between the preset laser plasma spectrum characteristic parameters and the vacuum degree.

[0030] As a preferred solution of the vacuum switch vacuum degree quantitative analysis system of the present invention, wherein: the first acquisition module includes:

[0031] An induction module is used to induce the preset target material to generate laser plasma by sending a high-energy pulse laser along a first optical path and irradiating the preset target material in the vacuum environment to be tested;

[0032] A detection module, used for detecting the laser plasma light beam that returns along the first light path and continues to be transmitted along the second light path, so as to obtain the laser plasma spectrum;

[0033] The first data processing module is used to obtain laser plasma spectrum data based on the laser plasma spectrum.

[0034] In a fourth aspect, the present invention provides a computing device, comprising:

[0035] Memory and processor;

[0036] The memory is used to store computer executable instructions, and the processor is used to execute the computer executable instructions. When the computer executable instructions are executed by the processor, the steps of the method for quantitatively analyzing the vacuum degree of a vacuum switch are implemented.

[0037] In a fifth aspect, the present invention provides a computer-readable storage medium storing computer-executable instructions, which, when executed by a processor, implement the steps of the method for quantitatively analyzing the vacuum degree of a vacuum switch.

[0038] Compared with the prior art, the present invention has the following beneficial effects: the present invention utilizes a high-energy pulse laser to induce a target material preset in a vacuum environment to be tested to generate laser plasma, utilizes a weak signal detector to detect the spectrum and morphological characteristics of the laser plasma, and obtains the vacuum degree of the vacuum switch to be tested according to the spectrum and morphological characteristics of the plasma. This method is a non-contact vacuum degree detection method, and the laser plasma spectrum characteristic parameters of the vacuum degree are more stable, and the vacuum degree can be better characterized. The result of the vacuum degree measurement is more stable and has a stronger anti-interference ability, which facilitates the practical application of the vacuum degree detection method of the vacuum switch based on laser-induced plasma. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying creative work.

[0040] Figure 1 A schematic diagram of the overall process logic of a method for quantitatively analyzing the vacuum degree of a vacuum switch according to an embodiment of the present invention;

[0041] Figure 2 A schematic diagram of the structure of a vacuum switch vacuum degree quantitative analysis device according to an embodiment of the present invention;

[0042] Figure 3 Spectral diagram of characteristic spectral lines of Cu and H elements in laser plasma at different vacuum degrees in a method for quantitatively analyzing the vacuum degree of a vacuum switch according to an embodiment of the present invention;

[0043] Figure 4 A relationship diagram between the spectral intensity ratio Cu / H of the spectral lines CuI521.8nm and HI 656.3nm and the vacuum degree in the method for quantitatively analyzing the vacuum degree of a vacuum switch according to an embodiment of the present invention;

[0044] Figure 5 This is a diagram of actual vacuum degree measurement results in a method for quantitatively analyzing the vacuum degree of a vacuum switch according to an embodiment of the present invention. DETAILED DESCRIPTION

[0045] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the specific implementation methods of the present invention are described in detail below in conjunction with the drawings of the specification. Obviously, the described embodiments are part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary persons in the art without creative work should fall within the scope of protection of the present invention.

[0046] Example 1

[0047] Reference Figure 1-Figure 2 , as an embodiment of the present invention, provides a method for quantitatively analyzing the vacuum degree of a vacuum switch, comprising:

[0048] S100: Acquiring laser plasma spectrum data of a preset target material in a vacuum environment to be tested;

[0049] S200: extracting spectral intensity data of characteristic spectral lines according to the spectral data;

[0050] S300: Obtaining laser plasma spectrum characteristic parameters according to spectrum intensity data;

[0051] It should be noted that this step is mainly used to eliminate the influence of the spectral intensity change of a single spectral line on the vacuum degree measurement, so as to improve the accuracy of the vacuum degree measurement result.

[0052] S400: According to the laser plasma spectrum characteristic parameters, the vacuum degree to be measured is obtained by using the preset relationship between the laser plasma spectrum characteristic parameters and the vacuum degree.

[0053] It should be noted that laser-induced plasma is a very complex process, involving both classical physics and quantum physics processes, with many influencing factors. Characteristic parameters such as the spectral intensity of a single spectral line, the integral of the laser plasma radiation intensity and the contour area measured in a single time are easily affected by multiple factors such as the degree of pulsed laser focusing, laser energy, and the surface morphology of the target material, which makes the measurement results of characteristic parameters such as the spectral intensity of a single spectral line of laser plasma, the integral of the radiation intensity and the contour area measured in a single time, etc., highly volatile, resulting in a decrease in the accuracy and stability of the vacuum degree measurement results, which is not conducive to the practical application of the vacuum degree detection method of the vacuum switch based on laser-induced plasma.

[0054] The above steps and methods are a non-contact vacuum degree detection, which can realize safe and reliable live vacuum degree detection of vacuum switches.

[0055] In the embodiment of the present application, the process of acquiring the laser plasma spectrum data in the above step S100 includes the following sub-steps A1-A2:

[0056] A1: by sending a high-energy pulse laser along the first optical path and irradiating the preset target material in the vacuum environment to be tested, inducing the preset target material to generate laser plasma;

[0057] A2: Detecting the laser plasma beam that returns along the first optical path and continues to be transmitted along the second optical path to obtain a laser plasma spectrum to obtain laser plasma spectrum data.

[0058] In the embodiment of the present application, the characteristic spectral lines in the above step S200 include: Cu I 510.5nm, Cu I515.3nm, Cu I 521.8nm, HI 656.3nm, OI 777.3nm.

[0059] In the embodiment of the present application, the characteristic parameters of the laser plasma spectrum in the above step S300 can be in two forms:

[0060] In one embodiment, the characteristic parameters of the laser plasma spectrum include the spectral intensity ratio of the spectral line Cu I 510.5nm and H I656.3nm Cu510.5 / H656.3, the spectral intensity ratio of the spectral line Cu I 515.3nm and HI 656.3nm Cu515.3 / H656.3, and the spectral intensity ratio of the spectral line Cu I 521.8nm and HI 656.3nm Cu521.8 / H656.3.

[0061] In another embodiment, the characteristic parameters of the laser plasma spectrum include the spectral intensity ratio of the spectral line Cu I 510.5nm and O I777.3nm Cu510.5 / O777.3, the spectral intensity ratio of the spectral line Cu I 515.3nm and O I777.3nm Cu515.3 / O777.3, and the spectral intensity ratio of the spectral line Cu I 521.8nm and OI 777.3nm Cu521.8 / O777.3.

[0062] In the embodiment of the present application, the relationship between the characteristic parameters of the laser plasma spectrum and the vacuum degree in the above step S400 is obtained through a calibration curve.

[0063] In the embodiment of the present application, the calibration curve in the above step S400 is obtained by fitting the air pressure and the spectral intensity ratio under known air pressure.

[0064] Specifically, the characteristic parameters of the laser plasma spectrum are taken as input and combined with the calibration curve to infer the vacuum degree to be measured.

[0065] The above is a schematic scheme of a vacuum switch vacuum degree quantitative analysis method of this embodiment. It should be noted that the technical scheme of the vacuum switch vacuum degree quantitative analysis system and the technical scheme of the vacuum switch vacuum degree quantitative analysis method described above belong to the same concept. For details not described in detail in the technical scheme of the vacuum switch vacuum degree quantitative analysis system of this embodiment, please refer to the description of the technical scheme of the vacuum switch vacuum degree quantitative analysis method described above.

[0066] like Figure 2 As shown, this embodiment also provides a device for quantitatively analyzing the vacuum degree of a vacuum switch, and the above method is applied to the device, including:

[0067] The laser induced plasma unit comprises: a pulse laser 100, a dichroic mirror 200, a first focusing lens 300 and a preset target material 500 arranged in sequence along a first optical path;

[0068] The laser plasma spectrum detection unit comprises: a second focusing lens 700, a low-pass filter 800 and a spectrometer 900 arranged along a second optical path;

[0069] A controller 1000, wherein the controller 1000 is connected to the spectrometer 900;

[0070] An observation window 400 made of quartz glass is disposed between the first focusing lens 300 and the preset target 500;

[0071] The preset target material 500 is disposed in the vacuum environment 600 to be tested.

[0072] This embodiment also provides a vacuum switch vacuum degree quantitative analysis system, including:

[0073] The first acquisition module is used to acquire the laser plasma spectrum data of a preset target material in the vacuum environment to be tested;

[0074] An extraction module, used for extracting spectral intensity data of characteristic spectral lines based on spectral data;

[0075] A second data processing module is used to obtain laser plasma spectrum characteristic parameters according to the spectrum intensity data;

[0076] The third data processing module is used to obtain the vacuum degree to be measured according to the laser plasma spectrum characteristic parameters and the relationship between the preset laser plasma spectrum characteristic parameters and the vacuum degree.

[0077] Wherein, the first acquisition module includes:

[0078] An induction module is used to induce the preset target material to generate laser plasma by sending a high-energy pulse laser along a first optical path and irradiating the preset target material in the vacuum environment to be tested;

[0079] A detection module, used for detecting the laser plasma light beam that returns along the first light path and continues to be transmitted along the second light path, so as to obtain the laser plasma spectrum;

[0080] The first data processing module is used to obtain laser plasma spectrum data based on the laser plasma spectrum.

[0081] This embodiment also provides a computing device suitable for quantitative analysis of the vacuum degree of a vacuum switch, comprising: a memory and a processor; the memory is used to store computer executable instructions, and the processor is used to execute computer executable instructions to implement the method for quantitative analysis of the vacuum degree of a vacuum switch as proposed in the above embodiment.

[0082] This embodiment further provides a storage medium on which a computer program is stored. When the program is executed by a processor, the method for quantitatively analyzing the vacuum degree of a vacuum switch as proposed in the above embodiment is implemented.

[0083] The storage medium proposed in this embodiment and the method for realizing quantitative analysis of vacuum degree of vacuum switch proposed in the above embodiment belong to the same inventive concept. The technical details not fully described in this embodiment can be referred to the above embodiment, and this embodiment has the same beneficial effects as the above embodiment.

[0084] Through the above description of the implementation methods, the technicians in the relevant field can clearly understand that the present invention can be implemented by means of software and necessary general hardware, and of course can also be implemented by hardware. Based on such an understanding, the technical solution of the present invention is essentially or the part that contributes to the prior art can be embodied in the form of a software product, and the computer software product can be stored in a computer-readable storage medium, such as a computer floppy disk, read-only memory (ReadOnly, Memory, ROM), random access memory (Random Access Memory, RAM), flash memory (FLASH), hard disk or optical disk, etc., including a number of instructions for a computer device (which can be a personal computer, server, or network device, etc.) to perform the methods of various embodiments of the present invention.

[0085] Example 2, reference Figure 3-Figure 5 Based on the previous embodiment, this embodiment combines a specific practical verification technical solution to characterize the vacuum degree effect of the vacuum switch to be tested.

[0086] The pulse laser in this embodiment preferably adopts the Brilliant Eazy Nd:YAG pulse laser produced by Quantel of France (the pulse width of the laser pulse can be compressed to 8ns by Q-switching, and the maximum laser energy is 150mJ), the wavelength is 1064nm, the pulse laser energy is set to 8mJ, and the Q-switch out signal of the pulse laser is used to trigger the spectrometer to collect spectral information.

[0087] The pulsed laser generated by the pulsed laser passes through a dichroic mirror (reflection wavelength: 420-900nm, transmission wavelength: 990-1600nm) and is focused on a preset target material in a vacuum environment to be tested through a first focusing lens with a focal length of 150mm. The preset target material generates laser plasma under the irradiation of the high-energy pulsed laser. The laser plasma beam returns through the first focusing lens and is reflected by the dichroic mirror (transmission wavelength: 420-900nm, reflection wavelength: 990-1600nm), focused by the second focusing lens, and collected by a spectrometer through a low-pass filter (transmittance greater than 90% at a wavelength of 280-1000nm, and transmittance less than 5% at a wavelength of 1000-2000nm).

[0088] In this embodiment, the spectrometer is preferably a three-channel spectrometer of model AVS-DESKTOP-USB2 produced by Avantes. The integration time of the spectrometer for collecting the laser plasma spectrum is set to 10 μs, and the delay time is 1 μs.

[0089] The spectra of the spectral lines Cu I 521.8nm and HI 656.3nm in the laser plasma spectra collected at various vacuum levels in this embodiment are as follows: Figure 3 As shown in the figure, the spectra of Cu I 521.8nm and HI 656.3nm under different gas pressures were collected. -3 When the pressure is between 10Pa and 10Pa, the spectral intensity of the Cu I 521.8nm line decreases with the increase of pressure, while the spectral intensity of the HI 656.3nm line increases with the increase of pressure. 5 Pa, the spectral intensity of the Cu I 521.8 nm and HI 656.3 nm lines increases with the increase of gas pressure. -3 Pa–10 5 Pa.

[0090] The relationship between the spectral intensity ratio Cu / H of the spectral line Cu I 521.8nm and HI 656.3nm and the vacuum degree is as follows Figure 4 As shown in the figure, the spectral intensity ratio Cu / H is obtained based on the spectrum of the spectral line Cu I 521.8nm and HI656.3nm. The spectral intensity ratio Cu / H is 10 -3It decreases monotonically with the increase of air pressure in the air pressure range of Pa-10Pa, which can be used to characterize the vacuum degree and can be used as a calibration curve for vacuum degree measurement.

[0091] Figure 4 The fitting curve in the figure is the calibration curve, where the horizontal axis is the common logarithm of the air pressure value, and the curve formula is:

[0092] y=0.19631×exp(-x / 0.72518)

[0093] Where y is the spectral intensity ratio Cu / H, x is the common logarithm of the pressure value, and the R of the curve fitting is 2 The value is 0.99989, which means that the fitting curve has a high degree of fit. The formula for obtaining the measured air pressure based on the fitting curve is:

[0094]

[0095] Where P is the air pressure measurement result, and y is the spectral intensity ratio Cu / H.

[0096] Figure 5 The experimental measurement results are given. -3 Pa, the measurement result is 1.84×10 3 ±0.553×10 3 Pa, 10 - 2 Pa, the measurement result is 1.63×10 -2 ±0.366×10 -2 Pa, 10 -1 Pa, the measurement result is 1.0779×10 -1 ±0.0214×10 -1 At 1Pa, the measurement result is 0.90555±0.08211Pa, and at 10Pa, the measurement result is 9.88726±0.60599Pa. It can be clearly seen that the characteristic parameters of the laser plasma spectrum of the disclosed solution can characterize the vacuum degree and can be well used for quantitative analysis of the vacuum degree of vacuum switches.

[0097] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present invention may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention, which should all be included in the scope of the claims of the present invention.

Claims

1. A method for quantitatively analyzing the vacuum degree of a vacuum switch, the method being applied to a device for quantitatively analyzing the vacuum degree of a vacuum switch, characterized in that: The method comprises: Obtaining laser plasma spectrum data of a preset target material in a vacuum environment to be tested; Extracting spectral intensity data of characteristic spectral lines according to the spectral data; Obtaining laser plasma spectrum characteristic parameters according to the spectrum intensity data; According to the characteristic parameters of the laser plasma spectrum, the vacuum degree to be measured is obtained by utilizing the preset relationship between the characteristic parameters of the laser plasma spectrum and the vacuum degree.

2. The method for quantitatively analyzing the vacuum degree of a vacuum switch according to claim 1, characterized in that: The process of acquiring the laser plasma spectrum data includes: By sending a high-energy pulse laser to transmit along a first optical path and irradiate a preset target material in a vacuum environment to be tested, the preset target material is induced to generate laser plasma; The laser plasma beam that returns along the first optical path and continues to be transmitted along the second optical path is detected to obtain a laser plasma spectrum to obtain laser plasma spectrum data.

3. The method for quantitatively analyzing the vacuum degree of a vacuum switch according to claim 1 or 2, characterized in that: The relationship between the characteristic parameters of the laser plasma spectrum and the vacuum degree is obtained through the calibration curve.

4. The method for quantitatively analyzing the vacuum degree of a vacuum switch according to claim 3, characterized in that: The calibration curve is obtained by fitting the air pressure and the spectral intensity ratio under known air pressure.

5. The method for quantitatively analyzing the vacuum degree of a vacuum switch according to claim 1 or 4, characterized in that: Also includes: The characteristic spectral lines include: Cu I 510.5nm, Cu I 515.3nm, Cu I 521.8nm, H I656.3nm, OI 777.3nm.

6. A device for quantitatively analyzing the vacuum degree of a vacuum switch according to any one of claims 1 to 5, characterized in that: include: A laser induced plasma unit comprises: a pulse laser (100), a dichroic mirror (200), a first focusing lens (300) and a preset target material (500) arranged in sequence along a first optical path; A laser plasma spectrum detection unit comprises: a second focusing lens (700) arranged along a second optical path, a low-pass filter (800) and a spectrometer (900); A controller (1000), the controller (1000) being connected to the spectrometer (900); An observation window (400) made of quartz glass is arranged between the first focusing lens (300) and the preset target material (500); The preset target material (500) is arranged in the vacuum environment (600) to be tested.

7. A system for quantitatively analyzing the vacuum degree of a vacuum switch according to any one of claims 1 to 5, characterized in that: include: The first acquisition module is used to acquire the laser plasma spectrum data of a preset target material in the vacuum environment to be tested; An extraction module, used for extracting spectral intensity data of characteristic spectral lines according to the spectral data; A second data processing module, used for obtaining laser plasma spectrum characteristic parameters according to the spectrum intensity data; The third data processing module is used to obtain the vacuum degree to be measured according to the laser plasma spectrum characteristic parameters and the relationship between the preset laser plasma spectrum characteristic parameters and the vacuum degree.

8. The vacuum switch vacuum degree quantitative analysis system according to claim 7, characterized in that: The first acquisition module includes: An induction module is used to induce the preset target material to generate laser plasma by sending a high-energy pulse laser along a first optical path and irradiating the preset target material in the vacuum environment to be tested; A detection module, used for detecting the laser plasma light beam that returns along the first light path and continues to be transmitted along the second light path, so as to obtain the laser plasma spectrum; The first data processing module is used to obtain laser plasma spectrum data based on the laser plasma spectrum.

9. An electronic device, comprising: Memory and processor; The memory is used to store computer executable instructions, and the processor is used to execute the computer executable instructions. When the computer executable instructions are executed by the processor, the steps of the vacuum degree quantitative analysis method of the vacuum switch according to any one of claims 1 to 5 are implemented.

10. A computer-readable storage medium storing computer-executable instructions, wherein the computer-executable instructions, when executed by a processor, implement the steps of the method for quantitatively analyzing the vacuum degree of a vacuum switch according to any one of claims 1 to 5.

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