Etching device for TOPCon battery production

Abstract

The invention relates to the technical field of TOPCon battery production, in particular to an etching device for TOPCon battery production, which comprises an etching box, guide rails with hollow middle parts are fixedly connected to two sides of the inner wall of the etching box, a clamping assembly for clamping a TOPCon battery panel is mounted between the two guide rails, a telescopic cylinder for pushing the clamping assembly to lift is mounted in the etching box, and the telescopic cylinder is fixedly connected with the etching box. One side of the etching box is fixedly connected with a treatment barrel with an opening in the top, one side of the etching box is provided with a discharging groove communicated with the treatment barrel, and a waste residue filtering assembly is installed in the treatment barrel; the waste residue filtering assembly comprises a net cylinder rotationally connected with one side of the inner wall of the treatment cylinder, the two sides of the net cylinder are closed, and a rotating pipe with one end movably extending out of the treatment cylinder is arranged on the side, away from the etching box, of the net cylinder. The problems that according to an existing cell panel etching device, waste residues on the surface of a filter screen are difficult to clean, cleaning can be conducted only after etching liquid is completely discharged, and the etching process of a cell panel can be interrupted are solved.

Description

Technical Field

[0001] The invention relates to the technical field of TOPCon battery production, in particular to an etching device for TOPCon battery production. Background Art

[0002] TOPCon currently has four process routes, all of which require etching of the solar panels. During the etching operation, waste liquid will produce waste residue, but the filter is generally installed in the liquid outlet pipe. When blockage occurs, it cannot be quickly removed and cleaned. The etching liquid needs to be completely discharged before it can be removed and cleaned, which greatly affects the efficiency of etching. After searching, the patent with application number CN202022831657.6 discloses an etching device for the production of thin-film solar cells, which filters the waste liquid to prevent the debris in the waste liquid from scaling and clogging the pipe, and protects the etching tank to prevent the etching liquid from splashing during etching.

[0003] Although the above device can filter out the debris in the waste liquid and prevent it from entering the pipeline, the accumulation of debris at the pipeline entrance will affect the discharge of the waste liquid, and the filter is set in the pipeline and is difficult to be quickly removed for cleaning. The internal etching liquid must be drained before the filter can be cleaned, which makes it difficult to clean the filter when it is blocked, and the cleaning process will also interrupt the etching process of the solar panel. Summary of the invention

[0004] In view of the deficiencies in the prior art, the present invention provides an etching device for TOPCon battery production, which solves the problem that the existing battery plate etching device has difficulty in cleaning the waste residue on the surface of the filter screen and needs to discharge all the etching liquid before cleaning, which will interrupt the etching process of the battery plate.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: an etching device for TOPCon battery production, comprising an etching box, wherein both sides of the inner wall of the etching box are fixedly connected with guide rails with a hollow middle portion, a clamping assembly for clamping a TOPCon battery panel is installed between the two guide rails, a telescopic cylinder for pushing the clamping assembly up and down is installed inside the etching box, a processing cylinder with a top opening is fixedly connected to one side of the etching box, a discharge trough connected to the processing cylinder is opened on one side of the etching box, and a waste residue filtering assembly is installed inside the processing cylinder;

[0006] The waste residue filtering assembly includes a mesh cylinder rotatably connected to one side of the inner wall of the processing cylinder, both sides of the mesh cylinder are closed, and a rotating tube with one end movably extending to the outside of the processing cylinder is provided on the side of the mesh cylinder away from the etching box, and a scraper assembly is installed on the inner wall of the processing cylinder for scraping off waste residue on its surface by rubbing against the mesh cylinder when it rotates.

[0007] Preferably, the scraper assembly includes two baffles located in the upper half of the mesh cylinder and two arc blocks for processing the lower half of the mesh cylinder, the baffles and the arc blocks are fixedly connected to the inner wall of the processing cylinder, the top of the arc block is fixedly connected with an inclined block that fits the mesh cylinder, a plurality of leakage grooves are provided on the top of the inclined block, the bottom of the leakage groove is an arc surface, and a channel adjustment assembly for controlling the size of the top channel is installed on the top of the inclined block.

[0008] Preferably, the channel adjustment assembly includes a slide plate slidably connected to the top of the tilting block, a notch with the same width as the leakage groove is provided on the top of the slide plate, a lever with one end movably extending to the outside of the processing cylinder is provided on the side of the slide plate away from the etching box, and the side of the top of the tilting block away from the mesh cylinder is an arc surface.

[0009] Preferably, the clamping assembly includes a slider sleeved on the outside of the guide rail, a clamping frame is rotatably connected between the two sliders, a motor for driving the clamping frame to rotate is fixedly connected to one side of one of the sliders, and the clamping frame is a frame structure on both sides and is connected by bolts.

[0010] Preferably, a liquid storage tank is fixedly connected to one side of the etching box, and the liquid storage tank is connected to the etching box through a pipeline.

[0011] Preferably, a rotary joint is sleeved on one end of the rotating tube away from the processing tube, and a discharge pipe with one end extending to the outside is arranged inside the rotary joint.

[0012] Compared with the prior art, the present invention provides an etching device for TOPCon battery production, which has the following beneficial effects:

[0013] 1. By setting up the waste residue filtering component, the waste residue on the surface of the filter can be cleaned without draining the etching liquid, which reduces the difficulty of cleaning the waste residue attached to the surface of the filter, and the process of cleaning the waste residue will not interrupt the etching process of the solar panel.

[0014] 2. The scraper assembly can not only scrape the waste residue attached to the surface of the mesh cylinder more cleanly in two stages, avoiding the situation that a large amount of waste residue easily blocks the gap between the scraper and the mesh cylinder when a single scraper is scraped, causing the mesh cylinder to be stuck and unable to rotate, but also store the waste residue in different positions to prevent all the scraped waste residue from settling at the bottom of the treatment cylinder and then gradually increasing in height to hinder the rotation of the mesh cylinder.

[0015] 3. By setting up the clamping assembly, both sides of the solar panel are fixed during the etching process, which improves the firmness of the fixation of the solar panel. Compared with the existing clamping structure that is fixed and rotated at one end, it can prevent the clamping frame and the solar panel from bending and deforming under the action of gravity, thereby affecting the solar panel.

[0016] 4. Through the channel adjustment component, the amount of waste residue scraped on the surface of the mesh cylinder by the inclined block and the baffle can be flexibly adjusted according to needs to prevent excessive waste residue scraped from a certain place, causing the waste residue to block the scraper component and the mesh cylinder, causing the mesh cylinder to be stuck and unable to rotate. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:

[0018] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0019] Figure 2 It is a cross-sectional schematic diagram of the present invention as a whole;

[0020] Figure 3 It is a structural schematic diagram of the treatment cylinder of the present invention;

[0021] Figure 4 is an internal cutaway view of the treatment tube of the present invention;

[0022] Figure 5 It is a partial cutaway view of the treatment cylinder and the scraper assembly of the present invention;

[0023] Figure 6 It is a schematic diagram of the structure of the arc block, the tilting block and the channel adjustment assembly of the present invention.

[0024] In the figure: 1. etching box; 2. guide rail; 3. clamping assembly; 31. slider; 32. clamping frame; 33. motor; 4. telescopic cylinder; 5. processing cylinder; 6. waste residue filtering assembly; 61. mesh cylinder; 62. rotating tube; 63. scraper assembly; 631. baffle; 632. arc block; 633. tilting block; 634. channel adjustment assembly; 6341. slide plate; 6342. lever; 7. liquid storage tank; 8. rotary joint; 9. discharge pipe. DETAILED DESCRIPTION

[0025] The following will describe the implementation methods of the present application in detail with the help of accompanying drawings and examples, so that the implementation process of how the present application uses technical means to solve technical problems and achieve technical effects can be fully understood and implemented accordingly.

[0026] Embodiment 1

[0027] In order to facilitate the cleaning of the waste residue produced during the etching process of the solar panels attached to the filter screen, Figure 1-Figure 5As one embodiment of the present invention, an etching device for TOPCon battery production is proposed, including an etching box 1, both sides of the inner wall of the etching box 1 are fixedly connected with guide rails 2 with a hollow middle portion, a clamping assembly 3 for clamping a TOPCon battery panel is installed between the two guide rails 2, a telescopic cylinder 4 for pushing the clamping assembly 3 to rise and fall is installed inside the etching box 1, a treatment barrel 5 with a top opening is fixedly connected to one side of the etching box 1, a discharge trough connected to the treatment barrel 5 is opened on one side of the etching box 1, and a waste residue filtering assembly 6 is installed inside the treatment barrel 5. When in use, the TOPCon battery panel is fixed by the clamping assembly 3, and then the telescopic cylinder 4 drives the battery panel to descend into the etching liquid inside the etching box 1 for etching. When both sides of the TOPCon solar panel are etched, the TOPCon solar panel is removed from the clamping assembly 3, and then the TOPCon solar panel to be etched is reinstalled on the clamping assembly 3, and the above etching process is repeated. The etching waste liquid is discharged from the etching box 1 into the processing cylinder 5, and then discharged after passing through the waste residue filtering assembly 6, and the waste residue in the etching waste liquid is blocked by the waste residue filtering assembly 6. The waste residue filtering assembly 6 cleans and removes the waste residue attached to its surface during the process of filtering the waste residue. The waste residue on the surface of the filter net can be cleaned without draining the etching liquid, which reduces the difficulty of cleaning the waste residue attached to the surface of the filter net, and the process of cleaning the waste residue will not interrupt the etching process of the solar panel.

[0028] In order to complete the purpose of cleaning the waste residue attached to the surface of the filter, refer to Figure 2 and Figure 3The waste residue filtering assembly 6 includes a mesh tube 61 rotatably connected to one side of the inner wall of the processing cylinder 5, both sides of the mesh tube 61 are closed, and a rotating tube 62 with one end movably extending to the outside of the processing cylinder 5 is provided on the side of the mesh tube 61 away from the etching box 1. The inner wall of the processing cylinder 5 is installed with a scraper assembly 63 for scraping off the waste residue on its surface by friction with the mesh tube 61 when it rotates. When in use, the etching liquid in the etching box 1 enters the processing cylinder 5 through the discharge trough, and then passes through the mesh holes on the mesh tube 61 for filtering. The waste liquid therein is discharged through the rotating tube 62, while the impurities are blocked by the mesh tube 61 and attached to the outside of the mesh tube 61. When it is necessary to clean the impurities, the staff manually drives the rotating tube 62 to rotate, thereby driving the mesh tube 61 to rotate. The mesh tube 61 rubs against the scraper assembly 63, and the waste residue on the surface of the mesh tube 61 is rubbed off by the scraper assembly 63 and falls to the bottom of the processing tube 5. There is a gap between the side of the mesh tube 61 away from the etching box 1 and the inner wall of the processing tube 5. After a period of time, the staff can use tools to reach into the bottom of the processing tube 5 from the top of the processing tube 5 through the gap to clean the waste residue settled at the bottom of the processing tube 5, thus completing the cleaning process of the waste residue attached to the surface of the mesh tube 61. It only needs to drive the rotating tube 62 to rotate to clean the waste residue attached to the surface of the mesh tube 61, prevent the waste residue from clogging the mesh tube 61, and enable the etching liquid to be continuously discharged. The etching liquid does not need to be completely discharged, which can avoid interrupting the etching of the battery panel during the cleaning of the waste residue.

[0029] In order to improve the effect of scraping off the waste residue on the surface of the mesh cylinder 61, refer to Figure 4 and Figure 5 The scraper assembly 63 includes two baffles 631 located in the upper half of the mesh cylinder 61 and two arc blocks 632 for processing the lower half of the mesh cylinder 61. The baffles 631 and the arc blocks 632 are fixedly connected to the inner wall of the processing cylinder 5. The top of the arc block 632 is fixedly connected with an inclined block 633 that fits the mesh cylinder 61. A plurality of leakage grooves are provided on the top of the inclined block 633. The bottom of the leakage groove is an arc surface. A channel adjustment assembly 634 for controlling the size of the top channel is installed on the top of the inclined block 633. When in use, the scraper is divided into two parts: the baffle 631 and the inclined block 633. In this way, the process of scraping off the waste residue on the surface of the mesh cylinder 61 can be divided into a first stage at the inclined block 633 and a second stage at the baffle 631.

[0030] In the first stage, since the inclined block 633 is provided with a leakage groove, only the waste residue in the outer area of ​​the mesh cylinder 61 can be scraped off, while the waste residue in the leakage groove cannot be scraped off. This part of the waste residue rotates with the mesh cylinder 61 to the baffle 631 and is scraped off by the baffle 631. The positions of the waste residue scraped off in these two stages are also different. The waste residue scraped off by the inclined block 633 in the first stage falls to the bottom of the processing cylinder 5, while the waste residue scraped off by the baffle 631 in the second stage falls onto the arc block 632. Not only can the waste residue attached to the surface of the mesh cylinder 61 be scraped off more cleanly in two stages to avoid the situation where a large amount of waste residue is easily blocked in the gap between the scraper and the mesh cylinder 61 when a single scraper is scraped, causing the mesh cylinder 61 to be stuck and unable to rotate, but the waste residue can also be stored in different positions to prevent all the scraped waste residue from settling at the bottom of the processing cylinder 5 and then gradually increasing in height to hinder the rotation of the mesh cylinder 61.

[0031] Compared with fixing the baffle 631 directly on the net cylinder 61, when cleaning, the net cylinder 61 is rotated to the top opening of the processing cylinder 5 for cleaning. There is a problem that it is difficult to process the layer of waste residue attached to the inner wall of the groove. It is easy to leave some waste residue on the surface of the net cylinder 61 after cleaning. In this way, the waste residue remaining on the net cylinder 61 after cleaning still blocks the net cylinder 61, or falls to the bottom of the processing cylinder 5, so that the staff needs to clean the waste residue at the opening of the processing cylinder 5 and the bottom, resulting in a large cleaning workload and an incomplete cleaning. In the embodiment, the baffle 631 is fixed to the inner wall of the processing tube 5, so that the scraper can be used to scrape off the waste residue on the surface of the mesh tube 61, and the rotation process of the mesh tube 61 is used to impact the waste residue on its surface with the waste liquid inside the processing tube 5, so that all the waste residue on the surface of the mesh tube 61 is removed into the processing tube 5. When cleaning the waste residue, you only need to shovel the waste residue on the arc block 632 to the bottom of the processing tube 5, and then clean the waste residue at the bottom of the processing tube 5, so that the waste residue attached to the surface of the mesh tube 61 can be cleaned more thoroughly, and the difficulty of cleaning the waste residue on the mesh tube 61 is also reduced.

[0032] In order to improve the firmness of the TOPCon panel clamping, refer to Figure 1The clamping assembly 3 includes a slider 31 sleeved on the outside of the guide rail 2, and a clamping frame 32 is rotatably connected between the two sliders 31, and one side of one slider 31 is fixedly connected to a motor 33 that drives the clamping frame 32 to rotate. When in use, the battery panel is clamped by the clamping frame 32, and the slider 31 is driven down by the telescopic cylinder 4, thereby driving one side of the battery panel to be immersed in the etching liquid in the etching box 1 for etching. When the next side needs to be etched, the telescopic cylinder 4 rises and drives the slider 31 to rise. After rising, the motor 33 works to drive the clamping frame 32 to flip, and then repeats the above process to make the clamping frame 32 descend, and then the other side is etched. During the etching process, both sides of the battery panel are fixed, which improves the firmness of the battery panel. Compared with the existing clamping structure that is fixed and rotated by one end, it can prevent the clamping frame 32 and the battery panel from bending and deforming under the action of gravity, thereby affecting the battery panel.

[0033] In order to facilitate the continuous delivery of etching liquid into the etching box 1, refer to Figure 1 A liquid storage tank 7 is fixedly connected to one side of the etching box 1. The liquid storage tank 7 is connected to the etching box 1 through a pipeline. When in use, the etching liquid is stored in the liquid storage tank 7, and the etching liquid in the liquid storage tank 7 is continuously transported to the etching box 1 through the pipeline. After the etching concentration of the etching liquid in the etching box 1 is reduced after etching the battery plate, it is discharged through the processing cylinder 5 to maintain the concentration of the etching liquid in the etching box 1.

[0034] In order to facilitate the discharge of etching waste liquid to the designated location, refer to Figure 1 A rotating joint 8 is sleeved on one end of the rotating tube 62 away from the processing tube 5, and a discharge pipe 9 with one end extending to the outside is arranged inside the rotating joint 8. When in use, the rotating tube 62 is connected using the rotating joint 8, and then the discharge pipe 9 is connected using the rotating joint 8, so that the end of the discharge pipe 9 away from the processing tube 5 extends to the designated position, so as to facilitate the discharge of the etching waste liquid to the designated position.

[0035] Embodiment 2

[0036] Since the scraper assembly 63 scrapes the waste residue attached to the surface of the net cylinder 61 in two stages, the stage where the scraping amount of waste residue is large is likely to cause the waste residue to block the gap between the scraper assembly 63 and the net cylinder 61, causing the net cylinder 61 to be stuck. In order to reasonably allocate the proportion of the amount of waste residue scraped by the scraper assembly 63 on the surface of the net cylinder 61 in the two stages and reduce the possibility of the net cylinder 61 being blocked by waste residue, refer to Figure 1-Figure 6On the basis of the first embodiment, the channel adjustment component 634 includes a slide plate 6341 which is slidably connected to the top of the tilting block 633. A notch with the same width as the leakage groove is provided on the top of the slide plate 6341. A lever 6342 with one end movably extending to the outside of the processing tube 5 is provided on the side of the slide plate 6341 away from the etching box 1. The side of the top of the tilting block 633 away from the mesh tube 61 is an arc surface. When in use, the staff can pull the lever 6342 along the axial direction of the processing tube 5 to make the slide plate 6341 slide along the tilting block 633. When the notch on the slide plate 6341 is opposite to the leakage groove on the tilting block 633, at this time, the area of ​​the mesh tube 61 scraped by the tilting block 633 and the slide plate 6341 in the first stage is the smallest, and the waste residue moved to the second stage after the first stage is the largest.

[0037] Continue to pull the lever 6342. When the notch on the slide plate 6341 is completely moved between the two leakage grooves of the tilting block 633, the area of ​​the scraping of the mesh cylinder 61 by the tilting block 633 and the slide plate 6341 in the first stage is the largest. All the waste residues on the mesh cylinder 61 are scraped off by the tilting block 633 in the first stage, while the baffle plate 631 does not scrape off the waste residues on the surface of the mesh cylinder 61 in the second stage. In this way, the amount of waste residues scraped off by the tilting block 633 and the baffle plate 631 on the surface of the mesh cylinder 61 can be flexibly adjusted according to needs to prevent excessive scraping of waste residues at a certain place from causing waste residues to block the scraper assembly 63 and the mesh cylinder 61, causing the mesh cylinder 61 to be stuck and unable to rotate.

[0038] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An etching device for TOPCon battery production, comprising an etching box (1), characterized in that: Guide rails (2) with hollowed-out middle portions are fixedly connected to both sides of the inner wall of the etching box (1); a clamping assembly (3) for clamping a TOPCon solar panel is installed between the two guide rails (2); a telescopic cylinder (4) for lifting and lowering the clamping assembly (3) is installed inside the etching box (1); a treatment cylinder (5) with an opening at the top is fixedly connected to one side of the etching box (1); a discharge trough in communication with the treatment cylinder (5) is provided on one side of the etching box (1); a waste residue filtering assembly (6) is installed inside the treatment cylinder (5); The waste residue filtering assembly (6) comprises a mesh cylinder (61) rotatably connected to one side of the inner wall of the processing cylinder (5), both sides of the mesh cylinder (61) are closed, and a rotating tube (62) with one end movably extending to the outside of the processing cylinder (5) is provided on the side of the mesh cylinder (61) away from the etching box (1), and a scraper assembly (63) is installed on the inner wall of the processing cylinder (5) for scraping off waste residue on the surface of the mesh cylinder (61) by friction with the mesh cylinder (61) when the mesh cylinder (61) rotates.

2. The etching device for TOPCon battery production according to claim 1, characterized in that: The scraper assembly (63) comprises two baffles (631) located in the upper half of the mesh cylinder (61) and two arc blocks (632) located in the lower half of the mesh cylinder (61); the baffles (631) and the arc blocks (632) are both fixedly connected to the inner wall of the processing cylinder (5); the top of the arc block (632) is fixedly connected to a tilting block (633) that fits the mesh cylinder (61); a plurality of material leakage grooves are provided on the top of the tilting block (633); the bottom of the material leakage grooves is an arc surface; and a channel adjustment assembly (634) for controlling the size of the top channel of the tilting block (633) is installed on the top of the tilting block (633).

3. The etching device for TOPCon battery production according to claim 2, characterized in that: The channel adjustment component (634) comprises a slide plate (6341) slidably connected to the top of the tilting block (633); a notch having the same width as the leakage groove is provided at the top of the slide plate (6341); a lever (6342) having one end movably extending to the outside of the processing cylinder (5) is provided on the side of the slide plate (6341) away from the etching box (1); and a side of the top of the tilting block (633) away from the mesh cylinder (61) is an arc surface.

4. The etching device for TOPCon battery production according to claim 1, characterized in that: The clamping assembly (3) comprises a slider (31) sleeved on the outside of the guide rail (2), a clamping frame (32) is rotatably connected between the two sliders (31), and a motor (33) for driving the clamping frame (32) to rotate is fixedly connected to one side of one of the sliders (31).

5. The etching device for TOPCon battery production according to claim 1, characterized in that: A liquid storage tank (7) is fixedly connected to one side of the etching box (1), and the liquid storage tank (7) and the etching box (1) are connected via a pipeline.

6. The etching device for TOPCon battery production according to claim 1, characterized in that: A rotating joint (8) is sleeved on one end of the rotating tube (62) away from the processing tube (5), and a discharge pipe (9) with one end extending to the outside thereof is arranged inside the rotating joint (8).

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