Substrate support assembly for substrate processing apparatus

Abstract

The present invention relates to a substrate support assembly for a substrate processing apparatus, comprising: a chuck base disposed so as to face a substrate when the substrate is disposed, the chuck base being capable of rotating about a rotation center axis; a chuck pin protruding from the upper part of the chuck base and used for holding or separating the substrate; the mechanism part is linked with the chuck pin; and a driving part for driving the mechanism part, the mechanism part including: a first operating part including a push rod cam capable of being lifted and restored in the direction of the rotation center axis by the driving part; a second operating part which is annular and is capable of reciprocating rotation around a rotation center shaft by being linked with the lifting movement of the push rod cam; and a first restoring unit that connects the chuck base and the second operation unit to restore the second operation unit, the chuck pin being capable of reciprocating rotation in situ in conjunction with the reciprocating rotation of the second operation unit, whereby the operation can be made very reliable and stable by implementing a gripping and releasing function of the chuck pin to the substrate.

Description

Technical Field

[0001] The present invention relates to a substrate support assembly for a substrate processing apparatus, and more particularly to a substrate support assembly that rotates while supporting a substrate in order to perform a semiconductor manufacturing process such as cleaning. Background Art

[0002] The substrate processing apparatus refers to an apparatus that uses a processing liquid to perform vapor deposition, development, etching or cleaning on substrates such as semiconductor wafers, display substrates, optical disk substrates, magnetic disk substrates, photomask substrates, ceramic substrates, and solar cell substrates.

[0003] The cleaning process is used to remove foreign matter or particles present on the substrate, and typically refers to a process of supplying a processing liquid to the surface or back side of the substrate while rotating the substrate at high speed while being supported by a chuck base (spinning head).

[0004] In the rotary cleaning device, when the chuck base rotates, in order to prevent the substrate from being disengaged along the side direction of the chuck base, a plurality of chuck pins need to be provided along the circumferential direction at the upper end of the chuck base.

[0005] Typically, the substrate processing device is provided with a mechanism for driving the chuck pins and a driving portion for driving the mechanism, so that when the substrate rotates, the substrate is gripped by the chuck pins, and when the substrate is initially set or transported to the chuck base, the substrate is maintained in a state of being separated from the chuck pins.

[0006] That is, the chuck pin has a structure that moves or rotates between a holding position where the substrate is held by the spin head and a release position where the substrate is separated from the substrate.

[0007] The chuck base, chuck pin, mechanism part and driving part constitute a substrate supporting device of the substrate processing device.

[0008] Prior art literature

[0009] Patent Literature

[0010] Patent Document 1: Korean Patent Publication No. 10-2023-0029170 (March 3, 2023) Summary of the invention

[0011] An object of the present invention is to provide a substrate supporting assembly for a substrate processing apparatus that allows a chuck pin for gripping and releasing a substrate to rotate stably and has excellent durability.

[0012] In order to achieve the above-mentioned purpose, the substrate support assembly for the substrate processing device of the present invention includes: a chuck base, which is arranged opposite to the above-mentioned substrate when the substrate is set, and can rotate around the rotation center axis; a chuck pin, which is protrudingly arranged on the upper part of the above-mentioned chuck base and is used to hold or separate the above-mentioned substrate; a mechanism part, which is used to link the above-mentioned chuck pin; and a driving part, which is used to drive the above-mentioned mechanism part, and the above-mentioned mechanism part includes: a first working part, including a push rod cam that can be lifted and restored along the direction of the above-mentioned rotation center axis by the above-mentioned driving part; a second working part, which can reciprocate around the rotation center axis due to the linkage with the lifting and lowering movement of the above-mentioned push rod cam; and a first restoration unit, which connects the chuck base with the second working part so as to be able to restore the above-mentioned second working part, and the above-mentioned chuck pin can reciprocate in place due to the linkage with the reciprocating rotation of the above-mentioned second working part.

[0013] The mechanism portion includes a guide roller which can rotate with one side thereof facing the outer peripheral surface of the second working portion. An inclined cam guide surface is formed at the upper end of the push rod cam and contacts the outer peripheral surface of the guide roller.

[0014] A rack gear portion is formed on an inner peripheral surface of the second operation portion, and a pinion gear portion meshing with the rack gear portion is formed on an outer peripheral surface of the chuck pin.

[0015] The second working portion is annular, the rack and gear portion is formed on a stopper, and the stopper is formed to protrude from the annular portion along the outer side.

[0016] The mechanism portion includes a moving roller that can rotate with one side thereof facing the outer peripheral surface of the second operating portion, and can move in contact with the chuck base while protruding from the upper end of the second operating portion.

[0017] The above-mentioned first working part includes: a pair of guide rods, which are extended up and down on the above-mentioned chuck base and are arranged to be spaced apart from each other along the peripheral direction of the rotation center axis; the above-mentioned push rod cam can move up and down through the above-mentioned pair of guide rods, and an inclined cam guide surface is formed on the upper surface, and the above-mentioned inclined cam guide surface is gradually raised along the restoration direction of the second working part through the above-mentioned first restoration unit; and a second restoration unit, which is extended along the above-mentioned guide rod and is located between the above-mentioned chuck base and the push rod cam.

[0018] The chuck base comprises: a chuck support portion in the form of a plate extending in a horizontal direction; and a receiving portion formed along the outer periphery of the chuck support portion for receiving the mechanism portion, with a chuck pin provided on the upper surface.

[0019] The present invention with the above structure has the following effect, namely, if the driving part pushes the push rod cam to move it to the upper side, the inclined cam guide surface formed at the upper end of the push rod cam applies an upward load to the guide roller, and as the guide roller that limits the upward movement moves along the above-mentioned inclined cam guide surface, the second working part rotates around the rotation center axis, and the chuck pin rotates in place due to the rotational movement of the linked second working part, thereby making the work very reliable and stable by realizing the gripping and releasing functions of the chuck pin on the substrate.

[0020] Furthermore, as the push rod cam moves linearly, the rotation of the chuck pin can be realized by interlocking the rotation of the rack gear portion and the pinion portion, so there is an advantage of excellent structural durability.

[0021] Furthermore, in the present invention, the mechanism portion includes a movable roller which can rotate in a state where one side surface is facing the outer peripheral surface of the second working portion, and in a state where the movable roller protrudes from the upper end of the second working portion, the movable roller can move due to contact with the chuck base. Since the outer peripheral surface of the movable roller protrudes from the second working portion and first contacts the surface of the chuck base to move, frictional resistance can be avoided.

[0022] Furthermore, in the present invention, since the second working part is annular, the rack gear part is formed on the stopper, and the stopper is formed by protruding from the annular part along the outer side, the second working part centered on the rotation center axis naturally forms a rotation restriction.

[0023] Furthermore, in the present invention, since the mechanism portion is accommodated in the accommodation portion disposed on the outer periphery of the chuck support portion, the space utilization around the rotation center axis can be improved by realizing a single-layer compact structure. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a side cross-sectional structural view showing a substrate processing apparatus of the present invention.

[0025] Figure 2 It is a partial perspective view showing the mechanism portion of the chuck pin in the substrate processing apparatus of the present invention.

[0026] Figure 3 To show from Figure 2 A side cross-sectional view of the coupling structure of the first working part observed from the C direction.

[0027] Figure 4 To show from Figure 2 A transverse cross-sectional view of the combined structure of the mechanism part, the driving part and the chuck base observed in the AA section direction.

[0028] Figure 5 To show from Figure 2A transverse cross-sectional view of the combined structure of the mechanism portion and the chuck base observed in the BB cross-sectional direction.

[0029] Figure 6 It is a partial bottom cross-sectional view showing the coupling structure between the mechanism portion of the chuck pin and the chuck base in the substrate processing apparatus of the present invention.

[0030] Figure 7 It is a plan cross-sectional view showing an example of linkage between the second operation portion and the chuck pin in the substrate processing apparatus of the present invention.

[0031] Figure 8 The present invention is a side cross-sectional view showing an example of use of the substrate processing apparatus of the present invention to fix or release a substrate using a chuck pin. DETAILED DESCRIPTION

[0032] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0033] like Figure 1 As shown, the substrate processing apparatus 1000 of the present invention includes a fluid supply unit 10 , a bowl assembly 20 and a substrate supporting device S.

[0034] The fluid supply unit 10 is used to supply the substrate W with a processing fluid required for substrate processing.

[0035] Furthermore, during the process, the substrate support device S performs a function of rotating while supporting the substrate W.

[0036] The bowl-shaped assembly 20 serves as a structural element for guiding discharge, which can prevent the chemical liquid used in the process and the fume generated during the process from splashing or flowing out. Since it has a stacked structure, different chemical liquids and fumes can flow in differently according to their relative heights relative to the substrate.

[0037] like Figures 1 to 4 As shown, the substrate supporting device S includes: a chuck base 100, which is arranged opposite to the substrate W when the substrate W is set, and can rotate around the rotation center axis A; a chuck pin 200, which is protrudingly arranged on the upper part of the chuck base 100 and is used to hold or separate the substrate W; a mechanism part 300, which is used to link the chuck pin 200; and a driving part 400, which is used to drive the mechanism part 300.

[0038] Typically, the chuck base 100 is further provided with support pins 800 to further support the substrate W to prevent the substrate W from sagging or other deformation.

[0039] The chuck pin 200 includes a chuck pin body 210 and a substrate holding piece 220 disposed on an upper end of the chuck pin body 210 .

[0040] like Figure 2 , Figure 7 and Figure 8 As shown, if observed from a top view, the above-mentioned substrate holding piece 220 deviates from the center of the chuck pin body 210. When the chuck pin body 210 rotates, the substrate holding piece 220 approaches the substrate W and holds the substrate W. When the substrate holding piece 220 detaches from the substrate W as it further rotates along one side, the substrate W will be separated.

[0041] The substrate holding piece 220 may be formed with a mounting groove into which the outer peripheral surface of the substrate W is inserted.

[0042] The above-mentioned mechanism part 300 includes: a first working part 310, including a push rod cam 311 that can be lifted and restored along the direction of the above-mentioned rotation center axis A through the above-mentioned driving part 400; a second working part 320, which can reciprocate around the rotation center axis A due to the lifting and lowering movement of the above-mentioned push rod cam 311; and a first restoration unit 340, which connects the chuck base 100 with the second working part 320 so as to be able to restore the above-mentioned second working part 320.

[0043] As the chuck pins 200 linked to the second operating part 320 rotate in place due to the rotation of the second operating part 320 , the substrate W may be separated from the chuck pins 200 .

[0044] In particular, the mechanism portion 300 may include a guide roller 330 that can rotate with one side thereof facing the outer peripheral surface of the second working portion 320 , and an inclined cam guide surface 311 a may be formed at the upper end of the push rod cam 311 , contacting the outer peripheral surface of the guide roller 330 .

[0045] like Figure 3 and Figure 4 As shown, based on the above structure, if the driving part 400 pushes the push rod cam 311 to move to the upper side, the inclined cam guide surface 311a formed at the upper end of the push rod cam 311 applies an upward load to the guide roller 330, and as the guide roller 330 that limits the upward movement moves along the inclined cam guide surface 311a, finally, the second working part 320 connected to the guide roller 330 rotates around the rotation center axis A.

[0046] In this case, if Figure 3 As shown, the mechanism part 300 includes a movable roller 390, which can rotate with one side thereof facing the outer peripheral surface of the second working part 320, and can contact and move with the chuck base 200 while protruding from the upper end of the second working part 320.

[0047] That is, the outer peripheral surface of the moving roller 390 protrudes from the second operating portion 320 and first contacts the surface of the chuck base 200 to move, thereby avoiding generation of friction resistance.

[0048] like Figure 2 and Figure 7 As shown, a rack gear portion 321 is formed on the inner circumferential surface of the second working portion 320, and a pinion gear portion 230 meshing with the rack gear portion 321 is formed on the outer circumferential surface of the chuck pin 200. When the second working portion 320 rotates horizontally reciprocatingly around the rotation center axis A, the chuck pin 200 can rotate reciprocatingly in situ.

[0049] This has the advantage that the chuck pins 200 can hold and release the substrate W very stably and reliably.

[0050] Furthermore, the connection operation can be realized by the linear movement of the push rod cam 311 and the rotation linkage of the rack gear part 321 and the pinion part 230, so there is an advantage of excellent durability.

[0051] like Figure 3 As shown, the first working part 310 may include: a pair of guide rods 312 extending up and down on the chuck base 100 and spaced apart from each other along the peripheral direction of the rotation center axis A; the push rod cam 311 capable of moving up and down through the pair of guide rods 312, and having an inclined cam guide surface 311a formed on the upper surface, and the inclined cam guide surface 311a is gradually raised along the restoration direction of the second working part 320 through the first restoration unit 340; and a second restoration unit 313 extending along the guide rod 312 and located between the chuck base 100 and the push rod cam 311.

[0052] The first working part 310 is formed in plurality along the circumference of the second working part 320 , and may be one or more than two.

[0053] When a plurality of the first working parts 310 are provided, if they are arranged at equal intervals, the second working parts 320 can achieve more stable rotation.

[0054] The inclined cam guide surface 311 a may be a linear inclined surface or a smooth curved surface.

[0055] That is, the shape may be deformed in various ways as long as the guide roller 330 can move naturally and smoothly.

[0056] When viewed from a top view, although the push rod cam 311 is extended to form an arc shape that is conducive to guiding the guide roller 330, its shape is not limited thereto.

[0057] In the drawings, the second restoring unit 313 is a compression spring, but various known springs such as leaf springs may also be used.

[0058] like Figure 2 As shown, the second working part 320 is annular, and the rack gear part 321 is formed on the stopping part 322. The stopping part 322 is formed by protruding from the annular part along the outer side, and is stopped on the chuck pin 200 after rotating to a certain extent, preferably, limiting the movement of the second working part 320 around the rotation center axis A.

[0059] However, the second working portion 320 does not necessarily have to be formed in a circular shape. Only a portion such as the rack gear portion 321 may be circular, and the remaining portion may be in other shapes.

[0060] When the second working portion 320 is circular, the stopper 322 is formed to protrude outwardly along the changing direction.

[0061] Furthermore, the second working portion 320 is preferably in a ring shape, but a part thereof may be separated, or the separated parts may be connected via a suitable connecting portion.

[0062] like Figure 7 As shown, preferably, the bottom surface of the stopper 322 formed with the rack gear portion 321 is formed into an arc shape with the rotation center axis A as the center, and when the moving distance is short, it can also be formed into an appropriate curved shape or a straight line shape.

[0063] like Figure 6 As shown, the first restoring unit 340 is located between the chuck base 100 and the second working part 320. Under normal conditions, a restoring force is applied to the second working part 320 from the position of holding the substrate W. As the driving part 400 works, when the second working part 320 receives the restoring force through the mechanism part 300 and moves, the substrate W can be separated.

[0064] The first restoration unit 340 is disposed in plurality along the circumference of the second working part 320 , and may be one or more than two.

[0065] When a plurality of first restoring units 340 are provided, if they are arranged at equal intervals, the restoring movement of the second working part 320 will not be affected.

[0066] When viewed from a top view, the first restoring unit 340 is a tension spring extending along the outer circumference of the second working portion 320 (not necessarily parallel), but various known springs may be applied according to configuration structures such as leaf springs or compression springs.

[0067] In the drawings, the first restoration units 340 are disposed one by one between adjacent first working parts 310 , but the arrangement is not limited to this, and the number of the first restoration units 340 does not necessarily have to be plural.

[0068] like Figure 3 and Figure 4 As shown, the driving part 400 may include: a push rod pin 410 contacting the push rod cam 311 of the mechanism part 300; and a driving unit 420 connected to the push rod pin 410.

[0069] As the driving unit 420, various known units such as a pressure cylinder and a link type punch can be used.

[0070] The driving unit 400 may be fixedly mounted on a fixed frame (not shown) outside the chuck base 100 .

[0071] On the other hand, the chuck base 100 may include: a chuck support portion 110, which is generally in the shape of a plate extending in the horizontal direction; and a receiving portion 120, which is formed along the outer periphery of the chuck support portion 110 and has a receiving space 121 for receiving the mechanism portion 300, and a chuck pin is provided on the upper surface.

[0072] The chuck support portion 110 may be in the shape of a disk, but it does not need to be a perfect disk, and a groove or a convex portion may be formed on the outer peripheral surface.

[0073] Furthermore, it is not necessary to have a predetermined thickness, and portions with different thicknesses may be formed by concave grooves or convex portions.

[0074] As described above, since the mechanism part 300 is accommodated in the accommodation part 120 disposed at the outer periphery of the chuck support part 110 , the space utilization around the rotation center axis A can be improved by realizing a single-layer compact structure.

[0075] like Figure 5 As shown, a plurality of rotating guide rollers 125 may be disposed inside the receiving portion 120 to guide the rotational movement of the outer circumferential surface of the second working portion 320 relative to the rotation center axis A.

[0076] And, if Figure 4 and Figure 5 As shown, a support sheet 190 may be disposed inside the receiving portion 120 to support the bottom of the second working portion 320 .

[0077] The support piece 190 does not need to be formed continuously along the circumferential direction around the rotation center axis A, and may be disposed intermittently with intervals therebetween.

[0078] It should be understood that the embodiments of the present invention are merely examples, and a person skilled in the art can implement various modifications and other equivalent embodiments within the scope of protection claimed by the invention.

Claims

1. A substrate support assembly for a substrate processing device, characterized in that: include: The chuck base is arranged opposite to the substrate when the substrate is set, and can rotate around the rotation center axis; A chuck pin, protrudingly disposed on the upper portion of the chuck base, for holding or separating the substrate; A mechanism part, used for linking the above-mentioned chuck pin; and A driving unit, used to drive the above-mentioned mechanism unit, The above mentioned institutions include: The first working part includes a push rod cam that can be lifted and lowered and restored along the direction of the rotation center axis by the driving part; The second working part is capable of reciprocating rotation around the rotation center axis due to linkage with the lifting and lowering movement of the push rod cam; and The first restoring unit connects the chuck base to the second working part so as to restore the second working part. The chuck pin is able to reciprocate and rotate in place in conjunction with the reciprocating rotation of the second working portion.

2. The substrate supporting assembly for a substrate processing apparatus according to claim 1, wherein: The mechanism portion includes a guide roller, and the guide roller is rotatable in a state where one side of the guide roller faces the outer peripheral surface of the second working portion. An inclined cam guide surface is formed at the upper end of the push rod cam and contacts the outer peripheral surface of the guide roller.

3. The substrate support assembly for a substrate processing apparatus according to claim 1 or 2, characterized in that: A rack and pinion portion is formed on the inner circumferential surface of the second working portion. A pinion gear portion meshing with the rack gear portion is formed on an outer peripheral surface of the chuck pin.

4. The substrate supporting assembly for a substrate processing apparatus according to claim 3, wherein: The second working portion is annular, the rack gear portion is formed on the stopper portion, and the stopper portion is formed to protrude from the annular portion along the outer side.

5. The substrate supporting assembly for a substrate processing apparatus according to claim 2, wherein: The mechanism portion includes a moving roller that can rotate with one side thereof facing the outer peripheral surface of the second operating portion, and can move in contact with the chuck base while protruding from the upper end of the second operating portion.

6. The substrate supporting assembly for a substrate processing apparatus according to claim 2, wherein: The first working part includes: A pair of guide rods extending up and down and arranged on the chuck base and spaced from each other along the peripheral direction of the rotation center axis; The push rod cam can be moved up and down by the pair of guide rods, and an inclined cam guide surface is formed on the upper surface, and the inclined cam guide surface is gradually raised along the restoration direction of the second working part by the first restoration unit; and The second restoring unit is extended along the guide rod and is disposed between the chuck base and the push rod cam.

7. The substrate supporting assembly for a substrate processing apparatus according to claim 1 or 2, characterized in that: The above-mentioned chuck base comprises: The chuck support portion is in the form of a plate extending in a horizontal direction; and The receiving portion is formed along the outer periphery of the chuck supporting portion and is used to receive the mechanism portion, and a chuck pin is provided on the upper surface thereof.

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