Supply system and supply method of chemical vapor deposition equipment

Abstract

The invention relates to the field of chemical vapor deposition, in particular to a supply system and a supply method of chemical vapor deposition equipment, and the supply system of the chemical vapor deposition equipment comprises a reaction container, at least one connecting assembly, a guide rail and a translation device. The reaction container is used for providing a reaction space for a chemical vapor deposition reaction, the at least one connecting assembly is arranged on the outer surface of the reaction container part, the guide rail is arranged along a straight line, and the reaction container is arranged on the guide rail. The translation device is detachably connected with the connecting assembly and is used for driving the reaction container to move along the guide rail. And the reaction container is driven by the translation device to move along the guide rail, so that the reaction container can move among the stations along the fixed direction. The reaction container can be accurately positioned at different stations, so that the gas conveying pipe is butted with the reaction container after the reaction container reaches the stations, and the smooth proceeding of chemical vapor deposition work is ensured.

Description

Technical Field

[0001] This patent relates to the field of silicon carbide reaction, and in particular to a supply system and supply method for chemical vapor deposition equipment. Background Art

[0002] Silicon carbide is a representative ceramic material that has been widely used in the entire industrial field due to its excellent physical, chemical and electrical properties.

[0003] In recent years, as the development of semiconductor processing components using silicon carbide materials has been actively progressing, the importance of silicon carbide materials has been increasing. In particular, silicon carbide materials are widely used as components for etching processes in semiconductor process components due to their high plasma resistance.

[0004] Silicon carbide materials used for semiconductor etching process parts are made by the traditional method of manufacturing silicon carbide. Since the quality and performance cannot be met by this method, it is manufactured by chemical vapor deposition.

[0005] Chemical vapor deposition of silicon carbide uses a mixture of Si-containing gases such as SiH4, SiCl2, SiCl4 and C-containing gases such as C2H2, CH4, C3H8 as raw material gases, or CH3SiCl3, CH3SiH3,

[0006] (CH3)3SiH) etc. There are some deposition methods using monolithic raw materials. The production of silicon carbide materials by chemical vapor deposition has the disadvantage of low productivity because the process is carried out in an intermittent chemical vapor deposition furnace. However, if the intermittent chemical vapor deposition furnace is to be improved to a continuous chemical vapor deposition furnace, the transportation problem of the reaction container needs to be overcome. Summary of the invention

[0007] In order to solve or at least partially solve the above technical problems, this patent provides a supply system and supply method for chemical vapor deposition equipment.

[0008] The present invention provides a supply system for a chemical vapor deposition device, and the supply system for the chemical vapor deposition device includes: a reaction vessel, at least one connecting component, a guide rail and a translation device. The reaction vessel is used to provide a reaction space for a chemical vapor deposition reaction. At least one connecting component is arranged on the outer surface of the reaction vessel portion, the guide rail is arranged along a straight line, and the reaction vessel is arranged on the guide rail. The translation device is detachably connected to the connecting component, and is used to drive the reaction vessel to move along the guide rail.

[0009] Preferably, the translation device comprises: a power source and a transmission rod arranged on the power source. The transmission rod comprises: a connecting portion and a straight rod portion, wherein the connecting portion is used for detachably connecting with the connection. The connection assembly further comprises: a rotating locking member, wherein a connecting groove is arranged on the rotating locking member, and the connecting groove matches the shape of the connecting portion; the connection portion is embedded in the connecting groove and drives the rotating locking member to rotate so as to detachably connect the connecting portion with the connection assembly.

[0010] Preferably, the guide rail is a roller rail; the roller rail comprises: two guide rails and a plurality of rollers. The two guide rails are symmetrically distributed. The plurality of rollers are evenly spaced and arranged between the two guide rails. The reaction container is arranged on the rollers and slides along the rolling direction of the rollers.

[0011] Preferably, the supply system of the chemical vapor deposition equipment further includes: a calibration device and a control module. The calibration device includes: two push positioning mechanisms, which are symmetrically arranged on both sides of the guide rail. The two push positioning structures act on the outer surface of the reaction container in a direction perpendicular to the guide rail, respectively, to calibrate the orientation of the reaction container. The control module is connected to the push positioning mechanism in communication to control the movement of the push positioning mechanism according to the instruction.

[0012] Preferably, the push positioning mechanism comprises: a fitting component and a telescopic component. The fitting component is used to fit with the outer surface of the reaction container to drive the reaction container to calibrate. The telescopic component is connected to the fitting component and is in communication connection with the control module; the telescopic component drives the fitting component to move in a direction perpendicular to the guide rail according to the instruction of the control module, so that the fitting component fits with the outer surface of the reaction container and applies an external force for calibration to the reaction container.

[0013] Preferably, the laminating assembly comprises: a laminating plate and a friction wheel. The laminating plate is connected to the telescopic assembly, and the laminating plate is used to mate with the outer surface of the reaction container to drive the reaction container to calibrate. The friction wheel is arranged on the side of the laminating plate facing the reaction container, and the friction wheel mates with the outer surface of the reaction container to reduce the contact friction between the laminating plate and the reaction container.

[0014] Preferably, the fitting assembly includes: a fitting part. The fitting part includes a plurality of fitting plates rotatably connected to each other, and a torsion spring is provided at the connection of adjacent fitting plates, so that the plurality of fitting plates of the fitting assembly tend to form a C-shape, and when the fitting plate abuts against the outer surface of the reaction vessel under the action of an external force, the elastic force of the torsion spring is overcome and the outer surface of the reaction vessel is fitted. At least two telescopic connecting rods are respectively connected to both sides of the telescopic assembly and connected to the fitting part. The orientation of the reaction vessel is adjusted by changing the telescopic amount of the telescopic connecting rod.

[0015] Preferably, the calibration device further comprises: a position sensor assembly which is in communication connection with the control module, and after detecting that the reaction container is in position, the position sensor assembly sends a position signal to the control module.

[0016] Preferably, the position sensing assembly includes: a first sensor and a second sensor. The first sensor is connected to the control module for communication, and is used to send a preliminary position signal to the control module after detecting that the reaction container is in place, so that the control module controls the positioning mechanism to calibrate the reaction container. The second sensor is connected to the control module for communication, and is used to assist in the calibration of the positioning mechanism, and after detecting that the calibrated reaction container reaches the docking position, sends a complete position signal to the control module, so that the control module controls the gas supply module to dock with the reaction container.

[0017] The present invention also provides a supply method for a supply system of a chemical vapor deposition device, the supply method comprising:

[0018] The manipulation translation device is connected to the connection assembly to push the reaction container to slide along the guide rail.

[0019] In response to a preliminary positioning signal of the reaction container, pushing of the reaction container is stopped.

[0020] The pushing and positioning mechanisms on both sides of the reaction container are controlled to fit with the outer surface of the reaction container, and the orientation of the reaction container is calibrated.

[0021] In response to the calibration completion signal of the orientation of the reaction container, the translation device is controlled to continue to push the reaction container to move along the guide track to fine-tune the reaction container to the docking position.

[0022] In response to the fully seated signal of the reaction container, the pushing of the reaction container is stopped, and the gas supply module is controlled to dock with the reaction container.

[0023] Preferably, the step of controlling the air supply module to dock with the reaction container specifically includes:

[0024] Controlling and pushing the positioning mechanism to separate from the reaction container;

[0025] After the positioning mechanism is pushed to reset, the air supply module is controlled to move so that the air pipe of the air supply module is connected to the reaction container.

[0026] Compared with the prior art, this patent uses a combination of a translation device and a connecting assembly to enable the reaction vessel to move along a guide rail, thereby enabling the reaction vessel to move between various stations and completing different operations at different stations. And by calibrating the reaction vessel with a calibration device, the posture of the reaction vessel can be adjusted to avoid deviations in the posture of the reaction vessel due to uneven external forces applied during transportation. Ensure that the pipeline used to transmit gas can be smoothly docked with the reaction vessel, so that chemical vapor deposition can proceed smoothly. At the same time, since the chemical vapor deposition furnace is changed to a continuous type, the utilization rate of the reaction chamber can be improved, and the production efficiency of chemical vapor deposition can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the implementation of this patent, the following is a brief introduction to the relevant drawings. It can be understood that the drawings described below are only used to illustrate some implementations of this patent, and ordinary technicians in this field can also obtain many other technical features and connection relationships not mentioned in this article based on these drawings.

[0028] Figure 1 is a three-dimensional schematic diagram of a supply system of a chemical vapor deposition device according to an embodiment of the present patent;

[0029] Figure 2 is a three-dimensional schematic diagram of a supply system of a chemical vapor deposition device according to an embodiment of the present patent;

[0030] Figure 3 is a three-dimensional schematic diagram of a supply system of a chemical vapor deposition device according to an embodiment of the present patent;

[0031] Figure 4 is a three-dimensional schematic diagram of a supply system of a chemical vapor deposition device according to an embodiment of the present patent;

[0032] Figure 5 It is a schematic diagram of a push positioning mechanism of an implementation method of the present patent;

[0033] Figure 6 It is a control module diagram of a supply system of a chemical vapor deposition device according to an embodiment of the present patent;

[0034] Figure 7 It is a flow chart of a supply method of a supply system of another chemical vapor deposition equipment according to an embodiment of the present invention;

[0035] Figure 8 This is a schematic diagram of a push positioning mechanism in an implementation mode of this patent.

[0036] Description of reference numerals:

[0037] 1. Reaction container; 200. Connecting assembly; 201. Rotating locking piece; 211. Locking port; 300. Guide rail; 301. Roller; 302. Guide rail; 400. Translation device; 401. Connecting part; 402. Straight rod; 500. Push positioning mechanism; 501. Telescopic assembly; 502. Laminating part; 503. Laminating plate; 504. Telescopic connecting rod; 505. Laminating assembly; 506. Friction wheel; 700. Air supply module. DETAILED DESCRIPTION

[0038] The patent is described in detail below in conjunction with the accompanying drawings.

[0039] In order to improve the technical problem of low productivity of intermittent chemical vapor deposition furnaces, the applicant of this patent hopes to propose a continuous chemical vapor deposition furnace. In this type of chemical vapor deposition furnace, the reaction container passes through the preparation chamber, reaction chamber and heat treatment chamber in sequence, and the atmosphere and temperature are prepared in the preparation chamber respectively; chemical vapor deposition is completed in the reaction chamber, and the post-heat treatment and cooling operations are completed in the heat treatment chamber.

[0040] That is to say, in the process of continuous chemical vapor deposition, the reaction vessel needs to be transported and passed through the preparation chamber, reaction chamber and heat treatment chamber in sequence. This is because when three different chambers are used to implement a segmented continuous process, since each chamber is relatively independent, when the reaction vessel completes the work in one chamber and moves to the next chamber, the previous chamber can be connected to a new reaction vessel to achieve continuous operation. That is to say, when a supply system for chemical vapor deposition equipment is provided, the preparation chamber, reaction chamber and heat treatment chamber of the continuous chemical vapor deposition furnace can operate on different reaction vessels at the same time.

[0041] The applicant has found that in the prior art, in order to ensure good airtightness and heat preservation performance, the reaction container usually has a relatively large weight.

[0042] In view of this, the inventors of the present disclosure provide a supply system adapted for chemical vapor deposition equipment, and a corresponding supply method, to solve the above technical problems.

[0043] Example 1

[0044] refer to Figure 3The embodiment of the present invention provides a supply system for a chemical vapor deposition device, and the supply system for the chemical vapor deposition device includes: a reaction vessel 1, at least one connecting component 200, a guide rail 300 and a translation device 400. The reaction vessel 1 is used to provide a reaction space for a chemical vapor deposition reaction. At least one connecting component 200 is arranged on the outer surface of the reaction vessel 1, the guide rail 300 is arranged along a straight line, and the reaction vessel 1 is arranged on the guide rail 300. The translation device 400 is detachably connected to the connecting component 200, and is used to drive the reaction vessel 1 to move along the guide rail 300.

[0045] When the reaction container 1 needs to be moved, the translation device 400 can be detachably connected to the connection assembly 200 on the surface of the reaction container 1. In this way, the translation device 400 can apply an external force to the reaction container 1 to drive it to move. Since the translation device 400 and the reaction container 1 are connected through the connection assembly 200, there will be no relative sliding between the two during the movement, thereby avoiding the reaction container 1 from swinging relative to the end of the translation device 400 during the movement.

[0046] Since the object has inertia, that is, after the external force is removed, the object will maintain its original state of motion. Usually, when the reaction container 1 reaches the target position, once the external force is stopped, the reaction container 1 will continue to slide for a short distance due to its own inertia, resulting in an inaccurate stop position. However, under the action of the connecting component 200, when the translation device 400 stops driving, the two will not separate, avoiding the stop error caused by the inertia of the reaction container 1 itself, thereby ensuring the moving direction and accuracy of the reaction container 1.

[0047] The guide rail 300 guides the movement direction of the reaction vessel 1, ensuring that the reaction vessel 1 can accurately pass through the three stations in sequence, avoiding unnecessary deviation during the movement process, and ensuring that the reaction vessel 1 successfully completes the reaction. In addition, the guide rail 300 also reduces the friction of the translation device 400 in the process of pushing the reaction vessel 1 to move, protecting the bottom of the reaction vessel 1 from wear, while reducing the power output of the translation device 400, saving energy.

[0048] And, if Figure 1 , Figure 2 The translation device 400 shown includes: a power source and a transmission rod arranged on the power source. The transmission rod has: a connection portion 401 and a straight rod portion 402, and the connection portion 401 is used to be detachably connected to the connection. The connection assembly 200 also includes: a rotating locking member 201, and a connection groove is arranged on the rotating locking member 201, and the connection groove matches the shape of the connecting portion 401; the connecting portion 401 is embedded in the connection groove, and drives the rotating locking member 201 to rotate so as to detachably connect the connecting portion 401 to the connection assembly 200.

[0049] As can be seen from the above, the connecting portion 401 is connected to the straight rod portion 402. Since the translation device 400 needs to push the reaction vessel 1 through three stations in the system in sequence, the straight rod portion 402 provides a sufficient operating length for the reaction vessel 1 to pass through, ensuring that the reaction vessel 1 can be subjected to the external force applied by the translation device 400. The connecting portion 401 of the translation device 400 is connected to the rotating locking member 201 of the connecting assembly 200, thereby realizing the connection between the translation device 400 and the reaction vessel 1.

[0050] Specifically, from Figure 2 and Figure 3 It can be seen that the connection assembly 200 has a locking opening 211, whose shape matches the locking portion. The locking portion can extend into the connection assembly 200 through the locking opening 211 and be inserted into the connection groove on the rotating locking member 201. By rotating the locking portion, the rotating locking member 201 is driven to rotate together. At this time, the locking opening 211 and the horizontal projection shape of the locking portion no longer match, thereby preventing the locking portion from passing through the locking opening 211, and avoiding the separation of the translation device 400 and the connection assembly 200.

[0051] In this embodiment, the shape of the locking part and the locking opening 211 are both rectangular, and the shape of the connecting groove can also match the locking part. The locking opening 211 is vertically arranged along the length direction of the rectangle. When the translation device 400 needs to be connected to the connection component 200, the locking part is vertically arranged to match the locking opening 211 and pass through it, and then inserted into the connecting groove on the rotating locking member 201 inside the connection component 200. At this time, the connection component 200 and the translation device 400 are connected. When the transmission rod of the translation device 400 rotates, it will drive the rotating locking member 201 to rotate together. For example, after rotating 90 degrees, the rectangle of the connection part 401 is placed horizontally, which does not match the vertical rectangle of the locking opening 211. In this state, the locking part cannot pass through the locking opening 211, thereby realizing a stable connection between the connection component 200 and the translation device 400. Similarly, when releasing the connection, it is only necessary to rotate the straight rod part 402 so that the rectangle of the connection part 401 returns to the vertical state and matches the locking opening 211, and the lock can be released smoothly.

[0052] In this embodiment, the rotary locking member 201 is provided to prevent the locking portion from sliding after being inserted into the interior of the connecting assembly 200. The fixed locking portion ensures the effective transmission of the force of the translation device 400. In order to simplify the structure of the connecting assembly 200, the rotary locking member 201 may not be provided in other embodiments. However, by comparison, after the rotary locking member 201 is provided, the pushing effect of the translation device 400 is better, and the movement deviation caused by the shaking of the locking portion can be effectively reduced.

[0053] In addition, reference Figure 1 , Figure 2 , Figure 3 , Figure 4 The guide rail 300 is a roller 301 track; the roller 301 track includes: two guide rails 302 and a plurality of rollers 301. The two guide rails 302 are symmetrically distributed. The plurality of rollers 301 are evenly spaced and arranged between the two guide rails 302. The reaction container 1 is arranged on the roller 301 and slides along the rolling direction of the roller 301.

[0054] It is not difficult to infer from the above content that the reaction vessel 1 needs to move along the guide rail 300, and the function of the guide rail 300 is to provide position guidance for the reaction vessel 1. By setting the roller 301 track, when the reaction vessel 1 moves along the track, multiple rollers 301 will rotate synchronously. In this way, the movement of the reaction vessel 1 on the guide rail 300 can reduce friction, thereby reducing the wear on the bottom of the reaction vessel 1 and facilitating its movement. At the same time, due to the reduction of resistance during transportation, the external force applied by the translation device 400 to the reaction vessel 1 is also reduced accordingly, saving energy and reducing energy consumption.

[0055] Example 2

[0056] In Example 1, the translation device 400 is detachably connected to the reaction container 1, so that the translation device 400 drives the reaction container 1 to move, which can solve the problem of switching the reaction container 1 between three different stations in the system. However, during the driving process of the translation device 400, the reaction container 1 may deflect due to force, friction and other reasons, and the deflection error of the reaction container 1 may affect the docking between the gas supply module 700 and the reaction container 1 at the reaction station.

[0057] In view of this, refer to Figure 1 , Figure 2 Embodiment 2 of the present invention also provides a supply system for chemical vapor deposition equipment. Embodiment 2 further includes a calibration device and a control module relative to Embodiment 1. The calibration device includes two push positioning mechanisms 500, which are symmetrically arranged on both sides of the guide rail 300. The two push positioning structures act on the outer surface of the reaction vessel 1 in a direction perpendicular to the guide rail 300, respectively, to calibrate the orientation of the reaction vessel 1. The control module is connected in communication with the push positioning mechanism 500 to control the movement of the push positioning mechanism 500 according to instructions.

[0058] Based on the above supply system, the present invention also provides a supply method for a supply system of a chemical vapor deposition device, referring to Figure 7 As shown, the supply methods include:

[0059] The manipulation translation device 400 is connected to the connection assembly 200 to push the reaction container 1 to slide along the guide rail 300 .

[0060] In response to the preliminary positioning signal of the reaction container 1, the pushing of the reaction container 1 is stopped.

[0061] The pushing and positioning mechanisms 500 on both sides of the reaction container 1 are controlled to fit with the outer surface of the reaction container 1 , and the orientation of the reaction container 1 is calibrated.

[0062] In response to the calibration completion signal of the orientation of the reaction container 1 , the translation device 400 is controlled to continue to push the reaction container 1 to move along the guide rail 300 so as to fine-tune the reaction container 1 to the docking position.

[0063] In response to the signal indicating that the reaction container 1 is fully in place, the pushing of the reaction container 1 is stopped, and the gas supply module 700 is controlled to dock with the reaction container 1 .

[0064] Further, the step of controlling the gas supply module 700 to dock with the reaction container 1 specifically includes:

[0065] Control and push the positioning mechanism 500 to separate from the reaction container 1;

[0066] After the positioning mechanism 500 is pushed to reset, the air supply module 700 is controlled to move so that the air pipe of the air supply module 700 is connected to the reaction container 1 .

[0067] When the air supply module 700 is docked with the reaction container 1, it needs to be connected to the docking port on the reaction container 1 in a direction perpendicular to the guide rail 300. If the reaction container 1 deviates on the guide rail 300, the air supply module 700 is difficult to dock smoothly, or the air supply module 700 needs to be rotated to achieve docking.

[0068] In this embodiment, the reaction container 1 is positioned by arranging two push positioning mechanisms 500 on both sides of the guide rail 300. The positioning mechanisms exert force on the side walls of the reaction container 1 from both sides to make the outer side walls parallel to the guide rail 300, eliminating left and right deviations. Therefore, the docking operation can be smoothly performed.

[0069] By controlling the control module to communicate with the positioning mechanism 500 and control its operation, the reaction container 1 can be positioned and reset, thereby realizing automatic control and improving work efficiency.

[0070] In the process of gas supply for chemical vapor deposition reaction, the reaction vessel 1 needs to be transported through different stations in sequence. During the transportation, due to the action of the translation device 400, the posture and orientation of the reaction vessel 1 may undergo some slight changes. Therefore, after the reaction vessel 1 is moved to the target position, the orientation of the reaction vessel 1 needs to be calibrated first, and the positioning mechanisms located on both sides of the reaction vessel 1 apply forces to the side walls of the reaction vessel 1 from both sides. Due to the two pushing and positioning mechanisms 500 acting in opposite directions, the side walls of the reaction vessel 1 are squeezed and deflected in a direction parallel to the guide rail 300 until the outer side wall of the reaction vessel 1 is parallel to the guide rail 300, thereby ensuring that there will be no left and right deviations when the reaction vessel 1 moves along the guide rail 300. At this time, the reaction vessel 1 completes the adjustment along the left and right directions of the guide rail 300, and the direction along the guide rail 300 needs to be precisely adjusted. By further controlling the translation device 400 to push the reaction vessel 1 to move, the reaction vessel 1 to be detected stops pushing the reaction vessel 1 after it has accurately reached the target along the track direction. Since the adjustment position for adjusting the orientation of the reaction container 1 is very close to the docking position for docking the reaction container 1 with the gas supply module 700, the distance between the two is for adjusting the orientation of the reaction container 1. Therefore, the moving distance for precise positioning is too short and will not affect the orientation of the reaction container 1, so that the gas supply module 700 and the reaction container 1 can be docked after the reaction container 1 is in place. The reaction container 1 can pass through different workstations in the system, and the precise positioning of the reaction container 1 can be completed at the same time, so as to meet the docking and gas supply between the gas supply module 700 and the reaction container 1.

[0071] The control module controls the operation of the push positioning mechanism 500 through a communication connection with the push positioning mechanism 500. When the reaction vessel 1 needs to be positioned, the control module directs the push positioning mechanism 500 to work; after the positioning is completed, the posture of the reaction vessel 1 at this time can meet the docking requirements between the gas supply module 700 and the reaction vessel 1. Therefore, in order to facilitate the smooth docking of the gas supply module 700 with the reaction vessel 1, after the push positioning mechanism 500 completes the positioning work, the push positioning mechanism 500 will be separated from the reaction vessel 1, providing sufficient space for the docking between the gas supply module 700 and the reaction vessel 1, avoiding unnecessary interference between some components of the push positioning mechanism 500 and the gas supply module 700. This automatic control mechanism not only completes the automatic control of the chemical vapor deposition equipment supply system, but also improves work efficiency.

[0072] Further, refer to Figure 5 , Figure 6The push positioning mechanism 500 includes: a fitting component 505 and a telescopic component 501. The fitting component 505 is used to fit with the outer surface of the reaction container 1 to drive the reaction container 1 to calibrate. The telescopic component 501 is connected to the fitting component 505 and is in communication connection with the control module; the telescopic component 501 drives the fitting component 505 to move in a direction perpendicular to the guide rail 300 according to the instruction of the control module, so that the fitting component 505 fits with the outer surface of the reaction container 1, and applies an external force for calibration to the reaction container 1.

[0073] The telescopic assembly 501 can carry the fitting assembly 505 to move so that it fits tightly with the outer surface of the reaction vessel 1. When adjusting the positioning and direction of the reaction vessel 1, the telescopic assembly 501 first drives the fitting assembly 505 to move to both sides of the reaction vessel 1. After the fitting assembly 505 contacts the outer side wall of the reaction vessel 1, the telescopic assembly 501 continues to work, so that the fitting assembly 505 applies pressure to the reaction vessel 1 from both sides, and adjusts its direction so as to smoothly dock with the air supply module 700. In this embodiment, the telescopic assembly 501 can choose to use a hydraulic rod. In view of the large weight of the reaction vessel 1, a large external force needs to be applied during calibration. The hydraulic rod can push the reaction vessel 1 with a large weight, so the smooth calibration can be guaranteed.

[0074] In addition, in some embodiments of the present invention, the laminating assembly 505 further includes: a laminating plate 503 and a friction wheel 506. The laminating plate 503 is connected to the telescopic assembly 501, and the laminating plate 503 is used to align with the outer surface of the reaction container 1 to drive the reaction container 1 to calibrate. The friction wheel 506 is arranged on the side of the laminating plate 503 facing the reaction container 1, and the friction wheel 506 is in contact with the outer surface of the reaction container 1 to reduce the contact friction between the laminating plate 503 and the reaction container 1.

[0075] Obviously, as the core part of the chemical vapor deposition (CVD) equipment, the precise positioning and calibration of the reaction vessel 1 is crucial for the preparation of high-purity, high-performance solid films. When both sides of the positioning mechanism 500 are pushed to fit tightly against the outer wall of the reaction vessel 1, the orientation of the reaction vessel 1 is adjusted and fixed. Next, the pipeline of the gas supply module 700 needs to be docked.

[0076] Since the air supply module 700 needs to dock multiple pipelines at the same time, and each pipeline is arranged along the direction of the guide rail 300, in order to ensure that each pipeline can be smoothly inserted into the reaction vessel 1, we need to accurately adjust the reaction vessel 1 along the direction of the guide rail 300. In order to prevent the reaction vessel 1 from deflecting during the precise adjustment process, the positioning mechanism 500 can be pushed to clamp the reaction vessel 1 from both sides. At this time, the friction wheel 506 located on the bonding plate 503 will contact the outer wall of the reaction vessel 1. When the translation device 400 is used to accurately adjust the reaction vessel 1, the two sides of the reaction vessel 1 will be limited by the bonding plate 503 and the friction wheel 506 to prevent sliding. Since the reaction vessel 1 will move slightly along the guide rail 300 during precise adjustment, it will generate friction with the bonding plate 503. The friction wheel 506 can rotate when the reaction vessel 1 slides, thereby converting the sliding friction into rolling friction, so that the friction force is reduced. This can avoid the wear of the outer surface of the reaction vessel 1 caused by precise adjustment on the one hand, and on the other hand, it also saves the output power of the translation device 400 and reduces energy consumption.

[0077] When the output power required by the translation device 400 is reduced, the external force required to drive the reaction container 1 to move the same distance is also reduced accordingly, which makes the driving distance easier to control and can further improve the accuracy of the operation.

[0078] Furthermore, in an embodiment of the present invention, the fitting assembly 505 includes: a fitting part 502. The fitting part 502 includes a plurality of fitting plates 503 that are rotatably connected to each other, and a torsion spring is provided at the connection of adjacent fitting plates 503, so that the plurality of fitting plates 503 of the fitting assembly 505 tend to form a C-shape, and when the fitting plates 503 abut against the outer surface of the reaction vessel 1 under the action of an external force, the elastic force of the torsion spring is overcome and the outer surface of the reaction vessel 1 is fitted. At least two telescopic connecting rods 504 are respectively connected to both sides of the telescopic assembly 501 and connected to the fitting part 502. By changing the telescopic amount of the telescopic connecting rod 504, the orientation of the reaction vessel 1 is adjusted.

[0079] The fitting component 502, which is formed by a plurality of fitting plates 503 connected by rotation through a torsion spring, can be adaptively fitted during the fitting process with the reaction container 1. Specifically, since an angle is usually formed between the side wall of the reaction container 1 and the length direction of the guide rail 300 when the reaction container 1 is calibrated, it is difficult for the fitting component 502 to completely fit with the outer surface of the reaction container 1 when the positioning mechanism 500 is pushed to work.

[0080] By configuring each bonding plate 503 as a bonding component 502 having a mutually rotatably connected structure, a tighter match with the side wall of the reaction vessel 1 can be achieved by means of rotation between the bonding plates 503, so that the bonding component 502 can be fully bonded with the side wall before calibration.

[0081] In addition, the torsion spring at the connection can provide a rebound force between the bonding plates 503. When the bonding plates 503 rotate to adapt to the outer wall of the reaction container 1, the rebound force makes them tightly attached to the outer wall, thereby improving the adaptability of the bonding component 502 and ensuring the fit.

[0082] It is worth mentioning that the side wall of the reaction container 1 can be set to an arc shape. Correspondingly, the multiple bonding plates 503 of the bonding component 505 can be set to form a C shape, so that the bonding component 505 can better fit with the arc outer wall of the reaction container 1, and the posture of the reaction container 1 can be calibrated by optimizing the bonding, ensuring the accuracy of the adjusted orientation.

[0083] In addition, the telescopic connecting rods on both sides of the telescopic assembly 501 realize the rotation of the fitting component 502 by telescoping, thereby changing the direction of the reaction container 1. Figure 5 Taking the illustrated embodiment as an example, two telescopic connecting rods 504 are symmetrically arranged on both sides of the telescopic component 501. When the telescopic connecting rod 504 on one side retracts, the telescopic connecting rod 504 on the other side extends, and the fitting component 502 rotates toward the retracted side, driving the reaction container 1 to rotate, thereby realizing orientation adjustment.

[0084] In some other embodiments, the number of telescopic connecting rods 504 can be set to be multiple and an even number to achieve a symmetrical setting, thereby ensuring that the rotational external force applied by the fitting component 502 is uniform and ensuring calibration accuracy.

[0085] Finally, reference Figure 6 As shown, the calibration device also includes: a position sensor assembly. The position sensor assembly is communicatively connected to the control module, and after detecting that the reaction vessel 1 is in place, the position sensor assembly sends a position signal to the control module. Preferably, the position sensing assembly includes: a first sensor and a second sensor. The first sensor is communicatively connected to the control module, and is used to send a preliminary position signal to the control module after detecting that the reaction vessel 1 is in place, so that the control module controls the positioning mechanism 500 to calibrate the reaction vessel 1. The second sensor is communicatively connected to the control module, and is used to assist in the calibration of the positioning mechanism, and after detecting that the calibrated reaction vessel 1 reaches the docking position, it sends a fully positioned signal to the control module, so that the control module controls the gas supply module 700 to dock with the reaction vessel 1.

[0086] It is not difficult to infer from the above content that the reaction vessel 1 needs to be calibrated in direction only after it reaches the designated position for docking with the air supply module 700. After completing the orientation calibration of the reaction vessel 1, in order to ensure that the air pipe of the air supply module 700 can be smoothly inserted into the reaction vessel 1, it is necessary to accurately adjust the direction of the reaction vessel 1 along the guide rail 300. Therefore, in the docking process of the reaction vessel 1, the orientation calibration is usually performed first, and then the precise positioning is performed. The calibration position of the reaction vessel 1 is very close to the docking position of the air supply module 700. After completing the orientation calibration of the reaction vessel 1, it is only necessary to continue to add a small amount of displacement to achieve precise positioning.

[0087] Specifically, the first sensor is responsible for detecting whether the reaction container 1 has reached the position of the calibration orientation. Once the first sensor detects the reaction container 1, it indicates that the reaction container 1 has reached the position of the calibration orientation. At this time, the control module will command the positioning mechanism 500 to adjust the orientation of the reaction container 1. After the orientation adjustment is completed, the translation device 400 will accurately position the reaction container 1.

[0088] When the second sensor detects the reaction container 1, it means that the reaction container 1 has reached a position where it can be connected to the air pipe of the air supply module 700. The control module then controls the air supply module 700 to dock with the reaction container 1. Since the reaction container 1 has been accurately positioned along the direction of the guide rail 300, the various pipelines of the air supply module 700 can be smoothly connected to the docking port on the reaction container 1, ensuring that the pipeline can be smoothly inserted into the docking port.

[0089] This embodiment completes the preliminary calibration and precise positioning of the reaction vessel 1 through the cooperation of the first sensor and the second sensor, ensuring that the reaction vessel 1 is precisely positioned in four directions on the horizontal plane. Due to the existence of the guide rail 300, the reaction vessel 1 will not have errors in the vertical direction, thereby achieving comprehensive positioning. In this way, the docking between the air supply module 700 and the reaction vessel 1 is achieved, avoiding the docking failure caused by the positioning error of the reaction vessel 1, and ensuring work efficiency.

[0090] Example 3

[0091] The present invention also provides a supply method for a supply system of a chemical vapor deposition device. Embodiment 3 is mainly used to solve how to use the supply system in Embodiment 1 and Embodiment 2 to complete the supply of gas for reaction in the reaction container 1. Figure 7 The above-mentioned supply methods shown include:

[0092] The manipulation translation device 400 is connected to the connection assembly 200 to push the reaction container 1 to slide along the guide rail 300 .

[0093] In response to the preliminary positioning signal of the reaction container 1, the pushing of the reaction container 1 is stopped.

[0094] The pushing and positioning mechanisms 500 on both sides of the reaction container 1 are controlled to fit with the outer surface of the reaction container 1 , and the orientation of the reaction container 1 is calibrated.

[0095] In response to the calibration completion signal of the orientation of the reaction container 1 , the translation device 400 is controlled to continue to push the reaction container 1 to move along the guide rail 300 so as to fine-tune the reaction container 1 to the docking position.

[0096] In response to the signal indicating that the reaction container 1 is fully in place, the pushing of the reaction container 1 is stopped, and the gas supply module 700 is controlled to dock with the reaction container 1 .

[0097] Further, the step of controlling the gas supply module 700 to dock with the reaction container 1 specifically includes:

[0098] Control and push the positioning mechanism 500 to separate from the reaction container 1;

[0099] After the positioning mechanism 500 is pushed to reset, the air supply module 700 is controlled to move so that the air pipe of the air supply module 700 is connected to the reaction container 1 .

[0100] Finally, it should be noted that ordinary technicians in this field can understand that in order to make readers better understand this patent, the implementation methods of this patent propose many technical details. However, even without these technical details and various changes and modifications based on the above-mentioned implementation methods, the technical solutions claimed for protection by the claims of this patent can be basically realized. Therefore, in practical applications, various changes can be made to the above-mentioned implementation methods in form and details without departing from the spirit and scope of this patent.

Claims

1. A supply system for chemical vapor deposition equipment, characterized in that: include: A reaction container, used to provide a reaction space for chemical vapor deposition reaction; at least one connecting component disposed on the outer surface of the reaction container portion; A guide rail is arranged along a straight line, and the reaction container is arranged on the guide rail; A translation device is detachably connected to the connection assembly and is used to drive the reaction container to move along the guide rail.

2. The supply system of chemical vapor deposition equipment according to claim 1, characterized in that: The translation device comprises: A power source and a transmission rod disposed on the power source, wherein the transmission rod has: A connecting portion and a straight rod portion, wherein the connecting portion is used to be detachably connected to the connecting portion; The connection component also includes: A rotary locking piece is provided with a connecting groove, and the connecting groove matches the shape of the connecting portion; the connecting portion is embedded in the connecting groove and drives the rotary locking piece to rotate so as to detachably connect the connecting portion with the connecting assembly.

3. The supply system of chemical vapor deposition equipment according to claim 1, characterized in that: The guide rail is a roller track; the roller track comprises: Two guide rails, the two guide rails are symmetrically distributed; A plurality of rollers are evenly spaced and arranged between the two guide rails. The reaction container is arranged on the rollers and slides along the rolling direction of the rollers.

4. The supply system of chemical vapor deposition equipment according to claim 1, characterized in that: The supply system of the chemical vapor deposition equipment also includes: Calibration device, comprising: Two pushing and positioning mechanisms are symmetrically arranged on both sides of the guide rail; The two pushing and positioning structures act on the outer surface of the reaction container in a direction perpendicular to the guide rail, respectively, to calibrate the orientation of the reaction container; The control module is connected to the push positioning mechanism for controlling the movement of the push positioning mechanism according to instructions.

5. The supply system of chemical vapor deposition equipment according to claim 4, characterized in that: The pushing and positioning mechanism comprises: A fitting component, used to fit with the outer surface of the reaction container to drive the reaction container to be calibrated; The telescopic component is connected to the fitting component and is in communication with the control module; the telescopic component drives the fitting component to move in a direction perpendicular to the guide rail according to the instructions of the control module, so that the fitting component fits the outer surface of the reaction container and applies an external force for calibration to the reaction container.

6. The supply system of chemical vapor deposition equipment according to claim 5, characterized in that: The fitting assembly comprises: A fitting plate connected to the telescopic assembly, the fitting plate being used to fit with the outer surface of the reaction container to drive the reaction container to be calibrated; The friction wheel is arranged on the side of the laminating plate facing the reaction container, and the friction wheel is in contact with the outer surface of the reaction container to reduce the contact friction between the laminating plate and the reaction container.

7. The supply system of chemical vapor deposition equipment according to claim 5, characterized in that: The laminating assembly comprises: a laminating component, comprising a plurality of laminating plates rotatably connected to each other, and a torsion spring is provided at the connection of adjacent laminating plates, so that the plurality of laminating plates of the laminating assembly tend to form a C-shape, and when the laminating plates abut against the outer surface of the reaction container under the action of an external force, the elastic force of the torsion spring is overcome and the laminating plates are in contact with the outer surface of the reaction container; At least two telescopic connecting rods, respectively connected to two sides of the telescopic assembly and connected to the fitting component; The direction of the reaction container is adjusted by changing the extension amount of the telescopic connecting rod.

8. The supply system of chemical vapor deposition equipment according to any one of claims 4 to 7, characterized in that: The calibration device also includes: The position sensor component is connected to the control module for communication. After detecting that the reaction container is in place, the position sensor component sends a position signal to the control module.

9. The supply system of chemical vapor deposition equipment according to claim 8, characterized in that: Position sensing components include: A first sensor is connected to the control module for communication, and is used to detect that the reaction container is in place, and then send a preliminary in-place signal to the control module, so that the control module controls the pushing and positioning mechanism to calibrate the reaction container; The second sensor is connected to the control module for assisting the calibration of the positioning mechanism and sending a fully positioned signal to the control module after detecting that the calibrated reaction container has reached the docking position, so that the control module controls the gas supply module to dock with the reaction container.

10. A supply method for a supply system of a chemical vapor deposition device, characterized in that: The supply method comprises: The control translation device is connected to the connection assembly to push the reaction container to slide along the guide rail; In response to a preliminary positioning signal of the reaction container, stopping pushing the reaction container; Controlling the pushing and positioning mechanisms on both sides of the reaction container to fit with the outer surface of the reaction container, and calibrating the orientation of the reaction container; In response to a calibration completion signal of the orientation of the reaction container, controlling the translation device to continue to push the reaction container to move along the guide track, so as to fine-tune the reaction container to a docking position; In response to a signal indicating that the reaction container is fully in place, the reaction container is stopped from being pushed, and the gas supply module is controlled to dock with the reaction container.

11. The supply method of the supply system of the chemical vapor deposition equipment according to claim 10, characterized in that: The step of controlling the air supply module to dock with the reaction container specifically includes: Controlling the pushing and positioning mechanism to separate from the reaction container; After the push positioning mechanism is reset, the air supply module is controlled to move so that the air pipe of the air supply module is connected to the reaction container.

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