Exposure device and control method thereof

Abstract

The invention provides an exposure device and a control method thereof, and belongs to the technical field of exposure. The exposure device comprises a workbench, a plurality of marker lamp assemblies, a plurality of auxiliary lamp assemblies, a visual assembly and an exposure assembly. Wherein the workbench comprises a preset area for placing a workpiece to be exposed; the plurality of marker lamp assemblies are arranged in a preset area, and mark points are formed on the reverse side of the to-be-exposed workpiece when the front side of the to-be-exposed workpiece is exposed; the auxiliary lamp assemblies are all arranged outside the preset area, each auxiliary lamp assembly corresponds to the corresponding marking lamp assembly, and the visual assembly is used for identifying the marking lamps, the auxiliary lamps and the marking points and speculating the correction positions of the marking points according to the relation among the marking lamps, the auxiliary lamps and the marking points. And finally, exposing the reverse side of the to-be-exposed workpiece according to the corrected mark point through the exposure assembly. The invention can ensure that the relative position relation of the front and back exposure patterns of the to-be-exposed workpiece is a determined value on the premise of not stopping the exposure work, thereby improving the production efficiency.

Description

Technical Field

[0001] The present invention relates to the field of exposure technology, and in particular to an exposure device and a control method thereof. Background Art

[0002] When exposing the front and back sides of the workpiece to be exposed, according to the product characteristics, the relative position requirements between the front and back exposure patterns are relatively strict, and the relative position relationship between the front and back exposure patterns must be relatively accurate.

[0003] In order to achieve the above product requirements, existing exposure devices such as Figure 1 As shown, it includes a workbench 1 for placing a workpiece 7 to be exposed, at least three marking light assemblies 2 arranged on the workbench 1, an exposure assembly 4 installed on a gantry bracket 3 and movable on the gantry bracket 3, and a visual assembly 5. After the exposure device is turned on, the visual assembly 5 will first obtain the specific position of the marking light assembly 2 relative to the workbench 1. When the workpiece 7 to be exposed coated with a photosensitive material is placed on the workbench 1 for exposure, the workpiece 7 to be exposed will cover the marking light assembly 2. When the exposure assembly 4 exposes the front of the workpiece 7 to be exposed according to a preset position and generates an exposure pattern, the marking light assembly 2 will generate a marking point on the back of the workpiece 7 to be exposed under the action of a photosensitive reaction. When the back of the workpiece 7 to be exposed is exposed, the visual assembly 5 will obtain the specific position of the marking point on the workpiece 7 to be exposed, and use the marking point as a reference system to expose the back of the workpiece 7 to be exposed and generate an exposure pattern. Through the above settings and steps, it can be achieved that: when the front and back of multiple workpieces 7 to be exposed are exposed in sequence, the relative position between the exposure patterns on the front and back of the workpiece 7 to be exposed always maintains a certain value.

[0004] However, due to the influence of factors such as the environment and table vibration, the position of the marking light assembly 2 on the workbench 1 may change, resulting in changes in the relative positions of the exposure patterns on the front and back sides of the workpiece 7 to be exposed when the workpiece 7 to be exposed is exposed.

[0005] In order to solve the above problems, the prior art stops the exposure work after the exposure device runs for a specific period of time, and the visual component 5 reacquires the position of the marker light component 2 relative to the workbench 1, and analyzes the reacquired position information of the marker light component 2 and the initially acquired position information of the marker light component 2, and adjusts the exposure position of the reverse exposure pattern to ensure that the relative position of the exposure pattern on the front and back of the workpiece 7 to be exposed always maintains a certain value. This method of achieving registration requires the exposure device to stop the exposure work and reacquire the position information of the marker light component 2 relative to the workbench 1 at regular intervals, which seriously affects production efficiency. Summary of the invention

[0006] One object of the present invention is to solve the problem that the existing exposure device seriously affects the production efficiency in order to ensure the registration of the front and back patterns.

[0007] In particular, the present invention provides an exposure apparatus comprising:

[0008] A workbench, including a preset area for placing a workpiece to be exposed;

[0009] A plurality of marking light assemblies are arranged in the preset area, each of the marking light assemblies comprises at least one marking light, and the marking light is used to form a marking point on the reverse side of the workpiece to be exposed when the workpiece to be exposed is exposed from the front side;

[0010] A plurality of auxiliary light assemblies, all arranged outside the preset area, each of the auxiliary light assemblies corresponding to each of the marker light assemblies, each of the auxiliary light assemblies being arranged adjacent to the corresponding marker light assemblies, and each of the auxiliary light assemblies comprising an auxiliary light corresponding to each of the marker lights of the marker light assemblies corresponding thereto;

[0011] A motion component, capable of moving relative to the workbench;

[0012] a visual component, disposed on the motion component, for identifying the positions of the marker light and the auxiliary light; and

[0013] The exposure assembly is arranged on the moving assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

[0014] Furthermore, at least three of the multiple marking light assemblies are not in the same straight line; and at least three of the multiple auxiliary light assemblies are not in the same straight line.

[0015] Furthermore, each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

[0016] Furthermore, the plurality of auxiliary lamps in each auxiliary lamp assembly are not located on the same straight line.

[0017] Furthermore, when the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

[0018] Furthermore, a barrier member is provided on a side of the auxiliary light assembly close to the marker light assembly.

[0019] The present invention provides an exposure device, comprising:

[0020] A workbench, including a preset area for placing a workpiece to be exposed;

[0021] A plurality of lamp assemblies, each of which includes a marking lamp assembly and an auxiliary lamp assembly, wherein the marking lamp assembly is arranged in the preset area, and the auxiliary lamp assembly is arranged outside the preset area, and each of the marking lamp assemblies includes at least one marking lamp, and the marking lamp is used to form a marking point on the reverse side of the workpiece to be exposed when the workpiece to be exposed is exposed from the front side, and each of the auxiliary lamp assemblies includes at least one auxiliary lamp, and the auxiliary lamp assembly in each lamp assembly is arranged adjacent to the marking lamp assembly in the lamp assembly, so that the auxiliary lamp assembly corresponds to the marking lamp assembly;

[0022] A motion component, capable of moving relative to the workbench;

[0023] a visual component, disposed on the motion component, for identifying the positions of the marker light and the auxiliary light; and

[0024] The exposure assembly is arranged on the moving assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

[0025] Furthermore, the plurality of lamp assemblies are not located on the same straight line.

[0026] Furthermore, each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

[0027] Furthermore, the plurality of auxiliary lamps in each auxiliary lamp assembly are not on the same straight line.

[0028] Furthermore, when the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

[0029] Furthermore, a barrier member is provided on a side of the auxiliary light assembly close to the marker light assembly.

[0030] The present invention also provides a control method for the above exposure device, comprising:

[0031] When the workpiece to be exposed is not placed, the visual component is controlled to identify the initial position of each of the marking light components relative to the workbench and the initial position of each of the auxiliary light components relative to the workbench;

[0032] When the workpiece to be exposed is subjected to front pattern exposure, the visual component is controlled to identify the current position of each of the auxiliary light components, and a marking point is formed on the reverse side of the workpiece to be exposed;

[0033] determining an offset of the auxiliary light assembly according to a current position of the auxiliary light assembly and an initial position of the auxiliary light;

[0034] After the workpiece to be exposed is turned over, controlling the visual component to identify the actual position of each of the marking points on the reverse side;

[0035] Determining the relative position of the reverse pattern relative to the actual position of each of the marking points according to the offset of the auxiliary light assembly;

[0036] The exposure component exposes the back surface according to the relative positions of the back surface patterns.

[0037] Furthermore, when the exposure workpiece is subjected to front pattern exposure, controlling the visual component to identify the current position of each of the auxiliary light components comprises:

[0038] When performing front pattern exposure, the exposure component and the visual component move relative to the workbench along a first direction, the visual component is located on a side of the motion component close to the auxiliary light component, and the motion component drives the exposure component and the visual component to move along a second direction, and the first direction is perpendicular to the second direction;

[0039] When the motion component moves to a position close to the auxiliary light assembly, the vision component recognizes the current position of the auxiliary light assembly.

[0040] Furthermore, when the exposure workpiece is subjected to front pattern exposure, controlling the visual component to identify the current position of each of the auxiliary light components comprises:

[0041] When the front pattern exposure is completed, the motion component stops moving, and the visual component moves along the first direction until the auxiliary light component is recognized.

[0042] Further, determining the offset of the auxiliary lamp assembly according to the current position of the auxiliary lamp assembly and the initial position of the auxiliary lamp comprises:

[0043] Determining an offset mode and an offset amount of the auxiliary light assembly;

[0044] The offset mode includes one or more of lateral offset, vertical offset, arc offset, expansion and contraction.

[0045] Further, determining the relative position of the reverse pattern relative to the actual position of each of the marking points according to the offset of the auxiliary light assembly includes:

[0046] determining the actual position of the marker light assembly based on the offset of the auxiliary light assembly;

[0047] Determining the relative position of the reverse pattern relative to the actual position of the marker light assembly according to the actual position of the marker light assembly;

[0048] According to the relative position of the reverse pattern relative to the actual position of the marking light assembly, the relative position of the reverse pattern relative to the actual position of each marking point is determined.

[0049] Further, determining the relative position of the reverse pattern relative to the actual position of each of the marking points according to the offset of the auxiliary light assembly includes:

[0050] The actual position of each of the marking points on the reverse side is corrected according to the offset of the auxiliary light assembly, the corrected position of each of the marking points is determined, and the relative position of the reverse pattern relative to the corrected position of each of the marking points is determined according to the corrected position.

[0051] The present invention also provides a control method for the above exposure device, comprising:

[0052] The motion component drives the visual component to move relative to the workbench, and stops when approaching the marking light component and the auxiliary light component. The visual component moves along the motion component, stops when moving to the marking light component, identifies the position of the marking light component, and stops when moving to the auxiliary light component, identifies the position of the auxiliary light component;

[0053] The motion component drives the exposure component and the visual component to perform stepping motion, the exposure component performs scanning motion to expose the front side of the workpiece to be exposed, the visual component stops when it moves to the auxiliary light component, identifies the position of the auxiliary light component, and the marking light component illuminates the reverse side of the workpiece to be exposed to form a marking point;

[0054] The workpiece to be exposed is turned over, the motion component drives the visual component to move relative to the workbench, the visual component moves along the motion component, and the visual component stops when it moves to the marking point to identify the position of the marking point;

[0055] The motion component drives the exposure component to perform stepping motion, and the exposure component performs scanning motion along the motion component to expose the reverse side pattern of the workpiece to be exposed.

[0056] The beneficial effects of the present invention are:

[0057] 1. The exposure device of the present invention calculates the position change (i.e., correction value) of each marker light in the marker light assembly by identifying the position change of each auxiliary light in the auxiliary light assembly, and then uses the correction value to correct the actual position of the identified marking point to obtain the corrected position of the marking point, thereby achieving the registration of the front and back patterns of the workpiece to be exposed. Since the workpiece to be exposed is never covered by the auxiliary light assembly, the position change of the auxiliary light assembly can always be acquired by the visual component. Therefore, the correction value can be obtained when the front side of the same workpiece to be exposed is exposed, and the correction value is used to correct the position of the marking point when the back side is exposed, thereby ensuring that the relative position of the front and back exposure patterns is more accurate without stopping the exposure work, thereby improving production efficiency.

[0058] 2. By setting each group of marker lights to multiple, more data support is provided for the calculation of the corrected position of the marker point, making the calculation more accurate.

[0059] 3. By setting the auxiliary lights and the corresponding marker lights to be on different lines at the same time, when the auxiliary lights are laterally offset, vertically offset, arc offset, expand, shrink, etc., the position change of the marker lights can be calculated through the position changes of multiple auxiliary lights that are not on the same line, thereby ensuring the measurement of the corrected position of the marker point in more position change situations.

[0060] 4. A partition is set between the auxiliary light assembly and the marking light assembly to form a barrier between the auxiliary light assembly and the marking light assembly to prevent the auxiliary light assembly from being blocked by the workpiece to be exposed after it is turned over due to a malfunction of the exposure system itself or an operator's mistake in turning it over. This may cause the visual component to be unable to capture the position change information of the auxiliary light assembly, thereby affecting the measurement of the correction position of the marking point. BRIEF DESCRIPTION OF THE DRAWINGS

[0061] Figure 1 It is a structural schematic diagram of an existing exposure device;

[0062] Figure 2 is a schematic structural diagram of an exposure device according to an embodiment of the present invention;

[0063] Figure 3 is a schematic structural diagram of an exposure device according to another embodiment of the present invention;

[0064] Figure 4 is a schematic diagram of a lamp assembly according to an embodiment of the present invention;

[0065] Figure 5 is a flow chart of a control method for an exposure device according to an embodiment of the present invention;

[0066] Figure 6A flowchart of determining the relative position of the reverse pattern relative to the actual position of the marking point of the reverse pattern according to the offset of the auxiliary light assembly according to one embodiment of the present invention;

[0067] Figure 7 A flowchart of determining the relative position of the reverse pattern relative to the actual position of the marking point of the reverse pattern according to the offset of the auxiliary light assembly according to another embodiment of the present invention;

[0068] In the figure:

[0069] 100-exposure device; 1-workbench; 2-marking light assembly; 21-marking light; 3-motion assembly; 4-exposure assembly; 5-visual assembly; 6-auxiliary light assembly; 61-auxiliary light; 7-workpiece to be exposed; 8-light assembly. DETAILED DESCRIPTION

[0070] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. It is to be understood that the specific embodiments described herein are only used to explain the present application, rather than to limit the present application. It should also be noted that, for ease of description, only some structures related to the present application are shown in the accompanying drawings, rather than all structures. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application.

[0071] The terms "including" and "having" and any variations thereof in this application are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device comprising a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to these processes, methods, products or devices.

[0072] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0073] like Figure 2As shown, the exposure device 100 of the present invention includes: a workbench 1, a plurality of marking light assemblies 2, a plurality of auxiliary light assemblies 6, a motion assembly 3, an exposure assembly 4 and a visual assembly 5. The workbench 1 includes a preset area for placing a workpiece 7 to be exposed. A plurality of marking light assemblies 2 are arranged in the preset area, and a plurality of auxiliary light assemblies 6 are arranged outside the preset area. When the workpiece 7 to be exposed is placed on the preset area, the workpiece 7 to be exposed will cover the marking light assembly 2, exposing the auxiliary light assembly 6. Each auxiliary light assembly 6 is arranged adjacent to the corresponding marking light assembly 2. Each marking light assembly 2 includes at least one marking light 21. When the workpiece 7 to be exposed is exposed from the front, the marking light assembly 2 covered by the workpiece 7 to be exposed forms a marking point on the reverse side of the workpiece 7 to be exposed. In one embodiment, a photosensitive material is coated on the workpiece 7 to be exposed. After the marking light 21 is irradiated on the workpiece 7 to be exposed, the photosensitive material reacts with the light emitted by the marking light 21, leaving a marking point on the workpiece 7 to be exposed. Each auxiliary light assembly 6 corresponds to each marker light assembly 2 , and each auxiliary light assembly 6 includes an auxiliary light 61 corresponding to each marker light 21 of the corresponding marker light assembly 2 .

[0074] The motion component 3 can move relative to the workbench 1. The visual component 5 and the exposure component 4 are arranged on the motion component 3 and can move relative to the motion component 3. The visual component 5 is used to identify the positions of the marking light 21 and the auxiliary light 61 relative to the workbench 1. The exposure component 4 is used to expose the front and back sides of the workpiece 7 to be exposed. Specifically, the exposure component 4 is driven by the motion component 3 and itself according to the position information, moves to the corresponding position, and exposes a pattern corresponding to the position information on the workpiece 7 to be exposed. Therefore, in order to accurately align the front and back patterns of the workpiece to be exposed, after the front pattern is exposed, the position information of the back pattern exposure needs to be accurately calculated, especially after the operator manually turns over the workpiece 7 to be exposed, the placement position cannot be accurately controlled.

[0075] When the exposure device 100 starts the exposure work, the operator usually provides the exposure device with the position information of the front pattern and the back pattern relative to the workbench. Since the position of the pattern on the workpiece 7 to be exposed does not need to be very accurate, the front pattern is exposed immediately after the workpiece 7 to be exposed is placed. At the same time as the front exposure is completed, the marking light assembly 2 illuminates the marking point on the back. At this time, the position relationship of the front pattern relative to the back marking point has been determined, and even if the workpiece 7 to be exposed is turned over, the position relationship will not change. At this time, the position information of the back pattern relative to the workbench 1 is converted into the position information of the back pattern relative to the marking point, so that after obtaining the position of the marking point, the back pattern aligned with the front pattern can be accurately exposed.

[0076] One feasible method is to convert the reference system, that is, after obtaining the position of the marker light 21, convert the position information of the reverse pattern relative to the workbench 1 into the position information of the reverse pattern relative to the marker light 21. Since the positions of the marker light 21 and the marking point correspond to each other, after the workpiece 7 to be exposed is turned over, it can be further converted into the position information of the reverse pattern relative to the marking point. It can be seen that if the position of the marker light 21 is offset after the position of the marker light 21 is obtained, and the position information of the reverse pattern relative to the marker light 21 is not updated, the relative position of the front pattern and the reverse pattern will be offset.

[0077] In this solution, an auxiliary light 61 corresponding to the marker light 21 is provided. Since the auxiliary light assembly 6 is provided outside the preset area, when the workpiece 7 to be exposed is placed in the preset area for exposure, the workpiece 7 to be exposed will never block the auxiliary light assembly 6, and the position of the auxiliary light assembly 6 relative to the workbench 1 can always be recognized by the visual assembly 5. At the same time, each auxiliary light assembly 6 is provided adjacent to the corresponding marker light assembly 2, so each auxiliary light assembly 6 and the corresponding marker light assembly 2 can be approximately regarded as having the same motion state and producing the same offset. Therefore, the offset of the corresponding marker light assembly 2 can be inferred based on the offset of the auxiliary light assembly 6.

[0078] Structurally, the auxiliary light assembly 6 and the marker light assembly 2 can be two components assembled separately. In order to make the offset of the auxiliary light assembly 6 and the marker light assembly 2 more similar, the auxiliary light assembly 6 and the marker light assembly can be two light sources assembled into one, or two beams of the same light source.

[0079] Specifically, the exposure process of the exposure device 100 of the present invention is as follows: First, after the exposure device 100 of the present invention is turned on and before the workpiece 7 to be exposed is placed, the visual component 5 identifies the initial position of each marking light component 2 and the auxiliary light component 6 relative to the workbench 1. Secondly, the workpiece 7 to be exposed is placed in the preset area, and the exposure component 4 is driven by the motion component 3 to expose the front pattern according to the positional relationship of the front pattern relative to the workbench 1. At the same time, since the visual component 5 is also driven by the motion component 3, when the visual component 5 moves to the vicinity of the auxiliary light component 6, the current position of the auxiliary light component 6 is identified. Since the marking light 21 is covered by the workpiece 7 to be exposed, the marking light 21 forms a marking point on the reverse side of the workpiece 7 to be exposed. Thirdly, after the workpiece 7 to be exposed is turned over, the visual component 5 identifies the actual position of the marking point. The offset of the auxiliary light component 6 is determined according to the initial position of the auxiliary light component 6 and the current position of the auxiliary light component 6, and the offset is approximately regarded as the offset of the marking light component 2, and then the relative position of the reverse pattern relative to the actual position of the marking point is determined.

[0080] Through the above arrangement, when exposing the workpiece 7 to be exposed, there is no need to stop the exposure process and re-identify the position of the marking light assembly 2 relative to the workbench 1. Instead, the actual position of the marking point is directly corrected according to the offset of the auxiliary light assembly 6, thereby ensuring the registration of the patterns on the front and back sides of the workpiece 7 to be exposed, thereby improving production efficiency.

[0081] In one embodiment, at least three of the multiple marking light assemblies 2 are not in the same straight line. At least three of the multiple auxiliary light assemblies 6 are not in the same straight line. Since the auxiliary light assemblies 6 and the marking light assemblies 2 are not in the same straight line, a complete two-dimensional coordinate system can be established, and the relative position of the reverse exposure pattern can be determined more accurately using the two-dimensional coordinate system as a reference system.

[0082] In one embodiment, each auxiliary lamp assembly 6 includes at least three auxiliary lamps 61. By providing three auxiliary lamps 61, more data support can be provided when determining the offset of the auxiliary lamp assembly 6, thereby ensuring that the offset of the auxiliary lamp assembly 6 is determined more accurately.

[0083] In one embodiment, the auxiliary lights 61 in the same auxiliary light assembly 6 are not located on the same straight line. Since the auxiliary lights 61 are not located on the same straight line, it is convenient to identify the position change of the auxiliary lights 61 to determine whether the auxiliary lights 61 have undergone various types of displacements, such as lateral displacement, vertical displacement, arc displacement, expansion, and contraction.

[0084] For example, in Figure 3 In the illustrated embodiment, each auxiliary light assembly 6 includes five auxiliary lights 61, wherein four auxiliary lights 61 are arranged around one auxiliary light 61 in the center. Here, the peripheral auxiliary lights 61 can be arranged to be at the same distance from the central auxiliary light 61. Of course, in other embodiments not shown, the number of peripheral auxiliary lights 61 can be more or less, which is not limited here. According to this arrangement, whether each group of auxiliary lights 61 is offset or expanded, it can be clearly captured by the visual component 5.

[0085] To ensure that the marking point can always mark the workpiece 7 to be exposed and the auxiliary light 61 can always be recognized by the visual component 5. When the workpiece 7 to be exposed is placed on the workbench 1, the workpiece 7 to be exposed covers the marking light 21 and exposes the auxiliary light 61.

[0086] In one embodiment, a barrier member (not shown) is provided on the side of the auxiliary light assembly 6 close to the opposite marking light assembly 2. By providing the barrier member, it is prevented that the workpiece 7 to be exposed blocks the auxiliary light 61 due to system failure or operator error. In another embodiment, the preset area for placing the workpiece 7 to be exposed can also be set as a groove, the workpiece 7 to be exposed can be placed in the groove, and multiple auxiliary light assemblies 6 are arranged on the outer edge of the groove.

[0087] Regarding the installation method of the visual component 5 and the exposure component 4, in one embodiment, Figure 2 As shown, the motion component 3 is a gantry bracket arranged on the workbench 1, and the gantry bracket can move along the second direction (direction b in the figure) on the workbench 1. The visual component 5 and the exposure component 4 are installed on the gantry bracket and can move along the first direction (direction a in the figure) perpendicular to the second direction.

[0088] In another embodiment, if Figure 4 As shown, the exposure device 100 includes: a workbench 1, a plurality of lamp assemblies 8, a motion assembly 3, a visual assembly 5 and an exposure assembly 4.

[0089] The workbench 1 includes a preset area for placing a workpiece 7 to be exposed. Each of the multiple lamp assemblies 8 includes a marking lamp assembly 2 and an auxiliary lamp assembly 6. The marking lamp assembly 2 is arranged in the preset area, and the auxiliary lamp assembly 6 is arranged outside the preset area. Each marking lamp assembly 2 includes at least one marking lamp 21. The marking lamp 21 is used to form a marking point on the reverse side of the workpiece 7 to be exposed when the workpiece 7 to be exposed is exposed from the front. Each auxiliary lamp assembly 6 includes at least one auxiliary lamp 61. The auxiliary lamp assembly 6 is arranged adjacent to the marking lamp assembly 2, so that the auxiliary lamp assembly 6 corresponds to the marking lamp assembly 2. The motion assembly 3 can move relative to the workbench 1. The visual assembly 5 and the exposure assembly 4 are arranged on the motion assembly 3 and can move relative to the motion assembly 3. Among them, the visual assembly 5 is used to identify the positions of the marking lamp 21 and the auxiliary lamp 61 relative to the workbench 1, and the exposure assembly 4 is used to expose the front and back sides of the workpiece 7 to be exposed.

[0090] In the exposure device 100 of the present invention, since the auxiliary lamp assembly 6 and the marking lamp assembly 2 in each lamp assembly 8 are arranged adjacent to each other, the offset of the auxiliary lamp assembly 6 is substantially consistent with the offset of the marking lamp assembly 2 in the same lamp assembly 8.

[0091] The exposure process of the present invention is as follows: after the exposure device 100 is turned on and before the device 100 to be exposed is placed, the visual component 5 identifies the initial positions of the auxiliary light component 6 and the marking light component 2 relative to the workbench 1. Then the workpiece 7 to be exposed is placed in a preset area for exposure of the front pattern, and the marking light component 2 marks a mark point on the back of the workpiece 7 to be exposed while the visual component 5 identifies the current position of the auxiliary light component 6. Then the workpiece 7 to be exposed is turned over, and the visual component 5 identifies the actual position of the mark point, and then the offset of the auxiliary light component 6 is determined by the initial position of the auxiliary light component 6 and the current position of the auxiliary light component 6, and then the relative position of the back pattern relative to the actual position of the mark point is determined.

[0092] During the exposure process, the exposure device 100 of the present invention does not need to stop the exposure process, and can directly calculate the relative position of the reverse pattern relative to the actual position of the marking point based on the offset of the auxiliary light assembly 6, thereby improving the production efficiency of the product.

[0093] In one embodiment, the plurality of lamp assemblies 8 are not located on the same straight line. By arranging the plurality of lamp assemblies 8 to be not located on the same straight line, a complete two-dimensional coordinate system can be established, and the relative position of the reverse pattern can be determined more accurately using the two-dimensional coordinate system as a reference system.

[0094] In one embodiment, each auxiliary lamp assembly 6 includes at least three auxiliary lamps 61. By providing three auxiliary lamps 61, more data support can be provided when determining the offset of the auxiliary lamp assembly 6, ensuring that the offset of the auxiliary lamp 61 is determined more accurately.

[0095] In one embodiment, the plurality of auxiliary lights 61 are not located on the same straight line. Therefore, the change in the position of the auxiliary light 61 can be used to easily identify the type of displacement of the auxiliary light 61, such as lateral displacement, vertical displacement, arc displacement, expansion, contraction, etc.

[0096] For example, in Figure 3 In the illustrated embodiment, each auxiliary light assembly 6 includes five auxiliary lights 61, of which four auxiliary lights 61 are arranged around one auxiliary light 61 in the center. Here, the surrounding auxiliary lights 61 can be arranged to be at the same distance from the central auxiliary light 61. Of course, in other embodiments not shown, the number of surrounding auxiliary lights 61 can be more or less, which is not limited here. According to this arrangement, whether the auxiliary lights 61 in each group of auxiliary light assemblies 6 are offset or expanded, they can be clearly captured by the visual component 5.

[0097] To ensure that the marking point can always mark the workpiece 7 to be exposed and the auxiliary light 61 can always be recognized by the visual component 5, when the workpiece 7 to be exposed is placed on the workbench 1, the workpiece 7 to be exposed covers the marking light 21 and exposes the auxiliary light 61.

[0098] In one embodiment, a barrier member (not shown) is provided on the side of the auxiliary light assembly 6 close to the opposite marking light assembly 2. By providing the barrier member, it is prevented that the workpiece 7 to be exposed blocks the auxiliary light 61 due to system failure or operator error. In another embodiment, the preset area for placing the workpiece 7 to be exposed can also be set as a groove, the workpiece 7 to be exposed can be placed in the groove, and multiple auxiliary light assemblies 6 are arranged on the outer edge of the groove.

[0099] Regarding the installation method of the visual component 5 and the exposure component 4, in one embodiment, Figure 2 As shown, the motion component 3 is a gantry bracket arranged on the workbench 1, and the gantry bracket can move along the second direction (direction b in the figure) on the workbench 1. The visual component 5 and the exposure component 4 are installed on the gantry bracket and can move along the first direction (direction a in the figure) perpendicular to the second direction. In other embodiments, the visual component 5 and the exposure component 4 can also be fixed in other ways, which will not be repeated here.

[0100] The present invention also provides a control method for the exposure device 100, the control method comprising:

[0101] Step S100 : When no workpiece 7 to be exposed is placed, the visual component 5 is controlled to identify the initial position of each marking light component 2 relative to the workbench 1 and the initial position of each auxiliary light component 6 relative to the workbench 1 .

[0102] In S100, the visual component 5 is located on the side of the motion component 3 that is closer to the marker light component 2. The motion component 3 drives the visual component 5 to move relative to the workbench 1, and stops when it is close to the marker light component 2 and the auxiliary light component 6. The visual component 5 moves along the motion component 3, and stops when it moves to the marker light component 2 to identify the position of the marker light component 2, and stops when it moves to the auxiliary light component 6 to identify the position of the auxiliary light component 6.

[0103] Step S200: When the workpiece 7 to be exposed is subjected to front pattern exposure, the visual component 5 is controlled to identify the current position of each auxiliary light component 6 relative to the workbench 1, and at the same time, a marking point is formed on the reverse side of the workpiece 7 to be exposed.

[0104] In S200, the motion component 3 drives the exposure component 4 and the vision component 5 to perform stepping motion, the exposure component 4 performs scanning motion to expose the front side of the workpiece 7 to be exposed, and the vision component 5 stops when it moves to the auxiliary light component 6 to identify the position of the auxiliary light component 6.

[0105] Step S300: determining the offset of the auxiliary light assembly 6 according to the current position of the auxiliary light assembly 6 and the initial position of the auxiliary light 61;

[0106] Step S400: After the workpiece 7 to be exposed is turned over, the visual component 5 is controlled to identify the actual position of each marking point on the reverse side;

[0107] In S400, the workpiece 7 to be exposed is turned over, and the motion component 3 drives the visual component 5 to move relative to the workbench 1. The visual component 5 moves along the motion component 3, and stops when the visual component 5 moves to the marking point to identify the position of the marking point.

[0108] As shown in the figure, since part of the marking light assembly 2 is set on the left side, after the workpiece 7 to be exposed is turned over, the marking point position will be in the middle or on the right side of the workbench 1. Therefore, when the moving assembly 3 moves, the initial position of the visual assembly 5 can be in the middle right position, which is convenient for quick identification of the marking point.

[0109] Step S500: determining the relative position of the reverse pattern relative to the actual position of each marking point according to the offset of the auxiliary light assembly 6;

[0110] Step S600: the exposure component 4 exposes the back surface according to the relative positions of the back surface patterns.

[0111] In S600 , the motion component 3 drives the exposure component 4 to perform stepping motion, and the exposure component 4 performs scanning motion along the motion component 3 to expose the reverse side pattern of the workpiece 7 to be exposed.

[0112] Further, step S200 includes the following steps:

[0113] Step S210: When performing front pattern exposure, the exposure component 4 and the visual component 5 move relative to the workbench 1 along the first direction ( Figure 2 The visual component 5 is located on the side of the motion component 3 close to the auxiliary light component 6, and the motion component 3 drives the exposure component 4 and the visual component 5 to move along the second direction ( Figure 2 b) movement, the first direction and the second direction are perpendicular;

[0114] Step S220: When the motion component 3 moves to a position close to the auxiliary light component 6, the visual component 5 identifies the current position of the auxiliary light component 6;

[0115] Step S230: When the front pattern exposure is completed, the motion component 3 stops moving, and the visual component 5 moves along the first direction until the auxiliary light component 6 is recognized.

[0116] Since the auxiliary lamp assembly 6 is not on the same straight line, Figure 2As shown in , there are two auxiliary light assemblies 6 located on the left side of the workbench, so at least one auxiliary light assembly 6 is located in the middle or right side of the workbench 1. When the motion assembly 3 moves down from top to bottom along the b direction, the visual assembly 5 will be on the left side of the motion assembly 3 in order to identify the auxiliary light assembly 6. Therefore, after the exposure is completed, the motion assembly 3 needs to stop moving, and the visual assembly 5 moves to the right along the a direction until the other auxiliary light assembly 6 is identified.

[0117] Step S300 includes:

[0118] Step S310: determining the offset mode and offset amount of the auxiliary lamp assembly 6, wherein the offset mode includes one or more of lateral offset, vertical offset, arc offset, expansion and contraction.

[0119] Step S500 includes:

[0120] Step S510: determining the actual position of the marker light assembly 2 according to the offset of the auxiliary light assembly 6;

[0121] Step S520: determining the relative position of the reverse pattern relative to the actual position of the marker light assembly 2 according to the actual position of the marker light assembly 2;

[0122] Step S530: Determine the relative position of the reverse pattern relative to the actual position of each marking point according to the relative position of the reverse pattern relative to the actual position of the marking light assembly 2 .

[0123] In another embodiment, step S500 includes:

[0124] Step S502: correcting the actual position of each marking point on the back according to the offset of the auxiliary light assembly 6, determining the corrected position of each marking point, and determining the relative position of the back pattern relative to the corrected position of each marking point according to the corrected position.

[0125] Use Figure 5 The control method shown can ensure that the relative position relationship between the exposure patterns on the front and back sides is always at a certain value and meets product requirements when exposing the front and back sides of the exposure workpiece 7 without interrupting the test process, while improving the production efficiency of the product without stopping the exposure process.

[0126] like Figure 6 The control method shown, after obtaining the offset of the auxiliary light assembly 6, determines the actual position of the marking light assembly 2 according to the offset of the auxiliary light assembly 6, and then determines the relative position of the reverse pattern relative to the actual position of the marking light assembly 2 according to the actual position of the marking light assembly 2, and finally determines the relative position of the reverse pattern relative to the actual position of each marking point.

[0127] like Figure 7 The control method shown corrects the actual position of the reverse marking point according to the offset of the auxiliary light assembly 6, and after determining the corrected position of the marking point, determines the relative position of the reverse pattern relative to the corrected position of each marking point based on the corrected position.

[0128] like Figure 6 and Figure 7 Both methods can determine the relative position of the reverse pattern relative to the actual position of the marking point, but the data obtained by the two methods are different, and can be freely selected according to actual conditions.

[0129] The above-mentioned embodiments only express several implementation methods of the present invention, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. An exposure device, characterized in that: include: A workbench, including a preset area for placing a workpiece to be exposed; A plurality of marking light assemblies are arranged in the preset area, each of the marking light assemblies comprises at least one marking light, and the marking light is used to form a marking point on the reverse side of the workpiece to be exposed when the workpiece to be exposed is exposed from the front side; A plurality of auxiliary light assemblies, all arranged outside the preset area, each of the auxiliary light assemblies corresponding to each of the marker light assemblies, each of the auxiliary light assemblies being arranged adjacent to the corresponding marker light assemblies, and each of the auxiliary light assemblies comprising an auxiliary light corresponding to each of the marker lights of the marker light assemblies corresponding thereto; A motion component, capable of moving relative to the workbench; A visual component, disposed on the motion component, for identifying the positions of the marker light and the auxiliary light; and The exposure assembly is arranged on the moving assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

2. The exposure device according to claim 1, characterized in that Among the multiple marking light assemblies, at least three are not in the same straight line; among the multiple auxiliary light assemblies, at least three are not in the same straight line.

3. The exposure device according to claim 1, characterized in that Each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

4. The exposure device according to claim 3, characterized in that The plurality of auxiliary lamps in each auxiliary lamp assembly are not located on the same straight line.

5. The exposure device according to claim 1, characterized in that When the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

6. The exposure device according to claim 1, characterized in that A barrier member is provided on one side of the auxiliary light assembly close to the marking light assembly.

7. An exposure device, characterized in that: include: A workbench, including a preset area for placing a workpiece to be exposed; A plurality of lamp assemblies, each of which includes a marking lamp assembly and an auxiliary lamp assembly, wherein the marking lamp assembly is arranged in the preset area, and the auxiliary lamp assembly is arranged outside the preset area, and each of the marking lamp assemblies includes at least one marking lamp, and the marking lamp is used to form a marking point on the reverse side of the workpiece to be exposed when the workpiece to be exposed is exposed from the front side, and each of the auxiliary lamp assemblies includes at least one auxiliary lamp, and the auxiliary lamp assembly in each lamp assembly is arranged adjacent to the marking lamp assembly in the lamp assembly, so that the auxiliary lamp assembly corresponds to the marking lamp assembly; A motion component, capable of moving relative to the workbench; A visual component, disposed on the motion component, for identifying the positions of the marker light and the auxiliary light; and The exposure assembly is arranged on the moving assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

8. The exposure device according to claim 7, characterized in that The plurality of lamp assemblies are not located on the same straight line.

9. The exposure device according to claim 7, characterized in that Each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

10. The exposure device according to claim 9, characterized in that The plurality of auxiliary lamps in each auxiliary lamp assembly are not on the same straight line.

11. The exposure device according to claim 7, characterized in that: When the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

12. The exposure device according to claim 7, characterized in that A barrier member is provided on one side of the auxiliary light assembly close to the marking light assembly.

13. A control method for the exposure device according to any one of claims 1 to 6, characterized in that: include: When the workpiece to be exposed is not placed, the visual component is controlled to identify the initial position of each of the marking light components relative to the workbench and the initial position of each of the auxiliary light components relative to the workbench; When the workpiece to be exposed is subjected to front pattern exposure, the visual component is controlled to identify the current position of each of the auxiliary light components, and a marking point is formed on the reverse side of the workpiece to be exposed; determining an offset of the auxiliary light assembly according to a current position of the auxiliary light assembly and an initial position of the auxiliary light; After the workpiece to be exposed is turned over, controlling the visual component to identify the actual position of each of the marking points on the reverse side; Determining the relative position of the reverse pattern relative to the actual position of each of the marking points according to the offset of the auxiliary light assembly; The exposure component exposes the back surface according to the relative positions of the back surface patterns.

14. The method for controlling an exposure device according to claim 13, wherein: When the exposure workpiece is subjected to front pattern exposure, the visual component is controlled to identify the current position of each of the auxiliary light components, including: When performing front pattern exposure, the exposure component and the visual component move relative to the workbench along a first direction, the visual component is located on a side of the motion component close to the auxiliary light component, and the motion component drives the exposure component and the visual component to move along a second direction, and the first direction is perpendicular to the second direction; When the motion component moves to a position close to the auxiliary light assembly, the vision component recognizes the current position of the auxiliary light assembly.

15. The method for controlling an exposure device according to claim 14, wherein: When the exposure workpiece is subjected to front pattern exposure, the visual component is controlled to identify the current position of each of the auxiliary light components, including: When the front pattern exposure is completed, the motion component stops moving, and the visual component moves along the first direction until the auxiliary light component is recognized.

16. The method for controlling an exposure device according to claim 13, wherein: Determining the offset of the auxiliary lamp assembly according to the current position of the auxiliary lamp assembly and the initial position of the auxiliary lamp comprises: Determining an offset mode and an offset amount of the auxiliary light assembly; The offset mode includes one or more of lateral offset, vertical offset, arc offset, expansion and contraction.

17. The method for controlling an exposure device according to claim 13, wherein: Determining the relative position of the reverse pattern relative to the actual position of each of the marking points according to the offset of the auxiliary light assembly includes: determining the actual position of the marker light assembly based on the offset of the auxiliary light assembly; Determining the relative position of the reverse pattern relative to the actual position of the marker light assembly according to the actual position of the marker light assembly; According to the relative position of the reverse pattern relative to the actual position of the marking light assembly, the relative position of the reverse pattern relative to the actual position of each marking point is determined.

18. The method for controlling an exposure device according to claim 13, wherein: Determining the relative position of the reverse pattern relative to the actual position of each of the marking points according to the offset of the auxiliary light assembly includes: The actual position of each of the marking points on the reverse side is corrected according to the offset of the auxiliary light assembly, the corrected position of each of the marking points is determined, and the relative position of the reverse pattern relative to the corrected position of each of the marking points is determined according to the corrected position.

19. A control method for the exposure device according to any one of claims 1 to 6, characterized in that: include: The motion component drives the visual component to move relative to the workbench, and stops when approaching the marking light component and the auxiliary light component. The visual component moves along the motion component, stops when moving to the marking light component, identifies the position of the marking light component, and stops when moving to the auxiliary light component, identifies the position of the auxiliary light component; The motion component drives the exposure component and the visual component to perform stepping motion, the exposure component performs scanning motion to expose the front side of the workpiece to be exposed, the visual component stops when it moves to the auxiliary light component, identifies the position of the auxiliary light component, and the marking light component illuminates the reverse side of the workpiece to be exposed to form a marking point; The workpiece to be exposed is turned over, the motion component drives the visual component to move relative to the workbench, the visual component moves along the motion component, and the visual component stops when it moves to the marking point to identify the position of the marking point; The motion component drives the exposure component to perform stepping motion, and the exposure component performs scanning motion along the motion component to expose the reverse side pattern of the workpiece to be exposed.

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