Flow path system for exhaust gas to harm removal reactor

Abstract

Provided is a flow path system for exhaust gas to a deinsectization reactor, which can prevent leakage of the exhaust gas sent to the deinsectization reactor and ensure safety. The flow path system is provided with: an exhaust gas transfer pipe (5) for transferring exhaust gas to the disinfection reactor (2); a first two-way valve (7) attached to the exhaust gas transfer pipe (5); a bypass pipe (10) branched from the exhaust gas transfer pipe (5) at a position on the upstream side of the first two-way valve (7) and bypassing the disinfection reactor (2); and a second two-way valve (12) attached to the bypass pipe (10). The first two-way valve (7) and the second two-way valve (12) are in a longitudinally placed state in which the flow paths (15, 16) of the exhaust gas extend in the longitudinal direction.

Description

Technical Field

[0001] The present invention relates to a flow path system for transferring waste gas discharged from a processing chamber of a semiconductor manufacturing device such as an etching device and a CVD device to a detoxification reactor, and in particular to a flow path system with a flow path switching function. Background Art

[0002] In the semiconductor manufacturing process of manufacturing semiconductor devices, liquid crystal panels, LEDs, etc., the processing gas is introduced into a vacuum processing chamber to perform various processes such as etching and CVD. The processing chamber and the exhaust system equipment connected to the processing chamber are regularly cleaned by passing clean gas. These processing gases, clean gases and other waste gases contain silane-based gases, halogen gases, PFC gases, etc., which may have adverse effects on the human body or become the cause of global warming and have adverse effects on the earth's environment. They cannot be released directly into the atmosphere. Therefore, these waste gases are released into the atmosphere after being detoxified by a detoxification reactor arranged on the downstream side of the semiconductor manufacturing device.

[0003] Figure 8 Schematic diagram showing an example of a flow path system for conveying waste gas from a processing chamber of a semiconductor manufacturing device to a harm removal reactor. Waste gas such as a processing gas and a cleaning gas is discharged from a processing chamber 400 through a vacuum pump (not shown) and is conveyed to a harm removal reactor 510 through a waste gas transfer pipe 500. A three-way valve 501 composed of a ball valve is arranged on the waste gas transfer pipe 500. The inlet 505 and the first outlet 506 of the three-way valve 501 are connected to the waste gas transfer pipe 500, and the second outlet 507 of the three-way valve 501 is connected to a bypass pipe 502 that bypasses the harm removal reactor 510. The valve core 508 of the three-way valve 501 operates in a manner that the inlet 505 is connected to either the first outlet 506 or the second outlet 507.

[0004] When the pest control reactor 510 operates normally, Figure 8 As shown, the inlet 505 of the three-way valve 501 is communicated with the first outlet 506, and the waste gas is sent to the harm removal reactor 510 through the three-way valve 501. On the other hand, when a serious failure occurs in the harm removal reactor 510 or when the harm removal reactor 510 stops, as shown in FIG. Fig. 9 As shown, the valve core 508 of the three-way valve 501 is operated to cut off the communication between the inlet 505 and the first outlet 506 of the three-way valve 501, and on the other hand, the inlet 505 is connected to the second outlet 507. As a result, the exhaust gas is not sent to the detoxification reactor 510, but is sent to the bypass pipe 502.

[0005] Prior art literature

[0006] Patent Literature

[0007] Patent Document 1: Japanese Patent Application Publication No. 2022-170680

[0008] Technical problem to be solved by the invention

[0009] Processing gases and cleaning gases used in semiconductor manufacturing processes sometimes form powders (such as SiO2) as sublimable products. When powders in the exhaust gas accumulate on the valve core 508 of the three-way valve 501, the valve core 508 of the three-way valve 501 sometimes fails to operate normally, or the sealing of the three-way valve 501 is impaired. In particular, when the valve core 508 rotates, the flow path formed in the valve core 508 passes through the sealing surface, so the powder is easily sandwiched between the valve core 508 and the sealing surface, and there is a concern that the sealing will be lost. As a result, there is a concern that part of the exhaust gas is not sent to the detoxification reactor 510, but is released into the atmosphere through the bypass pipe 502.

[0010] In order to prevent the accumulation of sublimable products, a jacket heater is installed on the three-way valve 501 to raise the temperature inside the three-way valve 501 to a temperature higher than the sublimation temperature (e.g., 200° C.). However, the temperature change between the high temperature higher than the sublimation temperature and the normal temperature may cause the resin or rubber sealing components of the three-way valve 501 to shrink due to the heat history, and the necessary sealing surface pressure may not be ensured, resulting in leakage of exhaust gas. Summary of the invention

[0011] Therefore, the present invention provides a flow path system capable of preventing leakage of exhaust gas sent to a detoxification reactor and ensuring safety.

[0012] Technical means for solving technical problems

[0013] In one embodiment, a flow path system is provided, comprising: an exhaust gas transfer pipe, which is used to transfer exhaust gas to a harm removal reactor; a first two-way valve, which is installed on the exhaust gas transfer pipe; a bypass pipe, which branches from the exhaust gas transfer pipe at a position on the upstream side of the first two-way valve to bypass the harm removal reactor; and a second two-way valve, which is installed on the bypass pipe, and the first two-way valve and the second two-way valve are placed in a longitudinal position so that the flow path of the exhaust gas extends in the longitudinal direction.

[0014] In one embodiment, the exhaust gas transfer pipe has a longitudinal section extending in the longitudinal direction, the bypass pipe has an ascending section extending upward, the first two-way valve is arranged in the longitudinal section, and the second two-way valve is arranged in the ascending section.

[0015] In one embodiment, the second two-way valve is located at a higher position than the first two-way valve.

[0016] In one embodiment, the flow path system further includes an inert gas supply line that supplies inert gas into the bypass pipe, and the inert gas supply line is connected to the bypass pipe at a position below the second two-way valve.

[0017] In one embodiment, the flow channel system further includes a heating device configured to heat the inert gas in the inert gas supply line.

[0018] In one embodiment, the first two-way valve and the second two-way valve are respectively ball valves.

[0019] Effects of the Invention

[0020] According to the present invention, a combination of a first two-way valve and a second two-way valve is used instead of a three-way valve. Since the first two-way valve and the second two-way valve are placed in a longitudinal direction with the flow path of the exhaust gas extending in the longitudinal direction, powder (e.g., SiO2) in the exhaust gas is difficult to accumulate in the first two-way valve and the second two-way valve, and the normal operation of the first two-way valve and the second two-way valve can be maintained. In particular, powder in the exhaust gas is difficult to reach the second two-way valve. As a result, leakage of the exhaust gas from the first two-way valve and the second two-way valve can be prevented and safety can be ensured. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 The present invention is a schematic diagram showing one embodiment of a flow system for conveying exhaust gas from a processing chamber of a semiconductor manufacturing apparatus to a detoxification reactor.

[0022] Figure 2 It is a cross-sectional view showing one embodiment of the first two-way valve.

[0023] Figure 3 It is a cross-sectional view showing a state where the first two-way valve is closed.

[0024] Figure 4 It is a schematic diagram showing another embodiment of the flow path system.

[0025] Figure 5 It is a schematic diagram showing still another embodiment of the flow path system.

[0026] Figure 6 It is a schematic diagram showing still another embodiment of the flow path system.

[0027] Figure 7 It is a schematic diagram showing still another embodiment of the flow path system.

[0028] Figure 8 This is a schematic diagram showing a conventional example of a flow path system for conveying exhaust gas from a processing chamber of a semiconductor manufacturing apparatus to a detoxification reactor.

[0029] Fig. 9 This is a diagram showing a state where the three-way valve is operated and the exhaust gas is sent to the bypass pipe.

[0030] Explanation of symbols

[0031] 1Processing chamber

[0032] 2 Pest control reactor

[0033] 5 Exhaust gas transfer pipe

[0034] 5A vertical section

[0035] 5B upstream section

[0036] 7First two-way valve

[0037] 10Bypass pipe

[0038] 10A rising range

[0039] 10B connection interval

[0040] 12 Second two-way valve

[0041] 15First flow path

[0042] 16 Second flow path

[0043] 21 entrance

[0044] 22Exit

[0045] 24 entrances

[0046] 25Exit

[0047] 31 valve housing

[0048] 33 valve core

[0049] 35 Sealing parts

[0050] 36 Sealing surface

[0051] 37 Rotation axis

[0052] 39 Movable flow path

[0053] 40 Inert gas supply line

[0054] 41 Heating device. DETAILED DESCRIPTION

[0055] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0056] Figure 1The present invention is a schematic diagram showing an embodiment of a flow path system for conveying exhaust gas from a processing chamber of a semiconductor manufacturing device to a detoxification reactor. Examples of processing chambers include processing chambers provided in semiconductor manufacturing devices such as etching devices and CVD devices.

[0057] like Figure 1 As shown, waste gas such as processing gas and cleaning gas is discharged from the processing chamber 1 by a vacuum pump not shown, and is sent to the harm removal reactor 2 through a flow path system. The harm removal reactor 2 is configured to make the waste gas harmless. As examples of the harm removal reactor 2, a combustion type harm removal reactor, a thermal plasma type harm removal reactor and a heater type harm removal reactor can be listed.

[0058] The flow path system includes: an exhaust gas transfer pipe 5 for transferring the exhaust gas discharged from the treatment chamber 1 to the harm removal reactor 2, a first two-way valve 7 installed on the exhaust gas transfer pipe 5, a bypass pipe 10 branching from the exhaust gas transfer pipe 5 at a position on the upstream side of the first two-way valve 7 and bypassing the harm removal reactor 2, and a second two-way valve 12 installed on the bypass pipe 10. In the harm removal treatment of the exhaust gas, the first two-way valve 7 is opened and the second two-way valve 12 is closed. Therefore, the exhaust gas is sent to the harm removal reactor 2 through the first two-way valve 7. In the case of a serious failure of the harm removal reactor 2, or in the case of the operation of the harm removal reactor 2 being stopped due to an unexpected situation, the first two-way valve 7 is closed and the second two-way valve 12 is opened. In this case, the exhaust gas flows through the bypass pipe 10 and the second two-way valve 12.

[0059] The first two-way valve 7 and the second two-way valve 12 are opening and closing valves having one inlet and one outlet, respectively. The first two-way valve 7 and the second two-way valve 12 are configured to be placed longitudinally with the flow path formed therein extending longitudinally. That is, the first two-way valve 7 has a first flow path 15 for exhaust gas to flow therein, and the first flow path 15 extends longitudinally. The second two-way valve 12 has a second flow path 16 for exhaust gas to flow therein, and the second flow path 16 extends longitudinally. In this specification, "longitudinal" includes a direction within an angle range of 0 to 45 degrees relative to the vertical direction, and the direction with an angle of 0 degrees is the vertical direction.

[0060] exist Figure 1 In the embodiment shown, the first flow path 15 of the first two-way valve 7 extends in the vertical direction. The first two-way valve 7 has an inlet 21 and an outlet 22 for exhaust gas, and the inlet 21 is located above the outlet 22. The exhaust gas transfer pipe 5 has a longitudinal section 5A extending in the longitudinal direction, and the first two-way valve 7 is arranged in the longitudinal section 5A. In the embodiment, the longitudinal section 5A extends in the vertical direction.

[0061] The second flow path 16 of the second two-way valve 12 extends in the vertical direction. The second two-way valve 12 has an inlet 24 and an outlet 25 for exhaust gas, and the inlet 24 is located below the outlet 25. The bypass pipe 10 has a rising section 10A extending upward, and the second two-way valve 12 is arranged in the rising section 10A. In the present embodiment, the rising section 10A extends in the vertical direction. The bypass pipe 10 also has a connecting section 10B branching from the exhaust gas transfer pipe 5. One end of the connecting section 10B is connected to the exhaust gas transfer pipe 5, and the other end of the connecting section 10B is connected to the rising section 10A. Figure 1 In the illustrated embodiment, the connecting section 10B extends horizontally. In one embodiment, the connecting section 10B may extend obliquely upward or upward while bending from the exhaust gas transfer pipe 5 to the rising section 10A.

[0062] Since the first two-way valve 7 and the second two-way valve 12 are placed in the longitudinal direction with the exhaust gas flow paths 15 and 16 extending in the longitudinal direction, powder (e.g., SiO2) in the exhaust gas is difficult to accumulate in the first two-way valve 7 and the second two-way valve 12, and the first two-way valve 7 and the second two-way valve 12 can maintain normal operation. In particular, the second two-way valve 12 is located at a higher position than the first two-way valve 7 and is arranged in the ascending section 10A of the bypass pipe 10, so that powder is difficult to reach the second two-way valve 12.

[0063] The first two-way valve 7 and the second two-way valve 12 are ball valves. Figure 2 The first two-way valve 7 will be described. Figure 2 1 is a cross-sectional view showing an embodiment of the first two-way valve 7. Although not shown, the second two-way valve 12 also has the same basic structure as the first two-way valve 7, and therefore the following description is also applicable to the second two-way valve 12.

[0064] like Figure 2 As shown, the first two-way valve 7 includes: a valve housing 31 having a first flow path 15 inside thereof that allows the passage of exhaust gas; a spherical valve core 33 disposed in the valve housing 31; a sealing member 35 that closes a gap between the valve housing 31 and the valve core 33; and a rotating shaft 37 that rotates the valve core 33 in the valve housing 31. The rotating shaft 37 is connected to the valve core 33. The sealing member 35 has a sealing surface 36 that contacts the outer surface of the valve core 33.

[0065] The first two-way valve 7 has an inlet 21 and an outlet 22 for exhaust gas. The inlet 21 is formed by one end of the first flow path 15, and the outlet 22 is formed by the other end of the first flow path 15. The valve core 33 has a movable flow path 39 inside. When the valve core 33 is rotated by the rotating shaft 37, as shown in FIG. Figure 2As shown, the movable flow path 39 is connected to the first flow path 15, so that the exhaust gas can pass through the first two-way valve 7 through the first flow path 15 and the movable flow path 39. The first flow path 15 extends in the vertical direction L. Therefore, the powder as a by-product contained in the exhaust gas falls due to its gravity and is difficult to accumulate in the first two-way valve 7.

[0066] The rotating shaft 37 is connected to an actuator (not shown). The actuator can change the direction of the movable flow path 39 in the valve body 33 by rotating the rotating shaft 37, that is, can open and close the first two-way valve 7. Figure 2 This shows a state where the first two-way valve 7 is open.

[0067] Figure 3 2 is a diagram showing a state in which the first two-way valve 7 is closed. Figure 3 As shown in FIG. 1 , the rotating shaft 37 is rotated by an actuator (not shown) so that the communication between the movable flow path 39 in the valve element 33 and the first flow path 15 is cut off, thereby closing the first two-way valve 7. Figure 2 and Figure 3 It can be seen that when the valve core 33 rotates in the valve housing 31, the movable flow path 39 does not cross the sealing surface 36 of the sealing member 35. Therefore, powder in the exhaust gas is difficult to be sandwiched between the outer surface of the valve core 33 and the sealing surface 36. As a result, the smooth movement of the valve core 33 can be ensured, the sealing performance can be maintained, and the leakage of the exhaust gas can be prevented.

[0068] Reference Figure 2 and Figure 3 The above description is also applicable to the second two-way valve 12. Therefore, it is possible to ensure smooth operation of the valve element of the second two-way valve 12, maintain sealing performance, and prevent leakage of exhaust gas.

[0069] Figure 4 and Figure 5 Schematic diagram showing another embodiment of the flow path system. The structure and operation of this embodiment not specifically described are similar to those of the reference Figures 1 to 3 The above-described embodiments are the same, so repeated descriptions thereof are omitted. Figure 4 and Figure 5 As shown, the exhaust gas transfer pipe 5 and the bypass pipe 10 may also be composed of Y-shaped pipes.

[0070] exist Figure 4 In the embodiment shown, the upstream section 5B of the exhaust gas transfer pipe 5 extends obliquely, and the first two-way valve 7 is installed in the longitudinal section 5A extending in the vertical direction. The upstream section 5B is a part of the exhaust gas transfer pipe 5 and is located on the upstream side of the longitudinal section 5A. The bypass pipe 10 includes a connecting section 10B extending obliquely upward from the exhaust gas transfer pipe 5 and a rising section 10A extending in the vertical direction from the connecting section 10B. The second two-way valve 12 is installed in the rising section 10A. Figure 4In the illustrated embodiment, both the first two-way valve 7 and the second two-way valve 12 are arranged in a vertical posture. That is, the first flow path 15 of the first two-way valve 7 and the second flow path 16 of the second two-way valve 12 extend in the vertical direction.

[0071] exist Figure 5 In the embodiment shown, the structure and arrangement of the exhaust gas transfer pipe 5 and the first two-way valve 7 are similar to those of Figure 4 The embodiment shown is the same, but the structure of the bypass pipe 10 and the configuration of the second two-way valve 12 are the same as Figure 4 The embodiment shown is different. That is, the bypass pipe 10 has an ascending section 10A extending obliquely upward from the exhaust gas transfer pipe 5, and the second two-way valve 12 is installed in the ascending section 10A. The lower end of the ascending section 10A is connected to the exhaust gas transfer pipe 5, and the upper end of the ascending section 10A is connected to the second two-way valve 12. The second two-way valve 12 is arranged at an angle. More specifically, the second flow path 16 of the second two-way valve 12 is inclined relative to the vertical direction at an angle greater than 0 and less than 45 degrees. In this embodiment, since the ascending section 10A extends in the longitudinal direction, it is difficult for powder in the exhaust gas to reach the second two-way valve 12.

[0072] Figure 6 Schematic diagram showing another embodiment of the flow path system. The structure and operation of this embodiment not specifically described are similar to those of the reference Figures 1 to 5 The above-described embodiments are the same, so repeated descriptions thereof are omitted. Figure 6 As shown, the flow path system further includes an inert gas supply line 40 for supplying inert gas into the bypass pipe 10. The inert gas supply line is connected to the bypass pipe 10 at a position below the second two-way valve 12. The inert gas supply line 40 is connected to an inert gas supply source not shown. As an example of the inert gas, nitrogen can be cited.

[0073] The inert gas flows into the bypass pipe 10 at a position below the second two-way valve 12 through the inert gas supply line 40. Furthermore, the inert gas flows through the bypass pipe 10 and flows into the exhaust gas transfer pipe 5. The downward flow of the inert gas in the bypass pipe 10 can prevent the powder in the exhaust gas from reaching the second two-way valve 12. Furthermore, the inert gas can reduce the concentration of the exhaust gas in the exhaust gas transfer pipe 5 and the bypass pipe 10, and reduce the sublimation temperature. As a result, the powder composed of the sublimable by-product is less likely to accumulate in the first two-way valve 7 and the second two-way valve 12.

[0074] exist Figure 7In other embodiments shown, the flow path system further includes a heating device 41 for heating the inert gas in the inert gas supply line 40. The heating device 41 is installed in the inert gas supply line 40 and is configured to heat the inert gas flowing in the inert gas supply line 40. For example, the heating device 41 is configured to heat the inert gas to a temperature above the sublimation temperature of the byproduct of the exhaust gas (for example, 200° C.). The specific structure of the heating device 41 is not particularly limited, and for example, an electric heater can be used as the heating device 41.

[0075] The heated inert gas can increase the temperature of the exhaust gas in the exhaust gas transfer pipe 5 and the bypass pipe 10. Therefore, it is difficult to form powder composed of sublimable by-products. As a result, the valve core 33 of the first two-way valve 7 and the second two-way valve 12 can be smoothly operated, and the sealing performance can be maintained to prevent leakage of the exhaust gas.

[0076] Reference Figure 6 and Figure 7 The embodiments of the inert gas supply line 40 and the heating device 41 described above can also be applied to the Figure 4 and Figure 5 Description of the embodiment.

[0077] In each of the above-mentioned embodiments, the first two-way valve 7 and the second two-way valve 12 as the on-off valve are ball valves having a ball-shaped valve core 33. In one embodiment, the first two-way valve 7 and the second two-way valve 12 may be on-off valves other than ball valves, such as a ball valve, a needle valve, a diaphragm valve, a gate valve, etc. However, from the viewpoint that the valve core is unlikely to bite into the powder, it is preferable to use a ball valve.

[0078] The above-mentioned embodiments are recorded for the purpose of enabling a person with common knowledge in the technical field to which the present invention belongs to implement the present invention. Various modifications of the above-mentioned embodiments can be accomplished by those skilled in the art as a matter of course, and the technical idea of ​​the present invention can also be applied to other embodiments. Therefore, the present invention is not limited to the described embodiments, but should comply with the widest scope of the technical idea defined by the scope of the patent claim.

Claims

1. A flow path system, characterized in that: have: An exhaust gas transfer pipe, which is used to transfer the exhaust gas to the detoxification reactor; a first two-way valve installed in the exhaust gas transfer pipe; a bypass pipe branching from the exhaust gas transfer pipe at a position on the upstream side of the first two-way valve and bypassing the detoxification reactor; as well as a second two-way valve, the second two-way valve being installed in the bypass pipe, The first two-way valve and the second two-way valve are disposed in a longitudinal direction so that the flow path of the exhaust gas extends in the longitudinal direction.

2. The flow path system according to claim 1, characterized in that: The exhaust gas transfer pipe has a longitudinal section extending in the longitudinal direction. The bypass pipe has a rising section extending upward. The first two-way valve is arranged in the longitudinal section, The second two-way valve is arranged in the rising section.

3. The flow path system according to claim 1, characterized in that: The second two-way valve is located at a higher position than the first two-way valve.

4. The flow path system according to claim 1, characterized in that: The bypass pipe further includes an inert gas supply line for supplying an inert gas into the bypass pipe. The inert gas supply line is connected to the bypass pipe at a position below the second two-way valve.

5. The flow path system according to claim 4, characterized in that: A heating device is further provided, the heating device heating the inert gas in the inert gas supply line.

6. The flow path system according to claim 1, characterized in that: The first two-way valve and the second two-way valve are respectively ball valves.

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